JPS5821943B2 - Method for manufacturing phosphor - Google Patents
Method for manufacturing phosphorInfo
- Publication number
- JPS5821943B2 JPS5821943B2 JP52119413A JP11941377A JPS5821943B2 JP S5821943 B2 JPS5821943 B2 JP S5821943B2 JP 52119413 A JP52119413 A JP 52119413A JP 11941377 A JP11941377 A JP 11941377A JP S5821943 B2 JPS5821943 B2 JP S5821943B2
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- phosphor
- powder
- electron beam
- zns
- resistance
- Prior art date
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Description
【発明の詳細な説明】
本発明は、低速電子線により刺激して発光させる粉末蛍
光体の製造方法に関するものであり、特に、高速電子線
刺激発光蛍光体において発光効率の高い材料であるZn
SおよびZn5e化合物粉末蛍光体を低速電子線刺激に
より発光可能ならしめるようにした蛍光体の製造方法に
関するものである。DETAILED DESCRIPTION OF THE INVENTION The present invention relates to a method for producing a powdered phosphor that is stimulated with a slow electron beam to emit light, and in particular, Zn, which is a material with high luminous efficiency in a fast electron beam-stimulated luminescent phosphor, is used.
The present invention relates to a method for producing a phosphor made of S and Zn5e compound powder that can emit light by low-speed electron beam stimulation.
従来、ZnSおよびZn5e化合物粉末蛍光体を電子線
刺激で発光させるには高速あるいは中速の電子線により
刺激して発光させていたが、可視発光の蛍光体の多くは
絶縁物であり、抵抗が高い。Conventionally, ZnS and Zn5e compound powder phosphors were stimulated with high-speed or medium-speed electron beams to emit light, but most of the visible light-emitting phosphors are insulators and have low resistance. expensive.
また、通常、二次電子放出特性の第1クロスオーバ電圧
は中速電子線エネルギー域にある。Further, the first crossover voltage of the secondary electron emission characteristic is usually in the medium-speed electron beam energy range.
主にこの二つの理由によって、低速電子線エネルギー域
の電子刺激では蛍光体表面に荷電を生じ、刺激電子はそ
のエネルギーを失い、蛍光体を刺激して発光せしめるこ
とができない。Mainly due to these two reasons, electronic stimulation in the low-speed electron beam energy range generates charges on the surface of the phosphor, and the stimulating electrons lose their energy, making it impossible to stimulate the phosphor to emit light.
また、一方、蛍光体表面に雰囲気ガス等の物理化学的吸
着により生ずる発光不活性層の形成が、低速電子線の場
合には、中または高速電子線の場合に比し、蛍光体の発
光中心の刺激を著しく妨げると考えられる。On the other hand, in the case of a low-speed electron beam, the formation of a light-emitting inactive layer that occurs on the surface of the phosphor due to physicochemical adsorption of atmospheric gas, etc. It is thought that this will significantly impede the stimulation of
これに対して、本発明は、蛍光体結晶中の発光中心の形
成と同時に結晶の低抵抗化を遂行し、低速電子線刺激に
よって蛍光体を発光させることを可能にしたものであり
、低速電子線刺激発光に対する蛍光体の表面状態や二次
電子放出特性の影響の如何に拘らず実施し得るものであ
る。In contrast, the present invention has made it possible to reduce the resistance of the crystal at the same time as forming luminescent centers in the phosphor crystal, and to make the phosphor emit light by slow electron beam stimulation. This method can be implemented regardless of the influence of the surface condition of the phosphor or secondary electron emission characteristics on line-stimulated light emission.
なお、ここで低速電子線とはその物質の二次電子放出特
性における第1クロスオーバー電圧以下の加速電圧にお
ける電子線をいう。Note that the slow electron beam here refers to an electron beam at an accelerating voltage equal to or lower than the first crossover voltage in the secondary electron emission characteristics of the material.
