JP7806353B2 - Vibration treatment device and treatment method using said device - Google Patents
Vibration treatment device and treatment method using said deviceInfo
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Description
本発明は、振動乾燥機、振動流動装置等の振動処理装置及び当該装置による処理方法であって、処理容器に投入する原料が、粉粒体又はスラリー状若しくはペースト状の粉粒体含有原料である振動処理装置に係る。なお、本発明における原料(分散質)は主として誘電体とするが、水分等の液成分を蒸発させる乾燥処理の場合、金属等の非誘電体(導体)でも適用可能であり、さらには流動化固相反応にも応用できるものである。The present invention relates to a vibration processing device such as a vibration dryer or a vibration fluidizer, and a processing method using the device, in which the raw material to be fed into a processing vessel is a powder or granular material or a powder-containing raw material in a slurry or paste form. Note that, although the raw material (dispersoid) in the present invention is primarily a dielectric, in the case of a drying process in which liquid components such as water are evaporated, a non-dielectric (conductor) such as a metal can also be applied, and the present invention can also be applied to a fluidized solid-state reaction.
ここでは、振動処理装置として、振動乾燥機を、特に竪型振動乾燥機を主として例にとり説明するが、横型振動乾燥機や振動流動装置(例えば、特許文献1・2)でも同様である。Here, we will mainly use a vibration dryer, particularly a vertical vibration dryer, as an example of a vibration treatment device, but the same applies to horizontal vibration dryers and vibration fluidizers (for example, Patent Documents 1 and 2).
振動乾燥機として、本出願人から、竪型である「バッチ式VU型」、「振動蒸発機」や「振動流動分散機」として、また、横型である「バッチ式VH型」、「連続式VHC型」、「スラリーフィードVHS」として、粉粒体原料からスラリー状、ペースト状の粉粒体原料まで多様な形態原料の処理が可能な装置が上市されている(非特許文献1)。なお、本願出願人が出願した竪型振動乾燥機に係る特許文献として特許文献3~6等がある。The present applicant has marketed vibration dryers such as vertical "batch VU type," "vibration evaporator," and "vibration fluidized disperser," as well as horizontal "batch VH type," "continuous VHC type," and "slurry feed VHS" that are capable of processing a variety of forms of raw materials, from powdered and granular materials to slurry and paste-like powdered and granular materials (Non-Patent Document 1). Patent documents related to vertical vibration dryers filed by the present applicant include Patent Documents 3 to 6.
これらの振動乾燥機や振動流動装置において、積極的に、処理容器内に導波管を介してマイクロ波を照射可なマイクロ波発振装置が付設されている装置は、本発明者らは寡聞にして知らない。なお、特許文献6[0028]には、加熱手段として、実施形態のジャケット加熱に限られず、マイクロ波発振器(マグネトロン)を処理容器の天井に取り付けてマイクロ波加熱併用できる旨記載されている。しかし、マイクロ波発振器(マグネトロン)を天井に直接取り付けることを意図しており、本発明の導波管からのマイクロ波を原料特定部位に照射することを予定しておらず異質的である。なお、マイクロ波発振器を直接処理容器の天井に取り付けるとマグネトロン寿命が短くなると推定され実用化されていない。The present inventors are not aware of any vibration dryers or vibration fluidizers that are equipped with a microwave generator capable of irradiating microwaves through a waveguide within a processing vessel. Patent Document 6 [0028] discloses that the heating means is not limited to jacket heating as in the embodiment, but that a microwave generator (magnetron) can be attached to the ceiling of the processing vessel in combination with microwave heating. However, this document intends to attach the microwave generator (magnetron) directly to the ceiling, and is therefore unconventional in that it does not anticipate irradiating a specific portion of the raw material with microwaves from the waveguide of the present invention. Furthermore, attaching a microwave generator directly to the ceiling of the processing vessel is believed to shorten the magnetron's lifespan, and has not been put to practical use.
