JP7659490B2 - 音響センサの較正方法 - Google Patents
音響センサの較正方法 Download PDFInfo
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- JP7659490B2 JP7659490B2 JP2021207690A JP2021207690A JP7659490B2 JP 7659490 B2 JP7659490 B2 JP 7659490B2 JP 2021207690 A JP2021207690 A JP 2021207690A JP 2021207690 A JP2021207690 A JP 2021207690A JP 7659490 B2 JP7659490 B2 JP 7659490B2
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- G—PHYSICS
- G01—MEASURING; TESTING
- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N29/00—Investigating or analysing materials by the use of ultrasonic, sonic or infrasonic waves; Visualisation of the interior of objects by transmitting ultrasonic or sonic waves through the object
- G01N29/04—Analysing solids
- G01N29/12—Analysing solids by measuring frequency or resonance of acoustic waves
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- G—PHYSICS
- G01—MEASURING; TESTING
- G01H—MEASUREMENT OF MECHANICAL VIBRATIONS OR ULTRASONIC, SONIC OR INFRASONIC WAVES
- G01H15/00—Measuring mechanical or acoustic impedance
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01H—MEASUREMENT OF MECHANICAL VIBRATIONS OR ULTRASONIC, SONIC OR INFRASONIC WAVES
- G01H17/00—Measuring mechanical vibrations or ultrasonic, sonic or infrasonic waves, not provided for in the other groups of this subclass
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B24—GRINDING; POLISHING
- B24B—MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
- B24B37/00—Lapping machines or devices; Accessories
- B24B37/005—Control means for lapping machines or devices
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B24—GRINDING; POLISHING
- B24B—MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
- B24B37/00—Lapping machines or devices; Accessories
- B24B37/005—Control means for lapping machines or devices
- B24B37/0053—Control means for lapping machines or devices detecting loss or breakage of a workpiece during lapping
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B24—GRINDING; POLISHING
- B24B—MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
- B24B37/00—Lapping machines or devices; Accessories
- B24B37/005—Control means for lapping machines or devices
- B24B37/013—Devices or means for detecting lapping completion
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B24—GRINDING; POLISHING
- B24B—MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
- B24B37/00—Lapping machines or devices; Accessories
- B24B37/34—Accessories
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B24—GRINDING; POLISHING
- B24B—MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
- B24B49/00—Measuring or gauging equipment for controlling the feed movement of the grinding tool or work; Arrangements of indicating or measuring equipment, e.g. for indicating the start of the grinding operation
- B24B49/003—Measuring or gauging equipment for controlling the feed movement of the grinding tool or work; Arrangements of indicating or measuring equipment, e.g. for indicating the start of the grinding operation involving acoustic means
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B24—GRINDING; POLISHING
- B24B—MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
- B24B49/00—Measuring or gauging equipment for controlling the feed movement of the grinding tool or work; Arrangements of indicating or measuring equipment, e.g. for indicating the start of the grinding operation
- B24B49/10—Measuring or gauging equipment for controlling the feed movement of the grinding tool or work; Arrangements of indicating or measuring equipment, e.g. for indicating the start of the grinding operation involving electrical means
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01H—MEASUREMENT OF MECHANICAL VIBRATIONS OR ULTRASONIC, SONIC OR INFRASONIC WAVES
- G01H1/00—Measuring characteristics of vibrations in solids by using direct conduction to the detector
- G01H1/04—Measuring characteristics of vibrations in solids by using direct conduction to the detector of vibrations which are transverse to direction of propagation
- G01H1/06—Frequency
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01H—MEASUREMENT OF MECHANICAL VIBRATIONS OR ULTRASONIC, SONIC OR INFRASONIC WAVES
- G01H3/00—Measuring characteristics of vibrations by using a detector in a fluid
