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JPS5814876B2 - Electron beam evaporation method - Google Patents
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JPS5814876B2 - Electron beam evaporation method - Google Patents

Electron beam evaporation method

Info

Publication number
JPS5814876B2
JPS5814876B2 JP12301278A JP12301278A JPS5814876B2 JP S5814876 B2 JPS5814876 B2 JP S5814876B2 JP 12301278 A JP12301278 A JP 12301278A JP 12301278 A JP12301278 A JP 12301278A JP S5814876 B2 JPS5814876 B2 JP S5814876B2
Authority
JP
Japan
Prior art keywords
liner
electron beam
evaporation
melted
evaporator
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
JP12301278A
Other languages
Japanese (ja)
Other versions
JPS5550465A (en
Inventor
古賀喜久雄
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Jeol Ltd
Original Assignee
Nihon Denshi KK
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Nihon Denshi KK filed Critical Nihon Denshi KK
Priority to JP12301278A priority Critical patent/JPS5814876B2/en
Publication of JPS5550465A publication Critical patent/JPS5550465A/en
Publication of JPS5814876B2 publication Critical patent/JPS5814876B2/en
Expired legal-status Critical Current

Links

Classifications

    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/24Vacuum evaporation
    • C23C14/28Vacuum evaporation by wave energy or particle radiation
    • C23C14/30Vacuum evaporation by wave energy or particle radiation by electron bombardment

Landscapes

  • Chemical & Material Sciences (AREA)
  • Health & Medical Sciences (AREA)
  • Toxicology (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Physical Vapour Deposition (AREA)

Description

【発明の詳細な説明】 本発明は電子線衝撃により、蒸着物質を加熱して蒸着す
るようにした電子ビーム蒸着力法に関する。
DETAILED DESCRIPTION OF THE INVENTION The present invention relates to an electron beam evaporation force method in which a deposition material is heated and deposited by electron beam bombardment.

被蒸着材に蒸発材を蒸着する場合、蒸着面の反射率を高
い値にしたり、耐剥離性を増すためには蒸着面への蒸着
材の入射角を小さくすることが望まれる。
When depositing an evaporation material onto a material to be deposited, it is desirable to reduce the angle of incidence of the evaporation material onto the evaporation surface in order to increase the reflectance of the evaporation surface and increase peeling resistance.

このような場合蒸発源の蒸発表面の形状が球面に近いと
、該球面と同心球になるように被蒸着材を配置すれば、
該被蒸着材は均一な厚さで入射角が殆んどOである蒸着
面を形成することができる。
In such a case, if the shape of the evaporation surface of the evaporation source is close to a spherical surface, if the material to be evaporated is arranged so as to form a sphere concentric with the spherical surface,
The material to be deposited can form a deposition surface with a uniform thickness and an incident angle of almost 0.

従ってその蒸発面が球面となるような蒸発源が従来から
使用されている。
Therefore, evaporation sources whose evaporation surfaces are spherical have been conventionally used.

従来、例えば第1図に示すように、所定速度で送られて
くる針線1を電子線を放射する環状の熱電子フィラメン
ト2の中央に導ひき、熱電子フィラメント2より照射さ
れる熱電子3によって前記針線1を加熱して溶融し、表
面張力により球状になった小球4より蒸発を行なわせる
ようにしていた。
Conventionally, for example, as shown in FIG. 1, a needle wire 1 sent at a predetermined speed is guided to the center of an annular thermionic filament 2 that emits an electron beam, and the thermionic electrons 3 irradiated by the thermionic filament 2 are emitted. The needle wire 1 was heated and melted, and evaporation was performed from the small spheres 4 which became spherical due to surface tension.

しかしながらこのような方法は、針線の送り速度表、熱
電子フィラメントに供給する電力を厳密に制御しないと
針線の先端の溶融部分が落下してしまい、運転の安定性
が悪い。
However, in such a method, unless the feeding speed table of the needle wire and the electric power supplied to the thermionic filament are not strictly controlled, the molten portion at the tip of the needle wire will fall, resulting in poor operational stability.

