JPS5816308B2 - semiconductor electrode - Google Patents
semiconductor electrodeInfo
- Publication number
- JPS5816308B2 JPS5816308B2 JP49119657A JP11965774A JPS5816308B2 JP S5816308 B2 JPS5816308 B2 JP S5816308B2 JP 49119657 A JP49119657 A JP 49119657A JP 11965774 A JP11965774 A JP 11965774A JP S5816308 B2 JPS5816308 B2 JP S5816308B2
- Authority
- JP
- Japan
- Prior art keywords
- semiconductor
- electrode
- sunlight
- light
- thin film
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
Classifications
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
- Y02E—REDUCTION OF GREENHOUSE GAS [GHG] EMISSIONS, RELATED TO ENERGY GENERATION, TRANSMISSION OR DISTRIBUTION
- Y02E10/00—Energy generation through renewable energy sources
- Y02E10/50—Photovoltaic [PV] energy
- Y02E10/542—Dye sensitized solar cells
Landscapes
- Photovoltaic Devices (AREA)
- Hybrid Cells (AREA)
Description
【発明の詳細な説明】
本発明は半導体を用いた光電極反応を利用する光電池あ
るいは光電解における半導体電極に関するものであり特
に本発明は太陽光の波長領域に感度を有する半導体電極
に関するものである。DETAILED DESCRIPTION OF THE INVENTION The present invention relates to a semiconductor electrode in a photovoltaic cell or photoelectrolysis that utilizes a photoelectrode reaction using a semiconductor, and particularly the present invention relates to a semiconductor electrode that is sensitive to the wavelength region of sunlight. .
光電極反応とは、物質にその固有吸収域の波長の光を照
射すれば価電子帯の電子が励起状態となり、この励起状
態の関与する電極反応を電気化学系では光電極反応と呼
んでいる。A photoelectrode reaction is when a substance is irradiated with light at a wavelength in its specific absorption range, electrons in the valence band become excited, and electrode reactions involving this excited state are called photoelectrode reactions in electrochemical systems. .
光電極反応は「工業化学雑誌j Vol 72 、 A
I(1969)、P、108あるいはrNATURE。The photoelectrode reaction is described in “Industrial Chemistry Magazine J Vol 72, A
I (1969), P, 108 or rNATURE.
Vo1238(1972)P、37に腰部等によって報
告されている。This was reported by Kobe et al. in Vol. 1238 (1972) P, 37.
更に同原理を応用した光電池あるいは光電解方法が腰部
等によって出願された特公昭46−20182.48−
13825に示されている。Furthermore, a photovoltaic cell or photoelectrolysis method applying the same principle was filed by Koshibe et al. in Japanese Patent Publication No. 46-20182.48-
13825.
腰部等は、特に光電解における半導体電極としてn型半
導体のルチル(TiO2)が有効であると報告している
。Kobe et al. reported that rutile (TiO2), an n-type semiconductor, is particularly effective as a semiconductor electrode in photoelectrolysis.
TiO□電解表面に光照射するとTiO2のバンドギャ
ップ3.OeVに相当する415mμより短波長の光に
よって励起されてアノード電流が著しく増加する。When the TiO□ electrolytic surface is irradiated with light, the band gap of TiO2 increases. Excitation by light with a wavelength shorter than 415 mμ, which corresponds to OeV, significantly increases the anode current.
またこのアノード電流は光の照射強度にほぼ直線的に依
存する。Further, this anode current depends almost linearly on the light irradiation intensity.
更にTiO2の光電極反応は、短波長の光照射tとよっ
て半導体表面の近傍に光励起が生じ、価電子帯に正孔が
蓄積され、伝導帯に電子が蓄積されることによって起こ
ると考えられる。Furthermore, the photoelectrode reaction of TiO2 is thought to occur due to photoexcitation occurring near the semiconductor surface due to short-wavelength light irradiation t, holes being accumulated in the valence band, and electrons being accumulated in the conduction band.
一方半導体電極の電極板となる材料の必要条件の一つと
して化学的に高い安定性を有することが挙げられるがT
iO2は充分に化学的に安定である。On the other hand, one of the requirements for the material that becomes the electrode plate of a semiconductor electrode is to have high chemical stability.
iO2 is sufficiently chemically stable.
