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JP7690730B2 - DLC film and members coated with it - Google Patents
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JP7690730B2 - DLC film and members coated with it - Google Patents

DLC film and members coated with it Download PDF

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JP7690730B2
JP7690730B2 JP2020183429A JP2020183429A JP7690730B2 JP 7690730 B2 JP7690730 B2 JP 7690730B2 JP 2020183429 A JP2020183429 A JP 2020183429A JP 2020183429 A JP2020183429 A JP 2020183429A JP 7690730 B2 JP7690730 B2 JP 7690730B2
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秀俊 斎藤
啓志 小松
亮太 吉川
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Nomura Plating Co Ltd
Nagaoka University of Technology NUC
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Description

本発明は、ダイヤモンドに近い特性を有する炭素系薄膜であるDLC膜およびそれを被覆された部材に関するものであり、高硬度で耐剥離性にも優れており、機械部品などの摺動部材や工具などの耐摩耗部材、電子部材用途や生体用部材にも使用できる。 The present invention relates to a DLC film, a carbon-based thin film with properties similar to those of diamond, and to components coated with the DLC film. The DLC film has high hardness and excellent peel resistance, and can be used for sliding components such as machine parts, wear-resistant components such as tools, electronic components, and biomaterials.

摺動部材や耐摩耗部材に使用される炭素系薄膜には、ダイヤモンドあるいは一般的にDLC(Diamond-like-carbon)と総称される材料が使用されている。最も高硬度な材料であるダイヤモンド薄膜は、結晶が強固で面粗度が粗くその鏡面化が困難であることなどから、摺動部材として使用が限定される。 Carbon-based thin films used in sliding and wear-resistant components are made of diamond or a material commonly known as DLC (diamond-like carbon). Diamond thin films are the hardest material, but their crystals are strong and their surface roughness is coarse, making it difficult to mirror-finish them, so their use as sliding components is limited.

一方、DLCは規格ISO20523により、ta-C、a-C、ta-C:H、a-C:Hの4種類に分類されている。この分類は、DLC中のC-C結合についてダイヤモンドのSP3 混成軌道結合とグラファイトのSP2 混成軌道結合の比率、および、DLC中に含有する水素量という2つの要素で4区分に分類されている。具体的には、SP3 混成軌道結合の比率が50%以上のDLCをta-C、ta-C:Hとし、50%以下のDLCをa-C、a-C:Hと分類している。また、水素含有量が5%以下のDLCをta-C、a-Cとし、5~50%含有するものをta-C:H、a-C:Hと分類している。すなわち、ダイヤモンドに最も近いDLCは、水素含有量が5%以下でSP3 /(SP2 +SP3 )が50%以上であるta-Cと分類されている。ダイヤモンドに近い機械的性質として70GPa以上の高硬度を示すものもあるta-Cは、グラファイト結合よりダイヤモンド結合を優勢にする必要がある。このため、ta-Cの作製法では、通常、炭素イオンを高エネルギーで基板に衝突させることから、形成される炭素膜の残留応力が大きくなり、付着強度が低く、また、脆いことから摺動部材などに適用した場合、短寿命に至る課題があった。 On the other hand, DLC is classified into four types, ta-C, a-C, ta-C:H, and a-C:H, according to the ISO20523 standard. This classification is based on two factors: the ratio of the SP 3 hybrid orbital bond of diamond to the SP 2 hybrid orbital bond of graphite for the C-C bonds in DLC, and the amount of hydrogen contained in DLC. Specifically, DLC with a ratio of SP 3 hybrid orbital bonds of 50% or more is classified as ta-C and ta-C:H, and DLC with a ratio of 50% or less is classified as a-C and a-C:H. DLC with a hydrogen content of 5% or less is classified as ta-C and a-C, and DLC with a hydrogen content of 5 to 50% is classified as ta-C:H and a-C:H. That is, the DLC closest to diamond is classified as ta-C, which has a hydrogen content of 5% or less and an SP 3 /(SP 2 +SP 3 ) of 50% or more. Some ta-C exhibit high hardness of 70 GPa or more, which is a mechanical property close to diamond, and it is necessary to make diamond bonds more dominant than graphite bonds. For this reason, in the manufacturing method of ta-C, carbon ions are usually bombarded with a substrate with high energy, so the residual stress of the carbon film formed is large, the adhesion strength is low, and the film is brittle, which leads to a short life when applied to sliding members, etc.

