JP7798623B2 - Fluid cabinet exhaust control method and substrate processing apparatus - Google Patents

Description

The present invention relates to a method for controlling exhaust from a fluid cabinet and a substrate processing apparatus.

Substrate processing apparatuses for processing substrates are known. Substrate processing apparatuses are suitable for processing semiconductor substrates. Typically, substrate processing apparatuses process substrates using processing liquids such as chemicals.

When using a processing liquid, pressure fluctuations or other factors within the container can cause the chemical liquid to come into contact with the surrounding atmosphere, which can cause the properties of the chemical liquid to fluctuate. For this reason, studies have been conducted to prevent the chemical liquid from coming into contact with the surrounding atmosphere by supplying a specific gas to the chemical liquid cabinet (see Patent Document 1). Patent Document 1 describes a substrate cleaning apparatus that prevents the chemical liquid from coming into contact with the surrounding atmosphere by supplying an organic-free gas with a controlled amount of organic contamination to the chemical liquid preparation cabinet. In the substrate cleaning apparatus of Patent Document 1, the organic-free gas supplied to the space above the chemical liquid surface in the concentration and temperature control container is exhausted through an exhaust duct from piping installed at the top of the concentration and temperature control container.

JP 2010-56209 A

In the substrate cleaning apparatus of Patent Document 1, chemical piping and concentration/temperature adjustment containers are arranged in a chemical preparation cabinet. If chemical piping and concentration/temperature adjustment containers leak into the chemical preparation cabinet, they are exhausted through an exhaust duct. However, if the exhaust volume of the exhaust air flowing through the exhaust duct is low, the leaked chemical cannot be exhausted sufficiently. On the other hand, if the exhaust volume of the exhaust duct is set too high, the air blower mechanism must be operated at high speed, which places an excessive burden on the environment.

The present invention was made in consideration of the above-mentioned problems, and its purpose is to provide a fluid cabinet exhaust control method and substrate processing apparatus that can appropriately exhaust the atmosphere inside the fluid cabinet depending on the condition inside the fluid cabinet.

According to one aspect of the present invention, a method for controlling exhaust of a fluid cabinet is a method for exhausting the atmosphere within a space partitioned by a fluid cabinet in which fluid piping is disposed, through which fluid supplied to a substrate processing unit flows, and includes a standard exhaust process for exhausting the atmosphere within the fluid cabinet under standard exhaust conditions; an abnormality detection process for detecting an abnormality within the fluid cabinet; an abnormal state determination process for determining an abnormal state within the fluid cabinet based on the detection results of the abnormality detection process; a forced exhaust condition determination process for determining forced exhaust conditions set to an exhaust volume greater than the exhaust volume of the standard exhaust conditions based on the determination results of the abnormal state determination process; and a forced exhaust process for exhausting the atmosphere within the fluid cabinet under the forced exhaust conditions determined in the forced exhaust condition determination process.

In one embodiment, the abnormality detection process includes a liquid leakage detection process that detects a liquid leakage that has occurred within the fluid cabinet, and the abnormal state determination process includes a liquid leakage state determination process that determines the state of a liquid leakage within the fluid cabinet based on the detection results in the liquid leakage detection process.

In one embodiment, the abnormality detection process includes an exhaust pressure drop detection process that detects a drop in exhaust pressure within the fluid cabinet, and the abnormal state determination process includes an exhaust pressure drop state determination process that determines a drop in exhaust pressure in the fluid cabinet based on the detection result in the exhaust pressure drop detection process.

In one embodiment, the forced exhaust process includes a first forced exhaust process, which transitions from the standard exhaust process and exhausts the atmosphere inside the fluid cabinet under first forced exhaust conditions set to a first forced exhaust volume that is greater than the exhaust volume under the standard exhaust conditions, and a second forced exhaust process, which, if no abnormality is detected inside the fluid cabinet after a predetermined time has elapsed since transitioning from the standard exhaust process to the first forced exhaust process, exhausts the atmosphere inside the fluid cabinet under second forced exhaust conditions set to a second forced exhaust volume that is greater than the exhaust volume under the standard exhaust conditions and less than the first forced exhaust volume.

In one embodiment, in the standard exhaust process, the standard exhaust conditions are set based on the type of fluid flowing through the fluid piping in the fluid cabinet or the flow rate of the fluid flowing through the fluid piping.

In one embodiment, the forced exhaust process includes a step of determining whether to return the exhaust conditions for exhausting the atmosphere within the fluid cabinet to the standard exhaust conditions based on the temporal change in the abnormal condition within the fluid cabinet determined in the forced exhaust process.

In one embodiment, the fluid cabinet includes a first fluid housing and a second fluid housing connected to a common exhaust pipe shared with the first fluid housing, and if an abnormality is detected in the first fluid housing in the abnormality detection process, the atmosphere in the first fluid housing is exhausted under the forced exhaust conditions in the forced exhaust process.

In one embodiment, the forced exhaust process increases the amount of exhaust gas flowing through the common exhaust pipe.

In one embodiment, if an abnormality in the first fluid housing is detected in the abnormality detection process, the forced exhaust process increases the exhaust volume of the first fluid housing without changing the exhaust volume of the exhaust gas flowing through the common exhaust pipe.

In one embodiment, the abnormal state determination process determines the abnormal state by comparing the detection result with a predetermined reference value, and a first reference value, which is the reference value for determination corresponding to the first fluid housing, is different from a second reference value, which is the reference value for determination corresponding to the second fluid housing.

In one embodiment, in the forced exhaust condition determination process, a first enclosure forced exhaust condition corresponding to the first fluid enclosure and a second enclosure forced exhaust condition corresponding to the second fluid enclosure are determined, and the first enclosure forced exhaust condition and the second enclosure forced exhaust condition are different.

In one embodiment, if an abnormality in the fluid cabinet is detected in the abnormality detection process, the forced exhaust process reduces the exhaust volume of a dummy cabinet connected to a common exhaust pipe shared with the fluid cabinet below the exhaust volume in the standard exhaust process, and increases the exhaust volume of the fluid cabinet above the exhaust volume in the standard exhaust process.

According to another aspect of the present invention, a substrate processing apparatus includes a substrate processing unit for processing substrates, a fluid cabinet in which fluid piping is disposed through which fluid supplied to the substrate processing unit flows, an abnormality detection unit for detecting abnormalities within the fluid cabinet, an exhaust unit for exhausting the atmosphere within the fluid cabinet, and a control unit for controlling the exhaust unit. The control unit controls the exhaust unit to exhaust the atmosphere within the fluid cabinet under standard exhaust conditions, the control unit determines an abnormal state within the fluid cabinet based on the detection result of the abnormality detection unit detecting an abnormality within the fluid cabinet, the control unit determines forced exhaust conditions set to an exhaust volume greater than the exhaust volume under the standard exhaust conditions based on the determination result of the abnormal state, and the control unit controls the exhaust unit to exhaust the atmosphere within the fluid cabinet under the forced exhaust conditions.

In one embodiment, the abnormality detection unit includes a liquid leakage detection unit that detects liquid leakage within the fluid cabinet.

In one embodiment, the abnormality detection unit includes an exhaust pressure detection unit that detects the exhaust pressure within the fluid cabinet.

In one embodiment, the control unit controls the exhaust unit to switch from the standard exhaust condition and exhaust the atmosphere inside the fluid cabinet under first forced exhaust conditions set to a first forced exhaust volume that is greater than the exhaust volume under the standard exhaust condition, and if no abnormality is detected inside the fluid cabinet after a predetermined time has elapsed since the switch from the standard exhaust condition to the first forced exhaust condition, controls the exhaust unit to exhaust the atmosphere inside the fluid cabinet under second forced exhaust conditions set to a second forced exhaust volume that is greater than the exhaust volume under the standard exhaust condition and less than the first forced exhaust volume.

In one embodiment, the control unit sets the standard exhaust conditions based on the type of fluid flowing through the fluid piping in the fluid cabinet or the flow rate of the fluid flowing through the fluid piping.

In one embodiment, the control unit determines whether to return the exhaust conditions for exhausting the atmosphere within the fluid cabinet to the standard exhaust conditions based on a temporal change in the abnormal state within the fluid cabinet determined when exhausting the atmosphere within the fluid cabinet under the forced exhaust conditions.

In one embodiment, the fluid cabinet includes a first fluid housing and a second fluid housing connected to a common exhaust pipe shared with the first fluid housing, and when the abnormality detection unit detects an abnormality in the first fluid housing, the control unit controls the exhaust unit to exhaust the atmosphere in the first fluid housing under the forced exhaust condition.

In one embodiment, the control unit increases the amount of exhaust gas flowing through the common exhaust pipe under forced exhaust conditions.

In one embodiment, when the abnormality detection unit detects an abnormality in the first fluid housing, the control unit increases the exhaust volume of the first fluid housing under the forced exhaust condition without changing the exhaust volume of the exhaust gas flowing through the common exhaust pipe.

In one embodiment, the control unit determines the abnormal state by comparing the detection result with a predetermined reference value, and a first reference value, which is the reference value for determination corresponding to the first fluid housing, is different from a second reference value, which is the reference value for determination corresponding to the second fluid housing.

In one embodiment, the control unit determines, as the forced exhaust conditions, a first enclosure forced exhaust condition corresponding to the first fluid enclosure and a second enclosure forced exhaust condition corresponding to the second fluid enclosure, and the first enclosure forced exhaust condition and the second enclosure forced exhaust condition are different.

In one embodiment, the substrate processing apparatus further includes a dummy cabinet and a common exhaust pipe connected to the fluid cabinet and the dummy cabinet, and when the abnormality detection unit detects an abnormality in the fluid cabinet, the control unit reduces the exhaust volume of the dummy cabinet below the exhaust volume under the standard exhaust conditions and increases the exhaust volume of the fluid cabinet above the exhaust volume under the standard exhaust conditions.

According to the present invention, the atmosphere inside the fluid cabinet can be appropriately vented depending on the leakage state inside the fluid cabinet.

1 is a schematic diagram of a substrate processing apparatus according to an embodiment of the present invention; 2 is a schematic view of a substrate processing unit in the substrate processing apparatus of the present embodiment. FIG. FIG. 2 is a schematic view of a fluid cabinet in the substrate processing apparatus of the present embodiment. 1 is a block diagram of a substrate processing apparatus according to an embodiment of the present invention; 1A to 1C are schematic diagrams illustrating a method for controlling exhaust from a fluid cabinet according to an embodiment of the present invention. FIG. 4 is a flow chart of a method for controlling exhaust of a fluid cabinet according to the present embodiment. 1 is a block diagram of a substrate processing apparatus according to an embodiment of the present invention; 1A to 1C are schematic diagrams illustrating a method for controlling exhaust from a fluid cabinet according to an embodiment of the present invention. 10A and 10B are graphs showing the change over time in the detected amount in the method for controlling exhaust from a fluid cabinet according to the present embodiment. FIG. 4 is a flow chart of a method for controlling exhaust of a fluid cabinet according to the present embodiment. 10A and 10B are graphs showing the change over time in the detected amount in the method for controlling exhaust from a fluid cabinet according to the present embodiment. FIG. 4 is a flow chart of a method for controlling exhaust of a fluid cabinet according to the present embodiment. 10A and 10B are graphs showing the change over time in the detected amount in the method for controlling exhaust from a fluid cabinet according to the present embodiment. 1A to 1C are schematic diagrams illustrating a method for controlling exhaust from a fluid cabinet according to an embodiment of the present invention. 1A to 1C are schematic diagrams illustrating a method for controlling exhaust from a fluid cabinet according to an embodiment of the present invention. FIG. 2 is a schematic view of a fluid cabinet in the substrate processing apparatus of the present embodiment. 1A and 1B are schematic diagrams of a fluid cabinet in the substrate processing apparatus of the present embodiment. 1A and 1B are schematic diagrams of a fluid cabinet in the substrate processing apparatus of the present embodiment. 10A and 10B are graphs showing the change over time in the detected amount in the method for controlling exhaust from a fluid cabinet according to the present embodiment. 1A and 1B are schematic diagrams of a fluid cabinet and a common exhaust pipe in the substrate processing apparatus of the present embodiment. 1A and 1B are schematic diagrams of a fluid cabinet and a common exhaust pipe in the substrate processing apparatus of the present embodiment. (a) is a schematic diagram of a fluid cabinet, a dummy cabinet, and a common exhaust piping in a substrate processing apparatus of this embodiment, (b) is a schematic diagram of a fluid cabinet in a substrate processing apparatus of this embodiment, (c) is a schematic diagram of a dummy cabinet in a substrate processing apparatus of this embodiment, and (d) is a schematic diagram of a fluid cabinet, a dummy cabinet, and a common exhaust piping in a substrate processing apparatus of this embodiment. 3 is a schematic diagram of a fluid cabinet, a dummy cabinet, and a common exhaust piping in the substrate processing apparatus of the present embodiment. FIG. 1A and 1B are schematic diagrams of a dummy cabinet in the substrate processing apparatus of the present embodiment. 1 is a block diagram of a substrate processing apparatus according to an embodiment of the present invention; FIG. 4 is a flow chart of a method for controlling exhaust of a fluid cabinet according to the present embodiment. 1A is a schematic diagram of a fluid cabinet in the substrate processing apparatus of the present embodiment, and FIG. 1B is a graph showing the change over time in exhaust pressure in the method for controlling exhaust of a fluid cabinet according to the present embodiment. 5A to 5C are schematic diagrams illustrating exhaust of the fluid cabinet according to the present embodiment. 5A to 5D are schematic views for explaining the operation of the exhaust unit in the substrate processing apparatus of the present embodiment. 1A to 1C are schematic diagrams illustrating a method for controlling exhaust from a fluid cabinet according to an embodiment of the present invention. 1A to 1C are schematic diagrams illustrating a method for controlling exhaust from a fluid cabinet according to an embodiment of the present invention.

Embodiments of a fluid cabinet exhaust control method and a substrate processing apparatus according to the present invention will be described below with reference to the drawings. Note that in the drawings, identical or corresponding parts will be designated by the same reference numerals and descriptions will not be repeated. Note that, in this specification, to facilitate understanding of the invention, mutually orthogonal X-, Y-, and Z-axes may be described. Typically, the X- and Y-axes are parallel to the horizontal direction, and the Z-axis is parallel to the vertical direction.

First, an embodiment of a substrate processing apparatus 100 according to the present invention will be described with reference to Figure 1. Figure 1 is a schematic plan view of the substrate processing apparatus 100 of this embodiment.

The substrate processing apparatus 100 processes the substrate W. The substrate processing apparatus 100 processes the substrate W by performing at least one of etching, surface treatment, property imparting, treatment film formation, removal of at least a portion of a film, and cleaning.

The substrate W is used as a semiconductor substrate. The substrate W includes a semiconductor wafer. For example, the substrate W is approximately disk-shaped. Here, the substrate processing apparatus 100 processes the substrates W one by one.

As shown in FIG. 1, the substrate processing apparatus 100 includes multiple substrate processing units 10, a fluid box 110, a fluid cabinet 120, multiple load ports LP, an indexer robot IR, a center robot CR, and a control device 101. The control device 101 controls the load ports LP, the indexer robot IR, and the center robot CR. The control device 101 includes a control unit 102 and a memory unit 104.

Each load port LP accommodates multiple stacked substrates W. The indexer robot IR transports substrates W between the load port LP and the center robot CR. The center robot CR transports substrates W between the indexer robot IR and the substrate processing units 10. The fluid cabinet 120 supplies fluids used to process the substrates W to the substrate processing units 10 via the fluid box 110. For example, the fluid cabinet 120 supplies processing liquid to the substrate processing units 10 via the fluid box 110. Each substrate processing unit 10 processes the substrates W by discharging processing liquid onto the substrates W. The fluid cabinet 120 accommodates the processing liquid.

Specifically, the multiple substrate processing units 10 form multiple towers TW (four towers TW in FIG. 1) arranged to surround the center robot CR in a plan view. Each tower TW includes multiple substrate processing units 10 stacked one above the other (three substrate processing units 10 in FIG. 1). Each fluid box 110 corresponds to one of the multiple towers TW. Fluid in the fluid cabinet 120 is supplied to the tower TW corresponding to the fluid box 110 via one of the fluid boxes 110. Either a processing liquid or a gas may be supplied to the substrate processing units 10 and the fluid cabinet 120.

The processing liquid may include a so-called chemical liquid. The chemical liquid may include hydrofluoric acid. For example, the hydrofluoric acid may be heated to a temperature of 40°C or higher and 70°C or lower, or to a temperature of 50°C or higher and 60°C or lower. However, the hydrofluoric acid does not have to be heated. The chemical liquid may also include water or phosphoric acid.

The chemical solution may also contain hydrogen peroxide. The chemical solution may also contain SC1 (ammonia-hydrogen peroxide mixture), SC2 (hydrochloric acid-hydrogen peroxide mixture), or aqua regia (a mixture of concentrated hydrochloric acid and concentrated nitric acid).

Alternatively, the processing liquid may include a so-called rinse liquid. For example, the rinse liquid may include deionized water (DIW), carbonated water, electrolytic ionized water, ozone water, ammonia water, diluted hydrochloric acid water (e.g., approximately 10 ppm to 100 ppm), or reduced water (hydrogen water).

The fluid cabinet 120 defines a specific space within the substrate processing apparatus 100. In the substrate processing apparatus 100, a boundary wall BW is disposed between the area where the center robot CR and substrate processing units 10 are installed and the area where the fluid cabinet 120 is installed. The fluid cabinet 120 defines a portion of the space in the area outside the boundary wall BW of the substrate processing apparatus 100.

The fluid cabinet 120 uses a housing to partition a specific space within the substrate processing apparatus 100. The fluid cabinet 120 has fluid piping within the housing through which fluid flows. For example, the fluid cabinet 120 has processing liquid piping within the housing through which processing liquid flows. Furthermore, the fluid cabinet 120 typically has a preparation tank (tank) for preparing the processing liquid. The fluid cabinet 120 may have a preparation tank for one type of processing liquid, or may have preparation tanks for multiple types of processing liquid. Furthermore, the fluid cabinet 120 may have a pump, nozzle, and/or filter for circulating the processing liquid.

Here, the fluid cabinet 120 has a first fluid housing 122a and a second fluid housing 122b. The first fluid housing 122a and the second fluid housing 122b are arranged opposite each other. The first fluid housing 122a and the second fluid housing 122b define a specific space within the substrate processing apparatus 100. Note that in order to avoid overly complicating the drawing, Figure 1 shows the flow of fluid in the first fluid housing 122a being supplied to the tower TW corresponding to the fluid box 110 via one of the fluid boxes 110, and omits the flow of fluid in the second fluid housing 122b.

The control device 101 controls various operations of the substrate processing apparatus 100. The control device 101 includes a control unit 102 and a memory unit 104. The control unit 102 has a processor. The control unit 102 has, for example, a central processing unit (CPU). Alternatively, the control unit 102 may have a general-purpose computer.

The memory unit 104 stores data and computer programs. The data includes recipe data. The recipe data includes information indicating multiple recipes. Each of the multiple recipes specifies the processing content and processing procedure for the substrate W. The data includes exhaust conditions for exhausting the atmosphere within the fluid cabinet 120. The exhaust conditions may include standard exhaust conditions and forced exhaust conditions.

The control unit 102 exhausts the atmosphere inside the fluid cabinet 120 according to the exhaust conditions stored in the memory unit 104. For example, the control unit 102 exhausts the atmosphere inside the fluid cabinet 120 according to the standard exhaust conditions or forced exhaust conditions stored in the memory unit 104.

