JPS5819948B2 - Method for forming a selective absorption film for solar thermal energy on the surface of aluminum material - Google Patents
Method for forming a selective absorption film for solar thermal energy on the surface of aluminum materialInfo
- Publication number
- JPS5819948B2 JPS5819948B2 JP55081848A JP8184880A JPS5819948B2 JP S5819948 B2 JPS5819948 B2 JP S5819948B2 JP 55081848 A JP55081848 A JP 55081848A JP 8184880 A JP8184880 A JP 8184880A JP S5819948 B2 JPS5819948 B2 JP S5819948B2
- Authority
- JP
- Japan
- Prior art keywords
- selective absorption
- treatment
- forming
- aluminum material
- absorption film
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
Classifications
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
- Y02E—REDUCTION OF GREENHOUSE GAS [GHG] EMISSIONS, RELATED TO ENERGY GENERATION, TRANSMISSION OR DISTRIBUTION
- Y02E10/00—Energy generation through renewable energy sources
- Y02E10/40—Solar thermal energy, e.g. solar towers
Landscapes
- Electrochemical Coating By Surface Reaction (AREA)
Description
【発明の詳細な説明】
この発明は、アルミニウムまたはアルミニウム合金を基
体とした太陽熱集熱板等のアルミニウム材の表面に、太
陽熱エネルギーの選択吸収膜を形成する方法、特に電解
着色法による選択吸収膜の形成方法に関する。DETAILED DESCRIPTION OF THE INVENTION The present invention relates to a method for forming a selective absorption film of solar energy on the surface of an aluminum material such as a solar heat collector plate made of aluminum or an aluminum alloy as a base, particularly a selective absorption film using an electrolytic coloring method. The present invention relates to a method of forming.
浅田法とも称される電解着色法は、アルミニウム材の表
面に太陽熱エネルギーの選択吸収膜を形成するための一
般的な方法として既知であり、近時多く採用されている
。The electrolytic coloring method, also called the Asada method, is known as a general method for forming a selective absorption film for solar thermal energy on the surface of an aluminum material, and has been widely adopted recently.
この方法は、一般に二段二浴法によるものであり、第1
工程として、硫酸、シュウ酸、リン酸等の水溶液を電解
液とし、対極にアルミニウム、カーボン、ステンレス等
を用い、直流(電流密度0601〜0.5 A/ d7
7L2)もしくは交流(電流密度0.1〜0.8A/a
m2)を印加して電解を行い、アルミニウム材の表面に
多孔性の陽極酸化皮膜を生成させ、次いで第2工程とし
て、この酸化皮膜を有するアルミニウム材を、ニッケル
塩、コバルト塩、銅塩、錫塩等の金属塩を含む水溶液中
で交流(電流密度0.1〜0.8 A / dm2)を
印加して電解を行い、前記酸化皮膜の微細孔中に金属を
析出充填させて黒色化し、所期する選択吸収膜を得るも
のである。This method is generally based on a two-stage, two-bath method, in which the first
The process involves using an aqueous solution of sulfuric acid, oxalic acid, phosphoric acid, etc. as an electrolyte, using aluminum, carbon, stainless steel, etc. as a counter electrode, and applying direct current (current density 0601 to 0.5 A/d7).
7L2) or alternating current (current density 0.1-0.8A/a
m2) is applied to perform electrolysis to generate a porous anodic oxide film on the surface of the aluminum material, and then in a second step, the aluminum material with this oxide film is treated with nickel salt, cobalt salt, copper salt, tin. Electrolyzing is performed by applying alternating current (current density 0.1 to 0.8 A/dm2) in an aqueous solution containing a metal salt such as a salt, and the fine pores of the oxide film are precipitated and filled with metal to blacken it, The desired selective absorption membrane is obtained.
しかしながら、従来のかかる電解着色法においては、電
解時間にかなり長時間を要する難点があった。However, such conventional electrolytic coloring methods have the disadvantage that the electrolysis time is quite long.
即ち、第1工程の処理に通常10〜15分を要し、第2
工程の黒色化処理にも、早くて5分、通常は10〜15
分以上を必要とし生産性が悪い欠点があった。That is, the first step usually takes 10 to 15 minutes, and the second step usually takes 10 to 15 minutes.
For blackening process, it takes 5 minutes at the earliest, usually 10 to 15 minutes.
