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JP7705337B2 - Vacuum Processing Equipment - Google Patents
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JP7705337B2 - Vacuum Processing Equipment - Google Patents

Vacuum Processing Equipment Download PDF

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JP7705337B2
JP7705337B2 JP2021190594A JP2021190594A JP7705337B2 JP 7705337 B2 JP7705337 B2 JP 7705337B2 JP 2021190594 A JP2021190594 A JP 2021190594A JP 2021190594 A JP2021190594 A JP 2021190594A JP 7705337 B2 JP7705337 B2 JP 7705337B2
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axis direction
transport
chamber
transport tray
tray
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JP2023077326A (en
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純一 永田
雄一 吉田
傑之 鈴木
政司 梅原
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Ulvac Inc
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Description

本発明は、一方の面に被処理基板が配置される搬送トレイを搬送しながら、被処理基板の処理面に対して所定の真空処理を施す真空処理装置に関し、より詳しくは、搬送トレイの姿勢変更を可能とする第1チャンバとこれに連設される第2チャンバとを備えるものに関する。 The present invention relates to a vacuum processing apparatus that performs a predetermined vacuum processing on the processing surface of a substrate to be processed while transporting a transport tray on one side of which the substrate is placed, and more specifically, to an apparatus that includes a first chamber that allows the position of the transport tray to be changed and a second chamber connected thereto.

上記種の真空処理装置は、例えば特許文献1で知られている。以下、搬送トレイの移動方向をX軸方向、X軸方向に直交する重力加速度方向をZ軸方向、X軸方向及びZ軸方向に直交する方向をY軸方向とし、また、被処理基板(以下、「基板」という)の処理面がZ軸方向上方を向く搬送トレイ(及び基板)の姿勢を水平姿勢、処理面がY軸方向一方を向く姿勢を起立姿勢として説明する。上記特許文献1記載のものは、例えば、大気雰囲気に存する処理前の基板を水平姿勢で搬送して搬送トレイに配置し、起立姿勢(Z軸に対して所定角度で搬送トレイが傾斜する姿勢を含む)に姿勢変更した後、起立姿勢の搬送トレイを真空雰囲気の各真空(処理)チャンバへと搬送するために、第1チャンバと第2チャンバとを備える。第1チャンバは、例えば、搬送トレイへの基板の着脱が実施される所謂ポジションチャンバと称されるものであり、その内部には、例えば、他方の面側から搬送トレイを保持した状態で傾動自在な傾動部と、傾動部をY軸方向左右に移動自在な移動部とが設けられている。 The above-mentioned type of vacuum processing apparatus is known, for example, from Patent Document 1. Hereinafter, the movement direction of the transport tray is defined as the X-axis direction, the direction of gravitational acceleration perpendicular to the X-axis direction as the Z-axis direction, and the direction perpendicular to the X-axis and Z-axis directions as the Y-axis direction. The attitude of the transport tray (and the substrate) in which the processing surface of the substrate to be processed (hereinafter referred to as the "substrate") faces upward in the Z-axis direction is defined as the horizontal attitude, and the attitude in which the processing surface faces one side of the Y-axis direction is defined as the upright attitude. The apparatus described in Patent Document 1 above, for example, is equipped with a first chamber and a second chamber to transport a substrate before processing that exists in an atmospheric atmosphere in a horizontal attitude, place it on the transport tray, and after changing the attitude to an upright attitude (including an attitude in which the transport tray is tilted at a predetermined angle with respect to the Z axis), transport the upright transport tray to each vacuum (processing) chamber in a vacuum atmosphere. The first chamber is, for example, a so-called position chamber in which the substrate is attached to and detached from the transport tray, and inside the first chamber, for example, a tilting part that can be tilted while holding the transport tray from the other side side, and a moving part that can move the tilting part left and right in the Y-axis direction are provided.

第1チャンバにて水平姿勢の搬送トレイに基板が配置されると、傾動部は、搬送トレイを持ち上げながら回転して搬送トレイを起立姿勢とし、移動部により後述の搬送部のZ軸方向上方の位置までY軸方向一方に移動した後、搬送トレイを差し込むように搬送部へと受け渡す。搬送部から処理済みの基板Swがある搬送トレイTrを受け取るときには、傾動部は、他方の面側から搬送トレイを保持し、Z軸方向上方に引き抜くように起立姿勢の搬送トレイを持ち上げた後、搬送トレイを持ち下げながら搬送トレイを回転させて水平姿勢に変更してY軸方向他方に所定位置まで移動し、搬送トレイからの処理済みの基板の回収が可能となる。 When a substrate is placed on the horizontally oriented transport tray in the first chamber, the tilting section lifts the transport tray while rotating it to put it in an upright position, and then the moving section moves it in one direction along the Y axis to a position above the transport section in the Z axis direction described below, and then hands it over to the transport section by inserting the transport tray. When receiving the transport tray Tr containing the processed substrate Sw from the transport section, the tilting section holds the transport tray from the other side, lifts the upright transport tray by pulling it out upward in the Z axis direction, then rotates the transport tray while lowering it to change it to a horizontal position, and moves it in the other direction along the Y axis to a predetermined position, making it possible to recover the processed substrate from the transport tray.

X軸方向にゲートバルブを介して連設される第2チャンバは所謂ロードロックチャンバと称されるものであり、その内部を大気雰囲気と真空雰囲気との切換えが可能なように真空ポンプや大気開放弁などが設けられ、例えば、真空雰囲気の各真空チャンバへの搬送トレイの搬送を可能としている。第1チャンバと第2チャンバとには、起立姿勢の搬送トレイをX軸方向に沿って搬送する搬送手段が設けられている。搬送手段は、搬送トレイの上部を非接触でZ軸方向上方に牽引した状態でX軸方向への移動を案内する案内部(以下、「第1案内部」という)と、搬送トレイを接触支持して搬送する搬送部とを備える(例えば、特許文献2参照)。第1案内部としては、搬送トレイのZ軸方向上面に設けられる一方の磁石(以下、「第1磁石」という)、この第1磁石からZ軸方向上方に間隔を置いて、且つ、第1磁石と引き合うように第1チャンバ及び第2チャンバ内上部にX軸方向に沿って配置される他方の磁石(以下、「第2磁石」という)とを備えるものが一般に使用されている。 The second chamber connected in the X-axis direction via a gate valve is a so-called load lock chamber, and is provided with a vacuum pump and an air release valve so that the inside can be switched between air and vacuum, making it possible to transport a transport tray to each vacuum chamber in a vacuum atmosphere, for example. The first and second chambers are provided with a transport means for transporting the transport tray in an upright position along the X-axis direction. The transport means includes a guide section (hereinafter referred to as the "first guide section") that guides the movement in the X-axis direction while pulling the upper part of the transport tray upward in the Z-axis direction without contact, and a transport section that supports the transport tray in contact and transports it (see, for example, Patent Document 2). As the first guide section, one that includes one magnet (hereinafter referred to as the "first magnet") provided on the upper surface of the transport tray in the Z-axis direction, and the other magnet (hereinafter referred to as the "second magnet") that is spaced above the first magnet in the Z-axis direction and is arranged along the X-axis direction at the top of the first and second chambers so as to attract the first magnet.

搬送部としては、搬送トレイのZ軸方向下面にX軸方向にのびるように設けた円筒状のレール部材に係合する、所定曲率で湾曲した凹溝を設けた搬送ローラとを備えるものが一般に使用されている。そして、各搬送ローラの回転により第1案内部でX軸方向に案内しながら第1チャンバと第2チャンバとの間で搬送トレイがX軸方向前後に搬送される。通常は、所謂スループットを高めるために、第1チャンバと第2チャンバとには、第1案内部と搬送部とを夫々設けた2つのレーン(行き搬送路と戻り搬送路)がY軸方向に間隔を置いて設けられ、第1チャンバと第2チャンバとの間で搬送トレイの同時搬送ができるようにしている。 The commonly used transport section is equipped with transport rollers with a curved groove of a predetermined curvature that engage with a cylindrical rail member provided on the underside of the transport tray in the Z-axis direction and extending in the X-axis direction. The transport tray is transported back and forth in the X-axis direction between the first and second chambers while being guided in the X-axis direction by the first guide section as each transport roller rotates. Usually, in order to increase the so-called throughput, the first and second chambers are provided with two lanes (a forward transport path and a return transport path) each equipped with a first guide section and a transport section, spaced apart in the Y-axis direction, allowing the transport tray to be transported simultaneously between the first and second chambers.