また、マイクロ波発振器が付設され乾燥処理容器内にマイクロ波を照射可能なマイクロ波(減圧)乾燥機が記載された公知文献として特許文献7・8等がある。しかし、特許文献7・8においては、処理容器が静置型であり、また、原料(被乾燥物)は、いずれも食品である(野菜や果物、さらには、海藻や肉等(特許文献7[請求項9]、特許文献8[0032])。本願発明におけるような振動処理を予定しておらず、また、原料として粉粒体ないしスラリー状若しくはペースト状の粉粒体含有原料を想定していない。さらに、マイクロ波の原料に対する均一照射のために、乾燥トレイを回転させる回転テーブルやスタラファンを必要としている(特許文献7[0052]、特許文献8[0031])。Furthermore, Patent Documents 7 and 8 are known documents that describe microwave (reduced pressure) dryers equipped with a microwave oscillator and capable of irradiating microwaves into a drying treatment container. However, in Patent Documents 7 and 8, the treatment container is stationary, and the raw materials (materials to be dried) are all food products (vegetables, fruits, seaweed, meat, etc. (Patent Document 7 [Claim 9], Patent Document 8 [0032]). They do not anticipate vibration treatment as in the present invention, nor do they anticipate powdery or granular materials or powder-containing raw materials in a slurry or paste form. Furthermore, to uniformly irradiate the raw materials with microwaves, a rotating table or a stirring fan for rotating the drying tray is required (Patent Document 7 [0052], Patent Document 8 [0031]).
本発明者らは、上記にかんがみて、発振器(マグネトロン)寿命が短くなるおそれがなく、また、回転テーブルやスタラファン等の装備を必要とせず、さらには、マイクロ波照射効率の格段の向上が期待できる新規な振動処理装置を提供することを目的として、下記構成の振動処理装置に想到し、先に出願した(特願2021-100522(特開2022-173013);以下「先願」という。)。In view of the above, the present inventors have conceived of a vibration treatment device having the following configuration and previously filed an application (Patent Application No. 2021-100522 (Patent Publication No. 2022-173013); hereinafter referred to as the "prior application") with the aim of providing a new vibration treatment device that does not pose a risk of shortening the lifespan of the oscillator (magnetron), does not require equipment such as a rotary table or stirrer fan, and is expected to significantly improve microwave irradiation efficiency.
処理容器を振動させる加振手段を備えた振動処理装置であって、原料を粉粒体又はスラリー状若しくはペースト状の粉粒体含有原料とするとともに、加振手段が、処理容器に投入された原料が壁面上昇落下流動させるものである振動処理装置において、
マイクロ波発信装置が付設され、該マイクロ波発振装置のマイクロ波放出口が、可撓性導波部材を介して前記処理容器に形成されたマイクロ波照射口と接続され、さらに、前記処理容器が蒸気吸引手段を備えている、ことを特徴とする。 A vibration treatment device equipped with a vibration means for vibrating a treatment vessel, wherein the raw material is a powder or granular material or a powder-containing raw material in a slurry or paste form, and the vibration means causes the raw material introduced into the treatment vessel to rise and fall along the wall of the treatment vessel,
The method is characterized in that a microwave transmitter is attached, the microwave emission port of the microwave generator is connected to a microwave irradiation port formed in the processing container via a flexible waveguide member, and the processing container is further equipped with a steam suction means.
そして、上記構成の振動処理装置は、通常、構造材を鋼鉄製とした振動台の上に、加熱(温調)ジャケットを備えた鋼鉄製の処理容器を取り付けた構成であった。ここで、処理容器本体の少なくとも接粉部は、コンタミ(内壁の腐食に伴う)防止の観点から、ステンレス、ハステロイ(Ni基耐食合金:登録商標)、チタンなどの耐食性材料で形成していた(非特許文献2、p10)。これらの耐食性材料は、ジャケットからの伝熱確保の見地から、いずれも伝熱性の良好な金属製とされている。なお、さらなるコンタミ防止の観点から処理容器の接粉部をテフロン(PTFE登録商標)コーティングする場合もあるが、上記伝熱性の見地から厚くすることができず、また、硬度も低く、高硬度の無機物を含有する原料には不適であった。The vibration treatment device described above typically comprises a steel processing vessel equipped with a heating (temperature-controlling) jacket mounted on a steel vibration table. To prevent contamination (associated with corrosion of the inner wall), at least the powder-contacting portion of the processing vessel body is formed of a corrosion-resistant material such as stainless steel, Hastelloy (a Ni-based corrosion-resistant alloy: a registered trademark), or titanium (Non-Patent Document 2, p. 10). These corrosion-resistant materials are all made of metals with good heat conductivity to ensure heat transfer from the jacket. To further prevent contamination, the powder-contacting portion of the processing vessel may be coated with Teflon (a registered trademark), but this coating cannot be made thick enough due to the heat transfer characteristics and its low hardness makes it unsuitable for raw materials containing highly hard inorganic substances.
