JP7711545B2 - Method for manufacturing an article having a plurality of through holes - Google Patents

Description

The present invention relates to a method for manufacturing an article having multiple through holes.

To create a shape with many through holes, such as a mesh, one method is to use a patterned resist and form the through holes by etching, or to use electroforming.

International Publication No. 2013/054786

However, in the method using etching, etching progresses faster in the area closer to the surface, so the diameter of the through hole becomes larger in the area closer to the surface, making it difficult to form a cylindrical through hole, and therefore it is difficult to form a through hole with a depth of more than several hundred microns. In addition, the etched surface is finished with a rough surface, so the wall surface of the through hole does not have a mirror finish. In the method using electroforming, it is difficult to make the resist thicker than several hundred microns or to pattern it, and as with etching, the resist cannot be patterned uniformly in the depth direction, so the rising surface cannot be made into a vertical mirror surface.

The objective of the present invention is to provide a method for manufacturing an article having multiple through holes, which can make the wall surfaces of the through holes into vertical mirror surfaces and can also produce articles that are thicker than several hundred μm.

The present invention solves the above problems by the following means. Note that, for ease of understanding, the following description will use symbols corresponding to the embodiments of the present invention, but the present invention is not limited to these.

The first invention includes a substrate forming step of forming a substrate (10) having a plurality of columnar convex portions (12), a photochromic layer forming step of forming a photochromic layer (20) whose characteristics change when irradiated with light of a specific wavelength range on the surface of the substrate (10) having the columnar convex portions (12), and a step of irradiating light from the surface of the substrate (10) opposite the columnar convex portions (12) into the interior of the columnar convex portions (12), causing the light to be totally reflected by the side surface (12b) of the columnar convex portions (12), and causing the light to be totally reflected by the top surface (12b) of the columnar convex portions (12). a) to change the properties of the photochromic layer (20) at the position corresponding to the apex (12a); an electrode layer forming process to form an electrode layer (50, 60) on the portion of the columnar convex portion (12) excluding the apex (12a); an electroforming process to perform electroforming using the electrode layer (50, 60) to form an electroformed product between the columnar convex portions (12); and a removal process to remove the substrate (10) from the electroformed product.

The second invention is a method for manufacturing an article (1) having a plurality of through holes (1a) according to the first invention, characterized in that the photochromic layer (20) is formed of a material whose properties change from hydrophilic to hydrophobic when irradiated with light in a specific wavelength range, and the side surface (12b) and bottom surface (12c) of the columnar convex portion (12) are kept hydrophilic and the top surface (12a) of the columnar convex portion (12) is changed to hydrophobic by the light irradiation process, and an electroless plating catalyst layer formation process is provided between the light irradiation process and the electrode layer formation process, in which an electroless plating catalyst material is applied to the photochromic layer (20) to form an electroless plating catalyst layer (40) on the photochromic layer (20) that has maintained its hydrophilicity, and in the electrode layer formation process, an electroless plating process is performed on the electroless plating catalyst layer (40) to form an electroless plating layer as the electrode layer (50).

The third invention is a method for manufacturing an article (1) having a plurality of through holes (1a) according to the first invention, characterized in that the photochromic layer (20) is formed of a material that changes from a state in which metal deposition is possible to a state in which metal deposition is impossible when irradiated with light in a specific wavelength range, the side surface (12b) and bottom surface (12c) of the columnar convex portion (12) are maintained in a state in which metal deposition is possible, and the top surface (12a) of the columnar convex portion (12) is changed to a state in which metal deposition is impossible by the light irradiation process, and in the electrode layer formation process, a metal that will become the electrode layer (50, 60) is vapor-deposited on the columnar convex portion (12) side to form the electrode layer (60) on the side surface (12b) and bottom surface (12c) of the columnar convex portion (12).

The fourth invention is a method for manufacturing an article (1) having a plurality of through holes (1a) according to any one of the first to third inventions, characterized in that the method further includes a low refractive index layer forming step for forming a low refractive index layer having a lower refractive index than the columnar convex portion (12) between the columnar convex portion (12) and the photochromic layer (20).

