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JP7785381B2 - Gas supply device and fluid control device - Google Patents
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JP7785381B2 - Gas supply device and fluid control device - Google Patents

Gas supply device and fluid control device

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Publication number
JP7785381B2
JP7785381B2 JP2024011030A JP2024011030A JP7785381B2 JP 7785381 B2 JP7785381 B2 JP 7785381B2 JP 2024011030 A JP2024011030 A JP 2024011030A JP 2024011030 A JP2024011030 A JP 2024011030A JP 7785381 B2 JP7785381 B2 JP 7785381B2
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gas supply
pipes
supply device
gas
upstream
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JP2025116544A (en
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泰輝 星子
拓哉 熊本
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Fujikin Inc
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Fujikin Inc
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    • FMECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F17STORING OR DISTRIBUTING GASES OR LIQUIDS
    • F17DPIPE-LINE SYSTEMS; PIPE-LINES
    • F17D1/00Pipe-line systems
    • F17D1/02Pipe-line systems for gases or vapours
    • F17D1/04Pipe-line systems for gases or vapours for distribution of gas
    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/448Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for generating reactive gas streams, e.g. by evaporation or sublimation of precursor materials
    • FMECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F17STORING OR DISTRIBUTING GASES OR LIQUIDS
    • F17DPIPE-LINE SYSTEMS; PIPE-LINES
    • F17D3/00Arrangements for supervising or controlling working operations
    • F17D3/01Arrangements for supervising or controlling working operations for controlling, signalling, or supervising the conveyance of a product
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10PGENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
    • H10P72/00Handling or holding of wafers, substrates or devices during manufacture or treatment thereof
    • H10P72/04Apparatus for manufacture or treatment
    • H10P72/0402Apparatus for fluid treatment

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  • Engineering & Computer Science (AREA)
  • Chemical & Material Sciences (AREA)
  • Mechanical Engineering (AREA)
  • General Engineering & Computer Science (AREA)
  • General Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Materials Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Drying Of Semiconductors (AREA)
  • Pipeline Systems (AREA)

Description

本発明は、半導体製造装置にプロセスガス等を供給するためのガス供給装置及びこのガス供給装置を複数備えた流体制御装置に関する。 The present invention relates to a gas supply device for supplying process gases and the like to semiconductor manufacturing equipment, and a fluid control device equipped with multiple such gas supply devices.

半導体製造プロセスにおいては、プロセスガスやパージガス等の複数種類のガスを処理チャンバに供給して、成膜やエッチング等の処理を行う。
このようなガスを計量して処理チャンバに供給するために、質量流量制御装置や開閉バルブ等の複数の流体機器を配置した集積化ガスラインを、例えばプロセスガスの種類ごとに設け、1つの処理チャンバが扱う複数の集積化ガスラインをガス供給装置内部に並列配置している。複数の処理チャンバを有する半導体製造装置では、例えば、処理チャンバ毎に上記ガス供給装置を設けている(特許文献1)。
In a semiconductor manufacturing process, a plurality of types of gases, such as process gas and purge gas, are supplied to a processing chamber to perform processes such as film formation and etching.
In order to measure and supply such gases to the processing chambers, integrated gas lines each equipped with a plurality of fluidic devices such as mass flow controllers and on-off valves are provided for each type of process gas, and the plurality of integrated gas lines for one processing chamber are arranged in parallel inside a gas supply device. In a semiconductor manufacturing device having a plurality of processing chambers, for example, the above-mentioned gas supply device is provided for each processing chamber (Patent Document 1).

この複数のガス供給装置にガスを供給する供給配管については、図7(a)に概念的に示すように、ガスのガス供給源からの供給配管5a~5dを各ガス供給装置5A~5Dに個別に接続する方式(特許文献3)、または途中まで1本の配管で、途中から分岐して各ガス供給装置に接続する方式(特許文献1,2)が採用されている。 As conceptually shown in Figure 7(a), the supply piping that supplies gas to these multiple gas supply devices employs a system in which supply piping 5a-5d from a gas supply source is individually connected to each of the gas supply devices 5A-5D (Patent Document 3), or a system in which a single piping runs partway through, branching off and connecting to each of the gas supply devices (Patent Documents 1 and 2).

特開2023-009666号公報Japanese Patent Publication No. 2023-009666 特表2021-533567号公報Special Publication No. 2021-533567 特開2017-123425号公報Japanese Patent Application Publication No. 2017-123425

しかし、上記図7(a)の個別配管方式では、ガス源から各ガス供給装置までの配管スペースが必要で、省スペース化が図りにくいという問題が懸念される。
この省スペースを実現するために、図7(b)に概念的に示すように、縦列に配列した複数のガス供給装置6A~6D内を順に通過する一本の通過配管(渡し配管)6sを設け、各ガス供給装置6A~6D内で分岐(ワンドロップ)して、そのガス供給装置6にガスを供給する方式(渡し配管方式)が考えられる。しかし、この図7(b)の方式では、1本の渡し配管6sを使用するので、ガスの供給容量が十分でないという問題がある。渡し配管6sを大径化することにより容量を増やすことが考えられるが、そうすると施工が困難であるという問題がある。
However, the individual piping system shown in FIG. 7A requires piping space from the gas source to each gas supply device, which poses a concern that it is difficult to save space.
To achieve this space saving, as conceptually shown in Figure 7(b), a system (a system of a transfer pipe) 6s is provided that passes through a plurality of gas supply devices 6A to 6D arranged in a vertical row in order, and that branches (one drop) within each gas supply device 6A to 6D to supply gas to that gas supply device 6 (a system of a transfer pipe). However, the system of Figure 7(b) has a problem that the gas supply capacity is insufficient because a single transfer pipe 6s is used. While it is possible to increase the capacity by increasing the diameter of the transfer pipe 6s, this system has a problem that construction is difficult.