上記搬送手段の搬送部では、通常、摩耗粉(発塵)の抑制を目的として、第1案内部に搬送トレイの重量(基板が配置されている場合には、基板重量も含む)の一部を牽引させることで、搬送トレイの残余の重量を接触支持する搬送ローラに印加する面圧及び荷重を軽減させている。これと同時に、搬送部の搬送ローラと共にY軸方向の自由度等について制限する構成となっている。つまり、上記搬送手段によって搬送トレイを搬送する際、第1案内部が搬送トレイに対し、Z軸方向上下を軸にした回転(ヨー)、X軸方向前後を軸にした回転(ロール)やY軸方向の移動について、搬送トレイの上部においてその移動をある範囲に制限する(移動の自由度を制限する)構成となっており、同様に搬送ローラも搬送トレイの下部において、Z軸方向上下を軸にした回転(ヨー)、X軸方向前後を軸にした回転(ロール)やY軸方向の移動について、その移動をある範囲に制限する構成となっている。なお、Z軸方向の移動とY軸方向前後を軸にした回転(ピッチング)の自由度については、搬送ローラがその移動の制限する構成となっており、案内部は搬送ローラに印加する面圧ならびに荷重を軽減させる効果のみを奏する構成となっている。 In the conveying section of the conveying means, the first guide section usually pulls part of the weight of the conveying tray (including the weight of the substrate if a substrate is placed thereon) in order to suppress wear powder (dust generation), thereby reducing the surface pressure and load applied to the conveying roller that contacts and supports the remaining weight of the conveying tray. At the same time, the conveying roller of the conveying section is configured to limit the degree of freedom in the Y-axis direction, etc. In other words, when the conveying tray is conveyed by the conveying means, the first guide section is configured to limit the movement of the conveying tray to a certain range at the top of the conveying tray with respect to rotation (yaw) around the up-down axis in the Z-axis direction, rotation (roll) around the front-back axis in the X-axis direction, and movement in the Y-axis direction, and similarly, the conveying roller is configured to limit the movement of the conveying tray to a certain range at the bottom of the conveying tray with respect to rotation (yaw) around the up-down axis in the Z-axis direction, rotation (roll) around the front-back axis in the X-axis direction, and movement in the Y-axis direction. In addition, the conveyor rollers are configured to limit the freedom of movement in the Z-axis direction and rotation (pitching) around the Y-axis direction, and the guide section only serves to reduce the surface pressure and load applied to the conveyor rollers.

上記搬送部の構成では、X軸或いはZ軸方向前後を軸にした搬送トレイの回転やY軸方向左右の移動の自由度に一定の制限を加えることができる(即ち、搬送トレイの下部の搬送ローラからの逸脱を防止することができる)が、搬送トレイ下部における移動の自由度の制限は、レール部材と搬送ローラの凹溝等による機械的な係合要素を用いる構成である。このため、搬送ローラの凹溝内では搬送トレイの移動に伴って係合部材がY軸方向左右に滑り移動する場合があり、このときの滑り摩擦に伴って係合部材と搬送ローラの回転に伴って凹溝内で摩耗粉を発生させてしまうという問題がある。特に、常時、Z軸方向に対して所定角度で搬送トレイを傾斜させて搬送させるような場合にはより顕著になる。 In the above-mentioned configuration of the transport section, it is possible to impose a certain restriction on the degree of freedom of rotation of the transport tray around the X-axis or Z-axis front and rear axes and the left and right movement in the Y-axis direction (i.e., it is possible to prevent the transport tray from departing from the transport roller at the bottom), but the restriction on the degree of freedom of movement at the bottom of the transport tray is a configuration that uses mechanical engagement elements such as the rail members and the grooves of the transport rollers. For this reason, in the grooves of the transport rollers, the engagement members may slide left and right in the Y-axis direction as the transport tray moves, and there is a problem that the sliding friction at this time generates wear powder in the grooves as the engagement members and transport rollers rotate. This is particularly noticeable when the transport tray is always tilted at a certain angle to the Z-axis direction and transported.

このような問題を解決するために、搬送トレイを接触支持する搬送部の部分を例えば球体などの転動体で構成してZ軸方向の自由度のみを制限する構成にすると共に、搬送トレイのZ軸方向下部にて非接触でZ軸方向上方に牽引した状態でX軸方向への移動を案内する他の案内部(以下、「第2案内部」という)を設けることが提案される。第2案内部としては、上記第1案内部と同様に、搬送トレイのZ軸方向下部に設けた一方の磁石(以下、「第3磁石」という)と、この第3磁石からZ軸方向上方に間隔を置いて、且つ、第3磁石と引き合うようにして第1チャンバ及び第2チャンバ内に設けられる他方の磁石(以下、「第4磁石」という)とで構成することが考えられる。このような場合、第3磁石は、例えば、搬送トレイの他方の面側でその下端にY軸方向外方に延出させて支持板部を形成してそのZ軸方向上面に設け、第4磁石は、第1チャンバ及び第2チャンバ内に行き搬送路及び戻り搬送路に沿って搬送トレイの支持板部にZ軸方向に間隔を置いて対峙する水平壁部を持つ支持壁を夫々設け、この水平壁部のZ軸方向下面に設ければよい。 To solve this problem, it is proposed to configure the portion of the transport section that contacts and supports the transport tray with rolling bodies such as spheres, limiting the degree of freedom only in the Z-axis direction, and to provide another guide section (hereinafter referred to as the "second guide section") that guides movement in the X-axis direction while being pulled upward in the Z-axis direction without contact at the lower part of the transport tray in the Z-axis direction. The second guide section, like the first guide section, can be configured with one magnet (hereinafter referred to as the "third magnet") provided at the lower part of the transport tray in the Z-axis direction, and another magnet (hereinafter referred to as the "fourth magnet") provided in the first and second chambers, spaced above the third magnet in the Z-axis direction and attracting the third magnet. In such a case, the third magnet may be provided, for example, on the other side of the transport tray, with the lower end extending outward in the Y-axis direction to form a support plate portion, which is provided on the upper surface of the Z-axis direction, and the fourth magnet may be provided on the lower surface of the horizontal wall portion, which is provided with support walls that face the support plate portion of the transport tray along the outward transport path and return transport path into the first chamber and second chamber, with the horizontal wall portion spaced apart in the Z-axis direction.

以上によれば、搬送トレイの上部にて第1案内部で案内しながら搬送トレイを搬送する際に、搬送トレイにX軸方向前後を軸にした搬送トレイの回転(ロール)やY軸方向左右の移動の自由度があっても、搬送部の部分では転がり摩擦しか発生しないため、上記従来例のような滑り摩擦に伴う摩耗粉の発生を可及的に抑制することができる。これに加えて、第2案内部により搬送部で接触支持される搬送トレイの残余の重量の一部もまた牽引されることで、搬送トレイを接触支持する搬送部の部分に加わる搬送トレイの荷重を軽減でき、その上、搬送トレイの下部におけるX軸方向前後を軸にした搬送トレイの回転(ロール)やY軸方向左右の移動の自由度を制限されることで、摩擦に伴う摩耗粉の発生を一層抑制することができる。なお、本発明において、搬送トレイの「Z軸方向下部」は、Z軸方向下端部のみを指すものではなく、搬送部で接触支持された搬送トレイの重心よりZ軸方向下方に位置する部分をいう。然し、上記のように第2案内部を設けると、互いに近接する第3磁石と第4磁石との干渉により搬送部への搬送トレイの差し込み動作や搬送部からの搬送トレイの引き抜き動作が阻害されるという問題を生じる。 According to the above, when the transport tray is transported while being guided by the first guide section at the top of the transport tray, even if the transport tray has the freedom of rotation (roll) of the transport tray about the front and rear axis in the X-axis direction and the freedom of movement in the left and right direction in the Y-axis direction, only rolling friction occurs in the transport section, so that the generation of wear powder due to sliding friction as in the above conventional example can be suppressed as much as possible. In addition, a part of the remaining weight of the transport tray that is contact-supported by the transport section is also pulled by the second guide section, so that the load of the transport tray applied to the part of the transport section that contact-supports the transport tray can be reduced, and further, the freedom of rotation (roll) of the transport tray about the front and rear axis in the X-axis direction and the freedom of movement in the left and right direction in the Y-axis direction at the bottom of the transport tray is limited, so that the generation of wear powder due to friction can be further suppressed. In addition, in the present invention, the "lower part in the Z-axis direction" of the transport tray does not refer only to the lower end part in the Z-axis direction, but refers to the part located below the center of gravity of the transport tray that is contact-supported by the transport section in the Z-axis direction. However, providing the second guide section as described above creates a problem in that interference between the third and fourth magnets, which are close to each other, can impede the insertion and removal of the transport tray into and from the transport section.

再表2012-140801号公報Re-table No. 2012-140801 特開2005-289556号公報JP 2005-289556 A

本発明は、以上の点に鑑み、滑り摩擦に伴う摩耗粉の発生を可及的に抑制するために、搬送トレイのZ軸方向上下部にて非接触でZ軸方向上方に牽引した状態でX軸方向への移動を案内する構成を採用した場合でも、搬送部への搬送トレイの差し込みや搬送部からの搬送トレイの引き抜きを可能にした真空処理装置を提供することをその課題とするものである。 In view of the above, the present invention aims to provide a vacuum processing device that allows the insertion and removal of a transport tray into and from the transport section, even when a configuration is adopted in which the transport tray is pulled upward in the Z-axis direction without contact at the upper and lower parts in the Z-axis direction while guiding movement in the X-axis direction in order to minimize the generation of wear powder due to sliding friction.