The fifth invention is a method for manufacturing an article (1) having a plurality of through holes (1a) according to any one of the first to fourth inventions, characterized in that it includes an initial irradiation step of irradiating the entire photochromic layer (20) with light of a wavelength range different from the light irradiation of the specific wavelength range prior to the light irradiation step.

The sixth invention is a method for manufacturing an article (1) having a plurality of through holes (1a) according to any one of the first to fifth inventions, characterized in that the method further includes a light-shielding layer forming step of forming a light-shielding layer (30) that partially blocks the light irradiated in the light-irradiating step on the surface of the substrate (10) opposite the columnar convex portion (12) before the light-irradiating step.

The present invention provides a method for manufacturing an article having multiple through holes that can have a vertical mirror surface on the wall of the through holes and can also produce an article that is thicker than several hundred microns.

1 is a perspective view showing an article 1 having a plurality of through holes manufactured by a method for manufacturing an article having a plurality of through holes according to the present invention. FIG. 2 is a diagram showing a substrate 10 of a reverse mold (resin mold) used to produce the article 1 shown in FIG. 1. FIG. 2 is a diagram showing a state in which a photochromic layer 20 is formed on a substrate 10 by a photochromic layer forming step. 3 is a diagram showing a state in which a light-shielding layer 30 is formed on a substrate 10 by a light-shielding layer forming step. FIG. FIG. FIG. FIG. 2 is a diagram showing a state in which an electroless plating catalyst layer 40 is formed by an electroless plating catalyst layer forming step. FIG. 11 is a diagram showing a state in which an electrode layer 50 is formed by an electrode layer forming step. 1 is a diagram showing the state of an article 1 formed by an electroforming process. 13 is a diagram showing a state in which an electrode layer 60 is formed by an electrode layer forming step of the second embodiment. FIG. 11A and 11B are diagrams showing the state of an article 1 formed by an electroforming process of a second embodiment.

The best mode for carrying out the present invention will be described below with reference to the drawings.

First Embodiment
FIG. 1 is a perspective view showing an article 1 having a plurality of through holes manufactured by the manufacturing method of an article having a plurality of through holes according to the present invention.
Note that the figures shown below, including FIG. 1, are schematic views, and the size and shape of each part are exaggerated or omitted as appropriate for ease of understanding.
In the following description, specific numerical values, shapes, materials, etc. are given, but these can be changed as appropriate.
In this specification, terms specifying shapes or geometric conditions, such as parallel and orthogonal, are intended to include not only their strict meanings but also states that have a similar function and have an error that can be considered as parallel or orthogonal.

In this embodiment, an example of producing a plate-shaped article 1 having a plurality of through holes 1a as shown in Fig. 1 will be described. Here, an example in which the through holes 1a are holes having a rectangular prism shape will be described, but the shape of the through holes 1a may be a cylinder shape or another polygonal shape.
In this embodiment, the material of the article 1 is copper, but any material that can be electroformed as described below may be used, such as aluminum, magnesium, molybdenum, titanium, nickel, etc.

Next, a method for producing an article having a plurality of through holes according to this embodiment will be described.
First, the substrate 10 having a plurality of columnar protrusions 12 is prepared (substrate formation step).
Fig. 2 is a diagram showing a substrate 10 of an inverse mold (resin mold) used for producing the article 1 shown in Fig. 1. Fig. 2(a) shows a cross-sectional view perpendicular to the sheet surface of the substrate 10, and Fig. 2(b) shows a perspective view.
The substrate 10 includes a substrate sheet 11 and columnar protrusions 12 .

The base sheet 11 is formed, for example, from a polyester resin such as PET (polyethylene terephthalate) having high optical transparency, an acrylic resin, a styrene resin, an acrylic-styrene resin, a PC (polycarbonate) resin, an alicyclic polyolefin resin, a TAC (triacetyl cellulose) resin, etc. The layer thickness of the base sheet 11 can be, for example, 50 μm or more and 300 μm or less.

