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JP7699374B2 - Bending sensor and method for manufacturing bending sensor - Google Patents
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JP7699374B2 - Bending sensor and method for manufacturing bending sensor - Google Patents

Bending sensor and method for manufacturing bending sensor Download PDF

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JP7699374B2
JP7699374B2 JP2021167265A JP2021167265A JP7699374B2 JP 7699374 B2 JP7699374 B2 JP 7699374B2 JP 2021167265 A JP2021167265 A JP 2021167265A JP 2021167265 A JP2021167265 A JP 2021167265A JP 7699374 B2 JP7699374 B2 JP 7699374B2
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周介 金澤
聖 植村
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National Institute of Advanced Industrial Science and Technology AIST
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Description

本発明は、導電膜に与えられた亀裂の開閉による抵抗変化を利用した曲げセンサ及び曲げセンサの製造方法に関する。 The present invention relates to a bending sensor that utilizes resistance changes caused by opening and closing cracks in a conductive film, and a method for manufacturing the bending sensor.

部材の曲げ量や曲率の変化を検出するための曲げセンサやひずみセンサがある。近年では、かかるセンサを人の使用する装具に一体化させることで、使用者の動作や関節の動きなどを連続的に計測し、健康管理やIoTサービスに連動させることも提案されている。このようなセンサのうち、電気抵抗の変化を介して曲げ量などを検出するセンサ、特に、導電膜に与えられた亀裂の開閉による抵抗変化を利用したセンサが知られている。 There are bending sensors and strain sensors for detecting changes in the amount of bending or curvature of components. In recent years, it has been proposed to integrate such sensors into prosthetics used by people to continuously measure the movements of the user and joints, and to link them to health management and IoT services. Among these sensors, sensors that detect the amount of bending and other parameters via changes in electrical resistance are known, in particular sensors that use resistance changes due to the opening and closing of cracks in a conductive film.

例えば、特許文献1では、部材上に与えられる可撓性の基板上に微小な亀裂を形成させた導電膜を与え、部材の変形とともに基板を曲げることで導電膜の亀裂を開閉させ、その電気抵抗(導電率)が変化することを利用して、部材の曲げやその変化を検知する曲げセンサを開示している。具体的には、予め導電性エラストマーに斜めに切り込みを入れておくと、曲がり角の増大とともに切り込みが開き、導電性エラストマーの電気抵抗が増加する。一方、真っ直ぐにすると、切り込みが閉じて導電性エラストマーの電気抵抗が減少する。かかる電気抵抗の変化から導電性エラストマーを与えられた部材の曲げを検知するのである。 For example, Patent Document 1 discloses a bending sensor that detects bending and changes in a component by providing a conductive film with tiny cracks on a flexible substrate provided on the component, and opening and closing the cracks in the conductive film as the substrate is bent as the component deforms, thereby changing the electrical resistance (conductivity). Specifically, if a diagonal cut is made in a conductive elastomer in advance, the cut opens as the bend increases, and the electrical resistance of the conductive elastomer increases. On the other hand, when the conductive elastomer is straightened, the cut closes and the electrical resistance of the conductive elastomer decreases. The bending of the component to which the conductive elastomer is provided is detected from this change in electrical resistance.

このような導電膜に与えられた亀裂の開閉による抵抗変化を利用したセンサにおいて、亀裂が安定して開閉しないと、曲げに対する抵抗変化の感度が変化し、動作が不安定となってしまう。 In such sensors that use resistance changes caused by the opening and closing of cracks in a conductive film, if the cracks do not open and close stably, the sensitivity of the resistance change to bending will change, causing unstable operation.

そこで、例えば、特許文献2では、高抵抗導電膜(高抵抗層)と、予め亀裂(クラック)を導入した低抵抗導電膜(低抵抗層)と、を間に絶縁部を隔てて配置し、複数の電極部に対して並列に接続し、オン・オフ動作をさせる曲げセンサを開示している。オフ状態においては、低抵抗層の亀裂は閉じており、複数の電極部から、高抵抗層の電気抵抗と、低抵抗層の電気抵抗と、の合成抵抗がオフ抵抗として出力される。一方、オン状態においては、低抵抗層の亀裂が開き、複数の電極部から、少なくとも高抵抗層の電気抵抗がオン抵抗として出力されるとしている。低抵抗層の電気抵抗は、主にクラックの状態(クラックの分布、開度、形状など)に依存するため、高抵抗層は低抵抗層よりも電気抵抗、感度のばらつきを生じにくく、クラックの開くオン状態において高抵抗層の電気抵抗を出力することで、動作を安定し得るとしている。 For example, Patent Document 2 discloses a bending sensor in which a high-resistance conductive film (high-resistance layer) and a low-resistance conductive film (low-resistance layer) in which cracks have been introduced in advance are arranged with an insulating section between them, and the sensor is connected in parallel to multiple electrode parts to perform on/off operation. In the off state, the cracks in the low-resistance layer are closed, and the combined resistance of the electrical resistance of the high-resistance layer and the electrical resistance of the low-resistance layer is output as the off resistance from the multiple electrode parts. On the other hand, in the on state, the cracks in the low-resistance layer open, and at least the electrical resistance of the high-resistance layer is output as the on resistance from the multiple electrode parts. Since the electrical resistance of the low-resistance layer mainly depends on the state of the cracks (distribution, opening, shape, etc. of the cracks), the high-resistance layer is less likely to cause variations in electrical resistance and sensitivity than the low-resistance layer, and the sensor is said to be able to operate stably by outputting the electrical resistance of the high-resistance layer in the on state in which the cracks open.

