JP7849161B2 - Dihydroxy compounds and methods for producing the same - Google Patents
Dihydroxy compounds and methods for producing the sameInfo
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Description
本発明は、ジヒドロキシ化合物およびその製造方法に関する。 This invention relates to dihydroxy compounds and methods for producing the same.
プラスチック光学材料は、ガラスなどの無機材料に比べて軽量で、割れにくく加工しやすいなどの特長を持ち、メガネレンズ、カメラレンズ、工業用レンズ、液晶ディスプレイ用位相差補償板、光ファイバーなどへの応用が期待されている。しかし、現在のプラスチック光学材料には解決すべき問題点が多い。例えば、レンズ用途においては、高屈折率、などの特性が要求されるが、現在実用化されているプラスチックレンズの屈折率は高屈折率ガラス材料の屈折率には至らず更なる性能向上が求められている。このような背景下、フルオレン誘導体やビナフチル誘導体が有機化合物としては高い屈折率を有することが示されている(特許文献1、2)。しかしながら、当該化合物を合成するには複数の反応工程を経る必要があり、より簡便な方法で高屈折率化合物を合成することが望まれている。 Plastic optical materials possess advantages such as being lighter, less prone to breakage, and easier to process compared to inorganic materials like glass, and are expected to have applications in eyeglass lenses, camera lenses, industrial lenses, phase difference compensation plates for liquid crystal displays, and optical fibers. However, current plastic optical materials have many problems that need to be solved. For example, in lens applications, properties such as high refractive index are required, but the refractive index of currently commercialized plastic lenses does not reach that of high refractive index glass materials, and further performance improvements are needed. Against this backdrop, fluorene derivatives and binaphthyl derivatives have been shown to have high refractive indexes as organic compounds (Patent Documents 1 and 2). However, synthesizing these compounds requires multiple reaction steps, and there is a desire for a simpler method to synthesize high refractive index compounds.
また、エポキシ樹脂の難燃剤として、炭素三重結合を有するフェノール誘導体が良好であり、化合物9として、4,4’-(プロパン-2,2-ジイル)ビス(2,6-ビス(フェニルエチニル)フェノール)が例示されているが、当該化合物の詳細な合成方法は記載されておらず、収率、純度、屈折率も記載されていない(特許文献3)。 Furthermore, phenol derivatives having a carbon triple bond are suitable as flame retardants for epoxy resins, and compound 9, 4,4'-(propane-2,2-diyl)bis(2,6-bis(phenylethynyl)phenol), is given as an example. However, the detailed synthesis method of this compound is not described, nor are the yield, purity, and refractive index (Patent Document 3).
本発明は、高屈折率かつ高純度であるジヒドロキシ化合物およびその製造方法を提供することを目的とする。 The present invention aims to provide a dihydroxy compound with a high refractive index and high purity, and a method for producing the same.
本発明者らは、以下の態様を有する本発明により、上記課題を解決できることを見出した。
《態様1》
HPLC純度が90面積%以上である下記式(1)で表されるジヒドロキシ化合物。
The inventors have found that the above problems can be solved by the present invention having the following aspects.
《Aspect 1》
A dihydroxy compound represented by the following formula (1), having an HPLC purity of 90 area percent or more.
(式中、Z1およびZ2はそれぞれ独立に炭素原子数1~20の芳香環、L1およびL2はそれぞれ独立に炭素原子数1~15のアルキレン基、m1およびm2はそれぞれ独立に0~5の整数、n1は1~4の整数、n2は0~4の整数である。)
《態様2》
下記式(2)で表される態様1に記載のジヒドロキシ化合物。
(In the formula, Z1 and Z2 are each independently aromatic rings having 1 to 20 carbon atoms, L1 and L2 are each independently alkylene groups having 1 to 15 carbon atoms, m1 and m2 are each independently integers from 0 to 5, n1 is an integer from 1 to 4, and n2 is an integer from 0 to 4.)
Appearance 2
The dihydroxy compound according to embodiment 1, represented by the following formula (2).
(式中、Z3~Z6はそれぞれ独立に炭素原子数1~20の芳香環、L1、L2、m1、m2は前記式(1)と同様である。)
《態様3》
下記式(3)で表される態様1または2に記載のジヒドロキシ化合物。
(In the formula, Z3 to Z6 are each independently aromatic rings having 1 to 20 carbon atoms, and L1 , L2 , m1 , and m2 are the same as in formula (1) above.)
