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JP7768282B2 - Method for operating an electrodeionization apparatus - Google Patents
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JP7768282B2 - Method for operating an electrodeionization apparatus - Google Patents

Method for operating an electrodeionization apparatus

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JP7768282B2
JP7768282B2 JP2024063535A JP2024063535A JP7768282B2 JP 7768282 B2 JP7768282 B2 JP 7768282B2 JP 2024063535 A JP2024063535 A JP 2024063535A JP 2024063535 A JP2024063535 A JP 2024063535A JP 7768282 B2 JP7768282 B2 JP 7768282B2
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concentration
boron
water
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formula
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JP2025160764A (en
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航 杉田
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Kurita Water Industries Ltd
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    • BPERFORMING OPERATIONS; TRANSPORTING
    • B01PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01DSEPARATION
    • B01D61/00Processes of separation using semi-permeable membranes, e.g. dialysis, osmosis or ultrafiltration; Apparatus, accessories or auxiliary operations specially adapted therefor
    • B01D61/42Electrodialysis; Electro-osmosis ; Electro-ultrafiltration; Membrane capacitive deionization
    • B01D61/44Ion-selective electrodialysis
    • B01D61/46Apparatus therefor
    • B01D61/48Apparatus therefor having one or more compartments filled with ion-exchange material, e.g. electrodeionisation
    • CCHEMISTRY; METALLURGY
    • C02TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
    • C02FTREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
    • C02F1/00Treatment of water, waste water, or sewage
    • C02F1/44Treatment of water, waste water, or sewage by dialysis, osmosis or reverse osmosis
    • CCHEMISTRY; METALLURGY
    • C02TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
    • C02FTREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
    • C02F1/00Treatment of water, waste water, or sewage
    • C02F1/46Treatment of water, waste water, or sewage by electrochemical methods
    • C02F1/469Treatment of water, waste water, or sewage by electrochemical methods by electrochemical separation, e.g. by electro-osmosis, electrodialysis, electrophoresis
    • YGENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y02TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
    • Y02ATECHNOLOGIES FOR ADAPTATION TO CLIMATE CHANGE
    • Y02A20/00Water conservation; Efficient water supply; Efficient water use
    • Y02A20/124Water desalination

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  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Water Supply & Treatment (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Hydrology & Water Resources (AREA)
  • Health & Medical Sciences (AREA)
  • Environmental & Geological Engineering (AREA)
  • Organic Chemistry (AREA)
  • Electrochemistry (AREA)
  • General Chemical & Material Sciences (AREA)
  • Molecular Biology (AREA)
  • Analytical Chemistry (AREA)
  • Urology & Nephrology (AREA)
  • Separation Using Semi-Permeable Membranes (AREA)
  • Water Treatment By Electricity Or Magnetism (AREA)

Description

本発明は、ホウ素などの弱電解物質の除去率を高め、高水質の処理水を得ることを可能とする電気脱イオン装置の運転方法に関する。 The present invention relates to a method for operating an electrodeionization apparatus that increases the removal rate of weak electrolytes such as boron, enabling the production of high-quality treated water.

半導体製造工場、液晶製造工場、製薬工業、食品工業、電力工業等の各種の産業又は民生用ないし研究施設等において使用される脱イオン水の製造には、電気脱イオン装置が多用されている。図1に示すようにこの電気脱イオン装置1は、電極(陽極2A,陰極3A)と接続した電極板2,3の間に複数のアニオン交換膜4及びカチオン交換膜5を配列して濃縮室Cと脱塩室Dとを形成し、脱塩室Dにイオン交換樹脂などのアニオン交換体及びカチオン交換体を混合、複層状、あるいは単独で充填した構造を有する。なお、E+は陽極室、E-は陰極室である。そして、被処理水(例えば、逆浸透膜の処理水)W1を電気脱イオン装置1の脱塩室Dに供給して処理水W2を得る一方、濃縮室Cに脱塩室とは逆方向に濃縮水W3を供給して濃縮排水W5を排出する。さらに、陽極室E+及び陰極室E-に電極水W4を供給して電極排水W6を排出する。 Electrodeionization devices are widely used to produce deionized water for use in various industries, including semiconductor and liquid crystal manufacturing plants, pharmaceutical, food, and power plants, as well as consumer and research facilities. As shown in Figure 1, this electrodeionization device 1 has multiple anion and cation exchange membranes 4 and 5 arranged between electrode plates 2 and 3 connected to electrodes (anode 2A and cathode 3A), forming a concentration chamber C and a deionization chamber D. Deionization chamber D is filled with a mixture, multilayer structure, or single layer of anion and cation exchangers, such as ion exchange resins. E+ denotes the anode chamber, and E- denotes the cathode chamber. Water to be treated (e.g., water treated using a reverse osmosis membrane) W1 is supplied to deionization chamber D of the electrodeionization device 1 to obtain treated water W2. Concentrated water W3 is supplied to concentration chamber C in the opposite direction to the deionization chambers, and concentrated wastewater W5 is discharged. Electrode water W4 is supplied to anode chamber E+ and cathode chamber E-, and electrode wastewater W6 is discharged.

近年、半導体工場などにおける超純水の要求水質がますます高まってきており、超純水中の弱電解物質であるホウ素要求濃度は1ppt以下レベルまで下がってきているが、ホウ素を高度に除去するためには、下記式によるイオン化を促進する必要がある。
BO+OH → B(OH)4- (pKa=9.24)
In recent years, the quality of ultrapure water required in semiconductor factories and the like has been increasing, and the required concentration of boron, a weak electrolyte in ultrapure water, has been reduced to a level of 1 ppt or less. However, in order to remove boron to a high degree, it is necessary to promote ionization according to the following formula:
H 3 BO 3 +OH → B(OH) 4− (pKa=9.24)

従来、このようなイオン化反応の促進のためには、電気脱イオン装置の電流密度を高めて運転することが有効であるとされており、電流密度を上げることによりホウ素除去率高めることができることが行われている・ Conventionally, it has been believed that operating an electrodeionization device at a higher current density is effective in promoting this ionization reaction, and that increasing the current density can increase the boron removal rate.