- G01H3/005—Testing or calibrating of detectors covered by the subgroups of G01H3/00
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N29/00—Investigating or analysing materials by the use of ultrasonic, sonic or infrasonic waves; Visualisation of the interior of objects by transmitting ultrasonic or sonic waves through the object
- G01N29/14—Investigating or analysing materials by the use of ultrasonic, sonic or infrasonic waves; Visualisation of the interior of objects by transmitting ultrasonic or sonic waves through the object using acoustic emission techniques
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N29/00—Investigating or analysing materials by the use of ultrasonic, sonic or infrasonic waves; Visualisation of the interior of objects by transmitting ultrasonic or sonic waves through the object
- G01N29/22—Details, e.g. general constructional or apparatus details
- G01N29/30—Arrangements for calibrating or comparing, e.g. with standard objects
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N29/00—Investigating or analysing materials by the use of ultrasonic, sonic or infrasonic waves; Visualisation of the interior of objects by transmitting ultrasonic or sonic waves through the object
- G01N29/36—Detecting the response signal, e.g. electronic circuits specially adapted therefor
- G01N29/42—Detecting the response signal, e.g. electronic circuits specially adapted therefor by frequency filtering or by tuning to resonant frequency
-
- G—PHYSICS
- G08—SIGNALLING
- G08B—SIGNALLING SYSTEMS, e.g. PERSONAL CALLING SYSTEMS; ORDER TELEGRAPHS; ALARM SYSTEMS
- G08B21/00—Alarms responsive to a single specified undesired or abnormal condition and not otherwise provided for
- G08B21/18—Status alarms
- G08B21/182—Level alarms, e.g. alarms responsive to variables exceeding a threshold
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
- H10P72/00—Handling or holding of wafers, substrates or devices during manufacture or treatment thereof
- H10P72/04—Apparatus for manufacture or treatment
- H10P72/0428—Apparatus for mechanical treatment or grinding or cutting
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
- H10P72/00—Handling or holding of wafers, substrates or devices during manufacture or treatment thereof
- H10P72/06—Apparatus for monitoring, sorting, marking, testing or measuring
- H10P72/0604—Process monitoring, e.g. flow or thickness monitoring
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
- H10P74/00—Testing or measuring during manufacture or treatment of wafers, substrates or devices
- H10P74/23—Testing or measuring during manufacture or treatment of wafers, substrates or devices characterised by multiple measurements, corrections, marking or sorting processes
- H10P74/238—Testing or measuring during manufacture or treatment of wafers, substrates or devices characterised by multiple measurements, corrections, marking or sorting processes comprising acting in response to an ongoing measurement without interruption of processing, e.g. endpoint detection or in-situ thickness measurement
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- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Engineering & Computer Science (AREA)
- Mechanical Engineering (AREA)
- Acoustics & Sound (AREA)
- Analytical Chemistry (AREA)
- General Health & Medical Sciences (AREA)
- Health & Medical Sciences (AREA)
- Life Sciences & Earth Sciences (AREA)
- Chemical & Material Sciences (AREA)
- Pathology (AREA)
- Biochemistry (AREA)
- Immunology (AREA)
- Emergency Management (AREA)
- Business, Economics & Management (AREA)
- Mechanical Treatment Of Semiconductor (AREA)
- Finish Polishing, Edge Sharpening, And Grinding By Specific Grinding Devices (AREA)
- Constituent Portions Of Griding Lathes, Driving, Sensing And Control (AREA)
- Machine Tool Sensing Apparatuses (AREA)
- Measurement Of Mechanical Vibrations Or Ultrasonic Waves (AREA)
Description
一態様では、前記音源は、前記AEセンサと同一の構成を有する音源用AEセンサである。
一態様では、前記音源は、前記AEセンサの直上に配置される。
一態様では、前記音響センサは、前記基板保持装置を支持するアームに連結された超音波センサであり、前記音源は、前記音響センサに連結される。
一態様では、前記音響センサは、AEセンサである。
一態様では、前記音源は、前記AEセンサと同一の構成を有する音源用AEセンサである。
一参考例では、前記少なくとも2つの特徴音を前記音響センサに入力する工程は、前記基板を前記基板保持装置に保持させた状態で行われる。
図1は、一実施形態に係る研磨装置を示す模式図である。図1に示すように、研磨装置は、研磨パッド2を支持する研磨テーブル3と、基板の一例であるウエハWを保持して、研磨パッド2に押し付ける研磨ヘッド(基板保持装置)1と、研磨テーブル3を回転させるテーブルモータ6と、研磨パッド2上にスラリーなどの研磨液を供給するための研磨液供給ノズル5と、研磨装置の動作を制御するための制御装置9を備えている。研磨パッド2の上面は、ウエハWを研磨する研磨面2aを構成する。
