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JP7689935B2 - Thermally conductive silicone composition and cured product thereof - Google Patents
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JP7689935B2 - Thermally conductive silicone composition and cured product thereof - Google Patents

Thermally conductive silicone composition and cured product thereof Download PDF

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JP7689935B2
JP7689935B2 JP2022063110A JP2022063110A JP7689935B2 JP 7689935 B2 JP7689935 B2 JP 7689935B2 JP 2022063110 A JP2022063110 A JP 2022063110A JP 2022063110 A JP2022063110 A JP 2022063110A JP 7689935 B2 JP7689935 B2 JP 7689935B2
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俊晴 森村
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Shin Etsu Chemical Co Ltd
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Description

本発明は、熱伝導性シリコーン組成物及びその硬化物に関する。 The present invention relates to a thermally conductive silicone composition and its cured product.

近年の電子機器の高機能化、電子部品の小型・高集積化に伴い、電子機器や電子部品の発熱量は増大し、発熱密度が高くなる傾向にあり、対策として放熱性に優れた機器設計にすることや、熱伝導性に優れた材料を使用する必要がある。また、発熱部品から発生する熱をヒートシンク等の冷却部品に速やかに伝えるため、放熱グリースや放熱シートが使用されているが、放熱材料にも高い熱伝導性が求められている。
放熱材料の熱伝導性を高めるためには、例えば窒化アルミニウムや窒化ホウ素等の熱伝導率の高い熱伝導性充填材を使用することや、熱伝導性充填材を高充填化する方法があるが、熱伝導率の高い充填材はコストが高く、充填材の高充填化は組成物の粘度が高くなる等の問題があった。
In recent years, with the increasing sophistication of electronic devices and the miniaturization and high integration of electronic components, the amount of heat generated by electronic devices and components tends to increase, and the heat generation density tends to become higher, so as a countermeasure, it is necessary to design devices with excellent heat dissipation properties and use materials with excellent thermal conductivity. In addition, thermal dissipation greases and thermal dissipation sheets are used to quickly transfer heat generated by heat-generating components to cooling components such as heat sinks, but high thermal conductivity is also required for heat dissipation materials.
In order to increase the thermal conductivity of a heat dissipation material, there are methods, for example, using a thermally conductive filler with high thermal conductivity such as aluminum nitride or boron nitride, or increasing the loading level of the thermally conductive filler. However, there are problems in that a filler with high thermal conductivity is expensive, and increasing the loading level of the filler increases the viscosity of the composition.

この問題を解決するために、球状アルミナ粉のみを使用する方法もあるが、高熱伝導化するためには、不定形アルミナに比べ、大量に充填する必要があり、組成物の粘度が上昇し、加工性が悪化する。また、高熱伝導化のために粒子径の大きい球状アルミナ粉を使用する方法もあるが、粒子径が大きすぎると材料の撹拌時に反応釜や撹拌羽が削れたり、シート成型時の加工性が悪くなったり、成型したシートが脆くなる問題があった。
また、シリコーン硬化物中のアルミナ粉の充填量が高くなると、高温で長時間使用した時に、硬化物の硬度が顕著に低下する傾向があり、振動が強いモジュール等、用途によっては復元性が不足することで密着不良が発生し、経時で熱抵抗が上昇する問題があった。
To solve this problem, there is a method of using only spherical alumina powder, but in order to achieve high thermal conductivity, a large amount of alumina powder is required compared to amorphous alumina, which increases the viscosity of the composition and deteriorates its processability. In addition, there is a method of using spherical alumina powder with a large particle size to achieve high thermal conductivity, but if the particle size is too large, there are problems such as the reaction vessel or stirring blade being scraped when the material is stirred, the processability during sheet molding being poor, and the molded sheet becoming brittle.
Furthermore, when the amount of alumina powder filled in the silicone cured product is high, there is a tendency for the hardness of the cured product to decrease significantly when used for long periods of time at high temperatures. Depending on the application, such as in modules that are subject to strong vibrations, this can result in insufficient recovery, leading to poor adhesion and an increase in thermal resistance over time.

特許文献1には、球状溶融固化アルミナを含む耐熱性熱伝導シリコーン組成物が記載されている。
特許文献2には、環状構造中に2級のアミノ基を1個以上、かつケトン基を1個以上含む有機多環芳香族化合物を含む耐熱性シリコーン樹脂組成物が記載されている。
特許文献3には、粒径の異なる球状アルミナと不定形アルミナを含む熱伝導シリコーン組成物が記載されている。
Patent Document 1 describes a heat-resistant, thermally conductive silicone composition that contains spherical fused and solidified alumina.
Patent Document 2 describes a heat-resistant silicone resin composition that contains an organic polycyclic aromatic compound that contains one or more secondary amino groups and one or more ketone groups in a cyclic structure.
Patent Document 3 describes a thermally conductive silicone composition containing spherical alumina and amorphous alumina having different particle sizes.

特開2018-123200号公報JP 2018-123200 A 国際公開第2021/161580号International Publication No. 2021/161580 特開2021-176945号公報JP 2021-176945 A

本発明は、上記事情に鑑みなされたもので、絶縁性、熱伝導性、加工性、耐熱性に優れた熱伝導性シリコーン組成物及びその硬化物を提供することを目的とする。特に、高温で長時間使用しても硬度が低下しない熱伝導性シリコーン組成物及びその硬化物を提供することを目的とする。 The present invention has been made in consideration of the above circumstances, and aims to provide a thermally conductive silicone composition and a cured product thereof that are excellent in insulation, thermal conductivity, processability, and heat resistance. In particular, the present invention aims to provide a thermally conductive silicone composition and a cured product thereof that do not lose hardness even when used at high temperatures for long periods of time.

上記課題を解決するために、本発明では、熱伝導性シリコーン組成物であって、
(A)1分子中に2個以上のアルケニル基を有するオルガノポリシロキサン:100質量部、
(B)1分子中に2個以上のヒドロシリル基を有するオルガノハイドロジェンポリシロキサン:ヒドロシリル基のモル数が前記(A)成分由来のアルケニル基のモル数の0.1~5.0倍量となる量、
(C)下記(C-1)~(C-4)からなる熱伝導性充填材:4,300~5,800質量部、
(C-1)平均粒径が70μmを超えて135μm以下である球状アルミナフィラー:1,750~3,000質量部、
(C-2)平均粒径が8μmを超えて40μm以下である球状アルミナフィラー:750~2,000質量部、
(C-3)平均粒径が0.4μmを超えて4μm以下である不定形アルミナフィラー:750~1,500質量部、
(C-4)平均粒径が0.7μmを超えて4μm以下である球状アルミナフィラー:125~750質量部、
(D)白金族金属系硬化触媒:前記(A)成分に対して白金族金属元素質量換算で0.1~2,000ppm、
(E)付加反応制御剤:0.01~2.0質量部、
(F)酸化セリウム:7.5~25質量部、及び
(G)下記(G-1)及び(G-2)から選ばれる1種以上の表面処理剤:0.01~300質量部、
(G-1)下記一般式(1)で表されるアルコキシシラン化合物、
Si(OR4-a-b (1)
(式中、Rは独立に炭素原子数6~15のアルキル基であり、Rは独立に炭素原子数1~5のアルキル基、炭素原子数6~12のアリール基、及び炭素原子数7~12のアラルキル基から選ばれる基であり、Rは独立に炭素原子数1~6のアルキル基であり、aは1~3の整数、bは0~2の整数であり、但しa+bは1~3の整数である。)
(G-2)下記一般式(2)で表される分子鎖片末端がトリアルコキシシリル基で封鎖されたジメチルポリシロキサン、

Figure 0007689935000001
(式中、Rは独立に炭素原子数1~6のアルキル基であり、cは5~100の整数である。)
を含むものである熱伝導性シリコーン組成物を提供する。 In order to solve the above problems, the present invention provides a thermally conductive silicone composition, comprising:
(A) organopolysiloxane having two or more alkenyl groups in one molecule: 100 parts by mass,
(B) an organohydrogenpolysiloxane having two or more hydrosilyl groups per molecule: an amount such that the number of moles of hydrosilyl groups is 0.1 to 5.0 times the number of moles of alkenyl groups derived from component (A);
(C) a thermally conductive filler consisting of the following (C-1) to (C-4): 4,300 to 5,800 parts by mass,
(C-1) Spherical alumina filler having an average particle size of more than 70 μm and not more than 135 μm: 1,750 to 3,000 parts by mass,
(C-2) Spherical alumina filler having an average particle size of more than 8 μm and not more than 40 μm: 750 to 2,000 parts by mass,
(C-3) irregular alumina filler having an average particle size of more than 0.4 μm and not more than 4 μm: 750 to 1,500 parts by mass,
(C-4) Spherical alumina filler having an average particle size of more than 0.7 μm and not more than 4 μm: 125 to 750 parts by mass,
(D) a platinum group metal curing catalyst: 0.1 to 2,000 ppm by mass of platinum group metal element relative to the component (A);
(E) Addition reaction inhibitor: 0.01 to 2.0 parts by mass,
(F) cerium oxide: 7.5 to 25 parts by mass, and (G) one or more surface treatment agents selected from the following (G-1) and (G-2): 0.01 to 300 parts by mass,
(G-1) An alkoxysilane compound represented by the following general formula (1):
R 1 a R 2 b Si(OR 3 ) 4-ab (1)
(In the formula, R 1 is independently an alkyl group having 6 to 15 carbon atoms, R 2 is independently a group selected from an alkyl group having 1 to 5 carbon atoms, an aryl group having 6 to 12 carbon atoms, and an aralkyl group having 7 to 12 carbon atoms, R 3 is independently an alkyl group having 1 to 6 carbon atoms, a is an integer of 1 to 3, b is an integer of 0 to 2, and a+b is an integer of 1 to 3.)
(G-2) Dimethylpolysiloxane having one molecular chain end blocked with a trialkoxysilyl group, represented by the following general formula (2):
Figure 0007689935000001
(In the formula, R 4 is independently an alkyl group having 1 to 6 carbon atoms, and c is an integer of 5 to 100.)
The present invention provides a thermally conductive silicone composition comprising:

このような熱伝導性シリコーン組成物であれば、その硬化物が絶縁性、熱伝導性、加工性、耐熱性に優れたものとなり、特に、高温で長時間使用しても硬度が低下しない硬化物を与える熱伝導性シリコーン組成物となる。このような熱伝導性シリコーン組成物は、例えば電子機器内の発熱部品と放熱部品の間に設置される熱伝導性樹脂成形体として好適に用いられる。 Such a thermally conductive silicone composition will give a cured product with excellent insulation, thermal conductivity, processability, and heat resistance, and in particular will give a cured product whose hardness does not decrease even when used for long periods at high temperatures. Such a thermally conductive silicone composition is suitable for use as a thermally conductive resin molded body to be placed, for example, between heat-generating and heat-dissipating components in electronic devices.

また、本発明では、更に、(H)成分として、下記一般式(3)で表される23℃における動粘度が10~100,000mm/sのオルガノポリシロキサンを前記(A)成分の100質量部に対して、0.1~100質量部で含有するものであることが好ましい。

Figure 0007689935000002
(式中、Rは独立に炭素原子数1~6のアルキル基、炭素原子数6~12のアリール基、及び炭素原子数7~12のアラルキル基から選ばれる基であり、dは5~2,000の整数である。) In the present invention, it is preferable that the component (H) further contains an organopolysiloxane having a kinetic viscosity at 23°C of 10 to 100,000 mm2 /s, represented by the following general formula (3), in an amount of 0.1 to 100 parts by mass per 100 parts by mass of the component (A).
Figure 0007689935000002
(In the formula, R5 is independently a group selected from an alkyl group having 1 to 6 carbon atoms, an aryl group having 6 to 12 carbon atoms, and an aralkyl group having 7 to 12 carbon atoms, and d is an integer of 5 to 2,000.)

このような熱伝導シリコーン組成物であれば、柔軟性に優れ、得られる硬化物のオイルブリードが発生しづらくなる。 Such a thermally conductive silicone composition has excellent flexibility and is less likely to cause oil bleeding in the resulting cured product.

また、本発明では、23℃におけるフローテスタ粘度計で測定した前記熱伝導性シリコーン組成物の粘度が4,000Pa・s以下のものであることが好ましい。 In addition, in the present invention, it is preferable that the viscosity of the thermally conductive silicone composition measured with a flow tester viscometer at 23°C is 4,000 Pa·s or less.

このような熱伝導性シリコーン組成物であれば、成形性(加工性)に優れる。 Such a thermally conductive silicone composition has excellent moldability (processability).

