JP7757129B2 - mask - Google Patents

Description

The present invention relates to a mask.

COVID-19 infections have been spreading since January 2020. Many people around the world have been forced to wear masks to prevent the spread of infection. Various research efforts have been conducted on masks, as disclosed in Patent Document 1, for example. Now that masks have become a part of everyday life, a new requirement for masks is that they also improve the appearance of the wearer.

JP 2017-48486 A

The inventors have confirmed that a mask can enhance the three-dimensional appearance of the wearer's face. By enhancing the three-dimensional appearance of the face, the wearer's appearance can be improved. The present invention was made with this in mind, and aims to provide a mask that enhances the three-dimensional appearance of the wearer's face.

<1> A mask body having a pattern;
and ear loops extending from both sides of the mask body in the width direction.
the pattern includes a plurality of pattern elements arranged two-dimensionally;
A mask in which, in a first region that is at least a part of the mask body, the plurality of pattern elements vary in at least one of the following: the spacing between two adjacent pattern elements in the width direction; and the ratio of the length of each pattern element along the width direction to the length of the pattern element along the up-down direction perpendicular to the width direction.

<2> A mask according to <1>, wherein in the first region, at least one of the spacing between two adjacent pattern elements in the width direction and the ratio of the length of each pattern element along the width direction to the length of that pattern element along the up-down direction is smaller on the outside in the width direction.

<3> A mask according to <1> or <2>, wherein the first region includes a region that is outward in the width direction from a position facing the tops of the mask wearer's cheekbones.

<4> A mask according to any one of <1> to <3>, wherein the first region includes a region that is on the outside in the width direction of a line connecting a position facing the top of each cheekbone of the mask wearer and a position facing the top of the chin of the mask wearer.

<5> A mask according to any one of <1> to <4>, wherein the first region straddles a straight line connecting a position facing the top of each cheekbone of the mask wearer and a position facing the top of the chin of the mask wearer.

<6> A mask according to <1>, wherein in the first region, at least one of the spacing between two adjacent pattern elements in the width direction and the ratio of the length of each pattern element along the width direction to the length of that pattern element along the up-down direction is smaller on the inside in the width direction.

<7> A mask according to <1> or <6>, wherein the first region includes a position facing the mask wearer's nose.

<8> A mask according to <1>, <6>, or <7>, wherein the first region straddles the center line of the mask body in the width direction.

<9> A mask according to any one of <1> to <8>, in which at least one of the following changes occurs in a second region that constitutes at least a part of the mask body: the spacing between two pattern elements adjacent in the vertical direction, and the ratio of the length of each pattern element along the vertical direction to the length of that pattern element along the width direction.

<10> The mask of <9>, wherein the first region at least partially overlaps with the second region.

<11> A mask body having a pattern;
and ear loops extending from both sides of the mask body in the width direction.
the pattern includes a plurality of pattern elements arranged two-dimensionally;
A mask in which, in a second region that is at least a part of the mask body, at least one of the spacing between two adjacent pattern elements in a vertical direction perpendicular to the width direction and the ratio of the length of each pattern element along the vertical direction to the length of the pattern element along the width direction changes.

<12> A mask according to any one of <9> to <11>, wherein in the second region, at least one of the spacing between two pattern elements adjacent in the vertical direction and the ratio of the length of each pattern element along the vertical direction to the length of that pattern element along the width direction is smaller on the lower side in the vertical direction.

<13> A mask according to any one of <9> to <12>, wherein the second region includes a region that is lower in the vertical direction than the position facing the top of the mask wearer's chin.

<14> A mask according to any one of <9> to <13>, wherein the second region includes a region that is below, in the up-down direction, a line connecting a position facing the top of each cheekbone of the mask wearer and a position facing the top of the chin of the mask wearer.

<15> A mask according to any one of <9> to <14>, wherein the second region straddles a straight line connecting a position facing the top of each cheekbone of the mask wearer and a position facing the top of the chin of the mask wearer.

<16> A mask according to any one of <9> to <12>, wherein the second region includes at least a position facing the nose of the mask wearer.

<17> A mask according to any one of <9> to <11> and <16>, wherein the second region straddles the center line of the mask body in the width direction.

<18> A mask according to any one of <1> to <17>, wherein the plurality of pattern elements are arranged apart from one another.

<19> A mask according to any one of <1> to <18>, wherein the dimensions of the plurality of pattern elements are 0.2 mm or more and 30 mm or less.

<20> A mask according to any one of <1> to <19>, wherein the color of the plurality of pattern elements is different from the color of the area of the mask body where the pattern elements are not provided.

This invention can enhance the three-dimensional appearance of the mask wearer's face.

FIG. 1 is a diagram for explaining an embodiment of the present invention, and is a plan view showing a mask in a folded state. FIG. 2 is a front view of a wearer wearing the mask of FIG. 1. FIG. 3 is a front view of a person without a mask. FIG. 4 is an enlarged plan view showing the outer first region included in the mask of FIG. FIG. 5 is an enlarged plan view showing the inner first region included in the mask of FIG. FIG. 6 is an enlarged plan view showing the lower second region included in the mask of FIG. FIG. 7 is a plan view showing a modified example of the pattern on the mask body.

One specific example of this implementation will be described below with reference to the specific example shown in the drawings. In the embodiment described below, the mask is designed to emphasize the three-dimensional appearance of the wearer's face.

In this specification, terms that specify shapes and geometric conditions, as well as their degrees, such as "parallel," "orthogonal," and "identical," as well as length and angle values, are not limited to their strict meanings, but are interpreted to include the range of degrees to which similar functions can be expected.

In the drawings accompanying this specification, the scale and aspect ratios have been appropriately altered and exaggerated from those of the actual objects for ease of illustration and understanding. Throughout this specification, terms such as "front," "back," "up," "down," "left," "right," "inside," and "outside" used with respect to a mask wearer, a mask, and mask components mean "front," "back," "up," "down," "left," "right," "inside," and "outside" relative to the wearer wearing the mask, unless otherwise specified. Therefore, "front" is the side facing the wearer when viewed from the front. "Down" is the side closer to the wearer's torso, and "up" is the opposite of "down."

As shown in Figures 1 and 2, the mask 10 has a mask body 20 and ear loops 30 extending from the mask body 20. The mask 10 can prevent the spread of droplets and other particles from the wearer. The mask 10 can also prevent the wearer from inhaling foreign objects and other particles.

As shown in FIG. 2, the mask 10 covers the nostrils and mouth of the wearer P. The mask 10 may cover the top CL of the wearer P's left cheekbone when viewed from the front. The mask 10 may cover the top CR of the wearer P's right cheekbone when viewed from the front. The mask 10 may cover the top CH of the wearer P's chin when viewed from the front. The mask 10 may cover the top N of the wearer P's nose when viewed from the front.