《Aspect 3》
The dihydroxy compound according to embodiment 1 or 2, represented by the following formula (3).
(式中、L1、L2、m1、m2は前記式(1)と同様である。)
《態様4》
下記式(4)で表される態様1~3のいずれかに記載のジヒドロキシ化合物。
(In the formula, L1 , L2 , m1 , and m2 are the same as in formula (1) above.)
《Aspect 4》
A dihydroxy compound according to any one of embodiments 1 to 3, represented by the following formula (4).
《態様5》
屈折率が1.64以上である態様1~4のいずれかに記載のジヒドロキシ化合物。
《態様6》
下記式(5)で表されるジオール類と下記式(6)で表される芳香族アセチレン類とを反応溶媒中、パラジウム系触媒、銅系触媒および塩基の存在下で反応する、態様1に記載のジヒドロキシ化合物の製造方法。
《Aspect 5》
A dihydroxy compound according to any one of embodiments 1 to 4, wherein the refractive index is 1.64 or higher.
《Aspect 6》
A method for producing a dihydroxy compound according to Embodiment 1, comprising reacting a diol represented by the following formula (5) with an aromatic acetylene represented by the following formula (6) in a reaction solvent in the presence of a palladium-based catalyst, a copper-based catalyst, and a base.
(式中、X1~X4はそれぞれ独立にハロゲン原子または水素原子であり、L1およびL2はそれぞれ独立に炭素原子数1~15のアルキレン基、m1およびm2はそれぞれ独立に0~5の整数である。) (In the formula, X1 to X4 are each independently a halogen atom or a hydrogen atom, L1 and L2 are each independently an alkylene group having 1 to 15 carbon atoms, and m1 and m2 are each independently an integer from 0 to 5.)
(式中、Y1は炭素原子数1~20の芳香族基である。)
《態様7》
前記式(5)で表されるジオール類が下記式(7)である態様6に記載のジヒドロキシ化合物の製造方法。
(In the formula, Y1 is an aromatic group having 1 to 20 carbon atoms.)
《Aspect 7》
A method for producing a dihydroxy compound according to embodiment 6, wherein the diols represented by formula (5) are the following formula (7).
《態様8》
前記式(5)で表されるジオール類、反応溶媒、パラジウム系触媒、銅系触媒および塩基の存在下、前記式(6)で表される芳香族アセチレン類を滴下もしくは分割添加しながら反応する、態様6または7に記載のジヒドロキシ化合物の製造方法。
《Appearance 8》
A method for producing a dihydroxy compound according to embodiment 6 or 7, wherein the reaction is carried out in the presence of a diol represented by formula (5), a reaction solvent, a palladium-based catalyst, a copper-based catalyst, and a base, while adding aromatic acetylenes represented by formula (6) dropwise or in divided portions.
本発明によれば、高屈折率かつ高純度であるジヒドロキシ化合物を提供することができる。また、当該ジヒドロキシ化合物を一つの反応工程で得る製造方法を提供することができる。 According to the present invention, a dihydroxy compound with a high refractive index and high purity can be provided. Furthermore, a method for producing the dihydroxy compound in a single reaction step can be provided.
<ジヒドロキシ化合物>
本発明における新規なジヒドロキシ化合物は下記式(1)で表される。
<Dihydroxy compounds>
The novel dihydroxy compound in the present invention is represented by the following formula (1).
(式中、Z1およびZ2はそれぞれ独立に炭素原子数1~20の芳香環、L1およびL2はそれぞれ独立に炭素原子数1~15のアルキレン基、m1およびm2はそれぞれ独立に0~5の整数、n1は1~4の整数、n2は0~4の整数である。) (In the formula, Z1 and Z2 are each independently aromatic rings having 1 to 20 carbon atoms, L1 and L2 are each independently alkylene groups having 1 to 15 carbon atoms, m1 and m2 are each independently integers from 0 to 5, n1 is an integer from 1 to 4, and n2 is an integer from 0 to 4.)
式(1)中のn1は1~4の整数であり、1~2の整数が好ましく、2が特に好ましい。また、n2は0~4の整数であり、1~2の整数が好ましく、2が特に好ましい。すなわち、式(1)で表されるジヒドロキシ化合物の中で、下記式(2)で表されるジヒドロキシ化合物が特に好ましい。 In formula (1), n1 is an integer from 1 to 4, preferably from 1 to 2, and particularly preferably 2. Also, n2 is an integer from 0 to 4, preferably from 1 to 2, and particularly preferably 2. That is, among the dihydroxy compounds represented by formula (1), the dihydroxy compound represented by the following formula (2) is particularly preferred.
