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JPS5637503B2 - - Google Patents
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JPS5637503B2 - - Google Patents

Info

Publication number
JPS5637503B2
JPS5637503B2 JP5303973A JP5303973A JPS5637503B2 JP S5637503 B2 JPS5637503 B2 JP S5637503B2 JP 5303973 A JP5303973 A JP 5303973A JP 5303973 A JP5303973 A JP 5303973A JP S5637503 B2 JPS5637503 B2 JP S5637503B2
Authority
JP
Japan
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
JP5303973A
Other languages
Japanese (ja)
Other versions
JPS4962184A (en
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed filed Critical
Publication of JPS4962184A publication Critical patent/JPS4962184A/ja
Publication of JPS5637503B2 publication Critical patent/JPS5637503B2/ja
Expired legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/02—Details
    • H01J37/22—Optical, image processing or photographic arrangements associated with the tube
    • H01J37/226—Optical arrangements for illuminating the object; optical arrangements for collecting light from the object
    • H01J37/228—Optical arrangements for illuminating the object; optical arrangements for collecting light from the object whereby illumination or light collection take place in the same area of the discharge
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/252—Tubes for spot-analysing by electron or ion beams; Microanalysers
    • H01J37/256—Tubes for spot-analysing by electron or ion beams; Microanalysers using scanning beams

Landscapes

  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Analysing Materials By The Use Of Radiation (AREA)
JP5303973A 1972-05-12 1973-05-11 Expired JPS5637503B2 (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
DE2223367A DE2223367C3 (en) 1972-05-12 1972-05-12 Micro-beam probe for the quantitative detection of charged secondary particles

Publications (2)

Publication Number Publication Date
JPS4962184A JPS4962184A (en) 1974-06-17
JPS5637503B2 true JPS5637503B2 (en) 1981-09-01

Family

ID=5844786

Family Applications (1)

Application Number Title Priority Date Filing Date
JP5303973A Expired JPS5637503B2 (en) 1972-05-12 1973-05-11

Country Status (5)

Country Link
US (1) US3845305A (en)
JP (1) JPS5637503B2 (en)
DE (1) DE2223367C3 (en)
FR (1) FR2184713B1 (en)
GB (1) GB1426359A (en)

