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JP7661695B2 - Cathode for electrolytic manganese dioxide production - Google Patents
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JP7661695B2 - Cathode for electrolytic manganese dioxide production - Google Patents

Cathode for electrolytic manganese dioxide production Download PDF

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JP7661695B2
JP7661695B2 JP2020214249A JP2020214249A JP7661695B2 JP 7661695 B2 JP7661695 B2 JP 7661695B2 JP 2020214249 A JP2020214249 A JP 2020214249A JP 2020214249 A JP2020214249 A JP 2020214249A JP 7661695 B2 JP7661695 B2 JP 7661695B2
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和正 末次
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    • CCHEMISTRY; METALLURGY
    • C01INORGANIC CHEMISTRY
    • C01BNON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
    • C01B11/00Oxides or oxyacids of halogens; Salts thereof
    • C01B11/12Chloric acid
    • CCHEMISTRY; METALLURGY
    • C25ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25BELECTROLYTIC OR ELECTROPHORETIC PROCESSES FOR THE PRODUCTION OF COMPOUNDS OR NON-METALS; APPARATUS THEREFOR
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    • C25B1/01Products
    • C25B1/21Manganese oxides
    • CCHEMISTRY; METALLURGY
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    • H01M4/06Electrodes for primary cells
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01MPROCESSES OR MEANS, e.g. BATTERIES, FOR THE DIRECT CONVERSION OF CHEMICAL ENERGY INTO ELECTRICAL ENERGY
    • H01M4/00Electrodes
    • H01M4/02Electrodes composed of, or comprising, active material
    • H01M4/36Selection of substances as active materials, active masses, active liquids
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01MPROCESSES OR MEANS, e.g. BATTERIES, FOR THE DIRECT CONVERSION OF CHEMICAL ENERGY INTO ELECTRICAL ENERGY
    • H01M4/00Electrodes
    • H01M4/02Electrodes composed of, or comprising, active material
    • H01M4/36Selection of substances as active materials, active masses, active liquids
    • H01M4/48Selection of substances as active materials, active masses, active liquids of inorganic oxides or hydroxides
    • H01M4/50Selection of substances as active materials, active masses, active liquids of inorganic oxides or hydroxides of manganese
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01MPROCESSES OR MEANS, e.g. BATTERIES, FOR THE DIRECT CONVERSION OF CHEMICAL ENERGY INTO ELECTRICAL ENERGY
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    • H01M4/02Electrodes composed of, or comprising, active material
    • H01M4/36Selection of substances as active materials, active masses, active liquids
    • H01M4/58Selection of substances as active materials, active masses, active liquids of inorganic compounds other than oxides or hydroxides, e.g. sulfides, selenides, tellurides, halogenides or LiCoFy; of polyanionic structures, e.g. phosphates, silicates or borates
    • H01M4/583Carbonaceous material, e.g. graphite-intercalation compounds or CFx
    • YGENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y02TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
    • Y02EREDUCTION OF GREENHOUSE GAS [GHG] EMISSIONS, RELATED TO ENERGY GENERATION, TRANSMISSION OR DISTRIBUTION
    • Y02E60/00Enabling technologies; Technologies with a potential or indirect contribution to GHG emissions mitigation
    • Y02E60/10Energy storage using batteries

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  • Electrolytic Production Of Non-Metals, Compounds, Apparatuses Therefor (AREA)

Description

本発明は、電解二酸化マンガン製造用陰極に関するものであり、より詳しくは、例えば、マンガン乾電池、特にアルカリマンガン乾電池において、正極活物質として使用される電解二酸化マンガンの製造に用いる陰極に関する。 The present invention relates to a cathode for producing electrolytic manganese dioxide, and more specifically, to a cathode used in producing electrolytic manganese dioxide to be used as a positive electrode active material in, for example, manganese dry batteries, particularly alkaline manganese dry batteries.

電解二酸化マンガンは、例えば、マンガン乾電池、特にアルカリマンガン乾電池の正極活物質として知られており、保存性に優れ、かつ安価であるという利点を有する。特に、電解二酸化マンガンを正極活物質として用いるアルカリマンガン乾電池は、ローレート放電からハイレート放電まで幅広い放電レートでの放電特性に優れていることから、電子機器、携帯用プレイヤー、携帯情報機器、さらにはゲーム機や玩具にまで幅広く使用され、日本だけでなく、世界でその需要が伸びてきている。 Electrolytic manganese dioxide is known, for example, as a positive electrode active material for manganese dry batteries, especially alkaline manganese dry batteries, and has the advantages of being excellent in storage stability and inexpensive. In particular, alkaline manganese dry batteries that use electrolytic manganese dioxide as the positive electrode active material have excellent discharge characteristics over a wide range of discharge rates, from low-rate discharge to high-rate discharge, and are therefore widely used in electronic devices, portable players, portable information devices, and even game consoles and toys, with demand for them growing not only in Japan but also around the world.

電解二酸化マンガンは、一般的に、硫酸酸性の硫酸マンガン電解液中で、陽極と陰極の間に電流を流すことにより、陽極上に電解酸化析出させて製造される。一般的に、陽極にはチタンなどが用いられ、対極である陰極には、主に黒鉛が用いられているが、希少例として銅や鋼が用いられる(特許文献1)。 Electrolytic manganese dioxide is generally produced by electrolytic oxidation and deposition on the anode by passing an electric current between the anode and cathode in a manganese sulfate electrolyte, which is acidic with sulfuric acid. Generally, titanium is used for the anode, and graphite is mainly used for the counter electrode, the cathode, although copper and steel are used in rare cases (Patent Document 1).

電解二酸化マンガン製造時には、電解液の温度を93℃~98℃の高温で保つ必要があり、電解期間が1~4週間の長期に及ぶため、パラフィンなどの沸点が高い油層を電解液の上に浮かべ、電解液の蒸散を防ぐ対策がとられる。 When producing electrolytic manganese dioxide, the temperature of the electrolyte must be kept at a high temperature of 93°C to 98°C, and since the electrolysis period is long, lasting from 1 to 4 weeks, a layer of oil with a high boiling point, such as paraffin, is floated on top of the electrolyte to prevent the electrolyte from evaporating.

このパラフィンは、電解中だけでなく、電解終了後に電解二酸化マンガンが析出した陽極を電解槽から引き抜いてパラフィン油層を通過する際に、電解二酸化マンガン析出物に付着して取り込まれ、電解二酸化マンガンの製品品質に影響を与えるため、電解二酸化マンガンに取り込まれたパラフィンを熱湯洗浄で取り除いたり、あるいはパラフィンを極力取り込ませない工夫を施した電解方法が検討されている(特許文献2)。 This paraffin adheres to and is absorbed into the electrolytic manganese dioxide deposit not only during electrolysis, but also when the anode on which electrolytic manganese dioxide is deposited is removed from the electrolytic cell and passes through the paraffin oil layer after electrolysis is completed, affecting the product quality of electrolytic manganese dioxide. Therefore, electrolysis methods that remove paraffin absorbed into electrolytic manganese dioxide by washing with hot water or that incorporate measures to minimize the incorporation of paraffin are being investigated (Patent Document 2).