上記課題を解決するために、一方の面に被処理基板が配置される搬送トレイを搬送しながら、被処理基板の処理面に対して所定の真空処理を施す本発明の真空処理装置は、水平面内で互いに直交する二方向をX軸方向及びY軸方向、X軸方向及びY軸方向に直交する方向をZ軸方向と、被処理基板の処理面がZ軸方向上方を向く搬送トレイの姿勢を水平姿勢、処理面がY軸方向一方を向く姿勢を起立姿勢とし、X軸方向に互いに連結される第1チャンバと第2チャンバとを備え、第1チャンバと第2チャンバとに起立姿勢の搬送トレイをX軸方向に沿って搬送する搬送手段が設けられ、第1チャンバ内に、搬送トレイを保持した状態で傾動自在な傾動部を備えて水平姿勢と起立姿勢との間で搬送トレイの姿勢を変更可能とし、搬送手段は、第1チャンバと第2チャンバとの内部に設けられて、搬送トレイの上部を非接触でZ軸方向上方に牽引した状態でX軸方向への移動を案内する第1案内部と、搬送トレイの下部を非接触でZ軸方向上方に牽引した状態でX軸方向への移動を案内する第2案内部と、搬送トレイを接触支持してX軸方向前後に搬送トレイを搬送する搬送部とを備え、第1チャンバ内に存する第2案内部の部分を少なくともY軸方向に移動させる駆動部を設けたことを特徴とする。 In order to solve the above problems, a vacuum processing apparatus of the present invention performs a predetermined vacuum processing on a processing surface of a substrate to be processed while transporting a transport tray on one surface of which the substrate is placed, the vacuum processing apparatus having the following features: two mutually perpendicular directions in a horizontal plane are the X-axis direction and the Y-axis direction; a direction perpendicular to the X-axis direction and the Y-axis direction is the Z-axis direction; a horizontal position is a position of the transport tray in which the processing surface of the substrate to be processed faces upward in the Z-axis direction; and an upright position is a position in which the processing surface faces one side in the Y-axis direction; the vacuum processing apparatus has a first chamber and a second chamber connected to each other in the X-axis direction; the first chamber and the second chamber are provided with transport means for transporting the upright-positioned transport tray along the X-axis direction; The conveying means is provided inside the first chamber and the second chamber and includes a first guide section that guides movement in the X -axis direction while pulling an upper part of the conveying tray upward in the Z-axis direction without contact, a second guide section that guides movement in the X-axis direction while pulling a lower part of the conveying tray upward in the Z-axis direction without contact, and a conveying section that supports the conveying tray in contact and conveys the conveying tray back and forth in the X-axis direction, and is provided with a drive section that moves at least the part of the second guide section located inside the first chamber in the Y-axis direction.

本発明において、前記第1チャンバと前記第2チャンバとにY軸方向に間隔を存して第1案内部、搬送部及び第2案内部を夫々設けた第1及び第2の各搬送路が設けられる場合、前記第2案内部は、前記他方の面側で前記搬送トレイの下部に形成した支持板部のZ軸方向上面に設けた一方の磁石と、この一方の磁石とZ軸方向上方から引き合うように、第1チャンバ及び第2チャンバ内で各搬送路に沿って配置される支持壁のZ軸方向下面に設けた他方の磁石とを備え、各第2案内部の部分を他方の磁石を含む支持壁の可動部分とし、各可動部分を一体に前記駆動部によりY軸方向に移動させる構成を採用することができる。 In the present invention, when the first and second transport paths are provided in the first and second chambers with a first guide section, a transport section, and a second guide section spaced apart in the Y-axis direction, the second guide section includes one magnet provided on the upper surface in the Z-axis direction of a support plate section formed on the lower part of the transport tray on the other side, and the other magnet provided on the lower surface in the Z-axis direction of a support wall arranged along each transport path in the first and second chambers so as to attract the one magnet from above in the Z-axis direction, and a configuration can be adopted in which the parts of each second guide section are movable parts of the support wall including the other magnet, and each movable part is moved integrally in the Y-axis direction by the drive section.

以上によれば、搬送部への搬送トレイの差し込みや搬送部からの搬送トレイの引き抜きの際には、駆動部により他の磁石を含む第2案内部の部分(他方の磁石を含む支持壁の可動部分)をY軸方向一方に退避させておけば、第2案内部としての一方の磁石と他方の磁石とが干渉して搬送トレイの差し込みや引き抜きが阻害されるといった不具合は生じない。この場合、上記部分をZ軸方向に移動させる他の駆動部を更に設け、例えば、搬送トレイを引き抜く際に傾動部で起立姿勢の搬送トレイを保持するの先立って上記部分をZ軸方向上方に移動退避させておけば、例えば、傾動部で搬送トレイを保持するときの振動で互いに近接する両磁石が接触してしまうといった不具合も生じない。しかも、独立して上記部分のみを移動させるだけであるため、スループットの低下を招くといった不具合も生じない。 According to the above, when inserting the transport tray into the transport section or removing the transport tray from the transport section, if the drive unit retracts the part of the second guide unit including the other magnet (the movable part of the support wall including the other magnet) to one side in the Y-axis direction, there is no problem that one magnet as the second guide unit interferes with the other magnet, hindering the insertion or removal of the transport tray. In this case, if another drive unit is further provided to move the above part in the Z-axis direction, and, for example, before holding the transport tray in an upright position with the tilting unit when removing the transport tray, there is no problem that the two magnets close to each other come into contact due to vibrations when holding the transport tray with the tilting unit. Moreover, since only the above part is moved independently, there is no problem that the throughput is reduced.

なお、第2案内部の可動部分をY軸方向に退避させるときにこれが搬送部に干渉する虞があるときには、前記搬送部は、前記第1チャンバ及び第2チャンバ内で前記第1及び第2の各搬送路に沿って配置されて前記搬送トレイの下面に点接触する転動体を有し、第1チャンバ内に存する各転動体を一体にY軸方向及びZ軸方向の少なくとも一方に移動させる他の駆動部を設けることが好ましい。 If there is a risk that the movable part of the second guide unit will interfere with the transport unit when it is retracted in the Y-axis direction, it is preferable that the transport unit has rolling elements arranged along the first and second transport paths in the first and second chambers and in point contact with the underside of the transport tray, and that another drive unit is provided to move each rolling element in the first chamber together in at least one of the Y-axis and Z-axis directions.

本実施形態のインライン式の真空処理装置の縦断面図。FIG. 2 is a vertical cross-sectional view of the in-line vacuum processing apparatus of the present embodiment. 図1に示すインライン式の真空処理装置の横断面図。FIG. 2 is a cross-sectional view of the in-line vacuum processing apparatus shown in FIG. 1 . 搬送トレイの搬送状態を示す部分拡大図。FIG. 4 is a partial enlarged view showing a transport state of the transport tray. (a)~(f)は、搬送部からの搬送トレイの受け取り、搬送部への搬送トレイの受け渡し操作を説明する図。6A to 6F are diagrams for explaining the operation of receiving a transport tray from the transport section and handing over the transport tray to the transport section.

以下、図面を参照して、被処理基板をフラットパネルディスプレイの製造に利用される大面積のガラス基板(以下、「基板Sw」という)とし、基板Swが配置される搬送トレイTrを真空チャンバ内で後述の搬送路Tp1,Tp2に沿って搬送しながら、基板Swの一方の面(処理面)に成膜処理、熱処理、エッチング処理といった各種の真空処理を施すインライン式のものを例に本発明の真空処理装置の実施形態を説明する。以下においては、搬送路Tp1,Tp2に沿った搬送トレイTrの移動方向をX軸方向、X軸方向に直交する重力加速度方向をZ軸方向、X軸方向及びZ軸方向に直交する方向をY軸方向とする。また、搬送トレイTrに配置された基板Swの処理面がZ軸方向上方を向く搬送トレイ(及び基板Sw)の姿勢を水平姿勢、基板Swの処理面がY軸方向一方を向く搬送トレイTr(及び基板Sw)の姿勢を起立姿勢(Z軸に対して所定角度で搬送トレイTrが傾斜する姿勢も含む)とする。 Hereinafter, with reference to the drawings, an embodiment of the vacuum processing apparatus of the present invention will be described using an in-line type example in which the substrate to be processed is a large-area glass substrate (hereinafter referred to as "substrate Sw") used in the manufacture of flat panel displays, and the transport tray Tr on which the substrate Sw is placed is transported along the transport paths Tp1 and Tp2 described below in a vacuum chamber while performing various vacuum processes such as film formation, heat treatment, and etching on one side (processing surface) of the substrate Sw. In the following, the movement direction of the transport tray Tr along the transport paths Tp1 and Tp2 is defined as the X-axis direction, the direction of gravitational acceleration perpendicular to the X-axis direction is defined as the Z-axis direction, and the direction perpendicular to the X-axis and Z-axis directions is defined as the Y-axis direction. In addition, the posture of the transport tray (and substrate Sw) in which the processing surface of the substrate Sw placed on the transport tray Tr faces upward in the Z-axis direction is defined as the horizontal posture, and the posture of the transport tray Tr (and substrate Sw) in which the processing surface of the substrate Sw faces one side in the Y-axis direction is defined as the upright posture (including the posture in which the transport tray Tr is tilted at a predetermined angle with respect to the Z-axis).

