JP7718962B2 - Metal replacement treatment solution, aluminum or aluminum alloy surface treatment method - Google Patents
Metal replacement treatment solution, aluminum or aluminum alloy surface treatment methodInfo
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- JP7718962B2 JP7718962B2 JP2021182009A JP2021182009A JP7718962B2 JP 7718962 B2 JP7718962 B2 JP 7718962B2 JP 2021182009 A JP2021182009 A JP 2021182009A JP 2021182009 A JP2021182009 A JP 2021182009A JP 7718962 B2 JP7718962 B2 JP 7718962B2
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- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C18/00—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating
- C23C18/16—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by reduction or substitution, e.g. electroless plating
- C23C18/48—Coating with alloys
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- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C18/00—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating
- C23C18/54—Contact plating, i.e. electroless electrochemical plating
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- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C18/00—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating
- C23C18/16—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by reduction or substitution, e.g. electroless plating
- C23C18/18—Pretreatment of the material to be coated
- C23C18/1803—Pretreatment of the material to be coated of metallic material surfaces or of a non-specific material surfaces
- C23C18/1824—Pretreatment of the material to be coated of metallic material surfaces or of a non-specific material surfaces by chemical pretreatment
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- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C18/00—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating
- C23C18/02—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by thermal decomposition
- C23C18/08—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by thermal decomposition characterised by the deposition of metallic material
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- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C18/00—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating
- C23C18/16—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by reduction or substitution, e.g. electroless plating
- C23C18/18—Pretreatment of the material to be coated
- C23C18/1803—Pretreatment of the material to be coated of metallic material surfaces or of a non-specific material surfaces
- C23C18/1824—Pretreatment of the material to be coated of metallic material surfaces or of a non-specific material surfaces by chemical pretreatment
- C23C18/1827—Pretreatment of the material to be coated of metallic material surfaces or of a non-specific material surfaces by chemical pretreatment only one step pretreatment
- C23C18/1831—Use of metal, e.g. activation, sensitisation with noble metals
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- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C18/00—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating
- C23C18/16—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by reduction or substitution, e.g. electroless plating
- C23C18/18—Pretreatment of the material to be coated
- C23C18/1803—Pretreatment of the material to be coated of metallic material surfaces or of a non-specific material surfaces
- C23C18/1824—Pretreatment of the material to be coated of metallic material surfaces or of a non-specific material surfaces by chemical pretreatment
- C23C18/1837—Multistep pretreatment
- C23C18/1841—Multistep pretreatment with use of metal first
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- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C18/00—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating
- C23C18/16—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by reduction or substitution, e.g. electroless plating
- C23C18/31—Coating with metals
- C23C18/32—Coating with nickel, cobalt or mixtures thereof with phosphorus or boron
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- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C28/00—Coating for obtaining at least two superposed coatings either by methods not provided for in a single one of groups C23C2/00 - C23C26/00 or by combinations of methods provided for in subclasses C23C and C25C or C25D
- C23C28/02—Coating for obtaining at least two superposed coatings either by methods not provided for in a single one of groups C23C2/00 - C23C26/00 or by combinations of methods provided for in subclasses C23C and C25C or C25D only coatings only including layers of metallic material
- C23C28/023—Coating for obtaining at least two superposed coatings either by methods not provided for in a single one of groups C23C2/00 - C23C26/00 or by combinations of methods provided for in subclasses C23C and C25C or C25D only coatings only including layers of metallic material only coatings of metal elements only
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- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23F—NON-MECHANICAL REMOVAL OF METALLIC MATERIAL FROM SURFACE; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL; MULTI-STEP PROCESSES FOR SURFACE TREATMENT OF METALLIC MATERIAL INVOLVING AT LEAST ONE PROCESS PROVIDED FOR IN CLASS C23 AND AT LEAST ONE PROCESS COVERED BY SUBCLASS C21D OR C22F OR CLASS C25
- C23F1/00—Etching metallic material by chemical means
- C23F1/10—Etching compositions
- C23F1/14—Aqueous compositions
- C23F1/16—Acidic compositions
- C23F1/20—Acidic compositions for etching aluminium or alloys thereof
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- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23G—CLEANING OR DE-GREASING OF METALLIC MATERIAL BY CHEMICAL METHODS OTHER THAN ELECTROLYSIS
- C23G1/00—Cleaning or pickling metallic material with solutions or molten salts
- C23G1/02—Cleaning or pickling metallic material with solutions or molten salts with acid solutions
- C23G1/12—Light metals
- C23G1/125—Light metals aluminium
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- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
- C25D5/00—Electroplating characterised by the process; Pretreatment or after-treatment of workpieces
- C25D5/34—Pretreatment of metallic surfaces to be electroplated
- C25D5/42—Pretreatment of metallic surfaces to be electroplated of light metals
- C25D5/44—Aluminium
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- Organic Chemistry (AREA)
- Mechanical Engineering (AREA)
- General Chemical & Material Sciences (AREA)
- Electrochemistry (AREA)
- Physics & Mathematics (AREA)
- Thermal Sciences (AREA)
- Chemically Coating (AREA)
- Electroplating Methods And Accessories (AREA)
Description
本発明は、金属置換処理液、アルミニウム又はアルミニウム合金の表面処理方法に関する。 The present invention relates to a metal replacement treatment solution and a method for treating the surface of aluminum or aluminum alloys.
アルミニウムは大気中、水中で容易に酸化膜を形成する。この酸化膜に起因し、アルミニウム又はアルミニウム合金にめっき処理を施す際に、めっき皮膜の密着性が低いことが知られている。そのため、めっき処理に先立って、アルミニウム又はアルミニウム合金表面の酸化被膜を除去しアルミニウム上に形成されるめっき皮膜との密着性を確保する目的で亜鉛置換処理(ジンケート処理)工程が行われている(例えば、特許文献1~3、非特許文献1~3)。 Aluminum easily forms an oxide film in the air or water. It is known that this oxide film causes poor adhesion of the plating film when plating aluminum or aluminum alloys. Therefore, prior to plating, a zinc substitution treatment (zincate treatment) is carried out to remove the oxide film from the aluminum or aluminum alloy surface and ensure adhesion of the plating film formed on the aluminum (see, for example, Patent Documents 1-3 and Non-Patent Documents 1-3).
本発明者らが鋭意検討した結果、従来の技術では、めっき皮膜との密着性について改善の余地があることが判明した。 As a result of extensive research, the inventors have found that there is room for improvement in the adhesion of conventional technologies to plating films.
本発明は、本発明者らが新たに見出した前記課題を解決し、めっき皮膜(金属皮膜)との良好な密着性を付与できる金属置換処理液、該金属置換処理液を用いたアルミニウム又はアルミニウム合金の表面処理方法を提供することを目的とする。 The present invention aims to solve the above-mentioned problems newly discovered by the inventors and to provide a metal replacement treatment liquid that can impart good adhesion to plating films (metal films), and a surface treatment method for aluminum or aluminum alloys using this metal replacement treatment liquid.
本発明者らは、鋭意検討した結果、特定の組成の金属置換処理液を用いることにより、めっき皮膜(金属皮膜)との良好な密着性を付与できることを見出し、本発明を完成した。
すなわち、本発明は、亜鉛化合物、ニッケル化合物、ゲルマニウム化合物、フッ素化合物を含む金属置換処理液に関する。
As a result of extensive research, the present inventors have discovered that by using a metal substitution treatment solution with a specific composition, good adhesion to a plating film (metal film) can be imparted, and have completed the present invention.
