JP7794673B2 - Substrate processing apparatus and substrate processing method - Google Patents

Description

The present invention relates to a substrate processing apparatus and a substrate processing method.

The substrate processing apparatus described in Patent Document 1 applies a liquid coating agent to the peripheral edge of a substrate, covering any dust adhering to the peripheral edge with the liquid coating agent. The coating agent that covers the dust adhering to the peripheral edge of the substrate is then hardened, trapping the dust within the hardened coating agent. Therefore, dust can be removed from the peripheral edge of the substrate by removing the coating agent from the peripheral edge of the substrate. Furthermore, since photoresist is applied to the substrate surface after the coating agent is applied to the peripheral edge of the substrate, the photoresist is applied on top of the coating agent at the peripheral edge of the substrate. Therefore, when the coating agent is removed from the peripheral edge of the substrate, the photoresist applied on top of the coating agent is also removed from the peripheral edge of the substrate along with the coating agent. In this way, dust and photoresist can be simultaneously removed from the peripheral edge of the substrate.

JP 2013-74126 A

However, in the substrate processing apparatus of Patent Document 1, the removal mechanism blows away the coating agent with nitrogen gas, removing the photoresist along with the coating agent. Therefore, all of the coating agent adhering to the substrate is removed. Meanwhile, the inventors of the present application have conducted extensive research into liquid-repellent substances that can repel processing liquids, in order to remove only the excess liquid-repellent substance.

The present invention was made in consideration of the above-mentioned problems, and its purpose is to provide a substrate processing apparatus and substrate processing method that can remove only excess liquid-repellent material from a substrate.

According to one aspect of the present invention, a substrate processing apparatus includes a substrate holding unit and a removal member. The substrate holding unit holds and rotates a substrate having a liquid-repellent substance capable of repelling processing liquid attached at least to the peripheral and end surfaces of the main body surface. While the substrate is rotating, the removal member contacts at least the peripheral surface of the main body of the substrate while being spaced apart from the radial side surface of the end surface of the substrate, thereby bringing a remover capable of removing the liquid-repellent substance into contact with the liquid-repellent substance attached to the peripheral surface of the main body. The peripheral surface of the substrate refers to the peripheral region of the surface of the substrate main body. The end surface of the substrate refers to the end surface region radially outward from the substrate main body.

In one aspect of the present invention, the removal member preferably includes a first contact portion and a second contact portion. The first contact portion preferably contacts at least the peripheral edge of the main body front surface of the substrate while being spaced apart from the side portion of the substrate during rotation of the substrate, thereby bringing the remover into contact with the liquid-repellent substance adhered to the peripheral edge of the main body front surface. The second contact portion preferably contacts at least the peripheral edge of the main body back surface of the substrate while being spaced apart from the side portion of the substrate during rotation of the substrate, thereby bringing the remover into contact with the liquid-repellent substance adhered to the peripheral edge of the main body back surface. The peripheral edge of the main body back surface of the substrate preferably refers to a peripheral region of the back surface of the substrate body.
The first contact portion and the second contact portion may be arranged on the same axis. When the first contact portion is in contact with the peripheral edge portion of the front surface of the main body and the second contact portion is in contact with the peripheral edge portion of the back surface of the main body, the first contact portion and the second contact portion may be spaced apart from the side surface.

In one aspect of the present invention, the first contact portion preferably includes a first outer contact portion and a first inner contact portion. The first outer contact portion preferably contacts the peripheral edge of the main body surface during rotation of the substrate, thereby bringing the remover into contact with the liquid-repellent substance adhering to the peripheral edge of the main body surface. The first inner contact portion is preferably disposed inside the first outer contact portion and contacts the surface edge of the end face of the substrate during rotation of the substrate, thereby bringing the remover into contact with the liquid-repellent substance adhering to the surface edge. The surface edge of the end face preferably represents a region of the end face on the front side of the substrate that is located radially outward from the peripheral edge of the main body surface and radially inward from the side face. The second contact portion preferably includes a second outer contact portion and a second inner contact portion. The second outer contact portion preferably contacts the peripheral edge of the back face of the substrate during rotation of the substrate, thereby bringing the remover into contact with the liquid-repellent substance adhering to the peripheral edge of the back face of the substrate. The second inner contact portion is preferably positioned inside the second outer contact portion and contacts the rear edge portion of the end surface of the substrate while the substrate is rotating, thereby bringing the remover into contact with the liquid-repellent substance adhered to the rear edge portion. The rear edge portion of the end surface preferably refers to a region of the end surface on the rear side of the substrate that is located radially outward from the main body rear edge portion and radially inward from the side surface portion.

In one aspect of the present invention, the first outer contact portion preferably has a flat surface that contacts the peripheral edge of the front surface of the main body. The first inner contact portion preferably has an inclined surface that contacts the edge of the front surface. The second outer contact portion preferably has a flat surface that contacts the peripheral edge of the back surface of the main body. The second inner contact portion preferably has an inclined surface that contacts the edge of the back surface.

In one aspect of the present invention, it is preferable that the distance between the first inner contact portion and the second inner contact portion is expandable and contractible.

In one aspect of the present invention, the substrate processing apparatus preferably further includes an inert gas discharge unit. The inert gas discharge unit preferably discharges an inert gas from between the first contact portion and the second contact portion.

In one aspect of the present invention, it is preferable that the removal member contacts at least the peripheral edge of the main body front surface and the peripheral edge of the main body back surface while rotating and being spaced apart from the side surface of the substrate.

In one aspect of the present invention, it is preferable that at least a portion of the removal member enters a notch present on the edge surface of the substrate and contacts the bottom of the notch.

In one aspect of the present invention, the substrate processing apparatus preferably further includes a biasing mechanism. The biasing mechanism preferably biases the removal member radially inward of the substrate.

In one aspect of the present invention, the substrate processing apparatus preferably further includes a remover supply unit. The remover supply unit preferably supplies the remover to the removal member.

According to another aspect of the present invention, a substrate processing method uses a removal member that brings a remover capable of removing a liquid-repellent substance into contact with the liquid-repellent substance. The substrate processing method includes the steps of holding and rotating a substrate having the liquid-repellent substance attached to at least the peripheral and end surfaces of its main body surface, and, while the substrate is rotating, bringing the removal member into contact with at least the peripheral surface of the main body of the substrate while separating the removal member from the radial side surface of the end surface of the substrate, thereby bringing the remover into contact with the liquid-repellent substance attached to the peripheral surface of the main body. The peripheral surface of the substrate refers to the peripheral region of the surface of the substrate main body. The end surface of the substrate refers to the end surface region radially outward from the substrate main body.

In one aspect of the present invention, the removal member preferably includes a first contact portion and a second contact portion arranged at a distance from each other in a fixed direction. The step of bringing the remover into contact with the liquid-repellent substance preferably includes a first contacting operation and a second contacting operation. The first contacting operation is preferably an operation of bringing the first contact portion into contact with at least the peripheral edge of the main body surface of the substrate while separating the first contact portion from the side portion of the substrate during rotation of the substrate, thereby bringing the remover into contact with the liquid-repellent substance adhering to the peripheral edge of the main body surface. The second contacting operation is preferably an operation of bringing the second contact portion into contact with at least the peripheral edge of the main body back surface of the substrate while separating the second contact portion from the side portion of the substrate during rotation of the substrate, thereby bringing the remover into contact with the liquid-repellent substance adhering to the peripheral edge of the main body back surface. The peripheral edge of the main body back surface of the substrate preferably refers to a peripheral region of the back surface of the substrate body.
The first contact portion and the second contact portion may be arranged on the same axis. The step of bringing the remover into contact with the liquid-repellent substance may include the step of simultaneously performing the first contacting operation and the second contacting operation. In the first contacting operation and the second contacting operation, the first contact portion and the second contact portion may be spaced apart from each other with respect to the side surface portion.

In one aspect of the present invention, the first contact portion preferably includes a first outer contact portion and a first inner contact portion disposed inside the first outer contact portion. In the step of bringing the remover into contact with the liquid-repellent substance, the first contact action preferably includes a first body contact action and a first edge surface contact action. The first body contact action preferably includes contacting the first outer contact portion with the body surface peripheral portion while the substrate is rotating, thereby bringing the remover into contact with the liquid-repellent substance adhering to the body surface peripheral portion. The first edge surface contact action preferably includes contacting the first inner contact portion with the surface edge portion of the edge surface of the substrate while the substrate is rotating, thereby bringing the remover into contact with the liquid-repellent substance adhering to the surface edge portion. The surface edge portion of the edge surface preferably refers to a region of the end surface portion located radially outward from the body surface peripheral portion and radially inward from the side surface portion, on the surface side of the substrate. The second contact portion preferably includes a second outer contact portion and a second inner contact portion disposed inside the second outer contact portion. In the step of bringing the remover into contact with the liquid-repellent substance, the second contacting operation preferably includes a second body contacting operation and a second edge contacting operation. The second body contacting operation preferably includes contacting the second outer contact portion with the peripheral edge of the back surface of the body of the substrate while the substrate is rotating, thereby bringing the remover into contact with the liquid-repellent substance adhering to the peripheral edge of the back surface of the body. The second edge contacting operation preferably includes contacting the second inner contact portion with the edge of the back surface of the edge surface of the substrate while the substrate is rotating, thereby bringing the remover into contact with the liquid-repellent substance adhering to the edge of the back surface. The edge of the edge surface preferably refers to a region of the end surface on the back side of the substrate that is located radially outward from the peripheral edge of the back surface of the body and radially inward from the side surface.

In one aspect of the present invention, the first outer contact portion preferably has a flat surface that contacts the peripheral edge of the front surface of the main body. The first inner contact portion preferably has an inclined surface that contacts the edge of the front surface. The second outer contact portion preferably has a flat surface that contacts the peripheral edge of the back surface of the main body. The second inner contact portion preferably has an inclined surface that contacts the edge of the back surface.

In one aspect of the present invention, it is preferable that the distance between the first inner contact portion and the second inner contact portion is expandable and contractible.

In one aspect of the present invention, in the step of bringing the remover into contact with the liquid-repellent substance, it is preferable to eject an inert gas from between the first contact portion and the second contact portion.

In one aspect of the present invention, in the step of bringing the remover into contact with the liquid-repellent substance, it is preferable that the removal member is brought into contact with at least the peripheral edge of the front surface of the main body and the peripheral edge of the back surface of the main body while being separated from the side portion of the substrate and rotating the removal member.

In one aspect of the present invention, in the step of bringing the remover into contact with the liquid-repellent substance, it is preferable that at least a portion of the remover enters a notch present on the edge surface of the substrate and contacts the bottom of the notch.

In one aspect of the present invention, in the step of bringing the remover into contact with the liquid-repellent substance, it is preferable that the removal member be biased radially inward of the substrate.

In one aspect of the present invention, it is preferable that the substrate processing method further includes a step of supplying the remover to the removal member.

The present invention allows only excess liquid-repellent material to be removed from the substrate.

1 is a plan view showing the inside of a substrate processing apparatus according to an embodiment of the present invention. FIG. 2 is a plan view showing the inside of the liquid repellent agent treatment unit according to the embodiment. FIG. 2 is a side view showing the inside of the liquid repellent agent treatment unit according to the embodiment. FIG. 2 is a cross-sectional view showing a substrate according to the embodiment. FIG. 2 is a plan view showing a part of the substrate according to the embodiment. FIG. 10 is a diagram showing the first stage of the liquid-repellent substance removal method according to the present embodiment. 10A and 10B are diagrams illustrating the latter stage of the liquid-repellent substance removal method according to the present embodiment. FIG. 2 is a side view showing the brush according to the embodiment. 10A and 10B are diagrams illustrating an example of a process for removing a liquid-repellent substance using a brush according to the present embodiment. 10A and 10B are diagrams illustrating an example of a process for removing a liquid-repellent substance using a brush according to a modified example of the present embodiment. 10A and 10B are diagrams illustrating an example of a process for removing a liquid-repellent substance using a brush according to another modified example of the present embodiment. 1 is a flowchart showing a substrate processing method according to the present embodiment. FIG. 2 is a plan view showing a substrate according to the embodiment. FIG. 10 is a plan view showing a state in which the brush according to the embodiment is in contact with a notch. FIG. 2 is a plan view showing a brush and a notch according to the embodiment. FIG. 10 is a cross-sectional view showing a brush according to a first modified example of the present embodiment. 10A and 10B are diagrams showing a first step of a process for removing a liquid-repellent substance by using a brush according to a first modified example. 10A and 10B are diagrams showing a second step of the process of removing the liquid-repellent substance by using a brush according to the first modified example. 10A and 10B are diagrams illustrating an example of a process for removing a liquid-repellent substance using a brush according to a second modified example of the present embodiment.

Embodiments of the present invention will be described below with reference to the drawings. In the drawings, identical or corresponding parts will be designated by the same reference numerals and description will not be repeated. In addition, to facilitate understanding, the X-axis, Y-axis, and Z-axis are shown as appropriate in the drawings. The X-axis, Y-axis, and Z-axis are mutually orthogonal, the X-axis and Y-axis are parallel to the horizontal direction, and the Z-axis is parallel to the vertical direction. Note that "plan view" refers to viewing an object from vertically above. Furthermore, a "plan view" refers to a drawing of an object viewed from vertically above.

