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JP7777321B2 - Agent and method for inhibiting or promoting the growth of specific acne bacteria - Google Patents
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JP7777321B2 - Agent and method for inhibiting or promoting the growth of specific acne bacteria - Google Patents

Agent and method for inhibiting or promoting the growth of specific acne bacteria

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JP7777321B2
JP7777321B2 JP2021013789A JP2021013789A JP7777321B2 JP 7777321 B2 JP7777321 B2 JP 7777321B2 JP 2021013789 A JP2021013789 A JP 2021013789A JP 2021013789 A JP2021013789 A JP 2021013789A JP 7777321 B2 JP7777321 B2 JP 7777321B2
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匡 藤井
巧 栃尾
明仁 遠藤
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Bフードサイエンス株式会社
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本発明は、エリスリトールを有効成分とする、ニキビ予防改善剤および特定のアクネ菌の増殖を抑制または促進する剤に関する。 The present invention relates to an acne prevention and improvement agent and an agent that inhibits or promotes the growth of specific acne bacteria, each containing erythritol as an active ingredient.

ニキビは、「尋常性?瘡」と呼ばれる皮膚の慢性疾患で、多くの場合、顔面、胸、肩、背中の皮膚に、黒色面皰(めんぽう)、白色面皰、吹き出物、嚢腫(のうしゅ)などの隆起が現れ、ときに膿瘍も生じる。ニキビは、死んだ皮膚細胞の堆積物や細菌、乾燥した皮脂などが皮膚の毛包をふさぐことによって生じる。ニキビの原因細菌としては、プロピオニバクテリウム・アクネス(Propionibacterium acnes、以下「アクネ菌」という。)が知られている。アクネ菌は、リパーゼで皮脂成分のうち中性脂肪であるトリグリセリドを分解しつつ増殖し、さらに炎症の発生にかかわる成分も分泌する。 Acne, also known as "acne vulgaris," is a chronic skin disease that often manifests as bumps such as blackheads, whiteheads, pimples, and cysts on the face, chest, shoulders, and back, and sometimes abscesses. Acne occurs when deposits of dead skin cells, bacteria, and dried sebum clog hair follicles. Propionibacterium acnes (hereinafter referred to as "P. acnes") is known to be the causative bacterium of acne. P. acnes grows by breaking down triglycerides, a neutral fat found in sebum, with lipase, and also secretes components involved in the development of inflammation.

アクネ菌は、その16S リボソーマルRNA遺伝子(16S rDNA)の配列多型をもとに、RT1~10といったリボタイプ(RT)に分類される。近年、ニキビ患者と健常者(ニキビの症状を呈さない者)との間では、皮膚に存在するアクネ菌の総量は変わらない一方で、優勢なアクネ菌のリボタイプが異なるという報告がされている。それによると、RT1、RT2およびRT3は患者群と健常者群とに均一に分布するのに対して、RT6はほぼ健常者にのみ分布し、RT4、RT5、RT8およびRT10はニキビ患者群に多く分布する。また、RT2およびRT6のアクネ菌はリパーゼ遺伝子領域に変異を有し、リパーゼ活性が相対的に低い可能性が示唆されている(非特許文献1、非特許文献2)。すなわち、アクネ菌のうちリパーゼ遺伝子領域に変異を有する特定の菌型は、リパーゼ活性が低いゆえにニキビの発生や悪化に関与せず、その結果としてニキビ患者で劣勢となっている可能性が示唆されている。 Propionibacterium acnes is classified into ribotypes (RT), RT1-10, based on sequence polymorphisms in its 16S ribosomal RNA gene (16S rDNA). Recent reports have shown that while the total amount of Propionibacterium acnes present on the skin is similar between acne patients and healthy individuals (those without acne symptoms), the predominant ribotype of Propionibacterium acnes differs. According to these studies, RT1, RT2, and RT3 are uniformly distributed between patients and healthy individuals, whereas RT6 is distributed almost exclusively in healthy individuals, and RT4, RT5, RT8, and RT10 are more prevalent in acne patients. It has also been suggested that RT2 and RT6 Propionibacterium acnes have mutations in the lipase gene region, potentially resulting in relatively low lipase activity (Non-Patent Documents 1 and 2). In other words, it has been suggested that certain types of Propionibacterium acnes that have mutations in the lipase gene region have low lipase activity and are therefore not involved in the development or worsening of acne, and as a result may be at a disadvantage in acne patients.

Joseph McLaughlin et al., Propionibacterium acnes and Acne Vulgaris: New Insights from the Integration of Population Genetic, Multi-Omic, Biochemical and Host-Microbe Studies, Microorganisms 2019, 7(5), 128; https://doi.org/10.3390/microorganisms7050128Joseph McLaughlin et al., Propionibacterium acnes and Acne Vulgaris: New Insights from the Integration of Population Genetic, Multi-Omic, Biochemical and Host-Microbe Studies, Microorganisms 2019, 7(5), 128; https://doi.org/10.3390/microorganisms7050128 Shuta Tomida et al., Pan-Genome and Comparative Genome Analyses of Propionibacterium acnes Reveal Its Genomic Diversity in the Healthy and Diseased Human Skin Microbiome, mBio, May/June 2013 Volume 4 Issue 3 e00003-13Shuta Tomida et al., Pan-Genome and Comparative Genome Analyses of Propionibacterium acnes Reveal Its Genomic Diversity in the Healthy and Diseased Human Skin Microbiome, mBio, May/June 2013 Volume 4 Issue 3 e00003-13

以上のことから、アクネ菌のうちでもニキビの発症や悪化に関与するのは、RT4、RT5およびRT8などの特定の菌型、あるいはリパーゼ遺伝子領域に変異を有さない特定の菌型であり、RT2やRT6、あるいはリパーゼ遺伝子領域に変異を有する菌型は、関与しないと考えられる。よって、これらニキビの発症や悪化に関与する菌型の増殖を抑制することにより、ニキビの予防または改善に寄与できると考えられる。 Based on the above, it is believed that the specific types of Propionibacterium acnes that are involved in the onset and worsening of acne, such as RT4, RT5, and RT8, or specific types that do not have mutations in the lipase gene region, and that RT2, RT6, or types that have mutations in the lipase gene region are not involved. Therefore, it is believed that inhibiting the growth of these types of bacteria that are involved in the onset and worsening of acne can contribute to the prevention or improvement of acne.

