JP7800045B2 - Cleaning composition and cleaning method - Google Patents

Description

The present invention relates to a cleaning composition and a cleaning method.

Hydrofluoroethers (hereinafter also referred to as HFEs) are known to be solvents that do not contain chlorine atoms in their molecules and have no impact on the ozone layer. Due to their excellent drying properties as fluorine-based solvents, HFEs are used as cleaning agents, diluents for lubricating oils, and heat transfer media. Patent Document 1 discloses a method for solvent cleaning of articles, which involves contacting the article to be cleaned with a solvent composition having a boiling point in the range of 20 to 120°C and containing a low-molecular-weight fluorinated ether having at least three carbon atoms and one or more hydrogen atoms, or its vapor, or both.

Patent No. 2961924

Cleaning removes various types of dirt that have adhered to an item. These include resin materials, dust, adhesives, ink, inorganic components, and organic components, and these can also exist as a combination of two or more types of dirt on the substrate.

However, in the case of stains containing (meth)acrylic resin and dust derived from adhesives or inks, the (meth)acrylic resin and dust become integrated, and the method described in Patent Document 1 may not be able to thoroughly clean the stains.

An object of the present invention is to provide a cleaning composition that is excellent in removing (meth)acrylic resins and dust from articles.
Another object of the present invention is to provide a cleaning method.

As a result of extensive investigation, the present inventors have found that the problems can be solved by the following configuration.
[1] A cleaning composition comprising 1,1,2,2-tetrafluoroethyl-2,2,2-trifluoroethyl ether and 2-chloro-1,1,1-trifluoroethane.
[2] The cleaning composition according to [1], wherein the total content of the 1,1,2,2-tetrafluoroethyl-2,2,2-trifluoroethyl ether and the 2-chloro-1,1,1-trifluoroethane is 80 to 100% by mass, based on the total amount of the cleaning composition.
[3] The cleaning composition according to [1] or [2], further comprising at least one selected from the group consisting of tetrafluoroethylene and 1,1,2-trifluoro-2-(2,2,2-trifluoroethoxy)ethene.
[4] The cleaning composition according to any one of [1] to [3], which is used for cleaning an article having dirt containing a (meth)acrylic resin and dust attached thereto.
[5] A cleaning method, comprising cleaning an article having soiling containing a (meth)acrylic resin and dust adhered thereto, using the cleaning composition according to any one of [1] to [4].
[6] The cleaning method according to [5], wherein the article is at least one selected from the group consisting of textile products, medical instruments, electrical equipment, precision machinery, and optical articles.

The cleaning composition of the present invention is excellent in removing (meth)acrylic resin and dust from articles.
Furthermore, the present invention can provide a cleaning method using the cleaning composition.

The terms used in the present invention have the following meanings.
(Meth)acrylic resin is a general term for acrylic resin and methacrylic resin.

The dirt includes (meth)acrylic resin and dust. The dirt may be composed of (meth)acrylic resin and dust, or may contain components other than (meth)acrylic resin and dust. The dust may be organic matter, inorganic matter, or a combination of both.
Examples of organic substances include oils such as processing oil, fluorine oil, silicone oil, and synthetic oil, resins such as polycarbonate, polystyrene, polyethylene, polypropylene, and polytetrafluoroethylene (hereinafter also referred to as PTFE), and organic fibers. Two or more types of organic substances may be included.
Examples of inorganic substances include silica, calcium, iron chloride, glass, inorganic fibers, graphite, metals, etc. Two or more types of inorganic substances may be contained.
Examples of the composite include the above-mentioned organic and inorganic composite materials.
The stain may be in a liquid or solid form. The shape of the solid stain is not particularly limited, and examples thereof include spherical, elliptical, cubic, spindle-shaped, and irregular shapes.
In the case of solid spherical dirt, the size of the dirt is not particularly limited, but is, for example, about 0.1 μm to 1 mm, and preferably about 1 μm to 0.1 mm.

(Detergent composition)
The solvent composition of the present invention contains 1,1,2,2-tetrafluoroethyl-2,2,2-trifluoroethyl ether (hereinafter also referred to as HFE-347pc-f) and 2-chloro-1,1,1-trifluoroethane (CF ₃ CH ₂ Cl, hereinafter also referred to as HCFC-133a).