さらに、昨今、振動(乾燥)処理した製品中のコンタミ許容含量の厳格化(例えば、ppmからppb)、特に、金属粉等のコンタミ許容含量の低減化の要望が強くなってきている。すなわち、処理後製品のさらなる高純度(ファイン)化が要望されるようになってきた。しかし、本発明者らは、当該要望に応えることのできる振動処理装置及び振動処理方法は、寡聞にして知らない。なお、PTFEは摩擦係数が他の樹脂に比して格段に低く耐摩耗性に優れているが硬さが低く、原料によっては(例えば高硬度の場合)擦傷されて、やはりコンタミが避けられないと考えられる。Furthermore, recently, there has been a growing demand for stricter tolerances for contaminant content in vibration (drying) processed products (e.g., from ppm to ppb), particularly for reducing the tolerance for contaminant content such as metal powder. In other words, there is a growing demand for even higher purity (fineness) of processed products. However, the inventors are unaware of any vibration processing device or vibration processing method that can meet this demand. Although PTFE has a significantly lower coefficient of friction than other resins and is highly abrasion-resistant, its hardness is low, and depending on the raw material (e.g., high hardness), it may be scratched, making contamination unavoidable.
本発明は、上記にかんがみて、処理後製品のさらなる高純度化(特に、金属コンタミ許容含量の低減化)の要望に応えることができる振動処理装置及び振動処理方法を提供することを目的(課題)とする。In view of the above, an object (object) of the present invention is to provide a vibration treatment device and a vibration treatment method that can meet the demand for even higher purity of treated products (particularly, a reduction in the allowable content of metal contaminants).
本発明者らは、上記課題を解決するために、先願に係るマイクロ波加熱タイプの振動処理装置に着目して、鋭意開発に努力をした結果、少なくとも接粉部を実質的にマイクロ波加熱されない誘電体層で構成した下記構成の振動処理装置及び振動処理方法に想到した。In order to solve the above problems, the inventors focused on the microwave heating type vibration treatment device of the prior application and made intensive efforts in development, and as a result, came up with the vibration treatment device and vibration treatment method of the following configuration, in which at least the powder contact part is made of a dielectric layer that is not substantially heated by microwaves.
処理容器を振動させる加振手段を備えた振動処理装置であって、原料を粉粒体又はスラリー状若しくはペースト状の粉粒体含有原料とするとともに、加振手段が、前記処理容器に投入された原料が壁面上昇落下流動させるものである振動処理装置において、
マイクロ波発信装置が付設され、該マイクロ波発振装置の出力口が、可撓性導波部材を介して前記処理容器に形成されたマイクロ波照射口と接続され、さらに、
前記処理容器が蒸気排出手段を備えるとともに、前記処理容器の内側面の少なくとも運転時の原料接触部が誘電体層で構成され、
該誘電体層の形成材料が、比誘電率(εr)10以下及び損失角(tanδ)0.08以下(いずれも周波数2.45GHz、25℃;以下同じ。)の双方の特性を満たす高分子材料又はセラミックス材料で形成されている、ことを特徴とする。 A vibration treatment device equipped with a vibration means for vibrating a treatment vessel, wherein the raw material is a powder or granular material or a powder-containing raw material in a slurry or paste form, and the vibration means causes the raw material introduced into the treatment vessel to flow upward and downward along the wall of the treatment vessel,
a microwave generator is provided, and an output port of the microwave generator is connected to a microwave irradiation port formed in the processing vessel via a flexible waveguide member; and
the processing vessel is provided with a vapor exhaust means, and at least a raw material contact portion of an inner surface of the processing vessel during operation is made of a dielectric layer;
The dielectric layer is characterized in that it is formed from a polymeric or ceramic material that satisfies both of the following characteristics: a relative dielectric constant ( εr ) of 10 or less and a loss angle (tanδ) of 0.08 or less (both at a frequency of 2.45 GHz and 25°C; the same applies below).