また、図7(c)に概念的に示す、縦列に配列した複数のガス供給装置7A~7D内を通過する、複数の並列の通過配管7a~7dを設け、目的のガス供給装置7にガスを供給する方式も考えられる。これにより、供給容量の確保とある程度の省スペース化とを両立できる。しかし、この方式では、ガス供給装置7A~7Dを一方向に揃えて配置すると、上流側のガス供給装置7と、下流側のガス供給装置7の間で、そのガス供給装置7に供給する配管の接続位置が異なるため、上流側のガス供給装置7と下流側のガス供給装置7でガス供給装置7の部品の共通化ができないという問題がある。特にガス供給装置7内部の配管をヒータで加熱する仕様の場合、この方式では、ガス供給装置7によってヒータの形状も変わるため、温度調節にばらつきが出るという問題がある。 Also, as conceptually shown in Figure 7(c), a method is conceivable in which multiple parallel gas supply pipes 7a-7d are provided that pass through multiple gas supply devices 7A-7D arranged in a vertical row, and gas is supplied to the target gas supply device 7. This allows for both ensuring supply capacity and a certain degree of space savings. However, with this method, if the gas supply devices 7A-7D are aligned in one direction, the connection positions of the pipes supplying gas to the upstream gas supply device 7 and the downstream gas supply device 7 will be different, which is a problem: the components of the gas supply device 7 cannot be shared between the upstream gas supply device 7 and the downstream gas supply device 7. In particular, if the specifications require the pipes inside the gas supply device 7 to be heated with a heater, this method poses the problem of inconsistent temperature control, as the shape of the heater will vary depending on the gas supply device 7.

本発明の目的の一つは、このような問題を解決するため、複数のガス供給装置を用いてガスを供給する流体制御装置において、ガス供給容量の維持と、配管スペースの省スペース化と、ガス供給装置間の部品の共通化が可能なガスボックス及び流体制御装置を提供することである。 One of the objectives of the present invention is to solve these problems by providing a gas box and fluid control device that maintains gas supply capacity, saves piping space, and allows parts to be shared between gas supply devices in a fluid control device that supplies gas using multiple gas supply devices.

上記課題を解決するために、本発明のガス供給装置は、
配管及び流体機器を配備するベース部材と、
前記ベース部材内に配置され、導入された前記ガスを制御する流体機器と、
前記ベース部材の前方に設けられ、前記流体機器と接続される導入配管の端部に形成した導入継手と、
それぞれ前記ベース部材の前方に設けられた上流側継手から前記ベース部材の後方に設けられた下流側継手へ前記ベース部材内を通過するように配置されるn本の通過配管(nは1以上の整数)と、
を有するガス供給装置であって、
前記n本の通過配管は平面視で屈曲した経路を有し、
前方視において、前記導入継手と前記n本の通過配管のうちの第1の通過配管の下流側継手とは、一致する位置に設けられ、n≧2のとき、第1~第n-1の通過配管の上流側継手と第2~第nの通過配管の下流側継手は、それぞれ一致する位置に設けられている。
この構成によれば、同一構造のガス供給装置を上流から下流に向かって複数配列し、隣接するガス供給装置の向かい合う継手同士をストレートの配管で接続した状態で、ガス供給源からの並列配管を最上流側ガス供給装置の前面の各継手に接続することにより、手前のガス供給装置内部を通過して目的の各ガス供給装置にガスを供給することができる。これにより、ガス供給容量の維持と、配管スペースの省スペース化と、手前側のガス供給装置と奥側のガス供給装置の間で部品の共通化が可能になる。
In order to solve the above problems, the gas supply device of the present invention comprises:
a base member on which piping and fluid equipment are arranged;
a fluid device disposed within the base member and controlling the introduced gas;
an inlet joint provided in front of the base member and formed at an end of an inlet pipe connected to the fluid device;
n passing pipes (n is an integer of 1 or more) arranged so as to pass through the base member from upstream joints provided in front of the base member to downstream joints provided in the rear of the base member;
A gas supply device having:
The n passage pipes have paths that are bent in a plan view,
When viewed from the front, the introduction joint and the downstream joint of the first passing pipe among the n passing pipes are provided at the same position, and when n≧2, the upstream joints of the first to (n-1)th passing pipes and the downstream joints of the second to nth passing pipes are provided at the same position, respectively.
With this configuration, multiple gas supply devices with the same structure are arranged from upstream to downstream, and the facing joints of adjacent gas supply devices are connected with straight piping. Parallel piping from the gas supply source is then connected to each joint on the front of the most upstream gas supply device, allowing gas to be supplied to each target gas supply device through the inside of the nearest gas supply device. This allows for maintaining the gas supply capacity, saving piping space, and sharing parts between the nearest gas supply device and the farthest gas supply device.

前記導入継手と第1~第n-1の通過配管の上流側継手は、前面視において、一直線状に等間隔でこの順に配置されていることが好ましい。
この構成によれば、導入継手及び各通過配管の上流側継手に袋状ナット締結工具がアクセスし易くなるので、その上流側配管との着脱作業が容易になる。また、各通過配管の下流側継手も前面視において、一直線状に等間隔でこの順に配置されるので、その上流側配管との着脱作業が容易になる。
The introduction joint and the upstream joints of the first to (n-1)th passage pipes are preferably arranged in this order at equal intervals in a straight line when viewed from the front.
This configuration allows the cap-shaped nut tightening tool to easily access the inlet fitting and the upstream fittings of each of the passage pipes, facilitating attachment and detachment to and from the upstream pipes. In addition, the downstream fittings of each of the passage pipes are also arranged in this order at equal intervals in a straight line in front view, facilitating attachment and detachment to and from the upstream pipes.

また、本発明の流体制御装置は、それぞれ上記のガス供給装置であり、上流側から配置されたm個のガス供給装置(mは2以上の整数)を含むとともに、第iの前記ガス供給装置(iは1からm-1の整数)の第1~第nの通過配管のうちの第1の通貨配管の下流側継手に、第i+1の前記ガス供給装置の前記導入継手を接続し、n≧2のとき、第iの前記ガス供給装置の第2~第nの通過配管に、第i+1の前記ガス供給装置の第1~第n-1の通過配管の上流側継手をそれぞれ接続するn-1個の接続配管を含み、m個のガス供給装置のうちの第1のガス供給装置の前記導入継手及び第1~第nの通過配管の上流側継手には、ガス供給源からの配管がそれぞれ接続されるものである。
この構成によれば、同一構造のガスボックスを上流から下流に向かって複数配列し、隣接するガスボックスの向かい合う継手同士をストレートの配管で接続した状態で、ガス供給源からの並列配管を最上流側ガスボックスの前面の各継手に接続することにより、手前のガスボックス内部を通過して目的の各ガスボックスにガスを供給することができる。これにより、手前側のガスボックスと奥側のガスボックスの間で部品の共通化が可能になる。
Furthermore, the fluid control device of the present invention includes m gas supply devices (m is an integer of 2 or more) arranged from the upstream side, each of which is the above-mentioned gas supply device, and the inlet joint of the (i+1)th gas supply device is connected to the downstream joint of a first outlet pipe among the first to n-th outlet pipes of the i-th gas supply device (i is an integer from 1 to m-1), and when n≧2, the device includes n-1 connection pipes that connect the upstream joints of the first to n-1th outlet pipes of the (i+1)th gas supply device to the second to n-th outlet pipes of the i-th gas supply device, respectively, and pipes from a gas supply source are connected to the inlet joint of the first gas supply device of the m gas supply devices and the upstream joints of the first to n-th outlet pipes, respectively.
With this configuration, multiple gas boxes of the same structure are arranged from upstream to downstream, and the facing joints of adjacent gas boxes are connected with straight piping. Then, parallel piping from the gas supply source is connected to each joint on the front of the most upstream gas box, so that gas can be supplied to each target gas box through the inside of the front gas box. This makes it possible to share parts between the front gas box and the back gas box.