(式中、Z3~Z6はそれぞれ独立に炭素原子数1~20の芳香環、L1、L2、m1、m2は前記式(1)と同様である。) (In the formula, Z3 to Z6 are each independently aromatic rings having 1 to 20 carbon atoms, and L1 , L2 , m1 , and m2 are the same as in formula (1) above.)
式(1)および式(2)中のZ1~Z6はそれぞれ独立に炭素原子数1~20の芳香環であり、ベンゼン環、ナフタレン環、アントラセン環、フェナントレン環、ピレン環、クリセン環、フルオレン環、ビフェニレン環等が例示され、ベンゼン環、ナフタレン環であることが好ましく、ベンゼン環であることが特に好ましい。すなわち、式(2)で表されるジヒドロキシ化合物の中で、下記式(3)で表されるジヒドロキシ化合物が特に好ましい。 In formulas (1) and (2), Z1 to Z6 are each independently aromatic rings having 1 to 20 carbon atoms, and examples include benzene rings, naphthalene rings, anthracene rings, phenanthrene rings, pyrene rings, chrysene rings, fluorene rings, biphenylene rings, etc., with benzene rings and naphthalene rings being preferred, and benzene rings being particularly preferred. That is, among the dihydroxy compounds represented by formula (2), the dihydroxy compounds represented by the following formula (3) are particularly preferred.
(式中、L1、L2、m1、m2は前記式(1)と同様である。)
式(1)~式(3)中のL1およびL2はそれぞれ独立に炭素原子数1~15のアルキレン基であり、炭素原子数1~4のアルキレン基が好ましく、エチレン基が特に好ましい。
(In the formula, L1 , L2 , m1 , and m2 are the same as in formula (1) above.)
In formulas (1) to (3), L1 and L2 are each independently an alkylene group having 1 to 15 carbon atoms, with an alkylene group having 1 to 4 carbon atoms being preferred, and an ethylene group being particularly preferred.
式(1)~式(3)中のm1およびm2は、それぞれ独立に0~5の整数であり、0または1が好ましく、0が特に好ましい。すなわち、式(3)で表されるジヒドロキシ化合物の中で、下記式(4)で表されるジヒドロキシ化合物が特に好ましい。 In formulas (1) to (3), m1 and m2 are each independently integers from 0 to 5, preferably 0 or 1, and particularly preferably 0. That is, among the dihydroxy compounds represented by formula (3), the dihydroxy compound represented by the following formula (4) is particularly preferred.
本発明のジヒドロキシ化合物は、HPLCで測定したHPLC純度が90面積%以上であり、95面積%以上が好ましく、98面積%以上がより好ましく、99面積%以上がさらに好ましい。 The dihydroxy compound of the present invention has an HPLC purity of 90 area% or higher, preferably 95 area% or higher, more preferably 98 area% or higher, and even more preferably 99 area% or higher.
本発明のジヒドロキシ化合物は、その屈折率が、1.64以上が好ましく、1.66以上がより好ましく、1.68以上がさらに好ましく、1.70以上が特に好ましい。屈折率は、ジヒドロキシ化合物をジメチルスルホキシドに溶解させ、所定濃度の溶液を作成し、各濃度の溶液の屈折率をATAGO社製DR-M2アッベ屈折計を用い、25℃におけるD線屈折率を測定し、各濃度の測定結果から濃度100%に外挿した値で得られた化合物の屈折率(nD)とした。 The dihydroxy compound of the present invention preferably has a refractive index of 1.64 or higher, more preferably 1.66 or higher, even more preferably 1.68 or higher, and particularly preferably 1.70 or higher. The refractive index was determined by dissolving the dihydroxy compound in dimethyl sulfoxide to prepare solutions of predetermined concentrations. The refractive index of each solution was measured at 25°C using an ATAGO DR-M2 Abbe refractometer, and the refractive index (nD) of the compound obtained by extrapolating the measurement results for each concentration to 100% concentration was defined as the nD of the compound.