以上の特性を有するTiO□を半導体電極として光電池
、光電解を実現した場合、T io 2は415mμよ
り短波長の光でしか励起されないので太陽光の利用率は
2%と′非常に低くなり光エネルギーの利用という点か
らは理想的でない。If a photovoltaic cell or photoelectrolysis is realized using TiO□, which has the above characteristics, as a semiconductor electrode, the utilization rate of sunlight will be very low at 2% because T io 2 will only be excited by light with a wavelength shorter than 415 mμ, and the light This is not ideal from the point of view of energy utilization.
そこで本発明は太陽光の波長領域の光を吸収して光起電
力を生ずる半導体を用いて光電極反応による光電池ある
いは光電解に使用可能な半導体電極を得ようとするもの
である。Therefore, the present invention aims to obtain a semiconductor electrode that can be used for photovoltaic cells or photoelectrolysis by photoelectrode reaction using a semiconductor that absorbs light in the wavelength range of sunlight and generates photovoltaic force.
太陽光の波長領域の光の吸収により光起電力を生ずる代
表的な半導体としてはGaP、GaAs、GaAlAs
、GaAsP。Typical semiconductors that generate photovoltaic force by absorbing light in the sunlight wavelength range include GaP, GaAs, and GaAlAs.
, GaAsP.
InP等の■−V族化合物半導体あるいはCdS等の…
−■族化合物半導体などがある。■-V group compound semiconductors such as InP or CdS etc...
- Group compound semiconductors, etc.
しかしながらこれらの化合物半導体は、半導体電極とし
て使用するのに充分化学的に安定であるとは云えない。However, these compound semiconductors cannot be said to be chemically stable enough to be used as semiconductor electrodes.
例えば上記化合物半導体を電極として水の光電解を行っ
た場合電解質溶液中に電解物質が溶は出し、溶解電流が
流れるので電極が侵食されてしまう。For example, when photoelectrolysis of water is carried out using the above compound semiconductor as an electrode, the electrolyte dissolves into the electrolyte solution, and a dissolution current flows, resulting in erosion of the electrode.
そこで本発明は太陽光の吸収で光起電力を生ずる上記半
導体の表面を化学的に安定な薄膜で被覆し、半導体電極
としようとするものである。Therefore, the present invention aims to coat the surface of the above-mentioned semiconductor, which generates photovoltaic force by absorbing sunlight, with a chemically stable thin film to form a semiconductor electrode.
以下本発明の一実施例を詳細に説明する。An embodiment of the present invention will be described in detail below.
第1図は本発明の半導体電極の一実施例で、断面図を示
したものである。FIG. 1 shows a cross-sectional view of an embodiment of the semiconductor electrode of the present invention.
第1図において1は太陽光の波長領域の光の吸収で光起
電力を生ずる半導体、2は半導体1の表面を被覆する化
学的に安定な薄膜であり、透明であることが望ましく、
また半導体1内で発生した電子が通りぬける厚さにする
必要がある、3はリード線であり、溶液と接する部分は
安定な物質でおおわれている。In FIG. 1, 1 is a semiconductor that generates photovoltaic force by absorbing light in the sunlight wavelength range, and 2 is a chemically stable thin film that coats the surface of the semiconductor 1, preferably transparent.
Further, the thickness must be such that the electrons generated in the semiconductor 1 can pass through. 3 is a lead wire, and the part that comes into contact with the solution is covered with a stable substance.
なお薄膜2は太陽光に対して透明でなければならないが
導体、半導体、絶縁体いずれでも化学的に安定であれば
使用可能である。The thin film 2 must be transparent to sunlight, but any conductor, semiconductor, or insulator can be used as long as it is chemically stable.
また薄膜2の厚さは半導体1中で発生した電子、正孔が
通りぬけるような厚さにする。Further, the thickness of the thin film 2 is set so that electrons and holes generated in the semiconductor 1 can pass through.
たとえば薄膜2として絶縁体を利用した場合、トンネル
効果で電子、あるいは正孔が薄膜2を通りぬけるような
厚さにする。For example, when an insulator is used as the thin film 2, the thickness is set so that electrons or holes can pass through the thin film 2 due to the tunnel effect.