A plurality of columnar protrusions 12 are arranged so as to protrude from one surface of the base sheet 11. In this embodiment, the columnar protrusions 12 are in a quadrangular prism shape in order to form the shape of the through-hole 1a of the article 1 in a quadrangular prism shape. The arrangement of the columnar protrusions 12 is not particularly limited, and may be arranged regularly at equal intervals, but may also be arranged randomly or in a houndstooth pattern.
The width of the columnar protrusions 12 can be, for example, 20 μm or more and 1000 μm or less, and the amount of protrusion from the base sheet 11 can be, for example, 50 μm or more and 2000 μm or less.
The columnar convex portion 12 is formed of an ultraviolet curing resin having high light transmittance, such as a urethane acrylate-based, polyester acrylate-based, epoxy acrylate-based, polyether acrylate-based, polythiol-based, butadiene acrylate-based, etc. The columnar convex portion 12 is formed by applying an uncured ultraviolet curing resin to one side of the base sheet 11, pressing the base sheet 11 together with the resin against a separately prepared mold, and curing the resin by irradiating the resin with ultraviolet light. The columnar convex portion 12 may also be formed by exposing the ultraviolet curing resin to light through a mask.
In this embodiment, an ultraviolet curable resin is used as an example of the resin constituting the columnar protrusion 12, but the resin is not limited to this, and may be, for example, other ionizing radiation curable resins such as electron beam curable resins, thermoplastic resins, or thermosetting resins.

After the substrate 10 is prepared, a photochromic layer 20 whose characteristics change when irradiated with light in a specific wavelength range is then formed on the surface of the substrate 10 having the columnar protrusions 12 (photochromic layer forming step).
FIG. 3 is a diagram showing a state in which the photochromic layer 20 is formed on the substrate 10 by the photochromic layer forming step.
The photochromic layer 20 is a layer whose characteristics change when irradiated with light in a specific wavelength range. More specifically, the photochromic layer 20 of this embodiment is formed by applying 1,2-diarylethene and drying it, and is hydrophilic immediately after drying. The photochromic layer 20 can be formed by, for example, a deposition method, a spin coating method, a slit coating method, or the like. The photochromic layer 20 of this embodiment has the property of becoming hydrophobic when irradiated with ultraviolet light (wavelength: 100 to 400 nm) and becoming hydrophilic when irradiated with visible light (wavelength: 400 to 750 nm).
The thickness of the photochromic layer 20 is desirably 1 μm or more and 50 μm or less.

In this specification, the term "photochromic" refers to a change in some property due to light irradiation, and does not necessarily mean that a color change (change in transmission spectrum) occurs due to light irradiation. In addition, the example of the photochromic layer 20 described above has reversible photochromic properties, but it may have irreversible photochromic properties. An example of a technology that changes wettability due to light irradiation is "Photochromism" edited by the Society of Polymer Science, Kyoritsu Shuppan, p. 28 (2012), which describes the property of diarylethene that changes from hydrophilic to hydrophobic due to light irradiation.

The photochromic layer 20 is hydrophilic immediately after drying, but depending on the storage conditions after drying, it may be impossible to deny that the photochromic layer 20 has been exposed to ultraviolet light. In such cases, it is advisable to thoroughly irradiate the photochromic layer 20 with visible light (wavelength: 400 to 750 nm) (initial irradiation step) before proceeding to the next step to ensure that the photochromic layer 20 is in a hydrophilic state.

