JPS5823704B2 - Equipment for monitoring the position, intensity, uniformity and directivity of ionizing radiation beams - Google Patents
Equipment for monitoring the position, intensity, uniformity and directivity of ionizing radiation beamsInfo
- Publication number
- JPS5823704B2 JPS5823704B2 JP1186076A JP1186076A JPS5823704B2 JP S5823704 B2 JPS5823704 B2 JP S5823704B2 JP 1186076 A JP1186076 A JP 1186076A JP 1186076 A JP1186076 A JP 1186076A JP S5823704 B2 JPS5823704 B2 JP S5823704B2
- Authority
- JP
- Japan
- Prior art keywords
- electrode
- radiation beam
- uniformity
- intensity
- monitoring
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
- 230000005865 ionizing radiation Effects 0.000 title claims description 16
- 238000012544 monitoring process Methods 0.000 title claims description 10
- 230000005855 radiation Effects 0.000 claims description 22
- 238000012545 processing Methods 0.000 claims description 15
- 238000012806 monitoring device Methods 0.000 claims description 7
- 238000005259 measurement Methods 0.000 claims description 2
- 230000001568 sexual effect Effects 0.000 claims 1
- 230000004907 flux Effects 0.000 description 7
- 230000007547 defect Effects 0.000 description 3
- 229920002799 BoPET Polymers 0.000 description 1
- 239000005041 Mylar™ Substances 0.000 description 1
- 230000004913 activation Effects 0.000 description 1
- 239000013256 coordination polymer Substances 0.000 description 1
- 238000012937 correction Methods 0.000 description 1
- 238000010586 diagram Methods 0.000 description 1
- 238000009826 distribution Methods 0.000 description 1
- 238000004519 manufacturing process Methods 0.000 description 1
- 239000002184 metal Substances 0.000 description 1
- 238000001465 metallisation Methods 0.000 description 1
- 238000000034 method Methods 0.000 description 1
- 230000002093 peripheral effect Effects 0.000 description 1
- -1 polyethylene terephthalate Polymers 0.000 description 1
- 229920000139 polyethylene terephthalate Polymers 0.000 description 1
- 239000005020 polyethylene terephthalate Substances 0.000 description 1
- 230000001960 triggered effect Effects 0.000 description 1
- 238000001771 vacuum deposition Methods 0.000 description 1
Classifications
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01T—MEASUREMENT OF NUCLEAR OR X-RADIATION
- G01T1/00—Measuring X-radiation, gamma radiation, corpuscular radiation, or cosmic radiation
- G01T1/29—Measurement performed on radiation beams, e.g. position or section of the beam; Measurement of spatial distribution of radiation
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/02—Details
- H01J37/244—Detectors; Associated components or circuits therefor
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/30—Electron-beam or ion-beam tubes for localised treatment of objects
- H01J37/304—Controlling tubes by information coming from the objects or from the beam, e.g. correction signals
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
- H01J2237/244—Detection characterized by the detecting means
- H01J2237/2445—Photon detectors for X-rays, light, e.g. photomultipliers
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
- H01J2237/244—Detection characterized by the detecting means
- H01J2237/24455—Transmitted particle detectors
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
- H01J2237/244—Detection characterized by the detecting means
- H01J2237/2446—Position sensitive detectors
- H01J2237/24465—Sectored detectors, e.g. quadrants
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
- H01J2237/245—Detection characterised by the variable being measured
- H01J2237/24507—Intensity, dose or other characteristics of particle beams or electromagnetic radiation
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
- H01J2237/245—Detection characterised by the variable being measured
- H01J2237/24571—Measurements of non-electric or non-magnetic variables
- H01J2237/24578—Spatial variables, e.g. position, distance
Landscapes
- Chemical & Material Sciences (AREA)
- Analytical Chemistry (AREA)
- Physics & Mathematics (AREA)
- Health & Medical Sciences (AREA)
- Life Sciences & Earth Sciences (AREA)
- General Physics & Mathematics (AREA)
- High Energy & Nuclear Physics (AREA)
- Molecular Biology (AREA)
- Spectroscopy & Molecular Physics (AREA)
- Measurement Of Radiation (AREA)
- Electron Tubes For Measurement (AREA)
Description
【発明の詳細な説明】
この発明は原特許出願(特許第983925号)の明細
書に記載された形式の電離性放射線ビームの位置、強度
、一様性および指向性の監視装置の改良に関し、そして
一層特に装置の電離室内に設けられたイオン収集電極に
関するものである。DETAILED DESCRIPTION OF THE INVENTION This invention relates to an improvement in a device for monitoring the position, intensity, uniformity and directivity of an ionizing radiation beam of the type described in the specification of the original patent application (Patent No. 983,925). and more particularly to an ion collection electrode located within the ionization chamber of the device.
