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JPS5839230B2 - Control device for phosphate chemical treatment - Google Patents
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JPS5839230B2 - Control device for phosphate chemical treatment - Google Patents

Control device for phosphate chemical treatment

Info

Publication number
JPS5839230B2
JPS5839230B2 JP7016177A JP7016177A JPS5839230B2 JP S5839230 B2 JPS5839230 B2 JP S5839230B2 JP 7016177 A JP7016177 A JP 7016177A JP 7016177 A JP7016177 A JP 7016177A JP S5839230 B2 JPS5839230 B2 JP S5839230B2
Authority
JP
Japan
Prior art keywords
nitrite
ions
ion concentration
chemical conversion
treatment
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
JP7016177A
Other languages
Japanese (ja)
Other versions
JPS544252A (en
Inventor
興一 藤田
良一 村上
彰子 末吉
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Nippon Paint Co Ltd
Original Assignee
Nippon Paint Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Nippon Paint Co Ltd filed Critical Nippon Paint Co Ltd
Priority to JP7016177A priority Critical patent/JPS5839230B2/en
Publication of JPS544252A publication Critical patent/JPS544252A/en
Publication of JPS5839230B2 publication Critical patent/JPS5839230B2/en
Expired legal-status Critical Current

Links

Classifications

    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C22/00Chemical surface treatment of metallic material by reaction of the surface with a reactive liquid, leaving reaction products of surface material in the coating, e.g. conversion coatings, passivation of metals
    • C23C22/73Chemical surface treatment of metallic material by reaction of the surface with a reactive liquid, leaving reaction products of surface material in the coating, e.g. conversion coatings, passivation of metals characterised by the process
    • C23C22/77Controlling or regulating of the coating process

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  • Chemical & Material Sciences (AREA)
  • General Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Control Of Non-Electrical Variables (AREA)
  • Chemical Treatment Of Metals (AREA)

Description

【発明の詳細な説明】 本発明は金属のリン酸塩化成処理の制御装置に関する。[Detailed description of the invention] The present invention relates to a control device for metal phosphate chemical conversion treatment.

従来の金属のリン酸塩化成処理は、一般に脱脂→水洗→
水洗→皮膜化成→水洗→水洗から成る工程で行われてい
る。
Conventional phosphate chemical treatment of metals generally consists of degreasing → water washing →
The process consists of washing with water → film formation → washing with water → washing with water.

皮膜化成段階では、皮膜化成や処理液の持出しなどによ
る処理液成分の消費に応じて薬剤の補給を行い、処理液
の酸比、全酸度、亜鉛イオン濃度などを一定になるよう
に管理している。
At the film formation stage, chemicals are replenished according to the consumption of processing liquid components due to film formation and removal of the processing liquid, and the acid ratio, total acidity, zinc ion concentration, etc. of the processing liquid are controlled to be constant. There is.

′i!た、皮膜化成反応促進剤として通常、亜硝酸ナト
リウム水溶液を供給して、処理液中の亜硝酸イオン濃度
を一定にするように管理している。
'i! In addition, a sodium nitrite aqueous solution is usually supplied as a film formation reaction accelerator to control the nitrite ion concentration in the treatment liquid to be constant.

しかし、上述の管理方法にあっては、皮膜化成に不要な
ナトリウムイオンを処理液に加えていることになり、ま
た処理液中の亜硝酸イオンは酸化されて硝酸イオンに変
化することにより、処理液中の硝酸イオン濃度を増加さ
せることになる。
However, with the above management method, sodium ions that are unnecessary for film formation are added to the treatment solution, and nitrite ions in the treatment solution are oxidized and converted to nitrate ions. This will increase the nitrate ion concentration in the liquid.

ところで、現在一般に採用されているリン酸塩化成処理
ラインでは、上述の如く処理液の一部が持出しの形で次
の水洗工程に出て行くので、持出しによる消費に応じた
補給を行えば、処理液中にナトリウムイオン釦よび硝酸
イオンは必要以上に蓄積せず、処理液組成のイオン濃度
の均衡は維持される。
By the way, in the phosphate chemical treatment line generally employed at present, as mentioned above, a part of the treatment liquid goes out to the next washing process in the form of taking out, so if you replenish it according to the consumption by taking out, Sodium ions and nitrate ions are not accumulated in the processing solution more than necessary, and the ion concentration balance of the processing solution composition is maintained.

