JPS5813500B2 - Usuitagarasunoseizohouhou - Google Patents
UsuitagarasunoseizohouhouInfo
- Publication number
- JPS5813500B2 JPS5813500B2 JP50115356A JP11535675A JPS5813500B2 JP S5813500 B2 JPS5813500 B2 JP S5813500B2 JP 50115356 A JP50115356 A JP 50115356A JP 11535675 A JP11535675 A JP 11535675A JP S5813500 B2 JPS5813500 B2 JP S5813500B2
- Authority
- JP
- Japan
- Prior art keywords
- glass
- film
- release film
- thin
- substrate surface
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
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Description
【発明の詳細な説明】
本発明は平担且つ平滑な表面を有する厚みが数μないし
1.0mm程度の薄板ガラスの製造方法に関する。DETAILED DESCRIPTION OF THE INVENTION The present invention relates to a method for manufacturing thin glass having a flat and smooth surface and a thickness of approximately several μ to 1.0 mm.
更に詳しく言うならば、平担且つ平滑な表面を有する基
板の表面と、ガラス形成可能な溶液の表面張力自体を利
用することによって両面ともに優れた平担度及び平滑度
を有する薄板ガラスの製造方法を提供せんとするもので
ある。More specifically, a method for producing thin glass having excellent flatness and smoothness on both surfaces by utilizing the surface of a substrate having a flat and smooth surface and the surface tension itself of a solution capable of forming glass. We aim to provide the following.
昭和47年秋の石油ショックを契機として世界中で省エ
ネルギー、省資源の研究開発が積極的に展開せられてい
る。Since the oil crisis in the fall of 1972, research and development into energy and resource conservation has been actively carried out around the world.
一方建築用、車輛用、その他の窓ガラスとしては突発的
事故によるガラスの破損によって生ずる不測の事態を回
避するために強化ガラス特に2枚のガラス板の中央にプ
ラスチック製中間膜を挾み込んだ合せガラスの使用が推
奨せられたり、或は一部の国によっては法制化が検討せ
られている。On the other hand, for architectural, vehicle, and other window glass, tempered glass, especially a plastic interlayer sandwiched in the center of two glass sheets, is used to avoid unexpected situations caused by glass breakage due to sudden accidents. The use of laminated glass is recommended, or legislation is being considered in some countries.
然るに人命尊重の立場から進められる合せガラスの利用
も、複数枚のガラスを使うこと自体が省資源の思想に逆
行し、コストアップを生むと同時に建築物や車輛用窓ガ
ラスの重量増加はガラスを組み込む構造物自身の強度ア
ップのために更に一層多量の骨材を使用することが必要
となってしまう。However, even though the use of laminated glass is promoted from the standpoint of respecting human life, the use of multiple sheets of glass itself goes against the idea of resource conservation, increases costs, and at the same time increases the weight of window glass for buildings and vehicles. In order to increase the strength of the structure itself, it becomes necessary to use an even larger amount of aggregate.
このだめガラス自体の薄板化が急務になっている。There is an urgent need to make the glass itself thinner.
またエレクトロニクスの分野でもより薄いガラス板が要
求されている。Thinner glass plates are also required in the electronics field.
しかしながら、現在の技術では要求せられる平担度及び
平滑度を満たした板ガラスの厚みは大略1.5yg以上
、充分満足のいくものは3mm以上である。However, with the current technology, the thickness of plate glass that satisfies the required flatness and smoothness is approximately 1.5 yg or more, and the thickness that is fully satisfactory is 3 mm or more.
特に厚み0.7mm以下の薄板ガラスの製造は種種の困
難を伴ない具体的には光学顕微鏡用のカバーガラスとし
て0.1〜0.3mmの薄板状ガラスが或はエレクトロ
ニクス部品用、写真乾板用として0.3〜0.7mmの
厚みを有する薄板ガラスが存在するのみである。In particular, manufacturing thin glass with a thickness of 0.7 mm or less involves various difficulties, and specifically, thin glass with a thickness of 0.1 to 0.3 mm is used as a cover glass for optical microscopes, or for electronic parts and photographic plates. There is only thin glass with a thickness of 0.3 to 0.7 mm.
しかもこれらの薄板ガラスは平担度、平滑度共に充分優
れたものであるとはいい難い。Moreover, it is difficult to say that these thin glass sheets have sufficiently excellent flatness and smoothness.
