JP7702787B2 - Pad raw material polishing device - Google Patents

Description

The present invention relates to a pad polishing device that can polish pads with high precision and efficiency.

As is well known, in substrate polishing apparatuses for polishing substrates such as wafers, the substrate is commonly polished by pressing the substrate against a polishing pad attached to a platen and moving it relative to the platen (see, for example, Patent Document 1).

The polishing pads used in this type of substrate polishing are manufactured by cutting the original pad roll, and a high degree of flatness must be ensured. Therefore, the original pad roll must be polished with high precision.

Therefore, various polishing devices have been disclosed that polish raw pads with high precision (see, for example, Patent Document 2).

Japanese Patent Application Publication No. 9-155721 JP 2000-158303 A

However, in order to polish substrates such as wafers with higher precision, it is desirable to manufacture pad base material with higher precision.

In view of the above, one of the objects of the present invention is to provide a pad roll polishing device capable of polishing pad rolls with high precision.

The present invention proposes the following means to solve the above problems.
(1) One aspect of the pad raw material polishing device of the present invention is characterized in that it comprises a feed roll formed in a cylindrical shape and supported rotatably about a first axis, a polishing roll formed in a cylindrical shape and supported rotatably about a second axis parallel to the first axis, and cooperates with the feed roll to polish the pad raw material, a feed roll drive unit that rotates and drives the feed roll, a polishing roll drive unit that rotates and drives the polishing roll, a first tensile force applying means arranged on the rear side of the polishing roll in the pad raw material transport direction in which the pad raw material is transported, and applying a tensile force to the pad raw material from the polishing area where the pad raw material is polished by the polishing roll toward the rear side in the pad raw material transport direction, and a second tensile force applying means arranged on the front side of the polishing roll in the pad raw material transport direction, and applying a tensile force to the pad raw material from the polishing area toward the front side in the transport direction from the polishing area.

According to the pad raw material polishing device of the present invention, there is provided a feed roll rotatably supported about a first axis, a polishing roll supported on a second axis and working together with the feed roll to polish the pad raw material, a feed roll drive unit which rotates and drives the feed roll, and a polishing roll drive unit which rotates and drives the polishing roll, so that while the pad raw material is fed to the feed roll, the polishing roll rotatably supported about the second axis and the feed roll work together to polish the pad raw material in the polishing area while the pad raw material is moving on the feed roll.
Specifically, a predetermined gap is formed between the feed roll and the polishing roll, and the raw pad is polished by passing the raw pad through this gap.
In addition, since the pad original polishing device is equipped with a first tensile force applying means, a tensile force is applied from the polishing area where the polishing roll polishes the pad original toward the rear side in the pad original transport direction, so that the pad original is pulled toward the rear side of the polishing area, making it possible to suppress the occurrence of differences in expansion and contraction of the pad original in the polishing area, and suppressing the occurrence of variations in the thickness of the pad original.
In addition, since the pad raw material polishing device is equipped with a second tensile force applying means, a tensile force is applied to the pad raw material toward the forward side in the pad raw material transport direction, and an even tensile force is applied to the pad raw material being polished, so that the pad raw material can be polished to a uniform thickness.
As a result, the raw pad can be polished with high precision (uniform thickness).
The term "polishing area" used herein is used to conceptually indicate the area in which the polishing roll polishes the raw pad.

(2) In the pad raw material polishing device described in (1) above, the first tensile force applying means may include a first tensile force detection means for detecting a tensile force generated on the pad raw material from the polishing area toward the rear side in the pad raw material transport direction, and a first tensile force adjustment means for adjusting the tensile force generated on the pad raw material toward the rear side in the pad raw material transport direction within a predetermined range based on the tensile force detected by the first tensile force detection means.

According to the pad raw material polishing apparatus of the present invention, the first tensile force applying means is equipped with a first tensile force detection means and a first tensile force adjustment means, and the first tensile force detection means detects the tensile force generated on the pad raw material toward the rear in the transport direction, and based on the tensile force detected by the first tensile force detection means, the first tensile force adjustment means adjusts the tensile force on the pad raw material toward the rear in the transport direction from the polishing area to within a predetermined range, thereby suppressing the occurrence of thickness variations in the pad raw material transported to the feed roll and stabilizing the thickness of the pad raw material.
As a result, the raw pad can be polished to a consistent thickness to produce a high-quality polishing pad.

