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JPS5431348B2 - - Google Patents
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JPS5431348B2 - - Google Patents

Info

Publication number
JPS5431348B2
JPS5431348B2 JP8405677A JP8405677A JPS5431348B2 JP S5431348 B2 JPS5431348 B2 JP S5431348B2 JP 8405677 A JP8405677 A JP 8405677A JP 8405677 A JP8405677 A JP 8405677A JP S5431348 B2 JPS5431348 B2 JP S5431348B2
Authority
JP
Japan
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
JP8405677A
Other versions
JPS5419664A (en
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed filed Critical
Priority to JP8405677A priority Critical patent/JPS5419664A/ja
Priority to US05/922,216 priority patent/US4209257A/en
Priority to GB7829391A priority patent/GB2001168B/en
Priority to DE2830871A priority patent/DE2830871C3/de
Publication of JPS5419664A publication Critical patent/JPS5419664A/ja
Publication of JPS5431348B2 publication Critical patent/JPS5431348B2/ja
Granted legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
    • G01N21/84—Systems specially adapted for particular applications
    • G01N21/88—Investigating the presence of flaws or contamination
    • G01N21/95—Investigating the presence of flaws or contamination characterised by the material or shape of the object to be examined
    • G01N21/956—Inspecting patterns on the surface of objects
    • G01N21/95607—Inspecting patterns on the surface of objects using a comparative method
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
    • G01B11/00—Measuring arrangements characterised by the use of optical techniques
    • G01B11/24—Measuring arrangements characterised by the use of optical techniques for measuring contours or curvatures
    • G01B11/2433—Measuring arrangements characterised by the use of optical techniques for measuring contours or curvatures for measuring outlines by shadow casting
    • G—PHYSICS
    • G06—COMPUTING OR CALCULATING; COUNTING
    • G06V—IMAGE OR VIDEO RECOGNITION OR UNDERSTANDING
    • G06V20/00—Scenes; Scene-specific elements
    • G06V20/60—Type of objects
    • G06V20/66—Trinkets, e.g. shirt buttons or jewellery items

Landscapes

  • General Physics & Mathematics (AREA)
  • Physics & Mathematics (AREA)
  • Pathology (AREA)
  • Immunology (AREA)
  • Engineering & Computer Science (AREA)
  • Health & Medical Sciences (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Biochemistry (AREA)
  • General Health & Medical Sciences (AREA)
  • Multimedia (AREA)
  • Theoretical Computer Science (AREA)
  • Investigating Materials By The Use Of Optical Means Adapted For Particular Applications (AREA)
  • Length Measuring Devices By Optical Means (AREA)
  • Preparing Plates And Mask In Photomechanical Process (AREA)
  • Testing Or Measuring Of Semiconductors Or The Like (AREA)
  • Closed-Circuit Television Systems (AREA)
  • Transforming Light Signals Into Electric Signals (AREA)
JP8405677A 1977-07-15 1977-07-15 Device for inspecting fault of pattern Granted JPS5419664A (en)

Priority Applications (4)

Application Number Priority Date Filing Date Title
JP8405677A JPS5419664A (en) 1977-07-15 1977-07-15 Device for inspecting fault of pattern
US05/922,216 US4209257A (en) 1977-07-15 1978-07-05 Apparatus for detecting defects in patterns
GB7829391A GB2001168B (en) 1977-07-15 1978-07-11 Apparatus for detecting defects in patterns
DE2830871A DE2830871C3 (de) 1977-07-15 1978-07-13 Vorrichtung zum Ermitteln von Fehlern in flächenhaften Mustern

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP8405677A JPS5419664A (en) 1977-07-15 1977-07-15 Device for inspecting fault of pattern

Publications (2)

Publication Number Publication Date
JPS5419664A JPS5419664A (en) 1979-02-14
JPS5431348B2 true JPS5431348B2 (ja) 1979-10-06

Family

ID=13819829

Family Applications (1)