As shown in Figure 3, in this specification, "top of cheekbone" means the position where the wearer P's cheekbone protrudes most forward. In this specification, "top of chin" means the position where the wearer P's chin protrudes most forward. In this specification, "tip of nose" means the position where the wearer P's nose protrudes most forward.

The mask 10 may be foldable by folding along the folding lines 40. The folded mask 10 is in the form of a flat sheet, as shown in FIG. 1. In the folded mask 10, the mask body 20 is folded and overlapped. In the folded mask 10, the pair of ear loops 30 overlap. The mask 10 can be unfolded by moving the pair of ear loops 30 away from each other and unfolding the folded mask body 20. As shown in FIG. 1, the folding lines 40 may extend in a curved line.

The illustrated mask 10 has a bilaterally symmetrical shape with respect to the folding line 40. The mask 10 includes a left mask half 10L and a right mask half 10R, which are separated by the folding line 40. In the example shown in FIG. 1, the left mask half 10L and the right mask half 10R are stacked on top of each other, forming the mask 10 in a sheet-like shape. FIG. 1 shows only the left mask half 10L, of the bilaterally symmetrical mask halves. The left mask half 10L and the right mask half 10R may be integrally formed. The left mask half 10L and the right mask half 10R may also be formed as separate bodies and joined at the folding line 40. The joining may be by welding or sewing.

As shown in FIG. 1, the fold line 40 has an upper end 41 and a lower end 42. The upper end 41 is the end closest to the wearer P's eyes when the mask 10 is worn. The lower end 42 is the end farthest from the wearer P's eyes when the mask 10 is worn.

In the example shown in FIG. 1, the first direction parallel to the line connecting the upper end 41 and lower end 42 of the folding line 40 is the up-down direction DA of the mask 10. In the example shown in FIG. 1, the second direction perpendicular to the first direction is the width direction DB. The width direction DB is also called the left-right direction. The ear loops 30 extend outward from the mask body 20 in the width direction DB. In FIG. 1 and FIGS. 4 to 6, which will be referred to later, the up-down direction DA and the width direction DB are indicated by arrows. In the up-down direction DA, the tip of the arrow is the upper side, and the opposite side is the lower side. In the width direction DB, the tip of the arrow is the outer side, and the opposite side is the inner side. "Inside" means the side closer to the center in each direction, and "outside" means the side away from the center in each direction. In the example shown, the inner side in the width direction means the side closer to the folding line 40 in the width direction.

As shown in Figure 1, the extending fold line 40 is curved and bulges out from the straight line connecting the upper end 41 and lower end 42 of the fold line 40. As shown in Figure 2, when observed from a position directly facing the mask wearer P, the fold line 40 extends in the up-down direction DA.

The elements that make up the mask 10 will be described with reference to Figure 1, which shows the left mask half 10L. Unless otherwise specified, the following description of the elements that make up the left mask half 10L also applies to the right mask half 10R.

The mask body 20 is positioned facing the nostrils and mouth of the wearer P. The mask body 20 covers the nostrils and mouth of the wearer P. The mask body 20 has a certain length in the up-down direction DA and the width direction DB. The mask body 20 has a bilaterally symmetrical shape with respect to the folding line 40. The mask body 20 includes a left mask body 20L and a right mask body 20R, which are separated by the folding line 40. In the example shown in FIG. 1, the left mask body 20L and the right mask body 20R are stacked on top of each other, forming the mask body 20 in a flat sheet shape. FIG. 1 shows only the left mask body 20L of the bilaterally symmetrical mask bodies. The left mask body 20L and the right mask body 20R may be formed integrally. The left mask body 20L and the right mask body 20R may be formed separately and joined at the folding line 40. The joining may be by welding or sewing.

The mask body 20 includes a pair of outer edges 22 spaced apart from each other in the width direction DB. The left mask body 20L includes one outer edge 22, and the right mask body 20R includes one outer edge 22. In the illustrated example, each outer edge 22 extends linearly between the connection points of the ear loops 30 and the mask body 20. The outer edges 22 are inclined at an angle θ22 with respect to the up-down direction DA so that they move inward in the width direction DB as they move upward in the up-down direction DA.

The mask body 20 includes an upper edge 23 and a lower edge 24 that are spaced apart in the vertical direction DA. The upper edge 23 is located at the top of the mask body 20 in the vertical direction. The upper edge 23 extends in a curved manner between the upper end 41 of the folding line 40 and the ear loops 30, curving downward in the vertical direction DA relative to the width direction DB. The lower edge 24 extends in a straight line between the lower end 42 of the folding line 40 and the ear loops 30. The lower edge 24 is inclined at an angle θ24 with respect to the width direction so that it extends upward in the vertical direction DA as it extends outward in the width direction DB.

The mask body 20 may be a single-layer structure or a multi-layer structure. A multi-layer mask body 20 may include a top layer, a filter layer, and a lining layer, in that order from front to back. "Back" refers to the side facing the wearer. "Front" refers to the side facing away from the wearer.

The surface layer may have a color or texture that can enhance its design. The surface layer may also have a filtering function that prevents droplets and foreign matter from passing through. A puff material layer (puff-like material layer) or nonwoven fabric can be used as the surface layer. A puff material layer is a material with a texture similar to that of a puff used to apply powder cosmetics such as foundation to the skin. Specific examples of puff materials include porous layers such as sponges made from natural rubber, synthetic rubber, or resins such as polyester or nylon. Examples of nonwoven fabrics that form the surface layer include nonwoven fabrics made from resins or fibers such as polyester or nylon. The surface layer may also contain heat-dissipating materials, deodorizing materials, antibacterial materials, etc.

The filter layer exhibits a filtering function, preventing the passage of droplets and foreign matter. Examples of filter layers include nonwoven fabrics made from resins or fibers such as polyester or nylon, and resin layers made from urethane or other materials. The filter layer has voids that allow ventilation for breathing. However, it is preferable that these voids are large enough to effectively prevent the passage of droplets such as saliva and foreign matter such as pollen and dust.

The lining layer comes into contact with the skin of the mask wearer P, so it is preferable that the layer be made of a material that feels comfortable against the skin. Examples of lining layer materials include textiles such as woven fabrics and nonwoven fabrics. Examples of nonwoven fabrics that form the lining layer include nonwoven fabrics made of resins or fibers such as polyester or nylon. The lining layer may also contain heat-dissipating materials, deodorizing materials, antibacterial materials, etc. The lining layer may also be made of a different material from the outer layer.

The mask body 20 includes a pattern 50. The pattern 50 has a plurality of pattern elements 51. The pattern elements 51 are observable by an observer facing the mask wearer P. The plurality of pattern elements 51 may be provided on the outermost surface of the mask body 20, i.e., the surface opposite the surface facing the wearer P. The plurality of pattern elements 51 may also be provided on a surface other than the outermost surface of the mask body 20 so that the observer can observe them through a surface layer or the like.

The multiple pattern elements 51 are arranged two-dimensionally. Therefore, the multiple pattern elements 51 may be dispersed in at least two or more non-parallel directions. The multiple pattern elements 51 may also be aligned in at least two or more non-parallel directions.

