JP7664952B2 - 高温用途のための断熱材 - Google Patents
高温用途のための断熱材 Download PDFInfo
- Publication number
- JP7664952B2 JP7664952B2 JP2022575241A JP2022575241A JP7664952B2 JP 7664952 B2 JP7664952 B2 JP 7664952B2 JP 2022575241 A JP2022575241 A JP 2022575241A JP 2022575241 A JP2022575241 A JP 2022575241A JP 7664952 B2 JP7664952 B2 JP 7664952B2
- Authority
- JP
- Japan
- Prior art keywords
- insulation
- tantalum carbide
- insulating material
- chemical vapor
- carbon
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Active
Links
Classifications
-
- C—CHEMISTRY; METALLURGY
- C30—CRYSTAL GROWTH
- C30B—SINGLE-CRYSTAL GROWTH; UNIDIRECTIONAL SOLIDIFICATION OF EUTECTIC MATERIAL OR UNIDIRECTIONAL DEMIXING OF EUTECTOID MATERIAL; REFINING BY ZONE-MELTING OF MATERIAL; PRODUCTION OF A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; SINGLE CRYSTALS OR HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; AFTER-TREATMENT OF SINGLE CRYSTALS OR A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; APPARATUS THEREFOR
- C30B29/00—Single crystals or homogeneous polycrystalline material with defined structure characterised by the material or by their shape
- C30B29/02—Elements
- C30B29/06—Silicon
-
- C—CHEMISTRY; METALLURGY
- C30—CRYSTAL GROWTH
- C30B—SINGLE-CRYSTAL GROWTH; UNIDIRECTIONAL SOLIDIFICATION OF EUTECTIC MATERIAL OR UNIDIRECTIONAL DEMIXING OF EUTECTOID MATERIAL; REFINING BY ZONE-MELTING OF MATERIAL; PRODUCTION OF A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; SINGLE CRYSTALS OR HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; AFTER-TREATMENT OF SINGLE CRYSTALS OR A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; APPARATUS THEREFOR
- C30B15/00—Single-crystal growth by pulling from a melt, e.g. Czochralski method
- C30B15/10—Crucibles or containers for supporting the melt
-
- C—CHEMISTRY; METALLURGY
- C30—CRYSTAL GROWTH
- C30B—SINGLE-CRYSTAL GROWTH; UNIDIRECTIONAL SOLIDIFICATION OF EUTECTIC MATERIAL OR UNIDIRECTIONAL DEMIXING OF EUTECTOID MATERIAL; REFINING BY ZONE-MELTING OF MATERIAL; PRODUCTION OF A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; SINGLE CRYSTALS OR HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; AFTER-TREATMENT OF SINGLE CRYSTALS OR A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; APPARATUS THEREFOR
- C30B23/00—Single-crystal growth by condensing evaporated or sublimed materials
-
- C—CHEMISTRY; METALLURGY
- C30—CRYSTAL GROWTH
- C30B—SINGLE-CRYSTAL GROWTH; UNIDIRECTIONAL SOLIDIFICATION OF EUTECTIC MATERIAL OR UNIDIRECTIONAL DEMIXING OF EUTECTOID MATERIAL; REFINING BY ZONE-MELTING OF MATERIAL; PRODUCTION OF A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; SINGLE CRYSTALS OR HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; AFTER-TREATMENT OF SINGLE CRYSTALS OR A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; APPARATUS THEREFOR
- C30B29/00—Single crystals or homogeneous polycrystalline material with defined structure characterised by the material or by their shape
- C30B29/10—Inorganic compounds or compositions
- C30B29/36—Carbides
-
- C—CHEMISTRY; METALLURGY
- C30—CRYSTAL GROWTH
- C30B—SINGLE-CRYSTAL GROWTH; UNIDIRECTIONAL SOLIDIFICATION OF EUTECTIC MATERIAL OR UNIDIRECTIONAL DEMIXING OF EUTECTOID MATERIAL; REFINING BY ZONE-MELTING OF MATERIAL; PRODUCTION OF A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; SINGLE CRYSTALS OR HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; AFTER-TREATMENT OF SINGLE CRYSTALS OR A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; APPARATUS THEREFOR
