JP7718874B2 - Apparatus, apparatus control method, article manufacturing method using apparatus, control program, and recording medium - Google Patents

Description

The present invention relates to a mechanical device.

Technologies are known for moving an object to a desired position and performing processing. For example, in blast processing, a feed mechanism moves the blast nozzle and workpiece to the desired position, and processing is performed for the desired time. In devices equipped with a feed mechanism, if dust scattered during processing enters the feed mechanism, it can cause a deterioration in the accuracy of the feed mechanism or damage it. Therefore, Patent Document 1 proposes a configuration in which a gas such as air is supplied to the inside of a bellows member, maintaining the internal pressure of the bellows member at or above the internal pressure of the blast chamber. Furthermore, Patent Document 2 proposes a configuration in which compressed gas is supplied through a gas supply pipe and the supplied gas is collected through a suction pipe, thereby reducing the pressure difference between the space surrounded by the bellows and the vacuum chamber.

Japanese Patent Application Publication No. 11-347948 Japanese Patent Application Laid-Open No. 2002-106562

When gas such as air is supplied to the interior of the member surrounding the feed mechanism, the feed accuracy of the feed mechanism can deteriorate. Therefore, the objective is to improve the feed accuracy of the feed mechanism.

The means for solving the above problem is an apparatus comprising a moving mechanism for moving an object, a cover provided around the moving mechanism, and an enclosure provided around the object, wherein the atmosphere inside the cover is set to be the same as the atmosphere outside the enclosure, and the difference in air pressure between the outside of the enclosure and the inside of the cover is smaller than the difference in air pressure between the inside of the cover and the inside of the enclosure .

The present invention provides an advantageous technology for improving the feeding accuracy of the feeding mechanism.

FIG. 1 is a schematic diagram showing the configuration of a mechanical device according to first and second embodiments. FIG. 10 is a perspective view showing the configuration of a feed mechanism according to a third embodiment. 10A is a perspective view showing the configuration of a feed mechanism according to a fourth embodiment, and FIG. 10B is a cross-sectional view showing the configuration of the feed mechanism according to the fourth embodiment. 3A is a cross-sectional view of the feed mechanism taken along line A1 in FIG. 3A, and FIG. 3B is a cross-sectional view of the feed mechanism taken along line A2 in FIG. FIG. 10 is a schematic diagram showing the configuration of a blasting device according to a fifth embodiment. FIG. 13 is a plan view showing an example of a partition member according to a fifth embodiment.

The following describes a mode for carrying out the present invention with reference to the drawings. However, the mode described below is one embodiment of the invention and is not limited to this. Common configurations will be described with mutual reference to multiple drawings, and descriptions of configurations with common reference numerals will be omitted as appropriate. Items with the same name but different functions can be distinguished by adding "0", such as "first item" and "second item".

First Embodiment
A mechanical device 10 according to a first embodiment will be described with reference to FIG.

Figure 1 shows a schematic diagram of a mechanical device 10 according to the first embodiment.

The machine 10 comprises a feed mechanism 5, a retractable, bellows-shaped protective cover 4, a support 11, and an enclosure 6 surrounding them. Processing, such as machining and analysis, is carried out within the enclosure 6 (inside the enclosure 6). In this embodiment, the enclosure 6 is a chamber or partition wall that defines a processing chamber in a processing device. The feed mechanism 5 is installed in a position surrounded by the protective cover 4, which seals the length of the feed mechanism 5 up to both ends. The protective cover 4 has openings 400 at both ends, and the interior of the protective cover 4 (inside the protective cover 4) is interconnected from one end to the other. The protective cover 4 is, for example, a Libereau bellows. However, holes or gaps that allow gas to pass between the protective cover 4 and the enclosure 6 may exist in the protective cover 4, at the connection between the protective cover 4 and the enclosure 6, or between the support 11 and the protective cover 4.