The shape of the pattern elements 51 is not particularly limited. The pattern elements 51 may be figures, designs, lines, colors, pictures, characters, marks, pictograms, letters, numbers, etc. Multiple pattern elements 51 may be identical to each other, may have the same shape but different orientations, or may have different shapes and sizes. As a figure, the pattern elements 51 may be, for example, polygonal shapes such as rectangular, rhombic, triangular, or quadrangular, or may be circular or elliptical. The pattern elements 51 in the example shown in Figure 7 can be said to be rectangular.

In the example shown in Figures 1 and 2, the multiple pattern elements 51 are configured identically, except for the first region S1 and second region S2 described below. In the example shown, each pattern element 51 is circular, except for the first region S1 and second region S2. In the first region S1 and second region S2, each pattern element 51 has a shape that is a squashed ellipse or circle, or an elongated ellipse or circle.

Two adjacent pattern elements 51 may be partially connected. In the first region S1 and the second region S2 described below, at least some of the two adjacent pattern elements 51 may be spaced apart. All of the multiple pattern elements 51 included in the first region S1 and the second region S2 described below may be spaced apart. All of the multiple pattern elements 51 included in the mask body 20 may be spaced apart. By positioning adjacent pattern elements 51 spaced apart from each other, the optical illusion effect described below can be made more pronounced.

The dimension of the pattern element 51 may be 0.2 mm or more and 30 mm or less, or 1 mm or more and 20 mm or less. The dimension of the pattern element 51 is the longest length of the pattern element 51. In other words, the dimension of the pattern element 51 means the length of the pattern element 51 along the direction in which the pattern element 51 is longest.

The pattern 50 including multiple pattern elements 51 may be formed on the mask body 20 by, for example, printing. In this example, the printed portions may constitute the multiple pattern elements 51, or the unprinted portions, i.e., the base portions, may constitute the pattern elements 51. The color of the multiple pattern elements 51 may be different from the color of the areas of the mask body 20 where the pattern elements 51 are not provided. In other words, the pattern elements 51 may be distinguished from the other portions by color. Either the pattern elements 51 or the portions other than the pattern elements 51 may be compressed by pressing or the like, thereby making the pattern 50 visible.

As shown in FIG. 1, the mask body 20 includes a first region S1. As shown in FIGS. 4 and 5, in the first region S1, which constitutes at least a portion of the mask body 20, the pattern elements 51 vary in at least one of the following: the spacing (widthwise spacing) D1 between two adjacent pattern elements 51 in the width direction DB; and the ratio (widthwise aspect ratio = L1/L2) of the length (widthwise length) L1 of each pattern element 51 along the width direction DB to the length (vertical length) L2 of the pattern element 51 along the vertical direction DA. In other words, at least one of the widthwise spacing D1 and the widthwise aspect ratio is not constant in the first region S1. In the example shown in FIGS. 4 and 5, both the widthwise spacing D1 and the widthwise aspect ratio vary in the first region S1. As will be described later, the first region S1 can enhance the three-dimensional effect in each region along the width direction DB through an optical illusion effect.

At least one of the widthwise spacing D1 and the widthwise aspect ratio may vary depending on the position in the widthwise direction DB. At least one of the widthwise spacing D1 and the widthwise aspect ratio may decrease toward the inside or outside in the widthwise direction DB. The change in the widthwise spacing D1 and the widthwise aspect ratio may be continuous or stepwise.

In the illustrated mask 10, the first region S1 includes an outer first region S11 and an inner first region S12. In Figures 1 and 2, the outer first region S11 and the inner first region S12 are indicated by lines that roughly indicate the boundaries between the first region S1 and regions other than the first region S1.

The outer first region S11 is located at the outermost position in the width direction DB within the range in which the pattern elements 51 of the mask body 20 are provided. The illustrated outer first region S11 extends along the outer edge 22 of the mask body 20. The outer first region S11 reaches the upper edge 23 in the up-down direction DA. The outer first region S11 reaches the lower edge 24 in the up-down direction DA. In other words, the outer first region S11 constitutes part of the upper edge 23 and part of the lower edge 24 at both ends in the up-down direction DA.

As shown in FIG. 2, one outer first region S11 is provided on the left mask body 20L of the mask body 20, and another outer first region S11 is provided on the right mask body 20R of the mask body 20. Each outer first region S11 is located on an area of the mask wearer P's face that faces more to the side than the front.

The outer first region S11 may include a region that is outward in the width direction DB from a position facing the tops CL, CR of each cheekbone of the mask wearer P. The outer first region S11 may include a region that is outward in the width direction DB from a line segment that connects a position facing the tops CL, CR of each cheekbone of the mask wearer P and a position facing the top CH of the chin of the mask wearer P. The outer first region S11 may straddle a line segment that connects a position facing the tops CL, CR of each cheekbone of the mask wearer P and a position facing the top CH of the chin of the mask wearer P.

In the outer first region S11, the widthwise spacing D1 decreases toward the outside in the width direction DB. In the outer first region S11, the widthwise aspect ratio decreases toward the outside in the width direction DB. In the illustrated example, the shape of the pattern elements 51 included in the outer first region S11 is approximately circular toward the inside in the width direction DB and elliptical toward the outside in the width direction DB. The major axis of the ellipse is inclined at an angle greater than 45° with respect to the width direction DB. The major axis of the ellipse is inclined significantly with respect to the width direction DB and is generally aligned with the up-down direction DA. The widthwise spacing D1 and the widthwise aspect ratio may decrease toward the outside in the width direction. The change in the widthwise spacing D1 and the widthwise aspect ratio may be continuous or gradual.

The inner first region S12 is located at the innermost position in the width direction DB within the range in which the pattern elements 51 are provided on each of the left mask body 20L and the right mask body 20R. The inner first region S12 is located at the uppermost position in the up-down direction DA within the range in which the pattern elements 51 are provided on each of the left mask body 20L and the right mask body 20R. The illustrated inner first region S12 extends along the fold line 40, which is the center line (widthwise center line) WM of the mask body 20 in the width direction DB. The inner first region S12 reaches the upper edge 23 in the up-down direction DA. In other words, the inner first region S12 forms a part of the upper edge 23 at its upper end in the up-down direction DA. The inner first region S12 is located above the center line (up-down center line) HM of the mask body 20 in the up-down direction DA. The vertical centerline HM passes through the centers of the upper end 41 and the lower end 42 and extends in the width direction DB. The inner first region S12 is spaced apart from the outer first region S11 in the width direction DB.

As shown in FIG. 2, the inner first region S12 located in the left mask body 20L and the inner first region S12 located in the right mask body 20R may be connected to each other. That is, one inner first region S12 may be provided across the left mask body 20L and the right mask body 20R. In other words, the inner first region S12 may extend across the widthwise centerline WM in the width direction DB of the mask body 20. The inner first region S12 may include a position facing the tip N of the nose of the mask wearer P. In the example shown in FIG. 1, the inner first region S12 is provided in an area covering the nose of the mask wearer P.

