JPS5820118B2 - ion cassock house - Google Patents
ion cassock houseInfo
- Publication number
- JPS5820118B2 JPS5820118B2 JP12922075A JP12922075A JPS5820118B2 JP S5820118 B2 JPS5820118 B2 JP S5820118B2 JP 12922075 A JP12922075 A JP 12922075A JP 12922075 A JP12922075 A JP 12922075A JP S5820118 B2 JPS5820118 B2 JP S5820118B2
- Authority
- JP
- Japan
- Prior art keywords
- electrode
- ion
- plasma source
- cassock
- house
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
Landscapes
- Particle Accelerators (AREA)
- Electron Sources, Ion Sources (AREA)
Description
【発明の詳細な説明】
本発明はイオン加速装置に関するものであり、特に大電
流用装置に適する。DETAILED DESCRIPTION OF THE INVENTION The present invention relates to an ion accelerator, and is particularly suitable for large current devices.
従来の加速装置は、第1図に示すように、プラズマ源1
、引き出し電極2、加速電極3、減速電極4、を以って
構成されている。A conventional accelerator has a plasma source 1 as shown in FIG.
, an extraction electrode 2, an acceleration electrode 3, and a deceleration electrode 4.
電極群2,3゜4を正面から見ると開口部形状が、第2
図Aに示す多孔型、Bに示す多細隙型の二つが従来特に
大電流イオン加速装置用として用いられて来たものであ
る。When looking at the electrode group 2, 3゜4 from the front, the shape of the opening is similar to that of the second electrode group.
Two types, the porous type shown in Figure A and the multi-pore type shown in Figure B, have been used in the past particularly for large current ion accelerators.
Bの場合、細隙長方向へのイオンビーム発散は極めて少
ないが、幅方向(図の左右方向)の収束は良くなかった
。In case B, the ion beam divergence in the slit length direction was extremely small, but the convergence in the width direction (horizontal direction in the figure) was poor.
Aの多孔型の場合、プラズマ源の密度温度が一様でない
ために、中心部分にある孔と、周辺部分にある孔から出
たビームが違った振舞を行って全体の収束性を悪くして
いるという欠点がある。In the case of the multi-hole type A, since the density temperature of the plasma source is not uniform, the beams emitted from the holes in the center and the holes in the periphery behave differently, worsening the overall convergence. There is a drawback that there is
従って、電極の工作は可能な限りの高い精度で行うこと
が必要であり、同時にプラズマ源として、一様性の良い
ものを得る為に努力が払われて来た。Therefore, it is necessary to work the electrode with the highest possible precision, and at the same time efforts have been made to obtain a plasma source with good uniformity.
本発明の基本的な特徴は、第3図に示すような細隙の配
置を行うことにある。The basic feature of the invention is to arrange the slits as shown in FIG.
このような配置によって、細隙長方向、すなわち円周方
向の発散は元来小さく、幅方向、すなわち平径方向の発
散は電極面に曲率を持たせて、収束を図れば収束性の良
好なイオンビームが得られる。With this arrangement, the divergence in the slit length direction, that is, the circumferential direction, is originally small, and the divergence in the width direction, that is, the flat diameter direction, can be converged by giving a curvature to the electrode surface. An ion beam is obtained.
第3図には同心円状の細隙配置を示したが第4図Aの如
き同心正3角でも良く、Bの同心正方形でも同じことで
ある。Although FIG. 3 shows a concentric slit arrangement, concentric regular triangles as shown in FIG. 4A or concentric squares as shown in FIG. 4B may be used.
また、同心正多角形であれば全て同じことである。The same thing applies to all concentric regular polygons.
プラズマ源として通常軸対称の構成が最も容易であり、
第3図の如き構成がプラズマ源と結合し易い。As a plasma source, an axially symmetrical configuration is usually the easiest;
A configuration as shown in FIG. 3 is easy to couple with a plasma source.
また製作上も同心円状の構成が容易である。In addition, the concentric configuration is easy to manufacture.
核融合用の中性粒子入射装置への応用を考えた場合、粒
子入射孔形状との関連で縦長のビーム形状が要求される
場合がある。When considering application to a neutral particle injection device for nuclear fusion, a vertically elongated beam shape may be required in relation to the particle injection hole shape.
第2図Bの型式の装置では従来、最大5という縦横比を
持ったプラズマ源電極群が用いられている。Devices of the type shown in FIG. 2B have conventionally used plasma source electrodes having an aspect ratio of up to 5.
このようなプラズマ源を用いて本発明を構成する場合に
は、第5図に示した電極開口部形状を用いれば良い。When configuring the present invention using such a plasma source, the electrode opening shape shown in FIG. 5 may be used.
3角形、5角形の場合でも同心、対称形状であれば良い
。Triangular or pentagonal shapes may be used as long as they are concentric or symmetrical.
通常プラズマはその容器内で、同心、対称形状に近い密
度及び温度の分布を持つ。Typically, a plasma has a nearly concentric, symmetrical density and temperature distribution within its container.
