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JP7697905B2 - Wiring board and probe card - Google Patents
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JP7697905B2 - Wiring board and probe card - Google Patents

Wiring board and probe card Download PDF

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JP7697905B2
JP7697905B2 JP2022055458A JP2022055458A JP7697905B2 JP 7697905 B2 JP7697905 B2 JP 7697905B2 JP 2022055458 A JP2022055458 A JP 2022055458A JP 2022055458 A JP2022055458 A JP 2022055458A JP 7697905 B2 JP7697905 B2 JP 7697905B2
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wiring
conductors
wiring conductors
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JP2023147760A (en
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隼 瀬戸口
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Kyocera Corp
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Description

本開示は、配線基板及びプローブカードに関する。 This disclosure relates to wiring boards and probe cards.

特許文献1には、プローブカード用の配線基板について記載されている。 Patent document 1 describes a wiring substrate for a probe card.

特開2010-177555号公報JP 2010-177555 A

プローブカード用の配線基板は、下面に複数のプローブピンが接合され、上面に複数の配線導体を有する。上面の複数の配線導体には、複数の接触導体がそれぞれ接触し、接触導体を介して配線基板と当該配線基板とは別の回路基板とが電気的に接続される。配線基板は接触導体との良好な接触性(適度な圧力で良好な導通が得られる接触)が望まれる。 A wiring board for a probe card has multiple probe pins bonded to its underside and multiple wiring conductors on its top side. Multiple contact conductors contact the multiple wiring conductors on the top side, respectively, and the wiring board is electrically connected to a circuit board separate from the wiring board via the contact conductors. It is desirable for the wiring board to have good contact with the contact conductors (contact that provides good conductivity with moderate pressure).

本開示は、接触導体との良好な接触性を実現できる配線基板及びプローブカードを提供することを目的とする。 The present disclosure aims to provide a wiring board and a probe card that can achieve good contact with the contact conductor.

本開示に係る配線基板は、
第1面と前記第1面の反対側に位置する第2面とを有する絶縁基板と、
前記第1面上及び前記第2面上に位置する複数の配線導体と、
を備え、
前記第1面を、前記第1面の中央に位置する円形の第1領域と、前記第1領域の周りを囲いかつ前記第1領域と同一の面積を有する第2領域と、の2つの領域に分けたとき、
前記複数の配線導体は、前記第1領域に位置する複数の第1配線導体と、前記第2領域に位置する複数の第2配線導体とを含み、
前記複数の第2配線導体の厚みが、前記複数の第1配線導体の厚みよりも大きい。
The wiring board according to the present disclosure includes:
an insulating substrate having a first surface and a second surface opposite to the first surface;
a plurality of wiring conductors located on the first surface and the second surface;
Equipped with
When the first surface is divided into two regions, a circular first region located at the center of the first surface, and a second region surrounding the first region and having the same area as the first region,
the plurality of wiring conductors include a plurality of first wiring conductors located in the first region and a plurality of second wiring conductors located in the second region;
The thickness of the second wiring conductors is greater than the thickness of the first wiring conductors.

本開示に係るプローブカードは、
上記の配線基板と、
前記第2面上に位置する複数の配線導体にそれぞれ電気的に接続された複数のプローブピンと、
を備える。
The probe card according to the present disclosure comprises:
The above wiring board;
a plurality of probe pins electrically connected to a plurality of wiring conductors located on the second surface;
Equipped with.

本開示に係るもう一つの態様のプローブカードは、
前記第1面上に位置する1つ又は複数の接合用金属膜を備え、
前記接合用金属膜の総数の半分以上が前記第1領域に位置する上記の配線基板と、
前記第2面上に位置する複数の配線導体にそれぞれ電気的に接続された複数のプローブピンと、
前記接合用金属膜に接合された金属部材と、
を備える。
Another aspect of the present disclosure provides a probe card comprising:
one or more bonding metal films located on the first surface;
the wiring substrate in which more than half of the total number of the bonding metal films are located in the first region;
a plurality of probe pins electrically connected to a plurality of wiring conductors located on the second surface;
A metal member bonded to the bonding metal film;
Equipped with.

本開示によれば、接続用導体との良好な接続性を実現できる配線基板及びプローブカードを提供できる。 This disclosure provides a wiring board and a probe card that can achieve good connectivity with the connecting conductor.

本開示の実施形態1に係る配線導体を示す平面図である。FIG. 2 is a plan view showing a wiring conductor according to the first embodiment of the present disclosure. 実施形態1の配線導体を示す縦断面図(A)と一部の拡大図(B)、(C)である。1A is a longitudinal sectional view showing a wiring conductor of embodiment 1, and FIG. 1B is a partially enlarged view showing the same. 本開示の実施形態1に係るプローブカードを示す縦断面図である。1 is a vertical cross-sectional view showing a probe card according to a first embodiment of the present disclosure. 本開示の実施形態2に係る配線導体を示す平面図である。FIG. 11 is a plan view showing a wiring conductor according to a second embodiment of the present disclosure. 本開示の実施形態2に係るプローブカードを示す縦断面図である。FIG. 11 is a longitudinal sectional view showing a probe card according to a second embodiment of the present disclosure.