For example, the memory unit 104 may have a table classified according to at least one of the type of fluid and the flow rate of the fluid corresponding to the fluid cabinet 120. For example, the memory unit 104 may have a table classified according to a combination of at least one of the type of fluid and the flow rate of the fluid corresponding to the fluid cabinet 120 and an abnormal state within the fluid cabinet 120. The memory unit 104 may also have a table classified according to a combination of at least one of the type of fluid and the flow rate of the fluid corresponding to the fluid cabinet 120 and a leakage state within the fluid cabinet 120.

Furthermore, the memory unit 104 may store a predetermined reference value that serves as a standard for determining the exhaust conditions. The predetermined reference value is compared with the detection results of abnormalities within the fluid cabinet 120 to determine an abnormal state within the fluid cabinet 120. For example, the predetermined reference value may be a threshold value.

The storage unit 104 includes a main storage unit and an auxiliary storage unit. The main storage unit is, for example, a semiconductor memory. The auxiliary storage unit is, for example, a semiconductor memory and/or a hard disk drive. The storage unit 104 may also include removable media. The control unit 102 executes computer programs stored in the storage unit 104 to perform substrate processing operations.

Next, the substrate processing unit 10 in the substrate processing apparatus 100 of this embodiment will be described with reference to Figure 2. Figure 2 is a schematic diagram of the substrate processing unit 10 in the substrate processing apparatus 100.

The substrate processing unit 10 includes a chamber 12, a substrate holder 20, and a processing liquid supply unit 30. The chamber 12 accommodates a substrate W. The substrate holder 20 holds the substrate W.

The chamber 12 is roughly box-shaped and has an internal space. The chamber 12 accommodates the substrates W. Here, the substrate processing apparatus 100 is a single-wafer type that processes substrates W one by one, and the chamber 12 accommodates the substrates W one by one. The substrates W are accommodated in the chamber 12 and processed within the chamber 12. The chamber 12 accommodates at least a portion of each of the substrate holder 20 and the processing liquid supply unit 30.

The substrate holding unit 20 holds the substrate W. The substrate holding unit 20 holds the substrate W horizontally so that the top surface (front surface) Wa of the substrate W faces upward and the back surface (bottom surface) Wb of the substrate W faces vertically downward. The substrate holding unit 20 also rotates the substrate W while holding it. The substrate holding unit 20 rotates the substrate W while holding it.

For example, the substrate holding unit 20 may be a clamping type that clamps the edge of the substrate W. Alternatively, the substrate holding unit 20 may have any mechanism that holds the substrate W from its back surface Wb. For example, the substrate holding unit 20 may be a vacuum type. In this case, the substrate holding unit 20 holds the substrate W horizontally by adsorbing the central portion of the back surface Wb of the substrate W, which is the non-device formation surface, to its upper surface. Alternatively, the substrate holding unit 20 may combine a clamping type that brings multiple chuck pins into contact with the peripheral edge surface of the substrate W, with a vacuum type.

For example, the substrate holder 20 includes a spin base 21, a chuck member 22, a shaft 23, an electric motor 24, and a housing 25. The chuck member 22 is provided on the spin base 21. The chuck member 22 chucks the substrate W. Typically, the spin base 21 is provided with multiple chuck members 22.

The shaft 23 is a hollow shaft. The shaft 23 extends vertically along the rotation axis Ax. The spin base 21 is connected to the upper end of the shaft 23. The substrate W is placed above the spin base 21.

The spin base 21 is disk-shaped and supports the substrate W horizontally. The shaft 23 extends downward from the center of the spin base 21. The electric motor 24 applies rotational force to the shaft 23. The electric motor 24 rotates the shaft 23 in a rotational direction, thereby rotating the substrate W and spin base 21 around the rotation axis Ax. The housing 25 surrounds the shaft 23 and the electric motor 24.

The processing liquid supply unit 30 supplies the processing liquid to the substrate W. Typically, the processing liquid supply unit 30 supplies the processing liquid to the upper surface Wa of the substrate W.

The processing liquid supply unit 30 includes a pipe 32, a valve 34, and a nozzle 36. The nozzle 36 ejects processing liquid onto the upper surface Wa of the substrate W. The nozzle 36 is connected to the pipe 32. Processing liquid is supplied to the pipe 32 from a supply source. The valve 34 opens and closes the flow path within the pipe 32. The nozzle 36 is preferably configured to be movable relative to the substrate W. The nozzle 36 can move horizontally and/or vertically in accordance with a movement mechanism controlled by the control unit 102. Note that the movement mechanism has been omitted in this specification to avoid overly complex drawings.

Valve 34 adjusts the opening of pipe 32 to regulate the flow rate of the processing liquid supplied to pipe 32. Specifically, valve 34 includes a valve body (not shown) with a valve seat inside, a valve element that opens and closes the valve seat, and an actuator (not shown) that moves the valve element between an open position and a closed position.

The substrate processing apparatus 100 further includes a cup 80. The cup 80 collects processing liquid that has splashed from the substrate W. The cup 80 moves up and down. For example, the cup 80 moves up vertically to the side of the substrate W during the period in which the processing liquid supply unit 30 supplies processing liquid to the substrate W. In this case, the cup 80 collects processing liquid that splashes from the substrate W due to the rotation of the substrate W. Furthermore, when the period in which the processing liquid supply unit 30 supplies processing liquid to the substrate W ends, the cup 80 moves down vertically from the side of the substrate W.

As described above, the control device 101 includes a control unit 102 and a memory unit 104. The control unit 102 controls the substrate holder 20, the processing liquid supply unit 30, and/or the cup 80. In one example, the control unit 102 controls the electric motor 24 and the valve 34.

The substrate processing apparatus 100 of this embodiment is suitable for use in the fabrication of semiconductor devices having semiconductors. Typically, in semiconductor devices, conductive layers and insulating layers are stacked on a substrate. The substrate processing apparatus 100 is suitable for use in cleaning and/or processing (e.g., etching, changing characteristics, etc.) the conductive layers and/or insulating layers during the fabrication of semiconductor devices.

In the substrate processing unit 10 shown in FIG. 2, the processing liquid supply section 30 is capable of supplying one type of processing liquid to the substrate W, but the processing liquid supply section 30 may be capable of supplying multiple types of processing liquid to the substrate W. For example, the processing liquid supply section 30 may include multiple pipes 32, valves 34, and nozzles 36.

Next, the fluid cabinet 120 in the substrate processing apparatus 100 of this embodiment will be described with reference to Figures 1 to 3. Figure 3 is a schematic diagram of the fluid cabinet 120 in the substrate processing apparatus 100 of this embodiment.

As shown in FIG. 3, the fluid cabinet 120 has a housing 122, an intake port 123, an exhaust section 124, an abnormality detection section 130, a processing liquid pipe 132, and a preparation tank 134.

The housing 122 is provided with an intake port 123 and an exhaust section 124. The housing 122 also houses the abnormality detection section 130. The housing 122 separates the fluid cabinet 120.

The housing 122 has an openable door 122d. By opening the door 122d, an operator can enter the housing 122.

An air intake 123 is provided in the housing 122. Outside air is drawn into the housing 122 through the air intake 123. In this example, the air intake 123 is provided in the door 122d.

The exhaust unit 124 exhausts the atmosphere inside the housing 122. The exhaust unit 124 can exhaust the atmosphere inside the housing 122 by changing the amount of exhaust per unit time. Note that in this specification, the amount of exhaust per unit time may be simply referred to as the "exhaust amount."

An airflow is formed within the housing 122 due to the positions of the intake port 123 and the exhaust section 124 within the housing 122. The gas drawn into the housing 122 through the intake port 123 is exhausted to the outside through the exhaust section 124. To prevent gas from stagnating within the housing 122, the intake port 123 and the exhaust section 124 are preferably positioned apart from each other. For example, when the intake port 123 and the exhaust section 124 are positioned on opposing wall surfaces, it is preferable that one of the intake port 123 and the exhaust section 124 be positioned at a relatively high position and the other of the intake port 123 and the exhaust section 124 be positioned at a relatively low position. Here, the intake port 123 is positioned at approximately the same height as the bottom of the preparation tank 134, and the exhaust section 124 is positioned higher than the top of the preparation tank 134.

Furthermore, the housing 122 may be provided with one exhaust section 124 and multiple intake ports 123. This effectively prevents gas from stagnating within the housing 122.

The exhaust section 124 may have an exhaust pipe 125 and an exhaust volume adjustment mechanism 126. Typically, the air pressure inside the fluid cabinet 120 is higher than the external air pressure via the exhaust pipe 125. When the atmosphere inside the housing 122 is exhausted, the gas inside the housing 122 flows through the exhaust pipe 125 and is discharged to the outside.

The exhaust volume adjustment mechanism 126 adjusts the flow rate (exhaust volume) of gas flowing through the exhaust pipe 125. The exhaust volume adjustment mechanism 126 can increase or decrease the exhaust volume flowing through the exhaust pipe 125. The exhaust volume adjustment mechanism 126 may be disposed inside the fluid cabinet 120 or outside the fluid cabinet 120. For example, the exhaust volume adjustment mechanism 126 may be disposed at the end of the exhaust pipe 125. Alternatively, the exhaust volume adjustment mechanism 126 may be disposed inside the exhaust pipe 125.

For example, the exhaust volume adjustment mechanism 126 may include a damper that adjusts the opening of the exhaust pipe 125. Alternatively, the exhaust volume adjustment mechanism 126 may include a fan that determines the flow rate of the exhaust gas flowing through the exhaust pipe 125.

The abnormality detection unit 130 detects an abnormality within the fluid cabinet 120. Based on the detection result of the abnormality detection unit 130, the control unit 102 determines whether an abnormality has occurred within the fluid cabinet 120. For example, the abnormality detected by the abnormality detection unit 130 is a liquid leak within the fluid cabinet 120. In this case, the abnormality detection unit 130 may detect a liquid leak within the fluid cabinet 120. Alternatively, the abnormality detected by the abnormality detection unit 130 is a drop in exhaust pressure within the fluid cabinet 120. In this case, the abnormality detection unit 130 may detect the exhaust pressure.

The abnormality detection unit 130 may include a liquid detection sensor. Typically, the liquid detection sensor detects leaking processing liquid within the fluid cabinet 120.

The abnormality detection unit 130 may include a gas detection sensor. Typically, the gas detection sensor detects a leak that has occurred within the fluid cabinet 120 by detecting gas produced by evaporation of the processing liquid within the fluid cabinet 120.

The abnormality detection unit 130 may include a camera. The camera has an imaging element. Typically, the camera captures images of the inside of the fluid cabinet 120 and detects leakage that has occurred within the fluid cabinet 120 by analyzing the captured images.

The abnormality detection unit 130 may include two or more flow meters. Typically, a leak occurring within the fluid cabinet 120 may be detected based on the difference between the readings of the two or more flow meters.

The abnormality detection unit 130 includes a differential pressure gauge or manometer. The abnormality detection unit 130 may detect an abnormality in the exhaust pressure within the fluid cabinet 120 based on the difference between the air pressure within the fluid cabinet 120 and the air pressure in the exhaust pipe 125 connecting the fluid cabinet 120 to the outside.

The abnormality detection unit 130 may acquire a detection amount that is a numerical representation of the detection result. The detection amount varies depending on the degree of abnormality. Alternatively, the control unit 102 may acquire a detection amount that indicates the degree of abnormality within the fluid cabinet 120 by numerically representing the detection result from the abnormality detection unit 130.

The processing liquid pipe 132 circulates the processing liquid. Typically, the processing liquid pipe 132 connects to the processing liquid supply section 30 of the substrate processing unit 10 and circulates the processing liquid to the processing liquid supply section 30.

The preparation tank 134 stores the treatment liquid. The treatment liquid flows into the preparation tank 134 via the treatment liquid piping 132, and then flows out of the preparation tank 134 via the treatment liquid piping 132.

As described above, the control device 101 includes the control unit 102 and the memory unit 104. The control unit 102 controls the exhaust unit 124 and the abnormality detection unit 130. For example, the control unit 102 determines an abnormal state within the fluid cabinet 120 based on the detection results of the abnormality detection unit 130. In one example, the control unit 102 determines a liquid leakage state within the fluid cabinet 120 based on the detection results of the abnormality detection unit 130. Alternatively, the control unit 102 determines a drop in exhaust pressure within the fluid cabinet 120 based on the detection results of the abnormality detection unit 130. The control unit 102 determines exhaust conditions based on the abnormal state within the fluid cabinet 120 and controls the exhaust unit 124 in accordance with the determined exhaust conditions.

Next, the substrate processing apparatus 100 of this embodiment will be described with reference to Figures 1 to 4. Figure 4 is a block diagram of the substrate processing apparatus 100.

As shown in FIG. 4, the control device 101 controls various operations of the substrate processing apparatus 100. The control device 101 controls the indexer robot IR, center robot CR, substrate holding unit 20, and processing liquid supply unit 30. Specifically, the control device 101 controls the indexer robot IR, center robot CR, substrate holding unit 20, and processing liquid supply unit 30 by sending control signals to the indexer robot IR, center robot CR, substrate holding unit 20, and processing liquid supply unit 30.

Specifically, the control unit 102 controls the indexer robot IR to transfer the substrate W using the indexer robot IR.

The control unit 102 controls the center robot CR to transfer the substrate W using the center robot CR. For example, the center robot CR receives an unprocessed substrate W and transports the substrate W into one of the substrate processing units 10. The center robot CR also receives a processed substrate W from the substrate processing unit 10 and transports the substrate W out.

The control unit 102 controls the substrate holding unit 20 to start rotation of the substrate W, change the rotation speed, and stop rotation of the substrate W. For example, the control unit 102 can control the substrate holding unit 20 to change the rotation speed of the substrate holding unit 20. Specifically, the control unit 102 can change the rotation speed of the substrate W by changing the rotation speed of the electric motor 24 of the substrate holding unit 20.

The control unit 102 can control the valve 34 of the processing liquid supply unit 30 to switch the state of the valve 34 between an open state and a closed state. Specifically, the control unit 102 can control the valve 34 of the processing liquid supply unit 30 to open the valve 34, thereby allowing the processing liquid flowing through the pipe 32 toward the nozzle 36 to pass. The control unit 102 can also control the valve 34 of the processing liquid supply unit 30 to close the valve 34, thereby stopping the supply of the processing liquid flowing through the pipe 32 toward the nozzle 36.

The control unit 102 can control the exhaust of the exhaust unit 124 by switching the exhaust conditions for exhausting the atmosphere inside the fluid cabinet 120. Specifically, the control unit 102 can control the exhaust unit 124 by switching the exhaust conditions between standard exhaust conditions and forced exhaust conditions. Furthermore, the control unit 102 can determine one of a plurality of forced exhaust conditions and control the exhaust unit 124 in accordance with the determined forced exhaust condition. Note that the control unit 102 may also stop exhaust by the exhaust unit 124.

The control unit 102 can control the abnormality detection unit 130 to detect abnormalities within the fluid cabinet 120. Furthermore, the control unit 102 can determine an abnormal state within the fluid cabinet 120 based on the detection results from the abnormality detection unit 130.

The substrate processing apparatus 100 of this embodiment is suitable for use in forming semiconductor devices. For example, the substrate processing apparatus 100 is suitable for processing substrates W used as semiconductor devices with a stacked structure. Semiconductor devices are so-called 3D memory (storage devices). As an example, the substrate W is suitable for use as a NAND flash memory.

Next, the exhaust control method for the fluid cabinet 120 of this embodiment will be described with reference to Figures 1 to 5. Figures 5(a) to 5(c) are schematic diagrams for explaining the exhaust control method for the fluid cabinet 120 of this embodiment. Note that in Figures 5(a) to 5(c), the processing liquid piping 132 and preparation tank 134 are omitted for the purpose of simplifying the drawings.

As shown in FIG. 5(a), the atmosphere inside the fluid cabinet 120 is exhausted under standard exhaust conditions set to a standard exhaust volume. The control unit 102 sets the exhaust conditions to the standard exhaust conditions. For example, the standard exhaust conditions are set based on the type of processing liquid flowing through the processing liquid piping 132 inside the fluid cabinet 120 or the flow rate of the processing liquid flowing through the piping.

The exhaust unit 124 exhausts the atmosphere inside the fluid cabinet 120 under standard exhaust conditions. As the exhaust unit 124 exhausts air, air is drawn into the fluid cabinet 120 through the intake port 123. Standard exhaust prevents the atmosphere inside the housing 122 from leaking outside the housing 122.

As shown in FIG. 5(b), when an abnormality is detected in the fluid cabinet 120, the exhaust unit 124 exhausts the atmosphere within the fluid cabinet 120 under forced exhaust conditions set to a forced exhaust volume greater than the standard exhaust volume. Specifically, when an abnormality occurs within the fluid cabinet 120, the abnormality detection unit 130 detects the abnormality within the fluid cabinet 120. The control unit 102 determines the abnormal state within the fluid cabinet 120 based on the detection result of the abnormality detection unit 130. The control unit 102 determines the forced exhaust conditions according to the abnormal state. For example, the forced exhaust conditions are set based on a combination of the type of treatment liquid flowing through the treatment liquid piping 132 within the fluid cabinet 120 or the flow rate of the treatment liquid flowing through the treatment liquid piping 132, and the abnormal state. The exhaust unit 124 exhausts the atmosphere within the fluid cabinet 120 according to the determined forced exhaust conditions.

Here, the abnormality detection unit 130 detects a relatively minor abnormality within the fluid cabinet 120. In this case, the control unit 102 determines the forced exhaust conditions, which are set to a forced exhaust volume greater than the standard exhaust volume, depending on the abnormal state. The control unit 102 controls the exhaust unit 124 under the determined forced exhaust conditions, causing the exhaust unit 124 to exhaust the atmosphere within the fluid cabinet 120.

As shown in FIG. 5(c), when a relatively large abnormality occurs within the fluid cabinet 120, the exhaust unit 124 exhausts the atmosphere within the fluid cabinet 120 under forced exhaust conditions set at a forced exhaust volume greater than the standard exhaust volume. Here, when the abnormality detection unit 130 detects a relatively large abnormality within the fluid cabinet 120, the control unit 102 determines forced exhaust conditions set at an even larger forced exhaust volume in accordance with the abnormal state. The control unit 102 controls the exhaust unit 124 under the determined forced exhaust conditions, allowing the exhaust unit 124 to forcibly exhaust the atmosphere within the fluid cabinet 120.

As described above, the exhaust control method for the fluid cabinet 120 of this embodiment allows the exhaust volume of the exhaust section 124 to be controlled depending on the abnormal condition within the fluid cabinet 120. Therefore, the atmosphere within the fluid cabinet 120 can be appropriately exhausted depending on the degree of the abnormal condition within the fluid cabinet 120.

In the above description with reference to FIG. 5, the abnormal state and forced exhaust conditions within the fluid cabinet 120 are divided into two stages, but this embodiment is not limited to this. The abnormal state and forced exhaust conditions within the fluid cabinet 120 may be divided into three or more stages.

Next, the exhaust control method for the fluid cabinet 120 of this embodiment will be described with reference to Figures 1 to 6. Figure 6 is a flow diagram of the exhaust control method for the fluid cabinet 120 of this embodiment.

As shown in FIG. 6, in step S102, the atmosphere inside the fluid cabinet 120 is exhausted under standard exhaust conditions set to a standard exhaust volume. The control unit 102 sets the exhaust conditions to the standard exhaust conditions, and the exhaust unit 124 exhausts the atmosphere inside the fluid cabinet 120 in accordance with the standard exhaust conditions.

In step S104, it is determined whether an abnormality is detected within the fluid cabinet 120. If an abnormality occurs within the fluid cabinet 120, the abnormality detection unit 130 detects the abnormality.

