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JPS5817825B2 - Method for producing metal-coated inorganic fine particles - Google Patents
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JPS5817825B2 - Method for producing metal-coated inorganic fine particles - Google Patents

Method for producing metal-coated inorganic fine particles

Info

Publication number
JPS5817825B2
JPS5817825B2 JP56082249A JP8224981A JPS5817825B2 JP S5817825 B2 JPS5817825 B2 JP S5817825B2 JP 56082249 A JP56082249 A JP 56082249A JP 8224981 A JP8224981 A JP 8224981A JP S5817825 B2 JPS5817825 B2 JP S5817825B2
Authority
JP
Japan
Prior art keywords
particles
inorganic fine
fine particles
aggregates
skeleton
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
JP56082249A
Other languages
Japanese (ja)
Other versions
JPS57198254A (en
Inventor
井上啓二郎
松本弘
桝井修一
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Uemera Kogyo Co Ltd
Original Assignee
Uemera Kogyo Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Uemera Kogyo Co Ltd filed Critical Uemera Kogyo Co Ltd
Priority to JP56082249A priority Critical patent/JPS5817825B2/en
Publication of JPS57198254A publication Critical patent/JPS57198254A/en
Publication of JPS5817825B2 publication Critical patent/JPS5817825B2/en
Expired legal-status Critical Current

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  • Chemically Coating (AREA)
  • Hard Magnetic Materials (AREA)
  • Soft Magnetic Materials (AREA)
  • Conductive Materials (AREA)

Description

【発明の詳細な説明】 この発明は金属で被覆された微粒アルミナ等の無機微粒
子の製造方法に関し、更に詳述すれはニッケル、ニッケ
ルーコバルト、銅などの金属を均質に被膜せしめ、電導
性或いは磁性等の特性を付与した5μ以下の無機微粒子
を製造する方法に関する。
DETAILED DESCRIPTION OF THE INVENTION The present invention relates to a method for producing inorganic fine particles such as fine alumina particles coated with a metal, and more specifically, the present invention relates to a method for producing inorganic fine particles such as fine alumina particles coated with a metal, and more specifically, by uniformly coating metals such as nickel, nickel-cobalt, copper, etc. The present invention relates to a method for producing inorganic fine particles of 5 μm or less that have properties such as magnetism.

従来、電導性微粒子としては無機材吉してのカーボン粒
子、或いはニッケル、銀等の金属粒子が知られているが
、アルミナ等の非電導性の無機微粒子自体を電導化する
例は殆んど知られていない。
Conventionally, inorganic particles such as carbon particles or metal particles such as nickel and silver have been known as conductive particles, but there have been few examples of making non-conductive inorganic particles themselves, such as alumina, conductive. unknown.

このため、従来は無機微粒子に電導性を付与する場合、
無機微粒子にニッケルや銀等の微粉を混合することによ
り電導性を持たせることが行なオ〕れていたが、これは
電導性材料が無機微粒子よりなる母相に単に分散されて
いるに過きないもので均一でないという欠点を有してい
た。
For this reason, conventionally when imparting electrical conductivity to inorganic fine particles,
It has been attempted to make inorganic particles conductive by mixing fine powders of nickel, silver, etc., but this is because the conductive material is simply dispersed in a matrix of inorganic particles. It had the disadvantage that it was difficult to clean and was not uniform.