ここで、上記誘電体層の形成材料の比誘電率(εr)及び誘電損失角(誘電正接)(tanδ)の範囲は、図2(肥後温子編「電子レンジ・マイクロ波利用ハンドブック」日本工業新聞社、昭和62年、16pから引用)に基づき、実質的にマイクロ波加熱され難いと考えられる範囲、すなわち、損失ファクター(εr・tanδ)を求めたものである。すなわち、マイクロ波加熱されにくさは、損失ファクターの小さいは範囲としたものである。そして、望ましい範囲は、tanδが0.02以下、さらには0.002以下、よりさらには0.0002以下とする。 Here, the ranges of the relative permittivity ( εr ) and dielectric loss angle (dielectric tangent) (tanδ) of the material forming the dielectric layer are determined based on Figure 2 (quoted from "Microwave Oven/Microwave Usage Handbook" edited by Atsuko Higo, Japan Industrial Newspaper, 1987, p. 16), and are the ranges considered to be substantially difficult to microwave heat, i.e., the loss factor ( εr ·tanδ). In other words, the difficulty to microwave heat is determined as the range in which the loss factor is small. The desirable range is a tanδ of 0.02 or less, preferably 0.002 or less, and even more preferably 0.0002 or less.
上記構成とすることにより、前記課題(処理後製品のさらなる高純度化(特に、金属コンタミ許容含量の低減化)の要望)を解決できる。The above-mentioned configuration can solve the above-mentioned problem (demand for further high purity of the processed product (particularly, reduction of the allowable content of metal contaminants)).
誘電体層の形成材料が、高分子材料からなる場合、たとえ、高分子摩耗粉が混入しても、高分子摩耗粉は、本発明に係る振動処理方法の如く、製品に含まれる高分子摩耗粉を加熱揮散焼却させることにより滅失させることができる。なお、高分子材料としては、上記特性を満足させるものなら、樹脂でもゴムでもよく、さらには、上記誘電特性を満足するなら、無機高分子、強化樹脂(FRP等)でもよい。When the dielectric layer is made of a polymeric material, even if polymeric wear particles are mixed in, they can be eliminated by heating, volatilizing, and incinerating the polymeric wear particles contained in the product, as in the vibration treatment method of the present invention. The polymeric material may be resin or rubber as long as it satisfies the above-mentioned properties, or may be inorganic polymer or reinforced resin (FRP, etc.) as long as it satisfies the above-mentioned dielectric properties.
なお、上記樹脂としては、ポリアミド等でもよいが、相対的にマイクロ波により発熱し難い、すなわち、低非極性の熱可塑性樹脂が望ましい。当該熱可塑性樹脂としては、結晶性ポリプロピレン(結晶性PP)、高密度ポリエチレン(高密度PE)、ポリテトラフルオロエチレン(PTFE)を挙げることができる。これらのうちで結晶性PPが、機械的特性が高密度PEに比して優れ、かつ、燃焼性においてPTFEより優れているため望ましい。Although the resin may be polyamide or the like, a thermoplastic resin that is relatively resistant to heat generation by microwaves, i.e., a low-polarity thermoplastic resin, is preferable. Examples of such thermoplastic resins include crystalline polypropylene (crystalline PP), high-density polyethylene (high-density PE), and polytetrafluoroethylene (PTFE). Of these, crystalline PP is preferable because it has superior mechanical properties compared to high-density PE and superior flammability compared to PTFE.