以下、本開示の各実施形態について図面を参照して詳細に説明する。 Each embodiment of the present disclosure will be described in detail below with reference to the drawings.

(実施形態1)
図1は、本開示の実施形態1に係る配線導体を示す平面図である。図2は、実施形態1の配線導体を示す縦断面図(A)と一部の拡大図(B)、(C)である。図3は、本開示の実施形態1に係るプローブカードを示す縦断面図である。図2(A)及び図3は、配線導体12、13、14の数を減らすなどの作図上の単純化を行った概略図を示している。図2(A)及び図3においては、各構成の縦横比、絶縁基板11の反り量、配線導体12、13の厚み、第1面S1に対する配線導体12の傾斜角などを誇張して示している。以下、配線基板10の第1面S1側を上方、第2面S2側を下方として説明する。図1は配線基板10の第1面S1側を示す。
(Embodiment 1)
FIG. 1 is a plan view showing a wiring conductor according to the first embodiment of the present disclosure. FIG. 2 is a longitudinal cross-sectional view (A) showing the wiring conductor according to the first embodiment, and partial enlarged views (B) and (C). FIG. 3 is a longitudinal cross-sectional view showing a probe card according to the first embodiment of the present disclosure. FIG. 2(A) and FIG. 3 show schematic diagrams in which the number of wiring conductors 12, 13, and 14 has been reduced, and the like has been simplified in terms of drawing. In FIG. 2(A) and FIG. 3, the aspect ratio of each component, the amount of warping of the insulating substrate 11, the thickness of the wiring conductors 12 and 13, the inclination angle of the wiring conductor 12 relative to the first surface S1, and the like are exaggerated. Hereinafter, the first surface S1 side of the wiring board 10 will be described as the upper side, and the second surface S2 side as the lower side. FIG. 1 shows the first surface S1 side of the wiring board 10.

実施形態1の配線基板10は、プローブカード用の配線基板10であってもよい。配線基板10は、第1面S1と第1面S1の反対側に位置する第2面S2とを有する絶縁基板11と、第1面S1上に位置する複数の配線導体12と、第2面S2上に位置する複数の配線導体13と、絶縁基板11の内部に位置する配線導体14とを備える。 The wiring board 10 of the first embodiment may be a wiring board 10 for a probe card. The wiring board 10 includes an insulating substrate 11 having a first surface S1 and a second surface S2 located on the opposite side of the first surface S1, a plurality of wiring conductors 12 located on the first surface S1, a plurality of wiring conductors 13 located on the second surface S2, and a wiring conductor 14 located inside the insulating substrate 11.

絶縁基板11の材質は、ムライトセラミック、あるいは、その他のセラミックであってもよい。配線基板10及び絶縁基板11は、平面視において、8個以上の角部を有する正多角形状、あるいは、円形状であってもよい。当該形状とすることで、絶縁基板11の縁部において応力を分散させることができ、よって配線基板10の強度を向上できる。配線基板10及び絶縁基板11は、プローブカード1により検査の対象であるウエハ(シリコンウエハ等)に対応した大きさを有してもよい。配線基板10がプローブカード1として使用される場合、配線基板10の第1面S1は、検査装置に接続された回路基板20(図3)に対向する面であってもよい。配線基板10の第2面S2は検査の対象(シリコンウエハ等)に対向する面であってもよい。 The material of the insulating substrate 11 may be mullite ceramic or other ceramics. The wiring substrate 10 and the insulating substrate 11 may be a regular polygon having eight or more corners or a circle in a plan view. By using such a shape, stress can be dispersed at the edge of the insulating substrate 11, and thus the strength of the wiring substrate 10 can be improved. The wiring substrate 10 and the insulating substrate 11 may have a size corresponding to the wafer (silicon wafer, etc.) that is the object of inspection by the probe card 1. When the wiring substrate 10 is used as the probe card 1, the first surface S1 of the wiring substrate 10 may be a surface facing the circuit substrate 20 (FIG. 3) connected to the inspection device. The second surface S2 of the wiring substrate 10 may be a surface facing the object of inspection (silicon wafer, etc.).

配線導体12、13、14(図2(A))は、第1面S1と第2面S2との間で信号又は電源電圧のやり取り(送りおよび受け取り)をする導体であってもよい。 The wiring conductors 12, 13, and 14 (FIG. 2(A)) may be conductors that exchange (send and receive) signals or power supply voltages between the first surface S1 and the second surface S2.

第1面S1上の複数の配線導体12は、接触導体31(図3)を介して回路基板20と電気的に接続される導体であってもよい。複数の配線導体12は、電極パッドであってもよい。接触導体31はバネの作用を有し、バネの反発力を用いて配線導体12に接触することで配線導体12と導通する構成であってもよい。配線導体12は、スパッタ工程等の薄膜形成工程により第1面S1上に配線導体12に対応するパターンの薄膜を形成した後、電解めっき工程により上記薄膜上にメッキを施すことで形成された導体であってもよい。 The multiple wiring conductors 12 on the first surface S1 may be conductors electrically connected to the circuit board 20 via contact conductors 31 (FIG. 3). The multiple wiring conductors 12 may be electrode pads. The contact conductors 31 may have a spring effect and be configured to contact the wiring conductors 12 using the repulsive force of the spring to establish electrical continuity with the wiring conductors 12. The wiring conductors 12 may be conductors formed by forming a thin film of a pattern corresponding to the wiring conductors 12 on the first surface S1 by a thin film formation process such as a sputtering process, and then plating the thin film by an electrolytic plating process.

