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JP7748855B2 - Dihydroxy compound, epoxy resin, production method thereof, epoxy resin composition, and cured product - Google Patents
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JP7748855B2 - Dihydroxy compound, epoxy resin, production method thereof, epoxy resin composition, and cured product - Google Patents

Dihydroxy compound, epoxy resin, production method thereof, epoxy resin composition, and cured product

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JP7748855B2
JP7748855B2 JP2021184593A JP2021184593A JP7748855B2 JP 7748855 B2 JP7748855 B2 JP 7748855B2 JP 2021184593 A JP2021184593 A JP 2021184593A JP 2021184593 A JP2021184593 A JP 2021184593A JP 7748855 B2 JP7748855 B2 JP 7748855B2
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epoxy resin
dihydroxy compound
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JP2023072206A (en
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正史 梶
ニランジャン スレスタ
浩一郎 大神
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Nippon Steel Chemical and Materials Co Ltd
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Description

本発明は、成形性に優れるとともに、耐熱性、低熱膨張性、耐湿性等にも優れた硬化物を与えるジヒドロキシ化合物、エポキシ樹脂、及びそれらを用いたエポキシ樹脂組成物並びにその硬化物に関するものであり、プリント配線板、半導体封止等の電気電子分野の絶縁材料、炭素繊維複合材料等の分野で好適に使用される。 The present invention relates to dihydroxy compounds and epoxy resins that exhibit excellent moldability and provide cured products with excellent heat resistance, low thermal expansion, and moisture resistance, as well as epoxy resin compositions and cured products using these compounds. These compounds are suitable for use in fields such as printed wiring boards, insulating materials in the electrical and electronic fields (e.g., semiconductor encapsulation), and carbon fiber composite materials.

近年、特に先端材料分野の進歩にともない、より高性能なベース樹脂の開発が求められており、耐熱性、耐湿性等の機能向上に加えて、環境面および安全性向上の観点から、難燃性に優れた樹脂の開発が求められている。また、エポキシ樹脂組成物を調整する際の溶剤溶解性等の取扱性の向上も重要な課題となっている。 In recent years, advances in the field of advanced materials, in particular, have led to a demand for the development of higher-performance base resins. In addition to improved functionality such as heat resistance and moisture resistance, there is also a demand for resins with excellent flame retardancy from the perspectives of environmental friendliness and safety. Another important issue is improving ease of handling, such as solvent solubility, when preparing epoxy resin compositions.

しかしながら、これまで知られているエポキシ樹脂には、これらの要求を十分に満足するものは未だ知られていない。例えば、特許文献1にはフェノールアラルキル樹脂から得られるエポキシ樹脂が提案されているが、耐熱性、耐湿性の点で十分ではなかった。特許文献2にはスーパーエンプラのユニットであるエーテルエーテルケトン基を持つエポキシ樹脂が提案されているが、成形性に難があるとともに、依然、耐熱性が十分ではなかった。特許文献3には、イミド環を有するビスフェノール化合物を硬化剤としたエポキシ樹脂組成物が提案されているが、イソプロピリデン構造を含むため、耐熱性の点で十分ではなかった。特許文献4には、イミド基を有するビスフェノール系エポキシ化合物が開示されているが、やはりイソプロピリデン構造を含むことから耐熱性が不足していた。特許文献5には、特定のビスイミドフェノール誘導体が提案されているが、エポキシ樹脂とした際の溶剤溶解性および硬化剤との相溶性が依然として悪く、エポキシ樹脂組成物の調整が困難であるとともに、熱分解安定性等の耐熱性が十分ではなかった。特許文献6には、イミド骨格を含むエポキシ樹脂が提案されているが、溶剤溶解性を確保するためにビスフェノール類が共重合された構造であるため、依然、熱分解安定性等の耐熱性が十分ではなかった。非特許文献1には、N,N’-ビス(5-ヒドロキシ-1-ナフチル)ピロメリットジイミドから得られるエポキシ樹脂が提案されているが、ピロメリットイミド基の高い剛直性により、依然、溶剤溶解性や硬化剤との相溶性に課題があった。 However, none of the epoxy resins known to date fully satisfy these requirements. For example, Patent Document 1 proposes an epoxy resin derived from a phenol aralkyl resin, but its heat resistance and moisture resistance are insufficient. Patent Document 2 proposes an epoxy resin containing an ether ether ketone group, a unit of super engineering plastics, but it suffers from moldability problems and still lacks heat resistance. Patent Document 3 proposes an epoxy resin composition using a bisphenol compound with an imide ring as a curing agent, but due to the inclusion of an isopropylidene structure, its heat resistance is insufficient. Patent Document 4 discloses a bisphenol-based epoxy compound with an imide group, but due to the inclusion of an isopropylidene structure, its heat resistance is also insufficient. Patent Document 5 proposes a specific bisimide phenol derivative, but when made into an epoxy resin, its solvent solubility and compatibility with the curing agent remain poor, making it difficult to prepare the epoxy resin composition and resulting in insufficient heat resistance, such as thermal decomposition stability. Patent Document 6 proposes an epoxy resin containing an imide skeleton, but because the structure is one in which bisphenols are copolymerized to ensure solvent solubility, heat resistance such as thermal decomposition stability is still insufficient. Non-Patent Document 1 proposes an epoxy resin obtained from N,N'-bis(5-hydroxy-1-naphthyl)pyromellitdiimide, but due to the high rigidity of the pyromellitimide group, there are still issues with solvent solubility and compatibility with curing agents.

特開昭63-238122号公報Japanese Unexamined Patent Publication No. 63-238122 特開2012-46615号公報JP 2012-46615 A 特開平4-328121号公報Japanese Patent Application Publication No. 4-328121 特開平4-36753号公報Japanese Patent Application Publication No. 4-36753 特開2011-173827号公報JP 2011-173827 A 特開2010-90360号公報JP 2010-90360 A

H. Ren, J. Sun, Q. Zhao, Q. Zhou, Qi. Ling, Polymer 49 (2008) 5249-5253H. Ren, J. Sun, Q. Zhao, Q. Zhou, Qi. Ling, Polymer 49 (2008) 5249-5253

本発明の目的は、良好な溶剤溶解性および成形性を有するとともに、優れた耐熱性、耐湿性を発揮する硬化物を得ることができ、積層、成形、注型、接着等の用途に有用なジヒドロキシ化合物およびエポキシ樹脂に加えて、それらの製造方法並びにそれらを用いたエポキシ樹脂組成物、更にはそれらの硬化物を提供することにある。 The object of the present invention is to provide dihydroxy compounds and epoxy resins that have good solvent solubility and moldability, and can produce cured products that exhibit excellent heat resistance and moisture resistance, making them useful for applications such as lamination, molding, casting, and adhesion. The object of the present invention is to provide methods for producing these compounds and epoxy resin compositions using these compounds, as well as cured products thereof.