また、アクネ菌は皮膚常在菌であり、その総存在量はニキビ患者と健常者とで変わらないことから、ニキビの発症や悪化に関与しない特定の菌型(RT2やRT6、あるいはリパーゼ遺伝子領域に変異を有する菌型)の増殖を促進することにより、相対的にニキビの発症や悪化に関与する菌型の増殖を抑制でき、ニキビの予防または改善に寄与できると考えられる。 In addition, since Propionibacterium acnes is a normal skin flora, and its total abundance is the same in acne patients and healthy individuals, it is thought that by promoting the growth of specific bacterial strains that are not involved in the onset or worsening of acne (such as RT2, RT6, or bacterial strains with mutations in the lipase gene region), it is possible to relatively suppress the growth of bacterial strains that are involved in the onset or worsening of acne, thereby contributing to the prevention or improvement of acne.

そこで、本発明は、アクネ菌のうち、ニキビの発症や悪化に関与しうる特定の菌型の増殖を抑制する技術を提供することを目的とする。また、本発明は、アクネ菌のうち、ニキビの発症や悪化に関与しない特定の菌型の増殖を促進する技術を提供することを目的とする。さらに、本発明は、ニキビの予防または改善に寄与する技術を提供することを目的とする。 The present invention therefore aims to provide a technology for inhibiting the growth of specific types of Propionibacterium acnes that may be involved in the onset or worsening of acne. It also aims to provide a technology for promoting the growth of specific types of Propionibacterium acnes that are not involved in the onset or worsening of acne. It also aims to provide a technology that contributes to the prevention or improvement of acne.

本発明者らは、鋭意研究の結果、エリスリトールが、ニキビの発症や悪化に関与しうる特定の菌型のアクネ菌の増殖を抑制する一方で、ニキビの発症や悪化に関与しない特定の菌型のアクネ菌の増殖を促進できることを見出した。そこで、これらの知見に基づいて、下記の各発明を完成した。 As a result of extensive research, the inventors have discovered that erythritol can inhibit the growth of certain types of Propionibacterium acnes that may be involved in the onset or worsening of acne, while promoting the growth of certain types of Propionibacterium acnes that are not involved in the onset or worsening of acne. Based on these findings, the inventors have completed the following inventions.

(1)本発明に係るニキビの予防または改善剤は、エリスリトールを有効成分とする。 (1) The acne prevention or amelioration agent of the present invention contains erythritol as an active ingredient.

(2)本発明に係るアクネ菌の増殖抑制剤の第1の態様は、リボタイプ4型(RT4)、5型(RT5)および8型(RT8)から選択される1以上のアクネ菌の増殖を抑制する剤であって、エリスリトールを有効成分とする。 (2) A first aspect of the acne bacteria growth inhibitor of the present invention is an agent that inhibits the growth of one or more acne bacteria selected from ribotypes 4 (RT4), 5 (RT5), and 8 (RT8), and contains erythritol as an active ingredient.

(3)本発明に係るアクネ菌の増殖抑制剤の第2の態様は、配列番号11に示されるDNA領域に変異を有さないアクネ菌の増殖を抑制する剤であって、エリスリトールを有効成分とする。 (3) A second aspect of the acne bacteria growth inhibitor of the present invention is an agent for inhibiting the growth of acne bacteria that do not have a mutation in the DNA region shown in SEQ ID NO: 11, and contains erythritol as an active ingredient.

(4)本発明に係るアクネ菌の増殖促進剤の第1の態様は、リボタイプ2型(RT2)および/またはリボタイプ6型(RT6)のアクネ菌の増殖を促進する剤であって、エリスリトールを有効成分とする。 (4) A first aspect of the acne bacteria proliferation promoter of the present invention is an agent for promoting the proliferation of ribotype 2 (RT2) and/or ribotype 6 (RT6) acne bacteria, and contains erythritol as an active ingredient.

(5)本発明に係るアクネ菌の増殖促進剤の第2の態様は、配列番号11に示されるDNA領域に変異を有するアクネ菌の増殖を促進する剤であって、エリスリトールを有効成分とする。 (5) A second aspect of the acne bacteria proliferation promoter of the present invention is an agent for promoting the proliferation of acne bacteria having a mutation in the DNA region shown in SEQ ID NO: 11, and contains erythritol as an active ingredient.

(6)本発明に係るアクネ菌の増殖促進剤の第2の態様において、配列番号11に示されるDNA領域における前記変異は下記(i)~(iii)から選択される1以上を含むものであってよい;
(i)配列番号11の138~143番目の6塩基の欠失、
(ii)配列番号11の288番目の1塩基の欠失、
(iii)配列番号11の370~372番目における終止コドンの出現。
(6) In a second aspect of the agent for promoting the proliferation of Propionibacterium acnes according to the present invention, the mutation in the DNA region shown in SEQ ID NO: 11 may include one or more mutations selected from the following (i) to (iii):
(i) deletion of 6 bases at positions 138 to 143 of SEQ ID NO: 11;
(ii) deletion of one base at position 288 of SEQ ID NO: 11;
(iii) The occurrence of a stop codon at positions 370 to 372 of SEQ ID NO: 11.

(7)本発明に係るアクネ菌型選択的抗菌剤は、アクネ菌型選択的抗菌作用として、HL007PA1株、HL038PA1株、HL043PA2株、HL072PA1株、HL086PA1株およびHL110PA1株から選択される1以上のアクネ菌株に対しては増殖を抑制し、かつ、HL110PA3株に対しては増殖を抑制しないまたは促進する物性を有するものであって、エリスリトールを有効成分とする。 (7) The Propionibacterium acnes-selective antibacterial agent of the present invention has a selective antibacterial effect against Propionibacterium acnes, inhibiting the growth of one or more Propionibacterium acnes strains selected from the group consisting of HL007PA1 strain, HL038PA1 strain, HL043PA2 strain, HL072PA1 strain, HL086PA1 strain, and HL110PA1 strain, and exhibiting physical properties that do not inhibit or promote the growth of the HL110PA3 strain, and contains erythritol as an active ingredient.