しかし、処理液の一部が持出しの形で次の水洗工程へ出
て行く量が少なくなり、補給する薬剤の組成が化成処理
ラインの条件に合わず一部の成分が蓄積増加する場合に
は、処理液組成のイオンの消費、供給の均衡がくずれる
However, if some of the treatment liquid is carried out and the amount going to the next washing process is reduced, and the composition of the replenishing chemicals does not match the conditions of the chemical conversion treatment line, some components may accumulate and increase. , the balance between consumption and supply of ions in the treatment liquid composition is disrupted.

例えば、ナトリウムイオンおよび硝酸イオンが異常に蓄
積すると、黄錆やスケ発生などの化成不良を来た十こと
がある。
For example, abnormal accumulation of sodium ions and nitrate ions can lead to formation defects such as yellow rust and scabbing.

特に、水洗工程で大量に発生する処理液を含む水洗水を
外部に排出することによる廃液処理の問題、および大量
の水洗水を使用することによる水資源保護の問題を解決
するものとして案出された特開昭48−69728号に
開示の化成処理装置にあっては、上記処理液にむける不
要イオンの蓄積が増大されて、処理液の早期更新が必要
となる。
In particular, it was devised to solve the problem of waste liquid treatment caused by discharging a large amount of washing water containing processing liquid generated in the washing process to the outside, and the problem of water resource protection caused by using a large amount of washing water. In the chemical conversion treatment apparatus disclosed in Japanese Unexamined Patent Publication No. 48-69728, the accumulation of unnecessary ions in the treatment liquid increases, making it necessary to renew the treatment liquid at an early stage.

そのために、皮膜化成反応促進剤として亜硝酸塩(例え
ば上記ナトリウム塩)を使用して生ずる問題を解決する
ものとして、亜硝酸イオンのみを処理液に補給する方法
が提案されている←特開昭51−24535号)。
To this end, a method has been proposed in which only nitrite ions are supplied to the treatment solution to solve the problems caused by using nitrite (e.g., the above-mentioned sodium salt) as a film formation reaction accelerator. -24535).

この方法は、処理液中の硝酸イオンの一部を陰イオン交
換法(陰イオン交換樹脂使用)で亜硝酸イオンに交換す
る方法であるが、交換樹脂の再生処理が必要であること
、そのための作業性が複雑化すること、再生処理に伴う
硝酸ナトリウムなどの廃棄処分が問題になるなどの別途
の問題点を有する。
This method involves exchanging some of the nitrate ions in the treatment solution to nitrite ions using an anion exchange method (using an anion exchange resin), but it requires regeneration of the exchange resin, and There are other problems, such as complicated workability and disposal of sodium nitrate and other substances associated with the regeneration process.

本発明の目的は、上記陰イオン交換法による亜硝酸イオ
ンの補給方法とは異なり、他の方法でもって処理液中の
亜硝酸イオン濃度を管理できるようにした制御装置を提
供することにある。
An object of the present invention is to provide a control device that is capable of managing the nitrite ion concentration in a treatment liquid using a method other than the above-mentioned anion exchange method for replenishing nitrite ions.

本発明で採用する亜硝酸イオンの補給方法とは先に出願
された特願昭51−49023号に開示の陰極電解還元
反応によって処理液中の硝酸イオンの一部を亜硝酸イオ
ンに還元する方法である。
The nitrite ion replenishment method adopted in the present invention is a method of reducing a portion of nitrate ions in the processing solution to nitrite ions by cathodic electrolytic reduction reaction disclosed in Japanese Patent Application No. 51-49023 previously filed. It is.

このように処理液(即ち、酸性リン酸塩皮膜化成処理液
)中で硝酸を還元すると、 NO3+ 3 H++ 2 e #HNO2+ H20
で示されるように亜硝酸の段階で還元が停止するという
ことは、従来の多くの研究が硝酸の還元によるヒドロキ
シアミンやアンモニアの生成に関するものであることか
らすれば、注目に値する。
When nitric acid is reduced in the treatment solution (i.e. acidic phosphate film chemical conversion treatment solution) in this way, NO3+ 3 H++ 2 e #HNO2+ H20
The fact that the reduction stops at the nitrous acid stage, as shown in , is noteworthy given that many previous studies have focused on the production of hydroxyamines and ammonia through the reduction of nitric acid.

本発明は、かかる陰極電解還元反応によって処理液に亜
硝酸イオンを補給する方法を基礎とし、これを更に発展
させて、処理液中の亜硝酸イオン濃度を酸化還元電位と
して取出しこれに基づいて処理液における亜硝酸イオン
濃度を管理できるようにした制御装置に係る。
The present invention is based on a method of replenishing nitrite ions to a treatment liquid by such a cathodic electrolytic reduction reaction, and further develops this method to extract the nitrite ion concentration in the treatment liquid as an oxidation-reduction potential and perform treatment based on this. This invention relates to a control device that can manage the concentration of nitrite ions in a liquid.

