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JP7706784B2 - Highly corrosion-resistant copper alloy - Google Patents
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JP7706784B2 - Highly corrosion-resistant copper alloy - Google Patents

Highly corrosion-resistant copper alloy Download PDF

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JP7706784B2
JP7706784B2 JP2023123246A JP2023123246A JP7706784B2 JP 7706784 B2 JP7706784 B2 JP 7706784B2 JP 2023123246 A JP2023123246 A JP 2023123246A JP 2023123246 A JP2023123246 A JP 2023123246A JP 7706784 B2 JP7706784 B2 JP 7706784B2
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夏美 藤原
昌史 西本
泉 武藤
優 菅原
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Tohoku University NUC
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特許法第30条第2項適用 ・刊行物:Proceedings of JSCE Materials and Enviroments 2023 材料と環境2023 講演集 発行日:令和5年(2023年)5月1日、 ・集会名:Proceedings of JSCE Materials and Enviroments 2023 材料と環境2023 開催日:令和5年(2023年)6月6日~8日Article 30, Paragraph 2 of the Patent Act applies ・Publication: Proceedings of JSCE Materials and Environments 2023 Materials and Environment 2023 Lecture Collection Publication date: May 1, 2023 ・Meeting name: Proceedings of JSCE Materials and Environments 2023 Materials and Environment 2023 Date: June 6-8, 2023

本発明は、高耐食銅合金に関する。 The present invention relates to a highly corrosion-resistant copper alloy.

電気配線などのコネクタ用電気接点材料としては、銅(Cu)が主に用いられている。しかし、比較的温度が高い条件で乾湿繰り返しが行われると、Cuの表面が腐食し、Cu2OやCuOなどを主体とする電気抵抗が高い腐食生成物が生じる。これに伴い表面の電気抵抗が上昇し、電気接点としての機能が低下する。そのため、耐食性や耐酸化性に優れる金(Au)や銀(Ag)をCuの表面にめっきすることが行われている。しかし、貴金属めっきはコストが高いため、経済性が求められる自動車などの産業機器には、安価で比較的耐食性が高いスズ(Sn)が使用されている。 Copper (Cu) is the main material used as electrical contacts for connectors such as electrical wiring. However, when the material is repeatedly wet and dry under relatively high temperature conditions, the surface of the Cu corrodes, producing corrosion products with high electrical resistance, mainly consisting of Cu2O and CuO. As a result, the electrical resistance of the surface increases, and its function as an electrical contact decreases. For this reason, the surface of the Cu is plated with gold (Au) or silver (Ag), which has excellent corrosion resistance and oxidation resistance. However, because precious metal plating is expensive, tin (Sn), which is inexpensive and relatively corrosion resistant, is used for industrial equipment such as automobiles, which require economical efficiency.

ところで、自動車などの輸送機器における軽量化と省資源化のニーズにより、Snめっきの膜厚を極限まで薄くすることが求められている。Snは比較的軟らかい金属であり、車載用コネクタとして使用した場合には、振動などによる摺動に伴い、Snめっき層が損耗し消失する場合を想定しておく必要がある。電気自動車や自動運転の実現と普及に伴い、コネクタ部の接触不良は重大事故につながる恐れがあり、その回避が求められている。 However, due to the need for weight reduction and resource conservation in automobiles and other transportation equipment, there is a demand to make the thickness of the Sn plating as thin as possible. Sn is a relatively soft metal, and when used in automotive connectors, it is necessary to assume that the Sn plating layer will be worn away and lost due to sliding caused by vibration, etc. As electric vehicles and autonomous driving become more common and widespread, poor contact in connectors can lead to serious accidents, and it is necessary to avoid this.