A substrate processing apparatus 100 according to an embodiment of the present invention will be described with reference to Figures 1 to 12. First, the substrate processing apparatus 100 will be described with reference to Figure 1. Figure 1 is a plan view showing the interior of the substrate processing apparatus 100. The substrate processing apparatus 100 shown in Figure 1 processes a substrate W. The substrate W has, for example, a pattern including a plurality of structures formed thereon.

The substrate W is, for example, a semiconductor wafer (e.g., a silicon wafer), a substrate for a liquid crystal display device, a substrate for a plasma display, a substrate for a field emission display (FED), a substrate for an optical disk, a substrate for a magnetic disk, a substrate for a magneto-optical disk, a substrate for a photomask, a ceramic substrate, or a substrate for a solar cell. Hereinafter, as an example, the substrate W is a silicon wafer.

As shown in FIG. 1, the substrate processing apparatus 100 includes multiple load ports LP, an indexer robot IR, a center robot CR, multiple processing units 1, a control device 2, multiple fluid boxes 3, a chemical cabinet 4, and a liquid repellent processing unit 5.

Each load port LP accommodates a stack of substrates W. The indexer robot IR transports substrates W between the load port LP and the center robot CR. The center robot CR transports substrates W between the indexer robot IR and the processing unit 1, between the indexer robot IR and the liquid-repellent agent processing unit 5, or between the processing unit 1 and the liquid-repellent agent processing unit 5. The liquid-repellent agent processing unit 5 applies a liquid-repellent agent to the substrate W. The liquid-repellent agent is a liquid containing a liquid-repellent substance that can repel processing liquid. The liquid-repellent agent processing unit 5 then removes excess liquid-repellent substance from the substrate W that has adhered to the substrate W. Details of the liquid-repellent agent processing unit 5 will be described later.

Each processing unit 1 processes substrates W with a processing liquid. Each processing unit 1 is a single-wafer processing device that processes substrates W one at a time. Specifically, the processing unit 1 includes a front surface nozzle 7 and a back surface nozzle 8. The front surface nozzle 7 supplies processing liquid to the front surface of the substrate W, out of the front surface (top surface) and back surface (bottom surface) of the substrate W, to process the front surface of the substrate W. The back surface nozzle 8 supplies processing liquid to the back surface of the substrate W to process the back surface of the substrate W.

The processing liquid is a chemical liquid or a rinse liquid. The chemical liquid is a liquid for processing the substrate W. Examples of the chemical liquid include dilute hydrofluoric acid (DHF), hydrofluoric acid (HF), _buffered hydrofluoric acid (BHF), ammonium fluoride, HFEG (a mixture of hydrofluoric acid and ethylene glycol), phosphoric acid ( _H3PO4 ), sulfuric acid, acetic acid, nitric acid, hydrochloric acid, ammonia water, hydrogen peroxide water, organic acids (e.g., citric acid, oxalic acid), organic alkalis (e.g., TMAH: tetramethylammonium hydroxide), ammonia-hydrogen peroxide water mixture (SC1), hydrochloric acid-hydrogen peroxide water mixture (SC2), isopropyl alcohol (IPA), surfactants, and corrosion inhibitors.

The rinse liquid is a liquid used to wash away chemicals, post-chemical processing by-products, and/or foreign matter from the substrate W. Examples of rinse liquids include deionized water (DIW), carbonated water, electrolytic ionized water, hydrogen water, ozone water, or diluted hydrochloric acid water (e.g., approximately 10 ppm to 100 ppm).

A tower TW is formed by stacking a predetermined number of processing units 1 (three processing units 1 in the example of FIG. 1) vertically. However, in the example of FIG. 1, one of the multiple towers TW (four towers TW in the example of FIG. 1) includes one liquid-repellent agent processing unit 5 instead of one processing unit 1. The multiple towers TW are arranged to surround the center robot CR in a plan view. The arrangement of the liquid-repellent agent processing unit 5 is not particularly limited; for example, the liquid-repellent agent processing unit 5 may be arranged in a dedicated space in the substrate processing apparatus 100 or outside the substrate processing apparatus 100. The substrate processing apparatus 100 may also be equipped with multiple liquid-repellent agent processing units 5.

Each of the multiple fluid boxes 3 houses fluid equipment. The multiple fluid boxes 3 correspond to multiple towers TW, respectively. The chemical cabinet 4 houses chemicals. The chemicals in the chemical cabinet 4 are supplied via one of the fluid boxes 3 to all processing units 1 included in the tower TW corresponding to the fluid box 3.

The control device 2 controls the load port LP, indexer robot IR, center robot CR, processing unit 1, fluid box 3, chemical cabinet 4, and liquid repellent processing unit 5. The control device 2 is, for example, a computer.

The control device 2 includes a control unit 21 and a memory unit 22. The control unit 21 includes a processor such as a CPU (Central Processing Unit). The memory unit 22 includes a storage device and stores data and computer programs. Specifically, the memory unit 22 includes a main storage device such as a semiconductor memory, and an auxiliary storage device such as a semiconductor memory, a solid-state drive, and/or a hard disk drive. The memory unit 22 may also include removable media. The memory unit 22 is an example of a non-transitory computer-readable storage medium.

Next, the liquid-repellent agent treatment unit 5 will be described with reference to Figure 2. Figure 2 is a plan view showing the interior of the liquid-repellent agent treatment unit 5. As shown in Figure 2, the liquid-repellent agent treatment unit 5 includes a chamber 11, a spin chuck 13, a liquid-repellent substance removal mechanism 15, a remover supply unit 17, a liquid receiving unit 19, a liquid-repellent agent application unit 31, and a rinse liquid supply unit 33. The liquid-repellent substance removal mechanism 15 includes a brush 151 and a swing arm 152. The remover supply unit 17 includes a remover nozzle 171, a valve 172, and piping 173. The liquid-repellent agent application unit 31 includes a liquid-repellent agent nozzle 311 and an arm 312. The rinse liquid supply unit 33 includes a rinse liquid nozzle 331. The control unit 21 controls the spin chuck 13, the liquid-repellent substance removal mechanism 15, the remover supply unit 17, the liquid-repellent agent application unit 31, and the rinse liquid supply unit 33.

The chamber 11 has a generally box-like shape. It houses a spin chuck 13, a liquid-repellent material removal mechanism 15, a remover nozzle 171, a liquid receiver 19, a liquid-repellent agent application unit 31, a liquid-repellent agent nozzle 311, and a rinse liquid nozzle 331.

The spin chuck 13 rotates the substrate W while holding it. Specifically, the spin chuck 13 rotates the substrate W around the rotation axis AX1 while holding it substantially horizontally. The spin chuck 13 corresponds to an example of the "substrate holding portion" of the present invention.

At application position P3, the liquid-repellent agent applicator 31 applies a liquid-repellent agent to the outer edge surface 51 of the substrate W in the radial direction RD. The edge surface 51 is a substantially annular portion of the substrate W around the rotation axis AX1. Specifically, at application position P3, the liquid-repellent agent applicator 31 ejects the liquid-repellent agent from the liquid-repellent agent nozzle 311 onto the outer edge surface 51 of the substrate W in the radial direction RD. In this embodiment, the radial direction RD is substantially parallel to the horizontal direction. The radial direction RD is also perpendicular to the rotation axis AX1. The radial direction RD can also be considered to be the radial direction relative to the rotation axis AX1. The circumferential direction around the rotation axis AX1 is sometimes referred to as the circumferential direction CD. The circumferential direction CD can also be considered to be the circumferential direction of the substrate W.

The coating position P3 indicates a position above the edge surface 51 of the substrate W. On the other hand, the standby position P4 indicates a position further outward in the radial direction RD than the coating position P3. In other words, the standby position P4 indicates a position spaced apart from the substrate W in the radial direction RD.

A liquid repellent agent is a liquid containing a liquid repellent substance. Specifically, a liquid repellent agent is a solution containing a liquid repellent substance. A liquid repellent substance is a substance that can repel the processing liquid used to process the substrate W. In other words, a liquid repellent substance is a substance that has the property of repelling the processing liquid more than the substrate W. A liquid repellent substance has liquid repellency. Liquid repellency is the property of repelling liquid. For example, a substance with a contact angle of 90 degrees or more is a liquid repellent substance.

The liquid repellent agent is a mixture of a solvent and a liquid repellent substance as a solute. The solvent is, for example, water. The water is, for example, the same liquid as a rinse solution. The liquid repellent substance is, for example, a polymer compound. The liquid repellent substance is preferably a non-fluorine-based liquid repellent substance. As an example, Neoseed (registered trademark) manufactured by Nicca Chemical can be used as the liquid repellent substance. The liquid repellent agent may also be wax.

The liquid-repellent substance is, for example, a water-repellent substance. A water-repellent substance is a substance that can repel water. In other words, a water-repellent substance is a substance that has the property of repelling water more than the substrate W. A water-repellent substance has water-repellency. Water-repellency refers to the property of repelling water. For example, a substance with a contact angle of 90 degrees or more is a water-repellent substance. In this case, water is, for example, the same liquid as the rinse liquid. When a water-repellent substance is used as the liquid-repellent substance, it is effective when the processing liquid is an aqueous solution. Note that when the liquid-repellent substance is a water-repellent substance, the liquid-repellent agent is a water-repellent agent.

The liquid-repellent substance may be, for example, a silicone-based liquid-repellent substance or an acrylic-based liquid-repellent substance. Silicon-based liquid-repellent substances impart liquid-repellency to silicon itself and compounds containing silicon. Silicon-based liquid-repellent substances are, for example, silane coupling agents. Silane coupling agents include, for example, at least one of HMDS (hexamethyldisilazane), TMS (tetramethylsilane), fluorinated alkylchlorosilane, alkyldisilazane, and non-chloro hydrophobizing agents. Non-chloro hydrophobizing agents include, for example, at least one of dimethylsilyldimethylamine, dimethylsilyldiethylamine, hexamethyldisilazane, tetramethyldisilazane, bis(dimethylamino)dimethylsilane, N,N-dimethylaminotrimethylsilane, N-(trimethylsilyl)dimethylamine, and organosilane compounds.

The liquid-repellent substance may be, for example, a metal-based liquid-repellent substance. Metal-based liquid-repellent substances impart liquid-repellency to metal itself and compounds containing metal. Metal-based liquid-repellent substances include, for example, at least one of an amine having a hydrophobic group and an organosilicon compound.

After the liquid-repellent agent dispensed onto the substrate W has dried, the liquid-repellent substance removal mechanism 15 performs a process of removing the liquid-repellent substance adhering to the substrate W at the removal position P1 using a brush 151 impregnated with the remover. The removal process refers to a process of separating the liquid-repellent substance adhering to the substrate W from the substrate W. In this case, "separation" refers to, for example, polishing the portion of the substrate W to which the liquid-repellent substance has adhered with the remover, thereby separating the liquid-repellent substance from the substrate W. However, "separation" may also refer to, for example, separating the liquid-repellent substance from the substrate W by dissolving the liquid-repellent substance adhering to the substrate W with the remover.

The removal position P1 is a position facing the edge surface 51 of the substrate W in the radial direction RD. On the other hand, the standby position P2 is a position further outward in the radial direction RD than the removal position P1. In other words, the standby position P2 is a position separated from the substrate W in the radial direction RD. A liquid receiving portion 19 is disposed below the standby position P2. The liquid receiving portion 19 is, for example, a pot.

The remover is a liquid for removing the liquid-repellent substance. In other words, the remover is a liquid for separating the liquid-repellent substance from the substrate W. The remover is, for example, a liquid containing an abrasive. The abrasive is, for example, cerium oxide. As the remover, for example, "Kirobin (registered trademark)" manufactured by Prostaff Co., Ltd. can be used. Note that the type of abrasive contained in the remover is not particularly limited, as long as it can remove (separate) the liquid-repellent substance from the substrate W. Furthermore, the remover may be, for example, a liquid containing a component that dissolves the liquid-repellent substance, as long as it can remove (separate) the liquid-repellent substance from the substrate W.

The rinse liquid supply unit 33 cleans the substrate W with rinse liquid after a removal process has been performed on the liquid-repellent substance adhering to the substrate W. In other words, the rinse liquid supply unit 33 uses rinse liquid to wash away the liquid-repellent substance separated from the substrate W after the removal process has been performed. Specifically, the rinse liquid supply unit 33 ejects rinse liquid from the rinse liquid nozzle 331 onto the outer portion of the substrate W in the radial direction RD (including the edge surface portion 51) after the removal process has been performed.

At standby position P2, the remover supply unit 17 supplies remover to the brush 151 of the liquid-repellent substance removal mechanism 15. Therefore, according to this embodiment, the remover can be effectively impregnated into the brush 151. The brush 151 corresponds to an example of the "removal member" in the present invention.

The brush 151 has, for example, a substantially cylindrical shape. The brush 151 has, for example, elasticity. The brush 151 includes, for example, a porous material. In this case, the brush 151 may be, for example, sponge-like. The brush 151 preferably has liquid-repellent properties. This is because this makes it easier for the liquid-repellent agent to be transferred to the substrate W. The material of the brush 151 is, for example, PTFE (polytetrafluoroethylene) or PFA (tetrafluoroethylene-perfluoroalkyl vinyl ether copolymer). Note that the brush 151 may be composed of a combination of multiple components, or may include multiple bristles, for example.