しかしながら、電気脱イオン装置のホウ素除去率は、濃縮水のホウ素濃度や給水(被処理水)のホウ素濃度等の他の因子の変動も大きく影響し、単に電気脱イオン装置の運転条件のうち電流密度を高く設定するのみでは、ホウ素などの弱電解物質を確実に除去することはできず、弱電解物質を確実に除去し得る運転条件の設定指標が強く望まれているのが現状である。 However, the boron removal rate of an electrodeionization device is significantly affected by fluctuations in other factors, such as the boron concentration in the concentrated water and the boron concentration in the feedwater (water to be treated). Therefore, simply setting a high current density as one of the operating conditions for an electrodeionization device is not enough to reliably remove weak electrolytes such as boron. Therefore, there is currently a strong demand for indicators for setting operating conditions that can reliably remove weak electrolytes.

本発明は、上記課題に鑑みてなされたものであり、ホウ素などの弱電解物質の除去率を高め、高水質の処理水を得ることを可能とする電気脱イオン装置の運転方法を提供することを目的とする。 The present invention was made in consideration of the above-mentioned problems, and aims to provide a method for operating an electrodeionization apparatus that increases the removal rate of weak electrolytes such as boron and enables the production of high-quality treated water.

上記目的を達成するために本発明は、陽極と陰極との間に複数のアニオン交換膜とカチオン交換膜とを配列して濃縮室と脱塩室とを形成し、脱塩室にイオン交換体を充填してなる電気脱イオン装置の運転方法であって、下記式(1)及び(2)を充足する条件で運転する、電気脱イオン装置の運転方法を提供する(発明1)。
50<A<200 ・・・(1)
(式(1)中、A:電気脱イオン装置の操作電流密度〔A/m〕)
AA/CDout<0.2 ・・・(2)
(式(2)中、AA:下記式(3)で算出される拡散によって濃縮室から脱塩室に移動するホウ素の濃度〔ng/L〕
CDout:電気脱イオン装置の処理水のホウ素濃度〔ng/L〕)
AA=D×(C×A/dx)×Q×10〔ng/L〕 ・・・(3)
(式(3)中、D:拡散係数〔m/秒〕、
:脱塩室の処理水出口に隣接する濃縮の入口または出口のホウ素濃度〔ng/L〕、
A:電気脱イオン装置の操作電流値〔A/m〕、
dx:イオン交換膜の厚み〔m〕、
Q:電気脱イオン装置の脱塩室のセルの流量〔L/秒〕)
To achieve the above object, the present invention provides a method for operating an electrodeionization apparatus comprising an anode, a cathode, and a plurality of anion-exchange membranes and cation-exchange membranes arranged between them to form concentration compartments and deionization compartments, and the deionization compartments are filled with ion exchangers, the method comprising operating the electrodeionization apparatus under conditions that satisfy the following formulas (1) and (2 ) (Invention 1):
50<A<200...(1)
(In formula (1), A: operating current density of the electrodeionization device [A/m 2 ])
AA/CDout<0.2...(2)
(In formula (2), AA: the concentration of boron that moves from the concentration compartment to the deionization compartment by diffusion [ng/L] calculated by the following formula (3),
CDout: boron concentration of treated water from electrodeionization device [ng/L]
AA=D×( CC ×A/dx)×Q×10 3 [ng/L] ...(3)
(In the formula (3), D: diffusion coefficient [m 2 /sec],
C C : boron concentration at the inlet or outlet of the concentration compartment adjacent to the treated water outlet of the desalination compartment [ng/L];
A: operating current value of the electrodeionization device [A/m 2 ],
dx: thickness of ion exchange membrane [m],
Q: Flow rate of the cell in the deionization compartment of the electrodeionization device [L/sec]

特に上記発明(発明1)においては、
式(2)が、AA/CDout<0.1 ・・・(2)
であることが好ましい(発明2)。
In particular, in the above invention (Invention 1),
Formula (2) is AA/CDout<0.1 (2)
It is preferable that (Invention 2).

かかる発明(発明1,2)によれば、ホウ素を確実かつ効率的に除去して高水質の処理水を得ることができる。これは、以下のような理由による。すなわち、本発明者は、電気脱イオン装置の運転時の電流(電流密度)を上げてもホウ素などの弱電解物質の除去率が上がりにくくなることを知得し、その原因について検討した結果、電気脱イオン装置において、脱塩室の処理水水質に関しては、脱塩室内における電流(電流密度)を上げることによるホウ素などの弱電解物質の除去が促進されるファクターと、イオン交換膜を介して濃縮室から脱塩室に透過する拡散のファクターとを考慮する必要があり、拡散の影響が大きくなると、電流(電流密度)を上げてもホウ素などの弱電解物質の除去が進まないことがわかった。そこで、本発明者が種々の検証をすすめた結果、所定の関係式を満たすように電気脱イオン装置を運転することで、ホウ素を確実かつ効率的に除去して高水質の処理水を得ることができることが判明した。これらに基づき本発明に想到した。 These inventions (Inventions 1 and 2) enable reliable and efficient removal of boron, resulting in high-quality treated water. This is due to the following reasons: The inventors discovered that increasing the current (current density) during operation of an electrodeionization apparatus makes it difficult to increase the removal rate of weak electrolytes such as boron. After investigating the causes, they discovered that, in an electrodeionization apparatus, the quality of treated water in the deionization compartment must take into account factors such as increasing the current (current density) in the deionization compartment to promote the removal of weak electrolytes such as boron, and the diffusion factor of permeation from the concentration compartment to the deionization compartment through the ion exchange membrane. They found that if the influence of diffusion becomes too great, increasing the current (current density) will not improve the removal of weak electrolytes such as boron. Based on these findings, the inventors conducted various experiments and discovered that operating an electrodeionization apparatus so as to satisfy a specific relationship can reliably and efficiently remove boron, resulting in high-quality treated water. This led to the invention of the present invention.