米国特許第5086785号明細書U.S. Pat. No. 5,086,785 国際公開第2012/060427号International Publication No. 2012/060427

上記したように、導電膜に与えられた亀裂の開閉による抵抗変化を利用したセンサにおいて、曲げに対する抵抗変化の感度を高く、かつ、安定して動作を得られるようにすることが求められる。これには、亀裂が安定して開閉することが必要である。また、導電膜への亀裂の導入にムラがあると、同じ曲げ量であっても、曲げ方によって抵抗変化に差を生じて、やはり安定した動作を得られない。 As mentioned above, in a sensor that uses resistance changes caused by the opening and closing of cracks in a conductive film, it is necessary to have high sensitivity to resistance changes with bending and to be able to obtain stable operation. This requires that the cracks open and close stably. Furthermore, if there is unevenness in the introduction of cracks into the conductive film, even with the same amount of bending, differences in resistance changes will occur depending on the bending method, and stable operation will not be obtained.

本発明は、上記したような状況に鑑みてなされたものであって、その目的とするところは、導電膜に与えられた亀裂の開閉による抵抗変化を利用した曲げセンサにおいて、曲げに対する抵抗変化の感度を高く、かつ、安定して動作を得られるセンサ及びその製造方法を提供することにある。 The present invention was made in consideration of the above-mentioned circumstances, and its purpose is to provide a bending sensor that uses resistance changes caused by opening and closing cracks in a conductive film, and that has high sensitivity to resistance changes due to bending and can operate stably, and a method for manufacturing the same.

本発明による曲げセンサは、帯状の導電路を形成するように基材の主面上に与えられた導電膜に導入された亀裂の開閉による抵抗変化から曲げを検出する曲げセンサであって、前記基材は前記主面に一定周期で凹凸を有する織布であって、前記導電路には厚さ方向及び幅方向に前記導電膜を貫通する亀裂を複数含むとともに、前記亀裂が前記凹凸に対応した位置にあることを特徴とする。 The bending sensor according to the present invention is a bending sensor that detects bending from a change in resistance caused by opening and closing of cracks introduced into a conductive film provided on the main surface of a substrate so as to form a strip-shaped conductive path, and is characterized in that the substrate is a woven fabric having irregularities at regular intervals on the main surface, the conductive path includes multiple cracks that penetrate the conductive film in the thickness and width directions, and the cracks are located at positions corresponding to the irregularities.

かかる特徴によれば、導電膜に与えられた亀裂の開閉による抵抗変化を利用した曲げセンサにおいて、曲げに対する抵抗変化の感度を高く、かつ、安定して動作を得られるのである。 This feature makes it possible to obtain high sensitivity to resistance changes due to bending and stable operation in a bending sensor that uses resistance changes caused by the opening and closing of cracks in a conductive film.

また、本発明による曲げセンサの製造方法は、帯状の導電路を形成するように基材の主面上に与えられた導電膜に導入された亀裂の開閉による抵抗変化から曲げを検出する曲げセンサの製造方法であって、前記基材は前記主面に一定周期で凹凸を有する織布であって、前記導電膜を与える導電性材料を前記基材の上に塗布し、前記基材を曲げることで、前記導電路には厚さ方向及び幅方向に前記導電膜を貫通する亀裂を複数与えるとともに、前記亀裂を前記凹凸に対応した位置に与えることを特徴とする。 The method for manufacturing a bending sensor according to the present invention is a method for manufacturing a bending sensor that detects bending from a change in resistance due to the opening and closing of cracks introduced into a conductive film provided on the main surface of a substrate so as to form a strip-shaped conductive path, and is characterized in that the substrate is a woven fabric having irregularities at a constant interval on the main surface, a conductive material that provides the conductive film is applied onto the substrate, and the substrate is bent to provide the conductive path with multiple cracks that penetrate the conductive film in the thickness and width directions, and the cracks are provided at positions corresponding to the irregularities.

かかる特徴によれば、導電膜に与えられた亀裂の開閉による抵抗変化を利用した曲げセンサにおいて、曲げに対する抵抗変化の感度を高く、かつ、安定して動作を得られる曲げセンサを容易に製造できるのである。 With these features, it is possible to easily manufacture a bending sensor that uses resistance changes caused by the opening and closing of cracks in a conductive film, and that has high sensitivity to resistance changes in response to bending and can operate stably.

本発明による実施例としての曲げセンサの(a)上面図及び(b)要部の拡大図である。1A is a top view of a bending sensor according to an embodiment of the present invention, and FIG. 本発明による実施例としての曲げセンサの側断面図である。1 is a side cross-sectional view of an embodiment of a bending sensor according to the present invention; 他の実施例による曲げセンサの(a)上面図、(b)要部の拡大図及び(c)側断面図である。13A is a top view of a bending sensor according to another embodiment, FIG. 13B is an enlarged view of a main portion, and FIG. さらに他の実施例による曲げセンサの(a)上面図及び(b)側断面図である。13A and 13B are a top view and a side cross-sectional view, respectively, of a bending sensor according to still another embodiment. 曲げセンサの製造工程を示す側断面図である。10A to 10C are side cross-sectional views showing a manufacturing process of the bending sensor. 製造した曲げセンサの要部の拡大写真である。1 is an enlarged photograph of a main part of the manufactured bending sensor. 製造した曲げセンサの要部を(a)反射光観察、(b)透過光観察した写真である。1A and 1B are photographs of a main part of the manufactured bending sensor, taken with reflected light and transmitted light, respectively. 撚糸による織布を基材として製造した曲げセンサの要部の拡大写真である。1 is an enlarged photograph of a main part of a bending sensor manufactured using a woven fabric made of twisted yarn as a base material. 製造試験における基材上の導電膜のパターン図である。FIG. 13 is a pattern diagram of a conductive film on a substrate in a production test. 電機抵抗値の測定方法とひずみ算出方法を説明する図である。1 is a diagram illustrating a method for measuring an electrical resistance value and a method for calculating a strain. ひずみと抵抗変化率との関係を示すグラフである。1 is a graph showing the relationship between strain and rate of resistance change. 基材によるゲージ率の違いを示す表である。1 is a table showing differences in gauge factor depending on the base material. 製造試験において導電膜上に形成した(a)密着させた保護膜と、(b)間隙を設けた保護膜の上面図である。1A is a top view of a protective film formed on a conductive film in a manufacturing test, and FIG. 1B is a top view of a protective film formed with a gap therebetween. 保護膜の導電膜に対する間隙の有無とゲージ率の関係を示す表である。11 is a table showing the relationship between the presence or absence of a gap between the protective film and the conductive film and the gauge factor. 芯材の直径を変えて製造した曲げセンサの要部の拡大写真である。13 is an enlarged photograph of a main part of a bending sensor manufactured by changing the diameter of the core material. 芯材の直径による亀裂の数とゲージ率を示す表である。1 is a table showing the number of cracks and the gauge factor depending on the diameter of the core material.