(HFE-347pc-f)
HFE-347pc-f has zero ozone depletion potential and low global warming potential.
HFE-347pc-f does not have a flash point.
HFE-347pc-f has low surface tension and viscosity.
HFE-347pc-f has a boiling point of 56°C.

HFE-347pc-f can be produced, for example, by reacting 2,2,2-trifluoroethanol with tetrafluoroethylene in the presence of an aprotic polar solvent and a catalyst (alkali metal alkoxide or alkali metal hydroxide) (see WO 2004/108644).

Examples of commercially available HFE-347pc-f products include the following:
"ASAHIKLIN (registered trademark) AE-3000" (manufactured by AGC).

(HCFC-133a)
HCFC-133a has a boiling point of 6°C.
HCFC-133a can be produced, for example, by a method in which trichloroethylene and hydrogen fluoride are supplied in the presence of a catalyst (chromium oxide) and reacted in the vapor phase.

The cleaning composition of the present invention contains HFE-347pc-f and HCFC-133a, which improves the cleaning power of the cleaning composition and provides excellent removal of stains containing (meth)acrylic resin and dust from articles.

In view of excellent removability of stains containing (meth)acrylic resin and dust on articles, the content of HFE-347pc-f in the cleaning composition of the present invention is preferably 99.9900 to 99.9999 mass%, more preferably 99.9950 to 99.9999 mass%, and even more preferably 99.9975 to 99.9999 mass%, based on the total content of HFE-347pc-f and HCFC-133a.

In order to achieve excellent removability of stains containing (meth)acrylic resin and dust on articles, the content of HCFC-133a in the cleaning composition of the present invention is preferably 1 to 100 ppm by mass, more preferably 1 to 50 ppm by mass, and even more preferably 1 to 25 ppm by mass, relative to the total content of HFE-347pc-f and HCFC-133a.

In view of excellent removability of stains containing (meth)acrylic resin and dust on articles, the total content of HFE-347pc-f and HCFC-133a in the cleaning composition of the present invention is preferably 80 to 100% by mass, more preferably 90 to 100% by mass, and even more preferably 95 to 100% by mass, based on the total amount of the cleaning composition.

In order to impart antifouling properties to articles, the cleaning composition of the present invention preferably further contains at least one selected from the group consisting of tetrafluoroethylene (hereinafter also referred to as TFE) and 1,1,2-trifluoro-2-(2,2,2-trifluoroethoxy)ethene (C ₄ H ₂ F ₆ O; hereinafter also referred to as specific vinyl ether). Here, antifouling properties refer to preventing adhesion of stains such as resin materials, dust, adhesives, inks, inorganic components, and organic components to the surface of an article. Antifouling properties are evaluated based on the contact angle of the article surface. The contact angle is the angle between the liquid surface and the article surface at the point where a stationary liquid comes into contact with the surface of the article. The larger this angle, the higher the antifouling properties of the article. The change in contact angle before and after cleaning is preferably 3° or more, more preferably 8° or more.

The specific vinyl ether can be produced, for example, by reacting 2,2,2-trifluoroethanol with hexafluoropropylene oxide in the presence of aqueous potassium hydroxide, diethyl ether, and tetra-n-butylammonium bromide to obtain 2-(2,2,2-trifluoroethoxy)tetrafluoropropionic acid, then reacting 2-(2,2,2-trifluoroethoxy)tetrafluoropropionic acid with sodium hydroxide in the presence of methanol to obtain sodium 2-(2,2,2-trifluoroethoxy)tetrafluoropropionate, and then heating the sodium 2-(2,2,2-trifluoroethoxy)tetrafluoropropionate to obtain 1,1,2-trifluoro-2-(2,2,2-trifluoroethoxy)ethene.

When the cleaning composition of the present invention contains TFE, the content of TFE in the cleaning composition of the present invention is preferably 0.1 to 100 ppm by mass, more preferably 0.2 to 80 ppm by mass, and even more preferably 0.5 to 75 ppm by mass, relative to the total content of HFE-347pc-f, HCFC-133a, and TFE, in order to improve the contact angle on the surface of the article and impart antifouling properties to the article.

When the cleaning composition of the present invention contains TFE, the content of HCFC-133a in the cleaning composition of the present invention is preferably 1 to 100 ppm by mass, more preferably 1 to 50 ppm by mass, and even more preferably 1 to 25 ppm by mass, based on the total content of HFE-347pc-f, HCFC-133a, and TFE.

