JP7722239B2 - Waterless offset master plate manufacturing method and manufacturing device - Google Patents
Waterless offset master plate manufacturing method and manufacturing deviceInfo
- Publication number
- JP7722239B2 JP7722239B2 JP2022058036A JP2022058036A JP7722239B2 JP 7722239 B2 JP7722239 B2 JP 7722239B2 JP 2022058036 A JP2022058036 A JP 2022058036A JP 2022058036 A JP2022058036 A JP 2022058036A JP 7722239 B2 JP7722239 B2 JP 7722239B2
- Authority
- JP
- Japan
- Prior art keywords
- coating
- cylindrical substrate
- release film
- film
- substrate
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Active
Links
Landscapes
- Coating Apparatus (AREA)
- Manufacture Or Reproduction Of Printing Formes (AREA)
- Application Of Or Painting With Fluid Materials (AREA)
Description
本発明は、水なしオフセット原版の製造方法および製造装置に関する。 The present invention relates to a method and apparatus for manufacturing a waterless offset master plate.
水なしオフセット印刷は、通常のオフセット印刷で油性インキを反発させるために用いている湿し水の代わりに、インキ反発性のあるシリコーン材料を用いていることを特徴とする平版印刷技術である。この水なしオフセット印刷では、原版として、アルミニウムなどの板材表面にシリコーンの膜を形成したものを用いるのが一般的である(特許文献1)。 Waterless offset printing is a lithographic printing technique characterized by the use of an ink-repellent silicone material instead of the dampening water used in regular offset printing to repel oil-based ink. In waterless offset printing, the master plate typically consists of a plate made of aluminum or other material with a silicone film formed on its surface (Patent Document 1).
具体的には、連続する長い板材に対しシリコーン材料を連続して塗布した後、必要とする原版の大きさに応じ、個々の長さにカットして使用する。そして、その原版に印刷パターンを加工し、印刷版とした後は、版胴と呼ばれる円柱基材に印刷版を巻き付け、印刷機にて使用される。 Specifically, a silicone material is continuously applied to a long, continuous sheet of material, which is then cut to individual lengths depending on the required size of the master plate. The printing pattern is then processed onto the master plate to create a printing plate, which is then wrapped around a cylindrical substrate called a plate cylinder and used in a printing press.
しかし、その際、印刷版の端部が円柱基材上の周方向で継ぎ目となり、この継ぎ目部分近傍では印刷できないという課題がある。この課題に対し、特許文献2には、オフセット原版を従来の板状から継ぎ目の無い円柱状とする原版が提案されている。さらに、特許文献2には、円筒状版基材の梨地状粗面に塗布したレジストパターンを、超音波洗浄処理、化学薬品洗浄処理などの処理を行って、円筒状版基材の表面からレジストパターン部を除去することで印刷版を再生処理することが開示されている。 However, this poses the problem that the edges of the printing plate form a seam in the circumferential direction on the cylindrical substrate, making it impossible to print near this seam. To address this problem, Patent Document 2 proposes an offset master plate that changes from the conventional plate-like shape to a seamless cylindrical shape. Patent Document 2 also discloses a method of recycling printing plates by subjecting a resist pattern applied to the matte surface of a cylindrical substrate to ultrasonic cleaning, chemical cleaning, or other treatments to remove the resist pattern portion from the surface of the cylindrical substrate.
さらに、特許文献3には、水なしオフセット印刷において、円筒状版基材の表面にシリコーン樹脂層をコーティングする方法などで継ぎ目がなくシームレスに形成することが提案されている。 Furthermore, Patent Document 3 proposes forming seamless printing cylinders in waterless offset printing by coating the surface of the printing cylinder substrate with a silicone resin layer.
原版の基材形状が、従来の板状から円柱形状になった場合、その製造において従来の手法を用いることが困難となる工程がある。基材上に必要な機能膜を形成する工程もその1つである。例えば、円柱状基材を用いる際は、原版の大きさによって、外径の異なる円柱状基材を用いるが、その保管や運送時において、板状基材のように重ねて、コンパクトにまとめることが出来ないことから、原版の製造は印刷所や印刷メーカーで実施される場合がある。 When the substrate shape of the master plate changes from the traditional plate shape to a cylindrical shape, there are some processes in its manufacturing that make it difficult to use traditional methods. One such process is the process of forming the required functional film on the substrate. For example, when using cylindrical substrates, cylindrical substrates with different outer diameters are used depending on the size of the master plate. However, since these cannot be stacked and compacted like plate-shaped substrates during storage and transportation, master plate manufacturing is sometimes carried out at a printing company or printing manufacturer.
原版の製造場所が印刷所や印刷メーカーとなった場合、原版の製造は、その場所で必要な個数のみ作ることとなり、その保管場所や運送負荷の関係で、同じ円柱状基材を繰り返し再利用するのが好ましい。この円柱状基材の再利用においては、円柱状基材の表面に形成した機能膜を、印刷版として使用した後に除去し、再度、機能膜を形成するという再生工程が必要となる。水なしオフセット原版の機能膜として用いられるシリコーン材料は、円柱状基材に密着しやすく、完全に無くなるまで除去することが困難である。そこで、円柱基材上に容易に剥離できる剥離膜を設けておいて、剥離膜上にシリコーン膜を形成し、基材を再生する際は、その剥離膜をシリコーン膜ごと引き剥がす再生方法が考えられるが、円柱状基材の表面に形成した剥離膜は、印刷時における版面の剥がれを防ぐために、円柱状基材との密着力が必要であり、特に、印刷時の回転方向である基材の周方向には、円柱状基材と強固な密着性が求められる。 When master plates are manufactured at a printing company or printing manufacturer, they are produced locally in the quantity needed. Due to storage space and transportation constraints, it is preferable to repeatedly reuse the same cylindrical substrate. Reusing such cylindrical substrates requires a recycling process: the functional film formed on the surface of the cylindrical substrate is removed after use as a printing plate, and then a new functional film is formed. The silicone material used as the functional film for waterless offset master plates tends to adhere to the cylindrical substrate and is difficult to remove completely. Therefore, one recycling method involves providing an easily removable release film on the cylindrical substrate, forming a silicone film on the release film, and then peeling off the release film along with the silicone film when recycling the substrate. However, the release film formed on the surface of the cylindrical substrate must have sufficient adhesion to the cylindrical substrate to prevent plate peeling during printing. Strong adhesion to the cylindrical substrate is particularly required in the circumferential direction of the substrate, which is the direction of rotation during printing.
つまり、円柱状基材を再生のために設ける剥離膜は、再生工程において容易に剥がすことができることに加え、印刷工程では、円柱状基材に対し強固に密着し剥がれないという、相反する機能を両立させる必要がある。しかしながら、水なしオフセット原版の製造において、円柱状基材表面に液状の剥離膜材料を塗布し剥離膜を形成することも、剥離時の易剥離性と円柱状基材との高い密着性を両立することは検討されていなかった。 In other words, the release film provided for recycling cylindrical substrates must be easily peelable during the recycling process, while also adhering strongly to the cylindrical substrate and not peeling off during the printing process. These contradictory functions must be compatible. However, in the manufacture of waterless offset master plates, applying a liquid release film material to the surface of the cylindrical substrate to form a release film has not been considered as a way to achieve both easy peeling and strong adhesion to the cylindrical substrate.
すなわち、本発明の解決しようとする課題は、円柱状基材の表面に継ぎ目のないシームレスの水なしオフセット原版を製造するに際し、円柱状基材から剥離し易く円柱状基材を再生可能にしつつ、印刷時においては基材に対し高い密着状態を保持し安定した印刷を行うことであり、そのための製造方法および製造装置の提供することを目的とする。 In other words, the problem that this invention aims to solve is to manufacture a seamless waterless offset master plate with no seams on the surface of a cylindrical substrate that can be easily peeled off from the cylindrical substrate, making the cylindrical substrate recyclable, while maintaining a high degree of adhesion to the substrate during printing, allowing for stable printing. The objective of this invention is to provide a manufacturing method and manufacturing device for this purpose.
上記課題を解決するため、本発明は、以下の構成からなる水なしオフセット原版の製造方法および製造装置を提供する。
(1)円柱状基材の表面に、液状の剥離膜材料を塗布する第1の塗布工程と、前記剥離膜材料を乾燥固化し前記円柱状基材の表面に剥離膜を形成する第1の固化工程と、前記剥離膜の表面にシリコーン膜材料を塗布する第2の塗布工程と、前記シリコーン膜材料を乾燥固化する第2の固化工程とを含む、水なしオフセット原版の製造方法において、前記剥離膜材料は、乾燥固化後の標準剥離特性において、塗膜厚みが100μm以下のとき、剥離膜の引張強さ[N/mm2]と塗膜厚み[mm]の積が、剥離膜の粘着力[N/mm]を超える剥離膜材料を用い、前記第1の塗布工程が、前記円柱状基材の軸を中心軸として回転させながら、前記円柱状基材の周面に対し、前記円柱状基材の下方に設けた第1の塗布器から前記剥離膜材料を噴き上げ、前記円柱状基材の表面に前記液状の剥離膜材料を付着させながら塗布する工程であり、
前記第1の固化工程が、前記第1の塗布工程に続き、前記円柱状基材を回転した状態で塗布された剥離膜材料の乾燥固化を行うことで、前記円柱状基材上で塗布された剥離膜材料を収縮させ、前記円柱状基材上に前記剥離膜を形成する工程であり、前記第2の塗布工程は、第2の塗布器から前記シリコーン膜材料を吐出し、前記剥離膜の表面に前記シリコーン膜材料を塗布する工程であり、円柱状基材の表面に、少なくとも前記剥離膜とシリコーン膜とを含む積層体が形成される、水なしオフセット原版の製造方法である。
In order to solve the above problems, the present invention provides a method and apparatus for producing a waterless offset master plate having the following configuration.
(1) A method for manufacturing a waterless offset master plate, comprising a first application step of applying a liquid release film material to the surface of a cylindrical substrate, a first solidification step of drying and solidifying the release film material to form a release film on the surface of the cylindrical substrate, a second application step of applying a silicone film material to the surface of the release film, and a second solidification step of drying and solidifying the silicone film material, wherein the release film material has standard release characteristics after drying and solidification such that when the coating film thickness is 100 μm or less, the product of the tensile strength [N/ mm2 ] of the release film and the coating film thickness [mm] exceeds the adhesive strength [N/mm] of the release film, and the first application step is a step of spraying the release film material from a first applicator provided below the cylindrical substrate onto the circumferential surface of the cylindrical substrate while rotating the cylindrical substrate about its axis as a central axis, and applying the liquid release film material while adhering it to the surface of the cylindrical substrate,
The first solidification step is a step following the first application step, in which the applied release film material is dried and solidified while the cylindrical substrate is rotated, thereby shrinking the applied release film material on the cylindrical substrate and forming the release film on the cylindrical substrate. The second application step is a step in which the silicone film material is ejected from a second applicator and applied to the surface of the release film, and a laminate including at least the release film and silicone film is formed on the surface of the cylindrical substrate. This is a method for manufacturing a waterless offset master plate.
(2)前記第1の塗布工程が、前記円柱状基材の回転運動を行いながら、前記第1の塗布器を円柱状の基材の軸方向に往復移動させることにより、前記円柱状基材の周面に前記剥離膜材料を噴き上げて塗膜を形成することを特徴とする、(1)に記載の水なしオフセット原版の製造方法である。
(3)前記液状の剥離膜材料の粘度が、0.01~1Poiseである、(1)または(2)に記載の水なしオフセット原版の製造方法である。
(4)前記第1の固化工程の途中で、前記円柱状基材を回転した状態で、第2の塗布工程を開始する、(1)~(3)に記載の水なしオフセット原版の製造方法である。
(5)前記第1の固化工程および前記第2の固化工程が、前記円柱状基材の回転により生じる風、もしくは、前記円柱状基材上の塗膜面に対してエアーノズルから送風することで行う、(1)~(4)のいずれかに記載の水なしオフセット原版の製造方法である。
(2) The method for producing a waterless offset master plate described in (1) is characterized in that the first coating step involves moving the first applicator back and forth in the axial direction of the cylindrical substrate while rotating the cylindrical substrate, thereby spraying the release film material onto the peripheral surface of the cylindrical substrate to form a coating film.