(3) The pad raw material polishing device described in (1) or (2) above may be provided with a second tensile force applying means that detects the tensile force generated on the pad raw material from the polishing area toward the front side in the pad raw material transport direction, and a second tensile force adjusting means that adjusts the tensile force generated on the pad raw material toward the front side in the pad raw material transport direction to within a predetermined range based on the tensile force detected by the second tensile force detecting means.

According to the pad raw material polishing apparatus of the present invention, the second tensile force applying means is equipped with a second tensile force detection means and a second tensile force adjustment means, and the second tensile force detection means detects the tensile force generated on the pad raw material from the polishing area toward the forward side in the transport direction, and the second tensile force adjustment means adjusts the tensile force generated on the pad raw material toward the forward side in the pad raw material transport direction based on this tensile force so that it is within a predetermined range, thereby suppressing the occurrence of thickness variations in the pad raw material transported by the feed roll and stabilizing the thickness of the pad raw material.
As a result, the raw pad can be polished to a consistent thickness to produce a high-quality polishing pad.

The pad roll polishing device of this invention allows pad rolls to be polished with high precision.

FIG. 2 is a side view illustrating an example of a schematic configuration of a roll layout of the pad material polishing apparatus according to the first embodiment of the present invention. 3 is a partial cross-sectional view taken along a pad web transport direction, illustrating a schematic configuration of a rubber roll (feed roll) of the pad web polishing apparatus according to the first embodiment. FIG. 1 is a diagram illustrating a schematic configuration of a polishing roll of a pad-form polishing apparatus according to a first embodiment, viewed along a pad-form transport direction. FIG. FIG. 2 is a side view illustrating a schematic configuration of a first tensile force detection means according to the first embodiment. 1 is a side view illustrating a schematic configuration of a first tensile force detection means of the pad original polishing apparatus according to the first embodiment. FIG. 4 is a diagram illustrating a schematic configuration of a first tensile force detection means of the pad fabric polishing apparatus according to the first embodiment, viewed along the pad fabric transport direction. FIG. 1 is a side view of a state in which a pinch roll is placed on a pinch roll support, illustrating the schematic configuration of a first tensile force adjustment means of the pad original polishing apparatus according to the first embodiment. FIG. 1 is a side view of a state in which a pinch roll is placed on a pinch roll support, illustrating the schematic configuration of a first tensile force adjustment means of the pad original polishing apparatus according to the first embodiment. FIG. 13 is a side view illustrating the operation of the first tensile force adjusting means of the pad original polishing apparatus according to the first embodiment. FIG. FIG. 4 is a side view illustrating a schematic configuration of a second tensile force detection means according to the first embodiment. 13 is a side view illustrating a schematic configuration of a second tensile force detection means of the pad original polishing apparatus according to the first embodiment. FIG.

First Embodiment
A first embodiment of the present invention will now be described with reference to FIGS.
FIG. 1 is a side view for explaining a schematic configuration of a roll layout of a pad material polishing apparatus according to a first embodiment of the present invention.

In the figure, reference numeral 100 denotes the pad raw material grinding device, reference numeral 110 denotes the pad raw material feeder (pad raw material feed section), reference numeral 120 denotes the pad raw material grinding device body, reference numeral 122 denotes a rubber roll (feed roll), reference numeral 125 denotes a grinding roll, reference numeral 150 denotes a first tensile force applying means, reference numeral 160 denotes a second tensile force applying means, and reference numeral S denotes a pad raw material.

As shown in FIG. 1, the pad fabric polishing device 100 includes, for example, a pad fabric payout machine (pad fabric payout section) 110, a pad fabric polishing device main body 120, a first tensile force applying means 150, a second tensile force applying means 160, and a control section (not shown).

The pad roll S is transported, for example, through the pad roll delivery machine (pad roll delivery section) 110, the first tensile force applying means 150, the pad roll polishing device main body 120, and the second tensile force applying means 160 in that order.

As shown in Figures 1 and 2, the pad raw material polishing device main body 120 includes, for example, a rubber roll (feed roll) 122, a polishing roll 125, a rubber roll drive motor 122M that drives the rubber roll (feed roll) 122 to rotate, a polishing roll drive motor (polishing roll drive unit) 125M that drives the polishing roll 125 to rotate, a temperature control fluid supply unit (not shown), a brush unit 130, and a roll spacing adjustment mechanism (not shown).