Next, a light shielding layer 30 that partially blocks the light irradiated in the next step, a light irradiation step, is formed on the surface of the base material 10 opposite the columnar convex portions 12 (light shielding layer forming step).
4A and 4B are diagrams showing a state in which the light-shielding layer 30 is formed on the substrate 10 by the light-shielding layer forming step. Fig. 4A shows a cross-sectional view perpendicular to the sheet surface of the substrate 10, and Fig. 4B shows a perspective view.
The light-shielding layer 30 of this embodiment is formed mainly in an area facing an area where the columnar convex portions 12 are not formed, on the surface of the substrate 10 opposite to the columnar convex portions 12. Therefore, the light-shielding layer 30 has an opening 31 where the light-shielding layer 30 is not formed and light can pass through, at a position facing the columnar convex portions 12. It is desirable that the opening width W31 of the opening 31 is the same as or slightly narrower than the width W12 of the columnar convex portions 12. This is because light incident from an oblique direction can be appropriately blocked in the next step, the light irradiation step.
The light-shielding layer 30 may be made of, for example, chrome black, a resin in which a black pigment is dispersed, or the like.

Next, only the photochromic layer 20 provided on the tops of the columnar protrusions 12 is irradiated with ultraviolet light (wavelength: 100 to 400 nm) (light irradiation step).
5 and 6 are diagrams showing the light irradiation step, in which Fig. 5(a) and Fig. 6(a) show cross-sectional views perpendicular to the sheet surface of the substrate 10, and Fig. 5(b) and Fig. 6(b) show perspective views.

Here, in the light irradiation process of this embodiment, the phenomenon of total reflection of ultraviolet light at the side surface 12b of the columnar convex portion 12 is utilized in order to irradiate ultraviolet light only to the photochromic layer 20 provided at the top of the columnar convex portion 12. In the light irradiation process, ultraviolet light is irradiated from the surface of the substrate 10 opposite the columnar convex portion through the opening 31 into the inside of the columnar convex portion 12. The ultraviolet light irradiated at this time is preferably parallel light, and is irradiated from an oblique direction having a slight angle with respect to the normal direction of the sheet surface of the substrate 10 (for example, a direction having an angle of 5° or less with respect to the normal direction of the substrate 10). This ultraviolet light is blocked by the light-shielding layer 30 and does not reach the portion where the columnar convex portion 12 is not provided (hereinafter also referred to as the bottom surface 12c). Note that while it is preferable that the ultraviolet light is parallel light, it may be diffused light as long as it is within a range in which the purpose of the light irradiation process can be achieved.

The light that travels into the columnar convex portion 12 travels in an oblique direction and reaches the side surface 12b. Here, the refractive index n20 of the photochromic layer 20 is lower than the refractive index n12 of the columnar convex portion 12. Specifically, in this embodiment, the columnar convex portion 12 is formed of a urethane acrylate resin with a refractive index n12 = 1.6, and the photochromic layer 20 is formed of 1,2-diarylethene with a refractive index n20 = 1.57. Therefore, when ultraviolet light reaches the side surface 12b at an angle that satisfies the total reflection condition (incident angle (critical angle) at the side surface 12b is 79° or more), it is totally reflected at the side surface 12b and the ultraviolet light does not reach the photochromic layer 20 at the side surface 12b. Therefore, even when ultraviolet light is irradiated, the photochromic layer 20 on the side surface 12b maintains its hydrophilicity.

The ultraviolet light totally reflected at the side surface 12b reaches the apex 12a, but at this location, the ultraviolet light is incident on the apex 12a at an angle smaller than the critical angle, so the total reflection condition is not met and the ultraviolet light reaches the photochromic layer 20 and exits as is. Therefore, at the apex 12a, the photochromic layer 20 is exposed to the ultraviolet light and becomes hydrophobic.

As shown in Figures 5 and 6, it is desirable to perform the light irradiation process multiple times while changing the irradiation angle and direction of the ultraviolet light so that the top 12a is sufficiently exposed, but depending on the shape of the columnar convex portion 12, it may be possible to perform only one ultraviolet irradiation.
By carrying out the light irradiation step, the photochromic layer 20 on the tops 12a of the columnar protrusions 12 becomes hydrophobic, while the photochromic layer 20 on the bottoms 12c and side surfaces 12b maintains its hydrophilicity.