(3) The method for producing a waterless offset master plate according to (1) or (2), wherein the viscosity of the liquid release film material is 0.01 to 1 poise.
(4) A method for producing a waterless offset master plate according to any one of (1) to (3), wherein the second coating step is started while the cylindrical substrate is rotated during the first solidification step.
(5) A method for producing a waterless offset master plate according to any one of (1) to (4), wherein the first solidification step and the second solidification step are carried out by using air generated by the rotation of the cylindrical substrate or by blowing air from an air nozzle onto the coating surface on the cylindrical substrate.
(7)円柱状基材の周面に第1の塗材を塗布するための第1の塗布ノズルとしてファウンテンノズルを有する第1の塗布手段と、円柱状基材の周面に第2の塗材を塗布するための第2の塗布ノズルを有する第2の塗布手段と、前記円柱状基材を円柱の軸を中心軸として回転せしめるための回転駆動手段と、前記円柱状基材の周面に塗布された塗膜を固化するエアーノズルからの送風または光照射による固化手段と、塗膜の膜厚値を計測する測定器と、前記第1および第2の塗布手段と前記固化手段との切り替えを行う制御器を少なくとも有し、
前記の第1および第2の塗布手段は、該円柱状基材の回転軸方向に前記第1の塗布ノズルおよび第2の塗布ノズルを移動させる移動手段を備え、さらに、前記回転駆動手段によって前記円柱状基材を回転した状態で前記第1および第2の塗布ノズルを前記移動手段により移動させることで塗材の塗布を行い、かつ、前記第2の塗布手段は、前記測定器の測定値に基づき、前記固化手段を停止した後、前記第2の塗布手段による塗布工程を開始する、水なしオフセット原版の製造装置である。
(7) A coating device comprising at least a first coating means having a fountain nozzle as a first coating nozzle for coating the peripheral surface of the cylindrical substrate with a first coating material, a second coating means having a second coating nozzle for coating the peripheral surface of the cylindrical substrate with a second coating material, a rotation drive means for rotating the cylindrical substrate around the axis of the cylinder as the central axis, a solidification means for solidifying the coating film coated on the peripheral surface of the cylindrical substrate by blowing air from an air nozzle or irradiating light, a measuring device for measuring the film thickness value of the coating film, and a controller for switching between the first and second coating means and the solidification means,
The first and second coating means are equipped with a moving means for moving the first coating nozzle and the second coating nozzle in the direction of the rotation axis of the cylindrical substrate, and further, the coating material is applied by moving the first and second coating nozzles by the moving means while the cylindrical substrate is rotated by the rotation drive means, and the second coating means starts the coating process by the second coating means after stopping the solidification means based on the measurement value of the measuring instrument, in a waterless offset master plate manufacturing apparatus.
本発明によれば、円柱状基材の表面に継ぎ目のないシームレスの水なしオフセット原版を製造するに際し、円筒状基材の表面に塗布された剥離膜材料を収縮させ、円柱基材上に剥離膜を形成し、引き続き、剥離層の表面にシリコーン膜を形成する積層体構造により、剥離層円柱状基材から剥離し易く、かつ、印刷時においては基材に対し高い密着状態を保持し安定した印刷を行うことができる。 According to the present invention, when manufacturing a seamless waterless offset master plate on the surface of a cylindrical substrate, a release film material applied to the surface of the cylindrical substrate is shrunk to form a release film on the cylindrical substrate, and then a silicone film is formed on the surface of the release layer. This laminate structure makes it easy to release the release layer from the cylindrical substrate, and maintains high adhesion to the substrate during printing, allowing for stable printing.
これにより、円柱状形状の基材に対応した、これら製造方法および製造装置を用いることで、易剥離膜を有する水なしオフセット原版を、効率よく、且つ高品質に製造することが可能となる。 As a result, by using these manufacturing methods and manufacturing equipment that are compatible with cylindrical substrates, it is possible to efficiently and with high quality produce waterless offset master plates with easily peelable films.
以下、本発明の実施の一形態について、図面を参照しながら説明する。本発明は、以下の説明および図面により理解されるものであるが、本発明の実施形態がこれらに限定されるものではない。 One embodiment of the present invention will be described below with reference to the drawings. The present invention will be understood based on the following description and drawings, but the embodiments of the present invention are not limited to these.
本発明の水なしオフセット原版の製造方法は、円柱状基材の表面に、液状の剥離膜材料を塗布する第1の塗布工程とその離型膜材料の乾燥固化工程と、さらにシリコーン膜材料を塗布する第2の塗布工程とそのシリコーン膜材料の乾燥固化工程とを含み、円柱状基材の表面に、少なくとも前記剥離膜とシリコーン膜とを含む積層体が形成される。本発明の剥離膜材料は、乾燥固化後の標準剥離特性において、塗膜厚みが100μm以下のとき、剥離膜の引張強さ[N/mm2]と塗膜厚み[mm]の積が、剥離膜の粘着力[N/mm]を超える易剥離材料を用いており、前記第1の塗布工程が、前記円柱状基材の軸を中心軸として回転させながら、前記円柱状基材の周面に対し、前記円柱状基材の下方に設けた第1の塗布器から前記剥離膜材料を噴き上げ、前記円柱状基材の表面に前記液状の剥離膜材料を付着させながら塗布する工程である。そして、前記第1の固化工程が、前記第1の塗布工程に続き実行され、前記円柱基材を回転した状態で塗布された剥離膜材料の乾燥固化を行うことで、前記円柱基材上で塗布された剥離膜材料を収縮させ、前記円柱基材上に前記剥離膜を形成する。その後、前記第2の塗布工程は、第2の塗布器から前記シリコーン膜材料を吐出し、前記剥離膜の表面に前記シリコーン膜材料を塗布する工程である。剥離膜材料とは、剥離膜となる剥離材料を表し、シリコーン膜材料とは、シリコーン膜を成すシリコーン材料を表し、剥離膜とシリコーン膜の積層体は機能膜と呼ぶことがある。 The method for producing a waterless offset master plate of the present invention includes a first coating step of coating a liquid release film material on the surface of a cylindrical substrate, a drying and solidifying step of the release film material, and a second coating step of coating a silicone film material and a drying and solidifying step of the silicone film material, thereby forming a laminate including at least the release film and the silicone film on the surface of the cylindrical substrate. The release film material of the present invention is an easily peelable material such that, when the coating film thickness is 100 μm or less, the product of the tensile strength [N/ mm2 ] and the coating film thickness [mm] exceeds the adhesive strength [N/mm] of the release film in standard release characteristics after drying and solidifying. The first coating step is a step of spraying the release film material from a first applicator located below the cylindrical substrate onto the circumferential surface of the cylindrical substrate while rotating the cylindrical substrate about its axis, thereby coating the liquid release film material while adhering it to the surface of the cylindrical substrate. The first solidification step is performed following the first application step, in which the applied release film material is dried and solidified while the cylindrical substrate is rotated, causing the applied release film material to shrink and form the release film on the cylindrical substrate. The second application step then involves ejecting the silicone film material from a second applicator and applying it to the surface of the release film. The release film material refers to the release material that becomes the release film, and the silicone film material refers to the silicone material that forms the silicone film. The laminate of the release film and the silicone film is sometimes called a functional film.
本発明において、シリコーン材料を塗布する第2の塗布方法は限定されないが、以下の実施態様の説明においては、第2の塗布工程は第1の塗布工程に類似する方法を用いて説明される。すなわち、前記円柱状基材の下方に設けた第2の塗布器から塗液を噴き上げ、前記円柱状基材の表面に前記得以上の塗液を付着させながら塗布する工程である。 In the present invention, the second coating method for applying the silicone material is not limited, but in the following description of the embodiment, the second coating step will be described using a method similar to the first coating step. That is, it is a step in which the coating liquid is sprayed from a second applicator located below the cylindrical substrate, and the coating liquid is applied to the surface of the cylindrical substrate while adhering to the surface.
本発明において、水なしオフセット原版の機能膜として用いられるシリコーン材料は、円柱状基材に密着しやすく剥離することが困難であることから、円柱基材上に容易に剥離できる剥離膜をシリコーン膜との間に設けることで、で容易に剥離される。そして、円柱状基材を再生する際は、その剥離膜をシリコーン膜ごと引き剥がし再生される。一方、円柱状基材の表面に形成した剥離膜は、印刷時における版面の剥がれを防ぐために、円柱状基材との強固な密着性を必要とするものでもある。 In this invention, the silicone material used as the functional film of the waterless offset master plate adheres easily to the cylindrical substrate and is difficult to peel off. Therefore, by providing an easily peelable release film between the cylindrical substrate and the silicone film, the cylindrical substrate can be easily peeled off. When recycling the cylindrical substrate, the release film is peeled off along with the silicone film. On the other hand, the release film formed on the surface of the cylindrical substrate must have strong adhesion to the cylindrical substrate to prevent peeling of the plate surface during printing.
ここで、本発明の剥離膜材料に求められる標準剥離特性は、以下の通りである。なお、本発明における「標準剥離特性」とは、剥離材料を塗布等により基材上に薄く形成した剥離層が有する特性により、剥離膜材料を表した指標である。ここで、剥離性が良好、すなわち易剥離性を有する剥離膜材料は、基材上に形成された剥離膜を、基材から引き剥がす際に剥離膜が破断することなく容易に剥離することが可能であり、剥離膜自体の引張強度と基材と剥離膜との粘着強度に関係する。そして、本発明の水なしオフセット原版に用いられる剥離材の標準剥離特性は、剥離膜の引張強さ[N]が基材と剥離膜との密着力[N]よりも大きいものである。 The standard release properties required for the release film material of the present invention are as follows. In this specification, "standard release properties" are an index that represents the release film material based on the properties of a release layer formed thinly on a substrate by coating or other methods. A release film material with good release properties, i.e., easy release, allows the release film formed on the substrate to be easily peeled off without breaking when peeled from the substrate, and is related to the tensile strength of the release film itself and the adhesive strength between the substrate and the release film. The standard release properties of the release material used in the waterless offset master plate of the present invention are such that the tensile strength [N] of the release film is greater than the adhesion strength [N] between the substrate and the release film.
ここで、引張強さは、剥離膜材料が膜状態での材料強度:T[N/mm2]であり、JIS B 7721(2018年)で定められた引張試験機により測定することができ、幅W[mm]と膜厚t[mm]の断面積[mm2]から、T/(W・t)で表される。粘着力:P[N/m]は、JIS Z 0237(2009年)に記載の90度引き剥がしによる粘着力の測定方法により測定することができ、幅W[mm]から、P/Wで表される。そして、剥離膜の厚み、つまり膜厚tは100μm以下のときに、標準剥離特性として、T・W・tが、P・Wを超える易剥離膜材料であることが必要である。標準剥離特性と本発明の製造方法により得られる剥離膜の特性については、詳細を後述する。 Here, the tensile strength is the material strength of the release film material in a film state: T [N/mm 2 ], and can be measured using a tensile tester specified in JIS B 7721 (2018), and is expressed as T/(W·t) from the cross-sectional area [mm 2 ] of the width W [mm] and the film thickness t [mm]. The adhesive strength: P [N/m] can be measured using the adhesive strength measurement method by 90-degree peeling described in JIS Z 0237 (2009), and is expressed as P/W from the width W [mm]. When the thickness of the release film, i.e., the film thickness t, is 100 μm or less, the standard release characteristics require that the easy-to-peel film material has T·W·t exceeding P·W. The standard release characteristics and the characteristics of the release film obtained by the manufacturing method of the present invention will be described in detail below.
まず、本発明の製造方法に係る装置の構成について図面を参照しながら説明する。 First, the configuration of the apparatus used in the manufacturing method of the present invention will be explained with reference to the drawings.
<製造装置の構成>
図1は、水なしオフセット原版の製造装置100の一例を示す概略構成図である。図2は、図1の製造装置100の一部である塗布工程を詳細に示す正面図で、図3及び図4は、同じく図1の製造装置100の一部である塗布工程について、図3は第1の塗布工程および第1の固化工程、図4は第2の塗布工程および第2の固化工程を示す側面図である。また、図5は、同じく図1の製造装置100の一部である乾燥固化工程を示す正面図である。
<Configuration of manufacturing equipment>
Fig. 1 is a schematic diagram showing an example of a waterless offset master plate manufacturing apparatus 100. Fig. 2 is a front view showing in detail the coating process, which is part of the manufacturing apparatus 100 of Fig. 1, and Figs. 3 and 4 are side views of the coating process, which is also part of the manufacturing apparatus 100 of Fig. 1, with Fig. 3 showing a first coating process and a first solidification process, and Fig. 4 showing a second coating process and a second solidification process. Fig. 5 is a front view showing a drying and solidification process, which is also part of the manufacturing apparatus 100 of Fig. 1.