In this embodiment, the first tensile force applying means 150 is disposed in the pad original sheet feeder 110. Specifically, the first tensile force applying means 150 is disposed between the pad original sheet feeder (pad original sheet feeder section) 110 and the pad original sheet polishing apparatus main body 120.
The first tensile force applying means 150 is configured to apply a tensile force from the polishing area to the rear side in the sheet transport direction to the pad sheet S before polishing.

In this embodiment, the second tensile force applying means 160 is disposed on the front side of the pad fabric polishing apparatus body 120 in the pad fabric transport direction.
The second tensile force applying means 160 is configured to apply a tensile force to the pad web S after polishing in a forward direction in the pad web transport direction.
The first tensile force applying means 150 and the second tensile force applying means 160 will be described in detail later.

As shown in FIG. 1, the pad roll unwinding machine (pad roll unwinding section) 110 includes, for example, a roll 111 on which the pad roll S is wound, a roll support stand (not shown) that supports the roll 111, a peeling roll 114 that peels the pad roll S from the roll 111, a dancing roll 116, and a transport roll 117.

The pad roll unloading machine 110 is configured to send the pad roll S peeled off from the roll 111 by the peeling roll 114 to the pad roll polishing device main body 120 via the dancing roll 116 and the transport roll 117.

The raw material roll 111 is formed in a cylindrical shape by winding the pad raw material S around a raw material roll shaft 111J.
The pad raw material S is pulled out from the upper part of the outer circumferential surface of the raw material roll 111.

As shown in FIG. 1, the peeling roll 114 includes, for example, a driving roll 114A and a pinch roll 114B that is disposed opposite the driving roll 114A and that applies a gripping force by its own weight.
The pad raw material S is sandwiched between the driving roll 114A and the pinch roll 114B, and the driving roll 114A rotates to pull out the pad raw material S from the raw material roll 111.
The transport roll 117 is, for example, a drive roll that is rotated by a motor (not shown).
The conveying roll 117 is rotated to send out the raw pad S toward the raw pad polishing apparatus body 120 .

As shown in FIG. 1, the dancing roll 116 is disposed between the peeling roll 114 and the transport roll 117, and is movable in the vertical direction as indicated by an arrow F.
The dancing roll 116 moves vertically to suppress deflection of the pad raw material S when a change occurs in the length of the pad raw material S between the peeling roll 114 and the transport roll 117.

The rubber roll (feed roll) 122 is formed in a cylindrical shape and is supported by the polishing apparatus main body frame 121 so as to be rotatable about a first axis O1.
The polishing roll 125 is formed in a cylindrical shape and is supported by the polishing apparatus main body frame 121 so as to be rotatable about a second axis O2.

The polishing apparatus main body frame 121 is formed, for example, in a generally rectangular shape when viewed from the side and includes a pair of left and right frame bodies 121L and 121R standing upward from the floor surface.
The left and right frame bodies 121L and 121R are provided with bearing blocks 122J that support the left and right ends of the rubber roll (feed roll) 122 and bearing blocks 125J that support the left and right ends of the polishing roll 125.

The first axis O1 and the second axis O2 are arranged in parallel, and the distance between the rubber roll (feed roll) 122 and the polishing roll 125 can be adjusted by a roll gap adjustment mechanism (not shown).

Next, the rubber roll (feed roll) 122 will be described with reference to FIG. 2. FIG. 2 is a partial cross-sectional view taken along the pad raw material transport direction, illustrating an example of the schematic configuration of the rubber roll 122 according to the first embodiment.

As shown in FIG. 2, the rubber roll (feed roll) 122 includes, for example, a metallic roll body 122A formed in a cylindrical shape centered on a first axis O1, a rubber lining 122B formed on the outer peripheral surface of the roll body 122A, and a rotating shaft 122P formed on both the left and right ends of the roll body 122A.

As shown in FIG. 2, the rubber roll (feed roll) 122 has left and right rotating shafts 122P rotatably supported by bearing blocks 122J and is connected to a rubber roll drive motor (feed roll drive unit) 122M via a transmission member (e.g., a timing belt) 122V.
The rubber roll 122 is rotated by a rubber roll drive motor 122M.