以下に、本発明による1つの実施例である曲げセンサ及びその制御方法について、図1乃至図5を用いて説明する。 Below, a bending sensor and its control method, which are one embodiment of the present invention, will be described with reference to Figures 1 to 5.

図1に示すように、曲げセンサ10は、基材1の主面上に帯状の導電路を形成するように導電膜2が与えられ、導電膜2に複数の亀裂3を導入させたものである。ここでは、導電路はコの字状に配置されている。基材1は、主面に一定周期で凹凸を有する織布であり、かかる凹凸に対応した位置において厚さ方向及び幅方向に導電膜2を貫通する亀裂を形成している。例えば、織布は、互いに直交する縦糸1a及び横糸1bを織り合わせたものである。つまり、凹凸は、織布の縦糸1a及び横糸1bの織り合わせによって織布の表面に形成されるものである。織布としては、縦糸1a及び横糸1bを平織したものとすると、高い強度を有し、摩耗しづらく、伸びて変形することが少ないなど、曲げセンサの基材1として好適に用い得る。 As shown in FIG. 1, the bending sensor 10 is formed by providing a conductive film 2 on the main surface of the substrate 1 so as to form a strip-shaped conductive path, and introducing multiple cracks 3 into the conductive film 2. Here, the conductive path is arranged in a U-shape. The substrate 1 is a woven fabric having irregularities at regular intervals on its main surface, and cracks are formed that penetrate the conductive film 2 in the thickness direction and width direction at positions corresponding to the irregularities. For example, the woven fabric is formed by weaving together warp threads 1a and weft threads 1b that are perpendicular to each other. In other words, the irregularities are formed on the surface of the woven fabric by weaving together the warp threads 1a and weft threads 1b of the woven fabric. If the woven fabric is made of plain weave warp threads 1a and weft threads 1b, it has high strength, is resistant to wear, and is less likely to stretch and deform, making it suitable for use as the substrate 1 of a bending sensor.

ここで、亀裂3は、曲げセンサ10の幅方向に延びて厚さ方向及び幅方向に導電膜2を貫通するように形成されている。さらに、亀裂3は、凹凸に対応した位置にある。例えば、曲げセンサ10の長さ方向に縦糸1aを配置し、幅方向に横糸1bを配置したとする。そして、このとき、幅方向に延びる横糸1bの2本に対し亀裂3が1本、などのように長さ方向に数えた亀裂の数が横糸1bによる凹凸の数に対応するのである。つまり、織布のメッシュと亀裂3の数が対応し、基材1である織布のメッシュによる一定周期の凹凸に合わせて、亀裂3も周期性をもって配置される。なお、この長さ方向の数の対応については、亀裂3の数を横糸1bの数の整数分の1とすることが観察されている。換言すれば、長手方向に計数した亀裂の数は、同方向に計数した糸の数の整数分の1となり、亀裂の生成した位置の周期は糸の周期の整数倍となる。 Here, the cracks 3 are formed so as to extend in the width direction of the bending sensor 10 and penetrate the conductive film 2 in the thickness direction and width direction. Furthermore, the cracks 3 are located at positions corresponding to the unevenness. For example, suppose that the warp threads 1a are arranged in the length direction of the bending sensor 10 and the weft threads 1b are arranged in the width direction. Then, the number of cracks counted in the length direction corresponds to the number of unevenness caused by the weft threads 1b, such as one crack 3 for every two weft threads 1b extending in the width direction. In other words, the number of cracks 3 corresponds to the number of meshes of the woven fabric, and the cracks 3 are also arranged periodically in accordance with the unevenness of a certain period caused by the mesh of the woven fabric, which is the base material 1. It has been observed that the number of cracks 3 is an integer divided by the number of weft threads 1b in this correspondence in the length direction. In other words, the number of cracks counted in the length direction is an integer divided by the number of threads counted in the same direction, and the period of the positions where the cracks are generated is an integer multiple of the period of the threads.

そして、図2に示すように、(a)曲げセンサ10の基材1を平板状にした状態のときに亀裂3は閉じ、(b)曲げセンサ10の導電膜2を基材1よりも外側とするように長手方向に曲げたときに亀裂3は開く。この亀裂の開閉によって導電膜2の電気抵抗が変化するから、かかる抵抗変化から曲げセンサ10及び曲げセンサ10を貼りつけた部材等の曲げを検出できる。 As shown in Figure 2, (a) the crack 3 closes when the substrate 1 of the bending sensor 10 is in a flat plate state, and (b) the crack 3 opens when the conductive film 2 of the bending sensor 10 is bent in the longitudinal direction so that it is on the outside of the substrate 1. The opening and closing of this crack changes the electrical resistance of the conductive film 2, and the bending of the bending sensor 10 and the member to which the bending sensor 10 is attached can be detected from this resistance change.

このように、曲げセンサ10によれば、織布からなる基材1の一定周期の凹凸に対応した位置に厚さ方向及び幅方向に貫通する亀裂3が配置されるから、一定の曲げに対する亀裂3の開閉の再現性を高くできる。その結果、亀裂3の開閉による抵抗変化は安定するとともに高い感度を得られるのである。 In this way, with the bending sensor 10, the cracks 3 penetrating in the thickness and width directions are arranged at positions corresponding to the periodic unevenness of the substrate 1 made of woven fabric, so that the reproducibility of the opening and closing of the cracks 3 for a certain bending can be increased. As a result, the resistance change due to the opening and closing of the cracks 3 is stable and high sensitivity can be obtained.