Specifically, the remover nozzle 171 of the remover supply unit 17 ejects the remover onto the brush 151 located at the standby position P2. As a result, the remover permeates the brush 151.

More specifically, pipe 173 is connected to remover nozzle 171. Pipe 173 supplies remover to remover nozzle 171. Valve 172 is disposed on pipe 173. Valve 172 closes or opens the flow path of pipe 173. Control unit 21 controls valve 172 so that valve 172 opens the flow path of pipe 173. As a result, valve 172 opens the flow path of pipe 173, and remover nozzle 171 ejects remover toward brush 151. Remover that is not soaked into brush 151 falls into liquid receiver 19 and accumulates there.

Next, the liquid-repellent agent treatment unit 5 will be described in detail with reference to FIG. 3. FIG. 3 is a side view showing the interior of the liquid-repellent agent treatment unit 5. As shown in FIG. 3, in the liquid-repellent agent treatment unit 5, the spin chuck 13 is a vacuum suction-type chuck. Specifically, the spin chuck 13 includes a spin shaft 131, a spin base 132, and a spin motor 133. The spin shaft 131 extends substantially vertically. The spin base 132 has a substantially circular disk shape and is attached to the upper end of the spin shaft 131. The spin base 132 holds the substrate W in a substantially horizontal position. In the example shown in FIG. 3, the spin base 132 holds the substrate W in a substantially horizontal position by suctioning the backside of the substrate W. The spin motor 133 has a rotation shaft coaxially coupled to the spin shaft 131. The spin motor 133 rotates the substrate W around the rotation axis AX1 of the spin shaft 131 while the substrate W is held by the spin base 132.

The liquid repellent agent treatment unit 5 further includes a heating section 20. Under the control of the control section 21, the heating section 20 heats the outer portion of the substrate W in the radial direction RD from the back surface side of the substrate W. The heating section 20 is disposed further outward in the radial direction RD than the spin chuck 13. The heating section 20 is disposed below the substrate W. Specifically, the heating section 20 is disposed below the outer portion of the substrate W in the radial direction RD. In the example of FIG. 3, the heating section 20 has a substantially annular shape extending around the rotation axis AX1. The heating section 20 is, for example, a heater. The direction along the rotation axis AX1 may be referred to as the axial direction AD. The axial direction AD is perpendicular to the substrate W and substantially parallel to the vertical direction.

Under the control of the control unit 21, the liquid-repellent substance removal mechanism 15 swings the brush 151 horizontally and raises and lowers the brush 151. The liquid-repellent substance removal mechanism 15 moves the brush 151 between a removal position P1 (Figure 2) and a standby position P2 (Figure 2). Details of the brush 151 will be described later.

Specifically, the liquid-repellent substance removal mechanism 15 includes a swing arm 152, a swing mechanism 153, a lifting mechanism 154, and an arm base shaft 155. A brush 151 is attached to the tip of one horizontal side of the swing arm 152. The swing arm 152 swings the brush 151 in a substantially horizontal direction and raises and lowers the brush 151.

More specifically, the swing mechanism 153 swings the swing arm 152 in a substantially horizontal direction around the swing axis AX3 under the control of the control unit 21. More specifically, the upper end of the arm base shaft 155 is connected to the other horizontal side of the swing arm 152. The driving force of the swing mechanism 153 is input to the arm base shaft 155. By inputting the driving force of the swing mechanism 153 to the arm base shaft 155, the arm base shaft 155 is rotated back and forth, causing the swing arm 152 to swing around the arm base shaft 155 as a fulcrum. The swing mechanism 153 includes, for example, a motor.

Furthermore, the lifting mechanism 154 raises and lowers the swing arm 152 under the control of the control unit 21. More specifically, the lifting mechanism 154 is coupled to the arm base shaft 155. The lifting mechanism 154 moves the arm base shaft 155 up and down, thereby moving the swing arm 152 up and down integrally with the arm base shaft 155. The lifting mechanism 154 includes, for example, a ball screw mechanism and a motor that provides driving force to the ball screw mechanism.

Specifically, the swing arm 152 includes an arm body 156, a support shaft 157, and a rotation mechanism 158. The arm body 156 is hollow and extends in a substantially horizontal direction. The arm body 156 is swung in a substantially horizontal direction by the swing mechanism 153. The arm body 156 is raised and lowered by the lifting mechanism 154. The support shaft 157 is located on one horizontal side of the arm body 156 and protrudes in a substantially horizontal direction. The rotation mechanism 158 is supported by the support shaft 157. The brush 151 is attached to the lower end of the rotation mechanism 158.

Under the control of the control unit 21, the rotation mechanism 158 rotates the brush 151 around the rotation axis AX2. In other words, the rotation mechanism 158 rotates the brush 151 on its axis. Specifically, the rotation mechanism 158 includes a brush motor 160, a shaft 161, a first fixed part C1, and a second fixed part C2.

The output shaft of the brush motor 160 is fixed to the shaft portion 161. The shaft portion 161 extends vertically downward. That is, the shaft portion 161 extends downward along the axial direction AD. A first fixed portion C1 and a second fixed portion C2 are attached to the lower portion of the shaft portion 161. The first fixed portion C1 and the second fixed portion C2 fix the brush 151 to the shaft portion 161. By rotating the shaft portion 161, the brush motor 160 rotates the brush 151 together with the first fixed portion C1 and the second fixed portion C2 around the rotation axis AX2. In this embodiment, the rotation axis AX2 is approximately parallel to the rotation axis AX1. Therefore, the axial direction AD relative to the rotation axis AX1 is approximately parallel to the rotation axis AX2. Therefore, the axial direction AD can also be considered the axial direction relative to the rotation axis AX2.

The swing arm 152 also includes a biasing mechanism 159. Under the control of the control unit 21, the biasing mechanism 159 biases the brush 151 inward in the radial direction RD of the substrate W via the support shaft 157 and the rotation mechanism 158. Specifically, the biasing mechanism 159 maintains the pressing pressure of the brush 151 in the radial direction RD against the edge surface 51 of the substrate W at a preset pressing pressure. The pressing pressure is the pressure when pressing the brush 151 against the edge surface 51 in the radial direction RD. For example, the biasing mechanism 159 biases the brush 151 inward in the radial direction RD of the substrate W by driving the support shaft 157 along the radial direction RD using an air cylinder.

In addition to the liquid-repellent agent nozzle 311 and arm 312, the liquid-repellent agent application unit 31 further includes a rotating shaft 313, a nozzle movement mechanism 314, a valve 315, and a pipe 316. The pipe 316 is connected to the liquid-repellent agent nozzle 311. The pipe 316 supplies the liquid-repellent agent to the liquid-repellent agent nozzle 311. A valve 315 is disposed on the pipe 316. The valve 315 closes or opens the flow path of the pipe 316. The control unit 21 controls the valve 315 so that the valve 315 opens the flow path of the pipe 316. As a result, the valve 315 opens the flow path of the pipe 316, and the liquid-repellent agent nozzle 311 ejects the liquid-repellent agent toward the edge surface 51 of the substrate W.

The nozzle movement mechanism 314 moves the liquid repellent agent nozzle 311 between the application position P3 (Figure 2) and the standby position P4 (Figure 2) via the arm 312 and the pivot shaft 313.

Specifically, the arm 312 extends in a substantially horizontal direction. The liquid repellent nozzle 311 is attached to the tip of the arm 312. The arm 312 is connected to a pivot shaft 313. The pivot shaft 313 extends in a substantially vertical direction. The nozzle movement mechanism 314 rotates the pivot shaft 313 around a pivot axis that extends in a substantially vertical direction, causing the arm 312 to rotate along a substantially horizontal plane. As a result, the liquid repellent nozzle 311 moves along the substantially horizontal plane. For example, the nozzle movement mechanism 314 includes an arm swing motor that rotates the pivot shaft 313 around the pivot axis. The arm swing motor is, for example, a servo motor. Furthermore, the nozzle movement mechanism 314 raises and lowers the pivot shaft 313 in a substantially vertical direction, raising and lowering the arm 312. As a result, the liquid repellent nozzle 311 moves in a substantially vertical direction. For example, the nozzle movement mechanism 314 includes a ball screw mechanism and an arm lift motor that provides driving force to the ball screw mechanism. The arm lift motor is, for example, a servo motor.

In addition to the rinse liquid nozzle 331, the rinse liquid supply unit 33 further includes a valve 332 and a pipe 333. The pipe 333 is connected to the rinse liquid nozzle 331. The pipe 333 supplies rinse liquid to the rinse liquid nozzle 331. A valve 332 is disposed on the pipe 333. The valve 332 closes or opens the flow path of the pipe 333. The control unit 21 controls the valve 332 so that the valve 332 opens the flow path of the pipe 333. As a result, the valve 332 opens the flow path of the pipe 333, and the rinse liquid nozzle 331 ejects rinse liquid toward the outer portion (including the edge surface portion 51) of the substrate W in the radial direction RD.

Next, the substrate W will be described in detail with reference to Figures 4 and 5. Figure 4 is a cross-sectional view of the substrate W. Figure 4 shows an enlarged cross-section of the outer portion of the substrate W in the radial direction RD. Figure 5 is a plan view of a portion of the substrate W. Figure 5 shows an enlarged view of the surface A1 of the outer portion of the substrate W in the radial direction RD.

As shown in Figures 4 and 5, the substrate W has a main body 50 (hereinafter referred to as "substrate main body 50") and an edge surface 51. The substrate main body 50 refers to the portion of the substrate W excluding the edge surface 51. In other words, the substrate main body 50 refers to the portion of the substrate W that is radially inward from the edge surface 51. In other words, the substrate main body 50 refers to the substantially flat portion of the substrate W along the radial direction RD. A pattern is formed on the substrate main body 50. For example, the pattern is formed on the substrate main body 50 on the front surface A1 side of the substrate W. Note that, for example, the pattern may also be formed on the substrate main body 50 on the back surface A2 side of the substrate W. The substrate main body 50 has a substantially circular disk shape. Note that in Figure 5, the boundary between the substrate main body 50 and the edge surface 51 is indicated by a dashed line for ease of understanding.

Specifically, the substrate body 50 includes a body front peripheral portion 501 and a body back peripheral portion 502. The body front peripheral portion 501 refers to the peripheral region of the front surface A1 of the substrate body 50. The body back peripheral portion 502 refers to the peripheral region of the back surface A2 of the substrate body 50. The body front peripheral portion 501 and the body back peripheral portion 502 are each a substantially annular region around the rotation axis AX1 (Figure 2). The width in the radial direction RD of each of the body front peripheral portion 501 and the body back peripheral portion 502 is, for example, 1 mm or more and 4 mm or less.

The edge surface portion 51 refers to the portion of the substrate W that is radially outward in the RD direction from the substrate body 50. In other words, the edge surface portion 51 refers to the edge surface region of the substrate W that is radially outward in the RD direction from the substrate body 50. In yet other words, the edge surface portion 51 refers to the edge surface region of the substrate W that is radially outward in the RD direction from the body front surface peripheral portion 501 and the body back surface peripheral portion 502. The edge surface portion 51 has a front surface edge portion 511, a front surface shoulder portion 512, a side portion 515, a back surface shoulder portion 514, and a back surface edge portion 513.

The front surface edge portion 511 is a region of the end surface portion 51 on the front surface A1 side of the substrate W, which is located radially outward from the substrate body 50 in the radial direction RD, and is located radially inward from the side surface portion 515 on the rear surface A2 side of the substrate W.

The surface edge 511 is a substantially annular region around the rotation axis AX1 (Figure 2). In a plan view, the surface edge 511 surrounds the substrate body 50 (specifically, the body surface peripheral portion 501) in the circumferential direction CD. In a cross-sectional view, the surface edge 511 includes an inclined surface that is inclined relative to the surface A1 of the substrate body 50 from the body surface peripheral portion 501 toward the surface shoulder 512. The surface edge 511 has an inclination angle θ1 relative to the body surface peripheral portion 501. The surface edge 511 connects the body surface peripheral portion 501 and the surface shoulder 512.

The surface shoulder 512 is a region of the end surface 51 on the surface A1 side that is located radially outward from the surface edge 511 and radially inward from the side surface 515.

The surface shoulder 512 is a substantially annular region around the rotation axis AX1 (Figure 2). In a plan view, the surface shoulder 512 surrounds the surface edge 511 in the circumferential direction CD. In a cross-sectional view, the surface shoulder 512 includes a curved surface that curves from the surface edge 511 toward the side surface 515. The surface shoulder 512 connects the surface edge 511 and the side surface 515.

The rear surface edge portion 513 is a region of the end surface portion 51 on the rear surface A2 side that is located radially outward from the substrate body 50 in the radial direction RD and is located radially inward from the side surface portion 515.

The back surface edge 513 is a substantially annular region around the rotation axis AX1 (Figure 2). In a plan view, the back surface edge 513 surrounds the substrate main body 50 (specifically, the main body back surface peripheral edge 502) in the circumferential direction CD. In a cross-sectional view, the back surface edge 513 includes an inclined surface that is inclined relative to the back surface A2 of the substrate main body 50 from the main body back surface peripheral edge 502 toward the back surface shoulder 514. The back surface edge 513 has an inclination angle θ2 relative to the main body back surface peripheral edge 502. For example, the inclination angle θ2 is substantially the same as the inclination angle θ1. The back surface edge 513 connects the main body back surface peripheral edge 502 and the back surface shoulder 514.