誘電体層の形成材料がセラミックス材料からなる場合、硬度が金属に比して格段に高いものを使用できる(例えば、アルミナ:15~18Hvであるのに対しSUS304:2Hv)。このため、原料接触部(接粉部)における摩耗粉の発生が大幅に抑制できる。なお、セラミックス材料としては、アルミナ、ジルコニア等の無機酸化物ばかりでなく、窒化物、炭化物、ホウ化物からなる又はそれらを含む複合化合物を含むものである。When the dielectric layer is made of a ceramic material, it is possible to use a material with a much higher hardness than metal (for example, alumina: 15-18 Hv, while SUS304: 2 Hv). This significantly reduces the generation of wear particles at the raw material contact area (powder contact area). Note that ceramic materials include not only inorganic oxides such as alumina and zirconia, but also nitrides, carbides, borides, or composite compounds containing these.
上記構成において、誘電体層の肉厚は、構成材料により若干変動するが、通常、0.5~5mm、望ましくは0.5~2.5mmとする。肉厚が薄すぎると、摩耗が早く、耐用期間が短くメインテナンス性におとる。他方、厚すぎると、過剰品質となるとともに、重量増大ないし処理容積の減少を伴い望ましくない。In the above configuration, the thickness of the dielectric layer varies slightly depending on the constituent material, but is usually 0.5 to 5 mm, preferably 0.5 to 2.5 mm. If the thickness is too thin, it will wear out quickly, its service life will be short, and maintenance will be difficult. On the other hand, if the thickness is too thick, it will be excessive in quality and will increase in weight or reduce the processing volume, which is undesirable.
上記構成の振動処理装置は、誘電体誘電体層を、処理容器本体に対して着脱可能なカートリッジ容器で構成することが望ましい。原料投入及び製品排出が容易になるとともに、カートリッジ容器をPP等の熱可塑性樹脂で使い捨てタイプとすれば、有機高分子摩耗微粉の加熱揮散焼却とカートリッジ容器の焼却処分を同時処理が可能となる。In the vibration treatment device having the above configuration, it is desirable that the dielectric layer be configured as a cartridge container that can be attached to and detached from the treatment container body. This makes it easy to load raw materials and unload products, and if the cartridge container is a disposable type made of thermoplastic resin such as PP, it becomes possible to simultaneously heat and volatilize the organic polymer wear powder and incinerate the cartridge container.
上記構成の振動処理装置は、通常、温調ジャケットが必然的でなく、さらには、常圧ないし低真空処理タイプとするとすることができる。温調ジャケットが必然的でないのは、マイクロ波加熱は損失ファクターの違いにより選択加熱が可能となり、原料(粉体)の損失ファクターが小さい場合、振動処理に際して、損失フクターが極端に大きい粉体付着液滴(水滴)のみを発熱させて効率的に原料を乾燥させることができるためである。そして、蒸発促進のために、処理容器内を高真空にする必要がない。したがって、温調ジャケットのような温調機構及び高真空にするための吸引手段、さらには、処理容器の高度シールが不要となり、結果的に、マイクロ波加熱することによる付加コストを低減できる。The vibration treatment device configured as described above does not usually require a temperature-controlled jacket, and can even be used for atmospheric pressure or low vacuum treatment. The temperature-controlled jacket is not necessary because microwave heating allows selective heating based on differences in loss factors. If the loss factor of the raw material (powder) is small, only the droplets (water droplets) adhering to the powder, which have an extremely large loss factor, can be heated during vibration treatment, allowing the raw material to be dried efficiently. Furthermore, there is no need to create a high vacuum inside the treatment vessel to promote evaporation. Therefore, there is no need for a temperature control mechanism such as a temperature-controlled jacket, a suction means for creating a high vacuum, or a high-level seal for the treatment vessel. As a result, the additional costs associated with microwave heating can be reduced.
なお、本発明は、従来及び先願における振動処理装置(振動乾燥装置)における処理容器の接粉部を誘電体層としない場合の各種態様の構成を採用し、それらの作用効果を奏することは勿論である(先願明細書[0012]~[0018]参照)。It should be noted that the present invention employs various configurations of conventional and prior application vibration treatment devices (vibration drying devices) in which the powder-contacting portion of the treatment container is not a dielectric layer, and of course exhibits the effects of these configurations (see prior application specification [0012] to [0018]).
