JP7669028B2 - Method for producing metal plate having layered double hydroxide on its surface - Google Patents
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Description
本発明は、層状複水酸化物を表面に有する金属板の製造方法に関する。 The present invention relates to a method for producing a metal plate having a layered double hydroxide on its surface.
マグネシウム合金およびアルミニウム合金は輸送機器(自動車、電車など)や家電製品、携帯電子機器、福祉材料(車椅子、杖など)などの軽量化部材として期待されているが、特に塩化物イオンを含む環境での耐食性が低いという課題がある。輸送機器や家電製品は、塩化物イオンを含む雨や海水の飛沫や人の汗に曝される。このため、高耐食性被膜の形成と、部材によっては高耐食性被膜に加えて塗装が必要とされている。
従来のマグネシウム材の耐食性被膜は、クロム、マンガンやフッ素などの環境負荷が高い元素を含むものが主流であったが、RoHSやREACHなどの環境規制が強化されクロメート処理は使用禁止や排除になっている。このため、製造工程での環境負荷が小さく、使用中の環境への安全性も高い元素で構成されている耐食性被膜が求められている。
Magnesium alloys and aluminum alloys are expected to be used as lightweight components for transportation equipment (automobiles, trains, etc.), home appliances, portable electronic devices, and welfare materials (wheelchairs, canes, etc.), but they have a problem of low corrosion resistance, especially in environments containing chloride ions. Transportation equipment and home appliances are exposed to rain, seawater splashes, and human sweat that contain chloride ions. For this reason, the formation of a highly corrosion-resistant coating and, depending on the component, painting in addition to the highly corrosion-resistant coating are required.
Conventional corrosion-resistant coatings for magnesium materials mainly contain elements that have a high environmental impact, such as chromium, manganese, and fluorine, but as environmental regulations such as RoHS and REACH have been strengthened, the use of chromate treatment has been prohibited or eliminated. For this reason, there is a demand for corrosion-resistant coatings that are composed of elements that have a small environmental impact during the manufacturing process and are highly safe for the environment during use.
リン酸を主成分とする環境負荷の低い元素で構成されている溶液中での陽極酸化により形成した高耐食性皮膜(特許文献1)の報告もあるが、陽極酸化は消費電力量が大きいという欠点がある。
また、リン酸、マンガン酸および酸化カルシウムを含む化成処理溶液および陽極酸化用電解液が開発されており(非特許文献1~4)、製造された皮膜は高い耐食性および塗料との密着性を示している。しかし、マンガン酸は廃液処理が必要な物質であることから、さらに環境負荷の低い耐食性皮膜およびその製造方法が望まれている。
There has been a report of a highly corrosion-resistant coating formed by anodizing in a solution composed of environmentally friendly elements, mainly phosphoric acid (Patent Document 1). However, anodizing has the disadvantage of consuming a large amount of power.
In addition, chemical conversion solutions and anodizing electrolytes containing phosphoric acid, manganic acid, and calcium oxide have been developed (Non-Patent Documents 1 to 4), and the films produced therefrom exhibit high corrosion resistance and adhesion to paint. However, since manganic acid is a substance that requires wastewater treatment, there is a need for a corrosion-resistant film with even lower environmental impact and a method for producing the same.
近年、層状複水酸化物(LDH:一般式[M2+
1-xM3+
x(OH)2][An-
x/n・mH2O])被膜がマグネシウム合金やアルミニウム合金の耐食性被膜として注目されている(特許文献2、3、4参照)。
LDHはホスト層のMgやAlなどの金属水酸化物層と陰イオンと水分子で構成されるゲスト層が交互に積層した化合物で、層間には陰イオンだけでなく有機分子を取り込むこともできる。このため、マグネシウム合金やアルミニウム合金の腐食インヒビターを層間に挿入したLDHで被膜を形成すると、被膜のキズの自己修復が促進されることが期待されている。これまでに、オートクレーブ(高温/高圧蒸気)処理によるAZ31合金やMg-Al-Zn-Ca合金表面での被膜形成、Zn(NO3)2-Al(NO3)3などの金属硝酸塩溶液中でのAZ91表面への電解析出による被膜形成や、LDHスラリー埋没加熱処理による被膜形成、Al(NO3)3溶液中での化成処理によるLDH被膜形成が行われた。
In recent years, layered double hydroxide (LDH: general formula [M 2+ 1-x M 3+ x (OH) 2 ][A n- x/n ·mH 2 O]) coatings have attracted attention as corrosion-resistant coatings for magnesium alloys and aluminum alloys (see Patent Documents 2, 3 and 4).
LDH is a compound in which a host layer of metal hydroxide layers such as Mg or Al and a guest layer consisting of anions and water molecules are alternately laminated, and it can incorporate not only anions but also organic molecules between the layers. For this reason, it is expected that forming a coating with LDH with a corrosion inhibitor for magnesium alloys or aluminum alloys inserted between the layers will promote self-repair of scratches in the coating. To date, coatings have been formed on the surfaces of AZ31 alloys and Mg-Al-Zn-Ca alloys by autoclave (high temperature/high pressure steam) treatment, coatings by electrolytic deposition on the surfaces of AZ91 in metal nitrate solutions such as Zn(NO 3 ) 2 -Al(NO 3 ) 3 , coatings by immersion in LDH slurry and heat treatment, and LDH coatings by chemical conversion treatment in an Al(NO 3 ) 3 solution.
オートクレーブ処理は、基材マグネシウム合金表面からLDHを成長させる手法のため密着性が高いという利点がある一方、処理に時間がかかり、また大型の部材のために大型高圧蒸気窯を設置するなどコストがかかるという欠点がある。スラリー埋没法も、処理時間が長いという欠点がある。電解析出は短時間で被膜形成できるが、金属硝酸塩水溶液のpHは低く処理中の基材の腐食が懸念されるため、比較的耐食性が低いMg合金や純Mgへの応用に課題がある。化成処理では比較的短時間に処理できる処理法が開発されているが、基材から溶出するMgイオンがLDH層の主成分になるためLDH層の組成や形態が基材Mg合金に大きく依存する。また、電解析出でも化成処理でも、被膜形成後にLDHの層間に任意の陰イオンや有機分子を挿入するのは困難である。これは、LDH層間のイオン交換反応は水溶液中で行われるため、イオン交換処理中に基材マグネシウム合金が腐食される可能性が高いためである。 The autoclave treatment has the advantage of high adhesion because it is a method of growing LDH from the surface of the substrate magnesium alloy, but it takes a long time to process and is costly because a large high-pressure steam furnace must be installed for large components. The slurry immersion method also has the disadvantage of a long processing time. Electrolytic deposition can form a film in a short time, but the pH of the metal nitrate solution is low, so there is a concern that the substrate may corrode during processing, and there are problems with application to Mg alloys and pure Mg, which have relatively low corrosion resistance. A treatment method that can be performed in a relatively short time has been developed for chemical conversion treatment, but the composition and form of the LDH layer are highly dependent on the substrate Mg alloy because Mg ions eluted from the substrate become the main component of the LDH layer. In addition, whether electrolytic deposition or chemical conversion treatment, it is difficult to insert any anion or organic molecule between the LDH layers after the coating is formed. This is because the ion exchange reaction between the LDH layers takes place in an aqueous solution, so there is a high possibility that the substrate magnesium alloy will be corroded during the ion exchange treatment.
マグネシウム合金やアルミニウム合金表面に層状複水酸化物(LDH)を被覆する従来の方法には、処理時間が数時間から数日と長い、処理溶液の腐食性が高く処理できる合金組成に制限がある、コストが高いという課題と、LDH組成や層間に挿入できるイオンに制限があるという課題がある。 Conventional methods for coating the surfaces of magnesium alloys or aluminum alloys with layered double hydroxides (LDHs) have issues such as long processing times of several hours to several days, high corrosiveness of the processing solution restricting the alloy compositions that can be processed, high costs, and restrictions on the LDH composition and the ions that can be inserted between layers.
本発明者は、鋭意研究の結果、電気泳動堆積法を用いることで、処理時間が短縮できると共にLDH組成や層間に挿入できるイオンが自由に選択できるのではないかと考え、本願発明を想到するに至った。電気泳動堆積法は、電解液中にセラミックス粒子を帯電・分散させ、その懸濁液に電極基板を浸漬し、対極との間に電場を印加することにより、セラミックス粒子を電極基板上に直接堆積させる方法である。電気泳動堆積法の利点として、様々な組成のLDH粉末を堆積できること、および層間に任意の陰イオンや有機分子を挿入したLDH粉末を堆積できる点に着目した。
一方、電気泳動堆積法は一般的に、セラミックス粒子堆積層と電極基板の密着性に課題があることが知られている。本発明者は、電解液に金属イオンを添加し、LDH粉末と共に水酸化物として電解析出させることで、堆積層の密着性を向上させることができることを発見し、本発明を完成するに至った。
As a result of intensive research, the inventors of the present invention came up with the idea that the use of electrophoretic deposition may enable the processing time to be shortened and the LDH composition and ions to be inserted between layers to be freely selected. The electrophoretic deposition method is a method in which ceramic particles are charged and dispersed in an electrolyte, an electrode substrate is immersed in the suspension, and an electric field is applied between the counter electrode to directly deposit the ceramic particles on the electrode substrate. The inventors focused on the advantages of the electrophoretic deposition method, such as the ability to deposit LDH powders of various compositions and the ability to deposit LDH powders with any anion or organic molecule inserted between layers.
On the other hand, it is known that the electrophoretic deposition method generally has a problem in adhesion between the ceramic particle deposition layer and the electrode substrate. The present inventor discovered that the adhesion of the deposition layer can be improved by adding metal ions to the electrolyte and electrolytically depositing them as hydroxides together with the LDH powder, and thus completed the present invention.
即ち、本発明は、上述した課題を解決したもので、1分~数十分程度の短時間処理で、様々な組成の層状複水酸化物粉末および金属水酸化物を製膜する方法および層間に任意の陰イオンや有機分子(インヒビター)を挿入した層状複水酸化物粉末を含む被膜を製膜する方法を提供するものである。 In other words, the present invention solves the above-mentioned problems by providing a method for forming films of layered double hydroxide powders and metal hydroxides of various compositions in a short period of time, such as one minute to several tens of minutes, and a method for forming films containing layered double hydroxide powders with any anion or organic molecule (inhibitor) inserted between the layers.
[1]本発明の層状複水酸化物を表面に有する金属板の製造方法は、例えば図1、図2に示すように、水を含有する第1の電解液に層状複水酸化物粉末を分散させる工程(S100)と、前記第1の電解液と前記層状複水酸化物粉末からなる懸濁液に電極基板と第1の対極板を浸漬する工程であって、前記電極基板は被覆処理される金属板であり(S102)、前記第1の電極基板と前記第1の対極板との間に電場を印加することにより、前記電極基板上に前記層状複水酸化物粉末を電気泳動堆積させる工程(S104、S106)と、
水を含有する第2の電解液に金属イオンを添加する工程(S110)と、添加した前記金属イオンを含む前記第2の電解液に前記層状複水酸化物粉末の堆積した電極基板と第2の対極板を浸漬する工程(S112)と、前記層状複水酸化物粉末の堆積した電極基板と前記第2の対極板との間に電場を印加することにより、前記層状複水酸化物粉末の堆積した電極基板上に前記金属イオンの水酸化物として電解析出させる工程(S114、S116)を有するものである。
好ましくは、電極基板12上の層状複水酸化物粉末の堆積層の膜厚が、所定値になるまで、電気泳動堆積を継続し、その後層状複水酸化物で被覆された電極基板12を第1の電解液から取り出す工程(S108)を有するとよい。
[1] As shown in Figs. 1 and 2, the method for producing a metal plate having a layered double hydroxide on its surface includes the steps of: dispersing a layered double hydroxide powder in a first electrolytic solution containing water (S100); immersing an electrode substrate and a first counter electrode plate in a suspension containing the first electrolytic solution and the layered double hydroxide powder, the electrode substrate being a metal plate to be coated (S102); and applying an electric field between the first electrode substrate and the first counter electrode plate to electrophoretically deposit the layered double hydroxide powder on the electrode substrate (S104, S106).
The method includes the steps of: adding metal ions to a second electrolytic solution containing water (S110); immersing an electrode substrate on which the layered double hydroxide powder has been deposited and a second counter electrode plate in the second electrolytic solution containing the added metal ions (S112); and applying an electric field between the electrode substrate on which the layered double hydroxide powder has been deposited and the second counter electrode plate, thereby electrolytically depositing the metal ions as hydroxides on the electrode substrate on which the layered double hydroxide powder has been deposited (S114, S116).