本発明のガス供給装置によれば、屈曲した経路を有する第1~第nの通過配管を備え、前面視において、前面の導入継手と後面の第1の通過配管の下流側出力継手を一致する位置に設け、前面の第1~第n-1の通過配管の上流側継手と後面の第2~第nの通過配管の下流側継手を、それぞれ一致する位置に設けた。この構造のガス供給装置を上流から下流に向かって複数配列し、隣接するガス供給装置の向かい合う継手同士をストレートの配管同士で接続した本発明の流体制御装置は、ガス供給源からの並列配管を最上流側ガスボックスの前面の各継手に接続することにより、手前のガス供給装置内部を通過しながら、目的の各ガス供給装置にガスを供給することができる。これにより、ガス供給容量の維持と、配管スペースの省スペース化と、手前側のガス供給装置と奥側のガス供給装置の間で部品の共通化が可能になる。 The gas supply device of the present invention includes first through nth passage pipes with curved paths. When viewed from the front, the inlet joint on the front side and the downstream output joint of the first passage pipe on the rear side are aligned, and the upstream joints of the first through n-1th passage pipes on the front side and the downstream joints of the second through nth passage pipes on the rear side are aligned. The fluid control device of the present invention, in which multiple gas supply devices with this structure are arranged from upstream to downstream and the facing joints of adjacent gas supply devices are connected with straight pipes, can supply gas to each target gas supply device by connecting parallel pipes from the gas supply source to the respective joints on the front side of the most upstream gas box, passing through the interior of the gas supply device at the front. This maintains gas supply capacity, saves piping space, and enables the use of common parts between the gas supply device at the front and the gas supply device at the back.

本発明の第1の実施形態に係るガス供給装置を概念的に示す図で、(a)は筐体上面付近を切断した平面断面図、(b)は筐体側面付近を切断した正面断面図、(c)は前面(前方)視の図を示す。1A and 1B are diagrams conceptually illustrating a gas supply device according to a first embodiment of the present invention, in which (a) is a plan cross-sectional view cut near the top surface of the housing, (b) is a front cross-sectional view cut near the side surface of the housing, and (c) is a front (forward) view. 図1のガス供給装置の変形例を概念的に示す図で、(a)は筐体上面付近を切断した平面断面図、(b)は筐体側面付近を切断した正面断面図、(c)は前面(前方)視の図を示す。1A is a plan cross-sectional view cut near the top surface of the housing; FIG. 1C is a front cross-sectional view cut near the side surface of the housing; and FIG. 1C is a front (forward) view. 図1のガス供給装置の他の変形例を概念的に示す図で、(a)は筐体上面付近を切断した平面断面図、(b)は筐体側面付近を切断した正面断面図、(c)は前面(前方)視の図を示す。1A and 1B are diagrams conceptually illustrating another modified example of the gas supply device of FIG. 1, in which (a) is a plan cross-sectional view cut near the top surface of the housing, (b) is a front cross-sectional view cut near the side surface of the housing, and (c) is a front (forward) view. 図1のガス供給装置を連結した流体制御装置を概念的に示すブロック図。FIG. 2 is a block diagram conceptually showing a fluid control device connected to the gas supply device of FIG. 1; 本発明の第2の実施形態に係るガス供給装置を概念的に示す筐体の上面付近を切断した平面断面図。FIG. 10 is a cross-sectional plan view conceptually showing a gas supply device according to a second embodiment of the present invention, taken along the vicinity of the upper surface of a housing. 図5のガス供給装置を連結した流体制御装置を概念的に示すブロック図。FIG. 6 is a block diagram conceptually showing a fluid control device connected to the gas supply device of FIG. 5 . 本発明以外のガス供給装置を連結した流体制御装置を概念的に示すブロック図で、(a)は従来の個別配管方式、(b)は1本の通過配管から分岐させる方式、(c)は並列の通過配管を設ける方式を示す。1A and 1B are block diagrams conceptually showing fluid control devices connected to gas supply devices other than those of the present invention, in which (a) shows a conventional individual piping system, (b) shows a system in which gas is branched from a single passing pipe, and (c) shows a system in which parallel passing pipes are provided.

以下、本発明の実施形態について図面を参照して説明する。説明において同様の要素には同一の符号を付して、重複する説明を適宜省略する。
(第1の実施形態)
図1は、本発明の第1の実施形態に係るガス供給装置を概念的に示す平面断面図である。本実施形態は、半導体製造装置の処理チャンバにプロセスガス等を供給するためのガス供給装置の例である。
本実施形態のガス供給装置1は、筐体10と、導入継手20と、流体機器30と、第1~第3の通過配管41~43と、を含む。
Hereinafter, an embodiment of the present invention will be described with reference to the drawings. In the description, like elements are designated by like reference numerals, and duplicated descriptions will be omitted where appropriate.
(First embodiment)
1 is a plan cross-sectional view conceptually illustrating a gas supply apparatus according to a first embodiment of the present invention, which is an example of a gas supply apparatus for supplying process gases and the like to a processing chamber of a semiconductor manufacturing apparatus.
The gas supply device 1 of this embodiment includes a housing 10, an inlet joint 20, a fluid device 30, and first to third flow pipes 41 to 43.