本発明者は上記事情に鑑み、非電導性の無機微粒子、或
いは無機セラミック微粒子、例えば粒径5μ以下の微粒
アルミナ等の個々の粒子を均質に電導化することについ
て鋭意研究を行った結果、粒径5μ以下の微粒アルミナ
等の無機微粒子の形骸粒子又は集合体であって、その平
均粒子サイズ10μ以上のものに対し、無電解めっきを
施した後、必要により電気めっきを行い、金属が被覆さ
れた形骸粒子又は集合体を最後に粉砕するこきにより、
個々に均質に金属被膜された粒抛5μ以下の無機微粒子
を簡単にしかも確実に得ることができることを知見した
In view of the above-mentioned circumstances, the present inventor conducted intensive research on making individual particles of non-conductive inorganic particles or inorganic ceramic particles, such as fine alumina particles with a particle size of 5 μm or less, uniformly conductive. Substance particles or aggregates of fine inorganic particles such as fine alumina particles with a diameter of 5μ or less, which have an average particle size of 10μ or more, are coated with metal by electroless plating and, if necessary, electroplating. By the final grinding of crushed particles or aggregates,
It has been found that inorganic fine particles each having a particle size of 5 μm or less and which are individually uniformly coated with metal can be easily and reliably obtained.

即ち、本発明者らが種々検討を行った結果では、無機質
粉体自体に無電解めっきを施す場合、粉体が籾粒でない
と沈殿、回収等が容易でなく、特に粒径が5μ以下のも
のは沈殿に時間を要し、また炉布の目を余程細かくしな
いと炉布を通過するなどの問題が生じ、経済性、量産性
に劣る」−1得られる無電解めっき被膜が被覆された粒
子は全体的に均質性に劣り、従って粒径5μ以下の個々
の無機微粒子に直接均質な金属被覆を行なうことは非常
に困難であるこ吉を矢口見した。
That is, as a result of various studies conducted by the present inventors, it has been found that when applying electroless plating to the inorganic powder itself, precipitation and recovery are not easy if the powder is not rice grains, especially if the powder is not rice grains. It takes time for the material to settle, and if the mesh of the furnace cloth is not very fine, problems such as passing through the furnace cloth will occur, making it less economical and mass-producible.''-1 The resulting electroless plating film is Kokichi and Yaguchi observed that the particles had poor homogeneity as a whole, and therefore it was extremely difficult to apply a homogeneous metal coating directly to individual inorganic fine particles with a particle size of 5 μm or less.

このため、更に検討を進めた結果、上述したように無機
微粒子の形骸粒子又は集合体に無電解めっきを施すこと
によりこれら形骸粒子又は集合体に無電解めっき被膜が
均一に被覆されると共に、これをボールミル等で粉砕す
ることにより形骸粒子又は集合体がそれぞれ個々の粒子
に分割されて金属が均質に被膜された無機微粒子が得ら
れ、この方法による場合には各種の電子材料、充填材等
として好適に使用し得る均質な金属被覆無機微粒子が能
率よく簡単に、しかも経済的に製造でき、この方法が金
属被覆無機微粒子の工業的製造法として非常に優れてい
ることを見い出し、本発明を完成するに至ったものであ
る。
Therefore, as a result of further investigation, we found that by applying electroless plating to the phantom particles or aggregates of inorganic fine particles, these phantom particles or aggregates are uniformly coated with an electroless plating film. By crushing with a ball mill etc., the skeletal particles or aggregates are divided into individual particles to obtain inorganic fine particles homogeneously coated with metal. When this method is used, it can be used as various electronic materials, fillers, etc. It was discovered that homogeneous metal-coated inorganic fine particles that can be suitably used can be produced efficiently, easily, and economically, and that this method is extremely superior as an industrial method for producing metal-coated inorganic fine particles, and the present invention was completed. This is what I came to do.

以下、本発明につき更に詳しく説明する。The present invention will be explained in more detail below.

本発明の金属被覆無機微粒子の製造方法は、無機微粒子
の形骸粒子又は集合体に無電解めっきを施し、必要によ
り更に電気めっきを施した後、これを粉砕するものであ
る。
The method for producing metal-coated inorganic fine particles of the present invention involves subjecting a skeleton particle or aggregate of inorganic fine particles to electroless plating, further electroplating if necessary, and then pulverizing this.