The back surface shoulder 514 is a region of the end surface 51 on the back surface A2 side that is located radially outward from the back surface edge 513 and radially inward from the side surface 515.

The back surface shoulder 514 is a substantially annular region around the rotation axis AX1 ( FIG. 2 ). In a plan view, the back surface shoulder 514 surrounds the back surface edge 513 in the circumferential direction CD. In a cross-sectional view, the back surface shoulder 514 includes a curved surface that curves from the back surface edge 513 toward the side surface 515. The back surface shoulder 514 connects the back surface edge 513 and the side surface 515.

The side portion 515 is located at the outermost position in the radial direction RD of the substrate W. The side portion 515 is a substantially annular region around the rotation axis AX1 (Figure 2). In a plan view, the side portion 515 surrounds the front surface shoulder 512 and the back surface shoulder 514 in the circumferential direction CD. In a cross-sectional view, the side portion 515 includes a flat surface extending from the front surface shoulder 512 toward the back surface shoulder 514. The side portion 515 has a substantially cylindrical shape around the rotation axis AX1. The side portion 515 connects the front surface shoulder 512 and the back surface shoulder 514.

Here, as shown in FIG. 4, for example, the thickness d of the substrate W in the axial direction AD is 765 μm. Also, for example, the radius of curvature of the front surface shoulder 512 is 270 μm, the length L0 in the axial direction AD of the side surface 515 is 228 μm, and the radius of curvature of the back surface shoulder 514 is 238 μm. Also, for example, the length L1 is 314 μm, and the length L2 is 323 μm. Length L1 indicates the distance along the radial direction RD from the radially inner end of the front surface edge 511 to the radially outer end (side surface 515) of the front surface shoulder 512. Length L2 indicates the distance along the radial direction RD from the radially inner end of the back surface edge 513 to the radially outer end (side surface 515) of the back surface shoulder 514. Furthermore, for example, the inclination angle θ1 of the front edge 511 is 22.3 degrees, and the inclination angle θ2 of the back edge 513 is 23.3 degrees.

Note that in Figures 6 to 11 and 16 to 19 shown below, the front shoulder 512 and back shoulder 514 are simplified and shown as straight lines.

Next, the liquid-repellent substance removal method according to this embodiment will be described with reference to Figures 6 and 7. The liquid-repellent substance removal method constitutes part of the substrate processing method according to this embodiment. Figures 6 and 7 are diagrams illustrating the liquid-repellent substance removal method according to this embodiment. To make the drawings easier to understand, Figures 6 and 7 show a side view of the brush 151 and a cross section of the substrate W.

As shown in Figures 6 and 7, the liquid-repellent substance removal method includes steps S100, S200, S300, S400, and S500.

First, as shown in FIG. 6 , in step S100, the remover nozzle 171 sprays the remover 87 toward the rotating brush 151 at standby position P2. As a result, the brush 151 is impregnated with the remover 87. In particular, in step S100, the rotation mechanism 158 ( FIG. 3 ) rotates the brush 151, allowing the remover 87 to evenly permeate the brush 151. In FIG. 6 , the remover nozzle 171 sprays the remover 87 in a direction intersecting the rotation axis AX2. Specifically, the remover nozzle 171 sprays the remover 87 in a direction approximately perpendicular to the rotation axis AX2. Furthermore, the swing arm 152 ( FIG. 3 ) moves (raises and lowers) the brush 151 along the axial direction AD. Therefore, even when the remover nozzle 171 is fixed, the remover 87 can be sprayed onto the entire brush 151. As a result, the entire brush 151 can be effectively impregnated with the remover. The remover nozzle 171 may be movable (raised and lowered) using a mechanism similar to the nozzle movement mechanism 314.

Next, in step S200, at application position P3, the liquid-repellent agent nozzle 311 applies the liquid-repellent agent 81 to the edge surface 51 of the rotating substrate W by discharging the liquid-repellent agent 81 onto the edge surface 51 of the substrate W. In this case, because the liquid-repellent agent 81 is discharged toward the substrate W, the liquid-repellent agent 81 adheres not only to the edge surface 51 but also to the peripheral edge 501 of the main body surface. The liquid-repellent agent 81 may also find its way around to the peripheral edge 502 of the main body back surface.

Next, in step S300, the heating unit 20 heats the outer radial direction RD portion of the rotating substrate W from below, thereby drying the liquid-repellent agent 81 applied in step S200. As a result, the solvent evaporates from the liquid-repellent agent 81, and the liquid-repellent substance 82 adheres to the edge surface 51, the main body front surface peripheral portion 501, and the main body back surface peripheral portion 502 of the substrate W. In other words, the liquid-repellent agent 81 dries, and the liquid-repellent substance 82 in the liquid-repellent agent 81 adheres to the edge surface 51, the main body front surface peripheral portion 501, and the main body back surface peripheral portion 502 of the substrate W.

7, in step S400, at removal position P1, the brush 151 contacts the main body front surface peripheral portion 501, front surface edge portion 511, back surface edge portion 513, and main body back surface peripheral portion 502 of the rotating substrate W while moving away from the side portion 515, front surface shoulder portion 512, and back surface shoulder portion 514 of the rotating substrate W, thereby bringing the remover 87 into contact with the liquid-repellent substance 82 (step S300) attached to the main body front surface peripheral portion 501, front surface edge portion 511, back surface edge portion 513, and main body back surface peripheral portion 502. As a result, the liquid-repellent substance 82 attached to the main body front surface peripheral portion 501, front surface edge portion 511, back surface edge portion 513, and main body back surface peripheral portion 502 is removed by the remover 87, while the liquid-repellent substance 82 remains on the side portion 515, front surface shoulder portion 512, and back surface shoulder portion 514. In other words, while the liquid-repellent substance 82 remains on the side surface 515, front surface shoulder 512, and back surface shoulder 514, the liquid-repellent substance 82 adhering to the main body front surface peripheral portion 501, front surface peripheral portion 511, back surface peripheral portion 513, and main body back surface peripheral portion 502 is separated from the main body front surface peripheral portion 501, front surface peripheral portion 511, back surface peripheral portion 513, and main body back surface peripheral portion 502. As a result, according to this embodiment, only the excess liquid-repellent substance 82 can be removed (separated) from the substrate W.

Preferably, in step S400, the rotation mechanism 158 (Figure 3) rotates the brush 151. In this case, the brush 151 rotates on its axis while being spaced apart from the side surface 515, front surface shoulder 512, and back surface shoulder 514 of the rotating substrate W, and contacts the main body front surface peripheral portion 501, front surface edge 511, back surface edge 513, and main body back surface peripheral portion 502 of the rotating substrate W. As a result, according to this embodiment, excess liquid-repellent substance 82 can be more effectively removed (separated) from the substrate W.

In the example of Figure 7, the rotation direction of the substrate W and the rotation direction of the brush 151 are opposite at the contact position between the substrate W and the brush 151. Therefore, excess liquid-repellent substance 82 can be more reliably removed (separated) from the substrate W. Note that the rotation direction of the substrate W and the rotation direction of the brush 151 may be the same at the contact position between the substrate W and the brush 151.

Next, in step S500, the rinse liquid nozzle 331 ejects rinse liquid 86 onto the rotating substrate W, thereby washing away excess liquid-repellent material 82 that has been separated from the substrate W. The rotation of the substrate W then dries the rinse liquid adhering to the substrate W.

For example, the rinse liquid nozzle 331 ejects the rinse liquid 86 onto the main body front surface peripheral portion 501 and the edge surface portion 51. The rinse liquid nozzle 331 may also eject the rinse liquid 86 onto the entire front surface A1 of the substrate W. Furthermore, the rinse liquid may be ejected not only from the front surface A1 of the substrate W but also from the back surface A2 of the substrate W.

For example, after step S500, the substrate W having the liquid-repellent substance 82 attached to the side surface 515, front surface shoulder 512, and back surface shoulder 514 is loaded into the processing unit 1 (Figure 1). Then, the back surface nozzle 8 (Figure 1) ejects the processing liquid onto the back surface A2 of the substrate W. In this case, the liquid-repellent substance 82 attached to the side surface 515, front surface shoulder 512, and back surface shoulder 514 of the substrate W repels the processing liquid, thereby preventing the processing liquid from flowing from the back surface A2 to the front surface A1 of the substrate W. As a result, the pattern formed on the front surface A1 of the substrate W can be prevented from being affected by the processing liquid ejected onto the back surface A2.

Here, the liquid-repellent substance 82 attached to the side surface 515, front surface shoulder 512, and back surface shoulder 514 of the substrate W is a polymer compound. Therefore, there is no need to remove the liquid-repellent substance 82, because the liquid-repellent substance 82 is only present on the side surface 515, front surface shoulder 512, and back surface shoulder 514.

Step S400 has been described above with reference to Figure 7 as an example of a process for contacting a remover with a liquid-repellent substance. However, the following variations are also possible.

That is, the spin chuck 13 (FIG. 3) holds and rotates the substrate W having the liquid-repellent substance attached at least to the peripheral surface portion 501 and the edge surface portion 51. While the substrate W is rotating, the brush 151 contacts at least the peripheral surface portion 501 of the substrate W while being spaced apart from the side surface portion 515 in the radial direction RD of the edge surface portion 51 of the substrate W, thereby bringing a remover capable of removing the liquid-repellent substance into contact with the liquid-repellent substance attached to the peripheral surface portion 501. As a result, the liquid-repellent substance 82 attached to at least the peripheral surface portion 501 of the substrate W is removed by the remover 87, while leaving the liquid-repellent substance 82 on the side surface portion 515. In other words, the liquid-repellent substance 82 attached to at least the peripheral surface portion 501 of the substrate W is separated from the peripheral surface portion 501 of the substrate W, while leaving the liquid-repellent substance 82 on the side surface portion 515. As a result, according to this embodiment, only the excess liquid-repellent substance 82 can be removed (separated) from the substrate W.

Preferably, the brush 151 contacts at least the peripheral surface portion 501 of the main body while rotating and spaced apart from the side surface portion 515 of the substrate W. In this case, the liquid-repellent substance 82 can be more effectively removed (separated) from at least the peripheral surface portion 501 of the main body.

In some cases, a liquid-repellent substance may be attached to the rear surface peripheral portion 502. In this case, the spin chuck 13 rotates the substrate W while holding it, with the liquid-repellent substance attached to the front surface peripheral portion 501, rear surface peripheral portion 502, and end surface portion 51. While the substrate W is rotating, the brush 151 contacts at least the front surface peripheral portion 501 and rear surface peripheral portion 502 of the substrate W while spaced apart from the side surface portion 515 of the substrate W, thereby bringing the remover into contact with the liquid-repellent substance attached to the front surface peripheral portion 501 and rear surface peripheral portion 502. As a result, the liquid-repellent substance 82 attached to at least the front surface peripheral portion 501 and rear surface peripheral portion 502 is removed by the remover 87, while leaving the liquid-repellent substance 82 on the side surface portion 515. In other words, only the excess liquid-repellent substance 82 can be removed (separated) from the substrate W.

Preferably, the brush 151 rotates and contacts at least the main body front surface peripheral portion 501 and the main body back surface peripheral portion 502 while being spaced apart from the side surface portion 515 of the substrate W. In this case, the liquid-repellent substance 82 can be more effectively removed (separated) from at least the main body front surface peripheral portion 501 and the main body back surface peripheral portion 502.

Next, the brush 151 will be described in detail with reference to Figure 8. Figure 8 is a side view showing the brush 151. As shown in Figure 8, the brush 151 includes a first contact portion B1 and a second contact portion B2. The first contact portion B1 and the second contact portion B2 are arranged at a distance in a fixed direction. In the example of Figure 8, the first contact portion B1 and the second contact portion B2 are arranged at a distance in the axial direction AD.

The first contact portion B1 includes a first outer contact portion B11 and a first inner contact portion B12. The first outer contact portion B11 has a generally cylindrical or circular plate shape. The first outer contact portion B11 has a first fitting portion 55. The first fitting portion 55 includes a generally cylindrical or circular plate-shaped space. The first outer contact portion B11 includes a flat surface B14. The flat surface B14 has a generally annular shape around the rotation axis AX2. The flat surface B14 is the lower end surface of the first outer contact portion B11.

The first fixed portion C1 is fixed to the upper surface of the first outer contact portion B11. The first fixed portion C1 is also fixed to the shaft portion 161.

The first inner contact portion B12 is positioned inside the first outer contact portion B11. The first inner contact portion B12 has a first non-contact portion 41 and a first inclined contact portion 43. The first non-contact portion 41 has a generally cylindrical or circular plate shape. The first non-contact portion 41 is fitted into the first fitting portion 55 and fixed inside the first outer contact portion B11. The first inclined contact portion 43 has a generally inverted truncated cone shape. The first inclined contact portion 43 protrudes from the first outer contact portion B11 toward the second contact portion B2. The first inclined contact portion 43 has an inclined surface B13. The inclined surface B13 is inclined with respect to the flat surface B14. The inclination angle θ1 of the inclined surface B13 is generally the same as the inclination angle θ1 of the surface edge portion 511 (Figure 4). Inclined surface B13 is a substantially inverted truncated cone surface.