In the inner first region S12, the widthwise spacing D1 decreases toward the inside in the width direction DB. In the inner first region S12, the widthwise aspect ratio decreases toward the inside in the width direction DB. In the illustrated example, the shape of the pattern elements 51 included in the inner first region S12 is approximately circular on the outside in the width direction DB and elliptical on the inside in the width direction DB. The major axis of the elliptical shape is inclined at an angle greater than 45° with respect to the width direction DB. The major axis of the elliptical shape is inclined significantly with respect to the width direction DB and is generally aligned with the up-down direction DA. The widthwise spacing D1 and the widthwise aspect ratio may decrease toward the inside in the width direction. The change in the widthwise spacing D1 and the widthwise aspect ratio may be continuous or gradual.

The mask body 20 includes a second region S2. As shown in FIG. 6 , in the second region S2, which constitutes at least a portion of the mask body 20, the multiple pattern elements 51 vary in at least one of the following: the spacing (vertical spacing) D2 between two adjacent pattern elements 51 in the vertical direction DA; and the ratio of the length (vertical length) L2 of each pattern element 51 along the vertical direction DA to the length (width length) L1 of the pattern element 51 along the width direction DB (vertical aspect ratio = L2/L1). In other words, at least one of the vertical spacing D2 and the vertical aspect ratio is not constant in the second region S2. In the example shown in FIG. 6 , both the vertical spacing D2 and the vertical aspect ratio vary in the second region S2. As will be described later, the second region S2 can enhance the three-dimensional effect in each region along the vertical direction DA through an optical illusion.

At least one of the vertical spacing D2 and the vertical aspect ratio may change depending on the position in the vertical direction DA. At least one of the vertical spacing D2 and the vertical aspect ratio may decrease toward the inside or outside in the vertical direction DA. The change in the vertical spacing D2 and the vertical aspect ratio may be continuous or gradual.

In the illustrated mask 10, the second region S2 includes a lower second region S21 and an upper second region S22. In Figures 1 and 2, the positions of the lower second region S21 and the upper second region S22 are indicated by lines that roughly indicate the boundaries between the second region S2 and regions other than the second region S2.

The lower second region S21 is located at the lowest point in the up-down direction DA of the range in which the pattern elements 51 are provided on each of the left mask body 20L and the right mask body 20R. The lower second region S21 extends to both edges in the width direction DB of the range in which the pattern elements 51 are provided on each of the left mask body 20L and the right mask body 20R.

The illustrated lower second region S21 reaches the fold line 40, which is the center line (widthwise center line) WM of the mask body 20 in the width direction DB. As shown in FIG. 1, one lower second region S21 is provided straddling the left mask body 20L and the right mask body 20R. In other words, one lower second region S21 extends across the widthwise center line WM of the mask body 20 in the width direction DB. The lower second region S21 reaches the outer edge 22 of the mask body 20 in the width direction DB. The lower second region S21 forms part of the outer edge 22 at its outer end in the width direction DB. The lower second region S21 is located below the center line (up-down center line) HM of the mask body 20 in the up-down direction DA.

The lower second region S21 may include a region that is lower in the vertical direction DA than the position facing the top of the chin CH of the mask wearer P. The lower second region S21 may include a region that is lower in the vertical direction DA with respect to a line segment connecting a position facing the tops CL, CR of each cheekbone of the mask wearer P and a position facing the top of the chin CH of the mask wearer P. The lower second region S21 may straddle the line segment connecting a position facing the tops CL, CR of each cheekbone of the mask wearer P and a position facing the top of the chin CH of the mask wearer P. The lower second region S21 is located on a region of the mask wearer P's face that faces downward rather than forward.

As shown in FIG. 6 , in the lower second region S21, the vertical spacing D2 decreases toward the lower side in the vertical direction DA. In the lower second region S21, the vertical aspect ratio decreases toward the lower side in the vertical direction DA. In the illustrated example, the shape of the pattern elements 51 included in the lower second region S21 is approximately circular toward the upper side in the vertical direction DA and elliptical toward the lower side in the vertical direction DA. The major axis of the ellipse is inclined at an angle greater than 45° with respect to the vertical direction DA. The major axis of the ellipse is significantly inclined with respect to the vertical direction DA and is generally aligned with the width direction DB. The vertical spacing D2 and the vertical aspect ratio may decrease toward the lower side in the vertical direction DA. The change in the vertical spacing D2 and the vertical aspect ratio may be continuous or gradual.

The lower second region S21 is connected to the outer first region S11 on the outside in the width direction DB. The lower second region S21 and the outer first region S11 partially overlap. The lower second region S21 does not have to overlap with the outer first region S11. The lower second region S21 may be separated from the outer first region S11.

The upper second region S22 is located at the innermost position in the width direction DB within the range in which the pattern elements 51 are provided on each of the left mask body 20L and the right mask body 20R. The upper second region S22 is located at the middle position in the up-down direction DA within the range in which the pattern elements 51 are provided on each of the left mask body 20L and the right mask body 20R. The illustrated upper second region S22 is located along the fold line 40, which is the center line (widthwise center line) WM of the mask body 20 in the width direction DB. The upper second region S22 is located above the center line (up-down center line) HM of the mask body 20 in the up-down direction DA. The upper second region S22 is located below the upper edge 23 of the mask body 20. The upper second region S22 is spaced apart from the lower second region S21 in the up-down direction DA.

As shown in FIG. 2, the upper second region S22 located in the left mask body 20L and the upper second region S22 located in the right mask body 20R may be connected to each other. That is, one upper second region S22 may be provided across the left mask body 20L and the right mask body 20R. In other words, the upper second region S22 may extend across the widthwise centerline WM in the width direction DB of the mask body 20. The upper second region S22 may include a position facing the tip N of the nose of the mask wearer P.

In the upper second region S22, the vertical spacing D2 decreases toward the lower side in the vertical direction DA. In the upper second region S22, the vertical aspect ratio decreases toward the lower side in the vertical direction DA. In the illustrated example, the shape of the pattern elements 51 included in the upper second region S22 is elliptical toward the lower side in the vertical direction DA. The long axis of the ellipse is inclined at an angle greater than 45° with respect to the vertical direction DA. The long axis of the ellipse is inclined significantly with respect to the vertical direction DA and is generally aligned with the width direction DB. The vertical spacing D2 and the vertical aspect ratio may decrease toward the lower side in the vertical direction DA. The change in the vertical spacing D2 and the vertical aspect ratio may be continuous or gradual.

The upper second region S22 is connected to the inner first region S12 at its upper side in the up-down direction DA. The upper second region S22 and the inner first region S12 partially overlap. The upper second region S22 does not have to overlap with the inner first region S12. The upper second region S22 may be separated from the inner first region S12.