図1には、液状の剥離膜材料を塗布する第1の塗布工程では、塗材の噴き上げを行うファウンテン方式の第1の塗布ノズル121a、および、塗材の供給および回収機能を有する第1の塗布回収ユニット122aを少なくとも有しており、剥離膜材料が円柱状基材の表面に塗布される。図1に示す製造装置100は、塗布対象となる円柱状基材111を軸中心回りに回転させつつ、塗材を吐出する第1の塗布ノズル121aを、円柱状基材111の軸方向を示す移動方向Pに対し往復で移動させ、基材の外周面に塗材Fを重ねながら塗布する。その後、円柱状基材111を軸中心回りに回転させつつ、基材の外周面上の塗材Fへ向けて気流による固化手段141から気流を噴射することで、塗材Fを乾燥固化させる。 In Figure 1, the first application process for applying a liquid release film material includes at least a first fountain-type application nozzle 121a that sprays the coating material and a first application and recovery unit 122a that has the function of supplying and recovering the coating material, and the release film material is applied to the surface of a cylindrical substrate. The manufacturing apparatus 100 shown in Figure 1 rotates the cylindrical substrate 111 to be coated about its axis while moving the first application nozzle 121a, which dispenses the coating material, back and forth in a movement direction P that indicates the axial direction of the cylindrical substrate 111, applying coating material F to the outer peripheral surface of the substrate in layers. Then, while the cylindrical substrate 111 is rotated about its axis, an airflow is sprayed from an airflow solidification means 141 toward the coating material F on the outer peripheral surface of the substrate, drying and solidifying the coating material F.
図1には、シリコーン膜材料を塗布する第2の塗布工程として、第2の塗布ノズル121bおよび第2の塗布回収ユニット122bを少なくとも有しており、図1中では第2の塗布工程を実施するために円柱状基材から離れて待機している。そして、図1に図示していないが、第1の塗布工程および第1の固化工程の後に、第2の塗布ノズル121bおよび第2の塗布回収ユニット122bにより、シリコーン材料が剥離膜上に塗布され、第2の固化工程を経て、シリコーン膜が形成され、水なしオフセット印刷原版が製造される。 In Figure 1, the second coating process for applying the silicone film material includes at least a second coating nozzle 121b and a second coating and recovery unit 122b, which are shown waiting away from the cylindrical substrate in Figure 1 to carry out the second coating process. Then, although not shown in Figure 1, after the first coating process and the first solidification process, the second coating nozzle 121b and the second coating and recovery unit 122b apply the silicone material onto the release film, and after the second solidification process, a silicone film is formed, resulting in the production of a waterless offset printing plate.
図1の製造装置100は、第1の固化工程と第2の固化工程に使用される気流による固化手段141が1つ示されているが、複数個の気流による固化手段を設けてそれぞれ独立に乾燥固化に供してもよい。なお、図1では気流による固化手段141は円柱状基材の軸方向にスリット状の気流吐出口を有するスリット型ノズルを記載したが、形状としては、これ以外のノズル形状を用いてもよい。 The manufacturing apparatus 100 in Figure 1 is shown with one airflow solidification means 141 used in the first and second solidification steps, but multiple airflow solidification means may be provided, each of which independently performs drying and solidification. Note that Figure 1 shows the airflow solidification means 141 as a slit-type nozzle with a slit-shaped airflow outlet in the axial direction of the cylindrical substrate, but other nozzle shapes may also be used.
塗膜に対し、気流による固化手段141で気流を基材周面の塗膜面に噴射する際は、塗膜全面対して気流が噴射されるよう、円柱基材を回転した状態で噴射するのが好ましい。これにより、基材回転により基材表面に発生する気流で塗膜の乾燥が促進されることに加え、重力影響による塗膜の液流動も抑えることが出来る。 When spraying an airflow onto the coating surface around the substrate using the airflow solidification means 141, it is preferable to spray the airflow while the cylindrical substrate is rotating so that the airflow is sprayed across the entire coating surface. This not only promotes drying of the coating with the airflow generated on the substrate surface by the rotation of the substrate, but also suppresses liquid flow in the coating due to the influence of gravity.
この固化工程では、図3および図4に示す膜厚センサ151で、塗膜の膜厚値を測定し、センサ制御器152にその測定値を取り込むことで、塗膜の付着量を検知し、第1塗布工程の終了および第1固化工程の開始タイミングを制御することの他、第1塗布工程終了後の塗膜変化状態を測定することで塗膜の乾燥固化状態をモニターしてもよい。 During this solidification process, the film thickness value of the coating film is measured using the film thickness sensor 151 shown in Figures 3 and 4, and the measured value is input into the sensor controller 152 to detect the amount of coating film adhered, control the timing of the end of the first coating process and the start of the first solidification process, and also monitor the drying and solidifying state of the coating film by measuring the change in the state of the coating film after the end of the first coating process.
たとえば、センサ制御器152に取り込まれた測定値は、連動動作制御器150にも伝達され、第1の塗布工程における塗膜の付着量が、次工程の第1固化工程に移行できる状態になると、連動動作制御器150からの指令により、第1の固化工程に移行する。そして、塗膜の乾燥固化状態が、次工程の第2の塗布工程に移行できる状態になると、連動動作制御器150からの指令により、第2の塗布工程に移行する。第2の塗布工程では、図1に示す、第2の塗布ノズル121bを円柱状基材111の軸方向へ移動させながら、剥離膜の表面上にシリコーン機能層の塗布を行い、引き続き、図1及び図4に示す気流による固化手段141から気流噴射し、塗膜の乾燥固化を行うことで、円柱基材上に複数の機能膜を積層する積層体を形成することができる。 For example, the measurement values captured by the sensor controller 152 are also transmitted to the interlocking operation controller 150. When the amount of coating film deposited in the first coating process reaches a level that allows for transition to the next process, the first solidification process, the interlocking operation controller 150 issues a command to transition to the first solidification process. Then, when the dried and solidified state of the coating film reaches a level that allows for transition to the next process, the second coating process, the interlocking operation controller 150 issues a command to transition to the second coating process. In the second coating process, a silicone functional layer is applied to the surface of the release film while the second coating nozzle 121b shown in FIG. 1 is moved in the axial direction of the cylindrical substrate 111. Subsequently, an airflow is sprayed from the airflow solidification means 141 shown in FIGS. 1 and 4 to dry and solidify the coating, thereby forming a laminate in which multiple functional films are layered on the cylindrical substrate.
また、本発明の製造装置100は、図1に示す円柱状基材111を回転させる回転駆動手段と、図2に示す塗布手段を基材の長手方向(図中のY方向)に移動させる移動手段と、図3および図4に示す膜厚センサ151およびセンサ制御器152からなる膜厚検知部を備えてもよい。第1および第2の塗布ノズルおよび塗布ヘッドと、気流による固化手段141などと、それぞれの移動手段および回転手段、並びに膜厚検知部を連動させてもよい。 The manufacturing apparatus 100 of the present invention may also include a rotation drive means for rotating the cylindrical substrate 111 shown in FIG. 1, a moving means for moving the coating means shown in FIG. 2 in the longitudinal direction of the substrate (the Y direction in the figure), and a film thickness detection unit consisting of a film thickness sensor 151 and a sensor controller 152 shown in FIGS. 3 and 4. The first and second coating nozzles and coating heads, the airflow solidification means 141, and the like may be linked with their respective moving means, rotating means, and film thickness detection unit.
図6(a)~(d)は、各工程とその連動を示したもので、図6(a)には、円柱状基材の表面に、滴状の剥離膜材料を往復移動で積層塗布する第1の塗布工程が示され、図6(b)には、前記剥離膜材料を乾燥固化し前記円柱状の基材の表面に剥離膜を形成する第1の固化工程が示され、図6(c)には前記剥離膜の表面にシリコーン膜材料を塗布する第2の塗布工程の一例が示され、図6(d)には前記シリコーン膜材料を乾燥固化する第2の固化工程の一例が示されている。図6(a)~(d)は連動動作制御器150により各工程を制御し工程を順に動作させてもよい。 Figures 6(a) to 6(d) show each process and how they are linked together. Figure 6(a) shows a first application process in which droplets of release film material are applied to the surface of a cylindrical substrate in a reciprocating motion, forming a layer of the material. Figure 6(b) shows a first solidification process in which the release film material is dried and solidified to form a release film on the surface of the cylindrical substrate. Figure 6(c) shows an example of a second application process in which a silicone film material is applied to the surface of the release film, and Figure 6(d) shows an example of a second solidification process in which the silicone film material is dried and solidified. Figures 6(a) to 6(d) may be controlled by an interlocking operation controller 150 to operate the processes in sequence.
以下、装置の各手段および塗膜の形成について、詳細に説明する。
<回転駆動手段>
図2に示す回転駆動手段は、円柱状基材111を回転支持する左右の回転中心軸112、113と、前記回転中心軸を支持する支持台114、115と、回転支持軸に接続されて、円柱状基材111を回転駆動させるアクチュエータ116と、前記アクチュエータを制御し、円柱状基材111の回転速度を制御する回転速度制御器117を備える。回転駆動手段は、円柱状基材111を任意の回転数で回転させることができ、円柱状基材111の回転数は塗布に適した回転数や、乾燥固化を行うに適した回転数を得ることができる。回転駆動手段は、第1の塗布ノズル121a、第2の塗布ノズル121bを往復または直動移動させる手段、つまり、図1中の矢印(符号P)とは独立して制御されることが好ましい。
Each means of the apparatus and the formation of the coating film will be described in detail below.
<Rotational driving means>
The rotation drive means shown in Figure 2 includes left and right rotation central shafts 112 and 113 that support the rotation of a cylindrical substrate 111, support tables 114 and 115 that support the rotation central shafts, an actuator 116 connected to the rotation support shafts to rotate the cylindrical substrate 111, and a rotation speed controller 117 that controls the actuator and controls the rotation speed of the cylindrical substrate 111. The rotation drive means can rotate the cylindrical substrate 111 at any rotation speed, and the rotation speed of the cylindrical substrate 111 can be set to a rotation speed suitable for coating or drying and solidifying. The rotation drive means is preferably controlled independently of the means for reciprocating or linearly moving the first coating nozzle 121a and the second coating nozzle 121b, i.e., the arrows (symbol P) in Figure 1.
<塗布手段とその移動手段>
図3に示す塗布手段は、第1の塗布工程で用いる塗布手段であり、液状の剥離膜材料の塗材を吐出孔から噴き上げ基材に付着させる第1の塗布ノズル121aと、塗材を供給しかつ基材に付着せず落下してきた塗材を回収する第1の塗布回収ユニット122a、第1の送液ポンプ123aと、塗材を蓄える第1の塗材タンク124aを備える。塗液は、第1の塗材タンク124aから第1の塗布回収ユニット122a内の流路(図示せず)を経て、第1の塗布回収ユニット122aの先端に在る第1の塗布ノズル121aの吐出孔から、任意の吐出量で塗材Faを連続吐出できる。ここで、第1の塗布ノズル121aに塗材Faを供給する方式は、塗布ノズルから塗材Faを連続吐出できるものであれば特に限定はなく、第1の送液ポンプ123aに定量ポンプを用いる方法の他、図示しないが、第1の塗材タンク124を加圧し、加圧の圧力を調整することで吐出流量を制御する圧送方式を用いてもよい。
<Coating means and means for moving it>
3 is a coating means used in the first coating step, and includes a first coating nozzle 121a that sprays the liquid release film material from a discharge hole and adheres it to the substrate, a first coating and recovery unit 122a that supplies the coating material and recovers any coating material that falls without adhering to the substrate, a first liquid supply pump 123a, and a first coating tank 124a that stores the coating material. The coating liquid travels from the first coating tank 124a through a flow path (not shown) in the first coating and recovery unit 122a, and can be continuously discharged at any desired discharge rate from the discharge hole of the first coating nozzle 121a at the tip of the first coating and recovery unit 122a. Here, the method of supplying the coating material Fa to the first coating nozzle 121a is not particularly limited as long as it can continuously eject the coating material Fa from the coating nozzle. In addition to a method using a metering pump for the first liquid delivery pump 123a, a pressure-feed method (not shown) can also be used in which the first coating material tank 124 is pressurized and the ejection flow rate is controlled by adjusting the pressurization pressure.