筐体10は、例えばステンレス製で略直方体を有し、互いに対向する前面11及び後面12を有するベース部材である。本実施形態では、筐体10は、防爆対策、漏れ対策で内部を完全に密封する構造で、前面11及び後面12は、物理的な壁面で構成されている。但し、この構成に限られず、一以上の面が開放した形状を有していてもよい。このため、前面11及び後面12は、必ずしも物理的な壁面に限られず、開口した面、換言すれば、板状の台座に載置する形であってもよい。 The housing 10 is a base member made of, for example, stainless steel, and has a roughly rectangular parallelepiped shape, with a front surface 11 and a rear surface 12 facing each other. In this embodiment, the housing 10 has a structure that completely seals the interior to prevent explosion and leakage, and the front surface 11 and the rear surface 12 are formed by physical walls. However, this configuration is not limited to this, and one or more surfaces may have an open shape. Therefore, the front surface 11 and the rear surface 12 are not necessarily limited to physical walls, but may also be open surfaces, in other words, placed on a plate-like base.

導入継手20は、ガスG1を流体機器30に導入する導入配管21に、後述するガス供給源S1(図4参照)からの供給配管F1または後述する第1の通過配管41と接続された接続配管L1を接続する継手で、前面11から突出して設けられている。導入継手20は、汎用の雄ナットからなり、ガス供給源S1(図2参照)からの供給配管F1または第1の通過配管41の下流側継手41bと接続される接続配管L1に設けられた袋状ナットと螺合できるよう構成されている。図1では、導入継手20は、雄ナットと袋状ナットが螺合した状態を示している(後述する各継手41a~43a,41b~43bも同じ)。 The inlet fitting 20 is a fitting that protrudes from the front face 11 and connects the inlet fitting 21, which introduces gas G1 into the fluid device 30, to the supply fitting F1 from the gas supply source S1 (see FIG. 4), described below, or the connection fitting L1 connected to the first passing fitting 41, described below. The inlet fitting 20 is made of a general-purpose male nut and is configured to be threaded with a cap-shaped nut provided on the connection fitting L1, which connects to the supply fitting F1 from the gas supply source S1 (see FIG. 2) or the downstream fitting 41b of the first passing fitting 41. In FIG. 1, the inlet fitting 20 is shown with the male nut and cap-shaped nut threaded together (the same applies to each of the fittings 41a-43a, 41b-43b, described below).

流体機器30は、筐体10内に配置され、導入されたガスG1を制御する機器等、ガスG1を取り扱う機器である。本実施形態では、流体機器30A~30Eを含む。流体機器30Aが開閉バルブ、30Bがマスフローコントローラ、30Cがスルーブロック、30Dが圧力レギュレータ、30Eが圧力センサである。32は、これらの流体機器30A~30Eによって制御されたガスG1を、例えば処理チャンバ(図示省略)に供給する導出配管である。これらの流体機器30A~30Eは、直列状に配列されて流路を形成する複数の流路ブロック31の上に配置され、1つの集積化ガスラインを構成している(「集積化ガスライン(30)」ともいう)。
但し、本発明において、流体機器は、これらの流体機器30A~30Eに限られず、様々なものを用いることができる。また、本実施形態では、ガス供給装置1内に集積化ガスライン(30)を1本のみ配置したが、一般的には、処理チャンバで使用するガスの種類ごとに集積化ガスライン(30)を形成するので、1つのガス供給装置1内に複数の集積化ガスライン(30)を配置してもよい。
また、本発明では、流体機器30は、必ずしも集積化ガスラインを構成せずに、1又は複数の流体機器30を単独でガス供給装置1内に配置してもよい。
The fluidic devices 30 are disposed within the housing 10 and are devices that handle the gas G1, such as devices that control the introduced gas G1. In this embodiment, the fluidic devices 30 include fluidic devices 30A to 30E. The fluidic device 30A is an on-off valve, 30B is a mass flow controller, 30C is a through block, 30D is a pressure regulator, and 30E is a pressure sensor. Reference numeral 32 denotes an outlet pipe that supplies the gas G1 controlled by these fluidic devices 30A to 30E to, for example, a processing chamber (not shown). These fluidic devices 30A to 30E are disposed on a plurality of flow path blocks 31 that are arranged in series to form flow paths, and constitute a single integrated gas line (also referred to as an "integrated gas line (30)").
However, in the present invention, the fluid devices are not limited to these fluid devices 30A to 30E, and various other fluid devices can be used. Also, in this embodiment, only one integrated gas line (30) is arranged in the gas supply device 1, but generally, an integrated gas line (30) is formed for each type of gas used in the processing chamber, so multiple integrated gas lines (30) may be arranged in one gas supply device 1.
Furthermore, in the present invention, the fluid devices 30 do not necessarily constitute an integrated gas line, and one or more fluid devices 30 may be independently disposed within the gas supply device 1 .

第1~第3の通過配管41~43は、それぞれ前面11に設けられた上流側継手41a~43aから後面12に設けられた下流側継手41b~43bへ筐体10内を通過するように配置され、他のガス供給装置(1)にガスG1を供給する配管である。
第1~第3の通過配管41~43は、それぞれ図1の平面視で段差hを有する屈曲した経路を有している。導入継手20と第1~第3の通過配管41~43は、図1(a)に示す平面視において、この順で段差hと同じピッチで並列に配列されている。
このため、図1(c)に示す前面視において、導入継手20と第1の通過配管41の下流側継手41bは、一致する位置に設けられ、第1、第2の通過配管41,42の上流側継手41a,42aと第2、第3の通過配管42、43の下流側継手42b、43bは、それぞれ一致する位置に設けられている。尚、図1(c)に示す前面視では、第1~第3の通過配管41~43の下流側継手41b~43bの外形は、筐体10の裏側で、かつ前面側の各継手(20,41a、41b)に完全に重なっているので、描いていない。
The first to third passage pipes 41 to 43 are arranged to pass through the housing 10 from upstream joints 41a to 43a provided on the front surface 11 to downstream joints 41b to 43b provided on the rear surface 12, respectively, and are pipes that supply gas G1 to other gas supply devices (1).
The first to third passage pipes 41 to 43 each have a bent path with a step h in the plan view of Fig. 1. The introduction joint 20 and the first to third passage pipes 41 to 43 are arranged in parallel in this order at the same pitch as the step h in the plan view shown in Fig. 1(a).
1(c), the introduction joint 20 and the downstream joint 41b of the first passage pipe 41 are provided at the same position, and the upstream joints 41a and 42a of the first and second passage pipes 41 and 42 and the downstream joints 42b and 43b of the second and third passage pipes 42 and 43 are provided at the same position. Note that in the front view shown in FIG. 1(c), the outlines of the downstream joints 41b to 43b of the first to third passage pipes 41 to 43 are not drawn because they are on the back side of the casing 10 and completely overlap the respective joints (20, 41a, 41b) on the front side.