Note that the widthwise spacing D1 and the vertical spacing D2 are lengths measured when the mask body 20 is spread out flat. That is, the widthwise spacing D1 and the vertical spacing D2 are lengths along the mask body 20 on the mask body 20 that supports the pattern elements 51. Similarly, the widthwise length L1 and the vertical length L2 used to determine the widthwise aspect ratio and the vertical aspect ratio are lengths measured when the mask body 20 is spread out flat. That is, the widthwise length L1 and the vertical length L2 are lengths along the mask body 20 on the mask body 20 that supports the pattern elements 51.

As shown in Figures 1 and 2, the mask body 20 may further include a third region S3 other than the first region S1 and the second region S2. The multiple pattern elements 51 may be regularly arranged in the third region S3. One or all of the widthwise spacing D1, the vertical spacing D2, the widthwise aspect ratio, and the vertical aspect ratio may be constant in the third region S3.

In the illustrated example, the multiple pattern elements 51 are regularly arranged in both the up-down direction DA and the width direction DB in the third region S3. The multiple pattern elements 51 are arranged at a constant pitch in the width direction DB in the third region S3. The multiple pattern elements 51 are arranged at constant intervals in the up-down direction DA in the third region S3. The arrangement pitch of the pattern elements 51 in the width direction DB is the same as the arrangement pitch of the pattern elements 51 in the up-down direction DA. The multiple pattern elements 51 included in the third region S3 have the same shape and size.

As a result, in the illustrated example, the widthwise spacing D1 is constant for the pattern elements 51 included in the third region S3. The widthwise aspect ratio is constant for the pattern elements 51 included in the third region S3. The vertical spacing D2 is constant for the pattern elements 51 included in the third region S3. The vertical aspect ratio is constant for the pattern elements 51 included in the third region S3.

The widthwise spacing D1 of the pattern elements 51 included in the third region S3 may be equal to or greater than the widthwise spacing D1 of the pattern elements 51 included in the first region S1. The widthwise aspect ratio of the pattern elements 51 included in the third region S3 may be equal to or greater than the widthwise aspect ratio of the pattern elements 51 included in the first region S1. In these examples, the first region S1 and the third region S3 may be adjacent in the width direction DB. In the illustrated example, the third region S3 is connected to the outer first region S11 from the inside in the width direction DB. In the illustrated example, the third region S3 is connected to the inner first region S12 from the outside in the width direction DB.

The vertical spacing D2 of the pattern elements 51 included in the third region S3 may be equal to or greater than the vertical spacing D2 of the pattern elements 51 included in the second region S2. The vertical aspect ratio of the pattern elements 51 included in the third region S3 may be equal to or greater than the vertical aspect ratio of the pattern elements 51 included in the second region S2. In these examples, the second region S2 and the third region S3 may be adjacent in the vertical direction DA. In the illustrated example, the third region S3 is connected to the lower second region S21 from above in the vertical direction DA. In the illustrated example, the third region S3 is connected to the upper second region S22 from below in the vertical direction DA.

Next, the ear loops 30 will be described. The ear loops 30 extend from both sides of the mask body 20 in the width direction DB. The ear loops 30 are connected to the mask body 20 at two locations, the upper and lower sides in the up-down direction DA of the mask body 20. The ear loops 30 are connected to the upper edge 23 of the mask body 20 at the upper side in the up-down direction DA of the mask body 20. The ear loops 30 are connected to the lower edge 24 of the mask body 20 at the lower side in the up-down direction DA of the mask body 20. The outer edge 22 of the mask body 20 extends between the parts connected to the ear loops 30. Ear holes 31 are formed by the ear loops 30 and the outer edge 22 of the mask body 20. By passing the ears through the ear holes 31, the mask 10 is held on the face of the mask wearer P. The ear loops 30 may be, for example, elastic bands. As shown in Figure 1, the ear loops 30 may be formed integrally with the mask body 20.

The following explains how the mask 10 described above works when in use.

The folded mask 10 can be unfolded in the width direction around the folding line 40 by separating the pair of overlapping ear loops 30. The unfolded mask 10 is held on the face of the wearer P by passing the wearer's ears through a pair of ear holes 31 formed by the pair of ear loops 30. As shown in Figure 2, when the mask 10 is held on the face of the wearer P, the upper end 41 of the folding line 40 is located at the top-to-bottom position of the mask 10.

When worn, a mask covers parts of the face of the mask wearer P, such as the nose, chin, and cheeks. Therefore, the mask gives the face of the mask wearer P a flattened appearance. In other words, conventional masks weaken the three-dimensional appearance of the face of the mask wearer P, and not only fail to improve the appearance of the mask wearer P, but may even worsen the appearance of the wearer.

In the mask 10 according to this embodiment, the pattern 50 applied to the mask body 20 includes a plurality of pattern elements 51. In the first region S1, which constitutes at least a portion of the mask body 20, the plurality of pattern elements 51 vary in at least one of the following: the spacing (widthwise spacing) D1 between two adjacent pattern elements 51 in the widthwise direction DB; and the ratio (widthwise aspect ratio = L1/L2) of the length (widthwise length) L1 of each pattern element 51 along the widthwise direction DB to the length (vertical length) L2 of the pattern element 51 along the vertical direction DA.

The first region S1, in which at least one of the widthwise spacing D1 and the widthwise aspect ratio changes, can cause an optical illusion when observing a wearer P of the mask 10. More specifically, the region in the first region S1 where the widthwise spacing D1 is shorter and the region in which the widthwise spacing D1 is longer will be observed by an observer facing the mask wearer P as if they are significantly shifted forward from their actual positional relationship. The region in the first region S1 where the widthwise aspect ratio is smaller and the region in which the widthwise aspect ratio is larger will be observed by an observer facing the mask wearer P as if they are significantly shifted forward from their actual positional relationship.

In the example shown in FIG. 4, pattern elements 51, which are actually drawn on the same plane, are observed, due to an optical illusion, in the outer region in the width direction DB to be located further forward or further back in the direction perpendicular to the paper surface of FIG. 4 than the outer region in the width direction DB. In the example shown in FIG. 5, pattern elements 51, which are actually drawn on the same plane, are observed, due to an optical illusion, in the inner region in the width direction DB to be located further forward or further back in the direction perpendicular to the paper surface of FIG. 5 than the outer region in the width direction DB. The optical illusion effect in the first region S1 can impart and emphasize a three-dimensional effect to each region along the width direction DB. In other words, a three-dimensional effect can be imparted or emphasized to the face of the mask wearer P, thereby improving the appearance of the mask wearer P, such as making the mask wearer P appear smaller.

As shown in Figures 4 and 5, at least one of the widthwise spacing D1 and the widthwise aspect ratio may vary depending on the position in the widthwise direction DB. At least one of the widthwise spacing D1 and the widthwise aspect ratio may decrease toward the inside or outside in the widthwise direction DB. As shown in Figures 4 and 5, in this example, pattern elements 51 that are actually drawn on the same plane appear, due to an optical illusion, to be arranged on a surface inclined relative to the paper surface, particularly a curved surface. This makes it possible to appropriately emphasize the complex contours of the face and improve the appearance of mask wearer P.