一方で、このように電解二酸化マンガンの析出反応が進行する陽極側に対し、水素発生反応が進行する陰極側では、製品品質に直接影響を与えることはないので、これまであまり着目されることもなく、過去に検討された例も少ない。 However, unlike the anode side where the electrolytic manganese dioxide precipitation reaction takes place, the cathode side where the hydrogen generation reaction takes place does not directly affect product quality, so it has not received much attention and there have been few cases in which it has been studied in the past.

しかしながら、我々の検討によると、陰極に黒鉛を用いる場合、陰極が劣化し、結果として、電解二酸化マンガンの製造効率を著しく低下させる課題があることが判明した。 However, our research has revealed that when graphite is used for the cathode, the cathode deteriorates, resulting in a significant decrease in the production efficiency of electrolytic manganese dioxide.

WO2000/037714号公報WO2000/037714 publication 特開2001-247987号公報JP 2001-247987 A

本発明の目的は、電解二酸化マンガン製造用に改質された陰極であり、陰極表面形状に沿って銅被膜を被覆した陰極、及びその製造方法を提供するものである。 The object of the present invention is to provide a cathode modified for the production of electrolytic manganese dioxide, which is coated with a copper film conforming to the cathode surface shape, and a method for producing the same.

本発明者は、電解二酸化マンガン製造に使用される陰極の性能発現と劣化の挙動について調査の上、陰極の改質について鋭意検討を重ねた結果、陰極表面形状に沿って銅被膜を被覆した陰極を用いることにより、陰極の劣化が抑制されるだけでなく、長期に亘って安定的に性能を維持でき、耐久性に優れることを見出して本発明を完成するに至ったものである。すなわち、本発明は、銅被膜が被覆された黒鉛板で構成される電解二酸化マンガン製造用陰極である。 The inventors investigated the performance expression and deterioration behavior of cathodes used in electrolytic manganese dioxide production, and conducted extensive research into modifying the cathode. As a result, they discovered that by using a cathode coated with a copper film conforming to the cathode surface shape, not only is the deterioration of the cathode suppressed, but the performance can be stably maintained over a long period of time and the cathode has excellent durability, which led to the completion of the present invention. In other words, the present invention is a cathode for electrolytic manganese dioxide production composed of a graphite plate coated with a copper film.

以下に、本発明について詳細に説明する。 The present invention is described in detail below.

本発明の電解二酸化マンガン製造用陰極は、銅被膜が被覆された黒鉛板で構成されるものである。 The cathode for producing electrolytic manganese dioxide of the present invention is composed of a graphite plate coated with a copper film.

黒鉛板は、金属精錬やめっきでも使用される板形状のものが主であるが、本質的にはこの形状に限るものではない。また、前述したように、黒鉛板内部にパラフィンが含まれている場合は、熱湯洗浄処理、有機溶剤処理、アルカリ液を用いた脱脂処理を施したり、または燃焼処理することによって、大部分のパラフィンを除去することが望ましく、少なくとも後に銅被膜が被覆される表面付近にはパラフィンが存在しないことが望ましい。工業的には、主にアルカリ成分で構成される脱脂洗浄剤などが用いられる場合がある。 Graphite plates are mostly in the form of plates used in metal refining and plating, but are not essentially limited to this shape. Also, as mentioned above, if paraffin is contained inside the graphite plate, it is desirable to remove most of the paraffin by washing with hot water, treating with an organic solvent, degreasing treatment using an alkaline solution, or by burning, and it is desirable that there is no paraffin at least near the surface that will later be coated with the copper coating. In industry, degreasing cleaners composed mainly of alkaline components are sometimes used.

銅被膜は銅基金属でありその純度について限定はないが、銅が60wt%以上含まれることが好ましく、鉄やニッケルなどの遷移金属やイオウやリンなどの非金属などとの複合被膜であっても良い。 The copper coating is a copper-based metal, and there is no restriction on its purity, but it is preferable that it contains 60 wt% or more copper, and it may be a composite coating with transition metals such as iron or nickel, or non-metals such as sulfur or phosphorus.

銅被膜は、黒鉛板上に存在してその電気的接触を保つことによって、電極触媒として作用する。銅の水素発生電極触媒活性は、基礎化学的にもグラファイトの素材であるカーボンよりも優れていることが知られており(U.R.EVANS著,THE CORROSION AND OXIDATION OF METALS)、例えば、水素過電圧として、カーボンが0.7Vなのに対して、銅が0.53Vとなり、低い水素過電圧で優れた活性を示すとされる。 The copper coating acts as an electrode catalyst by being on the graphite plate and maintaining electrical contact. The hydrogen generation electrode catalytic activity of copper is known to be superior to that of carbon, the material from which graphite is made, even in terms of basic chemistry (U.R. Evans, THE CORROSION AND OXIDATION OF METALS). For example, the hydrogen overvoltage of carbon is 0.7 V, while that of copper is 0.53 V, and it is said to show excellent activity at low hydrogen overvoltages.

黒鉛板表面上に被覆される銅被膜の厚みは限定されるものではないが、好ましくは0.3μm以上100μm以下が、より好ましくは0.5μm以上100μm以下が、さらに好ましくは0.5μm以上50μm以下が、最も好ましくは1μm以上20μm以下が選択される。黒鉛板表面には数μm~数mm程度の凹凸が存在する場合があり、この黒鉛板表面の凹凸は、前述した厚みの銅被膜によって全面的に覆われることが望ましいが、必ずしも完全に覆われる必要はなく、少なくとも銅が電極触媒活性を発現できる被覆率、例えば40%の被覆率であっても良い。なお、黒鉛板に電流を供給する給電部など、電解液に浸漬されない黒鉛板の部分は、電極触媒反応には寄与しないので、必ずしも銅被膜に覆われる必要はない。 The thickness of the copper coating applied to the graphite plate surface is not limited, but is preferably 0.3 μm to 100 μm, more preferably 0.5 μm to 100 μm, even more preferably 0.5 μm to 50 μm, and most preferably 1 μm to 20 μm. The graphite plate surface may have irregularities of several μm to several mm, and it is desirable for these irregularities on the graphite plate surface to be completely covered with a copper coating of the above-mentioned thickness, but it is not necessary to cover them completely. The coverage may be at least such that copper can exhibit electrocatalytic activity, for example, a coverage of 40%. Note that the parts of the graphite plate that are not immersed in the electrolyte, such as the power supply part that supplies current to the graphite plate, do not contribute to the electrocatalytic reaction, and therefore do not necessarily need to be covered with a copper coating.