図1(c)に示す前面視の図において、導入継手20と第1~第3の通過配管41~43の上流側継手41a~43aは、一直線状に等間隔でこの順に配置されている。
この構成によれば、導入継手20及び各通過配管(41~43)の上流側継手41a~43aに締結工具がアクセスし易くなるので、その上流側配管との着脱作業が容易になる。また、各通過配管(41~43)の下流側継手41b~43bも前面視において、一直線上に等間隔でこの順に配置されるので、その下流側配管との着脱作業が容易になる。
In the front view shown in FIG. 1(c), the inlet joint 20 and the upstream joints 41a to 43a of the first to third passage pipes 41 to 43 are arranged in this order at equal intervals in a straight line.
This configuration allows easy access for a fastening tool to the introduction joint 20 and the upstream joints 41 a to 43 a of each of the passage pipes (41 to 43), facilitating attachment and detachment to and from the upstream pipes. In addition, the downstream joints 41 b to 43 b of each of the passage pipes (41 to 43) are also arranged in this order at equal intervals on a straight line in a front view, facilitating attachment and detachment to and from the downstream pipes.

本発明のガス供給装置1において、導入継手20と第1~第3の通過配管41~43の上流側継手41a~43aは、必ずしも一直線状の配置に限られず、例えば図2(a)~図2(c)、図3(a)~(c)に示すような配置でもよい。これらの例においても、導入継手20と第1の通過配管41の下流側継手41bは、一致する位置に設けられ、第1、第2の通過配管41,42の上流側継手41a,42aと第2、第3の通過配管42、43の下流側継手42b、43bは、それぞれ一致する位置に設けられている。これらの変形例では、継手部分の配置が上下にずれているため、図1よりも配管スペースを狭くしても着脱作業において工具と隣接する継手が干渉することがない。そのため、配管を配置するスペースをさらに省スペース化することが可能になる。
尚、通過配管の本数は3本に限られず、1本以上であれば何本でもよいが、接続するガス供給装置1の個数をnとしたとき、n-1本であることが、全てのガス供給装置のガスを供給するのに必要十分な数であるため好ましい。
In the gas supply device 1 of the present invention, the inlet joint 20 and the upstream joints 41a to 43a of the first to third passage pipes 41 to 43 are not necessarily arranged in a straight line. For example, they may be arranged as shown in FIGS. 2(a) to 2(c) and 3(a) to 3(c). In these examples, the inlet joint 20 and the downstream joint 41b of the first passage pipe 41 are aligned, and the upstream joints 41a and 42a of the first and second passage pipes 41 and 42 and the downstream joints 42b and 43b of the second and third passage pipes 42 and 43 are aligned, respectively. In these variations, the joints are vertically offset, so that even if the piping space is narrower than that shown in FIG. 1, tools do not interfere with adjacent joints during installation and removal. This further reduces the space required for arranging the pipes.
The number of passage pipes is not limited to three, and may be any number greater than or equal to one. However, when the number of gas supply devices 1 to be connected is n, it is preferable to have n-1 pipes, as this is the necessary and sufficient number to supply gas to all of the gas supply devices.

本実施形態によれば、上流側のガス供給装置1の後面12が下流側のガス供給装置1の前面11に向かい合うように隣接させて配置した場合、上流側のガス供給装置1の第1~第3の通過配管41~43の下流側継手41b~43bを、下流側のガス供給装置1の導入継手20と第1、第2の通過配管41,42の上流側継手41a,42aにそれぞれストレートの配管で接続することができる。 According to this embodiment, when the upstream gas supply device 1 is positioned adjacent to the downstream gas supply device 1 so that the rear surface 12 faces the front surface 11, the downstream joints 41b to 43b of the first to third passage pipes 41 to 43 of the upstream gas supply device 1 can be connected to the inlet joint 20 of the downstream gas supply device 1 and the upstream joints 41a and 42a of the first and second passage pipes 41 and 42, respectively, using straight pipes.

図4は、図1のガス供給装置1を複数連結した流体制御装置100を概念的に示すブロック図を示す。この流体制御装置100では、上記構造のガス供給装置1を上流から下流に向かって4個配列している。
この4個のガス供給装置1(1A,1B,1C,1D)の上流側には、ガス供給源S1からの供給配管F1~F4が最上流側のガス供給装置1Aの前面11の各継手(導入継手20と第1~第3の通過配管41~43の上流側継手41a~43a)に接続されている。
また、隣接するガス供給装置1(すなわち1Aと1B,1Bと1C、1Cと1D)の向かい合う継手同士(上流側のガス供給装置1の第1~第3の通過配管41~43の下流側継手41b~43bと、下流側のガス供給装置1の導入継手20及び第1、第2の通過配管41,42の上流側継手41a,42a)は、それぞれストレートの接続配管L1~L3で接続されている。
Fig. 4 is a block diagram conceptually showing a fluid control device 100 in which a plurality of gas supply devices 1 shown in Fig. 1 are connected together. In this fluid control device 100, four gas supply devices 1 having the above structure are arranged from upstream to downstream.
Upstream of these four gas supply devices 1 (1A, 1B, 1C, 1D), supply pipes F1 to F4 from a gas supply source S1 are connected to each joint (inlet joint 20 and upstream joints 41a to 43a of the first to third passing pipes 41 to 43) on the front surface 11 of the most upstream gas supply device 1A.
In addition, the facing joints (the downstream joints 41b to 43b of the first to third passage pipes 41 to 43 of the upstream gas supply device 1 and the inlet joint 20 of the downstream gas supply device 1 and the upstream joints 41a, 42a of the first and second passage pipes 41, 42) of adjacent gas supply devices 1 (i.e., 1A and 1B, 1B and 1C, 1C and 1D) are connected to each other by straight connecting pipes L1 to L3, respectively.