That is, the present invention relates to a metal substitution treatment solution containing a zinc compound, a nickel compound, a germanium compound, and a fluorine compound.
前記金属置換処理液は、亜鉛化合物を亜鉛濃度として0.2~5.0g/L含むことが好ましい。 The metal replacement treatment solution preferably contains a zinc compound at a zinc concentration of 0.2 to 5.0 g/L.
前記金属置換処理液は、ニッケル化合物をニッケル濃度として0.2~10g/L含むことが好ましい。 The metal replacement treatment solution preferably contains a nickel compound at a nickel concentration of 0.2 to 10 g/L.
前記金属置換処理液は、ゲルマニウム化合物をゲルマニウム濃度として0.2~5.0g/L含むことが好ましい。 The metal replacement treatment solution preferably contains a germanium compound at a germanium concentration of 0.2 to 5.0 g/L.
前記金属置換処理液は、フッ素化合物をフッ素濃度として5.0~50g/L含むことが好ましい。 The metal replacement treatment solution preferably contains a fluorine compound at a fluorine concentration of 5.0 to 50 g/L.
前記金属置換処理液は、亜鉛濃度、ゲルマニウム濃度の比率が1:5~5:1であることが好ましい。 It is preferable that the ratio of zinc concentration to germanium concentration in the metal replacement treatment solution be 1:5 to 5:1.
前記金属置換処理液は、pHが4.0~6.5であることが好ましい。 The metal replacement treatment solution preferably has a pH of 4.0 to 6.5.
前記金属置換処理液は、アルミニウム又はアルミニウム合金用であることが好ましい。 The metal replacement treatment liquid is preferably for use on aluminum or aluminum alloys.
本発明はまた、アルミニウム又はアルミニウム合金を表面に有する被処理物を、前記金属置換処理液に接触させ、前記アルミニウム又はアルミニウム合金上の酸化皮膜を除去し、前記アルミニウムを前記金属置換処理液に含有される金属に置換させる金属置換処理を行い、前記被処理物の表面に前記金属を含む置換金属皮膜を形成するアルミニウム又はアルミニウム合金の表面処理方法に関する。 The present invention also relates to a surface treatment method for aluminum or aluminum alloys, which involves contacting a workpiece having aluminum or an aluminum alloy on its surface with the metal replacement treatment solution, removing an oxide film on the aluminum or aluminum alloy, and performing a metal replacement treatment to replace the aluminum with a metal contained in the metal replacement treatment solution, thereby forming a replacement metal film containing the metal on the surface of the workpiece.
前記置換金属皮膜を形成した後、該置換金属皮膜表面にめっき皮膜を形成することが好ましい。 After forming the replacement metal film, it is preferable to form a plating film on the surface of the replacement metal film.
本発明によれば、亜鉛化合物、ニッケル化合物、ゲルマニウム化合物、フッ素化合物を含む金属置換処理液であるので、めっき皮膜(金属皮膜)との良好な密着性を付与できる。 According to the present invention, the metal replacement treatment solution contains zinc compounds, nickel compounds, germanium compounds, and fluorine compounds, which can impart good adhesion to the plating film (metal film).
本発明の金属置換処理液は、亜鉛化合物、ニッケル化合物、ゲルマニウム化合物、フッ素化合物を含む。これにより、めっき皮膜(金属皮膜)との良好な密着性を付与できる。 The metal replacement treatment solution of the present invention contains a zinc compound, a nickel compound, a germanium compound, and a fluorine compound. This allows it to provide good adhesion to the plating film (metal film).
前記金属置換処理液で前述の効果が得られる理由は、以下のように推察される。
アルミニウム又はアルミニウム合金を表面に有する被処理物を、前記金属置換処理液に接触させ、前記アルミニウム又はアルミニウム合金上の酸化皮膜を除去し、前記アルミニウムを前記金属置換処理液に含有される金属に置換させる金属置換処理を行うことにより、亜鉛(Zn)と共に、ニッケル(Ni)、ゲルマニウム(Ge)が共析し、Zn、Ni、Geを含有する置換金属皮膜をアルミニウム又はアルミニウム合金表面に形成できる。
このようなZn、Ni、Geを含有する置換金属皮膜を表面に有するアルミニウム又はアルミニウム合金にめっき処理を行い、めっき皮膜(金属皮膜、例えば、ニッケル皮膜)を形成すると、アルミニウム又はアルミニウム合金と、めっき皮膜(金属皮膜、例えば、ニッケル皮膜)間で、置換金属皮膜中に存在するZn、Ni、Geが相乗的に作用することとなり、アルミニウム又はアルミニウム合金に、めっき皮膜(金属皮膜)との良好な密着性を付与できる。
Zn、Ni、Geが相乗的に作用していることは、Zn、Ni、Ge単独の場合、Zn、Niの組み合わせ(Geなし)の場合、Zn、Geの組み合わせ(Niなし)の場合、Ni、Geの組み合わせ(Znなし)の場合では、めっき皮膜(金属皮膜)との良好な密着性を付与できないことから明らかである。
The reason why the metal substitution treatment solution provides the above-mentioned effects is presumed to be as follows.
A metal substitution treatment is performed by bringing a workpiece having aluminum or an aluminum alloy on its surface into contact with the metal substitution treatment liquid, removing an oxide film on the aluminum or aluminum alloy, and substituting the aluminum with a metal contained in the metal substitution treatment liquid. As a result, nickel (Ni) and germanium (Ge) are co-deposited with zinc (Zn), and a substituted metal film containing Zn, Ni, and Ge can be formed on the aluminum or aluminum alloy surface.
When aluminum or an aluminum alloy having such a substituted metal film containing Zn, Ni, or Ge on its surface is plated to form a plated film (metal film, for example, a nickel film), the Zn, Ni, and Ge present in the substituted metal film act synergistically between the aluminum or aluminum alloy and the plated film (metal film, for example, a nickel film), and good adhesion between the aluminum or aluminum alloy and the plated film (metal film) can be imparted to the aluminum or aluminum alloy.
The synergistic effect of Zn, Ni, and Ge is evident from the fact that good adhesion to the plating film (metal film) cannot be imparted when Zn, Ni, or Ge is used alone, when a combination of Zn and Ni (without Ge), when a combination of Zn and Ge (without Ni), or when a combination of Ni and Ge (without Zn) is used.
<金属置換処理液>
本発明の金属置換処理液は、亜鉛化合物、ニッケル化合物、ゲルマニウム化合物、フッ素化合物を含む。
<Metal replacement treatment liquid>
The metal substitution treatment liquid of the present invention contains a zinc compound, a nickel compound, a germanium compound, and a fluorine compound.
<<亜鉛化合物>>
亜鉛化合物は、水溶性の亜鉛化合物であれば特に限定されない。その具体例としては、例えば、硫酸亜鉛、硝酸亜鉛、塩化亜鉛、酢酸亜鉛、酸化亜鉛、グルコン酸亜鉛等を例示できる。これらは単独で用いてもよく、2種以上を併用してもよい。なかでも、硫酸亜鉛が好ましい。
<<Zinc compounds>>
The zinc compound is not particularly limited as long as it is a water-soluble zinc compound. Specific examples include zinc sulfate, zinc nitrate, zinc chloride, zinc acetate, zinc oxide, and zinc gluconate. These may be used alone or in combination of two or more. Of these, zinc sulfate is preferred.