When the cleaning composition of the present invention contains TFE, the content of HFE-347pc-f in the cleaning composition of the present invention is preferably 99.98000 to 99.99989 mass%, more preferably 99.98700 to 99.99988 mass%, and even more preferably 99.99000 to 99.99985 mass%, based on the total content of HFE-347pc-f, HCFC-133a, and TFE.

When the cleaning composition of the present invention contains TFE, the total content of HFE-347pc-f, HCFC-133a, and TFE in the cleaning composition of the present invention is preferably 80 to 100% by mass, more preferably 90 to 100% by mass, and even more preferably 95 to 100% by mass, based on the total amount of the cleaning composition, in order to achieve excellent removability of stains containing (meth)acrylic resin and dust on articles.

When the cleaning composition of the present invention contains a specific vinyl ether, the content of the specific vinyl ether in the cleaning composition of the present invention is preferably 1 to 1,000 ppm by mass, more preferably 5 to 750 ppm by mass, and even more preferably 10 to 500 ppm by mass, relative to the total content of HFE-347pc-f, HCFC-133a, and the specific vinyl ether, in order to improve the contact angle on the surface of the article and impart antifouling properties to the article.

When the cleaning composition of the present invention contains a specific vinyl ether, the content of HCFC-133a in the cleaning composition of the present invention is preferably 1 to 100 ppm by mass, more preferably 1 to 50 ppm by mass, and even more preferably 1 to 25 ppm by mass, based on the total content of HFE-347pc-f, HCFC-133a, and the specific vinyl ether.

When the cleaning composition of the present invention contains a specific vinyl ether, the content of HFE-347pc-f in the cleaning composition of the present invention is preferably 99.8900 to 99.9998 mass%, more preferably 99.9200 to 99.9994 mass%, and even more preferably 99.9475 to 99.9989 mass%, based on the total content of HFE-347pc-f, HCFC-133a, and the specific vinyl ether.

When the cleaning composition of the present invention contains a specific vinyl ether, the total content of HFE-347pc-f, HCFC-133a, and the specific vinyl ether in the cleaning composition of the present invention is preferably 80 to 100% by mass, more preferably 90 to 100% by mass, and even more preferably 95 to 100% by mass, based on the total amount of the cleaning composition, in order to achieve excellent removability of stains containing (meth)acrylic resin and dust on articles.

The cleaning composition of the present invention may contain a component other than HFE-347pc-f, HCFC-133a, TFE, and the specific vinyl ether (hereinafter also referred to as component (A)) to the extent that the effects of the present invention are not impaired.

(Component (A))
Component (A) is a component soluble in HFE-347pc-f and HCFC-133a, and when the cleaning composition of the present invention contains TFE and the specific vinyl ether, it is a component also soluble in TFE and the specific vinyl ether.
Component (A) is appropriately selected depending on various purposes, such as increasing solubility or adjusting the evaporation rate.
Examples of component (A) include hydrocarbons soluble in HFE-347pc-f, HCFC-133a, TFE, and specific vinyl ethers, alcohols, ethers other than the specific vinyl ethers, ketones, esters, amines, chlorocarbons, hydrofluorocarbons (hereinafter also referred to as HFCs), perfluorocarbons other than TFE (hereinafter also referred to as PFCs), hydrochlorofluorocarbons other than HCFC-133a (hereinafter also referred to as HCFCs), etc. These components may be contained alone or in combination of two or more.

The hydrocarbon may be linear or cyclic, and may be saturated or unsaturated.
Preferred hydrocarbons are heptane, hexane, octane, nonane, cyclobutane, cyclopentane, cyclohexane, 1-butene, 2-butene, 2-methylpropene, 1-pentene, 2-pentene, 1-butyne, 2-butyne, pentyne, cyclopropene, cyclobutene, cyclopentene, and cyclohexene.

The alcohol may be either a chain or cyclic alcohol, and may be either a saturated or unsaturated alcohol.
As the alcohol, methanol, ethanol, normal propyl alcohol, isopropyl alcohol, normal butyl alcohol, isobutyl alcohol, sec-butyl alcohol, and tert-butyl alcohol are preferred.