また、DLCの分類法として、光学特性評価による分類法がISOに提案され、分光エリプソメトリ法による試験の規格化への検討が進んでいる。分光エリプソメトリによる評価では、波長550nm(450~950nmの波長)の光を使用し、DLC膜の光学的特性として屈折率と消衰係数によりDLC膜を分類する。一般的に屈折率は密度と密接な関係があり、組成が同じであればDLCでも同様に考えられる。また、消衰係数については、黒色を呈するグラファイトは大きく、透明なダイヤモンドの消衰係数はほぼゼロである。DLCのC-C結合におけるSP2 混成軌道結合とSP3 混成軌道結合の比率と関係があるとも言われている。 In addition, a classification method based on optical property evaluation has been proposed to ISO as a classification method for DLC, and the standardization of testing by spectroscopic ellipsometry is underway. In the evaluation by spectroscopic ellipsometry, light with a wavelength of 550 nm (wavelength of 450 to 950 nm) is used, and DLC films are classified according to the refractive index and extinction coefficient as the optical properties of the DLC film. In general, the refractive index is closely related to the density, and the same can be considered for DLC if the composition is the same. In addition, the extinction coefficient of black graphite is large, while the extinction coefficient of transparent diamond is almost zero. It is also said to be related to the ratio of SP 2 hybrid orbital bonds to SP 3 hybrid orbital bonds in the C-C bonds of DLC.

非特許文献1では、ISOに提案し検討されている分光エリプソメトリ評価法による屈折率nと消衰係数κによるDLC分類案を図1の光学的分類図のように示している。各分類の屈折率nと消衰係数κの数値範囲で次に示す。ta-Cは2.56<n<3.0、0<κ<0.75の範囲、a-Cは2.04<n<2.42、0.53<κ<0.86の範囲、ta-C:Hは2.42<n<2.56、0<κ<0.75の範囲、a-C:Hは2.04<n<2.42、0<κ<0.86の範囲としている。 In Non-Patent Document 1, a proposed classification of DLC based on the refractive index n and extinction coefficient κ, as determined by the spectroscopic ellipsometry evaluation method, which has been proposed to and is being considered by the ISO, is shown in the optical classification diagram in Figure 1. The numerical ranges of the refractive index n and extinction coefficient κ for each classification are as follows: ta-C is in the range of 2.56<n<3.0, 0<κ<0.75, a-C is in the range of 2.04<n<2.42, 0.53<κ<0.86, ta-C:H is in the range of 2.42<n<2.56, 0<κ<0.75, and a-C:H is in the range of 2.04<n<2.42, 0<κ<0.86.

特許文献1では、屈折率nと消衰係数κで範囲限定したDLC膜及びDLCコート金型を、また特許文献2では、屈折率nと消衰係数κで数値限定したDLC膜及びDLC膜被覆物品が示されている。いずれも金型や物品の保護膜として耐久性の向上を目的としている。特許文献1では、2.5<n<2.8と、κ<0.2の範囲であり、特許文献2では、2.5<n<3.0と、0.05<κ<0.4の範囲が優れるとしている。すなわち、屈折率が大きく、消衰係数がκ<0.4の小さなta-Cが耐久性の高い膜であると示している。 Patent Document 1 shows a DLC film and DLC-coated mold with a range limited by the refractive index n and extinction coefficient κ, while Patent Document 2 shows a DLC film and DLC film-coated article with a numerical limit by the refractive index n and extinction coefficient κ. Both aim to improve durability as protective films for molds and articles. Patent Document 1 recommends the ranges 2.5<n<2.8 and κ<0.2, while Patent Document 2 states that the ranges 2.5<n<3.0 and 0.05<κ<0.4 are excellent. In other words, it is shown that ta-C with a large refractive index and a small extinction coefficient κ<0.4 is a highly durable film.

特開2008-297171号公報JP 2008-297171 A 国際公開2016-021671号公報International Publication No. 2016-021671