2 研磨パッド
3 研磨テーブル
5 研磨液供給ノズル
6 テーブルモータ
9 制御装置
10 ヘッドシャフト
15 ヘッドアーム
44 音響センサ
45 音源
46 信号発生器
48 センサアーム
49 音処理装置
50 ブラケット
Claims (10)
- 基板保持装置に保持された基板を、研磨テーブルに取り付けられた研磨パッドに押し付けて、該基板を研磨する研磨装置に設けられた音響センサを較正する方法であって、
前記音響センサを用いて、前記基板の研磨音を取得し、
前記取得された研磨音から、特徴周波数を有する少なくとも2つの特徴音を抽出し、
前記研磨テーブル、前記音響センサ、および前記基板保持装置のいずれかに連結された音源から前記少なくとも2つの特徴音を出力して、前記少なくとも2つの特徴音を前記音響センサに入力し、
前記少なくとも2つの特徴音に対する前記音響センサの出力値が許容範囲に入るように、前記音響センサの出力値を較正し、
前記少なくとも2つの特徴音は、前記音響センサによって取得された研磨音のうち特徴的なピークを有する周波数の音である、方法。 - 前記音響センサは、前記研磨テーブルに取り付けられたAEセンサであり、
前記音源は、前記研磨パッドまたは前記研磨テーブルにおける前記基板の研磨位置に対応する位置に配置される、請求項1に記載の方法。 - 前記音源は、前記AEセンサと同一の構成を有する音源用AEセンサである、請求項2に記載の方法。
- 前記音源は、前記AEセンサの直上に配置される、請求項2または3に記載の方法。
- 前記音響センサは、前記基板保持装置を支持するアームに連結された超音波センサであり、
前記音源は、前記研磨パッドまたは前記研磨テーブルにおける前記基板の研磨位置に対応する位置に配置される、請求項1に記載の方法。 - 前記音響センサは、前記基板保持装置を支持するアームに連結された超音波センサであり、
前記音源は、前記音響センサに連結される、請求項1に記載の方法。 - 前記音響センサは、前記基板保持装置に取り付けられており、
前記音源は、前記基板保持装置に取り付けられる、請求項1に記載の方法。 - 前記音響センサは、AEセンサである、請求項7に記載の方法。
- 前記音源は、前記AEセンサと同一の構成を有する音源用AEセンサである、請求項8に記載の方法。
- 前記少なくとも2つの特徴音に対する前記音響センサの出力値が上限しきい値または下限しきい値を超えている場合に、警報を発する、請求項1乃至9のいずれか一項に記載の方法。
Priority Applications (5)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2021207690A JP7659490B2 (ja) | 2021-12-22 | 2021-12-22 | 音響センサの較正方法 |
| US18/080,510 US20230194477A1 (en) | 2021-12-22 | 2022-12-13 | Calibration method for acoustic sensor |
| KR1020220178053A KR20230095832A (ko) | 2021-12-22 | 2022-12-19 | 음향 센서의 교정 방법 |
| TW111148828A TWI921629B (zh) | 2021-12-22 | 2022-12-20 | 聲音檢測器之校正方法 |
| CN202211649857.7A CN116337209A (zh) | 2021-12-22 | 2022-12-21 | 声音传感器的校正方法 |
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| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2021207690A JP7659490B2 (ja) | 2021-12-22 | 2021-12-22 | 音響センサの較正方法 |
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| Publication Number | Publication Date |
|---|---|
| JP2023092579A JP2023092579A (ja) | 2023-07-04 |
| JP7659490B2 true JP7659490B2 (ja) | 2025-04-09 |
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| JP2021207690A Active JP7659490B2 (ja) | 2021-12-22 | 2021-12-22 | 音響センサの較正方法 |
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| Country | Link |
|---|---|
| US (1) | US20230194477A1 (ja) |
| JP (1) | JP7659490B2 (ja) |
| KR (1) | KR20230095832A (ja) |
| CN (1) | CN116337209A (ja) |
Families Citing this family (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| TWI775626B (zh) * | 2021-09-29 | 2022-08-21 | 吉而特科技股份有限公司 | 聲音定位的磨針裝置 |
Citations (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2017163100A (ja) | 2016-03-11 | 2017-09-14 | 東芝メモリ株式会社 | 半導体製造装置の制御装置および制御方法 |
Family Cites Families (7)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS62120950A (ja) * | 1985-11-15 | 1987-06-02 | Omron Tateisi Electronics Co | 工具折損検出装置 |
| US6352466B1 (en) * | 1998-08-31 | 2002-03-05 | Micron Technology, Inc. | Method and apparatus for wireless transfer of chemical-mechanical planarization measurements |
| JP5533666B2 (ja) * | 2008-12-12 | 2014-06-25 | 旭硝子株式会社 | 研磨装置、及び研磨方法、並びにガラス板の製造方法 |
| US10478937B2 (en) * | 2015-03-05 | 2019-11-19 | Applied Materials, Inc. | Acoustic emission monitoring and endpoint for chemical mechanical polishing |
| KR102626038B1 (ko) * | 2016-11-16 | 2024-01-17 | 주식회사 케이씨텍 | 화학 기계적 연마장치 |
| JP7227909B2 (ja) * | 2017-01-13 | 2023-02-22 | アプライド マテリアルズ インコーポレイテッド | インシトゥ監視からの測定値の、抵抗率に基づく調整 |
| CN111168569B (zh) * | 2020-01-08 | 2021-11-16 | 华中科技大学 | 一种磨削材料去除量预测方法、装置、设备及存储介质 |
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2021
- 2021-12-22 JP JP2021207690A patent/JP7659490B2/ja active Active
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2022
- 2022-12-13 US US18/080,510 patent/US20230194477A1/en active Granted
- 2022-12-19 KR KR1020220178053A patent/KR20230095832A/ko active Pending
- 2022-12-21 CN CN202211649857.7A patent/CN116337209A/zh active Pending
Patent Citations (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2017163100A (ja) | 2016-03-11 | 2017-09-14 | 東芝メモリ株式会社 | 半導体製造装置の制御装置および制御方法 |
Also Published As
| Publication number | Publication date |
|---|---|
| JP2023092579A (ja) | 2023-07-04 |
| TW202326846A (zh) | 2023-07-01 |
| CN116337209A (zh) | 2023-06-27 |
| US20230194477A1 (en) | 2023-06-22 |
| KR20230095832A (ko) | 2023-06-29 |
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