In this embodiment, the opening 400 of the protective cover 4 is connected to the air duct 8. The inside of the air duct 8 may be sealed or may be connected to a space separate from the inside of the envelope 6, as long as it is a space separate from the inside of the envelope 6. The inside of the protective cover 4 is connected to the atmosphere outside the envelope 6.

The mechanical device 10 is equipped with an exhaust unit 7, which exhausts gas from within the enclosure 6. The exhaust unit 7 includes an exhaust port and a suction pump, and is required to have the function of exhausting gas in order to exhaust unnecessary gases and the like when the mechanical device 10 is in use. The exhaust unit 7 exhausts gas from within the enclosure 6 to the outside of the enclosure 6 (outside the enclosure 6), creating a negative pressure within the enclosure 6 relative to the outside of the enclosure 6.

Because the atmosphere inside the protective cover 4 is connected to the atmosphere outside the envelope 6, the pressure inside the protective cover 4 is roughly equal to the pressure of the atmosphere outside the envelope 6. Here, "roughly equal" means that the pressure difference between the outside of the envelope 6 and inside the protective cover 4 is smaller than the pressure difference between the inside of the protective cover 4 and inside the envelope 6.

Furthermore, the phrase "the pressures of the atmosphere inside the protective cover 4 and outside the envelope 6 are approximately equal" means that the pressure difference between the pressure of the atmosphere outside the envelope 6 and inside the protective cover 4 is smaller than the pressure difference between the pressure of the atmosphere outside the envelope 6 and inside the envelope 6. Here, the atmosphere outside the envelope 6 is the atmosphere in which pressure is applied to the wall surface of the envelope 6 from outside the envelope 6. In other words, in this embodiment, the atmosphere outside the envelope 6 is the atmosphere inside the air duct 8.

The pressure from the atmosphere outside the envelope 6 is, for example, atmospheric pressure, and can vary depending on the location and conditions of use of the mechanical device 10 according to this embodiment. The atmosphere outside the envelope 6 is, for example, 30,000 Pa or more, or 91,193 Pa or more (90% or more of atmospheric pressure), preferably 100,312 Pa or more (99% or more of atmospheric pressure). The atmosphere outside the envelope 6 is, for example, 150,000 Pa or less, or 111,458 Pa or less (110% or less of atmospheric pressure), preferably 102,338 Pa or less (101% or less of atmospheric pressure).

The pressure inside the protective cover 4 is roughly equal to the pressure outside the envelope 6. When the pressure outside the envelope 6 is atmospheric pressure, the pressure is, for example, 30,000 Pa or more or 91,193 Pa or more (90% or more of atmospheric pressure), preferably 100,312 Pa or more (99% or more of atmospheric pressure). The atmosphere outside the envelope 6 is, for example, 150,000 Pa or less or 111,458 Pa or less (110% or less of atmospheric pressure), preferably 102,338 Pa or less (101% or less of atmospheric pressure).

The pressure inside the envelope 6 only needs to be lower than the pressure inside the protective cover 4, but the pressure difference between the pressure inside the envelope 6 and the pressure inside the protective cover 4 is, for example, 10 Pa or more, or 30 Pa or more, and preferably 50 Pa or more. The pressure difference between the pressure inside the envelope 6 and the pressure inside the protective cover 4 is, for example, 1000 Pa or less, or 500 Pa or less, and preferably 250 Pa or less.

Since gas is being exhausted by the exhaust section 7, the pressure inside the envelope 6 only needs to be lower than the pressure inside the protective cover 4, and is preferably 100 Pa or higher. The pressure inside the envelope 6 is, for example, 60,795 Pa or higher (60% or higher of atmospheric pressure), and preferably 81,060 Pa or higher (80% or higher of atmospheric pressure). Furthermore, a pressure of 101,325 Pa or lower (100% or lower of atmospheric pressure) is preferable, and 101,224 Pa or lower (99.9% or lower of atmospheric pressure) is even more preferable.