また、図4には、第2の塗布工程で用いる、もう1つの第2の塗布ノズル121bについての塗布手段を示すが、こちらも図3と同様に、シリコーン塗材を供給する第2の塗布回収ユニット122b、第2の送液ポンプ123bと、塗材を蓄える第2の塗材タンク124bを備える。第2の塗布回収ユニット122bの先端に在る第2の塗布ノズル121bの吐出孔から任意の吐出量で塗材Fbを連続吐出できる。これら塗材を供給する方式は、図3の塗布手段と同様に方式を限定するものでなく、また、第2の塗布ノズル121bの形状や塗材を供給する方式については、図3の塗布手段と異なる方式を用いてもよい。 Figure 4 also shows the coating means for the second coating nozzle 121b used in the second coating process. Similar to Figure 3, this also includes a second coating and recovery unit 122b that supplies the silicone coating material, a second liquid supply pump 123b, and a second coating material tank 124b that stores the coating material. The coating material Fb can be continuously discharged at any desired rate from the discharge hole of the second coating nozzle 121b at the tip of the second coating and recovery unit 122b. As with the coating means of Figure 3, the method for supplying these coating materials is not limited to a specific method, and the shape of the second coating nozzle 121b and the method for supplying the coating material may be different from those of the coating means of Figure 3.
図2、図3及び図4に示す各塗布手段の移動手段は、第1の塗布回収ユニット122a、第2の塗布回収ユニット122bを支持するステージ131a、131bと、前記ステージが移動するスライダー132と、前記スライダーを駆動するアクチュエータ133と、前記アクチュエータを制御する制御器134を備え、第1の塗布ヘッド121a、第2の塗布ヘッド121bを円柱状基材111の軸方向に対し任意の速度で移動させることができる。ここで、剥離膜材料を塗布する第1の塗布工程において、ステージ131には、第1の塗布回収ユニット122a内の塗布ノズル121aと円柱状基材111との距離を調整する調整機構を有してもよい。 The movement means for each coating means shown in Figures 2, 3, and 4 includes stages 131a and 131b that support the first coating and recovery unit 122a and the second coating and recovery unit 122b, a slider 132 along which the stage moves, an actuator 133 that drives the slider, and a controller 134 that controls the actuator, and can move the first coating head 121a and the second coating head 121b at any speed in the axial direction of the cylindrical substrate 111. Here, in the first coating step of coating the release film material, the stage 131 may have an adjustment mechanism that adjusts the distance between the coating nozzle 121a in the first coating and recovery unit 122a and the cylindrical substrate 111.
また、図3に示す第1の塗布ノズル121aの移動手段と図4に示す第2の塗布ノズル121bの移動手段は、それぞれ独立して移動及び制御できることが好ましいが、同じ移動手段を共有してもよい。塗布動作においては、前記回転駆動手段によって基材を回転させながら、これら移動手段によって塗布ノズル121を往復移動させることによって、円筒状の基材の周面に対し、塗布ノズル121から連続して塗材を噴出し基材周面に付着させながら、基材周面全体に塗材を付着させることで周面上に塗膜が形成される。 Furthermore, it is preferable that the movement means for the first application nozzle 121a shown in Figure 3 and the movement means for the second application nozzle 121b shown in Figure 4 can be moved and controlled independently, but they may also share the same movement means. During the application operation, the substrate is rotated by the rotation drive means, while the application nozzle 121 is moved back and forth by these movement means. This causes the coating material to be continuously sprayed from the application nozzle 121 onto the circumferential surface of the cylindrical substrate, adhering to the circumferential surface of the substrate, and the coating material is then applied to the entire circumferential surface of the substrate, thereby forming a coating film on the circumferential surface.
また、図2に示す制御器134は、前記塗布手段に、前記塗布手段の移動手段と連動し往復移動の折り返し位置を判定する判定器と、移動手段の位置情報を入力し、所定走査を実行するプログラムが格納された制御器を用いてもよい。この連動動作制御器150によって、例えば、円柱基材の端部など特定の箇所において塗膜の厚みを薄くするなど、膜厚の変化を行いたい場合は、往復移動の折り返し位置を変化させるなど、設定された移動手段の位置情報を元に、塗膜形成に関わる各パラメータを制御すればよい。 The controller 134 shown in FIG. 2 may also be a controller that stores a program for linking the coating means with the movement means of the coating means to determine the return position of the reciprocating movement, and inputting position information from the movement means and executing a predetermined scan. When it is desired to change the film thickness, for example, to thin the coating film at a specific location such as the end of a cylindrical substrate, this linked operation controller 150 can control each parameter related to coating film formation based on the set position information of the movement means, such as changing the return position of the reciprocating movement.
<塗膜を乾燥固化する固化手段>
図3は、円柱状の基材の側面方向から見た模式図である。図3には円柱基材の軸方向にスリット状の気流を吐出する吐出口を有する気流による固化手段141を用いている。乾燥固化手段は、図3に示すように、前記円柱状の基材の周面から径方向に一定の間隙を保持することが好ましい。
<Solidification means for drying and solidifying the coating film>
Fig. 3 is a schematic diagram of a cylindrical substrate viewed from the side. Fig. 3 shows an airflow solidification means 141 having an outlet for discharging a slit-shaped airflow in the axial direction of the cylindrical substrate. As shown in Fig. 3, the drying and solidification means preferably maintains a constant gap in the radial direction from the peripheral surface of the cylindrical substrate.
また、気流による固化手段141は、供給する気体の圧力を制御する気流噴射の圧力制御器142と、圧縮気体を前記圧力制御器へ供給する圧縮気体供給源143を備え、円柱状基材111の外周面へ向けて、気流を連続噴射できる。この際、気流に用いる気体として、乾燥空気のほか窒素などの不活性気体を用いてもよい。 The airflow solidification means 141 also includes an airflow injection pressure controller 142 that controls the pressure of the supplied gas, and a compressed gas supply source 143 that supplies compressed gas to the pressure controller, and is capable of continuously injecting an airflow toward the outer circumferential surface of the cylindrical substrate 111. In this case, the gas used for the airflow may be dry air or an inert gas such as nitrogen.
さらに、図3には気流による固化手段141を示したが、固化手段はこれに限定されない。たとえば、光照射器により固化する方法が挙げられる。ただし、本発明の固化手段には、溶媒の除去や樹脂の硬化に用いられる高温の加熱や熱風の噴射による固化方法は、基材の温度上昇を伴い、常温に戻すまでに時間を要することから好ましくない。 Furthermore, while Figure 3 shows solidification means 141 using an air flow, the solidification means is not limited to this. For example, a solidification method using a light irradiator can be used. However, solidification methods using high-temperature heating or hot air spray, which are used to remove solvents and harden resins, are not preferred for the solidification means of the present invention because they increase the temperature of the substrate and require time to return it to room temperature.
<膜厚検知部>
膜厚検知部は、図3および図4に示す膜厚センサ151およびセンサ制御器152からなる。膜厚センサ151は、円柱状基材111の周面位置に向けて設置されており、塗膜の膜厚値を測定し、センサ制御器152にその測定値を取り込むことで、塗布工程における塗布膜厚値および固化工程における塗膜の乾燥固化状態をモニターすることができる。この際、膜厚センサが測定する膜厚値は、塗膜の表面と裏面を測定し膜厚値を測定するものが好ましいが、基材および塗膜の表面高さを測定し、その高さ変化から膜厚値を算出してもよい。その際、膜厚センサ151および制御装置152により検知する膜厚値は、円柱状基材111の回転状態で測定した複数の測定値を平均した、円柱状基材111の周面における平均膜厚値であるが、それに限らず、周面の特定位置のみで測定を行い、その箇所での測定値を膜厚値としてもよい。
<Film thickness detection unit>
The film thickness detection unit comprises a film thickness sensor 151 and a sensor controller 152 shown in FIGS. 3 and 4 . The film thickness sensor 151 is installed facing the circumferential surface of the cylindrical substrate 111. The film thickness sensor 151 measures the film thickness value of the coating film and inputs the measured values into the sensor controller 152, thereby monitoring the coating film thickness during the coating process and the drying and solidifying state of the coating film during the solidifying process. In this case, the film thickness value measured by the film thickness sensor is preferably measured by measuring the front and back surfaces of the coating film. However, the film thickness value may also be calculated by measuring the surface height of the substrate and the coating film and calculating the film thickness value from the change in height. In this case, the film thickness value detected by the film thickness sensor 151 and the control device 152 is the average film thickness value on the circumferential surface of the cylindrical substrate 111, obtained by averaging multiple measured values measured while the cylindrical substrate 111 is rotating. However, the film thickness value may also be measured only at specific positions on the circumferential surface, and the measured value at that position may be used as the film thickness value.
また、本発明において膜厚センサ151は、共焦点式のレーザーセンサを用いているが、塗膜状態での膜厚値が測定できるセンサであればよく、この限りでない。 In addition, in the present invention, the film thickness sensor 151 uses a confocal laser sensor, but any sensor that can measure the film thickness value in the coated film state will do, and is not limited to this.
<剥離膜材料の塗布形成について>
以上の構成を備える製造装置100を用い、円柱基材上に塗膜の形成を行う。剥離膜材料の塗布方法について説明する。塗材の充填工程では、図3に示す第1の塗材タンク124aに十分に脱泡した剥離膜材料の塗材Faを入れ、第1の送液ポンプ123aにより、第1の塗布回収ユニット122a、第1の塗布ノズル121a及び構成部品同士を接続する配管内に送液を行うことで、塗材Faを充填する。塗布動作工程では、円柱状基材111を図2に示す回転支持軸112、113に固定した後、製造装置100において、円柱状基材111を円柱の軸を中心軸とし、一定の回転速度で回転を行う。この時、塗材Faを吐出する第1の塗布ノズル121aは、円柱状基材111の軸方向端部で待機状態である。次に、第1の送液ポンプ123aを稼働させ、第1の塗布回収ユニット122aを介し、第1の塗布ノズル121aから塗材Faの噴出を行う。この際、塗材Faを、回転する円柱状基材111の下方から吹き付けることで、噴出した塗材Faの一部は円柱状基材111の下面に付着するが、付着しなかった塗材は重力により落下し、塗布回収ユニット122aによって回収される。そして、塗布ノズル121および塗布回収ユニット122を円柱状基材111の軸方向に移動させることで、基材周面に対し、塗材Fが付着し、塗膜が形成される。この塗布動作の際、円柱状基材111が1回転する間の、塗布ノズル121の移動量を、付着する塗膜の幅より少なくすることで、塗膜同志が端部で重なり合い、面状の塗膜となる。
<About coating of release film material>
A coating film is formed on a cylindrical substrate using the manufacturing apparatus 100 having the above configuration. A method for applying a release film material will now be described. In the coating material filling process, a coating material Fa, which is a sufficiently degassed release film material, is placed in the first coating material tank 124a shown in FIG. 3, and the first liquid supply pump 123a uses the first coating and recovery unit 122a, the first coating nozzle 121a, and the piping connecting the components to fill the coating material Fa. In the coating operation process, the cylindrical substrate 111 is fixed to the rotary support shafts 112 and 113 shown in FIG. 2, and then the cylindrical substrate 111 is rotated at a constant rotational speed in the manufacturing apparatus 100, with the axis of the cylinder as the central axis. At this time, the first coating nozzle 121a, which dispenses the coating material Fa, is in a standby state at the axial end of the cylindrical substrate 111. Next, the first liquid supply pump 123a is operated, and the coating material Fa is sprayed from the first coating nozzle 121a via the first coating and recovery unit 122a. At this time, by spraying the coating material Fa from below the rotating cylindrical substrate 111, some of the sprayed coating material Fa adheres to the underside of the cylindrical substrate 111, but the coating material that does not adhere falls due to gravity and is collected by the coating and recovery unit 122a. Then, by moving the coating nozzle 121 and the coating and recovery unit 122 in the axial direction of the cylindrical substrate 111, the coating material F adheres to the circumferential surface of the substrate, forming a coating film. During this coating operation, by making the movement amount of the coating nozzle 121 during one rotation of the cylindrical substrate 111 less than the width of the coating film to be adhered, the coating films overlap at the edges, forming a planar coating film.