The ether other than the specific vinyl ether may be linear or cyclic, and may be a saturated or unsaturated ether.
As the ether other than the specific vinyl ether, dimethyl ether, ethyl methyl ether, diethyl ether, diisopropyl ether, methyl tert-butyl ether, and tetrafluoroethanol are preferred.

The ketone may be a chain or cyclic ketone, and may be a saturated or unsaturated ketone.
As the ketone, acetone, methyl ethyl ketone, diethyl ketone, methyl propyl ketone, methyl isobutyl ketone, cyclopentanone, and cyclohexanone are preferred.

The ester may be linear or cyclic, and may be a saturated or unsaturated ester.
Preferred esters are methyl formate, ethyl formate, propyl formate, methyl acetate, ethyl acetate, propyl acetate, methyl butyrate, ethyl butyrate, and γ-butyrolactone.

Preferred amines are monomethylamine, dimethylamine, and trimethylamine.

The chlorocarbon may be either chain or cyclic, and may be either saturated or unsaturated.
Preferred chlorocarbons are dichloromethane, 1,1-dichloroethane, 1,2-dichloroethane, 1,1,2-trichloroethane, 1,1,1,2-tetrachloroethane, 1,1,2,2-tetrachloroethane, pentachloroethane, 1,1-dichloroethylene, cis-1,2-dichloroethylene, trans-1,2-dichloroethylene, trichloroethylene, tetrachloroethylene, and 1,2-dichloropropane.

Preferred HFCs are 1,1,1,3,3-pentafluorobutane, 1,1,1,2,2,3,4,5,5,5-decafluoropentane, 1,1,2,2,3,3,4-heptafluorocyclopentane, 1,1,1,2,2,3,3,4,4-nonafluorohexane, 1,1,1,2,2,3,3,4,4,5,5,6,6-tridecafluorohexane, and 1,1,1,2,2,3,3,4,4,5,5,6,6-tridecafluorooctane.

Preferred PFCs other than TFE are decafluorobutane, dodecafluoropentane, tetradecafluorohexane, hexadecafluoroheptane, and octadecafluorooctane.

Preferred HCFCs other than HCFC-133a include dichloropentafluoropropane, 1,1-dichloro-1-fluoroethane, 1-chloro-1,1-difluoroethane, and 2,2-dichloro-1,1,1-trifluoroethane.

When the cleaning composition of the present invention contains component (A), the content of this component is preferably 20% by mass or less, more preferably 10% by mass or less, and even more preferably 5% by mass or less, based on the total amount of the cleaning composition.

The cleaning composition of the present invention is preferably used to clean articles having dirt containing (meth)acrylic resin and dust attached thereto.

(Cleaning method)
In the cleaning method of the present invention, the (meth)acrylic resin and dirt adhering to an article are cleaned using the detergent composition of the present invention.
Examples of the manner in which the (meth)acrylic resin adheres to an article include when an adhesive containing the (meth)acrylic resin is brought into contact with the article, and when ink containing the (meth)acrylic resin is applied to the article. Specific examples include metal parts, resin parts, inkjet printer heads and nozzle parts, etc., to which an acrylic adhesive containing a UV-curable resin or an ink containing a pigment and an acrylic resin is adhered and fixed.

The cleaning composition of the present invention dissolves and removes (meth)acrylic resin from articles, and also removes stains containing (meth)acrylic resin and dust.

Specific cleaning methods involve contacting the surface of an item with the cleaning composition of the present invention. While not particularly limited, methods that can be used include, for example, hand wiping, immersion, spraying, shaking, ultrasonic cleaning, steam cleaning, or a combination of these.

Examples of materials for articles to which the cleaning composition of the present invention can be applied include metals, resins other than (meth)acrylic resins, elastomers, glass, and ceramics. Furthermore, the article may be made of a composite material containing two or more of these materials. Examples of the composite material include a laminate of a metal and a resin other than a (meth)acrylic resin.
Specific examples of articles to which the cleaning method of the present invention can be applied include textiles, medical instruments, electrical equipment, precision machinery, optical equipment, transportation equipment, and their parts. Specific examples of electrical equipment, precision machinery, optical equipment, transportation equipment, and their parts include electric wires, fuses, current controllers, transformers, electric heaters, capacitors, resistors such as thermistors, transformers, inductors, switches, connectors, acoustic components such as speakers, sensors for light and heat, actuators such as motors, power supply components, quartz crystal resonators, quartz oscillators, filters, antenna components, printed circuit boards on which these are mounted, relays, optical lenses, glass substrates, bearings, gears, chains, and brakes.