すなわち、本発明は下記一般式(1)で表される新規なジヒドロキシ化合物である。
(ここで、Xは、単結合、-CH2-、-O-、-CO-、-SO2-、-C(CF3)2-を示し、Aは置換基を有していてもよいナフチレン基を示す。)
That is, the present invention relates to a novel dihydroxy compound represented by the following general formula (1).
(wherein X represents a single bond, —CH—, —O—, —CO—, —SO—, or —C(CF)—, and A represents a naphthylene group which may have a substituent.)

また、本発明は下記一般式(2)で表される新規エポキシ樹脂である。
(ここで、AおよびXは、式(1)と同義であり、nは0~50の数を表す。)
The present invention also relates to a novel epoxy resin represented by the following general formula (2):
(wherein A and X have the same meanings as in formula (1), and n represents a number from 0 to 50.)

また、本発明は上記一般式(1)のジヒドロキシ化合物とエピクロルヒドリンを反応させることを特徴とする上記一般式(2)のエポキシ樹脂の製造方法である。 The present invention also relates to a method for producing an epoxy resin represented by the general formula (2) above, which comprises reacting a dihydroxy compound represented by the general formula (1) above with epichlorohydrin.

さらに、本発明は上記一般式(1)のジヒドロキシ化合物または、上記一般式(2)のエポキシ樹脂をエポキシ樹脂成分中のエポキシ樹脂または、硬化剤成分中の硬化剤の必須成分として配合してなるエポキシ樹脂組成物であり、また、これらのエポキシ樹脂組成物を硬化してなる硬化物である。 Furthermore, the present invention relates to an epoxy resin composition containing the dihydroxy compound of general formula (1) above or the epoxy resin of general formula (2) above as an essential component of the epoxy resin in the epoxy resin component or the curing agent in the curing agent component, and also to a cured product obtained by curing such an epoxy resin composition.

本発明のナフタレン及びイミド構造を有するエポキシ樹脂またはジヒドロキシ化合物を必須成分として含むエポキシ樹脂組成物を硬化して得られる硬化物は、良好な溶剤溶解性や成形性を有するとともに耐熱性、低熱膨張性、耐湿性等に優れた特長を有し、積層、成形、注型、接着等の用途に好適に使用することができる。 The cured product obtained by curing the epoxy resin composition of the present invention, which contains as essential components an epoxy resin or dihydroxy compound having a naphthalene and imide structure, has good solvent solubility and moldability, as well as excellent heat resistance, low thermal expansion, moisture resistance, etc., and is suitable for use in applications such as lamination, molding, casting, and adhesion.

実施例1で得られたエポキシ樹脂AのIRチャートを示す。1 shows an IR chart of epoxy resin A obtained in Example 1. 実施例3で得られたエポキシ樹脂AのIRスペクトルを示す。1 shows an IR spectrum of epoxy resin A obtained in Example 3. 実施例3で得られたエポキシ樹脂AのH-NMRスペクトルを示す。1 shows the H-NMR spectrum of epoxy resin A obtained in Example 3.

以下、本発明を詳細に説明する。
本発明のジヒドロキシ化合物は、一般式(1)で表される。
The present invention will be described in detail below.
The dihydroxy compound of the present invention is represented by the general formula (1).

ここで、Xは、単結合、-CH2-、-O-、-CO-、-SO2-、-C(CF3)2-を示す。耐熱性の観点からは、単結合、-O-、-CO-が好ましく、溶剤溶解性および成形性の観点からは、-O-、-SO2-、-C(CF3)2-が好ましい。また、Aは置換基を有していてもよいナフチレン基を示す。ナフチレン基は、1,4-置換体、1,5-置換体、1,6-置換体、2,6-置換体、2,7-置換体等が例示されるが、溶剤溶解性および耐熱性の観点から、1,5-置換体が好ましい。すなわち、ナフタレンの1位、5位がヒドロキシ基、イミド基に結合していることが好ましい。また置換基としては、例えばアルキル基である。 Here, X represents a single bond, -CH2-, -O-, -CO-, -SO2-, or -C(CF3)2-. From the viewpoint of heat resistance, a single bond, -O-, or -CO- is preferred, while from the viewpoints of solvent solubility and moldability, -O-, -SO2-, or -C(CF3)2- is preferred. Furthermore, A represents a naphthylene group which may have a substituent. Examples of naphthylene groups include 1,4-substituted, 1,5-substituted, 1,6-substituted, 2,6-substituted, and 2,7-substituted groups, with the 1,5-substituted group being preferred from the viewpoint of solvent solubility and heat resistance. In other words, it is preferable that the 1st and 5th positions of the naphthalene are bonded to a hydroxy group or an imide group. Furthermore, examples of the substituent include an alkyl group.

本発明のジヒドロキシ化合物は、水酸基当量が、好ましくは250~3,000g/eq.、より好ましくは280~1,000g/eq.、さらに好ましくは、290~500の範囲である。また、融点または軟化点が、好ましくは120~350℃、より好ましくは150~300℃の範囲である。 The dihydroxy compound of the present invention preferably has a hydroxyl group equivalent weight in the range of 250 to 3,000 g/eq., more preferably 280 to 1,000 g/eq., and even more preferably 290 to 500. The melting point or softening point is preferably in the range of 120 to 350°C, and more preferably 150 to 300°C.

また、本発明のエポキシ樹脂は、一般式(2)で表される。
ここで、XおよびAは、式(1)と同義である。
The epoxy resin of the present invention is represented by general formula (2).
Here, X and A have the same meanings as in formula (1).