Preferably, the method includes a step (S108) of continuing electrophoretic deposition until the thickness of the deposited layer of layered double hydroxide powder on the electrode substrate 12 reaches a predetermined value, and then removing the electrode substrate 12 coated with layered double hydroxide from the first electrolytic solution.
[2]本発明の層状複水酸化物を表面に有する金属板の製造方法は、例えば図1、図5に示すように、水を含有する第3の電解液に金属イオンを添加する工程(S200)と、添加した前記金属イオンを含む前記第3の電解液に電極基板と第3の対極板を浸漬する工程であって、前記電極基板は被覆処理される金属板であり(S202)、前記電極基板と前記第3の対極板との間に電場を印加することにより、前記電極基板上に前記金属イオンの水酸化物として電解析出させる工程(S204、S206)と、
水を含有する第4の電解液中に層状複水酸化物粉末を分散させる工程(S210)と、前記第4の電解液と前記層状複水酸化物粉末からなる懸濁液に前記金属イオンの水酸化物が電解析出した電極基板と第4の対極板を浸漬する工程(S212)と、前記金属イオンの水酸化物が電解析出した電極基板と前記第4の対極板との間に電場を印加することにより、前記電極基板上に前記層状複水酸化物粉末を電気泳動堆積させる工程(S214、S216)を有するものである。
好ましくは、電極基板12上の金属水酸化物の膜厚が、所定値になるまで、電解析出を継続し、その後金属水酸化物で被覆された電極基板12を第3の電解液から取り出す工程(S208)を有するとよい。この金属水酸化物は前記金属イオンの水酸化物である。
[2] The method for producing a metal plate having a layered double hydroxide on its surface according to the present invention includes, as shown in Figs. 1 and 5, a step of adding metal ions to a third electrolytic solution containing water (S200), a step of immersing an electrode substrate and a third counter electrode plate in the third electrolytic solution containing the added metal ions (S202), the electrode substrate being a metal plate to be coated (S204, S206), and a step of applying an electric field between the electrode substrate and the third counter electrode plate to electrolytically deposit the metal ions as hydroxides on the electrode substrate (S205, S206).
The method includes the steps of: dispersing a layered double hydroxide powder in a fourth electrolytic solution containing water (S210); immersing an electrode substrate on which the hydroxide of the metal ion is electrolytically deposited and a fourth counter electrode plate in a suspension consisting of the fourth electrolytic solution and the layered double hydroxide powder (S212); and electrophoretically depositing the layered double hydroxide powder on the electrode substrate by applying an electric field between the electrode substrate on which the hydroxide of the metal ion is electrolytically deposited and the fourth counter electrode plate (S214, S216).
Preferably, the electrolytic deposition is continued until the thickness of the metal hydroxide on the electrode substrate 12 reaches a predetermined value, and then the electrode substrate 12 coated with the metal hydroxide is removed from the third electrolytic solution (S208). The metal hydroxide is a hydroxide of the metal ion.
[3]本発明の層状複水酸化物を表面に有する金属板の製造方法は、例えば図1、図7、図8に示すように、水を含有する第5の電解液に金属イオンを添加すると共に、前記第5の電解液中に層状複水酸化物粉末を分散させる工程(S300)、又は前記水を含有する第5の電解液に層状複水酸化物粉末を分散させると共に、前記第5の電解液中に金属イオンを添加する工程(S300)と、添加した前記金属イオンを含む前記第5の電解液と前記層状複水酸化物粉末からなる懸濁液に電極基板12と第5の対極板を浸漬する工程であって、電極基板12は被覆処理される金属板であり(S302)、電極基板12と前記第5の対極板との間に電場を印加することにより、電極基板12上に前記金属イオンの水酸化物と前記層状複水酸化物粉の複合体を電気泳動堆積させる工程(S304、S306)と、
水を含有する第6の電解液に金属イオンを添加する工程(S310)と、添加した前記金属イオンを含む前記第6の電解液に、前記金属イオンの水酸化物と前記層状複水酸化物粉末の複合体が堆積した電極基板と第6の対極板を浸漬する工程(S312)と、電極基板12と前記第6の対極板との間に電場を印加することにより、前記金属イオンの水酸化物と前記層状複水酸化物粉末の複合体が堆積した電極基板上に前記金属イオンの水酸化物として電解析出させる工程(S314、S316)を有するものである。
好ましくは、電極基板12上の金属水酸化物と層状複水酸化物粉末の複合堆積層の膜厚が、所定値になるまで、電気泳動堆積を継続し、その後複合堆積層で被覆された電極基板12を第5の電解液から取り出す工程(S308)を有するとよい。
[3] A method for producing a metal plate having a layered double hydroxide on its surface according to the present invention includes, as shown in, for example, Figs. 1, 7 and 8, a step of adding metal ions to a fifth electrolytic solution containing water and dispersing a layered double hydroxide powder in the fifth electrolytic solution (S300), or a step of dispersing a layered double hydroxide powder in the fifth electrolytic solution containing water and adding metal ions to the fifth electrolytic solution (S300), a step of immersing an electrode substrate 12 and a fifth counter electrode plate in a suspension consisting of the fifth electrolytic solution containing the added metal ions and the layered double hydroxide powder, the electrode substrate 12 being a metal plate to be coated (S302), and a step of electrophoretically depositing a complex of the hydroxide of the metal ions and the layered double hydroxide powder on the electrode substrate 12 by applying an electric field between the electrode substrate 12 and the fifth counter electrode (S304, S306).
The method includes the steps of: adding metal ions to a sixth electrolytic solution containing water (S310); immersing an electrode substrate on which a complex of the hydroxide of the metal ion and the layered double hydroxide powder has been deposited and a sixth counter electrode plate in the sixth electrolytic solution containing the added metal ions (S312); and applying an electric field between the electrode substrate 12 and the sixth counter electrode plate to electrolytically deposit the hydroxide of the metal ion on the electrode substrate on which the complex of the hydroxide of the metal ion and the layered double hydroxide powder has been deposited (S314, S316).
Preferably, the electrophoretic deposition is continued until the thickness of the composite deposition layer of the metal hydroxide and the layered double hydroxide powder on the electrode substrate 12 reaches a predetermined value, and then the electrode substrate 12 covered with the composite deposition layer is removed from the fifth electrolyte (S308).
[4]本発明の層状複水酸化物を表面に有する金属板の製造方法は、例えば図1、図7、図10に示すように、水を含有する第7の電解液に金属イオンを添加する工程(S400)と、添加した前記金属イオンを含む前記第7の電解液に電極基板と第7の対極板を浸漬する工程であって、電極基板12は被覆処理される金属板であり(S402)、電極基板12と前記第7の対極板との間に電場を印加することにより、電極基板12上に前記金属イオンの水酸化物として電解析出させる工程(S404、S406)と、
水を含有する第8の電解液に金属イオンを添加すると共に、前記第8の電解液中に層状複水酸化物粉末を分散させる工程、又は前記水を含有する第8の電解液に層状複水酸化物粉末を分散させると共に、前記第8の電解液中に金属イオンを添加する工程(S410)と、添加した前記金属イオンを含む前記第8の電解液と前記層状複水酸化物粉末からなる懸濁液に前記金属イオンの水酸化物が電解析出した電極基板と第8の対極板を浸漬する工程(S412)と、前記金属イオンの水酸化物が電解析出した電極基板と前記第8の対極板との間に電場を印加することにより、電極基板12上に前記金属イオンの水酸化物と前記層状複水酸化物粉末の複合体を電気泳動堆積させる工程(S414、S416)を有するものである。
好ましくは、電極基板12上の金属水酸化物の膜厚が、所定値になるまで、電気泳動堆積を継続し、その後金属水酸化物で被覆された電極基板12を第7の電解液から取り出す工程(S408)を有するとよい。
[4] A method for producing a metal plate having a layered double hydroxide on its surface according to the present invention includes, as shown in, for example, Figs. 1, 7 and 10, a step of adding metal ions to a seventh electrolytic solution containing water (S400), a step of immersing an electrode substrate and a seventh counter electrode plate in the seventh electrolytic solution containing the added metal ions (S402), the electrode substrate 12 being the metal plate to be coated (S404, S406), and a step of applying an electric field between the electrode substrate 12 and the seventh counter electrode plate to electrolytically deposit the metal ions as hydroxides on the electrode substrate 12 (S404, S406).
The method includes the steps of adding metal ions to an eighth electrolytic solution containing water and dispersing a layered double hydroxide powder in the eighth electrolytic solution, or dispersing a layered double hydroxide powder in the eighth electrolytic solution containing water and adding metal ions to the eighth electrolytic solution (S410); immersing an electrode substrate on which the hydroxide of the metal ions is electrolytically deposited and an eighth counter electrode plate in a suspension consisting of the eighth electrolytic solution containing the added metal ions and the layered double hydroxide powder (S412); and applying an electric field between the electrode substrate on which the hydroxide of the metal ions is electrolytically deposited and the eighth counter electrode plate, thereby electrophoretically depositing a complex of the hydroxide of the metal ions and the layered double hydroxide powder on the electrode substrate 12 (S414, S416).
Preferably, the electrophoretic deposition is continued until the thickness of the metal hydroxide on the electrode substrate 12 reaches a predetermined value, and then the electrode substrate 12 coated with the metal hydroxide is removed from the seventh electrolyte (S408).
[5]本発明の層状複水酸化物を表面に有する金属板の製造方法[1]乃至[4]において、好ましくは、第1乃至第8の電解液は有機溶媒と水の混合溶媒であるとよい。
[6]本発明の層状複水酸化物を表面に有する金属板の製造方法[5]において、好ましくは、有機溶媒と水の体積の割合は、有機溶媒:水=99:1~70:30であるとよい。
水の体積割合が30%を超えると、被覆処理溶液中での基材マグネシウム合金やアルミニウム合金の腐食が増大すると共に、水の還元反応で発生する水素ガスが増大して、被膜の欠陥が増える。水の体積割合が1%未満であれば、有機溶媒の濃度が高すぎて、電気泳動堆積に必要な電気伝導度が得られない。水の体積割合が1%以上30%以下であり、残部を有機溶媒とすれば、緻密な層状複水酸化物層を作製できる。
[7]本発明の層状複水酸化物を表面に有する金属板の製造方法[5]又は[6]において、好ましくは、前記有機溶媒は、エタノール、メタノール、ブタノール、プロパノール、イソプロパノール、グリセリン、エチレングリコール、アセトン、ジメチルケトン、メチルエチルケトン、メチルイソブチルケトン、シクロヘキサノン、ジエチルエーテル、ジメチルスルホキシド、ジメチルフォルムアミド、クロロホルムの何れか1種類を含むとよい。
[8]本発明の層状複水酸化物を表面に有する金属板の製造方法[1]乃至[7]において、好ましくは、前記金属イオンは、Mg,Al,Zn、Mn、Fe、Co、Ni、Cu、Ca、Cr、Inの何れか1種類を含む金属イオンであり、前記金属イオンを生成する金属塩は、硝酸塩、硫酸塩、炭酸塩、カルボン酸塩、リン酸塩、又は塩化物であるとよい。
[5] In the method [1] to [4] for producing a metal plate having a layered double hydroxide on its surface according to the present invention, the first to eighth electrolytic solutions are preferably mixed solvents of an organic solvent and water.
[6] In the method [5] for producing a metal plate having a layered double hydroxide on its surface according to the present invention, the volume ratio of the organic solvent to the water is preferably from 99:1 to 70:30 (organic solvent:water).
If the volumetric percentage of water exceeds 30%, corrosion of the substrate magnesium alloy or aluminum alloy in the coating treatment solution increases, and hydrogen gas generated by the reduction reaction of water increases, resulting in more defects in the coating. If the volumetric percentage of water is less than 1%, the concentration of the organic solvent is too high to obtain the electrical conductivity required for electrophoretic deposition. If the volumetric percentage of water is 1% or more and 30% or less, with the remainder being an organic solvent, a dense layered double hydroxide layer can be produced.
[7] In the method [5] or [6] for producing a metal plate having a layered double hydroxide on its surface according to the present invention, the organic solvent preferably includes any one of ethanol, methanol, butanol, propanol, isopropanol, glycerin, ethylene glycol, acetone, dimethyl ketone, methyl ethyl ketone, methyl isobutyl ketone, cyclohexanone, diethyl ether, dimethyl sulfoxide, dimethylformamide, and chloroform.
