JPS5516451A - Method of manufacturing semiconductor device - Google Patents
Method of manufacturing semiconductor deviceInfo
- Publication number
- JPS5516451A JPS5516451A JP8945578A JP8945578A JPS5516451A JP S5516451 A JPS5516451 A JP S5516451A JP 8945578 A JP8945578 A JP 8945578A JP 8945578 A JP8945578 A JP 8945578A JP S5516451 A JPS5516451 A JP S5516451A
- Authority
- JP
- Japan
- Prior art keywords
- recess
- grooves
- pellet
- stem
- voids
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Classifications
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10W—GENERIC PACKAGES, INTERCONNECTIONS, CONNECTORS OR OTHER CONSTRUCTIONAL DETAILS OF DEVICES COVERED BY CLASS H10
- H10W72/00—Interconnections or connectors in packages
- H10W72/30—Die-attach connectors
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10W—GENERIC PACKAGES, INTERCONNECTIONS, CONNECTORS OR OTHER CONSTRUCTIONAL DETAILS OF DEVICES COVERED BY CLASS H10
- H10W72/00—Interconnections or connectors in packages
- H10W72/01—Manufacture or treatment
- H10W72/013—Manufacture or treatment of die-attach connectors
- H10W72/01308—Manufacture or treatment of die-attach connectors using permanent auxiliary members, e.g. using alignment marks
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10W—GENERIC PACKAGES, INTERCONNECTIONS, CONNECTORS OR OTHER CONSTRUCTIONAL DETAILS OF DEVICES COVERED BY CLASS H10
- H10W72/00—Interconnections or connectors in packages
- H10W72/071—Connecting or disconnecting
- H10W72/073—Connecting or disconnecting of die-attach connectors
- H10W72/07311—Treating the bonding area before connecting, e.g. by applying flux or cleaning
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10W—GENERIC PACKAGES, INTERCONNECTIONS, CONNECTORS OR OTHER CONSTRUCTIONAL DETAILS OF DEVICES COVERED BY CLASS H10
- H10W72/00—Interconnections or connectors in packages
- H10W72/071—Connecting or disconnecting
- H10W72/073—Connecting or disconnecting of die-attach connectors
- H10W72/07351—Connecting or disconnecting of die-attach connectors characterised by changes in properties of the die-attach connectors during connecting
- H10W72/07353—Connecting or disconnecting of die-attach connectors characterised by changes in properties of the die-attach connectors during connecting changes in shapes
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10W—GENERIC PACKAGES, INTERCONNECTIONS, CONNECTORS OR OTHER CONSTRUCTIONAL DETAILS OF DEVICES COVERED BY CLASS H10
- H10W72/00—Interconnections or connectors in packages
- H10W72/30—Die-attach connectors
- H10W72/331—Shapes of die-attach connectors
- H10W72/334—Cross-sectional shape, i.e. in side view
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10W—GENERIC PACKAGES, INTERCONNECTIONS, CONNECTORS OR OTHER CONSTRUCTIONAL DETAILS OF DEVICES COVERED BY CLASS H10
- H10W72/00—Interconnections or connectors in packages
- H10W72/90—Bond pads, in general
- H10W72/931—Shapes of bond pads
Landscapes
- Die Bonding (AREA)
Abstract
PURPOSE: To reduce the amount of the voids appeared in the solder layer by forming the recess on the soldering surface of the stem in advance and then forming the grooves extending outwards in the radial direction and connecting to the recess at plural positions in the circumferential direction.
CONSTITUTION: On a stem 2 formed is a recess 2b which has such arrangement as capable of holding hold a pellet 4 without being fallen down within it. For example, the recess 2 has the diameter a little shorter than the diagonal line length of the pellet 4 and the protruded portion forming a semi-spherical surface 2a at its bottom. In addition formed are grooves 2c extending outwards in the radial direction and connecting to the recess 2b at plural positions in the circumferential direction, for example, at 4 positions corresponding to each side of the pellet 4. With the recess 2b and grooves 2c formed on the stem 2, the voids often produced during in the soldering process can easily run away through the recess 2b and grooves 2c. This reduces the amount of the voids appeared in the solder layer significantly.
COPYRIGHT: (C)1980,JPO&Japio
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP8945578A JPS5516451A (en) | 1978-07-24 | 1978-07-24 | Method of manufacturing semiconductor device |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP8945578A JPS5516451A (en) | 1978-07-24 | 1978-07-24 | Method of manufacturing semiconductor device |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPS5516451A true JPS5516451A (en) | 1980-02-05 |
Family
ID=13971162
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP8945578A Pending JPS5516451A (en) | 1978-07-24 | 1978-07-24 | Method of manufacturing semiconductor device |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS5516451A (en) |
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS61106493A (en) * | 1984-10-31 | 1986-05-24 | Nec Corp | Molecular beam epitaxial growing method |
| JPS6230317A (en) * | 1985-04-02 | 1987-02-09 | Fujitsu Ltd | Method and apparatus for growing semiconductor crystal |
-
1978
- 1978-07-24 JP JP8945578A patent/JPS5516451A/en active Pending
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS61106493A (en) * | 1984-10-31 | 1986-05-24 | Nec Corp | Molecular beam epitaxial growing method |
| JPS6230317A (en) * | 1985-04-02 | 1987-02-09 | Fujitsu Ltd | Method and apparatus for growing semiconductor crystal |
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