一般式(2)において、nは繰り返し数であり、0から50の数を表す。繰り返し数の異なる複数の化合物の混合物である場合は、nの平均値(Σn/Σ分子数)が0から50の範囲にあるものである。好ましいnの値又はその平均値は、適用する用途に応じて異なる。例えば、フィラーの高充填率化が要求される半導体封止材の用途には、低粘度であるものが望ましく、nの値又はその平均値は0~15、好ましくは0.1~10.0、さらに好ましくは0.1~5.0のものである。通常のエポキシ樹脂は、nが0の化合物が生成し、次にそれが重合してnが1の化合物が生成するというような逐次反応によって得られることが多いが、本発明においてもこのようなエポキシ樹脂を有利に使用することができる。また、プリント配線板等の用途には、高分子量のエポキシ樹脂が好適に使用され、この場合のnの値は、2~50、好ましくは5~50、更に好ましくは、10~40である。 In general formula (2), n represents the repeating number and represents a number between 0 and 50. In the case of a mixture of multiple compounds with different repeating numbers, the average value of n (Σn/Σ number of molecules) is between 0 and 50. The preferred value or average value of n varies depending on the intended application. For example, for semiconductor encapsulation applications requiring a high filler loading, a low viscosity is desirable, and the value or average value of n is between 0 and 15, preferably between 0.1 and 10.0, and more preferably between 0.1 and 5.0. Conventional epoxy resins are often obtained by a sequential reaction in which a compound with n = 0 is produced, which is then polymerized to produce a compound with n = 1. Such epoxy resins can also be advantageously used in the present invention. Furthermore, for applications such as printed wiring boards, high-molecular-weight epoxy resins are preferably used; in this case, the value of n is between 2 and 50, preferably between 5 and 50, and more preferably between 10 and 40.

本発明のエポキシ樹脂の好ましい重量平均分子量は、500~6,000の範囲であり、より好ましくは500~3,000の範囲である。また、好ましいエポキシ当量は、300~3,000の範囲であり、より好ましくは300~2,000の範囲、特に好ましくは400~1,000の範囲である。これより大きいと、粘度および軟化点が高くなり、エポキシ樹脂組成物の調整が困難になるとともに、成形性が低下する。本発明のエポキシ樹脂の好ましい軟化点、または融点は、80~350℃、より好ましくは100~300℃の範囲である。また、加水分解性塩素は好ましくは1000ppm以下、より好ましくは500ppm以下である。 The epoxy resin of the present invention preferably has a weight-average molecular weight in the range of 500 to 6,000, more preferably 500 to 3,000. The epoxy equivalent is preferably in the range of 300 to 3,000, more preferably 300 to 2,000, and particularly preferably 400 to 1,000. If it is greater than this, the viscosity and softening point will be high, making it difficult to prepare the epoxy resin composition and reducing moldability. The epoxy resin of the present invention preferably has a softening point or melting point in the range of 80 to 350°C, more preferably 100 to 300°C. The hydrolyzable chlorine content is preferably 1,000 ppm or less, more preferably 500 ppm or less.

本発明のエポキシ樹脂は、特に限定されるものではないが、一般式(1)で表されるジヒドロキシ化合物とエピクロルヒドリンを反応させることにより製造することができる。この反応は、通常のエポキシ化反応と同様に行うことができる。 The epoxy resin of the present invention can be produced by reacting a dihydroxy compound represented by general formula (1) with epichlorohydrin, although this reaction is not particularly limited. This reaction can be carried out in the same manner as a conventional epoxidation reaction.

例えば、一般式(1)で表されるジヒドロキシ化合物を過剰のエピクロルヒドリンに溶解した後、水酸化ナトリウム、水酸化カリウム等のアルカリ金属水酸化物の存在下に、50~150℃、好ましくは、60~120℃の範囲で1~10時間反応させる方法が挙げられる。この際、アルカリ金属水酸化物の使用量は、ジヒドロキシ化合物中の水酸基1モルに対して0.8~2モル、好ましくは0.9~1.2モルの範囲である。また、エピクロルヒドリンはジヒドロキシ化合物中の水酸基に対して過剰に用いられるが、通常、ジヒドロキシ化合物中の水酸基1モルに対して、1.5~15モル、好ましくは2~8モルの範囲である。また、反応の際、四級アンモニウム塩等を添加することができる。四級アンモニウム塩としては、たとえばテトラメチルアンモニウムクロライド、テトラブチルアンモニウムクロライド、ベンジルトリエチルアンモニウムクロライド等があり、その添加量としては、ジヒドロキシ化合物に対して、0.1~2.0wt%の範囲が好ましい。これより少ないと四級アンモニウム塩添加の効果が小さく、これより多いと難加水分解性塩素の生成が多くなり、高純度化が困難になる。更には、ジメチルスルホキシド、ジグライム等の極性溶媒を用いても良く、その添加量は、ジヒドロキシ化合物に対して、10~200wt%の範囲が好ましい。これより少ないと添加の効果が小さく、これより多いと容積効率が低下し経済上好ましくない。反応終了後、過剰のエピクロルヒドリンを留去し、残留物をトルエン、メチルイソブチルケトン等の溶剤に溶解、濾過した後、水洗して無機塩を除去し、次いで溶剤を留去することにより目的のエポキシ樹脂を得ることができる。 For example, a dihydroxy compound represented by general formula (1) can be dissolved in excess epichlorohydrin and then reacted in the presence of an alkali metal hydroxide, such as sodium hydroxide or potassium hydroxide, at 50 to 150°C, preferably 60 to 120°C, for 1 to 10 hours. The alkali metal hydroxide is used in an amount of 0.8 to 2 moles, preferably 0.9 to 1.2 moles, per mole of hydroxyl groups in the dihydroxy compound. Epichlorohydrin is used in excess relative to the hydroxyl groups in the dihydroxy compound, typically 1.5 to 15 moles, preferably 2 to 8 moles, per mole of hydroxyl groups in the dihydroxy compound. A quaternary ammonium salt or the like can also be added during the reaction. Examples of quaternary ammonium salts include tetramethylammonium chloride, tetrabutylammonium chloride, and benzyltriethylammonium chloride. The amount of the quaternary ammonium salt added is preferably 0.1 to 2.0 wt % of the dihydroxy compound. If the amount is less than this, the effect of adding the quaternary ammonium salt is small; if it is more than this, the amount of hardly hydrolyzable chlorine produced increases, making it difficult to achieve high purity. Furthermore, polar solvents such as dimethyl sulfoxide and diglyme may be used, and the amount added is preferably in the range of 10 to 200 wt% relative to the dihydroxy compound. If the amount is less than this, the effect is small; if it is more than this, the volume efficiency decreases, which is undesirable from an economic standpoint. After the reaction is complete, the excess epichlorohydrin is distilled off, and the residue is dissolved in a solvent such as toluene or methyl isobutyl ketone, filtered, washed with water to remove inorganic salts, and the solvent is then distilled off to obtain the desired epoxy resin.