また、本発明では、上記に記載の熱伝導性シリコーン組成物の硬化物である熱伝導性シリコーン硬化物を提供する。 The present invention also provides a thermally conductive silicone cured product, which is a cured product of the thermally conductive silicone composition described above.

このような熱伝導性シリコーン硬化物であれば、絶縁性、熱伝導性、加工性、耐熱性に優れたものとなり、例えば電子機器内の発熱部品と放熱部品の間に設置される熱伝導性樹脂成形体として好適に用いられる。 Such thermally conductive silicone cured products have excellent insulation, thermal conductivity, processability, and heat resistance, and are suitable for use, for example, as thermally conductive resin molded bodies placed between heat-generating and heat-dissipating components in electronic devices.

また、本発明では、前記熱伝導性シリコーン硬化物の形状がシート状のものであることが好ましい。 In the present invention, it is also preferable that the thermally conductive silicone cured product is in the form of a sheet.

このような熱伝導性シリコーン硬化物であれば、取り扱い性に優れる。 Such thermally conductive silicone cured products are easy to handle.

また、本発明では、前記熱伝導性シリコーン硬化物のアスカーC硬度計で測定した硬さにおいて、150℃×500時間エージング後の硬さが、エージング前の硬さに対して、-5ポイント以上、40ポイント以下のものであることが好ましい。 In addition, in the present invention, it is preferable that the hardness of the thermally conductive silicone cured product measured with an Asker C hardness tester after aging at 150°C for 500 hours is at least -5 points and at most 40 points lower than the hardness before aging.

このような熱伝導性シリコーン組成物の硬化物であれば、高温で長時間使用しても硬度の低下が小さいものとなる。 When this type of thermally conductive silicone composition is cured, the loss in hardness is minimal even when used at high temperatures for long periods of time.

また、本発明では、前記熱伝導性シリコーン硬化物のホットディスク法により測定した23℃における熱伝導率が、7.5W/m・K以上のものであることが好ましい。 In addition, in the present invention, it is preferable that the thermal conductivity of the thermally conductive silicone cured product at 23°C measured by the hot disk method is 7.5 W/m·K or more.

このような熱伝導性シリコーン硬化物であれば、熱伝導性に優れる。 Such thermally conductive silicone cured products have excellent thermal conductivity.

また、本発明では、前記熱伝導性シリコーン硬化物の1mm厚における絶縁破壊電圧が10kV/mm以上のものであることが好ましい。 In the present invention, it is also preferable that the thermally conductive silicone cured product has a dielectric breakdown voltage of 10 kV/mm or more at a thickness of 1 mm.

このような熱伝導性シリコーン硬化物であれば、使用時に安定的に絶縁を確保することができる。 This type of thermally conductive silicone cured material can ensure stable insulation during use.

以上のように、本発明の熱伝導性シリコーン組成物であれば、絶縁性、熱伝導性、加工性に優れた熱伝導性シリコーン組成物及びその硬化物を提供できる。また、高温保存時における硬度低下が抑えられ、7.5W/m・K以上の熱伝導率を有し、シート状に成型された熱伝導性シリコーン硬化物を提供することができる。 As described above, the thermally conductive silicone composition of the present invention can provide a thermally conductive silicone composition and its cured product that are excellent in insulating properties, thermal conductivity, and processability. It can also provide a thermally conductive silicone cured product that is molded into a sheet shape and that suppresses loss of hardness during storage at high temperatures and has a thermal conductivity of 7.5 W/m·K or more.

上述のように、絶縁性、熱伝導性、加工性、耐熱性に優れた熱伝導性シリコーン組成物及びその硬化物の開発が求められていた。 As mentioned above, there was a need to develop a thermally conductive silicone composition and its cured product that have excellent insulation properties, thermal conductivity, processability, and heat resistance.

本発明者らは、上記目的を達成するため鋭意検討を行った結果、平均粒径が8μmを超えて40μm以下の球状アルミナフィラーと、平均粒径が0.4μmを超えて4μm以下の不定形アルミナフィラーと、平均粒径が0.7μmを超えて4μm以下の球状アルミナフィラーと、平均粒径が70μmを超えて135μm以下の球状アルミナフィラーとを特定割合で混合し、酸化セリウムを併用することで上記問題を解決することができることを見出した。即ち、比表面積が小さい平均粒径が70μmを超えて135μm以下の球状アルミナフィラーを多く配合することで、効果的に熱伝導性を向上させることが可能であり、かつ粘度が低く加工性に優れた熱伝導性シリコーン組成物及びその硬化物を提供できることを見出した。
また、40μm以下の平均粒径を有する球状アルミナフィラー及び不定形アルミナフィラーを併用し、特に4μm以下の粒径では不定形アルミナフィラーと球状アルミナフィラーを併用することにより、熱伝導性シリコーン組成物の流動性が向上し、加工性が改善する。更に5μm以上の粒子には球状アルミナフィラーを使用するため、反応釜や撹拌羽の磨耗が抑えられ、絶縁性が向上することを見出した。
つまり、粒径が小さい球状アルミナフィラーと、大粒径球状アルミナフィラーがお互いの欠点を補い合うことで、上記目的を達成し得る熱伝導性シリコーン組成物及び硬化物を与えることを見出した。
また、上記熱伝導性シリコーン組成物に酸化セリウムを添加することにより、高温保存時における硬化物の硬度低下を抑制できることを見出し、本発明をなすに至った。
As a result of intensive research conducted by the present inventors to achieve the above object, it was found that the above problem can be solved by mixing spherical alumina filler having an average particle size of more than 8 μm and not more than 40 μm, amorphous alumina filler having an average particle size of more than 0.4 μm and not more than 4 μm, spherical alumina filler having an average particle size of more than 0.7 μm and not more than 4 μm, and spherical alumina filler having an average particle size of more than 70 μm and not more than 135 μm in a specific ratio, and using cerium oxide in combination. In other words, it was found that by blending a large amount of spherical alumina filler having an average particle size of more than 70 μm and not more than 135 μm, which has a small specific surface area, it is possible to effectively improve thermal conductivity, and to provide a thermally conductive silicone composition and its cured product that have low viscosity and excellent processability.
In addition, by using a combination of spherical alumina filler and amorphous alumina filler having an average particle size of 40 μm or less, and particularly by using a combination of amorphous alumina filler and spherical alumina filler with a particle size of 4 μm or less, the flowability of the thermally conductive silicone composition is improved, improving processability.Furthermore, by using spherical alumina filler for particles of 5 μm or more, it was found that wear on the reaction vessel and stirring blades is suppressed and insulation is improved.
In other words, the inventors have discovered that small particle size spherical alumina filler and large particle size spherical alumina filler complement each other's shortcomings to provide a thermally conductive silicone composition and cured product that are capable of achieving the above-mentioned objectives.
The inventors also discovered that adding cerium oxide to the above-mentioned thermally conductive silicone composition makes it possible to inhibit the decrease in hardness of the cured product during storage at high temperatures, which led to the creation of the present invention.

即ち、本発明は、熱伝導性シリコーン組成物であって、
(A)1分子中に2個以上のアルケニル基を有するオルガノポリシロキサン:100質量部、
(B)1分子中に2個以上のヒドロシリル基を有するオルガノハイドロジェンポリシロキサン:ヒドロシリル基のモル数が前記(A)成分由来のアルケニル基のモル数の0.1~5.0倍量となる量、
(C)下記(C-1)~(C-4)からなる熱伝導性充填材:4,300~5,800質量部、
(C-1)平均粒径が70μmを超えて135μm以下である球状アルミナフィラー:1,750~3,000質量部、
(C-2)平均粒径が8μmを超えて40μm以下である球状アルミナフィラー:750~2,000質量部、
(C-3)平均粒径が0.4μmを超えて4μm以下である不定形アルミナフィラー:750~1,500質量部、
(C-4)平均粒径が0.7μmを超えて4μm以下である球状アルミナフィラー:125~750質量部、
(D)白金族金属系硬化触媒:前記(A)成分に対して白金族金属元素質量換算で0.1~2,000ppm、
(E)付加反応制御剤:0.01~2.0質量部、
(F)酸化セリウム:7.5~25質量部、及び
(G)下記(G-1)及び(G-2)から選ばれる1種以上の表面処理剤:0.01~300質量部、
(G-1)下記一般式(1)で表されるアルコキシシラン化合物、
Si(OR4-a-b (1)
(式中、Rは独立に炭素原子数6~15のアルキル基であり、Rは独立に炭素原子数1~5のアルキル基、炭素原子数6~12のアリール基、及び炭素原子数7~12のアラルキル基から選ばれる基であり、Rは独立に炭素原子数1~6のアルキル基であり、aは1~3の整数、bは0~2の整数であり、但しa+bは1~3の整数である。)
(G-2)下記一般式(2)で表される分子鎖片末端がトリアルコキシシリル基で封鎖されたジメチルポリシロキサン、

Figure 0007689935000003
(式中、Rは独立に炭素原子数1~6のアルキル基であり、cは5~100の整数である。)
を含むものである熱伝導性シリコーン組成物である。 That is, the present invention provides a thermally conductive silicone composition,
(A) organopolysiloxane having two or more alkenyl groups in one molecule: 100 parts by mass,
(B) an organohydrogenpolysiloxane having two or more hydrosilyl groups per molecule: an amount such that the number of moles of hydrosilyl groups is 0.1 to 5.0 times the number of moles of alkenyl groups derived from component (A);
(C) a thermally conductive filler consisting of the following (C-1) to (C-4): 4,300 to 5,800 parts by mass,
(C-1) Spherical alumina filler having an average particle size of more than 70 μm and not more than 135 μm: 1,750 to 3,000 parts by mass,
(C-2) Spherical alumina filler having an average particle size of more than 8 μm and not more than 40 μm: 750 to 2,000 parts by mass,
(C-3) irregular alumina filler having an average particle size of more than 0.4 μm and not more than 4 μm: 750 to 1,500 parts by mass,
(C-4) Spherical alumina filler having an average particle size of more than 0.7 μm and not more than 4 μm: 125 to 750 parts by mass,
(D) a platinum group metal curing catalyst: 0.1 to 2,000 ppm by mass of platinum group metal element relative to the component (A);
(E) Addition reaction inhibitor: 0.01 to 2.0 parts by mass,
(F) cerium oxide: 7.5 to 25 parts by mass, and (G) one or more surface treatment agents selected from the following (G-1) and (G-2): 0.01 to 300 parts by mass,
(G-1) An alkoxysilane compound represented by the following general formula (1):
R 1 a R 2 b Si(OR 3 ) 4-ab (1)
(In the formula, R 1 is independently an alkyl group having 6 to 15 carbon atoms, R 2 is independently a group selected from an alkyl group having 1 to 5 carbon atoms, an aryl group having 6 to 12 carbon atoms, and an aralkyl group having 7 to 12 carbon atoms, R 3 is independently an alkyl group having 1 to 6 carbon atoms, a is an integer of 1 to 3, b is an integer of 0 to 2, and a+b is an integer of 1 to 3.)
(G-2) Dimethylpolysiloxane having one molecular chain end blocked with a trialkoxysilyl group, represented by the following general formula (2):
Figure 0007689935000003
(In the formula, R 4 is independently an alkyl group having 1 to 6 carbon atoms, and c is an integer of 5 to 100.)
The thermally conductive silicone composition comprises:

以下、本発明について詳細に説明するが、本発明はこれらに限定されるものではない。 The present invention is described in detail below, but is not limited to these.

[熱伝導性シリコーン組成物]
本発明の熱伝導性シリコーン組成物は、
(A)1分子中に2個以上のアルケニル基を有するオルガノポリシロキサン、
(B)1分子中に2個以上のヒドロシリル基を有するオルガノハイドロジェンポリシロキサン、
(C)下記(C-1)~(C-4)からなる熱伝導性充填材、
(C-1)平均粒径が70μmを超えて135μm以下である球状アルミナフィラー、
(C-2)平均粒径が8μmを超えて40μm以下である球状アルミナフィラー、
(C-3)平均粒径が0.4μmを超えて4μm以下である不定形アルミナフィラー、
(C-4)平均粒径が0.7μmを超えて4μm以下である球状アルミナフィラー、
(D)白金族金属系硬化触媒、
(E)付加反応制御剤、
(F)酸化セリウム、
(G)表面処理剤
を必須成分として含有する。以下、各成分について詳述する。
[Thermal conductive silicone composition]
The thermally conductive silicone composition of the present invention comprises:
(A) an organopolysiloxane having two or more alkenyl groups in each molecule;
(B) an organohydrogenpolysiloxane having two or more hydrosilyl groups in one molecule;
(C) a thermally conductive filler consisting of the following (C-1) to (C-4):
(C-1) A spherical alumina filler having an average particle size of more than 70 μm and not more than 135 μm;
(C-2) Spherical alumina filler having an average particle size of more than 8 μm and not more than 40 μm;
(C-3) irregular alumina filler having an average particle size of more than 0.4 μm and not more than 4 μm;
(C-4) Spherical alumina filler having an average particle size of more than 0.7 μm and not more than 4 μm;
(D) platinum group metal curing catalyst;
(E) an addition reaction regulator,
(F) cerium oxide,
(G) A surface treatment agent is contained as an essential component. Each component will be described in detail below.