また、製造方法に関していえば、厚み1.0mm前後ま
では、溶解された高温のガラス素地を引き上げつつ板状
に成形するいわゆるフルコール法或いはコルバーン法で
現在でも製造可能ではあるが、厚みが1.0mm前後に
なると成形には高度な技術と熟練作業を必要とし、且つ
成形されたガラス板の平担度、平滑度は満足のいくもの
ではなく、しかも厚み1.5mm以下では製造歩留が著
しく悪化する,また上記成形法では厚み0.5mmn以
下のガラス板を製造することがほとんど不可能である。Regarding the manufacturing method, it is currently possible to manufacture up to a thickness of around 1.0 mm using the so-called Fourcor method or Colburn method, in which a molten glass substrate is pulled up and formed into a plate shape. When the thickness is around 0 mm, advanced technology and skilled work are required to form the glass plate, and the flatness and smoothness of the formed glass plate are unsatisfactory.Furthermore, when the thickness is less than 1.5 mm, the manufacturing yield is extremely low. Moreover, it is almost impossible to manufacture a glass plate with a thickness of 0.5 mm or less using the above molding method.
一方0.5mm以下のガラスを作るためにロールアウト
法と称して高温のガラス素地をロールを介して引き出す
方法があるが、この方法では上記成形法よりも更に面状
態が悪くなる。On the other hand, in order to make glass of 0.5 mm or less, there is a method called the roll-out method in which a hot glass substrate is drawn out through rolls, but this method results in a worse surface condition than the above-mentioned forming method.
他に高温ガラス素地に空気を吹き込んでボール状にふく
らませ、これを割って引き延ばし薄板にする方法も古く
から存在するが、この方法では面の平担度が極めて悪い
。Another method that has existed for a long time is to blow air into a high-temperature glass base to inflate it into a ball shape, then break it and stretch it to make a thin plate, but this method results in extremely poor surface flatness.
つまシ現在の技術によって1.5mm更に0.7mm以
下の厚みを有し且つ平担、平滑な薄板ガラスを製造する
ことは極めて困難といわざるをえない。It must be said that it is extremely difficult to produce a flat, smooth thin sheet glass with a thickness of 1.5 mm or even 0.7 mm or less using current technology.
このような現状把握から本発明者らは平担、平滑度の優
れた薄板ガラスの製造方法の開発を目的として研究した
結果、本発明による薄板ガラスの製造方法に成功したの
である。Based on this understanding of the current situation, the present inventors conducted research with the aim of developing a method for producing thin glass with excellent flatness and smoothness, and as a result, they succeeded in producing a method for producing thin glass according to the present invention.
即ち本発明は平担、平滑な基板表面に加熱処理によりガ
ラスとなク得る溶液を塗布することにより、該基板表面
の平担、平滑度と、溶液の表面張力とによって両面が平
担、平滑な塗膜を形成せしめ、該塗膜を焼成せしめるこ
とによって溶液状塗膜をガラス化し、薄板ガラスを製造
することを特徴としている。That is, in the present invention, by applying a solution that can be dissolved into glass by heat treatment on the surface of a flat, smooth substrate, both sides can be made flat and smooth depending on the flatness and smoothness of the substrate surface and the surface tension of the solution. The method is characterized in that the solution coating film is vitrified by forming a coating film and firing the coating film, thereby producing thin glass.
更に本発明は、この場合、焼成せられた薄板ガラスと、
基板との離脱を容易ならしめるために予め基板表面に、
後刻の溶失処理によって消失可能な被膜を付着せしめて
おくことをも特徴としている。Furthermore, the present invention provides, in this case, a fired thin sheet glass;
In order to make it easier to separate from the board, the surface of the board is coated with
Another feature is that a film is attached that can be removed by a subsequent melting process.
同時に、本発明はまた、上記塗膜が、完全にはガラス化
せずしかもハンドリングに支障が無い程度の硬度をもつ
軟質フイルム状になるまで第1段階の焼成を行ない(以
下半焼きと称する)次いでこの半焼きガラス塗膜を基板
から脱離せしめた後にこの半焼きガラス塗膜に対してガ
ラス化するに充分な第2段階の焼成(本焼き)を行なう
ことにより薄板ガラスを製造する方法をも含むものであ
る。At the same time, the present invention also provides a first step of firing (hereinafter referred to as half-baking) until the coating film is not completely vitrified and becomes a soft film having a hardness that does not hinder handling. Next, a method for manufacturing thin sheet glass is provided, in which this semi-baked glass coating film is detached from the substrate, and then a second stage of firing (main baking) sufficient to vitrify the semi-baked glass coating film is performed. It also includes.