[8] In the methods [1] to [7] for producing a metal plate having a layered double hydroxide on its surface according to the present invention, preferably, the metal ion is a metal ion containing any one of Mg, Al, Zn, Mn, Fe, Co, Ni, Cu, Ca, Cr, and In, and the metal salt generating the metal ion is a nitrate, sulfate, carbonate, carboxylate, phosphate, or chloride.
[9]本発明の層状複水酸化物を表面に有する金属板の製造方法[1]乃至[8]において、好ましくは、層状複水酸化物粉末40は、一般式:[M2+
(1-x)M3+
x(OH)2][An-
x/n・yH2O]で表されると共に、
M2+は、Mg(マグネシウム),Zn(亜鉛),Ca(カルシウム),Mn(マンガン),Pd(パラジウム),Sr(ストロンチウム),Fe(鉄),Co(コバルト),Ni(ニッケル),Cu(銅)の何れか1種類から選択される二価金属イオンであり、
M3+は、Al(アルミニウム),Bi(ビスマス),Ga(ガリウム),Ni,Mn,V(バナジウム),Ce(セリウム),La(ランタン),Cr(クロム),Fe(鉄),Co(コバルト),In(インジウム)の何れか1種類から選択される三価金属イオンであり、
Aは、NO3
-,CO3
2-,OH-,Cl-,SO4
2-,SiO4
4-,リン酸、クロム酸、過マンガン酸、バナジン酸、セレン酸、ホウ酸、フッ化物、カルボン酸の何れか1種類から選択されるn価(n=1、2、3、又は4)の陰イオンであるとよい。
[10]本発明の層状複水酸化物を表面に有する金属板の製造方法[9]において、好ましくは、層状複水酸化物粉末40の三価金属イオンは、二価金属イオンを最大モル比M2+:M3+=2:1まで置換しているとよい。なお、M3+の割合がゼロの場合は、Mg(OH)2(ブルーサイト)と呼ばれる。全く置換されていない状態を下限値としておくが、好ましくは二価と三価の金属イオンのモル比は、4:1~2:1の範囲であるとよい。
[9] In the method [1] to [8] for producing a metal plate having a layered double hydroxide on the surface thereof according to the present invention, the layered double hydroxide powder 40 is preferably represented by the general formula: [M 2+ (1-x) M 3+ x (OH) 2 ][A n- x/ n.yH 2 O],
M2 + is a divalent metal ion selected from any one of Mg (magnesium), Zn (zinc), Ca (calcium), Mn (manganese), Pd (palladium), Sr (strontium), Fe (iron), Co (cobalt), Ni (nickel), and Cu (copper);
M3 + is a trivalent metal ion selected from any one of Al (aluminum), Bi (bismuth), Ga (gallium), Ni, Mn, V (vanadium), Ce (cerium), La (lanthanum), Cr (chromium), Fe (iron), Co (cobalt), and In (indium);
A may be an n-valent (n=1, 2, 3, or 4) anion selected from any one of NO 3 − , CO 3 2− , OH − , Cl − , SO 4 2− , SiO 4 4− , phosphoric acid, chromic acid, permanganic acid, vanadic acid, selenic acid, boric acid, fluoride, and carboxylic acid.
[10] In the method [9] for producing a metal plate having a layered double hydroxide on its surface according to the present invention, preferably, the trivalent metal ions in the layered double hydroxide powder 40 are substituted with divalent metal ions up to a maximum molar ratio of M 2+ :M 3+ =2:1. When the proportion of M 3+ is zero, it is called Mg(OH) 2 (brucite). The lower limit is a state where no substitution is present, but preferably the molar ratio of divalent to trivalent metal ions is in the range of 4:1 to 2:1.
[11]本発明の層状複水酸化物を表面に有する金属板の製造方法[9]又は[10]において、好ましくは、電極基板12上に電解析出された堆積層における層状複水酸化物粉末40と金属水酸化物の体積の割合は、層状複水酸化物粉末:金属水酸化物=90:10~10:90であるよい。
堆積層における層状複水酸化物粉末と金属水酸化物の体積の割合について説明する。粉末の割合の上限は、層状複水酸化物粉末:金属水酸化物=90:10(体積比)である。2種類のサイズのレンズ形粒子をランダムに混ぜた場合のシミュレーションで、最大の充填率が約90%になるからである。最も広い範囲の下限は、層状複水酸化物粉末:金属水酸化物=10:90(体積比)である。これは、低い電圧や低い金属イオン濃度の電解液中でEPDして作製した堆積層における割合である。好ましい範囲の下限は、層状複水酸化物粉末:金属水酸化物=55:45(体積比)である。均一なサイズの球形粒子をランダムに充填した場合のシミュレーションで最も低い充填率が約55%になるからである。さらに好ましい範囲の下限は、層状複水酸化物粉末:金属水酸化物=68:32(体積比)である。層状複水酸化物粉末が均一なサイズの球形で体心立方で充填されている場合である。最適範囲の下限は、層状複水酸化物粉末:金属水酸化物=74:26(体積比)である。層状複水酸化物粉末が均一なサイズの球形で最密充填されており、隙間に金属水酸化物が充填されている場合である。
最も広い範囲:層状複水酸化物粉末:金属水酸化物=90:10~10:90
好ましい範囲:層状複水酸化物粉末:金属水酸化物=90:10~55:45
さらに好ましい範囲:90:10~68:32
最適範囲:層状複水酸化物粉末:金属水酸化物=90:10~74:26
[12]本発明の層状複水酸化物を表面に有する金属板の製造方法[1]乃至[11]において、好ましくは、電極基板12は、純Mg又はAZ31(Mg-3Al-1Zn)合金、AZ91(Mg-9Al-1Zn)合金、AM60(Mg-6Al-0.4Mn)合金、AXM(Mg-Al-(Zn)-Ca)合金、WE43(Mg-4Y-3RE)合金、又はZK60(Mg-6Zn-0.5Zr)合金の何れかであるとよい。
[13]本発明の層状複水酸化物を表面に有する金属板の製造方法[1]~[12]において、好ましくは、電極基板12に印加される電場は、パルス電圧又は定電圧を用いるとよい。
[11] In the method for producing a metal plate having a layered double hydroxide on its surface according to the present invention [9] or [10], the volume ratio of layered double hydroxide powder 40 to metal hydroxide in the deposited layer electrolytically deposited on the electrode substrate 12 is preferably layered double hydroxide powder:metal hydroxide=90:10 to 10:90.
The volume ratio of the layered double hydroxide powder and the metal hydroxide in the sediment layer will be described. The upper limit of the powder ratio is layered double hydroxide powder:metal hydroxide=90:10 (volume ratio). This is because the maximum packing ratio is about 90% in a simulation in which two types of lenticular particles of different sizes are mixed randomly. The lower limit of the widest range is layered double hydroxide powder:metal hydroxide=10:90 (volume ratio). This is the ratio in a sediment layer produced by EPD in an electrolyte with a low voltage or low metal ion concentration. The lower limit of the preferred range is layered double hydroxide powder:metal hydroxide=55:45 (volume ratio). This is because the lowest packing ratio is about 55% in a simulation in which spherical particles of uniform size are randomly packed. The lower limit of the more preferred range is layered double hydroxide powder:metal hydroxide=68:32 (volume ratio). This is the case in which the layered double hydroxide powder is spherical and packed in a body-centered cubic shape with uniform size. The lower limit of the optimum range is layered double hydroxide powder:metal hydroxide=74:26 (volume ratio), in which the layered double hydroxide powder is packed closely in the form of uniformly sized spheres, with the metal hydroxide filling the gaps.
Widest range: Layered double hydroxide powder: Metal hydroxide = 90:10 to 10:90
Preferred range: layered double hydroxide powder: metal hydroxide=90:10 to 55:45
More preferred range: 90:10 to 68:32
Optimum range: layered double hydroxide powder: metal hydroxide = 90:10 to 74:26
[12] In the methods [1] to [11] for producing a metal plate having a layered double hydroxide on its surface according to the present invention, the electrode substrate 12 is preferably made of pure Mg or any one of an AZ31 (Mg-3Al-1Zn) alloy, an AZ91 (Mg-9Al-1Zn) alloy, an AM60 (Mg-6Al-0.4Mn) alloy, an AXM (Mg-Al-(Zn)-Ca) alloy, a WE43 (Mg-4Y-3RE) alloy, and a ZK60 (Mg-6Zn-0.5Zr) alloy.
[13] In the method [1] to [12] for producing a metal plate having a layered double hydroxide on its surface according to the present invention, the electric field applied to the electrode substrate 12 is preferably a pulse voltage or a constant voltage.
本発明の層状複水酸化物を表面に有する金属板の製造方法において、金属イオンとして金属硝酸塩を添加した電解液中での金属水酸化物の電解析出の工程と、層状複水酸化物粉末の電気泳動堆積の工程との2段階で被覆処理を実施する効果、及び最終的に層状複水酸化物粉末と金属水酸化物の複合体を堆積させる効果を、従来技術と対比して説明する。
1) 電気泳動堆積において粉末が基板に押し付けられる力は粉末の表面電荷に比例するため、層状複水酸化物粉末の堆積条件において添加する金属イオンが粉末の表面電荷に及ぼす影響を考慮しなくてよいことは緻密な粉末の堆積層の形成において利点である。
2) 粉末を堆積した後に、金属水酸化物を析出させると粉末の隙間に金属水酸化物が侵入して、粉末同士を接着性を高めるとともに堆積層の孔を封孔できる。
3) 金属水酸化物を析出した後に粉末を堆積させると、基板表面と粉末との間の金属水酸化物が糊として粉末の接着性を高める。また、金属水酸化物層は粉末堆積層よりも緻密なため、被膜の欠陥を低減できる。
4) 層状複水酸化物粉末を主原料としている。このため、層状複水酸化物粉末の組成や層間の陰イオンや有機分子の自由度が高い。
5) 電気泳動堆積法は比較的短時間で数マイクロメートル以上の厚い被膜を形成できる手法のため、被覆時間を短くできる。
6) 電気泳動堆積では、合金組成によらず層状複水酸化物被膜を形成できる。これに対して、化成処理やオートクレーブ処理では、基材マグネシウム合金中のMgやAlが被膜に取り込まれて層状複水酸化物を形成しているため、被膜組成が基材合金の組成に依存する。
7) 実施例のように、電解液に添加する金属イオンとして、金属硝酸塩を添加する場合、電解析出法と電気泳動堆積法を組み合わせた手法になっている。金属水酸化物と層状複水酸化物粉末の析出・堆積により、粉末の密着性を向上できる。
In the method of manufacturing a metal plate having a layered double hydroxide on its surface according to the present invention, the effect of carrying out a coating treatment in two stages, namely, a step of electrolytic deposition of a metal hydroxide in an electrolyte solution containing added metal nitrate as a metal ion and a step of electrophoretic deposition of a layered double hydroxide powder, and the effect of finally depositing a complex of layered double hydroxide powder and a metal hydroxide, will be explained in comparison with the prior art.
1) In electrophoretic deposition, the force with which the powder is pressed against the substrate is proportional to the surface charge of the powder. Therefore, in determining the deposition conditions for the layered double hydroxide powder, it is not necessary to take into account the effect of added metal ions on the surface charge of the powder, which is an advantage in forming a dense powder deposition layer.
2) If a metal hydroxide is precipitated after the powder is deposited, the metal hydroxide will penetrate into the gaps between the powder particles, thereby increasing the adhesion between the powder particles and sealing the pores in the deposited layer.
3) When the powder is deposited after the metal hydroxide is precipitated, the metal hydroxide between the substrate surface and the powder acts as glue to increase the adhesion of the powder. In addition, the metal hydroxide layer is denser than the powder deposition layer, which reduces defects in the coating.
4) Layered double hydroxide powder is used as the main raw material. This allows for a high degree of freedom in the composition of the layered double hydroxide powder and the anions and organic molecules between the layers.
5) Electrophoretic deposition is a technique that can form a thick coating of several micrometers or more in a relatively short time, so the coating time can be shortened.
6) Electrophoretic deposition can form layered double hydroxide coatings regardless of the alloy composition. In contrast, chemical conversion coating and autoclave treatment incorporate Mg and Al from the magnesium alloy substrate into the coating to form layered double hydroxide, so the composition of the coating depends on the composition of the substrate alloy.
7) When metal nitrates are added to the electrolyte as metal ions as in the examples, the electrolytic deposition method and the electrophoretic deposition method are combined. The adhesion of the powder can be improved by the deposition and deposition of the metal hydroxide and layered double hydroxide powder.