一方で、長期にわたり低い表面電気抵抗を維持するためのCu合金の組成やミクロ組織に関しては、具体的な条件が明らかにはされておらず、Snめっきが消失した場合、Cu系電気接点材料が露出し、それ自体が腐食する状態を避けることは困難である。このような背景から、腐食環境においても表面の電気抵抗が低い値に維持され、電気接点特性に優れる高耐食銅合金が求められている。 On the other hand, the specific conditions for the composition and microstructure of Cu alloys to maintain low surface electrical resistance over the long term have not been clarified, and if the Sn plating disappears, it will be difficult to avoid the Cu-based electrical contact material being exposed and corroding itself. In this context, there is a demand for highly corrosion-resistant copper alloys that maintain low surface electrical resistance even in corrosive environments and have excellent electrical contact properties.

ところで、Cuの耐食性向上に関しては、合金元素の添加が試みられてきた。たとえば、アルミニウム青銅(Cu-6~12%Al-1.5~6%Fe-5%Ni)、黄銅(Cu-40%Zn)、リン青銅(Cu-4~10%Sn)、白銅(Cu-10~30%Ni)、洋白(Cu-5~35%Ni-15~35%Zn)などが、腐食環境で使用されている。しかし、これらは耐食性には優れるが、腐食環境で表面に腐食生成物が生成し、表面の電気抵抗が高くなり、コネクタ用の電気接点材料としては不向きである。 In regards to improving the corrosion resistance of Cu, attempts have been made to add alloying elements. For example, aluminum bronze (Cu-6-12% Al-1.5-6% Fe-5% Ni), brass (Cu-40% Zn), phosphor bronze (Cu-4-10% Sn), cupro-nickel (Cu-10-30% Ni), and nickel silver (Cu-5-35% Ni-15-35% Zn) are used in corrosive environments. However, although these materials have excellent corrosion resistance, corrosion products are formed on the surface in corrosive environments, increasing the electrical resistance of the surface, making them unsuitable as electrical contact materials for connectors.

そこで、電気自動車の充電ソケットなどのコネクタ用として、Cu合金表面にSnまたはSn合金を被覆した後に熱処理を施し、表面にCu-Sn系金属間化合物(Cu3Sn、Cu4Snなど)を形成させる技術が開示されている(例えば、特許文献1参照)。しかし、Snは、Cuよりも電気化学的に卑な金属であり、貴金属であるCuよりも耐食性に劣る。このため、Cu-Sn合金の耐食性もそれほど高くはない。 Therefore, a technique has been disclosed for connectors such as charging sockets for electric vehicles, in which a Cu alloy surface is coated with Sn or a Sn alloy, and then heat-treated to form a Cu-Sn intermetallic compound (Cu 3 Sn, Cu 4 Sn, etc.) on the surface (see, for example, Patent Document 1). However, Sn is an electrochemically less noble metal than Cu, and has poorer corrosion resistance than Cu, which is a noble metal. For this reason, the corrosion resistance of the Cu-Sn alloy is not very high.

Cuの耐食性を改善するためには、Cuに固溶する組成範囲を有するSn、Zn、Ni、Alを、適切な組成で添加することが好適であると推定される。しかし、そのようなCu合金の組成やミクロ組織に関して、具体的な条件は明らかにはされていない。特に、耐食性が高いだけはなく、電気配線のコネクタ用電気接点材料に求められる低い表面電気抵抗を維持する技術に関しては不明である。 In order to improve the corrosion resistance of Cu, it is presumed that it is suitable to add Sn, Zn, Ni, and Al in an appropriate composition, which have a composition range in which they dissolve in Cu. However, the specific conditions for the composition and microstructure of such Cu alloys have not been made clear. In particular, the technology to maintain not only high corrosion resistance but also the low surface electrical resistance required for electrical contact materials for connectors in electrical wiring is unclear.

特開平10-25562号公報Japanese Patent Application Publication No. 10-25562

本発明は上記事情に鑑みてなされたもので、その目的とするところは、乾湿が繰り返される腐食環境において、高い耐食性を示すと共に、表面電気抵抗を低い値で維持することができ、電気接点特性に優れた高耐食銅合金を提供することにある。 The present invention was made in consideration of the above circumstances, and its purpose is to provide a highly corrosion-resistant copper alloy that exhibits high corrosion resistance in a corrosive environment where drying and wetting are repeated, can maintain a low surface electrical resistance, and has excellent electrical contact properties.