この塗布動作の際に用いる塗材Fは、円柱状基材111への付着量を少なく制御できるものが好ましく、塗液粘度が低く、また、溶媒による希釈量の多いもの、すなわち固形分濃度の低いものがよい。塗布における好ましい適用範囲として、塗材粘度が0.01P~1P、より好ましくは0.03P~0.5Pに粘度を調整した塗材を用いるのがよい。すなわち、本発明の第1の塗布工程において、第1の塗布器から吐出される剥離膜材料の塗液の粘度は、0.01P~1Pの範囲を用いることができる。より好ましくは、剥離膜材料の塗液の粘度が0.03P~0.5Pである。塗液の粘度の単位Pは、Poise:ポアズである。 The coating material F used in this coating operation is preferably one that can be controlled to adhere to the cylindrical substrate 111 in small amounts, has a low coating viscosity, and is highly diluted with solvent, i.e., has a low solids concentration. A preferred application range for coating is one with a coating viscosity adjusted to 0.01 P to 1 P, more preferably 0.03 P to 0.5 P. That is, in the first coating step of the present invention, the viscosity of the coating liquid of the release film material discharged from the first applicator can be in the range of 0.01 P to 1 P. More preferably, the viscosity of the coating liquid of the release film material is 0.03 P to 0.5 P. The unit of viscosity for the coating liquid is Poise.
また、剥離膜材料を第1の塗布ノズル121aの吐出孔から安定して塗材Faを噴出させるためには、塗布ノズル121aの吐出孔が大きい方がよく、吐出孔の直径は0.1mm以上を用いるのが好ましい。一方、塗布ノズル121aの吐出孔を大きくし過ぎると、噴き上げに必要な吐出流量が多くなり、少量の付着量制御が難しくなることから、吐出孔の直径は1mm以下であることが好ましい。
<剥離膜とシリコーン膜の乾燥固化について>
まず、図5に塗膜の乾燥固化のための装置構成を示す。図5(a)は気流による固化手段141を用いた場合の乾燥固化手段で、図5(b)は、後に記載する光照射器151を用いて塗膜の固化を行う構成である。図5(a)および(b)は第1の塗布工程を代表して示されている。以下の説明における塗膜は、剥離膜材料を塗布した塗膜である。
In order to stably spray the peel-off film material Fa from the nozzle hole of the first application nozzle 121a, it is better to have a larger nozzle hole of the application nozzle 121a, and it is preferable to use a nozzle hole with a diameter of 0.1 mm or more. On the other hand, if the nozzle hole of the application nozzle 121a is too large, the discharge flow rate required for spraying becomes large, making it difficult to control the small amount of adhesion, so it is preferable that the diameter of the nozzle hole is 1 mm or less.
<About the drying and solidification of the release film and silicone film>
First, Figure 5 shows the configuration of an apparatus for drying and solidifying a coating film. Figure 5(a) shows a drying and solidifying means using solidifying means 141 using an airflow, and Figure 5(b) shows a configuration for solidifying a coating film using a light irradiator 151, which will be described later. Figures 5(a) and (b) are shown representatively for the first coating step. The coating film in the following description is a coating film coated with a release film material.
まず、図5(a)の構成において乾燥固化工程を説明する。塗布手段により基材上に塗膜を塗布した後は、基材を回転させながら、円柱状基材の周面に向かって、気流噴射手段から気流を噴射することで、塗膜の乾燥を促進させ、塗膜の乾燥固化を行う。 First, the drying and solidifying process will be described for the configuration shown in Figure 5(a). After a coating film is applied to the substrate by the coating means, the substrate is rotated while an airflow is sprayed from the airflow spraying means toward the circumferential surface of the cylindrical substrate, thereby accelerating the drying of the coating film and causing it to dry and solidify.
この乾燥固化工程において、処理時間を短縮するために、気流の温度を常温に対し10~30℃程度上昇させると効果的であるが、乾燥固化後に円柱基材の温度が過度に上昇した場合、円柱基材に熱によるひずみが発生し、次工程のパターン形成における精度にも影響を与えることから、気流の昇温は行わず、常温で処理することが好ましい。 In this drying and solidifying process, it is effective to increase the temperature of the airflow by about 10 to 30°C above room temperature in order to shorten the processing time. However, if the temperature of the cylindrical substrate rises excessively after drying and solidifying, thermal distortion will occur in the cylindrical substrate, which will affect the accuracy of the pattern formation in the next process. Therefore, it is preferable to carry out the process at room temperature without increasing the temperature of the airflow.
次に、図6には、剥離膜とシリコーン膜との積層体の形成方法の一例を示している。各工程は、第1の塗布工程(a)、第1の固化工程(b)、第2の塗布工程(c)、第2の固化工程(d)の順に行われ、それぞれ、塗布が完了してから塗膜全体に気流を噴射することで乾燥固化を促進させる。さらに、第1の固化工程の途中で、円柱状基材を回転した状態で、第2の塗布工程を開始することもできる。これは、剥離膜表面が完全に固化する前にシリコーン層を塗布し積層体を一体で乾燥させることで密着性をさらに高める観点から、好ましい。 Next, Figure 6 shows an example of a method for forming a laminate of a release film and a silicone film. The steps are performed in the following order: first application step (a), first solidification step (b), second application step (c), and second solidification step (d). After each application step is completed, an airflow is sprayed over the entire coating film to promote drying and solidification. Furthermore, the second application step can be started while the cylindrical substrate is rotating during the first solidification step. This is preferable from the perspective of further enhancing adhesion by applying a silicone layer and drying the laminate together before the release film surface has completely solidified.
この際、各工程(a)~(d)において、円柱基材は回転状態で行うが、回転速度は同じ速度で行わなくともよい。例えば、塗布を回転速度500rpmで行ったのち、乾燥固化は25rpmに速度低下して行うと、固化前の塗膜面において塗材のレベリングが生じ易く、塗布スジのない高品位な塗膜を形成することができる。 In this process, the cylindrical substrate is rotated in each of steps (a) to (d), but the rotation speed does not have to be the same. For example, if the coating is performed at a rotation speed of 500 rpm and then the drying and solidification is performed at a reduced speed of 25 rpm, the coating material is more likely to level on the coating surface before solidification, resulting in the formation of a high-quality coating film without coating streaks.
さらに、異なる乾燥固化の手段として、塗膜材料に、常温で容易に固化させることが可能な光硬化型の樹脂を用いる方法もある。この場合、希釈溶剤を用いない光硬化型の樹脂を用いれば、気流噴射手段を用いる必要はない。一方、樹脂の固化には光照射器を必要とすることから、装置内に図5(b)に示すような光照射器161および照射時間を制御する制御器162を設置し、基材回転状態で光照射を行うことで基材上塗膜の固化を行うとよい。 Another method of drying and solidifying the coating is to use a photocurable resin, which can be easily solidified at room temperature. In this case, if a photocurable resin that does not require a diluting solvent is used, there is no need to use an air jetting means. However, since a light irradiator is required to solidify the resin, it is advisable to install a light irradiator 161 and a controller 162 that controls the irradiation time, as shown in Figure 5(b), within the device, and irradiate the substrate with light while it is rotating to solidify the coating on the substrate.
<剥離膜について>
水なしオフセット原版に用いる円柱状基材を再利用するためには、目的の印刷が完了したのち、円柱状基材上に形成した塗膜を除去し、再度、基材上に新規原版用の塗膜を形成することで、円柱状基材を再利用することができる。
<About the release film>
In order to reuse the cylindrical substrate used for a waterless offset master plate, after the desired printing is completed, the coating film formed on the cylindrical substrate is removed, and a coating film for a new master plate is formed on the substrate again, thereby reusing the cylindrical substrate.
オフセット印刷においては、基材上のレジスト膜を薬液で洗浄溶解させることで除去しているが、水なし平版に用いるシリコーン材料を同様の手段で円柱基材上から除去した場合、シリコーン材料が円柱状基材の表面に付着してしまい、一旦、付着したシリコーン材料は円柱状基材表面に薄く残ることから、円柱状基材を再利用する際に表面状態が変わることで原版の品質が低下してしまう。 In offset printing, the resist film on the substrate is removed by washing and dissolving it with chemicals. However, if the silicone material used in waterless lithography is removed from a cylindrical substrate using the same method, the silicone material will adhere to the surface of the cylindrical substrate. Once adhered, the silicone material will remain in a thin layer on the surface of the cylindrical substrate, which changes the surface condition when the cylindrical substrate is reused, resulting in a decrease in the quality of the master plate.
このため、シリコーン材料を除去する手段としては、シリコーン層の下、円柱状基材の表面に、剥離用の塗膜(剥離膜)を形成し、その剥離膜をシリコーン層ごと円柱状基材から膜状に剥離することで、円柱状基材の初期化を安定して行うことができる。 For this reason, one method of removing the silicone material is to form a release coating (release film) on the surface of the cylindrical substrate below the silicone layer, and then peel the release film off the cylindrical substrate together with the silicone layer in a film-like form, thereby enabling stable initialization of the cylindrical substrate.
剥離膜に求められる機能としては、まず、円柱状基材から容易に剥離できることであり、そのためには、以下の式(1)を満たす膜特性を有する剥離膜材料を用いるのが好ましい。この特性を有する剥離材料を、易剥離性を有すると判定し、このような剥離特性を有する剥離材料を易剥離膜材料と呼ぶ。 The primary function required of a release film is that it can be easily peeled from the cylindrical substrate. To achieve this, it is preferable to use a release film material with film properties that satisfy the following formula (1). Release materials that have this property are determined to have easy peelability, and release materials with such peelability properties are called easy-to-peel film materials.
剥離膜を基材から剥離する際、膜に加わる力は、膜を引き剥がそうとする引張力[N]と基材に膜が留まろうとする密着力[N]であり、引張力[N]が密着力[N]より大きい場合、膜は基材から剥がれることができる。 When peeling a release film from a substrate, the forces acting on the film are the tensile force [N] that tries to peel the film off and the adhesion force [N] that tries to keep the film attached to the substrate. If the tensile force [N] is greater than the adhesion force [N], the film can be peeled off from the substrate.
この関係式を単位幅[1/mm]あたりの力のつり合いに変形すると式(1)のようになる。
引張強さ(N/mm2)×塗膜厚み(mm)>粘着力(N/mm) ・・・ 式(1)
左項の引張強さ[N/mm2]は、膜が破断することなく発生できる最大の引張力[N]を膜の断面積[mm2]で除した値であり、塗布厚み[mm]を乗じることで単位幅[1/mm]あたりの引張力[N]となる。また、右項の粘着力[N/mm]は、単位幅[1/mm]あたりの密着力[N]である。
When this relational expression is transformed into a balance of forces per unit width [1/mm], it becomes as shown in Equation (1).
Tensile strength (N/mm 2 )×coating film thickness (mm)>adhesive strength (N/mm) Formula (1)
The tensile strength [N/ mm2 ] on the left is the maximum tensile force [N] that can be generated without the film breaking, divided by the cross-sectional area of the film [ mm2 ], and multiplied by the coating thickness [mm] to obtain the tensile force [N] per unit width [1/mm]. The adhesive strength [N/mm] on the right is the adhesion force [N] per unit width [1/mm].
この式(1)において、引張強さ×塗膜厚みは、剥離膜を除去する際、膜状態での引き剥がしに耐えられる膜強度であり、この膜強度以下の力であれば剥離膜は破れることなく膜形状を保つことが出来る。また、右項の粘着力は基材から剥離膜を引き剥がす際に生じる抵抗力であり、この力より大きい力で膜を引き上げれば、基材上から膜を引き剥がすことができる。つまり、式(1)を満たす材料では、膜形状を保ったまま連続的に基材から剥離膜を引き剥がすことができるのに対し、式(1)を満たさない条件では、剥離膜の引き剥がしの際、剥離膜がちぎれてしまい、基材上の剥離膜を全て除去するには多大な労力を要してしまう。このように、剥離膜が易剥離性を有するかどうかは、式(1)を膜の材質が満たすかどうかで確認出来ることの他に、基材から剥離膜がどのように剥がれるかを確認することでも、概ね知ることがきる。 In this formula (1), the tensile strength x coating thickness represents the film strength that the film can withstand when peeled off in its film state. If the force applied is less than this film strength, the release film will not tear and will be able to maintain its shape. Furthermore, the adhesive strength (right-hand term) represents the resistance force that arises when peeling the release film from the substrate. If the film is pulled up with a force greater than this resistance force, it can be peeled off from the substrate. In other words, with materials that satisfy formula (1), the release film can be continuously peeled off from the substrate while maintaining its shape. However, under conditions that do not satisfy formula (1), the release film will tear when peeled off, and it will take a great deal of effort to remove all of the release film from the substrate. Thus, whether a release film has easy peelability can be determined not only by whether the film material satisfies formula (1), but also by observing how the release film peels off from the substrate.