[(A)アルケニル基含有オルガノポリシロキサン]
(A)成分であるアルケニル基含有オルガノポリシロキサンは、ケイ素原子に結合したアルケニル基を1分子中に2個以上有するオルガノポリシロキサン、即ち1分子中に2個以上のアルケニル基を有するオルガノポリシロキサンであり、本発明の熱伝導性シリコーン組成物の主剤となるものである。通常は主鎖部分が基本的にジオルガノシロキサン単位の繰り返しからなるのが一般的であるが、これは分子構造の一部に分枝状の構造を含んだものであってもよく、また環状体であってもよいが、得られる熱伝導性シリコーン硬化物の機械的強度等、物性の点から直鎖状のジオルガノポリシロキサンが好ましい。
[(A) Alkenyl-containing organopolysiloxane]
The alkenyl-containing organopolysiloxane, which is component (A), is an organopolysiloxane having two or more alkenyl groups bonded to silicon atoms in one molecule, that is, an organopolysiloxane having two or more alkenyl groups in one molecule, and is the main component of the thermally conductive silicone composition of the present invention.Normally, the main chain part is generally basically composed of repetitions of diorganosiloxane units, but this may also include a branched structure in a part of the molecular structure, or may also be a cyclic body, but from the viewpoint of physical properties such as mechanical strength of the obtained thermally conductive silicone cured product, linear diorganopolysiloxane is preferred.

上記アルケニル基としては、例えば、ビニル基、アリル基、プロペニル基、イソプロペニル基、ブテニル基、ヘキセニル基、シクロヘキセニル基等の炭素原子数が2~8のものが挙げられ、中でもビニル基、アリル基等の低級アルケニル基が好ましく、特に好ましくはビニル基である。なお、アルケニル基は、1分子中に2個以上存在することを特徴とし、好ましくは2~6個であり、より好ましくは2~3個である。また、得られる熱伝導性シリコーン硬化物の柔軟性がよいものとするためには、分子鎖末端のケイ素原子にのみ結合して存在することが最も好ましい。 Examples of the alkenyl group include those having 2 to 8 carbon atoms, such as vinyl, allyl, propenyl, isopropenyl, butenyl, hexenyl, and cyclohexenyl groups. Of these, lower alkenyl groups such as vinyl and allyl groups are preferred, with vinyl being particularly preferred. The alkenyl group is characterized by the presence of two or more alkenyl groups in one molecule, preferably 2 to 6, and more preferably 2 to 3. In order to ensure good flexibility in the resulting thermally conductive silicone cured product, it is most preferred that they are present bonded only to silicon atoms at the ends of the molecular chain.

ケイ素原子に結合したアルケニル基以外の官能基としては、炭素原子数が1~10、好ましくは炭素原子数が1~6の1価炭化水素基が挙げられる。例えば、メチル基、エチル基、プロピル基、イソプロピル基、ブチル基、イソブチル基、tert-ブチル基、ペンチル基、ネオペンチル基、ヘキシル基、ヘプチル基、オクチル基、ノニル基、デシル基、ドデシル基等のアルキル基、シクロペンチル基、シクロヘキシル基、シクロヘプチル基等のシクロアルキル基、フェニル基、トリル基、キシリル基、ナフチル基、ビフェニリル基等のアリール基、ベンジル基、フェニルエチル基、フェニルプロピル基、メチルベンジル基等のアラルキル基等が挙げられる。中でも、メチル基、エチル基、プロピル基、及びフェニル基が好適に用いられる。また、ケイ素原子に結合したアルケニル基以外の官能基は全てが同一であっても異なっていてもよい。 Examples of functional groups other than the alkenyl group bonded to the silicon atom include monovalent hydrocarbon groups having 1 to 10 carbon atoms, preferably 1 to 6 carbon atoms. Examples include alkyl groups such as methyl, ethyl, propyl, isopropyl, butyl, isobutyl, tert-butyl, pentyl, neopentyl, hexyl, heptyl, octyl, nonyl, decyl, and dodecyl groups; cycloalkyl groups such as cyclopentyl, cyclohexyl, and cycloheptyl groups; aryl groups such as phenyl, tolyl, xylyl, naphthyl, and biphenylyl groups; and aralkyl groups such as benzyl, phenylethyl, phenylpropyl, and methylbenzyl groups. Among these, methyl, ethyl, propyl, and phenyl groups are preferably used. In addition, the functional groups other than the alkenyl groups bonded to the silicon atom may all be the same or different.

このオルガノポリシロキサンの23℃における動粘度は、通常、10~100,000mm/s、特に好ましくは500~50,000mm/sの範囲である。前記動粘度が10mm/s以上であれば、得られる熱伝導性シリコーン組成物の保存安定性が良くなり、また100,000mm/s以下であれば、得られる熱伝導性シリコーン組成物の伸展性が良くなる。なお、本明細書において、動粘度はJIS Z 8803:2011記載の方法でキャノン-フェンスケ粘度計を用いて23℃で測定した場合の値である。 The kinetic viscosity of this organopolysiloxane at 23°C is typically in the range of 10 to 100,000 mm 2 /s, and particularly preferably 500 to 50,000 mm 2 /s. If the kinetic viscosity is 10 mm 2 /s or more, the storage stability of the resulting thermally conductive silicone composition will be good, and if it is 100,000 mm 2 /s or less, the extensibility of the resulting thermally conductive silicone composition will be good. In this specification, the kinetic viscosity is the value measured at 23°C using a Cannon-Fenske viscometer according to the method described in JIS Z 8803:2011.

この(A)成分のオルガノポリシロキサンは、1種単独でも、動粘度が異なる2種以上を組み合わせて用いてもよい。 The organopolysiloxane of component (A) may be used alone or in combination of two or more types with different kinetic viscosities.

[(B)オルガノハイドロジェンポリシロキサン]
(B)成分のオルガノハイドロジェンポリシロキサンは、1分子中に2個以上、好ましくは2~100個のヒドロシリル基(ケイ素原子に直接結合する水素原子)を有するオルガノハイドロジェンポリシロキサンであり、(A)成分の架橋剤として作用する成分である。即ち、(B)成分中のヒドロシリル基と(A)成分中のアルケニル基とが、後述する(D)成分の白金族金属系硬化触媒により促進されるヒドロシリル化反応により付加して、架橋構造を有する3次元網目構造を与える。なお、ヒドロシリル基の数が1分子中に2個未満の場合、硬化しない。
[(B) Organohydrogenpolysiloxane]
The organohydrogenpolysiloxane of component (B) is an organohydrogenpolysiloxane having at least two, preferably 2 to 100, hydrosilyl groups (hydrogen atoms directly bonded to silicon atoms) in one molecule, and acts as a crosslinking agent for component (A). That is, the hydrosilyl groups in component (B) and the alkenyl groups in component (A) are added by a hydrosilylation reaction promoted by the platinum group metal curing catalyst of component (D) described below, to give a three-dimensional network structure having a crosslinked structure. Note that if the number of hydrosilyl groups in one molecule is less than two, the composition will not cure.

(B)成分のオルガノハイドロジェンポリシロキサンとしては、下記平均構造式(4)で示されるものが用いられるが、これに限定されるものではない。

Figure 0007689935000004
(式中、Rは独立に水素原子、又は炭素数1~12のアルキル基、炭素数6~12のアリール基、及び炭素数7~12のアラルキル基から選ばれる1価炭化水素基である。ただし、1分子中の2個以上、好ましくは2~10個のRは水素原子である。また、eは1以上の整数、好ましくは10~200の整数である。) The organohydrogenpolysiloxane of component (B) is preferably one represented by the average structural formula (4) below, but is not limited to this.
Figure 0007689935000004
(In the formula, R 6 is independently a hydrogen atom or a monovalent hydrocarbon group selected from an alkyl group having 1 to 12 carbon atoms, an aryl group having 6 to 12 carbon atoms, and an aralkyl group having 7 to 12 carbon atoms. However, at least two, preferably at least two and at most ten, R 6s in one molecule are hydrogen atoms. Also, e is an integer of 1 or more, preferably an integer of 10 to 200.)

式(4)中、Rは独立に水素原子、又は炭素数1~12のアルキル基、炭素数6~12のアリール基、及び炭素数7~12のアラルキル基から選ばれる1価炭化水素基である。ただし、1分子中の2個以上、好ましくは2~10個のRは水素原子である。Rの水素原子以外の1価炭化水素基としては、例えば、メチル基、エチル基、プロピル基、イソプロピル基、ブチル基、イソブチル基、tert-ブチル基、ペンチル基、ネオペンチル基、ヘキシル基、ヘプチル基、オクチル基、ノニル基、デシル基、ドデシル基等のアルキル基、シクロペンチル基、シクロヘキシル基、シクロヘプチル基等のシクロアルキル基、フェニル基、トリル基、キシリル基、ナフチル基、ビフェニリル基等のアリール基、ベンジル基、フェニルエチル基、フェニルプロピル基、メチルベンジル基等のアラルキル基が挙げられる。これらの1価炭化水素基の中で、好ましくは炭素原子数が1~10、特に好ましくは炭素原子数が1~6のものであり、中でも、好ましくはメチル基、エチル基、プロピル基等の炭素原子数1~3のアルキル基、及びフェニル基が好適に用いられる。また、eは1以上の整数、好ましくは10~200の整数である。 In formula (4), R 6 is independently a hydrogen atom or a monovalent hydrocarbon group selected from an alkyl group having 1 to 12 carbon atoms, an aryl group having 6 to 12 carbon atoms, and an aralkyl group having 7 to 12 carbon atoms. However, at least two, preferably 2 to 10, R 6s in one molecule are hydrogen atoms. Examples of the monovalent hydrocarbon group other than a hydrogen atom of R 6 include alkyl groups such as methyl, ethyl, propyl, isopropyl, butyl, isobutyl, tert-butyl, pentyl, neopentyl, hexyl, heptyl, octyl, nonyl, decyl, and dodecyl, cycloalkyl groups such as cyclopentyl, cyclohexyl, and cycloheptyl, aryl groups such as phenyl, tolyl, xylyl, naphthyl, and biphenylyl, and aralkyl groups such as benzyl, phenylethyl, phenylpropyl, and methylbenzyl. Among these monovalent hydrocarbon groups, those having 1 to 10 carbon atoms are preferred, and those having 1 to 6 carbon atoms are particularly preferred, and among these, alkyl groups having 1 to 3 carbon atoms, such as methyl, ethyl and propyl groups, and phenyl groups are preferably used. Furthermore, e is an integer of 1 or more, preferably an integer of 10 to 200.

(B)成分の添加量は、(B)成分由来のヒドロシリル基が(A)成分由来のアルケニル基1モルに対して0.1~5.0モルとなる量、即ちヒドロシリル基のモル数が前記(A)成分由来のアルケニル基のモル数の0.1~5.0倍量となる量であることを特徴とする。好ましくは、0.3~2.0モルとなる量、更に好ましくは0.5~1.0モルとなる量である。(B)成分由来のヒドロシリル基の量が(A)成分由来のアルケニル基1モルに対して0.1モル未満であると硬化しない、又は熱伝導性シリコーン硬化物の強度が不十分で成形体としての形状を保持できず取り扱えない場合がある。また5.0モルを超えると熱伝導性シリコーン硬化物の柔軟性がなくなり、熱伝導性シリコーン硬化物が脆くなる。 The amount of component (B) added is such that the hydrosilyl groups derived from component (B) are 0.1 to 5.0 moles per mole of alkenyl groups derived from component (A), i.e., the number of moles of hydrosilyl groups is 0.1 to 5.0 times the number of moles of alkenyl groups derived from component (A). Preferably, the amount is 0.3 to 2.0 moles, more preferably 0.5 to 1.0 moles. If the amount of hydrosilyl groups derived from component (B) is less than 0.1 mole per mole of alkenyl groups derived from component (A), the product will not cure, or the strength of the heat-conductive silicone cured product may be insufficient to maintain its shape as a molded product and make it difficult to handle. If the amount exceeds 5.0 moles, the heat-conductive silicone cured product will lose its flexibility and become brittle.