図1~図3を参照して、真空処理装置VMは、図外の搬送ロボットにより処理前の基板Swを水平姿勢で搬送トレイTrの一方の面に配置し、または、水平姿勢の搬送トレイTrから処理済みの基板Swを取り出すためのポジションチャンバ(第1チャンバ)Pcを備える。搬送トレイTrは、基板Swより一回り大きな輪郭の板状体11で構成され、板状体11には、起立姿勢にしたときに基板Swの下辺が当接する基板受け部12と、板状体11に対して基板Swの縁部を局所的に押圧するクランプなどの押圧部(図示せず)とが設けられ、真空処理の間、起立姿勢の基板Swを搬送トレイTrに保持することができる。基板Swに対する真空処理によっては、マスクプレートが基板Swと共に取り付けられるようにしてもよい。このような搬送トレイTrとしては公知のものが利用できるため、これ以上の説明は省略する。 Referring to Figures 1 to 3, the vacuum processing device VM includes a position chamber (first chamber) Pc for placing the unprocessed substrate Sw in a horizontal position on one side of the transport tray Tr by a transport robot (not shown), or for removing the processed substrate Sw from the horizontal transport tray Tr. The transport tray Tr is composed of a plate-like body 11 having an outline one size larger than the substrate Sw. The plate-like body 11 is provided with a substrate receiving portion 12 against which the lower side of the substrate Sw abuts when the substrate Sw is in an upright position, and a pressing portion (not shown) such as a clamp that locally presses the edge of the substrate Sw against the plate-like body 11, so that the substrate Sw in an upright position can be held on the transport tray Tr during vacuum processing. Depending on the vacuum processing of the substrate Sw, a mask plate may be attached together with the substrate Sw. Since a known one can be used as such a transport tray Tr, further explanation is omitted.

大気雰囲気に維持されるポジションチャンバPcには、他方の面側から搬送トレイTrを保持した状態で傾動自在な傾動部2が備えられ、水平姿勢と起立姿勢との間で搬送トレイTrの姿勢を変更することができる。傾動部2は保持板21を備え、保持板21の所定位置には、特に図示して説明しないが、バキュームチャックなどの保持機構が設けられ、搬送トレイTrを起立姿勢にしたときでも保持板21から基板Swが離脱しないようにしている。保持板21には、X軸方向に間隔を置いて立設されて、単軸ロボットなどの機構(図示せず)によりZ軸方向上下に同期して伸縮自在な2本のフレーム22に設けた回転軸23が連結され、モータMtにより回転軸23を一方向に回転駆動すると、保持板21が回転軸23回りに回転して搬送トレイTrを傾動するようにしている。各フレーム22の下端は、Y軸方向にのびるようにポジションチャンバPcに設けた単軸ロボットの移動機構24に連結され、Y軸方向左右に往復動自在となっている。 The position chamber Pc, which is maintained in an atmospheric atmosphere, is provided with a tilting unit 2 that can be tilted while holding the transport tray Tr from the other side, and the posture of the transport tray Tr can be changed between a horizontal posture and an upright posture. The tilting unit 2 is provided with a holding plate 21, and a holding mechanism such as a vacuum chuck (not shown) is provided at a predetermined position of the holding plate 21, so that the substrate Sw does not come off the holding plate 21 even when the transport tray Tr is in the upright posture. The holding plate 21 is connected to a rotating shaft 23 provided on two frames 22 that are erected at an interval in the X-axis direction and can be synchronously extended and retracted up and down in the Z-axis direction by a mechanism such as a single-axis robot (not shown). When the rotating shaft 23 is rotated in one direction by the motor Mt, the holding plate 21 rotates around the rotating shaft 23 to tilt the transport tray Tr. The lower end of each frame 22 is connected to a single-axis robot movement mechanism 24 installed in the position chamber Pc so that it extends in the Y-axis direction, and is freely movable back and forth in the Y-axis direction.

ポジションチャンバPcにて水平姿勢の搬送トレイTrに基板Swが配置されると、傾動部2は、搬送トレイTrを持ち上げながら回転して搬送トレイTrを起立姿勢とし、移動機構24により後述の搬送部のZ軸方向上方の位置までY軸方向一方に移動した後、搬送トレイTrを差し込むように搬送部へと受け渡す。一方、後述の搬送部から処理済みの基板Swがある搬送トレイTrを受け取るときには、傾動部2は、他方の面側から搬送トレイTrを保持した後、Z軸方向上方に引き抜くように起立姿勢の搬送トレイTrを持ち上げた後、搬送トレイTrを持ち下げながら搬送トレイTrを回転させて水平姿勢に変更してY軸方向他方に所定位置まで移動し、搬送トレイTrからの処理済みの基板Swの回収が可能となる。 When the substrate Sw is placed on the horizontally oriented transport tray Tr in the position chamber Pc, the tilting unit 2 rotates the transport tray Tr while lifting it up to place it in an upright position, and then moves it in one direction along the Y axis to a position above the transport unit in the Z axis direction using the moving mechanism 24, which will be described later, and then passes the transport tray Tr to the transport unit by inserting it. On the other hand, when receiving the transport tray Tr with the processed substrate Sw from the transport unit, which will be described later, the tilting unit 2 holds the transport tray Tr from the other side, lifts the transport tray Tr in the upright position by pulling it out upward in the Z axis direction, and then rotates the transport tray Tr while lowering it to change it to a horizontal position and moves it to a predetermined position in the other direction along the Y axis, making it possible to collect the processed substrate Sw from the transport tray Tr.

ポジションチャンバPcのX軸方向前方には、ゲートバルブGv1を介してロードロックチャンバ(第2チャンバ)Lcが連設されている。ロードロックチャンバLcには、特に図示して説明しないが、真空ポンプからの排気管とベントガスを導入するベントガスラインとが夫々接続され、ロードロックチャンバLcを真空雰囲気と大気雰囲気とに適宜切り換えることができる。ロードロックチャンバLcのX軸方向前方には、基板Swの処理面に対して実施しようとする各種の真空処理に応じた数の処理チャンバVc1~VcnがゲートバルブGv2,Gvnを介して順次連設されている。各処理チャンバVc1,Vcnは、X軸方向に沿ってのびる隔離壁31によってY軸方向で左右2室に隔絶され、各室31a,31bには、例えば、スパッタリングカソードといった各種の真空処理の実施に必要な装置32が夫々設けられている。そして、基板Swの処理面がY軸方向左方(図2中、下方)を向く起立姿勢で搬送トレイTrが各真空処理チャンバVc1,Vcnの各室31a,31bを夫々通過する間に、基板Swの処理面に対し各種の真空処理が施される。X軸方向前方で最下流側に位置する処理チャンバVcnにはターンバックチャンバBcが連設されている。 A load lock chamber (second chamber) Lc is connected to the position chamber Pc in the X-axis direction via a gate valve Gv1. Although not shown or described, an exhaust pipe from a vacuum pump and a vent gas line for introducing vent gas are connected to the load lock chamber Lc, so that the load lock chamber Lc can be switched between a vacuum atmosphere and an air atmosphere as appropriate. A number of processing chambers Vc1 to Vcn corresponding to the various vacuum processes to be performed on the processing surface of the substrate Sw are connected to the load lock chamber Lc in the X-axis direction in sequence via gate valves Gv2 and Gvn. Each processing chamber Vc1 and Vcn is separated into two chambers, left and right, in the Y-axis direction by a partition wall 31 extending along the X-axis direction, and each chamber 31a and 31b is provided with a device 32 necessary for performing various vacuum processes, such as a sputtering cathode. While the transport tray Tr passes through each of the chambers 31a and 31b of each of the vacuum processing chambers Vc1 and Vcn in an upright position with the processing surface of the substrate Sw facing leftward in the Y-axis direction (downward in FIG. 2), various vacuum processes are performed on the processing surface of the substrate Sw. A turnback chamber Bc is connected to the processing chamber Vcn, which is located at the front and most downstream side in the X-axis direction.