The rubber roll (feed roll) 122 is configured to transport the pad raw material S sent from the pad raw material delivery machine (pad raw material delivery section) 110 forward in the pad raw material delivery direction.
Specifically, the outer peripheral surface of the rubber lining 122B adheres closely to the pad raw material S, thereby gripping and transporting the pad raw material S, holding the pad raw material S while it is being polished, and sending out the polished pad raw material S.

Next, the polishing roll 125 will be described with reference to Fig. 3. Fig. 3 is a partial cross-sectional view taken along the pad sheet transport direction, illustrating an example of a schematic configuration of the polishing roll according to the first embodiment.
As shown in FIG. 3 , the grinding roll 125 includes, for example, a roll body 126 formed in a cylindrical shape centered on the second axis O2, a rotation shaft 127 passing through the inside of the roll body 126 and extending toward the left side (first end side) L and right side (second end side) R of the roll body 126, an end member 128L arranged at the end of the left side L of the roll body 126, an end member 128R arranged at the end of the right side (second end side) R of the roll body 126, and a screw-shaped member 129.
In addition, for example, sandpaper (not shown) can be attached (e.g., glued) to the surface of the body 126 .

The rotating shaft 127 passes through the end members 128L and 128R and extends to the left and right of the roll barrel 126.
The rotating shaft 127 has a rotating shaft main body 127A formed in the roll barrel 126 with a diameter larger than both end portions.
The screw-shaped member 129 is formed in a helical shape and is disposed along the outer circumferential surface of the rotating shaft main body 127A.

As shown in FIG. 3, a spiral temperature control fluid passage 125P is formed inside the polishing roll 125 along the screw-shaped member 129. Specifically, the temperature control fluid passage 125P is formed in a spiral shape revolving around the second axis O2 between the roll barrel 126 and the rotating shaft main body 127A inside the polishing roll 125.

The polishing roll 125 has a rotating shaft 127 rotatably supported by a bearing block 125J and is connected to a polishing roll drive motor (polishing roll drive unit) 125M via a transmission member (eg, a V-belt) 125V.
The polishing roll 125 is rotated by a polishing roll drive motor (polishing roll drive unit) 125M.

As shown in FIG. 3, the rotating shaft 127 has a temperature control fluid inlet hole 127D and a temperature control fluid outlet hole 127E formed between the end members 128L and 128R in the direction of the second axis O2, respectively.

The temperature control fluid that flows in through the temperature control fluid inlet hole 127D flows through the temperature control fluid passage 125P and flows out through the temperature control fluid outlet hole 127E. While the temperature control fluid flows through the temperature control fluid passage 125P, it exchanges heat with the roll body 126, thereby regulating the temperature of the outer peripheral surface of the roll body 126.
The temperature control fluid flowing out from the temperature control fluid outlet hole 127E is discharged to the outside of the system.
In addition, the temperature control fluid supply means is not limited to a type in which the temperature control fluid is discharged outside the system, and various well-known temperature control fluid supply units (not shown), such as a type in which the temperature control fluid is circulated, can be used.

In this way, by circulating a temperature control fluid (e.g., cooling water) from a temperature control fluid supply unit (not shown) to the temperature control fluid passage 125P, the heat generated by the polishing roll 125 when polishing the raw pad S can be reduced and adjusted to a predetermined range.

The distance between the rubber roll (feed roll) 122 and the polishing roll 125 can be adjusted, for example, by a roll spacing adjustment mechanism (not shown) as described above.

As shown in FIG. 1, the brush unit 130 includes, for example, a rubber roll brush 131, a pad fabric brush 135, a drive motor 130M, and timing belts (transmission members) 130V and 135V that transmit the rotation of the drive motor 130M to the rubber roll brush 131 and the pad fabric brush 135.

The rubber roll brush 131 is, for example, an axial member that extends along an axis that is arranged parallel to the first axis O1, has a sheet-like material wound around its outer circumferential surface, and has a large number of bristles planted in the sheet-like material.
The rubber roll brush 131 is configured so that a large number of bristles extend radially when rotated.
In addition, it is preferable to use soft bristles that are weak in stiffness as the bristles used for the rubber roll brush 131 in order to remove dust and prevent damage to the rubber roll 122. Specifically, it is more preferable to use soft goat hair, for example.

