JPS5836500B2 - Manufacturing method of ceramic substrate for IC - Google Patents
Manufacturing method of ceramic substrate for ICInfo
- Publication number
- JPS5836500B2 JPS5836500B2 JP49064004A JP6400474A JPS5836500B2 JP S5836500 B2 JPS5836500 B2 JP S5836500B2 JP 49064004 A JP49064004 A JP 49064004A JP 6400474 A JP6400474 A JP 6400474A JP S5836500 B2 JPS5836500 B2 JP S5836500B2
- Authority
- JP
- Japan
- Prior art keywords
- ceramic substrate
- melting point
- point metal
- ceramic
- substrate
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
Landscapes
- Cooling Or The Like Of Electrical Apparatus (AREA)
- Structure Of Printed Boards (AREA)
- Cooling Or The Like Of Semiconductors Or Solid State Devices (AREA)
Description
【発明の詳細な説明】
本発明はセラミック基板およびその製造に関し主として
半導体集積回路装置(IC)用の放熱部材を有するIC
用セラミック基板の製造を対象とする。DETAILED DESCRIPTION OF THE INVENTION The present invention relates to a ceramic substrate and its manufacture, and mainly relates to a ceramic substrate having a heat dissipating member for a semiconductor integrated circuit device (IC).
Targeting the manufacturing of ceramic substrates for
半導体集積回路装置(IC)用の熱放散性のよいセラミ
ック基板として、一般に、アルミナを主成分とするセラ
ミック基板の上面に銅金属板よりなるヒートシンク(放
熱部材)を固定し、この上面に半導体ベレットを固定す
る構造、あるいは、セラミック基板に凹部を形成し、コ
バール板(又?尭板)の上面に銅金属板を固定したもの
をとの凹部の底面に固定し、この銅金属板上面に半導体
ペレットを固定する構造が知られている。As a ceramic substrate with good heat dissipation properties for a semiconductor integrated circuit device (IC), a heat sink (heat dissipation member) made of a copper metal plate is generally fixed on the top surface of a ceramic substrate mainly composed of alumina, and a semiconductor pellet is placed on the top surface of the ceramic substrate. Alternatively, a recess is formed in the ceramic substrate, a copper metal plate is fixed to the top surface of the Kovar plate (also known as a Kovar plate), and the semiconductor is fixed to the bottom of the recess. Structures for fixing pellets are known.
前者の場合は、アルナを主成分とするセラミック基板に
銅金属板が固定されているだけであるから、安価である
反面、セラツク基板を介して基板外部へ放散するため放
熱特性が悪い。In the former case, since a copper metal plate is simply fixed to a ceramic substrate containing alumina as a main component, it is inexpensive, but on the other hand, heat dissipation characteristics are poor because heat is radiated to the outside of the substrate via the ceramic substrate.
後者の場合は、放熱用金属板がセラツク基板外部へ露出
しているため放熱特性が良い反面、セラミック基板に凹
部を形成して、コバール板、銅金属板をはめこみ固定す
るために、高価につく欠点がある。In the latter case, the metal plate for heat dissipation is exposed to the outside of the ceramic board, so it has good heat dissipation properties, but it is expensive because it requires forming a recess in the ceramic board and inserting and fixing the Kovar plate and copper metal plate. There are drawbacks.
そして、前記いずれの場合にも、セラミック基板焼成後
、銅金属板を別に設けなければならないから、製造工数
および製造費、材料費が大になることがあった。In any of the above cases, a copper metal plate must be provided separately after firing the ceramic substrate, which may increase manufacturing man-hours, manufacturing costs, and material costs.
そこで、本願発明者は、アルナを主成分とするセラツク
基板のペレット固定部位置に大きな貫通孔を形成し、こ
の孔の中に高融点金属ペーストを充填させて焼成すれば
、一回の焼成で高融点金属からなるヒートシンクを有す
るセラツク基板を形成することができ、放熱特性の良く
、シかも安価なセラミック基板を比較的簡単に製造する
ことができることを考えた。Therefore, the inventor of the present application has proposed that if a large through hole is formed at the pellet fixing part of a ceramic substrate containing alumina as a main component, and the high melting point metal paste is filled into this hole and fired, it can be fired in one time. The inventors have thought that it is possible to form a ceramic substrate having a heat sink made of a high-melting-point metal, and that it is possible to relatively easily manufacture an inexpensive ceramic substrate with good heat dissipation characteristics.