この発明によれば、電離性放射線ビームの位置、強度、
一様性および指向性の監視装置は、それぞれ第1.第2
円形電極を備えた少なくとも第1゜第2電離室を有し、
上記第2円形電極の面積S2が上記第1円形電極の面積
S1より小さく、上記面積S1が電離性放射線ビームの
横断面積にほぼ等しく、上記第1.第2円形電極が捕集
する電気信号を処理する回路と組合さへ さらに上記回
路にこよって制御されかつ電離性放射線ビームを発生す
る放射線源を制御する安全装置を有する。According to this invention, the position, intensity,
The uniformity and directional monitoring devices are respectively first . Second
having at least a first degree second ionization chamber with a circular electrode;
The area S2 of the second circular electrode is smaller than the area S1 of the first circular electrode, the area S1 is approximately equal to the cross-sectional area of the ionizing radiation beam, and the area S2 of the first circular electrode is smaller than the area S1 of the first circular electrode. The second circular electrode is combined with a circuit for processing the electrical signals collected and further has a safety device for controlling a radiation source controlled by said circuit and generating a beam of ionizing radiation.
この発明をさらに良く理解し、またこの発明がどのよう
に実施され得るかを示すため以下添付図面について説明
する。BRIEF DESCRIPTION OF THE DRAWINGS In order to better understand the invention and to show how it may be practiced, reference is made to the accompanying drawings.
第1図にはこの発明による監視装置に使用される二つの
電離室の番1の実施例を示す。FIG. 1 shows a first embodiment of two ionization chambers used in a monitoring device according to the invention.
これらの電離室1,2はそれぞれ例えば第2図に概略的
に示すように商標名”MYLAR”で知られたポリエチ
レンテレフタレートのシートを支持したフレームCで構
成した二つの円形電極E。These ionization chambers 1, 2 each consist of two circular electrodes E, each constituted by a frame C supporting a sheet of polyethylene terephthalate, known by the trade name "MYLAR", as shown schematically in FIG. 2, for example.
12EO2を備えており、上記シートの上には真空蒸着
によって電離性ビームを透過する金属薄膜が沈着される
。12EO2, on which a thin metal film transparent to the ionizing beam is deposited by vacuum deposition.
電極E。Electrode E.
1の直径d1は電離性ビームの直径にほぼ等しく、また
電極E。The diameter d1 of 1 is approximately equal to the diameter of the ionizing beam, and the diameter d1 of the electrode E.
2の直径d2は電極E。1の直径d1より小さい。The diameter d2 of 2 is the electrode E. 1 diameter d1.
各電極の面積S。1 t 802は、801>802 の関係にある。Area S of each electrode. 1 t 802 is 801>802 There is a relationship between
動作において、電極E。In operation, electrode E.
1 t EO2をそれぞれ交差する電離フラックスφ1
.φ2は電極E。Ionization flux φ1 that intersects 1 t EO2
.. φ2 is electrode E.
1 t EO2によって捕集される電流■。1 t The current collected by EO2 ■.
1 t IO2に比例する。フラックスが一様であると
すると、次の関係が成立つ
上方および下方の金属化した透明壁(図示してない)を
備えたこれらの電極室内に配置した電極はこれらの壁に
対して負のバイアスであるほぼ同一のバイアスによって
適当にバイアスのかけられることが注意されるべきであ
る。1 t Proportional to IO2. Assuming that the flux is uniform, electrodes placed in these electrode chambers with upper and lower metalized transparent walls (not shown) will have a negative polarity with respect to these walls. It should be noted that the biases are suitably biased by nearly identical biases.
第3図において、グラフaは一様で適当に中心決めされ
た放射線ビームに対する電極E。In FIG. 3, graph a represents electrode E for a uniform, properly centered radiation beam.
1の直径軸XXに沿った電流■。The current along the diameter axis XX of 1■.
1および従ってフラックスφo1の変動を示し、またグ
ラフbは、放射線ビームが一様でない時(考察している
例では電離性ビームは周囲部においてより中心部におい
て密である)上記電極E。1 and thus the variation of the flux φo1, and graph b shows the above electrode E when the radiation beam is not uniform (in the considered example the ionizing beam is denser in the center than in the periphery).