本発明を適用可能な電気脱イオン装置を示す概略図である。1 is a schematic diagram showing an electrodeionization apparatus to which the present invention can be applied. 実施例1で用いた電気脱イオン装置を示す概略図である。FIG. 1 is a schematic diagram showing an electrodeionization apparatus used in Example 1. 比較例1で用いた電気脱イオン装置を示す概略図である。FIG. 1 is a schematic diagram showing an electrodeionization apparatus used in Comparative Example 1. 実測値と数式AAでの算出値の濃縮水のホウ素濃度と処理水ホウ素濃度との関係を示すグラフである。1 is a graph showing the relationship between the boron concentration in concentrated water and the boron concentration in treated water, and between the actual measured value and the calculated value using formula AA. 実施例6で用いた電気脱イオン装置を示す概略図である。FIG. 1 is a schematic diagram showing an electrodeionization apparatus used in Example 6. 数式AA/CDoutの算出値とホウ素除去率との関係を示すグラフである。1 is a graph showing the relationship between the calculated value of the formula AA/CDout and the boron removal rate. 電流密度とホウ素除去率との関係を示すグラフである。1 is a graph showing the relationship between current density and boron removal rate. 電流密度と処理水のホウ素濃度との関係を示すグラフである。1 is a graph showing the relationship between current density and boron concentration in treated water. AA/CDoutの算出値と処理水のホウ素濃度との関係を示すグラフである。1 is a graph showing the relationship between the calculated value of AA/CDout and the boron concentration of treated water. 実施例15で用いた電気脱イオン装置を示す概略図である。FIG. 1 is a schematic diagram showing an electrodeionization apparatus used in Example 15.

以下、本発明の電気脱イオン装置の運転方法について詳細に説明する。 The operating method of the electrodeionization apparatus of the present invention is described in detail below.

<電気脱イオン装置、及びその運転方法>
本発明を適用可能な電気脱イオン装置としては、特に制限はなく、例えば、図1に概略的に示されるようなものを用いることができる。そして、下記式(1)及び(2)を充足する条件で運転する以外は常法に従って運転すればよい。すなわち、被処理水(例えば、逆浸透膜の処理水)W1を電気脱イオン装置の脱塩室Dに供給して処理水W2を得る。濃縮室Cに濃縮水W3を供給して濃縮排水W5を排出するとともに、陽極室E+及び陰極室E-に電極水W4を供給して電極排水W6を排出する。この際、陰極及び陽極に電流を印可することで脱イオン処理を行い、脱塩室の流出水を処理水(脱イオン水)W2として取り出せばよい。なお、濃縮室や電極室の排出水W5,W6は系外に排出するか、あるいは処理原水の供給側へ循環される。
<Electrodeionization Apparatus and Operation Method Thereof>
The electrodeionization apparatus to which the present invention can be applied is not particularly limited, and for example, an apparatus as schematically shown in FIG. 1 can be used. The apparatus may be operated in a conventional manner, except that the following formulas (1) and (2 ) are satisfied. Specifically, water to be treated (e.g., water treated by a reverse osmosis membrane) W1 is supplied to the deionization chamber D of the electrodeionization apparatus to obtain treated water W2. Concentrated water W3 is supplied to the concentration chamber C to discharge concentrated wastewater W5, and electrode water W4 is supplied to the anode chamber E+ and cathode chamber E- to discharge electrode wastewater W6. Deionization is performed by applying an electric current to the cathode and anode, and the effluent from the deionization chamber is extracted as treated water (deionized water) W2. The wastewaters W5 and W6 from the concentration chamber and electrode chamber are either discharged outside the system or circulated to the supply side of the raw water to be treated.

本実施形態において、電気脱イオン装置の運転条件は下記式(1)及び(2)を充足するように規定される。
50<A<200 ・・・(1)
(式中、A:電気脱イオン装置の操作電流密度〔A/m〕)
AA/CDout<0.2 ・・・(2)
(式中、AA:下記式(3)で算出される拡散によって濃縮室から脱塩室に移動するホウ素の濃度〔ng/L〕
CDout:処理水W2のホウ素濃度〔ng/L〕)
AA=D×(C×A/dx)×Q×10〔ng/L〕 ・・・(3)
(式中、C:脱塩室の処理水出口に隣接する濃縮の入口または出口のホウ素濃度〔ng/L〕、
A:電気脱イオン装置の操作電流値〔A/m〕、
dx:イオン交換膜の厚み〔m〕、
Q:電気脱イオン装置の脱塩室のセル流量〔L/秒〕)
D:拡散係数〔m秒/秒〕は、電気脱イオン装置ごとに異なる数値であり、用いるイオン交換膜によって、物質の透過係数(拡散係数)は変化する。膜の孔径が小さければ、拡散係数は小さくなる。一方、膜の孔径が大きれば、拡散係数は大きくなる。具体的には以下により算出することができる。)
In this embodiment, the operating conditions of the electrodeionization apparatus are specified so as to satisfy the following formulas (1) and (2 ) .
50<A<200...(1)
(wherein A is the operating current density of the electrodeionization device [A/m 2 ])
AA/CDout<0.2...(2)
(Wherein, AA: concentration of boron that moves from the concentrating compartment to the deionizing compartment by diffusion [ng/L] calculated by the following formula (3),
CDout: boron concentration of treated water W2 [ng/L]
AA=D×( CC ×A/dx)×Q×10 3 [ng/L] ...(3)
(Wherein, C C : boron concentration [ng/L] at the inlet or outlet of the concentration compartment adjacent to the treated water outlet of the desalting compartment;
A: operating current value of the electrodeionization device [A/m 2 ],
dx: thickness of ion exchange membrane [m],
Q: Cell flow rate in the deionization compartment of the electrodeionization device [L/sec]
D: Diffusion coefficient [m 2 sec/sec] is a value that differs for each electrodeionization device, and the permeability coefficient (diffusion coefficient) of a substance varies depending on the ion exchange membrane used. If the membrane pore size is small, the diffusion coefficient will be small. On the other hand, if the membrane pore size is large, the diffusion coefficient will be large. Specifically, it can be calculated as follows:

上述したような式(1)及び(2)を満たすことにより、被処理水(給水)中のホウ素を確実かつ効率的に除去して高水質の脱イオン水(処理水)を得ることができる。 By satisfying the above-mentioned formulas (1) and (2) , boron in the water to be treated (feed water) can be reliably and efficiently removed, and high-quality deionized water (treated water) can be obtained.