金属置換処理液は、亜鉛化合物を亜鉛(金属亜鉛(Zn))濃度として0.1~7.0g/L含むことが好ましく、0.2~5.0g/L含むことがより好ましく、0.2~4.0g/L含むことが更に好ましい。0.1g/L未満では、Zn析出量が少なく充分な密着性が確保できない傾向がある。7.0g/L超では、Znの析出量が過剰となり充分な密着性が確保できない傾向がある。 The metal replacement treatment solution preferably contains a zinc compound with a zinc (metallic zinc (Zn)) concentration of 0.1 to 7.0 g/L, more preferably 0.2 to 5.0 g/L, and even more preferably 0.2 to 4.0 g/L. If the concentration is less than 0.1 g/L, the amount of Zn precipitated will be small and sufficient adhesion will not be ensured. If the concentration is more than 7.0 g/L, the amount of Zn precipitated will be excessive and sufficient adhesion will not be ensured.
<<ニッケル化合物>>
ニッケル化合物は、水溶性のニッケル化合物であれば特に限定されない。その具体例としては、例えば、硫酸ニッケル、硝酸ニッケル、塩化ニッケル、酢酸ニッケル、グルコン酸ニッケル等を例示できる。これらは単独で用いてもよく、2種以上を併用してもよい。なかでも、硫酸ニッケルが好ましい。
<<Nickel compounds>>
The nickel compound is not particularly limited as long as it is a water-soluble nickel compound. Specific examples include nickel sulfate, nickel nitrate, nickel chloride, nickel acetate, and nickel gluconate. These may be used alone or in combination of two or more. Of these, nickel sulfate is preferred.
金属置換処理液は、ニッケル化合物をニッケル(金属ニッケル(Ni))濃度として0.1~12g/L含むことが好ましく、0.2~10g/L含むことがより好ましい。0.1g/L未満では、Znとの共析量が低下し充分な密着性が確保できない傾向がある。12g/L超では、Znとの共析量が過剰となり充分な密着性が確保できない傾向がある。 The metal replacement treatment solution preferably contains a nickel compound at a nickel (metallic nickel (Ni)) concentration of 0.1 to 12 g/L, and more preferably 0.2 to 10 g/L. If the concentration is less than 0.1 g/L, the amount of co-deposited Zn decreases, and sufficient adhesion tends to be insufficient. If the concentration is more than 12 g/L, the amount of co-deposited Zn becomes excessive, and sufficient adhesion tends to be insufficient.
<<ゲルマニウム化合物>>
ゲルマニウム化合物は、水溶性のゲルマニウム化合物であれば特に限定されない。その具体例としては、例えば、二酸化ゲルマニウム、硫酸ゲルマニウム、硫化ゲルマニウム、フッ化ゲルマニウム、塩化ゲルマニウム、ヨウ化ゲルマニウム等を例示できる。これらは単独で用いてもよく、2種以上を併用してもよい。なかでも、二酸化ゲルマニウムが好ましい。
なお、本明細書において、フッ化ゲルマニウムなど、ゲルマニウム化合物にもフッ素化合物にも該当する場合、ゲルマニウム化合物として扱う。亜鉛化合物、ニッケル化合物についても同様の場合、同様に、亜鉛化合物、ニッケル化合物として扱う。
<<Germanium Compounds>>
The germanium compound is not particularly limited as long as it is a water-soluble germanium compound. Specific examples thereof include germanium dioxide, germanium sulfate, germanium sulfide, germanium fluoride, germanium chloride, and germanium iodide. These compounds may be used alone or in combination of two or more. Among these, germanium dioxide is preferred.
In this specification, when a compound corresponds to both a germanium compound and a fluorine compound, such as germanium fluoride, it is treated as a germanium compound. Similarly, when a zinc compound or a nickel compound corresponds to both a zinc compound and a nickel compound, it is treated as a zinc compound or a nickel compound.
金属置換処理液は、ゲルマニウム化合物をゲルマニウム(金属ゲルマニウム(Ge))濃度として0.1~7.0g/L含むことが好ましく、0.2~5.0g/L含むことがより好ましい。0.1g/L未満では、Znとの共析量が低下し充分な密着性が確保できない傾向がある。7.0g/L超では、Znとの共析量が過剰となり充分な密着性が確保できない傾向がある。 The metal replacement treatment solution preferably contains a germanium compound at a germanium (metallic germanium (Ge)) concentration of 0.1 to 7.0 g/L, and more preferably 0.2 to 5.0 g/L. If the concentration is less than 0.1 g/L, the amount of co-deposited Zn decreases, and sufficient adhesion tends to be insufficient. If the concentration is more than 7.0 g/L, the amount of co-deposited Zn becomes excessive, and sufficient adhesion tends to be insufficient.
亜鉛濃度、ゲルマニウム濃度の比率(亜鉛濃度:ゲルマニウム濃度)は、1:5~5:1であることが好ましい。 The ratio of zinc concentration to germanium concentration (zinc concentration:germanium concentration) is preferably 1:5 to 5:1.
<<フッ素化合物>>
フッ素化合物は、アルミニウム又はアルミニウム合金表面の酸化被膜中のアルミニウムを溶解して、亜鉛などの金属との置換をスムーズに進行させる。
フッ素化合物の具体例としては、例えば、ホウフッ化水素酸、フッ化ナトリウム、フッ化カリウム、フッ化水素アンモニウム、フッ化アンモニウム、フッ化水素、フッ化リチウム等を例示できる。これらは単独で用いてもよく、2種以上を併用してもよい。なかでも、ホウフッ化水素酸、フッ化ナトリウム、フッ化カリウム、フッ化水素アンモニウム、フッ化アンモニウム、フッ化水素が好ましく、ホウフッ化水素酸、フッ化ナトリウム、フッ化カリウム、フッ化水素アンモニウム、フッ化アンモニウムがより好ましい。
<<Fluorine compounds>>
Fluorine compounds dissolve aluminum in the oxide film on the surface of aluminum or aluminum alloys, and facilitate the replacement with metals such as zinc.
Specific examples of fluorine compounds include fluoroboric acid, sodium fluoride, potassium fluoride, ammonium hydrogen fluoride, ammonium fluoride, hydrogen fluoride, and lithium fluoride. These may be used alone or in combination of two or more. Among these, fluoroboric acid, sodium fluoride, potassium fluoride, ammonium hydrogen fluoride, ammonium fluoride, and hydrogen fluoride are preferred, and fluoroboric acid, sodium fluoride, potassium fluoride, ammonium hydrogen fluoride, and ammonium fluoride are more preferred.
金属置換処理液は、フッ素化合物をフッ素(F)濃度として1.0~100g/L含むことが好ましく、5.0~50g/L含むことがより好ましい。1.0g/L未満では、アルミニウムを溶解させる作用が弱くなり充分な密着性が確保できない傾向がある。100g/L超では、 アルミニウムが過剰に溶解して充分な密着性が確保できない傾向がある。
なお、本明細書において、金属置換処理液中の、亜鉛(金属亜鉛(Zn))濃度、ニッケル(金属ニッケル(Ni))濃度、ゲルマニウム(金属ゲルマニウム(Ge))濃度は、ICP(堀場製作所社製)により測定される。
また、本明細書において、金属置換処理液中のフッ素(F)濃度は、フッ素イオン電極を用いて測定される。
The metal replacement treatment solution preferably contains a fluorine compound at a fluorine (F) concentration of 1.0 to 100 g/L, more preferably 5.0 to 50 g/L. If the concentration is less than 1.0 g/L, the aluminum dissolving effect is weak, and sufficient adhesion tends to be insufficient. If the concentration is more than 100 g/L, aluminum dissolves excessively, and sufficient adhesion tends to be insufficient.