(8)本発明に係る剤は、外用剤として用いられるものであってもよい。 (8) The agent of the present invention may be used as an external preparation.

本発明によれば、アクネ菌のうち、ニキビの発症や悪化に関与しうる特定の菌型の増殖を抑制することができる。本発明によれば、アクネ菌のうち、ニキビの発症や悪化に関与しない特定の菌型の増殖を促進することができる。よって、本発明によれば、ニキビの予防または改善に寄与することができる。 The present invention can inhibit the growth of specific types of Propionibacterium acnes that may be involved in the onset or worsening of acne. The present invention can promote the growth of specific types of Propionibacterium acnes that are not involved in the onset or worsening of acne. Therefore, the present invention can contribute to the prevention or improvement of acne.

また、本発明が有効成分とするエリスリトールは、食品としても用いられることから明かであるように、ヒトや動物にとって極めて安全な物質である。従って、本発明によれば、皮膚への刺激性や安全性を全く懸念することなく、ニキビの発症や悪化に関与しうる特定の菌型の増殖を抑制し、あるいはニキビの発症や悪化に関与しない特定の菌型の増殖を促進することができる。 Furthermore, erythritol, the active ingredient of the present invention, is an extremely safe substance for humans and animals, as evidenced by its use as a food product. Therefore, according to the present invention, it is possible to inhibit the growth of specific bacterial strains that may be involved in the onset or worsening of acne, or to promote the growth of specific bacterial strains that are not involved in the onset or worsening of acne, without any concerns about skin irritation or safety.

0%、5(w/v)%または10(w/v)%のエリスリトールを含む培地でアクネ菌の各菌株を培養して、得られた培養液の濁度を示す棒グラフである。有意差検定で有意であったものを*で示す。1 is a bar graph showing the turbidity of culture solutions obtained by culturing various strains of Propionibacterium acnes in media containing 0%, 5 (w/v)% or 10 (w/v)% erythritol. Significant differences are indicated by *. アクネ菌のリパーゼ遺伝子領域を模式的に示す図である。FIG. 1 is a diagram showing a schematic diagram of the lipase gene region of Propionibacterium acnes. アクネ菌の各菌株について、リパーゼ遺伝子領域をシークエンスして得られた塩基配列(1~320番目)を示す図である。FIG. 1 shows the base sequences (1st to 320th bases) obtained by sequencing the lipase gene region of each P. acnes strain. アクネ菌の各菌株について、リパーゼ遺伝子領域をシークエンスして得られた塩基配列(321~400番目)を示す図である。FIG. 1 shows the base sequences (321st to 400th bases) obtained by sequencing the lipase gene region of each P. acnes strain.

以下、本発明について詳細に説明する。本発明は、ニキビの予防または改善剤、アクネ菌の増殖抑制剤(第1の態様および第2の態様)、アクネ菌の増殖促進剤(第1の態様および第2の態様)ならびにアクネ菌型選択的抗菌剤を提供する。本明細書では、これらの剤をまとめて、あるいはいずれかの剤を指して「本発明の剤」あるいは「本剤」という場合がある。 The present invention is described in detail below. The present invention provides an agent for preventing or ameliorating acne, an agent for inhibiting the growth of Propionibacterium acnes (first and second embodiments), an agent for promoting the growth of Propionibacterium acnes (first and second embodiments), and an Propionibacterium acnes-type selective antibacterial agent. In this specification, these agents may be collectively referred to as the "agent of the present invention" or "the agent" or any one of them may be referred to as such.

本発明において「リボタイプ」は、16S リボソーマルRNA遺伝子(16S rDNA)の配列多型をもとに分類した、アクネ菌のサブタイプ(菌型)をいう。16S rDNAの野生型配列(配列番号1)を有するアクネ菌をリボタイプ1型(RT1)、野生型配列において、T854C変異を有するサブタイプをリボタイプ2型(RT2)、T1007C変異を有するサブタイプをリボタイプ3型(RT3)、G1058CおよびA1201C変異を有するサブタイプをリボタイプ4型(RT4)、G1058C変異を有するサブタイプをリボタイプ5型(RT5)、T854CおよびC1336T変異を有するサブタイプをリボタイプ6型(RT6)、G1004AおよびT1007C変異を有するサブタイプをリボタイプ8型(RT8)と同定することができる(S Fitz-Gibbon et al., The Skin Microbiome Associated with Acne, Journal of Investigative Dermatology 133, 2152?2160; doi:10.1038/jid.2013.21; published online 28 February 2013)。 In the present invention, "ribotype" refers to a subtype (bacterial type) of P. acnes classified based on sequence polymorphism of the 16S ribosomal RNA gene (16S rDNA). P. acnes having the wild-type sequence of 16S rDNA (SEQ ID NO: 1) can be identified as ribotype 1 (RT1), subtypes having the T854C mutation in the wild-type sequence as ribotype 2 (RT2), subtypes having the T1007C mutation as ribotype 3 (RT3), subtypes having G1058C and A1201C mutations as ribotype 4 (RT4), subtypes having G1058C mutation as ribotype 5 (RT5), subtypes having T854C and C1336T mutations as ribotype 6 (RT6), and subtypes having G1004A and T1007C mutations as ribotype 8 (RT8) (S. Fitz-Gibbon et al., The Skin Microbiome Associated with Acne, Journal of Investigative Dermatology 133, 2152-2160; doi:10.1038/jid.2013.21; published online 28 February 2013).

「配列番号11に示されるDNA領域」は、アクネ菌のリパーゼ遺伝子領域の一部領域である。ここで、当該リパーゼ遺伝子領域は、遺伝子間領域(intergenic region)を挟んで前後に縦列配置された2つのリパーゼ遺伝子(SK137株において遺伝子座HMPREF0675_4855およびHMPREF0675_4856で特定されるリパーゼコーディング領域)からなる。配列番号11は、当該リパーゼ遺伝子領域の、1つ目のリパーゼ遺伝子のカルボキシル末端側領域、遺伝子間領域および2つ目のリパーゼ遺伝子のアミノ末端側領域からなる。 The "DNA region shown in SEQ ID NO: 11" is a partial region of the lipase gene region of Propionibacterium acnes. This lipase gene region consists of two lipase genes (lipase coding regions identified by loci HMPREF0675_4855 and HMPREF0675_4856 in the SK137 strain) arranged in tandem with an intergenic region between them. SEQ ID NO: 11 consists of the carboxyl-terminal region of the first lipase gene, the intergenic region, and the amino-terminal region of the second lipase gene in this lipase gene region.