The second contact portion B2 includes a second outer contact portion B21 and a second inner contact portion B22. The second outer contact portion B21 has a generally cylindrical or circular plate shape. The second outer contact portion B21 has a second fitting portion 56. The second fitting portion 56 includes a generally cylindrical or circular plate-shaped space. The second outer contact portion B21 includes a flat surface B24. The flat surface B24 has a generally annular shape around the rotation axis AX2. The flat surface B24 is the upper end surface of the second outer contact portion B21.

The second fixed portion C2 is fixed to the underside of the second outer contact portion B21. The second fixed portion C2 is also fixed to the shaft portion 161.

The second inner contact portion B22 is disposed inside the second outer contact portion B21. The second inner contact portion B22 has a second non-contact portion 42 and a second inclined contact portion 44. The second non-contact portion 42 has a generally cylindrical or circular plate shape. The second non-contact portion 42 is fitted into the second fitting portion 56 and fixed inside the second outer contact portion B21. The second inclined contact portion 44 has a generally truncated cone shape. The second inclined contact portion 44 protrudes from the second outer contact portion B21 toward the first contact portion B1. The second inclined contact portion 44 has an inclined surface B23. The inclined surface B23 is inclined with respect to the flat surface B24. The inclination angle θ2 of the inclined surface B23 with respect to the flat surface B24. The inclination angle θ1 of the inclined surface B23 is generally the same as the inclination angle θ2 of the surface edge portion 511 ( FIG. 4 ). The inclined surface B23 is a substantially truncated cone surface.

The flat surface B14 of the first outer contact portion B11 and the flat surface B24 of the second outer contact portion B21 face each other with a gap in the axial direction AD. Furthermore, the inclined surface B13 of the first inner contact portion B12 and the inclined surface B23 of the second inner contact portion B22 face each other with a gap in the axial direction AD. In this embodiment, the first contact portion B1 and the second contact portion B2 are symmetrical with respect to an imaginary plane PL. The imaginary plane PL is an imaginary plane perpendicular to the rotation axis AX2 and passes through the midpoint of the axial direction AD of the opposing shaft portion 161a. Furthermore, in this embodiment, the inclination angle θ1 and the inclination angle θ2 are approximately the same.

The first outer contact portion B11 and the first inner contact portion B12 may be integrally formed. The second outer contact portion B21 and the second inner contact portion B22 may be integrally formed.

The liquid repellent treatment unit 5 (Figure 3) also includes an inert gas supply unit 35. The inert gas supply unit 35 supplies an inert gas from between the first contact portion B1 and the second contact portion B2. The inert gas is, for example, nitrogen or argon. Specifically, the inert gas supply unit 35 includes an inert gas discharge unit 353, a pipe 352, and a valve 351. The inert gas discharge unit 353 discharges an inert gas from between the first contact portion B1 and the second contact portion B2 toward the outside of the shaft portion 161. The inert gas discharge unit 353 is, for example, a nozzle.

Specifically, a pipe 352 is connected to the inert gas discharge unit 353. The pipe 352 supplies the inert gas to the inert gas discharge unit 353. A valve 351 is disposed in the pipe 352. The valve 351 closes or opens the flow path of the pipe 352. The control unit 21 controls the valve 351 so that the valve 351 opens the flow path of the pipe 352. As a result, the valve 351 opens the flow path of the pipe 352, and the inert gas discharge unit 353 discharges the inert gas.

More specifically, the inert gas discharge portion 353 is disposed on the opposing shaft portion 161a. The opposing shaft portion 161a is the portion of the shaft portion 161 located between the first contact portion B1 and the second contact portion B2. The shaft portion 161, for example, penetrates the first contact portion B1 and the second contact portion B2 in the axial direction AD.

Next, an example of the process of removing the liquid-repellent substance 82 using the brush 151 will be described with reference to Figure 9. Figure 9 is a diagram showing an example of the process of removing the liquid-repellent substance using the brush 151. To make the drawing easier to understand, Figure 9 shows a side view of the brush 151 and a cross section of the substrate W. Also, to simplify the drawing, the diagonal lines indicating the cross section have been omitted.

As shown in FIG. 9 , while the substrate W is rotating, the first contact portion B1 contacts at least the main body surface peripheral portion 501 of the substrate W while being spaced apart from the side portion 515 of the substrate W, thereby bringing the remover into contact with the liquid-repellent substance adhering to the main body surface peripheral portion 501. In other words, the remover impregnated in the first contact portion B1 is transferred to the main body surface peripheral portion 501 and the liquid-repellent substance. Therefore, the liquid-repellent substance 82 can be removed (separated) from the main body surface peripheral portion 501 by the remover, while leaving the liquid-repellent substance 82 on the side portion 515.

Meanwhile, while the substrate W is rotating, the second contact portion B2 contacts at least the rear surface peripheral portion 502 of the substrate W while being spaced apart from the side portion 515 of the substrate W, thereby bringing the remover into contact with the liquid-repellent substance adhering to the rear surface peripheral portion 502. In other words, the remover impregnated in the second contact portion B2 is transferred to the rear surface peripheral portion 502 and the liquid-repellent substance. Therefore, the liquid-repellent substance 82 can be removed (separated) from the rear surface peripheral portion 502 by the remover, while leaving the liquid-repellent substance 82 on the side portion 515.

Specifically, the first outer contact portion B11 comes into contact with the main body surface peripheral portion 501 while the substrate W is rotating, thereby bringing the remover into contact with the liquid-repellent substance adhering to the main body surface peripheral portion 501. In other words, the remover impregnated in the first outer contact portion B11 is transferred to the main body surface peripheral portion 501 and the liquid-repellent substance. Therefore, the remover can effectively remove (separate) the liquid-repellent substance from the main body surface peripheral portion 501.

Furthermore, while the substrate W is rotating, the first inner contact portion B12 comes into contact with the surface edge portion 511 at the edge surface 51 of the substrate W, thereby bringing the remover into contact with the liquid-repellent substance adhering to the surface edge portion 511. In other words, the remover impregnated in the first inner contact portion B12 is transferred to the surface edge portion 511 and the liquid-repellent substance. Therefore, the remover can effectively remove (separate) the liquid-repellent substance from the surface edge portion 511.

On the other hand, the second outer contact portion B21 contacts the rear surface peripheral portion 502 of the substrate W while the substrate W is rotating, thereby bringing the remover into contact with the liquid-repellent substance adhered to the rear surface peripheral portion 502. In other words, the remover impregnated in the second outer contact portion B21 is transferred to the rear surface peripheral portion 502 and the liquid-repellent substance. Therefore, the remover can effectively remove (separate) the liquid-repellent substance from the rear surface peripheral portion 502.

Furthermore, while the substrate W is rotating, the second inner contact portion B22 comes into contact with the rear surface edge portion 513 at the edge surface 51 of the substrate W, thereby bringing the remover into contact with the liquid-repellent substance adhering to the rear surface edge portion 513. In other words, the remover impregnated in the second inner contact portion B22 is transferred to the rear surface edge portion 513 and the liquid-repellent substance. Therefore, the remover can effectively remove (separate) the liquid-repellent substance from the rear surface edge portion 513.

More specifically, the flat surface B14 of the first outer contact portion B11 contacts the main body surface peripheral portion 501. Therefore, the remover liquid impregnated in the first outer contact portion B11 comes into contact with the liquid-repellent substance adhered to the main body surface peripheral portion 501 via the flat surface B14. The liquid-repellent substance adhered to the main body surface peripheral portion 501 is then polished away by, for example, the remover liquid and the flat surface B14, and separated from the main body surface peripheral portion 501. In this way, the liquid-repellent substance can be more effectively removed from the main body surface peripheral portion 501.

Furthermore, the inclined surface B13 of the first inner contact portion B12 contacts the surface edge portion 511. Therefore, the remover impregnated in the first inner contact portion B12 contacts the liquid-repellent substance adhered to the surface edge portion 511 via the inclined surface B13. The liquid-repellent substance adhered to the surface edge portion 511 is then polished away from the surface edge portion 511 by, for example, the remover and the inclined surface B13. In this way, the liquid-repellent substance can be more effectively removed from the surface edge portion 511. The inclined surface B13 is inclined along the surface edge portion 511.

On the other hand, the flat surface B24 of the second outer contact portion B21 contacts the rear peripheral portion 502 of the main body. Therefore, the remover liquid impregnated in the second outer contact portion B21 comes into contact with the liquid-repellent substance adhered to the rear peripheral portion 502 of the main body via the flat surface B24. The liquid-repellent substance adhered to the rear peripheral portion 502 of the main body is then polished away by, for example, the remover liquid and the flat surface B24, and separated from the rear peripheral portion 502 of the main body. In this way, the liquid-repellent substance can be more effectively removed from the rear peripheral portion 502 of the main body.

Furthermore, the inclined surface B23 of the second inner contact portion B22 contacts the rear surface edge portion 513. Therefore, the remover liquid impregnated in the second inner contact portion B22 comes into contact with the liquid-repellent substance adhered to the rear surface edge portion 513 via the inclined surface B23. The liquid-repellent substance adhered to the rear surface edge portion 513 is then polished away from the rear surface edge portion 513, for example, by the remover liquid and the inclined surface B23. In this way, the liquid-repellent substance can be more effectively removed from the rear surface edge portion 513. The inclined surface B23 is inclined along the rear surface edge portion 513.

As a result of performing the removal process described above with reference to Figure 9, the liquid-repellent substance is removed from the main body front surface peripheral portion 501, front surface edge portion 511, back surface edge portion 513, and main body back surface peripheral portion 502 of the substrate W, while the liquid-repellent substance 82 can be left on the front surface shoulder portion 512, side portion 515, and back surface shoulder portion 514 of the end surface portion 51 of the substrate W.

The opposing shaft 161a faces the liquid-repellent substance 82 adhering to the edge surface 51 of the substrate W at a distance in the radial direction RDa. The radial direction RDa indicates a radial direction relative to the rotation axis AX2 and is perpendicular to the rotation axis AX2. The inert gas ejection unit 353 ejects inert gas from the opposing shaft 161a outward in the radial direction RDa. As a result, the liquid-repellent substance 82 is exposed to the inert gas, preventing oxidation of the liquid-repellent substance 82.

The first inner contact portion B12 (specifically, the inclined surface B13) may contact the front surface edge portion 511 and the front surface shoulder portion 512 at the edge portion 51 of the substrate W during rotation, thereby bringing the remover into contact with the liquid-repellent substance adhering to the front surface edge portion 511 and the front surface shoulder portion 512. In this case, the liquid-repellent substance can be effectively removed (separated) from the front surface edge portion 511 and the front surface shoulder portion 512 by the remover. On the other hand, the second inner contact portion B22 (specifically, the inclined surface B23) may contact the back surface edge portion 513 and the back surface shoulder portion 514 at the edge portion 51 of the substrate W during rotation, thereby bringing the remover into contact with the liquid-repellent substance adhering to the back surface edge portion 513 and the back surface shoulder portion 514. In this case, the liquid-repellent substance can be effectively removed (separated) from the back surface edge portion 513 and the back surface shoulder portion 514 by the remover.

In this case, for example, the control unit 21 adjusts the biasing force (pressure) of the biasing mechanism 159 (Figure 3) to elastically deform the first inner contact portion B12 and second inner contact portion B22 of the brush 151, thereby bringing the first inner contact portion B12 of the brush 151 into contact with the front edge portion 511 and front shoulder portion 512, and bringing the second inner contact portion B22 of the brush 151 into contact with the back edge portion 513 and back shoulder portion 514.

Next, with reference to Figure 10, an example of the process of removing the liquid-repellent substance 82 using a brush 151A according to a modified example will be described. Figure 10 is a diagram showing an example of the process of removing the liquid-repellent substance using the brush 151A. To make the drawing easier to understand, Figure 10 shows a side view of the brush 151A and a cross section of the substrate W. Also, to simplify the drawing, the diagonal lines indicating the cross section have been omitted.

As shown in FIG. 10, the first contact portion B1 includes a first inner contact portion B12a. The inclined surface B13 of the first inner contact portion B12a contacts the upper region a1 of the surface edge portion 511, but does not contact the lower region b1 of the surface edge portion 511. Therefore, only the liquid-repellent substance adhering to the upper region a1 is removed, and the liquid-repellent substance adhering to the lower region b1 remains.

Meanwhile, the second contact portion B2 includes a second inner contact portion B22a. The inclined surface B23 of the second inner contact portion B22a contacts the lower region a2 of the rear surface edge portion 513 but does not contact the upper region b2 of the rear surface edge portion 513. Therefore, only the liquid-repellent substance adhering to the lower region a2 is removed, and the liquid-repellent substance adhering to the upper region b2 remains.

As a result of performing the removal process described above with reference to Figure 10, the liquid-repellent substance is removed from the substrate W's main surface peripheral edge 501, the upper region a1 of the surface edge 511, the lower region a2 of the back surface edge 513, and the main body back surface peripheral edge 502, while the liquid-repellent substance 82 remains in the lower region b1 of the surface edge 511, the surface shoulder 512, the side surface 515, the back surface shoulder 514, and the upper region b2 of the back surface edge 513 of the substrate W's end surface 51.