本発明は、このような従来力法の欠点を解決する新規な
電子ビーノ・蒸着力法を提供するもので、以下図面に基
づき本発明の−実施例を詳述する。
The present invention provides a novel electronic vino vapor deposition method that solves the drawbacks of the conventional method, and embodiments of the present invention will be described in detail below with reference to the drawings.

第2図は本発明を実施するための装置の一例を示したも
ので、図面中5は電子銃であり、該電子銃5より発生し
た電子線6は磁界型偏向器7によって偏向される。
FIG. 2 shows an example of an apparatus for carrying out the present invention. In the drawing, 5 is an electron gun, and an electron beam 6 generated by the electron gun 5 is deflected by a magnetic field type deflector 7.

該磁界型偏向器7は水冷ホルダー8を挾むようにして取
り付けられた一対の磁極より成る。
The magnetic field type deflector 7 consists of a pair of magnetic poles attached to sandwich a water-cooled holder 8.

前記水冷ホルダーは内部に冷却水を流すための流路(図
示せず)が設けられており、銅等で形成されている。
The water-cooled holder is provided with a flow path (not shown) for flowing cooling water therein, and is made of copper or the like.

該水冷ホルダー8の上部にはライナー9が設けられてお
り、該ライナー9の上部表面は前記偏向された電子線6
によって衝撃される。
A liner 9 is provided on the upper part of the water-cooled holder 8, and the upper surface of the liner 9 receives the deflected electron beam 6.
shocked by.

該ライナー9は高温に加熱されて溶融したアルミニウム
の如き蒸発材に対して適変な濡れ性を有する例えばグラ
ファイトの如き高融点物質で形成されている。
The liner 9 is made of a high melting point material, such as graphite, which has suitable wettability to the evaporating material, such as aluminum, which is heated to a high temperature and melted.

該ライナーの上部表面に連通ずる通過孔11が該ライナ
ー9と水冷ホルダー8を貫通して設けられており、該通
過孔11を通して蒸発材より成る針線10がその先端が
ライナー表面の近傍に到達するように導出される。
A passage hole 11 communicating with the upper surface of the liner is provided through the liner 9 and the water-cooled holder 8, and through the passage hole 11, a needle wire 10 made of an evaporative material reaches the vicinity of the liner surface. It is derived as follows.

12は該針線10を矢印13の刀向であるライナーの表
面力向へ送るためのローラーであり、該ローラーはモー
ターの如き駆動源14によって回転せられる。
12 is a roller for feeding the needle wire 10 in the direction of the surface force of the liner, which is the direction of the arrow 13, and the roller is rotated by a driving source 14 such as a motor.

上述した装置を用いて、まず針線10をライナー9の表
面程度まで導出しておき、電子銃5より電子線6を発生
せしめる。
Using the above-mentioned apparatus, the needle wire 10 is first led out to about the surface of the liner 9, and the electron beam 6 is generated from the electron gun 5.

該電子線6はライナー9の表面のみならず、針線10の
先端部を衝撃し、その結果針線10の先端部は加熱され
て溶融し蒸発を開始する。
The electron beam 6 impacts not only the surface of the liner 9 but also the tip of the needle wire 10, and as a result, the tip of the needle wire 10 is heated, melted, and begins to evaporate.

蒸発によって飛散した蒸発材を補うため、針線10を順
次通過孔10を介して導出すると、ライナー表面の近傍
に到達した針純の部分は順次電子衝撃加熱により溶融す
る。
In order to compensate for the evaporation material scattered by evaporation, the needle wires 10 are sequentially led out through the passage holes 10, and the portions of the needle wires that reach the vicinity of the liner surface are sequentially melted by electron impact heating.

針線10の導出速度と電子銃5に供給する電力が適当な
運転状態のもとでは、蒸発によって飛散する蒸発材と針
線10の導出によって新たに溶融してくる蒸発材の量と
が平衡し、溶融している蒸発材の量は時間的に一定とな
る。
Under operating conditions in which the speed at which the needle wire 10 is drawn out and the electric power supplied to the electron gun 5 are appropriate, the amount of evaporation material that is scattered by evaporation and the amount of evaporation material that is newly melted when the needle wire 10 is drawn out are in balance. The amount of melted evaporative material remains constant over time.