配列番号11に示されるDNA領域における変異とは、配列番号11における塩基の欠失、挿入、置換および/または付加や、それに伴うコーディング領域内における終止コドンの出現などをいう。欠失、挿入、置換および/または付加される塩基の個数としては、例えば、1~40個、1~30個、1~20個、1~15個、1~10個、1~6個の任意の数を例示することができる。また、変異の具体例としては、下記(i)~(iii)を例示することができる。
(i)配列番号11の138~143番目の6塩基の欠失、
(ii)配列番号11の288番目の1塩基の欠失、
(iii)(塩基の欠失、挿入、置換および/または付加に伴う)配列番号11の370~372番目における終止コドンの出現。
Mutations in the DNA region shown in SEQ ID NO: 11 refer to deletions, insertions, substitutions, and/or additions of bases in SEQ ID NO: 11, and the associated appearance of stop codons in the coding region. The number of bases deleted, inserted, substituted, and/or added can be any number, for example, 1 to 40, 1 to 30, 1 to 20, 1 to 15, 1 to 10, or 1 to 6. Specific examples of mutations include the following (i) to (iii):
(i) deletion of 6 bases at positions 138 to 143 of SEQ ID NO: 11;
(ii) deletion of one base at position 288 of SEQ ID NO: 11;
(iii) The occurrence of a stop codon at positions 370 to 372 of SEQ ID NO: 11 (associated with deletion, insertion, substitution and/or addition of bases).

アクネ菌の増殖が抑制されたか、それとも、促進されたかは、後述する実施例に示すように、培養試験により判断することができる。すなわち、一方は本剤を添加して、他方はこれを添加せずに、同種の培地を調製する。この両培地にアクネ菌を植菌して所定の期間培養した後、培地の菌量を測定する。菌量の測定は、簡便には濁度法により行うことができるが、乾燥菌体重量法や湿重量法、リアルタイムPCR法などの公知の手法を適宜選択することができる。その結果、本剤を添加したものの方が、これを添加しないものよりも菌量が小さければ、本剤によりアクネ菌の増殖が抑制されたと判断することができる。逆に、本剤を添加したものの方が、これを添加しないものよりも菌量が大きければ、本剤によりアクネ菌の増殖が促進されたと判断することができる。 Whether the growth of P. acnes has been inhibited or promoted can be determined by a culture test, as shown in the Examples below. Specifically, two identical media are prepared, one with the addition of this agent and the other without. P. acnes is inoculated into both media and cultured for a predetermined period, after which the bacterial mass in the media is measured. The bacterial mass can be measured simply by the turbidity method, but any known method, such as the dry bacterial weight method, wet bacterial weight method, or real-time PCR method, can also be used as appropriate. If the bacterial mass is lower in the sample with the agent added than in the sample without the agent, it can be determined that the agent has inhibited the growth of P. acnes. Conversely, if the bacterial mass is higher in the sample with the agent added than in the sample without the agent added, it can be determined that the agent has promoted the growth of P. acnes.

「アクネ菌型選択的抗菌剤」は、アクネ菌に対して選択的な抗菌作用を有する剤をいう。ここで、当該選択的抗菌作用とは、ニキビの発症や悪化に関与する菌型のアクネ菌の増殖を抑制し、かつ、ニキビの発症や悪化に関与しない菌型のアクネ菌の増殖は抑制しない、ないしは促進することを意味する。当該選択的抗菌作用を有するか否かは、例えば、HL007PA1株(HM496、BEI Resources、RT4)、HL038PA1株(HM512、BEI Resources、RT4)、HL043PA2株(HM514、BEI Resources、RT5)、HL072PA1株(HM531、BEI Resources、RT5)、HL086PA1株(HM539、BEI Resources、RT8)もしくはHL110PA1株(HM552、BEI Resources、RT8)に対しては増殖を抑制し、かつ、HL110PA3株(HM554、BEI Resources、RT6)に対しては増殖を抑制しないまたは促進する物性を有するか否かで、判断することができる。 "An acne-type selective antibacterial agent" refers to an agent that has selective antibacterial activity against acne bacteria. Here, this selective antibacterial activity means that the agent inhibits the growth of acne bacteria types that are involved in the onset and worsening of acne, but does not inhibit or promote the growth of acne bacteria types that are not involved in the onset and worsening of acne. Whether or not an agent has this selective antibacterial activity can be determined, for example, by whether or not it has physical properties that inhibit the growth of the HL007PA1 strain (HM496, BEI Resources, RT4), HL038PA1 strain (HM512, BEI Resources, RT4), HL043PA2 strain (HM514, BEI Resources, RT5), HL072PA1 strain (HM531, BEI Resources, RT5), HL086PA1 strain (HM539, BEI Resources, RT8), or HL110PA1 strain (HM552, BEI Resources, RT8), but do not inhibit or promote the growth of the HL110PA3 strain (HM554, BEI Resources, RT6).

エリスリトール(エリトリトール)は、ブドウやナシなどの果実、味噌や醤油、清酒などの発酵食品にも元来含まれている糖アルコールである。化学名は1,2,3,4-Butaneterolで四炭糖の単糖アルコールである。エリスロース(エリトロース)の還元体であるが、工業的には発酵により得られる。 Erythritol is a sugar alcohol that is naturally found in fruits such as grapes and pears, as well as fermented foods such as miso, soy sauce, and sake. Its chemical name is 1,2,3,4-butaneterol, and it is a tetracarbonate monosaccharide alcohol. It is a reduced form of erythrose, and is obtained industrially through fermentation.

エリスリトールは、当業者に公知の方法に従って製造して用いてもよく、簡便には、市販されているものを用いてもよい。また、エリスリトールは、液体、粉末状、顆粒状などいずれの形態のものも用いることができる。 Erythritol may be produced according to methods known to those skilled in the art, or commercially available erythritol may be used for convenience. Erythritol may also be used in any form, including liquid, powder, or granules.