It has the drawback that it requires more than 10 minutes, resulting in poor productivity.
この発明は、かかる問題点に対し、特に第2工程の黒色
化のための電解処理工程につき、これを改善しその処理
時間の顕著な短縮化をはかることを目的とするものであ
る。SUMMARY OF THE INVENTION The present invention aims to solve these problems, particularly in the second electrolytic treatment step for blackening, and to significantly shorten the treatment time.
而して、この発明は、アルミニウム材(アルミニウムお
よびアルミニウム合金を含む)を陽極酸化処理して多孔
酸化皮膜を形成し、然る後これを金属塩を含む水溶液中
で電解処理して前記多孔酸化皮膜の微細孔中に金属を析
出充填せしめる太陽熱エネルギーの選択吸収膜を形成す
る方法において、前記金属塩を含む水溶液中での電解処
理を、金属塩の濃度がニッケル塩において80〜200
9/e、コバルト塩において80〜2009/e。Therefore, the present invention involves anodizing an aluminum material (including aluminum and aluminum alloys) to form a porous oxide film, and then electrolytically treating it in an aqueous solution containing a metal salt to form the porous oxide film. In a method for forming a selective solar energy absorption film in which metal is precipitated and filled into the fine pores of the film, electrolytic treatment in an aqueous solution containing the metal salt is carried out so that the concentration of the metal salt is 80 to 200% in the case of nickel salt.
9/e, 80-2009/e in cobalt salts.
銅塩において30〜100g/e、錫塩において15〜
509/e、鉄塩において60〜2009/eの範囲の
、常法の該電解処理に用いられる液濃度よりも相対的に
高濃度の金属塩水溶液中で、かつ液温を45〜85℃に
保持して行うことを特徴とするものである。30-100g/e for copper salt, 15-100g/e for tin salt
509/e, iron salt in the range of 60 to 2009/e, in a metal salt aqueous solution with a relatively higher concentration than that used in the conventional electrolytic treatment, and at a liquid temperature of 45 to 85 ° C. It is characterized by being held and carried out.
上記において、この明細書にいう、「常法の該電解処理
に用いられる液濃度」とは、
ニッケ< 20〜509/e
コバルト塩 20〜509/e
銅 塩 159/e
錫 塩 5 g/e未満
鉄 塩 209/e未満
をいうものであり、本発明に用いる前掲の濃度は、この
常法濃度に較べ相対的に高い値に設定されるものである
。In the above, the "liquid concentration used in the conventional electrolytic treatment" as used in this specification means: Nickel < 20-509/e Cobalt salt 20-509/e Copper salt 159/e Tin salt 5 g/e The above-mentioned concentration used in the present invention is set to a relatively high value compared to this conventional concentration.
この発明における前記の金属塩水溶液の濃度範囲の限定
理由は、下限値未満であると、良好な選択吸収膜を生成
せしめるのに長時間を要する欠点があり、また濃度が上
限値を超えるとコスト高になると共に、着色性が悪くな
って良好な選択吸収膜の生成が困難になることに基づく
ものである。The reason for limiting the concentration range of the metal salt aqueous solution in this invention is that if it is less than the lower limit, it will take a long time to form a good selective absorption membrane, and if the concentration exceeds the upper limit, it will be costly. This is because as the amount of water increases, the colorability deteriorates, making it difficult to form a good selective absorption film.
而して特に好ましい濃度範囲は、ニッケル塩において9
0〜1309/l、 mlハルト塩において90〜13
09/e、銅塩において40〜5o9/e、錫塩におい
て20〜309/e、鉄塩において70〜100 ’j
/eの範囲である。A particularly preferable concentration range is 9 for the nickel salt.
0-1309/l, 90-13 in ml Hardt's salt
09/e, 40-5o9/e for copper salts, 20-309/e for tin salts, 70-100'j for iron salts
/e range.
一方、金属塩水溶液の温度は、従来の一般的な処理条件
が20〜30℃であったのに較べ、35〜85℃とかな
り高い値に設定されるものである。On the other hand, the temperature of the metal salt aqueous solution is set to a considerably higher value of 35 to 85°C, compared to the conventional general processing conditions of 20 to 30°C.