なお、本実施形態において、式(3)は、以下のような手順で導出した。
式(3)で規定するAAは拡散によって濃縮室から脱塩室に移動するホウ素の概算濃度を表している。したがって、処理水に占める拡散の影響が大きいほど、AA/CDoutが大きくなることを示す。この式(3)で規定するAAは、物質の拡散に関する基本法則であるFickの法則をベースとしている(式i)。
J=-D´(dC/dx) ・・・i
(式中、Jは拡散束又は流束(flux)[mol/m/秒]であり、単位時間当たりに単位面積を通過する、ある性質の量と定義される。Dは拡散係数[m/秒]であり、Cは濃度[mol/m]であり、xは位置[m]である。)
In this embodiment, the formula (3) is derived in the following manner.
The AA defined in formula (3) represents the approximate concentration of boron that moves from the concentration compartment to the deionization compartment due to diffusion. Therefore, the greater the influence of diffusion in the treated water, the greater the AA/CDout. The AA defined in formula (3) is based on Fick's law, which is the fundamental law regarding the diffusion of substances (formula i).
J=-D'(dC/dx)...i
(Where J is the diffusion flux or flux [mol/ m2 /sec], defined as the amount of a property passing through a unit area per unit time, D is the diffusion coefficient [ m2 /sec], C is the concentration [mol/ m3 ], and x is the position [m].)

ここで、膜表面近傍おけるホウ素濃度は、濃縮室側≫脱塩室側であるため下記式iiとなる。
dC=CC,m-CD,m ≒ CC,m ・・・ii
∵CC,m≫-CD,m
濃縮室側における膜表面近傍のホウ素濃度(CC,m)は、電流(A)の印加によって下記式iiiにより濃縮される。
C,m=C×βA ・・・iii
(式中、βは便宜上の定数項である。)
Here, the boron concentration near the membrane surface is expressed by the following formula ii, since the concentration compartment side is greater than the deionization compartment side.
dC=C C,m -C D,m ≒ C C,m ...ii
∵C C,m ≫-C D,m
The boron concentration (C C,m ) near the membrane surface on the concentrating compartment side is concentrated by applying a current (A) according to the following formula iii.
C C,m =C C ×βA...iii
(In the formula, β is a constant term for convenience.)

そして、上記式iに式ii,式iiiを代入すると下記式iv、vが得られる。
J=-D´(dC/dx)=-D´(CC,m/dx)・・・(iv:式iにiiを代入)
J=-D´(CC,m/dx)=-D´(C×βA/dx)・・・(v:式ivにiiiを代入)
ここで、拡散係数DをD=D´×βと置くと、フラックス(J)は下記式viとなる。
J=-D(C×A/dx) ・・・vi
Jはフラックスであるので、脱塩室のセル流量であるQ〔L/秒〕をかけることで透過量を算出することにより、下記式vii、viiiが得られる。
AA=D(C×A/dx)×Q 〔μg/L〕 ・・・vii
AA=D×(C×A/dx)×Q×10 〔ng/L〕 ・・・viii
これにより、本発明の式(3)を導出した。
Then, by substituting formulas ii and iii into formula i above, the following formulas iv and v are obtained.
J = -D'(dC/dx) = -D'(C C,m /dx) ... (iv: Substitute ii into formula i)
J = -D'(C C,m /dx) = -D'(C C × βA/dx) ... (v: Substitute iii into formula iv)
Here, if the diffusion coefficient D is set to D=D'×β, the flux (J) is given by the following formula vi.
J=-D( CC ×A/dx)...vi
Since J is the flux, the permeation amount is calculated by multiplying it by Q [L/sec], which is the cell flow rate in the deionization compartment, to obtain the following equations vii and viii.
AA=D( CC ×A/dx)×Q [μg/L] ・・・vii
AA=D×( CC ×A/dx)×Q×10 3 [ng/L] ...viii
As a result, the formula (3) of the present invention was derived.

以上、本発明について前記実施形態に基づいて説明してきたが、本発明は種々の変形実施が可能である。例えば、電気脱イオン装置は、陽極と陰極との間に複数のアニオン交換膜とカチオン交換膜とを配列して濃縮室と脱塩室とを形成したものであればよく、部分的にアニオン交換膜又はカチオン交換膜を連続させて、脱塩室を連続して形成したものなどであってもよい。 The present invention has been described above based on the above-mentioned embodiment, but various modifications are possible. For example, the electrodeionization device may be one in which a plurality of anion exchange membranes and cation exchange membranes are arranged between an anode and a cathode to form concentration compartments and deionization compartments, or one in which anion exchange membranes or cation exchange membranes are partially connected to form a continuous deionization compartment.

以下の具体的な実施例に基づき本発明の電気脱イオン装置の運転方法における運転条件の算定プロセスについて説明する。 The process for calculating operating conditions for the electrodeionization apparatus operating method of the present invention will be explained using the following specific example.

[実施例1~5]
図2に示すような試験用の電気脱イオン装置を用意した。図2において、電気脱イオン装置1は、電極(陽極2A,陰極3A)と接続した電極板2,3の間にアニオン交換膜4及びカチオン交換膜5を配列して2個の濃縮室Cと1個の脱塩室Dとを形成した構造を有する。図中、E+は陽極室、E-は陰極室である。そして、超純水(UPW)の供給源6に連通して超純水送水管が設けられており、この超純水送水管が途中で送水管7と送水管8とに分岐している一方、薬液成分として既知の濃度のホウ素溶液Bのタンク11を用意し、このタンク11からポンプ13を備えた供給管12が送水管7に接続している。これにより、陰極室E-側の濃縮室Cにはホウ素溶液Bが添加された超純水が供給されるとともに、他方の濃縮室C、脱塩室D、陽極室E+及び陰極室E-には、超純水が供給される構造となっている。なお、14A、14Bはそれぞれホウ素濃度測定手段である。そして、被処理水W1を電気脱イオン装置1の脱塩室Dに供給して処理水W2を得る一方、濃縮室Cに濃縮水W3を供給して濃縮排水W5を排出する。さらに、陽極室E+及び陰極室E-に電極水W4を供給して電極排水W6を排出する。
[Examples 1 to 5]
A test electrodeionization apparatus as shown in FIG. 2 was prepared. In FIG. 2, electrodeionization apparatus 1 has a structure in which an anion exchange membrane 4 and a cation exchange membrane 5 are arranged between electrode plates 2 and 3 connected to electrodes (anode 2A and cathode 3A), forming two concentration compartments C and one deionization compartment D. In the figure, E+ is the anode compartment, and E- is the cathode compartment. An ultrapure water supply pipe is provided in communication with an ultrapure water (UPW) supply source 6, and this ultrapure water supply pipe branches into water supply pipes 7 and 8. A tank 11 containing a boron solution B of a known concentration as a chemical component is provided, and a supply pipe 12 equipped with a pump 13 is connected to this tank 11 and to the supply pipe 7. Thus, ultrapure water containing boron solution B is supplied to the concentration compartment C on the cathode compartment E- side, and ultrapure water is supplied to the other concentration compartment C, deionization compartment D, anode compartment E+, and cathode compartment E-. The reference numerals 14A and 14B denote boron concentration measuring means. The water to be treated W1 is supplied to the deionization chamber D of the electrodeionization apparatus 1 to obtain treated water W2, while concentrated water W3 is supplied to the concentration chamber C and concentrated wastewater W5 is discharged. Furthermore, electrode water W4 is supplied to the anode chamber E+ and the cathode chamber E- and electrode wastewater W6 is discharged.