本剤は、皮膚常在菌であるアクネ菌のうち、ニキビの発症や悪化に関与しうる特定の菌型の増殖を抑制し、あるいは、ニキビの発症や悪化に関与しない特定の菌型の増殖を促進して、ニキビの発症や悪化が起こりにくい皮膚環境にすることにより効果を発揮する。よって、本剤は、皮膚に作用する使用態様の製剤、すなわち外用剤として用いることができる。 This agent exerts its effects by suppressing the growth of specific types of Propionibacterium acnes, a normal skin flora, that may be involved in the onset or worsening of acne, or by promoting the growth of specific types of bacteria that are not involved in the onset or worsening of acne, thereby creating a skin environment that is less susceptible to the onset or worsening of acne. Therefore, this agent can be used as a formulation that acts on the skin, i.e., as a topical agent.

本発明の外用剤としては、皮膚に直接塗布や貼付、噴霧等するもの(化粧品、医薬部外品、医薬品)の他、皮膚洗浄料や入浴料、消毒剤、殺菌剤などの衛生用品を例示することができる。製品の剤型としては、エアゾール剤、ロールオン、スティック、クリーム、シート剤、ローション、乳液、ジェル、粉剤、錠剤等の形態を例示することができる。本剤が配合された製品は、当該製品に通常用いられる原料(例えば、油、界面活性剤、アルコール、防腐剤、キレート剤、酸化防止剤、増粘剤、香料、殺菌剤等の成分)にエリスリトールを添加して、製造することができる。 Examples of topical preparations of the present invention include those that are directly applied, pasted, or sprayed onto the skin (cosmetics, quasi-drugs, and pharmaceuticals), as well as hygiene products such as skin cleansers, bath additives, disinfectants, and bactericides. Product forms include aerosols, roll-ons, sticks, creams, sheets, lotions, emulsions, gels, powders, and tablets. Products containing the present agent can be manufactured by adding erythritol to ingredients commonly used in such products (e.g., oils, surfactants, alcohols, preservatives, chelating agents, antioxidants, thickeners, fragrances, bactericides, and other ingredients).

エリスリトールの含有量は、製品の形態や用途に応じて適宜設定することができるが、例えば0.01~35質量%、好ましくは0.01~30質量%、より好ましくは0.5~25質量%、さらに好ましくは1~20質量%を例示することができる。 The erythritol content can be set appropriately depending on the product form and application, but examples include 0.01 to 35% by mass, preferably 0.01 to 30% by mass, more preferably 0.5 to 25% by mass, and even more preferably 1 to 20% by mass.

以下、本発明について、各実施例に基づいて説明する。なお、本発明の技術的範囲は、これらの実施例によって示される特徴に限定されない。 The present invention will now be described based on examples. Note that the technical scope of the present invention is not limited to the features demonstrated in these examples.

本実施例において、エリスリトールは、市販品(製品名:Erythritol、白色粒状、物産フードサイエンス(株))を用いた。また、アクネ菌は表1に記載のPropionibacterium acnes株を用いた。No.6~10、12および13の菌株はBEI Resources(アメリカ合衆国)から入手したものであり、表1にカタログ番号も示す。No.1~5および11の菌株は、遠藤明仁氏(東京農業大学 生物産業学部 食香粧化学科 准教授)から分譲された。
In this example, commercially available erythritol (product name: Erythritol, white granules, Bussan Food Science Co., Ltd.) was used. Propionibacterium acnes strains listed in Table 1 were used as acne bacteria. Strains Nos. 6 to 10, 12, and 13 were obtained from BEI Resources (USA), and their catalog numbers are also shown in Table 1. Strains Nos. 1 to 5 and 11 were provided by Akihito Endo (Associate Professor, Department of Food and Cosmetic Chemistry, Faculty of Bioindustry, Tokyo University of Agriculture).

No.6~10、12および13のリボタイプは、非特許文献2の表1に記載されたとおりである。No.1~5および11のリボタイプは、常法にしたがって各菌株の16S rDNAをシークエンスし、得られた配列に基づいて決定した。No.1~5および11の16S rDNA塩基配列を配列番号2~7にそれぞれ示す。表1のリボタイプのうちRT1、RT2およびRT3は、ニキビ患者群の皮膚と健常者(ニキビ症状が無い者)群の皮膚とで同程度に存在し、RT6は殆ど健常者群の皮膚のみに存在することが報告されている。また、RT4、RT5およびRT8は、殆どニキビ患者群の皮膚のみに存在することが報告されている(非特許文献2)。 Ribotypes No. 6-10, 12, and 13 are as described in Table 1 of Non-Patent Document 2. Ribotypes No. 1-5 and 11 were determined by sequencing the 16S rDNA of each strain using standard methods and based on the sequences obtained. The 16S rDNA base sequences of No. 1-5 and 11 are shown in SEQ ID NOs: 2-7, respectively. Of the ribotypes in Table 1, RT1, RT2, and RT3 are reported to be present at similar levels in the skin of acne patients and healthy subjects (those without acne symptoms), while RT6 is reported to be present almost exclusively in the skin of healthy subjects. RT4, RT5, and RT8 are reported to be present almost exclusively in the skin of acne patients (Non-Patent Document 2).

<実施例1>アクネ菌の菌数に対する効果
表1の各菌株を変法CDC嫌気性菌用ヒツジ血液寒天培地(日本ベクトン・ディッキンソン)に塗布し、アネロパック・ケンキ(三菱ガス化学)を用いて30℃で4日間嫌気培養した。これらの菌株をチップですくい、変法GAMブイヨン「ニッスイ」(日水製薬)0.5mLに懸濁し、種母懸濁液とした。一方、変法GAMブイヨン「ニッスイ」に、エリスリトールを終濃度で0%、5質量%または10質量%となるよう添加して、これを本培養培地とした。本培養培地を96 Deep Well Plate (AxyGen Scientific, Inc., ) に分注し、ここに種母懸濁液20μLを植菌して、30℃で48時間嫌気培養(本培養)した。
Example 1: Effect on Propionibacterium acnes Bacterial Count Each strain in Table 1 was spread on a modified CDC anaerobic sheep blood agar medium (Nippon Becton Dickinson) and anaerobically cultured at 30°C for 4 days using Anaeropack Kenki (Mitsubishi Gas Chemical). These strains were picked up with a chip and suspended in 0.5 mL of modified GAM bouillon "Nissui" (Nissui Pharmaceutical) to prepare a seed suspension. Erythritol was added to modified GAM bouillon "Nissui" to a final concentration of 0%, 5%, or 10% by mass to prepare a main culture medium. The main culture medium was dispensed into a 96-deep well plate (AxyGen Scientific, Inc.), and 20 μL of the seed suspension was inoculated into the plate and anaerobically cultured (main culture) at 30°C for 48 hours.