この場合、無機微粒子としては、例えばAt203゜S
i02 、TiO2、BaTiOs 、MnO2,
Cr2O3、Fe20B等の酸化物、Ba S04等の
硫酸塩、A、/、(OH)s 。
In this case, as the inorganic fine particles, for example, At203°S
i02, TiO2, BaTiOs, MnO2,
Oxides such as Cr2O3 and Fe20B, sulfates such as BaS04, A,/, (OH)s.

W(0H)2 、Cr (OH)a等の水酸化物、C,
WC。
Hydroxides such as W(0H)2, Cr(OH)a, C,
W.C.

SiC等の炭化物、TiN等の窒化物、ケイ化物、ホウ
化物、その他ガラスなどのセラミック材料として用いら
れている無機微粒子が使用され得る。
Carbides such as SiC, nitrides such as TiN, silicides, borides, and other inorganic fine particles used as ceramic materials such as glass may be used.

本発明は前記無機微粒子、特に粒径5μ以下、通常1μ
以下の無機微粒子の形骸粒子又は集合体を使用し、これ
ら形骸粒子又は集合体に無電解めっきを施すものである
が、形骸粒子又は集合体はその1個の粒子サイズが10
μ以上、特に20μ以上のものが好適に用いられる。
The present invention is directed to the inorganic fine particles, particularly the particle size of 5 μm or less, usually 1 μm.
The following phantom particles or aggregates of inorganic fine particles are used and electroless plating is applied to these phantom particles or aggregates.
A thickness of μ or more, particularly 20 μ or more, is preferably used.

なお、前記無機微粒子の形骸粒子又は集合体は、適当な
金属塩或いは無機微粒子を適当な温度で仮焼することに
よって得ることができる。
The skeleton particles or aggregates of the inorganic fine particles can be obtained by calcining an appropriate metal salt or inorganic fine particles at an appropriate temperature.

例えば、微粒アルミナの形骸粒子の場合には、アルミニ
ウムの硫酸塩、アンモニア炭酸塩、アンモニア硫酸塩、
塩化物、微粒水酸化物、硝酸塩の1種又は2種以上を1
000°C以上、好ましくは1000〜1300℃の温
度で仮焼することによって得られるものが使用される。
For example, in the case of fine alumina particles, aluminum sulfate, ammonia carbonate, ammonia sulfate,
One or more of chlorides, fine hydroxides, and nitrates
Those obtained by calcining at a temperature of 000°C or higher, preferably 1000 to 1300°C are used.

この形骸粒子は、上記原料、の熱分解により形成された
球形成いはマユ形状を有するもので、粒径5μ以下の微
粒アルミナの連続した粒子である(第1,2図参照)。
The skeleton particles have a spherical or cocoon shape formed by thermal decomposition of the raw material, and are continuous particles of fine alumina with a particle size of 5 μm or less (see Figures 1 and 2).

また、微粒アルミナの集合体の場合には、5μ以下の微
粒アルミナ及び/又は気相法によって製造されるγアル
ミナを1100℃以上、好ましくは1200〜1300
℃の温度で仮焼することによって得らイするものが使用
できる。
In addition, in the case of an aggregate of fine alumina, fine alumina of 5μ or less and/or γ alumina produced by a vapor phase method is heated at a temperature of 1100°C or higher, preferably 1200 to 1300°C.
Those obtained by calcining at a temperature of °C can be used.

この微粒アルミナの集合体は、微粒アルミナの再仮焼に
よる粒成長と不連続粒子の凝集体を相称したもので、粒
径5μ以下の微粒アルミナの集合体である(第3,4図
参照)。
This aggregate of fine alumina is a combination of grain growth due to re-calcination of fine alumina and aggregates of discontinuous particles, and is an aggregate of fine alumina with a particle size of 5μ or less (see Figures 3 and 4). .