本発明の電解二酸化マンガン製造用陰極は、黒鉛板を作用極として、銅イオンを含む電解液中で電気めっき又は無電解めっきして銅被膜を被覆することで製造することができる。 The cathode for producing electrolytic manganese dioxide of the present invention can be produced by using a graphite plate as the working electrode and coating it with a copper film by electroplating or electroless plating in an electrolyte containing copper ions.

黒鉛板に銅被膜を被覆する方法としては、例えば、電気めっき法、無電解めっき法等が用いられる。 Methods for coating a graphite plate with a copper film include, for example, electroplating and electroless plating.

電気めっき法では、銅イオンを含む電解液に黒鉛板を浸し、黒鉛板と対極(陽極)との間に電流を所定時間流すことで銅が被覆される。 In electroplating, a graphite plate is immersed in an electrolyte containing copper ions, and a current is passed between the graphite plate and a counter electrode (anode) for a specified period of time to coat the plate with copper.

銅イオンを含む電解液は、硫酸銅、塩酸銅、硝酸銅やピロリン酸銅などの銅塩を電解液に溶解させて調製する。電解液には、銅塩以外に、添加剤として、クエン酸イオン、酒石酸イオン、リン酸イオン、ピロリン酸イオンなどの錯化剤、またはデキストリンやラウリル硫酸イオンなどに代表される光沢剤、あるいはチオ尿素に代表されるイオウ含有物質などが含まれる場合がある。また、銅イオンを含む電解液には、他の金属イオンとして、鉄イオンやニッケルイオンなどの遷移金属イオンを混合して、銅基合金の被膜を得る場合もある。但し、マンガンイオンなど、銅イオンと直接的な相互作用がなく、黒鉛板に析出しない金属イオンが含まれていても問題ない。 An electrolyte containing copper ions is prepared by dissolving copper salts such as copper sulfate, copper hydrochloride, copper nitrate, and copper pyrophosphate in the electrolyte. In addition to the copper salt, the electrolyte may contain additives such as complexing agents such as citrate ions, tartrate ions, phosphate ions, and pyrophosphate ions, or gloss agents such as dextrin and lauryl sulfate ions, or sulfur-containing substances such as thiourea. In addition, the electrolyte containing copper ions may be mixed with other metal ions such as transition metal ions such as iron ions and nickel ions to obtain a copper-based alloy coating. However, there is no problem if the electrolyte contains metal ions such as manganese ions that do not directly interact with copper ions and do not precipitate on the graphite plate.

電解液のpHは、電解液中に含まれる添加剤や金属イオンの性質に応じて調整される場合があるが、本発明の場合、概ねpH0.1以上pH7以下となる。 The pH of the electrolyte may be adjusted depending on the additives and properties of the metal ions contained in the electrolyte, but in the case of the present invention, it is generally pH 0.1 or more and pH 7 or less.

電解液の銅イオン濃度は特に制限されるものではないが、例えば、10mg/L以上30g/L以下が適用される。電解液温度も制限されるものではないが、例えば、40℃以上98℃以下が適用される。 The copper ion concentration of the electrolyte is not particularly limited, but for example, 10 mg/L or more and 30 g/L or less is applied. The electrolyte temperature is also not limited, but for example, 40°C or more and 98°C or less is applied.

対極(陽極)には、主に、不溶性の白金やイリジウムなどの貴金属が用いられるが、電解液中の成分濃度を制御することによって、銅などの電解溶解を伴う金属であっても使用することができる。 For the counter electrode (anode), insoluble precious metals such as platinum and iridium are primarily used, but by controlling the concentration of components in the electrolyte, even metals that undergo electrolytic dissolution, such as copper, can be used.

電解時に印加する電流としては、黒鉛板の電流密度として20A/m以上1000A/m以下の範囲で選択され、所定の銅被膜厚みになる時間まで電解が継続される。 The current applied during electrolysis is selected in the range of 20 A/m 2 to 1000 A/m 2 as the current density of the graphite plate, and electrolysis is continued until a predetermined copper coating thickness is achieved.

無電解めっき法では、銅イオンを含む電解液に還元剤を添加し、前処理を施した黒鉛板を所定時間浸すことで銅被覆される。 In the electroless plating method, a reducing agent is added to an electrolyte containing copper ions, and a pretreated graphite plate is immersed in the electrolyte for a specified period of time to be coated with copper.

銅イオンを含む電解液は、硫酸銅、塩酸銅、硝酸銅やピロリン酸銅などの銅塩を電解液に溶解させて調製する。電解液には、銅塩以外に、添加剤として、クエン酸イオン、酒石酸イオン、リン酸イオン、ピロリン酸イオンなどの錯化剤、またはポリアセチレングリコール系の界面活性剤、あるいはチオ尿素に代表されるイオウ含有物質やホウ酸などが含まれる場合がある。また、銅イオンを含む電解液には、他の金属イオンとして、ニッケルイオンなどの遷移金属イオンを混合して、銅基合金の被膜を得る場合もある。 An electrolyte containing copper ions is prepared by dissolving copper salts such as copper sulfate, copper hydrochloride, copper nitrate, and copper pyrophosphate in the electrolyte. In addition to the copper salt, the electrolyte may contain additives such as complexing agents such as citrate ions, tartrate ions, phosphate ions, and pyrophosphate ions, polyacetylene glycol surfactants, sulfur-containing substances such as thiourea, and boric acid. In addition, transition metal ions such as nickel ions may be mixed into the electrolyte containing copper ions to obtain a copper-based alloy coating.

還元剤としては、代表的に次亜リン酸ナトリウムが使用される。 Sodium hypophosphite is typically used as a reducing agent.

電解液のpHは、電解液中に含まれる添加剤や金属イオンの性質に応じて調整されるが、本発明の場合、概ねpH7以上pH12以下になるように調整される。 The pH of the electrolyte is adjusted according to the additives and the properties of the metal ions contained in the electrolyte, but in the case of the present invention, it is adjusted to be generally pH 7 or higher and pH 12 or lower.

電解液の銅イオン濃度は特に制限されるものではないが、例えば、0.5g/L以上30g/L以下が適用される。電解液温度も制限されるものではないが、例えば、20℃以上80℃以下が適用される。 The copper ion concentration of the electrolyte is not particularly limited, but for example, 0.5 g/L or more and 30 g/L or less is applied. The electrolyte temperature is also not limited, but for example, 20°C or more and 80°C or less is applied.