特に後者の場合には、ガラス塗膜の半焼き焼成時に該塗
膜中から構成有機物質或は溶媒、水分などが充分抜け切
っていないために柔かく、基板からの脱離が容易であり
、更に本焼き焼成時に於では基板や離型膜なしで焼成せ
られるため基板や離型膜と薄板ガラスとの熱膨張係数差
によるクラツクの発生がないために、薄板ガラスにクラ
ツクの入ることがない。In particular, in the latter case, when the glass coating film is semi-baked, constituent organic substances, solvents, moisture, etc. are not sufficiently removed from the coating film, so it is soft and easily detached from the substrate. During final firing, since the firing is performed without a substrate or mold release film, no cracks occur due to the difference in thermal expansion coefficient between the substrate or mold release film and the thin glass, so no cracks occur in the thin glass.
更に又、必要とする薄板ガラスの寸法も、この半焼き状
態ならば、はさみや、カミソリなどの刃物を用いて容易
に切断でき、本焼き後に注意を払ってガラスカッターで
切断する必要もない。Furthermore, the required dimensions of the thin glass sheet can be easily cut using scissors or a blade such as a razor in this half-baked state, and there is no need to carefully cut it with a glass cutter after final firing.
また離型膜をいわゆるストリツバブルペイントを用いて
形成し、半焼き焼成後に基板から、半焼きガラス塗膜と
離型膜(ストリツバブルフイルム)を同時に剥離せしめ
、この状態のまま離型膜が分解消滅する以上の焼成条件
で本焼きすることによって薄板ガラスを製造することも
可能である。In addition, a mold release film is formed using a so-called stripbubble paint, and after half-baking, the semi-baked glass coating film and the mold release film (stripbable film) are simultaneously peeled off from the substrate, and the mold release film is left in this state. It is also possible to produce thin glass by performing final firing under firing conditions that are higher than the conditions at which the glass decomposes and disappears.
ガラスや金属板の輸送、保管時における表面キズ防止に
用いられるストリツバブルペイントは一般に市販されて
おり、いづれも有機物溶液であって、200℃以上の加
熱により容易に分解し炭化したり、消滅するので、本発
明の如く高温焼成を行なう場合、薄板ガラスに何ら悪影
響を及ぼさないことがわかっている。Stritz bubble paint, which is used to prevent surface scratches on glass and metal plates during transportation and storage, is generally commercially available, and all of them are organic solutions that easily decompose, carbonize, or disappear when heated above 200°C. Therefore, it is known that when high-temperature firing is performed as in the present invention, there is no adverse effect on the thin glass.
上記のように離型膜としてストリツバブルフイルムを用
い且つ半焼きガラス塗膜の一面にこのフイルムを接着さ
せたまま基板から剥離させる方法は、切断時にこのフイ
ルムが切口での切粉の飛散を防止し、良好な切口が得ら
れる利点がある。As mentioned above, the method of using a stripable film as a mold release film and peeling it off from the substrate while adhering this film to one side of the semi-baked glass coating film prevents the scattering of chips at the cut end during cutting. It has the advantage of preventing this and obtaining a good cut.
本発明に用いられる基板としては、焼成によってガラス
板となりうる溶液の焼成温度によって各種のものが用い
られるが、一般的には、板ガラス、金属板、プラスチッ
ク板、或はグラファイト板等が用いられる。Various types of substrates can be used in the present invention, depending on the firing temperature of the solution that can be fired into a glass plate, but generally a plate glass, a metal plate, a plastic plate, a graphite plate, etc. are used.
更に又焼成によってガラス板となりうる溶液としては、
ケイ素、チタン、バナジウム、リン等ガラス形成能を有
する金属のうちの少なくとも1種以上を含む有機金属溶
液もしくはアルコラート溶液、またはこれらの混合液が
用いられる。Furthermore, as a solution that can be made into a glass plate by firing,
An organometallic solution or an alcoholate solution containing at least one metal having glass-forming ability such as silicon, titanium, vanadium, and phosphorus, or a mixture thereof is used.
さらに硅酸塩、硼硅酸塩、リン酸塩、硼酸塩などの水ガ
ラス系も使用できる。Furthermore, water glasses such as silicates, borosilicates, phosphates, and borates can also be used.
また前記ガラス形成能を有する金属を1種以上含む有機
金属溶液あるいはアルコラート溶液に添加される添加物
としては、その酸化物がガラスの網目形成助剤として働
く硫黄、アンチモン、ゲルマニウム、錫、シルコニウム
、ベリリウム、アルミニウム、ビスマスなどの有機もし
くは無機化合物が用いられ、さらにその酸化物がガラス
の網目修飾剤として働くマグネシウム、カルシウム、リ
チウム、バリウム、ナトリウム、リビジウム、セシウム
などの有機もしくは無機化合物が用いられる。Additives added to the organometallic solution or alcoholate solution containing one or more of the metals having glass-forming ability include sulfur, antimony, germanium, tin, silconium, and Organic or inorganic compounds such as beryllium, aluminum, and bismuth are used, and further organic or inorganic compounds such as magnesium, calcium, lithium, barium, sodium, ribidium, and cesium, whose oxides act as network modifiers of the glass, are used.