NEW DIAMOND 136号(2020)1月号 3-8頁NEW DIAMOND No. 136 (2020) January issue pages 3-8

本発明は、機械部品などの摺動部材や工具などの耐摩耗部材に使用される薄膜炭素材料に関するもので、耐剥離性・耐摩耗性に優れ耐久性に優れるDLC(Diamond-like-carbon)薄膜材料である。ISOの分類におけるta-Cは、高屈折率で高密度であり、ダイヤモンドに最も近いDLCと分類されており、消衰係数も小さく透明度が高い分類に位置づけられる。現行の製法では、高密度のDLC膜(ta-C)を作製するために、炭素に高電圧で加速した高エネルギーイオンを衝撃させる。その加速電圧はダイヤモンドのC-C結合エネルギー7.2eVより格段に高い、50~150V以上である。高エネルギー衝撃により、薄膜炭素材の密度をダイヤモンドの密度に近づけ、高密度化、高硬度化が達成できる。しかし同時に薄膜に強い圧縮残留応力が残り、微小な欠落や膜剥離が生じやすくなる課題があった。 The present invention relates to a thin carbon film material used for wear-resistant components such as sliding members of machine parts and tools, and is a DLC (diamond-like-carbon) thin film material with excellent peeling resistance, wear resistance, and durability. In the ISO classification, ta-C has a high refractive index and high density, and is classified as the DLC closest to diamond, with a small extinction coefficient and high transparency. In the current manufacturing method, to produce a high-density DLC film (ta-C), carbon is bombarded with high-energy ions accelerated by a high voltage. The acceleration voltage is 50 to 150 V or more, which is significantly higher than the C-C bond energy of diamond, 7.2 eV. The high-energy bombardment brings the density of the thin carbon film material close to that of diamond, achieving high density and high hardness. However, at the same time, there is a problem that strong compressive residual stress remains in the thin film, making it prone to minute chipping and film peeling.

DLC膜を含め機械部品や工具などに使用される耐摩耗性材料では、高硬度材料がすなわち高耐摩耗性材料と考えられることが多い。薄膜材料では、押し込み式硬度計が硬度の測定に用いられる。押し込み式硬度計は変形抵抗を測定する手法であり、膜に圧縮残留応力があると硬さが高く出やすい。DLC膜の場合には、炭素質膜のダイヤモンド化率を上げるために、成膜時に高エネルギーイオンの衝撃により、通常の薄膜より大きな圧縮残留応力が残る。また、DLCは潤滑性に優れる材料であることから、他の材料との結合力が弱く、すなわちDLC膜は基体との付着力が弱いことから、圧縮残留応力による膜剥離力の影響を強く受けやすい性質を持っている。 In the case of wear-resistant materials used in machine parts and tools, including DLC films, materials with high hardness are often considered to be highly wear-resistant materials. For thin film materials, a hardness tester is used to measure the hardness. A hardness tester is a method for measuring deformation resistance, and if the film has compressive residual stress, it is likely to show high hardness. In the case of DLC films, in order to increase the diamondification rate of the carbonaceous film, the impact of high-energy ions during film formation leaves a larger compressive residual stress than in normal thin films. In addition, because DLC is a material with excellent lubricity, it has a weak bond with other materials, i.e., DLC films have a weak adhesion to the substrate, and are therefore highly susceptible to the effects of film peeling forces caused by compressive residual stress.

圧縮残留応力が抑制されたDLC膜という条件が満たされれば、耐摩耗性には、より高硬度すなわちダイヤモンドに近い膜が好ましいということもできる。ダイヤモンドの密度は3.5g/cm3 に対しグラファイトの密度は2.2g/cm3 である。DLC膜の耐久性の指針として、圧縮残留応力の観点から膜の硬度に偏重することなく、膜密度などにより、どれだけダイヤモンドに近い膜かを知ることもきわめて重要である。 If the condition of a DLC film with suppressed compressive residual stress is met, it can be said that a film with higher hardness, i.e., closer to diamond, is preferable for wear resistance. The density of diamond is 3.5 g/ cm3 , while that of graphite is 2.2 g/ cm3 . As a guideline for the durability of DLC films, it is also extremely important to know how close the film is to diamond, based on film density, etc., without placing too much emphasis on the hardness of the film from the viewpoint of compressive residual stress.

本発明は、このような点に鑑みてなされたものであり、高密度でありながら、圧縮残留応力が大きくなく、膜の剥離や破壊が生じにくいDLC膜を提供することを課題とする。また、DLC膜を被覆された部材の長寿命化を達成することを課題とする。 The present invention was made in consideration of these points, and aims to provide a DLC film that is high density, does not have large compressive residual stress, and is resistant to peeling and destruction. Another aim is to achieve a long life for components coated with the DLC film.

請求項1の発明は、実質的に水素を含有しない膜厚50nm~1.5μmのダイヤモンドライクカーボン(DLC)であり、分光エリプソメトリ法による波長550nmでの光学計測において、その屈折率が2.5~3.0、かつ消衰係数が0.75~1.20の範囲であるDLC膜である。
請求項2の発明は、請求項1のDLC膜の圧縮残留応力が0.5~2.0GPaであることを特徴とする。
請求項3の発明は、請求項1または2のDLC膜を被覆された部材である。
The invention of claim 1 is a diamond-like carbon (DLC) film having a film thickness of 50 nm to 1.5 μm that is substantially free of hydrogen, and in optical measurement at a wavelength of 550 nm by spectroscopic ellipsometry, the DLC film has a refractive index of 2.5 to 3.0 and an extinction coefficient in the range of 0.75 to 1.20.
The invention according to claim 2 is characterized in that the compressive residual stress of the DLC film according to claim 1 is 0.5 to 2.0 GPa.
The third aspect of the present invention is a member coated with the DLC film of the first or second aspect.