本発明者は、以上のような従来技術の限界を克服し、未解決の課題を解決するため、種々の試験研究を行い、本発明を完成させた。特に、Cu合金において、Sn、Zn、Al、Niの添加量を制御すると、50原子%以上のSnと15原子%以上のCuおよびNiとを含有するSn-Cu-Ni相と、65原子%以上のCuと5原子%以上のSnを含有するCu-Sn相とが生成することを見出した。 The inventors conducted various experimental research to overcome the limitations of the conventional technology and solve the unresolved problems described above, and completed the present invention. In particular, they discovered that controlling the amounts of Sn, Zn, Al, and Ni added to a Cu alloy produces a Sn-Cu-Ni phase containing 50 atomic % or more of Sn and 15 atomic % or more of Cu and Ni, and a Cu-Sn phase containing 65 atomic % or more of Cu and 5 atomic % or more of Sn.

さらに、この二つの相から構成されるCu合金は、乾湿繰り返し試験における腐食減量が非常に小さく、しかも、乾湿繰り返し試験により表面の電気抵抗が大きく増加することはないことを見出した。 Furthermore, it was found that the Cu alloy composed of these two phases shows very little corrosion weight loss in a dry-wet cycle test, and that the surface electrical resistance does not increase significantly as a result of the dry-wet cycle test.

本発明は、以上の新知見に基づくものであり、主旨は以下の通りである。すなわち、本発明に係る高耐食銅合金は、含有量が35原子%以上のCuと、含有量が30原子%以上のSnと、含有量が15原子%以上のNiと、含有量がいずれも1原子%以上10原子%以下のZnおよびAlとを有し、Sn-Cu-Ni相とCu-Sn相とを有し、前記Sn-Cu-Ni相は、50原子%以上のSnと15原子%以上のCuと15原子%以上のNiとを含有し、前記Cu-Sn相は、65原子%以上のCuと5原子%以上のSnとを含有することを特徴とする。 The present invention is based on the above new findings, and its gist is as follows. That is, the highly corrosion-resistant copper alloy according to the present invention has a Cu content of 35 atomic % or more, a Sn content of 30 atomic % or more, a Ni content of 15 atomic % or more, and Zn and Al contents of 1 atomic % or more and 10 atomic % or less, and has a Sn-Cu-Ni phase and a Cu-Sn phase, the Sn-Cu-Ni phase contains 50 atomic % or more Sn, 15 atomic % or more Cu and 15 atomic % or more Ni, and the Cu-Sn phase contains 65 atomic % or more Cu and 5 atomic % or more Sn.

本発明に係る高耐食銅合金で、前記Sn-Cu-Ni相は、Snの含有量が60原子%以上であることが好ましい。 In the highly corrosion-resistant copper alloy according to the present invention, it is preferable that the Sn-Cu-Ni phase has an Sn content of 60 atomic % or more.

本発明に係る高耐食銅合金は、乾湿が繰り返される腐食環境において、高い耐食性を示すと共に、表面電気抵抗を低い値で維持することができ、電気接点特性に優れている。このため、本発明によれば、屋外に設置される電気・通信設備や自動車などの電気配線のコネクタ部の接点不良を、長期間にわたり飛躍的に軽減することが可能である。 The highly corrosion-resistant copper alloy of the present invention exhibits high corrosion resistance in a corrosive environment where drying and wetting are repeated, and is capable of maintaining a low surface electrical resistance, providing excellent electrical contact properties. Therefore, according to the present invention, it is possible to dramatically reduce contact failures in connectors of electrical wiring in electrical and communication equipment installed outdoors, automobiles, and the like, over a long period of time.