1によって捕集される電流■。1の変動を示す。The current collected by 1■. It shows a variation of 1.
従って電流■。1 t IO2はもはや電極EOI t
EO2の面積sot t 802に比例し、また式(
2)二つの比較器CPo1.CPo2から成る回路(第
4図)によって、電極E。Therefore, the current ■. 1 t IO2 is no longer electrode EOI t
It is proportional to the area of EO2 sot t 802, and the formula (
2) Two comparators CPo1. Electrode E by means of a circuit consisting of CPo2 (FIG. 4).
1 j EO2によって捕集される電流■。1 j Current collected by EO2■.
1 j IO2に対応した電圧■。1 j VO2を比
較し、それで安全装置SSは、
の時トリガーされる。1 j Voltage corresponding to IO2■. 1 j VO2, so the safety device SS is triggered when .
■閾値は与えられた値の閾値電圧でさり、照射装置の動
作パラメータまたは特性に関係する。■The threshold value is a threshold voltage of a given value and is related to the operating parameters or characteristics of the irradiation device.
放射線ビームの強度、一様性および指向性を制御できる
電離室1,2は、例えば探針を備えたまたはビームの中
心決めを監視できる周知型の分割電極から成る別の電離
室(第1図に示されてない)と組合され得る。The ionization chambers 1, 2, in which the intensity, uniformity and directivity of the radiation beam can be controlled, can be replaced by a separate ionization chamber (Fig. (not shown).
第2の実施例では、この発明による装置は第5図に概略
的に示した二つの円形分割電極E、、E2をそれぞれ備
えた二つの電離室を有する。In a second embodiment, the device according to the invention has two ionization chambers, each equipped with two circularly segmented electrodes E, , E2, shown schematically in FIG.
二つの絶縁条片3,4(金属化体を備えてない’MYL
AR”から成る)は電極E1を二つの要素e11 t
e12にまた電極E2を二つの他の要素e2□、e22
に直径的に分割しこれらの絶縁条片3,4は互いに90
°の角度を成して配置される。Two insulating strips 3, 4 ('MYL without metallization)
AR'') consists of electrode E1 and two elements e11 t
In e12, electrode E2 is also connected to two other elements e2□, e22
These insulating strips 3, 4 are 90 mm apart from each other.
arranged at an angle of .
電極E1の面積S1は電離性ビームの断面積にほぼ等し
く、また電極E2の面積S2は電極E1の面積S1より
小さい。The area S1 of the electrode E1 is approximately equal to the cross-sectional area of the ionizing beam, and the area S2 of the electrode E2 is smaller than the area S1 of the electrode E1.
動作において、電極E1.電極E2の要素e12゜12
tti22を通す。In operation, electrode E1. Element e12°12 of electrode E2
Pass through tti22.
電極E1.E2をそれぞれ横切3電離性放射線フラック
スφ1.φ2はそれぞれ電極E1.E2に流れる電流1
1= i11+i12. l2=i21+i22に比例
する。Electrode E1. 3 ionizing radiation fluxes φ1. φ2 are the electrodes E1. Current 1 flowing through E2
1=i11+i12. It is proportional to l2=i21+i22.
フラックスが一様であるとすると、次の関係式が成立つ
。Assuming that the flux is uniform, the following relational expression holds.
動作において、dl、d2を電極E1.E2のそれぞれ
の直径とするとき、
のような電極E0の絶縁条片3の軸線に従う偏心率△d
をもつ一様でない放射線ビームの最も都合の悪い場合を
考えると、捕集される電流11.■2の比較により次の
関係が得られる。In operation, dl, d2 are connected to electrodes E1. E2, the eccentricity △d according to the axis of the insulating strip 3 of the electrode E0 such that
Considering the most unfavorable case of a non-uniform radiation beam with a collected current of 11. (2) The following relationship is obtained by comparing 2.
従って不等式(6) 、 (8)は放射線ビームを止め
る警報または安全装置を作動させることになる。Inequalities (6) and (8) will therefore activate an alarm or safety device to stop the radiation beam.
偏心的である一様なビームの場合には、次の関係が得ら
れる。In the case of a uniform beam that is eccentric, the following relationship is obtained:
不等類11)は安全装置によって放射線ビームの放出を
止めさせる。Inequality 11) causes the emission of the radiation beam to be stopped by a safety device.