ここで、式(1)の各項目について説明する。左項の引張強さは、剥離膜材料が膜状態での材料強度であり、JIS B 7721(2018年)で定められた引張試験機により測定することができる。剥離膜における引張強さは、原版として機能膜を保持するうえで20N/mm2 以上であることが好ましく、さらに安定性を考慮すると40N/mm2 以上であることが好ましい。同じく左項の、塗膜厚みは、剥離膜として乾燥固化した際の膜厚みであり、膜厚が厚くなるほど膜としての強度が向上するという利点があるが、膜厚が大きくなると、その分、乾燥固化に時間が必要であり、また、材料費も多く必要となることから、適度な膜厚が求められる。この剥離膜の厚みとしては、100μm以下が好ましく、また、短時間に乾燥固化を行ううえで50μm以下がさらに好ましい。 Here, each item in formula (1) will be explained. The tensile strength in the left term is the material strength of the release film material in a film state, and can be measured using a tensile tester specified in JIS B 7721 (2018). The tensile strength of the release film is preferably 20 N/mm 2 or more in order to maintain the functional film as a master, and more preferably 40 N/mm 2 or more in consideration of stability. Similarly, the coating film thickness in the left term is the film thickness when dried and solidified as a release film. The thicker the film thickness, the better the strength of the film. However, as the film thickness increases, the longer it takes to dry and solidify, and the higher the material costs, so an appropriate film thickness is required. The thickness of this release film is preferably 100 μm or less, and more preferably 50 μm or less in order to dry and solidify in a short time.
次に右項の粘着力は、JIS Z 0237(2009年)に記載の90度引き剥がしによる粘着力の測定方法を元に、基材を円柱状基材の表面仕上げ状態と同じ表面粗さとして測定する。ここで、本開示における円柱状基材の表面状態は、アルミニウムを母材(A5052)とし、仕上げ面の平均粗さをRa1.6とした。 Next, the adhesive strength in the right column is measured based on the adhesive strength measurement method using 90-degree peeling as described in JIS Z 0237 (2009), with the substrate having the same surface roughness as the surface finish of the cylindrical substrate. Here, the surface condition of the cylindrical substrate in this disclosure is aluminum (A5052) as the base material, with an average roughness of the finished surface of Ra 1.6.
また、剥離膜の粘着力の大きさは、式(1)の関係より、小さい値であるほど易剥離性の傾向が大きくなるが、一方、印刷時における円柱状基材への機能膜保持性能は低下する。このため、式(1)を満たす条件内で大きな値の粘着力を有するのがよいが、人力により指で引き剥がしできる容易さを考慮した場合、粘着力の値は0.50N/mm以下が好ましく、また、0.10N/mm以下がさらに好ましい。 Furthermore, according to the relationship in formula (1), the smaller the adhesive strength of the release film, the greater the tendency for it to be easily peeled off, but on the other hand, the ability of the functional film to be retained on the cylindrical substrate during printing decreases. For this reason, it is desirable to have a large adhesive strength within the conditions that satisfy formula (1), but when considering the ease of manual peeling with fingers, an adhesive strength value of 0.50 N/mm or less is preferable, and 0.10 N/mm or less is even more preferable.
また、円柱状基材に対して剥離膜が密着する力は、式(1)における基材との粘着力の他に、剥離膜が円柱状基材を締め付ける力によっても向上する。このため、より剥離し易い剥離膜材料を用いたうえで、基材への密着性を保持したい場合は、剥離膜の収縮特性を用いて、円柱状基材上で剥離膜を収縮させ、円柱状基材の保持力を高める方法もある。 The adhesive strength of the release film to the cylindrical substrate is also increased by the force with which the release film tightens the cylindrical substrate, in addition to the adhesive strength with the substrate as shown in formula (1). Therefore, if you want to maintain adhesion to the substrate while using a release film material that is easier to release, you can use the shrinkage properties of the release film to shrink the release film on the cylindrical substrate, thereby increasing the holding force of the cylindrical substrate.
<水なしオフセット原版の製造について>
円柱状基材を用い、本発明の塗布方法および製造装置にて、水なしオフセット原版を製造する際は、第1の塗布工程および第1の固化工程で基材表面に剥離膜を形成したのち、第2の塗布工程および第2の固化工程により、前記剥離膜状にシリコーン層を形成する。
<About the production of waterless offset master plates>
When using a cylindrical substrate to manufacture a waterless offset master plate using the coating method and manufacturing apparatus of the present invention, a release film is formed on the surface of the substrate in a first coating step and a first solidification step, and then a silicone layer is formed on the release film in a second coating step and a second solidification step.
詳細に記載すると、まず第1の塗布工程で、円柱状基材を回転した状態で、乾燥固化後の膜厚から計算した剥離膜材量分だけ円柱状基材上に塗膜を形成する。この塗布の際、塗液の量は、塗膜形成に必要な材料の量よりも多く第1の塗布ノズルから噴出し、その一部を円柱基材に付着させることで、噴き上げに必要な流量を確保しつつ、少量の付着量で塗布することができる。付着量を少量に制御できると、目的の膜厚に達するまでに、薄膜状態での積層形成が可能になり、塗膜の積層量が多くなることで、螺旋状塗布の塗布跡が残りにくく、良質な塗布面を形成することができる。この塗膜形成は、例えば、途中で円柱状基材の回転を停止した場合、重力影響による塗材流れにより、塗膜の不均一状態が生じることから、塗布の開始から終了まで円柱状基材の回転状態を保持したまま行うのが好ましい。 In more detail, in the first coating step, a coating film is formed on the cylindrical substrate while the cylindrical substrate is rotating, using an amount of release film material calculated from the film thickness after drying and solidification. During this coating, a larger amount of coating liquid is sprayed from the first coating nozzle than the amount of material needed to form the coating film, and a portion of it is deposited on the cylindrical substrate, allowing for application with a small deposition amount while maintaining the flow rate required for spraying. Controlling the deposition amount to a small amount makes it possible to form a thin film layer by the time the target film thickness is reached. The increased deposition amount reduces the likelihood of leaving traces of the spiral coating, resulting in a high-quality coated surface. For example, if the rotation of the cylindrical substrate is stopped midway, gravity will cause the coating material to flow, resulting in an uneven coating film. Therefore, it is preferable to maintain the rotation of the cylindrical substrate from start to finish during this coating film formation process.
次に、第1の塗布工程で、剥離膜の塗膜厚さが膜厚センサの測定値が設定膜厚に達したところで、第1の塗布工程を終了させ、液膜の形状が崩れないよう円柱状基材の回転状態を保持しながら、第1の固化工程を行うのがよい。第1の固化工程では、塗膜表面に常温のエアーを吹き付けることで乾燥を促進させ、同時に液膜の収縮固化により、剥離膜が円柱状基材を把持するように固化される。この際、液膜の固化手段はエアー吹き付けの他に、剥離膜材料を光硬化樹脂としたうえで光照射を行ってもよい。光照射による樹脂硬化は、基材の温度上昇を少なく抑えるという利点の他に、短時間で固化工程が完了できるという利点もある。 Next, in the first coating step, when the coating thickness of the release film measured by the film thickness sensor reaches the set film thickness, the first coating step is terminated, and the first solidification step is carried out while the cylindrical substrate is kept rotating to prevent the shape of the liquid film from collapsing. In the first solidification step, room temperature air is blown onto the coating surface to promote drying, and at the same time, the liquid film shrinks and solidifies, solidifying so that the release film grips the cylindrical substrate. In this case, in addition to air blowing, the liquid film can also be solidified by using a photocurable resin as the release film material and then irradiating it with light. Resin curing by light irradiation has the advantage of minimizing the temperature rise of the substrate, as well as the advantage of completing the solidification step in a short time.
次に、第1の固化工程を膜厚センサの測定値を元に乾燥状態を判断することで終了させ、引き続き、第2の塗布工程のシリコーン膜材料の塗布に移行する。この第1の固化工程から第2の塗布工程の移行は、第1の固化工程において、剥離膜の固化が完了してから実施してもよいが、剥離膜表面が完全に固化する手前で移行することにより、原版の製造時間を短縮できることのほか、剥離膜とシリコーン層の密着性をより高めることが期待できる。また、この際、剥離膜の乾燥固化は、第2の固化工程による追乾燥により完了する。そして、第2塗布工程が完了したのち、第2の固化工程を行うことで、円柱状基材上に剥離膜、シリコーン層を有する水なしオフセット原版が製造できる。 Next, the first solidification process is terminated by determining the dryness state based on the film thickness sensor measurement value, and the process then moves on to the application of the silicone film material in the second coating process. The transition from the first solidification process to the second coating process can be carried out after the release film has completely solidified in the first solidification process, but by transitioning before the release film surface has completely solidified, the master production time can be shortened and the adhesion between the release film and the silicone layer can be expected to be further improved. Furthermore, the release film is dried and solidified by further drying in the second solidification process. After the second coating process is completed, the second solidification process can be carried out to produce a waterless offset master plate having a release film and silicone layer on a cylindrical substrate.
このようにして製造した水なしオフセット原版は、剥離膜部分が円柱状基材の周面に対して均一な塗膜で形成できることから、印刷時において剥離膜の剥離起点が生じにくく、膜の耐久性が高い。 The waterless offset printing plate manufactured in this way has a release film formed as a uniform coating on the peripheral surface of the cylindrical substrate, making it less likely for the release film to peel off during printing and resulting in high film durability.
さらに、円柱状基材の再利用時においては、剥離膜に易剥離性の材料を用いていることから、膜面の一部にカッターなどで機能膜にキズを入れ、剥離の起点を作ることにより、手で容易に剥離膜をシリコーン層ごと円柱状基材から剥離することができる。
また、本開示では、水なしオフセット原版の機能膜について、剥離膜とシリコーン層の2層構成について記載したが、この2層以外に、例えば、剥離層とシリコーン層の間に印刷パターンを形成するための感熱層を設けてもよく、その他、シリコーン層の外側に容易に剥離ができる保護膜を設けてもよい。この際、剥離膜上にシリコーン層を形成することと同様に、塗膜の数に応じて塗材の塗布ノズル、塗布手段および塗布ノズル移動手段の数を増加することで、第2塗布工程および第2固化工程と同様な方法で積層膜を形成すればよい。
Furthermore, when reusing the cylindrical substrate, since the release film is made of an easily peelable material, by scratching part of the film surface with a cutter or the like to create a starting point for peeling, the release film can be easily peeled off by hand from the cylindrical substrate together with the silicone layer.
In addition, in this disclosure, the functional film of the waterless offset master plate has been described as having a two-layer structure consisting of a release film and a silicone layer, but in addition to these two layers, for example, a heat-sensitive layer for forming a printing pattern between the release layer and the silicone layer may be provided, or a protective film that can be easily peeled off may be provided on the outside of the silicone layer. In this case, just as in the case of forming a silicone layer on a release film, by increasing the number of coating nozzles, coating means, and coating nozzle movement means for the coating material according to the number of coating films, a laminated film can be formed in a manner similar to the second coating step and the second solidification step.
以下、実施例により本発明の具体的態様を示す。なお、本発明の実施形態はこれらによって何ら限定されるものではない。 The following examples illustrate specific aspects of the present invention. However, the present invention is not limited to these examples.
実施例1、2および比較例1については、それぞれの条件で原版の評価サンプルを作製したのち、印刷時を想定した機能膜の耐久性評価と、基材再生時を想定した剥離膜の剥離性評価を実施した。 For Examples 1 and 2 and Comparative Example 1, evaluation samples of the master plate were prepared under the respective conditions, and then the durability of the functional film was evaluated assuming printing, and the peelability of the release film was evaluated assuming substrate recycling.