これが45℃未満の場合には、濃度が低すぎる場合と同
様に、皮膜黒色化の進行が遅く良好な選択吸収膜を生成
せしめるのに長時間を要し、この発明の所期の目的を達
成することができない。If this temperature is lower than 45°C, as in the case where the concentration is too low, the blackening of the film will progress slowly and it will take a long time to form a good selective absorption film, thus achieving the intended purpose of the present invention. Can not do it.
逆に85℃を超える高温では、皮膜の溶解作用が太きす
ぎて、やはり良好な選択吸収膜の化成が困難である。On the other hand, at high temperatures exceeding 85° C., the dissolution effect of the film is too strong, making it difficult to form a good selective absorption film.
特に好ましい温度は、40〜60”Cの範囲である。Particularly preferred temperatures are in the range 40-60''C.
なお、他の電解条件は従来と略同様で良く、たとえば対
極にはステンレス、カーボン等を用いることができ、電
源は交流、直流、またはそれらに準する波形のいずれを
用いても良く、電圧lO〜30V、電流密度0.5〜2
.5 A/ d 12の程度で良好な処理を行いうる。The other electrolytic conditions may be approximately the same as conventional ones, for example, stainless steel, carbon, etc. may be used for the counter electrode, and the power source may be alternating current, direct current, or a waveform similar to these, and the voltage lO ~30V, current density 0.5~2
.. Good treatment can be achieved with as little as 5 A/d 12.
この発明によれば、陽極酸化皮膜の黒色化のための金属
塩処理を、上述したような高濃度、高温度の金属含有塩
水溶液中で電解処理することにより、0.5〜2.0分
の極めて短かい処理時間で完了することができ、従来の
前述したような一般的な処理条件によるときは、当該処
理に通常10〜15分な要していたのに較べ、処理時間
を大幅に短縮し得て、コイルでの連続高速化処理が可能
となり生産性の顕著な向上をはかりうるものである。According to this invention, the metal salt treatment for blackening the anodic oxide film is carried out for 0.5 to 2.0 minutes by electrolytic treatment in a high-concentration, high-temperature metal-containing salt aqueous solution as described above. The processing time can be completed in an extremely short time, compared to the conventional processing that normally takes 10 to 15 minutes under the general processing conditions mentioned above. It is possible to shorten the time, enable continuous high-speed processing using the coil, and significantly improve productivity.
; なお、この発明は、上述のように電解着色法の第2
工程である金属塩処理をその対象としているものであり
、従って、第1工程の陽極酸化処理は、特に限定される
ものではな〈従来の一般的な処理条件によるも許容され
るものである。; Furthermore, this invention is based on the second electrolytic coloring method as described above.
The target is metal salt treatment, which is a step, and therefore, the first step, anodizing treatment, is not particularly limited (it is acceptable under conventional general treatment conditions).
しかしなか、ら、前述したようにこの陽極酸化処理も、
従来法によるときはその処理に10〜15分もの長時間
を要するものであったのに対し、該処理を、濃度50g
/e以上の高濃度のリン酸水溶液中で、しかも液温を3
5〜80℃の高温度に設定して行う;ものとすることに
より、0.5〜30分の極めて短時間で処理可能となり
、しかも選択吸収性の良好な厚さ1μ以下の安定した酸
化皮膜を生成せしめることが可能となる。However, as mentioned above, this anodizing treatment also
When using the conventional method, the treatment required a long time of 10 to 15 minutes, but the treatment was carried out at a concentration of 50 g.
/e or more in a highly concentrated phosphoric acid aqueous solution, and at a temperature of 3.
It is carried out at a high temperature of 5 to 80°C; by doing so, it can be processed in an extremely short time of 0.5 to 30 minutes, and a stable oxide film with a thickness of 1 μm or less with good selective absorption property is formed. It becomes possible to generate .
従って、かかる陽極酸化処理と組合わせてこの発明の金
属塩処理を実施する、ことにより、選択吸収膜の形成の
ための全体としての処理時間を大幅に短縮化することが
でき、しかも吸収率αが0.90以上、放射率εが0.
10以下というそれらの相対評価において卓越した性能
を有する良好な選択吸収膜を形成せしめることが1可能
となるものである。Therefore, by performing the metal salt treatment of the present invention in combination with such anodic oxidation treatment, the overall treatment time for forming a selective absorption film can be significantly shortened, and the absorption rate α is 0.90 or more, and emissivity ε is 0.
This makes it possible to form a good selective absorption membrane having excellent performance in the relative evaluation of 10 or less.