<ジヒドロキシ化合物の製造方法>
本発明の上記式(1)で表されるジヒドロキシ化合物は、下記式(5)で表されるジオール類と下記式(6)で表される芳香族アセチレン類とを反応溶媒中、パラジウム系触媒、銅系触媒および塩基の存在下で反応させることにより製造することができる。
<Method for producing dihydroxy compounds>
The dihydroxy compound represented by formula (1) of the present invention can be produced by reacting a diol represented by formula (5) below with an aromatic acetylene represented by formula (6) below in a reaction solvent in the presence of a palladium-based catalyst, a copper-based catalyst, and a base.
(式中、X1~X4はそれぞれ独立にハロゲン原子または水素原子であり、L1およびL2はそれぞれ独立に炭素原子数1~15のアルキレン基、m1およびm2はそれぞれ独立に0~5の整数である。) (In the formula, X1 to X4 are each independently a halogen atom or a hydrogen atom, L1 and L2 are each independently an alkylene group having 1 to 15 carbon atoms, and m1 and m2 are each independently an integer from 0 to 5.)
(式中、Y1は炭素原子数1~20の芳香族基である。)
前記式(5)中のX1~X4はそれぞれ独立にハロゲン原子または水素原子であり、臭素原子、ヨウ素原子が好ましく、臭素原子がより好ましい。
(In the formula, Y1 is an aromatic group having 1 to 20 carbon atoms.)
In formula (5), X1 to X4 are each independently a halogen atom or a hydrogen atom, with bromine and iodine atoms being preferred, and bromine atoms being more preferred.
式(5)で表されるジオール類の具体例として、2,2-ビス(3-クロロ-4-ヒドロキシフェニル)プロパン、2,2-ビス(3,5-ジクロロ-4-ヒドロキシフェニル)プロパン、2,2-ビス(3-ブロモ-4-ヒドロキシフェニル)プロパン、2,2-ビス(3,5-ジブロモ-4-ヒドロキシフェニル)プロパン、2,2-ビス(3-ヨード-4-ヒドロキシフェニル)プロパン、2,2-ビス(3,5-ジヨード-4-ヒドロキシフェニル)プロパンが好ましく、2,2-ビス(3-ブロモ-4-ヒドロキシフェニル)プロパン、2,2-ビス(3,5-ジブロモ-4-ヒドロキシフェニル)プロパンがより好ましく、特に、下記式(7)で表される2,2-ビス(3,5-ジブロモ-4-ヒドロキシフェニル)プロパンが好ましい。これらのジオール類は単独で使用してもよく、または2種以上を混合してもよく、目的により任意に選ぶことができる。 Specific examples of diols represented by formula (5) include 2,2-bis(3-chloro-4-hydroxyphenyl)propane, 2,2-bis(3,5-dichloro-4-hydroxyphenyl)propane, 2,2-bis(3-bromo-4-hydroxyphenyl)propane, 2,2-bis(3,5-dibromo-4-hydroxyphenyl)propane, 2,2-bis(3-iodo-4-hydroxyphenyl)propane, and 2,2-bis(3,5-diiodo-4-hydroxyphenyl)propane, with 2,2-bis(3,5-bromo-4-hydroxyphenyl)propane and 2,2-bis(3,5-dibromo-4-hydroxyphenyl)propane being more preferred, and particularly preferred is 2,2-bis(3,5-dibromo-4-hydroxyphenyl)propane represented by formula (7) below. These diols may be used individually or mixed in groups of two or more, and can be arbitrarily selected depending on the purpose.