以下、図面を用いて本発明を説明する。
図1は、本発明の層状複水酸化物(LDH)を表面に有する金属板を製造するために用いる電気泳動堆積装置の概要図で、(A)はLDH粉末の電気泳動堆積処理、(B)は添加金属イオンの電解析出処理を示している。図1(A)、(B)において、電気泳動堆積装置は、電解槽10、スターラー20、直流電源30、関数発生器36を備えている。
図1(A)では、電解槽10は、LDH粉末40が分散した表面処理溶液16aを収容していると共に、表面処理溶液16aに被処理金属基板としての基材12、対極板14が浸されており、攪拌子22が表面処理溶液16aの下部に位置している。基材12には、電気泳動堆積法による処理の進行に従って、その表面にLDH粉末の電気泳動堆積物18aが存在する。直流電源30の一方の極と基材12との間は、電線32で結線されている。直流電源30の他方の極と対極板14との間は、電線34で結線されている。
基材12と対極板14との間で生ずる電位差によって、表面処理溶液16aの内部でLDH粉末40が対極板14から基材12に移動して、堆積したLDH粉末40の層が形成される。直流電源30の電圧は、電気泳動堆積に必要な電圧としている。電気泳動堆積では、帯電した粉末が電場の力(F=qE.F:力、q:電荷クーロン、E:電圧)で電極基板上に押し付けられている。
The present invention will now be described with reference to the drawings.
Fig. 1 is a schematic diagram of an electrophoretic deposition apparatus used to manufacture a metal plate having a layered double hydroxide (LDH) on its surface according to the present invention, in which (A) shows the electrophoretic deposition process of LDH powder, and (B) shows the electrolytic deposition process of added metal ions. In Fig. 1 (A) and (B), the electrophoretic deposition apparatus is provided with an electrolytic cell 10, a stirrer 20, a DC power source 30, and a function generator 36.
1(A), an electrolytic cell 10 contains a surface treatment solution 16a in which LDH powder 40 is dispersed, a substrate 12 as a metal substrate to be treated, and a counter electrode plate 14 are immersed in the surface treatment solution 16a, and a stirrer 22 is positioned below the surface treatment solution 16a. As treatment by electrophoretic deposition progresses, an electrophoretic deposit 18a of LDH powder is present on the surface of the substrate 12. One pole of a DC power source 30 is connected to the substrate 12 by an electric wire 32. The other pole of the DC power source 30 is connected to the counter electrode plate 14 by an electric wire 34.
Due to the potential difference between the substrate 12 and the counter electrode 14, the LDH powder 40 moves from the counter electrode 14 to the substrate 12 in the surface treatment solution 16a, forming a layer of deposited LDH powder 40. The voltage of the DC power supply 30 is set to a voltage required for electrophoretic deposition. In electrophoretic deposition, the charged powder is pressed onto the electrode substrate by the force of an electric field (F=qE.F: force, q: charge coulomb, E: voltage).
図1(B)では、電解槽10は、金属イオン42が添加された表面処理溶液16bを収容していると共に、表面処理溶液16bに被処理金属基板としての基材12、対極板14が浸されており、攪拌子22が表面処理溶液16bの下部に位置している。基材12には、電気泳動堆積法による処理の進行に従って、LDH粉末40の電気泳動堆積物18aが堆積した基材12の表面に金属イオン水酸化物18bの堆積層が存在する。直流電源30の一方の極と基材12との間は、電線32で結線されている。直流電源30の他方の極と対極板14との間は、電線34で結線されている。
基材12と対極板14との間で生ずる電位差によって、表面処理溶液16bの溶液内で添加金属イオン42が対極板14から基材12に移動して、堆積した金属水酸化物18の層が形成される。直流電源30の電圧は、電解析出に必要な電圧としている。
1(B), the electrolytic cell 10 contains a surface treatment solution 16b to which metal ions 42 have been added, and a substrate 12 as a metal substrate to be treated and a counter electrode plate 14 are immersed in the surface treatment solution 16b, with a stirrer 22 positioned below the surface treatment solution 16b. As the treatment by electrophoretic deposition progresses, a deposition layer of metal ion hydroxides 18b is present on the surface of the substrate 12 on which electrophoretic deposits 18a of LDH powder 40 have been deposited. One pole of a DC power source 30 is connected to the substrate 12 by an electric wire 32. The other pole of the DC power source 30 is connected to the counter electrode plate 14 by an electric wire 34.
Due to the potential difference generated between the substrate 12 and the counter electrode 14, the added metal ions 42 in the surface treatment solution 16b migrate from the counter electrode 14 to the substrate 12, forming a layer of deposited metal hydroxide 18. The voltage of the DC power supply 30 is set to a voltage required for electrolytic deposition.
このように構成された電気泳動堆積装置の動作を説明する。
電気泳動堆積装置では、粉末を堆積させる基板である基材12を陰極、ステンレス板等の対極板14を陽極にして電場を印加する。このため、電解液中でプラスに帯電している粉末および陽イオン(カチオン)が陰極に引き付けられ、陰イオン(アニオン)が陽極側に引き付けられる。陰極に引き付けられた粉末は電場により押し付けられた状態となっている。同時に陰極表面では水の電気分解が起こり、水素発生とpH上昇が起こる。このため、陰極に引き付けられた陽イオン(カチオン)は高pH環境で水酸化物として陰極表面に析出する。
本発明の電気泳動堆積装置において、図1(A)では、陰極Mg合金表面で、電場によるLDH粉末の押しつけが起きている。他方、図1(B)では、Mgイオンおよび/もしくはAlイオンのpH上昇による水酸化物としての析出や有機溶媒との化合物である有機金属化合物としての析出が起きている。既に、基材12にLDH粉末40の層が形成されている場合は、Mgイオンおよび/もしくはAlイオンのpH上昇による水酸化物や有機溶媒との化合物である有機金属化合物が、LDH粉末の表面やLDH粉末間の隙間に露出しているMg合金表面に吸着する状態で析出する。LDH粉末やMg合金表面に吸着した金属イオンは大気中の水と反応して水酸化物や酸化物になり、有機金属化合物は加水分解されると水酸化物や酸化物になる。このため、金属水酸化物をバインダー(糊)としてLDH粉末がMg合金表面に固着することができる。
The operation of the electrophoretic deposition apparatus thus configured will now be described.
In the electrophoretic deposition apparatus, an electric field is applied between the substrate 12, which is the substrate on which the powder is deposited, as the cathode and the counter electrode plate 14, such as a stainless steel plate, as the anode. As a result, the powder and positively charged ions (cations) in the electrolyte are attracted to the cathode, and the negative ions (anions) are attracted to the anode. The powder attracted to the cathode is pressed against it by the electric field. At the same time, water is electrolyzed on the surface of the cathode, generating hydrogen and increasing the pH. As a result, the positive ions (cations) attracted to the cathode are precipitated on the surface of the cathode as hydroxides in a high pH environment.
In the electrophoretic deposition apparatus of the present invention, in FIG. 1(A), the LDH powder is pressed by the electric field on the cathode Mg alloy surface. On the other hand, in FIG. 1(B), the Mg ions and/or Al ions are precipitated as hydroxides due to an increase in pH, or as organometallic compounds which are compounds with organic solvents. If a layer of LDH powder 40 has already been formed on the substrate 12, the hydroxides due to an increase in pH of Mg ions and/or Al ions, or organometallic compounds which are compounds with organic solvents, are precipitated in a state of being adsorbed on the surface of the LDH powder or on the Mg alloy surface exposed in the gaps between the LDH powder. The metal ions adsorbed on the LDH powder or Mg alloy surface react with water in the air to become hydroxides or oxides, and the organometallic compounds are hydrolyzed to become hydroxides or oxides. For this reason, the LDH powder can be fixed to the Mg alloy surface using the metal hydroxide as a binder (glue).
層状複水酸化物は、一般式:[M2+
(1-x)M3+
x(OH)2][An-
x/n・yH2O]で表される(成田榮一、粘土科学,46(4),207-218(2007)参照)。
ここで、基本層のM2+は、Mg(マグネシウム),Zn(亜鉛),Ca(カルシウム),Mn(マンガン),Pd(パラジウム),Sr(ストロンチウム),Fe(鉄),Co(コバルト),Ni(ニッケル),Cu(銅),などの二価金属イオンである。
基本層のM3+は、Al(アルミニウム),Bi(ビスマス),Ga(ガリウム),Ni,Mn,V(バナジウム),Ce(セリウム),La(ランタン),Cr(クロム),Fe(鉄),Co(コバルト),In(インジウム)などの三価金属イオンである。
水酸化物基本層中の三価金属イオンは、二価金属イオンを最大モル比M2+:M3+=2:1まで置換することができる。
中間層の陰イオンAは、NO3
-,CO3
2-,OH-,Cl-,SO4
2-,SiO4
4-,リン酸、クロム酸、過マンガン酸、バナジン酸、セレン酸、ホウ酸、フッ化物、カルボン酸などのn価の陰イオンである。
Layered double hydroxides are represented by the general formula: [M 2+ (1-x) M 3+ x (OH) 2 ][A n- x/n ·yH 2 O] (see Eiichi Narita, Clay Science, 46(4), 207-218 (2007)).
Here, M2 + in the basic layer is a divalent metal ion such as Mg (magnesium), Zn (zinc), Ca (calcium), Mn (manganese), Pd (palladium), Sr (strontium), Fe (iron), Co (cobalt), Ni (nickel), or Cu (copper).
The M3 + in the basic layer is a trivalent metal ion such as Al (aluminum), Bi (bismuth), Ga (gallium), Ni, Mn, V (vanadium), Ce (cerium), La (lanthanum), Cr (chromium), Fe (iron), Co (cobalt), or In (indium).
Trivalent metal ions in the hydroxide based layer can replace divalent metal ions up to a maximum molar ratio M 2+ :M 3+ =2:1.
The anion A in the intermediate layer is an n-valent anion such as NO 3 − , CO 3 2− , OH − , Cl − , SO 4 2− , SiO 4 4− , phosphate, chromate, permanganate, vanadate, selenate, borate, fluoride, or carboxylate.
表面処理溶液16は、表面処理用の電解液であって、その組成は電気泳動の溶液として次の様になっている。
有機溶媒―水混合溶媒:有機溶媒は、アルコール系として、エタノール、メタノール、ブタノール、プロパノール、イソプロパノール、グリセリン、エチレングリコールなどがある。ケトン系として、アセトン、ジメチルケトン、メチルエチルケトン、メチルイソブチルケトン、シクロヘキサノンなどがある。エーテル系として、ジエチルエーテルなどがある。その他として、ジメチルスルホキシド、ジメチルフォルムアミド、クロロホルムなどがある。
The surface treatment solution 16 is an electrolyte for surface treatment, and has the following composition as an electrophoretic solution:
Organic solvent-water mixed solvent: Organic solvents include alcohols such as ethanol, methanol, butanol, propanol, isopropanol, glycerin, and ethylene glycol. Ketones include acetone, dimethyl ketone, methyl ethyl ketone, methyl isobutyl ketone, and cyclohexanone. Ethers include diethyl ether. Others include dimethyl sulfoxide, dimethylformamide, and chloroform.
電解液に分散させるLDH粉末の濃度は、電解液に対する体積比率として、0%以上10%以下であるとよい。LDH粉末の濃度が10%を超えると、懸濁液中での粒子間距離が近くなって凝集し、沈降しやすくなるという技術的課題が生じる。
電解液に添加する金属イオンとして、金属硝酸塩を添加する場合、Mg(NO3)2およびAl(NO3)3濃度範囲は、例えば次の比率とするとよい。
Mg(NO3)2:Al(NO3)3=1:0~0:1
金属イオンとLDH粉末が共存している場合、マグネシウムイオンは、LDH粉末表面に吸着してLDH粉末と共に負極側に泳動し、負極表面でゲル状水酸化マグネシウムとして析出するため、水酸化マグネシウムがLDH粉末を負極表面や粉末同士に接着させる糊としての働くという技術的効果がある。アルミニウムイオンも、マグネシウムイオンと同様にLDH粉末表面に吸着して泳動し、LDH粉末を負極表面や粉末同士に接着させる糊としての働くという技術的効果がある。マグネシウムイオンとアルミニウムイオンを同時に添加すると、負極表面でマグネシウムとアルミニウムの複水酸化物として析出し、LDH粉末を負極表面や粉末同士に接着させる糊として働く。
The concentration of the LDH powder dispersed in the electrolyte is preferably 0% or more and 10% or less in volume ratio to the electrolyte. If the concentration of the LDH powder exceeds 10%, the distance between particles in the suspension becomes short, causing aggregation and making the particles more likely to settle, which is a technical problem.