以下に、この発明の具体的な実施例を示す。Specific examples of this invention are shown below.
伺、実施例1〜5は、第1工程の陽極酸化処理を上記の
改善された処理条件、即ち高濃度、高温度のリン酸水溶
液中で行ったものであり、実施例6〜8は、当該陽極酸
化処理を従来の一般的な処理条件で行ったものである。In Examples 1 to 5, the anodizing treatment in the first step was performed under the above-mentioned improved treatment conditions, that is, in a high concentration, high temperature phosphoric acid aqueous solution, and in Examples 6 to 8, The anodic oxidation treatment was performed under conventional and general treatment conditions.
実施例 I
JIS−A1030の純度を有するアルミニウム板を用
い、これを通常の前処理方法で脱脂したのち、第1表に
示す電解液の組成と電解条件で、第1工程、第2工程の
電解処理を順次行った。Example I Using an aluminum plate having a purity of JIS-A1030, it was degreased by a normal pretreatment method, and then electrolyzed in the first and second steps using the electrolytic solution composition and electrolytic conditions shown in Table 1. The treatments were performed sequentially.
第1表に示すように、第2工程の処理時間を2分で終了
して酸化皮膜の良好な黒色化を達成でき、得られた選択
吸収膜は、膜厚0.4μ、吸収率α=0.94、放射率
ε二0.06の極めて良好な太陽熱エネルギーの選択吸
収性を有するものであった。As shown in Table 1, good blackening of the oxide film can be achieved by finishing the second step in 2 minutes, and the resulting selective absorption film has a thickness of 0.4μ and an absorption rate α= It had extremely good selective absorption of solar thermal energy with an emissivity of 0.94 and an emissivity of ε2 of 0.06.
実施例 2
実施例1と同様にして、第2表に示す電解液組成と電解
条件で処理した。Example 2 The same procedure as in Example 1 was carried out using the electrolyte composition and electrolytic conditions shown in Table 2.
上表に示すように第2工程の電解処理時間は2分であり
、第1工程との合計処理時間3分で、得られた選択吸収
被膜は、膜厚0.2μ、α=0.94、。As shown in the table above, the electrolytic treatment time in the second step was 2 minutes, and the total treatment time with the first step was 3 minutes, and the selective absorption film obtained had a film thickness of 0.2μ and α=0.94. ,.
ε二0.06の良好な選択吸収性を有するものであつた
。It had good selective absorption of ε20.06.
実施例 3
1 実施例1と同様にして、第3表に示す電解液組成と
電解条件で処理した。Example 3 1 Processing was carried out in the same manner as in Example 1 using the electrolytic solution composition and electrolytic conditions shown in Table 3.
上表に示すように、これも第2工程の処理時間は2分で
終了し、得られた選択吸収被嘆は、膜厚0.3μ、α、
=0.95、ε=0.07の良好な選択吸収性を有する
ものであった。As shown in the table above, the processing time of the second step was also completed in 2 minutes, and the obtained selective absorption film had a film thickness of 0.3μ, α,
= 0.95 and ε = 0.07.
実施例 4
実施例1と同様にして、第4表に示す電解液組成と電解
条件で処理した。Example 4 Processing was carried out in the same manner as in Example 1 using the electrolytic solution composition and electrolytic conditions shown in Table 4.
第2工程の処理時間は1.5分で充分な皮膜の黒色化を
達成でき、得られた選択吸収膜は、膜厚0.5μ、α=
0.95、ε=0.06の良好な選択吸収性を有するも
のであった。The processing time of the second step was 1.5 minutes to achieve sufficient blackening of the film, and the obtained selective absorption film had a film thickness of 0.5μ, α=
It had good selective absorption of 0.95 and ε=0.06.
〈実施例 5
実施例1と同様にして、第5表に示す電解組成と電解条
件で処理した。Example 5 In the same manner as in Example 1, treatment was carried out using the electrolytic composition and electrolytic conditions shown in Table 5.
上表に示すように、第2工程は1.5分間で処理を完了
し、しかも酸化皮膜の良好な黒色化を達成できた。As shown in the table above, the second step was completed in 1.5 minutes, and the oxide film was successfully blackened.
得られた選択吸収膜は、α=0.92、ε=0.08の
値を示すものであった。The selective absorption membrane obtained had values of α=0.92 and ε=0.08.