無電解めっきにおける浴負荷(電解液の容積V(m)に対するめっき対象物の面積A(m)のV/A比率)は、概ね5以上30以下の範囲で選択され、所定の銅被膜厚みになる時間まで浸漬が継続される。 The bath load in electroless plating (the V/A ratio of the area A ( m2 ) of the object to be plated to the volume V ( m3 ) of the electrolyte) is selected in the range of approximately 5 to 30, and immersion is continued until a predetermined copper coating thickness is achieved.

黒鉛板の前処理としては、黒鉛板のパラフィンを除去するために、熱湯洗浄処理、有機溶剤処理、アルカリ液を用いた脱脂処理などが行われたり、あらかじめ銅被覆の下地として他の金属をめっきするなどが行われる場合がある。工業的には、黒鉛板のパラフィンを除去するために、主にアルカリ成分で構成される脱脂洗浄剤などが用いられる場合がある。 Pretreatment of graphite plates may involve washing with hot water, treatment with organic solvents, degreasing with alkaline liquid, or plating with another metal as a base for the copper coating in order to remove paraffin from the graphite plate. In industry, degreasing cleaners mainly composed of alkaline components may be used to remove paraffin from the graphite plate.

本発明の電解二酸化マンガン製造用陰極は、陰極の劣化を抑制し、電解電圧を低く維持できるので、効率的で安定した電解二酸化マンガンの製造効率を発現できる。 The cathode for producing electrolytic manganese dioxide of the present invention suppresses cathode deterioration and can maintain a low electrolysis voltage, thereby achieving efficient and stable production efficiency of electrolytic manganese dioxide.

比較例3で得られた陰極の外観写真である。1 is a photograph showing the appearance of a cathode obtained in Comparative Example 3. 実施例1で得られた陰極の外観写真である。1 is a photograph showing the appearance of the cathode obtained in Example 1. 実施例1で得られた陰極の表面近傍の断面写真である。2 is a cross-sectional photograph of the surface vicinity of the cathode obtained in Example 1. 実施例3で得られた陰極の外観写真である。1 is a photograph showing the appearance of the cathode obtained in Example 3. 実施例4で得られた陰極の外観写真である。1 is a photograph showing the appearance of a cathode obtained in Example 4. 実施例7で得られた陰極の外観写真である。1 is a photograph showing the appearance of the cathode obtained in Example 7. 実施例8で得られた陰極の外観写真である。1 is a photograph showing the appearance of a cathode obtained in Example 8. 実施例9で得られた陰極の外観写真である。1 is a photograph showing the appearance of a cathode obtained in Example 9. 実施例1~4、実施例8、9と比較例4の、水素発生時における、電流密度の対数値と電位との変化を示すターフェルプロットである。1 is a Tafel plot showing the change in logarithm of current density and potential during hydrogen generation in Examples 1 to 4, Examples 8 and 9, and Comparative Example 4. 比較例1、3~6の、水素発生時における、電流密度の対数値と電位との変化を示すターフェルプロットである。1 is a Tafel plot showing the change in logarithm of current density and potential during hydrogen generation in Comparative Examples 1 and 3 to 6.

以下、本発明を実施例及び比較例により詳細に説明するが、本発明はこれら実施例に限定されるものではない。 The present invention will be described in detail below with reference to examples and comparative examples, but the present invention is not limited to these examples.

<電位性能測定用の陰極作製方法>
黒鉛などの陰極基材板を1cm角の面がとれるように切出して、測定方向が唯一の露出面となるようにして、その裏側にニッケルリード線を埋め込み電気的接触を保った状態で硬化樹脂(テクノビット#4071、マルトー製)に包埋させ、その後、露出面を#1500のサンドペーパーで研磨して、陰極(電極面積1×1cm)を作製した。
<Method of preparing cathode for measuring potential performance>
A cathode substrate plate such as graphite was cut to have a surface of 1 cm square so that the measurement direction was the only exposed surface. A nickel lead wire was embedded on the back side and, while maintaining electrical contact, the plate was embedded in a cured resin (Technovit #4071, manufactured by Marutoh). The exposed surface was then polished with #1500 sandpaper to produce a cathode (electrode area 1 x 1 cm2 ).

銅被膜を被覆した陰極を作製する場合は、陰極の露出面を銅イオンが含まれた電解液に浸し、電気めっき法または無電解めっき法にて銅被膜を被覆することによって得た。 To prepare a cathode coated with a copper film, the exposed surface of the cathode was immersed in an electrolyte containing copper ions and coated with a copper film using electroplating or electroless plating.

<電位性能測定>
陰極、または銅被膜が被覆された陰極の露出面を96℃、28g/Lの硫酸液に浸して、対極には白金板、参照極として飽和カロメル電極(S.C.E)を用い、ポテンショガルバノスタット(HA-151B、北斗電工製)に接続し、0.05~1A/dmの電流を印加して、S.C.E参照極に対する陰極電位の数値を読み取る方法で測定した。
<Measurement of potential performance>
The exposed surface of the cathode or the copper-coated cathode was immersed in a 28 g/L sulfuric acid solution at 96°C, a platinum plate was used as the counter electrode, and a saturated calomel electrode (S.C.E) was used as the reference electrode. The electrodes were connected to a potentiogalvanostat (HA-151B, Hokuto Denko Corporation), and a current of 0.05 to 1 A/ dm2 was applied to read the value of the cathode potential relative to the S.C.E reference electrode.

このうち、0.5A/dmの電流を印加した際の陰極電位を各陰極の陰極電位の代表値として示した。また、各陰極の他の性能指標として、0.05~1A/dm間の電位変化度合いをターフェル勾配(電極触媒材料の電気化学的な水素発生機構の指標として扱われる)として示した。 The cathode potential when a current of 0.5 A/ dm2 was applied was shown as a representative value of the cathode potential of each cathode. In addition, as another performance index of each cathode, the degree of potential change between 0.05 and 1 A/ dm2 was shown as the Tafel slope (used as an index of the electrochemical hydrogen generation mechanism of the electrode catalyst material).

<電解試験方法>
電解液として硫酸-硫酸マンガン混合溶液を用い、マンガンイオン濃度46g/Lの補給硫酸マンガン液を電解槽内に連続的に供給しながら、陰極、または銅被膜が被覆された陰極とチタン陽極の間に電流を印加し、チタン陽極上に電解二酸化マンガンを析出させる電解試験を行った。この際、電解電流密度を0.68A/dm、電解温度を96℃とし、電解槽内の硫酸濃度が34g/Lとなるよう調整しながら18日間電解した。電解中には、参照極として水銀/硫酸水銀電極を用い、陰極電位を測定した。
<Electrolytic test method>
An electrolysis test was performed in which a sulfuric acid-manganese sulfate mixed solution was used as the electrolyte, and a current was applied between the cathode or the copper-coated cathode and the titanium anode while continuously supplying a manganese sulfate replenishment solution with a manganese ion concentration of 46 g/L into the electrolytic cell, to deposit electrolytic manganese dioxide on the titanium anode. At this time, electrolysis was performed for 18 days while adjusting the electrolysis current density to 0.68 A/dm 2 , the electrolysis temperature to 96° C., and the sulfuric acid concentration in the electrolytic cell to 34 g/L. During the electrolysis, a mercury/mercury sulfate electrode was used as a reference electrode, and the cathode potential was measured.