しかしながら、中心決めした一様なビームは監視回路の
出力に司9) 、 (10) 、 (11)と同じ関係
を形成することが指摘されるべきである。However, it should be pointed out that a centered uniform beam forms the same relationship as 9), (10), (11) to the output of the monitoring circuit.
前述の場合のように不等式(11)は安全装置の動作を
もたらし、そしてその結果放射線ビームの放出を止めさ
せる。As in the previous case, inequality (11) results in the activation of the safety device and thus stopping the emission of the radiation beam.
従ってここで述べた実施例においては、装置の動作の信
頼性は保証されるが、しかし、放射線ビームにおいて現
われる欠陥の表示は行なわれない。In the embodiment described here, therefore, the reliability of the operation of the device is guaranteed, but no indication of defects appearing in the radiation beam is provided.
二つの他の好ましい実施例(第6,7図)においては、
ビームに現われる欠陥は表示される。In two other preferred embodiments (Figures 6 and 7):
Defects appearing in the beam are displayed.
第6図にはこの発明による装置に用いた二つの電極E3
.E4を概略的に示す。FIG. 6 shows two electrodes E3 used in the device according to the invention.
.. E4 is schematically shown.
電極E3は四〇の要素e31 t e32 j e33
t e34から成り、また電極E4は単一要素e4か
ら成っている。Electrode E3 has 40 elements e31 t e32 j e33
The electrode E4 consists of a single element e4.
動作において、電流■3=i3□+t32+t33十i
3+を測定することによって、フラックスφすなわち電
流I3に比例する放射線量を監視することができ、この
フラックスφはまた電流
を供給する第2の電離室で監視される。In operation, the current ■3=i3□+t32+t330i
By measuring 3+, it is possible to monitor the flux φ, i.e. the radiation dose which is proportional to the current I3, which flux φ is also monitored in the second ionization chamber supplying the current.
ざら−t、の場合、ビームの中心決めが得られ、 の場合、ビームの一様性が満足される。If Zara-t, then the centering of the beam is obtained, If , beam uniformity is satisfied.
上式仙)においてkは課せられた安全規準を考慮して1
に近い係数である。In the above-mentioned method, k is 1 considering the imposed safety standards.
The coefficient is close to .
放射線ビームが走査ビームである場合には、ビームの中
心決めの監視は、例えば四つの要素e3、。If the radiation beam is a scanning beam, the monitoring of the centering of the beam can be carried out, for example, by four elements e3.
e33 t e34を備えた電極E3を備えた電離室に
、特開昭51−16981号公報に記載された種類の中
心決め装置を組合わせることによって達成することがで
き、上記中心決め装置にはまた各々二つの要素を備えた
El j E2のような二つの電極が組合され得る。This can be achieved by combining an ionization chamber equipped with an electrode E3 equipped with an e33t e34 with a centering device of the type described in JP-A-51-16981; Two electrodes such as El j E2 with two elements each can be combined.
別の実施例ではこの発明による監視装置は第7図に示す
ようにそれぞれ電極E5゜E6.E7を備えた三つの電
離室5,6,7を備え°Cいる。In another embodiment, a monitoring device according to the invention is provided with electrodes E5, E6, . It is equipped with three ionization chambers 5, 6, 7 equipped with E7 °C.
電極E3.E6は実質上放射線ビームと同じ直径をもち
、各電極はそれぞれ二つの要素e5、。Electrode E3. E6 has substantially the same diameter as the radiation beam, and each electrode has two elements e5, respectively.
e5□、eQ□、e62から成っている。It consists of e5□, eQ□, and e62.
比較的小さな直径の電極E7はただ一つの要素e7から
成っている。The relatively small diameter electrode E7 consists of only one element e7.
電極E5の要素e51 j e52 を電極E6の要素
e6、。Element e51 j e52 of electrode E5 is element e6 of electrode E6.
e62および電極E7の要素e7はそれぞれ電流i5□
。e62 and element e7 of electrode E7 each have a current i5□
.
i52 j :i61 t 162 :i7を捕集する
。Collect i52 j : i61 t 162 : i7.
一様でないビームの場合(この非一様性は例えば修正フ
ィルタがないことかまたはビーム走査作用におけるある
欠陥に起因する)/Iこは次の関係が得られる。In the case of a non-uniform beam (this non-uniformity is due, for example, to the absence of a correction filter or to some defect in the beam scanning action), the following relationship is obtained:
これらの不等式は安全装置をトリガーして、放射線源の
動作を中断させるかまたは電離性ビームを制御させる。These inequalities trigger safety devices to interrupt operation of the radiation source or control the ionizing beam.