The pad raw material brush 135 is, for example, an axial member that extends along an axis that is arranged parallel to the first axis O1 and the axis of the rubber roll brush 131, and has a large number of bristles implanted in a sheet-like member that is wound around the outer circumferential surface.
The pad brush 135 is configured so that a large number of bristles extend radially when rotated.
In addition, the bristles used for the pad fabric brush 135 are preferably horsehair, for example, in terms of removing dust and static electricity.

The drive motor 130M is connected to the rubber roll brush 131 and the pad raw material brush 135 by transmission means 130V, 135V such as a V-belt. The drive motor 130M is configured to rotate the rubber roll brush 131 and the pad raw material brush 135.

Next, the first tensile force application means 150 will be described with reference to Figures 1, 4, and 5A to 6B. In the figures, reference numeral 151 denotes a first tensile force detection means, and reference numeral 155 denotes a first tensile force adjustment means.
In this embodiment, the first tensile force applying means 150, as shown in Figures 1 and 4, is equipped with, for example, a first tensile force detection means 151 that detects the tensile force of the pad raw material S, and a first tensile force adjustment means 155 that adjusts the tensile force of the pad raw material S.

As shown in Figures 4 and 5A, the first tensile force detection means 151 includes, for example, a first guide roll 152A, a second guide roll 152B, a third guide roll 152C, a bearing unit 153 that rotatably supports the first to third guide rolls 152A, 152B, and 152C, and a load cell 154 disposed below the bearing unit 153 that supports the second guide roll 152B.

The first guide roll 152A, the second guide roll 152B, and the third guide roll 152C are disposed in this order along the transport direction of the raw pad sheet S.
5B, the first to third guide rolls 152A, 152B, and 152C are formed to be wider than the pad raw material S. In addition, in FIG. 5B, the gaps between the first to third guide rolls 152A, 152B, and 152C and the pad raw material S are exaggerated.

For example, the first guide roll 152A contacts the pad raw material S with its lateral outer peripheral surface located on the opposite side to the second guide roll 152B, the second guide roll 152B contacts the pad raw material S with its upper outer peripheral surface, and the third guide roll 152C contacts the pad raw material S with its lower outer peripheral surface.

As a result, the second guide roll 152B is pressed downward from above by the pad raw sheet S. Then, the load applied by the pad raw sheet S pressing the second guide roll 152B is applied to the load cell 154 via the bearing unit 153.
A load measurement signal generated by the load applied to the load cell 154 is sent to a control unit (not shown). The control unit (not shown) calculates the tensile force acting in the transport direction of the raw pad sheet S.

If the direction (vector) of the load applied by the pad raw material S to the second guide roll 152B is inclined with respect to the normal line of the load receiving surface of the load cell 154, the control unit (not shown) is configured to correct the tensile force of the pad raw material S.

As shown in Figures 6, 7A, and 7B, the first tension adjustment means 155 includes, for example, a conveying roll (drive roll) 117, a pinch roll 156 that is arranged opposite the conveying roll 117 and applies a gripping force by its own weight, and a pinch roll support 157 on which the pinch roll 156 can be temporarily placed.

When the pad raw material S is set in the pad raw material polishing device 100 by passing the pad raw material S between the pinch roll 156 and the transport roll 117, for example, the pinch roll 156 is temporarily placed in the arc-shaped recess of the pinch roll receiving base 157 as shown in FIG. 7A, and the pinch roll 156 is separated from the transport roll 117 to form a gap between the pinch roll 156 and the transport roll 117.

Also, after the pad raw sheet S has been passed between the transport roll 117 and the pinch roll 156, as shown in FIG. 7B, the pinch roll 156 is moved from the pinch roll support 157 toward the transport roll 117 so that the pad raw sheet S is sandwiched between the pinch roll 156 and the transport roll 117.
The pinch roll 156 cooperates with the transport roll 117 by its own weight to apply a gripping force to the raw pad sheet S.

As a result, when the feed speed of the pad raw sheet S changes, the tensile force acting on the pad raw sheet S toward the rear side in the transport direction is adjusted within a predetermined range.
In addition, the change in length of the pad raw material S that occurs behind the conveying roll (drive roll) 117 in the conveying direction due to a change in the feed speed of the pad raw material S by the first tensile force adjustment means 155 is absorbed by the dancing roll 116 moving in the vertical direction, thereby preventing deflection of the pad raw material S.