本発明の実施の形態の高耐食銅合金(実施例1~6)及び比較例の化学組成、並びに、Sn-Cu-Ni相およびCu-Sn相の組成と面積率とを示す表である。1 is a table showing the chemical compositions of highly corrosion-resistant copper alloys (Examples 1 to 6) according to embodiments of the present invention and comparative examples, as well as the compositions and area ratios of Sn--Cu--Ni phases and Cu--Sn phases. 図1に示す実施例6のミクロ組織の走査型電子顕微鏡像(S.E.)、並びに、Cu、Zn、Al、Ni、およびSnのEDS(エネルギー分散型X線分析法)による元素マップである。2 is a scanning electron microscope image (S.E.) of the microstructure of Example 6 shown in FIG. 1, and elemental maps of Cu, Zn, Al, Ni, and Sn by EDS (energy dispersive X-ray spectroscopy). 図1に示す実施例及び比較例の、耐食性(平均侵食深さ)および表面電気抵抗、並びにそれらの評価を示す表である。2 is a table showing the corrosion resistance (average corrosion depth) and surface electrical resistivity of the examples and comparative examples shown in FIG. 1, as well as their evaluations.

以下に、本発明の実施の形態について述べる。
Cuは比較的耐食性が高く、しかも電気抵抗が低い金属である。また、加工性、Snめっき性、はんだ付け性にも優れている。このため、腐食環境用銅合金としては、必須な元素である。しかし、Cuが35原子%未満では、腐食環境用銅合金として必要な耐食性を得ることができない。このため、本発明の実施の形態の高耐食銅合金は、Cuを35原子%以上含有している。
Hereinafter, an embodiment of the present invention will be described.
Cu is a metal with relatively high corrosion resistance and low electrical resistance. It also has excellent workability, Sn plating property, and solderability. For this reason, it is an essential element for copper alloys for use in corrosive environments. However, if Cu is less than 35 atomic %, the corrosion resistance required for a copper alloy for use in a corrosive environment cannot be obtained. For this reason, the highly corrosion-resistant copper alloy according to the embodiment of the present invention contains Cu at 35 atomic % or more.

本発明の実施の形態の高耐食銅合金は、Cuを35原子%以上含有し、Snを30原子%以上、Niを15原子%以上、ZnとAlをいずれも1原子%以上10原子%以下で含み、50原子%以上のSnとそれぞれ15原子%以上のCuおよびNiとを含有するSn-Cu-Ni相と、65原子%以上のCuと5原子%以上のSnとを含有するCu-Sn相とを有している。 The highly corrosion-resistant copper alloy according to the embodiment of the present invention contains 35 atomic % or more of Cu, 30 atomic % or more of Sn, 15 atomic % or more of Ni, and 1 atomic % or more and 10 atomic % or less of Zn and Al, and has a Sn-Cu-Ni phase containing 50 atomic % or more of Sn and 15 atomic % or more of Cu and Ni, and a Cu-Sn phase containing 65 atomic % or more of Cu and 5 atomic % or more of Sn.

Cu、Sn、Zn、Al、Niが、前記の範囲の場合には、50原子%以上のSnとそれぞれ15原子%以上のCuおよびNiとを含有するSn-Cu-Ni相と、65原子%以上のCuと5原子%以上のSnとを含有するCu-Sn相とを有するミクロ組織が形成される。 When Cu, Sn, Zn, Al, and Ni are within the above ranges, a microstructure is formed that has a Sn-Cu-Ni phase containing 50 atomic % or more of Sn and 15 atomic % or more of Cu and Ni, and a Cu-Sn phase containing 65 atomic % or more of Cu and 5 atomic % or more of Sn.

Sn-Cu-Ni相は、高い耐食性と、腐食試験後においても低い表面電気抵抗とを示す相である。この特性を発現させるためには、50原子%以上のSnと、それぞれ15原子%以上のCuおよびNiとが含有されている必要がある。この相は、比較的高い耐食性を示すが、それはNiによる効果である。Niが15原子%未満では、耐食性が低下する。Cuが50原子%未満の場合には、腐食試験後においても低い表面電気抵抗を示すことが困難となる。同様に、Snが15原子%未満では、腐食試験後においても低い表面電気抵抗を示すことが困難となる。 The Sn-Cu-Ni phase is a phase that exhibits high corrosion resistance and low surface electrical resistance even after corrosion testing. To achieve this characteristic, it is necessary to contain 50 atomic % or more of Sn and 15 atomic % or more each of Cu and Ni. This phase exhibits relatively high corrosion resistance, which is an effect of Ni. If Ni is less than 15 atomic %, corrosion resistance decreases. If Cu is less than 50 atomic %, it becomes difficult to exhibit low surface electrical resistance even after corrosion testing. Similarly, if Sn is less than 15 atomic %, it becomes difficult to exhibit low surface electrical resistance even after corrosion testing.