When the refractive index n20 of the photochromic layer 20 is higher than the refractive index n12 of the columnar convex portion 12, a low refractive index layer having a refractive index lower than the refractive index n12 of the columnar convex portion 12 may be provided between the columnar convex portion 12 and the photochromic layer 20. The low refractive index layer forming step for providing this low refractive index layer may be performed before providing the photochromic layer 20. For example, the low refractive index layer may be made of an amorphous fluorine polymer, hollow silica nanoparticles, urethane acrylate resin with porous silica nanoparticles dispersed therein, epoxy acrylate resin, or the like.

Next, a catalyst material for electroless plating is applied to the photochromic layer 20 to form an electroless plating catalyst layer 40 on the photochromic layer 20 that maintains its hydrophilicity (electroless plating catalyst layer forming step).
FIG. 7 is a diagram showing a state in which the electroless plating catalyst layer 40 has been formed by the electroless plating catalyst layer forming step.
Here, since the photochromic layer 20 on the tops 12a of the columnar protrusions 12 has been rendered hydrophobic by the previous light irradiation process, even if a catalyst material for electroless plating is applied, it is repelled and does not adhere to the tops 12a. Therefore, as shown in Fig. 7, no electroless plating catalyst layer 40 is formed on the tops 12a of the columnar protrusions 12, and the electroless plating catalyst layer 40 is formed only on the bottom surfaces 12c and side surfaces 12b.
In the electroless plating catalyst layer forming step, for example, the photochromic layer 20 may be immersed in a catalyst material for electroless plating, or the catalyst material for electroless plating may be applied onto the photochromic layer 20 by slit coating, spin coating, or the like.
For example, a palladium chloride catalyst, a palladium/tin colloid catalyst, a silver nanoparticle catalyst, or the like can be used as the electroless plating catalyst layer 40 .

Next, the electrode layer 50 is formed on the portion of the columnar protrusion 12 excluding the top portion 12 a (electrode layer forming step). Specifically, electroless plating of copper is performed. Note that nickel can also be used as the electrode layer 50 in addition to copper.
FIG. 8 is a diagram showing a state in which the electrode layer 50 has been formed in the electrode layer forming step.
In the electrode layer forming step, the substrate 10 on which the electroless plating catalyst layer 40 is formed is immersed in an electroless copper plating solution. The electroless copper plating solution is preferably a mixture of formalin and an aqueous solution of copper sulfate. As shown in FIG. 8, an electroless copper plating layer is formed as an electrode layer 50 only on the surface on which the electroless plating catalyst layer 40 is formed.

Next, using the base material 10 on which the electrode layer 50 has been formed in the electrode layer forming step as a matrix, electroforming is performed using the electrode layer 50 to form an electroformed product between the columnar protrusions 12 (electroforming step).
FIG. 9 is a diagram showing the state of the article 1 formed by the electroforming process.
In the electroforming step, the gaps between the columnar protrusions 12 are filled with copper to form the electroformed product 1 having a plurality of through holes 1a. The portions of the columnar protrusions 12 are formed into a shape corresponding to the through holes 1a.

Finally, the substrate 10 is removed from the electroformed product 1 (removal step).
This removal step may involve peeling the substrate 10 off the article 1, or may involve melting the substrate 10 with a chemical agent and removing it.
By completing this removing step, an electroformed product 1 having a plurality of through holes 1a as shown in FIG. 1 can be obtained.

As described above, according to the manufacturing method of the first embodiment, the manufactured article 1 can have the inner wall surface of the through hole 1a as a vertical mirror surface. In addition, it is possible to manufacture thick articles having a thickness of several hundred μm or more and up to several mm.

Second Embodiment
The second embodiment utilizes the property that the photochromic layer 20 changes by light irradiation, which is different from that of the first embodiment, and has many points in common with the first embodiment. Therefore, the same reference numerals are used for parts that perform the same functions as those of the first embodiment described above, and duplicated explanations will be omitted as appropriate.