When metal nitrates are added as metal ions to the electrolyte, the concentration ranges of Mg(NO 3 ) 2 and Al(NO 3 ) 3 may be, for example, in the following ratio.
Mg(NO 3 ) 2 :Al(NO 3 ) 3 =1:0 to 0:1
When metal ions and LDH powder coexist, magnesium ions are adsorbed to the surface of the LDH powder and migrate to the negative electrode side together with the LDH powder, and precipitate as gel-like magnesium hydroxide on the negative electrode surface, resulting in the technical effect that magnesium hydroxide acts as a glue to adhere the LDH powder to the negative electrode surface and to other powders. Aluminum ions, like magnesium ions, are adsorbed to the surface of the LDH powder and migrate, resulting in the technical effect that they act as a glue to adhere the LDH powder to the negative electrode surface and to other powders. When magnesium ions and aluminum ions are added simultaneously, they precipitate as double hydroxides of magnesium and aluminum on the negative electrode surface, and act as a glue to adhere the LDH powder to the negative electrode surface and to other powders.
図2は、第1の態様による本発明の層状複水酸化物(LDH)を表面に有する金属板を製造する工程を説明する流れ図である。
まず、電解液16aにLDH粉末40を分散させる(S100)。この場合には例えばスターラーを用いて攪拌する。LDH粉末40は電解液16a中で自発的に帯電する。
次に、電解液16aとLDH粉末40からなる懸濁液に電極基板12及び対極板14を浸漬する(S102)。そして、電極基板12と対極板14との間に電場を印加する(S104)。電場の印加は、例えば直流電源30の一方の極と基材12との間を電線32で結線し、直流電源30の他方の極と対極板14との間を電線34で結線し、直流電源30から所定電位の定電圧やパルス電圧により電場を印加する。すると、電極基板12上にLDH粉末40が電気泳動堆積する(S106)。
電極基板12上のLDH粉末40の膜厚が、所定値になるまで、電気泳動堆積を継続する(S108)。電気泳動堆積を継続させる時間は、直接電極基板12上のLDH粉末40の膜厚を測定してもよく、また直流電源30から供給した電荷の総量や電気泳動堆積前後の基材の重量変化から定めてもよい。そして、LDH粉末40で被覆された電極基板12を電解液16aから取り出す(S108)。
FIG. 2 is a flow chart illustrating the process for producing a metal plate having a layered double hydroxide (LDH) on its surface according to the first embodiment of the present invention.
First, the LDH powder 40 is dispersed in the electrolytic solution 16a (S100). In this case, the dispersion is stirred using a stirrer, for example. The LDH powder 40 spontaneously becomes charged in the electrolytic solution 16a.
Next, the electrode substrate 12 and the counter electrode plate 14 are immersed in a suspension consisting of the electrolytic solution 16a and the LDH powder 40 (S102). Then, an electric field is applied between the electrode substrate 12 and the counter electrode plate 14 (S104). For example, the electric field is applied by connecting one pole of a DC power source 30 and the substrate 12 with an electric wire 32, connecting the other pole of the DC power source 30 and the counter electrode plate 14 with an electric wire 34, and applying an electric field by a constant voltage or a pulse voltage of a predetermined potential from the DC power source 30. Then, the LDH powder 40 is electrophoretically deposited on the electrode substrate 12 (S106).
Electrophoretic deposition is continued until the thickness of the LDH powder 40 on the electrode substrate 12 reaches a predetermined value (S108). The time for which electrophoretic deposition is continued may be determined by directly measuring the thickness of the LDH powder 40 on the electrode substrate 12, or may be determined from the total amount of charge supplied from the DC power source 30 or the change in weight of the substrate before and after electrophoretic deposition. Then, the electrode substrate 12 coated with the LDH powder 40 is removed from the electrolytic solution 16a (S108).
次に、第2電解液16bに金属イオン42を添加する(S110)。次に、添加した金属イオン42を含む電解液16bに電極基板12及び対極板14を浸漬する(S112)。電極基板12と対極板14との間に電場を印加する(S114)。すると、LDH粉末40で被覆された電極基板12上に金属イオン42の水酸化物が電解析出する(S116)。電極基板12上の金属水酸化物の膜厚が、所定値になるまで、電解析出を継続する(S118)。そして、LDH粉末40の電気泳動堆積層の上を金属イオン42の水酸化物で被覆された堆積層18bを有する電極基板12を電解液16bから取り出す(S218)。 Next, metal ions 42 are added to the second electrolytic solution 16b (S110). Next, the electrode substrate 12 and the counter electrode plate 14 are immersed in the electrolytic solution 16b containing the added metal ions 42 (S112). An electric field is applied between the electrode substrate 12 and the counter electrode plate 14 (S114). Then, hydroxides of the metal ions 42 are electrolytically deposited on the electrode substrate 12 coated with the LDH powder 40 (S116). Electrolytic deposition is continued until the film thickness of the metal hydroxide on the electrode substrate 12 reaches a predetermined value (S118). Then, the electrode substrate 12 having the deposition layer 18b coated with the hydroxides of the metal ions 42 on the electrophoretic deposition layer of the LDH powder 40 is taken out from the electrolytic solution 16b (S218).
実施例では、LDH粉末として市販のハイドロタルサイト(HT)粉末を用いた。HTは層間にCO3 2-イオンが挿入されたMg-Al系LDHである。基材には、Mg-3mass% Al-1mass% Zn(AZ31)合金を用いた。AZ31合金は、現在、自動車やカメラ、パソコン、携帯電話等の部材に使用されている汎用マグネシウム合金である。 In the examples, commercially available hydrotalcite (HT) powder was used as the LDH powder. HT is a Mg-Al-based LDH with CO 3 2- ions inserted between layers. For the substrate, Mg-3 mass% Al-1 mass% Zn (AZ31) alloy was used. AZ31 alloy is a general-purpose magnesium alloy currently used in components for automobiles, cameras, personal computers, mobile phones, etc.
<実施例1-1>HT粉末のみの電気泳動堆積
Mg-3mass% Al-1mass% Zn(AZ31)板表面を#1200の耐水研磨紙で仕上げ、基材とした。電解液には、エタノール:水=4:1(体積比)の溶媒に粒径約1μmの市販のハイドロタルサイト(HT)粉末を1~5w/v%(weight/volμme%)で懸濁した溶液を用いた。同懸濁液を撹拌しながら、作用極として基材AZ31板および対極としてステンレス鋼メッシュ板を挿入した。AZ31板を陰極として対極との間にピーク―ピーク(p-p)電圧10V、周波数0.1Hz、デューティー比98%のパルス電圧を10分間印加し、電気泳動堆積(EPD)を行った。EPD後のAZ31板を100℃で1時間乾燥した後、イソプロパノール溶液で超音波洗浄し、LDH堆積表面を得た。なお、超音波洗浄前の表面は目視ではHT粉末で均一に覆われていた。
Example 1-1: Electrophoretic deposition of HT powder only The surface of an Mg-3mass% Al-1mass% Zn (AZ31) plate was finished with #1200 waterproof abrasive paper to form a substrate. For the electrolyte, a solution was used in which commercially available hydrotalcite (HT) powder with a particle size of about 1 μm was suspended at 1 to 5 w/v% (weight/volμme%) in a solvent of ethanol:water = 4:1 (volume ratio). While stirring the suspension, the substrate AZ31 plate was inserted as the working electrode and a stainless steel mesh plate as the counter electrode. A pulse voltage of peak-peak (pp) voltage 10V, frequency 0.1Hz, and duty ratio 98% was applied between the AZ31 plate as the cathode and the counter electrode for 10 minutes to perform electrophoretic deposition (EPD). The AZ31 plate after EPD was dried at 100°C for 1 hour, and then ultrasonically cleaned with an isopropanol solution to obtain an LDH-deposited surface. Before the ultrasonic cleaning, the surface was found to be uniformly covered with HT powder when observed visually.
EPDにおいて、HT濃度を1w/v%、2w/v%、3w/v%、5w/v%としたときのHT堆積表面の電子顕微鏡写真を図3に示す。表面にHT粉末の凝集体が付着していた。電解液中のHT粉末濃度の増加に伴い、HT粉末の付着量は増加した。 Figure 3 shows electron microscope photographs of the HT deposition surface when the HT concentration in the EPD was 1 w/v%, 2 w/v%, 3 w/v%, and 5 w/v%. Aggregates of HT powder were found attached to the surface. The amount of HT powder attached increased with an increase in the HT powder concentration in the electrolyte.
<実施例1-2>HT粉末の電気泳動堆積→金属水酸化物の電解析出
Mg-3mass% Al-1mass% Zn(AZ31)板表面を#1200の耐水研磨紙で仕上げ、基材とした。1段目のハイドロタルサイト(HT)粉末の電気泳動堆積のための電解液には、イソプロパノール:水=40:1(体積比)の溶媒に粒径約1μmの市販のHT粉末を2w/v%(weight/volμme%)で懸濁した溶液を用いた。作用極として基材AZ31板および対極としてステンレス鋼板を電解液に挿入した。AZ31板を陰極として対極との間に定電圧100Vを1分間印加し、電気泳動堆積(EPD)を行った。
2段目の金属水酸化物の電解析出のための電解液には、イソプロパノール:水=40:1(体積比)の溶媒に0.002mol/Lの硝酸マグネシウムおよび0.0005mol/Lの硝酸アルミニウムを添加した溶液を用いた。1段目の電気泳動堆積でHT粉末が堆積した基材AZ31を作用極として、ステンレス鋼板を対極として電解液に挿入した。陰極と対極の間に定電圧100Vを1分間印加し、電解析出を行った。その後、100℃にて1時間乾燥した。
図4に作製した表面の電子顕微鏡写真を示す。最表面に金属水酸化物が観察され、基材と金属水酸化物の間にHT粉がみられた。基材表面にHT粉末と金属水酸化物の複合堆積層が形成できた。
Example 1-2: Electrophoretic deposition of HT powder → Electrolytic deposition of metal hydroxide The surface of an Mg-3 mass% Al-1 mass% Zn (AZ31) plate was finished with #1200 waterproof abrasive paper to be used as a substrate. For the electrophoretic deposition of the first stage of hydrotalcite (HT) powder, a solution was used in which commercially available HT powder with a particle size of about 1 μm was suspended at 2 w/v% (weight/volμme%) in a solvent of isopropanol:water = 40:1 (volume ratio). The substrate AZ31 plate was inserted as the working electrode and a stainless steel plate as the counter electrode into the electrolytic solution. A constant voltage of 100 V was applied between the AZ31 plate as the cathode and the counter electrode for 1 minute to perform electrophoretic deposition (EPD).
The electrolytic solution for the electrolytic deposition of the second metal hydroxide was a solution in which 0.002 mol/L magnesium nitrate and 0.0005 mol/L aluminum nitrate were added to a solvent of isopropanol:water = 40:1 (volume ratio). The substrate AZ31 on which the HT powder was deposited in the first electrophoretic deposition was inserted into the electrolytic solution as the working electrode and a stainless steel plate as the counter electrode. A constant voltage of 100V was applied between the cathode and the counter electrode for 1 minute to perform electrolytic deposition. Then, it was dried at 100°C for 1 hour.
An electron microscope photograph of the prepared surface is shown in Figure 4. Metal hydroxide was observed on the outermost surface, and HT powder was found between the substrate and the metal hydroxide. A composite deposition layer of HT powder and metal hydroxide was formed on the substrate surface.
図5は、第2の態様による本発明の層状複水酸化物(LDH)を表面に有する金属板を製造する工程を説明する流れ図である。第2の態様は、第1の態様と比較すると、電極基板12上へのLDH粉末40の電気泳動堆積と金属イオンの水酸化物の電解析出の順序が逆になっている。
まず、電解液16bに金属イオン42を添加する(S200)。次に、添加した金属イオン42を含む電解液16bに電極基板12及び対極板14を浸漬する(S202)。電極基板12と対極板14との間に電場を印加する(S204)。電場の印加は、例えば直流電源30の一方の極と基材12との間を電線32で結線し、直流電源30の他方の極と対極板14との間を電線34で結線し、直流電源30から所定電位の定電圧やパルス電圧により電場を印加する。すると電極基板12上に金属イオンの水酸化物が電解析出する(S206)。
電極基板12上の金属水酸化物の膜厚が、所定値になるまで、電解析出を継続する(S208)。電解析出を継続させる時間は、直接電極基板12上の金属水酸化物の膜厚を測定してもよく、また直流電源30から供給した電荷の総量や電解析出前後の基材の重量変化から定めてもよい。そして、金属水酸化物で被覆された電極基板12を電解液16bから取り出す(S208)。
5 is a flow chart for explaining the process for producing a metal plate having a layered double hydroxide (LDH) on the surface thereof according to the second embodiment of the present invention. In the second embodiment, the order of electrophoretic deposition of the LDH powder 40 on the electrode substrate 12 and electrolytic deposition of the hydroxide of the metal ions is reversed compared to the first embodiment.