以下、本発明を竪型振動乾燥機に適用した一形態を、図1に基づいて説明する。本発明は、本実施形態に限られることなく、請求の範囲の及ぶ技術範囲内で種々の態様に及び、当然、横型振動乾燥機や振動流動層にも適用できる。なお、図例における図符号は、基本的に先願図1におけるものと同一である。An embodiment of the present invention applied to a vertical vibration dryer will be described below with reference to Figure 1. The present invention is not limited to this embodiment, but can be applied to various aspects within the technical scope of the claims, and can also be applied to horizontal vibration dryers and vibration fluidized beds. Note that the reference numerals in the illustration are basically the same as those in Figure 1 of the prior application.
本実施形態は、基本的には竪型振動乾燥機VUにマイクロ波発振装置Mが付設されたものである。
振動乾燥機VUは、筒状竪型の処理容器11と、該処理容器11を振動させる発振機(加振手段)13とを備えている。 In this embodiment, a microwave oscillator M is basically attached to a vertical vibration dryer VU.
The vibration dryer VU includes a cylindrical vertical treatment vessel 11 and an oscillator (vibration means) 13 that vibrates the treatment vessel 11 .
具体的には、処理容器11は、架台17に配設された圧縮コイルばね(弾性体)18で支持されている。ここで、圧縮コイルばね18は、振動モータ13の出力及び種類に応じて、板ばね、さらには、防振ゴム等の弾性体でもよい。Specifically, the processing vessel 11 is supported by a compression coil spring (elastic body) 18 disposed on the stand 17. Here, the compression coil spring 18 may be a leaf spring or an elastic body such as vibration-isolating rubber depending on the output and type of the vibration motor 13.
そして、図例では、処理容器15の処理容器が底部に中央隆起部(へそ部)を有して環状処理空間Tを備え、前記環状処理空間に保持された前記原料が旋回流動可能とされているとともに、口述のマイクロ波照射口を環状処理空間の一部に対するものとしてある。そして、中央隆起部は、製品排出用の上下動バルブVの弁体29で担っている。該弁体29の下流側弁箱には製品排出パイプ31が取り付けられている。なお、上下動弁体30はエアシリンダ30aで駆動されるようになっている。また、処理容器15の天井側壁には、後述のマイクロ波照射部(照射口)R以外に、天井側上面には原料投入口(図示せず)、内蔵フィルター33及び蒸気排出口35を備えた集塵部Dを備えている。なお、集塵部Dの入り口にはマイクロ波漏洩防止のためのパンチングプレート31が取り付けられている。また、集塵部Dには、図示しないが、蒸気排出口35は吸引配管が接続され、該蒸気排出配管は蒸気回収容器等を介して吸引ポンプに接続されている。In the illustrated example, the processing vessel 15 has a central raised portion (navel) at the bottom, forming an annular processing space T, allowing the raw material held in the annular processing space to swirl, and the aforementioned microwave irradiation port is located in a portion of the annular processing space. The central raised portion is supported by a valve body 29 of a vertically movable valve V for product discharge. A product discharge pipe 31 is attached to the downstream valve body of the valve body 29. The vertically movable valve body 30 is driven by an air cylinder 30a. In addition to the microwave irradiation section (irradiation port) R described below, the ceiling wall of the processing vessel 15 is also provided with a dust collection section D on the upper surface of the ceiling, which includes a raw material inlet (not shown), a built-in filter 33, and a steam exhaust port 35. A punched plate 31 is attached to the entrance of the dust collection section D to prevent microwave leakage. Although not shown, the steam exhaust port 35 of the dust collection section D is connected to a suction pipe, which is connected to a suction pump via a steam recovery container or the like.