A difference of 100 Pa is 100 N/ ^m2 , which means that the air pressure is equivalent to a load of 10 kg per 1 meter square plate. Since the envelope 6 according to this embodiment is approximately 3 m long x 2 m wide x 1.8 m high, even if the pressure difference between inside the envelope 6 and inside the protective cover 4 is 100 Pa, a considerable load will be applied.

In this embodiment, compressed gas is not supplied inside the protective cover 4, but rather the inside of the protective cover 4 is connected to the atmosphere outside the envelope 6. If compressed gas were supplied inside the protective cover 4, the pressure of the supplied gas would fluctuate during supply. Fluctuations in the pressure of the supplied gas would cause the resistance of the gas to the feed mechanism to vary depending on the position of the feed mechanism, resulting in poor feed accuracy.

By connecting the inside of the protective cover 4 to the atmosphere outside the enclosure 6, it is possible to prevent the resistance of the gas to the feed mechanism from varying depending on the position of the feed mechanism, compared to when compressed gas is supplied inside the protective cover 4.

In this embodiment, the difference between the pressure applied from the atmosphere outside the enclosure 6 and the pressure inside the protective cover 4 is smaller than the difference between the pressure inside the protective cover 4 and the pressure inside the enclosure 6. This configuration makes the flow of gas flowing from outside the enclosure 6 into the protective cover 4 gentler than when compressed gas is supplied. By gentler gas flow, pressure loss inside the protective cover 4 can be reduced.

We will explain the pressure loss of gas. When gas passes through a wall, friction occurs between the gas and the wall, causing the gas to lose energy. The amount of energy lost varies depending on the properties of the fluid, and the friction force per unit volume is expressed by the following formula (1):
τ=μ×du/dr...(1)

Here, μ represents viscosity, and du/dr represents the velocity gradient of the fluid at the wall surface. In other words, the higher the viscosity or the greater the velocity, the greater the pressure loss of the fluid at the wall surface. If a supply port is provided to supply compressed gas into the protective cover, the velocity of the gas will increase, resulting in pressure loss.

Conditions that cause pressure loss include not only friction on the wall surface, but also stagnation that occurs when a fluid flows from a thin pipe to a thick pipe, and collisions with the wall that occur when a fluid flows from a thin pipe to a thick pipe. In the case of a bellows-shaped protective cover, the thickness of the protective cover varies depending on how the bellows expand and contract, which can result in fluctuations in gas pressure loss. While bellows-shaped protective covers have been explained here, they are not limited to bellows shapes and can be applied to any cover whose diameter changes with expansion and contraction.

If the feeding mechanism is installed inside the protective cover, fluctuations in the energy of the gas causing pressure loss will cause the gas's resistance force on the feeding mechanism to fluctuate, causing a deterioration in the feeding accuracy of the feeding mechanism.

In this embodiment, by opening the inside of the protective cover 4 to the atmosphere outside the envelope 6, the pressure inside the protective cover 4 and the atmosphere outside the envelope 6 are roughly equalized, and the speed of the gas flowing from outside the envelope 6 into the protective cover 4 is maintained at a low level. In other words, this configuration reduces the occurrence of gas pressure loss. As a result, the gas resistance force on the feed mechanism 5 does not fluctuate, and high precision of the feed mechanism 5 in the mechanical device 10 can be achieved.

In this embodiment, the pressure difference between the inside of the protective cover 4 and the inside of the envelope 6 is greater than the pressure difference between the atmosphere outside the envelope 6 and the inside of the protective cover 4. Therefore, the flow velocity generated by the pressure difference between the inside of the protective cover 4 and the inside of the envelope 6 is more dominant than the flow velocity generated by the pressure difference between the outside of the envelope 6 and the inside of the protective cover 4.