First, metal ions 42 are added to the electrolytic solution 16b (S200). Next, the electrode substrate 12 and the counter electrode plate 14 are immersed in the electrolytic solution 16b containing the added metal ions 42 (S202). An electric field is applied between the electrode substrate 12 and the counter electrode plate 14 (S204). For example, the electric field is applied by connecting one pole of the DC power source 30 to the substrate 12 with an electric wire 32, connecting the other pole of the DC power source 30 to the counter electrode plate 14 with an electric wire 34, and applying an electric field from the DC power source 30 by a constant voltage or pulse voltage of a predetermined potential. Then, hydroxides of the metal ions are electrolytically deposited on the electrode substrate 12 (S206).
The electrolytic deposition is continued until the thickness of the metal hydroxide film on the electrode substrate 12 reaches a predetermined value (S208). The time for which the electrolytic deposition is continued may be determined by directly measuring the thickness of the metal hydroxide film on the electrode substrate 12, or may be determined from the total amount of charge supplied from the DC power source 30 or the change in weight of the substrate before and after the electrolytic deposition. Then, the electrode substrate 12 coated with the metal hydroxide is removed from the electrolytic solution 16b (S208).
次に、別の電解液16a中にLDH粉末40を分散させる(S210)。この場合には例えばスターラーを用いて攪拌する。LDH粉末40は電解液16a中で自発的に帯電する。
次に、電解液16aとLDH粉末40からなる懸濁液に金属イオン42の水酸化物で被覆された電極基板12及び対極板14を浸漬する(S212)。そして、電極基板12と対極板14との間に電場を印加する(S214)。すると、電極基板12上にLDH粉末40が電気泳動堆積する(S216)。電極基板12上のLDH粉末40の膜厚が、所定値になるまで、電気泳動堆積を継続する(S218)。そして、金属水酸化物で被覆された電極基板12の表面上がLDH粉末40の電気泳動堆積層で被覆された処理済みの電極基板12を電解液16aから取り出す(S218)。
Next, the LDH powder 40 is dispersed in another electrolytic solution 16a (S210). In this case, the dispersion is stirred using a stirrer, for example. The LDH powder 40 spontaneously becomes charged in the electrolytic solution 16a.
Next, the electrode substrate 12 and the counter electrode plate 14 coated with the hydroxide of the metal ions 42 are immersed in a suspension consisting of the electrolytic solution 16a and the LDH powder 40 (S212). Then, an electric field is applied between the electrode substrate 12 and the counter electrode plate 14 (S214). Then, the LDH powder 40 is electrophoretically deposited on the electrode substrate 12 (S216). The electrophoretic deposition is continued until the film thickness of the LDH powder 40 on the electrode substrate 12 reaches a predetermined value (S218). Then, the treated electrode substrate 12, in which the surface of the electrode substrate 12 coated with the metal hydroxide is covered with an electrophoretically deposited layer of the LDH powder 40, is taken out from the electrolytic solution 16a (S218).
<実施例2>金属水酸化物の電解析出→HT粉末の電気泳動堆積
Mg-3mass% Al-1mass% Zn(AZ31)板表面を#1200の耐水研磨紙で仕上げ、基材とした。1段目の金属水酸化物の電解析出のための電解液には、イソプロパノール:水=40:1(体積比)の溶媒に0.002mol/Lの硝酸マグネシウムおよび0.0005mol/Lの硝酸アルミニウムを添加した溶液を用いた。作用極として基材AZ31板および対極としてステンレス鋼板を電解液に挿入した。AZ31板を陰極として対極との間に定電圧100Vを1分間印加し、電解析出を行った。
Example 2: Electrolytic deposition of metal hydroxide → electrophoretic deposition of HT powder The surface of an Mg-3 mass% Al-1 mass% Zn (AZ31) plate was finished with #1200 waterproof abrasive paper to prepare a substrate. For the electrolytic deposition of the first stage of metal hydroxide, a solution was used in which 0.002 mol/L of magnesium nitrate and 0.0005 mol/L of aluminum nitrate were added to a solvent of isopropanol:water = 40:1 (volume ratio). An AZ31 substrate plate was inserted as a working electrode and a stainless steel plate as a counter electrode into the electrolytic solution. A constant voltage of 100V was applied between the AZ31 plate as a cathode and the counter electrode for 1 minute to perform electrolytic deposition.
2段目のハイドロタルサイト(HT)粉末の電気泳動堆積のための電解液には、イソプロパノール:水=40:1(体積比)の溶媒に粒径約1μmの市販のHT粉末を2w/v%(weight/volμme%)で懸濁した溶液を用いた。1段目の電解析出で金属水酸化物を堆積した基材AZ31を作用極として、ステンレス鋼板を対極として電解液に挿入した。陰極と対極の間に定電圧100Vを1分間印加し、電気泳動堆積を行った。その後、100℃にて1時間乾燥した。
図6に作製した表面の電子顕微鏡写真を示す。金属水酸化物の堆積層の上面にHT粉末が付着していた。基材表面にHT粉末と金属水酸化物の複合堆積層が形成できた。
The electrolytic solution for electrophoretic deposition of hydrotalcite (HT) powder in the second stage was a solution in which commercially available HT powder with a particle size of about 1 μm was suspended at 2 w/v% (weight/volume μme%) in a solvent of isopropanol:water = 40:1 (volume ratio). The substrate AZ31 on which metal hydroxide was deposited in the first stage electrolytic deposition was inserted into the electrolytic solution as the working electrode and a stainless steel plate as the counter electrode. A constant voltage of 100 V was applied between the cathode and the counter electrode for 1 minute to perform electrophoretic deposition. Then, it was dried at 100 ° C for 1 hour.
An electron microscope photograph of the prepared surface is shown in Figure 6. The HT powder was attached to the upper surface of the metal hydroxide deposition layer. A composite deposition layer of HT powder and metal hydroxide was formed on the substrate surface.
図7は、本発明の層状複水酸化物を表面に有する金属板を製造するために用いる電気泳動堆積装置の概要図で、LDH粉末と添加金属イオンの同時存在による電気泳動堆積処理を示している。なお、図7において前出の図1の構成要素と同一作用をするものには同一符号を付して説明を省略する。
図1(A)においては、電解槽10にLDH粉末40が分散した表面処理溶液16aを収容しているが、図7においては、電解槽10に金属イオン42を添加した表面処理溶液16にLDH粉末40を分散させて収容している。
なお、別工程である図1(B)に示す工程は、電解槽10に金属イオン42が添加された表面処理溶液16bを収容しているが、図7に示す工程でも図1(A)に示す工程と同様に組み合わせて、電極基板の被覆処理がなされる。
Fig. 7 is a schematic diagram of an electrophoretic deposition apparatus used for producing a metal plate having a layered double hydroxide on its surface according to the present invention, showing an electrophoretic deposition process in the simultaneous presence of LDH powder and added metal ions. In Fig. 7, components having the same functions as those in Fig. 1 are given the same reference numerals and will not be described.
In FIG. 1(A), the electrolytic cell 10 contains a surface treatment solution 16a in which LDH powder 40 is dispersed, whereas in FIG. 7, the electrolytic cell 10 contains a surface treatment solution 16 to which metal ions 42 have been added, in which LDH powder 40 is dispersed.
In the process shown in FIG. 1(B), which is a separate process, a surface treatment solution 16b to which metal ions 42 have been added is contained in an electrolytic cell 10. In the process shown in FIG. 7, a coating process for an electrode substrate is performed in the same combination as in the process shown in FIG. 1(A).
図7における動作としては、基材12と対極板14との間で生ずる電位差によって、表面処理溶液16の内部でLDH粉末40と添加金属イオン42が対極板14から基材12に移動して、LDH粉末40と金属水酸化物18の電気泳動堆積層が形成される。直流電源30の電圧は、電気泳動堆積に必要な電圧としている。電気泳動堆積では、帯電した粉末が電場の力(F=qE.F:力、q:電荷クーロン、E:電圧)で電極基板上に押し付けられている。 In the operation shown in FIG. 7, the potential difference between the substrate 12 and the counter electrode 14 causes the LDH powder 40 and added metal ions 42 to move from the counter electrode 14 to the substrate 12 inside the surface treatment solution 16, forming an electrophoretic deposition layer of the LDH powder 40 and metal hydroxide 18. The voltage of the DC power supply 30 is set to the voltage required for electrophoretic deposition. In electrophoretic deposition, the charged powder is pressed onto the electrode substrate by the force of an electric field (F=qE.F: force, q: charge coulomb, E: voltage).
図7に示す電気泳動堆積処理の工程では、陰極Mg合金表面で、電場によるLDH粉末の押しつけと同時に、Mgイオンおよび/もしくはAlイオンのpH上昇による水酸化物としての析出や、LDH粉末に吸着した状態での析出、または有機溶媒との化合物である有機金属化合物としての析出が同時に起こっている。LDH粉末に吸着した金属イオンは大気中の水と反応して水酸化物や酸化物になり、有機金属化合物は加水分解されると水酸化物や酸化物になる。このため、金属水酸化物をバインダー(糊)としてLDH粉末がMg合金表面に固着することができる。 In the electrophoretic deposition process shown in Figure 7, the LDH powder is pressed against the cathode Mg alloy surface by the electric field, and simultaneously, Mg ions and/or Al ions are precipitated as hydroxides due to an increase in pH, precipitated while adsorbed to the LDH powder, or precipitated as organometallic compounds that are compounds with organic solvents. Metal ions adsorbed to the LDH powder react with water in the air to become hydroxides or oxides, and organometallic compounds become hydroxides or oxides when hydrolyzed. This allows the LDH powder to adhere to the Mg alloy surface using the metal hydroxide as a binder (glue).
図8は、本発明の第3の態様による層状複水酸化物(LDH)を表面に有する金属板を製造する工程を説明する流れ図である。
本発明の層状複水酸化物を表面に有する金属板を製造する第3の態様は、第1の態様と比較すると、電極基板12上にHT粉末のみを電気泳動堆積するのに代えて、第3の態様では電極基板12上にHT粉末と金属水酸化物の複合体を電気泳動堆積し、続いて金属イオンの水酸化物の電解析出を行っている。
FIG. 8 is a flow diagram illustrating the process for producing a metal plate having a layered double hydroxide (LDH) on its surface according to the third embodiment of the present invention.
The third embodiment of the present invention for producing a metal plate having a layered double hydroxide on its surface is different from the first embodiment in that, instead of electrophoretically depositing only HT powder on the electrode substrate 12, in the third embodiment, a complex of HT powder and a metal hydroxide is electrophoretically deposited on the electrode substrate 12, followed by electrolytic deposition of the hydroxide of the metal ion.
まず、金属イオンを添加した電解液16にLDH粉末40を分散させる(S300)。LDH粉末40の分散には、例えばスターラーを用いて攪拌する。LDH粉末40は電解液16中で自発的に帯電する。なお、電解液に対する金属イオンの添加とLDH粉末の分散の順序は、逆でもよい。即ち、LDH粉末を分散させた電解液16に金属イオンを添加する順序でもよい。
次に、金属イオンを添加した電解液16とLDH粉末40からなる懸濁液に電極基板12及び対極板14を浸漬する(S302)。そして、電極基板12と対極板14との間に電場を印加する(S304)。すると、電極基板12上にLDH粉末40と金属イオン42の水酸化物の複合体が電気泳動堆積する(S306)。
電極基板12上のLDH粉末40と金属イオン42の水酸化物の複合体の膜厚が、所定値になるまで、電気泳動堆積を継続する(S308)。電気泳動堆積を継続させる時間は、直接電極基板12上のLDH粉末40と金属イオン42の水酸化物の複合体の膜厚を測定してもよく、また直流電源30から供給した電荷の総量や電気泳動堆積前後の基材12の重量変化から定めてもよい。そして、LDH粉末40で被覆された電極基板12を電解液16から取り出す(S308)。
第2の工程である電極基板12に金属イオン42の水酸化物を電解析出させる工程S310~S318は、図2に示すS110~S118と同様である。
First, the LDH powder 40 is dispersed in the electrolytic solution 16 to which metal ions have been added (S300). The LDH powder 40 is dispersed by stirring, for example, with a stirrer. The LDH powder 40 is spontaneously charged in the electrolytic solution 16. The order of adding the metal ions to the electrolytic solution and dispersing the LDH powder may be reversed. That is, the order may be such that the metal ions are added to the electrolytic solution 16 in which the LDH powder has been dispersed.