図3に示すように、さらに基材1の主面に絶縁膜4を介して導電膜2を設けた曲げセンサ10aを得ることもできる。例えば、絶縁膜4は、導電膜2の下面全体を覆うように形成され、基材1に対して導電膜2を絶縁することができる。これによって、基材1には導電性の材料を用いることもできる。なお、亀裂3は、導電膜2及び絶縁膜4の両者を厚さ方向及び幅方向に貫通するように形成される。 As shown in FIG. 3, a bending sensor 10a can be obtained in which a conductive film 2 is provided on the main surface of the substrate 1 via an insulating film 4. For example, the insulating film 4 is formed so as to cover the entire lower surface of the conductive film 2, and the conductive film 2 can be insulated from the substrate 1. This allows a conductive material to be used for the substrate 1. The crack 3 is formed so as to penetrate both the conductive film 2 and the insulating film 4 in the thickness direction and width direction.

また、図4に示すように、保護膜5を設けた曲げセンサ10bを得ることもできる。保護膜5は、基材1の主面に対向するとともに、導電膜2と間隙を有するように形成される。つまり、導電膜2は、保護膜5の下部に間隙を有して与えられ、かかる間隙により亀裂3の開閉に保護膜5からの影響を受けないようにできる。このような配置は、例えば、保護膜5の外周に合わせた導電膜2を囲む位置において、基材1や導電膜2との間にスペーサ6を形成させることで得られる。なお、上記した絶縁膜4を用いた曲げセンサ10aにさらに保護膜5を設けてもよい。 As shown in FIG. 4, a bending sensor 10b having a protective film 5 can also be obtained. The protective film 5 faces the main surface of the substrate 1 and is formed to have a gap with the conductive film 2. In other words, the conductive film 2 is provided with a gap below the protective film 5, and this gap prevents the protective film 5 from affecting the opening and closing of the crack 3. Such an arrangement can be obtained, for example, by forming a spacer 6 between the substrate 1 and the conductive film 2 at a position that surrounds the conductive film 2 and is aligned with the outer periphery of the protective film 5. Note that a protective film 5 may be further provided on the bending sensor 10a using the insulating film 4 described above.

次に、曲げセンサ10、10a及び10bの製造方法について説明する。 Next, we will explain the manufacturing method of bending sensors 10, 10a, and 10b.

図5(a)に示すように、まず、基材1を用意する。上記したように基材1は、その主面に一定周期で凹凸を有する織布である。なお、基材1は、複数の曲げセンサを並べて配置できるような大きさのものとし、複数の曲げセンサを同時に製造するようにしてもよい。 As shown in FIG. 5(a), first, a substrate 1 is prepared. As described above, the substrate 1 is a woven fabric having irregularities at a regular interval on its main surface. The substrate 1 is of a size that allows multiple bending sensors to be arranged side by side, and multiple bending sensors may be manufactured simultaneously.

次に、同図(b)に示すように、基材1の一方の主面に導電膜2を与える導電性材料2’を塗布する。導電性材料2’としては、例えば導電性カーボンペーストを好適に用い得る。塗布においては、導電膜2のパターン(形状)を精度良く得るためにスクリーン印刷などの印刷技術を用いるとよい。導電性材料2’は塗布後、例えば、乾燥されるなどして導電膜2とされる。 Next, as shown in FIG. 1B, a conductive material 2' that provides a conductive film 2 is applied to one main surface of the substrate 1. For example, a conductive carbon paste can be suitably used as the conductive material 2'. In applying the conductive material, a printing technique such as screen printing can be used to accurately obtain the pattern (shape) of the conductive film 2. After application, the conductive material 2' is dried, for example, to form the conductive film 2.

このとき、同図(c)に示すように、基材1には縦糸1a及び横糸1bによる凹凸が形成されている。そして、基材1の主面の凹凸により導電膜2の厚さ部分的に薄くするなど、亀裂の発生のしやすさを部位によって変化させている。 At this time, as shown in FIG. 1C, the warp threads 1a and weft threads 1b form unevenness on the substrate 1. The unevenness on the main surface of the substrate 1 makes the conductive film 2 thinner in parts, thereby varying the susceptibility of cracks to occur depending on the location.

次いで、同図(d)に示すように、一定の曲率で基材1に曲げを与えて、導電膜2に亀裂を生じさせる。曲げの方向としては、導電膜2により形成される帯状の導電路の長手方向への曲げである。このとき、導電膜2に引張り方向の歪みを与えるよう導電膜2を基材1の外側に配置するように曲げる。曲げを与えるにあたって、例えば、表面に一定の曲率を有する丸棒などの芯材11に導電膜2を外側にして基材1を折り返すように部分的に巻き付け、これをしごくようにして基材1の全体に曲げを与えるようにするとよい。 Next, as shown in FIG. 1(d), the substrate 1 is bent with a constant curvature to cause cracks in the conductive film 2. The direction of bending is in the longitudinal direction of the strip-shaped conductive path formed by the conductive film 2. At this time, the conductive film 2 is bent so as to be positioned on the outside of the substrate 1 so as to apply a tensile strain to the conductive film 2. When bending, for example, the substrate 1 may be partially wrapped around a core material 11 such as a round bar having a constant curvature on its surface, with the conductive film 2 on the outside, and the entire substrate 1 may be bent by squeezing it.

このとき、横糸1bの表面で導電膜2は薄く、亀裂を生じやすくなっている(図中小矢印部)。そして、芯材11の外側で大きな曲率の曲げを受けたときに横糸1bに沿った方向に延びる亀裂3を生じて引張歪みを吸収する。すると、亀裂3を生じた部分の近傍においては歪みが小さくなりそれ以上の亀裂を生じづらくなる。このようにして、横糸1bによる凹凸に対応した位置に複数の亀裂3を形成させることができる。そして、長手方向(曲げ方向)に延びる直線上の横糸1bの数と亀裂3の数との対応は、亀裂3を形成させる曲率の選択によって制御し得る。つまり、芯材11の直径を、適宜、選択することで亀裂3の数を制御できる。 At this time, the conductive film 2 is thin on the surface of the weft thread 1b, making it prone to cracking (small arrow in the figure). When the core material 11 is bent with a large curvature on the outside, cracks 3 extending in the direction along the weft thread 1b are generated, absorbing the tensile strain. Then, the strain is reduced in the vicinity of the part where the crack 3 has occurred, making it difficult for further cracks to occur. In this way, multiple cracks 3 can be formed at positions corresponding to the unevenness caused by the weft thread 1b. The correspondence between the number of weft threads 1b on a straight line extending in the longitudinal direction (bending direction) and the number of cracks 3 can be controlled by selecting the curvature at which the cracks 3 are formed. In other words, the number of cracks 3 can be controlled by appropriately selecting the diameter of the core material 11.