In this specification, the zinc (metallic zinc (Zn)) concentration, nickel (metallic nickel (Ni)) concentration, and germanium (metallic germanium (Ge)) concentration in the metal substitution treatment solution are measured by ICP (manufactured by Horiba, Ltd.).
In this specification, the fluorine (F) concentration in the metal substitution treatment solution is measured using a fluorine ion electrode.
<<pH>>
金属置換処理液のpHは、好ましくは1.0~12.0、より好ましくは2.0~10.0である。すなわち、本発明の金属置換処理液は、アルカリ性、酸性のいずれにおいても使用可能である。ここで、通常のジンケート処理では、アルカリ性の場合、アルミニウムが過剰に溶出することがあり(例えば、非特許文献3の図9)、アルミニウムスパイクが生じる傾向があり、酸性の場合は、アルミニウムが過剰に溶出することがないものの、充分な密着性が確保できない傾向がある。
一方、本発明の金属置換処理液は、酸性の場合であっても、充分な密着性が確保できるもので、酸性で用いることにより、より顕著な密着性の改善効果が得られる。更には、酸性の場合、アルミニウムが過剰に溶出することがなく、アルミニウムスパイクも低減できる。ただし、pHが3.5未満になると、アルミニウムが過剰に溶出するおそれもある。
そのため、金属置換処理液のpHは、更に好ましくは3.5~6.5、特に好ましくは4.0~6.5、最も好ましくは4.5~6.5である。これにより、前記の通り、より顕著な密着性の改善効果が得られると共に、アルミニウムが過剰に溶出することがなく、アルミニウムスパイクも低減できる。ここで、アルミニウムが過剰に溶出され、アルミニウムスパイクが生じると、アルミニウム表面に多数のくさび状の凹みが生じてしまい、その後のめっき皮膜形成工程において、例えばニッケルめっきがその凹みに入り込み、平滑性の乏しいめっき皮膜が形成されてしまい、導通性にも影響をもたらし、外観も大きく損なわれる。よって、アルミニウムスパイクの低減により、平滑性が高く、めっき外観の優れためっき皮膜を形成できる。
なお、本明細書において、金属置換処理液のpHは、25℃において測定される値である。
<<pH>>
The pH of the metal substitution treatment solution is preferably 1.0 to 12.0, more preferably 2.0 to 10.0. That is, the metal substitution treatment solution of the present invention can be used in either alkaline or acidic conditions. Here, in a typical zincate treatment, when the solution is alkaline, aluminum may be excessively eluted (for example, Figure 9 of Non-Patent Document 3), which tends to cause aluminum spikes. When the solution is acidic, although aluminum does not excessively elute, sufficient adhesion tends to be difficult to ensure.
On the other hand, the metal replacement treatment solution of the present invention can ensure sufficient adhesion even when it is acidic, and when used in an acidic state, a more significant improvement in adhesion can be achieved. Furthermore, when it is acidic, aluminum is not excessively eluted and aluminum spikes can be reduced. However, if the pH is less than 3.5, there is a risk of excessive aluminum elution.
Therefore, the pH of the metal replacement treatment solution is more preferably 3.5 to 6.5, particularly preferably 4.0 to 6.5, and most preferably 4.5 to 6.5. As described above, this not only achieves a more significant improvement in adhesion, but also prevents excessive aluminum elution and reduces aluminum spikes. If excessive aluminum elution results in aluminum spikes, numerous wedge-shaped depressions form on the aluminum surface. In the subsequent plating film formation process, nickel plating, for example, penetrates into these depressions, resulting in the formation of a plating film with poor smoothness, which affects conductivity and significantly impairs the appearance. Therefore, reducing aluminum spikes allows the formation of a plating film with high smoothness and excellent plating appearance.
In this specification, the pH of the metal replacement treatment solution is a value measured at 25°C.
金属置換処理液のpHの調整は、亜鉛化合物、ニッケル化合物、ゲルマニウム化合物、フッ素化合物の種類の選択により行なうこともできる。また必要に応じて、アルカリ成分、酸成分を添加してもよい。
アルカリ成分は、特に限定されるものではないが、例えば、水酸化ナトリウム、アンモニウム等が挙げられる。酸成分は、特に限定されるものではないが、例えば、硫酸、リン酸等が挙げられる。これらアルカリ成分、酸成分は単独で用いてもよく、2種以上を併用してもよい。
The pH of the metal substitution treatment solution can be adjusted by selecting the type of zinc compound, nickel compound, germanium compound, or fluorine compound.Alkaline components and acidic components may also be added as needed.
The alkaline component is not particularly limited, but examples thereof include sodium hydroxide, ammonium, etc. The acid component is not particularly limited, but examples thereof include sulfuric acid, phosphoric acid, etc. These alkaline components and acid components may be used alone or in combination of two or more.
金属置換処理液は、pH緩衝性を高めるために、緩衝剤を含有してもよい。
緩衝剤としては、緩衝性があれば特に限定されず、例えば、pH4.0~6.5付近に緩衝性がある化合物としては、例えば、酢酸、リンゴ酸、コハク酸、クエン酸、マロン酸、乳酸、シュウ酸、グルタル酸、アジピン酸、ギ酸等が挙げられる。これらは単独で用いてもよく、2種以上を併用してもよい。
金属置換処理液中の緩衝剤濃度は、好ましくは1.0~50g/L、より好ましくは5.0~30g/Lである。
The metal substitution treatment solution may contain a buffering agent to enhance pH buffering properties.
The buffering agent is not particularly limited as long as it has buffering properties, and examples of compounds that have buffering properties around pH 4.0 to 6.5 include acetic acid, malic acid, succinic acid, citric acid, malonic acid, lactic acid, oxalic acid, glutaric acid, adipic acid, formic acid, etc. These may be used alone or in combination of two or more.
The concentration of the buffer in the metal replacement treatment solution is preferably 1.0 to 50 g/L, more preferably 5.0 to 30 g/L.
<<その他>>
金属置換処理液は、前記成分と共に、金属置換処理液に汎用されている成分、例えば、界面活性剤、光沢剤等を含有してもよい。また、上記以外の金属、例えば、鉄、銅、銀、パラジウム、鉛、ビスマス、タリウム等の金属の水溶性塩類を含有してもよい。これらは単独で用いてもよく、2種以上を併用してもよい。
<<Others>>
The metal replacement treatment liquid may contain, in addition to the above components, components commonly used in metal replacement treatment liquids, such as surfactants and brighteners. It may also contain water-soluble salts of metals other than those mentioned above, such as iron, copper, silver, palladium, lead, bismuth, and thallium. These may be used alone or in combination of two or more.
金属置換処理液は、溶媒(好ましくは水)を用いて、各成分を適宜混合することにより製造することができる。金属置換処理液は、操作の安全性の観点から水溶液として調製されることが好ましいが、その他の溶媒、例えばメタノール、エタノール、エチレングリコール、ジエチレングリコール、トリエチレングリコール、グリセリン、IPA等を用いたり、水との混合溶媒とすることも可能である。なお、これらの溶媒は単独で用いてもよく、2種以上を併用してもよい。 The metal replacement treatment solution can be produced by appropriately mixing each component using a solvent (preferably water). From the perspective of operational safety, the metal replacement treatment solution is preferably prepared as an aqueous solution, but other solvents such as methanol, ethanol, ethylene glycol, diethylene glycol, triethylene glycol, glycerin, IPA, etc. can also be used, or a mixed solvent with water can be used. These solvents may be used alone, or two or more types may be used in combination.