第8図には電極E5.E6.E7で捕集した信号を処理
する回路の一実施を示す。FIG. 8 shows electrode E5. E6. One implementation of a circuit for processing signals acquired at E7 is shown.
増幅器A、、A5□は電流”51 t i52に比例し
た電圧を発生する。Amplifiers A, , A5□ generate a voltage proportional to the current "51 t i52.
演算増幅器AS5は電流の和i5□+is2に比例した
電圧VS5を発生する。Operational amplifier AS5 generates a voltage VS5 proportional to the sum of currents i5□+is2.
可変抵抗R5□代上記電流の和が電離室5で測定した線
量を所与スケールで表わすように測定値を算定できるよ
うにする。The variable resistor R5 allows the measurement value to be calculated so that the sum of the above currents represents the dose measured in the ionization chamber 5 on a given scale.
演算増幅器AD5は電流の差151 !52に比例し
た電圧■D5を発生する。Operational amplifier AD5 has a current difference of 151! A voltage D5 proportional to 52 is generated.
可変抵抗R5□は電極E5の二つの要素6517652
間に存在し得るどのような僅かな非対称も保証できるよ
うにする。Variable resistance R5□ is two elements of electrode E5 6517652
Any slight asymmetry that may exist between them can be guaranteed.
同様な要素は電極E6に属する処理回路に対応符号で示
されている。Similar elements are designated with corresponding symbols in the processing circuitry belonging to electrode E6.
増幅器A。7は、電極E7で捕集された電流17および
従って線量に比例した電圧■7を発生する。Amplifier A. 7 generates a current 17 and thus a voltage 7 proportional to the dose collected at the electrode E7.
電圧VS5.■S6.■7はそれぞれ第9図に示すよう
に比較器C”1 、(:p、、 t C”3 +C”4
)CP、、CP6から成る誤差検出回路に供給される
。Voltage VS5. ■S6. ■7 are comparators C"1, (:p,, t C"3 +C"4, respectively, as shown in Fig. 9.
)CP, , CP6.
抵抗R1〜R7は製造における機械的不正確さを考慮し
て比較器に加えられる信号の値を調整できるようにする
。Resistors R1-R7 allow the value of the signal applied to the comparator to be adjusted to account for mechanical inaccuracies in manufacturing.
電極E、の面積は電圧E7の面積より大きいので、電圧
VS5は北斗すなわち電極E7.E5の面積S7゜S5
の比において電圧■S7より大きい。Since the area of electrode E, is larger than the area of voltage E7, voltage VS5 is the North Star, or electrode E7. Area of E5 S7゜S5
Voltage ■ is larger than S7 in the ratio of .
抵抗R1゜R2,R3は、電圧V7が下記の二重不等式
を満足するような抵抗値をもつ。The resistors R1°R2 and R3 have resistance values such that the voltage V7 satisfies the following double inequality.
この二重不等式が満足されなければ、比較器 。If this double inequality is not satisfied, the comparator .
CPlまたはCP2(不平衡に関係する)は安全装置S
5をトリガーする正の出力電圧または信号Kを発生する
。CPl or CP2 (related to imbalance) is the safety device S
Generates a positive output voltage or signal K that triggers 5.
比較器CP3.CP4は、線量が所与値■を越えた際に
安全装置SSをトリガーする。Comparator CP3. CP4 triggers the safety device SS when the dose exceeds a given value ■.
一方比較器CP5.CP6は電圧■S5.■S6間にお
よび従って電極E5.E6で測定した線量間に任意の不
一致が存在する場合に安全装置をトリガーする。On the other hand, comparator CP5. CP6 is the voltage ■S5. ■ Between S6 and therefore electrode E5. Trigger the safety device if there is any discrepancy between the doses measured at E6.
第10図に示す別の実施例においては、電極E5.E6
.E7の要素で捕集した電流は増倍器Mおよび計算機C
Lと組合さったアナログ・デジタル変換器CAによって
構成した装置に供給されこの装置は上記条件のチェック
を行ないそして安全装置SSを制御し、これらの条件が
満されない場合に放射線ビーム源を止めさせる。In another embodiment shown in FIG. 10, electrode E5. E6
.. The current collected by element E7 is transferred to multiplier M and computer C.
A device constituted by an analog-to-digital converter CA in combination with L is supplied to a device which performs a check of the above-mentioned conditions and controls a safety device SS to shut down the radiation beam source if these conditions are not met.
