JPS5827864B2 - Method for measuring the concentration of hydrogen ions and hydrofluoric acid - Google Patents
Method for measuring the concentration of hydrogen ions and hydrofluoric acidInfo
- Publication number
- JPS5827864B2 JPS5827864B2 JP53107934A JP10793478A JPS5827864B2 JP S5827864 B2 JPS5827864 B2 JP S5827864B2 JP 53107934 A JP53107934 A JP 53107934A JP 10793478 A JP10793478 A JP 10793478A JP S5827864 B2 JPS5827864 B2 JP S5827864B2
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- Prior art keywords
- concentration
- electrode
- potential difference
- hydrogen ion
- solution
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- Cleaning And De-Greasing Of Metallic Materials By Chemical Methods (AREA)
Description
【発明の詳細な説明】
本発明は酸洗浴中の水素イオンと、フッ化水素酸の濃度
を求める方法に関するものである。DETAILED DESCRIPTION OF THE INVENTION The present invention relates to a method for determining the concentration of hydrogen ions and hydrofluoric acid in a pickling bath.
金属、主としてステンレス鋼の酸洗いのために硝酸HN
O3、フッ化水素酸HF、および鉄Fe、クロムCr、
ニッケルNi等の金属イオンを含有する浴が使用される
。Nitric acid HN for pickling of metals, mainly stainless steel
O3, hydrofluoric acid HF, and iron Fe, chromium Cr,
A bath containing metal ions such as nickel Ni is used.
HNO3は金属酸化物皮膜下の金属を溶解し、Fe、C
r、Ni等の金属イオンはフッ化物と共に錯体を形成し
、これにより金属を更に溶解する。HNO3 dissolves the metal under the metal oxide film and dissolves Fe, C
Metal ions such as r, Ni, etc. form complexes with fluoride, thereby further dissolving the metal.
この際HNO3とHFとは酸洗い工程の経過と共に消耗
するので浴の機能は次第に低下する。At this time, HNO3 and HF are consumed as the pickling process progresses, so the functionality of the bath gradually deteriorates.
従って、浴中成分のうちHNO3と■゛との濃度を迅速
かつ精確に測定し、これらの濃度を適正維持することは
浴管理上重要なことである。Therefore, it is important for bath management to quickly and accurately measure the concentrations of HNO3 and 2 among the components in the bath and to maintain these concentrations appropriately.
第1図は、測定浴液中における基準電極と水素イオンに
選択的に感応する電極(以下、水素イオン選択性電極と
いう。FIG. 1 shows a reference electrode and an electrode selectively sensitive to hydrogen ions in the measurement bath liquid (hereinafter referred to as a hydrogen ion selective electrode).
)との間の電位差、または基準電極とフッ素イオンに選
択的に感応する電極(以下、フッ素イオン選択性電極と
いう。), or an electrode that is selectively sensitive to fluorine ions (hereinafter referred to as a fluorine ion-selective electrode) or a reference electrode.
)との間の電位差を測定する公知の装置の模式図であっ
て、測定溶液1中の基準電極2と水素イオン選択性電極
3またはフッ素イオン選択性電極31との間の電位差を
電圧計4で測定する。) is a schematic diagram of a known device for measuring the potential difference between a reference electrode 2 and a hydrogen ion selective electrode 3 or a fluorine ion selective electrode 31 in a measurement solution 1 using a voltmeter 4. Measure with.
基準電極2は電極5、内部溶液6、および隔膜γよりな
り、水素イオン選択性電極3またはフッ素イオン選択性
電極31は、電極8、内部溶液9、および水素イオン感
応膜10、またはフッ素イオン感応膜10よりなり、か
つ高濃度のフッ化水素酸が共存する強い腐食条件lこ耐
えるよう構成されている。The reference electrode 2 consists of an electrode 5, an internal solution 6, and a diaphragm γ, and the hydrogen ion selective electrode 3 or the fluorine ion selective electrode 31 consists of an electrode 8, an internal solution 9, and a hydrogen ion sensitive membrane 10, or a fluorine ion sensitive membrane 10. The film 10 is constructed to withstand strong corrosive conditions in which highly concentrated hydrofluoric acid coexists.