金属置換処理液は、アルミニウム又はアルミニウム合金用の金属置換処理液として好適に使用可能である。 The metal replacement treatment liquid can be suitably used as a metal replacement treatment liquid for aluminum or aluminum alloys.
<アルミニウム又はアルミニウム合金の表面処理方法>
次に、本発明の金属置換処理液を用いた、本発明のアルミニウム又はアルミニウム合金の表面処理方法について説明する。
本発明のアルミニウム又はアルミニウム合金の表面処理方法は、アルミニウム又はアルミニウム合金を表面に有する被処理物を、本発明の金属置換処理液に接触させ、前記アルミニウム又はアルミニウム合金上の酸化皮膜を除去し、前記アルミニウムを前記金属置換処理液に含有される金属に置換させる金属置換処理を行い、前記被処理物の表面に前記金属を含む置換金属皮膜を形成する。
この表面処理方法は、被処理物に対してめっき皮膜、例えばニッケルめっき皮膜やパラジウムめっき皮膜を施すための前処理方法であり、アルミニウム又はアルミニウム合金を少なくとも表面に有する被処理物に、本発明の金属置換処理液を接触させて、表面に付着した酸化皮膜を除去し、置換金属皮膜を形成することによって、後に処理するニッケルめっき皮膜等の密着性を高めるようにしている。
<Surface treatment method for aluminum or aluminum alloy>
Next, the method for surface treatment of aluminum or aluminum alloys of the present invention using the metal substitution treatment liquid of the present invention will be described.
The method for surface treatment of aluminum or an aluminum alloy of the present invention involves bringing a workpiece having aluminum or an aluminum alloy on its surface into contact with the metal substitution treatment liquid of the present invention, removing an oxide film on the aluminum or aluminum alloy, and performing a metal substitution treatment to replace the aluminum with a metal contained in the metal substitution treatment liquid, thereby forming a substituted metal film containing the metal on the surface of the workpiece.
This surface treatment method is a pretreatment method for applying a plating film, such as a nickel plating film or a palladium plating film, to a workpiece, and involves bringing the metal substitution treatment solution of the present invention into contact with the workpiece, which has aluminum or an aluminum alloy at least on its surface, to remove the oxide film adhering to the surface and form a substitution metal film, thereby increasing the adhesion of the nickel plating film or the like to be applied later.
本発明のアルミニウム又はアルミニウム合金の表面処理方法では、本発明の金属置換処理液によって、少なくとも表面にアルミニウム又はアルミニウム合金を有する被処理物(以下、アルミニウム基板とも記載する。)上に付着した酸化皮膜が除去され、亜鉛等の金属とアルミニウムとの電極電位差による置換反応により亜鉛粒子、ニッケル粒子、ゲルマニウム粒子が被処理物の表面に析出する。 In the aluminum or aluminum alloy surface treatment method of the present invention, the metal substitution treatment solution of the present invention is used to remove an oxide film adhering to a workpiece having at least aluminum or an aluminum alloy on its surface (hereinafter also referred to as an aluminum substrate), and zinc particles, nickel particles, and germanium particles are precipitated on the surface of the workpiece through a substitution reaction caused by the electrode potential difference between a metal such as zinc and aluminum.
一般的に、ジンケート処理液を用いた、アルミニウム基板へのめっき前処理では、2回の亜鉛置換処理を施すダブルジンケート処理プロセスで行われる。すなわち、(1)アルミニウム基板に第1亜鉛置換処理を施し、(2)酸洗後、(3)次いで第2亜鉛置換処理を施すというプロセスであり、このダブルジンケート処理後に、(4)無電解ニッケルめっき等のめっき処理を行う。
一方、本発明の金属置換処理液を用いた、本発明のアルミニウム又はアルミニウム合金の表面処理方法では、非常に良好な密着性が得られるため、ダブルジンケート処理を行う必要が無く、シングルジンケート処理により良好な密着性を付与できる。よって、本発明のアルミニウム又はアルミニウム合金の表面処理方法では、(1)アルミニウム基板に金属置換処理を施し、このシングルジンケート処理後に、(4)無電解ニッケルめっき等のめっき処理を行うことが好ましい。すなわち、金属置換処理と、めっき処理の間に、(2)酸洗処理、(3)酸洗処理後の第2金属置換処理を行わないことが好ましい。
Generally, in the plating pretreatment of an aluminum substrate using a zincate treatment solution, a double zincate treatment process is performed in which two zincation treatments are performed: (1) the aluminum substrate is subjected to a first zincation treatment, (2) pickling, and then (3) a second zincation treatment is performed. After this double zincate treatment, (4) a plating treatment such as electroless nickel plating is performed.
On the other hand, in the surface treatment method for aluminum or aluminum alloys of the present invention using the metal substitution treatment solution of the present invention, very good adhesion can be obtained, so that double zincate treatment is not necessary, and good adhesion can be imparted by single zincate treatment. Therefore, in the surface treatment method for aluminum or aluminum alloys of the present invention, it is preferable to (1) subject the aluminum substrate to metal substitution treatment, and after this single zincate treatment, to (4) a plating treatment such as electroless nickel plating. In other words, it is preferable not to perform (2) pickling treatment between the metal substitution treatment and the plating treatment, or (3) a second metal substitution treatment after the pickling treatment.
<<(1)金属置換処理>>
めっき被処理物であるアルミニウム基板は、少なくともその表面にアルミニウム又はアルミニウム合金を有していればよい。アルミニウム基板は、例えば、アルミニウム又はアルミニウム合金を材質とする各種の物品のほか、非アルミニウム材(例えば、セラミックス、ウェハ等の各種の基材)上にアルミニウム又はアルミニウム合金皮膜が形成されてなる物品、溶融アルミニウムめっき処理を施した物品、鋳物、ダイキャスト等を使用することができる。アルミニウム基板の形状も特に限定されるものではなく、通常の板状物(フィルム、シート等の薄膜状物を含む)や各種の形状に成形された成型品のいずれでもよい。また、上記板状物には、アルミニウム又はアルミニウム合金単独の板状物に限らず、例えばセラミックスやウェハ等の基板上にスパッタリング法、真空蒸着法、イオンプレーティング法等の常法に従って成形されたアルミニウム皮膜(基板と一体化されたもの)も包含される。
<<(1) Metal Replacement Treatment>>
The aluminum substrate, which is the object to be plated, need only have aluminum or an aluminum alloy on at least its surface. Examples of aluminum substrates include various articles made of aluminum or aluminum alloys, as well as articles in which an aluminum or aluminum alloy coating is formed on a non-aluminum material (e.g., various substrates such as ceramics and wafers), articles subjected to hot-dip aluminum plating, castings, die-cast products, etc. The shape of the aluminum substrate is not particularly limited, and may be any of ordinary plate-like articles (including thin-film articles such as films and sheets) and molded articles formed into various shapes. Furthermore, the plate-like articles are not limited to plate-like articles made of aluminum or aluminum alloys alone, but also include aluminum coatings (integrated with the substrate) formed on substrates such as ceramics or wafers by conventional methods such as sputtering, vacuum deposition, and ion plating.