しかしこの場合、セラツク板と高融点金属体との熱膨張
係数に著しい差があるため、焼成後、七ランク基板にク
ラツクが生ずるという問題がある。However, in this case, since there is a significant difference in the coefficient of thermal expansion between the ceramic plate and the high melting point metal body, there is a problem that cracks occur in the 7-rank board after firing.
したがって、本発明はかかる問題を解決するためになさ
れたもので、その一つの目的は少ない工数で放熱特性の
優れたIC用セラツク基板を得ることにあり、本発明の
他の目的は、■C用七ランク基板にクラツクを生じさせ
ないことにあり、本発明のさらに他の目的は安価なIC
用セラミック基板を提供することにある。Therefore, the present invention has been made to solve such problems, and one purpose thereof is to obtain a ceramic substrate for IC with excellent heat dissipation characteristics with a small number of man-hours.Another purpose of the present invention is It is a further object of the present invention to prevent cracks from occurring in a 7-rank board for use in ICs.
The purpose of the present invention is to provide a ceramic substrate for use.
上記目的を達成するための本発明の要旨は、未焼結セラ
ミック基板のICペレット載置部分に選択的に貫通孔を
形成し、上記貫通孔に高融点金属?充填するとともに上
記ICペレット載置部分近傍に配線用高融点金属層及び
上記セラミック基板裏面に放熱用高融点金属層を形成し
、その後上記基板を焼成することを特徴とするIC用セ
ラミック基板の製造方法にある。The gist of the present invention to achieve the above object is to selectively form a through hole in the IC pellet mounting portion of an unsintered ceramic substrate, and fill the through hole with a high melting point metal. Manufacturing a ceramic substrate for IC, characterized in that a high melting point metal layer for wiring and a high melting point metal layer for heat dissipation are formed on the back surface of the ceramic substrate in the vicinity of the IC pellet mounting portion, and then the substrate is fired. It's in the method.
以下本発明の一実施例を図面を参照して具体的に説明す
る。An embodiment of the present invention will be specifically described below with reference to the drawings.
第1図aは本発明のセラミック基板である。FIG. 1a shows a ceramic substrate of the present invention.
同図において、1はアルミナを主成分とするセラミック
基板で、この基板の上主面にはタングステンやモリブデ
ン等高融点金属のメタライズ層からなる配線層2が形成
され、この基板の下主面には高融点金属のメタライズ層
からなる導体層3が形成されている。In the figure, reference numeral 1 denotes a ceramic substrate mainly composed of alumina, and a wiring layer 2 made of a metallized layer of a high melting point metal such as tungsten or molybdenum is formed on the upper main surface of this substrate, and on the lower main surface of this substrate. A conductor layer 3 made of a metallized layer of a high melting point metal is formed.
4はヒートシンクで、セラミック基板のペレット固定部
に埋設されたタングステンやモリブデン等の高融点金属
柱群からなっている。4 is a heat sink, which is made up of columns of high-melting metal such as tungsten or molybdenum embedded in the pellet fixing part of the ceramic substrate.
そして、このヒートシンクは、上部がセラミック基板の
上主面に形成されているペレット固定用の配線層2に接
続し、下部がセラミック基板の下工面に形成されている
導体層3に接続している。The upper part of this heat sink is connected to a wiring layer 2 for fixing pellets formed on the upper main surface of the ceramic substrate, and the lower part is connected to a conductor layer 3 formed on the lower surface of the ceramic substrate. .
なお、上記ヒートシンクの各高融点金属柱は、約1φの
柱からなっている。Note that each high melting point metal pillar of the heat sink is made of a pillar with a diameter of about 1φ.
第1図bは本発明セラミック基板に半導体ペレットを取
付けた状態を示すものである。FIG. 1b shows a state in which semiconductor pellets are attached to the ceramic substrate of the present invention.
半導体ベレット5はペレット固定用の配線層2の表面に
Niメツキを施し、その上に銀ろうを介して取付ける。The semiconductor pellet 5 is plated with Ni on the surface of the wiring layer 2 for fixing the pellet, and is attached thereon via silver solder.