耐久性評価は、原版の外周面にオフセット印刷時のブランケットを模したゴムローラを押しつけた状態で、50時間および100時間の長時間回転駆動を行い、機能膜が円柱状基材に密着した状態を保持できるかを確認した。評価の対象は、基材に対する剥離膜の浮きや剥がれ、剥離膜に対するシリコーン膜の剥がれであり、状態は目視で確認した。評価基準は、設定した耐久時間(50時間、100時間)を経ても機能膜の状態変化が生じなかったものは「良好:〇」、機能膜に剥がれ、破れなどの欠陥が確認できたものは「不良:×」、また、×には至らないが、その予兆として機能膜に浮きが生じたものは「やや不良:△」と評価した。 Durability was evaluated by pressing a rubber roller, simulating the blanket used in offset printing, against the outer surface of the master plate and running the plate for long periods of time, 50 and 100 hours, to see whether the functional film could maintain adhesion to the cylindrical substrate. Evaluations were made to determine whether the release film had lifted or peeled off from the substrate, and whether the silicone film had peeled off from the release film, and the conditions were checked visually. The evaluation criteria were "Good: ◯" if no change in the condition of the functional film occurred after the set durability time (50 hours, 100 hours); "Bad: ×" if defects such as peeling or tears were observed in the functional film; and "Slightly poor: △" if the functional film had lifted off, which was a precursor to the problem but did not reach the "×" rating.
剥離性の評価は、人手で剥離膜を基材から除去することを想定し、円柱状基材上の機能膜端部に切り目を入れ、そこから円周方向に剥離しながら、円柱状基材から剥離膜とシリコーン膜の積層体を剥離した。剥離性の評価は、積層体が切れることなく、容易に引き剥がすことが出来るものは「良好:〇」、積層体が3か所以上に引きちぎれてしまい、引き剥がしが困難なものは「不良:×」、また、引き剥がすことは可能だが、積層体が2か所以下で引きちぎれてしまい容易でないものは「やや不良:△」と評価した。 Removability was evaluated by simulating the manual removal of the release film from the substrate. A cut was made at the end of the functional film on the cylindrical substrate, and the laminate of the release film and silicone film was peeled off from the cylindrical substrate while peeling in the circumferential direction. Peelability was evaluated as "Good: ◯" if the laminate could be easily peeled off without breaking; "Poor: ×" if the laminate was torn in three or more places and was difficult to peel; and "Slightly Poor: △" if the laminate was possible to peel off but was torn in two or fewer places and was difficult to peel off.
<実施例1>
図1~図4に示す構成と同等の製造装置を使用し、図6の手順で円柱状基材上に剥離膜とシリコーン膜の積層体を形成した。外径185mm、軸長300mmの円柱状基材を用い、第1の塗布工程において、円柱状基材の周面に均一に平坦な塗膜が形成された場合に、乾燥固化後の膜厚が50μmとなるよう塗布膜の積層量を設定し、出口径Φ0.08mmのファウンテン方式の塗布ノズルを用い、基材を50rpmで回転させた状態で剥離膜の積層塗布を行った。次の第1の固化工程では、基材の回転速度を25rpmに低下させ、スリット型のエアーノズルを用い、吐出流速90m/secの気流を10分間、基材の回転数を25rpmに保持した状態で吹き付け続け、塗膜の乾燥固化を行った。次の第2の塗布工程では、再び基材の回転速度を500rpmに上昇させ、乾燥固化後の膜厚が10μmとなるよう膜厚を設定し、出口径Φ0.5mmのファウンテン方式の塗布ノズルを用い、螺旋状にシリコーン膜材料の積層塗布を行った。次の第2の固化工程では、基材の回転速度を25rpmに低下させ、剥離膜乾燥時と同じスリット型のエアーノズルを用い、吐出流速90m/secの気流を10分間、基材の回転数を25rpmに保持した状態で吹き付け続け、塗膜を乾燥固化した。
Example 1
Using a manufacturing apparatus similar to that shown in Figures 1-4, a laminate of a release film and a silicone film was formed on a cylindrical substrate using the procedure shown in Figure 6. A cylindrical substrate with an outer diameter of 185 mm and an axial length of 300 mm was used. In the first coating step, the amount of coating film applied was set so that a uniform, flat coating film would form on the cylindrical substrate's periphery, resulting in a film thickness of 50 μm after drying and solidifying. A fountain-type coating nozzle with an outlet diameter of 0.08 mm was used to apply the release film while the substrate was rotating at 50 rpm. In the next solidification step, the substrate rotation speed was reduced to 25 rpm, and a slit-type air nozzle was used to spray an airflow at a discharge velocity of 90 m/sec for 10 minutes while the substrate rotation speed was maintained at 25 rpm, allowing the coating to dry and solidify. In the second coating step, the rotation speed of the substrate was increased to 500 rpm, the film thickness was set to 10 μm after drying, and a fountain-type coating nozzle with an outlet diameter of 0.5 mm was used to apply the silicone film material in a spiral pattern. In the second solidification step, the rotation speed of the substrate was reduced to 25 rpm, and using the same slit-type air nozzle as used in drying the peeled film, an air flow with a discharge velocity of 90 m/sec was sprayed for 10 minutes while the rotation speed of the substrate was maintained at 25 rpm, and the coating was dried and solidified.
機能膜の耐久性および剥離膜の剥離性の確認結果を表1に示す。耐久性確認では、実施例1~3において、剥離膜の浮きや剥がれ、また、シリコーン膜の剥がれともに100時間経過後も問題は生じなかった。 The results of the confirmation of the durability of the functional film and the peelability of the release film are shown in Table 1. In the durability confirmation, in Examples 1 to 3, there were no problems with lifting or peeling of the release film or peeling of the silicone film even after 100 hours had passed.
また、剥離膜材料には、ポリウレタンを原料とし、N,N-ジメチルホルムアミドを主溶剤成分とした固形分濃度5wt%の希釈液を用いた。希釈液材料の液粘度は10cP、乾燥固化後の膜状態での粘着力が0.10N/mmに対し、引張強さ40N/mm2、膜厚50μmの易剥離性であった。 The release film material was a diluted solution of polyurethane with a solids concentration of 5 wt% and N,N-dimethylformamide as the main solvent. The liquid viscosity of the diluted solution material was 10 cP, and the adhesive strength of the film after drying and solidification was 0.10 N/mm, while the tensile strength was 40 N/ mm2 and the film thickness was 50 μm, making it easy to peel.
<実施例2>
図1~図4に示す構成に、第1の固化工程において、図5(b)の光照射器を加えた構成の製造装置を使用し、剥離膜材料に光硬化型の塗材を用いることで、円柱状基材上に剥離膜とシリコーン膜を形成した。第1の塗布工程では、外径185mm、軸長300mmの円柱状基材を用い、円柱状基材の周面に均一に平坦な塗膜が形成された場合に、固化後の膜厚が50μmとなるよう塗膜量を設定し、出口径Φ0.2mmのファウンテン方式の塗布ノズルを用い、基材を500rpmで回転させた状態で螺旋状に剥離膜の塗布を行った。次に第1の固化工程では、基材の回転速度を25rpmに低下させ、照射光量300mW/cm2の光照射器を用い、5分間、基材の回転数を25rpmに保持した状態で光照射を続け、塗膜を固化した。次に第2の塗布工程で、再び基材の回転速度を500rpmに上昇させ、乾燥固化後の膜厚が10μmとなるよう送液ポンプで送液量を調整し、出口径Φ0.5mmのファウンテン方式の塗布ノズルを用い、螺旋状にシリコーン材料の塗布を行った。次に第2の固化工程で、基材の回転速度を25rpmに低下させ、スリット型のエアーノズルを用い、吐出流速90m/secの気流を10分間、基材の回転数を25rpmに保持した状態で吹き付け続け、塗膜を乾燥固化し、下地剥離層、上層シリコーン膜の原版を作製した。
Example 2
In the first solidification step, a manufacturing apparatus with the configuration shown in Figures 1 to 4, but with the addition of the light irradiator shown in Figure 5(b), was used. A photocurable coating material was used as the release film material to form a release film and a silicone film on a cylindrical substrate. In the first coating step, a cylindrical substrate with an outer diameter of 185 mm and an axial length of 300 mm was used. When a uniform, flat coating film was formed on the circumferential surface of the cylindrical substrate, the coating amount was set so that the film thickness after solidification would be 50 μm. A fountain-type coating nozzle with an outlet diameter of Φ0.2 mm was used, and the release film was applied in a spiral pattern while the substrate was rotating at 500 rpm. Next, in the first solidification step, the rotation speed of the substrate was reduced to 25 rpm, and a light irradiator with an irradiation dose of 300 mW/ cm2 was used. Light irradiation was continued for 5 minutes while the rotation speed of the substrate was maintained at 25 rpm, solidifying the coating. Next, in the second coating step, the rotation speed of the substrate was increased again to 500 rpm, the liquid feed rate was adjusted with the liquid feed pump so that the film thickness after drying and solidifying would be 10 μm, and the silicone material was applied in a spiral pattern using a fountain-type application nozzle with an outlet diameter of Φ0.5 mm. Next, in the second solidification step, the rotation speed of the substrate was reduced to 25 rpm, and using a slit-type air nozzle, an air flow with an outlet velocity of 90 m/sec was continuously sprayed for 10 minutes while the rotation speed of the substrate was maintained at 25 rpm, drying and solidifying the coating film, producing a master plate with a base release layer and an upper silicone film.
剥離膜材料には、ポリウレタンを原料とした光硬化樹脂を用い、材料固化時の膜収縮率は10%、液粘度は50cP、膜状態での粘着力が0.08N/mmに対し、引張強さ40N/mm2、膜厚50μmの易剥離性であった。
<比較例1>
実施例1において、第1の塗布工程の塗布手段をスプレーによる液滴噴霧に切り替え、膜厚が50μmとなるよう剥離膜材料の螺旋状塗布を行った。その際、螺旋状塗布における軸方向の移動は1回で終え、積層塗布は実施しなかった。また、第1の固化工程以降は実施例1と同様な方法で剥離膜の乾燥固化およびシリコーン層の形成を行った。
The peelable film material used was a photocurable resin made from polyurethane, and the film shrinkage rate when the material solidified was 10%, the liquid viscosity was 50 cP, the adhesive strength in the film state was 0.08 N/mm, the tensile strength was 40 N/ mm2 , and the film thickness was 50 μm, making it easy to peel.
<Comparative Example 1>
In Example 1, the coating method for the first coating step was changed to droplet spraying using a spray, and the release film material was spirally coated to a film thickness of 50 μm. The axial movement in the spiral coating was completed in one go, and no layer coating was performed. Furthermore, after the first solidification step, the release film was dried and solidified, and a silicone layer was formed in the same manner as in Example 1.
実施例1~3および比較例1の条件で製作した水なしオフセット原版を用い、機能膜の耐久性および剥離膜の剥離性確認を行った結果を以下に示す。耐久性確認は、各原版を回転保持できる試験機にセットし、回転速度200rpmで保持した状態で、版表面にゴムローラを荷重10kgで押しつけ、50時間および100時間後の版面状態を目視で確認した。実施例1~3において、剥離膜の浮きや剥がれ、また、シリコーン膜の剥がれともに100時間経過後も問題は生じなかった。一方、比較例1では、シリコーン膜に剥がれが生じなかったものの、時間の経過とともに剥離膜の一部で膜の割れが発生し、100時間経過前に剥離膜が破れ基材から剥がれた。 The durability of the functional film and the releasability of the release film were confirmed using waterless offset master plates manufactured under the conditions of Examples 1-3 and Comparative Example 1. The results are shown below. To confirm durability, each master plate was set in a testing machine capable of rotating and holding the plate. While held at a rotation speed of 200 rpm, a rubber roller was pressed against the plate surface with a load of 10 kg, and the plate surface condition was visually confirmed after 50 and 100 hours. In Examples 1-3, there were no problems with lifting or peeling of the release film or peeling of the silicone film, even after 100 hours. In Comparative Example 1, however, although there was no peeling of the silicone film, cracks occurred in parts of the release film over time, and the release film broke and peeled off from the substrate before 100 hours had passed.