[(C)熱伝導性充填材]
(C)成分である熱伝導性充填材は、下記(C-1)~(C-4)成分からなるものである。
(C-1)平均粒径が70μmを超えて135μm以下である球状アルミナフィラー、
(C-2)平均粒径が8μmを超えて40μm以下である球状アルミナフィラー、
(C-3)平均粒径が0.4μmを超えて4μm以下である不定形アルミナフィラー、
(C-4)平均粒径が0.7μmを超えて4μm以下である球状アルミナフィラー。
なお、本発明において、上記平均粒径は、日機装(株)製の粒度分析計であるマイクロトラックMT3300EXにより、レーザ回折・散乱法にて測定した体積基準の累積平均粒径(メディアン径)の値である。
[(C) Thermally conductive filler]
The thermally conductive filler, which is component (C), is composed of the following components (C-1) to (C-4).
(C-1) A spherical alumina filler having an average particle size of more than 70 μm and not more than 135 μm;
(C-2) Spherical alumina filler having an average particle size of more than 8 μm and not more than 40 μm;
(C-3) irregular alumina filler having an average particle size of more than 0.4 μm and not more than 4 μm;
(C-4) Spherical alumina filler having an average particle size of more than 0.7 μm and not more than 4 μm.
In the present invention, the average particle size is a volume-based cumulative average particle size (median diameter) measured by a laser diffraction/scattering method using a particle size analyzer, Microtrac MT3300EX, manufactured by Nikkiso Co., Ltd.

(C-1)成分の球状アルミナフィラーは、熱伝導率を優位に向上させることができる。球状アルミナの平均粒径は70μmを超えて135μm以下であり、70μmを超えて120μm以下であることが好ましく、さらに70μmを超えて100μm以下であることがより好ましい。平均粒径が70μm以下であると、熱伝導性を向上させる効果が低くなり、また、熱伝導性シリコーン組成物の粘度が上昇し、加工性が悪くなる。また、平均粒径が135μmより大きいと、反応釜や撹拌羽根の磨耗が顕著となり、熱伝導性シリコーン組成物の絶縁性が低下する懸念がある。さらに、プレス成形時に球状アルミナフィラーと樹脂の分離が発生し、シート端部がフィラーリッチ部となり脆化してしまう問題があった。この場合、シート成形における材料収率が大きく低下してしまう。(C-1)成分の球状アルミナフィラーとしては1種又は2種以上を複合して用いてもよい。2種以上を複合して用いる場合は、それぞれ上記平均粒径の範囲を満たせばよい。 The spherical alumina filler of the component (C-1) can significantly improve the thermal conductivity. The average particle size of the spherical alumina is more than 70 μm and not more than 135 μm, preferably more than 70 μm and not more than 120 μm, and more preferably more than 70 μm and not more than 100 μm. If the average particle size is 70 μm or less, the effect of improving the thermal conductivity is reduced, and the viscosity of the thermally conductive silicone composition increases, resulting in poor processability. If the average particle size is greater than 135 μm, wear of the reaction vessel and stirring blades becomes significant, and there is a concern that the insulation properties of the thermally conductive silicone composition will decrease. Furthermore, there is a problem that the spherical alumina filler and resin separate during press molding, causing the sheet ends to become filler-rich and embrittled. In this case, the material yield in sheet molding will be significantly reduced. As the spherical alumina filler of the component (C-1), one type or two or more types may be used in combination. When two or more types are used in combination, it is sufficient that each satisfies the above average particle size range.

(C-2)成分の球状アルミナフィラーは、熱伝導性シリコーン組成物の熱伝導率を向上させるとともに、後述する(C-3)の不定形アルミナフィラーと反応釜や撹拌羽根の接触を抑制し、磨耗を抑えるバリア効果を提供する。平均粒径は8μmを超えて40μm以下であり、10~40μmであることが好ましい。平均粒径が8μm以下であると、バリア効果が低下し、不定形アルミナフィラーによる反応釜や撹拌羽根の磨耗が顕著となる。 The spherical alumina filler of component (C-2) improves the thermal conductivity of the thermally conductive silicone composition, and also provides a barrier effect that prevents contact between the amorphous alumina filler (C-3) described below and the reaction kettle or stirring blades, thereby reducing wear. The average particle size is greater than 8 μm and not more than 40 μm, and is preferably 10 to 40 μm. If the average particle size is 8 μm or less, the barrier effect decreases, and wear of the reaction kettle and stirring blades due to the amorphous alumina filler becomes noticeable.

(C-3)成分の不定形アルミナフィラーは、熱伝導性シリコーン組成物の熱伝導率を向上させる役割も担うが、その主な役割は熱伝導性シリコーン組成物の粘度調整、滑らかさ向上、充填性向上である。(C-3)成分の平均粒径は0.4μmを超えて4μm以下であり、0.6~3μmであることが、上記した特性発現のためにより好ましい。 The amorphous alumina filler of component (C-3) also plays a role in improving the thermal conductivity of the thermally conductive silicone composition, but its main role is to adjust the viscosity of the thermally conductive silicone composition, improve smoothness, and improve filling properties. The average particle size of component (C-3) is more than 0.4 μm and not more than 4 μm, and it is more preferable for it to be 0.6 to 3 μm in order to express the above-mentioned characteristics.

(C-4)成分の球状アルミナフィラーは、熱伝導性シリコーン組成物の熱伝導率を向上させる役割も担うが、その主な役割は熱伝導性シリコーン組成物の粘度調整、滑らかさ向上、充填性向上である。(C-4)成分の平均粒径は0.7μmを超えて4μm以下であり、0.7μmを超えて3μm以下であることが、上記した特性発現のためにより好ましい。 The spherical alumina filler of component (C-4) also plays a role in improving the thermal conductivity of the thermally conductive silicone composition, but its main role is to adjust the viscosity of the thermally conductive silicone composition, improve smoothness, and improve filling properties. The average particle size of component (C-4) is more than 0.7 μm and not more than 4 μm, and more preferably more than 0.7 μm and not more than 3 μm in order to express the above-mentioned characteristics.

(C-1)成分の配合量は、(A)成分100質量部に対して1,750~3,000質量部であり、好ましくは1,875~2,500質量部である。少なすぎると熱伝導率の向上が困難であり、多すぎると反応釜や撹拌羽根の磨耗が顕著となり、熱伝導性シリコーン組成物の絶縁性が低下する。 The amount of component (C-1) to be blended is 1,750 to 3,000 parts by mass, and preferably 1,875 to 2,500 parts by mass, per 100 parts by mass of component (A). If the amount is too small, it is difficult to improve the thermal conductivity, and if the amount is too large, wear of the reaction kettle and stirring blades becomes significant, and the insulating properties of the thermally conductive silicone composition decrease.

(C-2)成分の配合量は、(A)成分100質量部に対して750~2,000質量部であり、好ましくは1,000~1,600質量部である。少なすぎると熱伝導率の向上が困難であり、多すぎると熱伝導性シリコーン組成物の流動性が失われ、成形性が損なわれる。 The amount of component (C-2) to be blended is 750 to 2,000 parts by mass, and preferably 1,000 to 1,600 parts by mass, per 100 parts by mass of component (A). If the amount is too small, it is difficult to improve the thermal conductivity, and if the amount is too large, the thermally conductive silicone composition loses its fluidity and its moldability is impaired.

(C-3)成分の配合量は、(A)成分100質量部に対して750~1,500質量部であり、好ましくは900~1,250質量部である。少なすぎると熱伝導率の向上が困難であり、多すぎると熱伝導性シリコーン組成物の流動性が失われ、成形性が損なわれる。 The amount of component (C-3) to be blended is 750 to 1,500 parts by mass, and preferably 900 to 1,250 parts by mass, per 100 parts by mass of component (A). If the amount is too small, it is difficult to improve the thermal conductivity, and if the amount is too large, the thermally conductive silicone composition loses its fluidity and its moldability is impaired.

(C-4)成分の配合量は、(A)成分100質量部に対して125~750質量部であり、好ましくは125~375質量部である。少なすぎると熱伝導率の向上が困難であり、多すぎると熱伝導性シリコーン組成物の流動性が失われ、成形性が損なわれる。 The amount of component (C-4) to be blended is 125 to 750 parts by mass, and preferably 125 to 375 parts by mass, per 100 parts by mass of component (A). If the amount is too small, it is difficult to improve the thermal conductivity, and if the amount is too large, the thermally conductive silicone composition loses its fluidity and its moldability is impaired.

更に、(C)成分の配合量(即ち、上記(C-1)~(C-4)成分の合計配合量)は、(A)成分100質量部に対して4,300~5,800質量部であることが必要であり、好ましくは4,500~5,200質量部である。この配合量が4,300質量部未満の場合には、得られる熱伝導性シリコーン組成物の熱伝導率が悪くなる。5,800質量部を超える場合には、得られる熱伝導性シリコーン組成物の流動性が失われ、成形性が損なわれる。 Furthermore, the blending amount of component (C) (i.e. the total blending amount of components (C-1) to (C-4) above) must be 4,300 to 5,800 parts by mass, and preferably 4,500 to 5,200 parts by mass, per 100 parts by mass of component (A). If this blending amount is less than 4,300 parts by mass, the thermal conductivity of the resulting thermally conductive silicone composition will deteriorate. If it exceeds 5,800 parts by mass, the resulting thermally conductive silicone composition will lose its fluidity and its moldability will be impaired.

上記配合割合で(C)成分を用いることで、上記した本発明の効果がより有利にかつ確実に達成できる。 By using component (C) in the above blending ratio, the effects of the present invention described above can be achieved more advantageously and reliably.

[(D)白金族金属系硬化触媒]
(D)成分の白金族金属系硬化触媒は、(A)成分由来のアルケニル基と、(B)成分由来のヒドロシリル基の付加反応を促進するための触媒であり、ヒドロシリル化反応に用いられる触媒として周知の触媒が挙げられる。その具体例としては、例えば、白金(白金黒を含む)、ロジウム、パラジウム等の白金族金属単体、HPtCl・nHO、HPtCl・nHO、NaHPtCl・nHO、KaHPtCl・nHO、NaPtCl・nHO、KPtCl・nHO、PtCl・nHO、PtCl、NaHPtCl・nHO(但し、式中、nは0~6の整数であり、好ましくは0又は6である。)等の塩化白金、塩化白金酸及び塩化白金酸塩、アルコール変性塩化白金酸(米国特許第3,220,972号明細書参照)、塩化白金酸とオレフィンとのコンプレックス(米国特許第3,159,601号明細書、同第3,159,662号明細書、同第3,775,452号明細書参照)、白金黒、パラジウム等の白金族金属をアルミナ、シリカ、カーボン等の担体に担持させたもの、ロジウム-オレフィンコンプレックス、クロロトリス(トリフェニルフォスフィン)ロジウム(ウィルキンソン触媒)、塩化白金、塩化白金酸又は塩化白金酸塩とビニル基含有シロキサン、特にビニル基含有環状シロキサンとのコンプレックス等が挙げられる。
[(D) Platinum group metal curing catalyst]
The platinum group metal curing catalyst of component (D) is a catalyst for promoting the addition reaction of the alkenyl group derived from component (A) and the hydrosilyl group derived from component (B), and examples of catalysts well known for use in hydrosilylation reactions include platinum group metals such as platinum (including platinum black), rhodium, and palladium, H 2 PtCl 4.nH 2 O, H 2 PtCl 6.nH 2 O, NaHPtCl 6.nH 2 O, KaHPtCl 6.nH 2 O, Na 2 PtCl 6.nH 2 O, K 2 PtCl 4.nH 2 O, PtCl 4.nH 2 O, PtCl 2 , and Na 2 HPtCl 4.nH 2 O. O (wherein, n is an integer of 0 to 6, preferably 0 or 6), chloroplatinic acid and chloroplatinate salts, alcohol-modified chloroplatinic acid (see U.S. Pat. No. 3,220,972), complexes of chloroplatinic acid and olefins (see U.S. Pat. Nos. 3,159,601, 3,159,662 and 3,775,452), platinum black, platinum group metals such as palladium supported on a support such as alumina, silica or carbon, rhodium-olefin complexes, chlorotris(triphenylphosphine)rhodium (Wilkinson's catalyst), complexes of platinum chloride, chloroplatinic acid or chloroplatinate salts with vinyl group-containing siloxanes, particularly vinyl group-containing cyclic siloxanes.