比較例1
パラフィンが24mg/g浸透した黒鉛板(PSG322、SEC製)を用いて、陰極を作製し、電位測定を行った。陰極電位は-1.02V vs.S.C.Eで、ターフェル勾配は、-0.080V/decであった。
Comparative Example 1
A graphite plate (PSG322, manufactured by SEC) infiltrated with 24 mg/g of paraffin was used to prepare a cathode, and potential measurements were performed. The cathode potential was −1.02 V vs. S.C.E., and the Tafel slope was −0.080 V/dec.

比較例2
比較例1の黒鉛板を用いて、ヘキサンによるパラフィン抽出除去処理を行ったところ、パラフィン残存量は<0.5mg/gとなった。このパラフィン除去処理を行った黒鉛板で陰極を作製し、電位測定を行った。陰極電位は-0.70V vs.S.C.Eであった。
Comparative Example 2
When the graphite plate of Comparative Example 1 was subjected to paraffin extraction and removal treatment with hexane, the amount of remaining paraffin was less than 0.5 mg/g. A cathode was made from the graphite plate subjected to the paraffin removal treatment, and the potential was measured. The cathode potential was −0.70 V vs. S.C.E.

比較例3
比較例1の黒鉛板を用いて、燃焼によるパラフィン除去処理を行ったところ、パラフィン残存量は<0.5mg/gとなった。このパラフィン除去処理を行った黒鉛板で陰極を作製し、電位測定を行った。陰極電位は-0.62V vs.S.C.Eで、ターフェル勾配は、-0.083V/decであった。得られた陰極の外観写真を図1に示す。
Comparative Example 3
When the graphite plate of Comparative Example 1 was subjected to a paraffin removal treatment by combustion, the amount of remaining paraffin was <0.5 mg/g. A cathode was prepared using this graphite plate subjected to the paraffin removal treatment, and the potential was measured. The cathode potential was -0.62 V vs. S.C.E, and the Tafel gradient was -0.083 V/dec. A photograph of the appearance of the obtained cathode is shown in Figure 1.

実施例1
比較例3のパラフィン除去処理を行った黒鉛板で作製した陰極を、銅(Cu2+)イオン10g/L、硫酸濃度35g/Lの電解液に浸し、対極を白金板とし、温度70℃に保ちながら、電流密度0.05A/dmで50分間電気めっきを行い、陰極を得た。電気めっき後の陰極の陰極電位は-0.39V vs.S.C.Eで、ターフェル勾配は、-0.060V/decであった。得られた陰極の外観写真を図2に示し、表面近傍の断面写真を図3に示す。
Example 1
A cathode made of a graphite plate that had been subjected to the paraffin removal treatment of Comparative Example 3 was immersed in an electrolyte containing 10 g/L of copper (Cu 2+ ) ions and 35 g/L of sulfuric acid, and a platinum plate was used as the counter electrode. While maintaining the temperature at 70° C., electroplating was performed for 50 minutes at a current density of 0.05 A/dm 2 to obtain a cathode. The cathode potential after electroplating was −0.39 V vs. S.C.E, and the Tafel gradient was −0.060 V/dec. A photograph of the appearance of the obtained cathode is shown in FIG. 2, and a photograph of a cross section near the surface is shown in FIG. 3.

実施例2~4
実施例1において、電流密度と時間の電気めっき条件を変えた以外は、実施例1と同様にして電気めっきを行い、陰極を得た。これらの電気めっき条件と電気めっき後の陰極の陰極電位、ターフェル勾配の値を表1に示した。
Examples 2 to 4
A cathode was obtained by electroplating in the same manner as in Example 1, except that the electroplating conditions of the current density and time were changed in Example 1. These electroplating conditions and the cathode potential and Tafel slope values of the cathode after electroplating are shown in Table 1.

実施例3で得られた陰極の外観写真を図4に示し、実施例4で得られた陰極の外観写真を図5に示す。 Figure 4 shows a photograph of the appearance of the cathode obtained in Example 3, and Figure 5 shows a photograph of the appearance of the cathode obtained in Example 4.

実施例5
比較例3のパラフィン除去処理を行った黒鉛板で作製した陰極を用いて、マンガンイオン濃度27g/L、硫酸濃度36g/Lの水溶液に、銅(Cu2+)イオンを10mg/Lになるように添加して調製した電解液に浸し、対極を白金板とし、電流密度0.57A/dm、温度96℃に保ちながら、60分間通電し、電気めっきを行い、陰極を得た。電気めっき中に陰極の露出面から水素ガスの気泡発生が確認されたが、電気めっき後には陰極の露出面は銅色に変わり、銅被膜が被覆されていることが目視された。電気めっき後の陰極の陰極電位は-0.47V vs.S.C.Eであった。
Example 5
A cathode made of a graphite plate subjected to the paraffin removal treatment of Comparative Example 3 was immersed in an electrolytic solution prepared by adding copper (Cu 2+ ) ions to an aqueous solution having a manganese ion concentration of 27 g/L and a sulfuric acid concentration of 36 g/L to obtain a cathode by electroplating for 60 minutes while maintaining a current density of 0.57 A/dm 2 and a temperature of 96° C., and a hydrogen gas bubble generation was confirmed from the exposed surface of the cathode during electroplating, but after electroplating, the exposed surface of the cathode turned copper color, and it was visually confirmed that the cathode was coated with a copper film. The cathode potential of the cathode after electroplating was −0.47 V vs. S.C.E.

実施例6~7
実施例5において、水溶液に添加する銅(Cu2+)イオンの濃度を100mg/Lおよび1000mg/Lとする以外は、実施例5と同様にして電気めっきを行い、陰極を得た。いずれも、電気めっき中に陰極の露出面から水素ガスの気泡発生が確認されたが、電気めっき後には陰極の露出面は銅色に変わり、銅被膜が被覆されていることが目視された。これらの電気めっき条件と電気めっき後の陰極の陰極電位の値を表1に示した。実施例7で得られた陰極の外観写真を図6に示す。
Examples 6 to 7
In Example 5, electroplating was performed in the same manner as in Example 5, except that the concentrations of copper (Cu 2+ ) ions added to the aqueous solution were 100 mg/L and 1000 mg/L, to obtain cathodes. In both cases, hydrogen gas bubbles were observed to be generated from the exposed surface of the cathode during electroplating, but after electroplating, the exposed surface of the cathode turned copper color, and it was visually confirmed that it was covered with a copper coating. These electroplating conditions and the cathode potential value of the cathode after electroplating are shown in Table 1. A photograph of the appearance of the cathode obtained in Example 7 is shown in FIG. 6.