本培養後の培養液について、濁度法により菌体濃度を測定した。具体的には、まず、96穴平底プレート(4845-96F、ワトソン)に水180μLを分注した。ここに、培養液20μLを入れ、マイクロプレートリーダー (SpectraMax(登録商標)M2、モレキュラーデバイスジャパン)を用いて波長660nmでの透過光強度を検出することにより、濁度(OD660)を測定した。OD660の値を10倍したものを濁度とし、同様の試験を4回行って平均値を算出した。本培養培地にエリスリトールを添加していないもの(対照群)と、エリスリトールを5質量%または10質量%となるよう添加したもの(5%群、10%群)との2群間でMann-Whitney のU検定により統計的有意差検定を行い、漸近有意確率p<0.05を有意とした。その結果を図1に示す。図1において、有意差検定で有意であったものを*で示す。 The bacterial cell concentration of the culture medium after the main culture was measured by the turbidity method. Specifically, 180 μL of water was dispensed into a 96-well flat-bottom plate (4845-96F, Watson). 20 μL of the culture medium was then added, and the turbidity (OD 660 ) was measured by detecting the transmitted light intensity at a wavelength of 660 nm using a microplate reader (SpectraMax® M2, Molecular Devices Japan). The OD 660 value was multiplied by 10 to determine the turbidity, and the same test was performed four times to calculate the average value. A Mann-Whitney U test was used to test for statistical significance between two groups: a control group without erythritol added to the main culture medium, and a 5% or 10% erythritol added group (5% group, 10% group). A p<0.05 asymptotic significance level was considered significant. The results are shown in Figure 1. In Figure 1, significant differences were indicated by an *.

図1に示すように、RT2およびRT6の各菌株では、エリスリトールを添加した場合(5%群、10%群)に、添加しない場合(0%群)と比較して有意に濁度が増加した。これに対して、RT1、RT3、RT4、RT5およびRT8の各菌株では、エリスリトールを添加した場合(5%群、10%群)に、添加しない場合(0%群)と比較して有意に濁度が減少した。 As shown in Figure 1, for the RT2 and RT6 strains, turbidity increased significantly when erythritol was added (5% group, 10% group) compared to when it was not added (0% group). In contrast, for the RT1, RT3, RT4, RT5, and RT8 strains, turbidity decreased significantly when erythritol was added (5% group, 10% group) compared to when it was not added (0% group).

すなわち、RT2およびRT6の各菌株はエリスリトールの添加により菌数が有意に増加したのに対して、RT1、RT3、RT4、RT5およびRT8の各菌株はエリスリトールの添加により菌数が有意に減少した。この結果から、エリスリトールは、P. acnesのRT2(ニキビ患者の皮膚と健常者の皮膚とで同程度に存在する菌型)およびRT6(ニキビ症状の無い健康な皮膚で優勢な菌型)の増殖を促進し、P. acnesのRT1およびRT3(ニキビ患者の皮膚と健常者の皮膚とで同程度に存在する菌型)、ならびに、RT4、RT5およびRT8(ニキビ患者の皮膚で優勢な菌型)の増殖を抑制できることが明らかになった。 In other words, the addition of erythritol significantly increased the number of RT2 and RT6 strains, while the addition of erythritol significantly decreased the number of RT1, RT3, RT4, RT5, and RT8 strains. These results demonstrate that erythritol promotes the growth of P. acnes RT2 (a strain present at similar levels in the skin of acne patients and healthy subjects) and RT6 (a strain predominant in healthy skin without acne symptoms), and inhibits the growth of P. acnes RT1 and RT3 (strains present at similar levels in the skin of acne patients and healthy subjects), as well as RT4, RT5, and RT8 (strains predominant in the skin of acne patients).

<実施例2>リパーゼ遺伝子領域のシークエンス解析
P. acnesは、リパーゼとして機能すると推定されるタンパク質をコードする遺伝子を13種、有する。このうちの1種は、図2に示すように、遺伝子間領域(intergenic region)を挟んで前後に縦列配置された2つのリパーゼ遺伝子(SK137株において遺伝子座HMPREF0675_4855およびHMPREF0675_4856で特定されるリパーゼ遺伝子)からなる(全長2036bp、配列番号8)。当該リパーゼ遺伝子領域について、RT2、RT6およびRT8に属するアクネ菌では、遺伝子間領域および2つ目のリパーゼ遺伝子(HMPREF0675_4856)に欠失変異を有することが報告されている(非特許文献2)。そこで、表1の菌株について当該リパーゼ遺伝子領域における変異の有無を解析した。
Example 2: Sequence analysis of the lipase gene region
P. acnes has 13 genes encoding proteins that are presumed to function as lipases. One of these genes consists of two lipase genes (the lipase genes identified by loci HMPREF0675_4855 and HMPREF0675_4856 in the SK137 strain) arranged in tandem with an intergenic region, as shown in Figure 2 (total length 2036 bp, SEQ ID NO: 8). It has been reported that P. acnes strains belonging to RT2, RT6, and RT8 have deletion mutations in the intergenic region and the second lipase gene (HMPREF0675_4856) (Non-Patent Document 2). Therefore, the strains listed in Table 1 were analyzed for the presence or absence of mutations in the lipase gene region.