(D)成分の使用量は、(A)成分に対して白金族金属元素質量換算で0.1~2,000ppmであり、好ましくは50~1,000ppmである。 The amount of component (D) used is 0.1 to 2,000 ppm, preferably 50 to 1,000 ppm, calculated as the mass of platinum group metal element relative to component (A).

[(E)反応制御剤]
(E)成分の付加反応制御剤は、通常の付加反応硬化型シリコーン組成物に用いられる公知の付加反応制御剤であれば、特に限定されない。例えば、1-エチニル-1-ヘキサノール、3-ブチン-1-オール、エチニルメチリデンカルビノール等のアセチレン化合物や各種窒素化合物、有機リン化合物、オキシム化合物、有機クロロ化合物等が挙げられる。(E)成分を配合する場合の使用量としては、(A)成分100質量部に対して0.01~2.0質量部、特に0.1~1.2質量部程度が望ましい。(E)成分の配合量が少なすぎると付加反応の進行により熱伝導性シリコーン組成物の取り扱い性に劣る場合があり、多すぎると硬化反応が進まず、成形効率が損なわれる場合がある。
[(E) Reaction control agent]
The addition reaction inhibitor of component (E) is not particularly limited as long as it is a known addition reaction inhibitor used in normal addition reaction curing silicone compositions. Examples include acetylene compounds such as 1-ethynyl-1-hexanol, 3-butyn-1-ol, and ethynylmethylidene carbinol, various nitrogen compounds, organic phosphorus compounds, oxime compounds, and organic chloro compounds. When component (E) is used, the amount is preferably about 0.01 to 2.0 parts by mass, and more preferably about 0.1 to 1.2 parts by mass, per 100 parts by mass of component (A). If the amount of component (E) is too small, the addition reaction may proceed, resulting in poor handling of the thermally conductive silicone composition, and if the amount is too large, the curing reaction may not proceed, resulting in poor molding efficiency.

[(F)酸化セリウム]
(F)成分の酸化セリウムは、耐熱性の改善、特には、前記熱伝導性シリコーン組成物の硬化物の軟化劣化を抑制することを目的とする。酸化セリウムの添加量は、(A)成分100質量部に対して、7.5~25質量部であり、好ましくは、8.0~14質量部である。添加量がこの範囲外だと、150℃の高温で保存した場合硬度の低下が見られる恐れがある。
[(F) Cerium oxide]
The purpose of the cerium oxide in component (F) is to improve heat resistance, in particular to inhibit softening and deterioration of the cured product of the thermally conductive silicone composition. The amount of cerium oxide added is 7.5 to 25 parts by mass, and preferably 8.0 to 14 parts by mass, per 100 parts by mass of component (A). If the amount added is outside this range, a decrease in hardness may be observed when the composition is stored at a high temperature of 150°C.

酸化セリウムを添加することで、前記熱伝導性シリコーン組成物の硬化物は、耐熱性に優れたものとなる。具体的には、前記硬化物のアスカーC硬度計で測定した硬さにおいて、150℃×500時間エージング後の硬さが、エージング前の硬さに対して、-5ポイント以上、+40ポイント以下であることが好ましく、-3ポイント以上+20ポイント以下であることがより好ましい。 By adding cerium oxide, the cured product of the thermally conductive silicone composition has excellent heat resistance. Specifically, the hardness of the cured product measured with an Asker C hardness tester after aging at 150°C for 500 hours is preferably -5 points or more and +40 points or less, and more preferably -3 points or more and +20 points or less, compared to the hardness before aging.

[(G)表面処理剤]
(G)成分の表面処理剤は、熱伝導性シリコーン組成物調製時に前記(C)成分を疎水化処理し、前記(A)成分との濡れ性を向上させ、(C)成分を(A)成分からなるマトリックス中に均一に分散させることを目的とする。(G)成分としては、下記に示す(G-1)成分及び(G-2)成分から選ばれる1種以上の表面処理剤である。
[(G) Surface treatment agent]
The purpose of the surface treatment agent for component (G) is to hydrophobize component (C) during preparation of the thermally conductive silicone composition, thereby improving the wettability with component (A) and dispersing component (C) uniformly within the matrix made of component (A). Component (G) is one or more surface treatment agents selected from components (G-1) and (G-2) shown below.

(G-1)成分は、下記一般式(1)で表されるアルコキシシラン化合物である。
Si(OR4-a-b (1)
(式中、Rは独立に炭素原子数6~15のアルキル基であり、Rは独立に炭素原子数1~5のアルキル基、炭素原子数6~12のアリール基、及び炭素原子数7~12のアラルキル基から選ばれる基であり、Rは独立に炭素原子数1~6のアルキル基であり、aは1~3の整数、bは0~2の整数であり、但しa+bは1~3の整数である。)
The component (G-1) is an alkoxysilane compound represented by the following general formula (1).
R 1 a R 2 b Si(OR 3 ) 4-ab (1)
(In the formula, R 1 is independently an alkyl group having 6 to 15 carbon atoms, R 2 is independently a group selected from an alkyl group having 1 to 5 carbon atoms, an aryl group having 6 to 12 carbon atoms, and an aralkyl group having 7 to 12 carbon atoms, R 3 is independently an alkyl group having 1 to 6 carbon atoms, a is an integer of 1 to 3, b is an integer of 0 to 2, and a+b is an integer of 1 to 3.)

上記一般式(1)において、Rで表される炭素原子数6~15のアルキル基としては、例えば、ヘキシル基、オクチル基、ノニル基、デシル基、ドデシル基、テトラデシル基等が挙げられる。このRで表されるアルキル基の炭素原子数が6~15の範囲を満たすと(A)成分の濡れ性が十分に向上し、取り扱い性がよく、組成物の低温特性が良好なものとなる。 In the above general formula (1), examples of the alkyl group having 6 to 15 carbon atoms represented by R1 include a hexyl group, an octyl group, a nonyl group, a decyl group, a dodecyl group, a tetradecyl group, etc. When the number of carbon atoms of the alkyl group represented by R1 falls within the range of 6 to 15, the wettability of component (A) is sufficiently improved, the handleability is good, and the low-temperature properties of the composition are excellent.

で表される炭素原子数1~5のアルキル基の例としては、例えば、メチル基、エチル基、プロピル基、イソプロピル基、ブチル基、イソブチル基、tert-ブチル基、ペンチル基、ネオペンチル基が挙げられる。炭素原子数6~12のアリール基の例としては、フェニル基、トリル基、キシリル基、ナフチル基、ビフェニリル基等が挙げられる。そして、炭素原子数7~12のアラルキル基から選ばれる基の例としては、ベンジル基、フェニルエチル基、フェニルプロピル基、メチルベンジル基等が挙げられる。中でも、好ましくはメチル基、エチル基、プロピル基等の炭素原子数1~3のアルキル基、及びフェニル基が挙げられる。Rとしては、メチル基、エチル基、プロピル基、ブチル基、ヘキシル基等が挙げられる。 Examples of the alkyl group having 1 to 5 carbon atoms represented by R2 include, for example, a methyl group, an ethyl group, a propyl group, an isopropyl group, a butyl group, an isobutyl group, a tert-butyl group, a pentyl group, and a neopentyl group. Examples of the aryl group having 6 to 12 carbon atoms include a phenyl group, a tolyl group, a xylyl group, a naphthyl group, and a biphenylyl group. Examples of the aralkyl group having 7 to 12 carbon atoms include a benzyl group, a phenylethyl group, a phenylpropyl group, and a methylbenzyl group. Among these, preferred are alkyl groups having 1 to 3 carbon atoms, such as a methyl group, an ethyl group, and a propyl group, and a phenyl group. Examples of R3 include a methyl group, an ethyl group, a propyl group, a butyl group, and a hexyl group.

(G-2)成分は、下記一般式(2)で表される分子鎖片末端がトリアルコキシシリル基で封鎖されたジメチルポリシロキサンである。

Figure 0007689935000005
(式中、Rは独立に炭素原子数1~6のアルキル基であり、具体的には前記Rで例示されたアルキル基と同じものが例示できる。cは5~100、好ましくは5~70、特に好ましくは10~50の整数である。) Component (G-2) is a dimethylpolysiloxane having one molecular chain end blocked with a trialkoxysilyl group, as represented by the following general formula (2).
Figure 0007689935000005
(In the formula, R 4 is independently an alkyl group having 1 to 6 carbon atoms, and specific examples thereof include the same alkyl groups as those exemplified for R 3 above. c is an integer of 5 to 100, preferably 5 to 70, and particularly preferably 10 to 50.)

(G)成分の表面処理剤としては、(G-1)成分と(G-2)成分のいずれか一方でも両者を組み合わせて配合しても差し支えない。 As the surface treatment agent for component (G), either component (G-1) or component (G-2) may be used alone or in combination with both.

(G)成分を配合する場合の配合量としては、(A)成分100質量部に対して0.01~300質量部であり、0.1~200質量部であることが好ましい。300質量部を超えて本成分の割合が多くなるとオイル分離を誘発する可能性がある。 When component (G) is added, the amount is 0.01 to 300 parts by mass, and preferably 0.1 to 200 parts by mass, per 100 parts by mass of component (A). If the proportion of this component exceeds 300 parts by mass, there is a possibility that oil separation will be induced.

[(H)オルガノポリシロキサン]
本発明の熱伝導性シリコーン組成物には、熱伝導性シリコーン組成物の粘度調整等の特性付与を目的として、(H)成分のオルガノポリシロキサンを配合してもよい。この(H)成分としては、下記一般式(3)で表される23℃における動粘度が10~100,000mm/sのオルガノポリシロキサンを添加することができる。(H)成分は、1種単独で用いても、2種以上を併用してもよい。

Figure 0007689935000006
(式中、Rは独立に炭素原子数1~6のアルキル基、炭素原子数6~12のアリール基、及び炭素原子数7~12のアラルキル基から選ばれる基、dは5~2,000の整数である。) [(H) Organopolysiloxane]
The thermally conductive silicone composition of the present invention may contain an organopolysiloxane as component (H) for the purpose of adjusting the viscosity of the thermally conductive silicone composition and imparting other properties. As component (H), an organopolysiloxane represented by the following general formula (3) and having a kinetic viscosity at 23° C. of 10 to 100,000 mm 2 /s may be added. Component (H) may be used alone or in combination of two or more types.
Figure 0007689935000006
(In the formula, R5 is independently a group selected from an alkyl group having 1 to 6 carbon atoms, an aryl group having 6 to 12 carbon atoms, and an aralkyl group having 7 to 12 carbon atoms, and d is an integer of 5 to 2,000.)

上記一般式(3)において、Rは独立に炭素原子数1~6のアルキル基、炭素原子数6~12のアリール基、及び炭素原子数7~12のアラルキル基から選ばれる基である。Rの具体例としては、例えば、メチル基、エチル基、プロピル基、イソプロピル基、ブチル基、イソブチル基、tert-ブチル基、ペンチル基等のアルキル基、シクロペンチル基、シクロヘキシル基等のシクロアルキル基、フェニル基、トリル基、キシリル基、ナフチル基、ビフェニリル基等のアリール基、ベンジル基、フェニルエチル基、フェニルプロピル基、メチルベンジル基等のアラルキル基等が挙げられる。中でも、好ましくはメチル基、エチル基、プロピル基等の炭素原子数1~3のアルキル基、及びフェニル基が挙げられるが、特にメチル基、フェニル基が好ましい。 In the above general formula (3), R5 is independently a group selected from an alkyl group having 1 to 6 carbon atoms, an aryl group having 6 to 12 carbon atoms, and an aralkyl group having 7 to 12 carbon atoms. Specific examples of R5 include alkyl groups such as methyl, ethyl, propyl, isopropyl, butyl, isobutyl, tert-butyl, and pentyl groups, cycloalkyl groups such as cyclopentyl and cyclohexyl groups, aryl groups such as phenyl, tolyl, xylyl, naphthyl, and biphenylyl groups, and aralkyl groups such as benzyl, phenylethyl, phenylpropyl, and methylbenzyl groups. Among these, alkyl groups having 1 to 3 carbon atoms such as methyl, ethyl, and propyl groups, and phenyl groups are preferred, with methyl and phenyl groups being particularly preferred.

上記dは要求される粘度の観点から、好ましくは5~2,000の整数で、特に好ましくは10~1,000の整数である。 From the viewpoint of the required viscosity, the above d is preferably an integer between 5 and 2,000, and particularly preferably an integer between 10 and 1,000.