従って、本発明においてはプラズマ源に対する密度、温
度の一様性に対する要求が著しく緩和されているところ
に大きな特徴がある。Therefore, a major feature of the present invention is that the requirements for uniformity of density and temperature of the plasma source are significantly relaxed.
電極面に曲率を持たせることによってビームを偏向させ
ることは良く知られている。It is well known that a beam can be deflected by giving a curvature to an electrode surface.
(例えば、PIasma Physics amd C
ontrolledNuclear Fusion R
e5earch、1974(IAEA、 Vienna
t tobe Published)。(For example, PIasma Physics amd C
controlledNuclear Fusion R
e5earch, 1974 (IAEA, Vienna
t tobe Published).
P aper No 、 IAEA−CN−33/D
2−2 )予めプラズマ源の密度および温度の分布がわ
かればそれに応じて細隙の巾と共に曲率を設定すれば良
い。Paper No., IAEA-CN-33/D
2-2) If the density and temperature distribution of the plasma source are known in advance, the width and curvature of the slit can be set accordingly.
第6図に示した機構を用いることによって、電極の曲面
を自由に調節することのできるので、プラズマ源の特性
に対して正確な対応を得ることができる。By using the mechanism shown in FIG. 6, the curved surface of the electrode can be freely adjusted, so that accurate correspondence can be obtained to the characteristics of the plasma source.
すなわち、細隙部5、の両側の電極部6、をねじ7、に
よって組立てておく。That is, the electrode portions 6 on both sides of the narrow gap portion 5 are assembled using screws 7.
ねじ7は、細隙の接合部分8、(第3図)に切っておく
。The screw 7 is cut into the slotted joint 8, (FIG. 3).
接合部分は極めて狭く、ねじによって調節し得る前後距
離は小さいが、予め設定した曲面に対する微調整用とし
ては、o」mm程度の前後動で充分であるから、15C
771直径で、10mmヒツチのねじを切れば接合部長
5龍となり、充分である。The joint part is extremely narrow, and the longitudinal distance that can be adjusted with the screw is small, but a longitudinal movement of about 0 mm is sufficient for fine adjustment to a preset curved surface, so 15C
If you cut a 10mm thread with a diameter of 771, the joint length will be 5 long, which is sufficient.
第6図Bの如くねじの代りに溝9、を切っておき、駆動
子を介して、電極片同志を直進させて移動させても良い
。As shown in FIG. 6B, grooves 9 may be cut in place of screws, and the electrode pieces may be moved in a straight line through a driver.
又、接合部10を絶縁物で作っておけば各電極部分へ異
なった電位を与えることができる。Furthermore, if the joint portion 10 is made of an insulator, different potentials can be applied to each electrode portion.
これにより、プラズマ源の密度および温度の変動に対し
て一層自由に適応することが可能になる。This allows more freedom to adapt to variations in plasma source density and temperature.
第1図は、イオン加速装置の概念図、第2図は従来の電
極パタンを示す図、第3図は本発明になる電極パタンを
示す図、第4図は正多角形同心細隙構成図、第5図は一
般の多角細隙構成図、第6図は各電極片の微調整機構を
示す図である。Fig. 1 is a conceptual diagram of an ion accelerator, Fig. 2 is a diagram showing a conventional electrode pattern, Fig. 3 is a diagram showing an electrode pattern according to the present invention, and Fig. 4 is a configuration diagram of regular polygonal concentric slits. , FIG. 5 is a configuration diagram of a general polygonal slit, and FIG. 6 is a diagram showing a fine adjustment mechanism for each electrode piece.
Claims (1)
部が細隙をもって構成されて居り、その細隙は同心状に
配置されていることを特徴とするイオン加速装置。1. An ion accelerator characterized in that an ion extraction and acceleration/deceleration electrode has an opening formed with a slit, and the slit is arranged concentrically.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP12922075A JPS5820118B2 (en) | 1975-10-29 | 1975-10-29 | ion cassock house |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP12922075A JPS5820118B2 (en) | 1975-10-29 | 1975-10-29 | ion cassock house |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS5254899A JPS5254899A (en) | 1977-05-04 |
| JPS5820118B2 true JPS5820118B2 (en) | 1983-04-21 |
Family
ID=15004100
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP12922075A Expired JPS5820118B2 (en) | 1975-10-29 | 1975-10-29 | ion cassock house |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS5820118B2 (en) |
Families Citing this family (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS5821949U (en) * | 1981-08-04 | 1983-02-10 | 日新ハイボルテ−ジ株式会社 | ion source device |
| JPH0616384B2 (en) * | 1984-06-11 | 1994-03-02 | 日本電信電話株式会社 | Microwave ion source |
-
1975
- 1975-10-29 JP JP12922075A patent/JPS5820118B2/en not_active Expired
Also Published As
| Publication number | Publication date |
|---|---|
| JPS5254899A (en) | 1977-05-04 |
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