本発明のエポキシ樹脂組成物は、エポキシ樹脂及び硬化剤よりなり、エポキシ樹脂成分として一般式(2)で表されるエポキシ樹脂、または一般式(1)で表されるジヒドロキシ化合物を必須成分として配合したものである。 The epoxy resin composition of the present invention comprises an epoxy resin and a curing agent, and contains, as an essential component, an epoxy resin represented by general formula (2) or a dihydroxy compound represented by general formula (1).

一般式(2)で表されるエポキシ樹脂を必須成分とする場合の硬化剤としては、一般にエポキシ樹脂の硬化剤として知られているものはすべて使用できる。例えば、ジシアンジアミド、多価フェノール類、酸無水物類、芳香族及び脂肪族アミン類等がある。具体的に例示すれば、多価フェノール類としては、例えば、ビスフェノールA、ビスフェノールF、ビスフェノールS、フルオレンビスフェノール、4,4’-ビフェノール、2,2’-ビフェノール、ハイドロキノン、レゾルシン、ナフタレンジオール等の2価のフェノール類、あるいは、トリス-(4-ヒドロキシフェニル)メタン、1,1,2,2-テトラキス(4-ヒドロキシフェニル)エタン、フェノールノボラック、o-クレゾールノボラック、ナフトールノボラック、ポリビニルフェノール等に代表される3価以上のフェノール類、更にはフェノール類、ナフトール類又は、ビスフェノールA、ビスフェノールF、ビスフェノールS、フルオレンビスフェノール、4,4’-ビフェノール、2,2’-ビフェノール、ハイドロキノン、レゾルシン、ナフタレンジオール等の2価のフェノール類のホルムアルデヒド、アセトアルデヒド、ベンズアルデヒド、p-ヒドロキシベンズアルデヒド、p-キシリレングリコール等の縮合剤により合成される多価フェノール性化合物、等があり、酸無水物としては、無水フタル酸、テトラヒドロ無水フタル酸、メチルテトラヒドロ無水フタル酸、ヘキサヒドロ無水フタル酸、メチルヘキサヒドロ無水フタル酸、メチル無水ハイミック酸、無水ナジック酸、無水トリメリット酸等がある。また、アミン類としては、4,4’-ジアミノジフェニルメタン、4,4’-ジアミノジフェニルプロパン、4,4’-ジアミノジフェニルスルホン、m-フェニレンジアミン、p-キシリレンジアミン等の芳香族アミン類、エチレンジアミン、ヘキサメチレンジアミン、ジエチレントリアミン、トリエチレンテトラミン等の脂肪族アミン類、あるいは一般式(1)で表されるジヒドロキシ化合物がある。本発明の樹脂組成物には、これら硬化剤の1種又は、2種以上を混合して用いることができる。本発明のジヒドロキシ樹脂を硬化剤として使用する場合、その配合量は、硬化剤全体中、好ましくは5~100wt%の範囲、より好ましくは30~100wt%の範囲である。 When the epoxy resin represented by general formula (2) is used as an essential component, any curing agent generally known as an epoxy resin curing agent can be used. Examples include dicyandiamide, polyhydric phenols, acid anhydrides, aromatic and aliphatic amines, etc. Specific examples of polyhydric phenols include dihydric phenols such as bisphenol A, bisphenol F, bisphenol S, fluorene bisphenol, 4,4'-biphenol, 2,2'-biphenol, hydroquinone, resorcinol, and naphthalenediol; trihydric or higher phenols such as tris-(4-hydroxyphenyl)methane, 1,1,2,2-tetrakis(4-hydroxyphenyl)ethane, phenol novolac, o-cresol novolac, naphthol novolac, and polyvinylphenol; and phenols, naphthols, bisphenol A, bisphenol B, bisphenol C, bisphenol D, bisphenol E, bisphenol F, bisphenol F, bisphenol F, bisphenol S, fluorene bisphenol, 4,4'-biphenol, 2,2'-biphenol, hydroquinone, resorcinol, and naphthalenediol. and polyhydric phenolic compounds synthesized by condensing dihydric phenols such as phenol F, bisphenol S, fluorene bisphenol, 4,4'-biphenol, 2,2'-biphenol, hydroquinone, resorcinol, and naphthalenediol with condensing agents such as formaldehyde, acetaldehyde, benzaldehyde, p-hydroxybenzaldehyde, and p-xylylene glycol. Acid anhydrides include phthalic anhydride, tetrahydrophthalic anhydride, methyltetrahydrophthalic anhydride, hexahydrophthalic anhydride, methylhexahydrophthalic anhydride, methylhimic anhydride, nadic anhydride, and trimellitic anhydride. Examples of amines include aromatic amines such as 4,4'-diaminodiphenylmethane, 4,4'-diaminodiphenylpropane, 4,4'-diaminodiphenylsulfone, m-phenylenediamine, and p-xylylenediamine; aliphatic amines such as ethylenediamine, hexamethylenediamine, diethylenetriamine, and triethylenetetramine; and dihydroxy compounds represented by general formula (1). The resin composition of the present invention can contain one or more of these curing agents in combination. When the dihydroxy resin of the present invention is used as a curing agent, its amount is preferably 5 to 100 wt %, more preferably 30 to 100 wt %, of the total curing agent.