上記構成において、本実施形態は、マイクロ波発振装置Mから発信されるマイクロ波は可撓性導波部材であるマイクロ波用同軸ケーブル37を介してアプリケータである処理容器11のマイクロ波照射部Rと接続されている。マイクロ波照射部Rは、同軸ケーブル3737の先端側と接続される真空シール部43とマイクロ波を出力する照射アンテナ45とからなる。マイクロ波減衰は導波管に比して大きいが、同軸ケ―ブル37の方が導波管に比して柔軟性があり、耐振動性に優れている。In the above configuration, in this embodiment, microwaves emitted from the microwave oscillator M are connected to the microwave irradiation unit R of the processing vessel 11, which is an applicator, via a microwave coaxial cable 37, which is a flexible waveguide member. The microwave irradiation unit R is made up of a vacuum seal unit 43 connected to the tip side of the coaxial cable 3737 and an irradiation antenna 45 that outputs microwaves. Although microwave attenuation is greater than that of a waveguide, the coaxial cable 37 is more flexible and has better vibration resistance than a waveguide.
マイクロ波発振装置Mは、一部構成は図示しないが、発振器(マグネトロン)が電源操作盤Eと接続され、発振器の出口側に装置導波管39を介してアイソレータ等の制御機構が接続され、導波管39の出口には、モード変換器41を備えたものである。モード変換器41は同軸ケーブルモードと導波管モードとを交互に切り替得るものである。当該変換器41には、同軸ケーブル37の元部側が接続される。Although some components of the microwave oscillator M are not shown, the oscillator (magnetron) is connected to a power supply control panel E, and a control mechanism such as an isolator is connected to the outlet side of the oscillator via an apparatus waveguide 39. A mode converter 41 is provided at the outlet of the waveguide 39. The mode converter 41 can alternately switch between a coaxial cable mode and a waveguide mode. The base side of the coaxial cable 37 is connected to the converter 41.
同軸ケーブル37の先端部は、シール部47とアンテナ部48で構成されるマイクロ波照射部Rとされている。The tip of the coaxial cable 37 is a microwave irradiation section R that is composed of a seal section 47 and an antenna section 48 .
ここまでは、先願における実施形態と略共通する。そして、本発明に係る実施形態は、内側面の少なくとも運転時の原料接触部が誘電体層15で構成されている。図例では内側壁全高及び排出弁29を除いて底面側全面に誘電体層15が形成されている。ここで、弁体Vの原料接触部も誘電体層で被覆しても良いが、弁体29をセラミックス材料で形成すれば、金属摩耗粉の発生は阻止できる。Up to this point, the embodiment is substantially the same as the embodiment in the prior application. In the embodiment according to the present invention, at least the portion of the inner surface that comes into contact with the raw material during operation is made of a dielectric layer 15. In the illustrated example, the dielectric layer 15 is formed over the entire height of the inner wall and the entire bottom surface side except for the discharge valve 29. Here, the raw material contact portion of the valve body V may also be covered with a dielectric layer, but if the valve body 29 is made of a ceramic material, the generation of metal wear powder can be prevented.
そして、上記誘電体層15の形成材料は、前述の如く、比誘電率(εr)10以下及び損失(tanδ)0.08以下(いずれも周波数2.45GHz、25℃;以下同じ。)の双方の特性を満たす高分子材料又はセラミックス材料である、図例では、誘電体層15は樹脂層としてある。当該樹脂層は、前述の如く、可燃性の非極性熱可塑性樹脂(例えば,PP)が望ましい。なお、誘電体層は処理容器本体に対して着脱可能なカートリッジ容器で構成してもよい。前述のような作用・効果を奏する。 As described above, the material forming the dielectric layer 15 is a polymeric or ceramic material that satisfies both the relative permittivity ( εr ) of 10 or less and the loss (tan δ) of 0.08 or less (both at a frequency of 2.45 GHz and 25°C; the same applies below). In the illustrated example, the dielectric layer 15 is a resin layer. As described above, the resin layer is preferably a flammable non-polar thermoplastic resin (e.g., PP). The dielectric layer may be formed from a cartridge container that is detachable from the processing container body. The above-mentioned functions and effects are achieved.