ターンバックチャンバBcには、上面に搬送ローラ41を設けたY軸方向左右に移動自在な移動ステージ4が設けられ、処理チャンバVcnのY軸方向左側の室31aから受け取った搬送トレイTrを再度処理チャンバPcnのY軸方向右側の室31bに戻すことができる。そして、ポジションチャンバPcとターンバックチャンバBcとの間でX軸方向にのびる2本の搬送路に沿って搬送トレイTrを起立姿勢で夫々搬送できるように搬送手段Tmが設けられている。以下において、互いにX軸方向に連設されたポジションチャンバPcからロードロックチャンバLc、各処理チャンバVc1,VcnのY軸方向左側の室31aを経てターンバックチャンバBcに通じる、搬送トレイTrがX軸方向前方(図1、2中、左側から右側)に搬送されるものを行き搬送路Tp1、逆に、ターンバックチャンバTcからY軸方向右側の室31b、ロードロックチャンバLcを経てポジションチャンバPcに通じる、搬送トレイTrがX軸方向後方(図1中、右側から左側)に搬送されるものを戻り搬送路Tp2とする。 The turnback chamber Bc is provided with a moving stage 4 with a transport roller 41 on its upper surface that can move left and right in the Y-axis direction, and the transport tray Tr received from the chamber 31a on the left side of the Y-axis direction of the processing chamber Vcn can be returned to the chamber 31b on the right side of the Y-axis direction of the processing chamber Pcn. A transport means Tm is provided so that the transport tray Tr can be transported in an upright position along two transport paths extending in the X-axis direction between the position chamber Pc and the turnback chamber Bc. In the following, the forward transport path Tp1 is the path that transports the transport tray Tr forward in the X-axis direction (from left to right in Figures 1 and 2) from the position chamber Pc, which are connected to each other in the X-axis direction, through the load lock chamber Lc, and the chamber 31a on the left side of the Y-axis direction of each processing chamber Vc1, Vcn, to the turnback chamber Bc. Conversely, the return transport path Tp2 is the path that transports the transport tray Tr backward in the X-axis direction (from right to left in Figure 1) from the turnback chamber Tc, through the chamber 31b on the right side of the Y-axis direction, and the load lock chamber Lc, to the position chamber Pc.

搬送手段Tmは、起立姿勢の搬送トレイTrを非接触でZ軸方向上方に牽引した状態で、X軸方向前方または後方への移動を案内する第1案内部4と、第1案内部4によりその重量の一部が牽引された搬送トレイTrの残余の重量を接触支持してX軸方向前方または後方に搬送トレイTrを搬送する搬送部5と、搬送トレイTrのZ軸方向下部にて非接触でZ軸方向上方に牽引した状態でX軸方向前方または後方への移動を案内する第2案内部6とを備える。第1案内部4は、搬送トレイTrの板状体11のZ軸方向上面にその上辺に沿って取り付けたX軸方向に長手の第1磁石41と、行き搬送路Tp1及び戻り搬送路Tp2に沿ってポジションチャンバPc、ロードロックチャンバLc及び各処理チャンバVc1,Vcn内のZ軸方向上部に夫々配置した第2磁石42とを備える。第1磁石41と第2磁石42とは、その対向面の極性が異なるように着磁され、これにより、搬送トレイTrを非接触でZ軸方向上方に牽引した状態でX軸方向前後への移動を夫々案内する。なお、第1磁石41と第2磁石42とはY軸方向に間隔を置いて複数例で設けることもでき、この場合には、第1磁石41と第2磁石42との互いに向かい合うものの極性を交互に変えることが好ましい。 The transport means Tm includes a first guide unit 4 that guides the transport tray Tr in the upright position to move forward or backward in the X-axis direction while towing it upward in the Z-axis direction without contact, a transport unit 5 that transports the transport tray Tr forward or backward in the X-axis direction by contacting and supporting the remaining weight of the transport tray Tr, part of whose weight has been towed by the first guide unit 4, and a second guide unit 6 that guides the transport tray Tr in the forward or backward direction in the X-axis direction while towing it upward in the Z-axis direction without contact at the lower part of the Z-axis direction. The first guide unit 4 includes a first magnet 41 that is long in the X-axis direction and is attached along the upper edge of the Z-axis upper surface of the plate-like body 11 of the transport tray Tr, and a second magnet 42 that is arranged along the forward transport path Tp1 and the return transport path Tp2 at the upper part of the Z-axis direction in the position chamber Pc, the load lock chamber Lc, and each of the processing chambers Vc1 and Vcn. The first magnet 41 and the second magnet 42 are magnetized so that the polarities of their opposing surfaces are different, thereby guiding the movement of the transport tray Tr back and forth in the X-axis direction while pulling it upward in the Z-axis direction without contact. Note that the first magnet 41 and the second magnet 42 can be provided in multiple instances at intervals in the Y-axis direction, and in this case, it is preferable to alternate the polarities of the first magnet 41 and the second magnet 42 that face each other.

搬送部5は、行き搬送路Tp1及び戻り搬送路Tp2に沿ってポジションチャンバPc、ロードロックチャンバLc及び各処理チャンバVc1,Vcn内の下部にX軸方向に間隔を置いて設けられる転動体としての搬送コロ51を備える。各搬送コロ51は、ポジションチャンバPc、ロードロックチャンバLc及び各処理チャンバVc1,Vcn内の所定位置に夫々軸支される軸体51aと、各軸体51aに夫々外嵌されて搬送トレイTrのZ軸方向下面に接触する車輪部51bとで構成される。この場合、単一の軸体51aには、Y軸方向に間隔を置いて少なくとも2個の車輪部51bが取り付けられ、車輪部51bの先端はまた、径方向外方に向かって先細りである楕円状に形成され、車輪部51bが搬送トレイTrのZ軸方向の下面に点接触するようにしている。本実施形態では、各搬送コロ51が、Z軸方向の自由度のみを制限した状態で搬送トレイTrを接触支持する搬送部5の部分を構成する。特に図示して説明しないが、各搬送コロ51の軸体51aには、プーリー、歯車、駆動ベルトやモータといった公知の動力伝達機構が連結され、行き搬送路Tp1及び戻り搬送路Tp2毎に各搬送コロ51が同期して同方向に回転駆動される。 The transport unit 5 includes transport rollers 51 as rolling elements provided at intervals in the X-axis direction at the bottom of the position chamber Pc, the load lock chamber Lc, and each of the processing chambers Vc1 and Vcn along the forward transport path Tp1 and the return transport path Tp2. Each transport roller 51 is composed of a shaft body 51a journaled at a predetermined position in the position chamber Pc, the load lock chamber Lc, and each of the processing chambers Vc1 and Vcn, and a wheel portion 51b fitted to each shaft body 51a and contacting the Z-axis direction lower surface of the transport tray Tr. In this case, at least two wheel portions 51b are attached to a single shaft body 51a at intervals in the Y-axis direction, and the tip of the wheel portion 51b is also formed in an elliptical shape tapered radially outward, so that the wheel portion 51b makes point contact with the Z-axis direction lower surface of the transport tray Tr. In this embodiment, each transport roller 51 constitutes a part of the transport unit 5 that contacts and supports the transport tray Tr while restricting only the degree of freedom in the Z-axis direction. Although not specifically shown or described, the shaft 51a of each conveying roller 51 is connected to a known power transmission mechanism such as a pulley, gear, drive belt, or motor, and each conveying roller 51 is driven to rotate in the same direction in synchronization for the forward conveying path Tp1 and the return conveying path Tp2.

第2案内部6は、搬送トレイTrのZ軸方向下部に設けた第3磁石(一方の磁石)61と、行き搬送路Tp1及び戻り搬送路Tp2に沿ってポジションチャンバPc、ロードロックチャンバLc及び各処理チャンバVc1,Vcn内の下部に夫々配置した第4磁石62とを備える。搬送トレイTrの板状体11には、基板Swが配置される一方の面に背向する他方の面側(図3中、左側)でその下端にその外方に向けて延出させて支持板部13が形成され、支持板部13のZ軸方向上面に第3磁石61が設けられている。他方、行き搬送路Tp1及び戻り搬送路Tp2に沿ってポジションチャンバPc、ロードロックチャンバLc及び各処理チャンバVc1,Vcn内のZ軸方向下部には、搬送トレイTrの支持板部13にZ軸方向に間隔を置いて対峙する水平壁部63aを持つ支持壁63がX軸方向に沿ってのびるように夫々設けられ、水平壁部63aの下面に第4磁石62が設けられている。第3磁石61と第4磁石62とは、その対向面の極性が異なるように着磁され、これにより、搬送トレイTrのZ軸方向下部を非接触でZ軸方向上方に牽引した状態でX軸方向前後への移動を夫々案内する。なお、第3磁石61と第4磁石62とは、上記同様、Y軸方向に間隔を置いて複数列で設けることもでき、この場合には、第3磁石61と第4磁石62との互いに向かい合うものの極性を交互に変えることが好ましい。 The second guide section 6 includes a third magnet (one magnet) 61 provided at the bottom of the transport tray Tr in the Z-axis direction, and a fourth magnet 62 arranged at the bottom of the position chamber Pc, the load lock chamber Lc, and each of the processing chambers Vc1 and Vcn along the forward transport path Tp1 and the return transport path Tp2. A support plate section 13 is formed on the plate-like body 11 of the transport tray Tr, extending outward from its lower end on the other surface side (left side in FIG. 3) facing away from the one surface on which the substrate Sw is placed, and the third magnet 61 is provided on the upper surface of the support plate section 13 in the Z-axis direction. On the other hand, along the forward transport path Tp1 and the return transport path Tp2, in the lower part of the Z axis direction in the position chamber Pc, the load lock chamber Lc, and each processing chamber Vc1, Vcn, a support wall 63 having a horizontal wall portion 63a facing the support plate portion 13 of the transport tray Tr at an interval in the Z axis direction is provided so as to extend along the X axis direction, and a fourth magnet 62 is provided on the lower surface of the horizontal wall portion 63a. The third magnet 61 and the fourth magnet 62 are magnetized so that the polarities of their opposing surfaces are different, thereby guiding the movement of the transport tray Tr forward and backward in the X axis direction while pulling the lower part of the Z axis direction of the transport tray Tr upward in the Z axis direction without contact. The third magnet 61 and the fourth magnet 62 can also be provided in multiple rows at intervals in the Y axis direction, as described above, and in this case, it is preferable to alternate the polarities of the third magnet 61 and the fourth magnet 62 that face each other.