更に、二酸化チタンの形骸粒子はチタンの硫酸塩、アン
モニア硫酸塩から600℃以上の仮焼によりつくること
ができ、また集合体は二酸化チタンに微量のアルカリ塩
を添加し、800℃以上の仮焼により得ることができる
Furthermore, titanium dioxide skeleton particles can be made from titanium sulfate or ammonia sulfate by calcining at 600°C or higher, and aggregates can be made by adding a small amount of alkali salt to titanium dioxide and calcining at 800°C or higher. It can be obtained by

本発明においては、前記無機微粒子の形骸粒子又は集合
体に対して無電解めっきを施す。
In the present invention, electroless plating is applied to the skeleton particles or aggregates of the inorganic fine particles.

この無電解めっき法としては公知の方法が採用し得、前
記無機微粒子の形骸粒子又は集合体に金属パラジウム等
の触媒体を付着させた後、所用の無電解めっき液中に浸
漬等することによって無電解めっきを行うものである。
As this electroless plating method, a known method can be adopted, and after attaching a catalyst such as metal palladium to the skeleton particles or aggregates of the inorganic fine particles, it is immersed in the required electroless plating solution. It performs electroless plating.

この場合、触媒体付着方法としては、例えば形骸粒子又
は集合体を第1錫塩の酸性溶液に浸漬した後、パラジウ
ム塩の酸性溶液に浸漬する方法(いわゆるセンシタイジ
ングーアクチベイションプロセス)、第1錫塩とパラジ
ウム塩とを含むいわゆるコロイドパラジウム溶液に浸漬
した後、酸洗する方法、パラジウム塩の酸性溶液に浸漬
した後、還元剤溶液に浸漬する方法、或いはこれらを組
合せて用いる方法など、適宜な方法が採用し得るが、つ
きまわりの点でセンシタイジングーアクチベイションプ
ロセスが好ましく、特にこの方法を2〜3回繰り返すこ
とが望ましい。
In this case, methods for attaching the catalyst include, for example, a method in which the skeleton particles or aggregates are immersed in an acidic solution of a stannous salt and then in an acidic solution of a palladium salt (so-called sensitizing-activation process); A method of immersing in a so-called colloidal palladium solution containing a tin salt and a palladium salt and then pickling, a method of immersing in an acidic solution of palladium salt and then immersing in a reducing agent solution, or a method of using a combination of these methods, etc. Although any suitable method may be employed, a sensitizing-activation process is preferred from the viewpoint of coverage, and it is particularly desirable to repeat this method two to three times.

無電解めっきの種類は、製品(金属被覆無機微粒子)に
要求される機能により適宜選定され、銅、ニッケル、コ
バルト、ニッケルーコバルト合金等、所望の無電解めっ
きが施される。
The type of electroless plating is appropriately selected depending on the function required of the product (metal-coated inorganic fine particles), and a desired electroless plating such as copper, nickel, cobalt, nickel-cobalt alloy, etc. is applied.

なお、本発明においては、無電解めっきは酸性、中性、
アルカリ性のいずれであっても差支えなく、まためっき
温度、還元剤の種類等も制限されない。
In addition, in the present invention, electroless plating is acidic, neutral,
It does not matter whether it is alkaline or not, and there are no restrictions on the plating temperature, type of reducing agent, etc.

更に、無電解めっき被膜の厚さも製品に要求される機能
によって適宜選定されるが、好ましくは0.1μ以上の
膜厚である。
Further, the thickness of the electroless plating film is also appropriately selected depending on the functions required of the product, but preferably the film thickness is 0.1 μm or more.

前記無電解めっきを施した後は、必要によりバレル法、
編付は法等を採用して電気めっきを施すこともできる。
After applying the electroless plating, barrel method,
For knitting, electroplating can also be applied using methods such as methods.

この場合、電気めっきの種類、膜厚等も製品に要求され
る機能などにより選択する。
In this case, the type of electroplating, film thickness, etc. are selected depending on the functions required for the product.

めっき後は、金属膜が形成された形骸粒子又は集合体を
粉砕する。
After plating, the particles or aggregates on which the metal film is formed are crushed.