この電気脱イオン装置1のセルサイズは横48.5mm×高さ230mm×厚さ5.0mmであり、脱塩室D及び濃縮室Cにそれぞれイオン交換樹脂(アニオン交換樹脂とカチオン交換樹脂の混合樹脂)を充填した。 The cell size of this electrodeionization device 1 was 48.5 mm wide x 230 mm high x 5.0 mm thick, and deionization compartment D and concentration compartment C were each filled with ion exchange resin (a mixed resin of anion exchange resin and cation exchange resin).

なお、この実施例の項において、超純水とは、抵抗率:18.1MΩ・cm以上、微粒子:粒径50nm以上で1000個/L以下、生菌:1個/L以下、TOC:1μg/L以下、全シリコン:0.1μg/L以下、金属類:1ng/L以下、イオン類:10ng/L以下、過酸化水素;30μg/L以下、水温:25±2℃のものである。 In this example, ultrapure water has the following characteristics: resistivity: 18.1 MΩ·cm or more; fine particles: 1000 particles/L or less with a particle size of 50 nm or more; viable bacteria: 1 particle/L or less; TOC: 1 μg/L or less; total silicon: 0.1 μg/L or less; metals: 1 ng/L or less; ions: 10 ng/L or less; hydrogen peroxide: 30 μg/L or less; and a water temperature of 25±2°C.

上述したような電気脱イオン装置1において、運転電流密度100〔A/m〕で、ホウ素溶液Bから一方の濃縮室Cに供給する濃縮水のホウ素濃度を0~1000ppbとなるように変動させて運転した The electrodeionization apparatus 1 described above was operated at an operating current density of 100 [A/m 2 ], while varying the boron concentration of the concentrated water supplied from the boron solution B to one of the concentration compartments C from 0 to 1000 ppb.

この際、計算用のパラメータを以下のとおり設定した。
Q(電気脱イオン装置の脱塩室のセル流量):0.005〔L/秒〕
dx(イオン交換膜の膜厚):5.0×10-4[m](500〔μm〕)
D(拡散係数):(2.5×10-19〔m/秒〕
In this case, the calculation parameters were set as follows:
Q (cell flow rate in the deionization compartment of the electrodeionization apparatus): 0.005 [L/sec]
dx (thickness of ion exchange membrane): 5.0 × 10 −4 [m] (500 [μm])
D (diffusion coefficient): (2.5×10 −19 [m 2 /sec]

これらの運転条件における、処理水W2のホウ素濃度を測定した。結果を被処理水(給水)W1のホウ素(B)濃度、濃縮水W3(C室入口)のホウ(B)素濃度、電流密度、及び数式(3)AAの値とともに表1に示す。また、処理水W2のホウ素濃度と濃縮水W3のホウ素濃度との関係を図4に示す。 The boron concentration of treated water W2 was measured under these operating conditions. The results are shown in Table 1, along with the boron (B) concentration of the water to be treated (feedwater) W1, the boron (B) concentration of concentrated water W3 (inlet to chamber C), the current density, and the value of AA in equation (3). Figure 4 also shows the relationship between the boron concentration of treated water W2 and the boron concentration of concentrated water W3.

[比較例1]
実施例3において、試験用に図3に示すように陽極室E+側の濃縮室Cにホウ素溶液Bを添加するように構成した以外は、同様にして電気脱イオン装置の運転を行った。
[Comparative Example 1]
The electrodeionization apparatus was operated in the same manner as in Example 3, except that for testing purposes, the boron solution B was added to the concentrating compartment C on the anode compartment E+ side as shown in FIG.

これらの運転条件における、処理水W2のホウ素濃度を測定した。結果を被処理水(給水)W1のホウ素(B)濃度、濃縮水W3(C室入口)のホウ(B)素濃度、電流密度、及び数式(3)AAの値とともに表1にあわせて示す。 The boron concentration of treated water W2 was measured under these operating conditions. The results are shown in Table 1, along with the boron (B) concentration of the water to be treated (feedwater) W1, the boron (B) concentration of concentrated water W3 (inlet to chamber C), the current density, and the value of AA in formula (3).

表1及び図4から、処理水W2中にホウ素が混入するのは、カチオン交換膜5を介してであることがわかる。しかしながら、カチオン交換膜5は固体超強酸であるため、カチオン交換膜5中のpHは極端に低く酸性条件である。このため、ホウ素はほとんどが分子状のホウ素(HBO)であり、以下の関係式となる。
BO+OH → B(OH) (pKa=9.24)
4, it can be seen that boron is mixed into the treated water W2 via the cation exchange membrane 5. However, because the cation exchange membrane 5 is a solid superacid, the pH inside the cation exchange membrane 5 is extremely low and is an acidic condition. For this reason, most of the boron is in the form of molecular boron (H 3 BO 3 ), and the following relational formula is satisfied:
H 3 BO 3 +OH → B(OH) 4 (pKa=9.24)

したがって、カチオン交換膜5を通過するためには、電圧印加による電荷的移動ではなく、濃度拡散によるものであるといえる。そして、図4から処理水W2のホウ素濃度(〇)と拡散による濃度上昇の計算値AA(●)とがほぼ一致していることがわかる。これらのことからカチオン交換膜を介しての拡散による影響は、式AAで算出することができるといえる。 Therefore, it can be said that passage through the cation exchange membrane 5 is due to concentration diffusion, rather than charge transfer caused by voltage application. Furthermore, Figure 4 shows that the boron concentration in treated water W2 (◯) and the calculated value AA (●) of the concentration increase due to diffusion are nearly identical. From these facts, it can be said that the effect of diffusion through the cation exchange membrane can be calculated using formula AA.