Next, the second tensile force applying means 160 will be described with reference to Figures 1, 8 and 9. In the figures, reference numeral 161 denotes a second tensile force detecting means, and reference numeral 165 denotes a second tensile force adjusting means.
In this embodiment, the second tensile force applying means 160, as shown in Figures 1 and 8, is equipped with, for example, a second tensile force detection means 161 that detects the tensile force of the pad raw material S, and a second tensile force adjustment means 165 that adjusts the tensile force of the pad raw material S.

As shown in FIG. 9, the second tensile force detection means 161 includes, for example, a first guide roll 162A, a second guide roll 162B, a third guide roll 162C, a bearing unit 163 that rotatably supports the first to third guide rolls 162A, 162B, and 162C, and a load cell 164 disposed below the bearing unit 163 that supports the second guide roll 162B.

The first guide roll 162A, the second guide roll 162B, and the third guide roll 162C are disposed in this order along the transport direction of the raw pad sheet S.
The first to third guide rolls 162A, 162B, and 162C are formed to be wider than the raw pad sheet S.

For example, the first guide roll 162A contacts the pad raw material S on the lower side of the outer circumferential surface, the second guide roll 162B contacts the pad raw material S on the upper side of the outer circumferential surface, and the third guide roll 162C contacts the pad raw material S on the lower side of the outer circumferential surface.

As a result, the second guide roll 162B is pressed downward from above by the pad raw sheet S. In addition, the load applied by the pad raw sheet S pressing the second guide roll 162B is applied to the load cell 164 via the bearing unit 163.
A load measurement signal generated by the load applied to the load cell 164 is sent to a control unit (not shown). The control unit (not shown) calculates the tensile force acting in the transport direction of the raw pad sheet S.

In addition, if the direction (vector) of the load applied by the pad raw material S to the second guide roll 162B is inclined with respect to the normal line of the load receiving surface of the load cell 164, the tensile force of the pad raw material S is corrected in the same manner as in the case of the first tensile force detection means 151.

As shown in Figures 1 and 8, the second tension adjustment means 165 is configured, for example, with a transport roll (drive roll) 166, a pinch roll 167 that is arranged opposite the transport roll 166 and applies a gripping force by its own weight, and a pinch roll lever (not shown) that sets the position of the pinch roll 167 relative to the transport roll 166.

As in the case of the first tension adjustment means 155, for example, when the pinch roll lever (not shown) changes its position and the pinch roll 166 comes into contact with the transport roll 117, the pinch roll 167 and the transport roll 166 cooperate to clamp the raw pad roll S.

As a result, the feed speed of the pad raw material S changes, and the tensile force acting on the pad raw material S toward the rear in the transport direction is adjusted within a predetermined range.

The control unit (not shown) is electrically connected to, for example, the pad roll feeder (pad roll feeder) 110, the pad roll polishing device main body 120, the brush unit 130, the first tensile force applying means 150, and the second tensile force applying means 160. The control unit (not shown) controls these in a synchronized manner.

First, the control unit (not shown) causes the raw material payout machine (raw material payout unit) 110 to pay out the pad raw material S from the raw material roll 111 and transport it to the pad raw material polishing apparatus main body 120.
At this time, the control unit (not shown) adjusts the payout amount of the raw pad S according to the height of the dancing roll 116. Specifically, when the dancing roll 116 is higher than a set position, the rotation speed of the peeling roll 114 is increased, and when the dancing roll 116 is lower than the set position, the rotation speed of the peeling roll 114 is decreased.

Then, while the pad raw material S fed from the raw material feeder (raw material feed section) 110 is being transported by the rubber roll (feed roll) 122, the pad raw material S is polished by the polishing roll 125.

Specifically, the control unit (not shown) rotates the polishing roll 125 arranged at a predetermined interval relative to the rubber roll 122 to uniformly polish the surface of the raw pad S being transported by the rubber roll 122.
At this time, the portion where the polishing roll 125 contacts the surface of the raw pad S is defined as a polishing region where the raw pad S is polished.

In addition, the control unit (not shown) rotates the brush unit 130 to remove dust from the rubber roll 122 and the polished raw pad sheet S.
The polished raw pad sheet S is sent to a raw pad sheet winder (not shown), for example, via a dust collector (not shown).
In addition, the control unit (not shown) adjusts the dust collection device so that the pad raw sheet S does not sag, and causes the pad raw sheet S sent by the pad raw sheet winder to be wound onto a winding roll (not shown).