請求項1のDLC膜は、屈折率が2.5~3.0、かつ消衰係数が0.75~1.20の範囲であり、高密度でありながら、圧縮残留応力が大きくなく、膜の剥離や破壊が生じにくい。
請求項2のDLC膜は、膜中の圧縮残留応力が低く、膜が壊れにくいので、耐剥離性に優れている。
請求項1または2のDLC膜を被覆された部材は、低摩擦、高耐摩耗が望まれる機械部品などの摺動部材や工具などの耐摩耗部材として活用でき、部材の長寿命化を達成できる。
The DLC film of claim 1 has a refractive index of 2.5 to 3.0 and an extinction coefficient in the range of 0.75 to 1.20, and while it is high density, the compressive residual stress is not large, making the film less susceptible to peeling or destruction.
The DLC film of claim 2 has low compressive residual stress in the film and is resistant to breakage, and therefore has excellent peeling resistance.
A member coated with the DLC film of claim 1 or 2 can be used as a wear-resistant member such as a sliding member for machine parts or a tool where low friction and high wear resistance are desired, thereby achieving a longer life for the member.

分光エリプソメトリ法による光学特性評価を用いたDLCの分類法を説明するための図である。FIG. 1 is a diagram for explaining a method for classifying DLC using optical property evaluation by spectroscopic ellipsometry. 本発明のDLC膜の屈折率と消衰係数の範囲を示す図である。FIG. 2 is a diagram showing the range of refractive index and extinction coefficient of the DLC film of the present invention. 本発明のDLC膜中の含有水素をグロー放電発光分析法(GD-OES法)により計測した結果を示す図である。FIG. 1 is a diagram showing the results of measuring the hydrogen content in the DLC film of the present invention by glow discharge optical emission spectroscopy (GD-OES).

DLCの分類法として、分光エリプソメトリ評価法による屈折率nと消衰係数κによる図1のような規格案がISOに提案し検討されている(非特許文献1 NEW DIAMOND 136号(2020)1月号 3-8頁)。これはDLC膜の光学的分類法として、日本からISOに示した規格案であり、波長550nmの時の屈折率nと消衰係数κを用いてDLC膜の分類を示したものである。屈折率nは、真空中の光速を物質中の光速で割った値であり、同一物質であれば屈折率の違いから膜密度の違いを容易に知る方法として知られている。ダイヤモンドの屈折率は2.4より大きく、グラファイト膜では2以下である。一方、消衰係数κは、可視光の物質透過を示すパラメータであり、可視光透過性が悪くなると値が大きくなる。DLC膜は2種類のC-C結合(ダイヤモンドのSP3 混成軌道結合とグラファイトのSP2 混成軌道結合)が混在する非晶質膜である。C-C結合間の結合が途切れるダングリングボンドの部分が光を吸収すると消衰係数が大きくなると考えられている。また、透光性セラミックスの例では、セラミックス結晶粒子サイズが光の波長より小さいと透明性が増し、結晶サイズが波長より大きいと不透明になることが知られている。摺動部材や機械部品などで高い耐摩耗性や耐久性を望む場合にはダイヤモンドに近いDLC膜がよい。また、高い耐久性を発揮するために膜の残留応力を極力小さくすることが望まれる。このためには、DLC膜の2種類のC-C結合構造が適切なサイズで均一に分布し、膜内歪が少ないことが望ましい。 As a classification method for DLC, a proposed standard as shown in FIG. 1 based on the refractive index n and extinction coefficient κ by the spectroscopic ellipsometry evaluation method has been proposed to ISO and is being considered (Non-Patent Document 1 NEW DIAMOND No. 136 (2020) January issue, pp. 3-8). This is a proposed standard presented by Japan to ISO as an optical classification method for DLC films, and shows the classification of DLC films using the refractive index n and extinction coefficient κ at a wavelength of 550 nm. The refractive index n is the value obtained by dividing the speed of light in a vacuum by the speed of light in a substance, and is known as a method for easily finding the difference in film density from the difference in refractive index if the substance is the same. The refractive index of diamond is greater than 2.4, and that of graphite film is less than 2. On the other hand, the extinction coefficient κ is a parameter that indicates the material transmission of visible light, and the value increases as the visible light transmittance decreases. DLC films are amorphous films that contain two types of C-C bonds (the SP 3 hybrid orbital bonds of diamond and the SP 2 hybrid orbital bonds of graphite). It is believed that the extinction coefficient increases when the dangling bonds, where the bonds between C-C bonds are broken, absorb light. In the case of translucent ceramics, it is known that when the ceramic crystal grain size is smaller than the wavelength of light, the transparency increases, and when the crystal grain size is larger than the wavelength, the transparency becomes opaque. When high wear resistance and durability are required for sliding members and machine parts, DLC films, which are similar to diamond, are good. In addition, to achieve high durability, it is desirable to minimize the residual stress of the film. To achieve this, it is desirable for the two types of C-C bond structures in the DLC film to be uniformly distributed at appropriate sizes and to have little strain within the film.