Families Citing this family (42)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4205226A (en) * 1978-09-01 1980-05-27 The Perkin-Elmer Corporation Auger electron spectroscopy
DE2950329C2 (en) * 1979-12-14 1985-06-05 Leybold-Heraeus GmbH, 5000 Köln Device for removing material from the surface of a target
JPS56114269A (en) 1980-02-15 1981-09-08 Internatl Precision Inc Scanning type electronic microscope
US4491735A (en) * 1982-04-05 1985-01-01 The Perkin-Elmer Corporation Restricted ion source of high current density
DE3231036A1 (en) * 1982-08-20 1984-02-23 Max Planck Gesellschaft COMBINED ELECTROSTATIC LENS AND EMISSION LENS
DE3236273A1 (en) * 1982-09-30 1984-04-05 Siemens AG, 1000 Berlin und 8000 München SPECTROMETER LENS WITH PARALLEL LENS AND SPECTROMETER FIELDS FOR POTENTIAL MEASUREMENT TECHNOLOGY
DE3236271A1 (en) * 1982-09-30 1984-04-05 Siemens AG, 1000 Berlin und 8000 München SPECTROMETER LENS FOR THE CARPUSULAR BEAM MEASUREMENT TECHNOLOGY
JPS6089050A (en) * 1983-10-20 1985-05-18 Toshiba Corp Strobo scanning electron microscope
EP0152501B1 (en) * 1984-02-18 1989-04-12 Leybold Aktiengesellschaft Device for measuring the angular distribution of charged particles diffracted on a sample surface
DE3576213D1 (en) * 1984-09-18 1990-04-05 Integrated Circuit Testing COUNTERFIELD SPECTROMETER FOR ELECTRON BEAM MEASURING TECHNOLOGY.
FR2575597B1 (en) * 1984-12-28 1987-03-20 Onera (Off Nat Aerospatiale) APPARATUS FOR VERY HIGH RESOLUTION ION MICROANALYSIS OF A SOLID SAMPLE
US4556794A (en) * 1985-01-30 1985-12-03 Hughes Aircraft Company Secondary ion collection and transport system for ion microprobe
FR2584234B1 (en) * 1985-06-28 1988-12-09 Cameca INTEGRATED CIRCUIT TESTER WITH ELECTRON BEAM
US4864130A (en) * 1986-06-04 1989-09-05 Arch Development Corporation Photo ion spectrometer
US4855596A (en) * 1986-06-04 1989-08-08 Arch Development Corp. Photo ion spectrometer
US4889987A (en) * 1986-06-04 1989-12-26 Arch Development Corporation Photo ion spectrometer
EP0281743B1 (en) * 1987-02-02 1994-03-30 ICT Integrated Circuit Testing Gesellschaft für Halbleiterprüftechnik mbH Detector objective for a scanning microscope
US4818872A (en) * 1987-05-11 1989-04-04 Microbeam Inc. Integrated charge neutralization and imaging system
FR2624610B1 (en) * 1987-12-11 1990-03-30 Cameca TIME-OF-FLIGHT, CONTINUOUSLY SCAN ANALYSIS METHOD AND ANALYSIS DEVICE FOR CARRYING OUT SAID METHOD
DE3904032A1 (en) * 1989-02-10 1990-08-16 Max Planck Gesellschaft ELECTRONIC MICROSCOPE FOR THE STUDY OF SOLID CARBON SURFACES
US4983830A (en) * 1989-06-29 1991-01-08 Seiko Instruments Inc. Focused ion beam apparatus having charged particle energy filter
DE4000579A1 (en) * 1990-01-10 1991-07-11 Integrated Circuit Testing ION RAY DEVICE AND METHOD FOR CARRYING OUT POTENTIAL MEASURES BY MEANS OF AN ION RAY
US5149974A (en) * 1990-10-29 1992-09-22 International Business Machines Corporation Gas delivery for ion beam deposition and etching
JP3730263B2 (en) * 1992-05-27 2005-12-21 ケーエルエー・インストルメンツ・コーポレーション Apparatus and method for automatic substrate inspection using charged particle beam
EP1130399B1 (en) * 1992-05-29 2009-04-01 The Rockefeller University Method for the sequence determination of peptides using a mass spectrometer
JPH08227689A (en) * 1995-02-22 1996-09-03 Nec Corp Secondary ion mass spectrometric device
FR2806527B1 (en) * 2000-03-20 2002-10-25 Schlumberger Technologies Inc SIMULTANEOUS FOCUSING COLUMN OF PARTICLE BEAM AND OPTICAL BEAM
EP1388883B1 (en) * 2002-08-07 2013-06-05 Fei Company Coaxial FIB-SEM column
JP4519567B2 (en) * 2004-08-11 2010-08-04 株式会社日立ハイテクノロジーズ Scanning electron microscope and sample observation method using the same
US7589322B2 (en) * 2005-06-29 2009-09-15 Horiba, Ltd. Sample measuring device
CN101248505B (en) * 2005-07-08 2010-12-15 耐克斯金思美控股公司 Apparatus and methods for the manufacture of controlled particle beams
GB2428868B (en) * 2005-10-28 2008-11-19 Thermo Electron Corp Spectrometer for surface analysis and method therefor
WO2008140585A1 (en) 2006-11-22 2008-11-20 Nexgen Semi Holding, Inc. Apparatus and method for conformal mask manufacturing
US10566169B1 (en) 2008-06-30 2020-02-18 Nexgen Semi Holding, Inc. Method and device for spatial charged particle bunching
US10991545B2 (en) 2008-06-30 2021-04-27 Nexgen Semi Holding, Inc. Method and device for spatial charged particle bunching
FR2960698B1 (en) * 2010-05-27 2013-05-10 Centre Nat Rech Scient ADJUSTABLE CATHODOLUMINESCENCE DETECTION SYSTEM AND MICROSCOPE USING SUCH A SYSTEM.
EP3966844B1 (en) 2019-05-09 2026-04-15 Attolight AG Cathodoluminescence electron microscope
US11227743B2 (en) 2019-08-20 2022-01-18 Attolight AG Accurate wavelength calibration in cathodoluminescence SEM
TWI808554B (en) 2020-12-04 2023-07-11 亞光股份有限公司 Dislocation type and density discrimination in semiconductor materials using cathodoluminescence measurements
US11782001B2 (en) 2020-12-04 2023-10-10 Attolight AG Dislocation type and density discrimination in semiconductor materials using cathodoluminescence measurements
US12014896B2 (en) 2021-01-19 2024-06-18 Attolight AG Cost effective probing in high volume manufacture of micro LEDs
US12493005B1 (en) 2022-06-07 2025-12-09 Nexgen Semi Holding, Inc. Extended range active illumination imager

Family Cites Families (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
BE430092A (en) * 1937-09-11
US2356535A (en) * 1940-08-31 1944-08-22 Ruska Ernst Electronic lens
US2330930A (en) * 1941-04-30 1943-10-05 Rca Corp Scanning type of electron microscope
DE1133841B (en) * 1957-09-11 1962-07-26 Leitz Ernst Gmbh Electron microscope for the direct imaging of surfaces by secondary electrons, method for examining non-conductors or semiconductors and arrangement for carrying out the method
US3253144A (en) * 1963-05-27 1966-05-24 Tektronix Inc Electron lens having means for correcting astigmatism
NL154050B (en) * 1966-08-13 1977-07-15 Philips Nv ELECTRON MICROSCOPE.
US3452241A (en) * 1966-09-06 1969-06-24 Rca Corp Electron gun suitable for electron microscope
US3374349A (en) * 1966-11-14 1968-03-19 Victor G. Macres Electron probe having a specific shortfocal length magnetic lens and light microscope
DE1614126B1 (en) * 1967-02-27 1970-11-19 Max Planck Gesellschaft Corpuscular beam microscope, in particular electron microscope, with a condenser lens formed by the front of an objective lens and a range diaphragm

Also Published As

Publication number Publication date
DE2223367A1 (en) 1973-11-29
FR2184713B1 (en) 1974-05-17
FR2184713A1 (en) 1973-12-28
US3845305A (en) 1974-10-29
DE2223367C3 (en) 1978-11-30
DE2223367B2 (en) 1978-03-30
GB1426359A (en) 1976-02-25
JPS4962184A (en) 1974-06-17

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