In addition, the control unit (not shown) applies a tensile force within a set predetermined range to the pad raw material S sent to the pad raw material polishing device main body 120 by the first tensile force applying means 150 toward the rear side in the transport direction.

Specifically, the control unit (not shown) calculates the tensile force acting along the transport direction of the raw pad sheet S based on the load measurement signal (load measured by the load cell 154) sent from the first tensile force detection means 151.

If the direction (vector) of the load applied by the pad raw material S to the second guide roll 152B is inclined with respect to the normal to the load receiving surface of the load cell 154, the inclination (intersection angle) between the load direction and the normal to the load receiving surface is clarified, and the effect of this inclination is corrected when calculating the tensile force generated in the pad raw material S.

Then, based on the tensile force of the pad raw sheet S measured by the first tensile force detection means 151, the control unit (not shown) adjusts the rotation speed of the transport roll (drive roll) 117 so that the tensile force generated in the pad raw sheet S on the rear side in the pad raw sheet transport direction is within a predetermined range.
Specifically, for example, when the tensile force is low, the rotation speed of the transport roll (drive roll) 117 is decreased, and when the tensile force is high, the rotation speed of the transport roll (drive roll) 117 is increased.
The rotation speed of the transport roll (drive roll) 117 is adjusted by, for example, calculating using PID control.

In addition, the control unit (not shown) applies a tensile force within a set predetermined range to the pad raw material S polished by the pad raw material polishing device main body 120 toward the forward side in the conveying direction by the second tensile force applying means 160.

Specifically, the control unit (not shown) calculates the tensile force acting along the transport direction of the pad raw material S based on the load measurement signal (load measured by the load cell 164) sent from the second tensile force detection means 161.
At this time, the tensile force acting on the raw pad S is corrected in the same manner as in the case of the first tensile force detection means 151 .

Then, based on the tensile force of the pad raw sheet S measured by the second tensile force detection means 161, the control unit (not shown) adjusts by increasing or decreasing the rotation speed of the transport roll (drive roll) 166 so that the tensile force generated in the pad raw sheet S on the front side in the pad raw sheet transport direction is within a predetermined range.
Specifically, for example, when the tensile force is low, the rotation speed of the transport roll (drive roll) 166 is increased, and when the tensile force is high, the rotation speed of the transport roll (drive roll) 166 is decreased.
The rotation speed of the transport roll (drive roll) 166 is adjusted by, for example, calculating using PID control.

According to the pad raw material polishing apparatus 100 of the first embodiment, the first tensile force detection means 151 detects the tensile force generated in the pad raw material, and based on the tensile force detected by the first tensile force detection means 151, the first tensile force adjustment means 155 adjusts the tensile force applied to the pad raw material S from the polishing area to the rear side in the transport direction of the pad raw material S so that it is within a predetermined range, thereby suppressing the occurrence of differences in expansion and contraction of the pad raw material S in the polishing area and suppressing the occurrence of variations in the thickness of the pad raw material S.
In addition, the second tensile force detection means 161 detects the tensile force generated in the pad original sheet S at the front side in the pad original sheet transport direction, and a tensile force toward the front side in the pad original sheet transport direction is applied to the pad original sheet S, so that an equal tensile force is applied to the pad original sheet S before and after polishing, thereby enabling the pad original sheet S to be polished evenly.
Specifically, the second tensile force applying means 160 adjusts the tensile force generated in the pad raw material S toward the forward side in the pad raw material transport direction so that it is within a predetermined range, thereby suppressing the occurrence of thickness variations in the polished pad raw material S and stabilizing the thickness of the pad raw material S.
As a result, the raw pad S can be polished to a consistent thickness to produce a high-quality polishing pad.
In addition, for example, when replacing the raw pad roll, the thickness can be adjusted efficiently and quickly to a stable thickness.

The present invention is not limited to the above embodiment, and various modifications can be made without departing from the spirit of the invention. In other words, the configuration of the pad raw material polishing device can be set arbitrarily within the scope of the purpose of the present invention.