実施例8
比較例3のパラフィン除去処理を行った黒鉛板で作製した陰極を、銅(Cu2+)イオン2g/L、ニッケル(Ni2+)イオン0.14g/L、クエン酸ナトリウム13.5g/L、次亜リン酸ナトリウム・1水和物29g/L、ホウ酸31g/L、でんぷん0.4g/Lの電解液に、浴負荷(V/A)10の条件で浸し、pH9.0として、温度60℃に保ちながら、30分間無電解めっきを行い、陰極を得た。無電解めっき後には、陰極の浸漬部全体が銅色に変わり、銅被膜が被覆されていることが目視された。陰極の露出面のみを残して他の銅被膜部分をサンドペーパーで除去した後に測定した陰極の陰極電位は-0.46V vs.S.C.Eで、ターフェル勾配は-0.052V/decであった。得られた陰極の外観写真を図7に示す。
Example 8
A cathode made of a graphite plate subjected to the paraffin removal treatment of Comparative Example 3 was immersed in an electrolytic solution containing 2 g/L of copper (Cu 2+ ) ions, 0.14 g/L of nickel (Ni 2+ ) ions, 13.5 g/L of sodium citrate, 29 g/L of sodium hypophosphite monohydrate, 31 g/L of boric acid, and 0.4 g/L of starch under the condition of a bath load (V/A) of 10, and electroless plating was performed for 30 minutes while keeping the pH at 9.0 and the temperature at 60° C. to obtain a cathode. After electroless plating, the entire immersed part of the cathode turned copper color, and it was visually confirmed that the cathode was coated with a copper coating. The cathode potential of the cathode measured after removing the other copper coating parts with sandpaper, leaving only the exposed surface of the cathode, was −0.46 V vs. S.C.E, and the Tafel gradient was −0.052 V/dec. A photograph of the appearance of the obtained cathode is shown in FIG.

実施例9
電解液のpHを10.5とした以外は実施例8と同様にして無電解めっきを行い、陰極を得た。実施例8と同じく、無電解めっき後には、陰極の浸漬部全体が銅色に変わり、銅被膜が被覆されていることが目視された。陰極の露出面のみを残して他の銅被膜部分をサンドペーパーで除去した後に測定した陰極の陰極電位は-0.47V vs.S.C.Eで、ターフェル勾配は-0.059V/decであった。得られた陰極の外観写真を図8に示す。
Example 9
A cathode was obtained by electroless plating in the same manner as in Example 8, except that the pH of the electrolytic solution was 10.5. As in Example 8, after electroless plating, the entire immersed part of the cathode turned copper color, and it was visually observed that the cathode was coated with a copper film. The cathode potential of the cathode measured after removing the copper film with sandpaper, leaving only the exposed surface of the cathode, was −0.47 V vs. S.C.E, and the Tafel slope was −0.059 V/dec. A photograph of the appearance of the obtained cathode is shown in FIG.

比較例4
比較例1の黒鉛板に代えて、銅板を用いて陰極を作製し、電位測定を行った。陰極電位は-0.49V vs.S.C.Eで、ターフェル勾配は、-0.062V/decであった。
Comparative Example 4
A cathode was prepared using a copper plate instead of the graphite plate of Comparative Example 1, and potential measurement was performed. The cathode potential was −0.49 V vs. S.C.E, and the Tafel slope was −0.062 V/dec.

比較例5
比較例1の黒鉛板に代えて、ニッケル板を用いて陰極を作製し、電位測定を行った。陰極電位は-0.59V vs.S.C.Eで、ターフェル勾配は、-0.077V/decであった。
Comparative Example 5
A cathode was prepared by using a nickel plate instead of the graphite plate of Comparative Example 1, and potential measurement was performed. The cathode potential was −0.59 V vs. S.C.E, and the Tafel slope was −0.077 V/dec.

比較例6
比較例1の黒鉛板に代えて、白金板を用いて陰極を作製し、電位測定を行った。陰極電位は-0.35V vs.S.C.Eで、ターフェル勾配は、-0.034V/decであった。
Comparative Example 6
A cathode was prepared using a platinum plate instead of the graphite plate of Comparative Example 1, and potential measurements were performed. The cathode potential was −0.35 V vs. S.C.E, and the Tafel slope was −0.034 V/dec.

実施例1~4、実施例8、9と比較例4の、水素発生時における、電流密度の対数値と電位との変化を示すターフェルプロットを図9に示し、比較例1、3~6の、水素発生時における、電流密度の対数値と電位との変化を示すターフェルプロットを図10に示す。 Figure 9 shows Tafel plots showing the change in logarithm of current density and potential during hydrogen generation for Examples 1 to 4, Examples 8 and 9, and Comparative Example 4, and Figure 10 shows Tafel plots showing the change in logarithm of current density and potential during hydrogen generation for Comparative Examples 1 and 3 to 6.

以上のように、パラフィンを除去した黒鉛板に銅薄膜を被覆することにより、陰極電位が改善された。その特性レベルは、銅金属よりも優れ、白金貴金属に近いものであった。 As described above, the cathode potential was improved by coating a thin copper film on a graphite plate from which the paraffin had been removed. The characteristic level was superior to that of copper metal and close to that of platinum precious metal.

実施例10
無電解めっきを60分間行った以外は実施例8と同様にして、陰極を得た。得られた陰極について、<電解試験方法>に従って電解試験を行った。得られた陰極のパラフィン含有量は<0.5mg/gであり、銅含有量は1.88mg/cmで、銅被膜厚みは2.10μmであった。また、この陰極の硫酸/硫酸水銀参照極に対する陰極電位は、-0.91V vs.HgSOであった。これらの数値を表2に示した。
Example 10
A cathode was obtained in the same manner as in Example 8, except that electroless plating was performed for 60 minutes. An electrolytic test was performed on the obtained cathode according to the <Electrolytic Test Method>. The paraffin content of the obtained cathode was <0.5 mg/g, the copper content was 1.88 mg/ cm2 , and the copper coating thickness was 2.10 μm. The cathode potential relative to the sulfuric acid/mercury sulfate reference electrode was −0.91 V vs. Hg2SO4 . These values are shown in Table 2 .