Since both ends of the protective cover 4 are connected to an atmosphere different from that of the enclosure 6 by air ducts 8, the pressure inside the protective cover 4 is relatively positive compared to the pressure inside the enclosure 6, which is negative due to the exhaust of gas. Even if the protective cover 4 has holes that allow air to enter and exit, the pressure difference between the gas inside the enclosure 6 and the protective cover 4 prevents powder and foreign matter scattered during mechanical processing from entering the protective cover 4.

Second Embodiment
Next, as a second embodiment, a blast processing device, which is an example of the mechanical device 10 according to the first embodiment, will be described with reference to FIG.

In Figure 1, there is an enclosure 6 that defines the blasting chamber (processing chamber). Within the enclosure 6, an abrasive spray nozzle 1 (hereinafter referred to as nozzle 1), which sprays abrasive on high-velocity gas, is positioned opposite a workpiece 2 placed on a worktable 3. Nozzle 1 is connected to a feed mechanism 5 and a support part 11 that is driven by the feed mechanism 5, so that nozzle 1 operates in accordance with the drive of the feed mechanism 5 to perform blasting. Here, the feed mechanism 5 moves nozzle 1 via the support part 11, but it can also be connected to the worktable 3.

The exhaust section 7 can not only exhaust gas, but also suck in abrasives and other materials generated during blasting. The exhaust section can be, for example, a classifier or dust collector.

Third Embodiment
Next, the X-direction feed mechanism 55 of the first and second embodiments will be described with reference to FIG.

Figure 2 shows the X-direction configuration of the feed mechanism according to this embodiment. The feed mechanism 55 in Figure 2 is perpendicular to the feed mechanism 5 in Figure 1 and performs feed operations in the X direction. Like the feed mechanism 5, the feed mechanism 55 is also enclosed by a protective cover 4. The feed mechanism 5 is composed of a ball screw 12, a guide rail 13, a guide support member 14 supporting the guide rail 13, a beam structure 15 supporting the entire Y-direction feed mechanism, a guide carriage 16, and a motor 17, and drives the support unit 11. Operation of the motor 17 rotates the ball screw 12, driving the support unit 11 along the guide rail 13. In Figure 1, the support unit 11 and the protective cover 4 are connected by a fixed part, so that the protective cover 4 expands and contracts in conjunction with the operation of the feed mechanism 5. In this embodiment, the protective cover 4 is interconnected from one end to the other, and the openings 40 at both ends of the protective cover 4 are connected to the air duct 8. In addition to the devices and parts that make up the feed mechanism 55, the protective cover 4 may also house a dust meter, a Cableveyor (registered trademark), a linear scale required for high-precision processing, and other devices.

<Fourth embodiment>
Next, the mechanical device 10 according to this embodiment will be described with reference to FIGS.

Figure 3(a) shows a combination of the feed mechanisms shown in Figure 2 along three orthogonal axes in the X, Y, and Z directions. Figure 3(b) is a cross-sectional view of the view in Figure 3(a). Feed mechanism 5 performs feed operations along the Y axis, and another feed mechanism 55, orthogonal to feed mechanism 5, performs feed operations along the X axis. Feed mechanism 5 is surrounded by protective cover 42, and feed mechanism 55 is surrounded by protective cover 41, and they each perform feed operations along orthogonal axes. Here, a nozzle 1 is installed at the tip of feed mechanism 5.

Figure 4(a) is a cross-sectional view in the X direction of Figure 3(a), and Figure 4(b) is a cross-sectional view in the Y direction of Figure 3(a).

The protective cover (X direction) 41 and the protective cover (Y direction) 42 are connected by a hollow fixed cover (XY communication) 24, which connects to the support part 11 of the feed mechanism 55 inside the protective cover (X direction) 41. Similarly, the protective cover (Y direction) 42 and the protective cover (Z direction) 43 are connected by a hollow fixed cover (YZ communication) 25, which connects to the feed mechanism 5 inside the protective cover (Y direction) 42.