即ち、本発明の制御装置の特徴とする所は、皮膜化成反
応促進剤として亜硝酸イオンを含む酸性リン酸塩皮膜化
成処理液中の亜硝酸イオン濃度を酸化還元電位として測
定する手段、測定電位と基準電位とによる偏差信号を比
例制御する手段、および制御信号によって直流電流密度
を増減しその直流電流を上記処理液中の両極に供給する
手段を備えていて、電流密度に比例して処理液中の硝酸
イオンを亜硝酸イオンに還元しこれによって亜硝酸イオ
ン濃度を所定値に維持できるようにした点にある。
That is, the control device of the present invention is characterized by: a means for measuring the nitrite ion concentration in an acidic phosphate film chemical conversion treatment solution containing nitrite ions as a film formation reaction accelerator; and a reference potential, and a means for increasing or decreasing the DC current density according to the control signal and supplying the DC current to both poles in the processing solution. The nitrate ions contained therein are reduced to nitrite ions, thereby maintaining the nitrite ion concentration at a predetermined value.

次に添付図面を参照して本発明を具体的に説明する。Next, the present invention will be specifically described with reference to the accompanying drawings.

1は処理液を収容する化成槽であって、被処理物はこれ
に浸漬されるか昔たばこの処理液を吹付けられてリン酸
塩化成処理される。
Reference numeral 1 denotes a chemical conversion tank containing a treatment liquid, and the object to be treated is either immersed in this tank or sprayed with the tobacco treatment liquid to undergo phosphate conversion treatment.

ここに使用される酸性リン酸塩皮膜化成処理液の一例を
示すと、以下の組成から成るpH約3の水溶液が挙げら
れる。
An example of the acidic phosphate film chemical conversion treatment solution used here is an aqueous solution with a pH of about 3 and having the following composition.

亜鉛イオン 0.08 重量饅ナトリウムイ
オン 0.30 ttリン酸イオン 1
.00 tt硝酸イオン 0.50
tt亜硝酸イオン 0.008 tt上記の如
き処理液にあって、化成処理の面からすれば、亜硝酸イ
オン濃度は0.004〜0.02重量φの範囲が好適で
ある。
Zinc ion 0.08 Sodium ion 0.30 tt Phosphate ion 1
.. 00 tt Nitrate ion 0.50
tt Nitrite ion 0.008 tt In the treatment liquid as described above, from the viewpoint of chemical conversion treatment, the nitrite ion concentration is preferably in the range of 0.004 to 0.02 weight φ.

この亜硝酸イオン濃度が一般に上記範囲内の所定濃度以
下に低下したとき、本装置による管理の対象となる。
When this nitrite ion concentration generally falls below a predetermined concentration within the above-mentioned range, it becomes subject to management by this device.

その際、処理液の硝酸イオン濃度は通常、0.2重量多
以上であることが望オしい。
In this case, it is usually desirable that the nitrate ion concentration of the treatment liquid is 0.2 weight or more.

該濃度が低すぎると、亜硝酸イオンの生成効率が低下し
、装置的に不利となる。
If the concentration is too low, the production efficiency of nitrite ions will decrease, which will be disadvantageous in terms of equipment.

2は電解槽であって、ポンプ3および管4による循環路
によって化成槽1に接続されて釦り、化成槽1からの処
理液中の硝酸イオンの一部を亜硝酸イオンに還元し、こ
れを化成槽1に供給する。
Reference numeral 2 denotes an electrolytic cell, which is connected to the chemical conversion tank 1 through a circulation path by a pump 3 and a pipe 4, and which reduces part of the nitrate ions in the treatment liquid from the chemical conversion tank 1 to nitrite ions. is supplied to the chemical conversion tank 1.

電解層2で使用する陰極としては、陰極電解還元反応に
悪影響を及ぼす水素の発生が少ないかまたは実質的に発
生させない水素過電圧の大きい金属、例えば亜鉛、銅、
鉛、チタン、水銀、錫などから成るものが好適である。
As the cathode used in the electrolytic layer 2, metals with a high hydrogen overvoltage that generate little or substantially no hydrogen that adversely affects the cathode electrolytic reduction reaction, such as zinc, copper, etc.
Preferably, the material is made of lead, titanium, mercury, tin, or the like.