実施例11~14
無電解めっきの時間と銅含有量と銅被膜厚みを変更した以外は実施例10と同様にして、陰極を得た。得られた陰極について、<電解試験方法>に従って電解試験を行った。これらの数値を表2にまとめて示した。なお、実施例13、14では、陰極からパラフィンが検出され、電解中にパラフィンがグラファイト基材へ再浸透したものと推定された。
Examples 11 to 14
Cathode was obtained in the same manner as in Example 10, except that the electroless plating time, copper content, and copper coating thickness were changed. Electrolysis test was performed on the obtained cathode according to <Electrolysis test method>. The values are summarized in Table 2. In Examples 13 and 14, paraffin was detected in the cathode, and it was presumed that paraffin re-permeated into the graphite substrate during electrolysis.

比較例7
比較例3のパラフィン除去処理を行った黒鉛板を陰極として、<電解試験方法>に従って電解試験を行った。この陰極のパラフィン含有量は<0.5mg/gであった。また、この陰極の硫酸/硫酸水銀参照極に対する陰極電位は、-1.35V vs.HgSOであった。
Comparative Example 7
An electrolysis test was carried out according to the <Electrolysis Test Method> using the graphite plate that had been subjected to the paraffin removal treatment of Comparative Example 3 as the cathode. The paraffin content of this cathode was <0.5 mg/g. The cathode potential of this cathode relative to the sulfuric acid/mercury sulfate reference electrode was -1.35 V vs. Hg2SO4 .

比較例8
パラフィンが54mg/g浸透した黒鉛板(PSG322、SEC製)を陰極として、<電解試験方法>に従って電解試験を行った。この陰極の硫酸/硫酸水銀参照極に対する陰極電位は、-1.52V vs.HgSOであった。
Comparative Example 8
An electrolysis test was carried out according to the <Electrolysis Test Method> using a graphite plate (PSG322, manufactured by SEC) permeated with 54 mg/g of paraffin as the cathode. The cathode potential of this cathode with respect to the sulfuric acid/mercury sulfate reference electrode was −1.52 V vs. Hg 2 SO 4 .

比較例9
銅板を陰極として、<電解試験方法>に従って電解試験を行った。この陰極の硫酸/硫酸水銀参照極に対する陰極電位は、-1.08V vs.HgSOであった。
Comparative Example 9
An electrolysis test was carried out using a copper plate as a cathode according to the <Electrolysis Test Method>. The cathode potential of this cathode with respect to a sulfuric acid/mercury sulfate reference electrode was −1.08 V vs. Hg 2 SO 4 .

以上のように、燃焼法によりパラフィンを除去した黒鉛板に無電解銅めっき法で銅薄膜を被覆することにより、硫酸-硫酸マンガン電解液を用いた電解二酸化マンガン析出の電解においても、陰極電位が改善された。その特性レベルは、銅金属よりも優れ、電解中にグラファイト基材へパラフィンが再浸透しても良好な性能を発現した。 As described above, by coating a thin copper film by electroless copper plating on a graphite plate from which paraffin had been removed by the combustion method, the cathode potential was improved even in electrolysis for electrolytic manganese dioxide deposition using a sulfuric acid-manganese sulfate electrolyte. The characteristic level was superior to that of copper metal, and good performance was demonstrated even when paraffin re-permeated into the graphite substrate during electrolysis.

実施例15
パラフィンが54mg/g浸透した黒鉛板(PSG322、SEC製)を用いて、55℃の脱脂洗浄剤(SC-60、旭油脂化学製)に15分間浸漬し、水洗した後に、無電解めっきを60分間行った以外は実施例8と同様にして、陰極を得た。得られた陰極について、<電解試験方法>に従って電解試験を行った。得られた陰極のパラフィン含有量は<0.5mg/gであり、銅被膜厚みは1.8μmであった。また、この陰極の硫酸/硫酸水銀参照極に対する陰極電位は、-0.97V vs.HgSOであった。これらの数値を表3に示した。
Example 15
A cathode was obtained in the same manner as in Example 8, except that a graphite plate (PSG322, manufactured by SEC) infiltrated with 54 mg/g of paraffin was immersed in a degreasing cleaner (SC-60, manufactured by Asahi Yushi Chemicals) at 55°C for 15 minutes, washed with water, and then electroless plating was performed for 60 minutes. An electrolytic test was performed on the obtained cathode according to the <Electrolytic test method>. The paraffin content of the obtained cathode was <0.5 mg/g, and the copper coating thickness was 1.8 μm. The cathode potential relative to a sulfuric acid/mercury sulfate reference electrode of this cathode was −0.97 V vs. Hg 2 SO 4. These values are shown in Table 3.

実施例16
パラフィンが54mg/g浸透した黒鉛板(PSG322、SEC製)を用いて、燃焼によりパラフィン除去した後に、実施例1と同様に電気めっきを行い、陰極を得た。得られた陰極について、<電解試験方法>に従って電解試験を行った。得られた陰極のパラフィン含有量は<0.5mg/gであり、銅被膜厚みは2.4μmであった。また、この陰極の硫酸/硫酸水銀参照極に対する陰極電位は、-1.06V vs.HgSOであった。これらの数値を表3に示した。
Example 16
A graphite plate (PSG322, manufactured by SEC) infiltrated with 54 mg/g of paraffin was used, and paraffin was removed by combustion, followed by electroplating in the same manner as in Example 1 to obtain a cathode. An electrolytic test was performed on the obtained cathode according to the <Electrolytic Test Method>. The paraffin content of the obtained cathode was <0.5 mg/g, and the copper coating thickness was 2.4 μm. The cathode potential of this cathode relative to a sulfuric acid/mercury sulfate reference electrode was −1.06 V vs. Hg 2 SO 4. These values are shown in Table 3.

実施例17
パラフィンが54mg/g浸透した黒鉛板(PSG322、SEC製)を用いて、55℃の脱脂洗浄剤(SC-60、旭油脂化学製)に15分間浸漬し、水洗した後に、実施例16と同様に電気めっきを行い、陰極を得た。得られた陰極について、<電解試験方法>に従って電解試験を行った。得られた陰極のパラフィン含有量は<0.5mg/gであり、銅被膜厚みは2.6μmであった。また、この陰極の硫酸/硫酸水銀参照極に対する陰極電位は、-1.03V vs.HgSOであった。これらの数値を表3に示した。
Example 17
A graphite plate (PSG322, manufactured by SEC) permeated with 54 mg/g of paraffin was immersed in a degreasing cleaner (SC-60, manufactured by Asahi Yushi Chemicals) at 55°C for 15 minutes, washed with water, and then electroplated in the same manner as in Example 16 to obtain a cathode. An electrolytic test was performed on the obtained cathode according to the <Electrolytic Test Method>. The paraffin content of the obtained cathode was <0.5 mg/g, and the copper coating thickness was 2.6 μm. The cathode potential of this cathode relative to a sulfuric acid/mercury sulfate reference electrode was −1.03 V vs. Hg 2 SO 4. These values are shown in Table 3.