- C30B35/00—Apparatus not otherwise provided for, specially adapted for the growth, production or after-treatment of single crystals or of a homogeneous polycrystalline material with defined structure
- C30B35/002—Crucibles or containers
Landscapes
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Crystallography & Structural Chemistry (AREA)
- Materials Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Inorganic Chemistry (AREA)
- Crystals, And After-Treatments Of Crystals (AREA)
- Chemical Vapour Deposition (AREA)
Description
Claims (11)
- 単結晶を製造するための装置における使用のための、高温用途のための断熱材(11)であって、
内部に空間を有する繊維部材と、
前記繊維部材の前記空間を満たす炭化タンタルと、
を備える断熱材。 - 前記空間には、熱分解炭素が含まれていない、
請求項1に記載の断熱材。 - 前記繊維部材は、織物、非捲縮布、不織布、及び/又はフェルトからなることを特徴とする、
請求項1又は2に記載の断熱材。 - 前記断熱材(11)又は前記繊維部材は、確定された幾何学形状を有することを特徴とする、
請求項1-3のいずれか1項に記載の断熱材。 - 単結晶を製造するための装置であって、前記装置は、請求項1-4のいずれか1項に記載の断熱材(11)を有する、
装置。 - 単結晶を製造するための装置における使用のための、高温用途のための断熱材(11)における炭化タンタルの使用であって、
前記断熱材は、内部に空間を有する繊維部材を備え、
前記繊維部材の前記空間を前記炭化タンタルによって満たす、
炭化タンタルの使用。 - 単結晶を製造するための装置における使用のための、高温用途のための断熱材(11)を製造する方法であって、
炭素からなる繊維を有する繊維部材に、熱分解炭素を浸透させることと、
前記浸透させることの後に、化学気相反応によって、前記熱分解炭素を炭化タンタルに転化させることと、
を含む断熱材(11)を製造する方法。 - 化学気相反応によって、前記炭素を炭化タンタルに転化させることをさらに含む、
請求項7に記載の断熱材(11)を製造する方法。 - 前記浸透させることは、化学蒸気浸透(CVI)によって行われる、
請求項7又は8に記載の断熱材(11)を製造する方法。 - 前記化学気相反応の後に、前記炭素が燃え尽きるように温度処理することをさらに含む、
請求項7-9のいずれか1項に記載の断熱材(11)を製造する方法。 - 前記化学気相反応において、反応ガスとしてハロゲン化タンタルを使用することをさらに含む、
請求項7-10のいずれか1項に記載の断熱材(11)を製造する方法。
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| PCT/EP2020/065803 WO2021249613A1 (de) | 2020-06-08 | 2020-06-08 | Isolation für hochtemperaturanwendungen |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JP2023534380A JP2023534380A (ja) | 2023-08-09 |
| JP7664952B2 true JP7664952B2 (ja) | 2025-04-18 |
Family
ID=71143695
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2022575241A Active JP7664952B2 (ja) | 2020-06-08 | 2020-06-08 | 高温用途のための断熱材 |
Country Status (4)
| Country | Link |
|---|---|
| EP (1) | EP4162101A1 (ja) |
| JP (1) | JP7664952B2 (ja) |
| CN (1) | CN115698390A (ja) |
| WO (1) | WO2021249613A1 (ja) |
Citations (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2012091966A (ja) | 2010-10-27 | 2012-05-17 | Denso Corp | 炭化珪素単結晶の製造装置および製造方法 |
| JP2020040845A (ja) | 2018-09-06 | 2020-03-19 | 昭和電工株式会社 | SiC単結晶製造装置 |
Family Cites Families (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH01153571A (ja) * | 1988-11-05 | 1989-06-15 | Toho Rayon Co Ltd | 炭素繊維強化炭素複合材の製法 |
| JP5332916B2 (ja) * | 2009-06-03 | 2013-11-06 | 株式会社デンソー | 炭化珪素単結晶の製造装置 |
| CN205821523U (zh) * | 2016-06-30 | 2016-12-21 | 北京华进创威电子有限公司 | 一种氮化铝单晶生长的提拉装置 |
| KR102675266B1 (ko) * | 2017-12-04 | 2024-06-14 | 신에쓰 가가꾸 고교 가부시끼가이샤 | 탄화탄탈 피복 탄소 재료 및 그 제조 방법, 반도체 단결정 제조 장치용 부재 |
| CN109129833A (zh) * | 2018-09-18 | 2019-01-04 | 北京大学 | 制备用于生长氮化铝单晶的碳化钽坩埚的装置及制备方法 |
-
2020
- 2020-06-08 CN CN202080101842.XA patent/CN115698390A/zh active Pending
- 2020-06-08 EP EP20734652.9A patent/EP4162101A1/de active Pending
- 2020-06-08 JP JP2022575241A patent/JP7664952B2/ja active Active
- 2020-06-08 WO PCT/EP2020/065803 patent/WO2021249613A1/de not_active Ceased