If no abnormality is detected within the fluid cabinet 120 (No in step S104), processing returns to step S102. This allows the exhaust unit 124 to repeatedly detect and determine whether an abnormality has occurred while exhausting the atmosphere within the fluid cabinet 120 in accordance with the standard exhaust conditions. On the other hand, if an abnormality is detected within the fluid cabinet 120 (Yes in step S104), processing proceeds to step S106.

In step S106, the control unit 102 determines whether an abnormal state exists within the fluid cabinet 120. The control unit 102 determines whether an abnormal state exists within the fluid cabinet 120 based on the detection results of the abnormality detection unit 130. For example, the control unit 102 may determine whether an abnormal state exists within the fluid cabinet 120 based on the amount of detection based on the detection results of the abnormality detection unit 130.

In step S108, the control unit 102 determines the forced exhaust conditions. The control unit 102 determines the forced exhaust conditions according to the abnormal state from a plurality of forced exhaust conditions. The plurality of forced exhaust conditions are set to forced exhaust amounts greater than the standard exhaust amount. For example, the control unit 102 determines the forced exhaust conditions according to the abnormal state from two levels of forced exhaust conditions. Alternatively, the control unit 102 determines the forced exhaust conditions according to the abnormal state from three or more levels of forced exhaust conditions.

In step S110, the control unit 102 controls the exhaust unit 124 in accordance with the determined forced exhaust conditions to exhaust the atmosphere inside the fluid cabinet 120. As a result, the fluid cabinet 120 is forced to be exhausted.

In step S112, it is again determined whether an abnormality is detected within the fluid cabinet 120. If the exhaust of the processing liquid within the fluid cabinet 120 has not been completed, the abnormality detection unit 130 detects an abnormality.

If an abnormality is detected within the fluid cabinet 120 (Yes in step S112), processing returns to step S110. In this case, the exhaust unit 124 continues forcibly exhausting the fluid cabinet 120. If no abnormality is detected within the fluid cabinet 120 (No in step S112), processing proceeds to step S114.

In step S114, it is determined whether or not to terminate the exhaust process. If the control unit 102 receives an instruction to terminate the exhaust process, it terminates the exhaust process. Alternatively, if maintenance of the entire substrate processing apparatus 100 is to be performed, the control unit 102 terminates the exhaust process.

If the exhaust process is not to be terminated (No in step S114), the process returns to S102. In this case, the exhaust unit 124 exhausts the atmosphere inside the fluid cabinet 120 under standard exhaust conditions. On the other hand, if it is determined that the exhaust process is to be terminated (Yes in step S114), the process ends.

As described above, the exhaust control method for the fluid cabinet 120 of this embodiment allows the forced exhaust conditions for the fluid cabinet 120 to be changed depending on the abnormal state within the fluid cabinet 120. This allows the atmosphere within the fluid cabinet 120 to be exhausted depending on the degree of abnormality within the fluid cabinet 120.

In the explanation given with reference to Figures 1 to 6, the abnormality detection unit 130 detected an abnormality within the fluid cabinet 120, but the abnormality detection unit 130 may also detect a leak that has occurred within the fluid cabinet 120.

Next, the substrate processing apparatus 100 of this embodiment will be described with reference to Figures 1 to 7. Figure 7 is a block diagram of the substrate processing apparatus 100. The substrate processing apparatus 100 shown in Figure 7 has a similar configuration to the substrate processing apparatus 100 shown in Figure 4, except that it is equipped with a liquid leakage detection unit 130p that detects liquid leakage that occurs within the fluid cabinet 120 instead of the abnormality detection unit 130, and duplicated descriptions will be omitted to avoid redundancy.

As shown in FIG. 7, the substrate processing apparatus 100 is equipped with a liquid leakage detection unit 130p. The liquid leakage detection unit 130p detects liquid leakage within the fluid cabinet 120. Based on the detection result of the liquid leakage detection unit 130p, the control unit 102 determines the state of liquid leakage within the fluid cabinet 120.

The liquid leakage detection unit 130p may include a liquid detection sensor. Typically, the liquid detection sensor detects leaked processing liquid within the fluid cabinet 120.

The liquid leak detection unit 130p may include a gas detection sensor. Typically, the gas detection sensor detects a liquid leak that has occurred within the fluid cabinet 120 by detecting gas produced by evaporation of the processing liquid produced within the fluid cabinet 120.

The liquid leakage detection unit 130p may include a camera. The camera has an imaging element. Typically, the camera captures images of the inside of the fluid cabinet 120 and detects liquid leakage that has occurred within the fluid cabinet 120 by analyzing the captured images.

The liquid leakage detection unit 130p may include two or more flow meters. Typically, a liquid leakage occurring within the fluid cabinet 120 may be detected based on the difference between the readings of two or more flow meters.

The liquid leakage detection unit 130p may acquire a detection amount that is a quantification of the detection result. Alternatively, the control unit 102 may acquire a detection amount that indicates the degree of liquid leakage within the fluid cabinet 120 by quantification of the detection result from the liquid leakage detection unit 130p.

Next, the exhaust control method for the fluid cabinet 120 of this embodiment will be described with reference to Figures 1 to 8. Figures 8(a) to 8(c) are schematic diagrams for explaining the exhaust control method for the fluid cabinet 120 of this embodiment. Note that in Figures 8(a) to 8(c), the processing liquid piping 132 and preparation tank 134 are omitted for the purpose of simplifying the drawings.

As shown in FIG. 8(a), the atmosphere inside the fluid cabinet 120 is exhausted under standard exhaust conditions set to a standard exhaust volume. The control unit 102 sets the exhaust conditions to the standard exhaust conditions. For example, the standard exhaust conditions are set based on the type of processing liquid flowing through the processing liquid piping 132 inside the fluid cabinet 120 or the flow rate of the processing liquid flowing through the piping.

The exhaust unit 124 exhausts the atmosphere inside the fluid cabinet 120 under standard exhaust conditions. As the exhaust unit 124 exhausts air, air is drawn into the fluid cabinet 120 through the intake port 123. Standard exhaust prevents the atmosphere inside the housing 122 from leaking outside the housing 122.

As shown in FIG. 8(b), when processing liquid leaks within the fluid cabinet 120, the exhaust unit 124 exhausts the atmosphere within the fluid cabinet 120 under forced exhaust conditions set to a forced exhaust volume greater than the standard exhaust volume. Specifically, when processing liquid leaks within the fluid cabinet 120, the liquid leakage detection unit 130p detects the leakage within the fluid cabinet 120. The control unit 102 determines the leakage state within the fluid cabinet 120 based on the detection result of the liquid leakage detection unit 130p. The control unit 102 determines the forced exhaust conditions according to the leakage state. For example, the forced exhaust conditions are set based on a combination of the type of processing liquid flowing through the processing liquid piping 132 within the fluid cabinet 120 or the flow rate of the processing liquid flowing through the processing liquid piping 132, and the leakage state. The exhaust unit 124 exhausts the atmosphere within the fluid cabinet 120 according to the determined forced exhaust conditions.

Here, the leak detection unit 130p detects a small amount of processing liquid inside the fluid cabinet 120. In this case, the control unit 102 determines the forced exhaust conditions, which are set to a forced exhaust volume greater than the standard exhaust volume, depending on the leak state. The control unit 102 controls the exhaust unit 124 under the determined forced exhaust conditions, causing the exhaust unit 124 to exhaust the atmosphere inside the fluid cabinet 120.

As shown in FIG. 8(c), when a large amount of processing liquid leaks within the fluid cabinet 120, the exhaust unit 124 exhausts the atmosphere within the fluid cabinet 120 under forced exhaust conditions set to a forced exhaust volume greater than the standard exhaust volume. Here, when the leakage detection unit 130p detects a large amount of liquid leakage within the fluid cabinet 120, the control unit 102 determines forced exhaust conditions set to an even greater forced exhaust volume depending on the state of the liquid leakage. The control unit 102 controls the exhaust unit 124 under the determined forced exhaust conditions, allowing the exhaust unit 124 to forcibly exhaust the atmosphere within the fluid cabinet 120.

As described above, the exhaust control method for the fluid cabinet 120 of this embodiment allows the exhaust volume of the exhaust unit 124 to be controlled according to the leakage state within the fluid cabinet 120. Therefore, the atmosphere within the fluid cabinet 120 can be appropriately exhausted according to the amount of processing liquid that has leaked within the fluid cabinet 120.

In the above description with reference to Figure 8, the leakage state and forced exhaust conditions within the fluid cabinet 120 were divided into two stages, but this embodiment is not limited to this. The leakage state and forced exhaust conditions within the fluid cabinet 120 may also be divided into three or more stages.

Next, referring to Figures 1 to 9, we will explain the change in the detection amount over time and changes in the exhaust conditions in the exhaust control method for the fluid cabinet 120 according to this embodiment. Figures 9(a) and 9(b) are graphs showing the change in the detection amount over time in the exhaust control method for the fluid cabinet 120 according to this embodiment. In the graphs of Figures 9(a) and 9(b), the horizontal axis represents time, and the vertical axis represents the detection amount, which is a numerical representation of the detection state. The greater the amount of processing liquid leaked within the fluid cabinet 120, the higher the value of the detection amount.

As shown in Figure 9(a), initially, there is no leakage of processing liquid within the fluid cabinet 120. At this time, the control unit 102 sets the exhaust conditions to standard exhaust conditions, and the exhaust unit 124 exhausts the atmosphere within the fluid cabinet 120 under standard exhaust conditions. Under standard exhaust conditions, the atmosphere within the fluid cabinet 120 is exhausted at a standard exhaust rate.

When processing liquid begins to leak inside the fluid cabinet 120 after a predetermined time has passed, the detected amount increases. When the detected amount exceeds threshold value t1, the exhaust conditions are changed from standard exhaust conditions to forced exhaust conditions. Threshold value t1 is used as a criterion for determining whether or not there is a leak inside the fluid cabinet 120. Threshold value t1 is an example of a predetermined reference value.

The control unit 102 changes the exhaust conditions from standard exhaust conditions to forced exhaust conditions, and the exhaust unit 124 exhausts the atmosphere inside the fluid cabinet 120 in accordance with the forced exhaust conditions. The exhaust volume under the forced exhaust conditions is greater than the standard exhaust volume. Thereafter, the detection volume begins to decrease due to the forced exhaust in accordance with the forced exhaust conditions.

When the detected amount falls below threshold t1, the exhaust conditions change from forced exhaust conditions to standard exhaust conditions. Specifically, when the detected amount falls below threshold t1, the control unit 102 changes the exhaust conditions from forced exhaust conditions to standard exhaust conditions, and the exhaust unit 124 exhausts the atmosphere inside the fluid cabinet 120 in accordance with the standard exhaust conditions. The exhaust volume under the standard exhaust conditions is smaller than the forced exhaust volume.

In this embodiment, the atmosphere inside the fluid cabinet 120 can be efficiently evacuated by changing the forced exhaust conditions depending on the detected amount indicating a leakage state inside the fluid cabinet 120. As described above, the exhaust conditions may be switched between standard exhaust conditions and forced exhaust conditions depending on whether the detected amount exceeds the threshold value t1.

In Figure 9(a), the detected amount indicating the amount of processing liquid leaked within the fluid cabinet 120 was relatively small, but it is possible that even more processing liquid may leak within the fluid cabinet 120. For example, if a large amount of processing liquid leaks from the processing liquid piping 132 within the fluid cabinet 120, the detected amount cannot be reduced unless the exhaust volume is significantly increased.

As shown in Figure 9(b), initially, there is no leakage of processing liquid within the fluid cabinet 120. At this time, the control unit 102 sets the exhaust conditions to standard exhaust conditions, and the exhaust unit 124 exhausts the atmosphere within the fluid cabinet 120 under standard exhaust conditions. Under standard exhaust conditions, the atmosphere within the fluid cabinet 120 is exhausted at a standard exhaust rate. Therefore, the detection amount is maintained at a low value.

When the processing liquid begins to leak inside the fluid cabinet 120 after a predetermined time has passed, the detected amount increases. For example, when the detected amount exceeds threshold value t1, the control unit 102 changes the exhaust conditions from standard exhaust conditions to first forced exhaust conditions, and the exhaust unit 124 exhausts the atmosphere inside the fluid cabinet 120 in accordance with the first forced exhaust conditions. Here, the exhaust unit 124 exhausts the atmosphere inside the fluid cabinet 120 under the first forced exhaust conditions, which are set to a first forced exhaust volume that is greater than the standard exhaust volume. By changing the exhaust conditions from standard exhaust conditions to the first forced exhaust conditions, the slope of the increase in the detected amount decreases, but the detected amount itself increases.

After that, when the detected amount exceeds the threshold value t2, the control unit 102 changes the exhaust conditions from the first forced exhaust conditions to the second forced exhaust conditions, and the exhaust unit 124 exhausts the atmosphere inside the fluid cabinet 120 in accordance with the second forced exhaust conditions. The threshold value t2 is an example of a predetermined reference value. Here, the exhaust unit 124 exhausts the atmosphere inside the fluid cabinet 120 under the second forced exhaust conditions, which are set to a second forced exhaust volume that is greater than the first forced exhaust volume. As the exhaust conditions change from the first forced exhaust conditions to the second forced exhaust conditions, the detected amount itself also begins to decrease.

After that, when the detected amount falls below threshold value t2, the control unit 102 changes the exhaust conditions from the second forced exhaust conditions to the third forced exhaust conditions, and the exhaust unit 124 exhausts the atmosphere inside the fluid cabinet 120 in accordance with the third forced exhaust conditions. Here, the exhaust unit 124 exhausts the atmosphere inside the fluid cabinet 120 under the third forced exhaust conditions, which are set to a third forced exhaust volume. The third forced exhaust volume is smaller than the second forced exhaust volume and larger than the standard exhaust volume. Note that the third forced exhaust volume may be equal to the first forced exhaust volume, and the third forced exhaust condition may be equal to the first forced exhaust condition. By changing the exhaust conditions from the second forced exhaust condition to the third forced exhaust condition, the detected amount itself continues to decrease, but the slope of the decrease in the detected amount slows.

After that, when the detected amount falls below threshold value t1, the control unit 102 changes the exhaust conditions from the third forced exhaust conditions to the standard exhaust conditions, and the exhaust unit 124 exhausts the atmosphere inside the fluid cabinet 120 in accordance with the standard exhaust conditions. Here, the exhaust unit 124 exhausts the atmosphere inside the fluid cabinet 120 under the standard exhaust conditions, which are set to a standard exhaust volume that is smaller than the third forced exhaust volume. By changing the exhaust conditions from the third forced exhaust conditions to the standard exhaust conditions, the slope of the decrease in the detected amount further slows.

As described above, by changing the forced exhaust conditions according to the detected amount indicating the leakage state within the fluid cabinet 120, the atmosphere within the fluid cabinet 120 can be efficiently exhausted according to the environment of the fluid cabinet 120.

Next, the exhaust control method for the fluid cabinet 120 of this embodiment will be described with reference to Figures 1 to 10. Figure 10 is a flow diagram of the exhaust control method for the fluid cabinet 120 of this embodiment.

As shown in FIG. 10, in step S102, the atmosphere inside the fluid cabinet 120 is exhausted under standard exhaust conditions set to a standard exhaust volume. The control unit 102 sets the exhaust conditions to the standard exhaust conditions, and the exhaust unit 124 exhausts the atmosphere inside the fluid cabinet 120 in accordance with the standard exhaust conditions.

In step S104, it is determined whether a leak is detected within the fluid cabinet 120. If a processing liquid leaks within the fluid cabinet 120, the leak detection unit 130p detects the leak.

If the liquid leakage detection unit 130p includes a liquid detection sensor, the liquid leakage detection unit 130p detects processing liquid leaking from the processing liquid pipe 132. The liquid leakage detection unit 130p may also detect the amount of processing liquid that has come into contact with the liquid detection sensor.

If the liquid leakage detection unit 130p includes a gas detection sensor, the liquid leakage detection unit 130p detects gas generated within the fluid cabinet 120. The gas detection sensor may detect the concentration of gas in the treatment liquid generated within the fluid cabinet 120.

If the liquid leakage detection unit 130p includes a camera, the liquid leakage detection unit 130p captures images of the inside of the fluid cabinet 120. The camera or the control unit 102 may detect a liquid leakage inside the fluid cabinet 120 by processing the captured images.

A liquid with a temperature higher than room temperature may be used as the processing liquid. In this case, the liquid leakage detection unit 130p may include a temperature sensor. If the liquid leakage detection unit 130p includes a temperature sensor, the liquid leakage detection unit 130p measures the temperature inside the fluid cabinet 120. In this case, if the processing liquid leaks inside the fluid cabinet 120, the leak can be detected by the temperature sensor. The temperature sensor may be of a contact type or a non-contact type. The temperature sensor may detect infrared rays emitted by the processing liquid.

If no leakage is detected within the fluid cabinet 120 (No in step S104), processing returns to step S102. This allows the exhaust unit 124 to repeatedly detect and determine leakage while exhausting the atmosphere within the fluid cabinet 120 according to standard exhaust conditions. On the other hand, if leakage is detected within the fluid cabinet 120 (Yes in step S104), processing proceeds to step S106.

In step S106, the control unit 102 determines the leakage state within the fluid cabinet 120. The control unit 102 determines the leakage state within the fluid cabinet 120 based on the detection results of the leakage detection unit 130p. For example, the control unit 102 may determine the leakage state within the fluid cabinet 120 based on the detection amount based on the detection results of the leakage detection unit 130p.

In step S108, the control unit 102 determines the forced exhaust conditions. The control unit 102 determines the forced exhaust conditions according to the leakage state from a plurality of forced exhaust conditions. The plurality of forced exhaust conditions are set to forced exhaust amounts greater than the standard exhaust amount. For example, the control unit 102 determines the forced exhaust conditions according to the leakage state from two levels of forced exhaust conditions. Alternatively, the control unit 102 determines the forced exhaust conditions according to the leakage state from three or more levels of forced exhaust conditions.

In step S110, the control unit 102 controls the exhaust unit 124 in accordance with the determined forced exhaust conditions to exhaust the atmosphere inside the fluid cabinet 120. As a result, the fluid cabinet 120 is forced to be exhausted.

In step S112, it is again determined whether a leak is detected within the fluid cabinet 120. If the exhaust of the processing liquid within the fluid cabinet 120 has not been completed, the leak detection unit 130p detects a leak.

If a leak is detected in the fluid cabinet 120 (Yes in step S112), processing returns to step S110. In this case, the exhaust unit 124 continues forcibly exhausting the fluid cabinet 120. If a leak is not detected in the fluid cabinet 120 (No in step S112), processing proceeds to step S114.

In step S114, it is determined whether or not to terminate the exhaust process. If the control unit 102 receives an instruction to terminate the exhaust process, it terminates the exhaust process. Alternatively, if maintenance of the entire substrate processing apparatus 100 is to be performed, the control unit 102 terminates the exhaust process.

If the exhaust process is not to be terminated (No in step S114), the process returns to S102. In this case, the exhaust unit 124 exhausts the atmosphere inside the fluid cabinet 120 under standard exhaust conditions. On the other hand, if it is determined that the exhaust process is to be terminated (Yes in step S114), the process ends.

As described above, the exhaust control method for the fluid cabinet 120 of this embodiment allows the forced exhaust conditions for the fluid cabinet 120 to be changed depending on the leakage state within the fluid cabinet 120. This allows the atmosphere within the fluid cabinet 120 to be exhausted depending on the level of leakage within the fluid cabinet 120.

Note that in the above description with reference to the graphs in Figures 9(a) and 9(b), the exhaust conditions were changed immediately in response to changes in the detected amount, but this embodiment is not limited to this. The exhaust conditions do not have to be changed immediately in response to changes in the detected amount.