本発明のエポキシ樹脂組成物には、一般式(2)で表されるエポキシ樹脂以外に、分子中にエポキシ基を2個以上有する通常のエポキシ樹脂をすべて使用できる。例を挙げれば、ビスフェノールA、ビスフェノールS、フルオレンビスフェノール、4,4’-ビフェノール、2,2’-ビフェノール、ハイドロキノン、レゾルシン等の2価のフェノール類、あるいは、トリス-(4-ヒドロキシフェニル)メタン、1,1,2,2-テトラキス(4-ヒドロキシフェニル)エタン、フェノールノボラック、o-クレゾールノボラック等の3価以上のフェノール類、又は、テトラブロモビスフェノールA等のハロゲン化ビスフェノール類から誘導されるグルシジルエーテル化物等がある。これらのエポキシ樹脂は、1種又は、2種以上を混合して用いることができる。この場合、本発明の式(2)で表されるエポキシ樹脂の配合量は、エポキシ樹脂全体中、好ましくは5~100wt%の範囲、より好ましくは50~100wt%の範囲である。 In addition to the epoxy resin represented by general formula (2), the epoxy resin composition of the present invention can use any conventional epoxy resin having two or more epoxy groups in the molecule. Examples include dihydric phenols such as bisphenol A, bisphenol S, fluorene bisphenol, 4,4'-biphenol, 2,2'-biphenol, hydroquinone, and resorcinol; trihydric or higher phenols such as tris-(4-hydroxyphenyl)methane, 1,1,2,2-tetrakis(4-hydroxyphenyl)ethane, phenol novolac, and o-cresol novolac; and glycidyl ethers derived from halogenated bisphenols such as tetrabromobisphenol A. These epoxy resins can be used alone or in combination. In this case, the amount of the epoxy resin represented by formula (2) of the present invention is preferably 5 to 100 wt %, more preferably 50 to 100 wt %, of the total epoxy resin.

一般式(1)で表されるジヒドロキシ化合物を必須成分とする場合のエポキシ樹脂としては、分子中にエポキシ基を2個以上有する通常のエポキシ樹脂をすべて使用できる。 When the dihydroxy compound represented by general formula (1) is used as an essential component of the epoxy resin, any ordinary epoxy resin having two or more epoxy groups in the molecule can be used.

本発明のエポキシ樹脂組成物には、一般式(1)で表されるジヒドロキシ化合物と共に、上述のとおり、一般にエポキシ樹脂の硬化剤として知られているものを併用することもできる。 In the epoxy resin composition of the present invention, a compound generally known as a curing agent for epoxy resins can also be used in combination with the dihydroxy compound represented by general formula (1), as described above.

エポキシ樹脂と硬化剤の配合比率は、エポキシ基と硬化剤中の官能基が当量比で0.8~1.5の範囲であることが好ましい。この範囲外では硬化後も未反応のエポキシ基、又は硬化剤中の官能基が残留する可能性がある。 The blending ratio of epoxy resin to curing agent is preferably in the range of 0.8 to 1.5 in terms of equivalent ratio of epoxy groups to functional groups in the curing agent. Outside this range, unreacted epoxy groups or functional groups in the curing agent may remain after curing.

本発明のエポキシ樹脂組成物中には、ポリエステル、ポリアミド、ポリイミド、ポリエーテル、ポリウレタン、石油樹脂、インデンクマロン樹脂、フェノキシ樹脂等のオリゴマー又は高分子化合物を適宜配合してもよいし、無機充填剤、顔料、難然剤、揺変性付与剤、カップリング剤、流動性向上剤、等の添加剤を配合してもよい。無機充填剤としては、例えば、球状あるいは、破砕状の溶融シリカ、結晶シリカ等のシリカ粉末、アルミナ粉末、ガラス粉末、又はマイカ、タルク、炭酸カルシウム、アルミナ、水和アルミナ、等が挙げられ、顔料としては、有機系又は、無機系の体質顔料、鱗片状顔料等がある。揺変性付与剤としては、シリコン系、ヒマシ油系、脂肪族アマイドワックス、酸化ポリエチレンワックス、有機ベントナイト系、等を挙げることができる。
更に必要に応じて、従来より公知の硬化促進剤を用いることができる。例を挙げれば、アミン類、イミダゾール類、有機ホスフィン類、ルイス酸等がある。添加量としては、通常、エポキシ樹脂100重量部に対して、0.2~5重量部の範囲である。
また更に必要に応じて、本発明の樹脂組成物には、カルナバワックス、OPワックス等の離型剤、γ-グリシドキシプロピルトリメトキシシラン等のカップリング剤、カーボンブラック等の着色剤、三酸化アンチモン等の難燃剤、シリコンオイル等の低応力化剤、ステアリン酸カルシウム等の滑剤等を使用できる。
The epoxy resin composition of the present invention may contain oligomers or polymers such as polyesters, polyamides, polyimides, polyethers, polyurethanes, petroleum resins, indene coumarone resins, and phenoxy resins, as appropriate, and may also contain additives such as inorganic fillers, pigments, flame retardants, thixotropy-imparting agents, coupling agents, and flowability improvers. Examples of inorganic fillers include silica powders such as spherical or crushed fused silica and crystalline silica, alumina powders, glass powders, mica, talc, calcium carbonate, alumina, and hydrated alumina. Examples of pigments include organic or inorganic extender pigments and flake pigments. Examples of thixotropy-imparting agents include silicone-based agents, castor oil-based agents, aliphatic amide waxes, oxidized polyethylene waxes, and organic bentonite-based agents.
Furthermore, if necessary, conventionally known curing accelerators can be used. Examples include amines, imidazoles, organic phosphines, Lewis acids, etc. The amount added is usually in the range of 0.2 to 5 parts by weight per 100 parts by weight of the epoxy resin.
Furthermore, if necessary, the resin composition of the present invention may contain a release agent such as carnauba wax or OP wax, a coupling agent such as γ-glycidoxypropyltrimethoxysilane, a colorant such as carbon black, a flame retardant such as antimony trioxide, a stress reducing agent such as silicone oil, a lubricant such as calcium stearate, or the like.

本発明の硬化物は、上記エポキシ樹脂組成物を注型、圧縮成形、トランスファー成形等の方法により、成形加工して得ることができる。成形する際の温度は、通常、120~280℃の範囲である。 The cured product of the present invention can be obtained by molding the above-mentioned epoxy resin composition using methods such as casting, compression molding, and transfer molding. The molding temperature is typically in the range of 120 to 280°C.