Cu-Sn相も、高い耐食性と、腐食試験後においても低い表面電気抵抗とを示す相である。この特性を発現させるためには、65原子%以上のCuと5原子%以上のSnとが含有されている必要がある。Cu濃度が65原子%未満の場合には、耐食性が低下する。Snが5原子%未満の場合には、腐食試験後においても低い表面電気抵抗を示すことができなくなる。 The Cu-Sn phase also exhibits high corrosion resistance and low surface electrical resistance even after corrosion testing. To achieve this characteristic, the material must contain at least 65 atomic % Cu and at least 5 atomic % Sn. If the Cu concentration is less than 65 atomic %, corrosion resistance decreases. If the Sn concentration is less than 5 atomic %, the material will not be able to exhibit low surface electrical resistance even after corrosion testing.

本発明の実施の形態の高耐食銅合金は、Sn-Cu-Ni相とCu-Sn相との生成割合や合金全体に占める生成比率を限定するものではないが、Sn-Cu-Ni相とCu-Sn相とを有することが必要である。相の面積に関しては、Sn-Cu-Ni相が50%以上で、Cu-Sn相は10%以上50%以下が好ましい。これは、Cu-Sn相とSn-Cu-Ni相とが異なる作用を発揮するためである。 The highly corrosion-resistant copper alloy according to the embodiment of the present invention is not limited in the ratio of the Sn-Cu-Ni phase and the Cu-Sn phase produced or in the overall alloy, but it is necessary that the alloy has both an Sn-Cu-Ni phase and a Cu-Sn phase. In terms of the area of the phases, it is preferable that the Sn-Cu-Ni phase is 50% or more and the Cu-Sn phase is 10% to 50%. This is because the Cu-Sn phase and the Sn-Cu-Ni phase exert different effects.

すなわち、Cu-Sn相は、Sn-Cu-Ni相に比較して、耐食性は低いものの、腐食試験後の表面電気抵抗を低い値に維持する作用は優れている。逆に、Sn-Cu-Ni相は、Cu-Sn相に比較して、耐食性は高いが、腐食試験後の表面電気抵抗を低い値に維持する作用は劣っている。耐食性と表面電気抵抗とのバランスを確保するためには、Sn-Cu-Ni相が50%以上で、Cu-Sn相は10%以上50%以下が好ましい。この二つの相以外に、面積率において10%以下のNi-Al相などが生成する場合もあり、本発明の実施の形態の高耐食銅合金は、その生成を排除するものではないが、Sn-Cu-Ni相とCu-Sn相との二相から合金が形成されていることが好ましい。 That is, the Cu-Sn phase has lower corrosion resistance than the Sn-Cu-Ni phase, but is excellent at maintaining the surface electrical resistance at a low value after the corrosion test. Conversely, the Sn-Cu-Ni phase has higher corrosion resistance than the Cu-Sn phase, but is inferior at maintaining the surface electrical resistance at a low value after the corrosion test. In order to ensure a balance between corrosion resistance and surface electrical resistance, it is preferable that the Sn-Cu-Ni phase is 50% or more and the Cu-Sn phase is 10% to 50%. In addition to these two phases, Ni-Al phases with an area ratio of 10% or less may be generated, and the highly corrosion-resistant copper alloy of the embodiment of the present invention does not exclude such generation, but it is preferable that the alloy is formed from two phases, the Sn-Cu-Ni phase and the Cu-Sn phase.