その結果、同図(e)に示すように、基材1の凹凸に対応した位置に亀裂3の形成された導電膜2を得られる。これによって、曲げセンサ10を得ることができる。 As a result, as shown in FIG. 1(e), a conductive film 2 is obtained in which cracks 3 are formed at positions corresponding to the unevenness of the substrate 1. This allows the bending sensor 10 to be obtained.

さらに、同図(f)に示すように、基材1の上に導電膜2を囲むスペーサ6を形成し、さらにその上に保護膜5を重ねることで、曲げセンサ10bを得ることもできる。 Furthermore, as shown in FIG. 1(f), a bending sensor 10b can be obtained by forming a spacer 6 surrounding the conductive film 2 on the substrate 1 and then overlaying a protective film 5 on top of the spacer 6.

なお、絶縁膜4を形成させる場合には、導電性材料2’の塗布の前に、基材1の主面に絶縁膜4を形成させ、この上に導電性材料2’を塗布するようにすればよい。これによって、曲げセンサ10aを得ることができる。 When forming the insulating film 4, the insulating film 4 is formed on the main surface of the substrate 1 before applying the conductive material 2', and then the conductive material 2' is applied on top of the insulating film 4. This allows the bending sensor 10a to be obtained.

[製造試験]
曲げセンサを製造し、その詳細について調査した結果を図6乃至図16を用いて説明する。
[Production testing]
A bending sensor was manufactured and the results of investigating the details thereof will be described with reference to FIGS.

[試験1]
モノフィラメントの織布、撚糸の織布をそれぞれ基材として用いた曲げセンサを製造し、導電膜に形成された亀裂を観察した。
[Test 1]
Bending sensors were manufactured using a monofilament woven fabric and a twisted yarn woven fabric as the substrate, and cracks formed in the conductive film were observed.

図6に示すように、縦糸及び横糸をモノフィラメントとする平織の織布を基材として曲げセンサを製造した。(a)モノフィラメントの線径が0.12mmの100メッシュの織布を基材に用いた場合、(b)モノフィラメントの線径が0.09mmの200メッシュの織布を基材に用いた場合、いずれにおいても織布の凹凸と亀裂との対応は同様であった。すなわち、曲げセンサの長手方向(紙面横方向)に延びる直線と交差する糸(紙面上下に延びる糸)の数に対して長手方向に延びる直線と交差する亀裂の数は1/2になった。亀裂は途中で枝分かれすることもあるが、亀裂の数は糸の数に対応して、すなわち基材1の凹凸に対応して一定であることが判る。なお、製造にあたっては、直径2.0mmの鉄棒を芯材として用い、折り返すようにしごく動作を20回繰り返して曲げを付与した。 As shown in Figure 6, a bending sensor was manufactured using a plain weave fabric with monofilament warp and weft as the substrate. (a) When a 100-mesh woven fabric with a monofilament wire diameter of 0.12 mm was used as the substrate, and (b) when a 200-mesh woven fabric with a monofilament wire diameter of 0.09 mm was used as the substrate, the correspondence between the unevenness of the woven fabric and the cracks was similar in both cases. That is, the number of cracks intersecting with the straight lines extending in the longitudinal direction of the bending sensor (horizontal direction of the paper) was 1/2 of the number of threads (threads extending up and down on the paper) intersecting with the straight lines extending in the longitudinal direction. Although the cracks may branch along the way, it can be seen that the number of cracks is constant in response to the number of threads, i.e., in response to the unevenness of the substrate 1. In addition, in the manufacturing process, an iron bar with a diameter of 2.0 mm was used as the core material, and the bending was imparted by repeatedly folding it over 20 times.

図7に示すように、(a)反射光で観察される写真と(b)透過光で観察した写真とを比べると、反射光で観察される亀裂と同じ位置に透過光による明るい部分が観察される。つまり、亀裂は少なくとも厚さ方向に貫通していることが判る。 As shown in Figure 7, when comparing (a) a photograph observed with reflected light and (b) a photograph observed with transmitted light, a bright area observed with transmitted light is observed in the same position as the crack observed with reflected light. In other words, it can be seen that the crack penetrates at least in the thickness direction.

図8に示すように、縦糸及び横糸を撚糸とする平織の織布を基材として曲げセンサを製造した。撚糸の線径は0.18mmであり、織布のメッシュ数は100である。写真の撮影にあたって、糸の数を観察できる光量と、亀裂の数を観察できる光量とが異なったため、(a)糸の数を観察できる写真及び(b)亀裂の数を観察できる写真の2枚を並べた。ここでは、糸の数と亀裂の数は同じとなった。モノフィラメントの場合と同様に、亀裂は途中で枝分かれしても、長手方向に横断する直線上の亀裂の数は一定であることが判る。 As shown in Figure 8, a bending sensor was manufactured using a plain weave fabric with twisted warp and weft threads as the base material. The twisted threads have a wire diameter of 0.18 mm, and the mesh number of the fabric is 100. When taking the photographs, the amount of light required to observe the number of threads was different from the amount of light required to observe the number of cracks, so two photographs were arranged side by side: (a) a photograph in which the number of threads can be observed, and (b) a photograph in which the number of cracks can be observed. In this case, the number of threads and the number of cracks are the same. As in the case of monofilament, it can be seen that even if the cracks branch out along the way, the number of cracks in a straight line crossing the longitudinal direction is constant.