DLC膜の製法には、CVD法(化学蒸着法)やPVD法(物理蒸着法)がある。水素を含まないDLC膜の製法には、一般的にPVD法が使用される。水素を含まないダイヤモンドに近い密度のDLC膜の作製には、イオン化した炭素を50~150V以上(場合によっては数kV)の高電圧で加速し、高エネルギーで基体に衝撃させる方法や、炭素の基体上への堆積と同時にアルゴンイオンなどを高電圧で加速し高エネルギーで衝撃することで、C-C結合をダイヤモンド型の結合に変化させる方法が使用されている。しかし、このような製法で作製されるDLC膜はダイヤモンドのC-C結合エネルギー7.2eVより格段に高いエネルギー衝撃により、密度もダイヤモンドに近づくが、強い圧縮残留応力が残り、微小な欠落や膜剥離が生じやすくなる課題があった。過大な残留応力を低減するためには、ダイヤモンドのC-C結合エネルギーレベルにイオンの加速電圧を下げることが良いが、さらに緻密なDLC膜を得るためには、低エネルギーのイオンによる衝撃回数を大幅に増やすことにより、高密度と低い残留応力を示すDLC膜を作製できる。 DLC films are produced by chemical vapor deposition (CVD) and physical vapor deposition (PVD). Hydrogen-free DLC films are generally produced by the PVD method. To produce hydrogen-free DLC films with a density close to that of diamond, a method is used in which ionized carbon is accelerated at a high voltage of 50 to 150 V or more (several kV in some cases) and bombarded with high energy on the substrate, or a method is used in which argon ions are accelerated at a high voltage and bombarded with high energy while carbon is being deposited on the substrate, thereby changing the C-C bonds to diamond-type bonds. However, DLC films produced by such methods have a density close to that of diamond due to the energy bombardment that is significantly higher than the C-C bond energy of diamond, 7.2 eV, but there is a problem that strong compressive residual stress remains, making it easy for minute chipping and film peeling to occur. In order to reduce excessive residual stress, it is effective to lower the ion acceleration voltage to the C-C bond energy level of diamond, but to obtain an even denser DLC film, it is possible to create a DLC film that exhibits high density and low residual stress by significantly increasing the number of bombardments with low-energy ions.

分光エリプソメトリ評価法による消衰係数κは、可視光の物質透過を示すパラメータであり、結晶質材料であれば、結晶粒子が可視光より小さければ小さな値を示す。本発明のDLC膜は、図1の光学的分類図には含まれない領域にあり、図2の網掛け部(本発明のDLC膜の光学的評価領域)のように高屈折率でありながら大きな消衰係数を示す領域にある。これは、ダイヤモンドのC-C結合エネルギーレベル7.2eVに近い低エネルギーのイオンによる、通常より数桁多い回数の衝撃により作製された高密度なDLC膜であり、かつアモルファスでありながらもSP2 混成軌道結合とSP3 混成軌道結合とからなる組織構造が均質に分散し、その組織構造に存在した多数のダングリングボンドあるいは構造サイズにより可視光を強く吸収したことから、消衰係数を大きくするためと推測される。すなわち、低エネルギーのイオンを丹念に絨毯爆撃的にC-C結合へ衝撃を加えることで均質で残留応力の少ない、かつ高密度の高品質なDLC膜を作製することができたと考えられる。 The extinction coefficient κ measured by the spectroscopic ellipsometry evaluation method is a parameter indicating the material transmission of visible light, and if the material is crystalline, it will show a small value if the crystal grains are smaller than visible light. The DLC film of the present invention is in a region not included in the optical classification diagram of FIG. 1, and is in a region that shows a large extinction coefficient while having a high refractive index, as shown in the shaded area of FIG. 2 (optical evaluation region of the DLC film of the present invention). This is presumed to be because the DLC film is a high-density DLC film produced by bombardment several orders of magnitude more than usual with low-energy ions close to the C-C bond energy level of diamond, and the tissue structure consisting of SP 2 hybrid orbital bonds and SP 3 hybrid orbital bonds is homogeneously dispersed even though it is amorphous, and the visible light is strongly absorbed due to the large number of dangling bonds or structure size present in the tissue structure, thereby increasing the extinction coefficient. In other words, it is believed that a homogeneous, low-residual-stress, high-density, high-quality DLC film could be produced by carefully carpet-bombarding the C-C bonds with low-energy ions.