その後、半導体ペレットの各電極と対応する配線間をワ
イヤ6で接続する。Thereafter, wires 6 are used to connect each electrode of the semiconductor pellet to the corresponding wiring.
以上実施例で述べたような本発明であれば、セラミック
基板に高融点金属柱群からなるヒートシンクを備えてお
くから、半導体ペレットから発生する熱を各金属柱を通
してセラミック基板外部に熱放散させることができ、実
質上、金属板上面に半導体ペレットを固定したと同じ作
用をなし、熱放散性の優れたセラツク基板を提供するこ
とができるのである。According to the present invention as described in the embodiments above, since the ceramic substrate is provided with a heat sink consisting of a group of high-melting point metal columns, the heat generated from the semiconductor pellet can be dissipated to the outside of the ceramic substrate through each metal column. This makes it possible to provide a ceramic substrate with substantially the same effect as fixing semiconductor pellets on the top surface of a metal plate, and with excellent heat dissipation properties.
次に、本発明のセラミック基板製造法を具体的に説明す
る。Next, the ceramic substrate manufacturing method of the present invention will be specifically explained.
第2図aに示すように、アルミナを主成分とするグリー
ンセラミック板(未焼成セラミック板)1を用意し、そ
のペレット固定部にプレス等により貫通孔7を多数形成
する。As shown in FIG. 2a, a green ceramic plate (unfired ceramic plate) 1 whose main component is alumina is prepared, and a large number of through holes 7 are formed in the pellet fixing part by pressing or the like.
各貫通孔は1525以下の孔で、ペレット固定部に形成
する孔の数は孔の上面の総面積がペレット固定部のセラ
ミック板の50?をしめるようにする。Each through-hole is 1,525 holes or less, and the number of holes formed in the pellet fixing part is such that the total area of the upper surface of the holes is 50 or less than that of the ceramic plate of the pellet fixing part. Make sure to close it.
bグリーンセラミック板の上面にタングステンやモリブ
デン等の高融点金属ペーストを印刷塗布し、同時に基板
下部を真空吸引して、グリーンセラミック板の上面に配
線層2を形成し、各貫通孔1に上記高融点金属ペースト
を充填させる。b Print and coat a high melting point metal paste such as tungsten or molybdenum on the top surface of the green ceramic board, and at the same time vacuum the bottom of the board to form the wiring layer 2 on the top surface of the green ceramic board, and fill each through hole 1 with the above-mentioned height. Fill with melting point metal paste.
上記ペーストを乾燥させた後、セラミック板裏面にも上
記高融点金属ペーストを印刷塗布し導体層3を形成する
。After drying the paste, the high melting point metal paste is also printed on the back surface of the ceramic plate to form a conductor layer 3.
ペースト乾燥後、上記セラミック板を1300〜160
0℃の還元雰囲気中で焼成し、第1図aに示すように上
面にメタライズ金属からなる配線層2が形成され、下面
にメタライズ金属からなる導体層3が形成され、ペレッ
ト固定部にメタライズ金属柱群(高融点金属柱群)から
なるヒートシンク4が設けられたセラミック基板を製造
する。After drying the paste, apply the above ceramic plate to 1300~160
After baking in a reducing atmosphere at 0°C, a wiring layer 2 made of metallized metal is formed on the upper surface, a conductor layer 3 made of metallized metal is formed on the lower surface, and metalized metal is formed on the pellet fixing part as shown in FIG. 1a. A ceramic substrate provided with a heat sink 4 consisting of a group of columns (a group of high melting point metal columns) is manufactured.
以上実施例で説明したような本発明によれば、セラミッ
ク基板のペレット取付部に多数の貫通孔を形成し、この
孔の中に高融点金属を充填した状態で基板を焼成するか
ら、一度の作業で高融点金属柱群からなるヒートシンク
を有するセラミック基板を製造することができ、少ない
工数で放熱特性の優れたセラミック基板を製造すること
ができる。According to the present invention as explained above in the embodiments, a large number of through holes are formed in the pellet mounting portion of the ceramic substrate, and the substrate is fired with the high melting point metal filled in the holes, so that the ceramic substrate can be fired at once. A ceramic substrate having a heat sink made of a group of high-melting point metal columns can be manufactured in a single operation, and a ceramic substrate with excellent heat dissipation characteristics can be manufactured with a small number of man-hours.