実施例 6
実施例1と同様にして、第6表に示す電解液組成と電解
条件で処理した。Example 6 In the same manner as in Example 1, treatment was carried out using the electrolyte composition and electrolysis conditions shown in Table 6.
上記のように第2工程を2分間の処理で終了して、しか
も酸化皮膜の良好な黒色化を達成できた。As mentioned above, the second step was completed in 2 minutes, and good blackening of the oxide film was achieved.
これにより得られた選択吸収膜は、α=0.92、ε=
0.8の良好な選択吸収性な有するものであつプた。The selective absorption membrane obtained in this way has α=0.92, ε=
It had good selective absorption of 0.8.
実施例 7
実施例1と同様にして、第7表に示す電解液組成と電解
条件で処理した。Example 7 In the same manner as in Example 1, treatment was carried out using the electrolytic solution composition and electrolytic conditions shown in Table 7.
第2工程を2分間の処理で終了して、しかも酸化皮膜の
良好な黒色化が達成できた。The second step was completed in 2 minutes, and good blackening of the oxide film was achieved.
これにより得られた選択吸収膜は、α=0.93、ε=
0.09の良好な選択吸収性を有するものであった。The selective absorption membrane obtained in this way has α=0.93, ε=
It had a good selective absorption of 0.09.
Claims (1)
含む水溶液中で電解処理して太陽熱エネルギーの選択吸
収膜な形成する方法において、前記金属塩を含む水溶液
中での電解処理を、金属塩の濃度カニッケル塩において
80〜2009/e。 コバルト塩において80〜2o09/e、銅塩において
30〜1009/e、錫塩において15〜509/f!
、鉄塩において60〜200 ’J/eの範囲の、常法
の該電解処理に用いられる液濃度よりも相対的に高濃度
の金属塩水溶液中で、かつ液温を45〜85℃に保持し
て行うことを特徴上するアルミニウム材の表面に太陽熱
エネルギーの選択吸収膜を形成する方法。[Scope of Claims] 1. In a method for forming a selective solar energy absorption film by anodizing an aluminum material and then electrolytically treating it in an aqueous solution containing a metal salt, the electrolytic treatment in an aqueous solution containing the metal salt is performed. 80 to 2009/e in the metal salt concentration of nickel salt. 80-2o09/e for cobalt salts, 30-1009/e for copper salts, 15-509/f for tin salts!
, in an aqueous metal salt solution with an iron salt concentration in the range of 60 to 200' J/e, which has a relatively higher concentration than that used in the conventional electrolytic treatment, and the liquid temperature is maintained at 45 to 85 ° C. A method for forming a selective absorption film for solar thermal energy on the surface of an aluminum material.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP55081848A JPS5819948B2 (en) | 1980-06-16 | 1980-06-16 | Method for forming a selective absorption film for solar thermal energy on the surface of aluminum material |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP55081848A JPS5819948B2 (en) | 1980-06-16 | 1980-06-16 | Method for forming a selective absorption film for solar thermal energy on the surface of aluminum material |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS579898A JPS579898A (en) | 1982-01-19 |
| JPS5819948B2 true JPS5819948B2 (en) | 1983-04-20 |
Family
ID=13757891
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP55081848A Expired JPS5819948B2 (en) | 1980-06-16 | 1980-06-16 | Method for forming a selective absorption film for solar thermal energy on the surface of aluminum material |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS5819948B2 (en) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS60118650U (en) * | 1984-01-19 | 1985-08-10 | 東和化成株式会社 | airtight container |
Families Citing this family (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS63210295A (en) * | 1987-02-25 | 1988-08-31 | Fujita Shoji Kk | Coloring treatment of aluminum or aluminum alloy for developing pastel color |
Family Cites Families (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS5385716A (en) * | 1977-01-10 | 1978-07-28 | Nippon Fuirutaa Kk | Method of recovering metal from acid waste |
| JPS5514827A (en) * | 1978-07-13 | 1980-02-01 | Sumitomo Alum Smelt Co Ltd | Production of selective absorbing material of solar heat energy |
-
1980
- 1980-06-16 JP JP55081848A patent/JPS5819948B2/en not_active Expired
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS60118650U (en) * | 1984-01-19 | 1985-08-10 | 東和化成株式会社 | airtight container |
Also Published As
| Publication number | Publication date |
|---|---|
| JPS579898A (en) | 1982-01-19 |
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