第2面S2上の複数の配線導体13は、プローブピン41(図3)が接合される導体であってもよい。複数の配線導体13は、電極パッドであってもよい。配線導体13は、スパッタ工程等の薄膜形成工程により第2面S2上に配線導体13に対応するパターンの薄膜を形成した後、電解めっき工程により上記薄膜上にメッキを施すことで形成された導体であってもよい。 The multiple wiring conductors 13 on the second surface S2 may be conductors to which probe pins 41 (FIG. 3) are joined. The multiple wiring conductors 13 may be electrode pads. The wiring conductors 13 may be conductors formed by forming a thin film of a pattern corresponding to the wiring conductors 13 on the second surface S2 by a thin film formation process such as a sputtering process, and then plating the thin film by an electrolytic plating process.

配線導体14は、第1面S1上の配線導体12と第2面S2上の配線導体13とを電気的に繋ぐ導体であってもよい。絶縁基板11は複数の絶縁層が積み重ねられた積層構造を有し、配線導体14は複数の絶縁層の間に位置する膜状又は線状のメタライズ導体と、絶縁層の層間にわたって延在するビア導体とを含んでもよい。 The wiring conductor 14 may be a conductor that electrically connects the wiring conductor 12 on the first surface S1 and the wiring conductor 13 on the second surface S2. The insulating substrate 11 has a laminated structure in which multiple insulating layers are stacked, and the wiring conductor 14 may include a film-like or linear metallized conductor located between the multiple insulating layers and a via conductor extending between the insulating layers.

<第1面S1の配線導体12、並びに、第2面S2の配線導体13の詳細>
以下では、第1面S1を、第1面S1の中央に位置する円形の第1領域R1と、第1領域R1を囲みかつ第1領域R1と面積が等しい第2領域R2との2つの領域に分けて説明する。図1において、一点鎖線により第1領域R1と第2領域R2との境界を示す。第1領域R1の中心点は第1面S1の中心点と重なっていてもよい。以下では、第1領域R1に位置する配線導体12を「第1配線導体12a」と記し、第2領域R2に位置する配線導体12を「第2配線導体12b」と記し、第2面S2に位置する配線導体13を「第3配線導体13」と記す。
<Details of the Wiring Conductor 12 on the First Surface S1 and the Wiring Conductor 13 on the Second Surface S2>
In the following, the first surface S1 will be described by dividing it into two regions: a circular first region R1 located at the center of the first surface S1, and a second region R2 surrounding the first region R1 and having an area equal to that of the first region R1. In FIG. 1, the boundary between the first region R1 and the second region R2 is indicated by a dashed line. The center point of the first region R1 may overlap with the center point of the first surface S1. In the following, the wiring conductor 12 located in the first region R1 will be referred to as the "first wiring conductor 12a", the wiring conductor 12 located in the second region R2 will be referred to as the "second wiring conductor 12b", and the wiring conductor 13 located on the second surface S2 will be referred to as the "third wiring conductor 13".

図2(A)に示すように、複数の第2配線導体12bの厚みは、複数の第1配線導体12aの厚みよりも大きい。個々の第1配線導体12aの厚みT1aa(図2(B))は一定でなくてもよい。同様に、個々の第2配線導体12bの厚みT2aa(図2(C))は一定でなくてもよい。複数の第1配線導体12aの厚みとは、全ての第1配線導体12aの平均の厚み、厚みの中央値、極端な大小を除くために厚みの大きい方から3%の第1配線導体12aと厚みの小さい方から3%の第1配線導体12aを除いた上での厚みの平均値、最大値又は最小値であってもよい。同様に、上記の複数の第2配線導体12bの厚みとは、全ての第2配線導体12bの平均の厚み、厚みの中央値、極端な大小を除くために厚みの大きい方から3%の第2配線導体12bと厚みの小さい方から3%の第2配線導体12bを除いた上での厚みの平均値、最大値又は最小値であってもよい。厚みを比較する場合には、第1配線導体12aの厚みと第2配線導体12bの厚みとに同一の定義が適用されればよい。 As shown in FIG. 2A, the thickness of the second wiring conductors 12b is greater than the thickness of the first wiring conductors 12a. The thickness T1aa (FIG. 2B) of each of the first wiring conductors 12a may not be constant. Similarly, the thickness T2aa (FIG. 2C) of each of the second wiring conductors 12b may not be constant. The thickness of the first wiring conductors 12a may be the average thickness of all the first wiring conductors 12a, the median thickness, the average thickness after removing the thickest 3% of the first wiring conductors 12a and the thinnest 3% of the first wiring conductors 12a to remove extreme thicknesses, the maximum thickness, or the minimum thickness. Similarly, the thickness of the multiple second wiring conductors 12b may be the average thickness of all the second wiring conductors 12b, the median thickness, the average thickness, the maximum thickness, or the minimum thickness after removing the thickest 3% of the second wiring conductors 12b and the thinnest 3% of the second wiring conductors 12b to eliminate extreme differences. When comparing thicknesses, the same definition may be applied to the thickness of the first wiring conductor 12a and the thickness of the second wiring conductor 12b.