以下、実施例及び比較例に基づき、本発明を具体的に説明する。
実施例1(ジヒドロキシ化合物Aの製造)
セパラブルフラスコに4,4’-オキシジフタル酸二無水物47.5g、5-アミノ-1-ナフトール50.3gをN-メチルピロリドン150mLに溶解し、80℃にて2時間反応させた。反応液にトルエン75mLを加えて昇温しながら、共沸により生成した水を除いた。その後、160℃に昇温し3時間反応を行った。この間、生成する水は系外に除いた。常温に冷却した後、蒸留水750mLを加えて、析出物をろ過により回収した後、水洗、乾燥を行い、粉末状の生成物84.0gを得た(ジヒドロキシ化合物A)。得られたジヒドロキシ化合物Aの融点は211℃であり、水酸基当量は306g/eq.であった。GPC測定から純度は100%であった。赤外吸収スペクトルを図1に示す。
ここで、融点の測定は、日立ハイテクサイエンス製、DSC7020型示差走査熱量分析装置を用いて行い、昇温速度10℃/分で求めた吸熱のピーク温度を融点とした。水酸基当量は、塩化アセチル溶液中で、水酸化カリウムによる電位差滴定を行うことにより測定した。赤外吸収スペクトルは日本分光製、FT/IR-6100型赤外吸収分析計を用いてKBr錠剤法により測定した。
The present invention will be specifically described below based on examples and comparative examples.
Example 1 (Production of dihydroxy compound A)
In a separable flask, 47.5 g of 4,4'-oxydiphthalic dianhydride and 50.3 g of 5-amino-1-naphthol were dissolved in 150 mL of N-methylpyrrolidone and reacted at 80°C for 2 hours. 75 mL of toluene was added to the reaction solution, and the temperature was raised while removing the water generated by azeotropy. The temperature was then raised to 160°C and the reaction was continued for 3 hours. During this time, the water generated was removed from the system. After cooling to room temperature, 750 mL of distilled water was added, and the precipitate was collected by filtration, washed with water, and dried to obtain 84.0 g of a powdery product (dihydroxy compound A). The melting point of the resulting dihydroxy compound A was 211°C, and the hydroxyl equivalent was 306 g/eq. GPC measurement indicated that the purity was 100%. The infrared absorption spectrum is shown in Figure 1.
The melting point was measured using a Hitachi High-Tech Science DSC7020 differential scanning calorimeter, and the endothermic peak temperature measured at a heating rate of 10°C/min was taken as the melting point. The hydroxyl group equivalent was measured by potentiometric titration with potassium hydroxide in an acetyl chloride solution. The infrared absorption spectrum was measured by the KBr tablet method using a JASCO FT/IR-6100 infrared absorption analyzer.

実施例2(ジヒドロキシ化合物Bの製造)
セパラブルフラスコに3,3’,4,4’-ビフェニルテトラカルボン酸二無水物45.0g、5-アミノ-1-ナフトール50.3gを用いて、実施例1と同様の反応を行い、粉末状の生成物82.8gを得た(ジヒドロキシ化合物B)。得られたジヒドロキシ化合物Bの融点は210℃であり、水酸基当量は296g/eq.であった。GPC測定から純度は100%であった。
Example 2 (Production of dihydroxy compound B)
A reaction similar to that in Example 1 was carried out using 45.0 g of 3,3',4,4'-biphenyltetracarboxylic dianhydride and 50.3 g of 5-amino-1-naphthol in a separable flask, yielding 82.8 g of a powdery product (dihydroxy compound B). The melting point of the resulting dihydroxy compound B was 210°C, and the hydroxyl equivalent was 296 g/eq. GPC measurement revealed that the purity was 100%.

実施例3(エポキシ樹脂Aの合成)
実施例1で得たジヒドロキシ化合物A20gをエピクロルヒドリン125g及びN-メチルピロリドン75gに溶解し、減圧下(約130mmHg)、65℃にて48.6%水酸化ナトリウム水溶液5.5gを4時間かけて滴下した。この間、生成する水はエピクロルヒドリンとの共沸により系外に除き、留出したエピクロルヒドリンは系内に戻した。反応後、エピクロルヒドリンを減圧留去した後、反応液を大量の蒸留水に滴下した。生成物のろ過、水洗を行った後、乾燥し、黄褐色のエポキシ樹脂19gを得た(エポキシ樹脂A)。得られたエポキシ樹脂の融点は185℃、エポキシ当量は362g/eq.、加水分解性塩素は560ppmであった。GPC測定から一般式(2)のn=0が89%、n=1が9%、であった。ここで、GPC測定は、装置:HLC-8320(東ソー(株)製)及びカラム:TSKgel SuperHZ2500×2本及びTSKgel SuperHZ2000×2本(何れも東ソー(株)製)を用い、溶媒:テトラヒドロフラン、流速:0.35ml/分、温度:40℃、検出器:RIの条件で行った。赤外吸収スペクトルを図2に示す。
ここで、エポキシ当量は、臭化テトラエチルアンモニウムの酢酸溶液中で、過塩素酸による電位差滴定を行うことにより測定した。加水分解性塩素は、樹脂試料0.5gを1,4-ジオキサン30mlに溶解させたものを1N-KOH/メタノール溶液5mlで30分間煮沸還流したものを、硝酸銀溶液で電位差滴定を行うことにより求めた。H-NMRの測定は、JEOL RESONANCE製、JNM-ECA600型測定装置を用いて、DMSO-d6を溶媒として行った。測定結果を図3に示す。
Example 3 (Synthesis of Epoxy Resin A)
20 g of dihydroxy compound A obtained in Example 1 was dissolved in 125 g of epichlorohydrin and 75 g of N-methylpyrrolidone, and 5.5 g of 48.6% aqueous sodium hydroxide solution was added dropwise over 4 hours at 65°C under reduced pressure (approximately 130 mmHg). During this time, the water produced was removed from the system by azeotropy with epichlorohydrin, and the distilled epichlorohydrin was returned to the system. After the reaction, the epichlorohydrin was distilled off under reduced pressure, and the reaction solution was added dropwise to a large amount of distilled water. The product was filtered, washed with water, and dried to obtain 19 g of a yellowish-brown epoxy resin (epoxy resin A). The resulting epoxy resin had a melting point of 185°C, an epoxy equivalent of 362 g/eq., and a hydrolyzable chlorine content of 560 ppm. GPC analysis revealed that 89% of the general formula (2) was n=0 and 9% was n=1. The GPC measurement was carried out using an apparatus: HLC-8320 (manufactured by Tosoh Corporation) and columns: two TSKgel Super HZ2500 columns and two TSKgel Super HZ2000 columns (both manufactured by Tosoh Corporation) under the conditions of a solvent: tetrahydrofuran, a flow rate: 0.35 ml/min, a temperature: 40°C, and a detector: RI. The infrared absorption spectrum is shown in Figure 2.
Here, the epoxy equivalent was measured by potentiometric titration with perchloric acid in an acetic acid solution of tetraethylammonium bromide. Hydrolyzable chlorine was determined by dissolving 0.5 g of a resin sample in 30 ml of 1,4-dioxane, boiling and refluxing the solution with 5 ml of a 1N-KOH/methanol solution for 30 minutes, and then potentiometric titration with a silver nitrate solution. 1 H-NMR measurements were performed using a JNM-ECA600 measuring apparatus manufactured by JEOL RESONANCE, using DMSO-d6 as the solvent. The measurement results are shown in Figure 3.