The piping that supplies compressed gas and abrasive material to the nozzle 1 runs from the compressed gas supply equipment and abrasive material supply equipment installed outside the enclosure 6 through each protective cover and fixed cover, then enters the protective cover (Z direction) 43 and connects to the nozzle 1. This allows the compressed gas supply piping and abrasive material supply piping to follow the movement of the protective cover 4 in conjunction with the operation of the feed mechanism 5 for each axis, and, like the feed mechanism 5, can be protected from damage caused by scattering of abrasive material during processing.

The support unit 11, driven by the X-direction feed mechanism 55, is connected to the Y-direction feed mechanism 5, and the support unit 11, driven by the Y-direction feed mechanism 5, is connected to the Z-direction feed mechanism. As a result, when the feed mechanism 55 drives in the X-direction, the hollow fixed cover (XY communication) 24 and protective cover (Y direction) 42, both connected to the X-direction feed mechanism 55, move in the same manner, causing the nozzle 1 to move in the X-direction. When the Y-direction feed mechanism 5 drives, the hollow fixed cover (YZ communication) 25 and protective cover (Z direction) 43, both connected to the Y-direction feed mechanism 5, move in the same manner, causing the nozzle 1 to move in the Y-direction. Similarly, the protective cover (Z direction) 43 moves in the same manner due to the operation of the Z-direction feed mechanism, causing the nozzle 1 to move in the Z-direction. For example, the fixed covers 24 and 25 are made of sheet metal. Alternatively, plastic or other materials may be used, preferably a material that surrounds the support unit 11 and is resistant to deformation.

The protective cover (X direction) 41, which has openings at both ends, is connected to the protective cover (Y direction) 42 through the hollow fixed cover (XY communication) 24, and further connected to the hollow fixed cover (YZ communication) 25. Because this is a cross-sectional view, the protective cover (Z direction) 43 is omitted, but by also connecting the hollow fixed cover (YZ communication) 25 and the protective cover (Z direction) 43, three-axis communication can be achieved within each protective cover in the X, Y, and Z directions.

By opening both ends of the protective cover 4 and connecting them to the atmosphere outside the enclosure 6, the pressure inside the protective cover 4 can be kept constant at atmospheric pressure. This configuration suppresses fluctuations in the resistance force on the support part 11 due to the degree of expansion and contraction of the bellows, achieving high precision in the feed mechanism 5. Here, the atmosphere outside the enclosure 6 refers to the atmosphere.

The enclosure 6 is installed in a position that surrounds the protective cover 4, and an opening 60 of the same size as the end of the protective cover 4 is provided at the joining position with the end of the protective cover 4 to allow communication between the inside of the protective cover 4 and the atmosphere outside the enclosure 6.

By joining the opening 40 of the protective cover 41 and the opening 60 of the enclosure 6, the inside of the protective cover 4 is connected to the atmospheric environment. However, it does not have to be an atmospheric environment; the present invention can be applied to any atmosphere that is separated from the inside of the enclosure 6 and in which pressure is applied to the wall surface of the enclosure 6 from outside the enclosure 6. In addition, the inside of the protective cover 4 is connected to the atmospheric environment via a filter, preventing the intrusion of dirt and dust in the air. The filter is provided, for example, at the opening 40, but it may be provided closer to the enclosure 6 than the opening 40.

With this configuration, when the suction function is activated during processing and the abrasive is collected through the exhaust section 7, the gas inside the enclosure 6 is exhausted to the outside of the enclosure 6, creating a negative pressure inside the enclosure 6. The pressure inside the protective cover 4 and fixed covers 24, 25, which are connected to the air duct 8, is relatively positive compared to the negative pressure inside the enclosure 6. This prevents dust particles scattered during processing from entering the protective cover 4 due to the pressure difference between the gas inside the enclosure 6 and the protective cover 4.