第1配線導体12aの厚み、並びに、第2配線導体12bの厚みは、配線導体12を形成するめっき工程として電解めっきを適用し、電解めっき時における第1配線導体12aのパターンに流す電流と、第2配線導体12bのパターンに流す電流とを調整することで制御されてもよい。 The thickness of the first wiring conductor 12a and the thickness of the second wiring conductor 12b may be controlled by applying electrolytic plating as the plating process for forming the wiring conductors 12 and adjusting the current passed through the pattern of the first wiring conductor 12a and the current passed through the pattern of the second wiring conductor 12b during electrolytic plating.

上記の構成によれば、複数の配線導体12と複数の接触導体31(図3)とを導通させる際に、第1領域R1の第1配線導体12aの表面と接触導体31との距離が比較的に大きくなる。一方、第2領域R2の第2配線導体12bの表面と接触導体31との距離が比較的に小さくなる。したがって、第1配線導体12aに接触導体31から加わる圧力を小さくし、第2領域R2の第2配線導体12bに接触導体31から加わる圧力を大きくすることができる。したがって、第2配線導体12bと接触導体31との接触性が向上する。さらに、第1面S1において配線導体12は第1領域R1に多く集まる傾向がある。よって、仮に、個々の接触導体31から個々の第1配線導体12aに加わる圧力が大きいと、第1領域R1に加わる全体の圧力が過大になり、配線導体12に生じる応力が増す。しかしながら、実施形態1の上記構成によれば、第1領域R1に加わる全体の圧力が低減されるので、配線基板10に生じる応力を低減できる。よって、第1領域R1及び第2領域R2の両方において配線導体12と接触導体31との良好な接触性が得られる。 According to the above configuration, when the multiple wiring conductors 12 and the multiple contact conductors 31 (FIG. 3) are electrically connected, the distance between the surface of the first wiring conductor 12a in the first region R1 and the contact conductor 31 becomes relatively large. On the other hand, the distance between the surface of the second wiring conductor 12b in the second region R2 and the contact conductor 31 becomes relatively small. Therefore, the pressure applied from the contact conductor 31 to the first wiring conductor 12a can be reduced, and the pressure applied from the contact conductor 31 to the second wiring conductor 12b in the second region R2 can be increased. Therefore, the contact between the second wiring conductor 12b and the contact conductor 31 is improved. Furthermore, the wiring conductors 12 tend to gather more in the first region R1 on the first surface S1. Therefore, if the pressure applied from each contact conductor 31 to each first wiring conductor 12a is large, the total pressure applied to the first region R1 becomes excessive, and the stress generated in the wiring conductor 12 increases. However, according to the above configuration of the first embodiment, the overall pressure applied to the first region R1 is reduced, so that the stress generated in the wiring board 10 can be reduced. Therefore, good contact between the wiring conductor 12 and the contact conductor 31 can be obtained in both the first region R1 and the second region R2.

第1面S1の配線導体12(第1配線導体12a及び第2配線導体12b)は、中央に近いほど漸次厚みが小さくなる構成であってもよい。当該構成により、接触導体31から配線導体12へ加わる圧力を、第1面S1の縁に近いほど大きくでき、第1面S1の縁の近くに位置する配線導体12と接触導体31との接触性をより向上できる。さらに、第1面S1の中央部に複数の接触導体31から加わる合計圧力が低くなり、配線基板10に生じる応力を低減できる。したがって、中央部における配線導体12と接触導体31との接触性をより良好にすることができる。 The wiring conductors 12 (first wiring conductor 12a and second wiring conductor 12b) on the first surface S1 may be configured so that their thickness gradually decreases toward the center. With this configuration, the pressure applied from the contact conductors 31 to the wiring conductors 12 can be increased toward the edge of the first surface S1, and the contact between the wiring conductors 12 located near the edge of the first surface S1 and the contact conductors 31 can be further improved. Furthermore, the total pressure applied from the multiple contact conductors 31 to the center of the first surface S1 is reduced, and the stress generated in the wiring board 10 can be reduced. Therefore, the contact between the wiring conductors 12 and the contact conductors 31 in the center can be improved.

平面視において、複数の第1配線導体12aの総面積は、複数の第2配線導体12bの総面積よりも大きくてもよい。当該構成においては、第1配線導体12aの厚さと第2配線導体12bの厚さとが仮に同一であると、第1領域R1に接触導体31から加わる合計圧力が、第2領域R2に接触導体31から加わる合計圧力よりも大きくなる。したがって、当該構成において、第1配線導体12aの厚さを、第2配線導体12bの厚さよりも小さくすることで、第1領域R1の上記合計圧力が低減され、第1領域R1において良好な接触性が得られる。 In a plan view, the total area of the multiple first wiring conductors 12a may be greater than the total area of the multiple second wiring conductors 12b. In this configuration, if the thickness of the first wiring conductor 12a and the thickness of the second wiring conductor 12b are the same, the total pressure applied from the contact conductor 31 to the first region R1 is greater than the total pressure applied from the contact conductor 31 to the second region R2. Therefore, in this configuration, by making the thickness of the first wiring conductor 12a smaller than the thickness of the second wiring conductor 12b, the total pressure in the first region R1 is reduced, and good contact is obtained in the first region R1.