また、(H)成分の23℃における動粘度は、好ましくは10~100,000mm/sであり、特に100~10,000mm/sであることが好ましい。動粘度が10mm/s以上であれば、得られる組成物の硬化物がオイルブリードを発生し難くなる。動粘度が100,000mm/s以下であれば、得られる熱伝導性シリコーン組成物の柔軟性が優れたものとなる。 Furthermore, the kinetic viscosity of component (H) at 23°C is preferably 10 to 100,000 mm 2 /s, and particularly preferably 100 to 10,000 mm 2 /s. If the kinetic viscosity is 10 mm 2 /s or higher, the cured product of the resulting composition is less prone to oil bleeding. If the kinetic viscosity is 100,000 mm 2 /s or lower, the resulting thermally conductive silicone composition will have excellent flexibility.

(H)成分を本発明の熱伝導性シリコーン組成物に添加する場合、その添加量は特に限定されず、所望の効果が得られる量であればよいが、(A)成分100質量部に対して、好ましくは0.1~100質量部、より好ましくは1~50質量部である。添加量がこの範囲にあると、硬化前の熱伝導性シリコーン組成物に良好な流動性、作業性を維持し易く、また(C)成分の熱伝導性充填材を組成物に充填するのが容易である。 When component (H) is added to the thermally conductive silicone composition of the present invention, there are no particular limitations on the amount added, so long as the desired effect is obtained, but the amount is preferably 0.1 to 100 parts by mass, and more preferably 1 to 50 parts by mass, per 100 parts by mass of component (A). If the amount added is within this range, it is easy to maintain good fluidity and workability in the thermally conductive silicone composition before curing, and it is also easy to fill the composition with the thermally conductive filler of component (C).

[その他の成分]
本発明の熱伝導性シリコーン組成物には、本発明の目的に応じて、更に他の成分を配合しても差し支えない。例えば、酸化鉄等の耐熱性向上剤;シリカ等の粘度調整剤;着色剤;離型剤等の任意成分を配合することができる。
[Other ingredients]
The thermally conductive silicone composition of the present invention may further contain other components depending on the object of the present invention, for example, optional components such as a heat resistance improver such as iron oxide, a viscosity modifier such as silica, a colorant, and a mold release agent.

[熱伝導性シリコーン硬化物]
本発明では、上記熱伝導性シリコーン組成物の硬化物である、熱伝導性シリコーン硬化物を提供する。本発明の熱伝導性シリコーン硬化物は絶縁性、熱伝導性、加工性、耐熱性に優れ、例えば電子機器内の発熱部品と放熱部品の間に設置される熱伝導性樹脂成形体として好適に用いられる。また、熱伝導性シリコーン硬化物の形状がシート状であれば、取り扱い性に優れるため好ましい。
[Thermal conductive silicone cured product]
The present invention provides a thermally conductive silicone cured product, which is a cured product of the above-mentioned thermally conductive silicone composition. The thermally conductive silicone cured product of the present invention has excellent insulation properties, thermal conductivity, processability, and heat resistance, and is suitable for use as a thermally conductive resin molded product to be installed between heat generating parts and heat dissipating parts in electronic devices, for example. In addition, if the thermally conductive silicone cured product is in the form of a sheet, it is preferable because it is easy to handle.

[熱伝導性シリコーン組成物の調製]
本発明の熱伝導性シリコーン組成物は、上述した各成分を常法に準じて均一に混合することにより調製することができる。
[Preparation of Thermally Conductive Silicone Composition]
The thermally conductive silicone composition of the present invention can be prepared by uniformly mixing the above-mentioned components in a conventional manner.

[熱伝導性シリコーン組成物の粘度]
本発明の熱伝導性シリコーン組成物の粘度は、23℃において4,000Pa・s以下であることが好ましく、より好ましくは3,000Pa・s以下である。粘度が4,000Pa・s以下であれば、成形性が損なわれる場合がない。なお、本発明において、この粘度はフローテスタ粘度計による測定に基づく。
[Viscosity of Thermally Conductive Silicone Composition]
The viscosity of the thermally conductive silicone composition of the present invention is preferably 4,000 Pa·s or less, and more preferably 3,000 Pa·s or less, at 23° C. If the viscosity is 4,000 Pa·s or less, moldability will not be impaired. In the present invention, this viscosity is based on measurements using a flow tester viscometer.

[熱伝導性シリコーン硬化物の製造方法]
熱伝導性シリコーン組成物を成形する硬化条件としては、公知の付加反応硬化型シリコーンゴム組成物と同様でよく、例えば、常温でも十分硬化するが、必要に応じて加熱してもよい。好ましくは100~120℃で8~12分間で付加硬化させるのがよい。このような本発明の熱伝導性シリコーン硬化物は熱伝導性に優れる。
[Method for producing thermally conductive silicone cured product]
The curing conditions for molding the thermally conductive silicone composition may be the same as those for known addition reaction curing type silicone rubber compositions, for example, the composition will cure sufficiently at room temperature, but may be heated if necessary. Addition curing is preferably carried out at 100 to 120°C for 8 to 12 minutes. Such a thermally conductive silicone cured product of the present invention has excellent thermal conductivity.

[熱伝導性シリコーン硬化物の熱伝導率]
本発明における熱伝導性シリコーン硬化物の熱伝導率は、ホットディスク法により測定した23℃における測定値が7.5W/m・K以上、特に8.0W/m・K以上であることが望ましい。
[Thermal Conductivity of Cured Thermally Conductive Silicone Product]
The thermal conductivity of the heat-conductive silicone cured product of the present invention, measured at 23° C. by the hot disk method, should desirably be at least 7.5 W/m·K, and especially at least 8.0 W/m·K.

[熱伝導性シリコーン硬化物の絶縁破壊電圧]
本発明における熱伝導性シリコーン硬化物の絶縁破壊電圧は、熱伝導性シリコーン硬化物の1mm厚における絶縁破壊電圧をJIS K 6249:2003に準拠して測定したときの測定値が、10kV/mm以上、より好ましくは12kV/mm以上であることが好ましい。絶縁破壊電圧が10kV/mm以上の硬化物の場合、使用時に安定的に絶縁を確保することができる。なお、このような絶縁破壊電圧は、フィラーの種類や純度を調整することにより、調整することができる。
[Dielectric breakdown voltage of thermally conductive silicone cured product]
The dielectric breakdown voltage of the thermally conductive silicone cured product in the present invention is preferably 10 kV/mm or more, more preferably 12 kV/mm or more, as measured in accordance with JIS K 6249:2003 at a thickness of 1 mm. When the dielectric breakdown voltage of the cured product is 10 kV/mm or more, stable insulation can be ensured during use. Such dielectric breakdown voltage can be adjusted by adjusting the type and purity of the filler.

[熱伝導性シリコーン硬化物の硬度]
本発明における熱伝導性シリコーン硬化物の硬さは、アスカーC硬度計で測定した23℃における測定値が60以下、好ましくは40以下、より好ましくは30以下であることが好ましく、また5以上であることが好ましい。硬さが60以下の場合、被放熱体の形状に沿うように変形し、被放熱体に応力をかけることなく良好な放熱特性を示す。なお、このような硬さは、(A)成分と(B)成分の比率を変えて、架橋密度を調整することにより、調整することができる。また、150℃×500時間エージング後の硬さが、エージング前の硬さに対して、-5ポイント以上、40ポイント以下のものであることが好ましい。このような熱伝導性シリコーン組成物の硬化物であれば、高温で長時間使用しても硬度の低下が小さいものとなる。
[Hardness of cured thermally conductive silicone product]
The hardness of the thermally conductive silicone cured product of the present invention is preferably 60 or less, more preferably 40 or less, more preferably 30 or less, and more preferably 5 or more, as measured at 23°C using an Asker C hardness tester. When the hardness is 60 or less, the product deforms to fit the shape of the heat-dissipating body, and exhibits good heat dissipation characteristics without applying stress to the heat-dissipating body. Such hardness can be adjusted by changing the ratio of the (A) component and the (B) component to adjust the crosslink density. In addition, it is preferable that the hardness after aging at 150°C for 500 hours is -5 points or more and 40 points or less compared to the hardness before aging. If the cured product of such a thermally conductive silicone composition is used for a long time at high temperatures, the decrease in hardness is small.

以下、実施例及び比較例を示し、本発明を具体的に説明するが、本発明は下記の実施例に制限されるものではない。なお、組成物の粘度は23℃においてフローテスタ粘度計により測定した。測定装置としては島津製作所製のCFT-500EXを使用した。ダイ穴径を直径2mm、ダイ長さを2mm、試験荷重を10kgとして時間とストロークをプロットし、傾きから粘度を算出した。また、平均粒径は日機装(株)製の粒度分析計であるマイクロトラックMT3300EXにより測定した体積基準の累積平均粒径(メディアン径)の値である。 The present invention will be described in detail below with examples and comparative examples, but the present invention is not limited to the following examples. The viscosity of the composition was measured at 23°C using a flow tester viscometer. The measuring device used was a CFT-500EX manufactured by Shimadzu Corporation. The time and stroke were plotted with a die hole diameter of 2 mm, die length of 2 mm, and test load of 10 kg, and the viscosity was calculated from the slope. The average particle size is the cumulative average particle size (median diameter) on a volume basis measured using a Microtrac MT3300EX particle size analyzer manufactured by Nikkiso Co., Ltd.

下記実施例及び比較例に用いられる(A)~(H)成分を下記に示す。
(A)成分:
下記式(5)で示されるオルガノポリシロキサン。

Figure 0007689935000007
(式中、Xはビニル基であり、fは下記粘度を与える数である。)
(A-1)動粘度:600mm/s
(A-2)動粘度:30,000mm/s Components (A) to (H) used in the following Examples and Comparative Examples are shown below.
Component (A):
An organopolysiloxane represented by the following formula (5):
Figure 0007689935000007
(In the formula, X is a vinyl group, and f is a number that gives the following viscosity.)
(A-1) Kinematic viscosity: 600mm 2 /s
(A-2) Kinematic viscosity: 30,000mm 2 /s

(B-1)成分:
下記式(6-1)で示されるオルガノハイドロジェンポリシロキサン。

Figure 0007689935000008
(B-2)成分:
下記式(6-2)で示されるオルガノハイドロジェンポリシロキサン。
Figure 0007689935000009
(B-1) Component:
Organohydrogenpolysiloxane represented by the following formula (6-1):
Figure 0007689935000008
(B-2) Component:
Organohydrogenpolysiloxane represented by the following formula (6-2):
Figure 0007689935000009

(C)成分:
平均粒径が下記の通りである球状アルミナフィラー、不定形アルミナフィラー。
(C-1)平均粒径が98.8μmの球状アルミナフィラー。
(C-2)平均粒径が23.4μmの球状アルミナフィラー。
(C-3)平均粒径が1.7μmの不定形アルミナフィラー。
(C-4)平均粒径が2.3μmの球状アルミナフィラー。
(C) Component:
Spherical alumina filler and irregular alumina filler with average particle diameters as shown below.
(C-1) Spherical alumina filler having an average particle size of 98.8 μm.
(C-2) Spherical alumina filler having an average particle size of 23.4 μm.
(C-3) Irregular alumina filler having an average particle size of 1.7 μm.
(C-4) Spherical alumina filler having an average particle size of 2.3 μm.

(D)成分:
5質量%塩化白金酸2-エチルヘキサノール溶液。
(D) Component:
5% by mass solution of chloroplatinic acid in 2-ethylhexanol.

(E)成分:
エチニルメチリデンカルビノール。
(E) Component:
Ethynylmethylidene carbinol.

(F)成分:
酸化セリウム。
Component (F):
Cerium oxide.

(G)成分:(G-2)成分
下記式(7)で示される平均重合度が30の片末端がトリメトキシシリル基で封鎖されたジメチルポリシロキサン。

Figure 0007689935000010
Component (G): Component (G-2) A dimethylpolysiloxane having an average degree of polymerization of 30 and one end blocked with a trimethoxysilyl group, as shown in the following formula (7).
Figure 0007689935000010

(H)成分
可塑剤として、下記式(8)で示される23℃における動粘度が100mm/sのジメチルポリシロキサン。

Figure 0007689935000011
Component (H) A plasticizer, which is a dimethylpolysiloxane having a kinetic viscosity of 100 mm 2 /s at 23° C. and represented by the following formula (8):
Figure 0007689935000011

[実施例1~4、比較例1~4]
実施例1~4及び比較例1~4において、上記(A)~(H)成分を下記表1に示す所定の量を用いて下記のように熱伝導性シリコーン組成物を調製し、成形硬化させ、下記方法に従って熱伝導性シリコーン組成物の粘度、その硬化物の熱伝導率、硬度、絶縁破壊電圧測定した。結果を表1に併記する。
[Examples 1 to 4, Comparative Examples 1 to 4]
In Examples 1 to 4 and Comparative Examples 1 to 4, thermally conductive silicone compositions were prepared as described below using the above components (A) to (H) in the prescribed amounts shown in Table 1 below, then molded and cured, and the viscosity of the thermally conductive silicone composition, and the thermal conductivity, hardness, and breakdown voltage of the cured product were measured according to the methods described below. The results are also shown in Table 1.