尚、ガス供給装置1B,1C及び1Dのそれぞれの第3の通過配管43の上流側継手43aには上流側配管が接続されず、封止部材Pで封止されている。このため、これらの上流側継手43aの下流側の各配管にはガスG1は供給されない。したがって、ガス供給装置1Bと1Cの間の第3の接続配管L3並びにガス供給装置1Cと1Dの間の第2及び第3の接続配管L2,L3にはガスG1が供給されないので、これらの接続配管L3,L2,L3は省略して、それらの両端の継手(43b,42a,42b,41a,43b,42a)を封止部材Pで封止してもよい。また、最下流のガス供給装置1Dにおける第1~第3の通過配管41~43の下流側継手41b~43bも封止部材Pで封止されている。
また、図4では図示省略するが、各ガス供給装置1(1A,1B,1C,1D)から、それぞれの処理チャンバ(図示省略)への導出配管32(図1参照)が設けられている。
Note that the upstream joint 43a of the third passage pipe 43 of each of the gas supply devices 1B, 1C, and 1D is not connected to an upstream pipe and is sealed with a sealing member P. Therefore, the gas G1 is not supplied to each pipe downstream of these upstream joints 43a. Therefore, the gas G1 is not supplied to the third connection pipe L3 between the gas supply devices 1B and 1C and the second and third connection pipes L2, L3 between the gas supply devices 1C and 1D. Therefore, these connection pipes L3, L2, L3 may be omitted, and the joints at both ends (43b, 42a, 42b, 41a, 43b, 42a) may be sealed with a sealing member P. Furthermore, the downstream joints 41b to 43b of the first to third passage pipes 41 to 43 in the most downstream gas supply device 1D are also sealed with a sealing member P.
Although not shown in FIG. 4, outlet pipes 32 (see FIG. 1) are provided from each gas supply device 1 (1A, 1B, 1C, 1D) to the respective processing chambers (not shown).

次に、このように構成された流体制御装置100の動作について説明する。ガス供給源S1からのガスG1の一部は、供給配管F1を通って、第1のガス供給装置1Aに供給される。ガスG1の別の一部は、供給配管F2、第1のガス供給装置1A内部の通過配管41、及び接続配管L1を通ってガス供給装置1Bに供給される。ガスG1のさらに別の一部は、供給配管F3、第1のガス供給装置1A内部の通過配管42、接続配管L2、第2のガス供給装置1B内部の通過配管41、及び接続配管L1を通って第3のガス供給装置1Cに供給される。ガスG1のさらに別の一部は、供給配管F4、第1のガス供給装置1A内部の通過配管43、接続配管L3、第2のガス供給装置1B内部の通過配管42、接続配管L2、第3のガス供給装置1C内部の通過配管41、及び接続配管L1を通って第4のガス供給装置1Dに供給される。
各ガス供給装置1(1A,1B,1C,1D)からは、計量されたガスG1が、導出配管32(図1参照)を通してそれぞれの処理チャンバ(図示省略)へ供給される。
Next, the operation of the fluid control device 100 configured as described above will be described. A portion of the gas G1 from the gas supply source S1 is supplied to the first gas supply device 1A through the supply pipe F1. Another portion of the gas G1 is supplied to the gas supply device 1B through the supply pipe F2, the passing pipe 41 inside the first gas supply device 1A, and the connection pipe L1. Another portion of the gas G1 is supplied to the third gas supply device 1C through the supply pipe F3, the passing pipe 42 inside the first gas supply device 1A, the connection pipe L2, the passing pipe 41 inside the second gas supply device 1B, and the connection pipe L1. Another portion of the gas G1 is supplied to the fourth gas supply device 1D through the supply pipe F4, the passing pipe 43 inside the first gas supply device 1A, the connection pipe L3, the passing pipe 42 inside the second gas supply device 1B, the connection pipe L2, the passing pipe 41 inside the third gas supply device 1C, and the connection pipe L1.
The measured gas G1 is supplied from each gas supply device 1 (1A, 1B, 1C, 1D) to the respective processing chambers (not shown) through the outlet pipes 32 (see FIG. 1).

このように接続することにより、手前のガス供給装置1内部を通過しながら、目的の各ガス供給装置1にガスG1を供給することができる。これにより、手前側のガス供給装置1と奥側のガス供給装置1の間で部品の共通化が可能になる。 By connecting in this manner, gas G1 can be supplied to each target gas supply device 1 while passing through the inside of the gas supply device 1 in front. This makes it possible to share parts between the gas supply device 1 in the front and the gas supply device 1 in the back.

(第2の実施形態)
図5は、本発明の第2の実施形態に係るガス供給装置を概念的に示す平面断面図である。
本実施形態のガス供給装置2は、第1の実施形態のガス供給装置1に、さらに第2のガスG2を供給する渡し配管60を追加したものである。
すなわち、本実施形態のガス供給装置2は、ガス供給装置1の構成に加えて、第2の流体機器50と、渡し配管60と、分岐配管70とを含む。本実施形態のうち第1の実施形態と同様の部分については、同一の符号を付し、詳細な説明は省略する。
Second Embodiment
FIG. 5 is a cross-sectional plan view conceptually showing a gas supply device according to a second embodiment of the present invention.
The gas supply device 2 of this embodiment is obtained by adding a connecting pipe 60 for supplying a second gas G2 to the gas supply device 1 of the first embodiment.
That is, the gas supply device 2 of this embodiment includes a second fluid device 50, a connecting pipe 60, and a branch pipe 70 in addition to the configuration of the gas supply device 1. The same parts of this embodiment as those of the first embodiment are denoted by the same reference numerals, and detailed description thereof will be omitted.

第2の流体機器50は、第1の実施形態の流体機器30と同様に1つの集積化ガスライン(「第2の集積化ガスライン(50)」ともいう)を構成し、流体機器50によって制御されたガスG2を、例えば処理チャンバ(図示省略)に供給する導出配管52を備えている。第2の流体機器50の構成は、第1の実施形態の流体機器30の構成と同様なので、詳細な説明は省略する。 The second fluid device 50, like the fluid device 30 of the first embodiment, forms a single integrated gas line (also referred to as the "second integrated gas line (50)") and is equipped with an outlet pipe 52 that supplies gas G2 controlled by the fluid device 50 to, for example, a processing chamber (not shown). The configuration of the second fluid device 50 is similar to the configuration of the fluid device 30 of the first embodiment, so a detailed description will be omitted.