しかして、nb−vib族化合物材料の低抵抗化は、通
常、Wb族(A/ 、 Ga 、 In )または■b
族(CI、 Br 、 I )の元素を結晶中に添加す
ること、および、化合物の構成元素の化学量論的不整を
もたらすことにより、化合物の禁止帯中に浅い不純物準
位または不純物以外の格子欠陥準位を作って容易に達成
することができる。Therefore, lowering the resistance of nb-vib group compound materials is usually achieved by using Wb group (A/, Ga, In) or
By adding elements of groups (CI, Br, I) into the crystal and causing stoichiometric misalignment of the constituent elements of the compound, shallow impurity levels or lattices other than impurities are created in the forbidden band of the compound. This can be easily achieved by creating a defect level.
nb−■b族化合物の中でZnS等は上述のような不純
物の熱拡散によって、結晶中に一旦入った不純物が熱処
理冷却過程で再拡散し、結晶外に放出されてしまうため
、従来はその低抵抗化が長年達成できない状態にあった
。Among the nb-■b group compounds, ZnS and the like are impurities that once enter the crystal due to the thermal diffusion of impurities as described above, and are re-diffused during the heat treatment and cooling process and released outside the crystal. It has been impossible to achieve low resistance for many years.
最近、青色発光ダイオード材料としてnb−vib族化
合物材料が注目されているが、この材料の低抵抗化が必
要であるがために、低抵抗化処理法について研究が進め
られ、さらに、ZnS単結晶についてその低抵抗化が確
立された。Recently, nb-vib group compound materials have been attracting attention as materials for blue light emitting diodes, but since it is necessary to reduce the resistance of this material, research has been carried out on low resistance processing methods, and furthermore, ZnS single crystal Its low resistance was established.
したがって、ZnS化合物材ic関する低抵抗化の技術
は公知である。Therefore, techniques for reducing the resistance of ZnS compound ICs are known.
本発明の目的は、ZnSおよびZn5e化合物を低速電
子線刺激により発光する蛍光体にすることにあり、結晶
の形状は粒径数ミクロンメーター以下の微粒子であるこ
とを必要とし、この微粒子の低抵抗化を行なうと同時に
、結晶中に低速電子線刺激で効率的な発光中心の形成を
遂行しなければならない。The purpose of the present invention is to make ZnS and Zn5e compounds into phosphors that emit light by low-speed electron beam stimulation. At the same time, it is necessary to efficiently form luminescent centers in the crystal by low-speed electron beam stimulation.
本発明は、微粒子結晶の低抵抗化を達成するとともに効
率的な発光が低速電子線刺激によって得られる粉末蛍光
体の合成方法である。The present invention is a method for synthesizing a powder phosphor that achieves low resistance of fine particle crystals and provides efficient light emission by low-speed electron beam stimulation.
以下に、ZnSおよびZn S e化合物粉末結晶の低
抵抗化蛍光体に対する合成方法の二実施例と、合成した
蛍光体の低速電子線刺激の発光特性を示して本発明の詳
細な説明する。The present invention will be described in detail below by showing two examples of a method for synthesizing ZnS and ZnSe compound powder crystals for low-resistance phosphors, and the luminescence characteristics of the synthesized phosphors when stimulated with slow electron beams.
〔実施例 1〕
すでに、付活剤として、例えば、Cuをほぼ10 ’A
tom/mob、共付活剤として、例えば、Alをほぼ
10 8 At om/mo lを用いて、発光中心形
成に有効な規定量の不純物活桂化を行なったZnSまた
はZn5e粉末について、亜鉛蒸気中で熱処理を施し、
低抵抗化を行なう製造方法である。[Example 1] Already, for example, Cu was used as an activator at approximately 10'A.
tom/mob, ZnS or Zn5e powder activated with a specified amount of impurities effective for forming luminescent centers using, for example, approximately 10 8 Atom/mol of Al as a co-activator, zinc vapor heat treated inside,
This is a manufacturing method that reduces resistance.