この場合、粉砕手段としてはボールミル等が用いられる
In this case, a ball mill or the like is used as the crushing means.

そして、この粉砕工程により形骸粒子又は集合体は5μ
以下の個々の粒子に分割、粉砕され、それぞれ金属膜が
均質に被覆された粒径5μ以下の無機微粒子が得られる
ものである。
Through this crushing process, the particles or aggregates are reduced to 5 μm.
The following individual particles are divided and pulverized to obtain inorganic fine particles having a particle size of 5 μm or less, each homogeneously coated with a metal film.

このようにして得られた金属被覆無機微粒子は、電導性
或いは磁性等の特性が付与され、電子材料として、また
樹脂やフィルム等の充填材などとして有効に使用し得る
The metal-coated inorganic fine particles thus obtained are imparted with properties such as conductivity or magnetism, and can be effectively used as electronic materials and as fillers for resins, films, and the like.

而して、本発明によれば、ニッケル、銅等の金属が均質
に被覆された粒径5μ以下の無機微粒子を簡単かつ能率
的にしかも確実に製造することができ、また本発明法は
経済的で工業的製造法として優れたものである。
According to the present invention, inorganic fine particles having a particle size of 5 μm or less that are homogeneously coated with metals such as nickel and copper can be easily, efficiently, and reliably produced, and the method of the present invention is economical. This is an excellent industrial manufacturing method.

以下、実施例を示して本発明を具体的に説明するが、本
発明は下記の実施例に限定されるものではない。
EXAMPLES Hereinafter, the present invention will be specifically explained with reference to Examples, but the present invention is not limited to the following Examples.

実施例 1 微粒アルミナの形骸粒子をアルカリ浸漬脱脂し、水洗後
、酸洗(濃塩酸400 ml、/ 、l )を行う。
Example 1 Fine alumina skeleton particles are degreased by immersion in an alkali, washed with water, and then pickled (concentrated hydrochloric acid 400 ml/l).

次いで、下記溶液 5nC4・2H2015?/l pH2,0(塩酸で調整) を用いて室温で5分間センシタイジングを行い、水洗後
下記溶液 PdC40,2?/l 、H2,0(塩酸で調整) にて40°Cで3分間アクチベイションを行い、水。
Next, the following solution 5nC4・2H2015? /l pH 2.0 (adjusted with hydrochloric acid) was used for sensitizing at room temperature for 5 minutes, and after washing with water, the following solution PdC40.2? /l, H2,0 (adjusted with hydrochloric acid) for 3 minutes at 40°C, followed by water.

洗する。Wash.

上記のセンシタイジング及びアクチベイション処理を再
度繰り返した後、上材工業(株)製無電解ニッケルめっ
き″DELニッケルめつき″(これはジメチルボラザン
を還元剤として用いる無電解ニッケルめっきで、この析
出膜はホウ素1゜%以下のニッケルーホウ素からなるも
のである)を60℃で5分間行い、前記形−粒子に約0
.5μの無電解ニッケルーホウ素膜を形成する。
After repeating the above sensitizing and activation processing again, electroless nickel plating "DEL nickel plating" manufactured by Uezai Kogyo Co., Ltd. (this is electroless nickel plating using dimethylborazane as a reducing agent), This precipitated film is made of nickel-boron containing less than 1% boron) at 60°C for 5 minutes, and the shape of the particles is about 0.
.. A 5μ electroless nickel-boron film is formed.

これを水洗し、次に湯洗した後、乾燥し、最後に前記形
骸粒子をボールミルで粉砕して個々の微粒子に分4割し
、粒径5μ以下の金属(=”ツケルーホウ素)被膜微粒
アルミナを得る。
This is washed with water, then hot water, dried, and finally, the skeleton particles are crushed in a ball mill, divided into 4 individual fine particles, and metal (boron) coated fine alumina particles with a particle size of 5μ or less are prepared. get.