以上の構成を採用すれば、搬送トレイTrをX軸方向前後に搬送する際、搬送トレイTrの下面と搬送部5の部分として、転動体である点接触の搬送コロ51を用いたことから、搬送トレイTr側の軌道面と転動体間の滑り摩擦が発生しないため、上記従来例のような滑り摩擦に伴う摩耗粉の発生を可及的に抑制することができる。しかも、第1案内部4によって搬送トレイTrの重量の一部が牽引されることに加えて、第2案内部6によって、搬送コロ51で接触支持される搬送トレイTrの残余の重量の一部もまた牽引されることで、各搬送コロ51に加わる搬送トレイTrの荷重をより一層軽減することができ、その上、第2案内部6によって搬送トレイTrの下部におけるX軸方向前後を軸にした搬送トレイTrの回転(ロール)やY軸方向左右の移動の自由度が制限されることで、摩擦に伴う摩耗粉の発生をより一層抑制することができる。但し、ポジションチャンバPcにて、搬送部5に対する搬送トレイTrの受け渡しまたは受け取りの際に、互いに近接する第3磁石61と第4磁石62との干渉により搬送コロ51への搬送トレイTrの差し込み動作や搬送コロ51からの搬送トレイTrの引き抜き動作が阻害されないように構成しておく必要がある。 By adopting the above configuration, when the transport tray Tr is transported back and forth in the X-axis direction, the transport rollers 51, which are rolling bodies and have point contact, are used as the lower surface of the transport tray Tr and the transport section 5, so that sliding friction between the track surface on the transport tray Tr side and the rolling bodies does not occur, and the generation of wear powder due to sliding friction as in the above conventional example can be suppressed as much as possible. Moreover, in addition to the first guide section 4 pulling a part of the weight of the transport tray Tr, the second guide section 6 also pulls a part of the remaining weight of the transport tray Tr that is contact-supported by the transport rollers 51, so that the load of the transport tray Tr applied to each transport roller 51 can be further reduced, and in addition, the second guide section 6 limits the degree of freedom of rotation (roll) of the transport tray Tr around the X-axis front and rear axis at the bottom of the transport tray Tr and the movement left and right in the Y-axis direction, so that the generation of wear powder due to friction can be further suppressed. However, when the transport tray Tr is handed over to or received from the transport unit 5 in the position chamber Pc, it is necessary to configure the configuration so that the insertion operation of the transport tray Tr into the transport roller 51 and the removal operation of the transport tray Tr from the transport roller 51 are not hindered by interference between the third magnet 61 and the fourth magnet 62, which are close to each other.

本実施形態では、両支持壁63のポジションチャンバPc内に存する部分がY軸方向左右及びZ軸方向上下に移動自在な可動部分63L,63Rとして夫々構成されている。各可動部分63L,63Rは、ポジションチャンバPc内に設けた共通の第1の可動ベース71に夫々立設されている。第1の可動ベース71には、これをY軸方向左右及びZ軸方向上下に所定のストローク長で夫々移動できる(第1の)駆動部72a,72bが連結されている。駆動部72a,72bとしては、エアシリンダや直動モータなどの公知のものが利用できる。加えて、ポジションチャンバPc内に存する各搬送コロ51の軸体51aには、図示省略の軸受を備える支持ロッド52a,52bが連結され、各支持ロッド52a,52bのZ軸方向下端がポジションチャンバPc内に設けた共通の第2の可動ベース73に夫々取り付けられている。第2の可動ベース73には、これをY軸方向左右及びZ軸方向上下に所定のストローク長で夫々独立して移動できる(第2の)駆動部74a,74bが連結されている。第2の駆動部74a,74bとしては、上記同様、エアシリンダや直動モータなどの公知のものが利用できる。なお、次の搬送トレイTrを行き搬送路Tp1に受け渡すのに際し、第1の可動ベース71をY軸方向左側に移動させたときに、戻り搬送路Tp2側の可動部分63Rと行き搬送路Tp1側の搬送用コロ51とが干渉する場合には、これを避けるために、(第3の)駆動部75を更に設け、行き搬送路Tp1側の可動部分63LのみをY軸方向左右に更に移動自在に構成してもよい。以下に、図4を参照して、ポジションチャンバPcにて、戻り搬送路Tp2から搬送トレイTrを受け取り、行き搬送路Tp1に搬送トレイTrを受け渡す操作について説明する。 In this embodiment, the portions of both support walls 63 that exist within the position chamber Pc are configured as movable parts 63L and 63R that can move freely left and right in the Y-axis direction and up and down in the Z-axis direction. Each movable part 63L and 63R is erected on a common first movable base 71 provided within the position chamber Pc. The first movable base 71 is connected to (first) drive units 72a and 72b that can move it left and right in the Y-axis direction and up and down in the Z-axis direction with a predetermined stroke length. As the drive units 72a and 72b, publicly known devices such as air cylinders and linear motors can be used. In addition, support rods 52a and 52b equipped with bearings (not shown) are connected to the shaft body 51a of each conveying roller 51 that exists within the position chamber Pc, and the lower ends of the Z-axis direction of each support rod 52a and 52b are attached to a common second movable base 73 provided within the position chamber Pc. The second movable base 73 is connected to (second) drive units 74a and 74b that can move the second movable base 73 independently in the left and right direction in the Y-axis direction and the up and down direction in the Z-axis direction with a predetermined stroke length. As the second drive units 74a and 74b, known devices such as air cylinders and linear motors can be used as described above. In addition, when the first movable base 71 is moved to the left in the Y-axis direction to transfer the next transport tray Tr to the outgoing transport path Tp1, if the movable part 63R on the return transport path Tp2 side and the transport roller 51 on the outgoing transport path Tp1 side interfere with each other, in order to avoid this, a (third) drive unit 75 may be further provided, and only the movable part 63L on the outgoing transport path Tp1 side may be configured to be further movable left and right in the Y-axis direction. Below, with reference to FIG. 4, the operation of receiving the transport tray Tr from the return transport path Tp2 and transferring the transport tray Tr to the outgoing transport path Tp1 in the position chamber Pc will be described.

ポジションチャンバPc内で戻り搬送路Tp2の受取位置まで搬送トレイTrが搬送されてくると(図4(a)参照)、傾動部2により他方の面側から搬送トレイTrを保持した後(以降、この搬送トレイTrのZ軸方向における位置を「保持位置」という)、一方の第1の駆動部72aにより第1の可動ベース71、ひいては、両支持壁63L,63RをZ軸方向に上昇させ、一方の第2の駆動部74aにより第2の可動ベース73、ひいては、各搬送コロ51をZ軸方向に下降させる(図4(b)参照)。次に、他方の第1の駆動部72bにより第1の可動ベース71を、また、他方の第2の駆動部74bにより第2の可動ベース73を同期させてY軸方向左側に移動させる(図4(c)参照)。なお、第1の可動ベース71をY軸方向左側に移動させたときに、戻り搬送路Tp2側の可動部分63Rと行き搬送路Tp1側の搬送用コロ51とが干渉しないような場合には、第2の可動ベース73の移動は不要にできる。そして、処理済みの基板Swがある搬送トレイTrをZ軸方向上方に引き抜くように保持位置から持上げられて戻り搬送路Tp2上から取り去れる。その後、特に図示して説明しないが、保持板21を回転させて水平姿勢に戻され、ポジションチャンバpcにて水平姿勢の搬送トレイTrに対する処理後の基板Swと処理前の基板Swとが交換される。 When the transport tray Tr is transported to the receiving position of the return transport path Tp2 in the position chamber Pc (see FIG. 4(a)), the tilting unit 2 holds the transport tray Tr from the other side (hereinafter, the position of the transport tray Tr in the Z-axis direction is referred to as the "holding position"). The first drive unit 72a raises the first movable base 71 and both support walls 63L and 63R in the Z-axis direction, and the second drive unit 74a lowers the second movable base 73 and each transport roller 51 in the Z-axis direction (see FIG. 4(b)). Next, the first drive unit 72b and the second drive unit 74b synchronously move the first movable base 71 and the second movable base 73 to the left in the Y-axis direction (see FIG. 4(c)). In addition, when the first movable base 71 is moved to the left in the Y-axis direction, if there is no interference between the movable part 63R on the return transport path Tp2 side and the transport rollers 51 on the forward transport path Tp1 side, it is possible to eliminate the need to move the second movable base 73. Then, the transport tray Tr on which the processed substrate Sw is located is lifted from the holding position so as to be pulled upward in the Z-axis direction and removed from the return transport path Tp2. After that, although not specifically shown or described, the holding plate 21 is rotated to return to a horizontal position, and the processed substrate Sw on the transport tray Tr in the horizontal position is exchanged for the unprocessed substrate Sw in the position chamber pc.