Next, the electrode substrate 12 and the counter electrode plate 14 are immersed in a suspension consisting of the electrolytic solution 16 with added metal ions and the LDH powder 40 (S302). Then, an electric field is applied between the electrode substrate 12 and the counter electrode plate 14 (S304). Then, a complex of the LDH powder 40 and the hydroxide of the metal ions 42 is electrophoretically deposited on the electrode substrate 12 (S306).
Electrophoretic deposition is continued until the thickness of the complex of the hydroxides of the LDH powder 40 and the metal ions 42 on the electrode substrate 12 reaches a predetermined value (S308). The time for which electrophoretic deposition is continued may be determined by directly measuring the thickness of the complex of the hydroxides of the LDH powder 40 and the metal ions 42 on the electrode substrate 12, or may be determined from the total amount of charge supplied from the DC power source 30 or the change in weight of the base material 12 before and after electrophoretic deposition. Then, the electrode substrate 12 coated with the LDH powder 40 is removed from the electrolyte solution 16 (S308).
The second step, steps S310 to S318 for electrolytically depositing hydroxides of metal ions 42 onto electrode substrate 12, are similar to steps S110 to S118 shown in FIG.
<実施例3>HT粉末と金属水酸化物の複合体を電気泳動堆積→金属水酸化物の電解析出
Mg-3mass% Al-1mass% Zn(AZ31)板表面を#1200の耐水研磨紙で仕上げ、基材とした。1段目のハイドロタルサイト(HT)粉末と金属水酸化物の複合体を電気泳動堆積のための電解液には、0.002mol/Lの硝酸マグネシウムおよび0.0005mol/Lの硝酸アルミニウムを添加したイソプロパノール:水=40:1(体積比)の溶媒に、粒径約1μmの市販のHT粉末を2w/v%(weight/volμme%)で懸濁した溶液を用いた。作用極として基材AZ31板および対極としてステンレス鋼板を電解液に挿入した。AZ31板を陰極として対極との間に定電圧100Vを1分間印加し、電気泳動堆積(EPD)を行った。
Example 3: Electrophoretic deposition of a complex of HT powder and metal hydroxide → Electrolytic deposition of metal hydroxide The surface of an Mg-3mass% Al-1mass% Zn (AZ31) plate was finished with #1200 waterproof abrasive paper to form a substrate. For the electrolytic solution for electrophoretic deposition of a complex of hydrotalcite (HT) powder and metal hydroxide in the first stage, a solution was used in which commercially available HT powder with a particle size of about 1 μm was suspended at 2 w/v% (weight/volμme%) in a solvent of isopropanol:water = 40:1 (volume ratio) to which 0.002 mol/L magnesium nitrate and 0.0005 mol/L aluminum nitrate were added. An AZ31 substrate plate was inserted as a working electrode and a stainless steel plate was inserted as a counter electrode into the electrolytic solution. A constant voltage of 100 V was applied between the AZ31 plate as a cathode and the counter electrode for 1 minute to perform electrophoretic deposition (EPD).
2段目の金属水酸化物の電解析出のための電解液には、イソプロパノール:水=40:1(体積比)の溶媒に0.002mol/Lの硝酸マグネシウムおよび0.0005mol/Lの硝酸アルミニウムを添加した溶液を用いた。1段目の電気泳動堆積でHT粉末および金属水酸化物の複合体が堆積した基材AZ31を作用極として、ステンレス鋼板を対極として電解液に挿入した。陰極と対極の間に定電圧100Vを1分間印加し、電解析出を行った。その後、100℃にて1時間乾燥した。
図9に作製した表面の電子顕微鏡写真を示す。基材表面は研磨痕がみえない量のHT粉末と金属水酸化物の複合堆積層に覆われており、その表層に析出した金属酸化物がみられた。基材表面にHT粉末と金属水酸化物の複合堆積層が形成できた。
The electrolytic solution for the electrolytic deposition of the metal hydroxide in the second stage was a solution in which 0.002 mol/L magnesium nitrate and 0.0005 mol/L aluminum nitrate were added to a solvent of isopropanol:water = 40:1 (volume ratio). The substrate AZ31 on which the composite of HT powder and metal hydroxide was deposited in the first stage electrophoretic deposition was inserted as the working electrode and a stainless steel plate as the counter electrode into the electrolytic solution. A constant voltage of 100V was applied between the cathode and the counter electrode for 1 minute to perform electrolytic deposition. Then, it was dried at 100°C for 1 hour.
An electron microscope photograph of the prepared surface is shown in Figure 9. The substrate surface was covered with a composite deposition layer of HT powder and metal hydroxide in an amount that did not show any polishing marks, and the metal oxide precipitated on the surface layer was observed. A composite deposition layer of HT powder and metal hydroxide was formed on the substrate surface.
本発明の層状複水酸化物を表面に有する金属板を製造する第4の態様は、第2の態様と比較すると、金属イオンの水酸化物の電解析出を行い、続いて、第2の態様では電極基板12上にHT粉末のみを電気泳動堆積するのに代えて、第4の態様では電極基板12上にHT粉末と金属水酸化物の複合電気泳動堆積を行っている。
図10は、本発明の第4の態様による層状複水酸化物を表面に有する金属板を製造する工程を説明する流れ図である。
最初の工程である電極基板12に金属イオン42の水酸化物を電解析出される工程S400~S408は、図5に示すS200~S208と同様である。
The fourth embodiment of the present invention for producing a metal plate having a layered double hydroxide on its surface is different from the second embodiment in that electrolytic deposition of hydroxides of metal ions is carried out, and then, instead of electrophoretic deposition of only HT powder on the electrode substrate 12 in the second embodiment, a composite electrophoretic deposition of HT powder and metal hydroxide is carried out on the electrode substrate 12 in the fourth embodiment.
FIG. 10 is a flow chart illustrating the steps of producing a metal plate having a layered double hydroxide on its surface according to the fourth embodiment of the present invention.
The first steps, steps S400 to S408 for electrolytically depositing hydroxides of metal ions 42 on electrode substrate 12, are similar to steps S200 to S208 shown in FIG.
次に、金属イオンを添加した別の電解液16中にLDH粉末40を分散させる(S410)。この場合には例えばスターラーを用いて攪拌する。LDH粉末40は電解液16中で自発的に帯電する。なお、電解液に対する金属イオンの添加とLDH粉末の分散の順序は、逆でもよい。即ち、LDH粉末を分散させた電解液16に金属イオンを添加する順序でもよい。
次に、金属イオンを添加した電解液16とLDH粉末40からなる懸濁液に金属イオン42の水酸化物で被覆された電極基板12及び対極板14を浸漬する(S412)。そして、電極基板12と対極板14との間に電場を印加する(S414)。すると、電極基板12上にLDH粉末40と金属イオン42の水酸化物の複合体が電気泳動堆積する(S416)。電極基板12上のLDH粉末40の膜厚が、所定値になるまで、電気泳動堆積を継続する(S418)。そして、金属水酸化物で被覆された電極基板12の表面上がLDH粉末40と金属イオン42の水酸化物の複合体の電気泳動堆積層で被覆された処理済みの電極基板12を電解液16から取り出す(S418)。
Next, the LDH powder 40 is dispersed in another electrolytic solution 16 to which metal ions have been added (S410). In this case, stirring is performed using a stirrer, for example. The LDH powder 40 spontaneously becomes charged in the electrolytic solution 16. The order of adding the metal ions to the electrolytic solution and dispersing the LDH powder may be reversed. In other words, the order may be such that the metal ions are added to the electrolytic solution 16 in which the LDH powder has been dispersed.
Next, the electrode substrate 12 and the counter electrode plate 14 coated with the hydroxide of the metal ion 42 are immersed in a suspension consisting of the electrolytic solution 16 to which the metal ions have been added and the LDH powder 40 (S412). Then, an electric field is applied between the electrode substrate 12 and the counter electrode plate 14 (S414). Then, a complex of the LDH powder 40 and the hydroxide of the metal ion 42 is electrophoretically deposited on the electrode substrate 12 (S416). The electrophoretic deposition is continued until the film thickness of the LDH powder 40 on the electrode substrate 12 reaches a predetermined value (S418). Then, the treated electrode substrate 12, in which the surface of the electrode substrate 12 coated with the metal hydroxide is covered with an electrophoretically deposited layer of the complex of the LDH powder 40 and the hydroxide of the metal ion 42, is taken out from the electrolytic solution 16 (S418).
<実施例4>金属水酸化物の電解析出→HT粉末と金属水酸化物の複合電気泳動堆積
Mg-3mass% Al-1mass% Zn(AZ31)板表面を#1200の耐水研磨紙で仕上げ、基材とした。1段目の金属水酸化物の電解析出のための電解液には、イソプロパノール:水=40:1(体積比)の溶媒に0.002mol/Lの硝酸マグネシウムおよび0.0005mol/Lの硝酸アルミニウムを添加した溶液を用いた。作用極として基材AZ31板および対極としてステンレス鋼板を電解液に挿入した。AZ31板を陰極として対極との間に定電圧100Vを1分間印加し、電解析出を行った。
Example 4: Electrolytic deposition of metal hydroxide → composite electrophoretic deposition of HT powder and metal hydroxide The surface of an Mg-3mass% Al-1mass% Zn (AZ31) plate was finished with #1200 waterproof abrasive paper to be used as a substrate. For the electrolytic deposition of the first stage of metal hydroxide, a solution was used in which 0.002 mol/L of magnesium nitrate and 0.0005 mol/L of aluminum nitrate were added to a solvent of isopropanol:water = 40:1 (volume ratio). The substrate AZ31 plate was inserted as the working electrode and a stainless steel plate as the counter electrode into the electrolytic solution. A constant voltage of 100V was applied between the AZ31 plate as the cathode and the counter electrode for 1 minute to perform electrolytic deposition.
2段目のハイドロタルサイト(HT)粉末と金属水酸化物の複合電気泳動堆積のための電解液には、0.002mol/Lの硝酸マグネシウムおよび0.0005mol/Lの硝酸アルミニウムを添加したイソプロパノール:水=40:1(体積比)の溶媒に、粒径約1μmの市販のHT粉末を2w/v%(weight/volμme%)で懸濁した溶液を用いた。1段目の電解析出で金属水酸化物を堆積した基材AZ31を作用極として、ステンレス鋼板を対極として電解液に挿入した。陰極と対極の間に定電圧100Vを1分間印加し、電気泳動堆積を行った。その後、100℃にて1時間乾燥した。
図11に作製した表面の電子顕微鏡写真を示す。基材に研磨痕がみえない量の金属水酸化物が析出しており、その上にHT粉と金属水酸化物の複合体が堆積していた。基材表面にHT粉末と金属水酸化物の複合堆積層が形成できた。
The electrolytic solution for the composite electrophoretic deposition of hydrotalcite (HT) powder and metal hydroxide in the second stage was prepared by suspending commercially available HT powder with a particle size of about 1 μm at 2 w/v% (weight/volume μme%) in a solvent of isopropanol:water = 40:1 (volume ratio) to which 0.002 mol/L magnesium nitrate and 0.0005 mol/L aluminum nitrate were added. The substrate AZ31 on which metal hydroxide was deposited in the first stage electrolytic deposition was inserted into the electrolytic solution as the working electrode and a stainless steel plate as the counter electrode. A constant voltage of 100 V was applied between the cathode and the counter electrode for 1 minute to perform electrophoretic deposition. The solution was then dried at 100 ° C. for 1 hour.
An electron microscope photograph of the prepared surface is shown in Figure 11. A metal hydroxide was precipitated on the substrate in an amount that did not show any polishing marks, and a composite of HT powder and metal hydroxide was deposited on top of it. A composite deposition layer of HT powder and metal hydroxide was formed on the substrate surface.