Next, with reference to Figures 1 to 11, we will explain the changes in the detected amount over time and changes in the exhaust conditions in the exhaust control method for the fluid cabinet 120 according to this embodiment. Figures 11(a) and 11(b) are graphs showing the changes in the detected amount over time in the exhaust control method for the fluid cabinet 120 according to this embodiment.

As shown in Figure 11(a), initially, there is no leakage of processing liquid within the fluid cabinet 120. At this time, the control unit 102 sets the exhaust conditions to standard exhaust conditions, and the exhaust unit 124 exhausts the atmosphere within the fluid cabinet 120 under standard exhaust conditions. Under standard exhaust conditions, the atmosphere within the fluid cabinet 120 is exhausted at a standard exhaust rate. Therefore, the detection amount is maintained at a low value.

When processing liquid begins to leak inside the fluid cabinet 120 after a predetermined time has passed, the detected amount increases. Here, even if the detected amount exceeds threshold t1, the exhaust conditions are not immediately changed and the detected amount continues to be acquired for a predetermined time. The exhaust conditions are then controlled according to the detected amount after a predetermined time Ta has passed since the detected amount exceeded threshold t1. Here, because the detected amount after the predetermined time Ta is higher than threshold t1 and lower than threshold t2, the control unit 102 changes the exhaust conditions to forced exhaust conditions according to the detected amount, and the exhaust unit 124 exhausts the atmosphere inside the fluid cabinet 120 under forced exhaust conditions set to a forced exhaust volume greater than the standard exhaust volume. By changing the exhaust conditions from standard exhaust conditions to forced exhaust conditions, the detected amount itself begins to decrease.

After that, when the detected amount falls below threshold value t1, the control unit 102 changes the exhaust conditions from forced exhaust conditions to standard exhaust conditions, and the exhaust unit 124 exhausts the atmosphere inside the fluid cabinet 120 under standard exhaust conditions. Even when the exhaust conditions are changed from forced exhaust conditions to standard exhaust conditions, the detected amount further decreases. However, the change in exhaust conditions reduces the slope of the decrease in the detected amount.

In the graph shown in Figure 11(a), the exhaust conditions are changed so that the exhaust volume increases after a predetermined time has elapsed since the detected amount exceeded threshold value t1, but this embodiment is not limited to this. The exhaust conditions may be changed so that the exhaust volume increases after the detected amount reaches the threshold value, and then changed so that the exhaust volume decreases after a predetermined period of time has elapsed since the exhaust conditions were changed.

As shown in Figure 11 (b), initially, there is no leakage of processing liquid within the fluid cabinet 120. At this time, the control unit 102 sets the exhaust conditions to standard exhaust conditions, and the exhaust unit 124 exhausts the atmosphere within the fluid cabinet 120 under standard exhaust conditions. Under standard exhaust conditions, the atmosphere within the fluid cabinet 120 is exhausted at a standard exhaust rate. Therefore, the detection amount is maintained at a low value.

When the processing liquid begins to leak inside the fluid cabinet 120 after a predetermined time has passed, the detected amount increases. Here, even if the detected amount exceeds threshold value t1, the control unit 102 does not immediately change the exhaust conditions, but continues to acquire the detected amount for a predetermined time. The control unit 102 then changes the exhaust conditions after the detected amount exceeds threshold value t2. In this case, when the detected amount exceeds threshold value t2, the control unit 102 changes the exhaust conditions from standard exhaust conditions to first forced exhaust conditions, and the exhaust unit 124 exhausts the atmosphere inside the fluid cabinet 120 in accordance with the first forced exhaust conditions. Here, the exhaust unit 124 exhausts the atmosphere inside the fluid cabinet 120 under the first forced exhaust conditions, which are set to a first forced exhaust volume that is greater than the standard exhaust volume. The detected amount also increases once the exhaust conditions are changed from standard exhaust conditions to first forced exhaust conditions, and then begins to decrease.

After that, even if the detected amount decreases and reaches threshold value t2, the control unit 102 does not immediately change the exhaust conditions and continues to acquire the detected amount for a predetermined time. The control unit 102 then controls the exhaust conditions according to the detected amount acquired a predetermined time Tb after the detected amount reached threshold value t1. In this embodiment, because the detected amount after predetermined time Tb is lower than threshold value t1, the control unit 102 changes the exhaust conditions from the first forced exhaust conditions to the second forced exhaust conditions, and the exhaust unit 124 exhausts the atmosphere inside the fluid cabinet 120 under the second forced exhaust conditions. Here, the exhaust unit 124 exhausts the atmosphere inside the fluid cabinet 120 under the second forced exhaust conditions, which are set to a second forced exhaust volume that is greater than the standard exhaust volume and smaller than the first forced exhaust volume. Even when the exhaust conditions are changed from the first forced exhaust conditions to the second forced exhaust conditions, the detected amount itself continues to decrease.

The exhaust conditions are then controlled according to the detected amount obtained after a predetermined time Tc has elapsed since the exhaust conditions were changed from the first forced exhaust conditions to the second forced exhaust conditions. In this embodiment, because the detected amount after the predetermined time Tc is lower than the threshold value t1, the control unit 102 changes the exhaust conditions from the second forced exhaust conditions to the standard exhaust conditions, and the exhaust unit 124 exhausts the atmosphere inside the fluid cabinet 120 under the standard exhaust conditions, which are set to a standard exhaust volume smaller than the second forced exhaust volume. Typically, even when the exhaust conditions are changed from the second forced exhaust conditions to the standard exhaust conditions, the detected amount further decreases. However, the change in exhaust conditions further reduces the slope of the decrease in the detected amount.

Next, with reference to Figures 1 to 12 (mainly Figures 11(b) and 12), the exhaust control method for the fluid cabinet 120 of this embodiment will be described. Figure 12 is a flow diagram of the exhaust control method for the fluid cabinet 120 of this embodiment. The flow diagram of Figure 12 has similar steps to the flow diagram shown in Figure 10, except that the forced exhaust process (step S110) is divided into multiple steps, and duplicated explanations will be omitted to avoid redundancy.

As shown in Figure 12, steps S102 to S106 are similar to steps S102 to S106 shown in Figure 10, and therefore their explanation will be omitted.

In step S108, the control unit 102 determines the forced exhaust conditions. The control unit 102 determines the forced exhaust conditions according to the leakage state. For example, the control unit 102 determines the forced exhaust conditions according to the leakage state from two or more stages of forced exhaust conditions according to the leakage state.

In step S110, the control unit 102 controls the exhaust unit 124 in accordance with the determined forced exhaust conditions to exhaust the atmosphere inside the fluid cabinet 120. Therefore, the fluid cabinet 120 is forcibly exhausted under forced exhaust conditions set to a forced exhaust volume greater than the standard exhaust volume.

In detail, in step S110a, the exhaust conditions are controlled based on the detected amount. For example, when the detected amount exceeds threshold value t2, the control unit 102 changes the exhaust conditions from the standard exhaust conditions to the first forced exhaust conditions, and the exhaust unit 124 exhausts the atmosphere inside the fluid cabinet 120 under the first forced exhaust conditions. The exhaust volume under the first forced exhaust conditions is greater than the exhaust volume under the standard exhaust conditions.

In step S110b, it is determined whether the predetermined time Tb has elapsed. If the predetermined time Tb has not elapsed (No in step S110b), processing returns to step S110a. Therefore, forced exhaust continues until the predetermined time Tb has elapsed. If the predetermined time Tb has elapsed (Yes in step S110b), processing proceeds to step S110c.

In step S110c, it is determined whether a liquid leak is detected in the fluid cabinet 120. If a liquid leak occurs in the fluid cabinet 120, the liquid leak detection unit 130p detects the liquid leak. For example, the control unit 102 determines whether the detected amount is lower than the threshold value t1.

If a leak is detected in the fluid cabinet 120 (Yes in step S110c), processing returns to step S110a. In this case, the control unit 102 continues forcibly evacuating the fluid cabinet 120. If a leak is not detected in the fluid cabinet 120 (No in step S110c), processing proceeds to step S110d.

In step S110d, the exhaust conditions are changed from the first forced exhaust conditions to the second forced exhaust conditions. Here, the second forced exhaust amount set in the second forced exhaust conditions is larger than the standard exhaust amount and smaller than the first forced exhaust amount.

In step S110e, it is determined whether the predetermined time Tc has elapsed. If the predetermined time Tc has not elapsed (No in step S110e), processing returns to step S110d. In this case, the exhaust unit 124 continues to exhaust the atmosphere inside the fluid cabinet 120 under the second forced exhaust condition until the predetermined time Tc has elapsed. If the predetermined time Tc has elapsed (Yes in step S110e), processing proceeds to step S112.

The steps from step S112 onwards are the same as those described above with reference to Figure 10. As described above, according to the method for controlling exhaust of the fluid cabinet 120 of this embodiment, the amount of exhaust from the fluid cabinet 120 can be controlled in accordance with the state of leakage within the fluid cabinet 120. Furthermore, in this embodiment, the exhaust conditions are changed based on the detected amount after a predetermined time has elapsed, so excessive changes to the exhaust conditions in accordance with fluctuations in the detected amount can be prevented.

In the above description with reference to the graphs shown in Figures 9(a), 9(b), 11(a), and 11(b), the exhaust conditions were changed based on the detected amount and/or elapsed time, but this embodiment is not limited to this. The exhaust conditions may also be changed based on changes in the detected state over time.

Next, with reference to Figures 1 to 13, we will explain the changes in the detected amount over time and changes in the exhaust conditions in the exhaust control method for the fluid cabinet 120 according to this embodiment. Figures 13(a) and 13(b) are graphs showing the changes in the detected amount over time in the exhaust control method for the fluid cabinet 120 according to this embodiment.

As shown in Figure 13(a), initially, there is no leakage of processing liquid within the fluid cabinet 120. At this time, the control unit 102 sets the exhaust conditions to standard exhaust conditions, and the exhaust unit 124 exhausts the atmosphere within the fluid cabinet 120 under standard exhaust conditions. Under standard exhaust conditions, the atmosphere within the fluid cabinet 120 is exhausted at a standard exhaust rate. Therefore, the detection amount is maintained at a low value.

When the processing liquid begins to leak inside the fluid cabinet 120 after a predetermined time has passed, the detected amount increases. When the detected amount exceeds threshold value t1, the control unit 102 changes the exhaust conditions from standard exhaust conditions to forced exhaust conditions, and the exhaust unit 124 exhausts the atmosphere inside the fluid cabinet 120 under forced exhaust conditions. The exhaust volume under forced exhaust conditions is greater than the exhaust volume under standard exhaust conditions. Thereafter, the detected amount begins to decrease due to forced exhaust under forced exhaust conditions.

Here, forced exhaust causes the detected amount to decrease quickly. For example, the ratio (ΔS/ΔT) of the difference (ΔS) between the peak value of the detected amount and the threshold value t1 and the time (ΔT) from when the detected amount reaches its peak value to when it reaches the threshold value t1 is greater than the ratio threshold.

In this case, when the detected amount falls below threshold value t1, the exhaust conditions are changed back from forced exhaust conditions to standard exhaust conditions. Specifically, the control unit 102 changes the exhaust conditions from forced exhaust conditions to standard exhaust conditions, and the exhaust unit 124 exhausts the atmosphere inside the fluid cabinet 120 under the standard exhaust conditions. Here, the exhaust unit 124 exhausts the atmosphere inside the fluid cabinet 120 under the standard exhaust conditions, which are set to a standard exhaust volume that is smaller than the forced exhaust volume. Even when the exhaust conditions are changed from forced exhaust conditions to standard exhaust conditions, the detected amount further decreases. However, the change in exhaust conditions reduces the slope of the decrease in the detected amount.

In the above description with reference to the graph shown in Figure 13(a), the exhaust conditions were changed when the detected amount fell below threshold t1, but this embodiment is not limited to this. The exhaust conditions may be changed based not only on the detected amount but also on changes in the detected amount over time.

As shown in Figure 13(b), initially, there is no leakage of processing liquid within the fluid cabinet 120. At this time, the control unit 102 sets the exhaust conditions to standard exhaust conditions, and the exhaust unit 124 exhausts the atmosphere within the fluid cabinet 120 under standard exhaust conditions. Under standard exhaust conditions, the atmosphere within the fluid cabinet 120 is exhausted at a standard exhaust rate. Therefore, the detection amount is maintained at a low value.

When the processing liquid begins to leak inside the fluid cabinet 120 after a predetermined time has passed, the detected amount increases. When the detected amount exceeds threshold value t1, the exhaust conditions are changed from standard exhaust conditions to forced exhaust conditions. The exhaust amount under forced exhaust conditions is greater than the standard exhaust amount. Thereafter, the detected amount begins to decrease due to forced exhaust according to the forced exhaust conditions.

Here too, forced exhaust shows a tendency for the detected amount to decrease. However, the detected amount fluctuates significantly over time, and the detected amount gradually decreases while fluctuating. The ratio (ΔS/ΔT) of the difference (ΔS) between the peak value of the detected amount and threshold value t1 and the time (ΔT) from the time when the detected amount reaches its peak value to the time when it reaches threshold value t1 is smaller than the ratio threshold.

In this case, even if the detected amount reaches threshold value t1, the control unit 102 does not change the exhaust conditions back from forced exhaust conditions to standard exhaust conditions. Therefore, even if the detected amount reaches threshold value t1, the control unit 102 maintains the exhaust conditions as forced exhaust conditions, and the exhaust unit 124 continues to exhaust the atmosphere inside the fluid cabinet 120 under forced exhaust conditions.

Here, when the detected amount reaches a threshold value t1s that is lower than the threshold value t1, the control unit 102 changes the exhaust conditions from forced exhaust conditions to standard exhaust conditions, and the exhaust unit 124 exhausts the atmosphere inside the fluid cabinet 120 under the standard exhaust conditions. In this case, the exhaust unit 124 exhausts the atmosphere inside the fluid cabinet 120 under the standard exhaust conditions, which are set to a standard exhaust volume that is smaller than the forced exhaust volume. Even when the exhaust conditions are changed from forced exhaust conditions to standard exhaust conditions, the detected amount further decreases. However, the change in exhaust conditions reduces the slope of the decrease in the detected amount.

As described above with reference to Figures 13(a) and 13(b), the conditions for changing the exhaust conditions may be changed based on the ratio (ΔS/ΔT) of the difference (ΔS) between the peak value of the plate detection amount and threshold value t1 and the time (ΔT) from the time when the detection amount reaches its peak value to the time when it reaches threshold value t1. In this way, it may be determined whether to return the exhaust conditions from the restricted exhaust conditions to the standard exhaust conditions based on the pattern of changes in the leakage state over time.

In the fluid cabinet 120, the exhaust volume adjustment mechanism 126 may be a damper that adjusts the opening of the exhaust pipe 125.

Next, the exhaust control method for the fluid cabinet 120 according to this embodiment will be described with reference to Figure 14. Figures 14(a) to 14(c) are schematic diagrams for explaining the exhaust control method for the fluid cabinet 120 according to this embodiment.

As shown in FIG. 14(a), the exhaust section 124 has an exhaust pipe 125 and a damper 127. When the atmosphere inside the housing 122 is exhausted, the air inside the housing 122 flows through the exhaust pipe 125. The damper 127 controls the opening degree of the exhaust pipe 125. The damper 127 functions as an exhaust volume adjustment mechanism for the exhaust pipe 125. The opening degree of the damper 127 may be controlled by a cylinder or a motor. Alternatively, the opening degree of the damper 127 may be controlled by turning off a lock pin.

Here, the damper 127 is located outside the exhaust pipe 125. Specifically, the damper 127 is disposed in a position that covers the end of the exhaust pipe 125. The opening degree of the damper 127 is controlled by the control unit 102.

In Figure 14(a), no leakage has been detected within the fluid cabinet 120. Therefore, the atmosphere within the fluid cabinet 120 is exhausted under standard exhaust conditions set to a standard exhaust volume. The control unit 102 controls the opening of the damper 127 to a relatively narrow value, causing the exhaust unit 124 to exhaust the atmosphere within the fluid cabinet 120 under standard exhaust conditions. As the exhaust unit 124 exhausts air, air is drawn into the fluid cabinet 120 through the intake port 123.

As shown in FIG. 14(b), when processing liquid leaks inside the fluid cabinet 120, the exhaust unit 124 exhausts the atmosphere inside the fluid cabinet 120 under forced exhaust conditions set to a forced exhaust volume greater than the standard exhaust volume. Specifically, when processing liquid leaks inside the fluid cabinet 120, the liquid leakage detection unit 130p detects leakage inside the fluid cabinet 120. The control unit 102 determines the leakage state inside the fluid cabinet 120 based on the detection result of the liquid leakage detection unit 130p. The control unit 102 determines the forced exhaust conditions according to the leakage state and increases the opening of the damper 127. The exhaust unit 124 exhausts the atmosphere inside the fluid cabinet 120 according to the determined forced exhaust conditions.

Here, the leak detection unit 130p detects a small amount of processing liquid inside the fluid cabinet 120. In this case, the control unit 102 determines the forced exhaust conditions, which are set to a forced exhaust volume greater than the standard exhaust volume, depending on the leak state. The control unit 102 controls the exhaust unit 124 under the determined forced exhaust conditions, causing the exhaust unit 124 to exhaust the atmosphere inside the fluid cabinet 120.

As shown in FIG. 14(c), when a large amount of processing liquid leaks within the fluid cabinet 120, the exhaust unit 124 exhausts the atmosphere within the fluid cabinet 120 under forced exhaust conditions set to a forced exhaust volume greater than the standard exhaust volume. Here, when the leakage detection unit 130p detects a large amount of liquid leakage within the fluid cabinet 120, the control unit 102 determines forced exhaust conditions set to an even greater forced exhaust volume depending on the state of the leakage. In this case, the control unit 102 further widens the opening of the damper 127. The control unit 102 controls the exhaust unit 124 under the determined forced exhaust conditions, allowing the exhaust unit 124 to forcibly exhaust the atmosphere within the fluid cabinet 120.

As described above, according to the method for controlling exhaust of the fluid cabinet 120 of this embodiment, the amount of exhaust from the exhaust section 124 can be controlled by adjusting the opening degree of the damper 127 depending on the leakage state within the fluid cabinet 120. Therefore, the atmosphere within the fluid cabinet 120 can be appropriately exhausted depending on the amount of processing liquid that has leaked within the fluid cabinet 120.

In the above description with reference to Figures 1 to 14, the exhaust unit 124 exhausts the atmosphere inside the fluid cabinet 120, causing air to be drawn into the fluid cabinet 120 through the intake port 123, but this embodiment is not limited to this. Gas may also be supplied into the fluid cabinet 120 as the exhaust unit 124 exhausts air.

Next, the exhaust control method for the fluid cabinet 120 of this embodiment will be described with reference to Figures 1 to 15. Figures 15(a) to 15(c) are schematic diagrams for explaining the exhaust control method for the fluid cabinet 120 of this embodiment.

15(a), the exhaust unit 124 further includes an air supply unit 128. The air supply unit 128 is disposed within the housing 112. The air supply unit 128 supplies gas to the fluid cabinet 120. Here, the fluid cabinet 120 does not have an air intake port 123. As described above, the damper 127 exhausts the atmosphere within the fluid cabinet 120 depending on its opening degree, but supplies air to the fluid cabinet 120 via the air supply unit 128. By supplying air to the fluid cabinet 120 via the air supply unit 128, the amount of exhaust air from the atmosphere within the fluid cabinet 120 to the outside can be controlled even if the opening degree of the damper 127 is constant. In one example, even if the opening degree of the damper 127 is maintained constant while the damper 127 is open, the air supply unit 128 can supply a predetermined amount of gas to the fluid cabinet 120, thereby exhausting the atmosphere within the fluid cabinet 120 to the outside.