また別種の添加物として、生成される薄板ガラスに着色
を与えるためにクロム、コバルト、銅、鉄、マンガン、
ニッケル、金、銀などの無機もしくは有機化合物も用い
られる。Other types of additives include chromium, cobalt, copper, iron, manganese, and
Inorganic or organic compounds such as nickel, gold, silver, etc. may also be used.
本発明方法において基板と焼成後の薄板カラスとの離脱
を容易にする離型膜としては、薄板ガラスを形成する溶
液が有機溶媒から成る場合、酸、アルカリ或は王水処理
によって容易に溶解する金属薄膜が有効であり、まだ薄
板ガラスを形成する溶液が水ガラス系の場合で且つ「半
焼き」の工程を経る場合の離型膜としては、上記金属薄
膜以外にもワックス被膜や脂肪酸、或は脂肪酸エステル
による被膜、更には既に述べた如きストリツバブルペイ
ント等のプラスチック被膜などが有効に用いられる。In the method of the present invention, the release film that facilitates separation of the substrate from the thin glass glass after firing is a film that is easily dissolved by acid, alkali, or aqua regia treatment when the solution forming the thin glass consists of an organic solvent. A metal thin film is effective, and when the solution used to form the thin glass is water glass-based and the "half-baking" process is performed, a release film other than the above-mentioned metal thin film may include a wax film, fatty acid, or A coating made of fatty acid ester or a plastic coating such as the above-mentioned stripbubble paint can be effectively used.
次に図面を用いて本発明を一実施例につき具体的に説明
しよう。Next, one embodiment of the present invention will be specifically explained using the drawings.
第1図aに於で1は平担且つ平滑な基板であり、ここで
は磨き板ガラスが使われている。In FIG. 1a, 1 is a flat and smooth substrate, in which polished plate glass is used.
3は離型被膜であり、金属網を通常の真空蒸着法により
約20OAの厚みに蒸着した。Reference numeral 3 is a release coating, and a metal mesh was deposited to a thickness of about 20 OA by a normal vacuum deposition method.
この上から第1図bの2に示した通り焼成によりガラス
化する溶液をアプリケーターを用いて塗布した。As shown in FIG. 1b-2, a solution that becomes vitrified by firing was applied onto this using an applicator.
使用した溶液は有機シリコンを主体とするSt02含有
率約30係の半硬化樹脂フレーク(商品名:ガラスレジ
ン、米国オーエンス・イリノイ社製)50部、エチレン
グリコール七ノエチルエーテル(通称エチルセロソルブ
)20部及びフローコントロール剤としてのレイボー#
3(キシレン溶液)2部の混合溶液である。The solution used was 50 parts of semi-cured resin flakes (trade name: Glass Resin, manufactured by Owens-Illinois, USA) with an St02 content of approximately 30 parts, mainly consisting of organic silicone, and 20 parts of ethylene glycol heptanoethyl ether (commonly known as ethyl cellosolve). Laboratories and Raybow # as a flow control agent
This is a mixed solution of 2 parts of 3 (xylene solution).
この状態で溶液の粘度は約80ボアズであり且つSto
2含有率約21係であった。In this state, the viscosity of the solution is about 80 boads, and Sto
2 content rate was about 21%.
アプリケーターは塗膜厚300μを形成する間隙を有す
るものを使用し基板1上の離型被膜3の上から約300
μ厚で溶液を均一に塗布した。Approximately 300 μm from the top of the release coating 3 on the substrate 1 is used as an applicator with a gap that forms a coating film thickness of 300 μm.
The solution was applied uniformly to a μ thickness.
塗布後室温で1時間放置して溶媒であるエチルセロソル
ブの大半を飛散させたのち250℃に保持した電気炉に
入れると同時に電気枦の電源を切って15時間かけてほ
ぼ室温まで徐冷した。After coating, it was left at room temperature for 1 hour to scatter most of the ethyl cellosolve solvent, and then placed in an electric furnace maintained at 250° C., the electric oven was turned off at the same time, and slowly cooled to approximately room temperature over 15 hours.