実施例4(エポキシ樹脂Bの合成)
実施例2で得たジヒドロキシ化合物B23g、エピクロルヒドリン150g、N-メチルピロリドン75g、48.6%水酸化ナトリウム水溶液6.6gを用いて実施例3と同様に反応を行い、茶白色のエポキシ樹脂22gを得た(エポキシ樹脂B)。得られたエポキシ樹脂の融点は159℃、エポキシ当量は347g/eq.、加水分解性塩素は340ppmであった。GPC測定から一般式(2)のn=0が88%、n=1が11%であった。
Example 4 (Synthesis of Epoxy Resin B)
A reaction was carried out in the same manner as in Example 3 using 23 g of dihydroxy compound B obtained in Example 2, 150 g of epichlorohydrin, 75 g of N-methylpyrrolidone, and 6.6 g of 48.6% aqueous sodium hydroxide solution, to obtain 22 g of a brownish-white epoxy resin (epoxy resin B). The resulting epoxy resin had a melting point of 159°C, an epoxy equivalent of 347 g/eq., and a hydrolyzable chlorine content of 340 ppm. GPC measurement revealed that 88% of the general formula (2) was n=0 and 11% was n=1.

参考例1(ジヒドロキシ化合物Cの製造)
3,3’,4,4’-ビフェニルテトラカルボン酸二無水物51.0g、4-アミノ-m-クレゾール42.7gを用いて、実施例1と同様の反応を行い、粉末状の生成物81gを得た(ジヒドロキシ化合物C)。GPC測定から純度は100%であった。
Reference Example 1 (Production of Dihydroxy Compound C)
The same reaction as in Example 1 was carried out using 51.0 g of 3,3',4,4'-biphenyltetracarboxylic dianhydride and 42.7 g of 4-amino-m-cresol to obtain 81 g of a powdery product (dihydroxy compound C). GPC measurement revealed that the purity was 100%.

参考例2(エポキシ樹脂Cの合成)
参考例1で得たジヒドロキシ化合物C20g、エピクロルヒドリン180g、N-メチルピロリドン90g、48.6%水酸化ナトリウム水溶液6.5gを用いて実施例3と同様に反応を行い、茶白色のエポキシ樹脂34gを得た(エポキシ樹脂C)。得られたエポキシ樹脂の融点は260℃、エポキシ当量は328g/eq.であった。
Reference Example 2 (Synthesis of Epoxy Resin C)
Using 20 g of dihydroxy compound C obtained in Reference Example 1, 180 g of epichlorohydrin, 90 g of N-methylpyrrolidone, and 6.5 g of a 48.6% aqueous solution of sodium hydroxide, a reaction was carried out in the same manner as in Example 3 to obtain 34 g of a brownish-white epoxy resin (epoxy resin C). The resulting epoxy resin had a melting point of 260°C and an epoxy equivalent of 328 g/eq.

参考例3(ジヒドロキシ化合物Dの製造)
4,4’-オキシジフタル酸二無水物51.0g、4-アミノ-m-クレゾール40.5gを用いて、実施例1と同様の反応を行い、粉末状の生成物77gを得た(ジヒドロキシ化合物D)。GPC測定から純度は100%であった。
Reference Example 3 (Production of dihydroxy compound D)
Using 51.0 g of 4,4'-oxydiphthalic dianhydride and 40.5 g of 4-amino-m-cresol, a reaction similar to that in Example 1 was carried out to obtain 77 g of a powdery product (dihydroxy compound D). GPC measurement revealed that the purity was 100%.

参考例4(エポキシ樹脂Dの合成)
参考例3で得たジヒドロキシ化合物D15g、エピクロルヒドリン105g、N-メチルピロリドン30g、48.6%水酸化ナトリウム水溶液4.4gを用いて実施例3と同様に反応を行い、茶色のエポキシ樹脂16gを得た(エポキシ樹脂D)。得られたエポキシ樹脂の融点は170℃、エポキシ当量は324g/eq.であった。
Reference Example 4 (Synthesis of Epoxy Resin D)
A reaction was carried out in the same manner as in Example 3 using 15 g of dihydroxy compound D obtained in Reference Example 3, 105 g of epichlorohydrin, 30 g of N-methylpyrrolidone, and 4.4 g of a 48.6% aqueous solution of sodium hydroxide to obtain 16 g of a brown epoxy resin (epoxy resin D). The melting point of the obtained epoxy resin was 170°C, and the epoxy equivalent was 324 g/eq.

実施例5~7及び比較例1~3
実施例3および4、参考例3および4で合成したエポキシ樹脂(エポキシ樹脂A~D)、ジフェニルエーテル系エポキシ樹脂(エポキシ樹脂E:日鉄ケミカル&マテリアル製、YSLV-80DE、エポキシ当量163、融点81℃)、o-クレゾールノボラック型エポキシ樹脂(エポキシ樹脂F;日本化薬製、EOCN-1020、エポキシ当量 200、軟化点55℃)、実施例1で合成したジヒドロキシ化合物(硬化剤A)、フェノールノボラック(硬化剤B;アイカ工業製、BRG-557、水酸基当量104、軟化点83℃)を用い、硬化促進剤として
1636678999873_0
(TMP)を用いて、表1に示す配合で計り取り、180℃にて撹拌混合を行い、樹脂組成物とした。
これを用いて、プレス成形機にて成形(190℃、5分)した後、ポストキュア(175℃、4時間)を行って試験片を得て、種々の物性試験に供した。試験方法は、以下のとおり。結果を表1に示す。
Examples 5 to 7 and Comparative Examples 1 to 3
The epoxy resins synthesized in Examples 3 and 4 and Reference Examples 3 and 4 (epoxy resins A to D), diphenyl ether-based epoxy resin (epoxy resin E: manufactured by Nippon Steel Chemical & Material Co., Ltd., YSLV-80DE, epoxy equivalent 163, melting point 81°C), o-cresol novolac-type epoxy resin (epoxy resin F: manufactured by Nippon Kayaku Co., Ltd., EOCN-1020, epoxy equivalent 200, softening point 55°C), the dihydroxy compound synthesized in Example 1 (curing agent A), and phenol novolac (curing agent B: manufactured by Aica Kogyo Co., Ltd., BRG-557, hydroxyl group equivalent 104, softening point 83°C) were used as curing accelerators.
1636678999873_0
The components were weighed out in the proportions shown in Table 1 using a thermoplastic polymer (TMP), and mixed with stirring at 180° C. to prepare a resin composition.
The resulting mixture was molded in a press (190°C, 5 minutes), and then post-cured (175°C, 4 hours) to obtain test pieces, which were then subjected to various physical property tests. The test methods were as follows. The results are shown in Table 1.