ところで、上記のように、Sn-Cu-Ni相は、Cu-Sn相に比較して耐食性は高いが、腐食試験後の表面電気抵抗を低い値に維持する作用は劣っている。しかし、表面電気抵抗を特に低い値に制御したい場合には、Sn-Cu-Ni相のSn濃度が60原子%以上であることが望ましい。Snは、Sn-Cu-Ni相ひいてはCu合金表面全体の腐食試験後の表面電気抵抗を低い値に維持する作用がある。 As mentioned above, the Sn-Cu-Ni phase has higher corrosion resistance than the Cu-Sn phase, but is inferior in maintaining the surface electrical resistance at a low value after a corrosion test. However, if you want to control the surface electrical resistance to a particularly low value, it is desirable for the Sn concentration in the Sn-Cu-Ni phase to be 60 atomic % or more. Sn has the effect of maintaining the surface electrical resistance of the Sn-Cu-Ni phase, and therefore the entire Cu alloy surface, at a low value after a corrosion test.

以下、実施例に基づき本発明の実施の形態を詳細に説明するが、本発明は実施例の記載に限定されるものではない。 The following describes in detail the embodiments of the present invention based on examples, but the present invention is not limited to the description of the examples.

高耐食銅合金として、図1に化学組成を示すものを、真空誘導溶解で作製した。各組成の合金を真空熱処理炉に入れ、1時間かけて500℃まで昇温し、500℃で5時間の均一化熱処理を施した後、直ちに氷水(5℃以下で攪拌状態)の中に投入し急冷を行った。その際、冷却速度が900℃/min以上になるように、氷水の攪拌を行った。その後、各合金を厚さ5 mm、幅15 mm、長さ25 mmに切断し、鏡面研磨することで試験片とした。鏡面研磨では、切断後の合金の表面、裏面及び端面に対して、1μmの粒径のダイヤモンドペーストを用いて研磨を施した。 Highly corrosion-resistant copper alloys with the chemical compositions shown in Figure 1 were prepared by vacuum induction melting. Alloys of each composition were placed in a vacuum heat treatment furnace and heated to 500°C over the course of one hour. They were then subjected to homogenizing heat treatment at 500°C for five hours, after which they were immediately plunged into ice water (stirred at 5°C or less) for rapid cooling. The ice water was stirred so that the cooling rate was 900°C/min or more. Each alloy was then cut to a thickness of 5 mm, width of 15 mm, and length of 25 mm, and mirror-polished to prepare test pieces. For mirror polishing, the front, back, and end faces of the cut alloys were polished using diamond paste with a grain size of 1 μm.

各試験片のミクロ組織を光学顕微鏡で観察し、各相の組成を走査型電子顕微鏡およびエネルギー分散型X線分析により解析した。試験片全体の平均組成は、蛍光X線分析により定量した。Sn-Cu-Ni相およびCu-Sn相の面積率は、1 mm×1 mmの視野を対象に算出した。なお、図2は、実施例6の試験片のミクロ組織の走査型電子顕微鏡像およびEDS(エネルギー分散型X線分析法)による元素マップである。
The microstructure of each test piece was observed by an optical microscope, and the composition of each phase was analyzed by a scanning electron microscope and energy dispersive X-ray analysis. The average composition of the entire test piece was quantified by fluorescent X-ray analysis. The area ratios of the Sn-Cu-Ni phase and the Cu-Sn phase were calculated for a field of view of 1 mm x 1 mm. Note that Figure 2 shows a scanning electron microscope image of the microstructure of the test piece of Example 6 and an element map by EDS (energy dispersive X-ray analysis).

作製した各試験片について、pH8.2に調整した人工海水を用いた乾湿繰り返し試験を行い、試験前後に四端子法により表面の電気抵抗を計測した。 Each test piece was subjected to repeated wet-dry tests using artificial seawater adjusted to a pH of 8.2, and the electrical resistance of the surface was measured using the four-terminal method before and after the test.