捷た、セラツク基板に形成した多数の貫通孔の中に高融
点金属を充填させた状態で焼成して高融点金属柱群から
なるヒートシンクを有するセラミック基板を形成するか
ら、セラミック基板全体から比較して各高融点金属部分
のしめる割合は小さい。Since a ceramic substrate with a heat sink consisting of a group of high-melting point metal columns is formed by firing a large number of through-holes formed in a splintered ceramic substrate and filled with a high-melting point metal, it is possible to compare the whole ceramic substrate. The proportion of each high melting point metal part is small.
したがって、セラツク板と高融点金属との熱膨張係数に
著しい差があっても、基板焼成後にセラツク基板にクラ
ツクが生ずるということはなくなる。Therefore, even if there is a significant difference in coefficient of thermal expansion between the ceramic plate and the high melting point metal, cracks will not occur in the ceramic substrate after the substrate is fired.
第3図は本発明の他の実施例を示すものである。FIG. 3 shows another embodiment of the invention.
同図に示すように、タングステンやモリブデン等の高融
点金属柱群を2段にし、2段高融点金属柱からヒートシ
ンクを有するセラミック基板としたものである。As shown in the figure, a group of high melting point metal columns such as tungsten and molybdenum are arranged in two stages, and a ceramic substrate having a heat sink is formed from the two stages of high melting point metal columns.
このようにすれば、放熱用金属体の面積が犬になり、よ
り熱放散性がよくなる。In this way, the area of the heat dissipating metal body becomes smaller and the heat dissipation performance becomes better.
なお、本発明は上述する実施例に限定されるものでなく
、セラミック基板製造において、グリーンセラミック基
板のペレット固定部に多数の貫通孔を形成し、ここで基
板を一旦焼成し、その後、貫通孔に高融点金属を充填し
、ここで再焼成して?ラミック基板を製造するようにし
てもよい。Note that the present invention is not limited to the embodiments described above, and in manufacturing a ceramic substrate, a large number of through holes are formed in the pellet fixing part of a green ceramic substrate, the substrate is once fired, and then the through holes are formed. filled with high melting point metal and refired here? A lamic substrate may also be manufactured.
本発明は主としてIC用のセラツク基板およびその製造
に適用することができるが、放熱を必要とするその他の
半導体装置一般用の七ランク基板およびその製造に適用
できるものである。The present invention is primarily applicable to ceramic substrates for ICs and their manufacture, but is also applicable to other general 7-rank substrates for semiconductor devices that require heat dissipation and their manufacture.
【図面の簡単な説明】
第1図aは本発明の一実施例の断面図、第1図bは本発
明のセラミック基板に半導体ペレットを取付けた断面図
、第2図は本発明方法を工程順に示したもので、a−b
は各工程の断面図、第3図は本発明の他の実施例の断面
図である。
1・・・セラミック基板(板)、2・・・配線層、3・
・・導体層、4・・・ヒートシンク、5・・・半導体ペ
レット、6・・・ワイヤ、7・・・貫通孔。[Brief Description of the Drawings] Figure 1a is a cross-sectional view of an embodiment of the present invention, Figure 1b is a cross-sectional view of a semiconductor pellet attached to a ceramic substrate of the present invention, and Figure 2 is a process diagram of the method of the present invention. Shown in order, a-b
3 is a sectional view of each step, and FIG. 3 is a sectional view of another embodiment of the present invention. 1... Ceramic substrate (board), 2... Wiring layer, 3...
... Conductor layer, 4... Heat sink, 5... Semiconductor pellet, 6... Wire, 7... Through hole.