具体的には、まず、滅菌水500μLと直径5μmのジルコニアビーズ2個とを入れた破砕用チューブに表1の各菌株を入れ、細胞破砕機Micro Smash(登録商標)MS-100(トミー精工)を用いて4000回転/分にて90秒間、菌体を破砕し、ゲノムDNAを得た。これを鋳型DNAとし、Quick Taq(商標)HS DyeMix(TOYOBO)を用いてPCR反応を行うことにより、上記リパーゼ遺伝子領域の一部領域のDNAを増幅した。プライマーは下記配列番号6、7に記載のものを用いた。反応条件は95℃10秒、63℃20秒および68℃60秒を32サイクルとした。
《リパーゼ遺伝子増幅用プライマー》
フォワード;5’-ACGAGCCTGGTGTCAAAAACATCCTCGTTCA-3’(配列番号9)
リバース;5’-GCTTCCACAAGCGGATGTGTTTCCGGGTTGTA-3’(配列番号10)
Specifically, each strain listed in Table 1 was placed in a disruption tube containing 500 μL of sterile water and two 5 μm-diameter zirconia beads. The cells were disrupted using a Micro Smash® MS-100 cell disrupter (Tomy Seiko) at 4,000 rpm for 90 seconds to obtain genomic DNA. This DNA was used as template DNA for PCR using Quick Taq™ HS DyeMix (TOYOBO), which amplified DNA from a portion of the lipase gene region. The primers used were SEQ ID NOs: 6 and 7. The reaction conditions were 32 cycles of 95°C for 10 seconds, 63°C for 20 seconds, and 68°C for 60 seconds.
<Primers for amplifying lipase genes>
Forward: 5'-ACGAGCCTGGTGTCAAAAACATCCTCGTTCA-3' (SEQ ID NO: 9)
Reverse: 5'-GCTTCCACAAGCGGATGTGTTTCCGGGTTGTA-3' (SEQ ID NO: 10)

増幅したDNA断片をFastGene(登録商標) Gel/PCR Extraction Kit(日本ジェネティクス)で精製した後、ファスマック株式会社(http://fasmac.co.jp/)にてシークエンス解析した。その結果を図3および図4に示す。また、図3~4に示すNo.1~13株の塩基配列を配列番号11~23に、それぞれ示す。 The amplified DNA fragments were purified using the FastGene® Gel/PCR Extraction Kit (Nippon Genetics) and then sequenced by FASMAC Corporation (http://fasmac.co.jp/). The results are shown in Figures 3 and 4. The nucleotide sequences of strains No. 1 to 13 shown in Figures 3 and 4 are shown in SEQ ID NOs: 11 to 23, respectively.

図3に示すように、No.3およびNo.4株(RT2)ならびにNo.10およびNo.11株(RT6)の塩基配列(配列番号13~14および20~21)には、下記(i)-(iii)の変異が確認された。
(i)遺伝子間領域の(1つ目のリパーゼ遺伝子のストップコドンの次の塩基から数えて)108~114番目(配列番号8の996~1001番目、配列番号11の138~143番目に相当)に6塩基の欠失、
(ii)2つ目のリパーゼ遺伝子の124番目(配列番号8の1146番目、配列番号11の288番目に相当)に1塩基の欠失、
(iii)2つ目のリパーゼ遺伝子の206~209番目(配列番号8の1228~1230番目、配列番号11の370~372番目に相当)に、上記(ii)の1塩基欠失に伴うフレームシフトによる終止コドンの出現。
一方、No.1~2、5~9および12~13株(RT1、RT3、RT4、RT5、RT8)の配列には変異は見られず、配列番号11~12、15~19および22~23は同一配列であった。
As shown in Figure 3, the following mutations (i) to (iii) were confirmed in the nucleotide sequences (SEQ ID NOS: 13-14 and 20-21) of strains No. 3 and No. 4 (RT2) and strains No. 10 and No. 11 (RT6):
(i) a deletion of 6 bases at positions 108 to 114 (counting from the next base after the stop codon of the first lipase gene) in the intergenic region (corresponding to positions 996 to 1001 of SEQ ID NO: 8 and positions 138 to 143 of SEQ ID NO: 11);
(ii) a deletion of one base at position 124 of the second lipase gene (corresponding to position 1146 of SEQ ID NO: 8 and position 288 of SEQ ID NO: 11);
(iii) Appearance of a stop codon due to a frameshift associated with the one-base deletion described in (ii) above at positions 206 to 209 of the second lipase gene (corresponding to positions 1228 to 1230 of SEQ ID NO: 8 and positions 370 to 372 of SEQ ID NO: 11).
On the other hand, no mutations were observed in the sequences of strains No. 1-2, 5-9, and 12-13 (RT1, RT3, RT4, RT5, RT8), and SEQ ID NOs: 11-12, 15-19, and 22-23 were identical sequences.

すなわち、実施例1でエリスリトールにより増殖が促進されたRT2およびRT6の菌株は、リパーゼ遺伝子領域の配列番号11に示されるDNA領域に変異を有するのに対して、実施例1でエリスリトールにより増殖が抑制されたRT1、RT3、RT4、RT5およびRT8の菌株は、当該DNA領域に変異を有さないことが明らかになった。この結果から、エリスリトールは、リパーゼ遺伝子領域の配列番号11に示されるDNA領域に変異を有するP. acnesの増殖を促進できることが明らかになった。また、エリスリトールは、当該DNA領域に変異を有さないP. acnesの増殖を抑制できることが明らかになった。 That is, it was revealed that the RT2 and RT6 strains, whose growth was promoted by erythritol in Example 1, have a mutation in the DNA region shown in SEQ ID NO: 11 in the lipase gene region, whereas the RT1, RT3, RT4, RT5, and RT8 strains, whose growth was inhibited by erythritol in Example 1, do not have a mutation in the DNA region. These results demonstrate that erythritol can promote the growth of P. acnes that has a mutation in the DNA region shown in SEQ ID NO: 11 in the lipase gene region. It was also demonstrated that erythritol can inhibit the growth of P. acnes that does not have a mutation in the DNA region.