またリード線3は半導体1としてGaPを用いた場合に
つい−て詳細に説明すると、GaPのバンドギャップ2
.25eVに相当する550mμ以下の波長の光によっ
て励起されて7.19 mA/fflのアノード電流が
流れる。In addition, to explain in detail the case where GaP is used as the semiconductor 1, the lead wire 3 has a band gap of 2
.. It is excited by light having a wavelength of 550 mμ or less, which corresponds to 25 eV, and an anode current of 7.19 mA/ffl flows.
この時の太陽光に対するエネルギー回収率すなわち照射
された太陽光のエネルギーのうち光起電力を生ずるため
に吸収されるエネルギーの割合は19%とTiO2の約
十倍である。At this time, the energy recovery rate for sunlight, that is, the ratio of energy absorbed to generate photovoltaic force among the energy of irradiated sunlight, is 19%, which is about ten times that of TiO2.
しかしGaP半導体を被覆する薄膜2としてGa2O3
を用いると、Ga2O3の光の透過率あるいは膜の厚さ
等によって光の吸収率が低下し、従ってエネルギー回収
率が低下することは云うまでもないが、TiO2よりは
るかに大きな起電力が得られる。However, as the thin film 2 covering the GaP semiconductor, Ga2O3
When using TiO2, the light absorption rate decreases depending on the light transmittance of Ga2O3 or the thickness of the film, and therefore, it goes without saying that the energy recovery rate decreases, but a much larger electromotive force can be obtained than with TiO2. .
また薄膜2としては光の屈折率が半導体1に近い材料を
用いた方がエネルギー損失を減少させることができるこ
とも云うまでもない。It goes without saying that energy loss can be reduced by using a material for the thin film 2 that has a light refractive index close to that of the semiconductor 1.
第1表に本発明に使用可能な半導体材料の特性をTiO
2と比較して示した。Table 1 shows the characteristics of semiconductor materials that can be used in the present invention.
This is shown in comparison with 2.
第1表に示すように従来使用されているTlO2が41
3mμ以下の短波長の光しか吸収しないのに対し、Ga
P、CdSは550mμ、520mμと可視光領域の光
まで吸収して光電流に変換しているし、またGaAs、
InPは885mμ、932mμと更に長波長領域の光
まで吸収するので太陽光の利用率を高めることができる
。As shown in Table 1, the conventionally used TlO2 is 41
While Ga only absorbs light with a short wavelength of 3 mμ or less,
P, CdS absorbs light in the visible light range of 550 mμ and 520 mμ and converts it into photocurrent, and GaAs,
Since InP absorbs light in longer wavelength regions such as 885 mμ and 932 mμ, it is possible to increase the utilization rate of sunlight.
またGaAsP混晶においては混晶の組成比を変化させ
ることによって550mμ〜885mμの波長領域の光
を吸収して光電流に変換させることができる。Furthermore, in the GaAsP mixed crystal, by changing the composition ratio of the mixed crystal, light in a wavelength range of 550 mμ to 885 mμ can be absorbed and converted into photocurrent.
なお本発明の半導体電極において光照射によって光起電
力を生ずる半導体の表面に設ける薄膜としては太陽光に
対して透明でありかつ化学的に安定で更に半導体との結
合強度の太きいものが使用可能である3例えばSiO2
,Al2O3などの酸化物による薄膜あるいはGaN、
AANなとの窒化物更に金属あるいは金属酸化物などの
薄膜が考えられる。In addition, in the semiconductor electrode of the present invention, as the thin film provided on the surface of the semiconductor that generates photovoltaic force upon irradiation with light, it is possible to use a film that is transparent to sunlight, is chemically stable, and has a strong bond with the semiconductor. For example, SiO2
, a thin film of oxides such as Al2O3 or GaN,
In addition to nitrides such as AAN, thin films of metals or metal oxides can be considered.
以下第2図に本発明の半導体電極を用いて水の光電解を
行なう場合の実施例を示す。FIG. 2 shows an example in which photoelectrolysis of water is carried out using the semiconductor electrode of the present invention.
第2図において半導体1としてn型GaPを用い表面に
G a 203薄膜2を形成してアノード電極とし、一
方のカソード電極4としては例えば白金黒を用いる。In FIG. 2, n-type GaP is used as the semiconductor 1, a Ga 203 thin film 2 is formed on the surface thereof to serve as an anode electrode, and one cathode electrode 4 is made of, for example, platinum black.
