JPS5820135B2 - Field junction electron beam exposure equipment - Google Patents

Description

DETAILED DESCRIPTION OF THE INVENTION The present invention relates to an electron beam exposure apparatus, and more particularly to a field junction electron beam exposure apparatus used for exposing large area patterns by means such as graphic synthesis.

In general, photophosphorography is an important technology in the integrated circuit manufacturing process and has achieved rapid development until now, but it is limited by the wavelength of light of about 0.3 μm, so it can only be used to fabricate patterns of 1 to 2 μm or less. is difficult.

However, in exposure methods that use electron beams or soft X-rays, the wavelength of the former is approximately 0.01 nm, and the wavelength of the latter is approximately 0.4 nm.
Since the resolution is ~1.4 nm, deterioration in resolution due to light diffraction phenomenon can be ignored, so it has come to attract attention as an extremely effective method for processing of 1 nm or less, which is required due to the increasing density of integrated circuits. .

In this electron beam exposure method, electrons ejected from an electron gun are focused by a capacitor 1/nozzle, then deflected by a deflection coil, and the focused and polarized electron beam is applied to the wafer to expose a resist that has been coated on the wafer in advance. A resist pattern is formed thereon, and then photoetching is performed.

However, in general, in electron beam exposure equipment, there is a limit to the field that can be exposed depending on the polarization region of the device, so when exposing a large figure that cannot be exposed with one field, the figure is divided into fields and the fields are joined. exposure must be done.

In field bonding such as Kaguno, data is created by comparing and contrasting the effects between patterns within one field, that is, within a deflection region that can be exposed in one go without moving the wafer stage. When extended to adjacent fields, the influence of exposure amount exists between figures due to the proximity effect, which causes some difficulty in data processing.

SUMMARY OF THE INVENTION An object of the present invention is to provide a field joining electron beam exposure apparatus which eliminates the proximidi effect when joining patterns spanning adjacent fields exposed within a field.

To achieve this purpose, an electron beam exposure device that exposes a predetermined pattern by focusing and deflecting an electron beam emitted from an electron gun divides the figure with the pattern into fields determined by the deflection area of the device. In a field junction electron beam exposure apparatus that performs exposure using a single field, in the present invention, when exposing a pattern of one field, it is determined at the time of data creation whether the pattern straddles an adjacent field, and if the pattern straddles an adjacent field, the previous information is stored in the data. It is characterized in that the exposure frequency is changed and the exposure amount is adjusted based on the data stored in the camera.

Embodiments of the field junction electron beam exposure apparatus according to the present invention will be described in detail below with reference to the drawings.

FIG. 1 shows a field junction electron beam exposure apparatus according to the present invention, in which an electron beam 1 is emitted by an electron gun 2, passes through a beam blanking coil 3, and passes through a first condenser lens 4, a second condenser lens 5, and a third condenser lens. The light is focused by the condenser lens 6, passes through the final aperture, and reaches the webber 9.

There is a deflection coil 8 above or below the final aperture.

On the other hand, the information of the input tape is input to the computer 21, and its output is moved through the weber 11 by driving the pulse motor 23 via the motor drive circuit 22, and the other output is applied to the scanning section 24, and the output is Deflection information is applied to the deflection coil 8 through the deflection amplifier circuit 25, and blinking information is applied to the blanking coil 3 through the blanking circuit 26.

In this case, the present invention provides pattern figures A, B, C, . . . insole fields F1, . . . as shown in FIG. F2゜...
When creating data for a pattern figure B that spans Fn, . . . , information indicating that it straddles both fields is entered in relation to the figure B, and the frequency of the clock pulse at an address near the field boundary of the figure B is changed.

Then, the computer 21 changes the frequency of the clock pulse applied to the deflection coil 8 and the blanking coil 3, thereby changing the exposure amount.

FIG. 3 shows one embodiment of a field-joined pattern figure B, in which A is a bonding pattern obtained by the prior art, and B in FIG. 3 is near the boundary of pattern figure B in the present invention. This is an example in which the exposure frequency of the address is lowered and the exposure amount is adjusted to eliminate the proximity effect.

The apparatus according to the present invention has been described in detail above, but in short, the present invention is to change the frequency of the clock pulse at an address near the field boundary based on information indicating that the data spans both fields when creating data for a pattern figure that spans both fields. The exposure amount is adjusted to remove the proximity effect, and although the present invention has been explained using a Ranta-Hiroshi scanning type drive circuit as an example, the idea of the present invention is not limited to this embodiment. Of course.

[Brief explanation of the drawing]

FIG. 1 is a block diagram of a field junction type electronic exposure apparatus according to the present invention, FIG. 2 is a pattern figure to be exposed by the apparatus of the present invention, and FIG. 3 is a block diagram of a pattern figure obtained by exposure using the apparatus of the present invention. It is a figure shown in comparison with what was obtained by the conventional apparatus. In the figure, 3 is a blanking coil, 8 is a deflection coil,
20 is an input tape, 21 is a computer, and 24 is a scanning control section. 89-

Claims (1)

[Claims] 1. Field junction, in which the figure on which the pattern is drawn is divided into fields determined by the deflection area of the device in an electron beam exposure device that exposes a predetermined pattern by focusing and deflecting an electron beam emitted from an electron gun. In an electron beam exposure system, when exposing a pattern in one field, it is determined at the time of data creation whether the pattern straddles an adjacent field, and if it does, information to that effect is included in the data and the data is A field junction electron beam exposure apparatus characterized in that the exposure frequency is changed to adjust the exposure amount.