アルミニウム合金としては特に限定されず、例えば、アルミニウムを主要金属成分とする各種合金を用いることができる。例えば、A1000系の準アルミニウム、A2000系の銅及びマンガンを含むアルミニウム合金、A3000系のアルミニウム-マンガン合金、A4000系のアルミニウム-シリコン合金、A5000系のアルミニウム-マグネシウム合金、A6000系のアルミニウム-マグネシウム-シリコン合金、A7000系のアルミニウム-亜鉛-マグネシウム合金、A8000系のアルミニウム-リチウム系合金等を適用対象とすることができる。 The aluminum alloy is not particularly limited, and various alloys containing aluminum as the main metallic component can be used. Examples of applicable alloys include A1000 series quasi-aluminum alloys, A2000 series aluminum alloys containing copper and manganese, A3000 series aluminum-manganese alloys, A4000 series aluminum-silicon alloys, A5000 series aluminum-magnesium alloys, A6000 series aluminum-magnesium-silicon alloys, A7000 series aluminum-zinc-magnesium alloys, and A8000 series aluminum-lithium alloys.
アルミニウム又はアルミニウム合金のアルミニウム純度は、めっき平滑性の観点から、好ましくは98%以上、より好ましくは98.5%以上、さらに好ましくは99%以上である。 From the viewpoint of plating smoothness, the aluminum purity of the aluminum or aluminum alloy is preferably 98% or more, more preferably 98.5% or more, and even more preferably 99% or more.
めっき被処理物であるアルミニウム基板は、周知の方法、例えばスパッタリング法等によって、非アルミニウム材、例えばシリコン板に、アルミニウム層を被覆して作成することができる。アルミニウム層の被覆は、非アルミニウム材の全部に対する被覆であっても、その一部のみの被覆でもよく、通常0.5μm以上、好ましくは1μm以上の厚みを有するアルミニウム層が被覆される。また、このアルミニウム基板の形成方法も、スパッタリング法に限られるものではなく、真空蒸着法、イオンプレーティング法等を用いて作成することができる。 The aluminum substrate, which is the workpiece to be plated, can be produced by coating a non-aluminum material, such as a silicon plate, with an aluminum layer using well-known methods, such as sputtering. The aluminum layer may cover the entire non-aluminum material, or only a portion of it, and is typically 0.5 μm or thicker, preferably 1 μm or thicker. Furthermore, the method for forming this aluminum substrate is not limited to sputtering; vacuum deposition, ion plating, and other methods can also be used.
まず、このアルミニウム基板を、周知の方法で、脱脂処理等のクリーナー処理を施し、適宜水洗後、アルカリ又は酸によって周知のエッチング処理を施す。具体的に、脱脂処理は、アルミニウム用の脱脂液に浸漬させたり、電解脱脂を行うことによって行う。また、エッチング処理は、例えば約1~10%のアルカリ溶液、又は約1~20%の酸性溶液を用い、約25~75℃の液温で、約1~15分間溶液に浸漬させることによって行う。 First, the aluminum substrate is subjected to a cleaning process such as degreasing using a well-known method, and after being appropriately rinsed with water, it is subjected to a well-known etching process using alkali or acid. Specifically, the degreasing process is carried out by immersing the substrate in a degreasing solution for aluminum or by electrolytic degreasing. The etching process is carried out by immersing the substrate in a solution of, for example, about 1 to 10% alkali or about 1 to 20% acid at a temperature of about 25 to 75°C for about 1 to 15 minutes.
次に、アルカリ又は酸によるエッチング残渣(スマット)を除去することを目的として、酸性溶液に所定時間、浸漬させる。具体的には、例えば、約10~800ml/L、好ましくは約100~600ml/Lの濃度範囲を有し、液温が約15~35℃の硝酸水溶液に、エッチングを施したアルミニウム基板を、約30秒~2分間浸漬させて、スマットを除去する。 Next, to remove any smut residues (residues) from alkaline or acid etching, the substrate is immersed in an acidic solution for a predetermined period of time. Specifically, the etched aluminum substrate is immersed for approximately 30 seconds to 2 minutes in an aqueous solution of nitric acid with a concentration ranging from approximately 10 to 800 ml/L, preferably from approximately 100 to 600 ml/L, at a temperature of approximately 15 to 35°C, to remove smut.
そして、このようにデスマット処理等が施されたアルミニウム基板を、水洗後、本発明の金属置換処理液(ジンケート処理液)に浸漬し、金属置換処理を施す。具体的には、例えば、上述した組成を有する、液温が10~50℃、好ましくは15~30℃のジンケート処理液に、アルミニウム基板を浸漬させる。ジンケート処理液の温度が10℃以上であれば、置換反応が遅くなりすぎず、ムラが生じることがなく金属皮膜を形成でき、また50℃以下であれば、置換反応が増大しすぎず、置換金属皮膜表面が粗くなってしまうことも防止することができることから、上述した温度が好ましい。 Then, after rinsing with water, the aluminum substrate that has been subjected to the desmutting treatment and other processes is immersed in the metal substitution treatment liquid (zincate treatment liquid) of the present invention to perform the metal substitution treatment. Specifically, for example, the aluminum substrate is immersed in a zincate treatment liquid having the composition described above and a liquid temperature of 10 to 50°C, preferably 15 to 30°C. If the temperature of the zincate treatment liquid is 10°C or higher, the substitution reaction does not slow down too much, allowing a metal coating to be formed without unevenness. On the other hand, if the temperature is 50°C or lower, the substitution reaction does not accelerate too much, preventing the surface of the substituted metal coating from becoming rough. Therefore, the above-mentioned temperatures are preferred.
浸漬時間に関する条件も、特に制限されるものではなく、除去すべきアルミニウム酸化皮膜の厚さ等を鑑みて適宜設定することができ、例えば、通常約5秒以上、好ましくは10秒以上、上限として5分以下である。浸漬時間が短すぎると、置換が進まず酸化皮膜の除去が不十分となり、一方で浸漬時間が長すぎると、置換金属層の小さな穴から処理液が侵入し、アルミニウム又はアルミニウム合金が溶出してしまうおそれがあることから、これらの点を考慮して、条件設定する必要がある。 There are no particular restrictions on the immersion time, which can be set appropriately taking into account factors such as the thickness of the aluminum oxide film to be removed. For example, it is usually at least about 5 seconds, preferably at least 10 seconds, with an upper limit of 5 minutes. If the immersion time is too short, the substitution will not progress and the oxide film will not be sufficiently removed. On the other hand, if the immersion time is too long, the treatment liquid may seep through small holes in the substituted metal layer, causing the aluminum or aluminum alloy to dissolve. Therefore, the conditions must be set taking these points into consideration.
このようにジンケート処理液にアルミニウム基板を浸漬させることによって、その基板表面に付着した酸化皮膜を除去させることができるとともに、Zn、Ni、Geを含有する置換金属皮膜をさらに被覆してアルミニウム表面を活性化することより、被処理物に対して、良好な密着性を有するめっき皮膜を形成させることが可能となる。 By immersing an aluminum substrate in this zincate treatment solution, the oxide film adhering to the substrate surface can be removed, and by further coating the aluminum surface with a substitution metal film containing Zn, Ni, and Ge, it is possible to form a plating film with good adhesion to the substrate.
金属置換処理では、アルミニウム基板の表面に、本発明の金属置換処理液が接触可能な態様である限り特に制限されない。該接触方法としては、浸漬以外にも、例えば、塗布、スプレー等の方法を採用することができる。 The metal replacement treatment is not particularly limited as long as it is possible for the metal replacement treatment solution of the present invention to come into contact with the surface of the aluminum substrate. In addition to immersion, other contact methods such as coating and spraying can also be used.