The present invention will be described in detail below using examples. The present invention is not limited to these examples. Examples 2 to 6 are examples of cleaning compositions of the present invention, and Examples 1 and 7 are comparative examples.

(HFE-347pc-f)
As the HFE-347pc-f, AE-3000 (manufactured by AGC) was purchased.

(Preparation of HCFC-133a)
A chromium oxide catalyst (50 mL) was packed into a U-shaped reaction tube made of Inconel 600 with an inner diameter of 1/2 inch and a length of 100 cm, and the temperature was raised to 300 °C while flowing nitrogen gas (150 NmL/min). While maintaining atmospheric pressure inside the reaction tube, the catalyst was dried until the moisture content of the crude gas after passing through the reaction tube was 20 volume ppm or less. After the catalyst drying was completed, the catalyst was activated by fluorination at 300 °C while flowing a mixed gas of hydrogen fluoride (68.3 NmL/min) and nitrogen (34.1 NmL/min). The reaction tube was heated to 250 °C, and gasified trichloroethylene (9.30 NmL/min) and hydrogen fluoride (93.1 NmL/min) were supplied and reacted. The reaction crude gas was passed through a 10 mass% potassium hydroxide aqueous solution. After 30 hours, the organic layer separated in the 10 mass% potassium hydroxide aqueous solution was recovered. The recovered organic layer was purified by distillation, yielding HCFC-133a (31.0 g) with a purity of 100% by mass.

(Preparation of specific vinyl ethers)
A 2 L stainless steel reactor equipped with a stirrer and lined with fluororesin was charged with 35% by mass aqueous potassium hydroxide solution (480 g), diethyl ether (400 mL), and tetra-n-butylammonium bromide (12.2 g), and stirring was initiated. 2,2,2-trifluoroethanol (161 g) was gradually added dropwise to the reactor while cooling in an ice bath to prevent the temperature of the reactor from rising. After the dropwise addition was completed, hexafluoropropylene oxide (133 g) was added while stirring, so that the temperature of the reactor was maintained below 30°C. After stirring for 1 hour, 35% hydrochloric acid was added until the pH reached 1. After stirring for another 1 hour, the organic layer that separated from the aqueous layer was recovered. The recovered organic layer was purified by distillation to obtain 148 g of 2-(2,2,2-trifluoroethoxy)tetrafluoropropionic acid with a purity of 100% by mass.
Methanol (100 g) and sodium hydroxide pellets (26.8 g) were placed in a 1 L glass reaction vessel equipped with a stirrer and stirring was initiated. A mixed solution of 2-(2,2,2-trifluoroethoxy)tetrafluoropropionic acid (148 g) and methanol (100 g) was gradually added dropwise to the reaction vessel while cooling in an ice bath to prevent the temperature of the reaction vessel from rising. After completion of the dropwise addition, the reaction vessel was heated to 60 ° C. while distilling off the methanol under a reduced pressure of 2 to 3 torr. Thereafter, the reaction vessel was further heated to 100 ° C. while distilling off the methanol under a reduced pressure of 2 to 3 torr to obtain a residue. Thereafter, the reaction vessel was heated to 250 ° C., and the resulting volatile substances were collected in a cold trap at -78 ° C. The condensate was purified by distillation to obtain 1,1,2-trifluoro-2-(2,2,2-trifluoroethoxy)ethene (73.2 g) with a purity of 100 mass%.

(Preparation of TFE)
Zinc powder (164 g), zinc chloride (10 g), ethanol (500 g), dibromotetrafluoroethane (649 g), and tetra-n-butylammonium bromide (10 g) were placed in a 2 L Hastelloy reactor equipped with a stirrer, and stirring was initiated. The reactor was stirred for 3 hours while being heated at 65°C, and the generated gas was collected in a stainless steel vessel cooled to -78°C, yielding TFE (160 g) with a purity of 100% by mass.

(Preparation of Nonafluorobutoxymethane)
Nonafluorobutoxymethane (hereinafter also referred to as "HFE-449s1") refers to a compound represented by C ₄ F ₉ OCH _3. As HFE-449s1, a product called "Novec 7100" (manufactured by 3M), which is a mixture of 1-methoxy-2-trifluoromethyl-1,1,2,3,3,3-hexafluoropropane and 1-methoxy-1,1,2,2,3,3,4,4,4-nonafluorobutane, was purchased.