上記操作により塗布した溶液は焼成せられ、基板1上に
離型膜3を介して薄板ガラス2′を形成した。The solution applied by the above operation was fired to form a thin glass plate 2' on the substrate 1 with a release film 3 interposed therebetween.
(第1図C)でこの基板1、離型膜と,しての銅薄膜3
、薄板ガラス2′から成る物品を2規定塩酸水溶液を入
れたバット内に浸漬した処約1時間後に、ほぼ完全に銅
薄膜3が溶出、消失して、薄板ガラス2′が基板1表面
から遊離した。(Figure 1C) shows this substrate 1, a release film, and a copper thin film 3.
The thin glass 2' is immersed in a vat containing a 2N aqueous solution of hydrochloric acid, and after about one hour, the copper thin film 3 is almost completely eluted and disappeared, and the thin glass 2' is separated from the surface of the substrate 1. did.
これが第1図dであり、成形された薄板ガラス2′は7
0mm×50wnで厚み75μ(0.075mm)であ
り、これを大略30mm角に切断して光学定盤を用いて
平担度(後述)を測定した処、約200μであって平担
度の優れていることが判明した。This is shown in Figure 1d, and the formed thin glass 2' is 7
The size is 0mm x 50wn and the thickness is 75μ (0.075mm), and when it was cut into approximately 30mm square pieces and the flatness (described later) was measured using an optical surface plate, it was approximately 200μ, which was excellent in flatness. It turned out that
同時に薄板ガラス2′表面を螢光灯の反射像を用いて観
測した結果、優れた平滑度を有することがわかった。At the same time, the surface of the thin glass 2' was observed using a reflected image of a fluorescent lamp, and it was found that it had excellent smoothness.
又第2図は「半焼き」工程を入れた本発明の実施例であ
って、aに於ける1は基板、3は一例としてストリツバ
ブルフイルムから成る離型被膜である。FIG. 2 shows an embodiment of the present invention which includes a "half-baking" process, in which 1 in a is a substrate, and 3 is a release film made of, for example, a stripbable film.
第2図bでは基板1の表面に形成せられた離型膜3上に
後にガラス板となる溶液状の塗膜2が塗布せられている
。In FIG. 2b, a coating film 2 in the form of a solution, which will later become a glass plate, is applied onto a release film 3 formed on the surface of a substrate 1.
第2図Cは不充分な焼成(半焼き)を行なった後の状態
であり2′が半焼き塗膜フイルムである。FIG. 2C shows the state after insufficient firing (half-baking), and 2' is the half-baked coating film.
ここで第2図4に示す如く離型膜3と半焼き塗膜フイル
ム2′とを基板1から剥離せしめ所望形状に切断した後
、ガラス化するに充分な焼成(本焼き)を行なうことに
よって第2図eに示した薄板ガラス2hがえられる。Here, as shown in FIG. 2, the mold release film 3 and the semi-baked coating film 2' are peeled off from the substrate 1 and cut into a desired shape, followed by firing (final firing) sufficient to vitrify the film. A thin glass sheet 2h shown in FIG. 2e is obtained.
あるいはdの代りにd′に示すように、Cの状態(半焼
き)のまま、離型膜3を溶失せしめ、半焼き塗膜フイル
ム2′のみで分離させてもよい。Alternatively, as shown in d' instead of d, the mold release film 3 may be dissolved away in the state C (half-baked), and only the half-baked coating film 2' may be separated.
半焼き塗膜フイルム2′を本焼きするに際しては、ガラ
スに対して非ぬれ性を有する材質(例えばグラファイト
)から成る平担で表面平滑な支持部材上で行なうのが好
適である。When final baking the semi-baked coating film 2', it is preferable to carry out the final baking on a flat, smooth-surfaced support member made of a material (such as graphite) that does not wet glass.
さて、本発明を実施するに当って基本的に注意するべき
事項として平担、平滑度の優れた基板を選択することが
最重要であると同時に、離型膜やガラス化する溶液塗膜
のコーティング法に充分留意するべきである。Now, as a matter of basic caution when carrying out the present invention, it is most important to select a substrate with excellent flatness and smoothness, and at the same time, it is important to select a substrate with excellent flatness and smoothness. Careful attention should be paid to the coating method.
例えば基板の有する優れた表面状態を維持する離型膜の
付着法としては、真空蒸着法やスパッタリング法や蒸気
曝露法或は浸漬塗布法が有効であり、一方溶液の塗布法
としては、アブリケーター法、浸漬塗布法、カーテンコ
ーター法などが推奨できる。For example, vacuum evaporation, sputtering, vapor exposure, or dip coating are effective methods for attaching a release film that maintains the excellent surface condition of the substrate.On the other hand, as a solution coating method, ablator Recommended methods include coating method, dip coating method, and curtain coater method.