摺動性、耐摩耗性、耐久性に優れるDLC膜では高密度で圧縮残留応力が小さいことが望まれる。分光エリプソメトリ法による波長550nmでの光学計測による屈折率nと消衰係数κの好適な範囲(本発明のDLC膜の光学的評価領域)を図2の網掛け部に示した。すなわち、従来のDLC分類法では知られていなかった屈折率が2.5~3.0、かつ消衰係数が0.75~1.20の範囲である。また、本発明のDLC膜は高密度で小さな残留応力を示すことから最適な膜である。圧縮残留応力値は、成膜前後のSi基板の変形量から計測でき、0.5~2.0GPaが良く、従来DLC膜の2.5~7.0GPaより小さい。圧縮残留応力は0.5~1.5GPaがより好ましい。 For DLC films with excellent sliding properties, wear resistance, and durability, it is desirable to have high density and small compressive residual stress. The preferred range of refractive index n and extinction coefficient κ (optical evaluation range of the DLC film of the present invention) measured optically at a wavelength of 550 nm by spectroscopic ellipsometry is shown in the shaded area in Figure 2. That is, the refractive index is in the range of 2.5 to 3.0 and the extinction coefficient is in the range of 0.75 to 1.20, which was not known in the conventional DLC classification method. In addition, the DLC film of the present invention is an optimal film because it has high density and shows small residual stress. The compressive residual stress value can be measured from the deformation amount of the Si substrate before and after film formation, and is preferably 0.5 to 2.0 GPa, which is smaller than the 2.5 to 7.0 GPa of conventional DLC films. The compressive residual stress is more preferably 0.5 to 1.5 GPa.

本発明のDLC膜の膜厚は50nm~1.5μmが好ましい。膜厚が1.5μmより厚くなると圧縮応力が強くなりすぎ、応力がかかる摺動部材や機械部品などの用途では、膜剥離などが生じやすくなる。膜厚が薄くなると膜剥離が起こりにくくなるので、1μm以下の膜厚はより好ましい。本発明のDLC膜の作製には、低エネルギーのイオンを丹念に絨毯爆撃的に衝撃することから、DLC膜の表面は平坦性にも優れる。このことから摩擦係数も小さく、優れた摺動特性を発揮する。 The thickness of the DLC film of the present invention is preferably 50 nm to 1.5 μm. If the film thickness is greater than 1.5 μm, the compressive stress becomes too strong, and film peeling is likely to occur in applications such as sliding members and machine parts that are subject to stress. As film peeling is less likely to occur as the film thickness becomes thinner, a film thickness of 1 μm or less is more preferable. The DLC film of the present invention is produced by carefully bombarding the film with low-energy ions in a carpet bombardment manner, so the surface of the DLC film also has excellent flatness. This results in a small coefficient of friction and excellent sliding properties.

本発明のDLC膜は、実質的に水素を含有しない。図3はグロー放電発光分析法(GD-OES法)による本発明DLC膜中の水素分析結果であり、縦軸に検出元素発光線の強度、横軸に分析時間を示す。分析時間2sから30sまでが薄膜の領域、30sから40sまでが薄膜とSi基板の界面の領域、40s以降がSi基板の領域となる。分析開始初期の2sから6s付近まで水素が検出されているが、これは成膜後の保管時に、膜表面に付着している水分を検出したと考えられる。このように、膜表面に吸着した水素を確認できるが、膜中には水素はほぼ存在していない。DLC膜内部は実質的に炭素のみで構成されている。 The DLC film of the present invention does not substantially contain hydrogen. Figure 3 shows the results of hydrogen analysis of the DLC film of the present invention by glow discharge optical emission spectrometry (GD-OES), with the intensity of the detected element emission line on the vertical axis and the analysis time on the horizontal axis. The analysis time from 2 s to 30 s is the thin film region, from 30 s to 40 s is the interface region between the thin film and the Si substrate, and from 40 s onwards is the Si substrate region. Hydrogen was detected from 2 s to around 6 s at the start of the analysis, which is thought to be due to the detection of moisture adhering to the film surface during storage after film formation. In this way, hydrogen adsorbed on the film surface can be confirmed, but there is almost no hydrogen in the film. The inside of the DLC film is essentially composed of only carbon.