次に、他方の第1及び第2の各駆動部72b,74bにより第1及び第2の各可動ベース71,73を元の位置までY軸方向右側に移動させ、第3の駆動部75により可動部分63LをY軸方向左側に移動させ、この状態で、傾動部2により行き搬送路Tp1の搬送部5に起立姿勢の搬送トレイTrを保持位置まで移動して待機させる(図4(d)参照)。そして、一方の第2の駆動部74aにより第2の可動ベース73を元の位置までZ軸方向に上昇させて各搬送コロ51で搬送トレイTrを接触支持させる(図4(e)参照)。最後に、第3の駆動部75により可動部分63Lを元の位置までY軸方向右側に移動させ、一方の第1の駆動部72aにより第1の可動ベース71を元の位置までZ軸方向に下降させた後、傾動部2を離脱させる(図4(f)参照)。これにより、ポジションチャンバPcとロードロックチャンバLcとの間で搬送トレイTrの同時搬送が可能な状態となる。 Next, the first and second movable bases 71 and 73 are moved to the right in the Y-axis direction by the other first and second drive units 72b and 74b to their original positions, and the movable part 63L is moved to the left in the Y-axis direction by the third drive unit 75. In this state, the tilt unit 2 moves the upright conveying tray Tr to the holding position on the conveying unit 5 of the outgoing conveying path Tp1 and makes it wait (see FIG. 4(d)). Then, the second movable base 73 is raised to its original position in the Z-axis direction by the second drive unit 74a, and the conveying tray Tr is contact-supported by the conveying rollers 51 (see FIG. 4(e)). Finally, the third drive unit 75 moves the movable part 63L to its original position to the right in the Y-axis direction, and the first movable base 71 is lowered to its original position in the Z-axis direction by the first drive unit 72a, and then the tilt unit 2 is released (see FIG. 4(f)). This allows the transport tray Tr to be transported simultaneously between the position chamber Pc and the load lock chamber Lc.

以上の実施形態によれば、搬送部5への搬送トレイTrの差し込みや搬送部5からの搬送トレイTrの引き抜きの際には、第2案内部6としての第3磁石61と第4磁石62とが干渉して搬送トレイTrの差し込み動作や引き抜き動作が阻害されるといった不具合は生じない。しかも、可動部分63L,63Rを事前にZ軸方向上方に移動退避させているため、傾動部2で搬送トレイTrを保持するときの振動で互いに近接する第3及び第4の両磁石61,62が接触してしまうといった不具合も生じない。その上、ポジションチャンバPc内の可動部分63L,63Rと搬送コロ51のみを移動させるだけであるため、スループットの低下を招くといった不具合も生じない。 According to the above embodiment, when inserting or removing the transport tray Tr into or from the transport unit 5, the third magnet 61 and the fourth magnet 62 serving as the second guide unit 6 do not interfere with each other, preventing the transport tray Tr from being inserted or removed. Moreover, since the movable parts 63L and 63R are moved and retracted in advance upward in the Z-axis direction, there is no problem in that the close third and fourth magnets 61 and 62 come into contact with each other due to vibrations when the tilting unit 2 holds the transport tray Tr. Moreover, since only the movable parts 63L and 63R and the transport roller 51 in the position chamber Pc are moved, there is no problem in that throughput is reduced.

以上、本発明の実施形態について説明したが、本発明の技術思想の範囲を逸脱しない限り、種々の変形が可能である。上記実施形態では、傾動部2により他方の面側から搬送トレイTrを保持するものを例に説明したが、搬送トレイTrを起立姿勢にしたときでも保持板21から基板Swが離脱しないように搬送トレイTrを保持できるものであれば、その形態は問わない。また、上記実施形態では、搬送部5として、搬送トレイTrのZ軸方向の下面に点接触して支持する搬送コロ51を備えるものを例に説明したが、Z軸方向の自由度のみを制限した状態で搬送トレイTrを接触支持できるものであれば、これに限定されるものではく、例えば、球体(図示せず)で接触支持するようにしてもよい。 Although the embodiment of the present invention has been described above, various modifications are possible without departing from the scope of the technical concept of the present invention. In the above embodiment, the tilting unit 2 holds the transport tray Tr from the other side, but the form is not important as long as the transport tray Tr can be held so that the substrate Sw does not come off the holding plate 21 even when the transport tray Tr is in an upright position. In addition, in the above embodiment, the transport unit 5 includes the transport rollers 51 that support the transport tray Tr by point contact with the underside of the Z-axis direction, but the present invention is not limited to this as long as the transport tray Tr can be contact-supported while only the degree of freedom in the Z-axis direction is limited. For example, the transport tray Tr may be contact-supported by a sphere (not shown).

また、上記実施形態では、第1案内部4と第2案内部6として、互いに引き合うように配置した一対の磁石41,42,61,62を備えるものを例に説明したが、第1案内部4として、搬送トレイTrの重量(基板Sw重量も含む)の大半を牽引できると共に、少なくともX軸方向の自由度、Z軸方向上下の移動とY軸方向左右を軸とした回転(ピッチング)の自由度がある程度制限できるものであれば、これに限定されるものではない。特に図示して説明しないが、例えば、ポジションチャンバPc、ロードロックチャンバLc及び各処理チャンバVc1,Vcn内上部にレール部材を設け、このレール部材に摺動自在に係合するスライダに設け、スライダにX軸方向に間隔を置いて吊設した複数本のワイヤで搬送トレイTrを牽引した状態で案内するようにしてもよい。他方、第2案内部6もまた、特に、X軸方向前後を軸にした搬送トレイTrの回転(ロール)やY軸方向左右の移動の自由度がある程度制限できるものであれば、これに限定されるものではなく、上記第1案内部と同様の構成を採用するようにしてもよい。 In the above embodiment, the first guide unit 4 and the second guide unit 6 are described as having a pair of magnets 41, 42, 61, 62 arranged to attract each other, but the first guide unit 4 is not limited to this as long as it can pull most of the weight of the transport tray Tr (including the weight of the substrate Sw) and can limit at least the degree of freedom in the X-axis direction, the degree of freedom of movement up and down in the Z-axis direction, and the degree of freedom of rotation (pitching) around the axis of the Y-axis direction to some extent. Although not particularly illustrated and described, for example, rail members may be provided in the upper part of the position chamber Pc, the load lock chamber Lc, and each processing chamber Vc1, Vcn, and the transport tray Tr may be guided in a pulled state by a plurality of wires provided on a slider that slidably engages with the rail members and suspended from the slider at intervals in the X-axis direction. On the other hand, the second guide section 6 is also not limited to this, and may adopt a configuration similar to that of the first guide section, as long as it can restrict to some extent the degree of freedom of rotation (roll) of the transport tray Tr around the axis in the front-back direction in the X-axis direction and the movement left-right in the Y-axis direction.

更に、上記実施形態では、搬送部5に備わる転動体として単一の軸体51aに少なくとも2個の車輪部51bを設けた搬送コロ51を例に説明したが、これに限定されるものでなく、1個の車輪部とした構成でも不都合はない。また、搬送トレイTrのZ軸方向の自由度を制限すると共に搬送トレイTrへX軸方向の駆動力を転がり接触による摩擦力にて伝達されるように構成されるのであれば不都合はない。つまり、滑り接触ではなく転がり接触で駆動可能となるための垂直抗力が第1案内部4によりその重量の一部が牽引された搬送トレイTrの残余の重量として確保され、これに必要な安全率を付与した構成とすれば理想的な実施形態となる。更に、上記実施形態では、車輪部51bの先端が搬送トレイTrのZ軸方向の下面に点接触するようにし、その点接触部位は、軸体51aを経由して回転駆動力が伝達される機構としたが、この車輪部と軸体との嵌合部に例えば等速ジョイントを用いれば、確実に転がり接触によって搬送トレイTrへ駆動力を伝達することもできる。 In addition, in the above embodiment, the conveying roller 51 is described as a rolling body provided in the conveying unit 5, in which at least two wheel parts 51b are provided on a single shaft body 51a, but this is not limited to this, and there is no problem with a configuration with one wheel part. In addition, there is no problem if the degree of freedom of the conveying tray Tr in the Z axis direction is limited and the driving force in the X axis direction is transmitted to the conveying tray Tr by frictional force due to rolling contact. In other words, an ideal embodiment would be one in which the normal force required to drive the conveying tray Tr by rolling contact rather than sliding contact is secured as the remaining weight of the conveying tray Tr, part of whose weight is pulled by the first guide unit 4, and a necessary safety factor is given to this. In addition, in the above embodiment, the tip of the wheel part 51b is made to make point contact with the underside of the conveying tray Tr in the Z axis direction, and the point contact part is a mechanism for transmitting the rotational driving force via the shaft body 51a, but if a constant velocity joint is used for example at the fitting part between the wheel part and the shaft body, the driving force can be reliably transmitted to the conveying tray Tr by rolling contact.