In this embodiment, as in the first embodiment, the suction function is activated during processing, and while abrasives and the like are being collected through the exhaust section 7, the gas inside the enclosure 6 is exhausted to the outside of the enclosure 6, creating a negative pressure inside the enclosure 6. Because the inside of the protective cover 4 is connected to the atmospheric environment and to a different space from the enclosure 6, the air pressure inside the protective cover 4 is relatively positive compared to the inside of the enclosure 6, which is placed under negative pressure due to the exhaust of gas. This prevents abrasives and the like scattered during blast processing from entering the protective cover 4 due to the pressure difference between the gas inside the enclosure 6 and the protective cover 4.

This embodiment does not require a device to supply gas to the protective cover 4, so the machine device 10 including the feed mechanism 5 according to this embodiment can be easily installed in a general processing area.

Fifth Embodiment
Next, a mechanical device 10 according to a fifth embodiment will be described with reference to FIGS.

Figure 5 shows a schematic diagram of the mechanical device 10 according to this embodiment.

In addition to the mechanical device 10 according to the second embodiment, the mechanical device 10 according to this embodiment has a partition member 9 or 90 provided between at least one of the protective cover 4 and the work table 3, or between the enclosure 6 and the work table 3.

By providing the partition members 9 and 90, it is possible to prevent the abrasive supplied with the compressed gas during processing and cutting chips from the workpiece 2 from scattering and directly colliding with the wall surfaces of the enclosure 6 and protective cover 4.

Furthermore, by limiting the main scattering area of the abrasive from the entire interior of the enclosure 6 to the space partitioned by the partition members 9 (horizontal) and 90 (vertical), the efficiency of recovering the abrasive from the exhaust section 7 is improved. Furthermore, when cleaning the interior of the enclosure 6 during maintenance work, the cleaning only needs to be focused on the spaces within the partition members 9 and 90, which is expected to improve the efficiency of maintenance work.

Figure 6 shows a specific implementation method for the partition member 9 in the configuration shown in Figure 5. In this embodiment, a feed mechanism 5 is provided on the nozzle 1 side. Therefore, in order to enhance the partitioning effect of the partition member 9 in dividing the abrasive, it is necessary for the partition member 9 to move horizontally in synchronization with the movement of the nozzle 1. Therefore, a configuration in which bellows are combined in the XY horizontal directions, as shown in Figure 6, is used.

The partition bellows (X direction) 31 in Figure 6 operates in accordance with the movement of the nozzle 1 in the X direction. Furthermore, by incorporating the partition bellows (Y direction) 32 into the partition bellows (X direction) 31, it also accommodates movement of the nozzle 1 in the Y direction. This allows the partition member 9 to operate in accordance with the movement of the nozzle 1 in the horizontal XY directions, and functions as a partition member for the abrasive.

Even when partition members 9 and 90 are installed, the inside of the protective cover 4 is connected to the outside of the enclosure 6, so the resistance force on the support part 11 does not fluctuate, achieving high precision in the feed mechanism 5. The partition bellows 31 and 32 are, for example, panel-type bellows, and have sheet metal at the ends of the bellows.

The mechanical device 10 according to this embodiment can be used, for example, when processing a substrate holder. The substrate holder can refer to the substrate holder described in JP 2015-94002 A, for example. The substrate holder can be, for example, an FPD chuck in an FPD (flat panel display) exposure device.

In the embodiment described above, a blast processing device has been described as an example of the mechanical device 10, but it is not limited to blast processing devices and can also be applied to other processing devices. It can be applied not only to grinding processes such as blast processing, but also to mechanical devices used for cutting processes and laser processing. It can also be applied to inspection devices that require precise feeding.

Abrasives and cutting chips generated during processing using these processing devices can be sucked up using the exhaust section 7.

Appropriate modifications are possible within the scope of the technical concept. For example, multiple embodiments can be combined. Furthermore, some features of at least one embodiment can be deleted or replaced. Furthermore, new features can be added to at least one embodiment.

The disclosure of this specification includes not only what is explicitly described in this specification, but also all matters that can be understood from this specification and the drawings attached hereto.