第1図aに示した形状の透明石英るつぼ3中に、発光中
心の形成熱処理を行なった粒径数μm以下のZnSまた
はZn5e粉末結晶1と亜鉛金属2とを図示のように分
離した状態において10−’Torrの分圧で真空封入
し、第1図すに示した温度分布を有する横型管状炉中に
設置する。In a transparent quartz crucible 3 having the shape shown in FIG. It is vacuum sealed at a partial pressure of 10-'Torr and placed in a horizontal tube furnace having the temperature distribution shown in FIG.
ここで用いられる亜鉛金属2の量は、熱処理中の密封容
器内の飽和蒸気圧を数気圧以下に維持し得る程度でよく
その量は厳密に定める必要はない。The amount of zinc metal 2 used here may be sufficient to maintain the saturated vapor pressure in the sealed container at several atmospheres or less during heat treatment, and the amount does not need to be strictly determined.
熱処理中、石英るつぼに溶着した石英棒5を回転駆動機
構に結合させて;粉体1が一様に亜鉛蒸気により処理さ
れるように、軸を中心にして緩くり廻わす。During the heat treatment, the quartz rod 5 welded to the quartz crucible is connected to a rotating drive mechanism; it is rotated loosely about the axis so that the powder 1 is uniformly treated with zinc vapor.
その際の処理温度は、粉体挿入部分が約1000℃であ
り、亜鉛金属蒸気生成部が亜鉛の沸点950℃以上に保
たれるようにし、処理時間は10時間以上とする。The treatment temperature at this time is approximately 1000° C. at the powder insertion portion, the zinc metal vapor generating portion is maintained at the boiling point of zinc of 950° C. or higher, and the treatment time is 10 hours or more.
すなわち、本発明による処理の効果は、処理時間の関数
となって増進するのであるが、低抵抗化の効果を充分に
達成しようとすると、処理時間を10時間以上とするこ
とが望ましい。That is, the effect of the treatment according to the present invention increases as a function of the treatment time, but in order to fully achieve the effect of lowering resistance, it is desirable that the treatment time be 10 hours or more.
かかる処理の後に、石英るつぼを炉中から速かに引出し
て水中に入れ、15〜25℃の温度にまで急冷する。After such treatment, the quartz crucible is quickly removed from the furnace and placed in water, where it is rapidly cooled to a temperature of 15-25°C.
その際、溶融亜鉛が粉体に混入しないように操作する。At that time, be sure to operate so that molten zinc does not mix with the powder.
〔実施例 2〕
化学的に合成したZnSまたはZn5eのルミネッセン
ス級の原料粉末に発光中心形成に必要な、例えば、実施
例1にて示したような不純物を添加すると同時に、低抵
抗化を進めるために過剰亜鉛金属を加える。[Example 2] Impurities necessary for forming luminescent centers, such as those shown in Example 1, are added to chemically synthesized ZnS or Zn5e luminescent grade raw material powder, and at the same time, in order to promote lower resistance. Add excess zinc metal to.
烹なわち、発光中心の熱処理形成とともに亜鉛蒸気中熱
処理の作業を同時に達成する方法である。In other words, this is a method of simultaneously accomplishing the heat treatment for forming the luminescent center and the heat treatment in zinc vapor.
第1図Cに示すような石英るつぼ3中に発光中心形成に
必要な添加不純物、例えば、アルミニウムと多量の亜鉛
金属2′とを粒径1μm以下のZnSまたはZn5e化
合物の原料粉末1とともに挿入する。Into a quartz crucible 3 as shown in FIG. 1C, added impurities necessary for forming a luminescent center, such as aluminum and a large amount of zinc metal 2', are inserted together with raw powder 1 of ZnS or Zn5e compound having a particle size of 1 μm or less. .
ここでも、用いられる多量の亜鉛金属2′の量は、熱処
理中の密封容器内の飽和蒸気圧を数気圧以下に維持し得
る程度でよく、その量は厳密に定める必要はない。Here, too, the amount of zinc metal 2' used is sufficient to maintain the saturated vapor pressure in the sealed container at several atmospheres or less during heat treatment, and the amount does not need to be strictly determined.
それらの添加不純物と多量の亜鉛金属2′とは直接にZ
nSまたはZn5e ([lS合物の原料粉末1と接触
するため、純度の高いものを使用し、特に表面清浄化化
学処理を行なう。Those added impurities and a large amount of zinc metal 2' are directly
Since it comes into contact with the nS or Zn5e ([lS compound raw material powder 1), a highly pure powder is used, and particularly a surface cleaning chemical treatment is performed.
添加不純物の量はZnSまたはZn5e化合物結晶中に
実際に必要となる量より遥かに多く、例えば約10%モ
ル比だけ入れ、また、亜鉛はZnSまたはZn5e化合
物の原料粉末に対して3〜5倍のモル比に入れる。The amount of added impurity is much larger than the amount actually required in the ZnS or Zn5e compound crystal, for example, about 10% molar ratio, and the amount of zinc is 3 to 5 times that of the raw material powder of ZnS or Zn5e compound. into the molar ratio of
一方、添加不純物にアノ、レミニウムを用いる場合には
石英管内壁に炭素被膜番被着させアルミニウムによる石
英の腐蝕を防止する。On the other hand, when ano-reminium is used as the additive impurity, a carbon film is deposited on the inner wall of the quartz tube to prevent corrosion of the quartz by aluminum.
これらの原料を挿入した石英るつぼを真空排気中におい
て300℃に予備加熱し、残留水分等を充分除去し、真
空度が10−’Torr台に達したときに封じ切る。The quartz crucible containing these raw materials is preheated to 300° C. under vacuum to sufficiently remove residual moisture, and the crucible is sealed when the degree of vacuum reaches 10-' Torr.
ついで第1図dに示す温度分布を有する縦型管状炉の均
熱帯に石英るつぼを設置し、石英るつぼの底部の温度を
均熱帯よりやや低くし、亜鉛の沸点より高めに保持する
。Next, a quartz crucible is placed in the soaking zone of a vertical tube furnace having the temperature distribution shown in FIG.
焼成の温度および時間は実施例1におけると同じにし、
また、焼成処理後は炉の直下に設置した水槽に石英るつ
ぼを垂直に落下させて急冷する。The firing temperature and time were the same as in Example 1,
After the firing process, the quartz crucible is dropped vertically into a water tank installed directly below the furnace for rapid cooling.
以上、ZnSまたはZn5e化合物一般に適用し得る低
抵抗化粉末蛍光体の合成方法について説明したが、従来
、高速電子線刺激では高効率の発光を示すが、低速電子
線刺激では発光しない硫化亜鉛系の蛍光体に対し、上述
した本発明の合成方法により低抵抗化するとともに蛍光
体表面付近にも効率の高い発光中心をつくり、低速電子
線刺激による発光を得ることができ、その特性の例をつ
ぎに示す。The above has described a method for synthesizing a low resistance powder phosphor that can be applied to ZnS or Zn5e compounds in general. By using the above-described synthesis method of the present invention, it is possible to reduce the resistance of a phosphor, create a highly efficient luminescent center near the surface of the phosphor, and obtain light emission by slow electron beam stimulation. Examples of its characteristics are as follows. Shown below.
第2図に上述の本発明製造方法により作成した代表的な
ZnS : Zn 、 AJI!粉末蛍光体の電子線加
速電圧に対する発光輝度と蛍光体に流れる電流との関係
の例を示す。FIG. 2 shows a typical ZnS produced by the above-described production method of the present invention: Zn, AJI! An example of the relationship between the luminance of a powder phosphor and the current flowing through the phosphor with respect to the electron beam acceleration voltage is shown.