この乾湿繰り返し試験は、海塩粒子に起因する大気腐食を模擬したものであり、海浜地域での耐食性に対する耐久性を評価するものである。 This wet-dry cycle test simulates atmospheric corrosion caused by sea salt particles and is used to evaluate the durability of corrosion resistance in coastal areas.

乾湿繰り返し試験は、恒温恒湿槽を用いて、各試験片の人工海水(25℃)への3時間半の浸漬と、25℃、30%RHの環境で30分の乾燥とを繰り返し行った。人工海水への浸漬は、試験片全体が浸漬するまでの時間が1時間20分、試験片全体が浸漬している時間が50分、試験片全体が人工海水から出るまでの時間が1時間20分となるように設定した。人工海水への浸漬と乾燥との組み合わせを1サイクルとし、20サイクルの乾湿繰り返し試験を行った。 For the wet-dry cycle test, a constant temperature and humidity chamber was used, where each test piece was repeatedly immersed in artificial seawater (25°C) for three and a half hours, followed by drying for 30 minutes in an environment of 25°C and 30% RH. The immersion time in artificial seawater was set so that it took 1 hour 20 minutes for the entire test piece to be immersed, 50 minutes for the entire test piece to be immersed, and 1 hour 20 minutes for the entire test piece to emerge from the artificial seawater. A combination of immersion in artificial seawater and drying constituted one cycle, and 20 cycles of wet-dry cycle tests were performed.

四端子法は、ロジウムめっきされた端子が2.0 mmの間隔で直線に配列されたプローブを使用し、そのプローブを、試験片に対して100 gfの一定の力で押しつけることにより、電気抵抗の測定を行った。 The four-terminal method uses a probe with rhodium-plated terminals arranged in a line at intervals of 2.0 mm, and measures electrical resistance by pressing the probe against the test piece with a constant force of 100 gf.

図3に、各試験片の耐食性(平均侵食深さ)および表面電気抵抗、ならびにそれらの評価を示す。耐食性は、乾湿繰り返し試験前後の平均侵食深さの程度で評価した。三酸化クロム(VI)3 g、硫酸12 mLを純水に溶解し、全体を100 mLとした25℃の溶液に、乾湿繰り返し試験後の各試験片を10秒間浸漬することで、腐食生成物を除去し、試験前後の質量変化と試験片表面積とから平均侵食深さを算出した。平均侵食深さが、1μm以下のものを◎(大変良好)、1μmを超え3μm以下のものを○(良好)、3μmを超えるものを×(不良)とした。 Figure 3 shows the corrosion resistance (average erosion depth) and surface electrical resistance of each test piece, as well as their evaluation. Corrosion resistance was evaluated in terms of the average erosion depth before and after the wet-dry cycle test. 3 g of chromium trioxide (VI) and 12 mL of sulfuric acid were dissolved in pure water to make a total of 100 mL. Each test piece after the wet-dry cycle test was immersed in this solution at 25°C for 10 seconds to remove the corrosion products, and the average erosion depth was calculated from the change in mass before and after the test and the surface area of the test piece. Average erosion depths of 1 μm or less were rated as ◎ (very good), those between 1 μm and 3 μm or less were rated as ○ (good), and those exceeding 3 μm were rated as × (poor).

表面の電気抵抗は、乾湿繰り返し試験前後の抵抗率の増加の程度で評価した。鏡面研磨状態での抵抗率に対して、1桁以内の増加を◎(大変良好)、2桁以内の増加を○(良好)、2桁を超える増加を×(不良)とした。 Surface electrical resistance was evaluated based on the degree of increase in resistivity before and after repeated wet-dry testing. Compared to the resistivity in a mirror-polished state, an increase of one digit or less was rated as ◎ (very good), an increase of two digits or less was rated as ○ (good), and an increase of more than two digits was rated as × (bad).