Patent Citations (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2012091966A (ja) | 2010-10-27 | 2012-05-17 | Denso Corp | 炭化珪素単結晶の製造装置および製造方法 |
| JP2020040845A (ja) | 2018-09-06 | 2020-03-19 | 昭和電工株式会社 | SiC単結晶製造装置 |
Non-Patent Citations (1)
| Title |
|---|
| Zhao-ke Chen et al,Phase composition and morphology of TaC coating on carbon fibers by chemical vapor infiltration,Thin Solid Films,NL,ELSEVIER,2008年03月19日,516,8248-8254 |
Also Published As
| Publication number | Publication date |
|---|---|
| JP2023534380A (ja) | 2023-08-09 |
| EP4162101A1 (de) | 2023-04-12 |
| CN115698390A (zh) | 2023-02-03 |
| WO2021249613A1 (de) | 2021-12-16 |
| TW202200497A (zh) | 2022-01-01 |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| JP3165685B2 (ja) | 炭化珪素単結晶の昇華成長 | |
| US6514338B2 (en) | Method and apparatus for producing silicon carbide single crystal | |
| CN113151895A (zh) | 大直径高纯半绝缘碳化硅生长工艺方法 | |
| TWI891900B (zh) | 用於生長單晶之方法 | |
| US20140202389A1 (en) | Apparatus for fabricating ingot | |
| JP7664952B2 (ja) | 高温用途のための断熱材 | |
| KR101031407B1 (ko) | 단결정 실리콘 탄화물의 형성방법 | |
| KR20120140151A (ko) | 잉곳 제조 장치 | |
| EP1158077B1 (en) | Method and apparatus for producing single crystal of silicon carbide | |
| KR20130022596A (ko) | 잉곳 제조 장치 및 원료 제공 방법 | |
| TWI915373B (zh) | 用於高溫應用的隔熱材料、製造單晶之裝置、碳化鉭之用途及製造用於高溫應用之隔熱材料之方法 | |
| JP2007314358A (ja) | 炭化ケイ素単結晶の製造装置及びその製造方法 | |
| TWI794376B (zh) | 從坩堝及相關芯總成移除矽融化物之方法 | |
| HK40086555A (zh) | 用於高温应用的绝缘体 | |
| JP2007308355A (ja) | 炭化ケイ素単結晶の製造装置及びその製造方法 | |
| CN106048728B (zh) | 一种生长高品质碳化硅晶须的方法 | |
| JP2004099414A (ja) | 炭化珪素単結晶の製造方法 | |
| JP4309509B2 (ja) | 熱分解黒鉛からなる単結晶成長用のルツボの製造方法 | |
| KR101425980B1 (ko) | 탄화규소 분말 제조 장치 및 탄화규소 분말 제조 방법 | |
| US20020071803A1 (en) | Method of producing silicon carbide power | |
| KR20170073834A (ko) | 탄화규소(SiC) 단결정 성장 장치 | |
| JP4823406B2 (ja) | 単結晶引き上げ装置用炭素繊維強化炭素複合材料 | |
| JP2000239079A (ja) | 表面を緻密化した炭素材料 | |
| JP5053344B2 (ja) | ルツボ受け皿の製造方法 | |
| US20140196659A1 (en) | Apparatus for fabricating ingot and method for fabricating ingot |
Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| A621 | Written request for application examination |
Free format text: JAPANESE INTERMEDIATE CODE: A621 Effective date: 20230511 |
|
| A977 | Report on retrieval |
Free format text: JAPANESE INTERMEDIATE CODE: A971007 Effective date: 20240411 |
|
| A131 | Notification of reasons for refusal |
Free format text: JAPANESE INTERMEDIATE CODE: A131 Effective date: 20240507 |
|
| A521 | Request for written amendment filed |
Free format text: JAPANESE INTERMEDIATE CODE: A523 Effective date: 20240731 |
|
| A131 | Notification of reasons for refusal |
Free format text: JAPANESE INTERMEDIATE CODE: A131 Effective date: 20241001 |
|
| A521 | Request for written amendment filed |
Free format text: JAPANESE INTERMEDIATE CODE: A523 Effective date: 20241224 |
|
| TRDD | Decision of grant or rejection written | ||
| A01 | Written decision to grant a patent or to grant a registration (utility model) |
Free format text: JAPANESE INTERMEDIATE CODE: A01 Effective date: 20250325 |
|
| A61 | First payment of annual fees (during grant procedure) |
Free format text: JAPANESE INTERMEDIATE CODE: A61 Effective date: 20250408 |
|
| R150 | Certificate of patent or registration of utility model |
Ref document number: 7664952 Country of ref document: JP Free format text: JAPANESE INTERMEDIATE CODE: R150 |