更に、用いられるガラス化する溶液には必要とする薄板
ガラスの厚みによって固型成分濃度や粘度に最適条件が
存在する。Furthermore, there are optimum conditions for the solid component concentration and viscosity of the vitrifying solution used, depending on the thickness of the required thin glass sheet.
本発明方法が適した薄板ガラスの厚みとしては数μ乃至
700μであり、これに適したガラス化する溶液粘度と
しては0.3乃至1,000ポアズ、好ましくは1乃至
600ポアズである。The thickness of thin glass sheets suitable for the method of the present invention is from several microns to 700 microns, and the suitable viscosity of the vitrifying solution is from 0.3 to 1,000 poise, preferably from 1 to 600 poise.
粘度がこれ以上低いと液の流動性が大きく、生成膜の膜
厚が薄くなりすぎて薄板状として基板から脱離させた時
に平滑度が損なわれ易く、高すぎる場合には、塗布液の
流動状態が悪く表面の平滑度が優れない。If the viscosity is lower than this, the fluidity of the liquid will be large, and the thickness of the formed film will be too thin, and the smoothness will be easily lost when it is detached from the substrate in the form of a thin plate. The condition is poor and the surface smoothness is not excellent.
また焼成温度としては250℃以上、好ましくは550
℃以上である。The firing temperature is 250°C or higher, preferably 550°C.
℃ or higher.
250℃以下では薄板ガラス中の溶媒或は溶液中の有機
物成分が充分に該薄板ガラスから消滅しないために充分
な無機質ガラスに成りきらないことが判明した。It has been found that at temperatures below 250°C, the organic components in the solvent or solution in the thin glass do not disappear sufficiently from the thin glass, so that a sufficient amount of inorganic glass cannot be obtained.
また焼成を半焼き工程と本焼き工程の2段に分ける場合
でも、ガラス化する溶液の塗膜を形成させる基板の平担
度・平滑度は重要な要素である。Furthermore, even when the firing is divided into two stages, a semi-baking process and a final firing process, the flatness and smoothness of the substrate on which the coating film of the vitrifying solution is formed are important factors.
なぜならば、半焼き工程で形成された塗膜フイルムに凹
凸を生じていると、本焼き工程において平担度・平滑度
の優れた支持部材上で細心の注意を払って焼成したとし
てもこの凹凸は容易には消失しないからである。This is because if the coating film formed in the half-baking process has unevenness, even if it is baked with great care on a support member with excellent flatness and smoothness in the final firing process, these unevenness will occur. This is because it does not disappear easily.
以上の如く本発明は、(1)平担且つ平滑な基板面上に
、後刻の溶失処理によって溶失可能な離型膜を付着せし
め、該離型膜表面に、加熱処理によってガラスを形成し
うる溶液状の有機金属もしくは無機ガラスの水溶液を薄
板状に塗布し、加熱焼成せしめて薄板状のガラスとし、
上記溶失可能な離型膜を溶失処理することによって、焼
成せられた薄板状ガラスを該平担且つ平滑な基板面から
離脱せしめることを特徴とした薄板ガラスの製造法を提
供せんとするものであり、同時にまた
(2)平担且つ平滑な基板面上に、後刻の溶失もしくは
剥離処理によって該基板表面からの容易に離脱し得る離
型膜を付着せしめ、刻離型膜表面に、加熱処理によって
ガラスを形成しうる溶液状の有機金属もしくは無機ガラ
スの水溶液を薄板状に塗布し、該塗膜が、充分にはガラ
ス化されつくさない不充分な焼成(半焼き)を行なった
後、該塗膜もしくは該塗膜を前記離型膜とを前記基板面
から剥離せしめ、然るのちに該塗膜のみ、もしくは該塗
膜に離型膜が付着した状態で、該塗膜がガラス化するに
充分な焼成(本焼き)を行なうことを特徴とした薄板ガ
ラスの製造法をも提供するものである。As described above, the present invention (1) attaches a release film that can be dissolved by subsequent melting treatment on a flat and smooth substrate surface, and forms glass on the surface of the release film by heat treatment. An aqueous solution of organic metal or inorganic glass in the form of a liquid solution is applied to a thin plate, and heated and fired to form a thin plate of glass.