水素は炭素のダングリングボンドと容易に結合し、C-H結合を形成しやすい。このC-H結合は、C-C結合におけるダイヤモンド結合の形成を妨げる傾向にあり、密度も小さく屈折率も小さい。ダイヤモンド結合50%以上のta-Cに分類されるDLC膜の成膜は、通常、水分をきらうため高真空下で行われる。しかしながら、真空炉内の壁に付着する水分子が分解して水素が発生することから、膜中に0.5%以下の微量水素が残留することもある。また、成膜後、空気中で保管することによって、DLC膜表面に空気や水分が付着することも有り得る。DLC膜には2種類のC-C結合(ダイヤモンドのSP3 混成軌道結合とグラファイトのSP2 混成軌道結合)が混在するが、その量を放射光のNEXAFSを使って測定した。本発明のDLC膜はSP3 結合が50%以上であった。 Hydrogen easily bonds with dangling bonds of carbon and easily forms C-H bonds. This C-H bond tends to prevent the formation of diamond bonds in C-C bonds, and has a low density and a low refractive index. The formation of DLC films classified as ta-C with diamond bonds of 50% or more is usually performed under high vacuum because they dislike moisture. However, water molecules adhering to the walls of the vacuum furnace decompose to generate hydrogen, so a trace amount of hydrogen of 0.5% or less may remain in the film. In addition, air or moisture may adhere to the surface of the DLC film by storing it in air after film formation. The DLC film contains two types of C-C bonds (SP 3 hybrid orbital bonds of diamond and SP 2 hybrid orbital bonds of graphite), and the amount of these bonds was measured using NEXAFS of synchrotron radiation. The DLC film of the present invention had SP 3 bonds of 50% or more.

本発明のDLC膜は膜中に水素を含まないことから、炭素源として原料ガスに炭化水素ガスを使うCVD法は適していない。炭素源には、カーボンターゲットからのスパッタやフラーレンC60のように水素を含まない原料を使用する。また、大量のイオン源での均質な基体衝撃が必要なことから、アルゴンやアルゴンクラスターなどのイオンビームを使用することが好ましい。 Since the DLC film of the present invention does not contain hydrogen in the film, the CVD method using a hydrocarbon gas as a raw material gas as a carbon source is not suitable. For the carbon source, a raw material that does not contain hydrogen, such as sputtering from a carbon target or fullerene C60, is used. In addition, since a homogeneous bombardment of the substrate with a large amount of ion source is required, it is preferable to use an ion beam such as argon or argon cluster.

本発明の被覆部材に使用される基体は、被覆部材の用途によって異なる。摺動部材や機械部品には、高炭素鋼、ダイス鋼などの金属や超硬合金などが選ばれる。また、電子部材では、Si、セラミックス、耐熱樹脂が選ばれ、生体材料では、TiあるいはTi合金やアパタイトなどのセラミックスが選ばれる。また、種々の基体材料表面に本発明のDLC薄膜を形成する場合、基体との付着強度を上げるために、ケイ素、クロム、タングステン、チタン及びその炭化物のうち1種類または2種類以上からなる中間層膜を基体との間に設けることができる。中間層の膜厚は、特に限定しないが、DLC薄膜の膜厚以下が好ましい。 The substrate used for the coated member of the present invention varies depending on the application of the coated member. For sliding members and machine parts, metals such as high carbon steel and die steel, and cemented carbide are selected. For electronic components, Si, ceramics, and heat-resistant resins are selected, and for biomaterials, Ti or Ti alloys and ceramics such as apatite are selected. When forming the DLC thin film of the present invention on the surface of various substrate materials, an intermediate layer film made of one or more of silicon, chromium, tungsten, titanium, and carbides thereof can be provided between the substrate and the DLC thin film in order to increase the adhesion strength with the substrate. The thickness of the intermediate layer is not particularly limited, but is preferably equal to or less than the thickness of the DLC thin film.

以下、本発明の試験結果に基づき、本発明の実施例を示し、さらに詳しく説明する。もちろん本発明は、以下の実施例に限定されるものでなく、様々な実施の形態をさらに具体的にとりうることは言うまでもない。 Below, examples of the present invention will be shown based on the test results of the present invention, and the invention will be described in more detail. Of course, the present invention is not limited to the following examples, and various more specific embodiments are possible.