前記式(6)で表される芳香族アセチレン類の具体例として、エチニルベンゼン、1-エチニルナフタレン、2-エチニルナフタレン、1-エチニルアントラセン、2-エチニルアントラセン、9-エチニルアントラセン、1-エチニルフェナントレン、2-エチニルフェナントレン、3-エチニルフェナントレン、4-エチニルフェナントレン、9-エチニルフェナントレン、1-エチニルピレン、2-エチニルピレン、4-エチニルピレン、2-エチニルクリセン、5-エチニルクリセン、6-エチニルクリセン、1-エチニルフルオレン、2-エチニルフルオレン、3-エチニルフルオレン、9-エチニルフルオレン、2-エチニルビフェニル、3-エチニルビフェニル、4-エチニルビフェニルが好ましく、エチニルベンゼン、1-エチニルナフタレン、2-エチニルナフタレンがより好ましく、エチニルベンゼンが特に好ましい。これらの芳香族アセチレン類は単独で使用してもよく、または2種以上を混合してもよく、目的により任意に選ぶことができる。 Specific examples of aromatic acetylenes represented by formula (6) include: ethynylbenzene, 1-ethynylnaphthalene, 2-ethynylnaphthalene, 1-ethynylanthracene, 2-ethynylanthracene, 9-ethynylanthracene, 1-ethynylphenanthrene, 2-ethynylphenanthrene, 3-ethynylphenanthrene, 4-ethynylphenanthrene, 9-ethynylphenanthrene, 1-ethynylpyrene, and 2-ethynylpyrene. 4-ethynylpyrene, 2-ethynylchrysene, 5-ethynylchrysene, 6-ethynylchrysene, 1-ethynylfluorene, 2-ethynylfluorene, 3-ethynylfluorene, 9-ethynylfluorene, 2-ethynylbiphenyl, 3-ethynylbiphenyl, and 4-ethynylbiphenyl are preferred, ethinylbenzene, 1-ethynylnaphthalene, and 2-ethynylnaphthalene are more preferred, and ethinylbenzene is particularly preferred. These aromatic acetylenes may be used individually or as a mixture of two or more, and can be arbitrarily selected depending on the purpose.
前記式(6)で表される芳香族アセチレン類の使用比率は、前記式(5)で表されるジオール類1モルに対して好ましくは2.0~6.0モル、より好ましくは、3.0~5.0モル、さらに好ましくは4.0~4.5モルである。 The usage ratio of aromatic acetylenes represented by formula (6) is preferably 2.0 to 6.0 moles, more preferably 3.0 to 5.0 moles, and even more preferably 4.0 to 4.5 moles per mole of diols represented by formula (5).
前記式(6)で表される芳香族アセチレン類は、前記式(5)で表されるジオール類、反応溶媒、パラジウム系触媒、銅系触媒および塩基の存在下、滴下もしくは分割添加しながら反応することが好ましい。 The aromatic acetylenes represented by formula (6) are preferably reacted dropwise or in divided doses in the presence of the diols represented by formula (5), a reaction solvent, a palladium-based catalyst, a copper-based catalyst, and a base.
本発明の製造方法で使用する塩基としてアミン類が好ましく、トリエチルアミン、ピぺリジン、ピリジン、N,N-ジイソプロピルエチルアミンがより好ましい。このような塩基は、単独で用いてもよく、また、2種類以上併用して用いることもできる。 In the manufacturing method of the present invention, amines are preferred as bases, with triethylamine, piperidine, pyridine, and N,N-diisopropylethylamine being more preferred. Such bases may be used individually or in combination of two or more types.
本発明の製造方法で使用するパラジウム系触媒は、テトラキス(トリフェニルホスフィン)パラジウム、ビス(トリフェニルホスフィン)パラジウムジクロリド、酢酸パラジウム、トリス(ジベンジリデンアセトン)ジパラジウム、ビス(ジベンジリデンアセトン)パラジウム、ビス[4-(N,N-ジメチルアミノ)フェニル]ジ-tert-ブチルホスフィンパラジウムジクロリド、ビス(ジ-tert-ブチルプレニルホスフィン)パラジウムジクロリド、ビス(ジ-tert-クロチルホスフィン)パラジウムジクロリドが好ましい。これらパラジウム系触媒は、単独で用いてもよく、また、2種以上併用して用いることもできる。 The palladium-based catalysts used in the manufacturing method of the present invention are preferably tetrakis(triphenylphosphine)palladium, bis(triphenylphosphine)palladium dichloride, palladium acetate, tris(dibenzylideneacetone)dipalladium, bis(dibenzylideneacetone)palladium, bis[4-(N,N-dimethylamino)phenyl]di-tert-butylphosphine palladium dichloride, bis(di-tert-butylprenylphosphine)palladium dichloride, and bis(di-tert-clotylphosphine)palladium dichloride. These palladium-based catalysts may be used individually or in combination of two or more.
上述したパラジウム系触媒の使用量は、前記式(5)で表されるジオール類1モルに対して、0.001~1モルが好ましく、0.005~0.05モルがより好ましい。 The amount of palladium-based catalyst used is preferably 0.001 to 1 mole, and more preferably 0.005 to 0.05 moles, per mole of the diol represented by formula (5).