It is an object of the present invention to provide a method for manufacturing thin glass, characterized in that the fired thin glass sheet is separated from the flat and smooth substrate surface by subjecting the meltable mold release film to a melting treatment. At the same time, (2) a release film that can be easily removed from the substrate surface by subsequent melting or peeling treatment is adhered to the flat and smooth substrate surface, and the release film is attached to the surface of the cut-off mold film. , an aqueous solution of organic metal or inorganic glass that can be formed into glass by heat treatment is applied to a thin plate, and the coating film is insufficiently fired (half-baked) so that it is not fully vitrified. After that, the coating film or the coating film and the release film are peeled off from the substrate surface, and then the coating film is removed with only the coating film or with the release film attached to the coating film. The present invention also provides a method for manufacturing thin glass, which is characterized by performing firing (firing) sufficient for vitrification.
以下に記載する具体的実施例により本発明の効果はさら
に明らかとなろう。The effects of the present invention will become clearer from the specific examples described below.
本発明に係る第1の方法を3種の条件につき実施した結
果を表1に示す。Table 1 shows the results of implementing the first method according to the present invention under three conditions.
また、表1で得られたガラス板の平担度および表面平滑
度を市販のガラス板(顕微鏡用カバーガラス)と比較し
た結果を表2に示す。Further, Table 2 shows the results of comparing the flatness and surface smoothness of the glass plate obtained in Table 1 with a commercially available glass plate (cover glass for microscope).
表2において、平担度はガラス板を光学定盤上に置き、
生じた干渉縞のピッチから板の最大浮き上り量(反り)
を算出したものであり、平滑度は螢光灯のガラス板面で
の反射像の歪みを肉眼観察した結果である。In Table 2, the flatness is determined by placing the glass plate on an optical surface plate.
Maximum lifting amount (warpage) of the plate from the pitch of the interference fringes that occur
The smoothness is the result of visually observing the distortion of the reflected image on the glass plate surface of the fluorescent lamp.
実施例 2
本発明の第2の方法すなわち塗布せしめた溶液を「半焼
き」工程を通して焼成した場合の条件および結果を表3
に、また実施例1と同様方法で行なった品質比較結果を
表4に示す。Example 2 Table 3 shows the conditions and results of the second method of the present invention, that is, when the applied solution was fired through a "half-baking" process.
Furthermore, Table 4 shows the results of quality comparison conducted in the same manner as in Example 1.
実施例 3
150mmX85mmX3mmの磨き板ガラス表面にア
クリル系ストリツバブルペイント(商品名:トレパンク
、藤倉化成社製)を浸漬法にて約14μに塗布し、常温
で5時間放置した。Example 3 On the surface of a polished plate glass measuring 150 mm x 85 mm x 3 mm, an acrylic stripbable paint (trade name: Trepank, manufactured by Fujikura Kasei Co., Ltd.) was applied to a thickness of about 14 μm using a dipping method and left at room temperature for 5 hours.
この離型膜の上から有機シリコン樹脂の半硬化フレーク
(商品名:グラスレンジ、米国オーエンス・イリノイ社
製)100部、エチレングリコールモノエチルエーテル
(通称エチルセロソルブ)20部及びフローコントロー
ル剤としてのレンボ13(キシレン溶液2部から成る溶
液を500μのアプリケーターを用いて塗布した。On top of this release film, 100 parts of semi-cured organic silicone resin flakes (trade name: Glass Range, manufactured by Owens-Illinois, USA), 20 parts of ethylene glycol monoethyl ether (commonly known as ethyl cellosolve), and Lembo as a flow control agent were added. 13 (a solution consisting of 2 parts of xylene solution was applied using a 500μ applicator).
これを常温で1時間放置した後、70℃1時間の加熱処
理(半焼き)を行ない、次に基板ガラスから離型膜ごと
、半焼成塗膜フイルムを剥離せしめた。After this was left at room temperature for 1 hour, it was heat-treated (half-baked) at 70° C. for 1 hour, and then the semi-baked coating film together with the release film was peeled off from the substrate glass.
次にハサミで離型膜ごと該半焼成塗膜フイルムを100
mmX50mmに切断し、これをグラファイト板上に載
置し500℃の電気炉内で15分間、焼成してから、徐
冷した。Next, use scissors to remove the semi-baked coating film together with the release film.
It was cut into pieces of mm x 50 mm, placed on a graphite plate, fired for 15 minutes in an electric furnace at 500°C, and then slowly cooled.
えられた薄板ガラスの厚みは約275μであり表面は良
好な平滑さを示し、平坦度は100m×50mmの太さ
で約75μであった。The thickness of the obtained thin glass sheet was approximately 275 μm, and the surface exhibited good smoothness, and the flatness was approximately 75 μm at a thickness of 100 m×50 mm.