アノード電極側の電解液5としてアルカリ性水溶液を、
カソード電極側の電解液6として酸性水溶液をそれぞれ
ガラス又は石英製の容器7,7′に満たす。An alkaline aqueous solution is used as the electrolyte 5 on the anode electrode side,
Glass or quartz containers 7 and 7' are respectively filled with an acidic aqueous solution as the electrolyte 6 on the cathode side.
容器7,7′は隔膜8を介して結続している。The containers 7, 7' are connected via a diaphragm 8.
アノード電極とカソード電極とは負荷9を介して接続し
ている。The anode electrode and the cathode electrode are connected via a load 9.
アノード電極に太陽光を照射すると半導体電極に光起電
力が生じアノード電極側から酸素ガス、カソード電極側
から水素ガスがそれぞれ発生する。When the anode electrode is irradiated with sunlight, a photovoltaic force is generated in the semiconductor electrode, and oxygen gas is generated from the anode electrode side and hydrogen gas is generated from the cathode electrode side.
以上に示したように本発明は太陽光の照射によつて光起
電力を生ずる半導体を電極基板として用い、この際生ず
る半導体の化学的な不安定性を解消するために半導体表
面を化学的に安定でかつ太陽光に対して透明な薄膜で被
覆した半導体電極である。As described above, the present invention uses a semiconductor that generates photovoltaic force when irradiated with sunlight as an electrode substrate, and chemically stabilizes the semiconductor surface to eliminate the chemical instability of the semiconductor that occurs at this time. It is a semiconductor electrode coated with a thin film that is large and transparent to sunlight.
本発明ζこよることによって太陽エネルギーを有効に利
用することができる半導体電極を得ることができる。By relying on the present invention ζ, a semiconductor electrode that can effectively utilize solar energy can be obtained.
第1図は、本発明の半導体電極の断面図、第2図は、第
1図の電極を用いて水の光分解をする場合の装置の概略
図である。
1・・・・・・半導体、2・・・・・・化学的に安定な
薄膜。FIG. 1 is a sectional view of a semiconductor electrode of the present invention, and FIG. 2 is a schematic diagram of an apparatus for photolyzing water using the electrode of FIG. 1. 1... Semiconductor, 2... Chemically stable thin film.
Claims (1)
解液と接する部分を太陽光に対して透明でかつ電解液に
対して化学的に安定な薄膜で被覆したことを特徴とする
光電極反応用半導体電極。1. A photoelectrode reaction device characterized by coating the part of a semiconductor that comes into contact with an electrolyte solution with a thin film that is transparent to sunlight and chemically stable to the electrolyte solution and generates a photovoltaic force when irradiated with sunlight. semiconductor electrode.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP49119657A JPS5816308B2 (en) | 1974-10-16 | 1974-10-16 | semiconductor electrode |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP49119657A JPS5816308B2 (en) | 1974-10-16 | 1974-10-16 | semiconductor electrode |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS5145993A JPS5145993A (en) | 1976-04-19 |
| JPS5816308B2 true JPS5816308B2 (en) | 1983-03-30 |
Family
ID=14766841
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP49119657A Expired JPS5816308B2 (en) | 1974-10-16 | 1974-10-16 | semiconductor electrode |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS5816308B2 (en) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS61149764U (en) * | 1985-03-09 | 1986-09-16 |
Families Citing this family (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS51151272A (en) * | 1975-06-20 | 1976-12-25 | Toray Ind Inc | A wet type photocell |
| JPS51151273A (en) * | 1975-06-20 | 1976-12-25 | Toray Ind Inc | A light radiation type water electrolysis system |
| US6471834B2 (en) | 2000-01-31 | 2002-10-29 | A. Nicholas Roe | Photo-assisted electrolysis apparatus |
Family Cites Families (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS5249959B2 (en) * | 1972-06-27 | 1977-12-21 |
-
1974
- 1974-10-16 JP JP49119657A patent/JPS5816308B2/en not_active Expired
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS61149764U (en) * | 1985-03-09 | 1986-09-16 |
Also Published As
| Publication number | Publication date |
|---|---|
| JPS5145993A (en) | 1976-04-19 |
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