針線10の送り速度をライナーに投射する電子ビームの
パワーを一定にしておいた状態でわずかに速めると、第
3図に示す如く溶融した蒸発材の量が増加して、該蒸発
材は表面張力によりライナー表面において小球15を形
成せしめる。
When the feeding speed of the needle wire 10 is slightly increased while the power of the electron beam projected onto the liner is kept constant, the amount of melted evaporation material increases as shown in FIG. This forms small spheres 15 on the liner surface.

該小球15の表面は直接電子ビームによって衝撃される
ため、最も高温となり、該小球表面より盛んに蒸発が行
なわれ、該蒸発した蒸発材は図示外の被蒸着材に被着さ
れる。
Since the surface of the small sphere 15 is directly bombarded by the electron beam, it becomes the highest temperature, and evaporation occurs more actively from the surface of the small ball, and the evaporated material is deposited on a material to be evaporated (not shown).

第4図は、更に発展した実施例を示すための図面であり
、上述した実施例においてはライナーの上部表面を単一
の材質で形成したが、この実施例では表面張力か弱いた
め球状の表面をつくりにくい蒸発材に対して、本発明を
実施するため2種の材質でその上面を形成したライナー
を使用したものである。
FIG. 4 is a drawing to show a further developed embodiment. In the above-mentioned embodiment, the upper surface of the liner was formed of a single material, but in this embodiment, the surface tension is weak, so a spherical surface is formed. In order to carry out the present invention for evaporation materials that are difficult to make, a liner whose upper surface is formed of two types of materials is used.

第4図において、16は水冷ホルダー8に取り付けられ
たライナーであり、17は例えば銅より成る蒸発材の針
線である。
In FIG. 4, 16 is a liner attached to the water-cooled holder 8, and 17 is an evaporative material needle made of copper, for example.

前記ライナー16は該針線17の材質である銅に対して
濡れ性を有する例えばモリブデンの如き材質でその中心
部18が形成されており、又その周辺部19は、該斜線
の材質である銅に対して濡れ性を有しないグラファイト
で形成されている。
The center portion 18 of the liner 16 is made of a material such as molybdenum, which has wettability with respect to copper, which is the material of the needle wire 17, and the peripheral portion 19 is made of copper, which is the material of the diagonal lines. It is made of graphite, which has no wettability.

斯くの如き装置を用いて、針線17の先端を電子ビーム
衝撃により溶解させると、その先端部分が溶融するが、
該溶融部分は該溶融蒸発材に対して濡れ性を有する中心
部18の表面上に拡がり、濡れ性を有しない周辺部19
には拡がって行かないので、表面張力の比頓的小さな蒸
発材も小球20を形成する。
When the tip of the needle wire 17 is melted by electron beam impact using such a device, the tip portion will melt;
The melted portion spreads over the surface of the central portion 18 that has wettability to the molten evaporation material, and forms a peripheral portion 19 that does not have wettability.
Since it does not spread, even the evaporative material with a relatively small surface tension forms the globules 20.

このようにライナーの上面を濡れ性の良いものと悪いも
のの2種の材質で形成すれば、表面張力の小さい蒸発材
に対しても容易に小球を形成でき、又小球の大きさを制
限したりすることに好都合である他、形成された小球を
より安定とすることができる。
If the upper surface of the liner is made of two types of materials, one with good wettability and one with poor wettability, it is possible to easily form globules even on evaporative materials with low surface tension, and the size of globules can be limited. In addition to being convenient for carrying out various operations, the formed globules can be made more stable.