[評価]
(1)混練性
表1に示す配合で計り取り、粉体混合したものを180℃にて撹拌混合を行った際の溶融混合状態を観察した。評価は以下のとおり。
〇;エポキシ樹脂および硬化剤が均一に溶融混合した。
△;エポキシ樹脂と硬化剤に僅かに未混合部分が残存した。
×;エポキシ樹脂と硬化剤が均一に溶融せず、未混合部分が残存した。
(2)成形性
樹脂組成物を粉砕し粉体としたものを190℃に加熱した金型に仕込み、プレス成形を行い、成形後の試験片の表面状態を目視にて観察した。評価は以下のとおり。
〇;金型内に未充填部なし。成形物の表面平滑性良好。
△;金型内の四隅に未充填部分あり。成形物の表面に凹凸あり。
×;金型内の全体的に未充填部分あり。成形物全体にボイドが発生し、脆い成形物となった。
(3)線膨張係数、ガラス転移温度
日立ハイテクサイエンス製TMA7100型熱機械測定装置を用いて、昇温速度10℃/分にて測定した。
(4)熱分解温度、残炭率
日立ハイテクサイエンス製TG/DTA7300型熱重量測定装置により、窒素気流下、昇温速度10℃/分の条件にて10wt%重量減少時の熱分解温度及び700℃での残炭率を求めた。
(5)吸水率
直径50mm、厚さ3mmの円盤を成形し、ポストキュア後、85℃、相対湿度85%の条件で100時間吸湿させた後の重量変化率とした。
[evaluation]
(1) Kneadability The components in the formulation shown in Table 1 were weighed out and mixed in powder form, and the mixture was stirred and mixed at 180° C. The state of the melted mixture was observed. The evaluation was as follows:
◯: The epoxy resin and hardener were melted and mixed uniformly.
Δ: A small amount of unmixed epoxy resin and curing agent remained.
×: The epoxy resin and the curing agent were not uniformly melted, and unmixed portions remained.
(2) Moldability The resin composition was pulverized into powder and charged into a mold heated to 190°C, followed by press molding. The surface condition of the molded test piece was visually observed. The evaluation was as follows:
◯: No unfilled areas in the mold. The surface smoothness of the molded product is good.
△: There are unfilled areas in the four corners of the mold. The surface of the molded product is uneven.
×: Unfilled areas were found throughout the mold, voids were generated throughout the molded product, and the molded product was brittle.
(3) Linear expansion coefficient and glass transition temperature: Measurements were made using a Hitachi High-Tech Science TMA7100 thermomechanical measuring device at a temperature rise rate of 10° C./min.
(4) Thermal decomposition temperature and residual carbon ratio Using a Hitachi High-Tech Science TG/DTA7300 thermogravimetric analyzer, the thermal decomposition temperature at which a weight loss of 10 wt % was achieved and the residual carbon ratio at 700°C were determined under conditions of a nitrogen gas flow and a heating rate of 10°C/min.
(5) Water Absorption Rate A disk having a diameter of 50 mm and a thickness of 3 mm was molded, and after post-curing, the weight change rate after absorbing moisture for 100 hours under conditions of 85°C and a relative humidity of 85% was measured.

Claims (3)

下記一般式(2)、The following general formula (2):
(ここで、Xは、単結合又は-O-を示し、Aは置換基を有していてもよいナフチレン基を示す。nは0~50の数を表す。)(wherein X represents a single bond or —O—, A represents a naphthylene group which may have a substituent, and n represents a number from 0 to 50.)
で表されることを特徴とするエポキシ樹脂。An epoxy resin characterized by being represented by the formula:
エポキシ樹脂及び硬化剤よりなるエポキシ樹脂組成物において、エポキシ樹脂成分として請求項に記載のエポキシ樹脂を配合することを特徴とするエポキシ樹脂組成物。 10. An epoxy resin composition comprising an epoxy resin and a curing agent, wherein the epoxy resin according to claim 1 is blended as an epoxy resin component. 請求項に記載のエポキシ樹脂組成物を硬化してなる硬化物。 A cured product obtained by curing the epoxy resin composition according to claim 2 .
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JP2009084360A (en) 2007-09-28 2009-04-23 Sumitomo Bakelite Co Ltd Epoxy resin composition, epoxy resin composition for semiconductor encapsulation, and semiconductor device
JP2010090360A (en) 2008-09-11 2010-04-22 Japan Epoxy Resin Kk Soluble imide-skeleton resin, soluble imide-skeleton resin solution composition, curable resin composition, and cured product thereof
JP2014132074A (en) 2012-12-06 2014-07-17 Mitsubishi Chemicals Corp Epoxy resin, epoxy resin composition, cured product, and laminate for electric/electronic circuit

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JP2009084360A (en) 2007-09-28 2009-04-23 Sumitomo Bakelite Co Ltd Epoxy resin composition, epoxy resin composition for semiconductor encapsulation, and semiconductor device
JP2010090360A (en) 2008-09-11 2010-04-22 Japan Epoxy Resin Kk Soluble imide-skeleton resin, soluble imide-skeleton resin solution composition, curable resin composition, and cured product thereof
JP2014132074A (en) 2012-12-06 2014-07-17 Mitsubishi Chemicals Corp Epoxy resin, epoxy resin composition, cured product, and laminate for electric/electronic circuit

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Synthesis and characterization of a novel heat resistant epoxy resin based on N,N'-bis(5-hydroxy-1-naphthyl)pyromellitic diimide,Polymer,2008年,Vol.49, No.24,pp.5249-5253
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