The first outer contact portion B11 and the first inner contact portion B12a may be integrally formed. The second outer contact portion B21 and the second inner contact portion B22a may be integrally formed.

Next, with reference to Figure 11, an example of the process of removing the liquid-repellent substance 82 using a brush 151B according to another modified example will be described. Figure 11 is a diagram showing an example of the process of removing the liquid-repellent substance using a brush 151B. To make the drawing easier to understand, Figure 11 shows a side view of the brush 151B and a cross section of the substrate W. Also, to simplify the drawing, the diagonal lines indicating the cross section have been omitted.

As shown in FIG. 11, the first contact portion B1 has a first outer contact portion B11, but does not have a first inner contact portion B12 (FIG. 9). In other words, the configuration of the first contact portion B1 is the same as the configuration of the first outer contact portion B11. In this case, the first contact portion B1 does not need to have the first fitting portion 55 (FIG. 9). The flat surface B14 of the first contact portion B1 contacts the main body surface peripheral portion 501 while being spaced apart from the edge portion 51 of the substrate W. Therefore, only the liquid-repellent substance adhering to the main body surface peripheral portion 501 is removed.

On the other hand, the second contact portion B2 has a second outer contact portion B21 but does not have a second inner contact portion B22 ( FIG. 9 ). In other words, the configuration of the second contact portion B2 is the same as the configuration of the second outer contact portion B21. In this case, the second contact portion B2 does not need to have the second fitting portion 56 ( FIG. 9 ). The flat surface B24 of the second contact portion B2 contacts the rear surface peripheral portion 502 of the main body while being spaced apart from the edge portion 51 of the substrate W. Therefore, only the liquid-repellent substance adhering to the rear surface peripheral portion 502 of the main body is removed.

As a result of performing the removal process described above with reference to Figure 11, the liquid-repellent substance 82 can be left on the entire edge portion 51 of the substrate W while being removed from the front surface peripheral portion 501 and the back surface peripheral portion 502 of the substrate W.

Next, a substrate processing method according to this embodiment will be described with reference to FIGS. 1 to 3 and 12. The substrate processing method uses a brush 151 that brings a remover capable of removing the liquid-repellent substance into contact with the liquid-repellent substance. The substrate processing method includes a liquid-repellent substance removal method. FIG. 12 is a flowchart showing the substrate processing method according to this embodiment. As shown in FIG. 12, the substrate processing method includes steps S1 to S13. Steps S1 to S13 are performed by the substrate processing apparatus 100.

First, as shown in FIGS. 2 , 3 , and 12 , in step S1, the remover supplying unit 17 supplies remover to the brush 151 while rotating the brush 151, which is located at the standby position P2. Specifically, the control unit 21 controls the rotation mechanism 158 so that the brush 151 rotates on its axis. As a result, the rotation mechanism 158 rotates the brush 151 on its axis. Furthermore, the control unit 21 controls the remover supplying unit 17 so that the remover is supplied to the brush 151. As a result, the remover supplying unit 17 supplies remover to the brush 151. Note that the rotation of the brush 151 and the supply of remover may be performed simultaneously, or the rotation may occur first and the supply of remover may occur later, or the rotation may occur later and the supply of remover may occur first. Note that when the supply of remover to the brush 151 is completed, the rotation mechanism 158 stops the rotation of the brush 151.

1 and 12 , in step S2, the control unit 21 controls the center robot CR to load the substrate W into the liquid-repellent agent treatment unit 5. As a result, the center robot CR loads the substrate W into the liquid-repellent agent treatment unit 5 and holds the substrate W on the spin chuck 13.

2, 3, and 12 , in step S3, the controller 21 controls the spin chuck 13 to rotate the substrate W. As a result, the spin chuck 13 rotates the substrate W.

Next, in step S4, the liquid-repellent agent applicator 31 discharges the liquid-repellent agent toward the edge surface 51 of the rotating substrate W at application position P3. Specifically, the controller 21 controls the valve 315 so that the liquid-repellent agent nozzle 311 discharges the liquid-repellent agent toward the edge surface 51 of the rotating substrate W. As a result, the valve 315 opens the flow path of the piping 316, causing the liquid-repellent agent nozzle 311 to discharge the liquid-repellent agent toward the edge surface 51 of the substrate W. Thus, the liquid-repellent agent is applied to the edge surface 51 of the substrate W. However, because the liquid-repellent agent is applied by the liquid-repellent agent nozzle 311, the liquid-repellent agent is also applied to the main body front surface peripheral portion 501 and the main body back surface peripheral portion 502 of the substrate W. When application of the liquid-repellent agent is completed, the liquid-repellent agent nozzle 311 stops discharging the liquid-repellent agent.

Next, in step S5, the spin chuck 13 holds and rotates the substrate W having the liquid-repellent substance adhered to at least the main body front surface peripheral portion 501 and the edge surface 51. Typically, the spin chuck 13 holds and rotates the substrate W having the liquid-repellent substance adhered to the main body front surface peripheral portion 501, the main body back surface peripheral portion 502, and the edge surface 51. The rotation of the substrate W continues from step S3. The heating unit 20 then heats the outer portion of the substrate W in the radial direction RD from below. Specifically, the control unit 21 controls the heating unit 20 to heat the substrate W. As a result, the heating unit 20 heats the substrate W and dries the liquid-repellent agent applied to the substrate W by heat. Therefore, the liquid-repellent substance contained in the liquid-repellent agent adheres to the edge surface 51, the main body front surface peripheral portion 501, and the main body back surface peripheral portion 502 of the substrate W.

Next, in step S6, the brush 151 rotates on its axis and comes into contact with the rotating substrate W to remove (separate) excess liquid-repellent material from the substrate W.

Specifically, the control unit 21 controls the rotation mechanism 158 so that the brush 151 rotates on its axis. As a result, the rotation mechanism 158 rotates the brush 151 on its axis. The control unit 21 then controls the swing arm 152 so that the brush 151 moves from the standby position P2 to the removal position P1. Therefore, the swing arm 152 moves the brush 151 from the standby position P2 to the removal position P1. As a result, the brush 151 removes only the excess liquid-repellent substance from the substrate W while leaving the necessary liquid-repellent substance on the substrate W. Once the removal of the excess liquid-repellent substance is complete, the swing arm 152 moves the brush 151 from the removal position P1 to the standby position P2, and the rotation mechanism 158 stops the rotation of the brush 151.

In detail, in step S6, while the substrate W is rotating, the brush 151 is spaced away from the side surface 515 in the radial direction RD of the end surface 51 of the substrate W, while the brush 151 is brought into contact with at least the peripheral surface 501 of the substrate W, thereby bringing the remover into contact with the liquid-repellent substance adhering to the peripheral surface 501 of the substrate W.

More specifically, in step S6, the brush 151 performs a first contact operation and a second contact operation. The first contact operation is an operation in which, while the substrate W is rotating, the brush 151 contacts the liquid-repellent substance adhering to the main body front surface peripheral portion 501 by bringing the first contact portion B1 into contact with at least the main body front surface peripheral portion 501 while separating the first contact portion B1 from the side portion 515 of the substrate W. The second contact operation is an operation in which, while the substrate W is rotating, the brush 151 contacts the liquid-repellent substance 82 adhering to the main body back surface peripheral portion 502 by bringing the second contact portion B2 into contact with at least the main body back surface peripheral portion 502 of the substrate W while separating the second contact portion B2 from the side portion 515 of the substrate W.

More specifically, in step S6, the first contact operation is performed by performing a first main body contact operation and a first end surface contact operation.

The first body contact operation is an operation in which the first outer contact portion B11 is brought into contact with the body surface peripheral portion 501 while the substrate W is rotating, thereby bringing the remover into contact with the liquid-repellent substance adhering to the body surface peripheral portion 501.

The first edge surface contacting operation is an operation in which, while the substrate W is rotating, the first inner contact portion B12 is brought into contact with the surface edge portion 511 at the edge surface 51 of the substrate W, thereby bringing the remover into contact with the liquid-repellent substance adhering to the surface edge portion 511. Note that the first edge surface contacting operation may also be an operation in which, while the substrate W is rotating, the first inner contact portion B12 is brought into contact with the surface edge portion 511 and surface shoulder portion 512 of the substrate W, thereby bringing the remover into contact with the liquid-repellent substance adhering to the surface edge portion 511 and surface shoulder portion 512.

In addition, in step S6, a second body contact operation and a second end surface contact operation are performed as the second contact operation.

The second body contact operation is an operation in which the second outer contact portion B21 is brought into contact with the body rear surface peripheral portion 502 of the substrate W while the substrate W is rotating, thereby bringing the remover into contact with the liquid-repellent substance adhering to the body rear surface peripheral portion 502.

The second edge surface contacting operation is an operation in which, while the substrate W is rotating, the second inner contact portion B22 is brought into contact with the back surface edge portion 513 at the edge surface 51 of the substrate W, thereby bringing the remover into contact with the liquid-repellent substance adhering to the back surface edge portion 513. Note that the second edge surface contacting operation may also be an operation in which, while the substrate W is rotating, the second inner contact portion B22 is brought into contact with the back surface edge portion 513 and back surface shoulder portion 514 of the substrate W, thereby bringing the remover into contact with the liquid-repellent substance adhering to the back surface edge portion 513 and back surface shoulder portion 514.

Preferably, in step S6, the brush 151 is rotated on its axis while being spaced apart from the side surface 515 of the substrate W, and the brush 151 is brought into contact with at least the main body front surface peripheral portion 501. Even more preferably, in step S6, the brush 151 is rotated on its axis while being spaced apart from the side surface 515 of the substrate W, and the brush 151 is brought into contact with at least the main body front surface peripheral portion 501 and the main body back surface peripheral portion 502. Even more preferably, in step S6, the brush 151 is rotated on its axis while being spaced apart from the side surface 515, the front surface shoulder 512, and the back surface shoulder 514 of the substrate W, and the brush 151 is brought into contact with the main body front surface peripheral portion 501, the front surface edge 511, the back surface edge 513, and the main body back surface peripheral portion 502. More preferably, in step S6, the brush 151 is rotated while being spaced away from the side surface 515 of the substrate W, and the brush 151 is brought into contact with the main body front surface peripheral portion 501, front surface edge portion 511, front surface shoulder portion 512, back surface shoulder portion 514, back surface edge portion 513, and main body back surface peripheral portion 502.

Also, preferably, in step S6, an inert gas is ejected from between the first contact portion B1 and the second contact portion B2 of the brush 151 toward the liquid-repellent material 82.

Next, in step S7, the rinse liquid supply unit 33 supplies rinse liquid to the substrate W to wash away from the substrate W any excess liquid-repellent material that was removed (separated) from the substrate W in step S6. Specifically, the control unit 21 controls the valve 332 so that the rinse liquid nozzle 331 sprays rinse liquid onto the rotating substrate W. As a result, the valve 332 opens the flow path of the pipe 333, causing the rinse liquid nozzle 331 to spray rinse liquid onto the substrate W.

Next, in step S8, the spin chuck 13 rotates the substrate W to dry the substrate W. The rotation of the substrate W continues from step S3.

Next, in step S9, the control unit 21 controls the spin chuck 13 to stop the rotation of the substrate W. As a result, the spin chuck 13 stops the rotation of the substrate W.

Next, in step S10, the control unit 21 controls the center robot CR to unload the substrate W from the liquid-repellent agent treatment unit 5. As a result, the center robot CR unloads the substrate W from the liquid-repellent agent treatment unit 5.

Next, in step S11, the control unit 21 controls the center robot CR to load the substrate W having the liquid-repellent substance attached to the side surface 515, or the substrate W having the liquid-repellent substance attached to the side surface 515, the front surface shoulder 512, and the back surface shoulder 514, into the processing unit 1. As a result, the center robot CR loads the substrate W into the processing unit 1.

Next, in step S12, the control unit 21 controls the processing unit 1 to process the substrate W with the processing liquid. As a result, the processing unit 1 processes the substrate W with the processing liquid. As an example, the rear surface nozzle 8 (FIG. 1) of the processing unit 1 processes the rear surface A2 of the substrate W by ejecting the processing liquid onto the rear surface A2 of the substrate W. As another example, the front surface nozzle 7 (FIG. 1) of the processing unit 1 processes the front surface A1 of the substrate W by ejecting the processing liquid onto the front surface A1 of the substrate W.

Next, in step S13, the control unit 21 controls the center robot CR to unload the substrate W from the processing unit 1. As a result, the center robot CR unloads the substrate W from the processing unit 1. Then, the processing ends.

As described above with reference to Figure 12, according to the substrate processing method of this embodiment, excess liquid-repellent material is removed while the brush 151 is moved away from the side surface 515 of the substrate W (step S6). Therefore, the excess liquid-repellent material can be removed while leaving the liquid-repellent material on the side surface 515 of the substrate W.

Furthermore, according to this embodiment, even if the processing liquid is ejected onto the rear surface A2 of the substrate W in step S12, the processing liquid can be prevented from flowing around to the front surface A1 of the substrate W. This is because in step S6, only the excess liquid-repellent substance is removed, and the liquid-repellent substance remains attached to the side surface portion 515 of the substrate W.