この図から明らかなように、上述の蛍光体における加速
電圧の閾値(Uc)は酸化亜鉛における閾値Uc約2ボ
ルト程度に比して僅かに高いが、10ボルト以下であり
、数十ボルトの加速電圧による発光の輝度は従来のZn
O: Znの輝度に匹敵する。As is clear from this figure, the acceleration voltage threshold (Uc) of the above-mentioned phosphor is slightly higher than the threshold Uc of about 2 volts for zinc oxide, but it is less than 10 volts, and the acceleration voltage of several tens of volts The brightness of light emitted by voltage is different from that of conventional Zn.
O: Comparable to the brightness of Zn.
なお、図示の試料電流からは試料が粉末であるために単
純に抵抗値を見積ることはできないが、同様の処理を行
なった単結晶の資料によれば10〜100Ωαであり、
この粉末結晶の抵抗値は少くともIKΩm以下と見られ
る。Note that from the sample current shown in the figure, it is not possible to simply estimate the resistance value because the sample is a powder, but according to the data of a single crystal that has been subjected to the same treatment, it is 10 to 100 Ωα,
The resistance value of this powder crystal appears to be at least IKΩm or less.
第3図には、上述のZnS : Zn 、 AA粉末と
同じ製造方法によって作ったZnS : Cu 、 A
l、 Zn混合粉末の低速電子線刺激による発光スペク
トルを示すが、前者は青色で単色性がよく、その発光中
心がD−A対であるために室温での発光効率がよいこと
も裏付けている。FIG. 3 shows ZnS:Cu, AA powders produced by the same manufacturing method as the above-mentioned ZnS:Zn, AA powders.
This shows the emission spectrum of Zn mixed powder by slow electron beam stimulation, and the former is blue and has good monochromaticity, which also supports the fact that the luminescence center is the D-A pair, so it has good luminescence efficiency at room temperature. .
また、後者は銅が僅かに入ったものについて亜鉛処理を
施したのであるから、特性曲線上の矢印aの肩の部分に
おける発光はZnとAIとの対発光であり、さらに、矢
印すで示すスペクトルの山は銅とAlとの対発光であり
、その対発光がこの蛍光体の発光色を支配して緑色を示
す。In addition, since the latter was zinc-treated with a small amount of copper, the light emission at the shoulder of arrow a on the characteristic curve is the pair light emission of Zn and AI, and furthermore, The peak of the spectrum is the paired luminescence between copper and Al, and the paired luminescence dominates the luminescent color of this phosphor, giving it a green color.
上述の蛍光体の電子線加速電圧に対する発光輝度および
電流は第2図に示したものとほとんど一致する。The luminance and current of the above-mentioned phosphor with respect to the electron beam accelerating voltage almost match those shown in FIG.
以上の蛍光体材料は、低速電子線刺激で青色および緑色
の発光を示すものであるが、実用上3原色に発光するも
のを得るために、さらに長波長側の発光を示す蛍光体材
料を同様の製造方法によってつくることができた。The above-mentioned phosphor materials emit blue and green light when stimulated with slow electron beams, but in order to practically obtain materials that emit light in the three primary colors, similar phosphor materials that emit light at longer wavelengths are used. It could be made using the manufacturing method.
その代表的な蛍光体の例であるZnS : Mn 、
ZnおよびZn5e : Cu 、 AI、 Znの低
速電子線刺激による発光スペクトルを第4図に示す。Examples of typical phosphors are ZnS: Mn,
Zn and Zn5e: The emission spectra of Cu, AI, and Zn upon slow electron beam stimulation are shown in FIG.
以上の説明から明らかなように、本発明によれば、低速
電子線刺激発光蛍光体の発光効率を改善して、単色性の
よい3原色発光の蛍光体を得ることができ、したがって
、
(1)表示管の多色表示、
(2)カラー画像表示、
(3)カラー受像管の加速電圧の低減、
(4)表示装置のエネルギーの省力化
等を達成し得る可能性が得られる。As is clear from the above description, according to the present invention, it is possible to improve the luminous efficiency of a slow electron beam stimulated luminescent phosphor and obtain a phosphor that emits three primary colors with good monochromaticity. ) Multicolor display on display tubes, (2) color image display, (3) reduction in accelerating voltage for color picture tubes, and (4) energy savings in display devices.