In the illustrated example, the first region S1 includes an outer first region S11. As shown in FIG. 2, the outer first region S11 is located outward in the width direction DB from a position facing the tops CL, CR of the cheekbones of the mask wearer P. The outer first region S11 is located outward in the width direction DB from a line connecting a position facing the tops CL, CR of the cheekbones of the mask wearer P and a position facing the top CH of the chin of the mask wearer P. In other words, the outer first region S11 is located on an area of the mask wearer P's face facing to the side. Furthermore, as shown in FIG. 4, in the outer first region S11, the widthwise spacing D1 is smaller on the outer side in the width direction DB. In the outer first region S11, the widthwise aspect ratio is smaller on the outer side in the width direction DB.

The outer first region S11 allows an observer facing the mask wearer P to see the areas of the mask wearer P's face near the ears as if they were positioned further back in the front direction than they actually are. This further emphasizes the three-dimensional appearance of the mask wearer P's face. In addition, because the pattern elements 51 are densely packed on the outside of the outer first region S11 in the width direction DB, the lateral contours of the mask wearer P's face can be emphasized. This gives the mask wearer P a neater impression. As a result, the mask wearer P's face is prevented from appearing to expand in the width direction DB, making the mask wearer P's face appear smaller through an optical illusion. As a result, the mask wearer P's appearance can be improved. For example, making the face appear smaller can enhance the attractiveness of the face, particularly that of a woman's face.

The outer first region S11 may also straddle a straight line connecting a position facing the tops CL, CR of the mask wearer P's cheekbones and a position facing the top CH of the mask wearer P's chin. In this example, the first region S1 is provided at or near the boundary between the front-facing region and the side-facing region of the mask wearer P's face. This makes it possible to more effectively emphasize the three-dimensionality of the mask wearer P's face.

In the illustrated example, the first region S1 further includes an inner first region S12. As shown in FIG. 2, the inner first region S12 faces the nose of the mask wearer P. The inner first region S12 extends upward in the up-down direction DA from the tip of the nose of the mask wearer P. The inner first region S12 straddles the widthwise centerline WM in the widthwise direction DB of the mask body 20. In other words, the inner first region S12 is provided along the nose of the mask wearer P. As shown in FIG. 5, in the inner first region S12, the widthwise spacing D1 is smaller on the inside in the widthwise direction DB. In the outer first region S11, the widthwise aspect ratio is smaller on the inside in the widthwise direction DB.

The inner first region S12 allows an observer facing the mask wearer P to see the nose of the mask wearer P as if it were positioned further forward in the front direction than it actually is. In other words, the three-dimensional appearance of the nose is emphasized, making it appear higher. In addition, because the pattern elements 51 are densely packed on the inside of the outer first region S11 in the width direction DB, the bridge of the mask wearer P's nose can be emphasized. This gives the mask wearer P's face the impression of a straight, sleek nose, or in other words, a neat and tidy appearance.

Furthermore, according to the mask 10 of this embodiment, in the second region S2 that forms at least a part of the mask body 20, the multiple pattern elements 51 vary in at least one of the following: the spacing (vertical spacing) D2 between two adjacent pattern elements 51 in the vertical direction DA; and the ratio of the length (vertical length) L2 of each pattern element 51 along the vertical direction DA to the length (width length) L1 of that pattern element 51 along the width direction DB (vertical aspect ratio = L2/L1).

The second region S2, in which at least one of the vertical spacing D2 and the vertical aspect ratio changes, can cause an optical illusion when observing the mask wearer P. More specifically, the region in the second region S2 where the vertical spacing D2 is shorter and the region in which the vertical spacing D2 is longer will be observed by an observer facing the mask wearer P as if they are significantly shifted forward from their actual positional relationship. The region in the second region S2 where the vertical aspect ratio is smaller and the region in which the vertical aspect ratio is larger will be observed by an observer facing the mask wearer P as if they are significantly shifted forward from their actual positional relationship.

In the example shown in Figure 6, pattern elements 51 that are actually drawn on the same plane are observed, due to an optical illusion, to be positioned further forward or further back in the direction perpendicular to the plane of the paper in Figure 6 in the lower region in the vertical direction DA than in the upper region in the vertical direction DA. The optical illusion effect in the second region S2 can impart and emphasize a three-dimensional effect to each region along the vertical direction DA. In other words, a three-dimensional effect can be imparted or emphasized to the face of the mask wearer P, thereby improving the appearance of the mask wearer P.

As shown in FIG. 6, at least one of the vertical spacing D2 and the vertical aspect ratio may vary depending on the position in the vertical direction DA. At least one of the vertical spacing D2 and the vertical aspect ratio may decrease toward the inside or bottom in the vertical direction DA. As shown in FIG. 6, in this example, pattern elements 51 that are actually drawn on the same plane appear, due to an optical illusion, to be arranged on a surface inclined relative to the paper surface, particularly a curved surface. This makes it possible to appropriately emphasize the complex contours of the face and improve the appearance of mask wearer P.

In the illustrated example, the second region S2 includes a lower second region S21. As shown in FIG. 2, the lower second region S21 is located lower in the vertical direction DA than the position facing the top of the chin CH of the mask wearer P. The lower second region S21 is located lower in the vertical direction DA with respect to a line connecting the positions facing the tops CL, CR of the mask wearer P's cheekbones and the position facing the top of the chin CH of the mask wearer P. In other words, the lower second region S21 is located on the area of the mask wearer P's face that faces downward. Furthermore, as shown in FIG. 6, in the lower second region S21, the vertical distance D2 is smaller at the lower side in the vertical direction DA. In the lower second region S21, the vertical aspect ratio is smaller at the lower side in the vertical direction DA.

The lower second region S21 allows an observer facing the mask wearer P to see the area under the mask wearer P's chin as if it were positioned further back in the front direction than it actually is. This further emphasizes the three-dimensional appearance of the mask wearer P's face. In addition, because the pattern elements 51 are densely packed on the lower side of the lower second region S21 in the up-down direction DA, the lower contour of the mask wearer P's face can be emphasized. As a result, the lower second region S21 can emphasize the jaw line of the mask wearer P. Therefore, the pattern 50 in the second region S2 can give or emphasize the jaw line that rises toward the ears. This prevents the mask wearer P's face from being observed as expanding in the up-down direction DA and the width direction DB, and creates an optical illusion that makes the mask wearer P's face appear smaller.

The lower second region S21 may also straddle a straight line connecting a position facing the tops CL, CR of the mask wearer P's cheekbones and a position facing the top CH of the mask wearer P's chin. In this example, the second region S2 is provided at or near the boundary between the area of the mask wearer P's face that faces forward and the area that faces downward. This makes it possible to more effectively emphasize the three-dimensionality of the mask wearer P's face.