The air supply unit 128 may supply an inert gas. The inert gas may include nitrogen. Alternatively, the air supply unit 128 may supply air. In this case, the air supply unit 128 may supply air used for the downflow in the clean room.

Because the fluid cabinet 120 does not have an air intake vent 123, even if the treatment liquid leaks inside the fluid cabinet 120, the treatment liquid can be prevented from leaking to the outside. Furthermore, external light can be prevented from entering the fluid cabinet 120, preventing fluctuations in the characteristics of the treatment liquid.

For example, the exhaust unit 124 exhausts the atmosphere inside the fluid cabinet 120 at a standard exhaust rate, and the air supply unit 128 supplies air to the fluid cabinet 120 at a standard air supply rate. This allows the air pressure inside the fluid cabinet 120 to be maintained at a constant level.

As shown in Figure 15(b), when a leak occurs within the fluid cabinet 120, the exhaust unit 124 exhausts the atmosphere within the fluid cabinet 120 at a forced exhaust rate that is greater than the standard exhaust rate.

Here, the leak detection unit 130p detects a small amount of leak within the fluid cabinet 120. In this case, the control unit 102 determines forced exhaust conditions that are set to a forced exhaust volume greater than the standard exhaust volume depending on the leak state, and the exhaust unit 124 exhausts the atmosphere within the fluid cabinet 120 under the forced exhaust conditions. The control unit 102 also sets a forced air supply volume greater than the standard air supply volume depending on the leak state, and the air supply unit 128 supplies air into the fluid cabinet 120 at the forced air supply volume. The control unit 102 controls the exhaust unit 124 under the determined forced exhaust conditions and the air supply unit 128 at the set forced air supply volume, thereby allowing the exhaust unit 124 to purify the atmosphere within the fluid cabinet 120.

As shown in FIG. 15(c), when a relatively large amount of processing liquid leaks within the fluid cabinet 120, the exhaust unit 124 exhausts the atmosphere within the fluid cabinet 120 at an exhaust rate greater than the standard exhaust rate. Here, the leak detection unit 130p detects a large amount of liquid leakage within the fluid cabinet 120. In this case, the control unit 102 sets a forced exhaust rate greater than the standard exhaust rate depending on the state of the liquid leakage. Furthermore, the air supply unit 128 supplies air to the fluid cabinet 120 at an even greater supply rate depending on the state of the liquid leakage. The control unit 102 controls the exhaust unit 124 according to the determined forced exhaust conditions and the air supply unit 128 at the set air supply rate, thereby allowing the exhaust unit 124 to exhaust the atmosphere within the fluid cabinet 120.

In the above description with reference to Figure 15, the leakage state within the fluid cabinet 120 was divided into two stages, but this embodiment is not limited to this. The leakage state within the fluid cabinet 120 may also be divided into three or more stages.

Next, the fluid cabinet 120 in the substrate processing apparatus 100 of this embodiment will be described with reference to Figure 16. Figure 16 is a schematic diagram of the fluid cabinet 120 in the substrate processing apparatus 100 of this embodiment.

As shown in FIG. 16 , the fluid cabinet 120 includes a housing 122, an intake port 123, an exhaust unit 124, a leak detection unit 130p, a treatment liquid pipe 132, and a preparation tank 134, as well as a pump 136a, a temperature control device 136b, and a filter 136c. The treatment liquid pipe 132 supplies the treatment liquid to the preparation tank 134. The treatment liquid pipe 132 also flows the treatment liquid from the preparation tank 134 to the outside.

The treatment liquid piping 132 extends from the outside of the fluid cabinet 120 to the inside of the fluid cabinet 120. Furthermore, the treatment liquid piping 132 extends from the inside of the fluid cabinet 120 to the outside of the fluid cabinet 120. In this specification, the boundary portion of the treatment liquid piping 132 where the treatment liquid flows from the outside of the fluid cabinet 120 to the inside of the fluid cabinet 120 is referred to as the inlet 132p, and the boundary portion where the treatment liquid flows from the inside of the fluid cabinet 120 to the outside of the fluid cabinet 120 is referred to as the outlet 132q. Furthermore, in this specification, the portion of the treatment liquid piping 132 from the inlet 132p to the preparation tank 134 is sometimes referred to as the upstream treatment liquid piping 132a, and the portion from the preparation tank 134 to the outlet 132q is sometimes referred to as the downstream treatment liquid piping 132b.

The pump 136a, temperature control device 136b, and filter 136c are attached to the processing liquid piping 132. Specifically, the pump 136a, temperature control device 136b, and filter 136c are attached to the downstream processing liquid piping 132b.

Pump 136a sends the processing liquid to processing liquid pipe 132. Temperature adjustment device 136b heats the processing liquid flowing through processing liquid pipe 132. The temperature adjustment device 136b adjusts the temperature of the processing liquid. Filter 136c filters the processing liquid flowing through processing liquid pipe 132.

The liquid leakage detection unit 130p may be located below the preparation tank 134. Alternatively, the liquid leakage detection unit 130p may be located near the processing liquid piping 132.

A space may be provided at the top of the housing 122 for placing electrical components.

Furthermore, multiple types of liquid leakage detection units 130p may be arranged within the fluid cabinet 120. In this case, a liquid leakage within the fluid cabinet 120 may be determined based on the detection results of any one of the multiple types of liquid leakage detection units 130p or a combination of multiple detection results.

Next, with reference to Figure 17, the fluid cabinet 120 in the substrate processing apparatus 100 of this embodiment will be described. Figure 17(a) is a schematic diagram of the fluid cabinet 120 in the substrate processing apparatus 100 of this embodiment. The fluid cabinet 120 shown in Figure 17(a) has a similar configuration to the fluid cabinet 120 shown in Figure 16, except that the liquid leakage detection unit 130p includes a liquid detection sensor 130a and a camera 130b, and therefore, duplicated descriptions will be omitted to avoid redundancy.

As shown in FIG. 17(a), the liquid leakage detection unit 130p includes a liquid detection sensor 130a and a camera 130b. The liquid detection sensor 130a is disposed below the housing 122. The camera 130b is disposed above the housing 122.

The liquid leakage detection unit 130p may detect a liquid leakage in the fluid cabinet 120 based on the detection results of either the liquid detection sensor 130a or the camera 130b. Alternatively, the liquid leakage detection unit 130p may detect a liquid leakage in the fluid cabinet 120 based on the detection results of both the liquid detection sensor 130a and the camera 130b.

The liquid leakage detection unit 130p may also detect a liquid leakage in the fluid cabinet 120 based on the flow rate through the processing liquid pipe 132.

Figure 17(b) is a schematic diagram of the fluid cabinet 120 in the substrate processing apparatus 100 of this embodiment. The fluid cabinet 120 shown in Figure 17(b) has the same configuration as the fluid cabinet 120 shown in Figure 17(a), except that the liquid leakage detection unit 130p includes flowmeter 136d and flowmeter 136e instead of liquid detection sensor 130a and camera 130b, and duplicated descriptions will be omitted to avoid redundancy.

As shown in FIG. 17(b), the fluid cabinet 120 further includes a flow meter 136d and a flow meter 136e. The flow meter 136d is attached to the upstream processing liquid pipe 132a and measures the flow rate of the processing liquid flowing through the upstream processing liquid pipe 132a. The flow meter 136e is attached to the downstream processing liquid pipe 132b and measures the flow rate of the processing liquid flowing through the downstream processing liquid pipe 132b.

When a constant amount of processing liquid flows from the inlet 132p to the outlet 132q of the processing liquid pipe 132, the flow rate measured by flow meter 136d is equal to the flow rate measured by flow meter 136e. Typically, when the processing liquid circulates through the fluid cabinet 120, the flow rate measured by flow meter 136d is equal to the flow rate measured by flow meter 136e.

However, if processing liquid leaks from either the upstream processing liquid piping 132a or the downstream processing liquid piping 132b, the flow rate measured by flow meter 136d will not be equal to the flow rate measured by flow meter 136e. Therefore, flow meter 136d and flow meter 136e can detect leakage in the fluid cabinet 120, and flow meter 136d and flow meter 136e can function as leakage detection unit 130p.

In the above description with reference to Figures 1 to 17, the fluid cabinet 120 has one partitioned space, but the fluid cabinet 120 may have multiple partitioned spaces.

Next, the fluid cabinet 120 in the substrate processing apparatus 100 of this embodiment will be described with reference to Figure 18. Figures 18(a) and 18(b) are schematic top views of the fluid cabinet 120 in the substrate processing apparatus 100 of this embodiment.

As shown in FIG. 18(a), the fluid cabinet 120 has a first fluid housing 122a and a second fluid housing 122b. Here, the first fluid housing 122a and the second fluid housing 122b are arranged adjacent to each other. The fluid cabinet 120 is partitioned from other components. Furthermore, the first fluid housing 122a and the second fluid housing 122b are each partitioned. As a result, the fluid cabinet 120 has multiple partitioned spaces.

The first fluid housing 122a is provided with a processing liquid pipe 132 and a preparation tank 134. The second fluid housing 122b is provided with a processing liquid pipe 132 and a preparation tank 134.

The processing liquid flowing through the first fluid housing 122a may be the same as or different from the processing liquid flowing through the second fluid housing 122b. For example, the processing liquid in the first fluid housing 122a may be a different type from the processing liquid in the second fluid housing 122b. Alternatively, the concentration of the processing liquid in the first fluid housing 122a may be different from the concentration of the processing liquid in the second fluid housing 122b. Alternatively, one of the processing liquids in the first fluid housing 122a and the second fluid housing 122b may supply the processing liquid to the substrate processing unit 10, and the other may circulate the processing liquid before supplying the processing liquid to the substrate processing unit 10.

The first fluid housing 122a has an exhaust section 124a. The exhaust section 124a has an exhaust pipe 125a and a damper 127a.

The second fluid housing 122b has an exhaust section 124b. The exhaust section 124b has an exhaust pipe 125b and a damper 127b.

A common exhaust pipe 140 is attached to the fluid cabinet 120. The common exhaust pipe 140 is connected to the exhaust pipe 125a of the first fluid housing 122a and the exhaust pipe 125b of the second fluid housing 122b. Therefore, the atmosphere inside the first fluid housing 122a is exhausted via the exhaust pipe 125a and the common exhaust pipe 140, and the atmosphere inside the second fluid housing 122b is exhausted via the exhaust pipe 125b and the common exhaust pipe 140.

The common exhaust pipe 140 has a connecting pipe 142 and a main pipe 144. The connecting pipe 142 connects the exhaust pipe 125a of the first fluid casing 122a, the exhaust pipe 125b of the second fluid casing 122b, and the main pipe 144. The atmosphere inside the first fluid casing 122a is exhausted via the exhaust pipe 125a, the connecting pipe 142, and the main pipe 144. The atmosphere inside the second fluid casing 122b is exhausted via the exhaust pipe 125b, the connecting pipe 142, and the main pipe 144.

As shown in FIG. 18(b), when processing liquid leaks in the first fluid housing 122a, the liquid leakage detection unit 130p of the first fluid housing 122a detects the liquid leakage in the fluid cabinet 120. The control unit 102 determines the liquid leakage state in the fluid cabinet 120. The control unit 102 sets the forced exhaust amount according to the liquid leakage state. Here, the control unit 102 increases the opening degree of the damper 127a according to the liquid leakage state.

On the other hand, there is no leakage of processing liquid within the second fluid housing 122b. Therefore, the liquid leakage detection unit 130p of the second fluid housing 122b does not detect any liquid leakage within the fluid cabinet 120. Therefore, the control unit 102 maintains a constant opening of the damper 127b depending on the state of the liquid leakage.

In this way, by exhausting the atmosphere within the first fluid housing 122a and the second fluid housing 122b, which are different from each other, via the common exhaust pipe 140, the atmosphere within the first fluid housing 122a and the second fluid housing 122b, which are separated from each other, can be exhausted together with a relatively simple configuration. As mentioned above, the treatment liquids flowing through the first fluid housing 122a and the second fluid housing 122b may be different. However, it is preferable that the treatment liquids flowing through the first fluid housing 122a and the second fluid housing 122b have one thing in common: they are acidic, alkaline, or an organic solvent. In this case, the exhaust gases that have flowed through the common exhaust pipe 140 can be treated together.

Note that if the volumes of the first fluid housing 122a and the second fluid housing 122b, or the type, temperature, or application of the processing liquid flowing through the first fluid housing 122a and the second fluid housing 122b are different, the criteria for determining leakage and/or the criteria for determining the leakage state in the first fluid housing 122a and the second fluid housing 122b may be different. Furthermore, the forced exhaust conditions for the first fluid housing 122a may be different from the forced exhaust conditions for the second fluid housing 122b.

Next, with reference to Figures 1 to 19 (mainly Figures 18 and 19), we will explain the change in the detected quantity over time and changes in the exhaust conditions in the exhaust control method for the fluid cabinet 120 according to this embodiment. Figure 19(a) is a graph showing the change in the detected quantity over time in the exhaust control method for the first fluid enclosure 122a of the fluid cabinet 120 according to this embodiment, and Figure 19(b) is a graph showing the change in the detected quantity over time in the exhaust control method for the second fluid enclosure 122b of the fluid cabinet 120 according to this embodiment.

As shown in Figure 19(a), initially, no processing liquid is leaking within the first fluid housing 122a.

When the processing liquid begins to leak from the first fluid housing 122a after a predetermined time has passed, the detected amount increases. For example, when the detected amount exceeds the threshold value t1a, the control unit 102 changes the exhaust conditions from the standard exhaust conditions to the first forced exhaust conditions, and the exhaust unit 124a exhausts the atmosphere inside the first fluid housing 122a in accordance with the first forced exhaust conditions. Here, the exhaust unit 124a exhausts the atmosphere inside the first fluid housing 122a under the first forced exhaust conditions, which are set to a first forced exhaust volume that is greater than the standard exhaust volume.

After that, when the detected amount exceeds the threshold value t2a, the control unit 102 changes the exhaust conditions from the first forced exhaust conditions to the second forced exhaust conditions, and the exhaust unit 124a exhausts the atmosphere inside the first fluid housing 122a in accordance with the second forced exhaust conditions. Here, the exhaust unit 124a exhausts the atmosphere inside the first fluid housing 122a under the second forced exhaust conditions, which are set to a second forced exhaust volume that is larger than the first forced exhaust volume.

After that, when the detected amount falls below threshold value t2a, the control unit 102 changes the exhaust conditions from the second forced exhaust conditions to the third forced exhaust conditions, and the exhaust unit 124a exhausts the atmosphere inside the first fluid housing 122a in accordance with the third forced exhaust conditions. Here, the exhaust unit 124a exhausts the atmosphere inside the first fluid housing 122a under the third forced exhaust conditions, which are set to a third forced exhaust volume that is smaller than the second forced exhaust volume and larger than the standard exhaust volume.

After that, when the detected amount falls below threshold value t1a, the control unit 102 changes the exhaust conditions from the third forced exhaust conditions to the standard exhaust conditions, and the exhaust unit 124a exhausts the atmosphere inside the first fluid housing 122a in accordance with the standard exhaust conditions.

The second fluid housing 122b may be set to exhaust conditions different from those of the first fluid housing 122a. Furthermore, the threshold value for determining the exhaust conditions in the second fluid housing 122b may be different from the threshold value for determining the exhaust conditions in the first fluid housing 122a.

As shown in Figure 19(b), initially, no processing liquid leaks within the second fluid housing 122b.

When the processing liquid begins to leak from the second fluid housing 122b after a predetermined time has passed, the detected amount increases. For example, when the detected amount exceeds the threshold value t1b, the control unit 102 changes the exhaust conditions from the standard exhaust conditions to the forced exhaust conditions, and the exhaust unit 124b exhausts the atmosphere inside the second fluid housing 122b in accordance with the forced exhaust conditions. Note that the threshold value t1b may be different from the threshold value t1a. Furthermore, the forced exhaust conditions used by the exhaust unit 124b may be different from the first forced exhaust conditions used by the exhaust unit 124a.

After that, because the detected amount does not exceed threshold value t2b, the control unit 102 maintains the exhaust conditions as forced exhaust conditions, and the exhaust unit 124b exhausts the atmosphere inside the second fluid housing 122b in accordance with the forced exhaust conditions. Furthermore, threshold value t2b may be different from threshold value t2a.

After that, when the detected amount falls below threshold value t1b, the control unit 102 changes the exhaust conditions from forced exhaust conditions to standard exhaust conditions, and the exhaust unit 124b exhausts the atmosphere inside the second fluid housing 122b in accordance with the standard exhaust conditions.

As described above, the control unit 102 may individually set the leakage detection, leakage state determination, and/or exhaust conditions for the first fluid housing 122a and the second fluid housing 122b.

In the fluid cabinet 120 shown in FIG. 18, the first fluid housing 122a and the second fluid housing 122b are arranged adjacent to each other, but this embodiment is not limited to this. The first fluid housing 122a and the second fluid housing 122b may be arranged in different locations. Furthermore, when the first fluid housing 122a and the second fluid housing 122b are connected to a common exhaust pipe 140, the amount of exhaust air flowing through the common exhaust pipe 140 may be changed.

Next, the fluid cabinet 120 and common exhaust piping 140 in the substrate processing apparatus 100 of this embodiment will be described with reference to Figures 1 to 20 (particularly Figures 18 to 20). Figures 20(a) and 20(b) are schematic diagrams of the fluid cabinet 120 and common exhaust piping 140 in the substrate processing apparatus 100 of this embodiment.

As shown in FIG. 20(a), the fluid cabinet 120 is connected to a common exhaust pipe 140. The fluid cabinet 120 includes a first fluid housing 122a, a second fluid housing 122b, and a third fluid housing 122c. Here, the first fluid housing 122a, the second fluid housing 122b, and the third fluid housing 122c are located apart. The first fluid housing 122a, the second fluid housing 122b, and the third fluid housing 122c each have the same configuration. Note that the first fluid housing 122a, the second fluid housing 122b, and the third fluid housing 122c may also be arranged adjacent to each other.

A blower mechanism 146 is disposed in the common exhaust pipe 140. The blower mechanism 146 blows air so that the gas in the common exhaust pipe 140 flows in a direction away from the first fluid housing 122a, the second fluid housing 122b, and the third fluid housing 122c. Therefore, the blower mechanism 146 allows the gas in the common exhaust pipe 140 to circulate and exhaust the first fluid housing 122a, the second fluid housing 122b, and the third fluid housing 122c, respectively. For example, the blower mechanism 146 includes a fan.

Here, no leakage has been detected in the first fluid housing 122a, the second fluid housing 122b, or the third fluid housing 122c. Figure 19(a) shows the exhaust volumes of the first fluid housing 122a, the second fluid housing 122b, the third fluid housing 122c, and the common exhaust pipe 140. The exhaust volumes of the first fluid housing 122a, the second fluid housing 122b, and the third fluid housing 122c are 1.0, 1.0, and 1.0, respectively, and the exhaust volume of the common exhaust pipe 140 is 3.0.

As shown in FIG. 20(b), when processing liquid leaks in the first fluid housing 122a, the liquid leakage detection unit 130p of the first fluid housing 122a detects the liquid leakage in the first fluid housing 122a. On the other hand, there is no processing liquid leakage in the second fluid housing 122b and the third fluid housing 122c.