[試験2]
メッシュ数の異なる平織の織布と、凹凸のないPET(ポリエチレンテレフタラート)フィルムとを基材として用いて曲げセンサを製造し、曲げを付与したときの電気抵抗を測定した。
[Test 2]
Bending sensors were manufactured using plain weave fabrics with different mesh counts and smooth PET (polyethylene terephthalate) films as substrates, and the electrical resistance was measured when bending was applied.

基材として用いた織布はいずれもポリエチレンのモノフィラメントによる平織の織布であり、メッシュ数をそれぞれ100、150、200とした。なお、モノフィラメントの線径は、それぞれ、0.12mm、0.10mm、0.08mmであった。基材の厚みはそれぞれ線径と同じである。なお、PETフィルムによる基材の厚みは0.1mmであった。 The woven fabrics used as the substrates were all plain weave woven fabrics made of polyethylene monofilaments, with mesh numbers of 100, 150, and 200, respectively. The monofilament wire diameters were 0.12 mm, 0.10 mm, and 0.08 mm, respectively. The thickness of the substrate was the same as the wire diameter. The thickness of the substrate, made of PET film, was 0.1 mm.

図9に示すように、それぞれの基材1に導電性カーボンペースト(十条ケミカル株式会社製:CH-8)による導電性材料をスクリーン印刷でパターニングし、100℃のオーブンで30分間乾燥させた。得られた導電膜の膜厚は0.03mm、導電膜の全長の抵抗値は5kΩであった。なお、基材1はA4サイズとし、1枚の基材に縦横4つずつ、計16個の曲げセンサを配置できるよう導電膜2をパターニングした。 As shown in Figure 9, a conductive material made of conductive carbon paste (CH-8, manufactured by Jujo Chemical Co., Ltd.) was patterned by screen printing on each substrate 1, and then dried in an oven at 100°C for 30 minutes. The thickness of the obtained conductive film was 0.03 mm, and the resistance value of the conductive film over its entire length was 5 kΩ. The substrate 1 was A4 size, and the conductive film 2 was patterned so that a total of 16 bending sensors could be arranged on one substrate, four vertically and four horizontally.

次いで、直径2.0mmの鉄棒による芯材11で折り返すようにしごく動作を20回繰り返して、導電膜2に亀裂3を形成させた(図5(d)参照)。亀裂の形成後、基材を切り離して同一の製造条件の曲げセンサを16個ずつ作製した。 Next, the core material 11, made of an iron bar with a diameter of 2.0 mm, was used to bend the conductive film 2 back and forth 20 times to form a crack 3 in the conductive film 2 (see FIG. 5(d)). After the cracks were formed, the substrate was cut away to produce 16 bending sensors each under the same manufacturing conditions.

図10(a)に示すように、得られた曲げセンサ10は、所定の曲率半径Rを持つ半円柱の治具21に固定されて電気抵抗値を計測された。ここで、曲げセンサ10は、長手方向を治具21の外周に沿った方向とし、導電膜2を外側とする向きに向けられた。曲率半径Rは、10mm、20mm、30mm、40mm、50mm、無限大(平面)、の6種類とした。そして、同図(b)に示すように、tを曲げセンサの厚みとし、ひずみε=t/2Rとして導電膜の全長の電気抵抗を測定し、ひずみに対する抵抗変化率の関係を求めた。抵抗変化率は、ひずみ0のとき(平面治具使用時)の電気抵抗値を1として比の値で示した。 As shown in FIG. 10(a), the obtained bending sensor 10 was fixed to a semi-cylindrical jig 21 having a predetermined radius of curvature R, and the electrical resistance value was measured. Here, the bending sensor 10 was oriented such that the longitudinal direction was along the outer periphery of the jig 21, and the conductive film 2 was facing outward. The curvature radius R was set to six types: 10 mm, 20 mm, 30 mm, 40 mm, 50 mm, and infinity (flat). Then, as shown in FIG. 10(b), the electrical resistance of the entire length of the conductive film was measured with strain ε=t/2R, where t is the thickness of the bending sensor, and the relationship between the resistance change rate and strain was obtained. The resistance change rate was expressed as a ratio value, with the electrical resistance value at strain 0 (when using a flat jig) being 1.

図11に示すように、ひずみに対し、抵抗変化率はほぼ直線状に変化することが判った。また、抵抗変化率/ひずみで求められるゲージ率は、基材のメッシュ数によって変化することが判った。さらに、凹凸のないPETフィルムを基材に用いた場合に比べて、一定周期で凹凸を有する織布を基材に用いることで、ゲージ率が高くなる、すなわち曲げに対する感度が高くなることも判った。 As shown in Figure 11, it was found that the rate of resistance change changes almost linearly with strain. It was also found that the gauge factor, calculated as the rate of resistance change/strain, changes depending on the number of meshes in the substrate. Furthermore, it was also found that the gauge factor becomes higher, i.e., the sensitivity to bending becomes higher, by using a woven fabric with regular irregularities as the substrate compared to using a PET film with no irregularities as the substrate.

さらに、図12に示すように、ゲージ率のばらつきを求めたところ、織布を基材に用いた(100~200メッシュの)場合、凹凸のないPETフィルムを基材に用いた場合に比べて、ゲージ率のばらつきを小さくできることが判った。つまり、一定周期で凹凸を有する織布を基材に用いることで、曲げセンサの動作を安定して得られることが判った。 Furthermore, as shown in Figure 12, when the variation in gauge factor was calculated, it was found that when a woven fabric (100 to 200 mesh) was used as the substrate, the variation in gauge factor could be reduced compared to when a PET film with no irregularities was used as the substrate. In other words, it was found that the bending sensor can operate stably by using a woven fabric with irregularities at a constant interval as the substrate.

[試験3]
異なる保護膜のある曲げセンサを製造し、保護膜のない曲げセンサと併せてその性能を比較した。
[Test 3]
Bending sensors with different overcoats were fabricated and their performance compared alongside that of an unovercoated bending sensor.