In the illustrated example, the second region S2 further includes an upper second region S22. As shown in FIG. 2, the upper second region S22 faces the nose of the mask wearer P. The upper second region S22 extends downward in the up-down direction DA from the tip N of the nose of the mask wearer P. The upper second region S22 straddles the widthwise centerline WM in the widthwise direction DB of the mask body 20. That is, the upper second region S22 extends from a position facing the tip N of the nose of the mask wearer P to a position facing the mouth of the mask wearer P. As shown in FIG. 1, in the upper second region S22, the up-down distance D2 is smaller at the lower side in the up-down direction DA. In the upper second region S22, the up-down aspect ratio is smaller at the lower side in the up-down direction DA.

The lower second region S21 allows an observer facing the mask wearer P to see the nose of the mask wearer P as if it were positioned further forward in the front direction than it actually is. In other words, the three-dimensional appearance of the nose is emphasized, making it appear higher. In addition, a firm impression can be given from the tip N of the nose through the mouth to the chin. This gives the face of the mask wearer P a neat and tidy impression.

In the illustrated example, the first region S1 and the second region S2 partially overlap. Specifically, the lower portion of the outer first region S11 in the up-down direction DA overlaps with the outer portion of the lower second region S21 in the width direction DB. The lower portion of the inner first region S12 in the up-down direction DA overlaps with the upper portion of the upper second region S22 in the up-down direction DA. The overlapping region of the first region S1 and the second region S2 can express not only a surface that is inclined or curved in the width direction DB or a surface that is inclined or curved in the up-down direction DA, but also a surface that is inclined or curved in both the width direction DB and the up-down direction DA. This makes it possible to express the complex facial contours of the mask wearer P. In other words, the three-dimensional effect is appropriately emphasized, improving the appearance of the wearer P.

Furthermore, in the illustrated example, the multiple pattern elements 51 are arranged apart from one another. Therefore, the pattern 50 including multiple pattern elements 51 can produce a more pronounced optical illusion effect.

The illustrated mask 10 includes a third region S3 in addition to the first region S1 and the second region S2. The widthwise spacing D1 of the pattern elements 51 included in the third region S3 is equal to or greater than the widthwise spacing D1 of the pattern elements 51 included in the first region S1. The widthwise aspect ratio of the pattern elements 51 included in the third region S3 is equal to or greater than the widthwise aspect ratio of the pattern elements 51 included in the first region S1. The first region S1 and the third region S3 are adjacent in the width direction DB.

In this example, due to an optical illusion, an observer facing the mask wearer P will see the first region S1, where the widthwise spacing D1 of the pattern elements 51 is short, and the third region S3, where the widthwise spacing D1 of the pattern elements 51 is long, as being shifted more forward than they actually are. Due to an optical illusion, an observer facing the mask wearer P will see the first region S1, where the widthwise aspect ratio of the pattern elements 51 is small, and the third region S3, where the widthwise aspect ratio of the pattern elements 51 is large, as being shifted more forward than they actually are. In the example shown in FIG. 1, the first region S1 and the third region S3 are actually located on the same plane. However, due to an optical illusion, the first region S1 is seen to be located further forward or further back than the third region S3 in the direction perpendicular to the plane of FIG. 1. Therefore, by providing the third region S3 in addition to the first region S1, the three-dimensional effect in each region along the width direction DB can be further emphasized.

In the illustrated example, the third region S3 is connected to the outer first region S11 from the inside in the width direction DB. Therefore, in the wide regions of the third region S3 and the outer first region S11, the widthwise spacing D1 and widthwise aspect ratio are smaller on the outside in the width direction DB. This makes the optical illusion effect of the outer first region S11 more pronounced, and more effectively emphasizes the three-dimensional appearance of the mask wearer P's face.

In the illustrated example, the third region S3 is connected to the inner first region S12 from the outside in the width direction DB. Therefore, in the wide regions of the third region S3 and the inner first region S12, the widthwise spacing D1 and widthwise aspect ratio become smaller on the inside in the width direction DB. This makes the optical illusion effect of the inner first region S12 described above more pronounced, and more effectively emphasizes the three-dimensional appearance of the mask wearer P's face.

The vertical spacing D2 of the pattern elements 51 included in the third region S3 is equal to or greater than the vertical spacing D2 of the pattern elements 51 included in the second region S2. The vertical aspect ratio of the pattern elements 51 included in the third region S3 is equal to or greater than the vertical aspect ratio of the pattern elements 51 included in the second region S2. In these examples, the second region S2 and the third region S3 are adjacent in the vertical direction DA.

In this example, due to an optical illusion, an observer facing the mask wearer P will see the second region S2, where the vertical spacing D2 of the pattern elements 51 is short, and the third region S3, where the vertical spacing D2 of the pattern elements 51 is long, as being shifted further forward than they actually are. Due to an optical illusion, an observer facing the mask wearer P will see the second region S2, where the vertical aspect ratio of the pattern elements 51 is small, and the third region S3, where the vertical aspect ratio of the pattern elements 51 is large, as being shifted further forward than they actually are. In the example shown in FIG. 1, the second region S2 and the third region S3 are actually located on the same plane. However, due to an optical illusion, the second region S2 is seen to be located further forward or further back than the third region S3 in the direction perpendicular to the plane of FIG. 1. By providing the third region S3, the three-dimensional effect in each region along the vertical direction DA can be further emphasized.

In the illustrated example, the third region S3 is connected to the lower second region S21 from above in the vertical direction DA. Therefore, in the wide areas of the third region S3 and the lower second region S21, the vertical spacing D2 and the vertical aspect ratio are smaller at the bottom in the vertical direction DA. This makes the optical illusion effect of the lower second region S21 described above more pronounced, and more effectively emphasizes the three-dimensional appearance of the mask wearer P's face.

In the illustrated example, the third region S3 connects to the upper second region S22 from below in the vertical direction DA. This example more significantly enhances the optical illusion effect of the upper second region S22, more effectively emphasizing the three-dimensional appearance of the mask wearer P's face. More specifically, due to the optical illusion, an observer facing the mask wearer P will see that the upper second region S22 is tilted relative to the third region S3, which connects to the upper second region S22 from below in the vertical direction DA. This gives the impression that the mask body 20 fits snugly against the contoured area from the nose to the mouth of the mask wearer P, emphasizing the three-dimensional appearance of this area.

In the embodiment described above, the mask 10 includes a mask body 20 provided with a pattern 50 and ear loops 30 extending from both sides of the mask body 20 in the width direction DB. The pattern 50 includes a plurality of pattern elements 51 arranged two-dimensionally. In a first region S1 that constitutes at least a portion of the mask body 20, the plurality of pattern elements 51 vary in at least one of the following: the widthwise spacing D1, which is the distance between two adjacent pattern elements in the width direction DB; and the widthwise aspect ratio (L1/L2), which is the ratio of the widthwise length L1 of each pattern element 51 along the width direction DB to the vertical length L2 of the pattern element 51 along the vertical direction DA. According to this embodiment, the difference in the frontal positions of two regions separated in the width direction DB can be imparted or emphasized by an optical illusion. Therefore, the three-dimensional appearance of the mask wearer P's face can be enhanced, thereby improving the appearance of the mask wearer P.