またえられた薄板ガラスは透明であり、離型膜に炭素の
付着は認められなかった。The thin glass thus obtained was transparent, and no carbon was observed on the release film.
以上の如く本発明でえられた薄板ガラスは従来の技術に
よりえられている薄板ガラスに比して平坦、平滑度共に
優れたものであり薄板ガラスの製造方法として充分な効
果を有することが証明された。As described above, the thin glass obtained by the present invention has superior flatness and smoothness compared to the thin glass obtained by conventional techniques, and it has been proven that it is sufficiently effective as a method for manufacturing thin glass. It was done.
第1図は本発明に係る第1の方法の工程を示し、第2図
は同第2の方法の工程を示す。FIG. 1 shows the steps of a first method according to the present invention, and FIG. 2 shows the steps of the second method.
Claims (1)
て溶失可能な離型膜を付着せしめ、該離型膜表面に、加
熱処理によってガラスを形成しうる溶液状の有機金属も
しくは無機ガラスの水溶液を薄板状に塗布し、加熱焼成
せしめて薄板状のガラスとし、次いで前記溶失可能な離
型膜を溶失処理することによって焼成せられた薄板状ガ
ラスを該平担且つ平滑な基板面から離脱せしめることを
特徴とした薄板ガラスの製造法。 2 平担且つ平滑な基板面上に、後刻の溶失もしくは剥
離処理によって該基板表面から容易に離脱し得る離型膜
を付着せしめ、該離型膜表面に、加熱処理によってガラ
スを形成しうる溶液状の有機金属もしくは無機ガラスの
水溶液を薄板状に塗布し、該塗膜が充分にはガラス化さ
れつくさない不充分な焼成(半焼き)を行なった後の該
塗膜もしくは該塗膜と前記離型膜とを前記基板面から剥
離せしめ、然るのちに該塗膜のみもしくは該塗膜に離型
膜が付着した状態で該塗膜がガラス化するのに充分な焼
成(本焼き)を行なうことを特徴とした薄板ガラスの製
造法。[Claims] 1. A release film that can be dissolved by subsequent melting treatment is attached onto a flat and smooth substrate surface, and a solution capable of forming glass by heat treatment on the surface of the release film. An aqueous solution of an organic metal or an inorganic glass is coated in a thin plate shape, heated and fired to form a thin plate glass, and then the meltable mold release film is melted away to produce a fired thin glass plate. A method for producing thin glass, characterized by separating it from the flat and smooth substrate surface. 2. A release film that can be easily removed from the substrate surface by subsequent melting or peeling treatment is adhered onto a flat and smooth substrate surface, and glass can be formed on the surface of the release film by heat treatment. A coating film after applying an aqueous solution of organic metal or inorganic glass in the form of a thin plate and performing insufficient firing (half-baking) in which the coating film is not fully vitrified. The mold release film is peeled off from the substrate surface, and then the paint film alone or with the mold release film attached to the paint film is fired sufficiently to vitrify the paint film (final firing). A method for manufacturing thin glass, characterized by performing the following steps.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP50115356A JPS5813500B2 (en) | 1975-09-23 | 1975-09-23 | Usuitagarasunoseizohouhou |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP50115356A JPS5813500B2 (en) | 1975-09-23 | 1975-09-23 | Usuitagarasunoseizohouhou |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS5239712A JPS5239712A (en) | 1977-03-28 |
| JPS5813500B2 true JPS5813500B2 (en) | 1983-03-14 |
Family
ID=14660491
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP50115356A Expired JPS5813500B2 (en) | 1975-09-23 | 1975-09-23 | Usuitagarasunoseizohouhou |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS5813500B2 (en) |
Families Citing this family (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS5777044A (en) * | 1980-10-30 | 1982-05-14 | Central Glass Co Ltd | Manufacture of glass from metallic alcoholate |
| US4985275A (en) * | 1986-06-05 | 1991-01-15 | Ushio Denki Kabushiki Kaisha | Method for producing a fused silica envelope for discharge lamp |
| KR101484089B1 (en) * | 2013-07-16 | 2015-01-19 | 코닝정밀소재 주식회사 | Method of fabricating extremely slim oled |
Family Cites Families (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS48100317A (en) * | 1972-03-31 | 1973-12-18 | ||
| JPS4940125A (en) * | 1972-08-17 | 1974-04-15 | ||
| JPS4948708A (en) * | 1972-09-08 | 1974-05-11 |
-
1975
- 1975-09-23 JP JP50115356A patent/JPS5813500B2/en not_active Expired
Also Published As
| Publication number | Publication date |
|---|---|
| JPS5239712A (en) | 1977-03-28 |
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