上記において、通常は、処理容器本体は、強度的観点から鋼鉄製とするため、特別な電磁シールドは弁体下面を除いて不要である。弁体をセラミックス材料で構成した場合は、下面にパンチングプレートを張り付ける。弁体金属製とし、その上面及び周面を誘電体層で形成してもよい。電磁波シールドはさらに、強度を確保できるなら、処理容器本体を金属製のパンングプレートとすることも可能である。In the above, the processing vessel body is usually made of steel from the viewpoint of strength, so no special electromagnetic shielding is required except for the underside of the valve body. If the valve body is made of a ceramic material, a punching plate is attached to the underside. The valve body may be made of metal, and its upper and peripheral surfaces may be formed with a dielectric layer. Furthermore, as long as strength can be ensured, the processing vessel body may be made of a metal punching plate for electromagnetic wave shielding.
上記竪形振動乾燥機の使用態様は、基本的には従来ないし先願におけるものと同様である(先願明細書[0029]~[0038]参照)。原料が無機粉体含有の場合において、誘電体層を熱可塑性樹脂等の高分子材料で形成した場合は、振動処理後の製品中に高分子摩耗粉が含まれる恐れがある、しかし通常無機粉体は成形品にする際に焼結するため、高分子摩耗粉は燃焼滅失するから問題ない。The use of the vertical vibration dryer is basically the same as that of the conventional or prior application (see paragraphs [0029] to [0038] of the specification of the prior application). When the raw material contains inorganic powder and the dielectric layer is formed from a polymer material such as a thermoplastic resin, there is a risk that polymer abrasion powder will be contained in the product after vibration treatment. However, since inorganic powder is usually sintered when being made into a molded product, the polymer abrasion powder will be burned away and will not be a problem.
11 処理容器(本体)
13 振動モータ(加振手段)
15 誘電体層
21 中央隆起部(へそ部)
35 蒸気排出口
37 同軸ケーブル(可撓性導波部材)
39 発振器(マグネトロン)
UV 竪型振動乾燥機
D 集塵部
M マイクロ波発振装置
E 電源
T 環状処理空間
R マイクロ波照射部
V 弁体11 Processing container (main body)
13 Vibration motor (vibration means)
15 Dielectric layer 21 Central protrusion (umbilicus)
35 Steam outlet 37 Coaxial cable (flexible waveguide member)
39 Oscillator (Magnetron)
UV Vertical vibration dryer D Dust collection section M Microwave oscillator E Power supply T Annular processing space R Microwave irradiation section V Valve body
Claims (6)
原料を粉粒体又はスラリー状若しくはペースト状の粉粒体含有原料とするとともに、加振手段が前記処理容器に投入された原料を、壁面上昇落下流動させるものである振動処理装置において、
マイクロ波発振装置が付設され、該マイクロ波発振装置の出力口が、同軸ケーブルを介してマイクロ波照射部と接続され、
前記処理容器が蒸気排出手段を備えるとともに電磁シールド構造を有し、さらに、内側面の少なくとも運転時の原料接触部が、肉厚0.5~5mmの高分子材料からなる誘電体層で構成され、
該高分子材料が、比誘電率(εr)10以下及び損失角(tanδ)0.08以下(いずれも周波数2.45GHz、25℃;以下同じ。)の双方の特性を満たす高分子材料である、
ことを特徴とする振動処理装置。 A vibration treatment device equipped with a vibration applying means for vibrating a treatment container,
A vibration treatment device in which the raw material is a powder or a powder-containing raw material in a slurry or paste form, and the vibration means causes the raw material charged into the treatment vessel to flow upward and downward along the wall of the treatment vessel,
A microwave oscillator is provided, and an output port of the microwave oscillator is connected to the microwave irradiation unit via a coaxial cable;
the treatment vessel is provided with a steam exhaust means and has an electromagnetic shielding structure, and further, at least the raw material contact portion of the inner surface during operation is made of a dielectric layer made of a polymer material and having a thickness of 0.5 to 5 mm;
The polymer material is a polymer material that satisfies both of the following characteristics: a relative dielectric constant (εr) of 10 or less and a loss angle (tanδ) of 0.08 or less (both at a frequency of 2.45 GHz and at 25°C; the same applies hereinafter).
A vibration treatment device characterized by:
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