[実施例6~9、及び比較利2]
図5に示すような試験用の電気脱イオン装置を用意した。図5において、電気脱イオン装置1は、基本的には図2に示すものと同じ構成を有する。そして、超純水(UPW)の供給源6に連通して超純水送水管が設けられており、この超純水送水管が途中で送水管7と送水管8とに分岐していて、脱塩室Dの供給水と、濃縮室C及び陽極室E+及び陰極室E-の供給水とは逆方向に通水する構成となっている。そして、薬液成分として既知の濃度のホウ素溶液Bのタンク11を用意し、このタンク11からポンプ13を備えた供給管12が送水管7に接続しているとともに、薬液成分として既知の濃度のホウ素溶液Bのタンク15を用意し、このタンク15からポンプ17を備えた供給管16が送水管8に接続している。これらにより、脱塩室Dにはタンク11からホウ素溶液Bが添加された超純水が供給されるとともに、濃縮室C及び陽極室E+及び陰極室E-にはタンク15からホウ素溶液Bが添加された超純水が供給される。これにより、脱塩室Dと濃縮室Cに異なる濃度にホウ素が添加された超純水が供給可能な構造となっている。なお、14A、14Bはそれぞれホウ素濃度測定手段である。
[Examples 6 to 9 and Comparative Example 2]
A test electrodeionization apparatus as shown in FIG. 5 was prepared. In FIG. 5, electrodeionization apparatus 1 has basically the same configuration as that shown in FIG. 2. An ultrapure water supply pipe is provided in communication with an ultrapure water (UPW) supply source 6. This ultrapure water supply pipe branches into water supply pipe 7 and water supply pipe 8, and the supply water for deionization chamber D flows in the opposite direction to the supply water for concentration chamber C, anode chamber E+, and cathode chamber E−. A tank 11 containing a boron solution B of a known concentration as a chemical component is prepared. A supply pipe 12 equipped with a pump 13 runs from this tank 11 to water supply pipe 7. A tank 15 containing a boron solution B of a known concentration as a chemical component is prepared. A supply pipe 16 equipped with a pump 17 runs from this tank 15 to water supply pipe 8. As a result, ultrapure water to which boron solution B has been added is supplied from tank 11 to deionization compartment D, and ultrapure water to which boron solution B has been added is supplied from tank 15 to concentration compartment C, anode compartment E+, and cathode compartment E-. This structure makes it possible to supply ultrapure water to which boron has been added at different concentrations to deionization compartment D and concentration compartment C. Reference numerals 14A and 14B each represent boron concentration measuring means.

上述したような電気脱イオン装置1において、運転電流密度100〔A/m〕で、濃縮室C及び陽極室E+及び陰極室E-に供給する濃縮水W3、電極水W4のホウ素濃度を0~1000ppbで変動させるとともに、脱塩室Dにホウ素濃度を10ppbとした被処理水(給水)を供給して運転した。なお、計算用のパラメータは実施例1と同じとした。 The electrodeionization apparatus 1 described above was operated at an operating current density of 100 [A/m 2 ], with the boron concentrations of the concentrated water W3 and electrode water W4 supplied to the concentration chamber C, anode chamber E+, and cathode chamber E- varying from 0 to 1000 ppb, and water to be treated (feedwater) with a boron concentration of 10 ppb was supplied to the deionization chamber D. The calculation parameters were the same as in Example 1.

これらの運転条件における、処理水W2のホウ素(B)濃度を測定した。結果を被処理水(給水)のホウ素(B)濃度、濃縮水W3(C室入口)のホウ(B)素濃度、電流密度、及びホウ素除去率とともに表2に示す。また、これらに基づき数式AA/CDout(CDoutを算出した結果を表2にあわせて示す。さらにこの算出結果と、ホウ素除去率との関係を図6に示す。 The boron (B) concentration of treated water W2 was measured under these operating conditions. The results are shown in Table 2, along with the boron (B) concentration of the water to be treated (feedwater), the boron (B) concentration of concentrated water W3 (inlet to chamber C), the current density, and the boron removal rate. The formula AA/CDout (CDout) was calculated based on these data, and the results are also shown in Table 2. Furthermore, the relationship between this calculation result and the boron removal rate is shown in Figure 6.

図6では、AA/CDoutという指標を基準にした。AAは拡散による濃度上昇を示し、CDoutは処理水中のホウ素濃度を示す。したがって、AA/CDoutは、処理水中のホウ素濃度のうち拡散の影響により上昇した推定割合を示す。表2及び図6から明らかな通り、AA/CDoutが小さいほどホウ素の除去率が高く、AA/CDoutが大きくなるにつれ、拡散による影響が大きくなり、AA/CDout が0.2を超えると急激にホウ素の除去率が低下する。特に、ホウ素の除去率を高く保つためには、AA/CDoutを0.1以下に保つことが好ましいことが分かる。 In Figure 6, the index AA/CDout was used as the basis. AA indicates the increase in concentration due to diffusion, and CDout indicates the boron concentration in the treated water. Therefore, AA/CDout indicates the estimated proportion of the boron concentration in the treated water that has increased due to the effects of diffusion. As is clear from Table 2 and Figure 6, the smaller the AA/CDout, the higher the boron removal rate; as AA/CDout increases, the impact of diffusion becomes greater, and when AA/CDout exceeds 0.2, the boron removal rate drops sharply. In particular, it is clear that in order to maintain a high boron removal rate, it is preferable to keep AA/CDout at 0.1 or less.

[実施例10~12、及び比較利3,4]
実施例6において、濃縮室C及び陽極室E+及び陰極室E-に供給する濃縮水W3、電極水W4のホウ素濃度を100ppbとするとともに、脱塩室Dに供給する被処理水W1のホウ素濃度を10ppbとした。そして、運転電流密度を25~300〔A/m〕に変動させて電気脱イオン装置1を運転した。なお、計算用のパラメータは実施例1と同じとした。
[Examples 10 to 12, and Comparative Examples 3 and 4]
In Example 6, the boron concentrations of the concentrated water W3 and electrode water W4 supplied to the concentrating chamber C, anode chamber E+, and cathode chamber E- were set to 100 ppb, and the boron concentration of the water to be treated W1 supplied to the deionization chamber D was set to 10 ppb. The electrodeionization apparatus 1 was operated with the operating current density varied from 25 to 300 [A/m 2 ]. The calculation parameters were the same as those in Example 1.