渡し配管60は、筐体10の前面11に設けられた上流側継手60aから後面12に設けられた下流側継手60bへ筐体10内を通過するように配置され、第2のガスG2を流す配管である。渡し配管60は、本実施形態ではストレートな配管であるため、前面11側の上流側継手60aと後面12側の下流側継手60bは、前面視(図示省略)で同一位置にある。
分岐配管70は、渡し配管60から分岐して第2の流体機器50に第2のガスG2を供給する配管である。
The connecting pipe 60 is arranged to pass through the housing 10 from an upstream joint 60a provided on the front surface 11 of the housing 10 to a downstream joint 60b provided on the rear surface 12, and is a pipe through which the second gas G2 flows. Since the connecting pipe 60 is a straight pipe in this embodiment, the upstream joint 60a on the front surface 11 side and the downstream joint 60b on the rear surface 12 side are in the same position when viewed from the front (not shown).
The branch pipe 70 is a pipe that branches off from the connecting pipe 60 and supplies the second gas G2 to the second fluid device 50.

この構成によれば、供給配管の容量に比べて使用量の大きい第1のガスG1については、並列に設けたガス供給源からの配管、第1~第3の通過配管41~43及び第1~第3の接続配管L1~L3で、それぞれのガス供給装置1A~1Dにガスを供給できるとともに、供給配管の容量に比べて使用量の小さい第2のガスG2については、第2のガス供給源からの一本の供給配管(渡し配管60と渡し接続配管L0)が複数のガス供給装置1A~1D内を順に通過し、各ガス供給装置1A~1D内で分岐(ワンドロップ)して、そのガス供給装置1A~1Dにガスを供給できる。 With this configuration, for the first gas G1, which is used in a larger amount compared to the capacity of the supply pipe, the gas can be supplied to each gas supply device 1A-1D via pipes from the parallel gas supply source, the first to third passing pipes 41-43, and the first to third connecting pipes L1-L3. For the second gas G2, which is used in a smaller amount compared to the capacity of the supply pipe, a single supply pipe (transfer pipe 60 and transfer connecting pipe L0) from the second gas supply source passes through multiple gas supply devices 1A-1D in sequence, branches (one drop) within each gas supply device 1A-1D, and supplies the gas to that gas supply device 1A-1D.

図6は、図5のガス供給装置2を複数連結した流体制御装置200を概念的に示すブロック図を示す。この流体制御装置200では、上記構造のガス供給装置2が上流から下流に向かって4個配列されている。
この4個のガス供給装置2(2A,2B,2C,2D)の上流側には、第1の実施形態のガス供給装置1と同様に、ガス供給源S1からの供給配管F1~F4が最上流側のガス供給装置2Aの前面の導入継手20と第1~第3の通過配管41~43の上流側継手41a~43aに接続され、さらに、渡し供給配管F0が渡し配管60の上流側継手60aに接続されている。
Fig. 6 is a block diagram conceptually showing a fluid control device 200 in which a plurality of gas supply devices 2 shown in Fig. 5 are connected together. In this fluid control device 200, four gas supply devices 2 having the above structure are arranged from upstream to downstream.
On the upstream side of these four gas supply devices 2 (2A, 2B, 2C, 2D), similar to the gas supply device 1 of the first embodiment, supply pipes F1 to F4 from the gas supply source S1 are connected to the inlet joint 20 on the front side of the most upstream gas supply device 2A and the upstream joints 41a to 43a of the first to third passing pipes 41 to 43, and further, the transfer supply pipe F0 is connected to the upstream joint 60a of the transfer pipe 60.

隣接するガス供給装置2(すなわち2Aと2B,2Bと2C,2Cと2D)の向かい合う継手同士(上流側のガス供給装置2の第1~第3の通過配管41~43の下流側継手41b~43bと、下流側のガス供給装置2の導入継手20及び第1、第2の通過配管41,42の上流側継手41a,42a)は、それぞれストレートの接続配管L1~L3で接続され、上流側のガス供給装置2の渡し配管60の下流側継手60bと下流側のガス供給装置2の渡し配管60の上流側継手60aもストレートの接続配管L0で接続されている。
また、図5では図示省略するが、各ガス供給装置2(2A,2B,2C,2D)から、それぞれの処理チャンバ(図示省略)への導出配管32,52(図5参照;1つの処理チャンバへ2本)が設けられている。
The facing joints of adjacent gas supply devices 2 (i.e., 2A and 2B, 2B and 2C, 2C and 2D) (the downstream joints 41b to 43b of the first to third passage pipes 41 to 43 of the upstream gas supply device 2 and the inlet joint 20 and the upstream joints 41a, 42a of the first and second passage pipes 41, 42 of the downstream gas supply device 2) are connected by straight connecting pipes L1 to L3, respectively, and the downstream joint 60b of the connecting pipe 60 of the upstream gas supply device 2 and the upstream joint 60a of the connecting pipe 60 of the downstream gas supply device 2 are also connected by a straight connecting pipe L0.
Although not shown in FIG. 5, outlet pipes 32, 52 (see FIG. 5; two pipes per one processing chamber) are provided from each gas supply device 2 (2A, 2B, 2C, 2D) to the respective processing chambers (not shown).

このように構成された本実施形態の流体制御装置200では、供給配管の容量に比べて使用量の大きいガスG1については、並列に設けた第1~第3の通過配管41~43及び第1~第3の接続配管L1~L3で、それぞれのガス供給装置2にガスを供給できるとともに、供給配管の容量に比べて使用量の小さい第2のガスG2については、第2のガス供給源S2からの一本の供給配管(渡し配管60と渡し接続配管L0)が複数のガス供給装置2A~2D内を順に通過し、各ガス供給装置2内で分岐(ワンドロップ)して、そのガス供給装置2にガスG2を供給できる。これにより、配管スペースのさらなる省スペース化を実現できる。 In the fluid control device 200 of this embodiment configured as described above, for gas G1, which is used in a quantity greater than the capacity of the supply pipe, gas can be supplied to each gas supply device 2 via the first to third flow pipes 41 to 43 and the first to third connection pipes L1 to L3, which are arranged in parallel. For second gas G2, which is used in a quantity less than the capacity of the supply pipe, a single supply pipe (transfer pipe 60 and transfer connection pipe L0) from the second gas supply source S2 passes through multiple gas supply devices 2A to 2D in sequence, branches (one drop) within each gas supply device 2, and supplies gas G2 to that gas supply device 2. This further reduces piping space.