この得られた微粒アルミナを顕微鏡で観察した結果、い
ずれの薇粒もニッケルーホウ素無電解めっき膜が均質に
被覆していることが認められた。
As a result of observing the obtained fine alumina particles under a microscope, it was found that each of the alumina particles was uniformly coated with a nickel-boron electroless plating film.

なお、こめ実轡例においては、微粒アルミナの形骸粒子
きしては、アンモニウム明ばんを1200℃で3時間仮
焼したものを用いた。
In the rice grain example, ammonium alum calcined at 1200° C. for 3 hours was used as the fine alumina particles.

この顕微鏡写真を第1,2図に示す。This micrograph is shown in Figures 1 and 2.

第1図は倍率1500倍で1個の形骸粒子を示し、第2
図は倍率10000倍で、第1図の形骸粒子の拡大写真
である。
Figure 1 shows one skeleton particle at 1500x magnification, and the second
The figure is an enlarged photograph of the skeleton particles in Figure 1 at a magnification of 10,000 times.

実施例 2 微粒アルミナの集合体を実施例1と同様に前処理した後
、下記組成の無電解銅めっきを行った。
Example 2 After pretreating an aggregate of fine alumina particles in the same manner as in Example 1, electroless copper plating with the following composition was performed.

Cu SO4・5 H200,03ルモ/lロツセル塩
0・3 “ ホルマリン(37%) 0.3 〃安定剤
少量 pH(NaOHで調整) 12.8 めっき温度 室温 めっき後、水洗、湯洗、乾燥し、次いでボールミルで粉
砕して個々の粒子に分割し、粒径5μ以下の金属(銅)
被膜微粒アルミナを得た。
Cu SO4.5 H200.03 lumo/l lotusel salt
0.3 “Formalin (37%) 0.3 Stabilizer
Small amount pH (adjusted with NaOH) 12.8 Plating temperature After plating at room temperature, wash with water, wash with hot water, dry, then crush with a ball mill to separate into individual particles, metal (copper) with a particle size of 5μ or less
A coated fine alumina was obtained.

この微粒アルミナを顕微鏡で観察した結果、いずれの微
粒も銅が均質に被覆していた。
As a result of observing the fine alumina particles under a microscope, it was found that all the fine particles were uniformly coated with copper.

なお、微粒アルミナの集合体としては、微粒水酸化アル
ミニウムを1200℃、3時間焼成し、その後約200
℃迄冷却し、再度1300℃、3時間焼成したものを使
用した。
In addition, as an aggregate of fine alumina, fine grain aluminum hydroxide is calcined at 1200°C for 3 hours, and then heated to about 200°C.
The product was cooled to 1300°C and fired again at 1300°C for 3 hours.

第3,4図にそれぞれその顕微鏡写真を、゛示す。Figures 3 and 4 show their microscopic photographs, respectively.

第3図は倍率1500倍で1個の集合体を示し、第4図
は倍率6000倍で、第3図の集合体の拡大写真である
FIG. 3 shows one aggregate at a magnification of 1,500 times, and FIG. 4 is an enlarged photograph of the aggregate in FIG. 3 at a magnification of 6,000 times.

なおまた、実施例1,2は微粒アルミナの形骸粒子又は
集合体について述べたが、他の無機微粒子の形骸粒子又
は集合体も同様に処理することができる。
Further, although Examples 1 and 2 have been described with respect to the phantom particles or aggregates of fine alumina, phantom particles or aggregates of other inorganic fine particles can be treated in the same manner.

【図面の簡単な説明】[Brief explanation of drawings]

第1図は微粒アルミナの形骸粒子の顕微鏡写真、第2図
は同形骸粒子の拡大顕微鏡写真、第3図は微粒アルミナ
の集合体の顕微鏡写真、第4図は同集合体の拡大顕微鏡
写真である。
Figure 1 is a microscopic photograph of a skeleton particle of fine alumina, Figure 2 is an enlarged microscope photograph of a same-shaped skeleton particle, Figure 3 is a microscope photograph of an aggregate of fine alumina, and Figure 4 is an enlarged microscope photograph of the same aggregate. be.