これらの運転条件における、処理水W2のホウ素濃度を測定した。結果を電流密度、数式AA/CDoutの値、及びホウ(B)素除去率とともに表3に示す。また、電流密度とホウ素除去率との関係を図7に、電流密度と処理水W2のホウ素濃度除との関係を図8に、数式AA/CDoutとホウ素濃度除との関係を図9にそれぞれ示す。 The boron concentration of treated water W2 was measured under these operating conditions. The results are shown in Table 3, along with the current density, the value of the formula AA/CDout, and the boron (B) removal rate. Figure 7 shows the relationship between current density and boron removal rate, Figure 8 shows the relationship between current density and boron concentration removal rate in treated water W2, and Figure 9 shows the relationship between the formula AA/CDout and boron concentration removal rate.

表3及び図7~図9から明らかなとおり、一般に、電流密度を上げるほど、ホウ素除去率は向上するが、AA/CDoutの値も上昇し、処理水W2のホウ素が一定値に漸近する。特にAA/CDoutの値が0.1を超えると顕著に処理水W2のホウ素濃度は一定値に収束していくことがわかった。 As is clear from Table 3 and Figures 7 to 9, generally, the higher the current density, the better the boron removal rate, but the value of AA/CDout also increases, and the boron concentration in treated water W2 gradually approaches a constant value. In particular, it was found that when the value of AA/CDout exceeds 0.1, the boron concentration in treated water W2 significantly converges to a constant value.

[実施例13,14]
実施例6において、運転電流密度100〔A/m〕で、濃縮室C及び陽極室E+及び陰極室E-に供給する濃縮水W3、電極水W4のホウ素濃度を100ppb及び250ppbとするとともに、脱塩室Dにホウ素濃度を10ppbとした被処理水を供給して運転した。なお、計算用のパラメータは実施例1と同じとした。
[Examples 13 and 14]
In Example 6, the system was operated at an operating current density of 100 [A/m 2 ], with the boron concentrations of the concentrated water W3 and electrode water W4 supplied to the concentration chamber C, anode chamber E+, and cathode chamber E- set to 100 ppb and 250 ppb, respectively, and water to be treated with a boron concentration of 10 ppb was supplied to the deionization chamber D. The calculation parameters were the same as in Example 1.

これらの運転条件における、処理水W2のホウ素濃度を測定した。結果を濃縮水W3のウ素濃度、濃縮排水W5のホウ素濃度、処理水W2の出口に隣接する濃縮室の入口の濃縮水W3のホウ素濃度、数式AA/CDoutの値、及びホウ(B)素除去率とともに表4に示す。 The boron concentration of treated water W2 was measured under these operating conditions. The results are shown in Table 4, along with the uron concentration of concentrated water W3, the boron concentration of concentrated wastewater W5, the boron concentration of concentrated water W3 at the inlet of the concentration chamber adjacent to the outlet of treated water W2, the value of the formula AA/CDout, and the boron (B) removal rate.

[実施例15,16]
図10に示すような試験用の電気脱イオン装置を用意した。図10において、電気脱イオン装置1は、基本的には図1に示すものと同じ構成を有する。そして、超純水(UPW)の供給源6に連通して超純水送水管が設けられており、この超純水送水管が途中で送水管7と送水管8とに分岐していて、脱塩室Dの供給水と濃縮室C、陽極室E+及び陰極室E-とは同方向となっている。そして、薬液成分として既知の濃度のホウ素溶液Bのタンク11を用意し、このタンク11からポンプ13を備えた供給管12が送水管7に接続しているとともに、薬液成分として既知の濃度のホウ素溶液Bのタンク15を用意し、このタンク15からポンプ17を備えた供給管16が送水管8に接続している。これらにより、脱塩室D、陽極室E+及び陰極室E-にはタンク11からホウ素溶液Bが添加された超純水が供給されるとともに、濃縮室Cにはタンク15からホウ素溶液Bが添加された超純水が供給される。これにより、脱塩室Dと濃縮室Cに異なる濃度でホウ素が添加された超純水が供給される構造となっている。なお、14C、14Dはそれぞれホウ素濃度測定手段である。
[Examples 15 and 16]
A test electrodeionization apparatus as shown in Figure 10 was prepared. In Figure 10, electrodeionization apparatus 1 has basically the same configuration as that shown in Figure 1. An ultrapure water supply pipe is provided in communication with an ultrapure water (UPW) supply source 6. This ultrapure water supply pipe branches into supply pipes 7 and 8 along the way, so that the supply water for deionization chamber D flows in the same direction as the water for concentration chamber C, anode chamber E+, and cathode chamber E-. A tank 11 containing a boron solution B of a known concentration as a chemical component is provided, and a supply pipe 12 equipped with a pump 13 connects this tank 11 to supply pipe 7. A tank 15 containing a boron solution B of a known concentration as a chemical component is also provided, and a supply pipe 16 equipped with a pump 17 connects this tank 15 to supply pipe 8. As a result, ultrapure water to which boron solution B has been added is supplied from tank 11 to deionization compartment D, anode compartment E+, and cathode compartment E-, and ultrapure water to which boron solution B has been added is supplied from tank 15 to concentration compartment C. This results in a structure in which ultrapure water to which boron has been added at different concentrations is supplied to deionization compartment D and concentration compartment C. Note that 14C and 14D are boron concentration measuring means, respectively.

これらの運転条件における、処理水W2のホウ素濃度を測定した。結果を濃縮水W3のホウ素濃度、濃縮排水W5のホウ素濃度、処理水W2の出口に隣接する濃縮室出口の濃縮排水5のホウ素濃度、数式AA/CDoutの値、及びホウ(B)素除去率とともに表4に示す。 The boron concentration of treated water W2 was measured under these operating conditions. The results are shown in Table 4, along with the boron concentration of concentrated water W3, the boron concentration of concentrated wastewater W5, the boron concentration of concentrated wastewater W5 at the outlet of the concentration chamber adjacent to the outlet of treated water W2, the value of the formula AA/CDout, and the boron (B) removal rate.