(Preparation of cleaning composition)
HFE-347pc-f, HCFC-133a, 1,1,2-trifluoro-2-(2,2,2-trifluoroethoxy)ethene, TFE, and HFE-449s1 were mixed in the mass ratios shown in Table 1 to prepare the cleaning compositions of Examples 1 to 7.

(Preparation of test specimens)
1.737 g of acrylic resin was added to 10 g of trichloroethylene, stirred and dissolved, and the resulting solution was used in the test as an acrylic resin solution.
A cleaned glass substrate of 50 mm x 50 mm was used for the test. The contact angle of water on the glass substrate was 8°.
One g of the prepared acrylic resin solution was applied to one side of a glass substrate, and graphite powder (special grade reagent, Fujifilm Wako Pure Chemical Industries, Ltd.) and PTFE powder (reagent, Fujifilm Wako Pure Chemical Industries, Ltd.) were sprinkled on the surface as dust and dried overnight to prepare a test piece. The total mass (amount of dirt) of the applied acrylic resin, graphite powder, and PTFE powder was calculated from the difference in mass before and after application.

(Cleaning test/particle residue evaluation)
In this example, two 1-L beakers were used for the test. 800 ml of each of the cleaning compositions of Examples 1 to 7 was placed in the 1-L beaker and placed in the water bath of an ultrasonic cleaner (Sharp ultrasonic cleaner UH-206H, 35 kHz, 200 W output) at 45°C. 300 ml of each of the cleaning compositions of Examples 1 to 7 was placed in the 1-L beaker with a cooling tube attached to the top, and the 1-L beaker was placed on a hot plate and heated to generate solvent vapor. In this example, one prepared test piece was used, and ultrasonic immersion cleaning was performed for 3 minutes and steam cleaning for 3 minutes using this testing equipment. The mass of the test piece after cleaning was measured, and the state of acrylic resin and particle residue on the surface was visually observed before and after the test using a 100x digital microscope (Hirox). The cleaning rate and acrylic resin and particle residue were evaluated according to the following criteria.
The cleaning rate below is calculated by the following formula: The higher the cleaning rate below, the higher the removability of the (meth)acrylic resin, graphite powder, and PTFE powder.
Cleaning rate (%) = 100 - (mass of test piece before cleaning - mass of test piece after cleaning) / (mass of test piece before cleaning - mass of test piece before preparation) x 100
Cleaning rate rating:
A: Over 70%, B: 50% to 70%, C: Less than 50%
Cleaning evaluation based on appearance of acrylic resin and particles:
AA: (Almost) no residual acrylic resin or particles can be detected; A: The acrylic resin and particles have been significantly reduced; B: The acrylic resin and particles have been reduced but are still abundant; C: No difference from the initial state.

(Measurement of water contact angle on glass substrate)
A cleaning test was carried out in the same manner using only the glass test piece, and the water contact angle of the glass substrate before and after the test was measured using an automatic contact angle meter (DY-300 manufactured by Kyowa Interface Science Co., Ltd.). The water contact angles before and after the test (contact angle after the test - contact angle before the test) were evaluated according to the following criteria.
Contact angle (change from initial value)
A: 8° or more, B: 3° or more and less than 8°, C: less than 3°

In Table 1, the column "HEF-347pc-f (mass %)" for Examples 1 to 4 indicates the content (mass %) of HEF-347pc-f relative to the total content of HFE-347pc-f and HCFC-133a.
In Table 1, the column "HCFC-133a (ppm by mass)" for Examples 1 to 4 indicates the content (ppm by mass) of HCFC-133a relative to the total content of HFE-347pc-f and HCFC-133a.
In Table 1, the column "HEF-347pc-f (mass%)" for Example 5 indicates the content (mass%) of HEF-347pc-f relative to the total content of HFE-347pc-f, HCFC-133a, and the specific vinyl ether.
In Table 1, the column "HCFC-133a (ppm by mass)" for Example 5 indicates the content (ppm by mass) of HCFC-133a relative to the total content of HFE-347pc-f, HCFC-133a, and the specific vinyl ether.
In Table 1, the column "Specific vinyl ether (ppm by mass)" for Example 5 indicates the content (ppm by mass) of the specific vinyl ether relative to the total content of HFE-347pc-f, HCFC-133a, and the specific vinyl ether.
In Table 1, the column "HEF-347pc-f (mass %)" for Example 6 indicates the content (mass %) of HEF-347pc-f relative to the total content of HFE-347pc-f, HCFC-133a, and TFE.
In Table 1, the column "HCFC-133a (ppm by mass)" for Example 6 indicates the content (ppm by mass) of HCFC-133a relative to the total content of HFE-347pc-f, HCFC-133a and TFE.
In Table 1, the column "TFE (ppm by mass)" for Example 6 indicates the content (ppm by mass) of TFE relative to the total content of HFE-347pc-f, HCFC-133a and TFE.
In Table 1, the column "HFE-449s1 (mass %)" indicates the content (mass %) of HFE-449s1 relative to the total amount of the cleaning agent composition.