The article 1 produced in the second embodiment has a similar structure to that in the first embodiment.
A method for manufacturing the article 1 in the second embodiment will be described below.
The substrate forming step and the photochromic layer forming step are the same as those in the first embodiment. The photochromic layer 20 is formed by applying and drying 1,2-diarylethene as in the first embodiment, but the characteristics to be utilized are different from those in the first embodiment.
In the second embodiment, the following characteristic is utilized: when 1,2-diarylethene is irradiated with light having a wavelength of 300 to 400 nm, the state becomes one in which a metal to be evaporated can adhere (a state in which metal evaporation is possible), whereas when 1,2-diarylethene is irradiated with light having a wavelength of 500 to 600 nm, the state becomes one in which a metal to be evaporated cannot adhere (a state in which metal evaporation is not possible).

After the photochromic layer 20 is formed, the photochromic layer 20 is sufficiently irradiated with light having a wavelength of 300 to 400 nm (initial irradiation step) to make the entire photochromic layer 20 in a state where the metal to be evaporated can be attached.

Next, a light-shielding layer forming step is carried out in the same manner as in the first embodiment.
Next, light having a wavelength of 500 to 600 nm is irradiated only onto the photochromic layer 20 provided on the top of the columnar protrusion 12 (light irradiation step). This light irradiation step is the same as that of the first embodiment except that the wavelength of the irradiated light is different from that of the first embodiment.
By carrying out the light irradiation process, the photochromic layer 20 on the top 12a of the columnar convex portion 12 changes to a state where the evaporated metal cannot adhere thereto, while the photochromic layer 20 on the bottom surface 12c and the side surface 12b maintains a state where the evaporated metal can adhere thereto.

Next, copper that will become the electrode layer 60 is vapor-deposited on the photochromic layer 20 on the side of the columnar protrusion 12 to form the electrode layer 60 on the side surface 12b and bottom surface 12c of the columnar protrusion 12 (electrode layer forming step).
FIG. 10 is a diagram showing a state in which the electrode layer 60 is formed by the electrode layer forming step of the second embodiment.
Here, the photochromic layer 20 on the tops 12a of the columnar projections 12 has been changed to a state where the evaporated metal does not adhere thereto, so that copper does not adhere thereto.

Next, using the base material 10 on which the electrode layer 60 has been formed in the electrode layer forming step as a matrix, electroforming is performed using the electrode layer 60 to form an electroformed product between the columnar protrusions 12 (electroforming step).
FIG. 11 is a diagram showing a state in which the article 1 is formed by the electroforming process of the second embodiment.
In the electroforming step, the gaps between the columnar protrusions 12 are filled with copper to form the electroformed product 1 having a plurality of through holes 1a. The portions of the columnar protrusions 12 are formed into a shape corresponding to the through holes 1a.

Finally, similarly to the first embodiment, the substrate 10 is removed from the article 1, which is an electroformed product (removal step).
By completing this removing step, an electroformed product 1 having a plurality of through holes 1a as shown in FIG. 1 can be obtained.

As described above, the manufacturing method of the second embodiment makes it possible to produce an article 1 similar to that of the first embodiment by using vapor deposition.

(Modifications)
The present invention is not limited to the above-described embodiment, and various modifications and variations are possible, and these are also within the scope of the present invention.

(1) In the first embodiment, the electrode layer formation process and the electroforming process are described as separate processes. However, this is not limited thereto, and for example, when the material of the electrode layer 50 and the material of the article 1 are the same, these may be performed together as one process.

(2) In each embodiment, the material of the electrode layer 50 and the material of the article 1 may be different. For example, silver may be used as the material of the electrode layer 50 and nickel may be used as the material of the article 1.

(3) In each embodiment, an example in which the light-shielding layer 30 is formed after the columnar convex portions 12 are created has been described. However, when the thickness of the base sheet 11 is large, it may be difficult to form the light-shielding layer 30 in a position corresponding to the arrangement of the columnar convex portions 12. In such a case, the light-shielding layer 30 may be formed on the base sheet 11 before the columnar convex portions 12 are formed on the base sheet 11. After the light-shielding layer 30 is formed, an ultraviolet curing resin is applied as a material for the columnar convex portions 12. Furthermore, ultraviolet light is irradiated from the side of the base sheet 11 on which the light-shielding layer 30 is formed. In this case, ultraviolet light is irradiated to the ultraviolet curing resin from the openings 31 where the light-shielding layer 30 is not provided, and the ultraviolet curing resin is cured, so that the shape of the columnar convex portions 12 can be formed. The columnar convex portions 12 may be formed by such a process, which is generally referred to as a self-alignment process.