第1図aおよびb並びにCおよびdは本発明蛍光体製造
方法の実施例および実施の特性をそれぞれ示す配置図お
よび特性曲線図、第2図は本発明製造方法による蛍光体
の発光特性の例を示す特性曲線図、第3図および第4図
は同じく発光スペクトルの他の例をそれぞれ示す特性曲
線図である。
1・・・・・・原料粉末結晶、2・・・・・・亜鉛また
はカドミウム粉末、2′・・・・・・nb金金属ib金
金属の混合物、3・・・・・・透明石英るつぼ、4・・
・・・・炉体、5・・・・・・るつぼ回転軸棒、6・・
・・・・炭素被膜。Figures 1 a and b and C and d are layout diagrams and characteristic curve diagrams showing the characteristics of the embodiment and implementation of the phosphor manufacturing method of the present invention, respectively, and Figure 2 is an example of the luminescent characteristics of the phosphor produced by the inventive manufacturing method. FIGS. 3 and 4 are characteristic curve diagrams showing other examples of emission spectra. 1... Raw material powder crystal, 2... Zinc or cadmium powder, 2'... nb gold metal ib gold metal mixture, 3... Transparent quartz crucible , 4...
... Furnace body, 5 ... Crucible rotating shaft rod, 6 ...
...Carbon coating.
Claims (1)
なる蛍光体を焼成により製造するにあたり1密封容器中
において亜鉛の飽和蒸気中で焼成したあと常温に急冷す
る低抵抗化の過程を設けたことを特徴とする蛍光体の製
造方法。 2 亜鉛の硫化物またはセレン化物に付活剤を加えてあ
らかじめ一旦焼成しておく過程を前記低抵抗化の過程の
前に設けたことを特徴とする特許請求の範囲第1項記載
の蛍光体の製造方法。 3 亜鉛の硫化物またはセレン化物に付活剤を添加する
過程に引続いて前記低抵抗化の過程を行なうようにした
ことを特徴とする特許請求の範囲第1項記載の蛍光体の
製造方法。[Claims] 1. When producing a phosphor made by adding an activator to zinc sulfide or selenide by firing, 1. 1. A method for producing a phosphor, characterized by providing a resistive process. 2. The phosphor according to claim 1, characterized in that a process of adding an activator to zinc sulfide or selenide and firing it once is performed before the process of lowering the resistance. manufacturing method. 3. The method for producing a phosphor according to claim 1, characterized in that the step of lowering the resistance is carried out subsequent to the step of adding an activator to zinc sulfide or selenide. .
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP52119413A JPS5821943B2 (en) | 1977-10-06 | 1977-10-06 | Method for manufacturing phosphor |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP52119413A JPS5821943B2 (en) | 1977-10-06 | 1977-10-06 | Method for manufacturing phosphor |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS5453688A JPS5453688A (en) | 1979-04-27 |
| JPS5821943B2 true JPS5821943B2 (en) | 1983-05-04 |
Family
ID=14760842
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP52119413A Expired JPS5821943B2 (en) | 1977-10-06 | 1977-10-06 | Method for manufacturing phosphor |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS5821943B2 (en) |
Families Citing this family (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS58222180A (en) * | 1982-06-18 | 1983-12-23 | Futaba Corp | Blue fluophor to be excited with low-velocity electron beam and display tube employing the fluophor |
Family Cites Families (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS5322951B2 (en) * | 1974-06-05 | 1978-07-12 |
-
1977
- 1977-10-06 JP JP52119413A patent/JPS5821943B2/en not_active Expired
Also Published As
| Publication number | Publication date |
|---|---|
| JPS5453688A (en) | 1979-04-27 |
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