[熱伝導性シリコーン組成物の調製]
(A)、(C)、(F)、(G)、(H)成分を下記表1の実施例1~4及び比較例1~4に示す所定の量で加え、プラネタリーミキサーで60分間混練した。そこに(D)成分を下記表1の実施例1~4及び比較例1~4に示す所定の量で加え、更にセパレータとの離型を促す内添離型剤として、信越化学製のフェニル変性シリコーンオイルであるKF-54を有効量加え、30分間混練した。
そこに更に(B)、(E)成分を下記表1の実施例1~4及び比較例1~4に示す所定の量で加え、30分間混練し、熱伝導性シリコーン組成物を得た。
[Preparation of Thermally Conductive Silicone Composition]
Components (A), (C), (F), (G), and (H) were added in the prescribed amounts shown in Examples 1 to 4 and Comparative Examples 1 to 4 in Table 1 below, and kneaded for 60 minutes with a planetary mixer. Component (D) was then added in the prescribed amount shown in Examples 1 to 4 and Comparative Examples 1 to 4 in Table 1 below, and an effective amount of KF-54, a phenyl-modified silicone oil manufactured by Shin-Etsu Chemical Co., Ltd., was further added as an internal release agent to promote release from the separator, and kneaded for 30 minutes.
To this was further added components (B) and (E) in the prescribed amounts shown in Examples 1 to 4 and Comparative Examples 1 to 4 in Table 1 below, and the mixture was kneaded for 30 minutes to obtain a thermally conductive silicone composition.

[成形方法]
実施例1~4及び比較例1~4で得られた熱伝導性シリコーン組成物を長さ60mm×幅60mmで、厚さ6mmもしくは1mmの金型に流し込み、プレス成形機を用い、120℃、10分間で成形した。
[Molding method]
The thermally conductive silicone compositions obtained in Examples 1 to 4 and Comparative Examples 1 to 4 were poured into a mold measuring 60 mm in length, 60 mm in width, and 6 mm or 1 mm in thickness, and molded using a press molding machine at 120°C for 10 minutes.

[評価方法]
熱伝導性シリコーン組成物の粘度:
実施例1~4及び比較例1~4で得られた熱伝導性シリコーン組成物の粘度を、フローテスタ粘度計にて、23℃環境下で測定した。
[Evaluation method]
Viscosity of the thermally conductive silicone composition:
The viscosity of the thermally conductive silicone compositions obtained in Examples 1 to 4 and Comparative Examples 1 to 4 was measured in an environment of 23° C. using a flow tester viscometer.

熱伝導率:
実施例1~4及び比較例1~4で得られた熱伝導性シリコーン組成物を、プレス成型機を用いて、120℃、10分間の条件で6mm厚のシート状に硬化させ、そのシートを2枚用いて、熱伝導率計(商品名:TPS-2500S、京都電子工業(株)製)により該シートの熱伝導率を測定した。
Thermal Conductivity:
The thermally conductive silicone compositions obtained in Examples 1 to 4 and Comparative Examples 1 to 4 were cured using a press molding machine at 120°C for 10 minutes into a 6 mm thick sheet, and the thermal conductivity of two of these sheets was measured using a thermal conductivity meter (product name: TPS-2500S, manufactured by Kyoto Electronics Manufacturing Co., Ltd.).

絶縁破壊電圧:
実施例1~4及び比較例1~4で得られた熱伝導性シリコーン組成物を、プレス成型機を用いて、120℃、10分間の条件で1mm厚のシート状に硬化させ、JIS K 6249:2003に準拠して絶縁破壊電圧を測定した。
Breakdown voltage:
The thermally conductive silicone compositions obtained in Examples 1 to 4 and Comparative Examples 1 to 4 were cured using a press molding machine at 120°C for 10 minutes into a 1 mm thick sheet, and the dielectric breakdown voltage was measured in accordance with JIS K 6249:2003.

硬さ:
実施例1~4及び比較例1~4で得られた熱伝導性シリコーン組成物を上記と同様に6mm厚のシート状に硬化させ、そのシートを2枚重ねてアスカーC硬度計で測定した。
Hardness:
The thermally conductive silicone compositions obtained in Examples 1 to 4 and Comparative Examples 1 to 4 were cured into sheets having a thickness of 6 mm in the same manner as above, and two of these sheets were then stacked together and measured for hardness using an Asker C hardness tester.

150℃、500時間保存後の硬さ:
実施例1~4及び比較例1~4で得られた熱伝導性シリコーン組成物を、プレス成型機を用いて、120℃、10分間の条件で6mm厚のシート状に硬化させた硬化物を、150℃の高温炉に500時間保存したのち、そのシートを2枚重ねてアスカーC硬度計で測定した。
Hardness after storage at 150°C for 500 hours:
The thermally conductive silicone compositions obtained in Examples 1 to 4 and Comparative Examples 1 to 4 were cured using a press molding machine at 120°C for 10 minutes into a 6 mm thick sheet. The cured products were then stored in a high-temperature oven at 150°C for 500 hours, and two of the sheets were then stacked and measured for hardness using an Asker C tester.

Figure 0007689935000012
Figure 0007689935000012

実施例1~4では、熱伝導性シリコーン組成物の粘度、成形性、熱伝導性シリコーン硬化物の熱伝導率、絶縁破壊電圧、硬さとも良好な結果であった。また、(F)酸化セリウムを添加したことで、さらに150℃の高温で保存しても、軟化劣化による硬度の低下はみられなかった。 In Examples 1 to 4, the viscosity and moldability of the thermally conductive silicone composition, and the thermal conductivity, dielectric breakdown voltage, and hardness of the cured thermally conductive silicone were all good. Furthermore, by adding (F) cerium oxide, no decrease in hardness due to softening deterioration was observed, even when stored at a high temperature of 150°C.

比較例1のように(C-4)成分(平均粒径が0.7μmを超えて4μm以下である球状アルミナフィラー)を含有しないと、熱伝導性シリコーン組成物の粘度が著しく上昇した。比較例2のように(F)酸化セリウムの添加量が本発明の範囲から外れた場合、150℃×500時間保存後の硬さが低下した。比較例3のように(C)熱伝導性充填材の配合量が多すぎると、熱伝導性充填材の濡れ性が不足し、グリース状の均一な熱伝導性シリコーン組成物を得ることができなかった。比較例4のように(C)熱伝導性充填材の配合量が少なすぎると、熱伝導性シリコーン硬化物の熱伝導率が顕著に低下した。 When the (C-4) component (spherical alumina filler with an average particle size of more than 0.7 μm and not more than 4 μm) was not included, as in Comparative Example 1, the viscosity of the thermally conductive silicone composition increased significantly. When the amount of cerium oxide (F) added was outside the range of the present invention, as in Comparative Example 2, the hardness decreased after storage at 150°C for 500 hours. When the amount of thermally conductive filler (C) was too high, as in Comparative Example 3, the wettability of the thermally conductive filler was insufficient, and a grease-like uniform thermally conductive silicone composition could not be obtained. When the amount of thermally conductive filler (C) was too low, as in Comparative Example 4, the thermal conductivity of the thermally conductive silicone cured product decreased significantly.

本明細書は以下の態様を包含する。
[1]:熱伝導性シリコーン組成物であって、
(A)1分子中に2個以上のアルケニル基を有するオルガノポリシロキサン:100質量部、
(B)1分子中に2個以上のヒドロシリル基を有するオルガノハイドロジェンポリシロキサン:ヒドロシリル基のモル数が前記(A)成分由来のアルケニル基のモル数の0.1~5.0倍量となる量、
(C)下記(C-1)~(C-4)からなる熱伝導性充填材:4,300~5,800質量部、
(C-1)平均粒径が70μmを超えて135μm以下である球状アルミナフィラー:1,750~3,000質量部、
(C-2)平均粒径が8μmを超えて40μm以下である球状アルミナフィラー:750~2,000質量部、
(C-3)平均粒径が0.4μmを超えて4μm以下である不定形アルミナフィラー:750~1,500質量部、
(C-4)平均粒径が0.7μmを超えて4μm以下である球状アルミナフィラー:125~750質量部、
(D)白金族金属系硬化触媒:前記(A)成分に対して白金族金属元素質量換算で0.1~2,000ppm、
(E)付加反応制御剤:0.01~2.0質量部、
(F)酸化セリウム:7.5~25質量部、及び
(G)下記(G-1)及び(G-2)から選ばれる1種以上の表面処理剤:0.01~300質量部、
(G-1)下記一般式(1)で表されるアルコキシシラン化合物、
Si(OR4-a-b (1)
(式中、Rは独立に炭素原子数6~15のアルキル基であり、Rは独立に炭素原子数1~5のアルキル基、炭素原子数6~12のアリール基、及び炭素原子数7~12のアラルキル基から選ばれる基であり、Rは独立に炭素原子数1~6のアルキル基であり、aは1~3の整数、bは0~2の整数であり、但しa+bは1~3の整数である。)
(G-2)下記一般式(2)で表される分子鎖片末端がトリアルコキシシリル基で封鎖されたジメチルポリシロキサン、

Figure 0007689935000013
(式中、Rは独立に炭素原子数1~6のアルキル基であり、cは5~100の整数である。)
を含むものであることを特徴とする熱伝導性シリコーン組成物。
[2]:更に、(H)成分として、下記一般式(3)で表される23℃における動粘度が10~100,000mm/sのオルガノポリシロキサンを前記(A)成分の100質量部に対して、0.1~100質量部で含有するものであることを特徴とする上記[1]の熱伝導性シリコーン組成物。
Figure 0007689935000014
(式中、Rは独立に炭素原子数1~6のアルキル基、炭素原子数6~12のアリール基、及び炭素原子数7~12のアラルキル基から選ばれる基であり、dは5~2,000の整数である。)
[3]:23℃におけるフローテスタ粘度計で測定した前記熱伝導性シリコーン組成物の粘度が4,000Pa・s以下のものであることを特徴とする上記[1]又は上記[2]の熱伝導性シリコーン組成物。
[4]:上記[1]、上記[2]又は上記[3]の熱伝導性シリコーン組成物の硬化物であることを特徴とする熱伝導性シリコーン硬化物。
[5]:前記熱伝導性シリコーン硬化物の形状がシート状のものであることを特徴とする上記[4]の熱伝導性シリコーン硬化物。
[6]:前記熱伝導性シリコーン硬化物のアスカーC硬度計で測定した硬さにおいて、150℃×500時間エージング後の硬さが、エージング前の硬さに対して、-5ポイント以上、40ポイント以下のものであることを特徴とする上記[4]又は上記[5]の熱伝導性シリコーン硬化物。
[7]:前記熱伝導性シリコーン硬化物のホットディスク法により測定した23℃における熱伝導率が、7.5W/m・K以上のものであることを特徴とする上記[4]、上記[5]又は上記[6]の熱伝導性シリコーン硬化物。
[8]:前記熱伝導性シリコーン硬化物の1mm厚における絶縁破壊電圧が10kV/mm以上のものであることを特徴とする上記[4]、上記[5]、上記[6]又は上記[7]の熱伝導性シリコーン硬化物。 The present specification includes the following aspects.
[1]: A thermally conductive silicone composition,
(A) organopolysiloxane having two or more alkenyl groups in one molecule: 100 parts by mass,
(B) an organohydrogenpolysiloxane having two or more hydrosilyl groups per molecule: an amount such that the number of moles of hydrosilyl groups is 0.1 to 5.0 times the number of moles of alkenyl groups derived from component (A);
(C) a thermally conductive filler consisting of the following (C-1) to (C-4): 4,300 to 5,800 parts by mass,
(C-1) Spherical alumina filler having an average particle size of more than 70 μm and not more than 135 μm: 1,750 to 3,000 parts by mass,
(C-2) Spherical alumina filler having an average particle size of more than 8 μm and not more than 40 μm: 750 to 2,000 parts by mass,
(C-3) irregular alumina filler having an average particle size of more than 0.4 μm and not more than 4 μm: 750 to 1,500 parts by mass,
(C-4) Spherical alumina filler having an average particle size of more than 0.7 μm and not more than 4 μm: 125 to 750 parts by mass,
(D) a platinum group metal curing catalyst: 0.1 to 2,000 ppm by mass of platinum group metal element relative to the component (A);
(E) Addition reaction inhibitor: 0.01 to 2.0 parts by mass,
(F) cerium oxide: 7.5 to 25 parts by mass, and (G) one or more surface treatment agents selected from the following (G-1) and (G-2): 0.01 to 300 parts by mass,
(G-1) An alkoxysilane compound represented by the following general formula (1):
R 1 a R 2 b Si(OR 3 ) 4-ab (1)
(In the formula, R 1 is independently an alkyl group having 6 to 15 carbon atoms, R 2 is independently a group selected from an alkyl group having 1 to 5 carbon atoms, an aryl group having 6 to 12 carbon atoms, and an aralkyl group having 7 to 12 carbon atoms, R 3 is independently an alkyl group having 1 to 6 carbon atoms, a is an integer of 1 to 3, b is an integer of 0 to 2, and a+b is an integer of 1 to 3.)
(G-2) Dimethylpolysiloxane having one molecular chain end blocked with a trialkoxysilyl group, represented by the following general formula (2):
Figure 0007689935000013
(In the formula, R 4 is independently an alkyl group having 1 to 6 carbon atoms, and c is an integer of 5 to 100.)
A thermally conductive silicone composition comprising:
[2]: The thermally conductive silicone composition of [1] above, further comprising, as component (H), 0.1 to 100 parts by mass of an organopolysiloxane represented by the following general formula (3) having a kinetic viscosity at 23°C of 10 to 100,000 mm2 /s per 100 parts by mass of component (A):
Figure 0007689935000014
(In the formula, R5 is independently a group selected from an alkyl group having 1 to 6 carbon atoms, an aryl group having 6 to 12 carbon atoms, and an aralkyl group having 7 to 12 carbon atoms, and d is an integer of 5 to 2,000.)
[3]: The thermally conductive silicone composition according to [1] or [2] above, characterized in that the viscosity of the thermally conductive silicone composition measured at 23°C with a flow tester viscometer is 4,000 Pa·s or less.
[4]: A thermally conductive silicone cured product, which is a cured product of the thermally conductive silicone composition according to [1], [2] or [3] above.
[5]: The thermally conductive silicone cured product according to [4] above, characterized in that the thermally conductive silicone cured product is in the form of a sheet.
[6]: The thermally conductive silicone cured product according to [4] or [5] above, characterized in that the hardness of the thermally conductive silicone cured product, as measured with an Asker C hardness tester, after aging at 150°C for 500 hours is at least -5 points and at most 40 points compared to the hardness before aging.
[7]: The thermally conductive silicone cured product according to [4], [5] or [6] above, characterized in that the thermal conductivity of the thermally conductive silicone cured product at 23°C measured by the hot disk method is 7.5 W/m K or more.
[8]: The thermally conductive silicone cured product according to [4], [5], [6] or [7] above, characterized in that the thermally conductive silicone cured product has a dielectric breakdown voltage of 10 kV/mm or more at a thickness of 1 mm.

なお、本発明は、上記実施形態に限定されるものではない。上記実施形態は例示であり、本発明の特許請求の範囲に記載された技術的思想と実質的に同一な構成を有し、同様な作用効果を奏するものは、いかなるものであっても本発明の技術的範囲に包含される。 The present invention is not limited to the above-described embodiment. The above-described embodiment is merely an example, and anything that has substantially the same configuration as the technical idea described in the claims of the present invention and exhibits similar effects is included within the technical scope of the present invention.

Claims (8)

熱伝導性シリコーン組成物であって、
(A)1分子中に2個以上のアルケニル基を有するオルガノポリシロキサン:100質量部、
(B)1分子中に2個以上のヒドロシリル基を有するオルガノハイドロジェンポリシロキサン:ヒドロシリル基のモル数が前記(A)成分由来のアルケニル基のモル数の0.1~5.0倍量となる量、
(C)下記(C-1)~(C-4)からなる熱伝導性充填材:4,300~5,800質量部、
(C-1)平均粒径が70μmを超えて135μm以下である球状アルミナフィラー:1,750~3,000質量部、
(C-2)平均粒径が8μmを超えて40μm以下である球状アルミナフィラー:750~2,000質量部、
(C-3)平均粒径が0.4μmを超えて4μm以下である不定形アルミナフィラー:750~1,500質量部、
(C-4)平均粒径が0.7μmを超えて4μm以下である球状アルミナフィラー:125~750質量部、
(D)白金族金属系硬化触媒:前記(A)成分に対して白金族金属元素質量換算で0.1~2,000ppm、
(E)付加反応制御剤:0.01~2.0質量部、
(F)酸化セリウム:7.5~25質量部、及び
(G)下記(G-1)及び(G-2)から選ばれる1種以上の表面処理剤:0.01~300質量部、
(G-1)下記一般式(1)で表されるアルコキシシラン化合物、
Si(OR4-a-b (1)
(式中、Rは独立に炭素原子数6~15のアルキル基であり、Rは独立に炭素原子数1~5のアルキル基、炭素原子数6~12のアリール基、及び炭素原子数7~12のアラルキル基から選ばれる基であり、Rは独立に炭素原子数1~6のアルキル基であり、aは1~3の整数、bは0~2の整数であり、但しa+bは1~3の整数である。)
(G-2)下記一般式(2)で表される分子鎖片末端がトリアルコキシシリル基で封鎖されたジメチルポリシロキサン、
Figure 0007689935000015
(式中、Rは独立に炭素原子数1~6のアルキル基であり、cは5~100の整数である。)
を含むものであることを特徴とする熱伝導性シリコーン組成物。
A thermally conductive silicone composition comprising:
(A) organopolysiloxane having two or more alkenyl groups in one molecule: 100 parts by mass,
(B) an organohydrogenpolysiloxane having two or more hydrosilyl groups per molecule: an amount such that the number of moles of hydrosilyl groups is 0.1 to 5.0 times the number of moles of alkenyl groups derived from component (A);
(C) a thermally conductive filler consisting of the following (C-1) to (C-4): 4,300 to 5,800 parts by mass,
(C-1) Spherical alumina filler having an average particle size of more than 70 μm and not more than 135 μm: 1,750 to 3,000 parts by mass,
(C-2) Spherical alumina filler having an average particle size of more than 8 μm and not more than 40 μm: 750 to 2,000 parts by mass,
(C-3) irregular alumina filler having an average particle size of more than 0.4 μm and not more than 4 μm: 750 to 1,500 parts by mass,
(C-4) Spherical alumina filler having an average particle size of more than 0.7 μm and not more than 4 μm: 125 to 750 parts by mass,
(D) a platinum group metal curing catalyst: 0.1 to 2,000 ppm by mass of platinum group metal element relative to the component (A);
(E) Addition reaction inhibitor: 0.01 to 2.0 parts by mass,
(F) cerium oxide: 7.5 to 25 parts by mass, and (G) one or more surface treatment agents selected from the following (G-1) and (G-2): 0.01 to 300 parts by mass,
(G-1) An alkoxysilane compound represented by the following general formula (1):
R 1 a R 2 b Si(OR 3 ) 4-ab (1)
(In the formula, R 1 is independently an alkyl group having 6 to 15 carbon atoms, R 2 is independently a group selected from an alkyl group having 1 to 5 carbon atoms, an aryl group having 6 to 12 carbon atoms, and an aralkyl group having 7 to 12 carbon atoms, R 3 is independently an alkyl group having 1 to 6 carbon atoms, a is an integer of 1 to 3, b is an integer of 0 to 2, and a+b is an integer of 1 to 3.)
(G-2) Dimethylpolysiloxane having one molecular chain end blocked with a trialkoxysilyl group, represented by the following general formula (2):
Figure 0007689935000015
(In the formula, R 4 is independently an alkyl group having 1 to 6 carbon atoms, and c is an integer of 5 to 100.)
A thermally conductive silicone composition comprising:
更に、(H)成分として、下記一般式(3)で表される23℃における動粘度が10~100,000mm/sのオルガノポリシロキサンを前記(A)成分の100質量部に対して、0.1~100質量部で含有するものであることを特徴とする請求項1に記載の熱伝導性シリコーン組成物。
Figure 0007689935000016
(式中、Rは独立に炭素原子数1~6のアルキル基、炭素原子数6~12のアリール基、及び炭素原子数7~12のアラルキル基から選ばれる基であり、dは5~2,000の整数である。)
The thermally conductive silicone composition according to claim 1, further comprising, as component (H), 0.1 to 100 parts by mass of an organopolysiloxane having a kinetic viscosity at 23°C of 10 to 100,000 mm2 /s, represented by the following general formula (3), per 100 parts by mass of component (A):
Figure 0007689935000016
(In the formula, R5 is independently a group selected from an alkyl group having 1 to 6 carbon atoms, an aryl group having 6 to 12 carbon atoms, and an aralkyl group having 7 to 12 carbon atoms, and d is an integer of 5 to 2,000.)
23℃におけるフローテスタ粘度計で測定した前記熱伝導性シリコーン組成物の粘度が4,000Pa・s以下のものであることを特徴とする請求項1又は請求項2に記載の熱伝導性シリコーン組成物。 The thermally conductive silicone composition according to claim 1 or 2, characterized in that the viscosity of the thermally conductive silicone composition measured with a flow tester viscometer at 23°C is 4,000 Pa·s or less. 請求項1に記載の熱伝導性シリコーン組成物の硬化物であることを特徴とする熱伝導性シリコーン硬化物。 A thermally conductive silicone cured product, which is a cured product of the thermally conductive silicone composition described in claim 1. 前記熱伝導性シリコーン硬化物の形状がシート状のものであることを特徴とする請求項4に記載の熱伝導性シリコーン硬化物。 The thermally conductive silicone cured product according to claim 4, characterized in that the thermally conductive silicone cured product is in the form of a sheet. 前記熱伝導性シリコーン硬化物のアスカーC硬度計で測定した硬さにおいて、150℃×500時間エージング後の硬さが、エージング前の硬さに対して、-5ポイント以上、40ポイント以下のものであることを特徴とする請求項4又は請求項5に記載の熱伝導性シリコーン硬化物。 The thermally conductive silicone cured product according to claim 4 or 5, characterized in that the hardness of the thermally conductive silicone cured product measured with an Asker C hardness tester after aging at 150°C for 500 hours is -5 points or more and 40 points or less compared to the hardness before aging. 前記熱伝導性シリコーン硬化物のホットディスク法により測定した23℃における熱伝導率が、7.5W/m・K以上のものであることを特徴とする請求項4又は請求項5に記載の熱伝導性シリコーン硬化物。 The thermally conductive silicone cured product according to claim 4 or 5, characterized in that the thermal conductivity of the thermally conductive silicone cured product at 23°C measured by the hot disk method is 7.5 W/m·K or more. 前記熱伝導性シリコーン硬化物の1mm厚における絶縁破壊電圧が10kV/mm以上のものであることを特徴とする請求項4又は請求項5に記載の熱伝導性シリコーン硬化物。 The thermally conductive silicone cured product according to claim 4 or 5, characterized in that the dielectric breakdown voltage of the thermally conductive silicone cured product at a thickness of 1 mm is 10 kV/mm or more.
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Citations (4)

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JP2004331962A (en) 2003-04-15 2004-11-25 Dow Corning Toray Silicone Co Ltd Addition curing type heat conductive liquid silicone rubber composition
JP2013147600A (en) 2012-01-23 2013-08-01 Shin-Etsu Chemical Co Ltd Heat-conductive silicone composition and cured product thereof
JP2020180200A (en) 2019-04-24 2020-11-05 信越化学工業株式会社 Thermally conductive silicone composition and its manufacturing method, and thermally conductive silicone cured product
JP2021176945A (en) 2020-05-08 2021-11-11 信越化学工業株式会社 Thermally conductive silicone composition and its cured product

Patent Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2004331962A (en) 2003-04-15 2004-11-25 Dow Corning Toray Silicone Co Ltd Addition curing type heat conductive liquid silicone rubber composition
JP2013147600A (en) 2012-01-23 2013-08-01 Shin-Etsu Chemical Co Ltd Heat-conductive silicone composition and cured product thereof
JP2020180200A (en) 2019-04-24 2020-11-05 信越化学工業株式会社 Thermally conductive silicone composition and its manufacturing method, and thermally conductive silicone cured product
JP2021176945A (en) 2020-05-08 2021-11-11 信越化学工業株式会社 Thermally conductive silicone composition and its cured product

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