The disclosure of this specification also includes the complement of the individual concepts described herein. In other words, if this specification states, for example, that "A is greater than B," then even if it omits the statement "A is not greater than B," it can be said that this specification discloses that "A is not greater than B." This is because when it states that "A is greater than B," it is assumed that the case in which "A is not greater than B" is taken into consideration.

4 Cover 5 Feeding mechanism 6 Enclosure

Claims (22)

An apparatus comprising: a moving mechanism for moving an object; a cover provided around the moving mechanism; and an enclosure provided around the object,
The atmosphere inside the cover is made to be the same as the atmosphere outside the envelope ,
a difference between the atmospheric pressure outside the enclosure and the atmospheric pressure inside the cover is smaller than a difference between the atmospheric pressure inside the cover and the atmospheric pressure inside the enclosure;
An apparatus characterized in that The air pressure inside the enclosure where the object exists is set to be lower than the air pressure inside the cover.
2. The device of claim 1 . a difference between the atmospheric pressure outside the enclosure and the atmospheric pressure inside the cover is smaller than a difference between the atmospheric pressure outside the enclosure and the atmospheric pressure inside the enclosure;
3. The device according to claim 1 or 2 . The outside of the enclosure is the atmosphere.
4. Apparatus according to any one of claims 1 to 3 . The cover has a hole that allows gas to enter and exit the inside of the enclosure.
5. An apparatus according to any one of claims 1 to 4 . an opening for exchanging the atmosphere inside the cover with the atmosphere outside the envelope;
6. An apparatus according to any one of claims 1 to 5 . a moving mechanism other than the moving mechanism, the moving direction of the other moving mechanism being perpendicular to the moving direction of the moving mechanism;
7. Apparatus according to any one of claims 1 to 6 . a cover separate from the cover is provided around the other moving mechanism, and the other cover is in communication with the cover;
8. The device according to claim 7 . the cover or the other cover is bellows-shaped;
9. The device according to claim 8 . an air duct is provided to make the atmosphere inside the cover equal to the atmosphere outside the enclosure;
10. Apparatus according to any one of claims 1 to 9 . An exhaust unit is provided to exhaust gas from inside the enclosure.
11. Apparatus according to any one of claims 1 to 10 . While performing work with the object, the exhaust unit sucks gas inside the enclosure.
10. The device of claim 1 , wherein: a support portion for supporting the object,
the movement mechanism is connected to the support part and moves the object by moving the support part;
13. The device according to claim 1, wherein the first and second electrodes are connected to a first electrode. the object is an abrasive jet nozzle or a work table provided opposite the abrasive jet nozzle;
13. The device according to claim 1 , wherein the first and second electrodes are connected to a first electrode. a partition member is provided inside the enclosure between at least one of the work table and the cover and the work table and the enclosure;
14. The device according to claim 13 . the workpiece to be machined by the abrasive jet nozzle is ceramic;
manufacturing a substrate holder by processing the workpiece with the abrasive spray nozzle;
13. The device according to claim 12, wherein the first and second electrodes are connected to the first and second electrodes . Laser processing is performed using the object.
13. The device according to claim 1 , wherein the first and second electrodes are connected to a first electrode. The moving mechanism is capable of performing precision feeding.
18. Apparatus according to any one of claims 1 to 17 . A method for manufacturing an article, comprising manufacturing the article using the apparatus according to any one of claims 1 to 18 . A method for controlling an apparatus including a movement mechanism for moving an object, a cover provided around the movement mechanism, and an enclosure provided around the object, the method comprising:
The atmosphere inside the cover is made to be the same as the atmosphere outside the envelope,
a difference between the atmospheric pressure outside the enclosure and the atmospheric pressure inside the cover is smaller than a difference between the atmospheric pressure inside the cover and the atmospheric pressure inside the enclosure;
moving the object by the movement mechanism;
A control method comprising: A control program for causing a computer to execute the control method according to claim 20 . 2. A computer-readable recording medium storing the control program according to claim 1 .