図13(a)に示すように、導電膜2に対して隙間なく密着するように保護膜5’となる樹脂をベタ塗りして形成させた曲げセンサを製造した。保護膜5’となる樹脂として、PGMEA(プロピレングリコールモノメチルエーテルアセテート)を溶媒として用いたエポキシ樹脂と、水を溶媒として用いたPVA(ポリビニルアルコール)樹脂の2通りとした。 As shown in FIG. 13(a), a bending sensor was manufactured by applying a resin that would become a protective film 5' so that it would adhere closely to the conductive film 2 without any gaps. Two types of resin were used to make the protective film 5': an epoxy resin that uses PGMEA (propylene glycol monomethyl ether acetate) as a solvent, and a PVA (polyvinyl alcohol) resin that uses water as a solvent.

また、同図(b)に示すように、導電膜2の電極部を除いた周囲を囲むようにスペーサ6となる接着性樹脂を印刷によって塗布し、その上に保護膜5となるPETフィルムを貼り付けたものを製造した。接着性樹脂としては、エポキシ樹脂とPVA樹脂の2通りとした。 As shown in FIG. 2B, an adhesive resin that will become the spacer 6 is applied by printing to surround the conductive film 2 except for the electrode portion, and a PET film that will become the protective film 5 is attached on top of the adhesive resin. Two types of adhesive resin were used: epoxy resin and PVA resin.

図14に示すように、「保護膜あり」のうち「中空状」との表示のない2つが保護膜を導電膜に対して密着させたものであり、「中空状」がスペーサ6を介して保護膜5を配置したものである。保護膜を密着させると、「保護膜なし」の場合に比べてゲージ率を半分以下に低下させてしまった。一方、間隙を設けて保護膜5を配置した場合、「保護膜なし」に対してゲージ率の低下をほとんど生じなかった。つまり、導電膜に対して間隙を有するように保護膜を設けることで、高いゲージ率を維持できた。なお、保護膜を密着させた場合も、スペーサを設けた場合も、エポキシ樹脂とPVA樹脂との間に有意差は観察されなかった。 As shown in Figure 14, of the "with protective film" cases, the two without the "hollow" designation had the protective film adhered to the conductive film, and the "hollow" case had the protective film 5 placed via a spacer 6. When the protective film was adhered to the conductive film, the gauge factor was reduced to less than half that of the "without protective film" case. On the other hand, when the protective film 5 was placed with a gap, there was almost no reduction in the gauge factor compared to the "without protective film" case. In other words, by providing the protective film with a gap from the conductive film, a high gauge factor could be maintained. No significant difference was observed between the epoxy resin and the PVA resin, whether the protective film was adhered to the conductive film or the spacer was provided.

[試験4]
曲げセンサの製造において、亀裂を形成させるための芯材の曲率を変化させた場合の影響を調査した。
[Test 4]
In the manufacture of bending sensors, the effect of changing the curvature of the core material for forming cracks was investigated.

基材にメッシュ数100のポリエチレンメッシュを用いて、試験2と同様に曲げセンサを製作し、ゲージ率を測定した。ただし、亀裂の形成にあたって用いた芯材の直径は、2.0mm、4.0mm、6.0mmの3種類とした。 A bending sensor was fabricated in the same manner as in Test 2, using a polyethylene mesh with a mesh count of 100 as the base material, and the gauge factor was measured. However, the diameter of the core material used to form the crack was 2.0 mm, 4.0 mm, and 6.0 mm.

図15には、亀裂を観察した写真を示した。符号のa、b、cが、それぞれ芯材の直径2.0mm、4.0mm、6.0mmを示し、符号の数字1が反射光撮影、2が透過光撮影であることを示す。これによると、芯材の直径を2.0mmとした(a1)(a2)において、長手方向(紙面横方向)の直線が横切る亀裂の数は、糸の数の1/2となった。同様に、芯材の直径を4.0mmとした(b1)(b2)では1/3、芯材の直径を6.0mmとした(c1)(c2)では1/6であった。 Figure 15 shows photographs of the cracks. The symbols a, b, and c indicate core diameters of 2.0 mm, 4.0 mm, and 6.0 mm, respectively, with the number 1 indicating that the photograph was taken with reflected light and the number 2 indicating that the photograph was taken with transmitted light. This shows that in (a1) and (a2), where the core diameter was 2.0 mm, the number of cracks crossed by a straight line in the longitudinal direction (horizontal direction on the page) was 1/2 the number of threads. Similarly, in (b1) and (b2), where the core diameter was 4.0 mm, the number was 1/3, and in (c1) and (c2), where the core diameter was 6.0 mm, the number was 1/6.

また、図16に示すように、ゲージ率の測定結果を併せて表示した。今回の試験範囲においては、芯材の直径を小さくした方が高いゲージ率を得られた。つまり、芯材の直径によって、基材の凹凸の周期に対する亀裂の周期を制御でき、曲げセンサのゲージ率を制御し得ることが判った。 As shown in Figure 16, the measurement results of the gauge factor are also shown. In the test range this time, a higher gauge factor was obtained by making the diameter of the core material smaller. In other words, it was found that the diameter of the core material can control the period of the cracks relative to the period of the unevenness of the base material, and the gauge factor of the bending sensor can be controlled.

以上、本発明による実施例及びこれに基づく変形例を説明したが、本発明は必ずしもこれに限定されるものではなく、当業者であれば、本発明の主旨又は添付した特許請求の範囲を逸脱することなく、様々な代替実施例及び改変例を見出すことができるであろう。 Although the above describes an embodiment of the present invention and variations based thereon, the present invention is not necessarily limited thereto, and a person skilled in the art will be able to find various alternative embodiments and modifications without departing from the spirit of the present invention or the scope of the appended claims.