Si基体表面への炭素質材料の蒸着と並行してアルゴンイオンビームを基体に照射することで、膜厚150nmのDLC薄膜を作製した。成膜条件は、表1に示す。アルゴン原子の加速エネルギー、および炭素原子数とアルゴン原子数の比を変数として、本発明試料1~4および比較試料1~3を作製した。また、各試料について、分光エリプソメトリ法により波長550nmで光学計測を行い、各試料の屈折率nと消衰係数κを測定した。また、圧縮残留応力値はDLC膜の形成前後のSi基体の変形量の測定から求めた。 A DLC thin film with a thickness of 150 nm was produced by irradiating the substrate with an argon ion beam in parallel with the deposition of carbonaceous material on the surface of the Si substrate. The film formation conditions are shown in Table 1. Samples 1 to 4 of the present invention and comparative samples 1 to 3 were produced using the acceleration energy of argon atoms and the ratio of the number of carbon atoms to the number of argon atoms as variables. In addition, optical measurements were performed on each sample using spectroscopic ellipsometry at a wavelength of 550 nm to measure the refractive index n and extinction coefficient κ of each sample. In addition, the compressive residual stress value was obtained by measuring the amount of deformation of the Si substrate before and after the formation of the DLC film.

Figure 0007690730000001
Figure 0007690730000001

本発明試料1~4はすべて、本発明範囲の屈折率と消衰係数を示し、圧縮残留応力は2GPa以下を示した。比較試料1では、炭素原子数に対してアルゴン原子数が多いものの加速電圧がダイヤモンドのC-C結合エネルギー7.2eVよりも過剰に大きいために、膜内に大きな応力が残留して高硬度な被膜となった。比較試料2は、アークイオンプレーティング法によりDLC膜を作製した例を示す。ダイヤモンドのC-C結合エネルギー7.2eVよりも高い加速電圧を加えた。ダイヤモンドに近い硬度を示し、高屈折率で小さな消衰係数値を示した。しかし、残留応力が大きく、耐剥離性に問題がある。比較試料3では、アルゴン原子数に対して炭素原子数が少なく被膜形成されなかった。 All of the inventive samples 1 to 4 exhibited refractive index and extinction coefficient within the range of the inventive method, and the compressive residual stress was 2 GPa or less. In comparative sample 1, the number of argon atoms was high relative to the number of carbon atoms, but the accelerating voltage was excessively higher than the C-C bond energy of diamond, 7.2 eV, so a large stress remained in the film and the film became very hard. Comparative sample 2 shows an example of a DLC film produced by the arc ion plating method. An accelerating voltage higher than the C-C bond energy of diamond, 7.2 eV, was applied. It showed hardness close to that of diamond, a high refractive index, and a small extinction coefficient value. However, the residual stress was large, and there was a problem with peeling resistance. In comparative sample 3, the number of carbon atoms relative to the number of argon atoms was low, so no film was formed.

本発明による屈折率が2.5~3.0かつ消衰係数が0.75~1.20の範囲であるDLC膜は、高密度かつ圧縮残留応力が小さく、膜の剥離や破壊が生じにくく、低摩擦、高耐摩耗、長寿命が望まれる機械部品や工具部材などに活用できる。また、電子部材用途や生体用部材にも使用できる。 The DLC film according to the present invention, which has a refractive index of 2.5 to 3.0 and an extinction coefficient in the range of 0.75 to 1.20, has high density and small compressive residual stress, and is less susceptible to peeling or destruction, making it suitable for use in machine parts and tool components that require low friction, high wear resistance, and a long life. It can also be used in electronic components and biomaterials.

Claims (3)

実質的に水素を含有しない膜厚50nm~1.5μmのダイヤモンドライクカーボン(DLC)であり、分光エリプソメトリ法による波長550nmでの光学計測において、その屈折率が2.5~3.0、かつ消衰係数が0.75~1.20の範囲であるDLC膜。 A diamond-like carbon (DLC) film with a thickness of 50 nm to 1.5 μm that is substantially hydrogen-free, and in optical measurements at a wavelength of 550 nm using spectroscopic ellipsometry, the DLC film has a refractive index of 2.5 to 3.0 and an extinction coefficient in the range of 0.75 to 1.20. 膜の圧縮残留応力が0.5~2.0GPaである請求項1のDLC膜。 The DLC film of claim 1, in which the compressive residual stress of the film is 0.5 to 2.0 GPa. 請求項1または2のDLC膜を被覆された部材。 A component coated with the DLC film of claim 1 or 2.
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