In this case, the control unit 102 determines the leakage state within the first fluid housing 122a. The control unit 102 then determines the forced exhaust conditions for the first fluid housing 122a according to the leakage state, and the exhaust unit 124 of the first fluid housing 122a exhausts the atmosphere within the first fluid housing 122a under the forced exhaust conditions. The control unit 102 also maintains the standard exhaust conditions for the second fluid housing 122b and the third fluid housing 122c, and the exhaust units 124 of the second fluid housing 122b and the third fluid housing 122c exhaust the atmosphere within the second fluid housing 122b and the third fluid housing 122c under the standard exhaust conditions.

At this time, the control unit 102 increases the exhaust volume of the common exhaust pipe 140 by the blower mechanism 146 in accordance with the increase in the exhaust volume of the exhaust section 124 of the first fluid housing 122a. In this case, the exhaust volumes of the first fluid housing 122a, second fluid housing 122b, and third fluid housing 122c are 1.5, 1.0, and 1.0, respectively, and the exhaust volume of the common exhaust pipe 140 is 3.5.

In this embodiment, the control unit 102 increases the exhaust volume of the first fluid housing 122a in accordance with the state of leakage within the first fluid housing 122a, and also increases the exhaust volume of the common exhaust pipe 140. This allows the first fluid housing 122a in which leakage has occurred to be efficiently exhausted.

In the explanation above with reference to FIG. 20, the exhaust volume of the common exhaust pipe 140 was adjusted by controlling the air blower mechanism 146 in response to the occurrence of a leak, but this embodiment is not limited to this. The exhaust volume of the common exhaust pipe 140 does not have to be adjusted regardless of whether a leak occurs or not.

Next, with reference to Figure 21, the exhaust control method for the fluid cabinet 120 of this embodiment will be described. Figures 21(a) and 21(b) are schematic diagrams for explaining the exhaust control method for the fluid cabinet 120 of this embodiment.

As shown in FIG. 21(a), the fluid cabinet 120 is connected to a common exhaust pipe 140. The fluid cabinet 120 includes a first fluid housing 122a, a second fluid housing 122b, and a third fluid housing 122c. Here, no leakage has been detected in the first fluid housing 122a, the second fluid housing 122b, or the third fluid housing 122c.

Figure 21(a) shows the exhaust volumes of the first fluid casing 122a, the second fluid casing 122b, the third fluid casing 122c, and the common exhaust pipe 140. The exhaust volumes of the first fluid casing 122a, the second fluid casing 122b, and the third fluid casing 122c are 1.0, 1.0, and 1.0, respectively, and the exhaust volume of the common exhaust pipe 140 is 3.0.

As shown in FIG. 21(b), when processing liquid leaks in the first fluid housing 122a, the liquid leakage detection unit 130p of the first fluid housing 122a detects the liquid leakage in the first fluid housing 122a. On the other hand, there is no processing liquid leakage in the second fluid housing 122b and the third fluid housing 122c.

In this case, the control unit 102 determines the leakage state within the first fluid housing 122a. The control unit 102 then determines the forced exhaust conditions for the first fluid housing 122a according to the leakage state, and the exhaust unit 124 of the first fluid housing 122a exhausts the atmosphere within the first fluid housing 122a under the forced exhaust conditions. The control unit 102 also maintains the standard exhaust conditions for the second fluid housing 122b and the third fluid housing 122c, and the exhaust units 124 of the second fluid housing 122b and the third fluid housing 122c exhaust the atmosphere within the second fluid housing 122b and the third fluid housing 122c under the standard exhaust conditions.

Here, the control unit 102 does not increase the exhaust volume of the common exhaust pipe 140 by the blower mechanism 146. As a result, the exhaust volume of the first fluid housing 122a increases, and the exhaust volumes of the second fluid housing 122b and the third fluid housing 122c decrease. For example, the exhaust volumes of the first fluid housing 122a, second fluid housing 122b, and third fluid housing 122c become 1.4, 0.8, and 0.8, respectively, and the exhaust volume of the common exhaust pipe 140 remains at 3.0.

In this embodiment, the control unit 102 increases the exhaust volume of the first fluid housing 122a according to the state of leakage within the first fluid housing 122a, and reduces the exhaust volumes of the second fluid housing 122b and the third fluid housing 122c. This allows the first fluid housing 122a, where a leak has occurred, to be efficiently exhausted without increasing the load on the blower mechanism 146.

In the above description with reference to Figures 20 and 21, the first to third fluid housings 122a to 122c have the same configuration, but this embodiment is not limited to this. The first to third fluid housings 122a to 122c may have different configurations. For example, the volumes of the first to third fluid housings 122a to 122c may be different.

In addition, in the above description with reference to Figures 20 and 21, the first fluid housing 122a to the third fluid housing 122c, which are equipped with the processing liquid pipes 132, are connected to the common exhaust pipe 140, but this embodiment is not limited to this. A cabinet that does not have the processing liquid pipes 132 may also be connected to the common exhaust pipe 140.

Next, the substrate processing apparatus 100 of this embodiment will be described with reference to Figure 22. Figures 22(a) and 22(d) are schematic diagrams of the fluid cabinet 120, common exhaust piping 140, and dummy cabinet 150 in the substrate processing apparatus 100 of this embodiment. Figure 22(b) is a schematic diagram of the fluid cabinet 120 in the substrate processing apparatus 100 of this embodiment, and Figure 22(c) is a schematic diagram of the dummy cabinet 150 in the substrate processing apparatus 100 of this embodiment.

As shown in FIG. 22(a), the common exhaust pipe 140 is connected to the fluid cabinet 120 and the dummy cabinet 150. The common exhaust pipe 140 allows the atmosphere inside the fluid cabinet 120 and the atmosphere inside the dummy cabinet 150 to be exhausted.

The fluid cabinet 120 includes a first fluid housing 122a, a second fluid housing 122b, and a third fluid housing 122c. The first fluid housing 122a, the second fluid housing 122b, and the third fluid housing 122c each include at least a processing liquid pipe 132. On the other hand, the dummy cabinet 150 does not include a processing liquid pipe 132.

Here, the first fluid housing 122a to the third fluid housing 122c have the same configuration. Therefore, the volumes of the first fluid housing 122a to the third fluid housing 122c are equal to each other. On the other hand, the volume of the dummy cabinet 150 is smaller than the volumes of the first fluid housing 122a to the third fluid housing 122c. Here, no leakage has been detected in the first fluid housing 122a, the second fluid housing 122b, and the third fluid housing 122c.

Figure 22(a) shows the exhaust volumes of the first fluid casing 122a, the second fluid casing 122b, the third fluid casing 122c, the dummy cabinet 150, and the common exhaust pipe 140. For example, the exhaust volumes of the first fluid casing 122a, the second fluid casing 122b, the third fluid casing 122c, and the dummy cabinet 150 are 1.0, 1.0, 1.0, and 0.5, respectively, and the exhaust volume of the common exhaust pipe 140 is 3.5.

As shown in FIG. 22(b), the first fluid housing 122a includes a housing 122, an intake port 123, an exhaust section 124, a leak detection section 130p, a processing liquid pipe 132, and a preparation tank 134, as well as a pump 136a, a temperature control device 136b, and a filter 136c. The configuration of the first fluid housing 122a is similar to that of the fluid cabinet 120 described above with reference to FIG. 16, and a detailed description thereof will be omitted here. The configurations of the second fluid housing 122b and the third fluid housing 122c are also similar to that of the first fluid housing 122a.

As shown in FIG. 22(c), the dummy cabinet 150 includes a housing 152, an intake port 153, and an exhaust section 154. Unlike the first to third fluid housings 122a to 122c, no processing liquid flows through the dummy cabinet 150.

The exhaust section 154 has an exhaust pipe 155 and an exhaust volume adjustment mechanism 156. When the atmosphere inside the housing 152 is exhausted, the gas inside the housing 152 flows through the exhaust pipe 155 and is discharged to the outside.

The exhaust volume adjustment mechanism 156 adjusts the flow rate (exhaust volume) of gas flowing through the exhaust pipe 155. The exhaust volume adjustment mechanism 156 can increase or decrease the exhaust volume flowing through the exhaust pipe 155.

However, the dummy cabinet 150 may also be equipped with a liquid leakage detection unit 130p. If the dummy cabinet 150 is equipped with a liquid leakage detection unit 130p, it can detect that processing liquid has entered the dummy cabinet 150 through the air intake 153.

As shown in FIG. 22(d), when processing liquid leaks in the first fluid housing 122a, the liquid leakage detection unit 130p of the first fluid housing 122a detects the liquid leakage in the first fluid housing 122a. On the other hand, there is no processing liquid leakage in the second fluid housing 122b and the third fluid housing 122c.

In this case, the control unit 102 determines the leakage state within the first fluid housing 122a. The control unit 102 then determines the forced exhaust conditions for the first fluid housing 122a according to the leakage state, and the exhaust unit 124 of the first fluid housing 122a exhausts the atmosphere within the first fluid housing 122a under the forced exhaust conditions. The control unit 102 also maintains the standard exhaust conditions for the second fluid housing 122b and the third fluid housing 122c, and the exhaust units 124 of the second fluid housing 122b and the third fluid housing 122c exhaust the atmosphere within the second fluid housing 122b and the third fluid housing 122c under the standard exhaust conditions.

Furthermore, the control unit 102 stops driving the exhaust unit 154 of the dummy cabinet 150 in response to changing the exhaust conditions of the first fluid housing 122a from standard exhaust conditions to forced exhaust conditions. Therefore, the control unit 102 can increase the exhaust volume of the first fluid housing 122a without increasing the exhaust volume of the common exhaust pipe 140 by the blower mechanism 146. For example, as shown in FIG. 22(d), the exhaust volumes of the first fluid housing 122a, second fluid housing 122b, third fluid housing 122c, and dummy cabinet 150 are 1.5, 1.0, 1.0, and 0.5, respectively, and the exhaust volume of the common exhaust pipe 140 remains at 3.5.

In this embodiment, the control unit 102 increases the exhaust volume of the first fluid housing 122a in accordance with the state of leakage within the first fluid housing 122a, while decreasing the exhaust volume of the dummy cabinet 150. This allows the first fluid housing 122a in which a leak has occurred to be efficiently exhausted without increasing the load on the blower mechanism 146.

In the substrate processing apparatus 100 shown in Figures 18 and 20 to 22, the fluid cabinet 120 is directly connected to the common exhaust pipe 140, but this embodiment is not limited to this. The fluid cabinet 120 may also be connected to the common exhaust pipe 140 via a dummy cabinet 150.

Next, the substrate processing apparatus 100 of this embodiment will be described with reference to Figure 23. Figure 23 is a schematic diagram of the fluid cabinet 120, common exhaust piping 140, and dummy cabinet 150 in the substrate processing apparatus 100 of this embodiment.

As shown in FIG. 23 , a dummy cabinet 150 is connected to the common exhaust pipe 140, and the fluid cabinet 120 is connected to the dummy cabinet 150. Here, the fluid cabinet 120 includes a first fluid housing 122a to a third fluid housing 122c. The first fluid housing 122a to the third fluid housing 122c are connected to the dummy cabinet 150. In this way, by connecting the fluid cabinet 120 to the common exhaust pipe 140 via the dummy cabinet 150, the common exhaust pipe 140 may be connected to each of the fluid cabinet 120 and the dummy cabinet 150.

Next, the substrate processing apparatus 100 of this embodiment will be described with reference to Figures 1 to 24 (mainly Figures 23 and 24). Figures 24(a) and 24(b) are schematic diagrams of a dummy cabinet 150 to which the exhaust pipes 125a to 125c of the first to third fluid enclosures 122a to 122c in the substrate processing apparatus 100 of this embodiment are connected.

As shown in FIG. 24(a), the dummy cabinet 150 is connected to the first fluid housing 122a to the third fluid housing 122c. More specifically, the dummy cabinet 150 is connected to the first fluid housing 122a to the third fluid housing 122c. The dummy cabinet 150 is also connected to the common exhaust pipe 140.

The exhaust section 154 has an exhaust pipe 155 and a damper 157. The exhaust pipe 155 is disposed within the housing 152. When the atmosphere within the housing 152 is exhausted, the air within the housing 152 flows through the exhaust pipe 155. The damper 157 controls the opening degree of the exhaust pipe 155. The damper 157 functions as an exhaust volume adjustment mechanism for the exhaust pipe 155.

The exhaust air that flows through the exhaust pipes 125a to 125c of the first to third fluid housings 122a to 122c flows into the exhaust pipe 155 inside the housing 152 of the dummy cabinet 150. As a result, the exhaust pipe 155 exhausts to the outside the gas that flows in through the exhaust pipes 125a to 125c of the first to third fluid housings 122a to 122c, along with the gas that flows in through the damper 157.

For example, if the exhaust volumes of the exhaust pipe 155 via the first fluid housing 122a, the second fluid housing 122b, the third fluid housing 122c, and the damper 157 are 1.0, 1.0, 1.0, and 0.5, respectively, the exhaust volume of the common exhaust pipe 140 is 3.5.

As shown in FIG. 24(b), when processing liquid leaks in the first fluid housing 122a, the liquid leakage detection unit 130p of the first fluid housing 122a detects the leakage in the first fluid housing 122a. On the other hand, there is no leakage of processing liquid in the second fluid housing 122b and the third fluid housing 122c.

In this case, the control unit 102 determines the leakage state within the first fluid housing 122a. The control unit 102 then determines the forced exhaust conditions for the first fluid housing 122a according to the leakage state, and the exhaust unit 124 of the first fluid housing 122a exhausts the atmosphere within the first fluid housing 122a under the forced exhaust conditions. The control unit 102 also maintains the standard exhaust conditions for the second fluid housing 122b and the third fluid housing 122c, and the exhaust units 124 of the second fluid housing 122b and the third fluid housing 122c exhaust the atmosphere within the second fluid housing 122b and the third fluid housing 122c under the standard exhaust conditions.

Furthermore, the control unit 102 reduces the exhaust volume of the exhaust pipe 155 via the damper 157 in response to changing the exhaust conditions of the first fluid housing 122a from standard exhaust conditions to forced exhaust conditions. By further narrowing the opening of the damper 157, the control unit 102 allows the exhaust unit 154 to maintain the overall exhaust volume, and the control unit 102 does not need to increase the exhaust volume of the common exhaust pipe 140 via the blower mechanism 146. For example, the exhaust volumes of the first fluid housing 122a, the second fluid housing 122b, the third fluid housing 122c, and the exhaust pipe 155 via the damper 157 are 1.4, 1.0, 1.0, and 0.1, respectively, and the exhaust volume of the common exhaust pipe 140 can remain at 3.5. This allows the first fluid housing 122a, which has experienced a leak, to be efficiently exhausted without increasing the load on the blower mechanism 146.

Note that in the above description with reference to Figures 7 to 24, a leak is detected as an abnormality occurring within the fluid cabinet 120, but a drop in exhaust pressure may also be detected as an abnormality within the fluid cabinet 120.

Next, the substrate processing apparatus 100 of this embodiment will be described with reference to Figures 1 to 25. Figure 25 is a block diagram of the substrate processing apparatus 100. The substrate processing apparatus 100 shown in Figure 25 has a similar configuration to the substrate processing apparatus 100 shown in Figure 4, except that it is equipped with an exhaust pressure detection unit 130q that detects the exhaust pressure inside the fluid cabinet 120 instead of the abnormality detection unit 130, and duplicated descriptions will be omitted to avoid redundancy.

As shown in FIG. 25, the substrate processing apparatus 100 includes an exhaust pressure detection unit 130q. The exhaust pressure detection unit 130q detects the exhaust pressure within the fluid cabinet 120. For example, if a malfunction occurs in the external piping, the exhaust pressure within the fluid cabinet 120 may decrease. Alternatively, if the number of pipes connected to the common piping increases, the exhaust pressure within the fluid cabinet 120 may decrease. In this case, the exhaust pressure detection unit 130q can detect the decrease in exhaust pressure within the fluid cabinet 120.

For example, the exhaust pressure detection unit 130q may include a differential pressure gauge or manometer. The exhaust pressure detection unit 130q may detect a decrease in exhaust pressure within the fluid cabinet 120 based on the difference between the air pressure within the fluid cabinet 120 and the air pressure in the exhaust pipe 125 connecting the fluid cabinet 120 to the outside.

Note that the above explanation with reference to Figures 7 to 24 describes a configuration in which a liquid leak is detected as an abnormality occurring within the fluid cabinet 120, but it goes without saying that the same is also applicable to a configuration in which a drop in exhaust pressure is detected as an abnormality occurring within the fluid cabinet 120.

Next, the exhaust control method for the fluid cabinet 120 of this embodiment will be described with reference to Figures 1 to 26. Figure 26 is a flow diagram of the exhaust control method for the fluid cabinet 120 of this embodiment.

As shown in FIG. 26, in step S102, the atmosphere inside the fluid cabinet 120 is exhausted under standard exhaust conditions set to a standard exhaust volume. The control unit 102 sets the exhaust conditions to the standard exhaust conditions, and the exhaust unit 124 exhausts the atmosphere inside the fluid cabinet 120 in accordance with the standard exhaust conditions.

In step S104, it is determined whether a decrease in exhaust pressure is detected within the fluid cabinet 120. If the exhaust pressure within the fluid cabinet 120 decreases, the exhaust pressure detection unit 130q detects the decrease in exhaust pressure within the fluid cabinet 120.

If a decrease in exhaust pressure is not detected within the fluid cabinet 120 (No in step S104), processing returns to step S102. This allows the exhaust unit 124 to repeatedly detect and determine abnormalities while exhausting the atmosphere within the fluid cabinet 120 according to the standard exhaust conditions. On the other hand, if a decrease in exhaust pressure is detected within the fluid cabinet 120 (Yes in step S104), processing proceeds to step S106.

In step S106, the control unit 102 determines whether the exhaust pressure in the fluid cabinet 120 has decreased. The control unit 102 determines whether the exhaust pressure in the fluid cabinet 120 has decreased based on the detection result of the exhaust pressure detection unit 130q. For example, the control unit 102 may determine whether the exhaust pressure in the fluid cabinet 120 has decreased based on the detection amount based on the detection result of the exhaust pressure detection unit 130q.

In step S108, the control unit 102 determines the forced exhaust conditions. The control unit 102 determines the forced exhaust conditions according to the state of decreased exhaust pressure from multiple forced exhaust conditions. The multiple forced exhaust conditions are set to forced exhaust amounts greater than the standard exhaust amount. For example, the control unit 102 determines the forced exhaust conditions according to the state of decreased exhaust pressure from two levels of forced exhaust conditions. Alternatively, the control unit 102 determines the forced exhaust conditions according to the state of decreased exhaust pressure from three or more levels of forced exhaust conditions.

In step S110, the control unit 102 controls the exhaust unit 124 in accordance with the determined forced exhaust conditions to exhaust the atmosphere inside the fluid cabinet 120. As a result, the fluid cabinet 120 is forced to be exhausted.

In step S112, it is again determined whether a decrease in exhaust pressure is detected within the fluid cabinet 120. If exhaust of the processing liquid within the fluid cabinet 120 has not been completed, the exhaust pressure detection unit 130q detects a decrease in exhaust pressure.

If a decrease in exhaust pressure is detected within the fluid cabinet 120 (Yes in step S112), processing returns to step S110. In this case, the exhaust unit 124 continues forcibly exhausting the fluid cabinet 120. If a decrease in exhaust pressure is not detected within the fluid cabinet 120 (No in step S112), processing proceeds to step S114.

In step S114, it is determined whether or not to terminate the exhaust process. If the control unit 102 receives an instruction to terminate the exhaust process, it terminates the exhaust process. Alternatively, if maintenance of the entire substrate processing apparatus 100 is to be performed, the control unit 102 terminates the exhaust process.