Claims (1)
択的に貫通孔を形成し、上記貫通孔に高融点金属を充填
するとともに上記ICペレット載置部分近傍に配線用高
融点金属層及び上記セラミック基板裏面に放熱用高融点
金属層を形成し、その後上記基板を焼成することを特徹
とするIC用セラツク基板の製造法。1. A through hole is selectively formed in the IC pellet mounting portion of the unsintered ceramic substrate, and the through hole is filled with a high melting point metal, and a high melting point metal layer for wiring and the above ceramic are filled in the vicinity of the IC pellet mounting portion. A method of manufacturing a ceramic substrate for IC, which is characterized by forming a high melting point metal layer for heat dissipation on the back surface of the substrate, and then firing the substrate.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP49064004A JPS5836500B2 (en) | 1974-06-07 | 1974-06-07 | Manufacturing method of ceramic substrate for IC |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP49064004A JPS5836500B2 (en) | 1974-06-07 | 1974-06-07 | Manufacturing method of ceramic substrate for IC |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS50155973A JPS50155973A (en) | 1975-12-16 |
| JPS5836500B2 true JPS5836500B2 (en) | 1983-08-09 |
Family
ID=13245606
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP49064004A Expired JPS5836500B2 (en) | 1974-06-07 | 1974-06-07 | Manufacturing method of ceramic substrate for IC |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS5836500B2 (en) |
Families Citing this family (8)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS58116233U (en) * | 1982-02-01 | 1983-08-08 | 株式会社日立製作所 | Heat dissipation fin structure for printed wiring boards |
| JPS5998649U (en) * | 1982-12-22 | 1984-07-04 | 京セラ株式会社 | Chippukiyariya |
| JPS62174341U (en) * | 1986-04-25 | 1987-11-05 | ||
| JPH0338653U (en) * | 1989-08-24 | 1991-04-15 | ||
| JPH06112375A (en) * | 1992-09-24 | 1994-04-22 | Kyocera Corp | Package for storing semiconductor devices |
| JP4699042B2 (en) * | 2005-02-21 | 2011-06-08 | 京セラ株式会社 | WIRING BOARD FOR LIGHT EMITTING ELEMENT AND LIGHT EMITTING DEVICE |
| JP4849859B2 (en) * | 2005-09-29 | 2012-01-11 | 京セラ株式会社 | Multilayer circuit board and portable electronic device having the same |
| KR100962706B1 (en) * | 2009-11-27 | 2010-06-15 | 주식회사 테크엔 | Manufacture method of the large illuminations with power led |
Family Cites Families (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS5910075B2 (en) * | 1973-09-19 | 1984-03-06 | 日本電気株式会社 | field effect transistor |
-
1974
- 1974-06-07 JP JP49064004A patent/JPS5836500B2/en not_active Expired
Also Published As
| Publication number | Publication date |
|---|---|
| JPS50155973A (en) | 1975-12-16 |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| US3872583A (en) | LSI chip package and method | |
| JPH09162322A (en) | Surface mount semiconductor device and manufacturing method thereof | |
| JPH08172143A (en) | Printed wiring board and electronic device using the same | |
| US4115837A (en) | LSI Chip package and method | |
| JPS5836500B2 (en) | Manufacturing method of ceramic substrate for IC | |
| US3303265A (en) | Miniature semiconductor enclosure | |
| JP3631638B2 (en) | Mounting structure of semiconductor device package | |
| JPH05175407A (en) | Semiconductor mounting board | |
| JP2000252391A (en) | Semiconductor element mounting wiring board and its mounting structure | |
| JP3432552B2 (en) | Aluminum nitride multilayer substrate | |
| JPH09260540A (en) | Method of manufacturing package base for semiconductor | |
| JPS5815264A (en) | Multichip package | |
| JP4217151B2 (en) | Wiring board | |
| JP3117967B2 (en) | Multilayer ceramic substrate | |
| JP2004281470A (en) | Wiring board | |
| EP0646963A1 (en) | Multi-chip module and manufacturing method thereof | |
| JPH0964252A (en) | Semiconductor device | |
| JPH11233674A (en) | Manufacture of ceramics substrate | |
| JP2005210041A (en) | Wiring board | |
| JPS62249465A (en) | Semiconductor device | |
| JPS60180151A (en) | Substrate with bump and manufacture thereof | |
| JP6818457B2 (en) | Wiring boards, electronics and electronic modules | |
| JPH0590437A (en) | Composite substrate for heat dissipation | |
| JP2003068920A (en) | Wiring board | |
| JPS63111697A (en) | Wiring board and manufacture of the same |