本発明の製造方法で使用する銅系触媒は、ヨウ化銅(I)、臭化銅(I)が好ましい。これら銅系触媒は、単独で用いてもよく、また、2種以上併用して用いることもできる。 The copper-based catalyst used in the manufacturing method of the present invention is preferably copper(I) iodide or copper(I) bromide. These copper-based catalysts may be used individually or in combination of two or more.
上述した銅系触媒の使用量は、前記式(5)で表されるジオール類1モルに対して、0.001~1モルが好ましく、0.005~0.05モルがより好ましい。 The amount of copper-based catalyst used is preferably 0.001 to 1 mole, and more preferably 0.005 to 0.05 moles, per mole of the diol represented by formula (5).
本発明の製造方法で使用する反応溶媒としては、上述した塩基を反応溶媒として使用することが好ましい。また、トルエン、キシレン等の芳香族炭化水素系溶媒、メタノール、エタノール、イソプロピルアルコール、n-ブタノール等のアルコール系溶媒、テトラヒドロフラン、アセトニトリル、N,N-ジメチルホルムアミドまたはN,N-ジメチルアセトアミド等の非プロトン性溶媒を使用しても良い。このような溶媒も単独で用いても良く、また、2種以上併用して用いることもできる。 In the manufacturing method of the present invention, it is preferable to use the above-mentioned base as the reaction solvent. Alternatively, aromatic hydrocarbon solvents such as toluene and xylene, alcoholic solvents such as methanol, ethanol, isopropyl alcohol, and n-butanol, and aprotic solvents such as tetrahydrofuran, acetonitrile, N,N-dimethylformamide, or N,N-dimethylacetamide may be used. These solvents may be used individually or in combination of two or more.
上述した反応溶媒の使用量は、前記式(5)で表されるジオール類の1~100重量倍が好ましく、5~50重量倍がより好ましい。 The amount of the reaction solvent used is preferably 1 to 100 times the weight of the diol represented by formula (5), and more preferably 5 to 50 times the weight.
本発明の製造方法において、反応温度は使用する原料、溶媒の種類により異なるが、好ましくは50~150℃、より好ましくは60~130℃、さらに好ましくは70~120℃である。反応は液体クロマトグラフィーなどの分析手段で追跡することができる。 In the manufacturing method of the present invention, the reaction temperature varies depending on the type of raw materials and solvent used, but is preferably 50 to 150°C, more preferably 60 to 130°C, and even more preferably 70 to 120°C. The reaction can be tracked by analytical means such as liquid chromatography.
本発明の製造方法において、反応終了後の反応混合物には、通常、生成した前記式(1)で表されるジヒドロキシ化合物以外に、未反応原料、反応中間体、塩基、触媒、副反応生成物などが含まれている。そのため、慣用の方法、例えば、ろ過、濃縮、蒸留、抽出、晶析、再結晶、再沈殿、活性炭処理あるいはそれと酷似した金属の除去処理、カラムクロマトグラフィーなどの分離手段や、これらを組み合わせた分離手段により分離精製できる。 In the manufacturing method of the present invention, the reaction mixture after the reaction typically contains unreacted raw materials, reaction intermediates, bases, catalysts, and by-reaction products, in addition to the dihydroxy compound represented by formula (1) that is produced. Therefore, it can be separated and purified by conventional separation methods, such as filtration, concentration, distillation, extraction, crystallization, recrystallization, reprecipitation, activated carbon treatment or similar metal removal treatments, column chromatography, or combinations thereof.
以下、本発明を実施例により詳細に説明するが、本発明はその要旨を超えない限り、以下の実施例に限定されるものではない。 The present invention will be described in detail below with reference to examples, but the present invention is not limited to the following examples unless it exceeds the essence of the invention.
なお、実施例において、各種測定は以下のように行った。
(1)HPLC測定(純度(面積%))
Waters製高速液体クロマトグラフAlliance e2695を用い、表1の測定条件で測定した。実施例中、特に断らない限り純度(面積%)はHPLCにおける溶媒を除いて補正した面積百分率値である。
In the examples, various measurements were performed as follows.
(1) HPLC measurement (purity (area %))
Measurements were performed using a Waters Alliance e2695 high-performance liquid chromatograph under the conditions shown in Table 1. In the examples, unless otherwise specified, purity (area %) is the area percentage value corrected for the solvent in HPLC.