<<(4)めっき処理>>
このめっき処理は、ジンケート処理が施されたアルミニウム基板に対して、無電解めっき又は電解めっきによって行われる。例えば、無電解ニッケル、無電解パラジウム又は銅めっき浴のような適当な金属めっき液で所望の最終膜厚にめっきさせる。
<<(4) Plating Treatment>>
The plating is carried out on the zincated aluminum substrate by electroless or electrolytic plating with a suitable metal plating solution, such as an electroless nickel, electroless palladium, or copper plating bath, to the desired final film thickness.
具体的に、一例として、無電解ニッケルめっきについて説明する。無電解ニッケルめっき液は、例えば、硫酸ニッケル、塩化ニッケル、酢酸ニッケル等の水溶性のニッケル塩の使用によってニッケルイオンが与えられ、このニッケルイオンの濃度としては、例えば約1~10g/Lである。また、無電解ニッケルめっき液には、例えば約20~80g/Lの濃度範囲を有する酢酸塩、コハク酸塩、クエン酸塩等の有機酸塩や、アンモニウム塩、アミン塩等のニッケルの錯化剤が含有され、さらに約10~40g/Lの濃度範囲を有する次亜リン酸又は次亜リン酸ナトリウム等の次亜リン酸塩が還元剤として含有される。次亜リン酸塩等を還元剤として含有させることにより、めっき液の安定性が高められ、コストの安価なニッケル-リンの合金皮膜を形成させることができる。そして、これらの化合物からなるめっき液は、pHが約4~7となるように調製して用いられ、さらにこのめっき液を60~95℃の液温に調製し、めっき処理液へのアルミニウム基板の浸漬時間としては、約15秒~120分間浸漬させることによってめっき処理が行われる。また、適宜、このめっき処理時間を変えることによって、めっき皮膜の厚みを変えることができる。 Specifically, electroless nickel plating will be described as an example. Electroless nickel plating solutions provide nickel ions using water-soluble nickel salts, such as nickel sulfate, nickel chloride, and nickel acetate. The nickel ion concentration is, for example, approximately 1 to 10 g/L. Furthermore, electroless nickel plating solutions contain organic acid salts, such as acetates, succinates, and citrates, or nickel complexing agents, such as ammonium salts and amine salts, at concentrations ranging from approximately 20 to 80 g/L. They also contain hypophosphites, such as hypophosphorous acid or sodium hypophosphite, as reducing agents at concentrations ranging from approximately 10 to 40 g/L. The inclusion of hypophosphites or other reducing agents enhances the stability of the plating solution, enabling the formation of inexpensive nickel-phosphorus alloy coatings. The plating solution containing these compounds is prepared to have a pH of approximately 4 to 7, and the temperature of this plating solution is adjusted to 60 to 95°C. The aluminum substrate is immersed in the plating solution for approximately 15 seconds to 120 minutes to perform the plating process. The thickness of the plating film can also be altered by changing the plating time as needed.
なお、上述したように、めっき処理としては、無電解めっき処理に限られず、電解めっきによって行ってもよい。また、めっき金属の種類は、以上に例示したものの他、Cu、Au等のめっき金属を用いて行ってもよく、さらに置換めっき法等によって、2層以上の層を形成するようにめっき処理を行ってもよい。 As mentioned above, the plating process is not limited to electroless plating, and electrolytic plating may also be used. Furthermore, in addition to the types of plating metals exemplified above, plating metals such as Cu and Au may also be used. Furthermore, plating may be performed to form two or more layers using a displacement plating method, etc.
以上に説明したジンケート処理及びめっき処理における処理条件や、各種の濃度設定に関しては、以上のような条件に限られるものではなく、形成する皮膜の厚み等によって適宜変更できることは言うまでもない。 The processing conditions and various concentration settings for the zincate treatment and plating treatment described above are not limited to those described above, and can, of course, be changed as appropriate depending on the thickness of the coating to be formed, etc.
本発明のアルミニウム又はアルミニウム合金の表面処理方法では、アルミニウム又はアルミニウム合金を表面に有する被処理物を、本発明の金属置換処理液に接触させ、前記アルミニウム又はアルミニウム合金上の酸化皮膜を除去し、前記アルミニウムを前記金属置換処理液に含有される金属に置換させる金属置換処理を行うことにより、Znと共に、Ni、Geが共析し、Zn、Ni、Geを含有する置換金属皮膜をアルミニウム又はアルミニウム合金表面に形成できる。
このようなZn、Ni、Geを含有する置換金属皮膜を表面に有するアルミニウム又はアルミニウム合金にめっき処理を行い、めっき皮膜(金属皮膜、例えば、ニッケル皮膜)を形成すると、アルミニウム又はアルミニウム合金と、めっき皮膜(金属皮膜、例えば、ニッケル皮膜)間で、置換金属皮膜中に存在するZn、Ni、Geが相乗的に作用することとなり、アルミニウム又はアルミニウム合金に、めっき皮膜(金属皮膜)との良好な密着性を付与できる。
In the surface treatment method for aluminum or an aluminum alloy of the present invention, a workpiece having aluminum or an aluminum alloy on its surface is brought into contact with the metal substitution treatment liquid of the present invention to perform a metal substitution treatment in which an oxide film on the aluminum or aluminum alloy is removed and the aluminum is substituted with a metal contained in the metal substitution treatment liquid. As a result, Ni and Ge are co-deposited with Zn, and a substituted metal film containing Zn, Ni, and Ge can be formed on the aluminum or aluminum alloy surface.
When aluminum or an aluminum alloy having such a substituted metal film containing Zn, Ni, or Ge on its surface is plated to form a plated film (metal film, for example, a nickel film), the Zn, Ni, and Ge present in the substituted metal film act synergistically between the aluminum or aluminum alloy and the plated film (metal film, for example, a nickel film), and good adhesion between the aluminum or aluminum alloy and the plated film (metal film) can be imparted to the aluminum or aluminum alloy.
本発明により得られためっき皮膜(金属皮膜)が施されたアルミニウム又はアルミニウム合金は、様々な電子部品に用いることが可能である。電子部品としては、例えば、家電機器、車載機器、送電システム、輸送機器、通信機器等に用いられる電子部品が挙げられ、具体的には、エアコン、エレベーター、電気自動車、ハイブリッド自動車、電車、発電装置用のパワーコントロールユニット等のパワーモジュール、一般家電、パソコン等が挙げられる。
本発明では、金属置換処理液のpHを4.0~6.5とすることにより、アルミニウムスパイクも低減でき、平滑性が高く、めっき外観の優れためっき皮膜を形成するための、めっき前表面処理を施すことができるため、半導体用途、好ましくはウェハ用途に好適に使用でき、特に、ウェハにアンダーバンプメタル又はバンプを形成する場合の前処理に有効なアルミニウム又はアルミニウム合金上の金属置換処理液及びこの金属置換処理液を用いたアルミニウム又はアルミニウム合金の表面処理方法として好適である。
The aluminum or aluminum alloy coated with the plating film (metal film) obtained by the present invention can be used in a variety of electronic components, including, for example, electronic components used in home appliances, in-vehicle equipment, power transmission systems, transportation equipment, and communication equipment, and more specifically, air conditioners, elevators, electric vehicles, hybrid vehicles, trains, power modules such as power control units for power generation devices, general home appliances, and personal computers.
In the present invention, by adjusting the pH of the metal substitution treatment liquid to 4.0 to 6.5, aluminum spikes can also be reduced, and pre-plating surface treatment can be performed to form a plating film with high smoothness and excellent plating appearance. Therefore, the present invention is suitable for use in semiconductor applications, preferably wafer applications, and is particularly suitable as a metal substitution treatment liquid on aluminum or aluminum alloys that is effective for pretreatment when forming under-bump metal or bumps on a wafer, and as a surface treatment method for aluminum or aluminum alloys using this metal substitution treatment liquid.