Next, with reference to Figure 13, a notch 52 formed in the substrate W will be described. Figure 13 is a plan view showing the substrate W. As shown in Figure 13, the substrate W may have a notch 52. In plan view, the notch 52 is a recess recessed inward in the radial direction RD from the end surface portion 51 of the substrate W. The width of the notch 52 in the circumferential direction CD becomes smaller, for example, as it moves inward in the radial direction RD.

Next, the relationship between the notch 52 and the brush 151 will be described with reference to Figures 9 and 14. Figure 14 is a plan view showing the state in which the brush 151 is in contact with the notch 52. Figure 14 shows the maximum portion MX1 of the first inclined contact portion 43 of the brush 151. The first outer contact portion B11 is also shown by a two-dot chain line.

14 , at least a portion of the brush 151 enters the notch 52 present in the edge surface 51 of the substrate W and contacts the bottom point BM of the notch 52. Therefore, according to this embodiment, as with the edge surface 51, the main body front surface peripheral portion 501, and the main body back surface peripheral portion 502, the liquid-repellent substance can be removed from the portion of the notch 52 where the liquid-repellent substance is not required and from the vicinity of the notch 52, while leaving the liquid-repellent substance in the portion of the notch 52 where the liquid-repellent substance is required. The portion where the liquid-repellent substance is required includes at least the portion of the notch 52 corresponding to the side surface 515. The portion where the liquid-repellent substance is required may include one or more of the portion of the notch 52 corresponding to the front surface shoulder 512, the portion corresponding to the back surface shoulder 514, the portion corresponding to the front surface edge 511, and the portion corresponding to the back surface edge 513. The portion where the liquid-repellent substance is not required is the portion of the notch 52 other than the portion where the liquid-repellent substance is required.

In the example of Figure 14, the entire first inclined contact portion 43 and the entire second inclined contact portion 44 (Figure 9) of the brush 151 are inserted into the notch 52 in a planar view. However, as long as the first inclined contact portion 43 and the second inclined contact portion 44 of the brush 151 are in contact with the bottom point BM of the notch 52, a portion of the first inclined contact portion 43 and a portion of the second inclined contact portion 44 may be inserted into the notch 52 in a planar view.

14, the diameter 2R of the brush 151 is smaller than the maximum width L of the notch 52 in the circumferential direction CD. "R" indicates the radius of the brush 151 in a planar view. As shown in FIG. 9, in this embodiment, the radius R of the brush 151 indicates the radius Rmx of the maximum portion MX1 of the first inclined contact portion 43 of the brush 151. Similarly, the diameter 2R of the brush 151 indicates the diameter 2Rmx of the maximum portion MX1 of the first inclined contact portion 43 of the brush 151. Also, in the example of FIG. 14, the diameter 2R of the brush 151 is smaller than the depth D of the notch 52 in the radial direction RD. Therefore, in a planar view, the entire first inclined contact portion 43 and the entire second inclined contact portion 44 of the brush 151 fit within the notch 52. As the substrate W rotates in the rotational direction D1, the brush 151 moves relative to the notch 52. Therefore, in plan view, the first inclined contact portion 43 and the second inclined contact portion 44 can remove the liquid-repellent substance from areas where it is not required, while leaving the liquid-repellent substance in areas where it is required across the entire notch 52. Similarly, in plan view, the first outer contact portion B11 and the second outer contact portion B21 (Figure 9) can remove the liquid-repellent substance from the entire vicinity of the notch 52.

In particular, in this embodiment, the biasing mechanism 159 (Figure 3) biases the brush 151 inward in the radial direction RD of the substrate W. Therefore, when the brush 151 is positioned in the notch 52 due to rotation of the substrate W, the first inclined contact portion 43 and the second inclined contact portion 44 of the brush 151 quickly enter the notch 52. As a result, the liquid-repellent substance can be more reliably removed from portions of the notch 52 where the liquid-repellent substance is not required.

Next, an example of a method for determining the radius R of the brush 151 will be described with reference to Figures 9, 13, and 15. As shown in Figure 13, the width L of the notch 52 is expressed by equation (1). In equation (1), "Rw" represents the radius of the substrate W. "θ" represents the central angle relative to the notch 52. The unit of the central angle θ is degrees.

L=2π×Rw×(θ/360)…(1)

Figure 15 is a plan view showing the brush 151 and notch 52. In Figure 15, the maximum portion MX1 of the first inclined contact portion 43 of the brush 151 is shown. The first outer contact portion B11 is also shown by a two-dot chain line. As shown in Figure 15, the x and y coordinates are defined with the bottom point BM of the notch 52 as the origin 0. The notch 52 is then approximated by a parabola y. Therefore, the notch 52 is expressed by equation (2). The coefficient a of equation (2) is expressed by equation (3).

y = a × x ² ... (2)
a=y/ ^x2 =By/ ^Ax2 ...(3)

The radius of curvature Rc at each point x of the parabola y is given by equation (4). "y1" represents the first derivative of equation (2) and is given by equation (5). "y2" represents the second derivative of equation (2) and is given by equation (6).

Rc=(1+y1 ² ) ^3/2 /y2...(4)
y1=dy/dx...(5)
y2=dy/dx...(6)

The radius of curvature R0 of the parabola y at the origin 0, i.e., the radius of curvature R0 at the bottom point BM of the notch 52, is given by equation (7). In other words, in equation (7), x = 0.

R0=(1+(2a) ² ×x ² ) ^3/2 /2a=1/2a...(7)

In this embodiment, the radius of curvature R0 at the origin 0 is set to the radius R of the brush 151. Therefore, the first inclined contact portion 43 and the second inclined contact portion 44 of the brush 151 can be reliably inserted into the notch 52. As a result, the liquid-repellent substance can be reliably removed from the portions of the notch 52 where the liquid-repellent substance is not required.

Here, as an example, we calculate the maximum value Rmax and minimum value Rmin of the radius R of the brush 151.

First, calculate the maximum value Rmax. In this case, if the radius Rw of the substrate W is 150 mm and the central angle θ is 2, then according to equation (1), the width L of the notch 52 is 5.24 mm. Furthermore, if Ax = 2.62 mm and By = 1.20 mm, then according to equation (3), the coefficient a is 0.175. Substituting coefficient a into equation (7), the maximum value of the radius of curvature R0 is 2.86 mm. Therefore, the maximum value Rmax of the radius R of the brush 151 is set to 2.86 mm.

Next, calculate the minimum value Rmin. In this case, if the radius Rw of the substrate W is 150 mm and the central angle θ is 1.5, then according to equation (1), the width L of the notch 52 is 3.93 mm. Furthermore, if Ax = 1.96 mm and By = 1.20 mm, then according to equation (3), the coefficient a is 0.31. Substituting coefficient a into equation (7), the minimum value of the radius of curvature R0 is 1.61 mm. Therefore, the minimum value Rmin of the radius R of the brush 151 is set to 1.61 mm.

That is, for example, if the width L of the notch 52 is 3.93 mm or more and 5.24 mm or less, the radius R of the brush 151 is set to 1.61 mm or more and 2.86 mm or less.

(First Modification)
A brush 151C according to a first modified example of this embodiment will be described with reference to Figures 16 to 18. The first modified example differs from the embodiment described with reference to Figure 8 mainly in that the first inner contact portion B12c and the second inner contact portion B22c of the brush 151C according to the first modified example are movable. Below, the differences between the first modified example and the embodiment will be mainly described.

Figure 16 is a cross-sectional view showing a brush 151C according to a first modified example. As shown in Figure 16, the first outer contact portion B11c has an internal space SP1. The internal space SP1 can accommodate the first inner contact portion B12c.

The first inner contact portion B12c includes a slider 181 and a main body 185. The main body 185 is attached to the outer peripheral surface of the slider 181. The slider 181 has a generally cylindrical shape. The slider 181 is inserted into the shaft portion 161. The slider 181 is movable along the axial direction AD on the shaft portion 161. Therefore, the first inner contact portion B12c is movable along the axial direction AD on the shaft portion 161. The slider 181 also rotates around the rotation axis AX2 together with the shaft portion 161. In this case, the engaging portion of the slider 181 engages with the engaging portion of the shaft portion 161. The engaging portion of the slider 181 is, for example, a convex portion extending in the axial direction AD, and the engaging portion of the shaft portion 161 is, for example, a concave portion extending in the axial direction AD.

The internal space SP1 includes a gap GP1 and a gap GP2. The gap GP1 represents the space between the upper surface 71 of the first inner contact portion B12c and the inner upper surface 72 of the first outer contact portion B11c. The gap GP2 represents the space between the outer peripheral surface 75 of the first inner contact portion B12c and the inner peripheral surface 74 of the first outer contact portion B11c.

On the other hand, the second outer contact portion B21c has an internal space SP2. The internal space SP2 can accommodate the second inner contact portion B22c.

The second inner contact portion B22c includes a slider 182 and a main body 186. The main body 186 is attached to the outer peripheral surface of the slider 182. The slider 182 has a generally cylindrical shape. The slider 182 is inserted into the shaft portion 161. The slider 182 is movable along the axial direction AD on the shaft portion 161. Therefore, the second inner contact portion B22c is movable along the axial direction AD on the shaft portion 161. Furthermore, the slider 182 rotates around the rotation axis AX2 together with the shaft portion 161. The configuration of the slider 182 is similar to the configuration of the slider 181.

The internal space SP2 includes a gap GP3 and a gap GP4. The gap GP3 represents the space between the upper surface 91 of the second inner contact portion B22c and the inner upper surface 92 of the second outer contact portion B21c. The gap GP4 represents the space between the outer peripheral surface 95 of the second inner contact portion B22c and the inner peripheral surface 94 of the second outer contact portion B21c.

As a first example, a biasing member that biases the first inner contact portion B12c downward may be placed in gap GP1, and a biasing member that biases the second inner contact portion B22c upward may be placed in gap GP3. The biasing member may be, for example, a resilient member such as a spring. Alternatively, as a second example, spacers may be placed in gaps GP1 and GP3, respectively, to fix the positions of the first inner contact portion B12c and the second inner contact portion B22c. In the first and second examples, stoppers are placed below the first inner contact portion B12c and above the second inner contact portion B22c on the opposing shaft portion 161a.

Next, the process of removing the liquid-repellent substance using the brush 151C according to the first modified example will be described with reference to Figures 17 and 18. Figure 17 shows the first step S1000 of the process of removing the liquid-repellent substance using the brush 151C. Figure 18 shows the second step S2000 of the process of removing the liquid-repellent substance using the brush 151C.

As shown in Figures 17 and 18, in the first step S1000 and the second step S2000, the slider 181 moves downward, causing the first inner contact portion B12c (specifically, the first inclined contact portion 43) to protrude downward from the first outer contact portion B11c. Furthermore, the slider 182 moves upward, causing the second inner contact portion B22c (specifically, the second inclined contact portion 44) to protrude upward from the second outer contact portion B21c.

17 , in the first step S1000, the flat surface B14 of the first outer contact portion B11c contacts the region M2 of the main body front surface peripheral portion 501, and the inclined surface B13 of the first inner contact portion B12c contacts the front surface edge portion 511. As a result, the liquid-repellent substance adhering to the region M2 and the front surface edge portion 511 is removed (separated) by the remover. Also in the first step S1000, the flat surface B24 of the second outer contact portion B21c contacts the region N2 of the main body rear surface peripheral portion 502, and the inclined surface B23 of the second inner contact portion B22c contacts the rear surface edge portion 513. As a result, the liquid-repellent substance adhering to the region N2 and the rear surface shoulder portion 513 is removed (separated) by the remover.

However, upon completion of the first step S1000, the liquid-repellent substance 85 remains in the area M1 of the main body front peripheral portion 501 and the area N1 of the main body back peripheral portion 502.

Therefore, after the first step S1000 is completed, the swing arm 152 (Figure 3) moves the brush 151C in the direction DA. The direction DA indicates a direction facing outward in the radial direction RD. Specifically, the swing arm 152 moves the brush 151C in the direction DA by a distance corresponding to the regions M1 and N1.

Region M1 indicates the radially inner portion of the main body front surface peripheral portion 501 in the RD direction, and region M2 indicates the radially outer portion of the main body front surface peripheral portion 501 in the RD direction. Region N1 indicates the radially inner portion of the main body back surface peripheral portion 502 in the RD direction, and region N2 indicates the radially outer portion of the main body back surface peripheral portion 502 in the RD direction.

Next, as shown in FIG. 18, in the second step S2000, the flat surface B14 of the first outer contact portion B11c contacts region M1 of the main body front surface peripheral portion 501, and the inclined surface B13 of the first inner contact portion B12c moves away from the front surface edge portion 511. As a result, the liquid-repellent substance adhering to region M1 is removed (separated) by the remover. Also, in the second step S2000, the flat surface B24 of the second outer contact portion B21c contacts region N1 of the main body rear surface peripheral portion 502, and the inclined surface B23 of the second inner contact portion B22c moves away from the rear surface edge portion 513. As a result, the liquid-repellent substance adhering to region N1 is removed (separated) by the remover.

As a result of the above, in the first modified example, the liquid-repellent substance 82 remains on the side surface 515, front surface shoulder 512, and rear surface shoulder 514 of the substrate W. Note that the first step S1000 may be performed after the second step S2000.