追加の関係
この発明は原発明〔特許第983925号(特公昭54
−16872号)〕すなわち〔イオン収集電極を備えた
少なくとも一つの電離室を有し、上記電極が導電性でし
かも互いに電気的に絶縁された多数の要素を備え、上記
要素が電離性放射線ビームの中心および周囲領域に相応
したイオン流を同時に測定できるように互いに関連して
配置され、上記要素が捕集した電気信号を処理する処理
回路と結合され、また上記処理回路が上記ビームを監視
する安全装置と結合されることを特徴とする予定の寸法
のターゲットを照射するようにされた電離性放射線ビー
ムの中心決め、強度、一様性および指向性を制御する監
視装置において、電離室にそれぞれ第1.第2円形電極
を設は上記第2電極の面積S2を上記第1円形電極の面
積S1より小さく、上記面積Sを電離性放射線ビームの
横断面積にほぼ等しくし、上記第1.第2円形電極を捕
集する電気信号を処理する回路を組合せ、さらに上記回
路によって制御されかつ電離性放射線ビームを発生する
放射線源を制御する安全装置で設けた点を特徴とする発
明であって原発明と同一の目的を達成する点で原発明の
追加の発明である。Additional Relationship This invention is based on the original invention [Patent No. 983925 (Special Publication No. 54
-16872)], i.e., [having at least one ionization chamber equipped with an ion collecting electrode, said electrode comprising a number of electrically conductive and electrically insulated elements from each other, said elements comprising a beam of ionizing radiation. arranged in relation to each other so as to simultaneously measure the ion currents corresponding to the central and peripheral regions, said elements being coupled to a processing circuit for processing the collected electrical signals, and said processing circuit for monitoring said beam; In a monitoring device for controlling the centering, intensity, uniformity and directivity of a beam of ionizing radiation adapted to irradiate a target of predetermined dimensions, the monitoring device is coupled with a device, characterized in that each 1. A second circular electrode is provided such that the area S2 of the second electrode is smaller than the area S1 of the first circular electrode, the area S is approximately equal to the cross-sectional area of the ionizing radiation beam, and the area S2 of the second circular electrode is smaller than the area S1 of the first circular electrode. The invention is characterized in that it combines a circuit for processing an electrical signal that collects a second circular electrode, and is further provided with a safety device that is controlled by the circuit and controls a radiation source that generates an ionizing radiation beam. An invention is an addition to the original invention in that it achieves the same purpose as the original invention.
第1図はこの発明による二つの電離室を有する監視装置
を示し、第2図はこの発明による上記二つの電離室に使
用した形式の二つの電極を概略的に示し、第3図は上記
電極の直径軸に沿った放射線の強度の分布の二つの実施
例を示し、第4図はこれらの電極と組合さった比較器回
路を概略的に示し、第5.6.7図はこの発明による装
置の別の三つの実施例を概略的に示し、第8.9 、1
0図はそれぞれ電離性放射線ビームの位置、強度、一様
性および指向性を監視できるようにする処理回路および
二つの比較器回路の線図である。
図中、1,2は電離室、EOI j E02円形電極C
Po1.CPo2は比較器、El、R2は円形分割電極
、3,4は絶縁条片、ell t e12 s e21
t e2□は要素、R3,R4は電極、e31.e3
2.e33゜e34 t e4は要素1 R5,R6,
R7は電極n e51゜e52 、e61 t e6
2 t e7は要素、A51 t A52は増幅器、R
51t R5□は可変抵抗、Ar1は演算増幅器、Ao
7は増幅器、CP1〜CP6は比較器、R1〜R71d
抵抗、SSは安全装置である。1 shows a monitoring device having two ionization chambers according to the invention, FIG. 2 schematically shows two electrodes of the type used in the two ionization chambers according to the invention, and FIG. 3 shows the electrodes according to the invention. FIG. 4 schematically shows a comparator circuit in combination with these electrodes, and FIG. 5.6.7 shows two examples of the distribution of the intensity of the radiation along the diametric axis of the 8.9, 1.
Figure 0 is a diagram of a processing circuit and two comparator circuits, respectively, making it possible to monitor the position, intensity, uniformity and directivity of the ionizing radiation beam. In the figure, 1 and 2 are ionization chambers, EOI j E02 circular electrode C
Po1. CPo2 is a comparator, El and R2 are circular split electrodes, 3 and 4 are insulating strips, ell t e12 s e21
t e2□ is an element, R3 and R4 are electrodes, e31. e3
2. e33゜e34 t e4 is element 1 R5, R6,
R7 is the electrode ne51゜e52, e61t e6
2 t e7 is an element, A51 t A52 is an amplifier, R
51t R5□ is a variable resistor, Ar1 is an operational amplifier, Ao
7 is an amplifier, CP1 to CP6 are comparators, R1 to R71d
The resistor, SS, is a safety device.
Claims (1)
室を有し、上記二つの電離室のうちの一方の電極の面積
が他方の電離室の電極の面積より少さく、上記他方の電
離室の電極の面積が電離性放射線ビームの横断面積にほ
ぼ等しく、上記他方の電離室の電極が少なくとも互いに
電気的に絶縁された多数の導電性要素を備え、上記二つ
の電極がそれぞれこれらの電極によって供給された電気
信号を処理する処理回路と組合され、上記処理回路が安
全装置を制御し、そして上記安全装置が上記電離性放射
線ビームの放射線源を制御することを特徴とする電離性
放射線ビームの位置、強度、一様性および指向性の監視
装置。 2 各電極が電気絶縁性の直径上の条片で互いに分離し
た二つの半円形要素から成り、一方の電極の電気絶縁性
の条片が他方の電極の電気絶縁性の条片に対して直角に
配置されることを特徴とする特許請求の範囲第1項に記
載の電離性放射線ビームの位置、強度、一様性および指
向性の監視装置。 3 一方の電極がほぼ4分円形の四つの要素に分割され
、また他方の電極が単一要素で構成されることを特徴と
する特許請求の範囲第1項に記載の電離性放射線ビーム
の位置、強度、一様性および指向性の監視装置。 4 ヨつの電離室を有し、これらの電離室の二つがそれ
ぞれ放射線ビームの横断面積とほぼ同じ大きさの電極を
備え、上記電極がそれぞれ電気絶縁性の直径上の条片で
互い0こ分離した二つの半円形要素を備え、上記電気絶
縁性の条片が互いに直角に配置され、上記電極室の残り
の−が単一要素で構成した電極を備え、この残りの一つ
の電極室の大きさが上記二つの電極室の電極の大きさよ
り小さいことを特徴とする特許請求の範囲第1項に記載
の電離性放射線ビームの位置、強度、一様性および指向
性の監視装置。 5 各電極が電極の要素によって供給された信号を処理
する処理回路と組合され、上記処理回路カー各電極に関
して要素によって供給された信号の和および差を予定の
閾値上比較できるようにする比較器回路および測定信号
が上記閾値と異なる値をもつ時放射線源を制御できるよ
うにする安全装置を備えていることを特徴とする特許請
求の範囲第1項に記載の電離性放射線ビームの位置、強
度、一様性および指向性の監視装置。 6 二つの電離室の電極がそれぞた処理装置と組合され
、上記処理装置が、各電極に関して上記電極の要素によ
って供給された信号の和および差を予定の閾値と比較で
きるようにする比較器回路と、残りの一つの電離室の電
極によって供給された信号を二つの両方の電離室の要素
によって供給された信号の和と同時に比較できるように
する別の比較器と、測定値が閾値と異なる値をもつ時放
射線源を制御できるようにする安全装置とを備えている
ことを特徴とする特許請求の範囲第4項に記載の電極性
放射線ビームの位置、強度、一様性および指向性の監視
装置。[Scope of Claims] 1. At least two ionization chambers each having one electrode, the area of one electrode of the two ionization chambers being smaller than the area of the electrode of the other ionization chamber, the area of the electrode of the other ionization chamber is approximately equal to the cross-sectional area of the ionizing radiation beam; ionization, characterized in that it is combined with a processing circuit for processing the electrical signals supplied by these electrodes, said processing circuit controlling a safety device, and said safety device controlling a radiation source of said ionizing radiation beam. Equipment for monitoring the position, intensity, uniformity and directionality of sexual radiation beams. 2 Each electrode consists of two semicircular elements separated from each other by an electrically insulating diametric strip, the electrically insulating strip of one electrode being at right angles to the electrically insulating strip of the other electrode. A device for monitoring the position, intensity, uniformity and directivity of an ionizing radiation beam according to claim 1, characterized in that the device is located at: 3. The position of the ionizing radiation beam according to claim 1, characterized in that one electrode is divided into four approximately quarter-circular elements and the other electrode consists of a single element. , intensity, uniformity and directionality monitoring equipment. 4 having two ionization chambers, two of which are each equipped with an electrode approximately the same size as the cross-sectional area of the radiation beam, each electrode separated from the other by an electrically insulating diametric strip; the electrically insulating strips are arranged at right angles to each other, the remaining electrode chambers are provided with a single-element electrode; The device for monitoring the position, intensity, uniformity and directivity of an ionizing radiation beam according to claim 1, characterized in that the size of the electrodes in the two electrode chambers is smaller than the size of the electrodes in the two electrode chambers. 5. A comparator in which each electrode is associated with a processing circuit for processing the signals supplied by the elements of the electrode, making it possible to compare the sums and differences of the signals supplied by the elements for each electrode above a predetermined threshold. The position and intensity of the ionizing radiation beam according to claim 1, characterized in that it is equipped with a circuit and a safety device that allows the radiation source to be controlled when the measurement signal has a value different from the threshold value. , uniformity and directional monitoring devices. 6. A comparator, in which the electrodes of the two ionization chambers are associated with a respective processing device, enabling said processing device to compare the sums and differences of the signals supplied by the elements of said electrodes for each electrode with predetermined threshold values. The circuit includes another comparator that allows the signal supplied by the electrode of the remaining one ionization chamber to be compared simultaneously with the sum of the signals supplied by both ionization chamber elements, and the measured value is equal to the threshold value. The position, intensity, uniformity and directivity of the polarized radiation beam according to claim 4, characterized in that it is provided with a safety device that makes it possible to control the radiation source when having different values. monitoring equipment.
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| FR7503798A FR2300414A2 (en) | 1975-02-07 | 1975-02-07 | DEVICE FOR MONITORING THE P |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS51102800A JPS51102800A (en) | 1976-09-10 |
| JPS5823704B2 true JPS5823704B2 (en) | 1983-05-17 |
Family
ID=9150889
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP1186076A Expired JPS5823704B2 (en) | 1975-02-07 | 1976-02-07 | Equipment for monitoring the position, intensity, uniformity and directivity of ionizing radiation beams |
Country Status (7)
| Country | Link |
|---|---|
| JP (1) | JPS5823704B2 (en) |
| CA (1) | CA1067624A (en) |
| CH (1) | CH588086A5 (en) |
| DE (1) | DE2604672C2 (en) |
| FR (1) | FR2300414A2 (en) |
| GB (1) | GB1558601A (en) |
| NL (1) | NL7601175A (en) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH0610001U (en) * | 1992-07-14 | 1994-02-08 | 正雄 宮前 | Trolley |
Families Citing this family (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| NL7804037A (en) * | 1978-04-17 | 1979-10-19 | Philips Nv | ELECTRONIC MICROSKOP WITH UNDIFFERENTIATED PHASE IMAGE. |
| US4347547A (en) * | 1980-05-22 | 1982-08-31 | Siemens Medical Laboratories, Inc. | Energy interlock system for a linear accelerator |
| GB8415709D0 (en) * | 1984-06-20 | 1984-07-25 | Dubilier Scient Ltd | Scanning microscope |
Family Cites Families (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| FR2133318A5 (en) * | 1971-04-16 | 1972-11-24 | Thomson Csf | |
| FR2215701B1 (en) * | 1973-01-26 | 1978-10-27 | Cgr Mev |
-
1975
- 1975-02-07 FR FR7503798A patent/FR2300414A2/en active Granted
-
1976
- 1976-02-04 GB GB445776A patent/GB1558601A/en not_active Expired
- 1976-02-05 NL NL7601175A patent/NL7601175A/en not_active Application Discontinuation
- 1976-02-06 CH CH149276A patent/CH588086A5/xx not_active IP Right Cessation
- 1976-02-06 CA CA245,763A patent/CA1067624A/en not_active Expired
- 1976-02-06 DE DE19762604672 patent/DE2604672C2/en not_active Expired
- 1976-02-07 JP JP1186076A patent/JPS5823704B2/en not_active Expired
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH0610001U (en) * | 1992-07-14 | 1994-02-08 | 正雄 宮前 | Trolley |
Also Published As
| Publication number | Publication date |
|---|---|
| CA1067624A (en) | 1979-12-04 |
| FR2300414B2 (en) | 1978-12-01 |
| CH588086A5 (en) | 1977-05-31 |
| NL7601175A (en) | 1976-08-10 |
| JPS51102800A (en) | 1976-09-10 |
| DE2604672C2 (en) | 1984-09-27 |
| GB1558601A (en) | 1980-01-09 |
| FR2300414A2 (en) | 1976-09-03 |
| DE2604672A1 (en) | 1976-08-19 |
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