以上、本発明の実施形態について詳述したが、本発明はかかる特定の実施例に限定されるものではなく、特許請求の範囲に記載された本発明の要旨の範囲内において、種々の変形・変更が可能である。 Although the embodiments of the present invention have been described in detail above, the present invention is not limited to these specific examples, and various modifications and variations are possible within the scope of the gist of the present invention as set forth in the claims.

1,1A~1D (第1の実施形態の)ガス供給装置
2,2A~2D (第2の実施形態の)ガス供給装置
5A~5D (図7(a)の)ガス供給装置
5a~5d 供給配管
6,6A~6D (図7(b)の)ガス供給装置
6s 通過配管(渡し配管)
7,7A~7D (図7(c)の)ガス供給装置
7a~7d 通過配管
10 筐体(ベース部材)
11 前面
12 後面
20 導入継手
30 流体機器
30A~30E 流体機器
31 流路ブロック
32 導出配管
41~43 第1~第3の通過配管(通過配管)
41a~43a (第1~第3の通過配管の)上流側継手
41b~43b (第1~第3の通過配管の)下流側継手
50 第2の流体制御機器
52 導出配管
60 渡し配管
60a (渡し配管60の)上流側継手
60b (渡し配管60の)下流側継手
70 分岐配管
100,200 流体制御装置
F0 渡し供給配管
F1~F4 第1~第4の供給配管(供給配管)
G1 ガス
G2 第2のガス
L0 渡し接続配管
L1~L3 第1~第3の接続配管(接続配管)
P 封止部材
S1 ガス供給源
S2 第2のガス供給源
1, 1A to 1D Gas supply devices 2, 2A to 2D (of the first embodiment) Gas supply devices 5A to 5D (of the second embodiment) Gas supply devices 5a to 5d (of FIG. 7(a)) Supply pipes 6, 6A to 6D Gas supply device 6s (of FIG. 7(b)) Passing pipe (crossover pipe)
7, 7A to 7D (in FIG. 7(c)) gas supply devices 7a to 7d, passage pipe 10, housing (base member)
11 Front surface 12 Rear surface 20 Inlet joint 30 Fluid equipment 30A to 30E Fluid equipment 31 Flow path block 32 Outlet pipes 41 to 43 First to third passing pipes (passing pipes)
41a to 43a: Upstream joints 41b to 43b (of the first to third passing pipes); Downstream joint 50 (of the first to third passing pipes); Second fluid control device 52: Outlet pipe 60; Connecting pipe 60a: Upstream joint 60b (of the connecting pipe 60); Downstream joint 70 (of the connecting pipe 60); Branch pipes 100, 200: Fluid control device F0; Connecting supply pipes F1 to F4: First to fourth supply pipes (supply pipes)
G1 Gas G2 Second gas L0 Transfer connection pipes L1 to L3 First to third connection pipes (connection pipes)
P: sealing member S1: gas supply source S2: second gas supply source

Claims (3)

配管及び流体機器を配備するベース部材と、
前記ベース部材内に配置され、導入されたガスを制御する流体機器と、
前記ベース部材の前方に設けられ、前記流体機器と接続される導入配管の端部に形成した導入継手と、
それぞれ前記ベース部材の前方に設けられた上流側継手から前記ベース部材の後方に設けられた下流側継手へ前記ベース部材内を通過するように配置されるn本の通過配管(nは1以上の整数)と、
を有するガス供給装置であって、
前記n本の通過配管は平面視で屈曲した経路を有し、
前方視において、前記導入継手と前記n本の通過配管のうちの第1の通過配管の下流側継手とは、一致する位置に設けられ、n≧2のとき、第1~第n-1の通過配管の上流側継手と第2~第nの通過配管の下流側継手は、それぞれ一致する位置に設けられている、ガス供給装置。
a base member on which piping and fluid equipment are arranged;
a fluid device disposed within the base member and controlling the introduced gas ;
an inlet joint provided in front of the base member and formed at an end of an inlet pipe connected to the fluid device;
n passing pipes (n is an integer of 1 or more) arranged so as to pass through the base member from upstream joints provided in front of the base member to downstream joints provided in the rear of the base member;
A gas supply device having:
The n passage pipes have paths that are bent in a plan view,
When viewed from the front, the introduction joint and a downstream joint of a first passage pipe among the n passage pipes are provided at the same position, and when n≧2, the upstream joints of the first to (n−1)th passage pipes and the downstream joints of the second to nth passage pipes are provided at the same position, respectively.
前記導入継手と第1~第nの通過配管の上流側継手は、前方視において、一直線上に等間隔で配置された、請求項1に記載のガス供給装置。 The gas supply device of claim 1, wherein the inlet joint and the upstream joints of the first to nth passage pipes are arranged at equal intervals on a straight line when viewed from the front. それぞれ請求項1に記載のガス供給装置であり、上流側から配置されたm個のガス供給装置(mは2以上の整数)を含むとともに、第iの前記ガス供給装置(iは1からm-1の整数)の第1~第nの通過配管のうちの第1の通過配管の下流側継手に、第i+1の前記ガス供給装置の前記導入継手を接続し、n≧2のとき、第iの前記ガス供給装置の第2~第nの通過配管に、第i+1の前記ガス供給装置の第1~第n-1の通過配管の上流側継手をそれぞれ接続するn-1個の接続配管を含み、m個のガス供給装置のうちの第1のガス供給装置の前記導入継手及び第1~第nの通過配管の上流側継手には、ガス供給源からの配管がそれぞれ接続される、流体制御装置。
a fluid control device including m gas supply devices (m is an integer of 2 or more) arranged from the upstream side, each of which is the gas supply device according to claim 1, and wherein the inlet joint of the (i+1)th gas supply device is connected to a downstream joint of a first passing pipe among first to n passing pipes of the i-th gas supply device (i is an integer from 1 to m-1); and when n≧2, the device includes n-1 connection pipes connecting upstream joints of the first to n-1th passing pipes of the (i+1)th gas supply device to second to n passing pipes of the i-th gas supply device, respectively; and wherein pipes from a gas supply source are connected to the inlet joint of the first gas supply device and the upstream joints of the first to n-1th passing pipes of the (i+1)th gas supply device among the m gas supply devices.
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WO2020085033A1 (en) 2018-10-26 2020-04-30 株式会社フジキン Fluid supply system, fluid control device, and semiconductor manufacturing device

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