図3に示すように、実施例1~6の各合金は、比較例1~5よりも、耐食性の評価が良好であることに加え、乾湿繰り返し試験に伴う抵抗率の増加が軽微であることが分かった。特に、Cu、Sn、Zn、Al、Niのいずれか一つの元素濃度が、本発明の実施の形態の高耐食銅合金の範囲外になった場合には、Sn-Cu-Ni相とCu-Sn相とが形成されず(図1参照)、耐食性の評価が下がるばかりか、腐食試験に伴い表面電気抵抗が大きく増加することが分かる。また、比較例5は純銅の例であるが、実施例1~6の各合金と比較し、耐食性も低く、抵抗率の増加が極めて大きいことが分かる。 As shown in Figure 3, the alloys of Examples 1 to 6 were found to have better corrosion resistance ratings than those of Comparative Examples 1 to 5, and also showed a slight increase in resistivity following repeated dry-wet testing. In particular, when the element concentration of any one of Cu, Sn, Zn, Al, and Ni falls outside the range of the highly corrosion-resistant copper alloy of the embodiment of the present invention, the Sn-Cu-Ni phase and Cu-Sn phase are not formed (see Figure 1), and not only is the corrosion resistance rating reduced, but the surface electrical resistance increases significantly following the corrosion test. Also, Comparative Example 5 is an example of pure copper, but it is found to have lower corrosion resistance and an extremely large increase in resistivity compared to the alloys of Examples 1 to 6.

本発明に係る高耐食銅合金の活用例としては、自動車用電気配線コネクタの接点材料や、屋外電気設備の電気接点用の材料が想定される。 Examples of applications for the highly corrosion-resistant copper alloy of the present invention include contact materials for electrical wiring connectors in automobiles and materials for electrical contacts in outdoor electrical equipment.

Claims (2)

含有量が35原子%以上52原子%以下のCuと、
含有量が30原子%以上36原子%以下のSnと、
含有量が15原子%以上22原子%以下のNiと、
含有量がいずれも1原子%以上10原子%以下のZnおよびAlとから成り
Sn-Cu-Ni相とCu-Sn相とを有し、
前記Sn-Cu-Ni相は、50原子%以上のSnと15原子%以上のCuと15原子%以上のNiとを含有し、
前記Cu-Sn相は、65原子%以上のCuと5原子%以上のSnとを含有することを
特徴とする高耐食銅合金。
Cu with a content of 35 atomic % or more and 52 atomic % or less ,
Sn having a content of 30 atomic % or more and 36 atomic % or less ,
Ni content is 15 atomic % or more and 22 atomic % or less ,
The content of Zn and Al is 1 atomic % or more and 10 atomic % or less,
It has a Sn-Cu-Ni phase and a Cu-Sn phase,
The Sn-Cu-Ni phase contains 50 atomic % or more of Sn, 15 atomic % or more of Cu, and 15 atomic % or more of Ni;
The Cu-Sn phase is a highly corrosion-resistant copper alloy containing 65 atomic % or more of Cu and 5 atomic % or more of Sn.
前記Sn-Cu-Ni相は、Snの含有量が60原子%以上であることを特徴とする請求項1記載の高耐食銅合金。 The highly corrosion-resistant copper alloy according to claim 1, characterized in that the Sn-Cu-Ni phase has an Sn content of 60 atomic % or more.
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Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2000096109A (en) 1998-09-21 2000-04-04 Sumitomo Electric Ind Ltd Composite sintered friction material and method for producing the same
CN101240386A (en) 2008-03-24 2008-08-13 金坛市恒旭科技有限公司 Copper-based catalyst alloy with anti-scaling function and preparation method thereof
JP2017538042A (en) 2014-10-28 2017-12-21 アドバンスド アロイ ホールディングス ピーティーワイ リミテッド Metal alloys containing copper

Patent Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2000096109A (en) 1998-09-21 2000-04-04 Sumitomo Electric Ind Ltd Composite sintered friction material and method for producing the same
CN101240386A (en) 2008-03-24 2008-08-13 金坛市恒旭科技有限公司 Copper-based catalyst alloy with anti-scaling function and preparation method thereof
JP2017538042A (en) 2014-10-28 2017-12-21 アドバンスド アロイ ホールディングス ピーティーワイ リミテッド Metal alloys containing copper

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