In Examples 2 to 6, in which the detergent compositions contained HFE-347pc-f and HCFC-133a, the detergency in terms of the detergency rate and appearance was rated AA or A, and the compositions were excellent in the ability to remove (meth)acrylic resin from articles and also in the ability to remove dirt particles coexisting with the (meth)acrylic resin.
In Examples 5 and 6, in which the detergent composition further contained TFE and a specific vinyl ether, the contact angle was A, and the antifouling property after cleaning was improved.

Claims (6)

A cleaning composition comprising 1,1,2,2-tetrafluoroethyl-2,2,2-trifluoroethyl ether and 2-chloro-1,1,1-trifluoroethane ,
the content of the 1,1,2,2-tetrafluoroethyl-2,2,2-trifluoroethyl ether is 99.9900 to 99.9999 mass% based on the total content of the 1,1,2,2-tetrafluoroethyl-2,2,2-trifluoroethyl ether and the 2-chloro-1,1,1-trifluoroethane,
the total content of the 1,1,2,2-tetrafluoroethyl-2,2,2-trifluoroethyl ether and the 2-chloro-1,1,1-trifluoroethane is 80 to 100 mass % based on the total amount of the cleaning composition. A cleaning composition comprising 1,1,2,2-tetrafluoroethyl-2,2,2-trifluoroethyl ether, 2-chloro-1,1,1-trifluoroethane, and tetrafluoroethylene,
the content of the 1,1,2,2-tetrafluoroethyl-2,2,2-trifluoroethyl ether is 99.98000 to 99.99989 mass% based on the total content of the 1,1,2,2-tetrafluoroethyl-2,2,2-trifluoroethyl ether, the 2-chloro-1,1,1-trifluoroethane, and the tetrafluoroethylene;
the total content of the 1,1,2,2-tetrafluoroethyl-2,2,2-trifluoroethyl ether, the 2-chloro-1,1,1-trifluoroethane, and the tetrafluoroethylene is 80 to 100 mass% based on the total amount of the cleaning composition. A cleaning composition comprising 1,1,2,2-tetrafluoroethyl-2,2,2-trifluoroethyl ether, 2-chloro-1,1,1-trifluoroethane, and 1,1,2-trifluoro-2-(2,2,2-trifluoroethoxy)ethene,
the content of the 1,1,2,2-tetrafluoroethyl-2,2,2-trifluoroethyl ether is 99.8900 to 99.9998 mass% based on the total content of the 1,1,2,2-tetrafluoroethyl-2,2,2-trifluoroethyl ether, the 2-chloro-1,1,1-trifluoroethane, and the 1,1,2-trifluoro-2-(2,2,2-trifluoroethoxy)ethene;
the total content of the 1,1,2,2-tetrafluoroethyl-2,2,2-trifluoroethyl ether, the 2-chloro-1,1,1-trifluoroethane, and the 1,1,2-trifluoro-2-(2,2,2-trifluoroethoxy)ethene is 80 to 100 mass% based on the total amount of the cleaning composition. The cleaning composition according to any one of claims 1 to 3, which is used to clean items having soiling containing a (meth)acrylic resin and dust attached thereto. A cleaning method comprising cleaning an item having soiling containing a (meth)acrylic resin and dust adhered thereto using the cleaning composition according to any one of claims 1 to 4. The cleaning method according to claim 5, wherein the article is at least one selected from the group consisting of textile products, medical instruments, electrical equipment, precision machinery, and optical articles.