パターンが異なる複数種類の配線基板10が用意される場合、複数の第1配線導体12aの総面積と複数の第2配線導体12bの総面積との差が大きくなるほど、複数の第1配線導体12aの厚み(平均厚み)と複数の第2配線導体12bの厚み(平均厚み)との差が大きくなるように設定されてもよい。当該構成により、複数種類の配線基板10のいずれにおいても、第1領域R1に接触導体31から加わる合計圧力を良好な大きさにして、第1領域R1における接触性を良好にできる。 When multiple types of wiring boards 10 with different patterns are prepared, the difference between the thickness (average thickness) of the multiple first wiring conductors 12a and the thickness (average thickness) of the multiple second wiring conductors 12b may be set to be greater as the difference between the total area of the multiple first wiring conductors 12a and the total area of the multiple second wiring conductors 12b increases. With this configuration, the total pressure applied from the contact conductors 31 to the first region R1 can be made to be of a good magnitude in any of the multiple types of wiring boards 10, thereby improving the contact in the first region R1.

平面視において、複数の第1配線導体12a及び複数の第2配線導体12bの総面積は、複数の第3配線導体13の総面積よりも大きくてもよい。当該構成においては、導体と絶縁基板11との膨張率の差により、第1面S1が凸となる反りが生じやすい。当該反りは、第1領域R1に接触導体31から加わる合計圧力を増加させるように作用する。したがって、第1配線導体12aの厚さが第2配線導体12bの厚さよりも小さいことに基づく作用(第1領域R1の合計圧力が低減する作用)が有効に機能し、第1領域R1における接触性を良好にすることができる。 In a plan view, the total area of the multiple first wiring conductors 12a and the multiple second wiring conductors 12b may be larger than the total area of the multiple third wiring conductors 13. In this configuration, the difference in the expansion coefficient between the conductor and the insulating substrate 11 tends to cause warping that makes the first surface S1 convex. This warping acts to increase the total pressure applied to the first region R1 from the contact conductor 31. Therefore, the effect based on the fact that the thickness of the first wiring conductor 12a is smaller than the thickness of the second wiring conductor 12b (the effect of reducing the total pressure in the first region R1) functions effectively, and the contact in the first region R1 can be improved.

平面視において、複数の第1配線導体12aの総面積は、第1面S1に位置する複数の配線導体12(第1配線導体12a、第2配線導体12b)の総面積の55%以上76%以下であってもよい。当該構成により、第1配線導体12aと第2配線導体12bとの間に適宜な厚みの差を付与しやすく、当該厚みの差により接触導体31と第1配線導体12a及び第2配線導体12bとの接触性を良好にできる。 In a plan view, the total area of the multiple first wiring conductors 12a may be 55% or more and 76% or less of the total area of the multiple wiring conductors 12 (first wiring conductor 12a, second wiring conductor 12b) located on the first surface S1. This configuration makes it easy to provide an appropriate thickness difference between the first wiring conductor 12a and the second wiring conductor 12b, and this thickness difference can improve the contact between the contact conductor 31 and the first wiring conductor 12a and the second wiring conductor 12b.

次の関係表1は、導体面積比率(第1面S1に位置する複数の配線導体12の総面積に対する第1領域R1に位置する複数の第1配線導体12aの総面積の割合)と、良好な接触性が得られる第1配線導体12aの厚み、第2配線導体12bの厚み、並びに、厚みの差の関係の一例を示す。 The following relationship table 1 shows an example of the relationship between the conductor area ratio (the ratio of the total area of the multiple first wiring conductors 12a located in the first region R1 to the total area of the multiple wiring conductors 12 located on the first surface S1) and the thickness of the first wiring conductor 12a, the thickness of the second wiring conductor 12b, and the difference in thickness that provides good contact.

<関係表1>

Figure 0007697905000001
<Relationship Table 1>
Figure 0007697905000001

(プローブカード)
本開示の実施形態1に係るプローブカード1は、図3に示すように、前述した配線基板10と、第2面S2の複数の配線導体13にそれぞれ接合された複数のプローブピン41とを備える。プローブピン41は、はんだ等の接合材を介して配線導体13に接合されてもよい。
(Probe card)
3, the probe card 1 according to the first embodiment of the present disclosure includes the above-described wiring substrate 10 and a plurality of probe pins 41 respectively joined to a plurality of wiring conductors 13 on the second surface S2. The probe pins 41 may be joined to the wiring conductors 13 via a joining material such as solder.