剥離性確認は、原版の機能膜にカッターで切り込みを入れることで剥離膜を一部破断し、そこを起点に機能膜を指で引っ張ることで、容易に剥離膜を剥離できるか確認した。機能膜の耐久性および剥離膜の剥離性の確認結果を示す。剥離性確認では、いずれの条件でも手で剥離膜を剥離することができたが、比較例1では、剥離の途中で膜が切れやすかった。 To check the peelability, a cut was made in the functional film of the master plate with a cutter, partially breaking the release film, and the functional film was then pulled with the fingers from that point to check whether the release film could be easily peeled off. The results of checking the durability of the functional film and the releaseability of the release film are shown below. In the peelability check, the release film could be peeled off by hand under all conditions, but in Comparative Example 1, the film was prone to tearing during peeling.
100:水なしオフセット原版の製造装置
110:回転駆動手段
111:円柱状基材
112、113:回転中心軸
114、115:支持台
116:アクチュエータ
117:回転速度制御器
121a:第1の塗布ノズル
121b:第2の塗布ノズル
122a:第1の塗布回収ユニット
122b:第2の塗布回収ユニット
123a:第1の送液ポンプ
123b:第2の送液ポンプ
124a:第1の塗材タンク
125b:第2の塗材タンク
131a:第1の塗布器のステージ
131b:第2の塗布器のステージ
132:スライダー
133:アクチュエータ
134:塗布手段の移動を制御する制御器
141:気流による固化手段
142:気流噴射の圧力制御器
143:圧縮気体供給源
150:連動動作制御器
151:膜厚センサ
152:センサ制御器
160:光照射器
161:照射時間を制御する制御器
F:塗材
Fa:第1の塗布工程の塗材
Fb:第2の塗布工程の塗材
R:回転方向
P:往復移動方向
100: Waterless offset master plate manufacturing apparatus 110: Rotation drive means 111: Cylindrical substrate 112, 113: Rotation center shaft 114, 115: Support table 116: Actuator 117: Rotation speed controller 121a: First coating nozzle 121b: Second coating nozzle 122a: First coating and recovery unit 122b: Second coating and recovery unit 123a: First liquid supply pump 123b: Second liquid supply pump 124a: First coating material Tank 125b: Second coating material tank 131a: First applicator stage 131b: Second applicator stage 132: Slider 133: Actuator 134: Controller 141 for controlling movement of coating means: Airflow solidification means 142: Airflow spray pressure controller 143: Compressed gas supply source 150: Interlocking operation controller 151: Film thickness sensor 152: Sensor controller 160: Light irradiator 161: Controller for controlling irradiation time F: Coating material Fa: Coating material for first coating process Fb: Coating material for second coating process R: Rotation direction P: Reciprocating movement direction
Claims (7)
前記剥離膜材料は、乾燥固化後の標準剥離特性において、塗膜厚みが100μm以下のとき、剥離膜の引張強さ[N/mm2]と塗膜厚み[mm]の積が、剥離膜の粘着力[N/mm]を超える剥離膜材料を用い、
前記第1の塗布工程が、前記円柱状基材の軸を中心軸として回転させながら、前記円柱状基材の周面に対し、前記円柱状基材の下方に設けた第1の塗布器から前記剥離膜材料を噴き上げ、前記円柱状基材の表面に前記液状の剥離膜材料を付着させながら塗布する工程であり、
前記第1の固化工程が、前記第1の塗布工程に続き、前記円柱状基材を回転した状態で塗布された剥離膜材料の乾燥固化を行うことで、前記円柱状基材上で塗布された剥離膜材料を収縮させ、前記円柱状基材上に前記剥離膜を形成する工程であり、
前記第2の塗布工程は、第2の塗布器から前記シリコーン膜材料を吐出し、前記剥離膜の表面に前記シリコーン膜材料を塗布する工程であり、
円柱状基材の表面に、少なくとも前記剥離膜とシリコーン膜とを含む積層体が形成される、水なしオフセット原版の製造方法。 A method for manufacturing a waterless offset master plate, comprising: a first coating step of coating a liquid release film material on a surface of a cylindrical substrate; a first solidification step of drying and solidifying the release film material to form a release film on the surface of the cylindrical substrate; a second coating step of coating a silicone film material on the surface of the release film; and a second solidification step of drying and solidifying the silicone film material,
The release film material is a release film material in which, when the coating film thickness is 100 μm or less in terms of standard release characteristics after drying and solidification, the product of the tensile strength [N/mm 2 ] of the release film and the coating film thickness [mm] exceeds the adhesive strength [N/mm] of the release film;
the first coating step is a step of spraying the release film material from a first applicator provided below the cylindrical substrate onto the circumferential surface of the cylindrical substrate while rotating the cylindrical substrate about its axis as a central axis, and coating the liquid release film material onto the surface of the cylindrical substrate while adhering the liquid release film material to the surface of the cylindrical substrate;
the first solidification step is a step of drying and solidifying the applied release film material while rotating the cylindrical substrate following the first application step, thereby shrinking the applied release film material on the cylindrical substrate and forming the release film on the cylindrical substrate;
the second coating step is a step of discharging the silicone film material from a second applicator and coating the silicone film material on the surface of the release film;
A method for producing a waterless offset master plate, in which a laminate including at least the release film and a silicone film is formed on the surface of a cylindrical substrate.
前記円柱状基材を円柱の軸を中心軸として回転せしめるための回転駆動手段と、
前記円柱状基材の周面に塗布された塗膜を固化するエアーノズルからの送風または光照射による固化手段と、
塗膜の膜厚値を計測する測定器と、前記第1および第2の塗布手段と前記固化手段との切り替えを行う制御器を少なくとも有し、
前記の第1および第2の塗布手段は、該円柱状基材の回転軸方向に前記第1の塗布ノズルおよび第2の塗布ノズルを移動させる移動手段を備え、さらに、前記回転駆動手段によって前記円柱状基材を回転した状態で前記第1および第2の塗布ノズルを前記移動手段により移動させることで塗材の塗布を行い、かつ、
前記第2の塗布手段は、前記測定器の測定値に基づき、前記固化手段を停止した後、前記第2の塗布手段による塗布工程を開始する、水なしオフセット原版の製造装置。 a first coating means having a fountain-type first coating nozzle provided below the cylindrical substrate for coating a first coating material on the peripheral surface of the cylindrical substrate; and a second coating means having a second coating nozzle for coating a second coating material on the peripheral surface of the cylindrical substrate;
a rotation drive means for rotating the cylindrical substrate about the axis of the cylinder;
a solidification means for solidifying the coating film applied to the peripheral surface of the cylindrical substrate by blowing air from an air nozzle or irradiating light;
The apparatus includes at least a measuring device for measuring a film thickness value of a coating film, and a controller for switching between the first and second coating means and the solidifying means,
The first and second coating means include a moving means for moving the first coating nozzle and the second coating nozzle in the direction of the rotation axis of the cylindrical substrate, and further, the coating material is applied by moving the first and second coating nozzles by the moving means while the cylindrical substrate is rotated by the rotation drive means, and
The second coating means stops the solidifying means based on the measurement value of the measuring device, and then starts a coating process by the second coating means.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2022058036A JP7722239B2 (en) | 2022-03-31 | 2022-03-31 | Waterless offset master plate manufacturing method and manufacturing device |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2022058036A JP7722239B2 (en) | 2022-03-31 | 2022-03-31 | Waterless offset master plate manufacturing method and manufacturing device |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JP2023149454A JP2023149454A (en) | 2023-10-13 |
| JP7722239B2 true JP7722239B2 (en) | 2025-08-13 |
Family
ID=88288388
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2022058036A Active JP7722239B2 (en) | 2022-03-31 | 2022-03-31 | Waterless offset master plate manufacturing method and manufacturing device |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JP7722239B2 (en) |
Families Citing this family (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN119717594B (en) * | 2024-10-30 | 2026-01-30 | 南京盛凯新材料有限公司 | An EB curing linkage control system for a coating production line |
Citations (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| WO2008018530A1 (en) | 2006-08-09 | 2008-02-14 | Asahi Kasei Chemicals Corporation | Production method and production device of cylindrical print substrate |
| JP2009190330A (en) | 2008-02-15 | 2009-08-27 | Asahi Kasei E-Materials Corp | Resin composition for laser engraving printing master |
Family Cites Families (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS5611258A (en) * | 1979-07-11 | 1981-02-04 | Toray Ind Inc | Installing method for lithoprinting plate to printer drum |
| JPS56113456A (en) * | 1980-02-15 | 1981-09-07 | Canon Inc | Production of original plate for planographic printing |
-
2022
- 2022-03-31 JP JP2022058036A patent/JP7722239B2/en active Active
Patent Citations (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| WO2008018530A1 (en) | 2006-08-09 | 2008-02-14 | Asahi Kasei Chemicals Corporation | Production method and production device of cylindrical print substrate |
| JP2009190330A (en) | 2008-02-15 | 2009-08-27 | Asahi Kasei E-Materials Corp | Resin composition for laser engraving printing master |
Also Published As
| Publication number | Publication date |
|---|---|
| JP2023149454A (en) | 2023-10-13 |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| CN101500817B (en) | Production method and production device of cylindrical print substrate | |
| CN100455720C (en) | Papermaking roll surface coating layer and preparation method thereof | |
| CN1263664C (en) | Adhesive dispenser in reel-up in paper machine | |
| JP7254905B2 (en) | Method for manufacturing three-dimensional moldings by layered material deposition | |
| CN102802955B (en) | For the maintenance unit of printhead | |
| JP7722239B2 (en) | Waterless offset master plate manufacturing method and manufacturing device | |
| WO2015085187A1 (en) | Embossing texture features to roll or sheet | |
| CN104302482B (en) | Cleaning device and method for cleaning a flexographic printing coating device | |
| JP7722238B2 (en) | Waterless offset master plate manufacturing method and manufacturing device | |
| JP7722237B2 (en) | Waterless offset master plate manufacturing method and manufacturing device | |
| JP4749063B2 (en) | Method for manufacturing sleeve printing original plate for laser engraving and apparatus for manufacturing sleeve printing original plate for laser engraving | |
| CN115397651A (en) | System and method for high resolution negative 3D printer | |
| JP4894962B1 (en) | Manufacturing method of cylindrical member | |
| EP3892468B1 (en) | Method and device for obtaining a raised pattern on a substrate | |
| TWI290855B (en) | Coating liquid supply device and slit coat type coating apparatus with the same | |
| KR20150099421A (en) | Gravure printing press | |
| JP2016528521A (en) | Method for manufacturing a cylindrical flexographic printing element | |
| JP4747264B2 (en) | Method for manufacturing sleeve printing original plate for laser engraving and apparatus for manufacturing sleeve printing original plate for laser engraving | |
| JP2025123208A (en) | Cleaning system for moving elements of a coating installation, related coating machine, coating installation and method | |
| JP6359167B1 (en) | Transfer apparatus and transfer method | |
| JP4521976B2 (en) | Method and apparatus for producing adhesive tape | |
| JP6404436B1 (en) | Transfer apparatus and transfer method | |
| CN117940221B (en) | Coating device and coating film forming method | |
| JP4436037B2 (en) | Printing master, plate making apparatus, printing apparatus, and printing method | |
| CN111845082B (en) | Ink-jet environment-friendly construction device for digital printing and debugging method |
Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| A621 | Written request for application examination |
Free format text: JAPANESE INTERMEDIATE CODE: A621 Effective date: 20240904 |
|
| A977 | Report on retrieval |
Free format text: JAPANESE INTERMEDIATE CODE: A971007 Effective date: 20250523 |
|
| A131 | Notification of reasons for refusal |
Free format text: JAPANESE INTERMEDIATE CODE: A131 Effective date: 20250603 |
|
| A521 | Request for written amendment filed |
Free format text: JAPANESE INTERMEDIATE CODE: A523 Effective date: 20250609 |
|
| TRDD | Decision of grant or rejection written | ||
| A01 | Written decision to grant a patent or to grant a registration (utility model) |
Free format text: JAPANESE INTERMEDIATE CODE: A01 Effective date: 20250701 |
|
| A61 | First payment of annual fees (during grant procedure) |
Free format text: JAPANESE INTERMEDIATE CODE: A61 Effective date: 20250714 |
|
| R150 | Certificate of patent or registration of utility model |
Ref document number: 7722239 Country of ref document: JP Free format text: JAPANESE INTERMEDIATE CODE: R150 |