1 基材
2 導電膜
3 亀裂
10 曲げセンサ
REFERENCE SIGNS LIST 1 Substrate 2 Conductive film 3 Crack 10 Bending sensor

Claims (10)

帯状の導電路を形成するように基材の主面上に与えられた導電膜に導入された亀裂の開閉による抵抗変化から曲げを検出する曲げセンサであって、
前記基材は前記主面に一定周期で凹凸を有する織布であって、前記導電路には厚さ方向及び幅方向に前記導電膜を貫通する亀裂を複数含むとともに、前記亀裂が前記凹凸に対応した位置にあることを特徴とする曲げセンサ。
A bending sensor that detects bending from a resistance change caused by opening and closing of a crack introduced in a conductive film provided on a main surface of a substrate so as to form a strip-shaped conductive path,
A bending sensor characterized in that the substrate is a woven fabric having irregularities on the main surface at a regular interval, the conductive path includes a plurality of cracks that penetrate the conductive film in the thickness and width directions, and the cracks are located at positions corresponding to the irregularities.
前記織布は互いに直交する縦糸及び横糸を織り合わせてなり、前記縦糸又は前記横糸が前記導電路の幅方向に配置されていることを特徴とする請求項1記載の曲げセンサ。 The bending sensor according to claim 1, characterized in that the woven fabric is made by weaving together warp threads and weft threads that are perpendicular to each other, and the warp threads or the weft threads are arranged in the width direction of the conductive path. 前記織布は前記縦糸及び前記横糸を平織りしてなることを特徴とする請求項2記載の曲げセンサ。 The bending sensor according to claim 2, characterized in that the woven fabric is formed by plain weaving the warp and weft threads. 前記織布の前記主面には絶縁膜を間に介して前記導電膜を与えられていることを特徴とする請求項1乃至3のうちの1つに記載の曲げセンサ。 The bending sensor according to any one of claims 1 to 3, characterized in that the conductive film is provided on the main surface of the woven fabric with an insulating film interposed therebetween. 前記導電膜は前記基材の前記主面に対向して与えられた保護膜と間隙を有してその下部に与えられていることを特徴とする請求項1乃至4のうちの1つに記載の曲げセンサ。 The bending sensor according to any one of claims 1 to 4, characterized in that the conductive film is provided below a protective film provided opposite the main surface of the substrate with a gap therebetween. 帯状の導電路を形成するように基材の主面上に与えられた導電膜に導入された亀裂の開閉による抵抗変化から曲げを検出する曲げセンサの製造方法であって、
前記基材は前記主面に一定周期で凹凸を有する織布であって、前記導電膜を与える導電性材料を前記基材の上に塗布し、前記基材を曲げることで、前記導電路には厚さ方向及び幅方向に前記導電膜を貫通する亀裂を複数与えるとともに、前記亀裂を前記凹凸に対応した位置に与えることを特徴とする曲げセンサの製造方法。
A method for manufacturing a bending sensor that detects bending from a resistance change caused by opening and closing of a crack introduced in a conductive film provided on a main surface of a substrate so as to form a strip-shaped conductive path, comprising:
The method for manufacturing a bending sensor is characterized in that the substrate is a woven fabric having irregularities on its main surface at a regular interval, a conductive material that provides the conductive film is applied onto the substrate, and the substrate is bent to provide a plurality of cracks in the conductive path that penetrate the conductive film in the thickness and width directions, and to provide the cracks at positions corresponding to the irregularities.
前記織布は互いに直交する縦糸及び横糸を織り合わせてなり、前記縦糸又は前記横糸が前記導電路の幅方向に配置されるように前記導電性材料を前記基材の上に塗布することを特徴とする請求項6記載の曲げセンサの製造方法。 The method for manufacturing a bending sensor according to claim 6, characterized in that the woven fabric is made by weaving together warp and weft threads that are perpendicular to each other, and the conductive material is applied onto the substrate so that the warp threads or the weft threads are arranged in the width direction of the conductive path. 前記織布は前記縦糸及び前記横糸を平織りしてなることを特徴とする請求項7記載の曲げセンサの製造方法。 The method for manufacturing a bending sensor according to claim 7, characterized in that the woven fabric is made by plain weaving the warp and weft threads. 前記織布の前記主面に絶縁膜を与え、この上に前記導電性材料を塗布することを特徴とする請求項6乃至8のうちの1つに記載の曲げセンサの製造方法。 The method for manufacturing a bending sensor according to any one of claims 6 to 8, characterized in that an insulating film is provided on the main surface of the woven fabric, and the conductive material is applied onto the insulating film. 前記導電膜が前記基材の前記主面に対向して与えられた保護膜と間隙を有してその下部に与えられるように、前記基材の上に前記導電膜を囲んでスペーサを与えこの上に前記保護膜を形成することを特徴とする請求項6乃至9のうちの1つに記載の曲げセンサの製造方法。 The method for manufacturing a bending sensor according to any one of claims 6 to 9, characterized in that a spacer is provided on the substrate surrounding the conductive film so that the conductive film is provided below the protective film provided facing the main surface of the substrate with a gap therebetween, and the protective film is formed on top of the spacer.
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Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US20090282671A1 (en) 2008-05-19 2009-11-19 Xiaoming Tao Method for manufacturing fabric strain sensors
WO2012060427A1 (en) 2010-11-04 2012-05-10 東海ゴム工業株式会社 Bending sensor
JP2014038088A (en) 2012-07-20 2014-02-27 Yamaha Corp Strain sensor
JP2016176874A (en) 2015-03-20 2016-10-06 ヤマハ株式会社 Strain sensor element
JP2019011965A (en) 2017-06-29 2019-01-24 グンゼ株式会社 Tensile sensor

Family Cites Families (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH11124775A (en) * 1997-10-17 1999-05-11 Seiren Co Ltd Fabric having electrode function

Patent Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US20090282671A1 (en) 2008-05-19 2009-11-19 Xiaoming Tao Method for manufacturing fabric strain sensors
WO2012060427A1 (en) 2010-11-04 2012-05-10 東海ゴム工業株式会社 Bending sensor
JP2014038088A (en) 2012-07-20 2014-02-27 Yamaha Corp Strain sensor
JP2016176874A (en) 2015-03-20 2016-10-06 ヤマハ株式会社 Strain sensor element
JP2019011965A (en) 2017-06-29 2019-01-24 グンゼ株式会社 Tensile sensor

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