プローブカード1は、さらに、図示しない検査装置と接続される回路基板20と、配線基板10を支持する枠体22と、回路基板20と配線基板10との間に介在する複数の接触導体31とを備えてもよい。枠体22は配線基板10の縁部を下方から支持する構成であってもよい。枠体22は回路基板20に固定され、配線基板10と回路基板20とが一体化されてもよい。複数の接触導体31はそれぞれ、回路基板20の下面に位置する複数の電極パッド21と、配線基板10の複数の配線導体12とに接触することで、互いに対応づけられた電極パッド21と配線導体12とを電気的に接続してもよい。 The probe card 1 may further include a circuit board 20 connected to an inspection device (not shown), a frame 22 supporting the wiring board 10, and a plurality of contact conductors 31 interposed between the circuit board 20 and the wiring board 10. The frame 22 may be configured to support the edge of the wiring board 10 from below. The frame 22 may be fixed to the circuit board 20, and the wiring board 10 and the circuit board 20 may be integrated. The plurality of contact conductors 31 may contact a plurality of electrode pads 21 located on the lower surface of the circuit board 20 and a plurality of wiring conductors 12 of the wiring board 10, thereby electrically connecting the corresponding electrode pads 21 and wiring conductors 12.

複数の接触導体31は、図示しない絶縁板又は絶縁シートに中央部位が支持されて一体化されていてもよい。一体化された複数の接触導体31は、インターポーザーと呼んでもよい。 The multiple contact conductors 31 may be integrated with each other by having their central portions supported by an insulating plate or sheet (not shown). The integrated multiple contact conductors 31 may be called an interposer.

当該構成のプローブカード1によれば、プローブカード1のプローブピン41が検査対象のシリコンウエハ上の電極に接続される。そして、回路基板20に接続された図示しない検査装置が、回路基板20、複数の接触導体31、配線基板10及びプローブピン41を介して、検査対象との間で信号及び電源電圧の一方又は両方をやり取りすることで検査対象を検査することができる。 According to the probe card 1 having this configuration, the probe pins 41 of the probe card 1 are connected to electrodes on the silicon wafer to be inspected. Then, an inspection device (not shown) connected to the circuit board 20 can inspect the inspection object by exchanging signals and/or power supply voltage with the inspection object via the circuit board 20, the multiple contact conductors 31, the wiring board 10, and the probe pins 41.

実施形態1のプローブカード1によれば、配線基板10と接触導体31との良好な接触性が実現されるので、検査装置と検査対象との間で信号及び電源電圧の一方又は両方の良好なやり取りを実現できる。 The probe card 1 of embodiment 1 achieves good contact between the wiring board 10 and the contact conductor 31, allowing good exchange of signals and/or power supply voltage between the inspection device and the subject to be inspected.

(実施形態2)
図4は、本開示の実施形態2に係る配線導体を示す平面図である。図5は、本開示の実施形態2に係るプローブカードを示す縦断面図である。図5は、作図上の単純化を行った概略図を示している。
(Embodiment 2)
Fig. 4 is a plan view showing a wiring conductor according to the second embodiment of the present disclosure. Fig. 5 is a vertical cross-sectional view showing a probe card according to the second embodiment of the present disclosure. Fig. 5 shows a schematic diagram that has been simplified in terms of drawing.

実施形態2の配線基板10A及びプローブカード1Aは、回路基板20Aが配線基板10Aを支持する構成に別の要素が加わった点が異なり、その他の構成要素は実施形態1と同様であってもよい。 The wiring board 10A and probe card 1A of embodiment 2 differ in that another element is added to the configuration in which the circuit board 20A supports the wiring board 10A, but the other components may be the same as those of embodiment 1.

実施形態2の配線基板10Aは、実施形態1と同様の構成要素に加え、図4に示すように、支持用の金属部材24を接合するための接合用金属膜16を更に備えてもよい。接合用金属膜16は、第1面S1に位置してもよい。配線基板10Aは、複数の接合用金属膜16を備えてもよいが、接合用金属膜16は1つであってもよい。接合用金属膜16は、平面視において個々の配線導体12、13よりも大きな面積を有してもよい。接合用金属膜16は、平面視において、多角形状、円形状又は一方に長い形状であってもよい。 The wiring board 10A of the second embodiment may further include a bonding metal film 16 for bonding a supporting metal member 24, as shown in FIG. 4, in addition to the same components as those of the first embodiment. The bonding metal film 16 may be located on the first surface S1. The wiring board 10A may include multiple bonding metal films 16, or may include only one bonding metal film 16. The bonding metal film 16 may have an area larger than each of the wiring conductors 12, 13 in a plan view. The bonding metal film 16 may be polygonal, circular, or elongated in one direction in a plan view.

接合用金属膜16は、スパッタ工程等の薄膜形成工程により第1面S1上に接合用金属膜16に対応するパターンの薄膜を形成した後、電解めっき工程により上記薄膜上にメッキを施すことで形成された導体であってもよい。 The bonding metal film 16 may be a conductor formed by forming a thin film having a pattern corresponding to the bonding metal film 16 on the first surface S1 by a thin film formation process such as a sputtering process, and then plating the thin film by an electrolytic plating process.