(2)NMR測定
実施例で得られた化合物を重クロロホルムに溶解させ、日本電子社製JNM-AL400(400MHz)を用い測定した。
(2) NMR measurement The compounds obtained in the examples were dissolved in deuterated chloroform and measured using a JEOL JNM-AL400 (400 MHz) NMR analyzer.
(3)屈折率(nD)
実施例で得られたジヒドロキシ化合物をジメチルスルホキシドに溶解させ、所定濃度の溶液を作成し、各濃度の溶液の屈折率をATAGO社製DR-M2アッベ屈折計を用い、25℃におけるD線屈折率を測定した。各濃度の測定結果から濃度100%に外挿した値を実施例で得られた化合物の屈折率(nD)とした。
(3) Refractive index (nD)
The dihydroxy compounds obtained in the examples were dissolved in dimethyl sulfoxide to prepare solutions of predetermined concentrations. The refractive index of each solution concentration was measured at 25°C using an ATAGO DR-M2 Abbe refractometer, specifically the D-line refractive index. The refractive index (nD) of the compounds obtained in the examples was defined as the value obtained by extrapolating the measurement results for each concentration to 100% concentration.
[実施例1]
窒素雰囲気下、撹拌機、冷却器、温度計を備え付けたフラスコにテトラブロモビスフェノールA(以下、TBAと省略することがある)5.00g(9ミリモル)、テトラキス(トリフェニルホスフィン)パラジウム0.53g(0.5ミリモル)、ヨウ化銅(I)0.05g(0.3ミリモル)、トリエチルアミン50mlを加え90℃に昇温した。TBAが溶解し反応液が均一になったこと確認した後、エチニルベンゼン4.13g(40ミリモル)を30分かけて滴下した。還流下6時間反応し、反応後の下記式(4)で表される2,2-ビス(3,5-ジ(フェニルエチニル)-4-ヒドロキシフェニル)プロパン(以下、TEBAと省略することがある)のHPLC純度は86.25面積%だった。反応液に酢酸エチル300mlを加え希釈した後、分液ロートに移し、蒸留水で5回分液水洗した。水洗した有機層を活性炭処理した後、有機層を濃縮し、トルエン/ヘキサンで再結晶した。得られた結晶を回収、乾燥し、2.04gのTEBAをHPLC純度99.88面積%で得た。また、TEBAの屈折率は1.70だった。
[Example 1]
Under a nitrogen atmosphere, 5.00 g (9 mmol) of tetrabromobisphenol A (hereinafter sometimes abbreviated as TBA), 0.53 g (0.5 mmol) of tetrakis(triphenylphosphine)palladium, 0.05 g (0.3 mmol) of copper(I) iodide, and 50 ml of triethylamine were added to a flask equipped with a stirrer, condenser, and thermometer, and the temperature was raised to 90°C. After confirming that the TBA had dissolved and the reaction mixture was homogeneous, 4.13 g (40 mmol) of ethynnylbenzene was added dropwise over 30 minutes. The reaction was carried out under reflux for 6 hours, and the HPLC purity of 2,2-bis(3,5-di(phenylethynyl)-4-hydroxyphenyl)propane (hereinafter sometimes abbreviated as TEBA), represented by the following formula (4), was 86.25 area%. After diluting the reaction mixture with 300 ml of ethyl acetate, it was transferred to a separatory funnel and washed five times with distilled water. The water-washed organic layer was treated with activated carbon, then concentrated and recrystallized in toluene/hexane. The resulting crystals were collected and dried to obtain 2.04 g of TEBA with an HPLC purity of 99.88 area%. The refractive index of TEBA was 1.70.
