JPS5835925B2 - Hydrogen peroxide compound - Google Patents

Description

DETAILED DESCRIPTION OF THE INVENTION The present invention relates to a novel hydrogen peroxide compound consisting of potassium sulfate, potassium hydrogen sulfate, and hydrogen peroxide.

Many compounds in which hydrogen peroxide is added to an inorganic compound have been known to date, but only a few types are actually used due to their properties and difficulty in production.

The major factors that restrict the use of hydrogen peroxide compounds are:
These are the stability of the added hydrogen peroxide and the properties of the parent Kabuki compound itself.

Many of the hydrogen peroxide compounds currently in use are
The use of solid hydrogen peroxide is restricted because its aqueous solution is highly alkaline.

In order to widen the use of solid hydrogen peroxide,
There is a need to find new adjunct compounds that are stable and have different properties, and an adjunct compound that itself is acidic is one such example.

From this perspective, the present inventors have conducted extensive research, and as a result, have found a new hydrogen peroxide-added compound containing stable hydrogen peroxide using a simple method, and have completed the present invention.

That is, the present invention can be obtained from a solution containing hydrogen peroxide (H202), potassium sulfate (K2804), and (H2SO4) or potassium hydrogen sulfate (KHSO3).
This invention relates to a novel hydrogen peroxide compound (hereinafter referred to as the present substance) having the composition K4)T2(804)3.H2O2.

The production of this substance depends on the concentrations of H2O2, K2SO4, and H2SO4 and the reaction temperature, and no additional compound is produced unless both concentration and temperature conditions are satisfied.

This substance can also be produced by using KHSO3 instead of H2SO4.

This substance can be produced by a solubility gradient method such as cooling crystallization, by adding 2SO4, KHS, etc. to the reaction solution.
There is a method of crystallizing by adding and suspending raw materials such as O3 and H2SO4 afterwards, and means such as concentration may also be used if necessary.

The reaction reactor liquid after recovering this substance, which is the target product, is acidic, so H2O2 stability is good, and K2SO4, H
The concentrations of each component, 2SO4 and H2O2, can be adjusted and recycled.

The temperature range for producing this substance is not particularly limited and can be selected at any temperature, but generally O~4
It is more convenient to carry out the reaction in a temperature range of about 0°C.

2SO4, H2SO when the H2O2 concentration is constant
The concentration range of No. 4 widens as the temperature decreases, and conversely narrows as the temperature increases.

Also, when the temperature is constant, 2SO4, H2SO4
The concentration range becomes wider as the H2O2 concentration increases.

In order to produce this substance in the above temperature range of 0 to 40°C, the H2O2 concentration must be at least 130y7t or more, preferably 200 to 400 f/l.

Temperature 0~40℃, H2O2 concentration 200~400? /l
The concentration range of 2SO4 and H2SO4 when carrying out the reaction in the range of 280 f/ and above and 60 f/
f/A or more and 260 f/ or less.

By drying the resulting crystals obtained by the above method at a temperature below about 70°C so as not to unnecessarily lose H2O2, it is possible to obtain a stable hydrogen peroxide-added compound containing approximately 7 weight φ of H2O2. I can do it.

As shown in Table 1, the discharge stability of this material at 50.degree. C. is stable enough to withstand use even without the use of a stabilizer.

In addition, the pH of the aqueous solution is 1.5 for 1 and 3 ton solutions, respectively.
and 1.8, indicating strong acidity.

This novel hydrogen peroxide compound can be used not only for general bleaching and sterilization purposes, but also for various surface cleaning purposes.

Incidentally, this substance may be used alone or as a component of a compounded composition, and can be used advantageously depending on various purposes.

Production examples and examples of the present invention are shown below.

Production example I H202397f / 4 K2 SO4434V /
l.

Solution 500- with H2SO4143t/lcD concentration
The 804 crystal 75? was kept at 5℃ and ground well in this solution. was added and suspended, and after stirring for 1 hour, the crystals were separated in a furnace, and
After drying at 0 to 60°C for about 3 hours, white crystals 89V (compound A-(1)'
) was obtained.

Manufacturing example 2 H2O2394171% 2SO4465t/l.

A solution 500- with a concentration of H25o4109 f/l
KH was kept at 5℃ and thoroughly ground into this solution.
804 crystal 125? After stirring for 2 hours, the crystals were separated in a furnace and dried at 50 to 60°C for about 3 hours to form H2O26.
, 72 g of white crystals (compound A-
(2)) was obtained.

Production example 3 H2O2205 at 30℃? /1. K25O4467g/l, H2SO4222? Solution 5 with a concentration of /l
00ml was cooled to 0°C with stirring, and after stirring for 1 hour, the crystallized crystals were separated in a furnace and treated in the same manner as in Production Example 1 to obtain crystals 122P (H2026, containing 91 weight φ) Compound A-(3)) was obtained.

Manufacturing example 4 H20□286 f/l, K2804420? /l
.

A solution 500- with a concentration of 141 f/l of H2SO4 was heated to 10°C, and 834 2SO4 crystals were ground into this solution.
V and 95% H280424,7y were added, stirred for 1 hour, separated from the furnace, and treated in the same manner as in Production Example 1 to obtain H20□.
Crystal 126f containing 7.00 weight type? (Compound A
-(4)) was obtained.

Manufacturing example 5 H2O2405 heated to 40℃? /l.

K25o4558 f? /l, H2SO4167t/l
(A solution having a concentration of D was heated at 50°C while stirring.)
After stirring for 1 hour, the crystallized crystals were separated in a furnace and treated in the same manner as in Production Example 1 to obtain 96 g of crystals (compound A-(5)) containing 7.02% by weight of H2O2. .

Example 1 (1) Table 2 shows the chemical analysis results of compounds A-(1) to A-(5) obtained in Production Examples 1 to 5, respectively.

(2) Compound A (5) Decomposition temperature measured by differential thermal analyzer teeth, ■ The temperature was 40°C.

(3) The X-ray diffraction pattern of Compound A-(5) is shown in FIG.

In addition, 2S04 (reagent), KHSO3 (reagent),
K2SO4/KHSO3 (applicant adjusted product) and 2K
HSO3・K2SO4−KHSO3(0XONE;
The X-ray diffraction patterns of E.I. (manufactured by DuPont) are shown in FIGS. 2 to 5, respectively.

Furthermore, Table 3 shows the interplanar spacing d(4) of the five peaks with the highest intensity in each diffraction diagram.

[Brief explanation of the drawing]

Figures 1 to 5 each show the products of the present invention. K2 SO4* KHSO3, K2 S 04・KHS
X-ray diffraction patterns of O3 and OXONE are shown.

Claims (1)

[Claims] 1 A hydrogen peroxide compound having the composition K4H2(SO4)3.H2O2.