プローブカード1Aにおいては、接合用金属膜16に金属部材24が接合され、当該金属部材24が配線基板10Aを上から支持する(図5を参照)。すなわち、金属部材24は接合用金属膜16を引き上げる方向に力を及ぼす。当該力は、複数の接触導体31が配線基板10Aを押す方向の力に対抗し、複数の接触導体31の圧力によって配線基板10Aが歪むことに対抗する作用を及ぼす。 In the probe card 1A, the metal member 24 is bonded to the bonding metal film 16, and the metal member 24 supports the wiring board 10A from above (see FIG. 5). That is, the metal member 24 exerts a force in a direction that lifts the bonding metal film 16. This force counteracts the force of the multiple contact conductors 31 in the direction that presses the wiring board 10A, and acts to counteract the distortion of the wiring board 10A caused by the pressure of the multiple contact conductors 31.

接合用金属膜16は、図4のように全てが第1領域R1に位置してもよいし、総面積の半分以上が第1領域R1に位置してもよい。当該構成によれば、複数の接触導体31の圧力が大きくなる第1領域R1に接合用金属膜16の大半が含まれるので、接合用金属膜16の歪みに対抗する作用が第1領域R1に作用され、第1領域R1における配線基板10Aの応力を緩和できる。さらに、接合用金属膜16の周囲においては、接合用金属膜16における配線基板10Aを引き上げる力と、複数の接触導体31が配線基板10Aを押し下げる力とが相殺する。したがって、接合用金属膜16の周囲に応力が集中することを緩和できる。 The bonding metal film 16 may be entirely located in the first region R1 as shown in FIG. 4, or more than half of the total area may be located in the first region R1. With this configuration, most of the bonding metal film 16 is included in the first region R1 where the pressure of the multiple contact conductors 31 is large, so that the first region R1 acts against the distortion of the bonding metal film 16, and the stress of the wiring board 10A in the first region R1 can be alleviated. Furthermore, around the bonding metal film 16, the force of the bonding metal film 16 lifting the wiring board 10A and the force of the multiple contact conductors 31 pressing down on the wiring board 10A cancel each other out. Therefore, the concentration of stress around the bonding metal film 16 can be alleviated.

実施形態2のプローブカード1Aは、実施形態1と同様の構成要素に加え、金属部材24(例えばボルトとナット)と、回路基板20Aに位置する支持部(貫通孔等)26とを更に備えてもよい。金属部材24はろう材等の接合部材8を介して接合用金属膜16に接合されてもよい。そして、金属部材24の別の部位が回路基板20Aの支持部26に係合することで回路基板20Aが金属部材24を介して配線基板10Aを支持してもよい。 The probe card 1A of the second embodiment may further include a metal member 24 (e.g., a bolt and a nut) and a support portion (through hole, etc.) 26 located on the circuit board 20A, in addition to the same components as those of the first embodiment. The metal member 24 may be joined to the joining metal film 16 via a joining member 8 such as a brazing material. Then, another portion of the metal member 24 may engage with the support portion 26 of the circuit board 20A, so that the circuit board 20A supports the wiring board 10A via the metal member 24.

実施形態2の配線基板10Aによれば、第1面S1の複数の配線導体12と接触導体31との良好な接触性が実現され、かつ、配線導体12に生じる応力を緩和することができる。実施形態2のプローブカード1Aによれば、上記の作用が得られる配線基板10Aにより、検査装置と検査対象との間で信号及び電源電圧の一方又は両方の良好なやり取りを実現できる。 The wiring board 10A of the second embodiment realizes good contact between the multiple wiring conductors 12 on the first surface S1 and the contact conductor 31, and can relieve stress on the wiring conductors 12. The probe card 1A of the second embodiment realizes good exchange of signals and/or power supply voltage between the inspection device and the inspection target by the wiring board 10A that provides the above-mentioned effects.

以上、本開示の各実施形態について説明した。しかし、本開示の配線基板及びプローブカードは上記実施形態に限られるものでない。実施形態で示した細部は、発明の趣旨を逸脱しない範囲で適宜変更可能である。 Each embodiment of the present disclosure has been described above. However, the wiring board and probe card of the present disclosure are not limited to the above-described embodiments. The details shown in the embodiments can be modified as appropriate without departing from the spirit of the invention.

1、1A プローブカード
8 接合部材
10、10A 配線基板
11 絶縁基板
12、14 配線導体
12a 第1配線導体
12b 第2配線導体
13 配線導体(第3配線導体)
16 接合用金属膜
R1 第1領域
R2 第2領域
T1aa、T2aa 厚み
20、20A 回路基板
21 電極パッド
22 枠体
24 金属部材
26 支持部
31 接触導体
41 プローブピン
REFERENCE SIGNS LIST 1, 1A Probe card 8 Bonding member 10, 10A Wiring board 11 Insulating board 12, 14 Wiring conductor 12a First wiring conductor 12b Second wiring conductor 13 Wiring conductor (third wiring conductor)
16 Bonding metal film R1 First region R2 Second region T1aa, T2aa Thickness 20, 20A Circuit board 21 Electrode pad 22 Frame 24 Metal member 26 Support portion 31 Contact conductor 41 Probe pin

Claims (8)