以上詳細に説明したように、本発明の層状複水酸化物を表面に有する金属板の製造方法によればマグネシウム合金およびアルミニウム合金において、高耐食性被膜の形成と、用途によっては高耐食性被膜に加えて塗装も容易に行えるので、これら軽合金を輸送機器や家電製品に用いる場合に、塩化物イオンを含む雨や海水の飛沫や人の汗に曝されても耐久性が高まる。 As explained in detail above, the method for producing a metal plate having a layered double hydroxide on the surface of the present invention makes it easy to form a highly corrosion-resistant coating on magnesium alloys and aluminum alloys, and depending on the application, paint can also be applied in addition to the highly corrosion-resistant coating. Therefore, when these light alloys are used in transportation equipment or home appliances, their durability is increased even when they are exposed to rain or seawater containing chloride ions or human sweat.
10:電解槽
12:基材(被処理金属基板、電極基板)
14:対極板
16a、16b:表面処理溶液(電解液)
18a、18b:堆積した金属水酸化物
20:スターラー
22:攪拌子
30:直流電源
36:関数発生器
40:LDH(層状複水酸化物)粉末
42:添加金属イオン
10: Electrolytic cell 12: Base material (metal substrate to be treated, electrode substrate)
14: Counter electrode plate 16a, 16b: Surface treatment solution (electrolyte)
18a, 18b: deposited metal hydroxide 20: stirrer 22: stirring bar 30: DC power supply 36: function generator 40: LDH (layered double hydroxide) powder 42: added metal ions
Claims (16)
前記第1の電解液と前記層状複水酸化物粉末からなる懸濁液に電極基板と第1の対極板を浸漬する工程であって、前記電極基板は被覆処理される金属板であり、
前記電極基板と前記第1の対極板との間に電場を印加することにより、前記電極基板上に前記層状複水酸化物粉末を電気泳動堆積させる工程と、
水を含有する第2の電解液に金属イオンを添加する工程と、
添加した前記金属イオンを含む前記第2の電解液に前記層状複水酸化物粉末の堆積した電極基板と第2の対極板を浸漬する工程と、
前記層状複水酸化物粉末の堆積した電極基板と前記第2の対極板との間に電場を印加することにより、前記層状複水酸化物粉末の堆積した電極基板上に前記金属イオンを水酸化物として電解析出させる工程を有する、
層状複水酸化物を表面に有する金属板の製造方法。 Dispersing a layered double hydroxide powder in a first electrolytic solution containing water;
a step of immersing an electrode substrate and a first counter electrode plate in a suspension containing the first electrolytic solution and the layered double hydroxide powder, the electrode substrate being a metal plate to be coated;
applying an electric field between the electrode substrate and the first counter electrode plate to electrophoretically deposit the layered double hydroxide powder onto the electrode substrate;
adding metal ions to a second electrolytic solution containing water;
immersing the electrode substrate on which the layered double hydroxide powder has been deposited and a second counter electrode in the second electrolytic solution containing the added metal ions;
applying an electric field between the electrode substrate on which the layered double hydroxide powder is deposited and the second counter electrode plate, thereby electrolytically depositing the metal ions as hydroxides on the electrode substrate on which the layered double hydroxide powder is deposited;
A method for producing a metal plate having a layered double hydroxide on its surface.
添加した前記金属イオンを含む前記第3の電解液に電極基板と第3の対極板を浸漬する工程であって、前記電極基板は被覆処理される金属板であり、
前記電極基板と前記第3の対極板との間に電場を印加することにより、前記電極基板上に前記金属イオンを水酸化物として電解析出させる工程と、
水を含有する第4の電解液中に層状複水酸化物粉末を分散させる工程と、
前記第4の電解液と前記層状複水酸化物粉末からなる懸濁液に前記金属イオンの水酸化物が電解析出した電極基板と第4の対極板を浸漬する工程と、
前記金属イオンの水酸化物が電解析出した電極基板と前記第4の対極板との間に電場を印加することにより、前記電極基板上に前記層状複水酸化物粉末を電気泳動堆積させる工程を有する、
層状複水酸化物を表面に有する金属板の製造方法。 adding metal ions to a third electrolytic solution containing water;
a step of immersing an electrode substrate and a third counter electrode plate in the third electrolytic solution containing the added metal ions, the electrode substrate being a metal plate to be coated;
applying an electric field between the electrode substrate and the third counter electrode plate to electrolytically deposit the metal ions as hydroxides on the electrode substrate;
dispersing a layered double hydroxide powder in a fourth electrolytic solution containing water;
a step of immersing an electrode substrate on which the hydroxide of the metal ion is electrolytically deposited and a fourth counter electrode plate in a suspension containing the fourth electrolytic solution and the layered double hydroxide powder;
a step of electrophoretically depositing the layered double hydroxide powder on the electrode substrate by applying an electric field between the electrode substrate on which the hydroxide of the metal ions is electrolytically deposited and the fourth counter electrode plate;
A method for producing a metal plate having a layered double hydroxide on its surface.
添加した前記金属イオンを含む前記第5の電解液と前記層状複水酸化物粉末からなる懸濁液に電極基板と第5の対極板を浸漬する工程であって、前記電極基板は被覆処理される金属板であり、
前記電極基板と前記第5の対極板との間に電場を印加することにより、前記電極基板上に前記金属イオンの水酸化物と前記層状複水酸化物粉末の複合体を電気泳動堆積させる工程と、
水を含有する第6の電解液に金属イオンを添加する工程と、
添加した前記金属イオンを含む前記第6の電解液に、前記金属イオンの水酸化物と前記層状複水酸化物粉末の複合体が堆積した電極基板と第6の対極板を浸漬する工程と、
前記電極基板と前記第6の対極板との間に電場を印加することにより、前記金属イオンの水酸化物と前記層状複水酸化物粉末の複合体が堆積した電極基板上に前記金属イオンを水酸化物として電解析出させる工程を有する、
層状複水酸化物を表面に有する金属板の製造方法。 a step of adding metal ions to a fifth electrolytic solution containing water and dispersing a layered double hydroxide powder in the fifth electrolytic solution, or a step of dispersing a layered double hydroxide powder in the fifth electrolytic solution containing water and adding metal ions to the fifth electrolytic solution;
a step of immersing an electrode substrate and a fifth counter electrode plate in a suspension composed of the fifth electrolytic solution containing the added metal ions and the layered double hydroxide powder, the electrode substrate being a metal plate to be coated;
applying an electric field between the electrode substrate and the fifth counter electrode plate to electrophoretically deposit a complex of the hydroxide of the metal ion and the layered double hydroxide powder on the electrode substrate;
adding metal ions to a sixth electrolytic solution containing water;
a step of immersing the electrode substrate on which the complex of the hydroxide of the metal ion and the layered double hydroxide powder is deposited and a sixth counter electrode plate in the sixth electrolytic solution containing the added metal ions;
applying an electric field between the electrode substrate and the sixth counter electrode plate to electrolytically deposit the metal ions as hydroxides on the electrode substrate on which a complex of the hydroxides of the metal ions and the layered double hydroxide powder has been deposited;
A method for producing a metal plate having a layered double hydroxide on its surface.
添加した前記金属イオンを含む前記第7の電解液に電極基板と第7の対極板を浸漬する工程であって、前記電極基板は被覆処理される金属板であり、
前記電極基板と前記第7の対極板との間に電場を印加することにより、前記電極基板上に前記金属イオンを水酸化物として電解析出させる工程と、
水を含有する第8の電解液に金属イオンを添加すると共に、前記第8の電解液中に層状複水酸化物粉末を分散させる工程、又は前記水を含有する第8の電解液に層状複水酸化物粉末を分散させると共に、前記第8の電解液中に金属イオンを添加する工程と、
添加した前記金属イオンを含む前記第8の電解液と前記層状複水酸化物粉末からなる懸濁液に前記金属イオンの水酸化物が電解析出した電極基板と第8の対極板を浸漬する工程と、
前記金属イオンの水酸化物が電解析出した電極基板と前記第8の対極板との間に電場を印加することにより、前記電極基板上に前記金属イオンの水酸化物と前記層状複水酸化物粉末の複合体を電気泳動堆積させる工程を有する、
層状複水酸化物を表面に有する金属板の製造方法。 adding metal ions to a seventh electrolyte solution containing water;
a step of immersing an electrode substrate and a seventh counter electrode plate in the seventh electrolytic solution containing the added metal ions, the electrode substrate being a metal plate to be coated;
applying an electric field between the electrode substrate and the seventh counter electrode plate to electrolytically deposit the metal ions as hydroxides on the electrode substrate;
a step of adding metal ions to an eighth electrolytic solution containing water and dispersing a layered double hydroxide powder in the eighth electrolytic solution, or a step of dispersing a layered double hydroxide powder in the eighth electrolytic solution containing water and adding metal ions to the eighth electrolytic solution;
a step of immersing an electrode substrate on which the hydroxide of the metal ion is electrolytically deposited and an eighth counter electrode plate in a suspension composed of the eighth electrolytic solution containing the added metal ion and the layered double hydroxide powder;
a step of electrophoretically depositing a complex of the hydroxide of the metal ion and the layered double hydroxide powder on the electrode substrate by applying an electric field between the electrode substrate on which the hydroxide of the metal ion is electrolytically deposited and the eighth counter electrode plate;
A method for producing a metal plate having a layered double hydroxide on its surface.
前記金属イオンを生成する金属塩は、硝酸塩、硫酸塩、炭酸塩、カルボン酸塩、リン酸塩又は塩化物である、
ことを特徴とする請求項1乃至10の何れか1項に記載の層状複水酸化物を表面に有する金属板の製造方法。 The metal ion is any one of Mg, Al, Zn, Mn, Fe, Co, Ni, Cu, Ca, Cr, and In,
The metal salt that generates the metal ion is a nitrate, sulfate, carbonate, carboxylate, phosphate or chloride.
A method for producing a metal plate having the layered double hydroxide according to any one of claims 1 to 10 on its surface.
M2+は、Mg(マグネシウム),Zn(亜鉛),Ca(カルシウム),Mn(マンガン),Pd(パラジウム),Sr(ストロンチウム),Fe(鉄),Co(コバルト),Ni(ニッケル),Cu(銅)の何れか1種類から選択される二価金属イオンであり、
M3+は、Al(アルミニウム),Bi(ビスマス),Ga(ガリウム),Ni,Mn,V(バナジウム),Ce(セリウム),La(ランタン),Cr(クロム),Fe(鉄),Co(コバルト),In(インジウム)の何れか1種類から選択される三価金属イオンであり、
前記Aは、NO3 -,CO3 2-,OH-,Cl-,SO4 2-,SiO4 4-,リン酸、クロム酸、過マンガン酸、バナジン酸、セレン酸、ホウ酸、フッ化物、カルボン酸の何れか1種類から選択されるn価(n=1、2、3、又は4)の陰イオンである、
請求項1乃至11の何れか1項に記載の層状複水酸化物を表面に有する金属板の製造方法。 The layered double hydroxide powder is represented by the general formula: [M 2+ (1-x) M 3+ x (OH) 2 ][A n- x/n · y H 2 O],
M2 + is a divalent metal ion selected from any one of Mg (magnesium), Zn (zinc), Ca (calcium), Mn (manganese), Pd (palladium), Sr (strontium), Fe (iron), Co (cobalt), Ni (nickel), and Cu (copper);
M3 + is a trivalent metal ion selected from any one of Al (aluminum), Bi (bismuth), Ga (gallium), Ni, Mn, V (vanadium), Ce (cerium), La (lanthanum), Cr (chromium), Fe (iron), Co (cobalt), and In (indium);
The A is an anion having a valence of n (n=1, 2, 3, or 4) selected from any one of NO 3 − , CO 3 2− , OH − , Cl − , SO 4 2− , SiO 4 4− , phosphoric acid, chromic acid, permanganic acid, vanadic acid, selenic acid, boric acid, fluoride, and carboxylic acid;
A method for producing a metal plate having the layered double hydroxide according to any one of claims 1 to 11 on its surface.
請求項3、4、7又は8に記載の層状複水酸化物を表面に有する金属板の製造方法。 the volume ratio of the layered double hydroxide powder to the metal hydroxide in the deposition layer formed by the step of electrophoretically depositing a complex of the hydroxide of the metal ion and the layered double hydroxide powder is layered double hydroxide powder:metal hydroxide=90:10 to 10:90;
A method for producing a metal plate having the layered double hydroxide according to claim 3, 4, 7 or 8 on its surface.
16. The method for producing a metal plate having a layered double hydroxide on a surface thereof according to claim 1, wherein the electric field applied to the electrode substrate is a constant voltage or a pulse voltage.
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