In addition, in the first modified example, the brush 151C has sliders 181 and 182. Therefore, the distance in the axial direction AD between the first inner contact portion B12c and the second inner contact portion B22c can be expanded or contracted. As a result, the axial direction AD positions of the first inner contact portion B12c (inclined surface B13) and the second inner contact portion B22c (inclined surface B23) can be set to match the shape of the edge surface 51 of the substrate W.

(Second Modification)
A brush 151D according to a second modification of this embodiment will be described with reference to Fig. 19. The second modification is mainly different from the embodiment described with reference to Fig. 8 in that the first inner contact portion B12 of the brush 151D according to the second modification conforms to the shapes of the front surface edge portion 511 and the front surface shoulder portion 512. The following mainly describes the differences between the second modification and the embodiment.

Fig. 19 is a diagram showing an example of a process for removing a liquid-repellent substance by a brush 151D according to the second modified example. To make the drawing easier to understand, Fig. 19 shows a side view of the brush 151D and a cross section of the substrate W. Also, to simplify the drawing, the diagonal lines indicating the cross section have been omitted.

As shown in FIG. 19, the first inclined contact portion 43d has a first contact surface B15 and a second contact surface B16. The first contact surface B15 has a shape that follows the surface edge portion 511. Therefore, when the first contact surface B15 comes into contact with the surface edge portion 511, the liquid-repellent substance adhering to the surface edge portion 511 is removed (separated) by the removing liquid. The second contact surface B16 has a shape that follows the surface shoulder portion 512. Therefore, when the second contact surface B16 comes into contact with the surface shoulder portion 512, the liquid-repellent substance adhering to the surface shoulder portion 512 is removed (separated) by the removing liquid.

The second inclined contact portion 44d also has a first contact surface B25 and a second contact surface B26. The first contact surface B25 has a shape that follows the back surface edge portion 513. Therefore, when the first contact surface B25 comes into contact with the back surface edge portion 513, the liquid-repellent substance adhering to the back surface edge portion 513 is removed (separated) by the remover. The second contact surface B26 has a shape that follows the back surface shoulder portion 514. Therefore, when the second contact surface B26 comes into contact with the back surface shoulder portion 514, the liquid-repellent substance adhering to the back surface shoulder portion 514 is removed (separated) by the remover.

As a result of the above, in the second modified example, the liquid-repellent substance 82 remains only on the side surface portion 515 of the substrate W.

Embodiments of the present invention have been described above with reference to the drawings. However, the present invention is not limited to the above embodiments and can be implemented in various forms without departing from the spirit of the present invention. Furthermore, the multiple components disclosed in the above embodiments can be modified as appropriate. For example, some of the components shown in one embodiment may be added to the components of another embodiment, or some of the components shown in one embodiment may be deleted from the embodiment.

Furthermore, the drawings primarily show each component in a schematic manner to facilitate understanding of the invention, and the thickness, length, number, spacing, etc. of each component shown may differ from the actual configuration due to the convenience of creating the drawings. Furthermore, the configuration of each component shown in the above embodiment is merely an example and is not particularly limited, and it goes without saying that various modifications are possible within the scope that does not substantially deviate from the effects of the present invention.

(1) In the embodiment (including the modified example) described with reference to FIG. 3, the brush 151 is rotated by the rotation mechanism 158. However, the brush 151 may also rotate in response to the rotation of the substrate W. The brush 151 does not have to rotate.

(2) In the embodiment described with reference to FIG. 12, after removing excess liquid-repellent substance from the substrate W, the processing unit 1 processed the substrate W with a processing liquid. However, after removing excess liquid-repellent substance from the substrate W, the liquid-repellent agent processing unit 5 may process the substrate W with a processing liquid. In this case, the liquid-repellent agent processing unit 5 is provided with a nozzle that ejects the processing liquid onto the substrate W. For example, the liquid-repellent agent processing unit 5 may be provided with a front surface nozzle 7 and/or a back surface nozzle 8.

(3) The brushes 151, 151A-151D described with reference to Figures 8 to 11 and 16 to 19 have flat surfaces B14, B24 and inclined surfaces B13, B23, or flat surfaces B14, B24, first contact surfaces B15, B25, and second contact surfaces B16, B26. However, as long as excess liquid-repellent material can be removed, the shape of the brushes 151, 151A-151D is not particularly limited.

The first contact portion B1 and the second contact portion B2 may also constitute separate brushes. In this case, for example, a shaft portion and a rotation mechanism are provided for each brush. Furthermore, the first outer contact portion B11, the first inner contact portion B12, the second outer contact portion B21, and the second inner contact portion B22 may each constitute separate brushes. In this case, for example, a shaft portion and a rotation mechanism are provided for each brush.

(4) The spin chuck 13 described with reference to Figure 3 was of a vacuum suction type, but it may also be of a clamping type or Bernoulli type, for example.

The present invention is suitable for use in substrate processing apparatuses and substrate processing methods.

13 Spin chuck (substrate holding part)
100 Substrate processing apparatus 151, 151A to 151D Brush (removal member)
158 Rotation mechanism 159 Biasing mechanism 353 Inert gas discharge part B1 First contact part B11 First outer contact part B12, B12a, B12c, B12d First inner contact part B2 Second contact part B21 Second outer contact part B22, B22a, B22c, B22d Second inner contact part W Substrate

Claims (18)

a substrate holder that holds and rotates a substrate having a liquid-repellent substance that can repel a processing liquid attached thereto;
a removal member including a first contact portion and a second contact portion ,
the first contact portion contacts at least the peripheral portion of the main body surface of the substrate while the substrate is rotating, thereby bringing a remover capable of removing the liquid-repellent substance into contact with the liquid-repellent substance attached to the peripheral portion of the main body surface;
the second contact portion contacts at least a peripheral edge portion of a rear surface of the substrate while the substrate is rotating, thereby bringing the remover into contact with the liquid-repellent substance attached to the peripheral edge portion of the rear surface of the substrate;
the main body surface peripheral portion of the substrate indicates a peripheral region of the surface of the substrate main body,
the main body rear surface peripheral portion of the substrate indicates a peripheral region of the rear surface of the substrate main body,
the first contact portion and the second contact portion are arranged on the same axis,
when the first contact portion is in contact with the peripheral edge portion of the front surface of the main body and the second contact portion is in contact with the peripheral edge portion of the back surface of the main body, the first contact portion and the second contact portion are spaced apart from a side surface portion in a radial direction of an end surface portion of the substrate,
The end surface portion of the substrate indicates an end surface region radially outward from the substrate body. The first contact portion is
a first outer contact portion that contacts the peripheral surface of the main body while the substrate is rotating, thereby bringing the remover into contact with the liquid-repellent substance attached to the peripheral surface of the main body;
a first inner contact portion that is disposed inside the first outer contact portion and that contacts a surface edge portion of the end face portion of the substrate while the substrate is rotating, thereby bringing the remover into contact with the liquid-repellent substance attached to the surface edge portion,
the surface edge portion of the end surface portion is a region of the end surface portion located radially outward from the main body surface peripheral portion on the surface side of the substrate, and is a region located radially inward from the side surface portion,
The second contact portion is
a second outer contact portion that contacts the periphery of the rear surface of the main body of the substrate while the substrate is rotating, thereby bringing the remover into contact with the liquid-repellent substance attached to the periphery of the rear surface of the main body;
a second inner contact portion that is disposed inside the second outer contact portion and that contacts a rear edge portion of the end surface of the substrate while the substrate is rotating, thereby bringing the remover into contact with the liquid-repellent substance adhered to the rear edge portion,
2. The substrate processing apparatus according to claim 1, wherein the rear edge portion of the end surface portion is a region of the end surface portion on the rear side of the substrate that is located radially outward from the main body rear peripheral portion and radially inward from the side portion . the first outer contact portion has a flat surface that contacts the peripheral edge of the main body surface;
the first inner contact portion has an inclined surface that contacts the surface edge portion,
the second outer contact portion has a flat surface that contacts the periphery of the rear surface of the main body,
The substrate processing apparatus according to claim 2 , wherein the second inner contact portion has an inclined surface that contacts the rear edge portion. The substrate processing apparatus according to claim 2 , wherein a distance between the first inner contact portion and the second inner contact portion is expandable and contractible. The substrate processing apparatus according to claim 1 , further comprising an inert gas discharge unit that discharges an inert gas from between the first contact portion and the second contact portion. The substrate processing apparatus according to claim 1 , wherein the removal member rotates about its axis and contacts at least the peripheral edge of the main body front surface and the peripheral edge of the main body back surface while being spaced apart from the side surface of the substrate. The substrate processing apparatus according to claim 1 , wherein at least a part of the removal member enters a notch present in the edge surface portion of the substrate and contacts a bottom point of the notch. The substrate processing apparatus according to claim 7 , further comprising a biasing mechanism that biases the removal member toward an inner side in a radial direction of the substrate. The substrate processing apparatus according to claim 1 , further comprising a remover supply unit that supplies the remover to the removal member . 1. A substrate processing method using a removal member that brings a remover capable of removing a liquid-repellent substance into contact with the liquid-repellent substance,
a step of rotating the substrate to which the liquid repellent substance is attached while holding it;
and performing the first contact action and the second contact action simultaneously ;
the removal member includes a first contact portion and a second contact portion that are arranged on the same axis;
the first contact operation is an operation of contacting the first contact portion with at least a peripheral portion of a main body surface of the substrate while the substrate is rotating, thereby bringing the remover into contact with the liquid-repellent substance attached to the peripheral portion of the main body surface;
the second contact operation is an operation of contacting the second contact portion with at least a peripheral edge portion of a rear surface of a main body of the substrate while the substrate is rotating, thereby bringing the remover into contact with the liquid-repellent substance attached to the peripheral edge portion of the rear surface of the main body;
the main body surface peripheral portion of the substrate indicates a peripheral region of the surface of the substrate main body,
the main body rear surface peripheral portion of the substrate indicates a peripheral region of the rear surface of the substrate main body,
In the first contact operation and the second contact operation, the first contact portion and the second contact portion are spaced apart from a side surface portion in a radial direction of an end surface portion of the substrate,
A substrate processing method, wherein the end surface portion of the substrate indicates an end surface region radially outward from the substrate body. the first contact portion includes a first outer contact portion and a first inner contact portion disposed inside the first outer contact portion;
In the step of simultaneously performing the first contacting operation and the second contacting operation , a first main body contacting operation and a first end surface contacting operation are performed as the first contacting operation;
the first body contacting operation is an operation of contacting the first outer contact portion with the peripheral edge of the body surface while the substrate is rotating, thereby bringing the remover into contact with the liquid-repellent substance attached to the peripheral edge of the body surface;
the first edge surface contacting operation is an operation of contacting the first inner contact portion with a surface edge portion of the edge surface of the substrate while the substrate is rotating, thereby bringing the remover into contact with the liquid-repellent substance attached to the surface edge portion;
the surface edge portion of the end surface portion is a region of the end surface portion located radially outward from the main body surface peripheral portion on the surface side of the substrate, and is a region located radially inward from the side surface portion,
the second contact portion includes a second outer contact portion and a second inner contact portion disposed inside the second outer contact portion;
In the step of simultaneously performing the first contacting operation and the second contacting operation , a second main body contacting operation and a second end surface contacting operation are performed as the second contacting operation;
the second body contacting operation is an operation of contacting the second outer contact portion with the peripheral edge of the rear surface of the body of the substrate while the substrate is rotating, thereby bringing the remover into contact with the liquid-repellent substance attached to the peripheral edge of the rear surface of the body,
the second edge surface contacting operation is an operation of contacting the second inner contact portion with a rear edge portion of the edge surface of the substrate while the substrate is rotating, thereby bringing the remover into contact with the liquid-repellent substance attached to the rear edge portion;
The substrate processing method of claim 10, wherein the rear edge portion of the end surface portion is a region of the end surface portion on the rear side of the substrate that is located radially outward from the main body rear peripheral portion and radially inward from the side portion . the first outer contact portion has a flat surface that contacts the peripheral edge of the main body surface;
the first inner contact portion has an inclined surface that contacts the surface edge portion,
the second outer contact portion has a flat surface that contacts the periphery of the rear surface of the main body,
The substrate processing method according to claim 11 , wherein the second inner contact portion has an inclined surface that contacts the rear surface edge portion. 13. The substrate processing method according to claim 11 , wherein a distance between the first inner contact portion and the second inner contact portion is expandable and contractible. 14. The substrate processing method according to claim 10 , wherein in the step of simultaneously performing the first contact operation and the second contact operation , an inert gas is ejected from between the first contact portion and the second contact portion. 15. The substrate processing method according to claim 10, wherein in the step of simultaneously performing the first contact operation and the second contact operation , the removal member is moved away from the side portion of the substrate, rotated on its axis, and brought into contact with at least the peripheral portion of the front surface and the peripheral portion of the back surface of the main body . 16. The substrate processing method according to claim 10, wherein in the step of simultaneously performing the first contact operation and the second contact operation , at least a portion of the removal member enters a notch present in the edge surface portion of the substrate and contacts a bottom point of the notch. The substrate processing method according to claim 16 , wherein in the step of simultaneously performing the first contact operation and the second contact operation , the removal member is biased toward an inner side in a radial direction of the substrate. The substrate processing method according to claim 10 , further comprising the step of supplying the remover to the removal member .