Claims (1)

【特許請求の範囲】 1 無機微粒子の形骸粒子又は集合体に無電解めっきを
施してこれら形骸粒子又は集合体に無電解めっき金属膜
を形成し、必要により電気めっきを行った後、最後に前
記形骸粒子又は集合体を粉砕して金属で被覆された無機
微粒子を得ることを特徴とする金属被覆無機微粒子の製
造方法。 2 無機微粒子が粒径5μ以下のものである特許請求の
範囲第1項記載の製造方法。 3 無機微粒子の形骸粒子又は集合体の1個の粒子サイ
ズが10μ以上のものである特許請求の範囲第1項又は
第2項記載の製造方法。 4 無機微粒子がセラミック材料として使用されている
ものである特許請求の範囲第1項乃至第3項いずれか記
載の製造方法。 5 無機微粒子が酸化物、硫酸塩、水酸化物、炭化物、
窒化物、ケイ化物、ホウ化物、ガラスから選ばれるもの
である特許請求の範囲第4項記載の製造方法。
[Scope of Claims] 1. Electroless plating is applied to skeleton particles or aggregates of inorganic fine particles to form an electroless plated metal film on these skeleton particles or aggregates, electroplating is performed if necessary, and finally the above-mentioned A method for producing metal-coated inorganic fine particles, which comprises obtaining metal-coated inorganic fine particles by pulverizing skeleton particles or aggregates. 2. The manufacturing method according to claim 1, wherein the inorganic fine particles have a particle size of 5 μm or less. 3. The manufacturing method according to claim 1 or 2, wherein the particle size of one of the skeleton particles or aggregates of inorganic fine particles is 10 μ or more. 4. The manufacturing method according to any one of claims 1 to 3, wherein inorganic fine particles are used as the ceramic material. 5 Inorganic fine particles are oxides, sulfates, hydroxides, carbides,
5. The manufacturing method according to claim 4, wherein the material is selected from nitrides, silicides, borides, and glasses.
JP56082249A 1981-05-29 1981-05-29 Method for producing metal-coated inorganic fine particles Expired JPS5817825B2 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP56082249A JPS5817825B2 (en) 1981-05-29 1981-05-29 Method for producing metal-coated inorganic fine particles

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP56082249A JPS5817825B2 (en) 1981-05-29 1981-05-29 Method for producing metal-coated inorganic fine particles

Publications (2)

Publication Number Publication Date
JPS57198254A JPS57198254A (en) 1982-12-04
JPS5817825B2 true JPS5817825B2 (en) 1983-04-09

Family

ID=13769153

Family Applications (1)

Application Number Title Priority Date Filing Date
JP56082249A Expired JPS5817825B2 (en) 1981-05-29 1981-05-29 Method for producing metal-coated inorganic fine particles

Country Status (1)

Country Link
JP (1) JPS5817825B2 (en)

Families Citing this family (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS58154102A (en) * 1982-03-09 1983-09-13 ティーディーケイ株式会社 Conductive particles
JPS58163102A (en) * 1982-03-20 1983-09-27 ティーディーケイ株式会社 Conductive paste
JPS59107007A (en) * 1982-11-30 1984-06-21 Matsushita Electric Works Ltd Production of tungsten carbide powder
JP2531588B2 (en) * 1987-07-13 1996-09-04 出光興産株式会社 Method for producing metal-supported particles having ferromagnetism
CN108728834B (en) * 2017-05-09 2020-01-14 西安工业大学 BaTiO3Method for plating copper on ceramic surface

Also Published As

Publication number Publication date
JPS57198254A (en) 1982-12-04

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