If the exhaust process is not to be terminated (No in step S114), the process returns to S102. In this case, the exhaust unit 124 exhausts the atmosphere inside the fluid cabinet 120 under standard exhaust conditions. On the other hand, if it is determined that the exhaust process is to be terminated (Yes in step S114), the process ends.

Next, a method for controlling exhaust of the fluid cabinet 120 according to an embodiment will be described with reference to Figure 27. Figure 27(a) is a schematic diagram of the fluid cabinet 120 in the substrate processing apparatus 100 according to this embodiment, and Figure 27(b) is a graph showing the change in exhaust pressure over time in the method for controlling exhaust of the fluid cabinet 120 according to this embodiment.

As shown in FIG. 27(a), the fluid cabinet 120 has a housing 122, an intake port 123, an exhaust section 124, and an exhaust pressure detection unit 130q. The fluid cabinet 120 is partitioned by the housing 122. The intake port 123 and the exhaust section 124 are provided in the housing 122. The housing 122 also houses the exhaust pressure detection unit 130q. The exhaust pressure detection unit 130q detects the exhaust pressure inside the fluid cabinet 120.

The housing 122 has an openable door 122d. By opening the door 122d, an operator can enter the housing 122.

An air intake 123 is provided in the housing 122. Outside air is drawn into the housing 122 through the air intake 123. In this example, the air intake 123 is provided in the door 122d.

The exhaust unit 124 exhausts the atmosphere inside the housing 122. The exhaust unit 124 can exhaust the atmosphere inside the housing 122 by changing the amount of exhaust per unit time.

The exhaust section 124 has an exhaust pipe 125 and an exhaust volume adjustment mechanism 126. Typically, the air pressure inside the fluid cabinet 120 is higher than the external air pressure via the exhaust pipe 125. When the atmosphere inside the housing 122 is exhausted, the gas inside the housing 122 flows through the exhaust pipe 125 and is discharged to the outside. Here, the exhaust pressure detection unit 130q is disposed on the exhaust pipe 125. The exhaust pressure detection unit 130q is located upstream of the exhaust volume adjustment mechanism 126. The exhaust pressure detection unit 130q detects the exhaust pressure of the exhaust gas flowing from the housing 122 through the exhaust pipe 125 via the exhaust volume adjustment mechanism 126.

The exhaust volume adjustment mechanism 126 adjusts the flow rate (exhaust volume) of gas flowing through the exhaust pipe 125. The exhaust volume adjustment mechanism 126 can increase or decrease the exhaust volume flowing through the exhaust pipe 125. For example, by adjusting the exhaust volume adjustment mechanism 126 to increase the opening of the exhaust pipe 125, the exhaust volume flowing through the exhaust pipe 125 can be increased.

As shown in Figure 27(b), the exhaust pressure is set to a target value Gv under standard exhaust conditions. Ideally, under standard exhaust conditions, the exhaust pressure is maintained at the target value Gv. However, even in this case, the exhaust pressure may fluctuate slightly from the target value Gv.

If a malfunction occurs in the exhaust source connected to the exhaust pipe 125 of the fluid cabinet 120, the exhaust pressure inside the fluid cabinet 120 will decrease. For example, if the exhaust pressure falls below the first threshold Tv1, the control unit 102 changes the exhaust conditions from the standard exhaust conditions to the first forced exhaust conditions, and the exhaust unit 124 exhausts the atmosphere inside the fluid cabinet 120 in accordance with the first forced exhaust conditions. Here, the exhaust unit 124 exhausts the atmosphere inside the fluid cabinet 120 under the first forced exhaust conditions, which are set to a first forced exhaust volume that increases the opening of the exhaust pipe 125 more than the standard exhaust volume.

After that, when the exhaust pressure falls below the second threshold Tv2, the control unit 102 changes the exhaust conditions from the first forced exhaust conditions to the second forced exhaust conditions, and the exhaust unit 124 exhausts the atmosphere inside the fluid cabinet 120 in accordance with the second forced exhaust conditions. Here, the exhaust unit 124 exhausts the atmosphere inside the fluid cabinet 120 under the second forced exhaust conditions, which are set to a second forced exhaust volume by further increasing the opening of the exhaust pipe 125.

In this way, when the exhaust pressure detection unit 130q detects that the exhaust pressure has fallen below the first threshold value Tv1, the control unit 102 determines an abnormal state and controls the exhaust volume adjustment mechanism 126 to increase the opening of the exhaust pipe 125. Furthermore, when the exhaust pressure detection unit 130q detects that the exhaust pressure has fallen below the second threshold value Tv2, the control unit 102 determines an abnormal state and controls the exhaust volume adjustment mechanism 126 to further increase the opening of the exhaust pipe 125. Note that if increasing the opening of the exhaust pipe 125 results in the exhaust pressure returning to the target value Gv, the control unit 102 may control the exhaust volume adjustment mechanism 126 to return the opening of the exhaust pipe 125.

Next, the exhaust control method for the fluid cabinet 120 according to this embodiment will be described with reference to Figure 28. Figures 28(a) to 28(c) are schematic diagrams for explaining the exhaust control method for the fluid cabinet 120 according to this embodiment.

Next, a method for controlling exhaust from the fluid cabinet 120 of this embodiment will be described with reference to Figures 1 to 28. Figures 28(a) to 28(c) are schematic diagrams for explaining exhaust from the fluid cabinet 120 of this embodiment.

As shown in FIG. 28(a), the atmosphere inside the fluid cabinet 120 is exhausted under standard exhaust conditions set to a standard exhaust volume. The control unit 102 sets the exhaust conditions to the standard exhaust conditions. For example, the standard exhaust conditions are set based on the type of processing liquid flowing through the processing liquid piping 132 inside the fluid cabinet 120 or the flow rate of the processing liquid flowing through the piping.

The exhaust unit 124 exhausts the atmosphere inside the fluid cabinet 120 under standard exhaust conditions. As the exhaust unit 124 exhausts air, air is drawn into the fluid cabinet 120 through the intake port 123. Standard exhaust prevents the atmosphere inside the housing 122 from leaking outside the housing 122.

As shown in FIG. 28(b), when the exhaust pressure in the fluid cabinet 120 drops, the exhaust unit 124 exhausts the atmosphere in the fluid cabinet 120 under forced exhaust conditions set to a forced exhaust volume greater than the standard exhaust volume. Specifically, when the exhaust pressure in the fluid cabinet 120 drops, the exhaust pressure detection unit 130q detects the drop in exhaust pressure in the fluid cabinet 120. The control unit 102 determines the drop in exhaust pressure in the fluid cabinet 120 based on the detection result of the exhaust pressure detection unit 130q. The control unit 102 determines the forced exhaust conditions according to the drop in exhaust pressure. For example, the forced exhaust conditions are set based on a combination of the type of processing liquid flowing through the processing liquid piping 132 in the fluid cabinet 120 or the flow rate of the processing liquid flowing through the processing liquid piping 132, and the drop in exhaust pressure. The exhaust unit 124 exhausts the atmosphere in the fluid cabinet 120 according to the determined forced exhaust conditions.

Here, the exhaust pressure detection unit 130q detects a relatively small decrease in exhaust pressure within the fluid cabinet 120. In this case, the control unit 102 determines the forced exhaust conditions, which are set to a forced exhaust volume greater than the standard exhaust volume, depending on the state of the decrease in exhaust pressure. The control unit 102 controls the exhaust unit 124 under the determined forced exhaust conditions, causing the exhaust unit 124 to exhaust the atmosphere within the fluid cabinet 120.

As shown in FIG. 28(c), when the exhaust pressure inside the fluid cabinet 120 drops relatively significantly, the exhaust unit 124 exhausts the atmosphere inside the fluid cabinet 120 under forced exhaust conditions set at a forced exhaust volume greater than the standard exhaust volume. Here, when the exhaust pressure detection unit 130q detects a relatively large drop in exhaust pressure inside the fluid cabinet 120, the control unit 102 determines forced exhaust conditions set at an even greater forced exhaust volume depending on the state of the drop in exhaust pressure. The control unit 102 controls the exhaust unit 124 under the determined forced exhaust conditions, allowing the exhaust unit 124 to forcibly exhaust the atmosphere inside the fluid cabinet 120.

As described above, according to the method for controlling exhaust of the fluid cabinet 120 of this embodiment, the exhaust volume of the exhaust section 124 can be controlled in accordance with the decrease in exhaust pressure within the fluid cabinet 120. Therefore, the atmosphere within the fluid cabinet 120 can be appropriately exhausted in accordance with the decrease in exhaust pressure within the fluid cabinet 120.

In the above description with reference to Figure 28, the state of reduced exhaust pressure and the forced exhaust conditions within the fluid cabinet 120 were divided into two stages, but this embodiment is not limited to this. The state of reduced exhaust pressure and the forced exhaust conditions within the fluid cabinet 120 may be divided into three or more stages.

Next, the operation of the exhaust unit 124 in the substrate processing apparatus 100 of this embodiment will be described with reference to Figure 29. Figures 29(a) to 29(d) are schematic diagrams for explaining the exhaust unit 124 and/or the fluid cabinet 120 in the substrate processing apparatus 100 of this embodiment.

As shown in FIG. 29(a), the exhaust section 124 has an exhaust pipe 125 and an exhaust volume adjustment mechanism 126. The exhaust volume adjustment mechanism 126 is disposed within the exhaust pipe 125. Here, the exhaust pressure detection unit 130q is also disposed within the exhaust pipe 125. The exhaust pressure detection unit 130q detects the air pressure on the housing 122 side relative to the rotation axis 126r of the exhaust volume adjustment mechanism 126. The exhaust volume adjustment mechanism 126 rotates around the rotation axis 126r. The opening of the exhaust pipe 125 can be adjusted by rotating the exhaust volume adjustment mechanism 126.

The displacement adjustment mechanism 126 may slide rather than rotate around the rotation axis 126r.

As shown in FIG. 29(b), the exhaust section 124 has an exhaust pipe 125 and an exhaust volume adjustment mechanism 126 that is slidable relative to the exhaust pipe 125. The exhaust volume adjustment mechanism 126 is disposed within the exhaust pipe 125. The exhaust volume adjustment mechanism 126 is disposed so as to partially block at least a portion of the exhaust pipe 125. Here, the exhaust pressure detection unit 130q is located on the housing 122 side with respect to the rotation axis 126r of the exhaust volume adjustment mechanism 126. The opening of the exhaust pipe 125 can be adjusted by sliding the exhaust volume adjustment mechanism 126.

Note that in the above description with reference to Figure 15, the exhaust section 124 had an air supply section 128 located on the lower side of the housing 122, but this embodiment is not limited to this.

As shown in FIG. 29(c), the exhaust section 124 has an exhaust pipe 125 and an air supply section 128u. The air supply section 128u is located above the housing 122. The air supply section 128u supplies gas to the housing 122. The air supply section 128u may form a so-called downflow. The air supply section 128u changes the amount of air supplied based on the detection result of the exhaust pressure detection section 130q. The exhaust pressure of the exhaust section 124 is changed according to the amount of air supplied from the air supply section 128u.

When the exhaust pressure inside the fluid cabinet 120 is the target value Gv, the air supply unit 128u supplies gas into the fluid cabinet 120 at the standard air supply volume. In this case, the atmosphere inside the fluid cabinet 120 is exhausted under standard exhaust conditions set to the standard exhaust volume.

When a drop in exhaust pressure is detected within the fluid cabinet 120, the air supply unit 128u supplies air at a forced air supply rate that is greater than the standard air supply rate. In this case, the fluid cabinet 120 is exhausted under forced exhaust conditions set to a forced exhaust rate that is greater than the standard exhaust rate.

For example, when the exhaust pressure detection unit 130q detects a relatively small decrease in exhaust pressure within the fluid cabinet 120, the control unit 102 determines forced air supply conditions that are set to a forced air supply volume greater than the standard air supply volume in accordance with the state of the decrease in exhaust pressure. The control unit 102 controls the exhaust unit 124 under the determined forced air supply conditions, causing the exhaust unit 124 to exhaust the atmosphere within the fluid cabinet 120.

Furthermore, when the exhaust pressure detection unit 130q detects a relatively large drop in exhaust pressure within the fluid cabinet 120, the control unit 102 determines forced air supply conditions that are set to a larger forced air supply amount in accordance with the state of the drop in exhaust pressure. The control unit 102 controls the exhaust unit 124 under the determined forced air supply conditions, allowing the exhaust unit 124 to forcibly exhaust the atmosphere within the fluid cabinet 120.

In the above description, the exhaust pipe 125 extends in a straight line, but this embodiment is not limited to this. The exhaust pipe 125 may branch off midway.

As shown in Figure 29 (d), the exhaust section 124 has an exhaust pipe 125 and an exhaust volume adjustment mechanism 126. The exhaust pipe 125 has a main pipe 125p and a branch pipe 125q. The main pipe 125p extends linearly in the vertical direction. The main pipe 125p branches off from the main pipe 125p. The branch point between the main pipe 125p and the branch pipe 125q is located downstream of the exhaust volume adjustment mechanism 126. Therefore, the exhaust volume adjustment mechanism 126 can adjust the amount of exhaust gas flowing through the main pipe 125p, while the branch pipe 125q exhausts a constant amount of gas regardless of the exhaust volume adjustment mechanism 126.

The branch pipe 125q extends diagonally upward from the main pipe 125p. The cross-sectional area of the passage of the branch pipe 125q is smaller than the cross-sectional area of the passage of the main pipe 125p. A separate blower mechanism may be installed in the branch pipe 125q.

In the description above with reference to Figures 27 and 28, the exhaust unit 124 changes the opening degree of the exhaust pipe 125 that connects the fluid cabinet 120 to the outside, but this embodiment is not limited to this. The exhaust unit 124 may also have an air supply unit that supplies gas to the fluid cabinet 120.

Next, the exhaust control method for the fluid cabinet 120 according to this embodiment will be described with reference to Figure 30. Figures 30(a) to 30(c) are schematic diagrams for explaining the exhaust control method for the fluid cabinet 120 according to this embodiment.

Next, with reference to Figures 1 to 30, an exhaust control method for the fluid cabinet 120 of this embodiment will be described. Figures 30(a) to 30(c) are schematic diagrams for explaining the exhaust control method for the fluid cabinet 120 of this embodiment. The fluid cabinet 120 shown in Figure 30 has the same configuration as the fluid cabinet 120 shown in Figure 28, except that it further includes an air supply section 128, and therefore, duplicated descriptions will be omitted to avoid redundancy.

As shown in FIG. 30(a), the exhaust section 124 here has an exhaust pipe 125, an exhaust volume adjustment mechanism 126, and an air supply section 128. The air supply section 128 is attached to the air intake port 123. The air supply section 128 includes, for example, a fan. The exhaust volume adjustment mechanism 126 can adjust the opening of the exhaust pipe 125. By controlling at least one of the exhaust volume adjustment mechanism 126 and the air supply section 128, the amount of exhaust air exhausted from the fluid cabinet 120 to the outside can be adjusted. Note that the exhaust volume adjustment mechanism 126 may maintain the opening of the exhaust pipe 125 constant after the substrate processing apparatus 100 starts operating.

The atmosphere inside the fluid cabinet 120 is exhausted under standard exhaust conditions set to a standard exhaust volume. The control unit 102 sets the exhaust conditions to the standard exhaust conditions. When the exhaust pressure of the fluid cabinet 120 is maintained at the target value Gv, the air supply unit 128 supplies gas to the fluid cabinet 120 at the standard air supply volume. In this case, the air supply unit 128 does not need to be driven.

The exhaust unit 124 exhausts the atmosphere inside the fluid cabinet 120 under standard exhaust conditions. As the exhaust unit 124 exhausts air, air is drawn into the fluid cabinet 120 through the intake port 123. Standard exhaust prevents the atmosphere inside the housing 122 from leaking outside the housing 122.

As shown in FIG. 30(b), when the exhaust pressure from the fluid cabinet 120 drops within the fluid cabinet 120, the exhaust unit 124 exhausts the atmosphere within the fluid cabinet 120 under forced exhaust conditions set to a forced exhaust volume greater than the standard exhaust volume. Specifically, when the exhaust pressure within the fluid cabinet 120 drops, the exhaust pressure detection unit 130q detects the drop in exhaust pressure within the fluid cabinet 120. The control unit 102 determines the drop in exhaust pressure within the fluid cabinet 120 based on the detection result of the exhaust pressure detection unit 130q. The control unit 102 determines the forced exhaust conditions according to the drop in exhaust pressure. Specifically, the control unit 102 controls the air supply unit 128 to supply gas at a forced air supply volume greater than the standard air supply volume. This causes the exhaust unit 124 to exhaust the atmosphere within the fluid cabinet 120.

Here, the exhaust pressure detection unit 130q detects a relatively small drop in exhaust pressure within the fluid cabinet 120. In this case, the control unit 102 determines the forced air supply conditions, which are set to a forced air supply volume greater than the standard air supply volume, depending on the drop in exhaust pressure. The control unit 102 controls the air supply unit 128 under the determined forced air supply conditions, thereby forcibly exhausting the atmosphere within the fluid cabinet 120.

As shown in FIG. 30(c), when the exhaust pressure inside the fluid cabinet 120 drops relatively significantly, the exhaust unit 124 exhausts the atmosphere inside the fluid cabinet 120 under forced air supply conditions set to a forced exhaust volume greater than the standard exhaust volume. Here, when the exhaust pressure detection unit 130q detects a relatively large drop in exhaust pressure inside the fluid cabinet 120, the control unit 102 determines forced air supply conditions set to an even greater forced air supply volume in accordance with the drop in exhaust pressure. The control unit 102 controls the air supply unit 128 under the determined forced air supply conditions. This allows the atmosphere inside the fluid cabinet 120 to be forcibly exhausted.

As described above, according to the method for controlling exhaust of the fluid cabinet 120 of this embodiment, the exhaust volume of the exhaust section 124 can be controlled in accordance with the decrease in exhaust pressure within the fluid cabinet 120. Therefore, the atmosphere within the fluid cabinet 120 can be appropriately exhausted in accordance with the decrease in exhaust pressure within the fluid cabinet 120.

Next, a method for controlling exhaust from the fluid cabinet 120 according to an embodiment will be described with reference to Figure 31. Figures 31(a) to 31(c) are schematic diagrams for explaining a method for controlling exhaust from the fluid cabinet 120 according to this embodiment. The fluid cabinet 120 shown in Figure 31 has the same configuration as the fluid cabinet 120 shown in Figure 28, except that it further includes a branch pipe 125q and an exhaust fan 129, and therefore, duplicated descriptions will be omitted to avoid redundancy.

As shown in FIG. 31(a), the exhaust section 124 here has an exhaust pipe 125, an exhaust volume adjustment mechanism 126, and an exhaust fan 129. The exhaust pipe 125 has a main pipe 125p and a branch pipe 125q. The main pipe 125p extends in a straight line. The branch pipe 125q branches off midway from the main pipe 125p. The exhaust volume adjustment mechanism 126 adjusts the opening of the exhaust pipe 125. The exhaust volume adjustment mechanism 126 is located upstream of the branch point of the main pipe 125p. The exhaust fan 129 increases the volume of exhaust from the fluid cabinet 120. The exhaust fan 129 is located on the branch pipe 125q. By controlling at least one of the exhaust volume adjustment mechanism 126 and the exhaust fan 129, the volume of exhaust exhausted from the fluid cabinet 120 to the outside can be adjusted. The exhaust amount adjustment mechanism 126 may maintain the opening of the exhaust pipe 125 constant after the substrate processing apparatus 100 starts operating.

The atmosphere inside the fluid cabinet 120 is exhausted under standard exhaust conditions set to a standard exhaust volume. The control unit 102 sets the exhaust conditions to the standard exhaust conditions. When the exhaust pressure of the fluid cabinet 120 is maintained at the target value Gv, the exhaust fan 129 exhausts the atmosphere inside the fluid cabinet 120 at a standard exhaust volume. In this case, the exhaust fan 129 does not need to be driven.