実施例18
パラフィンが54mg/g浸透した黒鉛板(PSG322、SEC製)を用いて、40℃の脱脂洗浄剤(SC-60、旭油脂化学製)で15分間電解脱脂処理を行い、水洗した後に、実施例16と同様に電気めっきを行い、陰極を得た。得られた陰極について、<電解試験方法>に従って電解試験を行った。得られた陰極のパラフィン含有量は<0.5mg/gであり、銅被膜厚みは3.0μmであった。また、この陰極の硫酸/硫酸水銀参照極に対する陰極電位は、-1.07V vs.HgSOであった。これらの数値を表3に示した。
Example 18
A graphite plate (PSG322, manufactured by SEC) permeated with 54 mg/g of paraffin was subjected to electrolytic degreasing treatment for 15 minutes with a degreasing cleaner (SC-60, manufactured by Asahi Yushi Chemicals) at 40°C, washed with water, and then electroplated in the same manner as in Example 16 to obtain a cathode. An electrolytic test was performed on the obtained cathode according to the <Electrolytic Test Method>. The paraffin content of the obtained cathode was <0.5 mg/g, and the copper coating thickness was 3.0 μm. The cathode potential of this cathode relative to a sulfuric acid/mercury sulfate reference electrode was −1.07 V vs. Hg 2 SO 4. These values are shown in Table 3.

以上のように、パラフィンの一部を市販の脱脂洗浄剤を用いて除去した黒鉛板に、無電解めっき、電気めっきのいずれかの方法で銅薄膜を被覆することにより、硫酸-硫酸マンガン電解液を用いた電解二酸化マンガン析出の電解において、陰極電位が改善された。その特性レベルは、銅金属と同等以上の優れたものであった。 As described above, by coating a thin copper film by either electroless plating or electroplating on a graphite plate from which some of the paraffin had been removed using a commercially available degreasing cleaner, the cathode potential was improved in electrolysis for electrolytic manganese dioxide deposition using a sulfuric acid-manganese sulfate electrolyte. The characteristic level was excellent, equivalent to or better than that of copper metal.

本発明は、陰極の水素発生電極触媒反応の活性に優れ、長期に亘って低い電解電圧を維持できるため、低い電力原単位で安定して電解二酸化マンガンを製造できる。 The present invention has excellent activity in the hydrogen generation electrode catalytic reaction at the cathode and can maintain a low electrolysis voltage for a long period of time, making it possible to stably produce electrolytic manganese dioxide with a low power consumption rate.

1 黒鉛露出面
2 包埋樹脂部
3 銅被膜が被覆された黒鉛露出面
4 包埋樹脂
5 銅被膜
6 黒鉛
1 Graphite exposed surface 2 Embedding resin part 3 Graphite exposed surface covered with copper film 4 Embedding resin 5 Copper film 6 Graphite

Claims (11)

銅被膜が被覆された黒鉛板で構成されることを特徴とする電解二酸化マンガン製造用陰極。 A cathode for electrolytic manganese dioxide production, characterized by being composed of a graphite plate coated with a copper film. 銅被膜の厚みが0.3μm以上100μm以下であることを特徴とする請求項1に記載の電解二酸化マンガン製造用陰極。 The cathode for producing electrolytic manganese dioxide as described in claim 1, characterized in that the thickness of the copper coating is 0.3 μm or more and 100 μm or less. 銅被膜が銅を60wt%以上含む銅基金属で構成されることを特徴とする請求項1または請求項2に記載の電解二酸化マンガン製造用陰極。 The cathode for producing electrolytic manganese dioxide according to claim 1 or 2, characterized in that the copper coating is made of a copper-based metal containing 60 wt% or more of copper. 銅被膜が鉄またはニッケル含む銅基金属で構成されることを特徴とする請求項1~請求項3のいずれかの項に記載の電解二酸化マンガン製造用陰極。 4. The cathode for producing electrolytic manganese dioxide according to claim 1, wherein the copper coating is made of a copper-based metal containing iron or nickel. 銅被膜がリンまたはイオウを含む銅基金属で構成されることを特徴とする請求項1~請求項4のいずれかの項に記載の電解二酸化マンガン製造用陰極。 A cathode for producing electrolytic manganese dioxide according to any one of claims 1 to 4, characterized in that the copper coating is composed of a copper-based metal containing phosphorus or sulfur. 黒鉛板がパラフィンを含むことを特徴とする請求項1~請求項5のいずれかの項に記載の電解二酸化マンガン製造用陰極。 A cathode for producing electrolytic manganese dioxide as described in any one of claims 1 to 5, characterized in that the graphite plate contains paraffin. 黒鉛板を作用極として、銅イオンを含む電解液中で電気めっきして銅被膜を被覆することを特徴とする請求項1~請求項6のいずれかの項に記載の電解二酸化マンガン製造用陰極の製造方法。 A method for producing a cathode for producing electrolytic manganese dioxide according to any one of claims 1 to 6, characterized in that a graphite plate is used as the working electrode and a copper coating is formed by electroplating in an electrolyte containing copper ions. 黒鉛板を作用極として、銅イオンを含む電解液中で無電解めっきして銅被膜を被覆することを特徴とする請求項1~請求項6のいずれかの項に記載の電解二酸化マンガン製造用陰極の製造方法。 A method for producing a cathode for producing electrolytic manganese dioxide according to any one of claims 1 to 6, characterized in that a graphite plate is used as the working electrode and a copper coating is formed by electroless plating in an electrolyte containing copper ions. 銅イオンを含む電解液中の銅イオン濃度が0.01g/L以上30g/L以下であることを特徴とする請求項7または請求項8に記載の電解二酸化マンガン製造用陰極の製造方法。9. The method for producing a cathode for producing electrolytic manganese dioxide according to claim 7 or 8, wherein the copper ion concentration in the copper ion-containing electrolyte is 0.01 g/L or more and 30 g/L or less. 請求項1~請求項6のいずれかの項に記載の電解二酸化マンガン製造用陰極を用いることを特徴とする電解二酸化マンガンの製造方法。 A method for producing electrolytic manganese dioxide, characterized by using a cathode for producing electrolytic manganese dioxide according to any one of claims 1 to 6. 請求項10に記載された電解二酸化マンガンの製造方法で製造された電解二酸化マンガンを用いて合成されたことを特徴とする電池用正極材の製造方法。 A method for producing a positive electrode material for a battery, the positive electrode material being synthesized using electrolytic manganese dioxide produced by the method for producing electrolytic manganese dioxide according to claim 10 .
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