In the embodiment described above, the mask 10 includes a mask body 20 provided with a pattern 50 and ear loops 30 extending from both sides of the mask body 20 in the width direction DB. The pattern 50 includes a plurality of pattern elements 51 arranged two-dimensionally. In the second region S2, which constitutes at least a portion of the mask body 20, the plurality of pattern elements 51 vary in at least one of the following: the vertical spacing D2 between two adjacent pattern elements 51 in the vertical direction DA; and the vertical aspect ratio (L2/L1) of the vertical length L2 of each pattern element 51 along the vertical direction DA to the width length L1 of the pattern element 51 along the width direction DB. According to this embodiment, the difference in the frontal positions of two regions separated in the vertical direction DA can be imparted or emphasized by an optical illusion. Therefore, the three-dimensional appearance of the mask wearer P's face can be enhanced, thereby improving the appearance of the mask wearer P.

One embodiment has been described with reference to the illustrated specific examples, but the illustrated specific examples are not intended to limit the embodiment. The embodiment described above can be implemented with various other specific examples, and various omissions, substitutions, modifications, and additions can be made without departing from the spirit of the invention.

In the specific example described above, the first region S1 and the second region S2 are partially different, but this is not limiting. The first region S1 and the second region S2 may overlap entirely. One of the first region S1 and the second region S2 may be included as part of the other. The first region S1 and the second region S2 do not have to overlap. The mask body 20 may include only one of the first region S1 and the second region S2.

In the specific example described above, the multiple pattern elements 51 are spaced apart from one another. However, the multiple pattern elements 51 may partially overlap one another. As described above, the shape of the pattern elements 51 is not particularly limited and may be various shapes. The multiple pattern elements 51 may have different shapes from one another.

In the specific example described above, the mask body 20 was foldable by bending it along the fold line 40. However, the mask body 20 is not limited to the example described above. The mask body 20 does not have to have the fold line 40. The mask body 20 may be a pleated mask that has a rectangular shape before the pleats are unfolded. The mask 10 may be a KF94 type. The mask body 20 of a KF94 type mask 10 may include a main fabric portion that has a horizontally elongated diamond shape when unfolded, an upper fabric portion connected to the upper edge of the main fabric portion, and a lower fabric portion connected to the lower edge of the main fabric portion. The mask 10 may also be a mask that meets the N95 standard of the National Institute for Occupational Safety and Health (NIOSH).

10: Mask, 10L: Left mask half, 10R: Right mask half, 20: Mask body, 20L: Left mask body, 20R: Right mask body, 22: Outer edge, 23: Upper edge, 24: Lower edge, 30: Ear hook, 31: Ear passage hole, 40: Fold line, 41: Upper edge, 42: Lower edge, 50: Pattern, 51: Pattern element, CH: Top of chin, CL: Top of cheekbone, CR: Top of cheekbone DA: Vertical direction, DB: Width direction, HM: Vertical center line, WM: Width direction center line, N: Top of nose, P: Mask wearer, S1: First region, S11: Outside first region, S12: Inside first region. area, S2: second area, S21: lower second area, S22: upper second area, S3: third area S3, D1: widthwise interval, D2: vertically interval, L1: widthwise length, L2: vertically length

Claims (19)

a mask body including a pattern;
and ear loops extending from both sides of the mask body in the width direction.
the pattern includes a plurality of pattern elements arranged two-dimensionally across the mask body ;
A mask in which, in a first region that is at least a part of the mask body, the ratio of the length of each pattern element along the width direction to the length of the pattern element along the up-down direction perpendicular to the width direction is smaller on the outside in the width direction. The mask of claim 1, wherein the spacing between two adjacent pattern elements in the width direction varies in the first region. The mask according to claim 1 or 2, wherein the first region includes a region that is outward in the width direction from a position facing the tops of the mask wearer's cheekbones. The mask according to any one of claims 1 to 3, wherein the first region includes a region that is outward in the width direction from a line connecting a position facing the top of each cheekbone of the mask wearer and a position facing the top of the mask wearer's chin. The mask according to any one of claims 1 to 4, wherein the first region straddles a straight line connecting a position facing the top of each cheekbone of the mask wearer and a position facing the top of the chin of the mask wearer. a mask body including a pattern;
and ear loops extending from both sides of the mask body in the width direction.
the pattern includes a plurality of pattern elements arranged two-dimensionally;
In a first region that is at least a part of the mask body, at least one of the interval between two pattern elements adjacent to each other in the width direction and the ratio of the length of each pattern element along the width direction to the length of the pattern element along a vertical direction perpendicular to the width direction is smaller on the inner side in the width direction,
A mask, wherein the first region includes a position facing the nose of a mask wearer. The mask of claim 6, wherein the first region straddles the center line of the mask body in the width direction. The mask described in any one of claims 1 to 7, wherein at least one of the following changes occurs in a second region that constitutes at least a portion of the mask body: the spacing between two adjacent pattern elements in the vertical direction; and the ratio of the length of each pattern element in the vertical direction to the length of that pattern element in the width direction. The mask of claim 8, wherein the first region at least partially overlaps with the second region. a mask body including a pattern;
and ear loops extending from both sides of the mask body in the width direction.
the pattern includes a plurality of pattern elements arranged two-dimensionally across the mask body ;
A mask in which, in a second region that is at least a part of the mask body, the ratio of the length of each pattern element along the up-down direction perpendicular to the width direction to the length of the pattern element along the width direction is smaller on the lower side in the up-down direction. The mask of claim 10, wherein the spacing between two vertically adjacent pattern elements varies in the second region. The mask according to any one of claims 8 to 11, wherein the second region includes a region that is lower in the vertical direction than a position facing the top of the mask wearer's chin. The mask according to any one of claims 8 to 12, wherein the second region includes a region that is below, in the up-down direction, a line connecting a position facing the top of each cheekbone of the mask wearer and a position facing the top of the chin of the mask wearer. The mask described in any one of claims 8 to 13, wherein the second region straddles a straight line connecting a position facing the top of each cheekbone of the mask wearer and a position facing the top of the mask wearer's chin. The mask according to any one of claims 8 to 11, wherein the second region includes at least a position facing the nose of the mask wearer. The mask described in any one of claims 8 to 10 and 15, wherein the second region straddles the center line of the mask body in the width direction. A mask as described in any one of claims 1 to 16, wherein the multiple pattern elements are spaced apart from one another. The mask described in any one of claims 1 to 17, wherein the dimensions of the multiple pattern elements are 0.2 mm or more and 30 mm or less. The mask described in any one of claims 1 to 18, wherein the color of the plurality of pattern elements is different from the color of areas of the mask body where the pattern elements are not provided.