The exhaust unit 124 exhausts the atmosphere inside the fluid cabinet 120 under standard exhaust conditions. As the exhaust unit 124 exhausts air, air is drawn into the fluid cabinet 120 through the intake port 123. Standard exhaust prevents the atmosphere inside the housing 122 from leaking outside the housing 122.

As shown in FIG. 31(b), when the exhaust pressure from the fluid cabinet 120 drops within the fluid cabinet 120, the exhaust unit 124 exhausts the atmosphere within the fluid cabinet 120 under forced exhaust conditions set to a forced exhaust volume greater than the standard exhaust volume. Specifically, when the exhaust pressure within the fluid cabinet 120 drops, the exhaust pressure detection unit 130q detects the drop in exhaust pressure within the fluid cabinet 120. The control unit 102 determines the state of the drop in exhaust pressure within the fluid cabinet 120 based on the detection result of the exhaust pressure detection unit 130q. The control unit 102 determines the forced exhaust conditions set to a forced exhaust volume greater than the standard exhaust volume of the exhaust fan 129 in accordance with the state of the drop in exhaust pressure. Specifically, the control unit 102 controls the exhaust fan 129 under the determined forced exhaust conditions, causing the exhaust unit 124 to exhaust the atmosphere within the fluid cabinet 120. The exhaust unit 124 exhausts the atmosphere within the fluid cabinet 120 in accordance with the determined forced exhaust conditions.

Here, the exhaust pressure detection unit 130q detects a relatively small decrease in exhaust pressure within the fluid cabinet 120. In this case, the control unit 102 determines the forced exhaust conditions for the exhaust fan 129, which are set to a forced exhaust volume greater than the standard exhaust volume, depending on the decrease in exhaust pressure. The control unit 102 controls the exhaust fan 129 according to the determined forced exhaust conditions, causing the exhaust fan 129 to exhaust the atmosphere within the fluid cabinet 120.

As shown in FIG. 31(c), when the exhaust pressure inside the fluid cabinet 120 drops relatively significantly, the exhaust unit 124 exhausts the atmosphere inside the fluid cabinet 120 under the forced exhaust conditions of the exhaust fan 129, which are set to a forced exhaust volume greater than the standard exhaust volume. Here, when the exhaust pressure detection unit 130q detects a relatively large drop in the exhaust pressure inside the fluid cabinet 120, the control unit 102 determines the forced exhaust conditions of the exhaust fan 129, which are set to an even greater forced exhaust volume depending on the state of the drop in exhaust pressure. The control unit 102 controls the exhaust fan 129 under the determined forced exhaust conditions, allowing the exhaust fan 129 to forcibly exhaust the atmosphere inside the fluid cabinet 120.

As described above, according to the method for controlling exhaust of the fluid cabinet 120 of this embodiment, the exhaust volume of the exhaust section 124 can be controlled according to the state of the decrease in exhaust pressure inside the fluid cabinet 120. Therefore, the atmosphere inside the fluid cabinet 120 can be appropriately exhausted according to the amount of processing liquid that has leaked inside the fluid cabinet 120.

The above describes embodiments of the present invention with reference to the drawings. However, the present invention is not limited to the above embodiments and can be embodied in various forms without departing from the spirit of the present invention. Furthermore, various inventions can be created by appropriately combining multiple components disclosed in the above embodiments. For example, some components may be omitted from all of the components shown in the embodiments. Furthermore, components from different embodiments may be appropriately combined. The drawings primarily show each component diagrammatically to facilitate understanding, and the thickness, length, number, spacing, etc. of each illustrated component may differ from the actual components due to the convenience of the drawings. Furthermore, the materials, shapes, dimensions, etc. of each component shown in the above embodiments are merely examples and are not particularly limited, and various modifications are possible within a scope that does not substantially deviate from the effects of the present invention.

The present invention is suitable for use in venting fluid cabinets.

REFERENCE SIGNS LIST 10 substrate processing unit 12 chamber 20 substrate holder 30 processing liquid supply unit 100 substrate processing apparatus 110 fluid box 120 fluid cabinet W substrate

Claims (22)

1. A method for exhausting an atmosphere in a space partitioned by a fluid cabinet in which fluid piping through which fluid supplied to a substrate processing unit flows is provided, comprising:
a standard evacuation step of evacuating the atmosphere in the fluid cabinet under standard evacuation conditions;
an abnormality detection step of detecting an abnormality in the fluid cabinet;
an abnormality determination step of determining an abnormal state in the fluid cabinet based on the detection result in the abnormality detection step;
a forced exhaust condition determination step of determining forced exhaust conditions that are set to an exhaust volume greater than the exhaust volume under the standard exhaust conditions based on the determination result in the abnormal state determination step;
a forced exhaust step of exhausting the atmosphere inside the fluid cabinet under the forced exhaust conditions determined in the forced exhaust condition determination step ,
the abnormality detection step includes an exhaust pressure drop detection step of detecting a drop in exhaust pressure in the fluid cabinet,
The method for controlling exhaust of a fluid cabinet, wherein the abnormal state determination step includes an exhaust pressure drop state determination step of determining a drop state of the exhaust pressure of the fluid cabinet based on the detection result in the exhaust pressure drop detection step . 1. A method for exhausting an atmosphere in a space partitioned by a fluid cabinet in which fluid piping through which fluid supplied to a substrate processing unit flows is provided, comprising:
a standard evacuation step of evacuating the atmosphere in the fluid cabinet under standard evacuation conditions;
an abnormality detection step of detecting an abnormality in the fluid cabinet;
an abnormality determination step of determining an abnormal state in the fluid cabinet based on the detection result in the abnormality detection step;
a forced exhaust condition determination step of determining forced exhaust conditions that are set to an exhaust volume greater than the exhaust volume under the standard exhaust conditions based on the determination result in the abnormal state determination step;
a forced exhaust step of exhausting the atmosphere inside the fluid cabinet under the forced exhaust conditions determined in the forced exhaust condition determination step;
It encompasses
The forced evacuation step includes:
a first forced evacuation step, which is a transition from the standard evacuation step, of evacuating the atmosphere inside the fluid cabinet under first forced evacuation conditions set to a first forced evacuation amount greater than the evacuation amount under the standard evacuation conditions;
and a second forced exhaust process for exhausting the atmosphere in the fluid cabinet under second forced exhaust conditions set to a second forced exhaust amount that is greater than the exhaust amount under the standard exhaust condition and smaller than the first forced exhaust amount, if no abnormality is detected within the fluid cabinet after a predetermined time has elapsed since transitioning from the standard exhaust process to the first forced exhaust process. 1. A method for exhausting an atmosphere in a space partitioned by a fluid cabinet in which fluid piping through which fluid supplied to a substrate processing unit flows is provided, comprising:
a standard evacuation step of evacuating the atmosphere in the fluid cabinet under standard evacuation conditions;
an abnormality detection step of detecting an abnormality in the fluid cabinet;
an abnormality determination step of determining an abnormal state in the fluid cabinet based on the detection result in the abnormality detection step;
a forced exhaust condition determination step of determining forced exhaust conditions that are set to an exhaust volume greater than the exhaust volume under the standard exhaust conditions based on the determination result in the abnormal state determination step;
a forced exhaust step of exhausting the atmosphere inside the fluid cabinet under the forced exhaust conditions determined in the forced exhaust condition determination step;
It encompasses
The forced exhaust process is a method for controlling exhaust of a fluid cabinet, and includes a step of determining whether or not to return the exhaust conditions for exhausting the atmosphere in the fluid cabinet to the standard exhaust conditions based on the temporal change in the abnormal condition in the previous fluid cabinet determined in the forced exhaust process. 1. A method for exhausting an atmosphere in a space partitioned by a fluid cabinet in which fluid piping through which fluid supplied to a substrate processing unit flows is provided, comprising:
a standard exhaust step of exhausting the atmosphere in the fluid cabinet under standard exhaust conditions;
an abnormality detection step of detecting an abnormality in the fluid cabinet;
an abnormality determination step of determining an abnormal state in the fluid cabinet based on the detection result in the abnormality detection step;
a forced exhaust condition determination step of determining forced exhaust conditions set to an exhaust volume greater than the exhaust volume under the standard exhaust conditions based on the determination result in the abnormal state determination step;
a forced exhaust step of exhausting the atmosphere inside the fluid cabinet under the forced exhaust conditions determined in the forced exhaust condition determination step;
It encompasses
The fluid cabinet includes:
a first fluid housing;
a second fluid housing connected to a common exhaust pipe shared with the first fluid housing;
Including,
When an abnormality in the first fluid casing is detected in the abnormality detection step, the atmosphere in the first fluid casing is exhausted under the forced exhaust condition in the forced exhaust step;
In the forced exhaust condition determination step, a first enclosure forced exhaust condition corresponding to the first fluid enclosure and a second enclosure forced exhaust condition corresponding to the second fluid enclosure are determined;
A method for controlling exhaust of a fluid cabinet, wherein the first enclosure forced exhaust condition is different from the second enclosure forced exhaust condition. 1. A method for exhausting an atmosphere in a space partitioned by a fluid cabinet in which fluid piping through which fluid supplied to a substrate processing unit flows is provided, comprising:
a standard exhaust step of exhausting the atmosphere in the fluid cabinet under standard exhaust conditions;
an abnormality detection step of detecting an abnormality in the fluid cabinet;
an abnormality determination step of determining an abnormal state in the fluid cabinet based on the detection result in the abnormality detection step;
a forced exhaust condition determination step of determining forced exhaust conditions set to an exhaust volume greater than the exhaust volume under the standard exhaust conditions based on the determination result in the abnormal state determination step;
a forced exhaust step of exhausting the atmosphere inside the fluid cabinet under the forced exhaust conditions determined in the forced exhaust condition determination step;
It encompasses
A method for controlling exhaust of a fluid cabinet, in which, if an abnormality in the fluid cabinet is detected in the abnormality detection process, the exhaust volume of a dummy cabinet connected to a common exhaust piping shared with the fluid cabinet is reduced below the exhaust volume of the standard exhaust process, and the exhaust volume of the fluid cabinet is increased above the exhaust volume of the standard exhaust process , in the forced exhaust process. the abnormality detection step includes a liquid leakage detection step of detecting a liquid leakage occurring in the fluid cabinet,
6. The method for controlling exhaust of a fluid cabinet according to claim 2, wherein the abnormal state determination step includes a leakage state determination step of determining a leakage state in the fluid cabinet based on a detection result in the leakage detection step. 7. A method for controlling exhaust of a fluid cabinet according to claim 1, wherein in the standard exhaust process, the standard exhaust conditions are set based on the type of fluid flowing through the fluid piping in the fluid cabinet or the flow rate of the fluid flowing through the fluid piping. The fluid cabinet includes:
a first fluid housing;
a second fluid housing connected to a common exhaust pipe common to the first fluid housing,
A method for controlling exhaust of a fluid cabinet as described in any one of claims 1 to 3 and 5, wherein if an abnormality is detected in the first fluid housing in the abnormality detection process, the atmosphere in the first fluid housing is exhausted under the forced exhaust conditions in the forced exhaust process. 9. The method for controlling exhaust of a fluid cabinet according to claim 4 , wherein the forced exhaust step increases the amount of exhaust gas flowing through the common exhaust pipe. 9. An exhaust control method for a fluid cabinet as described in claim 4 or 8, wherein if an abnormality is detected in the first fluid housing during the abnormality detection process, the exhaust volume of the first fluid housing is increased during the forced exhaust process without changing the exhaust volume of the exhaust circulating through the common exhaust piping. the abnormal state determination step determines the abnormal state by comparing the detection result with a predetermined reference value;
A method for controlling exhaust of a fluid cabinet described in any one of claims 4 and 8 to 10 , wherein a first reference value which is the reference value for the judgment corresponding to the first fluid housing and a second reference value which is the reference value for the judgment corresponding to the second fluid housing are different. a substrate processing unit for processing a substrate;
a fluid cabinet in which fluid piping is arranged through which fluids supplied to the substrate processing units flow;
an abnormality detection unit that detects an abnormality in the fluid cabinet;
an exhaust unit that exhausts the atmosphere inside the fluid cabinet;
a control unit that controls the exhaust unit,
the control unit controls the exhaust unit to exhaust the atmosphere inside the fluid cabinet under standard exhaust conditions;
the control unit determines an abnormal state in the fluid cabinet based on a detection result of the abnormality detection unit detecting an abnormality in the fluid cabinet,
the abnormality detection unit includes an exhaust pressure detection unit that detects an exhaust pressure in the fluid cabinet,
the control unit determines forced exhaust conditions that are set to an exhaust volume greater than an exhaust volume under the standard exhaust conditions based on the determination result of the abnormal state,
The control unit controls the exhaust unit to exhaust the atmosphere inside the fluid cabinet under the forced exhaust condition. a substrate processing unit for processing a substrate;
a fluid cabinet in which fluid piping is arranged through which fluids supplied to the substrate processing units flow;
an abnormality detection unit that detects an abnormality in the fluid cabinet;
an exhaust unit that exhausts the atmosphere inside the fluid cabinet;
a control unit that controls the exhaust unit;
Equipped with
the control unit controls the exhaust unit to exhaust the atmosphere inside the fluid cabinet under standard exhaust conditions;
the control unit determines an abnormal state in the fluid cabinet based on a detection result of the abnormality detection unit detecting an abnormality in the fluid cabinet,
the control unit determines forced exhaust conditions that are set to an exhaust volume greater than an exhaust volume under the standard exhaust conditions based on the determination result of the abnormal state,
the control unit controls the exhaust unit to exhaust the atmosphere inside the fluid cabinet under the forced exhaust condition;
The control unit
controlling the exhaust unit so as to switch from the standard exhaust condition to a first forced exhaust condition set to a first forced exhaust amount greater than the exhaust amount under the standard exhaust condition, and exhausting the atmosphere inside the fluid cabinet;
A substrate processing apparatus, wherein if no abnormality is detected within the fluid cabinet after a predetermined time has elapsed since transitioning from the standard exhaust condition to the first forced exhaust condition, the exhaust unit is controlled to exhaust the atmosphere within the fluid cabinet under second forced exhaust conditions set to a second forced exhaust amount that is greater than the exhaust amount of the standard exhaust condition and smaller than the first forced exhaust amount. a substrate processing unit for processing a substrate;
a fluid cabinet in which fluid piping is arranged through which fluids supplied to the substrate processing units flow;
an abnormality detection unit that detects an abnormality in the fluid cabinet;
an exhaust unit that exhausts the atmosphere inside the fluid cabinet;
a control unit that controls the exhaust unit;
Equipped with
the control unit controls the exhaust unit to exhaust the atmosphere inside the fluid cabinet under standard exhaust conditions;
the control unit determines an abnormal state in the fluid cabinet based on a detection result of the abnormality detection unit detecting an abnormality in the fluid cabinet,
the control unit determines forced exhaust conditions that are set to an exhaust volume greater than an exhaust volume under the standard exhaust conditions based on the determination result of the abnormal state,
the control unit controls the exhaust unit to exhaust the atmosphere inside the fluid cabinet under the forced exhaust condition;
The control unit of the substrate processing apparatus determines whether or not to return the exhaust conditions for exhausting the atmosphere in the fluid cabinet to the standard exhaust conditions based on the temporal change in the abnormal state in the fluid cabinet determined when exhausting the atmosphere in the fluid cabinet under the forced exhaust conditions. a substrate processing unit for processing a substrate;
a fluid cabinet in which fluid piping is arranged through which fluids supplied to the substrate processing units flow;
an abnormality detection unit that detects an abnormality in the fluid cabinet;
an exhaust unit that exhausts the atmosphere inside the fluid cabinet;
a control unit that controls the exhaust unit;
Equipped with
the control unit controls the exhaust unit to exhaust the atmosphere inside the fluid cabinet under standard exhaust conditions;
the control unit determines an abnormal state in the fluid cabinet based on a detection result of the abnormality detection unit detecting an abnormality in the fluid cabinet,
the control unit determines forced exhaust conditions that are set to an exhaust volume greater than an exhaust volume under the standard exhaust conditions based on the determination result of the abnormal state,
the control unit controls the exhaust unit to exhaust the atmosphere inside the fluid cabinet under the forced exhaust condition;
The fluid cabinet includes:
a first fluid housing;
a second fluid housing connected to a common exhaust pipe shared with the first fluid housing;
Including,
when the abnormality detection unit detects an abnormality in the first fluid casing, the control unit controls the exhaust unit to exhaust the atmosphere in the first fluid casing under the forced exhaust condition,
the control unit determines, as the forced exhaust conditions, a first enclosure forced exhaust condition corresponding to the first fluid enclosure and a second enclosure forced exhaust condition corresponding to the second fluid enclosure;
The substrate processing apparatus, wherein the first enclosure forced exhaust condition is different from the second enclosure forced exhaust condition. a substrate processing unit for processing a substrate;
a fluid cabinet in which fluid piping is arranged through which fluids supplied to the substrate processing units flow;
an abnormality detection unit that detects an abnormality in the fluid cabinet;
an exhaust unit that exhausts the atmosphere inside the fluid cabinet;
a control unit that controls the exhaust unit;
A dummy cabinet and
a common exhaust pipe connected to each of the fluid cabinet and the dummy cabinet;
Equipped with
the control unit controls the exhaust unit to exhaust the atmosphere inside the fluid cabinet under standard exhaust conditions;
the control unit determines an abnormal state in the fluid cabinet based on a detection result of the abnormality detection unit detecting an abnormality in the fluid cabinet,
the control unit determines forced exhaust conditions that are set to an exhaust volume greater than an exhaust volume under the standard exhaust conditions based on the determination result of the abnormal state,
the control unit controls the exhaust unit to exhaust the atmosphere inside the fluid cabinet under the forced exhaust condition;
In a substrate processing apparatus, when the abnormality detection unit detects an abnormality in the fluid cabinet, the control unit reduces the exhaust volume of the dummy cabinet below the exhaust volume under the standard exhaust conditions and increases the exhaust volume of the fluid cabinet above the exhaust volume under the standard exhaust conditions. The substrate processing apparatus according to claim 13 , wherein the abnormality detection unit includes a liquid leakage detection unit that detects liquid leakage in the fluid cabinet. 18. The substrate processing apparatus according to claim 12, wherein the control unit sets the standard exhaust condition based on a type of fluid flowing through the fluid piping in the fluid cabinet or a flow rate of the fluid flowing through the fluid piping. The fluid cabinet includes:
a first fluid housing;
a second fluid housing connected to a common exhaust pipe common to the first fluid housing,
17. The substrate processing apparatus of claim 12, wherein the control unit controls the exhaust unit to exhaust the atmosphere in the first fluid enclosure under the forced exhaust conditions when the abnormality detection unit detects an abnormality in the first fluid enclosure. 20. The substrate processing apparatus according to claim 15 , wherein the control unit increases the amount of exhaust gas flowing through the common exhaust pipe under the forced exhaust condition. 20. The substrate processing apparatus of claim 15, wherein when the abnormality detection unit detects an abnormality in the first fluid enclosure, the control unit increases the exhaust volume of the first fluid enclosure without changing the exhaust volume of the exhaust circulating through the common exhaust piping under the forced exhaust condition. The control unit determines the abnormal state by comparing the detection result with a predetermined reference value,
22. The substrate processing apparatus according to claim 15, wherein a first reference value, which is a reference value for judgment corresponding to the first fluid enclosure, and a second reference value, which is a reference value for judgment corresponding to the second fluid enclosure, are different.