実施例に基づいて、本発明を具体的に説明するが、本発明はこれらのみに限定されるものではない。 The present invention will be specifically explained based on examples, but the present invention is not limited to these examples.
表1~3に示す条件に従い、アルミニウム基板に各処理を施してめっき皮膜を形成した。ここで、アルミニウム基板として、1cm×2cmのAl-Cu TEG wafeを用いた。得られためっき皮膜、めっき皮膜が設けられた基板について、下記の方法で評価した。評価結果を表2、3に示す。
なお、表2、3において、表中の数値(濃度)は、コハク酸を除き、フッ素(F)又は各金属元素換算濃度(g/L)である。
Plating films were formed by subjecting aluminum substrates to various treatments under the conditions shown in Tables 1 to 3. A 1 cm x 2 cm Al-Cu TEG wafer was used as the aluminum substrate. The resulting plating films and the substrates on which the plating films were formed were evaluated using the following methods. The evaluation results are shown in Tables 2 and 3.
In Tables 2 and 3, the numerical values (concentrations) in the tables, except for succinic acid, are fluorine (F) or metal element equivalent concentrations (g/L).
<密着性評価:折り割り試験>
得られためっき皮膜が設けられた基板について、エアーブロー乾燥させ、めっき面にセロハンテープを貼り付けた。そして、テープを貼り付けたwafer中央部に傷をつけ半分に割った。割った中央部からテープを剥がし、Al下地とNi皮膜間で剥がれた量を100分率として求めた。なお、折り割り試験の概要を図1に示した。
0%は、テープを剥がした際に全くめっき皮膜が剥がれないことを、100%は、テープを剥がした際に全面でめっき皮膜が剥がれることを意味する。
<Adhesion evaluation: folding test>
The substrate with the resulting plating film was air-dried, and cellophane tape was applied to the plated surface. The wafer was then scratched in the center where the tape was applied, and split in half. The tape was peeled from the center of the split, and the amount of peeling between the Al substrate and the Ni film was calculated as a percentage. An overview of the folding test is shown in Figure 1.
0% means that none of the plating film peels off when the tape is peeled off, and 100% means that the plating film peels off from the entire surface when the tape is peeled off.
<アルミニウム(Al)スパイク評価>
得られためっき皮膜について日立ハイテクノロジーズ社製のXVision 210DBを用いてFIB(集束イオンビーム)断面観察を行った。図2(a)にAlスパイクが見られない場合の一例を、図2(b)にAlスパイクが見られる場合の一例を示した。図2(a)のようにAlスパイクが見られない場合に良好であると判断した。
<Aluminum (Al) Spike Evaluation>
The obtained plating film was subjected to cross-sectional observation using a focused ion beam (FIB) using an XVision 210DB manufactured by Hitachi High-Technologies Corporation. Figure 2(a) shows an example of a case where no Al spikes were observed, and Figure 2(b) shows an example of a case where Al spikes were observed. When no Al spikes were observed, as in Figure 2(a), the film was judged to be good.
無電解Ni:エピタスNPR-18(上村工業(株)製)
Electroless Ni: Epitas NPR-18 (Uemura Industries Co., Ltd.)
表2、3より、亜鉛化合物、ニッケル化合物、ゲルマニウム化合物、フッ素化合物を含む実施例の金属置換処理液は、めっき皮膜(金属皮膜)との良好な密着性を付与できることが分かった。また、金属置換処理液のpHを3.5~6.5とすることにより、アルミニウムスパイクも低減できることが分かった。なお、表2、3は、アルミニウム基板として、Al-Cu TEG wafeを用いた場合の結果であるが、アルミニウム基板として、・Al-Si TEG waferを用いた場合も同様の結果であった。
Tables 2 and 3 show that the metal replacement treatment solutions of the examples, which contain a zinc compound, a nickel compound, a germanium compound, and a fluorine compound, can provide good adhesion to plating films (metal films). Furthermore, it was found that aluminum spikes can be reduced by adjusting the pH of the metal replacement treatment solution to 3.5 to 6.5. While Tables 2 and 3 show results when an Al-Cu TEG wafer was used as the aluminum substrate, similar results were obtained when an Al-Si TEG wafer was used as the aluminum substrate.
Claims (9)
亜鉛化合物を亜鉛濃度として0.1~7.0g/L含み、ニッケル化合物をニッケル濃度として0.1~12g/L含み、ゲルマニウム化合物をゲルマニウム濃度として0.1~7.0g/L含み、フッ素化合物をフッ素濃度として1.0~100g/L含み、pHが3.5~6.5であるアルミニウム又はアルミニウム合金用金属置換処理液。 zinc compounds, nickel compounds, germanium compounds, and fluorine compounds ,
A metal replacement treatment solution for aluminum or an aluminum alloy, which contains a zinc compound at a zinc concentration of 0.1 to 7.0 g/L, a nickel compound at a nickel concentration of 0.1 to 12 g/L, a germanium compound at a germanium concentration of 0.1 to 7.0 g/L, and a fluorine compound at a fluorine concentration of 1.0 to 100 g/L, and has a pH of 3.5 to 6.5 .
9. The method for treating the surface of aluminum or an aluminum alloy according to claim 8, wherein after forming the displacement metal film, a plating film is formed on the surface of the displacement metal film.
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| JP4538490B2 (en) | 2007-11-26 | 2010-09-08 | 上村工業株式会社 | Metal substitution treatment liquid on aluminum or aluminum alloy and surface treatment method using the same |
| JP4605409B2 (en) * | 2008-08-21 | 2011-01-05 | 上村工業株式会社 | Surface treatment method of aluminum or aluminum alloy |
| JP5643484B2 (en) * | 2009-01-13 | 2014-12-17 | 日本パーカライジング株式会社 | Metal surface treatment liquid, metal surface treatment method and metal material |
| JP2020196914A (en) | 2019-05-31 | 2020-12-10 | 奥野製薬工業株式会社 | Plating pretreatment method |
-
2021
- 2021-11-08 JP JP2021182009A patent/JP7718962B2/en active Active
-
2022
- 2022-04-28 CN CN202210500745.9A patent/CN114807918A/en active Pending
- 2022-10-24 TW TW111140222A patent/TW202336272A/en unknown
- 2022-10-28 EP EP22204326.7A patent/EP4177376A1/en active Pending
- 2022-11-03 US US18/052,569 patent/US20230151493A1/en not_active Abandoned
- 2022-11-08 KR KR1020220147573A patent/KR20230067550A/en active Pending
Patent Citations (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US20050008788A1 (en) | 2003-06-26 | 2005-01-13 | Joshi Nayan H. | Aqueous acidic immersion plating solutions and methods for plating on aluminum and aluminum alloys |
| JP2007521390A (en) | 2003-06-26 | 2007-08-02 | アトテック・ドイチュラント・ゲーエムベーハー | Aqueous and acidic immersion plating solution and method for plating on aluminum or aluminum alloy |
Also Published As
| Publication number | Publication date |
|---|---|
| EP4177376A1 (en) | 2023-05-10 |
| US20230151493A1 (en) | 2023-05-18 |
| CN114807918A (en) | 2022-07-29 |
| JP2023069841A (en) | 2023-05-18 |
| KR20230067550A (en) | 2023-05-16 |
| TW202336272A (en) | 2023-09-16 |
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