また、上記実施形態では、第1チャンバをポジションチャンバPc、第2チャンバをロードロックチャンバとしたものを例に説明したが、これに限定されるものではない。例えば、ロードロックチャンバに水平姿勢の基板を搬送し、ロードロックチャンバ内が所定圧力まで真空排気されると、ロードロックチャンバに連設されたポジションチャンバに搬送して水平姿勢の基板を搬送トレイに配置した後、起立姿勢に変更し、この状態で例えば処理チャンバに搬送するものにおいて、第1チャンバとしてのポジションチャンバと第2チャンバとしての処理チャンバとの間で搬送トレイを搬送するものにも本発明は適用することができる。 In the above embodiment, the first chamber is the position chamber Pc and the second chamber is the load lock chamber, but the present invention is not limited to this. For example, a substrate is transported in a horizontal position to a load lock chamber, and when the inside of the load lock chamber is evacuated to a predetermined pressure, the substrate is transported to a position chamber connected to the load lock chamber, the substrate is placed on a transport tray in a horizontal position, and then the substrate is changed to an upright position and transported in this state to, for example, a processing chamber, and the transport tray is transported between the position chamber as the first chamber and the processing chamber as the second chamber.

VM…真空処理装置、Sw…基板(被処理基板)、Tr…搬送トレイ、13…支持板部、Pc…ポジションチャンバ(第1チャンバ)、Lc…ロードロックチャンバ(第2チャンバ)、Vc1,Vcn…処理チャンバ(第2チャンバ)、Tm…搬送手段、2…傾動部、4…第1案内部、5…搬送部、51…搬送コロ(転動体)、6…第2案内部、Tp1…行き搬送路(第1搬送路)、Tp2…戻り搬送路(第2搬送路)、61…第3磁石(一方の磁石)、62…第4磁石(他方の磁石)、63…支持壁、63L,63R…支持壁の可動部分、72a,72b…駆動部、74a,74b…第2の駆動部(他の駆動部)。 VM...vacuum processing device, Sw...substrate (substrate to be processed), Tr...transport tray, 13...support plate portion, Pc...position chamber (first chamber), Lc...load lock chamber (second chamber), Vc1, Vcn...processing chamber (second chamber), Tm...transport means, 2...tilting portion, 4...first guide portion, 5...transport portion, 51...transport roller (rolling body), 6...second guide portion, Tp1...forward transport path (first transport path), Tp2...return transport path (second transport path), 61...third magnet (one magnet), 62...fourth magnet (other magnet), 63...support wall, 63L, 63R...movable portion of support wall, 72a, 72b...drive portion, 74a, 74b...second drive portion (other drive portion).

Claims (3)

一方の面に被処理基板が配置される搬送トレイを搬送しながら、被処理基板の処理面に対して所定の真空処理を施す真空処理装置であって、
水平面内で互いに直交する二方向をX軸方向及びY軸方向、X軸方向及びY軸方向に直交する方向をZ軸方向と、被処理基板の処理面がZ軸方向上方を向く搬送トレイの姿勢を水平姿勢、処理面がY軸方向一方を向く姿勢を起立姿勢とし、
X軸方向に互いに連結される第1チャンバと第2チャンバとを備え、第1チャンバと第2チャンバとに起立姿勢の搬送トレイをX軸方向に沿って搬送する搬送手段が設けられ、第1チャンバ内に、搬送トレイを保持した状態で傾動自在な傾動部を備えて水平姿勢と起立姿勢との間で搬送トレイの姿勢を変更可能としたものにおいて、
搬送手段は、第1チャンバと第2チャンバとの内部に設けられて、搬送トレイの上部を非接触でZ軸方向上方に牽引した状態でX軸方向への移動を案内する第1案内部と、搬送トレイの下部を非接触でZ軸方向上方に牽引した状態でX軸方向への移動を案内する第2案内部と、搬送トレイを接触支持してX軸方向前後に搬送トレイを搬送する搬送部とを備え、第1チャンバ内に存する第2案内部の部分を少なくともY軸方向に移動させる駆動部を設けたことを特徴とする真空処理装置。
A vacuum processing apparatus that performs a predetermined vacuum processing on a processing surface of a substrate to be processed while transporting a transport tray on one surface of which the substrate to be processed is placed,
Two mutually orthogonal directions in a horizontal plane are defined as the X-axis direction and the Y-axis direction, and a direction orthogonal to the X-axis direction and the Y-axis direction is defined as the Z-axis direction. The orientation of the transport tray in which the processing surface of the substrate to be processed faces upward in the Z-axis direction is defined as a horizontal orientation, and the orientation in which the processing surface faces one side in the Y-axis direction is defined as an upright orientation.
A device comprising a first chamber and a second chamber connected to each other in an X-axis direction, a transport means for transporting a transport tray in an upright position along the X-axis direction between the first chamber and the second chamber, and a tilting section for tilting the transport tray while holding it in the first chamber, thereby making it possible to change the position of the transport tray between a horizontal position and an upright position,
The vacuum processing apparatus is characterized in that the transport means is provided inside the first chamber and the second chamber and comprises a first guide section that guides movement in the X-axis direction while pulling the upper part of the transport tray upward in the Z-axis direction without contact, a second guide section that guides movement in the X-axis direction while pulling the lower part of the transport tray upward in the Z-axis direction without contact, and a transport section that supports the transport tray in contact and transports the transport tray back and forth in the X-axis direction, and further comprises a drive section that moves at least the part of the second guide section located within the first chamber in the Y-axis direction.
請求項1記載の真空処理装置であって、前記第1チャンバと前記第2チャンバとにY軸方向に間隔を存して第1案内部、搬送部及び第2案内部を夫々設けた第1搬送路と第2搬送路とが設けられるものにおいて、
前記第2案内部は、前記処理面に対して他方の面側で前記搬送トレイの下部に形成した支持板部のZ軸方向上面に設けた一方の磁石と、この一方の磁石とZ軸方向上方から引き合うように、第1チャンバ及び第2チャンバ内で第1搬送路及び第2搬送路に沿って配置される支持壁のZ軸方向下面に設けた他方の磁石とを備え、各第2案内部の部分を他方の磁石を含む支持壁の可動部分とし、各可動部分を前記駆動部により一体にY軸方向に移動させるように構成したことを特徴とする真空処理装置。
2. The vacuum processing apparatus according to claim 1, wherein a first transport path and a second transport path, each of which is provided with a first guide portion, a transport portion, and a second guide portion, are provided between the first chamber and the second chamber at a distance in the Y-axis direction,
The vacuum processing apparatus is characterized in that the second guide section includes one magnet provided on the upper surface in the Z-axis direction of a support plate section formed at the bottom of the transport tray on the other side of the processing surface , and another magnet provided on the lower surface in the Z-axis direction of a support wall arranged along the first transport path and the second transport path in the first chamber and the second chamber so as to attract the one magnet from above in the Z-axis direction, and each part of the second guide section is made a movable part of the support wall including the other magnet, and each movable part is moved together in the Y-axis direction by the drive section.
前記搬送部は、前記第1チャンバ及び第2チャンバ内で前記第1及び第2の各搬送路に沿って配置されて前記搬送トレイの下面に点接触する転動体を有し、第1チャンバ内に存する各転動体を一体にY軸方向及びZ軸方向の少なくとも一方に移動させる他の駆動部を設けたことを特徴とする請求項2記載の真空処理装置。 The vacuum processing apparatus according to claim 2, characterized in that the transport unit has rolling elements arranged along the first and second transport paths in the first and second chambers and in point contact with the underside of the transport tray, and further includes another drive unit that moves each rolling element present in the first chamber together in at least one of the Y-axis direction and the Z-axis direction.
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Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2013131542A (en) 2011-12-20 2013-07-04 Ulvac Japan Ltd In-line film forming device
JP2016103633A (en) 2014-11-27 2016-06-02 アルバック コリア リミテッドUlvac Korea,Ltd. Substrate transfer apparatus
JP2021025102A (en) 2019-08-06 2021-02-22 株式会社アルバック Vacuum treatment apparatus

Patent Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2013131542A (en) 2011-12-20 2013-07-04 Ulvac Japan Ltd In-line film forming device
JP2016103633A (en) 2014-11-27 2016-06-02 アルバック コリア リミテッドUlvac Korea,Ltd. Substrate transfer apparatus
JP2021025102A (en) 2019-08-06 2021-02-22 株式会社アルバック Vacuum treatment apparatus

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