[比較例1]
窒素雰囲気下、撹拌機、冷却器、温度計を備え付けたフラスコにTBA5.00g(9ミリモル)、エチニルベンゼン4.13g(40ミリモル)、テトラキス(トリフェニルホスフィン)パラジウム0.53g(0.5ミリモル)、ヨウ化銅(I)0.05g(0.3ミリモル)、トリエチルアミン50mlを加え90℃に昇温した。還流下7時間反応し、反応後のTEBAのHPLC純度は29.62面積%だった。反応液に酢酸エチル300mlを加え希釈した後、分液ロートに移し、蒸留水で5回分液水洗した。水洗した有機層を活性炭処理した後、有機層を濃縮し、トルエン/ヘキサンで再結晶した。反応液に酢酸エチル300mlを加え希釈した。希釈した反応液を分液ロートに移し、蒸留水で5回分液水洗した。洗浄した有機層を活性炭処理した後、有機層を濃縮し、トルエン/ヘキサンで再結晶したところ、オイル状であり結晶は得られなかった。
[Comparative Example 1]
Under a nitrogen atmosphere, 5.00 g (9 mmol) of TBA, 4.13 g (40 mmol) of ethynylbenzene, 0.53 g (0.5 mmol) of tetrakis(triphenylphosphine)palladium, 0.05 g (0.3 mmol) of copper(I) iodide, and 50 ml of triethylamine were added to a flask equipped with a stirrer, condenser, and thermometer, and the temperature was raised to 90°C. The reaction was carried out under reflux for 7 hours, and the HPLC purity of the TEBA after the reaction was 29.62 area%. The reaction solution was diluted with 300 ml of ethyl acetate, then transferred to a separatory funnel and washed five times with distilled water. The washed organic layer was treated with activated carbon, then concentrated and recrystallized with toluene/hexane. The reaction solution was diluted with 300 ml of ethyl acetate. The diluted reaction solution was transferred to a separatory funnel and washed five times with distilled water. After washing the organic layer and treating it with activated carbon, the layer was concentrated and recrystallized with toluene/hexane. However, it was in an oily state and no crystals were obtained.
実施例1で得られたTEBAは、高純度な結晶であり、高屈折率であった。また、一つの反応工程で製造することができ、工業的に有用である。 The TEBA obtained in Example 1 was a high-purity crystal with a high refractive index. Furthermore, it can be manufactured in a single reaction step, making it industrially useful.
本発明で得られるジヒドロキシ化合物は、光学レンズや光学フィルムに代表される光学部材を構成する樹脂を形成するモノマーとして好適である。 The dihydroxy compounds obtained in this invention are suitable as monomers for forming resins that constitute optical components such as optical lenses and optical films.
Claims (24)
ただし、HPLC純度とは、Waters製高速液体クロマトグラフAlliance e2695を用い、下表1の測定条件で測定したHPLCにおける溶媒を除いて補正した面積百分率値である。
However, HPLC purity is the area percentage value corrected for the solvent in HPLC measured using a Waters High Performance Liquid Chromatograph Alliance e2695 under the measurement conditions shown in Table 1 below.
ただし、HPLC純度とは、Waters製高速液体クロマトグラフAlliance e2695を用い、下表1の測定条件で測定したHPLCにおける溶媒を除いて補正した面積百分率値である。However, HPLC purity is the area percentage value corrected for excluding the solvent in HPLC measured using a Waters High Performance Liquid Chromatograph Alliance e2695 under the measurement conditions shown in Table 1 below.
ただし、HPLC純度とは、Waters製高速液体クロマトグラフAlliance e2695を用い、下表1の測定条件で測定したHPLCにおける溶媒を除いて補正した面積百分率値である。However, HPLC purity is the area percentage value corrected for the solvent in HPLC measured using a Waters High Performance Liquid Chromatograph Alliance e2695 under the measurement conditions shown in Table 1 below.
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| JP2002363261A (en) | 2001-06-06 | 2002-12-18 | Sumitomo Bakelite Co Ltd | Flame retardant epoxy resin composition, semiconductor encapsulating material and semiconductor device |
| JP2013249439A (en) | 2012-06-04 | 2013-12-12 | Nippon Kayaku Co Ltd | Energy ray-curable resin composition for optical lens sheet, and cured material thereof |
| JP2021175802A (en) | 2020-05-02 | 2021-11-04 | ローム アンド ハース エレクトロニック マテリアルズ エルエルシーRohm and Haas Electronic Materials LLC | Methods of Forming Coating Compositions and Electronic Devices |
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| JP2002363261A (en) | 2001-06-06 | 2002-12-18 | Sumitomo Bakelite Co Ltd | Flame retardant epoxy resin composition, semiconductor encapsulating material and semiconductor device |
| JP2013249439A (en) | 2012-06-04 | 2013-12-12 | Nippon Kayaku Co Ltd | Energy ray-curable resin composition for optical lens sheet, and cured material thereof |
| JP2021175802A (en) | 2020-05-02 | 2021-11-04 | ローム アンド ハース エレクトロニック マテリアルズ エルエルシーRohm and Haas Electronic Materials LLC | Methods of Forming Coating Compositions and Electronic Devices |
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