The embodiments and variations can be used in any suitable combination, but detailed explanations will be omitted. Furthermore, the present invention is not limited to the embodiments described above.

Reference Signs List 1: Article 1a: Through hole 10: Substrate 11: Substrate sheet 12: Columnar protrusion 12a: Top 12b: Side surface 12c: Bottom surface 20: Photochromic layer 30: Light-shielding layer 31: Opening 40: Electroless plating catalyst layer 50: Electrode layer 60: Electrode layer

Claims (6)

a base material forming step of forming a base material having a plurality of columnar protrusions;
a photochromic layer forming step of forming a photochromic layer, the characteristics of which change when irradiated with light in a specific wavelength range, on the surface of the base material having the columnar protrusions;
a light irradiation step of irradiating light from a surface of the base material opposite to the columnar convex portions toward the inside of the columnar convex portions, causing the light to be totally reflected by the side surfaces of the columnar convex portions and reach the tops of the columnar convex portions, thereby changing the properties of the photochromic layer at the positions corresponding to the tops;
an electrode layer forming step of forming an electrode layer on a portion of the columnar protrusion excluding the top;
an electroforming step of performing electroforming using the electrode layer to form an electroformed product between the columnar protrusions;
a removing step of removing the base material from the electroformed product;
A method for manufacturing an article having a plurality of through holes, comprising: The method for producing an article having a plurality of through holes according to claim 1,
the photochromic layer is formed of a material whose properties change from hydrophilic to hydrophobic when irradiated with light in a specific wavelength range;
the side and bottom surfaces of the columnar protrusions are kept hydrophilic and the tops of the columnar protrusions are made hydrophobic by the light irradiation step;
between the light irradiation step and the electrode layer formation step, an electroless plating catalyst layer formation step is provided in which an electroless plating catalyst material is applied to the photochromic layer to form an electroless plating catalyst layer on the photochromic layer that maintains its hydrophilicity;
In the electrode layer forming step, an electroless plating process is performed on the electroless plating catalyst layer to form an electroless plating layer as the electrode layer;
A method for producing an article having a plurality of through holes, comprising the steps of: The method for producing an article having a plurality of through holes according to claim 1,
the photochromic layer is formed of a material that changes from a state in which metal deposition is possible to a state in which metal deposition is not possible when irradiated with light in a specific wavelength range;
the light irradiation step maintains the side and bottom surfaces of the columnar protrusions in a state where metal deposition is possible, and changes the tops of the columnar protrusions to a state where metal deposition is not possible;
the electrode layer forming step comprises performing a vapor deposition process on the columnar protrusion side to form the electrode layer on the side surface and the bottom surface of the columnar protrusion;
A method for producing an article having a plurality of through holes, comprising the steps of: The method for producing an article having a plurality of through holes according to any one of claims 1 to 3,
a low refractive index layer forming step of forming a low refractive index layer having a refractive index lower than that of the columnar convex portion between the columnar convex portion and the photochromic layer;
A method for producing an article having a plurality of through holes, comprising the steps of: The method for producing an article having a plurality of through holes according to any one of claims 1 to 4,
an initial irradiation step of irradiating the entire photochromic layer with light in a wavelength range different from the specific wavelength range of the light irradiation before the light irradiation step;
A method for producing an article having a plurality of through holes, comprising the steps of: The method for producing an article having a plurality of through holes according to any one of claims 1 to 5,
a light-shielding layer forming step of forming a light-shielding layer that partially blocks the light irradiated in the light-irradiating step on a surface of the base material opposite to the columnar convex portion, prior to the light-irradiating step;
A method for producing an article having a plurality of through holes, comprising the steps of: