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JP7816136B2 - Compounds containing photoreactive groups, polymers, and retardation films - Google Patents
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JP7816136B2 - Compounds containing photoreactive groups, polymers, and retardation films - Google Patents

Compounds containing photoreactive groups, polymers, and retardation films

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JP7816136B2
JP7816136B2 JP2022501080A JP2022501080A JP7816136B2 JP 7816136 B2 JP7816136 B2 JP 7816136B2 JP 2022501080 A JP2022501080 A JP 2022501080A JP 2022501080 A JP2022501080 A JP 2022501080A JP 7816136 B2 JP7816136 B2 JP 7816136B2
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竜一 坂下
範武 村上
洋樹 一條
優輝 七田
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    • C07C69/00Esters of carboxylic acids; Esters of carbonic or haloformic acids
    • C07C69/66Esters of carboxylic acids having esterified carboxylic groups bound to acyclic carbon atoms and having any of the groups OH, O—metal, —CHO, keto, ether, acyloxy, groups, groups, or in the acid moiety
    • C07C69/73Esters of carboxylic acids having esterified carboxylic groups bound to acyclic carbon atoms and having any of the groups OH, O—metal, —CHO, keto, ether, acyloxy, groups, groups, or in the acid moiety of unsaturated acids
    • C07C69/732Esters of carboxylic acids having esterified carboxylic groups bound to acyclic carbon atoms and having any of the groups OH, O—metal, —CHO, keto, ether, acyloxy, groups, groups, or in the acid moiety of unsaturated acids of unsaturated hydroxy carboxylic acids
    • CCHEMISTRY; METALLURGY
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    • C07CACYCLIC OR CARBOCYCLIC COMPOUNDS
    • C07C69/00Esters of carboxylic acids; Esters of carbonic or haloformic acids
    • C07C69/66Esters of carboxylic acids having esterified carboxylic groups bound to acyclic carbon atoms and having any of the groups OH, O—metal, —CHO, keto, ether, acyloxy, groups, groups, or in the acid moiety
    • C07C69/73Esters of carboxylic acids having esterified carboxylic groups bound to acyclic carbon atoms and having any of the groups OH, O—metal, —CHO, keto, ether, acyloxy, groups, groups, or in the acid moiety of unsaturated acids
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    • C08G63/00Macromolecular compounds obtained by reactions forming a carboxylic ester link in the main chain of the macromolecule
    • C08G63/02Polyesters derived from hydroxycarboxylic acids or from polycarboxylic acids and polyhydroxy compounds
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    • C08G63/16Dicarboxylic acids and dihydroxy compounds
    • C08G63/18Dicarboxylic acids and dihydroxy compounds the acids or hydroxy compounds containing carbocyclic rings
    • C08G63/19Hydroxy compounds containing aromatic rings
    • C08G63/193Hydroxy compounds containing aromatic rings containing two or more aromatic rings
    • GPHYSICS
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    • G02B5/00Optical elements other than lenses
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Description

本発明は、光反応性基を含む化合物に関する。より詳細には、光反応性基を含む化合物の重合体及びそれを含む位相差膜に関する。 The present invention relates to a compound containing a photoreactive group. More specifically, it relates to a polymer of a compound containing a photoreactive group and a retardation film containing the polymer.

位相差膜などの光学薄膜は、視野角拡大などの観点から、様々な画像表示装置で用いられる。既存の位相差膜として、樹脂を延伸してなる薄膜が知られており、材料の例としてポリカーボネート樹脂、環状ポリオレフィン、セルロースアシレート等がある(例えば、特許文献1~3参照)。しかし、延伸膜にはクラックが入り易い、残留応力歪による光漏れが生じやすい等の課題がある。近年、延伸複屈折膜に代えて、液晶性化合物を用いた光学異方性層を使用することが提案されている。このような光学異方性層は、液晶性化合物を配向させるために、光学異方性層を形成する支持体上に配向膜を設けることが必要であり、ラビング処理や光配向処理を施した配向膜が知られている(例えば、特許文献4~6参照)。しかし、どちらも複雑な製造装置と工程が必要となる課題がある。Optical thin films, such as retardation films, are used in various image display devices to expand the viewing angle. Existing retardation films are thin films made by stretching resins, such as polycarbonate resin, cyclic polyolefin, and cellulose acylate (see, for example, Patent Documents 1 to 3). However, stretched films have issues such as being prone to cracking and light leakage due to residual stress distortion. In recent years, the use of optically anisotropic layers using liquid crystal compounds has been proposed as an alternative to stretched birefringent films. To align the liquid crystal compounds, such optically anisotropic layers require an alignment layer to be provided on the support on which the optically anisotropic layer is formed. Known examples of such alignment layers include those that have undergone rubbing or photoalignment (see, for example, Patent Documents 4 to 6). However, both require complex manufacturing equipment and processes.

特開2012-111964Patent Publication No. 2012-111964 特開2006-281628JP 2006-281628 特開2012-230282Patent Publication No. 2012-230282 特開平8-160430JP 8-160430 特表2003-505561Special Publication No. 2003-505561 国際公開第2010-150748International Publication No. 2010-150748

本発明は上記課題に鑑みてなされたものであり、その目的は、加工履歴に由来するクラック等が発生することなく、かつ、配向膜を必要とせずに配向し、十分な位相差を発現する光学薄膜を提供することにある。 The present invention was made in consideration of the above-mentioned problems, and its purpose is to provide an optical thin film that is oriented without the need for an alignment film, and that exhibits sufficient phase difference without the occurrence of cracks or the like resulting from processing history.

本発明者は、上記課題を解決するために鋭意検討した結果、特定の構造を有する光反応性基を含む化合物が、該化合物を含む重合体とすることで、上記課題を解決した薄膜形状において十分な位相差を発現し、視野角補償などの光学用途に使用できることを見出し、本発明を完成するに至った。 As a result of extensive research into resolving the above-mentioned problems, the inventors discovered that compounds containing photoreactive groups with specific structures can be made into polymers containing the compounds, thereby solving the above-mentioned problems and exhibiting sufficient phase difference in thin film form, making the polymers usable for optical applications such as viewing angle compensation, and thus completing the present invention.

すなわち、本発明の一つの態様は、以下の式(1)で表される化合物に関するものである。
(式(1)中、X~Xは、それぞれ独立に、置換基を有していてもよい炭素数5~7の芳香環または置換基を有していてもよい炭素数5~7の脂環式炭化水素基のいずれかを表し、該芳香環中または該脂環式炭化水素基中の任意の炭素原子は窒素原子、酸素原子、硫黄原子に置換されてもよい。ここでX~Xにおける置換基は、それぞれ独立に、ハロゲン原子、炭素数1~5のアルキル基、炭素数1~5のアルコキシ基からなる群の1種を表し、X~Xが置換基を有さない場合、水素原子である。YおよびYは、それぞれ独立に、ヒドロキシ基、カルボキシル基、アミノ基からなる群の1種を表す。ArおよびArは、それぞれ独立に、置換基を有していてもよい炭素数5~7の芳香環を表し、該芳香環中の任意の炭素原子は窒素原子、酸素原子、硫黄原子に置換されてもよい。ここでArおよびArにおける置換基は、それぞれ独立に、ハロゲン原子、炭素数1~5のアルキル基、炭素数1~5のアルコキシ基からなる群の1種を表し、ArおよびArが置換基を有さない場合、水素原子である。R~Rは、それぞれ独立に、水素原子、ハロゲン原子、シアノ基、ニトロ基、炭素数1~5のアルキル基、炭素数1~5のアルコキシ基からなる群の1種を表す。LおよびLは、それぞれ独立に、単結合または-O-、-NR-からなる群の1種を表す。ここで、Rは水素原子または炭素数1~5のアルキル基からなる群の1種を表す。LおよびLは、それぞれ独立に、単結合または-O-、-CO-O-、-CO-NR-、-CO-、-CR-からなる群の1種を表す。ここで、Rは水素原子または炭素数1~5のアルキル基からなる群の1種を表す。RおよびRは、それぞれ独立に、水素原子、ハロゲン原子または炭素数1~5のアルキル基からなる群の1種を表す。aおよびbは、それぞれ独立に、0または1を表す。)
That is, one aspect of the present invention relates to a compound represented by the following formula (1):
(In formula (1), X 1 to X 3 each independently represent an aromatic ring having 5 to 7 carbon atoms which may have a substituent, or an alicyclic hydrocarbon group having 5 to 7 carbon atoms which may have a substituent, and any carbon atom in the aromatic ring or the alicyclic hydrocarbon group may be substituted with a nitrogen atom, an oxygen atom, or a sulfur atom. Here, the substituents in X 1 to X 3 each independently represent one kind of the group consisting of a halogen atom, an alkyl group having 1 to 5 carbon atoms, and an alkoxy group having 1 to 5 carbon atoms, and when X 1 to X 3 are unsubstituted, they are hydrogen atoms. Y 1 and Y 2 each independently represent one kind of the group consisting of a hydroxy group, a carboxyl group, and an amino group. Ar 1 and Ar 2 each independently represent an aromatic ring having 5 to 7 carbon atoms which may have a substituent, and any carbon atom in the aromatic ring may be substituted with a nitrogen atom, an oxygen atom, or a sulfur atom. Here, Ar 1 and Ar The substituents in Ar 1 and Ar 2 each independently represent one of the group consisting of a halogen atom, an alkyl group having 1 to 5 carbon atoms, and an alkoxy group having 1 to 5 carbon atoms, and when Ar 1 and Ar 2 do not have a substituent, they are hydrogen atoms. R 1 to R 4 each independently represent one of the group consisting of a hydrogen atom, a halogen atom, a cyano group, a nitro group, an alkyl group having 1 to 5 carbon atoms, and an alkoxy group having 1 to 5 carbon atoms. L 1 and L 4 each independently represent one of the group consisting of a single bond, -O-, or -NR 5 -. Here, R 5 represents one of the group consisting of a hydrogen atom or an alkyl group having 1 to 5 carbon atoms. L 2 and L 3 each independently represent one of the group consisting of a single bond, or -O-, -CO-O-, -CO-NR 6 -, -CO-, or -CR 7 R 8 -. Here, R 6 represents one of the group consisting of a hydrogen atom or an alkyl group having 1 to 5 carbon atoms. R R 7 and R 8 each independently represent a hydrogen atom, a halogen atom, or an alkyl group having 1 to 5 carbon atoms. a and b each independently represent 0 or 1.

また、本発明の別の態様は、以下の式(2)で表される構成単位Aを有し、以下の式(3)で表される構成単位Bまたは以下の式(4)で表される構成単位Cのうち少なくとも1種を有する重合体に関するものである。
(式(2)中、X~Xは、それぞれ独立に、置換基を有していてもよい炭素数5~7の芳香環または置換基を有していてもよい炭素数5~7の脂環式炭化水素基のいずれかを表し、該芳香環中または該脂環式炭化水素基中の任意の炭素原子は窒素原子、酸素原子、硫黄原子に置換されてもよい。ここでX~Xにおける置換基は、それぞれ独立に、ハロゲン原子、炭素数1~5のアルキル基、炭素数1~5のアルコキシ基からなる群の1種を表し、X~Xが置換基を有さない場合、水素原子である。YおよびYは、それぞれ独立に、-O-、-CO-、-NR-からなる群の1種を表す。ここで、Rは水素原子または炭素数1~5のアルキル基からなる群の1種を表す。ArおよびArは、それぞれ独立に、置換基を有していてもよい炭素数5~7の芳香環を表し、該芳香環中の任意の炭素原子は窒素原子、酸素原子、硫黄原子に置換されてもよい。ここでArおよびArにおける置換基は、それぞれ独立に、ハロゲン原子、炭素数1~5のアルキル基、炭素数1~5のアルコキシ基からなる群の1種を表し、ArおよびArが置換基を有さない場合、水素原子である。
~Rは、それぞれ独立に、水素原子、ハロゲン原子、シアノ基、ニトロ基、炭素数1~5のアルキル基、炭素数1~5のアルコキシ基からなる群の1種を表す。LおよびLは、単結合または-O-、-NR-からなる群の1種を表す。ここで、Rは水素原子または炭素数1~5のアルキル基からなる群の1種を表す。LおよびLは、単結合または-O-、-CO-O-、-CO-NR-、-CO-、-CR-からなる群の1種を表す。
ここで、Rは水素原子または炭素数1~5のアルキル基からなる群の1種を表す。RおよびRは、それぞれ独立に、水素原子、ハロゲン原子または炭素数1~5のアルキル基からなる群の1種を表す。aおよびbは、それぞれ独立に、0または1を表す。)
(式(3)中、YおよびYは、それぞれ独立に、-O-、-CO-、-NR10-からなる群の1種を表す。ここで、R10は水素原子または炭素数1~5のアルキル基からなる群の1種を表す。X~Xは、それぞれ独立に、置換基を有していてもよい炭素数5~7の芳香環または置換基を有していてもよい炭素数5~7の脂環式炭化水素基のいずれかを表し、該芳香環中または該脂環式炭化水素基中の任意の炭素原子は窒素原子、酸素原子、硫黄原子に置換されてもよい。R11およびR12は、水素原子または炭素数1~5のアルキル基からなる群の1種を表す。cは、0または1を表す。)
(式(4)中、YおよびYは、それぞれ独立に、-O-、-CO-、-NR13-からなる群の1種を表す。ここで、R13は水素原子または炭素数1~5のアルキル基からなる群の1種を表す。Zは、炭素数5~7の脂環式炭化水素基、炭素数2~20の直鎖状のアルキレン基、炭素数4~20の分枝状のアルキレン基からなる群の一種を表す。)
Another aspect of the present invention relates to a polymer having a structural unit A represented by the following formula (2) and at least one of a structural unit B represented by the following formula (3) or a structural unit C represented by the following formula (4):
In formula (2), X 1 to X 3 each independently represent an aromatic ring having 5 to 7 carbon atoms which may have a substituent, or an alicyclic hydrocarbon group having 5 to 7 carbon atoms which may have a substituent, and any carbon atom in the aromatic ring or the alicyclic hydrocarbon group may be substituted with a nitrogen atom, an oxygen atom, or a sulfur atom. Here, the substituents in X 1 to X 3 each independently represent one kind of the group consisting of a halogen atom, an alkyl group having 1 to 5 carbon atoms, and an alkoxy group having 1 to 5 carbon atoms, and when X 1 to X 3 do not have a substituent, it is a hydrogen atom. Y 3 and Y 4 each independently represent one kind of the group consisting of —O—, —CO—, or —NR 9 —. Here, R 9 represents one kind of the group consisting of a hydrogen atom or an alkyl group having 1 to 5 carbon atoms. Ar 1 and Ar Ar 1 and Ar 2 each independently represent an aromatic ring having 5 to 7 carbon atoms which may have a substituent, and any carbon atom in the aromatic ring may be substituted with a nitrogen atom, an oxygen atom, or a sulfur atom. Here, the substituents in Ar 1 and Ar 2 each independently represent one kind of the group consisting of a halogen atom, an alkyl group having 1 to 5 carbon atoms, and an alkoxy group having 1 to 5 carbon atoms, and when Ar 1 and Ar 2 do not have a substituent, they are hydrogen atoms.
R 1 to R 4 each independently represent a group consisting of a hydrogen atom, a halogen atom, a cyano group, a nitro group, an alkyl group having 1 to 5 carbon atoms, and an alkoxy group having 1 to 5 carbon atoms. L 1 and L 4 represent a single bond or a group consisting of -O- or -NR 5 -. Here, R 5 represents a hydrogen atom or a group consisting of an alkyl group having 1 to 5 carbon atoms. L 2 and L 3 represent a single bond or a group consisting of -O-, -CO-O-, -CO-NR 6 -, -CO- or -CR 7 R 8 -.
Here, R6 represents a hydrogen atom or a C1-C5 alkyl group. R7 and R8 each independently represent a hydrogen atom, a halogen atom, or a C1-C5 alkyl group. a and b each independently represent 0 or 1.
(In formula (3), Y5 and Y6 each independently represent a group consisting of —O—, —CO—, and —NR 10 —. Here, R 10 represents a hydrogen atom or a group consisting of an alkyl group having 1 to 5 carbon atoms. X4 to X6 each independently represent an aromatic ring having 5 to 7 carbon atoms which may have a substituent, or an alicyclic hydrocarbon group having 5 to 7 carbon atoms which may have a substituent, and any carbon atom in the aromatic ring or the alicyclic hydrocarbon group may be substituted with a nitrogen atom, an oxygen atom, or a sulfur atom. R 11 and R 12 each independently represent a hydrogen atom or a group consisting of an alkyl group having 1 to 5 carbon atoms. c represents 0 or 1.)
(In formula (4), Y7 and Y8 each independently represent one selected from the group consisting of -O-, -CO-, and -NR13- . Here, R13 represents a hydrogen atom or an alkyl group having 1 to 5 carbon atoms. Z represents one selected from the group consisting of an alicyclic hydrocarbon group having 5 to 7 carbon atoms, a linear alkylene group having 2 to 20 carbon atoms, and a branched alkylene group having 4 to 20 carbon atoms.)

また、本発明の別の態様は、以下の式(5)で表される構成単位Dを有し、式(3)で表される構成単位Bまたは式(4)で表される構成単位Cのうち少なくとも1種を有する重合体に関するものである。
(式(5)中、YおよびY10は、それぞれ独立に、単結合または-O-、-CO-、-NR14-からなる群の1種を表す。ここで、R14は水素原子または炭素数1~5のアルキル基からなる群の1種を表す。ArおよびArは、それぞれ独立に、置換基を有していてもよい炭素数5~7の芳香環を表し、該芳香環中の任意の炭素原子は窒素原子、酸素原子、硫黄原子に置換されてもよい。R15~R18は、それぞれ独立に、水素原子、ハロゲン原子、シアノ基、ニトロ基、炭素数1~5のアルキル基、炭素数1~5のアルコキシ基からなる群の1種を表す。Lは、単結合または-O-、-NR25-からなる群の1種を表す。ここで、R25は水素原子または炭素数1~5のアルキル基からなる群の1種を表す。d~fは、それぞれ独立に、0または1を表す。)
Another aspect of the present invention relates to a polymer having a structural unit D represented by the following formula (5) and at least one of a structural unit B represented by formula (3) or a structural unit C represented by formula (4):
(In formula (5), Y9 and Y10 each independently represent a single bond or a member selected from the group consisting of —O—, —CO—, and —NR14— . Here, R14 represents a hydrogen atom or an alkyl group having 1 to 5 carbon atoms. Ar3 and Ar4 each independently represent an aromatic ring having 5 to 7 carbon atoms which may have a substituent, and any carbon atom in the aromatic ring may be substituted with a nitrogen atom, an oxygen atom, or a sulfur atom. R15 to R18 each independently represent a member selected from the group consisting of a hydrogen atom, a halogen atom, a cyano group, a nitro group, an alkyl group having 1 to 5 carbon atoms, and an alkoxy group having 1 to 5 carbon atoms. L5 represents a single bond or a member selected from the group consisting of —O— and —NR25— . Here, R25 represents a hydrogen atom or an alkyl group having 1 to 5 carbon atoms. Each of d to f independently represents 0 or 1.)

また、本発明の別の態様は、前記重合体を含む光学薄膜に関するものである。 Another aspect of the present invention relates to an optical thin film containing the polymer.

また、本発明の別の態様は、前記薄膜を備えた位相差膜に関するものである。
さらに、本発明の別の態様は、前記薄膜を備えた液晶配向膜に関するものである。
Another aspect of the present invention relates to a retardation film including the thin film.
Furthermore, another aspect of the present invention relates to a liquid crystal alignment film comprising the thin film.

本発明によれば、配向膜を必要とせず、偏光紫外線照射または斜め入射紫外線照射、および加熱処理により、優れた液晶配向性を示す光学薄膜、およびそれからなる位相差膜を提供することができる。 According to the present invention, it is possible to provide an optical thin film that exhibits excellent liquid crystal alignment properties by irradiating it with polarized ultraviolet light or obliquely incident ultraviolet light and by heat treatment, without requiring an alignment film, and a retardation film made from the same.

(式(1)で表される化合物)
以下に本発明の一態様である化合物について詳細に説明する。
(Compound represented by formula (1))
The compound according to one embodiment of the present invention will be described in detail below.

本発明の一つの態様は、光反応性基を含む前記式(1)で表される化合物(以下、「本発明の化合物」という)である。 One aspect of the present invention is a compound represented by the above formula (1) containing a photoreactive group (hereinafter referred to as the "compound of the present invention").

光反応性基とは、光を照射することにより配向能を生じる基をいう。具体的には、光を照射することで分子の二量化反応、異性化反応、光架橋反応、光分解反応のような配向能の起源となる光反応を生じるものである。
光反応性基としては、不飽和結合、特に二重結合を有するものが好ましい。具体的にはシンナモイル基、ビニル基、ポリエン基、スチルベン基、スチルバゾール基、スチルバゾリウム基、カルコン基、芳香族シッフ塩基、芳香族ヒドラゾンの構造を有する基、ベンゾフェノン基、クマリン基、アントラキノン基、マレイミド基、アゾベンゼン基、アゾナフタレン基、芳香族複素環アゾ基、ビスアゾ基、ホルマザン基、アゾキシベンゼンを基本構造とする基が例示される。これらのうち、光配向に必要な光照射量が比較的少なく、かつ熱安定性や経時安定性に優れる観点から、シンナモイル基が好ましい。
The photoreactive group is a group that generates alignment ability upon irradiation with light. Specifically, upon irradiation with light, it causes a photoreaction that is the origin of alignment ability, such as a molecular dimerization reaction, an isomerization reaction, a photocrosslinking reaction, or a photodecomposition reaction.
As the photoreactive group, those having unsaturated bond, especially double bond are preferred.Specific examples include cinnamoyl group, vinyl group, polyene group, stilbene group, stilbazole group, stilbazolium group, chalcone group, aromatic Schiff base, group having aromatic hydrazone structure, benzophenone group, coumarin group, anthraquinone group, maleimide group, azobenzene group, azonaphthalene group, aromatic heterocyclic azo group, bisazo group, formazan group, and group having azoxybenzene as basic structure.Among these, cinnamoyl group is preferred from the viewpoint that the light irradiation amount required for photoalignment is relatively small and has excellent thermal stability and stability over time.

式(1)中、X~Xは、それぞれ独立に、置換基を有していてもよい炭素数5~7の芳香環または置換基を有していてもよい炭素数5~7の脂環式炭化水素基のいずれかを表し、該芳香環中または該脂環式炭化水素基中の任意の炭素原子は窒素原子、酸素原子、硫黄原子に置換されてもよい。ここでX~Xにおける置換基として、ハロゲン原子、炭素数1~5のアルキル基、炭素数1~5のアルコキシ基を挙げることができ、X~Xが置換基を有さない場合、水素原子である。X~Xは、好ましくはベンゼン環、メチルベンゼン環、t-ブチルベンゼン環、ジメチルベンゼン環、テトラフルオロベンゼン環またはシクロヘキサン環からなる群の1種であり、さらに好ましくはtrans-シクロヘキサン環である。 In formula (1), X 1 to X 3 each independently represent either an aromatic ring having 5 to 7 carbon atoms which may have a substituent or an alicyclic hydrocarbon group having 5 to 7 carbon atoms which may have a substituent, and any carbon atom in the aromatic ring or the alicyclic hydrocarbon group may be substituted with a nitrogen atom, an oxygen atom, or a sulfur atom. Examples of the substituents in X 1 to X 3 include halogen atoms, alkyl groups having 1 to 5 carbon atoms, and alkoxy groups having 1 to 5 carbon atoms. When X 1 to X 3 are unsubstituted, they are hydrogen atoms. X 1 to X 3 are preferably a member of the group consisting of a benzene ring, a methylbenzene ring, a t-butylbenzene ring, a dimethylbenzene ring, a tetrafluorobenzene ring, or a cyclohexane ring, and more preferably a trans-cyclohexane ring.

およびYは、それぞれ独立に、ヒドロキシ基、カルボキシル基、アミノ基からなる群の1種を表す。YおよびYは、好ましくはヒドロキシ基である。 Y1 and Y2 each independently represent one of the group consisting of a hydroxy group, a carboxyl group, and an amino group, and are preferably a hydroxy group.

ArおよびArは、それぞれ独立に、置換基を有していてもよい炭素数5~7の芳香環を表し、該芳香環中の任意の炭素原子は窒素原子、酸素原子、硫黄原子に置換されてもよい。ここでArおよびArにおける置換基として、ハロゲン原子、炭素数1~5のアルキル基、炭素数1~5のアルコキシ基を挙げることができ、ArおよびArが置換基を有さない場合、水素原子である。ArおよびArは、好ましくは置換基を有していてもよいベンゼン環であり、さらに好ましくはベンゼン環である。 Ar 1 and Ar 2 each independently represent an aromatic ring having 5 to 7 carbon atoms which may have a substituent, and any carbon atom in the aromatic ring may be substituted with a nitrogen atom, an oxygen atom, or a sulfur atom. Examples of the substituents in Ar 1 and Ar 2 include a halogen atom, an alkyl group having 1 to 5 carbon atoms, and an alkoxy group having 1 to 5 carbon atoms. When Ar 1 and Ar 2 do not have a substituent, they are hydrogen atoms. Ar 1 and Ar 2 are preferably benzene rings which may have a substituent, and more preferably benzene rings.

~Rは、それぞれ独立に、水素原子、ハロゲン原子、シアノ基、ニトロ基、炭素数1~5のアルキル基、炭素数1~5のアルコキシ基からなる群の1種を表す。R~Rは、好ましくは水素原子またはシアノ基であり、さらに好ましくは水素原子である。 R 1 to R 4 each independently represent one of the group consisting of a hydrogen atom, a halogen atom, a cyano group, a nitro group, an alkyl group having 1 to 5 carbon atoms, and an alkoxy group having 1 to 5 carbon atoms. R 1 to R 4 are preferably a hydrogen atom or a cyano group, and more preferably a hydrogen atom.

およびLは、それぞれ独立に、単結合または-O-、-NR-からなる群の1種を表す。LおよびLは、好ましくは-O-または-NR-である。LおよびLにおけるRは水素原子または炭素数1~5のアルキル基からなる群の1種を表す。Rにおける炭素数1~5のアルキル基としては、メチル基、エチル基、プロピル基、ブチル基、ペンチル基を挙げることができる。 L1 and L4 each independently represent a single bond or one of the group consisting of -O- and -NR5- . L1 and L4 are preferably -O- or -NR5- . R5 in L1 and L4 represents a hydrogen atom or one of the group consisting of alkyl groups having 1 to 5 carbon atoms. Examples of the alkyl group having 1 to 5 carbon atoms for R5 include a methyl group, an ethyl group, a propyl group, a butyl group, and a pentyl group.

およびLは、それぞれ独立に、単結合または-O-、-CO-O-、-CO-NR-、-CO-、-CR-からなる群の1種を表す。ただし、LおよびLの左右の関係は、逆になってもよい。LおよびLは、好ましくは単結合または-CO-NR-であり、さらに好ましくは単結合である。LおよびLにおけるRは水素原子または炭素数1~5のアルキル基からなる群の1種を表す。Rにおける炭素数1~5のアルキル基としては、メチル基、エチル基、プロピル基、ブチル基、ペンチル基を挙げることができる。LおよびLにおけるRおよびRは、それぞれ独立に、水素原子、ハロゲン原子または炭素数1~5のアルキル基からなる群の1種を表す。RおよびRにおけるハロゲン原子としては、フッ素原子、塩素原子、臭素原子、ヨウ素原子を挙げることができる。RおよびRにおける炭素数1~5のアルキル基としては、メチル基、エチル基、プロピル基、ブチル基、ペンチル基を挙げることができる。 L2 and L3 each independently represent a single bond or a group selected from the group consisting of -O-, -CO-O-, -CO-NR 6 -, -CO-, and -CR 7 R 8 -. However, the left-right relationship of L2 and L 3 may be reversed. L2 and L3 are preferably a single bond or -CO-NR 6 -, more preferably a single bond. R6 in L2 and L3 represents a hydrogen atom or a group selected from the group consisting of an alkyl group having 1 to 5 carbon atoms. Examples of the alkyl group having 1 to 5 carbon atoms in R6 include a methyl group, an ethyl group, a propyl group, a butyl group, and a pentyl group. R7 and R8 in L2 and L3 each independently represent a hydrogen atom, a halogen atom, or a group selected from the group consisting of an alkyl group having 1 to 5 carbon atoms. Examples of the halogen atom in R7 and R8 include a fluorine atom, a chlorine atom, a bromine atom, and an iodine atom. Examples of the alkyl group having 1 to 5 carbon atoms in R 7 and R 8 include a methyl group, an ethyl group, a propyl group, a butyl group, and a pentyl group.

aおよびbは、それぞれ独立に、0または1を表す。 a and b each independently represent 0 or 1.

式(1)で表される化合物は、好ましくは以下の式(11)で表される化合物である。
式(11)中、X~X、Ar、Ar、R~R、L~L、a、およびbは、式(1)と同じである。
The compound represented by formula (1) is preferably a compound represented by the following formula (11):
In formula (11), X 1 to X 3 , Ar 1 , Ar 2 , R 1 to R 4 , L 1 to L 4 , a, and b are the same as in formula (1).

式(1)で表される化合物は、より好ましくは以下の式(12)で表される化合物である。
The compound represented by formula (1) is more preferably a compound represented by the following formula (12).

式(12)中、XおよびXは、それぞれ独立に、置換基を有していてもよい炭素数5~7の芳香環または置換基を有していてもよい炭素数5~7の脂環式炭化水素基のいずれかを表す。ここでXおよびXにおける置換基として、ハロゲン原子、炭素数1~5のアルキル基、炭素数1~5のアルコキシ基を挙げることができ、XおよびXが置換基を有さない場合、水素原子である。
およびXは、好ましくはベンゼン環、メチルベンゼン環、t-ブチルベンゼン環、ジメチルベンゼン環またはシクロヘキサン環からなる群の1種であり、さらに好ましくはベンゼン環またはシクロヘキサン環のいずれかである。
は、好ましくは置換基を有さない炭素数5~7の芳香環または置換基を有さない炭素数5~7の脂環式炭化水素基のいずれかである。
In formula (12), X7 and X8 each independently represent either an aromatic ring having 5 to 7 carbon atoms which may have a substituent, or an alicyclic hydrocarbon group having 5 to 7 carbon atoms which may have a substituent. Here, examples of the substituent in X7 and X8 include a halogen atom, an alkyl group having 1 to 5 carbon atoms, and an alkoxy group having 1 to 5 carbon atoms. When X7 and X8 do not have a substituent, they are hydrogen atoms.
X7 and X8 are preferably one member of the group consisting of a benzene ring, a methylbenzene ring, a t-butylbenzene ring, a dimethylbenzene ring or a cyclohexane ring, and more preferably either a benzene ring or a cyclohexane ring.
X7 is preferably either an unsubstituted aromatic ring having 5 to 7 carbon atoms or an unsubstituted alicyclic hydrocarbon group having 5 to 7 carbon atoms.

式(12)中、Lは、単結合または-O-、-CO-O-、-CO-NR21-、-CO-、-CR2223-からなる群の1種を表す。
は、好ましくは単結合である。
におけるR21は水素原子または炭素数1~5のアルキル基のいずれかを表す。
21における炭素数1~5のアルキル基としては、メチル基、エチル基、プロピル基、ブチル基、ペンチル基を挙げることができる。
におけるR22およびR23は、それぞれ独立に、水素原子、ハロゲン原子または炭素数1~5のアルキル基からなる群の1種を表す。ただし、Lの左右の関係は、逆になってもよい。
22およびR23におけるハロゲン原子としては、フッ素原子、塩素原子、臭素原子、ヨウ素原子を挙げることができる。
22およびR23における炭素数1~5のアルキル基としては、メチル基、エチル基、プロピル基、ブチル基、ペンチル基を挙げることができる。
In formula (12), L 6 represents a single bond or one of the group consisting of —O—, —CO—O—, —CO—NR 21 —, —CO—, and —CR 22 R 23 —.
L6 is preferably a single bond.
R 21 in L 6 represents either a hydrogen atom or an alkyl group having 1 to 5 carbon atoms.
Examples of the alkyl group having 1 to 5 carbon atoms for R 21 include a methyl group, an ethyl group, a propyl group, a butyl group, and a pentyl group.
R 22 and R 23 in L 6 each independently represent one of the group consisting of a hydrogen atom, a halogen atom, or an alkyl group having 1 to 5 carbon atoms, provided that the left and right relationships of L 6 may be reversed.
Examples of the halogen atom in R 22 and R 23 include a fluorine atom, a chlorine atom, a bromine atom, and an iodine atom.
Examples of the alkyl group having 1 to 5 carbon atoms in R 22 and R 23 include a methyl group, an ethyl group, a propyl group, a butyl group, and a pentyl group.

式(12)中、mおよびlは、それぞれ独立に、0または1を表す。
式(12)中、R19およびR20は、それぞれ独立に、水素原子、ヒドロキシ基、ハロゲン原子、炭素数1~5のアルキル基または炭素数1~5のアルコキシ基からなる群の1種を表す。
19およびR20における炭素数1~5のアルキル基としては、メチル基、エチル基、プロピル基、ブチル基、ペンチル基を挙げることができる。
19およびR20における炭素数1~5のアルコキシ基としては、メトキシ基、エトキシ基、プロポキシ基、ブトキシ基、ペントキシ基を挙げることができる。
式(12)中、nおよびnは、それぞれ独立に、0~4の整数を表す。
In formula (12), m and l each independently represent 0 or 1.
In formula (12), R 19 and R 20 each independently represent one of the group consisting of a hydrogen atom, a hydroxy group, a halogen atom, an alkyl group having 1 to 5 carbon atoms, or an alkoxy group having 1 to 5 carbon atoms.
Examples of the alkyl group having 1 to 5 carbon atoms in R 19 and R 20 include a methyl group, an ethyl group, a propyl group, a butyl group, and a pentyl group.
Examples of the alkoxy group having 1 to 5 carbon atoms in R 19 and R 20 include a methoxy group, an ethoxy group, a propoxy group, a butoxy group, and a pentoxy group.
In formula (12), n1 and n2 each independently represent an integer of 0 to 4.

式(12)中のエステル結合は、それぞれ独立に、置換基を有してもよいアミド結合に置き換わってもよい。置換基としては、例えば、ハロゲン原子、炭素数1~5のアルキル基を挙げることができる。 Each ester bond in formula (12) may be independently replaced with an amide bond, which may have a substituent. Examples of the substituent include a halogen atom and an alkyl group having 1 to 5 carbon atoms.

本発明の化合物は、さらに好ましくは以下の式(13)で表される化合物である。
The compound of the present invention is more preferably a compound represented by the following formula (13):

(式(13)中、Y11は、置換基を有していてもよいベンゼン環、ビフェニル環、シクロヘキサン環、ビシクロヘキサン環からなる群の1種を表す。R19およびR20は、それぞれ独立に、水素原子、ヒドロキシ基、ハロゲン原子、炭素数1~5のアルキル基または炭素数1~5のアルコキシ基を表す。nおよびnは、それぞれ独立に、0~4の整数を表す。) (In formula (13), Y 11 represents one member of the group consisting of a benzene ring, a biphenyl ring, a cyclohexane ring, and a bicyclohexane ring, each of which may have a substituent. R 19 and R 20 each independently represent a hydrogen atom, a hydroxy group, a halogen atom, an alkyl group having 1 to 5 carbon atoms, or an alkoxy group having 1 to 5 carbon atoms. n 1 and n 2 each independently represent an integer of 0 to 4.)

式(13)中、Y11は置換基を有していてもよいベンゼン環、ビフェニル環、シクロヘキサン環、ビシクロヘキサン環からなる群の1種を表す。ここでY11における置換基として、ハロゲン原子、炭素数1~5のアルキル基、炭素数1~5のアルコキシ基を挙げることができ、Y11が置換基を有さない場合水素原子である。
11は、好ましくは置換基を有していてもよいベンゼン環、ビフェニル環、シクロヘキサン環からなる群の1種であり、さらに好ましくは、ベンゼン環、メチルベンゼン環、t-ブチルベンゼン環、テトラメチルビフェニル環、シクロヘキサン環からなる群の1種である。
In formula (13), Y 11 represents one of the group consisting of an optionally substituted benzene ring, a biphenyl ring, a cyclohexane ring, and a bicyclohexane ring, where examples of the substituent on Y 11 include a halogen atom, an alkyl group having 1 to 5 carbon atoms, and an alkoxy group having 1 to 5 carbon atoms, and when Y 11 is unsubstituted, it is a hydrogen atom.
Y11 is preferably one member of the group consisting of a benzene ring, a biphenyl ring, and a cyclohexane ring, each of which may have a substituent, and more preferably one member of the group consisting of a benzene ring, a methylbenzene ring, a t-butylbenzene ring, a tetramethylbiphenyl ring, and a cyclohexane ring.

19およびR20における炭素数1~5のアルキル基としては、メチル基、エチル基、プロピル基、ブチル基、ペンチル基を挙げることができる。
19およびR20における炭素数1~5のアルコキシ基としては、メトキシ基、エトキシ基、プロポキシ基、ブトキシ基、ペントキシ基を挙げることができる。
Examples of the alkyl group having 1 to 5 carbon atoms in R 19 and R 20 include a methyl group, an ethyl group, a propyl group, a butyl group, and a pentyl group.
Examples of the alkoxy group having 1 to 5 carbon atoms in R 19 and R 20 include a methoxy group, an ethoxy group, a propoxy group, a butoxy group, and a pentoxy group.

式(13)中のエステル結合は、それぞれ独立に、置換基を有してもよいアミド結合に置き換わってもよい。置換基としては、例えば、ハロゲン原子、炭素数1~5のアルキル基を挙げることができる。 Each ester bond in formula (13) may be independently replaced with an amide bond which may have a substituent. Examples of the substituent include a halogen atom and an alkyl group having 1 to 5 carbon atoms.

本発明の化合物は、有機合成化学における一般的手法を組み合わせることによって合成することができる。例えば、Y及びYがヒドロキシ基である式(1)で表される化合物の合成方法として、下記合成スキームで表されるように、ヒドロキシ基を保護(合成スキームA1)した後、ヒドロキシ基を保護した化合物と、ジヒドロキシ化合物またはアミン化合物を縮合反応(合成スキームA2)させ、脱保護(合成スキームA3)させる方法を例示することができる。 The compound of the present invention can be synthesized by combining general techniques in organic synthetic chemistry. For example, as a method for synthesizing a compound represented by formula (1) in which Y1 and Y2 are hydroxy groups, a method can be exemplified in which the hydroxy groups are protected (Synthesis Scheme A1), and then the compound with the protected hydroxy groups is subjected to a condensation reaction with a dihydroxy compound or an amine compound (Synthesis Scheme A2), followed by deprotection (Synthesis Scheme A3), as shown in the following synthesis scheme.

(合成スキームA1)
(Synthesis Scheme A1)

(合成スキームA2)
(Synthetic Scheme A2)

(合成スキームA3)
(合成スキームA1~A3中、PGは保護基を表す)
(Synthesis Scheme A3)
(In the synthesis schemes A1 to A3, PG represents a protecting group.)

合成スキームで用いられる保護基PGは、特に限定されない。具体的には、置換メチルエーテル保護基としては、メトキシメチル基、メチルチオメチル基、ベンジルオキシメチル基、t-ブトキシメチル基、4-ペンテニルオキシメチル基、テトラヒドロピラニル基、テトラヒドロフラニル基、テトラヒドロチオフラニル基が例示される。置換エチルエーテル保護基としては、1-エトキシエチル基、1-(2-クロロエトキシ)エチル基、2-ヒドロエチル基、2-ブロモエチル基、t-ブチル基、シクロヘキシル基、ベンジル基が例示される。メトキシ置換ベンジルエーテル保護基としては、p-メトキシベンジル基、3,4-ジメトキシベンジル基、2,6-ジメトキシベンジル基、p-フェニルベンジル基、p-シアノベンジル基、ジフェニルメチル基、4-メトキシジフェニルメチル基、トリフェニルメチル基、トリ(p-メトキシフェニル)メチル基、ジ(p-メトキシフェニル)フェニルメチル基が例示される。シリルエーテル保護基としては、トリメチルシリル基、トリエチルシリル基、トリイソプロピルシリル基、ジメチルイソプロピルシリル基、t-ブチルジメチルシリル基、トリベンジルシリル基、トリフェニルシリル基、ジフェニルメチルシリル基、t-ブチルメトキシフェニルシリル基、t-ブトキシジフェニルシリル基が例示される。これらのうち、コストや簡便さの観点から、特にテトラヒドロピラニル基やt-ブチルジメチルシリル基が好ましい。The protecting group PG used in the synthesis scheme is not particularly limited. Specific examples of substituted methyl ether protecting groups include methoxymethyl, methylthiomethyl, benzyloxymethyl, t-butoxymethyl, 4-pentenyloxymethyl, tetrahydropyranyl, tetrahydrofuranyl, and tetrahydrothiofuranyl. Examples of substituted ethyl ether protecting groups include 1-ethoxyethyl, 1-(2-chloroethoxy)ethyl, 2-hydroxyethyl, 2-bromoethyl, t-butyl, cyclohexyl, and benzyl. Examples of methoxy-substituted benzyl ether protecting groups include p-methoxybenzyl, 3,4-dimethoxybenzyl, 2,6-dimethoxybenzyl, p-phenylbenzyl, p-cyanobenzyl, diphenylmethyl, 4-methoxydiphenylmethyl, triphenylmethyl, tri(p-methoxyphenyl)methyl, and di(p-methoxyphenyl)phenylmethyl. Examples of silyl ether protecting groups include trimethylsilyl, triethylsilyl, triisopropylsilyl, dimethylisopropylsilyl, t-butyldimethylsilyl, tribenzylsilyl, triphenylsilyl, diphenylmethylsilyl, t-butylmethoxyphenylsilyl, and t-butoxydiphenylsilyl. Of these, from the viewpoints of cost and simplicity, tetrahydropyranyl and t-butyldimethylsilyl are particularly preferred.

合成スキームA2での縮合反応において用いられる縮合剤は、特に限定されない。具体的には、カルボジイミド縮合剤としては、1,3-ビス(2,2-ジメチル-1,3-ジオキソラン-4-イルメチル)カルボジイミド、N,N’-ジイソプロピルカルボジイミド、N,N’-ジシクロヘキシルカルボジイミド、N,N’-ジ-t-ブチルカルボジイミド、1-(3-ジメチルアミノプロピル)-3-エチルカルボジイミドが例示される。エステル縮合剤としては、N-ヒドロキシスクシンイミド、ビス(2-オキソ-3-オキサゾリジニルホスフィン酸クロリド、炭酸ビス(ペンタフルオロフェニル)、クロロギ酸イソブチル、クロロギ酸4-ニトロフェニル、ジフェニルホスフィン酸クロリド、炭酸ビス(4-ニトロフェニル)、2,2’-ジピリジルジスルフィド、3,4-ジヒドロ-3-ヒドロキシ-4-オキソ-1,2,3-ベンゾトリアジン、N-ヒドロキシフタルイミド、4-ニトロフェノール、2-メチル-6-ニトロ安息香酸無水物、トリフルオロ酢酸4-ニトロフェニル、4-トリフルオロメチル安息香酸無水物、2,4,6-トリクロロベンゾイルクロリドが例示される。カルボジイミダゾール縮合剤としては、1,1’-カルボニルジイミダゾール、1,1’-カルボニルジ(1,2,4-トリアゾール)、1,1’―オキサリルジイミダゾールが例示される。ホスゲン縮合剤としては、チオカルボニルクロリド、炭酸(トリクロロメチル)、チオ炭酸O,O’-ジ-2-ピリジルが例示される。トリフラート縮合剤としては、2-[N,N’-ビス(トリフルオロメタンスルホニル)アミノ]-5-クロロピリジン、トリフルオロメタンスルホン酸4-ニトロフェニル、N-フェニルビス(トリフルオロメタンスルホンイミド)が例示される。これらのうち、コストや簡便さの観点から、特にN,N’-ジシクロヘキシルカルボジイミドや1-(3-ジメチルアミノプロピル)-3-エチルカルボジイミド、1,1’-カルボニルジイミダゾールが好ましい。 The condensing agent used in the condensation reaction in Synthesis Scheme A2 is not particularly limited. Specific examples of carbodiimide condensing agents include 1,3-bis(2,2-dimethyl-1,3-dioxolan-4-ylmethyl)carbodiimide, N,N'-diisopropylcarbodiimide, N,N'-dicyclohexylcarbodiimide, N,N'-di-t-butylcarbodiimide, and 1-(3-dimethylaminopropyl)-3-ethylcarbodiimide. Examples of ester condensing agents include N-hydroxysuccinimide, bis(2-oxo-3-oxazolidinylphosphinic acid chloride, bis(pentafluorophenyl) carbonate), isobutyl chloroformate, 4-nitrophenyl chloroformate, diphenylphosphinic acid chloride, bis(4-nitrophenyl) carbonate, 2,2'-dipyridyl disulfide, 3,4-dihydro-3-hydroxy-4-oxo-1,2,3-benzotriazine, N-hydroxyphthalimide, 4-nitrophenol, 2-methyl-6-nitrobenzoic acid anhydride, 4-nitrophenyl trifluoroacetate, 4-trifluoromethylbenzoic acid anhydride, and 2,4,6-trichlorobenzoyl chloride. Examples of carbodiimidazole condensing agents include 1,1'-carbonyldibenzoyl Examples of the condensing agent include thiocarbonyl chloride, trichloromethyl carbonate, and O,O'-di-2-pyridyl thiocarbonate. Examples of the triflate condensing agent include 2-[N,N'-bis(trifluoromethanesulfonyl)amino]-5-chloropyridine, 4-nitrophenyl trifluoromethanesulfonate, and N-phenylbis(trifluoromethanesulfonimide). Of these, from the viewpoints of cost and simplicity, N,N'-dicyclohexylcarbodiimide, 1-(3-dimethylaminopropyl)-3-ethylcarbodiimide, and 1,1'-carbonyldiimidazole are particularly preferred.

合成スキームA3での脱保護において用いられる方法は、特に限定されない。用いた保護基に適した脱保護方法を用いればよい。 The method used for deprotection in Synthesis Scheme A3 is not particularly limited. A deprotection method appropriate for the protecting group used may be used.

式(1)で表される化合物が式(12)で表される化合物である場合は、以下の合成スキーム4~6の方法を例示することができる。 When the compound represented by formula (1) is a compound represented by formula (12), the following synthesis schemes 4 to 6 can be exemplified.

(合成スキームA4)
(Synthetic Scheme A4)

(合成スキームA5)
(Synthesis Scheme A5)

(合成スキームA6)
(合成スキームA4~A6中、PGは保護基を表す)
(Synthesis Scheme A6)
(In the synthesis schemes A4 to A6, PG represents a protecting group.)

合成スキームで用いられる保護基PGは、特に限定されない。具体的には、置換メチルエーテル保護基としては、メトキシメチル基、メチルチオメチル基、ベンジルオキシメチル基、t-ブトキシメチル基、4-ペンテニルオキシメチル基、テトラヒドロピラニル基、テトラヒドロフラニル基、テトラヒドロチオフラニル基が例示される。置換エチルエーテル保護基としては、1-エトキシエチル基、1-(2-クロロエトキシ)エチル基、2-ヒドロエチル基、2-ブロモエチル基、t-ブチル基、シクロヘキシル基、ベンジル基が例示される。メトキシ置換ベンジルエーテル保護基としては、p-メトキシベンジル基、3,4-ジメトキシベンジル基、2,6-ジメトキシベンジル基、p-フェニルベンジル基、p-シアノベンジル基、ジフェニルメチル基、4-メトキシジフェニルメチル基、トリフェニルメチル基、トリ(p-メトキシフェニル)メチル基、ジ(p-メトキシフェニル)フェニルメチル基が例示される。シリルエーテル保護基としては、トリメチルシリル基、トリエチルシリル基、トリイソプロピルシリル基、ジメチルイソプロピルシリル基、t-ブチルジメチルシリル基、トリベンジルシリル基、トリフェニルシリル基、ジフェニルメチルシリル基、t-ブチルメトキシフェニルシリル基、t-ブトキシジフェニルシリル基が例示される。これらのうち、コストや簡便さの観点から、特にテトラヒドロピラニル基やt-ブチルジメチルシリル基が好ましい。The protecting group PG used in the synthesis scheme is not particularly limited. Specific examples of substituted methyl ether protecting groups include methoxymethyl, methylthiomethyl, benzyloxymethyl, t-butoxymethyl, 4-pentenyloxymethyl, tetrahydropyranyl, tetrahydrofuranyl, and tetrahydrothiofuranyl. Examples of substituted ethyl ether protecting groups include 1-ethoxyethyl, 1-(2-chloroethoxy)ethyl, 2-hydroxyethyl, 2-bromoethyl, t-butyl, cyclohexyl, and benzyl. Examples of methoxy-substituted benzyl ether protecting groups include p-methoxybenzyl, 3,4-dimethoxybenzyl, 2,6-dimethoxybenzyl, p-phenylbenzyl, p-cyanobenzyl, diphenylmethyl, 4-methoxydiphenylmethyl, triphenylmethyl, tri(p-methoxyphenyl)methyl, and di(p-methoxyphenyl)phenylmethyl. Examples of silyl ether protecting groups include trimethylsilyl, triethylsilyl, triisopropylsilyl, dimethylisopropylsilyl, t-butyldimethylsilyl, tribenzylsilyl, triphenylsilyl, diphenylmethylsilyl, t-butylmethoxyphenylsilyl, and t-butoxydiphenylsilyl. Of these, from the viewpoints of cost and simplicity, tetrahydropyranyl and t-butyldimethylsilyl are particularly preferred.

合成スキームA5での縮合反応において用いられる縮合剤は、特に限定されない。具体的には、カルボジイミド縮合剤としては、1,3-ビス(2,2-ジメチル-1,3-ジオキソラン-4-イルメチル)カルボジイミド、N,N’-ジイソプロピルカルボジイミド、N,N’-ジシクロヘキシルカルボジイミド、N,N’-ジ-t-ブチルカルボジイミド、1-(3-ジメチルアミノプロピル)-3-エチルカルボジイミドが例示される。エステル縮合剤としては、N-ヒドロキシスクシンイミド、ビス(2-オキソ-3-オキサゾリジニルホスフィン酸クロリド、炭酸ビス(ペンタフルオロフェニル)、クロロギ酸イソブチル、クロロギ酸4-ニトロフェニル、ジフェニルホスフィン酸クロリド、炭酸ビス(4-ニトロフェニル)、2,2’-ジピリジルジスルフィド、3,4-ジヒドロ-3-ヒドロキシ-4-オキソ-1,2,3-ベンゾトリアジン、N-ヒドロキシフタルイミド、4-ニトロフェノール、2-メチル-6-ニトロ安息香酸無水物、トリフルオロ酢酸4-ニトロフェニル、4-トリフルオロメチル安息香酸無水物、2,4,6-トリクロロベンゾイルクロリドが例示される。カルボジイミダゾール縮合剤としては、1,1’-カルボニルジイミダゾール、1,1’-カルボニルジ(1,2,4-トリアゾール)、1,1’―オキサリルジイミダゾールが例示される。ホスゲン縮合剤としては、チオカルボニルクロリド、炭酸(トリクロロメチル)、チオ炭酸O,O’-ジ-2-ピリジルが例示される。トリフラート縮合剤としては、2-[N,N’-ビス(トリフルオロメタンスルホニル)アミノ]-5-クロロピリジン、トリフルオロメタンスルホン酸4-ニトロフェニル、N-フェニルビス(トリフルオロメタンスルホンイミド)が例示される。これらのうち、コストや簡便さの観点から、特にN,N’-ジシクロヘキシルカルボジイミドや1-(3-ジメチルアミノプロピル)-3-エチルカルボジイミドが好ましい。 The condensing agent used in the condensation reaction in Synthesis Scheme A5 is not particularly limited. Specific examples of carbodiimide condensing agents include 1,3-bis(2,2-dimethyl-1,3-dioxolan-4-ylmethyl)carbodiimide, N,N'-diisopropylcarbodiimide, N,N'-dicyclohexylcarbodiimide, N,N'-di-t-butylcarbodiimide, and 1-(3-dimethylaminopropyl)-3-ethylcarbodiimide. Examples of ester condensing agents include N-hydroxysuccinimide, bis(2-oxo-3-oxazolidinylphosphinic acid chloride, bis(pentafluorophenyl) carbonate), isobutyl chloroformate, 4-nitrophenyl chloroformate, diphenylphosphinic acid chloride, bis(4-nitrophenyl) carbonate, 2,2'-dipyridyl disulfide, 3,4-dihydro-3-hydroxy-4-oxo-1,2,3-benzotriazine, N-hydroxyphthalimide, 4-nitrophenol, 2-methyl-6-nitrobenzoic acid anhydride, 4-nitrophenyl trifluoroacetate, 4-trifluoromethylbenzoic acid anhydride, and 2,4,6-trichlorobenzoyl chloride. Examples of carbodiimidazole condensing agents include 1,1 Examples of the condensing agent include 1,1'-carbonyldiimidazole, 1,1'-carbonyldi(1,2,4-triazole), and 1,1'-oxalyldiimidazole. Examples of the phosgene condensing agent include thiocarbonyl chloride, trichloromethyl carbonate, and O,O'-di-2-pyridyl thiocarbonate. Examples of the triflate condensing agent include 2-[N,N'-bis(trifluoromethanesulfonyl)amino]-5-chloropyridine, 4-nitrophenyl trifluoromethanesulfonate, and N-phenylbis(trifluoromethanesulfonimide). Of these, N,N'-dicyclohexylcarbodiimide and 1-(3-dimethylaminopropyl)-3-ethylcarbodiimide are particularly preferred from the standpoints of cost and simplicity.

合成スキームA6での脱保護において用いられる方法は、特に限定されない。用いた保護基に適した脱保護方法を用いればよい。 The method used for deprotection in Synthesis Scheme A6 is not particularly limited. A deprotection method appropriate for the protecting group used may be used.

(重合体)
以下に本発明の一態様である重合体について詳細に説明する。
(polymer)
The polymer according to one embodiment of the present invention will be described in detail below.

本発明の別の態様として、以下の式(2)で表される構成単位Aを有し、以下の式(3)で表される構成単位Bまたは以下の式(4)で表される構成単位Cのうち少なくとも1種を有する重合体(以下、「本発明の重合体1」という。)を挙げることができる。なかでも、本発明の重合体1は、式(2)で表される構成単位Aおよび式(3)で表される構成単位Bを有する重合体であることが好ましい。
(式(2)中、X~Xは、それぞれ独立に、置換基を有していてもよい炭素数5~7の芳香環または置換基を有していてもよい炭素数5~7の脂環式炭化水素基のいずれかを表し、該芳香環中または該脂環式炭化水素基中の任意の炭素原子は窒素原子、酸素原子、硫黄原子に置換されてもよい。ここでX~Xにおける置換基は、それぞれ独立に、ハロゲン原子、炭素数1~5のアルキル基、炭素数1~5のアルコキシ基からなる群の1種を表し、X~Xが置換基を有さない場合、水素原子である。YおよびYは、それぞれ独立に、-O-、-CO-、-NR-からなる群の1種を表す。ここで、Rは水素原子または炭素数1~5のアルキル基からなる群の1種を表す。ArおよびArは、それぞれ独立に、置換基を有していてもよい炭素数5~7の芳香環を表し、該芳香環中の任意の炭素原子は窒素原子、酸素原子、硫黄原子に置換されてもよい。ここでArおよびArにおける置換基は、それぞれ独立に、ハロゲン原子、炭素数1~5のアルキル基、炭素数1~5のアルコキシ基からなる群の1種を表し、ArおよびArが置換基を有さない場合、水素原子である。
~Rは、それぞれ独立に、水素原子、ハロゲン原子、シアノ基、ニトロ基、炭素数1~5のアルキル基、炭素数1~5のアルコキシ基からなる群の1種を表す。LおよびLは、単結合または-O-、-NR-からなる群の1種を表す。ここで、Rは水素原子または炭素数1~5のアルキル基からなる群の1種を表す。LおよびLは、単結合または-O-、-CO-O-、-CO-NR-、-CO-、-CR-からなる群の1種を表す。
ここで、Rは水素原子または炭素数1~5のアルキル基からなる群の1種を表す。RおよびRは、それぞれ独立に、水素原子、ハロゲン原子または炭素数1~5のアルキル基からなる群の1種を表す。aおよびbは、それぞれ独立に、0または1を表す。)
Another embodiment of the present invention is a polymer (hereinafter referred to as "polymer 1 of the present invention") having a structural unit A represented by the following formula (2) and at least one of a structural unit B represented by the following formula (3) or a structural unit C represented by the following formula (4). In particular, polymer 1 of the present invention is preferably a polymer having a structural unit A represented by formula (2) and a structural unit B represented by formula (3).
In formula (2), X 1 to X 3 each independently represent an aromatic ring having 5 to 7 carbon atoms which may have a substituent, or an alicyclic hydrocarbon group having 5 to 7 carbon atoms which may have a substituent, and any carbon atom in the aromatic ring or the alicyclic hydrocarbon group may be substituted with a nitrogen atom, an oxygen atom, or a sulfur atom. Here, the substituents in X 1 to X 3 each independently represent one kind of the group consisting of a halogen atom, an alkyl group having 1 to 5 carbon atoms, and an alkoxy group having 1 to 5 carbon atoms, and when X 1 to X 3 do not have a substituent, it is a hydrogen atom. Y 3 and Y 4 each independently represent one kind of the group consisting of —O—, —CO—, or —NR 9 —. Here, R 9 represents one kind of the group consisting of a hydrogen atom or an alkyl group having 1 to 5 carbon atoms. Ar 1 and Ar Ar 1 and Ar 2 each independently represent an aromatic ring having 5 to 7 carbon atoms which may have a substituent, and any carbon atom in the aromatic ring may be substituted with a nitrogen atom, an oxygen atom, or a sulfur atom. Here, the substituents in Ar 1 and Ar 2 each independently represent one kind of the group consisting of a halogen atom, an alkyl group having 1 to 5 carbon atoms, and an alkoxy group having 1 to 5 carbon atoms, and when Ar 1 and Ar 2 do not have a substituent, they are hydrogen atoms.
R 1 to R 4 each independently represent a group consisting of a hydrogen atom, a halogen atom, a cyano group, a nitro group, an alkyl group having 1 to 5 carbon atoms, and an alkoxy group having 1 to 5 carbon atoms. L 1 and L 4 represent a single bond or a group consisting of -O- or -NR 5 -. Here, R 5 represents a hydrogen atom or a group consisting of an alkyl group having 1 to 5 carbon atoms. L 2 and L 3 represent a single bond or a group consisting of -O-, -CO-O-, -CO-NR 6 -, -CO- or -CR 7 R 8 -.
Here, R6 represents a hydrogen atom or a C1-C5 alkyl group. R7 and R8 each independently represent a hydrogen atom, a halogen atom, or a C1-C5 alkyl group. a and b each independently represent 0 or 1.

(式(3)中、YおよびYは、それぞれ独立に、-O-、-CO-、-NR10-からなる群の1種を表す。ここで、R10は水素原子または炭素数1~5のアルキル基からなる群の1種を表す。X~Xは、それぞれ独立に、置換基を有していてもよい炭素数5~7の芳香環または置換基を有していてもよい炭素数5~7の脂環式炭化水素基のいずれかを表し、該芳香環中または該脂環式炭化水素基中の任意の炭素原子は窒素原子、酸素原子、硫黄原子に置換されてもよい。R11およびR12は、水素原子または炭素数1~5のアルキル基からなる群の1種を表す。cは、0または1を表す。) (In formula (3), Y5 and Y6 each independently represent a group consisting of —O—, —CO—, and —NR 10 —. Here, R 10 represents a hydrogen atom or a group consisting of an alkyl group having 1 to 5 carbon atoms. X4 to X6 each independently represent an aromatic ring having 5 to 7 carbon atoms which may have a substituent, or an alicyclic hydrocarbon group having 5 to 7 carbon atoms which may have a substituent, and any carbon atom in the aromatic ring or the alicyclic hydrocarbon group may be substituted with a nitrogen atom, an oxygen atom, or a sulfur atom. R 11 and R 12 each independently represent a hydrogen atom or a group consisting of an alkyl group having 1 to 5 carbon atoms. c represents 0 or 1.)

(式(4)中、YおよびYは、それぞれ独立に、-O-、-CO-、-NR13-からなる群の1種を表す。ここで、R13は水素原子または炭素数1~5のアルキル基からなる群の1種を表す。Zは、炭素数5~7の脂環式炭化水素基、炭素数2~20の直鎖状のアルキレン基、炭素数4~20の分枝状のアルキレン基からなる群の一種を表す。) (In formula (4), Y7 and Y8 each independently represent one selected from the group consisting of -O-, -CO-, and -NR13- . Here, R13 represents a hydrogen atom or an alkyl group having 1 to 5 carbon atoms. Z represents one selected from the group consisting of an alicyclic hydrocarbon group having 5 to 7 carbon atoms, a linear alkylene group having 2 to 20 carbon atoms, and a branched alkylene group having 4 to 20 carbon atoms.)

式(2)中、X~X、Ar、Ar、R~R、L~L、aおよびbは、式(1)と同じである。
およびYは、それぞれ独立に、-O-、-CO-、-NR-からなる群の1種を表す。ここで、Rは水素原子または炭素数1~5のアルキル基からなる群の1種を表す。YおよびYは、好ましくは-O-である。
In formula (2), X 1 to X 3 , Ar 1 , Ar 2 , R 1 to R 4 , L 1 to L 4 , a and b are the same as in formula (1).
Y3 and Y4 each independently represent one of the group consisting of -O-, -CO-, and -NR9- , where R9 represents one of the group consisting of a hydrogen atom or an alkyl group having 1 to 5 carbon atoms. Y3 and Y4 are preferably -O-.

式(3)中、YおよびYは、それぞれ独立に、-O-、-CO-、-NR10-からなる群の1種を表す。ここで、R10は水素原子または炭素数1~5のアルキル基からなる群の1種を表す。YおよびYは、好ましくは-O-または-CO-である。
~Xは、それぞれ独立に、置換基を有していてもよい炭素数5~7の芳香環または置換基を有していてもよい炭素数5~7の脂環式炭化水素基のいずれかを表し、該芳香環中または該脂環式炭化水素基中の任意の炭素原子は窒素原子、酸素原子、硫黄原子に置換されてもよい。ここでX~Xにおける置換基として、ハロゲン原子、炭素数1~5のアルキル基、炭素数1~5のアルコキシ基を挙げることができ、X~Xが置換基を有さない場合、水素原子である。X~Xは、好ましくはベンゼン環、メチルベンゼン環、t-ブチルベンゼン環、ジメチルベンゼン環、テトラフルオロベンゼン環またはシクロヘキサン環からなる群の1種であり、さらに好ましくはベンゼン環またはtrans-シクロヘキサン環である。
11およびR12は、水素原子または炭素数1~5のアルキル基からなる群の1種を表す。Rにおける炭素数1~5のアルキル基としては、メチル基、エチル基、プロピル基、ブチル基、ペンチル基を挙げることができる。
cは、0または1を表す。
In formula (3), Y5 and Y6 each independently represent one of the group consisting of -O-, -CO-, and -NR10- , where R10 represents one of the group consisting of a hydrogen atom or an alkyl group having 1 to 5 carbon atoms. Y5 and Y6 are preferably -O- or -CO-.
X4 to X6 each independently represent either an aromatic ring having 5 to 7 carbon atoms which may have a substituent or an alicyclic hydrocarbon group having 5 to 7 carbon atoms which may have a substituent, and any carbon atom in the aromatic ring or the alicyclic hydrocarbon group may be substituted with a nitrogen atom, an oxygen atom, or a sulfur atom. Examples of the substituents in X4 to X6 include halogen atoms, alkyl groups having 1 to 5 carbon atoms, and alkoxy groups having 1 to 5 carbon atoms. When X4 to X6 are unsubstituted, they are hydrogen atoms. X4 to X6 are preferably a member of the group consisting of a benzene ring, a methylbenzene ring, a t-butylbenzene ring, a dimethylbenzene ring, a tetrafluorobenzene ring, or a cyclohexane ring, and more preferably a benzene ring or a trans-cyclohexane ring.
R11 and R12 each represent a hydrogen atom or a C1 to C5 alkyl group. Examples of the C1 to C5 alkyl group represented by R5 include a methyl group, an ethyl group, a propyl group, a butyl group, and a pentyl group.
c represents 0 or 1.

式(4)中、YおよびYは、それぞれ独立に、-O-、-CO-、-NR13-からなる群の1種を表す。ここで、R13は水素原子または炭素数1~5のアルキル基からなる群の1種を表す。YおよびYは、好ましくは-CO-である。
Zは、炭素数5~7の脂環式炭化水素基、炭素数2~20の直鎖状のアルキレン基、炭素数4~20の分枝状のアルキレン基からなる群の一種を表す。Zは、好ましくは炭素数5~7の脂環式炭化水素基、炭素数2~20の直鎖状のアルキレン基であり、さらに好ましくは炭素数5~7の脂環式炭化水素基、炭素数2~10の直鎖状のアルキレン基である。
In formula (4), Y7 and Y8 each independently represent one of the group consisting of -O-, -CO-, and -NR13- , where R13 represents one of the group consisting of a hydrogen atom or an alkyl group having 1 to 5 carbon atoms. Y7 and Y8 are preferably -CO-.
Z represents one member of the group consisting of an alicyclic hydrocarbon group having 5 to 7 carbon atoms, a linear alkylene group having 2 to 20 carbon atoms, and a branched alkylene group having 4 to 20 carbon atoms. Z is preferably an alicyclic hydrocarbon group having 5 to 7 carbon atoms or a linear alkylene group having 2 to 20 carbon atoms, and more preferably an alicyclic hydrocarbon group having 5 to 7 carbon atoms or a linear alkylene group having 2 to 10 carbon atoms.

本発明の重合体1は、好ましくは、以下の式(14)で表されるシンナモイル基を含む構成単位Aと、以下の式(15)で表される構成単位Cを有する重合体である。
(式(14)中、XおよびXは、それぞれ独立に、置換基を有していてもよい炭素数5~7の芳香環または置換基を有していてもよい炭素数5~7の脂環式炭化水素基のいずれかを表す。Lは、単結合または-O-、-CO-O-、-CO-NR21-、-CO-、-CR2223-からなる群の1種を表す。ここで、R21は水素原子または炭素数1~5のアルキル基のいずれかを表す。R22およびR23は、それぞれ独立に、水素原子、ハロゲン原子または炭素数1~5のアルキル基からなる群の1種を表す。mおよびlは、それぞれ独立に、0または1を表す。R19およびR20は、それぞれ独立に、水素原子、ヒドロキシ基、ハロゲン原子、炭素数1~5のアルキル基または炭素数1~5のアルコキシ基からなる群の1種を表す。nおよびnは、それぞれ独立に、0~4の整数を表す。)
The polymer 1 of the present invention is preferably a polymer having a structural unit A1 containing a cinnamoyl group represented by the following formula (14) and a structural unit C1 represented by the following formula (15).
(In formula (14), X7 and X8 each independently represent an aromatic ring having 5 to 7 carbon atoms which may have a substituent, or an alicyclic hydrocarbon group having 5 to 7 carbon atoms which may have a substituent. L6 represents a single bond or a member selected from the group consisting of -O-, -CO-O-, -CO- NR21- , -CO-, and -CR22R23- . Here, R21 represents a hydrogen atom or an alkyl group having 1 to 5 carbon atoms. R22 and R23 each independently represent a member selected from the group consisting of a hydrogen atom, a halogen atom, or an alkyl group having 1 to 5 carbon atoms. m and l each independently represent 0 or 1. R19 and R20 each independently represent a hydrogen atom, a hydroxy group, a halogen atom, an alkyl group having 1 to 5 carbon atoms, or an alkoxy group having 1 to 5 carbon atoms. n1 and n2 each independently represent an integer of 0 to 4.)

(式(15)中、Zは炭素数2~20の直鎖状のアルキレン基または炭素数4~20の分枝状のアルキレン基のいずれかを表す。) (In formula (15), Z represents either a linear alkylene group having 2 to 20 carbon atoms or a branched alkylene group having 4 to 20 carbon atoms.)

本発明の重合体1において、構成単位Aは以下の式(16)で表される構成単位Aであることが好ましい。
(式(16)中、Y11は、置換基を有していてもよいベンゼン環、ビフェニル環、シクロヘキサン環、ビシクロヘキサン環からなる群の1種を表す。R19およびR20は、それぞれ独立に、水素原子、ヒドロキシ基、ハロゲン原子、炭素数1~5のアルキル基または炭素数1~5のアルコキシ基を表す。nおよびnは、それぞれ独立に、0~4の整数を表す。)
In the polymer 1 of the present invention, the structural unit A1 is preferably a structural unit A2 represented by the following formula (16).
(In formula (16), Y 11 represents one member of the group consisting of a benzene ring, a biphenyl ring, a cyclohexane ring, and a bicyclohexane ring, each of which may have a substituent. R 19 and R 20 each independently represent a hydrogen atom, a hydroxy group, a halogen atom, an alkyl group having 1 to 5 carbon atoms, or an alkoxy group having 1 to 5 carbon atoms. n 1 and n 2 each independently represent an integer of 0 to 4.)

本発明の重合体1を合成する方法としては、特に限定されず、当該分野で公知の重合法、例えば、溶融重合法または対応するジカルボン酸クロライドを用いる溶液重合法で合成される。これらのうち、温和な条件の重合が可能な溶液重合法が特に好ましく、具体的には、溶媒中、本発明の化合物と、構成単位Bを有する化合物または構成単位Cを有する化合物のうち少なくとも1種とを界面重縮合させればよい。The method for synthesizing polymer 1 of the present invention is not particularly limited, and it can be synthesized by polymerization methods known in the art, such as melt polymerization or solution polymerization using the corresponding dicarboxylic acid chloride. Of these, solution polymerization, which allows polymerization under mild conditions, is particularly preferred. Specifically, the compound of the present invention can be subjected to interfacial polycondensation in a solvent with at least one compound having structural unit B or a compound having structural unit C.

式(3)で表される構成単位Aを含まない重合体は、光反応が進行しないため、偏光紫外線照射または斜め入射紫外線照射、および加熱処理を行っても、該重合体からなる薄膜は優れた液晶配向性を示さない。
式(3)で表される構成単位Bおよび式(4)で表される構成単位Cを含まない重合体は、熱配向性が低いため、偏光紫外線照射または斜め入射紫外線照射、および加熱処理を行っても、該重合体からなる薄膜は優れた液晶配向性を示さない。
A polymer that does not contain the structural unit A represented by formula (3) does not undergo photoreaction, and therefore a thin film made of the polymer does not exhibit excellent liquid crystal alignment properties even when irradiated with polarized ultraviolet light or obliquely incident ultraviolet light and subjected to heat treatment.
A polymer that does not contain the structural unit B represented by formula (3) and the structural unit C represented by formula (4) has low thermal alignment properties, and therefore a thin film made of the polymer does not exhibit excellent liquid crystal alignment properties even when irradiated with polarized ultraviolet light or obliquely incident ultraviolet light and subjected to heat treatment.

また、本発明の別の態様は、式(5)で表される構成単位Dを有し、前記式(3)で表される構成単位Bまたは前記式(4)で表される構成単位Cのうち少なくとも1種を有する重合体(以下、「本発明の重合体2」という。)を挙げることができる。なかでも、本発明の重合体2は、式(5)で表される構成単位Dおよび式(3)で表される構成単位Bを有する重合体であることが好ましい。
(式(5)中、YおよびY10は、それぞれ独立に、単結合または-O-、-CO-、-NR14-からなる群の1種を表す。ここで、R14は水素原子または炭素数1~5のアルキル基からなる群の1種を表す。ArおよびArは、それぞれ独立に、置換基を有していてもよい炭素数5~7の芳香環を表し、該芳香環中の任意の炭素原子は窒素原子、酸素原子、硫黄原子に置換されてもよい。R15~R18は、それぞれ独立に、水素原子、ハロゲン原子、シアノ基、ニトロ基、炭素数1~5のアルキル基、炭素数1~5のアルコキシ基からなる群の1種を表す。Lは、単結合または-O-、-NR25-からなる群の1種を表す。ここで、R25は水素原子または炭素数1~5のアルキル基からなる群の1種を表す。d~fは、それぞれ独立に、0または1を表す。)
Another embodiment of the present invention is a polymer having a structural unit D represented by formula (5) and at least one of the structural unit B represented by formula (3) and the structural unit C represented by formula (4) (hereinafter referred to as "polymer 2 of the present invention"). In particular, polymer 2 of the present invention is preferably a polymer having a structural unit D represented by formula (5) and a structural unit B represented by formula (3).
(In formula (5), Y9 and Y10 each independently represent a single bond or a member selected from the group consisting of —O—, —CO—, and —NR14— . Here, R14 represents a hydrogen atom or an alkyl group having 1 to 5 carbon atoms. Ar3 and Ar4 each independently represent an aromatic ring having 5 to 7 carbon atoms which may have a substituent, and any carbon atom in the aromatic ring may be substituted with a nitrogen atom, an oxygen atom, or a sulfur atom. R15 to R18 each independently represent a member selected from the group consisting of a hydrogen atom, a halogen atom, a cyano group, a nitro group, an alkyl group having 1 to 5 carbon atoms, and an alkoxy group having 1 to 5 carbon atoms. L5 represents a single bond or a member selected from the group consisting of —O— and —NR25— . Here, R25 represents a hydrogen atom or an alkyl group having 1 to 5 carbon atoms. Each of d to f independently represents 0 or 1.)

式(5)中、YおよびY10は、それぞれ独立に、単結合または-O-、-CO-、-NR14-からなる群の1種を表す。ここで、R14は水素原子または炭素数1~5のアルキル基からなる群の1種を表す。YおよびY10は、好ましくは単結合または-CO-、-O-である。
ArおよびArは、それぞれ独立に、置換基を有していてもよい炭素数5~7の芳香環を表し、該芳香環中の任意の炭素原子は窒素原子、酸素原子、硫黄原子に置換されてもよい。ここでArおよびArにおける置換基として、ハロゲン原子、炭素数1~5のアルキル基、炭素数1~5のアルコキシ基を挙げることができ、ArおよびArが置換基を有さない場合、水素原子である。ArおよびArは、好ましくは置換基を有していてもよいベンゼン環であり、さらに好ましくはベンゼン環である。
15~R18は、それぞれ独立に、水素原子、ハロゲン原子、シアノ基、ニトロ基、炭素数1~5のアルキル基、炭素数1~5のアルコキシ基からなる群の1種を表す。R15~R18は、好ましくは水素原子である。
は、単結合または-O-、-NR25-からなる群の1種を表す。ここで、R25は水素原子または炭素数1~5のアルキル基からなる群の1種を表す。Lは、好ましくは単結合または-O-である。
d~fは、それぞれ独立に、0または1を表す。
In formula (5), Y9 and Y10 each independently represent a single bond or one of the group consisting of -O-, -CO-, and -NR14- , where R14 represents a hydrogen atom or one of the group consisting of an alkyl group having 1 to 5 carbon atoms. Y9 and Y10 are preferably a single bond, -CO-, or -O-.
Ar3 and Ar4 each independently represent an aromatic ring having 5 to 7 carbon atoms which may have a substituent, and any carbon atom in the aromatic ring may be substituted with a nitrogen atom, an oxygen atom, or a sulfur atom. Examples of the substituents in Ar3 and Ar4 include halogen atoms, alkyl groups having 1 to 5 carbon atoms, and alkoxy groups having 1 to 5 carbon atoms. When Ar3 and Ar4 do not have a substituent, they are hydrogen atoms. Ar3 and Ar4 are preferably benzene rings which may have a substituent, and more preferably benzene rings.
R 15 to R 18 each independently represent one of the group consisting of a hydrogen atom, a halogen atom, a cyano group, a nitro group, an alkyl group having 1 to 5 carbon atoms, and an alkoxy group having 1 to 5 carbon atoms. R 15 to R 18 are preferably a hydrogen atom.
L5 represents a single bond or one member of the group consisting of —O— and —NR 25 —, where R 25 represents a hydrogen atom or one member of the group consisting of an alkyl group having 1 to 5 carbon atoms. L5 is preferably a single bond or —O—.
d to f each independently represent 0 or 1.

本発明の重合体2は、式(5)で表される構成単位Dが、以下の式(6)~(10)で表される構成単位D-1~D-5のうちいずれかであることが好ましい。
In the polymer 2 of the present invention, the structural unit D represented by formula (5) is preferably any one of structural units D-1 to D-5 represented by the following formulas (6) to (10).

本発明の重合体2を合成する方法としては、特に限定されず、該分野で公知の重合法、例えば、溶融重合法または対応するジカルボン酸クロライドを用いる溶液重合法で合成される。これらのうち、温和な条件の重合が可能な溶液重合法が特に好ましく、具体的には、溶媒中、構成単位Dを有する化合物と、構成単位Bを有する化合物または構成単位Cを有する化合物のうち少なくとも1種とを界面重縮合させればよい。The method for synthesizing polymer 2 of the present invention is not particularly limited, and it can be synthesized by polymerization methods known in the art, such as melt polymerization or solution polymerization using the corresponding dicarboxylic acid chloride. Of these, solution polymerization, which allows polymerization under mild conditions, is particularly preferred. Specifically, it involves interfacial polycondensation of a compound having structural unit D with at least one of a compound having structural unit B or a compound having structural unit C in a solvent.

式(5)で表される構成単位Dを含まない重合体は、光反応が進行しないため、偏光紫外線照射または斜め入射紫外線照射、および加熱処理を行っても、該重合体からなる薄膜は優れた液晶配向性を示さない。
式(3)で表される構成単位Bおよび式(4)で表される構成単位Cを含まない重合体は、熱配向性が低いため、偏光紫外線照射または斜め入射紫外線照射、および加熱処理を行っても、該重合体からなる薄膜は優れた液晶配向性を示さない。
A polymer that does not contain the structural unit D represented by formula (5) does not undergo photoreaction, and therefore a thin film made of the polymer does not exhibit excellent liquid crystal alignment properties even when irradiated with polarized ultraviolet light or obliquely incident ultraviolet light and subjected to heat treatment.
A polymer that does not contain the structural unit B represented by formula (3) and the structural unit C represented by formula (4) has low thermal alignment properties, and therefore a thin film made of the polymer does not exhibit excellent liquid crystal alignment properties even when irradiated with polarized ultraviolet light or obliquely incident ultraviolet light and subjected to heat treatment.

本発明の重合体1および2は、発明の主旨を越えない範囲で、その他高分子、結晶核剤、界面活性剤、高分子電解質、導電性錯体、無機フィラ-、顔料、帯電防止剤、アンチブロッキング剤、滑剤等を配合してもよい。 Polymers 1 and 2 of the present invention may be blended with other polymers, crystal nucleating agents, surfactants, polymer electrolytes, conductive complexes, inorganic fillers, pigments, antistatic agents, antiblocking agents, lubricants, etc., within the scope of the invention.

本発明の重合体1および2は薄膜の形状にして使用することができる。これにより光学特性を発現し、光学薄膜(以下、「本発明の薄膜」という。)として使用することができる。薄膜を製造する方法については特に制限はなく、例えば、溶融製膜法、溶液キャスト法等の方法が挙げられる。 Polymers 1 and 2 of the present invention can be used in the form of a thin film. This allows them to exhibit optical properties and be used as an optical thin film (hereinafter referred to as "thin film of the present invention"). There are no particular restrictions on the method for producing the thin film, and examples include melt casting and solution casting.

(溶融製膜法)
溶融製膜する方法は、具体的にはTダイを用いた溶融押出法、カレンダ-成形法、熱プレス法、共押出法、共溶融法、多層押出、インフレ-ション成形法等があり、特に限定されない。
(Melt film forming method)
Specific examples of the melt film-forming method include melt extrusion using a T-die, calendar molding, heat pressing, co-extrusion, co-melting, multi-layer extrusion, and inflation molding, and are not particularly limited.

(溶液キャスト法)
溶液キャスト法は、重合体を溶媒に溶解した溶液(以下、「キャスト用ド-プ」という。)を支持基板上に流延した後、加熱等により溶媒を除去して薄膜を得る方法である。その際、キャスト用ド-プを支持基板上に流延する方法としては、スピンコート法、Tダイ法、ドクタ-ブレ-ド法、バ-コ-タ-法、ロ-ルコ-タ-法、リップコ-タ-法等が用いられる。特に工業的にはダイからキャスト用ド-プをベルト状またはドラム状の支持基板に連続的に押し出す方法が最も一般的である。用いられる支持基板としては、例えば、ガラス基板、ステンレスやフェロタイプ等の金属基板、ポリエチレンテレフタレ-ト、ポリエチレンナフタレート、シクロオレフィンポリマー、ポリイミド等のフィルム等がある。
(Solution casting method)
The solution casting method is a method in which a solution in which a polymer is dissolved in a solvent (hereinafter referred to as "casting dope") is cast onto a support substrate, and the solvent is then removed by heating or the like to obtain a thin film. Methods for casting the casting dope onto the support substrate include spin coating, T-die coating, doctor blade coating, bar coater coating, roll coater coating, and lip coater coating. In particular, the most common industrial method is to continuously extrude the casting dope from a die onto a belt-shaped or drum-shaped support substrate. Examples of support substrates that can be used include glass substrates, metal substrates such as stainless steel and ferrotype substrates, and films such as polyethylene terephthalate, polyethylene naphthalate, cycloolefin polymer, and polyimide.

(界面活性剤)
本発明の薄膜は、膜厚むらを低減させるために界面活性剤を少なくとも1種類以上含有してもよい。含有することができる界面活性剤としては、アルキルカルボン酸塩、アルキルリン酸塩、アルキルスルホン酸塩、フルオロアルキルカルボン酸塩、フルオロアルキルリン酸塩、フルオロアルキルスルホン酸塩、ポリオキシエチレン誘導体、フルオロアルキルエチレンオキシド誘導体、ポリエチレングリコール誘導体、アルキルアンモニウム塩、フルオロアルキルアンモニウム塩類等をあげることができ、特に含フッ素界面活性剤が好ましい。
(Surfactant)
The thin film of the present invention may contain at least one surfactant to reduce thickness unevenness. Examples of surfactants that can be contained include alkyl carboxylates, alkyl phosphates, alkyl sulfonates, fluoroalkyl carboxylates, fluoroalkyl phosphates, fluoroalkyl sulfonates, polyoxyethylene derivatives, fluoroalkylethylene oxide derivatives, polyethylene glycol derivatives, alkyl ammonium salts, and fluoroalkyl ammonium salts, with fluorine-containing surfactants being particularly preferred.

前記したように、本発明の薄膜は光学薄膜として好適に使用することができ、特に位相差を発現することから、位相差膜として好適に使用することができる。
本発明の薄膜は、紫外線を照射することで位相差を発現する。紫外線は、偏光紫外線または斜め入射紫外線であってもよい。この際、紫外線の波長は200nm以上400nm以下であることが好ましい。照射エネルギー量としては10mJ/cm以上10000mJ/cm以下であることが好ましい。
本発明の薄膜における重合体1および2は、光学特性を発現するために、その光反応性基の光反応率は50%以下であることが好ましい。光反応率は、例えば、参考文献 Macromolecules 30, 903, 1997.に記載の方法で測定することができる。より詳細には、一般的な分光光度計を用いて、紫外光照射前後の透過スペクトルを測定し、スペクトル変化より算出することができる。
本発明の薄膜は、前記紫外線照射を行った後で、さらに熱処理を行う。これにより位相差を発現する。熱処理温度は、重合体1および2が液晶性を発現する範囲内の温度が好ましく、50℃以上400℃以下を例示することができる。
本発明の薄膜は、偏光紫外線照射または斜め入射紫外線照射を行い、さらに加熱処理を行うことで、三次元屈折率異方性を発現させ、位相差膜として用いることができる。
As described above, the thin film of the present invention can be suitably used as an optical thin film, and in particular, since it exhibits retardation, it can be suitably used as a retardation film.
The thin film of the present invention exhibits retardation when irradiated with ultraviolet light. The ultraviolet light may be polarized ultraviolet light or obliquely incident ultraviolet light. In this case, the wavelength of the ultraviolet light is preferably 200 nm or more and 400 nm or less. The irradiation energy amount is preferably 10 mJ/ cm2 or more and 10,000 mJ/ cm2 or less.
In order to exhibit optical properties, the photoreaction rate of the photoreactive groups of polymers 1 and 2 in the thin film of the present invention is preferably 50% or less. The photoreaction rate can be measured, for example, by the method described in the reference Macromolecules 30, 903, 1997. More specifically, the photoreaction rate can be calculated from the change in the spectrum by measuring the transmission spectrum before and after irradiation with ultraviolet light using a general spectrophotometer.
The thin film of the present invention is further subjected to heat treatment after the ultraviolet irradiation, thereby exhibiting retardation. The heat treatment temperature is preferably within a range in which polymers 1 and 2 exhibit liquid crystallinity, and can be, for example, 50°C or higher and 400°C or lower.
The thin film of the present invention can be used as a retardation film by being irradiated with polarized ultraviolet light or obliquely incident ultraviolet light and then subjected to a heat treatment to develop three-dimensional refractive index anisotropy.

本発明の薄膜は位相差を発現することから、位相差膜として使用することができる。位相差膜として使用する場合は、単膜で用いてもよく、他の膜を積層させた複層膜として使用してもよい。本発明の薄膜に積層される膜としては、本発明の薄膜でもよいし、重合性液晶膜、フィルム、延伸フィルム、スパッタ膜でもよい。 The thin film of the present invention exhibits phase difference and can therefore be used as a retardation film. When used as a retardation film, it may be used as a single film or as a multi-layer film laminated with other films. The film laminated on the thin film of the present invention may be the thin film of the present invention, or may be a polymerizable liquid crystal film, a film, a stretched film, or a sputtered film.

本発明の薄膜は膜上の液晶化合物を配向させることから、液晶配向膜として用いることができる。 The thin film of the present invention aligns liquid crystal compounds on the film, and can therefore be used as a liquid crystal alignment film.

以下、実施例により本発明をさらに詳細に説明するが、本発明はこれらに限定して解釈されるものではない。
<核磁気共鳴スペクトルの測定>
核磁気共鳴装置(日本電子製、商品名:ECZ 400S)を用いて、H-NMRスペクトルを測定した。
<偏光紫外線照射>
バンドパスフィルター(248nm)を組み込んだ水銀光源(朝日分光製、商品名:REX-250)を用いて紫外線を照射した。偏光紫外線を照射する場合は、対応する波長の偏光ビームスプリッターにてP偏光のみを照射した。
<加熱処理>
安全扉付恒温器セーフティーオーブン(ESPEC製、商品名:SPH-202またはSPH-102)、ホットプレート(アズワン製、商品名:DSHP-1L)、無酸化雰囲気恒温器イナートオーブン(ESPEC製、商品名:IPHH-202)のいずれかを用いて、加熱処理を行った。
The present invention will be described in more detail below with reference to examples, but the present invention should not be construed as being limited to these examples.
<Measurement of Nuclear Magnetic Resonance Spectrum>
1 H-NMR spectra were measured using a nuclear magnetic resonance spectrometer (manufactured by JEOL Ltd., trade name: ECZ 400S).
<Polarized UV irradiation>
Ultraviolet light was irradiated using a mercury light source (manufactured by Asahi Spectroscopy, product name: REX-250) equipped with a bandpass filter (248 nm). When irradiating polarized ultraviolet light, only P-polarized light was irradiated using a polarizing beam splitter of the corresponding wavelength.
<Heat treatment>
The heat treatment was carried out using either a safety oven with a safety door (manufactured by ESPEC, product name: SPH-202 or SPH-102), a hot plate (manufactured by AS ONE, product name: DSHP-1L), or an inert oven with a non-oxidizing atmosphere (manufactured by ESPEC, product name: IPHH-202).

<位相差特性の測定>
試料傾斜型自動複屈折計(AXOMETRICS社製、商品名:AxoScan)を用いて、波長589nmの光を用いて位相差膜の位相差特性を測定した。
<薄膜の膜厚測定>
分光エリプソメーター(J.A. Woollam社製、商品名:RC2-U)を用いて、薄膜の膜厚を測定した。
<光反応率の算出>
分光光度計(HITACHI製、商品名:U-4100)を用いて、偏光紫外光照射前後の透過スペクトルを測定し、スペクトル変化より光反応率を算出した。
<偏光顕微鏡観察>
顕微鏡(オリンパス製、商品名:BX53)、偏光用コンデンサ(オリンパス製、商品名:U-POC-2)、アナライザ(オリンパス製、商品名:U-AN360P-2)を用いて、薄膜上の低分子液晶を観察し、液晶配向性を観察した。
<Measurement of phase difference characteristics>
The retardation characteristics of the retardation film were measured using a sample tilting automatic birefringence meter (manufactured by AXOMETRICS, trade name: AxoScan) with light having a wavelength of 589 nm.
<Thin film thickness measurement>
The thickness of the thin film was measured using a spectroscopic ellipsometer (manufactured by J.A. Woollam, trade name: RC2-U).
<Calculation of photoreaction rate>
The transmission spectrum was measured before and after irradiation with polarized ultraviolet light using a spectrophotometer (manufactured by HITACHI, trade name: U-4100), and the photoreaction rate was calculated from the change in the spectrum.
<Polarizing microscope observation>
The low molecular weight liquid crystal on the thin film was observed using a microscope (Olympus, product name: BX53), a polarizing condenser (Olympus, product name: U-POC-2), and an analyzer (Olympus, product name: U-AN360P-2), and the liquid crystal orientation was observed.

[合成例1]
Angew. Chem. Int. Ed. 56(35), 10573, 2017. に記載の方法で、フェノール部位を保護した4-t-ブチルジメチルシリル-クマル酸(5g)とヒドロキノン(0.97g)、塩基触媒として4-ジメチルアミノピリジン(0.22g)を脱水ジクロロメタン(100ml)に窒素気流下0℃にて溶解させた。これにジシクロヘキサンカルボジイミド(4.1g)を加え、室温へ戻して一晩反応させた。シュウ酸メタノール溶液を加えて反応を停止させ、溶媒を減圧留去した。
残滓を酢酸エチルに再溶解し、溶解しない副生成物である尿素誘導体をろ別した。ろ液を重曹水で洗浄し、硫酸ナトリウムにて乾燥して減圧濃縮した。酢酸エチルに溶解させ、少量のシリカゲルカラムを通して残存する尿素誘導体を除去し、再度減圧濃縮してエステル体粗精製物を得た。このエステル体粗精製物を窒素気流下室温でTHF(100ml)に溶解させ、脱保護剤であるフッ化テトラブチルアンモニウム(20ml)を加えた。一時間撹拌し、反応液を減圧濃縮した。残滓をテトラヒドロフラン(THF)に再溶解させ、THF/ヘキサンで再結晶して化合物1 4.16gを得た。H-NMRスペクトルの結果を以下に示す。
H-NMR(400MHz,CDOD):δ7.79-7.75(m,2H),7.46-7.42(m,4H),7.19(s,4H),6.73-6.68(m,4H),6.43-6.35(m,2H).
(化合物1)
[Synthesis Example 1]
Angew. Chem. Int. Ed. 56(35), 10573, 2017. 4-t-butyldimethylsilyl-coumaric acid (5 g) with a protected phenol moiety, hydroquinone (0.97 g), and 4-dimethylaminopyridine (0.22 g) as a base catalyst were dissolved in dehydrated dichloromethane (100 ml) at 0°C under a nitrogen stream. Dicyclohexanecarbodiimide (4.1 g) was added to the solution, which was then returned to room temperature and allowed to react overnight. The reaction was terminated by adding a methanol solution of oxalic acid, and the solvent was distilled off under reduced pressure.
The residue was redissolved in ethyl acetate, and the insoluble by-product urea derivative was filtered off. The filtrate was washed with aqueous sodium bicarbonate, dried over sodium sulfate, and concentrated under reduced pressure. The filtrate was dissolved in ethyl acetate, passed through a small amount of silica gel column to remove the remaining urea derivative, and again concentrated under reduced pressure to obtain a crude ester. This crude ester was dissolved in THF (100 ml) at room temperature under a nitrogen stream, and tetrabutylammonium fluoride (20 ml) as a deprotecting agent was added. After stirring for one hour, the reaction solution was concentrated under reduced pressure. The residue was redissolved in tetrahydrofuran (THF) and recrystallized from THF/hexane to obtain 4.16 g of Compound 1. The results of the 1 H-NMR spectrum are shown below.
1 H-NMR (400 MHz, CD 3 OD): δ7.79-7.75 (m, 2H), 7.46-7.42 (m, 4H), 7.19 (s, 4H), 6.73-6.68 (m, 4H), 6.43-6.35 (m, 2H).
(Compound 1)

[合成例2]
Chinese Journal of chemistry, 23, 1523, 2005. に記載の方法で、フェノール部位を保護したテトラヒドロピラニル-クマル酸(10g)と2―メチルヒドロキノン(2.45g)、塩基触媒として4-ジメチルアミノピリジン(0.49g)を脱水ジクロロメタン(150ml)に窒素気流下0℃にて溶解させた。これにジシクロヘキサンカルボジイミド(9.1g)を加え、室温へ戻して一晩反応させた。シュウ酸メタノール溶液を加えて反応を停止させ、溶媒を減圧留去した。
残滓をTHF(100ml)に再溶解し、2M HCl(30ml)を加え、室温にて四時間撹拌した。反応液を酢酸エチル/重曹水で分液し、硫酸ナトリウムにて乾燥して減圧濃縮した。残滓をエタノール/水で再結晶して化合物2 3.82gを得た。H-NMRスペクトルの結果を以下に示す。
H-NMR(400MHz,(CDCO):δ7.81(d,J=16.0Hz,1H),7.77(d,J=16.0Hz,1H),7.65-7.62(m,4H),7.14-7.10(m,2H),7.06-7.03(m,1H)6.92-6.90(m,4H),6.59(d,J=16.0Hz,1H),6.54(d,J=16.0,1H),2.18(s,3H).
(化合物2)
[Synthesis Example 2]
According to the method described in Chinese Journal of Chemistry, 23, 1523, 2005, tetrahydropyranyl-coumaric acid (10 g) with a protected phenol moiety, 2-methylhydroquinone (2.45 g), and 4-dimethylaminopyridine (0.49 g) as a base catalyst were dissolved in dehydrated dichloromethane (150 ml) at 0°C under a nitrogen stream. Dicyclohexanecarbodiimide (9.1 g) was added to the solution, which was then allowed to react overnight after being returned to room temperature. The reaction was terminated by adding a methanol solution of oxalic acid, and the solvent was distilled off under reduced pressure.
The residue was redissolved in THF (100 ml), 2M HCl (30 ml) was added, and the mixture was stirred at room temperature for 4 hours. The reaction mixture was separated into ethyl acetate and aqueous sodium bicarbonate, dried over sodium sulfate, and concentrated under reduced pressure. The residue was recrystallized from ethanol and water to obtain 3.82 g of compound 2. The results of the 1 H-NMR spectrum are shown below.
1 H-NMR (400 MHz, (CD 3 ) 2 CO): δ7.81 (d, J = 16.0Hz, 1H), 7.77 (d, J = 16.0Hz, 1H), 7.65-7.62 (m, 4H), 7.14-7.10 (m, 2H), 7 06-7.03 (m, 1H) 6.92-6.90 (m, 4H), 6.59 (d, J = 16.0Hz, 1H), 6.54 (d, J = 16.0, 1H), 2.18 (s, 3H).
(Compound 2)

[合成例3]
Chinese Journal of chemistry, 23, 1523, 2005. に記載の方法で、フェノール部位を保護したテトラヒドロピラニル-クマル酸(10g)と2―t―ブチルヒドロキノン(3.28g)、塩基触媒として4-ジメチルアミノピリジン(0.98g)を脱水ジクロロメタン(150ml)に窒素気流下0℃にて溶解させた。これに1-(3-ジメチルアミノプロピル)-3-エチルカルボジイミド(6.88g)を加え、室温へ戻して一晩反応させた。シュウ酸メタノール溶液を加えて反応を停止させ、溶媒を減圧留去した。
残滓をTHF(100ml)に再溶解し、2M HCl(30ml)を加え、室温にて四時間撹拌した。反応液を酢酸エチル/重曹水で分液し、硫酸ナトリウムにて乾燥して減圧濃縮した。残滓をエタノールに再溶解させ、エタノール/水で再結晶して化合物3 5.81gを得た。H-NMRスペクトルの結果を以下に示す。
H-NMR(400MHz,(CDCO):δ7.84-7.71(m,2H),7.67-7.59(m,4H),6.96-6.95(m,1H),6.93-6.88(m,4H),6.82-6.81(m,2H),6.68-6.49(m,2H),1.37(s,9H).
(化合物3)
[Synthesis Example 3]
According to the method described in Chinese Journal of Chemistry, 23, 1523, 2005, tetrahydropyranyl-coumaric acid (10 g) with a protected phenol moiety, 2-t-butylhydroquinone (3.28 g), and 4-dimethylaminopyridine (0.98 g) as a base catalyst were dissolved in dehydrated dichloromethane (150 ml) at 0°C under a nitrogen stream. 1-(3-dimethylaminopropyl)-3-ethylcarbodiimide (6.88 g) was added to the solution, which was then allowed to react overnight after being returned to room temperature. The reaction was quenched by adding a methanol solution of oxalic acid, and the solvent was distilled off under reduced pressure.
The residue was redissolved in THF (100 ml), 2M HCl (30 ml) was added, and the mixture was stirred at room temperature for 4 hours. The reaction mixture was separated into ethyl acetate and aqueous sodium bicarbonate, dried over sodium sulfate, and concentrated under reduced pressure. The residue was redissolved in ethanol and recrystallized from ethanol/water to obtain 5.81 g of compound 3. The results of the 1 H-NMR spectrum are shown below.
1 H-NMR (400 MHz, (CD 3 ) 2 CO): δ7.84-7.71 (m, 2H), 7.67-7.59 (m, 4H), 6.96-6.95 (m, 1H), 6.93-6.88 (m, 4H), 6.82-6.81 (m, 2H), 6.68-6.49 (m, 2H), 1.37 (s, 9H).
(Compound 3)

[合成例4]
Angew. Chem. Int. Ed. 56(35), 10573, 2017. に記載の方法で、フェノール部位を保護した4-t-ブチルジメチルシリル-クマル酸(5g)とテトラメチルビフェノール(2.13g)、塩基触媒として4-ジメチルアミノピリジン(0.22g)を脱水ジクロロメタン(100ml)に窒素気流下0℃にて溶解させた。これにジシクロヘキサンカルボジイミド(4.1g)を加え、室温へ戻して一晩反応させた。シュウ酸メタノール溶液を加えて反応を停止させ、溶媒を減圧留去した。
残滓を酢酸エチルに再溶解し、溶解しない副生成物である尿素誘導体をろ別した。ろ液を重曹水で洗浄し、硫酸ナトリウムにて乾燥して減圧濃縮した。酢酸エチルに溶解させ、少量のシリカゲルカラムを通して残存する尿素誘導体を除去し、再度減圧濃縮してエステル体粗精製物を得た。このエステル体粗精製物を窒素気流下室温でTHF(100ml)に溶解させ、脱保護剤であるフッ化テトラブチルアンモニウム(20ml)を加えた。一時間撹拌し、反応液を減圧濃縮した。残滓をTHFに再溶解させ、THF/ヘキサンで再結晶して化合物4 2.13gを得た。H-NMRスペクトルの結果を以下に示す。
H-NMR(400MHz,CDOD):δ7.84-7.74(m,2H),7.59-7.44(m,4H),7.39-7.12(m,4H),6.73-6.68(m,4H),6.49-6.39(m,2H),2.24-2.17(m,12H).
(化合物4)
[Synthesis Example 4]
Angew. Chem. Int. Ed. 56(35), 10573, 2017. Using the method described in [translate], phenol-protected 4-t-butyldimethylsilyl-coumaric acid (5 g), tetramethylbiphenol (2.13 g), and 4-dimethylaminopyridine (0.22 g) as a base catalyst were dissolved in dehydrated dichloromethane (100 ml) at 0°C under a nitrogen stream. Dicyclohexanecarbodiimide (4.1 g) was added to the solution, which was then returned to room temperature and allowed to react overnight. The reaction was terminated by adding a methanol solution of oxalic acid, and the solvent was removed under reduced pressure.
The residue was redissolved in ethyl acetate, and the insoluble by-product urea derivative was filtered off. The filtrate was washed with aqueous sodium bicarbonate, dried over sodium sulfate, and concentrated under reduced pressure. The filtrate was dissolved in ethyl acetate, passed through a small amount of silica gel column to remove the remaining urea derivative, and concentrated under reduced pressure again to obtain a crude ester. This crude ester was dissolved in THF (100 ml) at room temperature under a nitrogen stream, and tetrabutylammonium fluoride (20 ml) as a deprotecting agent was added. After stirring for one hour, the reaction solution was concentrated under reduced pressure. The residue was redissolved in THF and recrystallized from THF/hexane to obtain 2.13 g of Compound 4. The results of the 1 H-NMR spectrum are shown below.
1H -NMR (400MHz, CD3 OD): δ7.84-7.74 (m, 2H), 7.59-7.44 (m, 4H), 7.39-7.12 (m, 4H), 6.73-6.68 (m, 4H), 6.49-6.39 (m, 2H), 2.24-2.17 (m, 12H).
(Compound 4)

[合成例5]
Chinese Journal of chemistry, 23, 1523, 2005. に記載の方法で、フェノール部位を保護したテトラヒドロピラニル-クマル酸(8.79g)とシクロヘキサンジオール(cis/trans=15/85)(2.01g)、塩基触媒として4-ジメチルアミノピリジン(0.87g)を脱水ジクロロメタン(150ml)に窒素気流下0℃にて溶解させた。これに1-(3-ジメチルアミノプロピル)-3-エチルカルボジイミド(6.88g)を加え、室温へ戻して一晩反応させた。シュウ酸メタノール溶液を加えて反応を停止させ、溶媒を減圧留去した。
残滓をTHF(100ml)に再溶解し、2M HCl(20ml)を加え、室温にて四時間撹拌した。反応液を酢酸エチル/重曹水で分液し、硫酸ナトリウムにて乾燥して減圧濃縮した。残滓をエタノールに再溶解させ、エタノール/水で再結晶して化合物5 0.7gを得た。
(化合物5)
[Synthesis Example 5]
According to the method described in Chinese Journal of Chemistry, 23, 1523, 2005, tetrahydropyranyl-coumaric acid (8.79 g) with the phenolic moiety protected, cyclohexanediol (cis/trans = 15/85) (2.01 g), and 4-dimethylaminopyridine (0.87 g) as a base catalyst were dissolved in dehydrated dichloromethane (150 ml) at 0°C under a nitrogen stream. 1-(3-dimethylaminopropyl)-3-ethylcarbodiimide (6.88 g) was added to the solution, which was then allowed to react overnight after being returned to room temperature. The reaction was quenched by adding a methanol solution of oxalic acid, and the solvent was distilled off under reduced pressure.
The residue was redissolved in THF (100 ml), 2M HCl (20 ml) was added, and the mixture was stirred at room temperature for 4 hours. The reaction mixture was partitioned between ethyl acetate and aqueous sodium bicarbonate, dried over sodium sulfate, and concentrated under reduced pressure. The residue was redissolved in ethanol and recrystallized from ethanol/water to obtain 0.7 g of compound 5.
(Compound 5)

[合成例6]
Chinese Journal of chemistry, 23, 1523, 2005. に記載の方法で、フェノール部位を保護したテトラヒドロピラニル-クマル酸(10g)とtrans-シクロヘキサンジオール(2.29g)、塩基触媒として4-ジメチルアミノピリジン(2.5g)を脱水ジクロロメタン(100ml)に窒素気流下0℃にて溶解させた。これに1-(3-ジメチルアミノプロピル)-3-エチルカルボジイミド(8.49g)を加え、室温へ戻して一晩反応させた。水を加えて反応を停止させ、溶媒を減圧留去した。
残滓をテトラヒドロフラン(200ml)に再溶解し、2N 塩化水素(40ml)を加え、室温にて二時間撹拌した。沈殿物をろ過して化合物6 6.74gを得た。H-NMRスペクトルの結果を以下に示す。
H-NMR(400MHz,(CDSO):δ7.53-7.49(m,6H),6.76-6.73(m,4H),6.38-6.31(m,2H),4.79(brs,2H),1.94(brs,4H),1.54(brs,4H).
(化合物6)
[Synthesis Example 6]
According to the method described in Chinese Journal of Chemistry, 23, 1523, 2005, tetrahydropyranyl-coumaric acid (10 g) with a protected phenol moiety, trans-cyclohexanediol (2.29 g), and 4-dimethylaminopyridine (2.5 g) as a base catalyst were dissolved in dehydrated dichloromethane (100 ml) at 0°C under a nitrogen stream. 1-(3-dimethylaminopropyl)-3-ethylcarbodiimide (8.49 g) was added to the solution, which was then allowed to react overnight after being returned to room temperature. Water was added to quench the reaction, and the solvent was removed under reduced pressure.
The residue was redissolved in tetrahydrofuran (200 ml), 2N hydrogen chloride (40 ml) was added, and the mixture was stirred at room temperature for two hours. The precipitate was filtered to obtain 6.74 g of compound 6. The results of the 1 H-NMR spectrum are shown below.
1 H-NMR (400 MHz, (CD 3 ) 2 SO): δ7.53-7.49 (m, 6H), 6.76-6.73 (m, 4H), 6.38-6.31 (m, 2H), 4.79 (brs, 2H), 1.94 (brs, 4H), 1.54 (brs, 4H).
(Compound 6)

[合成例7]
Chinese Journal of chemistry, 23, 1523, 2005. に記載の方法で、フェノール部位を保護したテトラヒドロピラニル-フェルラ酸(6.82g)と2―メチルヒドロキノン(1.52g)、塩基触媒として4-ジメチルアミノピリジン(0.60g)を脱水ジクロロメタン(100ml)に窒素気流下0℃にて溶解させた。これに1-(3-ジメチルアミノプロピル)-3-エチルカルボジイミド(4.18g)を加え、室温へ戻して一晩反応させた。水を加えて反応を停止させ、溶媒を減圧留去した。
残滓をクロロホルム/メタノール(3/1)混合溶媒(130ml)に再溶解し、p―トルエンスルホン酸(0.12g)を加え、室温にて四時間撹拌した。反応液をクロロホルム/重曹水で分液し、硫酸ナトリウムにて乾燥して減圧濃縮した。残滓をエタノールに再溶解させ、エタノール/水で再結晶して化合物7 0.22gを得た。H-NMRスペクトルの結果を以下に示す。
H-NMR(400MHz,CDCl):δ7.88-7.79(m,4H),7.20-7.10(m,4H),6.95-6.93(m,2H)6.65-6.49(m,3H),3.94-3.87(m,6H),2.25-2.23(m,3H).
(化合物7)
[Synthesis Example 7]
According to the method described in Chinese Journal of Chemistry, 23, 1523, 2005, tetrahydropyranyl-ferulic acid (6.82 g) with a protected phenol moiety, 2-methylhydroquinone (1.52 g), and 4-dimethylaminopyridine (0.60 g) as a base catalyst were dissolved in dehydrated dichloromethane (100 ml) at 0°C under a nitrogen stream. 1-(3-dimethylaminopropyl)-3-ethylcarbodiimide (4.18 g) was added to the solution, which was then allowed to react overnight after being returned to room temperature. Water was added to quench the reaction, and the solvent was removed under reduced pressure.
The residue was redissolved in a chloroform/methanol (3/1) mixed solvent (130 ml), p-toluenesulfonic acid (0.12 g) was added, and the mixture was stirred at room temperature for four hours. The reaction solution was separated into chloroform/aqueous sodium bicarbonate, dried over sodium sulfate, and concentrated under reduced pressure. The residue was redissolved in ethanol and recrystallized from ethanol/water to obtain 0.22 g of compound 7. The results of the 1 H-NMR spectrum are shown below.
1 H-NMR (400 MHz, CDCl 3 ): δ7.88-7.79 (m, 4H), 7.20-7.10 (m, 4H), 6.95-6.93 (m, 2H) 6.65-6.49 (m, 3H), 3.94-3.87 (m, 6H), 2.25-2.23 (m, 3H).
(Compound 7)

[合成例8]
特許第4320089号に記載の方法と同一の方法で、化合物8を5.12g得た。H-NMRスペクトルの結果を以下に示す。
H-NMR(400MHz,(CDSO):δ9.97-9.22(br,7.03(d,J=8.7Hz,2H),6.86(d,J=8.7Hz,2H),6.58(d,J=8.7Hz,2H),6.50(d,J=8.7 Hz,2H),3.20(s,3H).
(化合物8)
[Synthesis Example 8]
5.12 g of Compound 8 was obtained by the same method as that described in Japanese Patent No. 4320089. The results of the 1 H-NMR spectrum are shown below.
1 H-NMR (400 MHz, (CD 3 ) 2 SO): δ9.97-9.22 (br, 7.03 (d, J = 8.7 Hz, 2H), 6.86 (d, J = 8.7 Hz, 2H), 6.58 (d, J = 8.7 Hz, 2H), 6.50 (d, J = 8.7 Hz, 2H), 3.20 (s, 3H).
(Compound 8)

[合成例9]
Chinese Journal of chemistry, 23, 1523, 2005. に記載の方法で、フェノール部位を保護したテトラヒドロピラニル-クマル酸(10g)と化合物8(4.8g)、塩基触媒として4-ジメチルアミノピリジン(0.5g)を脱水ジクロロメタン(100ml)に窒素気流下0℃にて溶解させた。これに1-(3-ジメチルアミノプロピル)-3-エチルカルボジイミド(8.49g)を加え、室温へ戻して一晩反応させた。水を加えて反応を停止させ、溶媒を減圧留去した。シリカゲルクロマトグラフィー(クロロホルム/メタノール)で精製して固体を得た。
得られた固体をテトラヒドロフラン(100ml)に再溶解し、2N 塩化水素(40ml)を加え、室温にて八時間撹拌した。沈殿物をろ過して化合物9 12.6gを得た。H-NMRスペクトルの結果を以下に示す。
H-NMR(400MHz,(CDSO):δ7.70(d,J=16.0Hz,2H),7.59(d,J=8.8Hz,4H),7.40-7.15(m,4H),7.10-7.03(m,4H),6.78(d,J=8.0Hz,4H),6.54(d,J=16.0Hz,2H),3.36-3.34(m,3H).
(化合物9)
[Synthesis Example 9]
According to the method described in Chinese Journal of Chemistry, 23, 1523, 2005, tetrahydropyranyl-coumaric acid (10 g) with a protected phenol moiety, compound 8 (4.8 g), and 4-dimethylaminopyridine (0.5 g) as a base catalyst were dissolved in dehydrated dichloromethane (100 ml) at 0°C under a nitrogen stream. 1-(3-dimethylaminopropyl)-3-ethylcarbodiimide (8.49 g) was added to the solution, and the mixture was allowed to warm to room temperature and react overnight. Water was added to quench the reaction, and the solvent was distilled off under reduced pressure. The resulting solid was purified by silica gel chromatography (chloroform/methanol).
The resulting solid was redissolved in tetrahydrofuran (100 ml), and 2N hydrogen chloride (40 ml) was added, followed by stirring at room temperature for 8 hours. The precipitate was filtered to obtain 12.6 g of Compound 9. The results of the 1 H-NMR spectrum are shown below.
1 H-NMR (400 MHz, (CD 3 ) 2 SO): δ7.70 (d, J=16.0Hz, 2H), 7.59 (d, J=8.8Hz, 4H), 7.40-7.15 (m, 4H), 7.10- 7.03 (m, 4H), 6.78 (d, J=8.0Hz, 4H), 6.54 (d, J=16.0Hz, 2H), 3.36-3.34 (m, 3H).
(Compound 9)

[合成例10]
Chinese Journal of chemistry, 23, 1523, 2005. に記載の方法で、フェノール部位を保護したテトラヒドロピラニル-クマル酸(20g)と4-N-メチルアミノフェノール硫酸塩(6.80g)、塩基触媒として4-ジメチルアミノピリジン(1.0g)を脱水ジクロロメタン(100ml)に窒素気流下0℃にて溶解させた。これに1-(3-ジメチルアミノプロピル)-3-エチルカルボジイミド(17.0g)を加え、室温へ戻して一晩反応させた。シュウ酸メタノール溶液を加えて反応を停止させ、溶媒を減圧留去した。反応液を重曹水で洗浄し、硫酸ナトリウムで乾燥した後、溶媒を留去した。残滓をシリカゲルクロマトグラフィー(クロロホルム/メタノール)で精製した粉体を得た。
得られた粉体をテトラヒドロフラン(50ml)に再溶解し、2N 塩化水素(20ml)を加え、室温にて一晩撹拌した。反応液を濾過して化合物10 15.0gを得た。H-NMRスペクトルの結果を以下に示す。
H-NMR(400MHz,(CDSO):δ7.77-7.74(m,1H),7.66-7.58(m,3H),7.42-7.34(m,3H),7.26-7.20(m,3H),6.81-6.77(m,3H),6.70-6.68(m,2H),6.63-6.56(m,1H),3.26(s,3H).
(化合物10)
[Synthesis Example 10]
According to the method described in Chinese Journal of Chemistry, 23, 1523, 2005, tetrahydropyranyl-coumaric acid (20 g) with a protected phenol moiety, 4-N-methylaminophenol sulfate (6.80 g), and 4-dimethylaminopyridine (1.0 g) as a base catalyst were dissolved in dehydrated dichloromethane (100 ml) at 0°C under a nitrogen stream. 1-(3-dimethylaminopropyl)-3-ethylcarbodiimide (17.0 g) was added to the solution, which was then returned to room temperature and allowed to react overnight. The reaction was terminated by adding a methanol solution of oxalic acid, and the solvent was distilled off under reduced pressure. The reaction solution was washed with aqueous sodium bicarbonate and dried over sodium sulfate, after which the solvent was distilled off. The residue was purified by silica gel chromatography (chloroform/methanol) to obtain a powder.
The obtained powder was redissolved in tetrahydrofuran (50 ml), 2N hydrogen chloride (20 ml) was added, and the mixture was stirred at room temperature overnight. The reaction solution was filtered to obtain 15.0 g of compound 10. The results of 1 H-NMR spectrum are shown below.
1 H-NMR (400 MHz, (CD 3 ) 2 SO): δ7.77-7.74 (m, 1H), 7.66-7.58 (m, 3H), 7.42-7.34 (m, 3H), 7.26-7.20 (m , 3H), 6.81-6.77 (m, 3H), 6.70-6.68 (m, 2H), 6.63-6.56 (m, 1H), 3.26 (s, 3H).
(Compound 10)

[合成例11]
Chinese Journal of chemistry, 23, 1523, 2005. に記載の方法で、フェノール部位を保護したテトラヒドロピラニル-クマル酸(10g)とテトラフルオロヒドロキノン(3.59g)、塩基触媒として4-ジメチルアミノピリジン(0.5g)を脱水ジクロロメタン(100ml)に窒素気流下0℃にて溶解させた。これに1-(3-ジメチルアミノプロピル)-3-エチルカルボジイミド(8.49g)を加え、室温へ戻して一晩反応させた。水を加えて反応を停止させ、溶媒を減圧留去した。シリカゲルクロマトグラフィー(クロロホルム)で精製し固体を得た。
得られた固体をテトラヒドロフラン(100ml)に再溶解し、2N 塩化水素(40ml)を加え、室温にて六時間撹拌した。沈殿物をろ過して化合物11 8.05gを得た。H-NMRスペクトルの結果を以下に示す。
H-NMR(400MHz,(CDSO):δ7.91(d,J=16.0Hz,2H),7.70(d,J=8.8Hz,4H),6.81(d,J=8.4Hz,4H),6.75(d,J=16.0Hz,2H).
(化合物11)
[Synthesis Example 11]
According to the method described in Chinese Journal of Chemistry, 23, 1523, 2005, tetrahydropyranyl-coumaric acid (10 g) with a protected phenol moiety, tetrafluorohydroquinone (3.59 g), and 4-dimethylaminopyridine (0.5 g) as a base catalyst were dissolved in dehydrated dichloromethane (100 ml) at 0°C under a nitrogen stream. 1-(3-dimethylaminopropyl)-3-ethylcarbodiimide (8.49 g) was added to the solution, and the mixture was allowed to warm to room temperature and react overnight. Water was added to quench the reaction, and the solvent was distilled off under reduced pressure. The resulting solid was purified by silica gel chromatography (chloroform).
The resulting solid was redissolved in tetrahydrofuran (100 ml), and 2N hydrogen chloride (40 ml) was added, followed by stirring at room temperature for 6 hours. The precipitate was filtered to obtain 8.05 g of compound 11. The results of 1 H-NMR spectrum are shown below.
1 H-NMR (400 MHz, (CD 3 ) 2 SO): δ7.91 (d, J=16.0Hz, 2H), 7.70 (d, J=8.8Hz, 4H), 6.81 (d, J=8.4Hz, 4H), 6.75 (d, J=16.0Hz, 2H).
(Compound 11)

[合成例12]
4-ヒドロキシベンズアルデヒド(28g)、シアノ酢酸メチル(25g)、ピペリジン(2.5ml)をエタノール(200ml)に溶解し、窒素雰囲気下で三時間加熱還流した。反応液を水に投入し、析出物をろ過して固体を得た。
Chinese Journal of chemistry, 23, 1523, 2005. に記載の方法で、得られた固体のフェノール部位を保護したテトラヒドロピラニル-α-シアノクマル酸(11g)とtrans-シクロヘキサンジオール(2.29g)、塩基触媒として4-ジメチルアミノピリジン(0.5g)を脱水ジクロロメタン(100ml)に窒素気流下0℃にて溶解させた。これに1-(3-ジメチルアミノプロピル)-3-エチルカルボジイミド(8.49g)を加え、室温へ戻して一晩反応させた。水を加えて反応を停止させ、溶媒を減圧留去した。シリカゲルクロマトグラフィー(クロロホルム/メタノール)で精製し固体を得た。
得られた固体をテトラヒドロフラン(100ml)に再溶解し、2N 塩化水素(40ml)を加え、室温にて一晩撹拌した。沈殿物をろ過して化合物12 3.61gを得た。H-NMRスペクトルの結果を以下に示す。
H-NMR(400MHz,(CDSO):δ8.19(s,2H),7.96(d,J=8.8Hz,4H),6.90(d,J=8.4Hz,4H),4.98(s,2H),1.98-1.96(m,4H),1.72-1.66(m,4H).
(化合物12)
[Synthesis Example 12]
4-Hydroxybenzaldehyde (28 g), methyl cyanoacetate (25 g), and piperidine (2.5 ml) were dissolved in ethanol (200 ml) and heated under reflux for 3 hours under a nitrogen atmosphere. The reaction solution was poured into water, and the precipitate was filtered to obtain a solid.
Using the method described in Chinese Journal of Chemistry, 23, 1523, 2005, the obtained solid phenol-protected tetrahydropyranyl-α-cyanocoumaric acid (11 g), trans-cyclohexanediol (2.29 g), and 4-dimethylaminopyridine (0.5 g) as a base catalyst were dissolved in dehydrated dichloromethane (100 ml) at 0°C under a nitrogen stream. 1-(3-dimethylaminopropyl)-3-ethylcarbodiimide (8.49 g) was added to the solution, which was then returned to room temperature and reacted overnight. Water was added to quench the reaction, and the solvent was distilled off under reduced pressure. The resulting solid was purified by silica gel chromatography (chloroform/methanol).
The resulting solid was redissolved in tetrahydrofuran (100 ml), and 2N hydrogen chloride (40 ml) was added, followed by stirring at room temperature overnight. The precipitate was filtered to obtain 3.61 g of compound 12. The results of 1 H-NMR spectrum are shown below.
1 H-NMR (400 MHz, (CD 3 ) 2 SO): δ8.19 (s, 2H), 7.96 (d, J = 8.8Hz, 4H), 6.90 (d, J = 8.4Hz, 4H), 4.98 (s, 2H), 1.98-1.96 (m, 4H), 1.72-1.66 (m, 4H).
(Compound 12)

[合成例13]
Chinese Journal of chemistry, 23, 1523, 2005. に記載の方法で、フェノール部位を保護したテトラヒドロピラニル-クマル酸(10g)とピペラジン(1.70g)、塩基触媒として4-ジメチルアミノピリジン(0.5g)を脱水ジクロロメタン(100ml)に窒素気流下0℃にて溶解させた。これに1-(3-ジメチルアミノプロピル)-3-エチルカルボジイミド(8.49g)を加え、室温へ戻して一晩反応させた。水を加えて反応を停止させ、溶媒を減圧留去した。得られた固体を水/メタノールで洗浄し粉体を得た。
得られた粉体をテトラヒドロフラン(200ml)に再溶解し、2N 塩化水素(40ml)を加え、室温にて三時間撹拌した。反応液を濾過して化合物13 7.44gを得た。H-NMRスペクトルの結果を以下に示す。
H-NMR(400MHz,(CDSO):δ7.52(d,J=8.8,4H),7.40(d,J=15.2Hz,2H),7.02(d,J=15.6Hz,2H),6.74(d,J=8.8Hz,4H),5.12(m,8H).
(化合物13)
[Synthesis Example 13]
According to the method described in Chinese Journal of Chemistry, 23, 1523, 2005, tetrahydropyranyl-coumaric acid (10 g) with a protected phenol moiety, piperazine (1.70 g), and 4-dimethylaminopyridine (0.5 g) as a base catalyst were dissolved in dehydrated dichloromethane (100 ml) at 0°C under a nitrogen stream. 1-(3-dimethylaminopropyl)-3-ethylcarbodiimide (8.49 g) was added to the solution, which was then returned to room temperature and reacted overnight. Water was added to quench the reaction, and the solvent was distilled off under reduced pressure. The resulting solid was washed with water/methanol to obtain a powder.
The obtained powder was redissolved in tetrahydrofuran (200 ml), 2N hydrogen chloride (40 ml) was added, and the mixture was stirred at room temperature for 3 hours. The reaction solution was filtered to obtain 7.44 g of compound 13. The results of 1 H-NMR spectrum are shown below.
1 H-NMR (400 MHz, (CD 3 ) 2 SO): δ7.52 (d, J=8.8, 4H), 7.40 (d, J=15.2Hz, 2H), 7.02 (d, J=15.6Hz, 2H), 6.74 (d, J=8.8Hz, 4H), 5.12 (m, 8H).
(Compound 13)

[合成例14]
Chinese Journal of chemistry, 23, 1523, 2005. に記載の方法で、フェノール部位を保護したテトラヒドロピラニル-クマル酸(20g)と2,3-ジメチルヒドロキノン(7.42g)、塩基触媒として4-ジメチルアミノピリジン(1.97g)を脱水ジクロロメタン(300ml)に窒素気流下0℃にて溶解させた。これに1-(3-ジメチルアミノプロピル)-3-エチルカルボジイミド(18.28g)を加え、室温へ戻して一晩反応させた。水を加えて反応を停止させ、ジクロロメタンで抽出した後、ジクロロメタンを留去して粉体を得た。
得られた粉体とテレフタル酸クロリド(0.34g)、トリエチルアミン(0.37g)をクロロホルムに溶解し、室温にて一時間撹拌した。反応液を重曹水で洗浄した後、溶媒を留去した。ヘキサンで再結晶して固体を得た。
得られた固体をジクロロメタン(200ml)に再溶解し、p―トルエンスルホン酸(0.67g)を加え、室温にて三時間撹拌した。溶媒を留去した後、アセトンで洗浄して化合物14 2.96gを得た。H-NMRスペクトルの結果を以下に示す。
H-NMR(400MHz,(CDCO):δ8.42(s,4H),7.83(d,J=16.0Hz,2H),7.65(d,J=8.4Hz,4H),7.16(d,J=8.8Hz,2H),7.06(d,J=8.8Hz,2H),6.92(d,J=8.4Hz,4H),6.62(d,J=16.0,2H),2.18(s,6H),2.15(s,6H).
(化合物14)
[Synthesis Example 14]
According to the method described in Chinese Journal of Chemistry, 23, 1523, 2005, tetrahydropyranyl-coumaric acid (20 g) with a protected phenol moiety, 2,3-dimethylhydroquinone (7.42 g), and 4-dimethylaminopyridine (1.97 g) as a base catalyst were dissolved in dehydrated dichloromethane (300 ml) at 0°C under a nitrogen stream. 1-(3-dimethylaminopropyl)-3-ethylcarbodiimide (18.28 g) was added to the solution, which was then allowed to cool to room temperature and react overnight. Water was added to quench the reaction, and the mixture was extracted with dichloromethane. The dichloromethane was then distilled off to obtain a powder.
The obtained powder, terephthalic acid chloride (0.34 g), and triethylamine (0.37 g) were dissolved in chloroform and stirred at room temperature for 1 hour. The reaction solution was washed with sodium bicarbonate water, and the solvent was then distilled off. The resulting solution was recrystallized from hexane to obtain a solid.
The resulting solid was redissolved in dichloromethane (200 ml), p-toluenesulfonic acid (0.67 g) was added, and the mixture was stirred at room temperature for 3 hours. After the solvent was distilled off, the residue was washed with acetone to obtain 2.96 g of compound 14. The results of the 1 H-NMR spectrum are shown below.
1 H-NMR (400 MHz, (CD 3 ) 2 CO): δ8.42 (s, 4H), 7.83 (d, J=16.0Hz, 2H), 7.65 (d, J=8.4Hz, 4H), 7.16 (d, J=8.8Hz, 2H), 7. 06 (d, J=8.8Hz, 2H), 6.92 (d, J=8.4Hz, 4H), 6.62 (d, J=16.0, 2H), 2.18 (s, 6H), 2.15 (s, 6H).
(Compound 14)

[合成例15]
窒素気流下、4-メトキシ-N-メチルアニリン(3.00g, 21.9mmol)、テトラヒドロフラン(20mL)、水(20mL)の混合物を氷冷した後、炭酸水素ナトリウム(11g)を加えた。混合物を撹拌しながら、テレフタル酸クロリド(2.17g,10.7mmol)のテトラヒドロフラン(20mL)溶液をゆっくりと加え、3時間氷冷下で撹拌した。反応混合物に水(500mL)を加え、生じた固体をろ取した後、2N塩酸(200mL)、メタノール(300mL)にて洗浄することでN,N’-ビス(4-メトキシフェニル)-N,N’-ジメチル-1,4-ベンゼンジカルボキシアミド(3.91g,収率:90%)を得た。H-NMRスペクトルの結果を以下に示す。
H-NMR(400MHz,(CDSO):δ7.07(s,4H),6.83(d,J=8.0Hz,4H),6.67(d,J=8.0Hz,4H),3.73(s,6H),3.38(s,6H).
上記にて得たN,N’-ビス(4-メトキシフェニル)-N,N’-ジメチル-1,4-ベンゼンジカルボキシアミド(1.00g,2.47mmol)をジクロロメタン(25mL)に溶解した後、氷冷下にて1mol/L三臭化ほう素ジクロロメタン溶液(7.4mL)を5分かけて加えた。反応系を室温まで昇温させた後、15時間撹拌し、反応混合物を氷冷した水(300mL)に加えた。系中に生じた固体をろ取し、水(500mL)で洗浄することで化合物15の褐色固体(776mg,83%)を得た。H-NMRスペクトルの結果を以下に示す。
H-NMR(400MHz,(CDSO):δ9.55-9.28(br,2H),6.98(s,4H),6.87-6.67(m,4H),6.58-6.49(m,4H),3.20(s,6H).
(化合物15)
[Synthesis Example 15]
A mixture of 4-methoxy-N-methylaniline (3.00 g, 21.9 mmol), tetrahydrofuran (20 mL), and water (20 mL) was ice-cooled under a nitrogen stream, and then sodium bicarbonate (11 g) was added. While stirring, a solution of terephthaloyl chloride (2.17 g, 10.7 mmol) in tetrahydrofuran (20 mL) was slowly added, and the mixture was stirred for 3 hours under ice-cooling. Water (500 mL) was added to the reaction mixture, and the resulting solid was collected by filtration and washed with 2N hydrochloric acid (200 mL) and methanol (300 mL) to obtain N,N'-bis(4-methoxyphenyl)-N,N'-dimethyl-1,4-benzenedicarboxamide (3.91 g, yield: 90%). The results of the 1H -NMR spectrum are shown below.
1 H-NMR (400 MHz, (CD 3 ) 2 SO): δ7.07 (s, 4H), 6.83 (d, J=8.0 Hz, 4H), 6.67 (d, J=8.0 Hz, 4H), 3.73 (s, 6H), 3.38 (s, 6H).
The N,N'-bis(4-methoxyphenyl)-N,N'-dimethyl-1,4-benzenedicarboxamide (1.00 g, 2.47 mmol) obtained above was dissolved in dichloromethane (25 mL), and then a 1 mol/L solution of boron tribromide in dichloromethane (7.4 mL) was added over 5 minutes under ice-cooling. The reaction system was allowed to warm to room temperature and stirred for 15 hours, and the reaction mixture was added to ice-cooled water (300 mL). The solid formed in the system was collected by filtration and washed with water (500 mL) to obtain compound 15 (776 mg, 83%) as a brown solid. The results of the 1 H-NMR spectrum are shown below.
1 H-NMR (400 MHz, (CD 3 ) 2 SO): δ9.55-9.28 (br, 2H), 6.98 (s, 4H), 6.87-6.67 (m, 4H), 6.58-6.49 (m, 4H), 3.20 (s, 6H).
(Compound 15)

[合成例16]
4-(メチルアミノ)安息香酸(7.56g)をN-メチルピロリドン(25ml)に窒素気流下にて溶解した。テレフタル酸クロリド(5.08g)を加え、室温にて二時間撹拌した。反応液に水を加えた後に、ろ過をした。ろ物を水/メタノールで洗浄して固体を得た。
得られた固体と塩化チオニル(20ml)の混合物を加熱還流下、三時間撹拌した。塩化チオニルを留去して化合物16 1.71gを得た。
(化合物16)
[Synthesis Example 16]
4-(Methylamino)benzoic acid (7.56 g) was dissolved in N-methylpyrrolidone (25 ml) under a nitrogen stream. Terephthalic acid chloride (5.08 g) was added and the mixture was stirred at room temperature for two hours. Water was added to the reaction mixture, which was then filtered. The residue was washed with water/methanol to obtain a solid.
A mixture of the obtained solid and thionyl chloride (20 ml) was stirred under reflux for 3 hours, and thionyl chloride was distilled off to obtain 1.71 g of Compound 16.
(Compound 16)

[合成例17]
4-N-メチルアミノフェノール硫酸塩(8.65g)をテトラヒドロフラン(50ml)と水(50ml)の混合溶媒に窒素気流下0℃にて溶解した。炭酸水素ナトリウム(20.1g)と1,4-シクロヘキサンジカルボン酸クロリド(5.0g)を加え、一時間氷冷下で撹拌した。テトラヒドロフランを留去し、析出物をろ過した。析出物を2N 塩化水素とメタノールで洗浄して化合物17 4.94gを得た。
(化合物17)
[Synthesis Example 17]
4-N-methylaminophenol sulfate (8.65 g) was dissolved in a mixed solvent of tetrahydrofuran (50 ml) and water (50 ml) at 0°C under a nitrogen stream. Sodium hydrogen carbonate (20.1 g) and 1,4-cyclohexanedicarboxylic acid chloride (5.0 g) were added, and the mixture was stirred for 1 hour under ice-cooling. Tetrahydrofuran was distilled off, and the precipitate was filtered. The precipitate was washed with 2N hydrogen chloride and methanol to obtain 4.94 g of compound 17.
(Compound 17)

[合成例18]
4-ヒドロキシベンズアルデヒド(22.8g)、4-ヒドロキシアセトフェノン(25.4g)、三フッ化ホウ素ジエチルエーテル錯体(触媒量)をメタノール(100ml)に窒素雰囲気下にて溶解し、加熱還流下、四時間撹拌した。メタノールを留去した後、トルエンにて再結晶して化合物18 45.5gを得た。
(化合物18)
[Synthesis Example 18]
4-Hydroxybenzaldehyde (22.8 g), 4-hydroxyacetophenone (25.4 g), and boron trifluoride diethyl ether complex (catalytic amount) were dissolved in methanol (100 ml) under a nitrogen atmosphere and stirred for 4 hours under reflux. After distilling off the methanol, the mixture was recrystallized from toluene to obtain 45.5 g of Compound 18.
(Compound 18)

[合成例19]
1,4-フェニレンジアクリル酸(1.3g)、塩化チオニル(15ml)の混合物を加熱還流下、三時間撹拌した。塩化チオニルを留去した後、トルエンで再結晶して化合物19 1.2gを得た。
(化合物19)
[Synthesis Example 19]
A mixture of 1,4-phenylenediacrylic acid (1.3 g) and thionyl chloride (15 ml) was stirred under reflux for 3 hours. After the thionyl chloride was distilled off, the residue was recrystallized from toluene to obtain 1.2 g of Compound 19.
(Compound 19)

[合成例20]
4-ホルミル安息香酸(10g)とマロン酸(10.4g)、塩基触媒としてピペリジン(1.5ml)をピリジン(50ml)に窒素気流下で溶解した。これを加熱還流下で五時間撹拌した。水を加えて反応を停止させ、2N 塩化水素を加えて沈殿を生じさせた。沈殿物をろ取し、水/メタノールで洗浄して固体を得た。
得られた固体(3.1g)、塩化チオニル(15ml)の混合物を加熱還流下、三時間撹拌した。塩化チオニルを留去した後、トルエンで再結晶して化合物20 1.8gを得た。
(化合物20)
[Synthesis Example 20]
4-Formylbenzoic acid (10 g), malonic acid (10.4 g), and piperidine (1.5 ml) as a base catalyst were dissolved in pyridine (50 ml) under a nitrogen stream. The mixture was stirred under reflux for five hours. Water was added to quench the reaction, and 2N hydrogen chloride was added to produce a precipitate. The precipitate was collected by filtration and washed with water/methanol to obtain a solid.
A mixture of the obtained solid (3.1 g) and thionyl chloride (15 ml) was stirred under reflux for 3 hours. After thionyl chloride was distilled off, the residue was recrystallized from toluene to obtain 1.8 g of Compound 20.
(Compound 20)

[合成例21]
4-メトキシけい皮酸(25g)、塩化チオニル(50ml)、触媒量のN,N-ジメチルホルムアミド(触媒量)の混合物を加熱還流下、一時間撹拌した。塩化チオニルを留去して固体を得た。
得られた固体、4-メトキシフェノール(18.3g)、トリエチルアミン(14.9g)を窒素気流下にてテトラヒドロフラン(25ml)に溶解して一晩撹拌した。水を加えて沈殿物を得た。
得られた沈殿物をジクロロメタン(140ml)に再溶解して、1mol/L 三臭化ホウ素ジクロロメタン溶液(46.5ml)を加えた。窒素雰囲気下で一晩撹拌した後、反応液を氷冷水に滴下した。沈殿物をろ取し、水で洗浄して化合物21 1.65gを得た。
(化合物21)
[Synthesis Example 21]
A mixture of 4-methoxycinnamic acid (25 g), thionyl chloride (50 ml) and a catalytic amount of N,N-dimethylformamide (catalytic amount) was stirred under reflux for 1 hour, and the thionyl chloride was distilled off to obtain a solid.
The obtained solid, 4-methoxyphenol (18.3 g), and triethylamine (14.9 g) were dissolved in tetrahydrofuran (25 ml) under a nitrogen stream and stirred overnight. Water was added to obtain a precipitate.
The resulting precipitate was redissolved in dichloromethane (140 ml), and a 1 mol/L solution of boron tribromide in dichloromethane (46.5 ml) was added. After stirring overnight under a nitrogen atmosphere, the reaction mixture was added dropwise to ice-cold water. The precipitate was collected by filtration and washed with water to obtain 1.65 g of compound 21.
(Compound 21)

[実施例1]
滴下漏斗を具備した三口フラスコに、水15mlを取り、化合物1 1.4mmolと水酸化ナトリウム4.0mmolを溶解させ撹拌した。触媒として臭化テトラn-ブチルアンモニウムの2.0重量%水溶液を0.8ml加え、装置内を窒素置換した。ジクロロメタン15mlにセバコイルクロリド(化合物22)1.4mmolを溶解させた溶液を、滴下漏斗に取り、滴下した後、常温で3時間撹拌した。反応後の溶液をメタノールへ投入し、沈殿物をろ別した後、真空乾燥して重合体1を得た(収率70%)。4.0質量%の重合体1を、ペンタフルオロフェノール32.0重量%、クロロホルム64.0質量%へ溶解した。これを石英基板上に流延して1500rpmで60秒間スピンコートし、オーブン中150℃で30分乾燥させ薄膜(膜厚1.9μm)を得た。得られた薄膜に248nmの偏光紫外光を1000mJ/cm照射した後(光反応率16.4%)、260℃にて加熱したところ、高位相差が発現した。位相差を表1に示す。
(化合物22)
[Example 1]
In a three-neck flask equipped with a dropping funnel, 15 ml of water was placed, and 1.4 mmol of compound 1 and 4.0 mmol of sodium hydroxide were dissolved and stirred. 0.8 ml of a 2.0 wt % aqueous solution of tetra-n-butylammonium bromide was added as a catalyst, and the inside of the apparatus was purged with nitrogen. A solution of 1.4 mmol of sebacoyl chloride (compound 22) dissolved in 15 ml of dichloromethane was placed in the dropping funnel and added dropwise, followed by stirring at room temperature for 3 hours. The reaction solution was poured into methanol, and the precipitate was filtered and then vacuum dried to obtain polymer 1 (yield 70%). 4.0% by mass of polymer 1 was dissolved in 32.0% by mass of pentafluorophenol and 64.0% by mass of chloroform. This was cast onto a quartz substrate, spin-coated at 1500 rpm for 60 seconds, and dried in an oven at 150°C for 30 minutes to obtain a thin film (thickness 1.9 μm). The obtained thin film was irradiated with 248 nm polarized ultraviolet light at 1000 mJ/ cm2 (photoreaction rate 16.4%) and then heated at 260°C, whereupon a high retardation was exhibited. The retardation is shown in Table 1.
(Compound 22)

[実施例2]
滴下漏斗を具備した三口フラスコに、水30mlを取り、化合物2 3.0mmolと水酸化ナトリウム6.0mmolを溶解させ撹拌した。触媒として臭化テトラn-ブチルアンモニウムの2.0重量%水溶液を1.2ml加え、装置内を窒素置換した。ジクロロメタン30mlにセバコイルクロリド(化合物22)3.0mmolを溶解させた溶液を、滴下漏斗に取り、滴下した後、常温で3時間撹拌した。反応後の溶液をメタノールへ投入し、沈殿物をろ別した後、真空乾燥して重合体2を得た(収率90%)。3.0質量%の重合体2を、クロロホルム97.0質量%へ溶解した。これを石英基板上に流延して1500rpmで60秒間スピンコートし、オーブン中70℃で30分乾燥させ薄膜(膜厚0.5μm)を得た。得られた薄膜に248nmの偏光紫外光を1000mJ/cm照射した後(光反応率19.7%)、200℃にて加熱したところ、高位相差が発現した。位相差を表1に示す。
[Example 2]
30 ml of water was placed in a three-neck flask equipped with a dropping funnel, and 3.0 mmol of compound 2 and 6.0 mmol of sodium hydroxide were dissolved and stirred. 1.2 ml of a 2.0 wt % aqueous solution of tetra-n-butylammonium bromide was added as a catalyst, and the atmosphere inside the apparatus was replaced with nitrogen. A solution of 3.0 mmol of sebacoyl chloride (compound 22) dissolved in 30 ml of dichloromethane was placed in the dropping funnel and added dropwise, followed by stirring at room temperature for 3 hours. The reaction solution was poured into methanol, and the precipitate was filtered and then vacuum dried to obtain polymer 2 (yield 90%). 3.0 mass % of polymer 2 was dissolved in 97.0 mass % chloroform. This was cast onto a quartz substrate, spin-coated at 1500 rpm for 60 seconds, and dried in an oven at 70°C for 30 minutes to obtain a thin film (film thickness 0.5 μm). The obtained thin film was irradiated with 248 nm polarized ultraviolet light at 1000 mJ/ cm2 (photoreaction rate 19.7%) and then heated at 200°C, whereupon a high retardation was exhibited. The retardation is shown in Table 1.

[実施例3]
滴下漏斗を具備した三口フラスコに、水9.4mlを取り、化合物2 1.9mmolと水酸化ナトリウム3.8mmolを溶解させ撹拌した。触媒として臭化テトラn-ブチルアンモニウムの2.0重量%水溶液を0.5ml加え、装置内を窒素置換した。クロロホルム9.4mlに化合物22 0.4mmolと化合物23 1.5mmolを溶解させた溶液を、滴下漏斗に取り、滴下した後、常温で三時間撹拌した。反応後の溶液をメタノールへ投入し、沈殿物をろ別した後、真空乾燥して重合体3を得た(収率82%)。6.0質量%の重合体3を、ヘキサフルオロ-2-プロパノール94.0質量%へ溶解した。これを石英基板上に流延して7000rpmで60秒間スピンコートし、オーブン中150℃で30分乾燥させ薄膜(膜厚1.0μm)を得た。得られた薄膜に248nmの偏光紫外光を500mJ/cm照射した後(光反応率5.4%)、240℃にて加熱したところ、高位相差が発現した。位相差を表1に示す。
(化合物23)
[Example 3]
A three-neck flask equipped with a dropping funnel was charged with 9.4 ml of water, and 1.9 mmol of compound 2 and 3.8 mmol of sodium hydroxide were dissolved and stirred. 0.5 ml of a 2.0 wt % aqueous solution of tetra-n-butylammonium bromide was added as a catalyst, and the atmosphere inside the apparatus was replaced with nitrogen. A solution of 0.4 mmol of compound 22 and 1.5 mmol of compound 23 dissolved in 9.4 ml of chloroform was transferred to the dropping funnel and added dropwise, followed by stirring at room temperature for three hours. The reaction solution was poured into methanol, and the precipitate was filtered and then vacuum dried to obtain polymer 3 (yield 82%). 6.0% by mass of polymer 3 was dissolved in 94.0% by mass of hexafluoro-2-propanol. This was cast onto a quartz substrate, spin-coated at 7000 rpm for 60 seconds, and dried in an oven at 150°C for 30 minutes to obtain a thin film (thickness 1.0 μm). The obtained thin film was irradiated with 248 nm polarized ultraviolet light at 500 mJ/ cm2 (photoreaction rate 5.4%) and then heated at 240°C, whereupon a high retardation was exhibited. The retardation is shown in Table 1.
(Compound 23)

[実施例4]
滴下漏斗を具備した三口フラスコに、水30mlを取り、化合物3 3.0mmolと水酸化ナトリウム6.0mmolを溶解させ撹拌した。触媒として臭化テトラn-ブチルアンモニウムの2.0重量%水溶液を1.2ml加え、装置内を窒素置換した。ジクロロメタン30mlにセバコイルクロリド(化合物22)3.0mmolを溶解させた溶液を滴下漏斗に取り、滴下した後、常温で3時間撹拌した。反応後の溶液をメタノールへ投入し、沈殿物をろ別した後、真空乾燥して重合体4を得た(収率66%)。10.0質量%の重合体4を、クロロホルム90.0質量%へ溶解した。これを石英基板上に流延して1500rpmで60秒間スピンコートし、オーブン中70℃で30分乾燥させ薄膜(膜厚2.6μm)を得た。得られた薄膜に248nmの偏光紫外光を1000mJ/cm照射した後(光反応率15.7%)、110℃にて加熱したところ、高位相差が発現した。位相差を表1に示す。
[Example 4]
30 ml of water was placed in a three-neck flask equipped with a dropping funnel, and 3.0 mmol of compound 3 and 6.0 mmol of sodium hydroxide were dissolved and stirred. 1.2 ml of a 2.0 wt % aqueous solution of tetra-n-butylammonium bromide was added as a catalyst, and the atmosphere inside the apparatus was replaced with nitrogen. A solution of 3.0 mmol of sebacoyl chloride (compound 22) dissolved in 30 ml of dichloromethane was placed in the dropping funnel and added dropwise, followed by stirring at room temperature for 3 hours. The reaction solution was poured into methanol, and the precipitate was filtered and then vacuum dried to obtain polymer 4 (yield 66%). 10.0 mass % of polymer 4 was dissolved in 90.0 mass % chloroform. This was cast onto a quartz substrate, spin-coated at 1500 rpm for 60 seconds, and dried in an oven at 70 °C for 30 minutes to obtain a thin film (film thickness 2.6 μm). The obtained thin film was irradiated with 248 nm polarized ultraviolet light at 1000 mJ/ cm2 (photoreaction rate 15.7%) and then heated at 110°C, whereupon a high retardation was exhibited. The retardation is shown in Table 1.

[実施例5]
滴下漏斗を具備した三口フラスコに、水10mlを取り、化合物4 2.0mmolと水酸化ナトリウム4.0mmolを溶解させ撹拌した。触媒として臭化テトラn-ブチルアンモニウムの2.0重量%水溶液を0.8ml加え、装置内を窒素置換した。ジクロロメタン10mlにセバコイルクロリド(化合物22)2.0mmolを溶解させた溶液を滴下漏斗に取り、滴下した後、常温で3時間撹拌した。反応後の溶液をメタノールへ投入し、沈殿物をろ別した後、真空乾燥して重合体5を得た(収率92%)。10.0質量%の重合体5を、クロロホルム90.0質量%へ溶解した。これを石英基板上に流延して1500rpmで60秒間スピンコートし、オーブン中70℃で30分乾燥させ薄膜(膜厚0.6μm)を得た。得られた薄膜に248nmの偏光紫外光を1000mJ/cm照射した後(光反応率8.5%)、240℃にて加熱したところ、高位相差が発現した。位相差を表1に示す。
[Example 5]
A three-neck flask equipped with a dropping funnel was charged with 10 ml of water, and 2.0 mmol of compound 4 and 4.0 mmol of sodium hydroxide were dissolved and stirred. 0.8 ml of a 2.0 wt % aqueous solution of tetra-n-butylammonium bromide was added as a catalyst, and the atmosphere inside the apparatus was replaced with nitrogen. A solution of 2.0 mmol of sebacoyl chloride (compound 22) dissolved in 10 ml of dichloromethane was charged to the dropping funnel and added dropwise, followed by stirring at room temperature for 3 hours. The reaction solution was poured into methanol, and the precipitate was filtered and then vacuum dried to obtain polymer 5 (yield 92%). 10.0 mass % of polymer 5 was dissolved in 90.0 mass % chloroform. This was cast onto a quartz substrate, spin-coated at 1500 rpm for 60 seconds, and dried in an oven at 70°C for 30 minutes to obtain a thin film (film thickness 0.6 μm). The obtained thin film was irradiated with 248 nm polarized ultraviolet light at 1000 mJ/ cm2 (photoreaction rate 8.5%) and then heated at 240°C, whereupon a high retardation was exhibited. The retardation is shown in Table 1.

[実施例6]
滴下漏斗を具備した三口フラスコに、水7.5mlを取り、化合物5 1.5mmolと水酸化ナトリウム3.0mmolを溶解させ撹拌した。触媒として臭化テトラn-ブチルアンモニウムの2.0重量%水溶液を0.6ml加え、装置内を窒素置換した。ジクロロメタン7.5mlにセバコイルクロリド(化合物22)1.5mmolを溶解させた溶液を滴下漏斗に取り、滴下した後、常温で3時間撹拌した。反応後の溶液をメタノールへ投入し、沈殿物をろ別した後、真空乾燥して重合体6を得た(収率49%)。3.6質量%の重合体6を、ペンタフルオロフェノール32.1重量%、クロロホルム64.3質量%へ溶解した。これを石英基板上に流延して1500rpmで60秒間スピンコートし、オーブン中70℃で30分乾燥させ薄膜を得た。得られた薄膜に248nmの偏光紫外光を1000mJ/cm照射した後(光反応率13.4%)、100℃にて加熱したところ、高位相差が発現した。位相差を表1に示す。
[Example 6]
7.5 ml of water was placed in a three-neck flask equipped with a dropping funnel, and 1.5 mmol of compound 5 and 3.0 mmol of sodium hydroxide were dissolved and stirred. 0.6 ml of a 2.0 wt % aqueous solution of tetra-n-butylammonium bromide was added as a catalyst, and the atmosphere inside the apparatus was replaced with nitrogen. A solution of 1.5 mmol of sebacoyl chloride (compound 22) dissolved in 7.5 ml of dichloromethane was placed in the dropping funnel and added dropwise, followed by stirring at room temperature for 3 hours. The reaction solution was poured into methanol, and the precipitate was filtered and then dried in vacuo to obtain polymer 6 (yield 49%). 3.6% by mass of polymer 6 was dissolved in 32.1% by mass of pentafluorophenol and 64.3% by mass of chloroform. This was cast onto a quartz substrate, spin-coated at 1500 rpm for 60 seconds, and dried in an oven at 70°C for 30 minutes to obtain a thin film. The obtained thin film was irradiated with 248 nm polarized ultraviolet light at 1000 mJ/ cm2 (photoreaction rate 13.4%) and then heated at 100°C, whereupon a high retardation was exhibited. The retardation is shown in Table 1.

[実施例7]
滴下漏斗を具備した三口フラスコに、水18.5mlを取り、化合物6 0.7mmolと化合物8 2.9mmolと水酸化ナトリウム7.5mmolを溶解させ撹拌した。触媒として臭化テトラn-ブチルアンモニウムの2.0重量%水溶液を1.5ml加え、装置内を窒素置換した。クロロホルム18.5mlに化合物22 3.7mmolを溶解させた溶液を滴下漏斗に取り、滴下した後、常温で三時間撹拌した。反応後の溶液をメタノールへ投入し、沈殿物をろ別した後、真空乾燥して重合体7を得た(収率61%)。6.0質量%の重合体7を、ヘキサフルオロ-2-プロパノール94.0質量%へ溶解した。これを石英基板上に流延して4000rpmで60秒間スピンコートし、オーブン中150℃で30分乾燥させ薄膜(膜厚1.0μm)を得た。得られた薄膜に248nmの偏光紫外光を500mJ/cm照射した後(光反応率50%以下)、190℃にて加熱したところ、高位相差が発現した。位相差を表1に示す。
[Example 7]
A three-neck flask equipped with a dropping funnel was charged with 18.5 ml of water, and 0.7 mmol of compound 6, 2.9 mmol of compound 8, and 7.5 mmol of sodium hydroxide were dissolved and stirred. 1.5 ml of a 2.0 wt % aqueous solution of tetra-n-butylammonium bromide was added as a catalyst, and the atmosphere inside the apparatus was replaced with nitrogen. A solution of 3.7 mmol of compound 22 dissolved in 18.5 ml of chloroform was added dropwise to the dropping funnel, and the mixture was stirred at room temperature for three hours. The reaction solution was poured into methanol, and the precipitate was filtered and then vacuum dried to obtain polymer 7 (yield 61%). 6.0% by mass of polymer 7 was dissolved in 94.0% by mass of hexafluoro-2-propanol. This was cast onto a quartz substrate, spin-coated at 4000 rpm for 60 seconds, and dried in an oven at 150°C for 30 minutes to obtain a thin film (thickness 1.0 μm). The obtained thin film was irradiated with 248 nm polarized ultraviolet light at 500 mJ/ cm² (photoreaction rate of 50% or less) and then heated at 190°C, whereupon a high retardation was exhibited. The retardation is shown in Table 1.

[実施例8]
滴下漏斗を具備した三口フラスコに、水18.5mlを取り、化合物6 0.7mmolと化合物8 2.9mmolと水酸化ナトリウム7.5mmolを溶解させ撹拌した。触媒として臭化テトラn-ブチルアンモニウムの2.0重量%水溶液を1.5ml加え、装置内を窒素置換した。クロロホルム18.5mlに化合物22 0.7mmolと化合物23 2.9mmolを溶解させた溶液を滴下漏斗に取り、滴下した後、常温で三時間撹拌した。反応後の溶液をメタノールへ投入し、沈殿物をろ別した後、真空乾燥して重合体8を得た(収率83%)。6.0質量%の重合体8を、ヘキサフルオロ-2-プロパノール94.0質量%へ溶解した。これを石英基板上に流延して5000rpmで60秒間スピンコートし、オーブン中150℃で30分乾燥させ薄膜(膜厚1.0μm)を得た。得られた薄膜に248nmの偏光紫外光を500mJ/cm照射した後(光反応率50%以下)、250℃にて加熱したところ、高位相差が発現した。位相差を表1に示す。
[Example 8]
A three-neck flask equipped with a dropping funnel was charged with 18.5 ml of water, and 0.7 mmol of compound 6, 2.9 mmol of compound 8, and 7.5 mmol of sodium hydroxide were dissolved and stirred. 1.5 ml of a 2.0 wt % aqueous solution of tetra-n-butylammonium bromide was added as a catalyst, and the atmosphere inside the apparatus was replaced with nitrogen. A solution of 0.7 mmol of compound 22 and 2.9 mmol of compound 23 dissolved in 18.5 ml of chloroform was added dropwise to the dropping funnel, and the mixture was stirred at room temperature for three hours. The reaction solution was poured into methanol, and the precipitate was filtered and then vacuum dried to obtain polymer 8 (yield 83%). 6.0% by mass of polymer 8 was dissolved in 94.0% by mass of hexafluoro-2-propanol. This was cast onto a quartz substrate, spin-coated at 5000 rpm for 60 seconds, and dried in an oven at 150°C for 30 minutes to obtain a thin film (thickness 1.0 μm). The obtained thin film was irradiated with 248 nm polarized ultraviolet light at 500 mJ/ cm2 (photoreaction rate of 50% or less) and then heated at 250°C, whereupon a high retardation was exhibited. The retardation is shown in Table 1.

[実施例9]
滴下漏斗を具備した三口フラスコに、水18.5mlを取り、化合物6 0.4mmolと化合物8 3.3mmolと水酸化ナトリウム7.5mmolを溶解させ撹拌した。触媒として臭化テトラn-ブチルアンモニウムの2.0重量%水溶液を1.5ml加え、装置内を窒素置換した。クロロホルム18.5mlに化合物23 3.7mmolを溶解させた溶液を滴下漏斗に取り、滴下した後、常温で三時間撹拌した。反応後の溶液をメタノールへ投入し、沈殿物をろ別した後、真空乾燥して重合体9を得た(収率88%)。6.0質量%の重合体9を、ヘキサフルオロ-2-プロパノール94.0質量%へ溶解した。これを石英基板上に流延して3000rpmで60秒間スピンコートし、オーブン中150℃で30分乾燥させ薄膜(膜厚1.0μm)を得た。得られた薄膜に248nmの偏光紫外光を1000mJ/cm照射した後(光反応率50%以下)、250℃にて加熱したところ、高位相差が発現した。位相差を表1に示す。
[Example 9]
A three-neck flask equipped with a dropping funnel was charged with 18.5 ml of water, and 0.4 mmol of compound 6, 3.3 mmol of compound 8, and 7.5 mmol of sodium hydroxide were dissolved and stirred. 1.5 ml of a 2.0 wt % aqueous solution of tetra-n-butylammonium bromide was added as a catalyst, and the atmosphere inside the apparatus was replaced with nitrogen. A solution of 3.7 mmol of compound 23 dissolved in 18.5 ml of chloroform was added dropwise to the dropping funnel, and the mixture was stirred at room temperature for three hours. The reaction solution was poured into methanol, and the precipitate was filtered and then vacuum dried to obtain polymer 9 (yield 88%). 6.0% by mass of polymer 9 was dissolved in 94.0% by mass of hexafluoro-2-propanol. This was cast onto a quartz substrate, spin-coated at 3000 rpm for 60 seconds, and dried in an oven at 150°C for 30 minutes to obtain a thin film (thickness 1.0 μm). The obtained thin film was irradiated with 248 nm polarized ultraviolet light at 1000 mJ/ cm2 (photoreaction rate of 50% or less) and then heated at 250°C, whereupon a high retardation was exhibited. The retardation is shown in Table 1.

[実施例10]
滴下漏斗を具備した三口フラスコに、水15.5mlを取り、化合物6 0.6mmolと化合物15 2.4mmolと水酸化ナトリウム6.2mmolを溶解させ撹拌した。触媒として臭化テトラn-ブチルアンモニウムの2.0重量%水溶液を1.3ml加え、装置内を窒素置換した。クロロホルム15.5mlに化合物23 3.1mmolを溶解させた溶液を滴下漏斗に取り、滴下した後、常温で三時間撹拌した。反応後の溶液をメタノールへ投入し、沈殿物をろ別した後、真空乾燥して重合体10を得た(収率90%)。5.0質量%の重合体10を、ヘキサフルオロ-2-プロパノール95.0質量%へ溶解した。これを石英基板上に流延して6000rpmで60秒間スピンコートし、オーブン中150℃で30分乾燥させ薄膜(膜厚1.0μm)を得た。得られた薄膜に248nmの偏光紫外光を500mJ/cm照射した後(光反応率50%以下)、250℃にて加熱したところ、高位相差が発現した。位相差を表1に示す。
[Example 10]
A three-neck flask equipped with a dropping funnel was charged with 15.5 ml of water, and 0.6 mmol of compound 6, 2.4 mmol of compound 15, and 6.2 mmol of sodium hydroxide were dissolved and stirred. 1.3 ml of a 2.0 wt % aqueous solution of tetra-n-butylammonium bromide was added as a catalyst, and the atmosphere inside the apparatus was replaced with nitrogen. A solution of 3.1 mmol of compound 23 dissolved in 15.5 ml of chloroform was added dropwise to the dropping funnel, and the mixture was stirred at room temperature for three hours. The reaction solution was poured into methanol, and the precipitate was filtered and then vacuum dried to obtain polymer 10 (yield 90%). 5.0% by mass of polymer 10 was dissolved in 95.0% by mass of hexafluoro-2-propanol. This was cast onto a quartz substrate, spin-coated at 6000 rpm for 60 seconds, and dried in an oven at 150°C for 30 minutes to obtain a thin film (thickness 1.0 μm). The obtained thin film was irradiated with 248 nm polarized ultraviolet light at 500 mJ/ cm2 (photoreaction rate of 50% or less) and then heated at 250°C, whereupon a high retardation was exhibited. The retardation is shown in Table 1.

[実施例11]
滴下漏斗を具備した三口フラスコに、水6.0mlを取り、化合物6 1.2mmolと水酸化ナトリウム2.5mmolを溶解させ撹拌した。触媒として臭化テトラn-ブチルアンモニウムの2.0重量%水溶液を0.5ml加え、装置内を窒素置換した。クロロホルム18.0mlに化合物16 1.2mmolを溶解させた溶液を滴下漏斗に取り、滴下した後、常温で三時間撹拌した。反応後の溶液をメタノールへ投入し、沈殿物をろ別した後、真空乾燥して重合体11を得た(収率96%)。6.0質量%の重合体11を、ヘキサフルオロ-2-プロパノール94.0質量%へ溶解した。これを石英基板上に流延して7000rpmで60秒間スピンコートし、オーブン中150℃で30分乾燥させ薄膜(膜厚1.8μm)を得た。得られた薄膜に248nmの偏光紫外光を1000mJ/cm照射した後(光反応率50%以下)、250℃にて加熱したところ、高位相差が発現した。位相差を表1に示す。
[Example 11]
A three-neck flask equipped with a dropping funnel was charged with 6.0 ml of water, and 1.2 mmol of compound 6 and 2.5 mmol of sodium hydroxide were dissolved and stirred. 0.5 ml of a 2.0 wt % aqueous solution of tetra-n-butylammonium bromide was added as a catalyst, and the atmosphere inside the apparatus was replaced with nitrogen. A solution of 1.2 mmol of compound 16 dissolved in 18.0 ml of chloroform was charged to the dropping funnel, added dropwise, and then stirred at room temperature for three hours. The reaction solution was poured into methanol, and the precipitate was filtered and then dried in vacuo to obtain polymer 11 (yield 96%). 6.0% by mass of polymer 11 was dissolved in 94.0% by mass of hexafluoro-2-propanol. This was cast onto a quartz substrate, spin-coated at 7000 rpm for 60 seconds, and dried in an oven at 150°C for 30 minutes to obtain a thin film (thickness 1.8 μm). The obtained thin film was irradiated with 248 nm polarized ultraviolet light at 1000 mJ/ cm2 (photoreaction rate of 50% or less) and then heated at 250°C, whereupon a high retardation was exhibited. The retardation is shown in Table 1.

[実施例12]
滴下漏斗を具備した三口フラスコに、水13.2mlを取り、化合物6 0.6mmolと化合物8 2.0mmolと水酸化ナトリウム5.3mmolを溶解させ撹拌した。触媒として臭化テトラn-ブチルアンモニウムの2.0重量%水溶液を1.1ml加え、装置内を窒素置換した。クロロホルム13.2mlに化合物23 2.1mmolと化合物16 0.5mmolを溶解させた溶液を滴下漏斗に取り、滴下した後、常温で三時間撹拌した。反応後の溶液をメタノールへ投入し、沈殿物をろ別した後、真空乾燥して重合体12を得た(収率88%)。6.0質量%の重合体12を、ヘキサフルオロ-2-プロパノール94.0質量%へ溶解した。これを石英基板上に流延して4500rpmで60秒間スピンコートし、オーブン中150℃で30分乾燥させ薄膜(膜厚1.0μm)を得た。得られた薄膜に248nmの偏光紫外光を500mJ/cm照射した後(光反応率50%以下)、250℃にて加熱したところ、高位相差が発現した。位相差を表1に示す。
[Example 12]
A three-neck flask equipped with a dropping funnel was charged with 13.2 ml of water, and 0.6 mmol of compound 6, 2.0 mmol of compound 8, and 5.3 mmol of sodium hydroxide were dissolved and stirred. 1.1 ml of a 2.0 wt % aqueous solution of tetra-n-butylammonium bromide was added as a catalyst, and the atmosphere inside the apparatus was replaced with nitrogen. A solution of 2.1 mmol of compound 23 and 0.5 mmol of compound 16 dissolved in 13.2 ml of chloroform was added dropwise to the dropping funnel, and the mixture was stirred at room temperature for three hours. The reaction solution was poured into methanol, and the precipitate was filtered and then vacuum dried to obtain polymer 12 (yield 88%). 6.0% by mass of polymer 12 was dissolved in 94.0% by mass of hexafluoro-2-propanol. This was cast onto a quartz substrate, spin-coated at 4500 rpm for 60 seconds, and dried in an oven at 150°C for 30 minutes to obtain a thin film (thickness 1.0 μm). The obtained thin film was irradiated with 248 nm polarized ultraviolet light at 500 mJ/ cm2 (photoreaction rate of 50% or less) and then heated at 250°C, whereupon a high retardation was exhibited. The retardation is shown in Table 1.

[実施例13]
滴下漏斗を具備した三口フラスコに、水13.2mlを取り、化合物6 0.6mmolと化合物15 1.6mmolと水酸化ナトリウム4.5mmolを溶解させ撹拌した。触媒として臭化テトラn-ブチルアンモニウムの2.0重量%水溶液を1.0ml加え、装置内を窒素置換した。クロロホルム11.2mlに化合物23 1.8mmolと化合物16 0.5mmolを溶解させた溶液を滴下漏斗に取り、滴下した後、常温で三時間撹拌した。反応後の溶液をメタノールへ投入し、沈殿物をろ別した後、真空乾燥して重合体13を得た(収率82%)。6.0質量%の重合体13を、ヘキサフルオロ-2-プロパノール94.0質量%へ溶解した。これを石英基板上に流延して5000rpmで60秒間スピンコートし、オーブン中150℃で30分乾燥させ薄膜(膜厚1.0μm)を得た。得られた薄膜に248nmの偏光紫外光を500mJ/cm照射した後(光反応率50%以下)、250℃にて加熱したところ、高位相差が発現した。位相差を表1に示す。
[Example 13]
A three-neck flask equipped with a dropping funnel was charged with 13.2 ml of water, and 0.6 mmol of compound 6, 1.6 mmol of compound 15, and 4.5 mmol of sodium hydroxide were dissolved and stirred. 1.0 ml of a 2.0 wt % aqueous solution of tetra-n-butylammonium bromide was added as a catalyst, and the atmosphere inside the apparatus was replaced with nitrogen. A solution of 1.8 mmol of compound 23 and 0.5 mmol of compound 16 dissolved in 11.2 ml of chloroform was added dropwise to the dropping funnel, and the mixture was stirred at room temperature for three hours. The reaction solution was poured into methanol, and the precipitate was filtered and then vacuum dried to obtain polymer 13 (yield 82%). 6.0% by mass of polymer 13 was dissolved in 94.0% by mass of hexafluoro-2-propanol. This was cast onto a quartz substrate, spin-coated at 5000 rpm for 60 seconds, and dried in an oven at 150°C for 30 minutes to obtain a thin film (thickness 1.0 μm). The obtained thin film was irradiated with 248 nm polarized ultraviolet light at 500 mJ/ cm2 (photoreaction rate of 50% or less) and then heated at 250°C, whereupon a high retardation was exhibited. The retardation is shown in Table 1.

[実施例14]
滴下漏斗を具備した三口フラスコに、水12mlを取り、化合物6 0.3mmolと化合物17 2.2mmolと水酸化ナトリウム4.8mmolを溶解させ撹拌した。触媒として臭化テトラn-ブチルアンモニウムの2.0重量%水溶液を1.0ml加え、装置内を窒素置換した。クロロホルム12mlに化合物23 2.4mmolを溶解させた溶液を滴下漏斗に取り、滴下した後、常温で三時間撹拌した。反応後の溶液をメタノールへ投入し、沈殿物をろ別した後、真空乾燥して重合体14を得た(収率73%)。6.0質量%の重合体14を、ヘキサフルオロ-2-プロパノール94.0質量%へ溶解した。これを石英基板上に流延して6500rpmで60秒間スピンコートし、オーブン中150℃で30分乾燥させ薄膜(膜厚1.0μm)を得た。得られた薄膜に248nmの偏光紫外光を500mJ/cm照射した後(光反応率50%以下)、250℃にて加熱したところ、高位相差が発現した。位相差を表1に示す。
[Example 14]
A three-neck flask equipped with a dropping funnel was charged with 12 ml of water, and 0.3 mmol of compound 6, 2.2 mmol of compound 17, and 4.8 mmol of sodium hydroxide were dissolved and stirred. 1.0 ml of a 2.0 wt % aqueous solution of tetra-n-butylammonium bromide was added as a catalyst, and the atmosphere inside the apparatus was replaced with nitrogen. A solution of 2.4 mmol of compound 23 dissolved in 12 ml of chloroform was added dropwise to the dropping funnel, and the mixture was stirred at room temperature for three hours. The reaction solution was poured into methanol, and the precipitate was filtered and then vacuum dried to obtain polymer 14 (yield 73%). 6.0% by mass of polymer 14 was dissolved in 94.0% by mass of hexafluoro-2-propanol. This was cast onto a quartz substrate, spin-coated at 6500 rpm for 60 seconds, and dried in an oven at 150°C for 30 minutes to obtain a thin film (thickness 1.0 μm). The obtained thin film was irradiated with 248 nm polarized ultraviolet light at 500 mJ/ cm2 (photoreaction rate of 50% or less) and then heated at 250°C, whereupon a high retardation was exhibited. The retardation is shown in Table 1.

[実施例15]
滴下漏斗を具備した三口フラスコに、水2.2mlを取り、化合物7 0.63mmolと水酸化ナトリウム0.92mmolを溶解させ撹拌した。触媒として臭化テトラn-ブチルアンモニウムの2.0重量%水溶液を0.2ml加え、装置内を窒素置換した。ジクロロメタン2.2mlにセバコイルクロリド(化合物22)0.63mmolを溶解させた溶液を滴下漏斗に取り、滴下した後、常温で3時間撹拌した。反応後の溶液をメタノールへ投入し、沈殿物をろ別した後、真空乾燥して重合体15を得た(収率100%)。7.0質量%の重合体15を、1,1,1,3,3,3-ヘキサフルオロ-―2―プロパノール93.0質量%へ溶解した。これを石英基板上に流延して2500rpmで60秒間スピンコートし、オーブン中150℃で30分乾燥させ薄膜(膜厚0.9μm)を得た。得られた薄膜に248nmの偏光紫外光を5000mJ/cm照射した後(光反応率8.7%)、150℃にて加熱したところ、高位相差が発現した。位相差を表1に示す。
[Example 15]
2.2 ml of water was placed in a three-neck flask equipped with a dropping funnel, and 0.63 mmol of compound 7 and 0.92 mmol of sodium hydroxide were dissolved and stirred. 0.2 ml of a 2.0 wt % aqueous solution of tetra-n-butylammonium bromide was added as a catalyst, and the atmosphere inside the apparatus was replaced with nitrogen. A solution of 0.63 mmol of sebacoyl chloride (compound 22) dissolved in 2.2 ml of dichloromethane was placed in the dropping funnel and added dropwise, followed by stirring at room temperature for 3 hours. The reaction solution was poured into methanol, and the precipitate was filtered and then vacuum dried to obtain polymer 15 (yield 100%). 7.0% by mass of polymer 15 was dissolved in 93.0% by mass of 1,1,1,3,3,3-hexafluoro-2-propanol. This was cast onto a quartz substrate, spin-coated at 2500 rpm for 60 seconds, and dried in an oven at 150°C for 30 minutes to obtain a thin film (film thickness 0.9 μm). The obtained thin film was irradiated with 248 nm polarized ultraviolet light at 5000 mJ/ cm2 (photoreaction rate 8.7%) and then heated at 150°C, whereupon a high retardation was exhibited. The retardation is shown in Table 1.

[実施例16]
滴下漏斗を具備した三口フラスコに、水14mlを取り、化合物9 0.6mmolと化合物8 2.2mmolと水酸化ナトリウム5.6mmolを溶解させ撹拌した。触媒として臭化テトラn-ブチルアンモニウムの2.0重量%水溶液を1.1ml加え、装置内を窒素置換した。クロロホルム14mlに化合物23 2.8mmolを溶解させた溶液を滴下漏斗に取り、滴下した後、常温で三時間撹拌した。反応後の溶液をメタノールへ投入し、沈殿物をろ別した後、真空乾燥して重合体16を得た(収率91%)。6.0質量%の重合体16を、ヘキサフルオロ-2-プロパノール94.0質量%へ溶解した。これを石英基板上に流延して4000rpmで60秒間スピンコートし、オーブン中150℃で30分乾燥させ薄膜(膜厚1.0μm)を得た。得られた薄膜に248nmの偏光紫外光を500mJ/cm照射した後(光反応率50%以下)、250℃にて加熱したところ、高位相差が発現した。位相差を表1に示す。
[Example 16]
A three-neck flask equipped with a dropping funnel was charged with 14 ml of water, and 0.6 mmol of compound 9, 2.2 mmol of compound 8, and 5.6 mmol of sodium hydroxide were dissolved and stirred. 1.1 ml of a 2.0 wt % aqueous solution of tetra-n-butylammonium bromide was added as a catalyst, and the atmosphere inside the apparatus was replaced with nitrogen. A solution of 2.8 mmol of compound 23 dissolved in 14 ml of chloroform was added dropwise to the dropping funnel, and the mixture was stirred at room temperature for three hours. The reaction solution was poured into methanol, and the precipitate was filtered and then vacuum dried to obtain polymer 16 (yield 91%). 6.0% by mass of polymer 16 was dissolved in 94.0% by mass of hexafluoro-2-propanol. This was cast onto a quartz substrate, spin-coated at 4000 rpm for 60 seconds, and dried in an oven at 150°C for 30 minutes to obtain a thin film (thickness 1.0 μm). The obtained thin film was irradiated with 248 nm polarized ultraviolet light at 500 mJ/ cm2 (photoreaction rate of 50% or less) and then heated at 250°C, whereupon a high retardation was exhibited. The retardation is shown in Table 1.

[実施例17]
滴下漏斗を具備した三口フラスコに、水12mlを取り、化合物9 2.4mmolと水酸化ナトリウム4.8mmolを溶解させ撹拌した。触媒として臭化テトラn-ブチルアンモニウムの2.0重量%水溶液を0.9ml加え、装置内を窒素置換した。クロロホルム12mlに化合物23 2.4mmolを溶解させた溶液を滴下漏斗に取り、滴下した後、常温で三時間撹拌した。反応後の溶液をメタノールへ投入し、沈殿物をろ別した後、真空乾燥して重合体17を得た(収率90%)。6.0質量%の重合体17を、ヘキサフルオロ-2-プロパノール94.0質量%へ溶解した。これを石英基板上に流延して6000rpmで60秒間スピンコートし、オーブン中150℃で30分乾燥させ薄膜(膜厚1.0μm)を得た。得られた薄膜に248nmの偏光紫外光を500mJ/cm照射した後(光反応率50%以下)、250℃にて加熱したところ、高位相差が発現した。位相差を表1に示す。
[Example 17]
A three-neck flask equipped with a dropping funnel was charged with 12 ml of water, and 2.4 mmol of compound 9 and 4.8 mmol of sodium hydroxide were dissolved and stirred. 0.9 ml of a 2.0 wt % aqueous solution of tetra-n-butylammonium bromide was added as a catalyst, and the atmosphere inside the apparatus was replaced with nitrogen. A solution of 2.4 mmol of compound 23 dissolved in 12 ml of chloroform was charged to the dropping funnel, added dropwise, and then stirred at room temperature for three hours. The reaction solution was poured into methanol, and the precipitate was filtered and then dried in vacuo to obtain polymer 17 (yield 90%). 6.0% by mass of polymer 17 was dissolved in 94.0% by mass of hexafluoro-2-propanol. This was cast onto a quartz substrate, spin-coated at 6000 rpm for 60 seconds, and dried in an oven at 150°C for 30 minutes to obtain a thin film (thickness 1.0 μm). The obtained thin film was irradiated with 248 nm polarized ultraviolet light at 500 mJ/ cm2 (photoreaction rate of 50% or less) and then heated at 250°C, whereupon a high retardation was exhibited. The retardation is shown in Table 1.

[実施例18]
滴下漏斗を具備した三口フラスコに、水11.4mlを取り、化合物10 2.2mmolと水酸化ナトリウム4.4mmolを溶解させ撹拌した。触媒として臭化テトラn-ブチルアンモニウムの2.0重量%水溶液を0.6ml加え、装置内を窒素置換した。クロロホルム11.4mlに化合物22 2.2mmolを溶解させた溶液を滴下漏斗に取り、滴下した後、常温で三時間撹拌した。反応後の溶液をメタノールへ投入し、沈殿物をろ別した後、真空乾燥して重合体18を得た(収率63%)。6.0質量%の重合体18を、ヘキサフルオロ-2-プロパノール94.0質量%へ溶解した。これを石英基板上に流延して3000rpmで60秒間スピンコートし、オーブン中150℃で30分乾燥させ薄膜(膜厚1.0μm)を得た。得られた薄膜に248nmの偏光紫外光を500mJ/cm照射した後(光反応率50%以下)、100℃にて加熱したところ、高位相差が発現した。位相差を表1に示す。
[Example 18]
A three-neck flask equipped with a dropping funnel was charged with 11.4 ml of water, and 2.2 mmol of compound 10 and 4.4 mmol of sodium hydroxide were dissolved and stirred. 0.6 ml of a 2.0 wt % aqueous solution of tetra-n-butylammonium bromide was added as a catalyst, and the atmosphere inside the apparatus was replaced with nitrogen. A solution of 2.2 mmol of compound 22 dissolved in 11.4 ml of chloroform was added dropwise to the dropping funnel, and the mixture was stirred at room temperature for three hours. The reaction solution was poured into methanol, and the precipitate was filtered and then vacuum dried to obtain polymer 18 (yield 63%). 6.0% by mass of polymer 18 was dissolved in 94.0% by mass of hexafluoro-2-propanol. This was cast onto a quartz substrate, spin-coated at 3000 rpm for 60 seconds, and dried in an oven at 150°C for 30 minutes to obtain a thin film (thickness 1.0 μm). The obtained thin film was irradiated with 248 nm polarized ultraviolet light at 500 mJ/ cm2 (photoreaction rate of 50% or less) and then heated at 100°C, whereupon a high retardation was exhibited. The retardation is shown in Table 1.

[実施例19]
滴下漏斗を具備した三口フラスコに、水10mlを取り、化合物10 1.9mmolと水酸化ナトリウム3.8mmolを溶解させ撹拌した。触媒として臭化テトラn-ブチルアンモニウムの2.0重量%水溶液を0.5ml加え、装置内を窒素置換した。クロロホルム10mlに化合物22 0.4mmolと化合物23 1.5mmolを溶解させた溶液を滴下漏斗に取り、滴下した後、常温で三時間撹拌した。反応後の溶液をメタノールへ投入し、沈殿物をろ別した後、真空乾燥して重合体19を得た(収率71%)。6.0質量%の重合体19を、ヘキサフルオロ-2-プロパノール94.0質量%へ溶解した。これを石英基板上に流延して3000rpmで60秒間スピンコートし、オーブン中150℃で30分乾燥させ薄膜(膜厚1.0μm)を得た。得られた薄膜に248nmの偏光紫外光を500mJ/cm照射した後(光反応率50%以下)、250℃にて加熱したところ、高位相差が発現した。位相差を表1に示す。
[Example 19]
A three-neck flask equipped with a dropping funnel was charged with 10 ml of water, and 1.9 mmol of compound 10 and 3.8 mmol of sodium hydroxide were dissolved and stirred. 0.5 ml of a 2.0 wt % aqueous solution of tetra-n-butylammonium bromide was added as a catalyst, and the inside of the apparatus was purged with nitrogen. A solution of 0.4 mmol of compound 22 and 1.5 mmol of compound 23 dissolved in 10 ml of chloroform was added dropwise to the dropping funnel, and the mixture was stirred at room temperature for three hours. The reaction solution was poured into methanol, and the precipitate was filtered and then dried in vacuo to obtain polymer 19 (yield 71%). 6.0% by mass of polymer 19 was dissolved in 94.0% by mass of hexafluoro-2-propanol. This was cast onto a quartz substrate, spin-coated at 3000 rpm for 60 seconds, and dried in an oven at 150°C for 30 minutes to obtain a thin film (thickness 1.0 μm). The obtained thin film was irradiated with 248 nm polarized ultraviolet light at 500 mJ/ cm2 (photoreaction rate of 50% or less) and then heated at 250°C, whereupon a high retardation was exhibited. The retardation is shown in Table 1.

[実施例20]
滴下漏斗を具備した三口フラスコに、水10mlを取り、化合物10 1.9mmolと水酸化ナトリウム3.8mmolを溶解させ撹拌した。触媒として臭化テトラn-ブチルアンモニウムの2.0重量%水溶液を0.5ml加え、装置内を窒素置換した。クロロホルム10mlに化合物23 1.9mmolを溶解させた溶液を滴下漏斗に取り、滴下した後、常温で三時間撹拌した。反応後の溶液をメタノールへ投入し、沈殿物をろ別した後、真空乾燥して重合体20を得た(収率76%)。6.0質量%の重合体20を、ヘキサフルオロ-2-プロパノール94.0質量%へ溶解した。これを石英基板上に流延して4000rpmで60秒間スピンコートし、オーブン中150℃で30分乾燥させ薄膜(膜厚1.0μm)を得た。得られた薄膜に248nmの偏光紫外光を500mJ/cm照射した後(光反応率0.6%)、250℃にて加熱したところ、高位相差が発現した。位相差を表1に示す。
[Example 20]
A three-neck flask equipped with a dropping funnel was charged with 10 ml of water, and 1.9 mmol of compound 10 and 3.8 mmol of sodium hydroxide were dissolved and stirred. 0.5 ml of a 2.0 wt % aqueous solution of tetra-n-butylammonium bromide was added as a catalyst, and the inside of the apparatus was purged with nitrogen. A solution of 1.9 mmol of compound 23 dissolved in 10 ml of chloroform was charged to the dropping funnel, added dropwise, and then stirred at room temperature for three hours. The reaction solution was poured into methanol, and the precipitate was filtered and then dried in vacuo to obtain polymer 20 (yield 76%). 6.0% by mass of polymer 20 was dissolved in 94.0% by mass of hexafluoro-2-propanol. This was cast onto a quartz substrate, spin-coated at 4000 rpm for 60 seconds, and dried in an oven at 150°C for 30 minutes to obtain a thin film (thickness 1.0 μm). The obtained thin film was irradiated with 248 nm polarized ultraviolet light at 500 mJ/ cm2 (photoreaction rate 0.6%) and then heated at 250°C, whereupon a high retardation was exhibited. The retardation is shown in Table 1.

[実施例21]
滴下漏斗を具備した三口フラスコに、水16mlを取り、化合物11 0.3mmolと化合物8 2.8mmolと水酸化ナトリウム6.4mmolを溶解させ撹拌した。触媒として臭化テトラn-ブチルアンモニウムの2.0重量%水溶液を1.3ml加え、装置内を窒素置換した。クロロホルム16mlに化合物23 3.2mmolを溶解させた溶液を滴下漏斗に取り、滴下した後、常温で三時間撹拌した。反応後の溶液をメタノールへ投入し、沈殿物をろ別した後、真空乾燥して重合体21を得た(収率86%)。6.0質量%の重合体21を、ヘキサフルオロ-2-プロパノール94.0質量%へ溶解した。これを石英基板上に流延して5000rpmで60秒間スピンコートし、オーブン中150℃で30分乾燥させ薄膜(膜厚1.0μm)を得た。得られた薄膜に248nmの偏光紫外光を500mJ/cm照射した後(光反応率50%以下)、250℃にて加熱したところ、高位相差が発現した。位相差を表1に示す。
[Example 21]
A three-neck flask equipped with a dropping funnel was charged with 16 ml of water, and 0.3 mmol of compound 11, 2.8 mmol of compound 8, and 6.4 mmol of sodium hydroxide were dissolved and stirred. 1.3 ml of a 2.0 wt % aqueous solution of tetra-n-butylammonium bromide was added as a catalyst, and the atmosphere inside the apparatus was replaced with nitrogen. A solution of 3.2 mmol of compound 23 dissolved in 16 ml of chloroform was added dropwise to the dropping funnel, and the mixture was stirred at room temperature for three hours. The reaction solution was poured into methanol, and the precipitate was filtered and then dried in vacuo to obtain polymer 21 (yield 86%). 6.0% by mass of polymer 21 was dissolved in 94.0% by mass of hexafluoro-2-propanol. This was cast onto a quartz substrate, spin-coated at 5000 rpm for 60 seconds, and dried in an oven at 150°C for 30 minutes to obtain a thin film (thickness 1.0 μm). The obtained thin film was irradiated with 248 nm polarized ultraviolet light at 500 mJ/ cm2 (photoreaction rate of 50% or less) and then heated at 250°C, whereupon a high retardation was exhibited. The retardation is shown in Table 1.

[実施例22]
滴下漏斗を具備した三口フラスコに、水30.0mlを取り、化合物12 0.6mmolと化合物8 2.4mmolを水酸化ナトリウム12.0mmolを溶解させ撹拌した。触媒として臭化テトラn-ブチルアンモニウムの2.0重量%水溶液を2.4ml加え、装置内を窒素置換した。ジクロロメタン30.0mlに化合物23 3.0mmolを溶解させた溶液を滴下漏斗に取り、滴下した後、常温で三時間撹拌した。反応後の溶液をメタノールへ投入し、沈殿物をろ別した後、真空乾燥して重合体22を得た(収率55%)。6.0質量%の重合体22を、ヘキサフルオロ-2-プロパノール94.0質量%へ溶解した。これを石英基板上に流延して2000rpmで60秒間スピンコートし、オーブン中150℃で30分乾燥させ薄膜(膜厚1.0μm)を得た。得られた薄膜に248nmの偏光紫外光を500mJ/cm照射した後(光反応率50%以下)、210℃にて加熱したところ、高位相差が発現した。位相差を表1に示す。
[Example 22]
30.0 ml of water was placed in a three-neck flask equipped with a dropping funnel, and 0.6 mmol of compound 12, 2.4 mmol of compound 8, and 12.0 mmol of sodium hydroxide were dissolved and stirred. 2.4 ml of a 2.0 wt % aqueous solution of tetra-n-butylammonium bromide was added as a catalyst, and the atmosphere inside the apparatus was replaced with nitrogen. A solution of 3.0 mmol of compound 23 dissolved in 30.0 ml of dichloromethane was placed in the dropping funnel and added dropwise, followed by stirring at room temperature for three hours. The reaction solution was poured into methanol, and the precipitate was filtered and then dried in vacuo to obtain polymer 22 (yield 55%). 6.0% by mass of polymer 22 was dissolved in 94.0% by mass of hexafluoro-2-propanol. This was cast onto a quartz substrate, spin-coated at 2000 rpm for 60 seconds, and dried in an oven at 150°C for 30 minutes to obtain a thin film (thickness 1.0 μm). The obtained thin film was irradiated with 248 nm polarized ultraviolet light at 500 mJ/ cm2 (photoreaction rate of 50% or less) and then heated at 210°C, whereupon a high retardation was exhibited. The retardation is shown in Table 1.

[実施例23]
滴下漏斗を具備した三口フラスコに、水30.0mlを取り、化合物13 0.6mmolと化合物8 2.4mmolを水酸化ナトリウム12.0mmolを溶解させ撹拌した。触媒として臭化テトラn-ブチルアンモニウムの2.0重量%水溶液を2.4ml加え、装置内を窒素置換した。ジクロロメタン30.0mlに化合物23 3.0mmolを溶解させた溶液を滴下漏斗に取り、滴下した後、常温で三時間撹拌した。反応後の溶液をメタノールへ投入し、沈殿物をろ別した後、真空乾燥して重合体23を得た(収率73%)。6.0質量%の重合体23を、ヘキサフルオロ-2-プロパノール94.0質量%へ溶解した。これを石英基板上に流延して3000rpmで60秒間スピンコートし、オーブン中150℃で30分乾燥させ薄膜(膜厚1.0μm)を得た。得られた薄膜に248nmの偏光紫外光を500mJ/cm照射した後(光反応率50%以下)、250℃にて加熱したところ、高位相差が発現した。位相差を表1に示す。
[Example 23]
30.0 ml of water was placed in a three-neck flask equipped with a dropping funnel, and 0.6 mmol of compound 13, 2.4 mmol of compound 8, and 12.0 mmol of sodium hydroxide were dissolved and stirred. 2.4 ml of a 2.0 wt % aqueous solution of tetra-n-butylammonium bromide was added as a catalyst, and the atmosphere inside the apparatus was replaced with nitrogen. A solution of 3.0 mmol of compound 23 dissolved in 30.0 ml of dichloromethane was placed in the dropping funnel and added dropwise, followed by stirring at room temperature for three hours. The reaction solution was poured into methanol, and the precipitate was filtered and then vacuum dried to obtain polymer 23 (yield 73%). 6.0% by mass of polymer 23 was dissolved in 94.0% by mass of hexafluoro-2-propanol. This was cast onto a quartz substrate, spin-coated at 3000 rpm for 60 seconds, and dried in an oven at 150°C for 30 minutes to obtain a thin film (thickness 1.0 μm). The obtained thin film was irradiated with 248 nm polarized ultraviolet light at 500 mJ/ cm2 (photoreaction rate of 50% or less) and then heated at 250°C, whereupon a high retardation was exhibited. The retardation is shown in Table 1.

[実施例24]
滴下漏斗を具備した三口フラスコに、水16.8mlを取り、化合物14 2.1mmolと水酸化ナトリウム4.2mmolを溶解させ撹拌した。触媒として臭化テトラn-ブチルアンモニウムの2.0重量%水溶液を1.3ml加え、装置内を窒素置換した。ジクロロメタン16.8mlに化合物22 2.1mmolを溶解させた溶液を滴下漏斗に取り、滴下した後、常温で三時間撹拌した。反応後の溶液をメタノールへ投入し、沈殿物をろ別した後、真空乾燥して重合体24を得た(収率90%)。6.0質量%の重合体24を、ペンタフルオロフェノール31.3重量%、クロロホルム62.6質量%へ溶解した。これを石英基板上に流延して4000rpmで60秒間スピンコートし、オーブン中150℃で30分乾燥させ薄膜(膜厚1.0μm)を得た。得られた薄膜に248nmの偏光紫外光を1000mJ/cm照射した後(光反応率50%以下)、260℃にて加熱したところ、高位相差が発現した。位相差を表1に示す。
[Example 24]
A three-neck flask equipped with a dropping funnel was charged with 16.8 ml of water, and 2.1 mmol of compound 14 and 4.2 mmol of sodium hydroxide were dissolved and stirred. 1.3 ml of a 2.0 wt % aqueous solution of tetra-n-butylammonium bromide was added as a catalyst, and the inside of the apparatus was purged with nitrogen. A solution of 2.1 mmol of compound 22 dissolved in 16.8 ml of dichloromethane was added dropwise to the dropping funnel, and the mixture was stirred at room temperature for three hours. The reaction solution was poured into methanol, and the precipitate was filtered and then vacuum dried to obtain polymer 24 (yield 90%). 6.0 wt % of polymer 24 was dissolved in 31.3 wt % pentafluorophenol and 62.6 wt % chloroform. This was cast onto a quartz substrate, spin-coated at 4000 rpm for 60 seconds, and dried in an oven at 150 °C for 30 minutes to obtain a thin film (thickness 1.0 μm). The obtained thin film was irradiated with 248 nm polarized ultraviolet light at 1000 mJ/ cm2 (photoreaction rate of 50% or less) and then heated at 260°C, whereupon a high retardation was exhibited. The retardation is shown in Table 1.

[実施例25]
滴下漏斗を具備した三口フラスコに、水30.0mlを取り、化合物18 0.6mmolと化合物8 2.4mmolを水酸化ナトリウム12.0mmolを溶解させ撹拌した。触媒として臭化テトラn-ブチルアンモニウムの2.0重量%水溶液を2.4ml加え、装置内を窒素置換した。ジクロロメタン30.0mlに化合物23 3.0mmolを溶解させた溶液を滴下漏斗に取り、滴下した後、常温で三時間撹拌した。反応後の溶液をメタノールへ投入し、沈殿物をろ別した後、真空乾燥して重合体25を得た(収率49%)。6.0質量%の重合体25を、ヘキサフルオロ-2-プロパノール94.0質量%へ溶解した。これを石英基板上に流延して2500rpmで60秒間スピンコートし、オーブン中150℃で30分乾燥させ薄膜(膜厚1.0μm)を得た。得られた薄膜に248nmの偏光紫外光を1000mJ/cm照射した後(光反応率50%以下)、250℃にて加熱したところ、高位相差が発現した。位相差を表1に示す。
[Example 25]
30.0 ml of water was placed in a three-neck flask equipped with a dropping funnel, and 0.6 mmol of compound 18, 2.4 mmol of compound 8, and 12.0 mmol of sodium hydroxide were dissolved and stirred. 2.4 ml of a 2.0 wt % aqueous solution of tetra-n-butylammonium bromide was added as a catalyst, and the atmosphere inside the apparatus was replaced with nitrogen. A solution of 3.0 mmol of compound 23 dissolved in 30.0 ml of dichloromethane was placed in the dropping funnel and added dropwise, followed by stirring at room temperature for three hours. The reaction solution was poured into methanol, and the precipitate was filtered and then vacuum dried to obtain polymer 25 (yield 49%). 6.0% by mass of polymer 25 was dissolved in 94.0% by mass of hexafluoro-2-propanol. This was cast onto a quartz substrate, spin-coated at 2500 rpm for 60 seconds, and dried in an oven at 150°C for 30 minutes to obtain a thin film (thickness 1.0 μm). The obtained thin film was irradiated with 248 nm polarized ultraviolet light at 1000 mJ/ cm2 (photoreaction rate of 50% or less) and then heated at 250°C, whereupon a high retardation was exhibited. The retardation is shown in Table 1.

[実施例26]
滴下漏斗を具備した三口フラスコに、水100mlを取り、化合物18 5mmolと水酸化ナトリウム20mmolを溶解させ撹拌した。触媒として臭化テトラn-ブチルアンモニウムの2.0重量%水溶液を4ml加え、装置内を窒素置換した。ジクロロメタン50mlに化合物22 5mmolを溶解させた溶液を滴下漏斗に取り、滴下した後、常温で三時間撹拌した。反応後の溶液をメタノールへ投入し、沈殿物をろ別した後、真空乾燥して重合体26を得た(収率23%)。10.0質量%の重合体26を、テトラヒドロフラン90.0質量%へ溶解した。これを石英基板上に流延して1500rpmで60秒間スピンコートし、オーブン中80℃で30分乾燥させ薄膜(膜厚1.0μm)を得た。得られた薄膜に248nmの偏光紫外光を1000mJ/cm照射した後(光反応率50%以下)、100℃にて加熱したところ、高位相差が発現した。位相差を表1に示す。
[Example 26]
A three-neck flask equipped with a dropping funnel was charged with 100 ml of water, and 5 mmol of compound 18 and 20 mmol of sodium hydroxide were dissolved and stirred. 4 ml of a 2.0 wt % aqueous solution of tetra-n-butylammonium bromide was added as a catalyst, and the inside of the apparatus was purged with nitrogen. A solution of 5 mmol of compound 22 dissolved in 50 ml of dichloromethane was added dropwise to the dropping funnel, and the mixture was stirred at room temperature for three hours. The reaction solution was poured into methanol, and the precipitate was filtered and then vacuum dried to obtain polymer 26 (yield 23%). 10.0% by mass of polymer 26 was dissolved in 90.0% by mass of tetrahydrofuran. This was cast onto a quartz substrate, spin-coated at 1500 rpm for 60 seconds, and dried in an oven at 80°C for 30 minutes to obtain a thin film (thickness 1.0 μm). The obtained thin film was irradiated with 248 nm polarized ultraviolet light at 1000 mJ/ cm2 (photoreaction rate of 50% or less) and then heated at 100°C, whereupon a high retardation was exhibited. The retardation is shown in Table 1.

[実施例27]
滴下漏斗を具備した三口フラスコに、水11mlを取り、化合物8 2.2mmolと水酸化ナトリウム4.4mmolを溶解させ撹拌した。触媒として臭化テトラn-ブチルアンモニウムの2.0重量%水溶液を0.9ml加え、装置内を窒素置換した。クロロホルム22mlに化合物19 2.2mmolを溶解させた溶液を滴下漏斗に取り、滴下した後、常温で三時間撹拌した。反応後の溶液をメタノールへ投入し、沈殿物をろ別した後、真空乾燥して重合体27を得た(収率91%)。6.0質量%の重合体27を、ヘキサフルオロ-2-プロパノール94.0質量%へ溶解した。これを石英基板上に流延して3000rpmで60秒間スピンコートし、オーブン中150℃で30分乾燥させ薄膜(膜厚1.0μm)を得た。得られた薄膜に248nmの偏光紫外光を1000mJ/cm照射した後(光反応率0.6%)、300℃にて加熱したところ、高位相差が発現した。位相差を表1に示す。
[Example 27]
A three-neck flask equipped with a dropping funnel was charged with 11 ml of water, and 2.2 mmol of compound 8 and 4.4 mmol of sodium hydroxide were dissolved and stirred. 0.9 ml of a 2.0 wt % aqueous solution of tetra-n-butylammonium bromide was added as a catalyst, and the atmosphere inside the apparatus was replaced with nitrogen. A solution of 2.2 mmol of compound 19 dissolved in 22 ml of chloroform was placed in the dropping funnel and added dropwise, followed by stirring at room temperature for three hours. The reaction solution was poured into methanol, and the precipitate was filtered and then vacuum dried to obtain polymer 27 (yield 91%). 6.0% by mass of polymer 27 was dissolved in 94.0% by mass of hexafluoro-2-propanol. This was cast onto a quartz substrate, spin-coated at 3000 rpm for 60 seconds, and dried in an oven at 150°C for 30 minutes to obtain a thin film (thickness 1.0 μm). The obtained thin film was irradiated with 248 nm polarized ultraviolet light at 1000 mJ/ cm2 (photoreaction rate 0.6%) and then heated at 300°C, whereupon a high retardation was exhibited. The retardation is shown in Table 1.

[実施例28]
滴下漏斗を具備した三口フラスコに、水14mlを取り、化合物8 2.8mmolと水酸化ナトリウム5.7mmolを溶解させ撹拌した。触媒として臭化テトラn-ブチルアンモニウムの2.0重量%水溶液を1.1ml加え、装置内を窒素置換した。クロロホルム28mlに化合物20 2.8mmolを溶解させた溶液を滴下漏斗に取り、滴下した後、常温で三時間撹拌した。反応後の溶液をメタノールへ投入し、沈殿物をろ別した後、真空乾燥して重合体28を得た(収率94%)。6.0質量%の重合体28を、ヘキサフルオロ-2-プロパノール94.0質量%へ溶解した。これを石英基板上に流延して4500rpmで60秒間スピンコートし、オーブン中150℃で30分乾燥させ薄膜(膜厚1.0μm)を得た。得られた薄膜に248nmの偏光紫外光を500mJ/cm照射した後(光反応率50%以下)、250℃にて加熱したところ、高位相差が発現した。位相差を表1に示す。
[Example 28]
A three-neck flask equipped with a dropping funnel was charged with 14 ml of water, and 2.8 mmol of compound 8 and 5.7 mmol of sodium hydroxide were dissolved and stirred. 1.1 ml of a 2.0 wt % aqueous solution of tetra-n-butylammonium bromide was added as a catalyst, and the inside of the apparatus was purged with nitrogen. A solution of 2.8 mmol of compound 20 dissolved in 28 ml of chloroform was added dropwise to the dropping funnel, and the mixture was stirred at room temperature for three hours. The reaction solution was poured into methanol, and the precipitate was filtered and then vacuum dried to obtain polymer 28 (yield 94%). 6.0% by mass of polymer 28 was dissolved in 94.0% by mass of hexafluoro-2-propanol. This was cast onto a quartz substrate, spin-coated at 4500 rpm for 60 seconds, and dried in an oven at 150°C for 30 minutes to obtain a thin film (thickness 1.0 μm). The obtained thin film was irradiated with 248 nm polarized ultraviolet light at 500 mJ/ cm2 (photoreaction rate of 50% or less) and then heated at 250°C, whereupon a high retardation was exhibited. The retardation is shown in Table 1.

[実施例29]
滴下漏斗を具備した三口フラスコに、水30.0mlを取り、化合物21 0.6mmolと化合物8 2.4mmolと水酸化ナトリウム12.0mmolを溶解させ撹拌した。触媒として臭化テトラn-ブチルアンモニウムの2.0重量%水溶液を2.4ml加え、装置内を窒素置換した。クロロホルム30.0mlに化合物23 3.0mmolを溶解させた溶液を滴下漏斗に取り、滴下した後、常温で三時間撹拌した。反応後の溶液をメタノールへ投入し、沈殿物をろ別した後、真空乾燥して重合体29を得た(収率38%)。6.0質量%の重合体29を、ヘキサフルオロ-2-プロパノール94.0質量%へ溶解した。これを石英基板上に流延して2500rpmで60秒間スピンコートし、オーブン中150℃で30分乾燥させ薄膜(膜厚1.0μm)を得た。得られた薄膜に248nmの偏光紫外光を1000mJ/cm照射した後(光反応率50%以下)、250℃にて加熱したところ、高位相差が発現した。位相差を表1に示す。
[Example 29]
30.0 ml of water was placed in a three-neck flask equipped with a dropping funnel, and 0.6 mmol of compound 21, 2.4 mmol of compound 8, and 12.0 mmol of sodium hydroxide were dissolved and stirred. 2.4 ml of a 2.0 wt % aqueous solution of tetra-n-butylammonium bromide was added as a catalyst, and the atmosphere inside the apparatus was replaced with nitrogen. A solution of 3.0 mmol of compound 23 dissolved in 30.0 ml of chloroform was placed in the dropping funnel and added dropwise, followed by stirring at room temperature for three hours. The reaction solution was poured into methanol, and the precipitate was filtered and then vacuum dried to obtain polymer 29 (yield 38%). 6.0% by mass of polymer 29 was dissolved in 94.0% by mass of hexafluoro-2-propanol. This was cast onto a quartz substrate, spin-coated at 2500 rpm for 60 seconds, and dried in an oven at 150°C for 30 minutes to obtain a thin film (thickness 1.0 μm). The obtained thin film was irradiated with 248 nm polarized ultraviolet light at 1000 mJ/ cm2 (photoreaction rate of 50% or less) and then heated at 250°C, whereupon a high retardation was exhibited. The retardation is shown in Table 1.

[実施例30]
滴下漏斗を具備した三口フラスコに、水16.5mlを取り、化合物8 3.3mmolと水酸化ナトリウム6.6mmolを溶解させ撹拌した。触媒として臭化テトラn-ブチルアンモニウムの2.0重量%水溶液を1.4ml加え、装置内を窒素置換した。クロロホルム16.5mlに化合物24 3.3mmolを溶解させた溶液を滴下漏斗に取り、滴下した後、常温で三時間撹拌した。反応後の溶液をメタノールへ投入し、沈殿物をろ別した後、真空乾燥して重合体30を得た(収率92%)。6.0質量%の重合体30を、ヘキサフルオロ-2-プロパノール94.0質量%へ溶解した。これを石英基板上に流延して3000rpmで60秒間スピンコートし、オーブン中150℃で30分乾燥させ薄膜(膜厚1.0μm)を得た。得られた薄膜に248nmの偏光紫外光を1000mJ/cm照射した後(光反応率50%以下)、250℃にて加熱したところ、高位相差が発現した。位相差を表1に示す。
(化合物24)
[Example 30]
A three-neck flask equipped with a dropping funnel was charged with 16.5 ml of water, and 3.3 mmol of compound 8 and 6.6 mmol of sodium hydroxide were dissolved and stirred. 1.4 ml of a 2.0 wt % aqueous solution of tetra-n-butylammonium bromide was added as a catalyst, and the atmosphere inside the apparatus was replaced with nitrogen. A solution of 3.3 mmol of compound 24 dissolved in 16.5 ml of chloroform was charged to the dropping funnel, added dropwise, and then stirred at room temperature for three hours. The reaction solution was poured into methanol, and the precipitate was filtered and then vacuum dried to obtain polymer 30 (yield 92%). 6.0% by mass of polymer 30 was dissolved in 94.0% by mass of hexafluoro-2-propanol. This was cast onto a quartz substrate, spin-coated at 3000 rpm for 60 seconds, and dried in an oven at 150°C for 30 minutes to obtain a thin film (thickness 1.0 μm). The obtained thin film was irradiated with 248 nm polarized ultraviolet light at 1000 mJ/ cm2 (photoreaction rate of 50% or less) and then heated at 250°C, whereupon a high retardation was exhibited. The retardation is shown in Table 1.
(Compound 24)

[実施例31]
6.0質量%の重合体3を、ヘキサフルオロ-2-プロパノール94.0質量%へ溶解した。これを石英基板上に流延して7000rpmで60秒間スピンコートし、オーブン中150℃で30分乾燥させ薄膜(膜厚1.0μm)を得た。得られた薄膜に248nmの紫外光を入射角60度として500mJ/cm照射した後(光反応率50%以下)、250℃にて加熱したところ、高位相差が発現した。位相差を表1に示す。
[Example 31]
6.0% by mass of polymer 3 was dissolved in 94.0% by mass of hexafluoro-2-propanol. This solution was cast onto a quartz substrate, spin-coated at 7000 rpm for 60 seconds, and dried in an oven at 150°C for 30 minutes to obtain a thin film (thickness 1.0 μm). The obtained thin film was irradiated with 248 nm ultraviolet light at an incident angle of 60° at 500 mJ/ cm2 (photoreaction rate 50% or less), and then heated at 250°C, whereupon a high retardation was exhibited. The retardation values are shown in Table 1.

[比較例1]
滴下漏斗を具備した三口フラスコに、水6.8mlを取り、化合物1 1.4mmolと水酸化ナトリウム2.7mmolを溶解させ撹拌した。触媒として臭化テトラn-ブチルアンモニウムの2.0重量%水溶液を0.5ml加え、装置内を窒素置換した。ジクロロメタン6.8mlに4,4’-ビフェニルジカルボニルクロリド1.4mmolを溶解させた溶液を滴下漏斗に取り、滴下した後、常温で三時間撹拌した。反応後の溶液をメタノールへ投入し、沈殿物をろ別した後、真空乾燥して重合体1’を得た(収率54%)。4.7質量%の重合体1’を、ペンタフルオロフェノール31.8重量%、クロロホルム63.5質量%へ溶解した。これを石英基板上に流延して1500rpmで60秒間スピンコートし、オーブン中150℃で30分乾燥させ薄膜を得た。得られた薄膜に248nmの偏光紫外光を1000mJ/cm照射した後、350℃にて加熱したところ、高位相差は発現しなかった。位相差を表1に示す。
[Comparative Example 1]
A three-neck flask equipped with a dropping funnel was charged with 6.8 ml of water, and 1.4 mmol of compound 1 and 2.7 mmol of sodium hydroxide were dissolved and stirred. 0.5 ml of a 2.0 wt % aqueous solution of tetra-n-butylammonium bromide was added as a catalyst, and the atmosphere inside the apparatus was replaced with nitrogen. A solution of 1.4 mmol of 4,4'-biphenyldicarbonyl chloride dissolved in 6.8 ml of dichloromethane was added dropwise to the dropping funnel, followed by stirring at room temperature for three hours. The reaction solution was poured into methanol, and the precipitate was filtered and then vacuum dried to obtain polymer 1' (yield: 54%). 4.7% by mass of polymer 1' was dissolved in 31.8% by mass of pentafluorophenol and 63.5% by mass of chloroform. This was cast onto a quartz substrate, spin-coated at 1500 rpm for 60 seconds, and dried in an oven at 150°C for 30 minutes to obtain a thin film. The obtained thin film was irradiated with 248 nm polarized ultraviolet light at 1000 mJ/cm 2 and then heated at 350° C., but no high retardation was observed. The retardation is shown in Table 1.

[比較例2]
滴下漏斗を具備した三口フラスコに、水6.5mlを取り、化合物15 1.3mmolと水酸化ナトリウム2.6mmolを溶解させ撹拌した。触媒として臭化テトラn-ブチルアンモニウムの2.0重量%水溶液を0.5ml加え、装置内を窒素置換した。ジクロロメタン6.5mlにテレフタル酸クロリド1.3mmolを溶解させた溶液を滴下漏斗に取り、滴下した後、常温で三時間撹拌した。反応後の溶液をメタノールへ投入し、沈殿物をろ別した後、真空乾燥して重合体2’を得た(収率99%)。3.0質量%の重合体2’を、クロロホルム97.0質量%へ溶解した。これを石英基板上に流延して7000rpmで60秒間スピンコートし、オーブン中150℃で30分乾燥させ薄膜を得た。得られた薄膜に248nmの偏光紫外光を500mJ/cm照射した後、250℃にて加熱したところ、高位相差は発現しなかった。位相差を表1に示す。
[Comparative Example 2]
A three-necked flask equipped with a dropping funnel was charged with 6.5 ml of water, and 1.3 mmol of compound 15 and 2.6 mmol of sodium hydroxide were dissolved and stirred. 0.5 ml of a 2.0 wt % aqueous solution of tetra-n-butylammonium bromide was added as a catalyst, and the atmosphere inside the apparatus was replaced with nitrogen. A solution of 1.3 mmol of terephthaloyl chloride dissolved in 6.5 ml of dichloromethane was added dropwise to the dropping funnel, and the mixture was stirred at room temperature for three hours. The reaction solution was poured into methanol, and the precipitate was filtered and then vacuum dried to obtain polymer 2' (yield 99%). 3.0% by mass of polymer 2' was dissolved in 97.0% by mass of chloroform. This was cast onto a quartz substrate, spin-coated at 7000 rpm for 60 seconds, and dried in an oven at 150°C for 30 minutes to obtain a thin film. The obtained thin film was irradiated with 248 nm polarized ultraviolet light at 500 mJ/cm 2 and then heated at 250° C., but no high retardation was exhibited. The retardation is shown in Table 1.

[比較例3]
滴下漏斗を具備した三口フラスコに、水50mlを取り、4,4’-ジヒドロキシビフェニル10.0mmolと水酸化ナトリウム20.0mmolを溶解させ撹拌した。触媒として臭化テトラn-ブチルアンモニウムの2.0重量%水溶液を4.0ml加え、装置内を窒素置換した。ジクロロメタン50mlにセバコイルクロリド(化合物22)10.0mmolを溶解させた溶液を滴下漏斗に取り、滴下した後、常温で3時間撹拌した。反応後の溶液をメタノールへ投入し、沈殿物をろ別した後、真空乾燥して重合体3’を得た(収率94%)。2.5質量%の重合体3’を、ペンタフルオロフェノール32.5重量%、クロロホルム65.0質量%へ溶解した。これを石英基板上に流延して1500rpmで60秒間スピンコートし、オーブン中150℃で30分乾燥させ薄膜を得た。得られた薄膜に248nmの偏光紫外光を1000mJ/cm照射した後、200℃にて加熱したところ、高位相差は発現しなかった。位相差を表1に示す。
[Comparative Example 3]
50 ml of water was placed in a three-neck flask equipped with a dropping funnel, and 10.0 mmol of 4,4'-dihydroxybiphenyl and 20.0 mmol of sodium hydroxide were dissolved and stirred. 4.0 ml of a 2.0 wt % aqueous solution of tetra-n-butylammonium bromide was added as a catalyst, and the atmosphere inside the apparatus was replaced with nitrogen. A solution of 10.0 mmol of sebacoyl chloride (compound 22) dissolved in 50 ml of dichloromethane was placed in the dropping funnel and added dropwise, followed by stirring at room temperature for 3 hours. The reaction solution was poured into methanol, and the precipitate was filtered and then vacuum dried to obtain polymer 3' (yield 94%). 2.5% by mass of polymer 3' was dissolved in 32.5% by mass of pentafluorophenol and 65.0% by mass of chloroform. This was cast onto a quartz substrate, spin-coated at 1500 rpm for 60 seconds, and dried in an oven at 150°C for 30 minutes to obtain a thin film. The obtained thin film was irradiated with 248 nm polarized ultraviolet light at 1000 mJ/cm 2 and then heated at 200° C., but no high retardation was exhibited. The retardation is shown in Table 1.

[比較例4]
滴下漏斗を具備した三口フラスコに、水11mlを取り、ヒドロキノン2.2mmolと水酸化ナトリウム4.5mmolを溶解させ撹拌した。触媒として臭化テトラn-ブチルアンモニウムの2.0重量%水溶液を0.9ml加え、装置内を窒素置換した。クロロホルム11mlに化合物19 2.2mmolを溶解させた溶液を滴下漏斗に取り、滴下した後、常温で三時間撹拌した。反応後の溶液をメタノールへ投入し、沈殿物をろ別した後、真空乾燥して重合体4’を得た(収率86%)。6.0質量%の重合体4’を、ヘキサフルオロ-2-プロパノール94.0質量%へ溶解した。これを石英基板上に流延して7000rpmで60秒間スピンコートし、オーブン中150℃で30分乾燥させ薄膜を得た。得られた薄膜に248nmの偏光紫外光を1000mJ/cm照射した後、250℃にて加熱したところ、高位相差は発現しなかった。位相差を表1に示す。
[Comparative Example 4]
A three-neck flask equipped with a dropping funnel was charged with 11 ml of water, and 2.2 mmol of hydroquinone and 4.5 mmol of sodium hydroxide were dissolved and stirred. 0.9 ml of a 2.0 wt % aqueous solution of tetra-n-butylammonium bromide was added as a catalyst, and the atmosphere inside the apparatus was replaced with nitrogen. A solution of 2.2 mmol of compound 19 dissolved in 11 ml of chloroform was placed in the dropping funnel and added dropwise, followed by stirring at room temperature for three hours. The reaction solution was poured into methanol, and the precipitate was filtered and then dried in vacuo to obtain polymer 4' (yield 86%). 6.0% by mass of polymer 4' was dissolved in 94.0% by mass of hexafluoro-2-propanol. This was cast onto a quartz substrate, spin-coated at 7000 rpm for 60 seconds, and dried in an oven at 150°C for 30 minutes to obtain a thin film. The obtained thin film was irradiated with 248 nm polarized ultraviolet light at 1000 mJ/cm 2 and then heated at 250° C., but no high retardation was exhibited. The retardation is shown in Table 1.

表1から明らかなように、実施例1~31の重合体は、偏光紫外線または斜め入射紫外線の照射と加熱処理により予想外の位相差Reを発現することが確認された。本願の重合体が特異な性能を示すことは比較例1~4と比較することでより顕著となる。As is clear from Table 1, the polymers of Examples 1 to 31 were confirmed to exhibit unexpected retardation Re upon irradiation with polarized UV light or obliquely incident UV light and heat treatment. The unique performance of the polymers of the present application becomes even more apparent when compared with Comparative Examples 1 to 4.

[実施例32]
3.5質量%の重合体10を、ヘキサフルオロ-2-プロパノール96.5質量%へ溶解した。これを石英基板上に流延して4500rpmで60秒間スピンコートし、オーブン中150℃で30分乾燥させ薄膜(膜厚0.5μm)を得た。得られた薄膜に248nmの偏光紫外光を500mJ/cm照射した後(光反応率50%以下)、250℃にて加熱したところ、高位相差が発現した。
1.5mm×20mmに切り取った厚さ25μmのPETフィルム(東レ製、製品名:ルミラー(R)T60)2枚をスペーサーとして、本薄膜が積層された石英板2枚を薄膜が内側に、かつ偏光紫外光が照射された方向が平行になるように重ね合わせ、液晶注入口エリアとなる部分を除く石英板の周辺に瞬間接着剤(東亞合成製、アロンアルフア201)で接着して液晶空セルとした。接着後、液晶空セルに50℃で加熱した4-シアノ-4'-ペンチルビフェニルを注入し、液晶セルとした。得られた液晶セルについて、偏光顕微鏡を用いて薄膜に偏光紫外光が照射された方向に対して偏光子の角度が0°、45°、90°となるように3方向観察したところ、顕微鏡像は暗、明、暗と変化し、液晶ダイレクタが均一に整って配向していることを確認した。
本明細書において、液晶ダイレクタとは液晶性分子の長軸が配向している方向(配向主軸)のベクトルを意図する。
[Example 32]
3.5% by mass of polymer 10 was dissolved in 96.5% by mass of hexafluoro-2-propanol. This solution was cast onto a quartz substrate, spin-coated at 4500 rpm for 60 seconds, and dried in an oven at 150°C for 30 minutes to obtain a thin film (thickness 0.5 μm). The obtained thin film was irradiated with 500 mJ/ cm2 of polarized ultraviolet light at 248 nm (photoreaction rate 50% or less) and then heated at 250°C, whereupon a high retardation was observed.
Using two 25 μm thick PET films (manufactured by Toray Industries, product name: Lumirror(R) T60) cut to 1.5 mm x 20 mm as spacers, two quartz plates with the thin film laminated thereon were stacked so that the thin film was facing inward and the direction of irradiation with polarized UV light was parallel. The quartz plates were then bonded with instant adhesive (manufactured by Toagosei, Aron Alpha 201) around the periphery, excluding the liquid crystal injection area, to form an empty liquid crystal cell. After bonding, 4-cyano-4'-pentylbiphenyl heated to 50°C was injected into the empty liquid crystal cell to form a liquid crystal cell. The resulting liquid crystal cell was observed using a polarizing microscope in three directions, with the polarizer angle at 0°, 45°, and 90° relative to the direction of irradiation of the thin film with polarized UV light. The microscope image changed from dark to light to dark, confirming that the liquid crystal directors were uniformly aligned.
In this specification, the liquid crystal director refers to a vector of the direction in which the major axes of liquid crystal molecules are aligned (main alignment axis).

[実施例33]
4.2質量%の重合体27を、ヘキサフルオロ-2-プロパノール95.8質量%へ溶解した。これを石英基板上に流延して4000rpmで60秒間スピンコートし、オーブン中150℃で30分乾燥させ薄膜(膜厚0.5μm)を得た。得られた薄膜に248nmの偏光紫外光を500mJ/cm照射した後(光反応率50%以下)、250℃にて加熱したところ、高位相差が発現した。
1.5mm×20mmに切り取った厚さ25μmのPETフィルム(東レ製、製品名:ルミラー(R)T60)2枚をスペーサーとして、本薄膜が積層された石英板2枚を薄膜が内側に、かつ偏光紫外光が照射された方向が平行になるように重ね合わせ、液晶注入口エリアとなる部分を除く石英板の周辺に瞬間接着剤(東亞合成製、アロンアルフア201)で接着して液晶空セルとした。接着後、液晶空セルに50℃で加熱した4-シアノ-4'-ペンチルビフェニルを注入し、液晶セルとした。得られた液晶セルについて、偏光顕微鏡を用いて薄膜に偏光紫外光が照射された方向に対して偏光子の角度が0°、45°、90°となるように3方向観察したところ、顕微鏡像は暗、明、暗と変化し、液晶ダイレクタが均一に整って配向していることを確認した。
[Example 33]
4.2% by mass of polymer 27 was dissolved in 95.8% by mass of hexafluoro-2-propanol. This solution was cast onto a quartz substrate, spin-coated at 4000 rpm for 60 seconds, and dried in an oven at 150°C for 30 minutes to obtain a thin film (thickness 0.5 μm). The obtained thin film was irradiated with 500 mJ/ cm2 of polarized ultraviolet light at 248 nm (photoreaction rate 50% or less) and then heated at 250°C, whereupon a high retardation was exhibited.
Using two 25 μm thick PET films (manufactured by Toray Industries, product name: Lumirror(R) T60) cut to 1.5 mm x 20 mm as spacers, two quartz plates with the thin film laminated thereon were stacked so that the thin film was facing inward and the direction of irradiation with polarized UV light was parallel. The quartz plates were then bonded with instant adhesive (manufactured by Toagosei, Aron Alpha 201) around the periphery, excluding the liquid crystal injection area, to form an empty liquid crystal cell. After bonding, 4-cyano-4'-pentylbiphenyl heated to 50°C was injected into the empty liquid crystal cell to form a liquid crystal cell. The resulting liquid crystal cell was observed using a polarizing microscope in three directions, with the polarizer angle at 0°, 45°, and 90° relative to the direction of irradiation of the thin film with polarized UV light. The microscope image changed from dark to light to dark, confirming that the liquid crystal directors were uniformly aligned.

[比較例5]
10.0質量%のメタクリル酸メチルポリマーを、トルエン90.0質量%へ溶解した。これを石英基板上に流延して5000rpmで60秒間スピンコートし、オーブン中150℃で30分乾燥させ薄膜(膜厚0.5μm)を得た。得られた薄膜に248nmの偏光紫外光を500mJ/cm照射した後、250℃にて加熱したところ、高位相差は発現しなかった。
1.5mm×20mmに切り取った厚さ25μmのPETフィルム(東レ製、製品名:ルミラー(R)T60)2枚をスペーサーとして、本薄膜が積層された石英板2枚を薄膜が内側に、かつ偏光紫外光が照射された方向が平行になるように重ね合わせ、液晶注入口エリアとなる部分を除く石英板の周辺に瞬間接着剤(東亞合成製、アロンアルフア201)で接着して液晶空セルとした。接着後、液晶空セルに50℃で加熱した4-シアノ-4'-ペンチルビフェニルを注入し、液晶セルとした。得られた液晶セルについて、偏光顕微鏡を用いて薄膜に偏光紫外光が照射された方向に対して偏光子の角度が0°、45°、90°となるように3方向観察したところ、顕微鏡像は常に明るいままであり、液晶ダイレクタが均一に整って配向していないことを確認した。
[Comparative Example 5]
A 10.0% by weight solution of methyl methacrylate polymer was dissolved in 90.0% by weight of toluene. The solution was cast onto a quartz substrate, spin-coated at 5000 rpm for 60 seconds, and dried in an oven at 150°C for 30 minutes to obtain a thin film (thickness 0.5 μm). The resulting thin film was irradiated with 248 nm polarized ultraviolet light at 500 mJ/ cm2 and then heated at 250°C, but no high retardation was observed.
Using two 25 μm thick PET films (manufactured by Toray Industries, product name: Lumirror(R) T60) cut to 1.5 mm x 20 mm as spacers, two quartz plates with the thin film laminated thereon were stacked so that the thin film was facing inward and the direction of irradiation with polarized UV light was parallel. The quartz plates were then bonded with instant adhesive (manufactured by Toagosei, Aron Alpha 201) around the periphery, excluding the liquid crystal injection area, to form an empty liquid crystal cell. After bonding, 4-cyano-4'-pentylbiphenyl heated to 50°C was injected into the empty liquid crystal cell to form a liquid crystal cell. The resulting liquid crystal cell was observed using a polarizing microscope in three directions, with the polarizer angled at 0°, 45°, and 90° relative to the direction of irradiation of the thin film with polarized UV light. The microscope image remained bright at all times, confirming that the liquid crystal directors were not uniformly aligned.

実施例32および33の重合体は、紫外光の照射と加熱処理により液晶化合物を配向させることが確認された。

It was confirmed that the polymers of Examples 32 and 33 were capable of aligning liquid crystal compounds by irradiation with ultraviolet light and heat treatment.

Claims (5)

以下の式(2)で表される構成単位Aを有し、以下の式(3)で表される構成単位Bまたは以下の式(4)で表される構成単位Cのうち少なくとも1種を有する重合体。
(式(2)中、X~Xは、それぞれ独立に、置換基を有していてもよいベンゼン環を表。ここでX~Xにおける置換基は、それぞれ独立に、ハロゲン原子、メチル基からなる群の1種を表し、X~Xが置換基を有さない場合、水素原子である。YおよびYは、-O-を表す。ArおよびArは、それぞれ独立に、置換基を有していないベンゼン環を表す。
~Rは、それぞれ独立に、水素原子、シアノ基からなる群の1種を表す。LおよびLは、-O-、-NR-からなる群の1種を表す。ここで、Rは水素原子または炭素数1~5のアルキル基からなる群の1種を表す。LおよびLは、単結合または-CO-O-、-CO-NR-からなる群の1種を表す。
ここで、Rは水素原子または炭素数1~5のアルキル基からなる群の1種を表す。aおよびbは、それぞれ独立に、0または1を表す。)
(式(3)中、YおよびYは、それぞれ独立に、-O-、-CO-、-NR10-からなる群の1種を表す。ここで、R10は水素原子または炭素数1~5のアルキル基からなる群の1種を表す。X~Xは、それぞれ独立に、置換基を有していてもよい炭素数5~7の芳香環または置換基を有していてもよい炭素数5~7の脂環式炭化水素基のいずれかを表し、該芳香環中または該脂環式炭化水素基中の任意の炭素原子は窒素原子、酸素原子、硫黄原子に置換されてもよい。R11およびR12は、水素原子または炭素数1~5のアルキル基からなる群の1種を表す。cは、0または1を表す。)
(式(4)中、YおよびYは、それぞれ独立に、-O-、-CO-、-NR13-からなる群の1種を表す。ここで、R13は水素原子または炭素数1~5のアルキル基からなる群の1種を表す。Zは、炭素数5~7の脂環式炭化水素基、炭素数2~20の直鎖状のアルキレン基、炭素数4~20の分枝状のアルキレン基からなる群の一種を表す。)
A polymer having a structural unit A represented by the following formula (2), and having at least one of a structural unit B represented by the following formula (3) or a structural unit C represented by the following formula (4).
In formula (2), X 1 to X 3 each independently represent a benzene ring which may have a substituent. Here, the substituents in X 1 to X 3 each independently represent one kind of the group consisting of a halogen atom and a methyl group, and when X 1 to X 3 do not have a substituent, they are hydrogen atoms. Y 3 and Y 4 represent —O—. Ar 1 and Ar 2 each independently represent a benzene ring which does not have a substituent.
R 1 to R 4 each independently represent a hydrogen atom or a cyano group. L 1 and L 4 represent a -O- or -NR 5 - group. R 5 represents a hydrogen atom or an alkyl group having 1 to 5 carbon atoms. L 2 and L 3 represent a single bond or a -CO-O- or -CO-NR 6 - group.
Here, R6 represents a hydrogen atom or one of the group consisting of alkyl groups having 1 to 5 carbon atoms. a and b each independently represent 0 or 1.
(In formula (3), Y5 and Y6 each independently represent a group consisting of —O—, —CO—, and —NR 10 —. Here, R 10 represents a hydrogen atom or a group consisting of an alkyl group having 1 to 5 carbon atoms. X4 to X6 each independently represent an aromatic ring having 5 to 7 carbon atoms which may have a substituent, or an alicyclic hydrocarbon group having 5 to 7 carbon atoms which may have a substituent, and any carbon atom in the aromatic ring or the alicyclic hydrocarbon group may be substituted with a nitrogen atom, an oxygen atom, or a sulfur atom. R 11 and R 12 each independently represent a hydrogen atom or a group consisting of an alkyl group having 1 to 5 carbon atoms. c represents 0 or 1.)
(In formula (4), Y7 and Y8 each independently represent one selected from the group consisting of -O-, -CO-, and -NR13- . Here, R13 represents a hydrogen atom or an alkyl group having 1 to 5 carbon atoms. Z represents one selected from the group consisting of an alicyclic hydrocarbon group having 5 to 7 carbon atoms, a linear alkylene group having 2 to 20 carbon atoms, and a branched alkylene group having 4 to 20 carbon atoms.)
式(2)で表される構成単位Aおよび式(3)で表される構成単位Bを有する請求項1に記載の重合体。 The polymer according to claim 1, having a structural unit A represented by formula (2) and a structural unit B represented by formula (3). 請求項1または請求項2に記載の重合体を含む光学薄膜。 An optical thin film comprising the polymer described in claim 1 or claim 2. 請求項3に記載の薄膜を備えた位相差膜。 A retardation film comprising the thin film described in claim 3. 請求項3に記載の薄膜を備えた液晶配向膜。 A liquid crystal alignment film comprising the thin film described in claim 3.
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