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DE2846256A1
(en)
*
|
1977-10-24 |
1979-04-26 |
Fuji Photo Film Co Ltd |
PROCESS FOR THE DEVELOPMENT OF POSITIVE LIGHT SENSITIVE PLANOGRAPHIC PRINT PLATES
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JPS5522759A
(en)
*
|
1978-08-08 |
1980-02-18 |
Fuji Photo Film Co Ltd |
Developing method of positive type photosensitive lithographic printing plate
|
|
JPS62143055A
(en)
*
|
1979-02-27 |
1987-06-26 |
Fuji Photo Film Co Ltd |
Treating agent for lithographic printing plate
|
|
JPS55115039A
(en)
*
|
1979-02-27 |
1980-09-04 |
Fuji Photo Film Co Ltd |
Constant retention method for developing activity of developing solution
|
|
JPS5612645A
(en)
*
|
1979-07-11 |
1981-02-07 |
Fuji Photo Film Co Ltd |
Developing method for positive type photosensitive lithographic plate
|
|
JPS5754938A
(en)
*
|
1980-09-20 |
1982-04-01 |
Konishiroku Photo Ind Co Ltd |
Developing method for positive type photosensitive lithographic printing plate
|
|
DE3469074D1
(en)
*
|
1983-06-17 |
1988-03-03 |
Petrarch Systems Inc |
High contrast photoresist developer
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|
CA1281578C
(en)
*
|
1985-07-18 |
1991-03-19 |
Susan A. Ferguson |
High contrast photoresist developer with enhanced sensitivity
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|
JPS6472155A
(en)
*
|
1987-09-12 |
1989-03-17 |
Tama Kagaku Kogyo Kk |
Developing solution for positive type photoresist
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|
EP0732628A1
(en)
|
1995-03-07 |
1996-09-18 |
Minnesota Mining And Manufacturing Company |
Aqueous alkaline solution for developing offset printing plate
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EP1314552B1
(en)
|
1998-04-06 |
2009-08-05 |
FUJIFILM Corporation |
Photosensitive resin composition
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|
JP2003315987A
(en)
|
2002-02-21 |
2003-11-06 |
Fuji Photo Film Co Ltd |
Method for making lithographic printing plate
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|
JP2005321763A
(en)
|
2004-04-06 |
2005-11-17 |
Fuji Photo Film Co Ltd |
Method for replenishing developer for automatic developing machine for photosensitive planographic printing plate
|