Application Number Title Priority Date Filing Date
JP8405677A Granted JPS5419664A (en) 1977-07-15 1977-07-15 Device for inspecting fault of pattern

Country Status (4)

Country Link
US (1) US4209257A (ja)
JP (1) JPS5419664A (ja)
DE (1) DE2830871C3 (ja)
GB (1) GB2001168B (ja)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2025090537A (ja) * 2023-12-05 2025-06-17 レーザーテック株式会社 画像処理装置、光学装置、画像処理方法及び光学装置の利用方法

Families Citing this family (19)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DD146500A1 (de) * 1979-10-16 1981-02-11 Eberhard Degenkolbe Anordnung zur automatischen pruefung von photomasken
US4490617A (en) * 1979-11-26 1984-12-25 European Electronic Systems Limited Optical width measuring system using two cameras
EP0070017B1 (en) * 1981-07-14 1986-10-29 Hitachi, Ltd. Pattern detection system
GB2124362A (en) * 1982-07-22 1984-02-15 Marconi Co Ltd Printed circuit board inspection
US4614430A (en) * 1983-04-28 1986-09-30 Hitachi Ltd. Method of detecting pattern defect and its apparatus
JPS6076606A (ja) * 1983-10-03 1985-05-01 Nippon Kogaku Kk <Nikon> マスクの欠陥検査方法
JPS60133724A (ja) * 1983-12-22 1985-07-16 Nippon Jido Seigyo Kk パタ−ンの欠陥検査装置に用いる歪み補正方法
JPS6139790A (ja) * 1984-07-31 1986-02-25 Kuniji Ukai 輝度信号切換方法
US4825394A (en) * 1985-05-07 1989-04-25 General Dynamics Corporation Vision metrology system
JP2796316B2 (ja) * 1988-10-24 1998-09-10 株式会社日立製作所 欠陥または異物の検査方法およびその装置
JP2757545B2 (ja) * 1990-07-27 1998-05-25 大日本スクリーン製造 株式会社 複数の画像読取りシステム相互の位置誤差補償方法
JP2984635B2 (ja) * 1996-10-23 1999-11-29 日本電気株式会社 高精度パターンの外観の検査方法および装置
US6330351B1 (en) * 1996-11-29 2001-12-11 Kabushiki Kaisha Yuyama Seisakusho Drug inspection device and drug packaging device
US6072574A (en) 1997-01-30 2000-06-06 Micron Technology, Inc. Integrated circuit defect review and classification process
US6324298B1 (en) * 1998-07-15 2001-11-27 August Technology Corp. Automated wafer defect inspection system and a process of performing such inspection
US6040912A (en) * 1998-09-30 2000-03-21 Advanced Micro Devices, Inc. Method and apparatus for detecting process sensitivity to integrated circuit layout using wafer to wafer defect inspection device
US7629993B2 (en) * 2002-09-30 2009-12-08 Rudolph Technologies, Inc. Automated wafer defect inspection system using backside illumination
US7319935B2 (en) * 2003-02-12 2008-01-15 Micron Technology, Inc. System and method for analyzing electrical failure data
US10451563B2 (en) 2017-02-21 2019-10-22 Kla-Tencor Corporation Inspection of photomasks by comparing two photomasks

Family Cites Families (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3546377A (en) * 1968-06-12 1970-12-08 Ovitron Corp Video comparator using vidicons with delayed scanning
JPS5265671A (en) * 1975-11-26 1977-05-31 Nippon Jidoseigyo Ltd Apparatus for testing defects in pattern

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2025090537A (ja) * 2023-12-05 2025-06-17 レーザーテック株式会社 画像処理装置、光学装置、画像処理方法及び光学装置の利用方法

Also Published As

Publication number Publication date
GB2001168B (en) 1982-01-27
DE2830871A1 (de) 1979-01-18
DE2830871B2 (de) 1979-11-15
GB2001168A (en) 1979-01-24
JPS5419664A (en) 1979-02-14
US4209257A (en) 1980-06-24
DE2830871C3 (de) 1980-07-31

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