上述した如き、本発明に基づく蒸着力法においては、ラ
イナー表面上に蒸発材の小球を形成しているが、該ライ
ナー表面は溶融した蒸発材に対して適度な濡れ性を有し
ており、しかも該ライナー表面は水冷ホルダーによって
冷却されているため小球の球面部ほど高温にならず、従
−って該小球は従来の如く飛散したり、移動したりする
ことなくライナー表面上のロー箇所に存在する。
In the vapor deposition force method based on the present invention as described above, small spheres of evaporative material are formed on the liner surface, and the liner surface has appropriate wettability with respect to the molten evaporative material. Furthermore, since the liner surface is cooled by a water-cooled holder, it does not reach as high a temperature as the spherical part of the small balls, and therefore the small balls do not scatter or move as in the conventional case, but instead stay on the liner surface. Exists at the low location.

このよ・うに本発明により極めて安定した球面点蒸発源
よりの蒸着が行い得る。
As described above, according to the present invention, extremely stable evaporation from a spherical point evaporation source can be performed.

【図面の簡単な説明】[Brief explanation of drawings]

第1図は従来技術を説明するための図、第2図は本発明
の一実施例を説明するための図、第3図は運転時におけ
るライナー表面上の小球を説明するための図であり、第
4図は更に他の実施例を説明するための図である。 1,10・・・・・・針線、2・・・・・・熱電子フィ
ラメント、3・・・・・・熱電子、4,15.20・・
・・・・小球、5・・・・・・電子銃、6・・・・・・
電子線、7・・・・・・磁界偏向器、8・・・・・・水
冷ホルダー、9.16・・・・・・ライナー、11・・
・・・・通過孔、12・・・・・・ローラー、14・・
・・・・7駆動源、17・・・・・・針線、18・・・
・・・中心部、19・・・・・・周辺部。
Fig. 1 is a diagram for explaining the prior art, Fig. 2 is a diagram for explaining an embodiment of the present invention, and Fig. 3 is a diagram for explaining small balls on the liner surface during operation. 4 is a diagram for explaining still another embodiment. 1,10...Needle wire, 2...Thermionic filament, 3...Thermionic, 4,15.20...
...Small ball, 5...Electron gun, 6...
Electron beam, 7... Magnetic field deflector, 8... Water cooling holder, 9.16... Liner, 11...
... Passing hole, 12 ... Roller, 14 ...
...7 driving source, 17...needle line, 18...
...center, 19...periphery.

Claims (1)

【特許請求の範囲】[Claims] 1 ライナー表面に連通ずる通過孔を通して針線状の蒸
発材をその先端が該ライナー表面の近傍に到達するよう
に導出し、該ライナー表面と蒸発材の先端部とを電子衝
撃により加熱し、該加熱によって前記蒸発材の先端部を
溶融し、該溶融した蒸発材によって前記ライナー表面上
に小球を形成し、該小球表面から蒸発材を蒸発せしめて
被蒸着材に被着させるようになしたことを特徴とする電
子ビーム蒸着力法。
1. Guide out a needle-like evaporator through a passage hole communicating with the liner surface so that its tip reaches near the liner surface, heat the liner surface and the tip of the evaporator by electron impact, and The tip of the evaporator is melted by the melted evaporator, a small sphere is formed on the liner surface by the melted evaporator, and the evaporator is evaporated from the surface of the small sphere and deposited on the material to be evaporated. The electron beam evaporation force method is characterized by:
JP12301278A 1978-10-05 1978-10-05 Electron beam evaporation method Expired JPS5814876B2 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP12301278A JPS5814876B2 (en) 1978-10-05 1978-10-05 Electron beam evaporation method

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP12301278A JPS5814876B2 (en) 1978-10-05 1978-10-05 Electron beam evaporation method

Publications (2)

Publication Number Publication Date
JPS5550465A JPS5550465A (en) 1980-04-12
JPS5814876B2 true JPS5814876B2 (en) 1983-03-22

Family

ID=14850048

Family Applications (1)

Application Number Title Priority Date Filing Date
JP12301278A Expired JPS5814876B2 (en) 1978-10-05 1978-10-05 Electron beam evaporation method

Country Status (1)

Country Link
JP (1) JPS5814876B2 (en)

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS57171450A (en) * 1981-04-10 1982-10-22 Kyokuto Kaihatsu Kogyo Co Monitor device for crushing treatment of crusher

Also Published As

Publication number Publication date
JPS5550465A (en) 1980-04-12

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