第1面と前記第1面の反対側に位置する第2面とを有する絶縁基板と、
前記第1面上及び前記第2面上に位置する複数の配線導体と、
を備え、
前記第1面を、前記第1面の中央に位置する円形の第1領域と、前記第1領域の周りを囲いかつ前記第1領域と同一の面積を有する第2領域と、の2つの領域に分けたとき、
前記複数の配線導体は、前記第1領域に位置する複数の第1配線導体と、前記第2領域に位置する複数の第2配線導体とを含み、
前記複数の第2配線導体の厚みが、前記複数の第1配線導体の厚みよりも大きい、
配線基板。
an insulating substrate having a first surface and a second surface opposite to the first surface;
a plurality of wiring conductors located on the first surface and the second surface;
Equipped with
When the first surface is divided into two regions, a circular first region located at the center of the first surface, and a second region surrounding the first region and having the same area as the first region,
the plurality of wiring conductors include a plurality of first wiring conductors located in the first region and a plurality of second wiring conductors located in the second region;
The thickness of the second wiring conductors is greater than the thickness of the first wiring conductors.
Wiring board.
平面視において、前記複数の第1配線導体の総面積が、前記複数の第2配線導体の総面積よりも大きい、
請求項1記載の配線基板。
a total area of the plurality of first wiring conductors is larger than a total area of the plurality of second wiring conductors in a plan view;
The wiring board according to claim 1.
前記複数の配線導体は、前記第2面上に位置する複数の第3配線導体を含み、
平面視において、前記複数の第1配線導体及び前記複数の第2配線導体の総面積が、前記複数の第3配線導体の総面積よりも大きい、
請求項1又は請求項2に記載の配線基板。
the plurality of wiring conductors include a plurality of third wiring conductors located on the second surface,
a total area of the plurality of first wiring conductors and the plurality of second wiring conductors is larger than a total area of the plurality of third wiring conductors in a plan view;
The wiring board according to claim 1 or 2.
平面視において、前記複数の第1配線導体の総面積が、前記第1面に位置する前記複数の配線導体の総面積の55%以上76%以下である、
請求項1から請求項3のいずれか一項に記載の配線基板。
a total area of the plurality of first wiring conductors is 55% or more and 76% or less of a total area of the plurality of wiring conductors located on the first surface in a plan view;
The wiring board according to claim 1 .
前記絶縁基板は、平面視において、8個以上の角部を有する正多角形状、あるいは、円形状である、
請求項1から請求項4のいずれか一項に記載の配線基板。
The insulating substrate has a regular polygonal shape having eight or more corners or a circular shape in a plan view.
The wiring board according to claim 1 .
前記第1面上に位置する1つ又は複数の接合用金属膜を備え、
平面視において、前記接合用金属膜の総面積の半分以上が前記第1領域に位置する、
請求項1から請求項5のいずれか一項に記載の配線基板。
one or more bonding metal films located on the first surface;
In a plan view, half or more of a total area of the bonding metal film is located in the first region.
The wiring board according to claim 1 .
請求項1から請求項6のいずれか一項に記載の配線基板と、
前記第2面上に位置する複数の配線導体にそれぞれ電気的に接続された複数のプローブピンと、
を備えるプローブカード。
The wiring board according to any one of claims 1 to 6,
a plurality of probe pins electrically connected to a plurality of wiring conductors located on the second surface;
A probe card comprising:
請求項6に記載の配線基板と、
前記第2面上に位置する複数の配線導体にそれぞれ電気的に接続された複数のプローブピンと、
前記接合用金属膜に接合された金属部材と、
を備えるプローブカード。
The wiring board according to claim 6 ;
a plurality of probe pins electrically connected to a plurality of wiring conductors located on the second surface;
A metal member bonded to the bonding metal film;
A probe card comprising:
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JP2006148042A (en) 2004-10-21 2006-06-08 Matsushita Electric Ind Co Ltd Wafer batch inspection apparatus and manufacturing method of inspection substrate used therefor
WO2006100764A1 (en) 2005-03-23 2006-09-28 Fujitsu Limited Printed wiring board
JP2009222680A (en) 2008-03-18 2009-10-01 Japan Electronic Materials Corp Probe card and method for manufacturing probe card
US20110108982A1 (en) 2009-11-09 2011-05-12 Hynix Semiconductor Inc. Printed circuit board
JP2020112487A (en) 2019-01-15 2020-07-27 株式会社日本マイクロニクス Probe board and electrical connection device

Patent Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2006148042A (en) 2004-10-21 2006-06-08 Matsushita Electric Ind Co Ltd Wafer batch inspection apparatus and manufacturing method of inspection substrate used therefor
WO2006100764A1 (en) 2005-03-23 2006-09-28 Fujitsu Limited Printed wiring board
JP2009222680A (en) 2008-03-18 2009-10-01 Japan Electronic Materials Corp Probe card and method for manufacturing probe card
US20110108982A1 (en) 2009-11-09 2011-05-12 Hynix Semiconductor Inc. Printed circuit board
JP2020112487A (en) 2019-01-15 2020-07-27 株式会社日本マイクロニクス Probe board and electrical connection device

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