For example, in the above embodiment, a case has been described in which the first tensile force applying means 150 is equipped with a first tensile force detection means 151 and a first tensile force adjustment means 155, and the second tensile force applying means 160 is equipped with a second tensile force detection means 161 and a second tensile force adjustment means 1655. However, the configurations of the first tensile force applying means 150 and the second tensile force applying means 160 can be set arbitrarily, and for example, they may be configured to apply tensile forces to the rear and front sides in the pad raw material transport direction without being equipped with the first tensile force detection means 151 and the second tensile force detection means 161.
Furthermore, the positions at which the first tensile force applying means 150 and the second tensile force applying means 160 are disposed may be set arbitrarily.

In addition, in the above embodiment, the first tensile force detection means 151 in the first tensile force applying means 150 is equipped with first to third guide rolls 152A, 152B, 152C for feeding the pad raw material S, a bearing unit 153, and a load cell 154, and a case has been described in which the tensile force is measured by detecting the load applied to the load cell 154, but the tensile force may also be measured by other measurement methods.
The same applies to the second tensile force detection means 161 in the second tensile force application means 160 .

In addition, in the above embodiment, the first tensile force adjustment means 155 in the first tensile force applying means 150 adjusts the tensile force acting on the buff raw material S by changing the transport speed of the pad raw material S by clamping the pad raw material S using the pinch roll 156 and the transport roll (drive roll) 117 in cooperation with each other, but the tensile force acting on the buff raw material S may also be adjusted by other means.
The same applies to the second tensile force adjusting means 165 in the second tensile force applying means 160 .

In addition, in the above embodiment, a temperature control fluid may be circulated through a temperature control fluid passage (not shown) formed in the polishing roll 125, or the temperature of the polishing roll 125 may be adjusted using a heater or the like (not shown).

In the above embodiment, the feed roll is a rubber roll 122 with a rubber lining formed on the outer circumferential surface, but the feed roll may have another configuration.

In the above embodiment, the polishing roll 125 is described as having sandpaper (sheet-like abrasive material) attached to its outer circumferential surface, but it may also be configured such that, for example, diamond abrasive grains or other abrasive grains are directly formed on the outer circumferential surface of the roll by electrochemical deposition or other means.

The pad roll polishing device of this invention can polish pad rolls with high precision and is therefore industrially applicable.

O1 First axis (feed roll)
O2 Second axis (polishing roll)
S Pad roll 100 Pad roll polishing device 110 Roll feeder (roll feeder)
111 Raw roll 120 Pad raw roll polishing device main body 122M Rubber roll drive motor (feed roll drive unit)
125 Polishing roll 125M Polishing roll drive motor (polishing roll drive unit)
130 Brush unit 150 First tensile force applying means 151 First tensile force detecting means 155 First tensile force adjusting means 160 Second tensile force applying means 161 Second tensile force detecting means 165 Second tensile force adjusting means

Claims (1)

A feed roll formed in a cylindrical shape and supported rotatably about a first axis;
a polishing roll that is formed in a cylindrical shape, is supported rotatably about a second axis parallel to the first axis, and cooperates with the feed roll to polish a raw pad that is a raw pad of the polishing pad ;
A feed roll drive unit that rotates the feed roll;
a polishing roll drive unit that rotates the polishing roll;
a first tensile force applying means arranged on the rear side of the polishing roll in the pad roll transport direction in which the pad roll is transported, and applying a tensile force to the pad roll from a polishing area in which the pad roll is polished by the polishing roll toward the rear side in the pad roll transport direction;
a second tensile force applying means arranged on a front side of the polishing roll in a pad web transport direction, the second tensile force applying means applying a tensile force from the polishing region to a front side in the transport direction to the pad web;
Equipped with
The first tension applying means is
a first tensile force detection means for detecting a tensile force acting on the pad web from the polishing area toward a rear side in a pad web transport direction;
a first tensile force adjusting means for adjusting a tensile force acting on the pad web toward a rear side in a pad web transport direction based on the tensile force detected by the first tensile force detecting means,
The second tension applying means is
a second tensile force detection means for detecting a tensile force acting on the pad web from the polishing area toward a front side in a pad web conveying direction;
A pad raw material polishing apparatus characterized by comprising a second tensile force adjustment means for adjusting the tensile force generated in the pad raw material toward the forward side in the pad raw material transport direction based on the tensile force detected by the second tensile force detection means.

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