Claims (5)

エリスリトールからなるアクネ菌型選択的抗菌剤であって、下記(a)および/または(b)の増殖を抑制し、かつ、(c)および/または(d)の増殖を抑制しないもしくは促進するアクネ菌型選択的抗菌作用を有する前記剤;
(a)リボタイプ4型(RT4)、5型(RT5)および8型(RT8)から選択される1以上のアクネ菌(Propionibacterium acnes)、
(b)配列番号11に示されるDNA領域に変異を有さないアクネ菌(Propionibacterium acnes)、
(c)リボタイプ2型(RT2)および/またはリボタイプ6型(RT6)のアクネ菌(Propionibacterium acnes)、
(d)配列番号11に示されるDNA領域に変異を有するアクネ菌(Propionibacterium acnes)。
An acne-type selective antibacterial agent comprising erythritol, which has an acne-type selective antibacterial effect of inhibiting the growth of the following (a) and/or (b), and not inhibiting or promoting the growth of (c) and/or (d):
(a) one or more Propionibacterium acnes selected from ribotypes 4 (RT4), 5 (RT5), and 8 (RT8);
(b) Propionibacterium acnes that does not have a mutation in the DNA region shown in SEQ ID NO: 11;
(c) ribotype 2 (RT2) and/or ribotype 6 (RT6) Propionibacterium acnes;
(d) Propionibacterium acnes having a mutation in the DNA region shown in SEQ ID NO: 11.
前記変異が下記(i)~(iii)から選択される1以上を含む、請求項1に記載の剤;
(i)配列番号11の138~143番目の6塩基の欠失、
(ii)配列番号11の288番目の1塩基の欠失、
(iii)配列番号11の370~372番目における終止コドンの出現。
The agent according to claim 1 , wherein the mutation includes one or more selected from the following (i) to (iii):
(i) deletion of 6 bases at positions 138 to 143 of SEQ ID NO: 11;
(ii) deletion of one base at position 288 of SEQ ID NO: 11;
(iii) The occurrence of a stop codon at positions 370 to 372 of SEQ ID NO: 11.
前記アクネ菌型選択的抗菌作用として、HL007PA1株、HL038PA1株、HL043PA2株、HL072PA1株、HL086PA1株およびHL110PA1株から選択される1以上のアクネ菌株に対しては増殖を抑制し、かつ、HL110PA3株に対しては増殖を抑制しないまたは促進する物性を有する請求項に記載の剤。 2. The agent according to claim 1, wherein the acne type-selective antibacterial activity has physical properties of inhibiting the growth of one or more acne strains selected from HL007PA1 strain, HL038PA1 strain, HL043PA2 strain, HL072PA1 strain, HL086PA1 strain, and HL110PA1 strain, and not inhibiting or promoting the growth of HL110PA3 strain. 外用剤として用いられることを特徴とする、請求項1~のいずれかに記載の剤。 The agent according to any one of claims 1 to 3 , which is used as an external preparation. エリスリトールを皮膚に作用させることで、下記(a)および/または(b)の増殖を抑制し、かつ、(c)および/または(d)の増殖を抑制しないもしくは促進する工程を有する、アクネ菌型選択的抗菌方法(人間を手術、治療または診断する方法を除く);
(a)リボタイプ4型(RT4)、5型(RT5)および8型(RT8)から選択される1以上のアクネ菌(Propionibacterium acnes)
(b)配列番号11に示されるDNA領域に変異を有さないアクネ菌(Propionibacterium acnes)、
(c)リボタイプ2型(RT2)および/またはリボタイプ6型(RT6)のアクネ菌(Propionibacterium acnes)、
(d)配列番号11に示されるDNA領域に変異を有するアクネ菌(Propionibacterium acnes)。
A method for selectively inhibiting the growth of Propionibacterium acnes (excluding methods for surgery, treatment, or diagnosis of humans), comprising the step of applying erythritol to the skin to inhibit the growth of the following (a) and/or (b) , and not inhibiting or promoting the growth of (c) and/or (d):
(a) one or more Propionibacterium acnes selected from ribotypes 4 (RT4), 5 (RT5), and 8 (RT8);
(b) Propionibacterium acnes that does not have a mutation in the DNA region shown in SEQ ID NO: 11;
(c) ribotype 2 (RT2) and/or ribotype 6 (RT6) Propionibacterium acnes;
(d) Propionibacterium acnes having a mutation in the DNA region shown in SEQ ID NO: 11.
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Citations (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2011148731A (en) 2010-01-21 2011-08-04 Toyobo Co Ltd Cosmetic
JP2018070536A (en) 2016-11-01 2018-05-10 株式会社桃谷順天館 Acnes bacterial strain selective antibacterial agent
CN108782937A (en) 2017-04-30 2018-11-13 徐加英 A kind of antierythrite chewing gum
JP2019129789A (en) 2018-02-01 2019-08-08 株式会社ノエビア Anti-acne food, hair quality improving food or makeup applicability improving food
CN110693751A (en) 2019-11-09 2020-01-17 周乐 Beauty cream and preparation method thereof
CN111329822A (en) 2020-03-30 2020-06-26 花域(上海)生物科技有限公司 Acne removing patch with good skin affinity
WO2020197669A1 (en) 2019-03-26 2020-10-01 International Flavors & Fragrances Inc. Use of polylysine dendrimers in the prevention and management of acne-prone skin and acneic skin

Family Cites Families (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP3315013B2 (en) * 1994-10-07 2002-08-19 カネボウ株式会社 Skin cosmetics
JPH11116436A (en) * 1997-10-15 1999-04-27 Shiseido Co Ltd Preparation for external use for skin

Patent Citations (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2011148731A (en) 2010-01-21 2011-08-04 Toyobo Co Ltd Cosmetic
JP2018070536A (en) 2016-11-01 2018-05-10 株式会社桃谷順天館 Acnes bacterial strain selective antibacterial agent
CN108782937A (en) 2017-04-30 2018-11-13 徐加英 A kind of antierythrite chewing gum
JP2019129789A (en) 2018-02-01 2019-08-08 株式会社ノエビア Anti-acne food, hair quality improving food or makeup applicability improving food
WO2020197669A1 (en) 2019-03-26 2020-10-01 International Flavors & Fragrances Inc. Use of polylysine dendrimers in the prevention and management of acne-prone skin and acneic skin
CN110693751A (en) 2019-11-09 2020-01-17 周乐 Beauty cream and preparation method thereof
CN111329822A (en) 2020-03-30 2020-06-26 花域(上海)生物科技有限公司 Acne removing patch with good skin affinity

Non-Patent Citations (3)

* Cited by examiner, † Cited by third party
Title
APPLIED AND ENVIRONMENTAL MICROBIOLOGY,1979年,38(4),pp. 585-589
感染症学雑誌,2000年,74(10),Page.927, 285
日本香粧品学会誌,2016年,40(2),pp.97-102

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