なお、水素イオン選択性電極とフッ素イオン選択性電極
との間の電位差を測定する場合には夫々、上記の水素イ
オン選択性電極3とフッ素イオン選択性電極31を用い
る。Note that when measuring the potential difference between the hydrogen ion selective electrode and the fluorine ion selective electrode, the hydrogen ion selective electrode 3 and the fluorine ion selective electrode 31 described above are used, respectively.
測定溶液中の水素イオン濃度は基準電極と水素イオン選
択性電極との間の電位差測定値を基礎として計算により
求められ(公知の計算式省略)、フッ化水素酸濃度は、
前記の基準電極と水素イオン選択性電極との間の電位差
測定値、ならびに基準電極または水素イオン選択性電極
とフッ素イオン選択性電極との間の電位差測定値を基礎
として計算によって求められる。The hydrogen ion concentration in the measurement solution is calculated based on the measured potential difference between the reference electrode and the hydrogen ion selective electrode (known calculation formula omitted), and the hydrofluoric acid concentration is
It is determined by calculation on the basis of the measured potential difference between the reference electrode and the hydrogen ion selective electrode, as well as the measured potential difference between the reference electrode or the hydrogen ion selective electrode and the fluorine ion selective electrode.
(公知の計算式省略)然しなから、上記在来の方法にお
いて、基準電極と水素イオン選択性電極との間の電位差
測定値は、第2図に示すように、測定溶液中(こ共存含
有されるHF濃度によって変動する。(Known calculation formula omitted) However, in the above conventional method, the measured value of the potential difference between the reference electrode and the hydrogen ion selective electrode is It varies depending on the HF concentration used.
第2図は、内部溶液を0.INのHClとし、1. O
NのHNO3と0、INのHNO3の測定溶液について
、HF濃度の変化が電位差に及ぼす影響を調べたもので
ある。Figure 2 shows the internal solution at 0. IN HCl, 1. O
The effect of changes in HF concentration on the potential difference was investigated for measurement solutions of HNO3 and 0 in N and HNO3 in IN.
この図によれば、HF濃度が0.INのあたりから、該
濃度の増加と共に電位が高くなり、その傾向は1、ON
のあたりから更に増大している。According to this figure, the HF concentration is 0. From around IN, the potential increases as the concentration increases, and the tendency is 1, ON
It has further increased since then.
これは結局、浴中のHF濃度が1. ON以上になると
、その値は見掛は上高位側に大きく偏位するものである
ことがわかる。This means that the HF concentration in the bath is 1. It can be seen that when the value becomes ON or higher, the value appears to deviate greatly toward the upper and higher side.
ところで、本発明者等の調査によれば、実際のステンレ
ス鋼用酸洗浴の組成は、H=0.1〜3N。According to research conducted by the present inventors, the composition of an actual pickling bath for stainless steel is H=0.1 to 3N.
HF = 0.5〜5N 、 Fe= ON30 g/
l 、 NiO〜5g/!’ 、 Cr= O〜10f
//lの如く広範囲にわたっているのに対し、浴管理上
要求される測定精度は±0.2 Nである。HF=0.5~5N, Fe=ON30g/
l, NiO~5g/! ', Cr=O~10f
//l, while the measurement accuracy required for bath management is ±0.2 N.
従って、上記在来の方法による基準電極と水素イオン選
択電極またはフッ素イオン選択電極との間の電位差の測
定値を基礎として算出される水素イオン濃度ならびOこ
フッ化水素酸濃度の測定値は、浴管理上要求される精度
を満足し得ないという欠点を有することは明かである。Therefore, the measured values of hydrogen ion concentration and hydrofluoric acid concentration calculated based on the measured value of the potential difference between the reference electrode and the hydrogen ion selective electrode or the fluorine ion selective electrode by the above-mentioned conventional method are as follows: It is clear that this method has the drawback of not being able to satisfy the accuracy required for bath management.
本発明は上記欠点を除くものであって、測定溶液中にお
ける、基準電極と水素イオン選択性電極との間の電位差
、ならびに基準電極または水素イオン選択性電極とフッ
素イオン選択性電極との間の電位差を測定し、該測定値
に基づいて水素イオン濃度、ならびにフッ化水素酸の濃
度を算出する濃度測定方法において、測定溶液に硝酸を
加えて、該溶液の硝酸濃度を0.05〜0.20 Nと
した後、測定溶液中における基準電極と水素イオンに選
択的に感応する電極との間の電位差を測定することを特
徴とする。The present invention eliminates the above-mentioned drawbacks and provides for the potential difference between the reference electrode and the hydrogen ion-selective electrode and between the reference electrode or the hydrogen ion-selective electrode and the fluoride ion-selective electrode in the measurement solution. In the concentration measurement method of measuring the potential difference and calculating the hydrogen ion concentration and the hydrofluoric acid concentration based on the measured value, nitric acid is added to the measurement solution to adjust the nitric acid concentration of the solution to 0.05 to 0. The method is characterized by measuring the potential difference between a reference electrode and an electrode selectively sensitive to hydrogen ions in the measurement solution after setting the pressure to 20 N.
以下、本発明を実施例によって詳細Oこ説明する。Hereinafter, the present invention will be explained in detail with reference to examples.
実施例 I
市販の基準電極(米国、オリオン社製)と強酸性陽イオ
ン交換膜型の水素イオン選択性電極とを用い、種々の混
合割合および硝酸濃度をもつHNO3とHFとの混合溶
液を測定溶液として、前記二電極間の電位差を求めた結
果を第3図に示す。Example I Using a commercially available reference electrode (manufactured by Orion, USA) and a strongly acidic cation exchange membrane type hydrogen ion selective electrode, mixed solutions of HNO3 and HF with various mixing ratios and nitric acid concentrations were measured. FIG. 3 shows the results of determining the potential difference between the two electrodes as a solution.
この場合の水素イオン選択性電極の内部溶液は、0、9
NのHNO3と0.INのHC’とを混合したものを
用いた。In this case, the internal solution of the hydrogen ion selective electrode is 0,9
N HNO3 and 0. A mixture of IN and HC' was used.
第3図より、HNO3濃度が0.05〜0.2ONの場
合には、HF濃度の変化にかかわらず、はぼ一定の測定
値が得られることがわかる。From FIG. 3, it can be seen that when the HNO3 concentration is 0.05 to 0.2ON, almost constant measured values can be obtained regardless of changes in the HF concentration.
なお実測値によれば、I(NO3単独の溶液とHNO3
4こその5倍量のHFを共存せしめた溶液との電位差は
、1mVに満たなかった。According to the actual measurements, I (a solution of NO3 alone and a solution of HNO3
The potential difference between 4 and a solution containing 5 times the amount of HF was less than 1 mV.
1 mVのずれは、HNO3濃度に換算して0.15N
以内であるから、浴管理上許容される値である。A deviation of 1 mV is equivalent to 0.15N in terms of HNO3 concentration.
Since it is within the range, it is an acceptable value for bath management.
実施例 2
HNO3濃度と■′濃度とを変化させた場合の具体的数
値を示せば、第1表の如くである。Example 2 Table 1 shows specific numerical values when the HNO3 concentration and the ■' concentration are changed.
第1表 HNO3およびHFの濃度変化と電位差との関
係
第1表からも、I(NO3濃度が0.05〜0.2ON
の場合は、HF濃度が変化しても電位差は1mV以内で
あって、浴管理上許容される範囲にあることがわかる。Table 1 Relationship between HNO3 and HF concentration changes and potential differences
In this case, it can be seen that even if the HF concentration changes, the potential difference is within 1 mV, which is within an acceptable range for bath management.
実施例 3
ステンレス酸洗浴より試料溶液を採取し、該試料溶液に
I(NO3を加えて、HNO3の濃度を0.12Nに調
整した後、該溶液における実施例1の基準**電極と水
素イオン選択性電極との間の電位差、および前記水素イ
オン選択性電極とフッ素イオン選択性電極(米国、オリ
オン社製)との間の電位差を測定し、これらの測定値を
基礎として算出した水素イオン濃度およびフッ化水素酸
濃度(本発明法則定値)を、別途精密化学分析法によっ
て求めた水素イオン濃度およびフッ化水素酸濃度との測
定値とを、第2表および第3表に示す。Example 3 A sample solution was collected from a stainless steel pickling bath, and after adjusting the concentration of HNO3 to 0.12N by adding I(NO3) to the sample solution, the reference** electrode of Example 1 and hydrogen ions were added to the sample solution. Hydrogen ion concentration calculated based on these measured values by measuring the potential difference between the selective electrode and the hydrogen ion selective electrode and the fluorine ion selective electrode (manufactured by Orion, USA) Tables 2 and 3 show the measured values of hydrogen ion concentration and hydrofluoric acid concentration, which were separately determined by a precision chemical analysis method, and the hydrofluoric acid concentration (fixed value according to the present invention).
第2表の測定値は、0.05NのHNO3NO3溶液1
00己!’ンレス鋼用酸洗液2mlを正確にはかり増り
、これらを300 mlのビー力(こ入れて十分攪拌し
た後測定した結果である。The measured values in Table 2 are 0.05N HNO3NO3 solution 1
00 self! These are the results of measurements after accurately measuring 2 ml of pickling solution for stainless steel, adding 300 ml of pickling solution, and thoroughly stirring.
水素イ*本オン濃度(I(NO3濃度)が正確に求まれ
ば、HF濃度もまたHFの解離定数とネルンストの式よ
り正確σこ求めることができる。If the hydrogen concentration (I (NO3 concentration)) is accurately determined, the HF concentration can also be determined accurately from the HF dissociation constant and Nernst's equation.
第2表および第3表より明かなように、水素イオン濃度
およびフッ化水素酸濃度が±0.2N以内の精度で求め
られることがわかる。As is clear from Tables 2 and 3, it can be seen that the hydrogen ion concentration and hydrofluoric acid concentration can be determined with an accuracy within ±0.2N.
上記のことから、測定溶液の水素イオン濃度を正確σこ
測定する場合、HNO3濃度を0.05〜0、2 Nの
範囲に調整しさえすれは、HF濃度に関係なく測定する
ことができることがわかったが、これを実際のステンレ
ス鋼用酸洗浴の測定に当て嵌めて実施するには次の如く
にする。From the above, when accurately measuring the hydrogen ion concentration of the measurement solution, it is possible to measure it regardless of the HF concentration as long as the HNO3 concentration is adjusted to a range of 0.05 to 0.2 N. Now, in order to apply this to the measurement of an actual pickling bath for stainless steel, proceed as follows.
即ち、ステンレス鋼用酸洗浴のHNO3濃度は通常0.
1〜2.ONであることが化学分析の結果既知であるか
ら、これを0.05〜0.20 Nの範囲にするには、
0.05NのHNO3で約50倍に希釈すればよく、か
かる希釈された溶液について基準電極、水素イオン選択
性電極およびフッ素イオン選択性電極Oこより測定を行
なえばよい。That is, the HNO3 concentration of the pickling bath for stainless steel is usually 0.
1-2. Since it is known as a result of chemical analysis that it is ON, in order to set this in the range of 0.05 to 0.20 N,
The solution may be diluted approximately 50 times with 0.05N HNO3, and the diluted solution may be measured using a reference electrode, a hydrogen ion selective electrode, and a fluorine ion selective electrode.
以上の如く、本発明法によれば、高濃度のHFが共存す
る酸洗浴中の水素イオン濃度およびフッ化水素酸濃度を
精確に求めることができ、精度の高い浴管理を行うこと
ができる。As described above, according to the method of the present invention, it is possible to accurately determine the hydrogen ion concentration and hydrofluoric acid concentration in a pickling bath in which a high concentration of HF coexists, and it is possible to perform highly accurate bath management.
第1図は測定溶液中における基準電極と水素イオン選択
性電極との間の電位差または、基準電極あるいは水素イ
オン選択性電極とフッ素イオン選択性電極との間の電位
差を測定する公知の装置の模式図である。
第2図は、測定溶液中のHF濃度(横軸)と基準電極−
水素イオン選択性電極間の電位差(縦軸)との関係を示
す。
第3図は、測定溶液中のHNO3濃度(横軸)と基準電
極−水素イオン選択性電極間の電位差(縦軸)との関係
をHNO3とHFの混合割合をパラメーターとして示し
たもので、曲線1はHNo 3単独、曲線2はHNO3
:HF=3:1、曲線3はHNO3:HF1:1、曲線
4はHNO3:HF=1 : 3、曲線5はHNO3:
HF=1 : 5の場合を示す。Figure 1 is a schematic diagram of a known device for measuring the potential difference between a reference electrode and a hydrogen ion selective electrode in a measurement solution, or between a reference electrode or a hydrogen ion selective electrode and a fluorine ion selective electrode. It is a diagram. Figure 2 shows the HF concentration in the measurement solution (horizontal axis) and the reference electrode.
The relationship with the potential difference (vertical axis) between hydrogen ion selective electrodes is shown. Figure 3 shows the relationship between the HNO3 concentration in the measurement solution (horizontal axis) and the potential difference between the reference electrode and the hydrogen ion selective electrode (vertical axis) using the mixing ratio of HNO3 and HF as a parameter. 1 is HNo3 alone, curve 2 is HNO3
:HF=3:1, curve 3 is HNO3:HF1:1, curve 4 is HNO3:HF=1:3, curve 5 is HNO3:
The case of HF=1:5 is shown.
Claims (1)
的に感応する電極との間の電位差ならびに水素イオンσ
こ選択的に感応する電極または基準電極とフッ素イオン
に選択的に感応する電極との間の電位差を測定し、該測
定値に基づいて水素イオン濃度ならびにフッ化水素酸の
濃度を算出する濃度測定方法において、測定溶液に硝酸
を加えて、該溶液の硝酸濃度を0.05〜0.20規定
Nとした後、測定溶液中における基準電極と水素イオン
に選択的に感応する電極との間の電位差を測定すること
を特徴とする前記濃度測定方法。1 Potential difference between the reference electrode and an electrode selectively sensitive to hydrogen ions and hydrogen ions σ in the measurement solution
Concentration measurement that measures the potential difference between this selectively sensitive electrode or reference electrode and an electrode that selectively sensitive to fluorine ions, and calculates the hydrogen ion concentration and the hydrofluoric acid concentration based on the measured value. In the method, after adding nitric acid to the measurement solution to make the nitric acid concentration of the solution 0.05 to 0.20N, The concentration measuring method described above comprises measuring a potential difference.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP53107934A JPS5827864B2 (en) | 1978-09-01 | 1978-09-01 | Method for measuring the concentration of hydrogen ions and hydrofluoric acid |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP53107934A JPS5827864B2 (en) | 1978-09-01 | 1978-09-01 | Method for measuring the concentration of hydrogen ions and hydrofluoric acid |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS5533682A JPS5533682A (en) | 1980-03-08 |
| JPS5827864B2 true JPS5827864B2 (en) | 1983-06-11 |
Family
ID=14471750
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP53107934A Expired JPS5827864B2 (en) | 1978-09-01 | 1978-09-01 | Method for measuring the concentration of hydrogen ions and hydrofluoric acid |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS5827864B2 (en) |
-
1978
- 1978-09-01 JP JP53107934A patent/JPS5827864B2/en not_active Expired
Also Published As
| Publication number | Publication date |
|---|---|
| JPS5533682A (en) | 1980-03-08 |
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