表4から明らかなとおり、脱塩室の処理水出口に隣接する濃縮の入口または出口濃度に着目すると、脱塩水Dと濃縮室Cとに同方向で通水した場合(パラレルフロー)も、脱塩水Dと濃縮室Cとに同方向で通水した場合(カウンターフロー)も数式AAは同じとなる。したがって、「脱塩室の処理水出口に隣接する濃縮の入口または出口濃度」で拡散の影響をまとめることで、カウンターフローもパラレルフローも同じ数式を適用できることがわかる。 As is clear from Table 4, when focusing on the inlet or outlet concentration of the concentrating compartment adjacent to the treated water outlet of the desalination compartment, formula AA is the same whether desalinated water D and concentrating compartment C are passed in the same direction (parallel flow) or whether desalinated water D and concentrating compartment C are passed in the same direction (counter flow). Therefore, by summarizing the effect of diffusion in terms of the "inlet or outlet concentration of the concentrating compartment adjacent to the treated water outlet of the desalting compartment," it can be seen that the same formula can be applied to both counter flow and parallel flow.

1 電気脱イオン装置
2,3 電極板
2A 陽極(電極)
3A 陰極(電極)
4 アニオン交換膜(AM)
5 カチオン交換膜(CM)
6 超純水(UPW)の供給源
7 送水管
8 送水管
11 タンク
12 供給管
13 ポンプ
14A,14B,14C,14D ホウ素濃度測定手段
15 タンク
16 供給管
17 ポンプ
C 濃縮室
D 脱塩室
E+ 陽極室
E- 陰極室
W1 被処理水
W2 処理水
W3 濃縮水
W4 電極水
W5 濃縮排水
W6 電極排水
1 Electrodeionization device 2, 3 Electrode plate 2A Anode (electrode)
3A cathode (electrode)
4. Anion exchange membrane (AM)
5. Cation exchange membrane (CM)
6 Ultrapure water (UPW) supply source 7 Water supply pipe 8 Water supply pipe 11 Tank 12 Supply pipe 13 Pumps 14A, 14B, 14C, 14D Boron concentration measuring means 15 Tank 16 Supply pipe 17 Pump C Concentration chamber D Deionization chamber E+ Anode chamber E- Cathode chamber W1 Water to be treated W2 Treated water W3 Concentrated water W4 Electrode water W5 Concentrated wastewater W6 Electrode wastewater

Claims (2)

陽極と陰極との間に複数のアニオン交換膜とカチオン交換膜とを配列して濃縮室と脱塩室とを形成し、脱塩室にイオン交換体を充填してなる電気脱イオン装置の運転方法であって、下記式(1)及び(2を充足する条件で運転する、電気脱イオン装置の運転方法。
50<A<200 ・・・(1)
(式(1)中、A:電気脱イオン装置の操作電流密度〔A/m〕)
AA/CDout<0.2 ・・・(2)
(式(2)中、AA:下記式(3)で算出される拡散によって濃縮室から脱塩室に移動するホウ素の濃度〔ng/L〕
CDout:電気脱イオン装置の処理水のホウ素濃度〔ng/L〕)
AA=D×(C×A/dx)×Q×10〔ng/L〕 ・・・(3)
(式(3)中、D:拡散係数〔m/秒〕、
:脱塩室の処理水出口に隣接する濃縮の入口または出口のホウ素濃度〔ng/L〕、
A:電気脱イオン装置の操作電流値〔A/m〕、
dx:イオン交換膜の厚み〔m〕、
Q:電気脱イオン装置の脱塩室のセルの流量〔L/秒〕)
A method for operating an electrodeionization apparatus comprising an anode, a cathode, and a plurality of anion exchange membranes and cation exchange membranes arranged between the anode and cathode to form concentration compartments and deionization compartments, and the deionization compartments are filled with ion exchangers, the method comprising operating the electrodeionization apparatus under conditions that satisfy the following formulas (1) and (2 ) :
50<A<200...(1)
(In formula (1), A: operating current density of the electrodeionization device [A/m 2 ])
AA/CDout<0.2...(2)
(In formula (2), AA: the concentration of boron that moves from the concentration compartment to the deionization compartment by diffusion [ng/L] calculated by the following formula (3),
CDout: boron concentration of treated water from electrodeionization device [ng/L]
AA=D×( CC ×A/dx)×Q×10 3 [ng/L] ...(3)
(In the formula (3), D: diffusion coefficient [m 2 /sec],
C C : boron concentration at the inlet or outlet of the concentration compartment adjacent to the treated water outlet of the desalination compartment [ng/L];
A: operating current value of the electrodeionization device [A/m 2 ],
dx: thickness of ion exchange membrane [m],
Q: Flow rate of the cell in the deionization compartment of the electrodeionization device [L/sec]
式(2)が、AA/CDout<0.1 ・・・(2)
である、請求項1に記載の電気脱イオン装置の運転方法。
Formula (2) is AA/CDout<0.1 (2)
2. The method of claim 1, wherein:
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JP2017140548A (en) 2016-02-08 2017-08-17 栗田工業株式会社 Method of operating electrodeionization apparatus
WO2018235366A1 (en) 2017-06-23 2018-12-27 栗田工業株式会社 Control method and design method of electrodeionization apparatus
JP2020015007A (en) 2018-07-26 2020-01-30 オルガノ株式会社 Electric deionized water production equipment
JP2021102206A (en) 2019-12-25 2021-07-15 栗田工業株式会社 Control method for ultrapure water producing apparatus

Patent Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2010042324A (en) 2008-08-08 2010-02-25 Kurita Water Ind Ltd Pure water producing apparatus and pure water producing method
JP2017140548A (en) 2016-02-08 2017-08-17 栗田工業株式会社 Method of operating electrodeionization apparatus
WO2018235366A1 (en) 2017-06-23 2018-12-27 栗田工業株式会社 Control method and design method of electrodeionization apparatus
JP2020015007A (en) 2018-07-26 2020-01-30 オルガノ株式会社 Electric deionized water production equipment
JP2021102206A (en) 2019-12-25 2021-07-15 栗田工業株式会社 Control method for ultrapure water producing apparatus

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