陽極としては、電解時溶解消耗し難い難溶性もしくは不
溶性の金属、例えば白金、白金メッキチタン、酸化貴金
属(チタンまたはタンタルにルテニウム、イリジウムな
どの貴金属の酸化物の薄膜を形成させたもの)、炭素、
二酸化鉛、四三酸化鉄、ステンレススチールなどから成
るものが好適である。
For the anode, use sparingly soluble or insoluble metals that are difficult to melt and consume during electrolysis, such as platinum, platinum-plated titanium, noble metal oxides (titanium or tantalum with a thin film of noble metal oxides such as ruthenium and iridium formed), and carbon. ,
Preferably, the material is made of lead dioxide, triiron tetroxide, stainless steel, or the like.

捷た、陽極として亜鉛電極を使用することができる。A twisted zinc electrode can be used as the anode.

上記電極に印加する電圧は通常3〜20Vである。The voltage applied to the electrodes is usually 3 to 20V.

また、電流密度は0.01〜30A/drn’である。Further, the current density is 0.01 to 30 A/drn'.

、この電流密度と電解による亜硝酸イオンの生成量との
関係を示すと、第2図に示す通りである。
The relationship between this current density and the amount of nitrite ions produced by electrolysis is shown in FIG. 2.

この図の縦軸の亜硝酸生成量ば、電解槽の流入口と流出
口における処理液中の当該酸の温度差である。
The amount of nitrous acid produced on the vertical axis in this figure is the temperature difference of the acid in the treatment liquid at the inlet and outlet of the electrolytic cell.

即ち、電流密度が零の場合、生成量も零である。That is, when the current density is zero, the amount of generation is also zero.

なお、図示の装置にあっては、電解層2を設けた例につ
いて述べているが、これを設けることなく、上記両電極
を化成槽1に浸漬、装置する構成を採用してもよい。
In the illustrated apparatus, an example is described in which the electrolytic layer 2 is provided, but a configuration may be adopted in which both the electrodes are immersed in the chemical conversion bath 1 without providing this.

5は化成槽1の処理液中の亜硝酸イオン濃度を酸化還元
電位として測定する手段であり、詳しくは以下の通りで
ある。
5 is a means for measuring the nitrite ion concentration in the treatment liquid in the chemical conversion tank 1 as an oxidation-reduction potential, and the details are as follows.

化成処理過程において、鉄筒たは鋼である被処理物が処
理液中に第1鉄イオンを溶出する。
In the chemical conversion treatment process, the object to be treated, which is an iron cylinder or steel, elutes ferrous ions into the treatment liquid.

この第1鉄イオンの濃度の増大は、被処理物に形成され
る被膜の品質を粗悪化するので、亜硝酸イオンによって
第2鉄イオンに酸化される。
This increase in the concentration of ferrous ions deteriorates the quality of the coating formed on the object to be treated, so that the ferrous ions are oxidized to ferric ions by nitrite ions.

従って、この第1鉄イオンは、白金電極と比較電極で構
成される一対の電極によって酸化還元電位として測定さ
れる。
Therefore, this ferrous ion is measured as a redox potential by a pair of electrodes consisting of a platinum electrode and a reference electrode.

このように第1鉄イオンの溶出が酸化還元電位に対応し
て測定されることは、即ち、亜硝酸イオンの消費に対応
することになる。
The fact that the elution of ferrous ions is measured in response to the redox potential in this way corresponds to the consumption of nitrite ions.

具体的には、特公昭42−10051号公報「酸性リン
酸塩被覆浴液における亜硝酸塩付加の自動制御方法」に
開示されている。
Specifically, this method is disclosed in Japanese Patent Publication No. 10051/1983 entitled "Automatic Control Method for Addition of Nitrite in Acidic Phosphate Coating Bath Liquid".

他の測定手段としては、処理液を別系路で連続的に採取
し、これに一定量のセリウム塩溶液を加えて攪拌し、白
金/比較電極を取付けたチューブに連続送液して酸化還
元電位を測定するものでもよく、また周期的に処理液を
サンプリングして数滴の希硫酸を添加し、過マンガン酸
カリウムで滴定して、その滴定終点を酸化還元電位で検
出する自動滴定装置によってもよい。
Another measurement method is to continuously collect the treated solution through a separate line, add a certain amount of cerium salt solution to it, stir it, and continuously send the solution to a tube equipped with a platinum/comparison electrode to reduce the oxidation. An automatic titration device that measures the potential may be used, or an automatic titration device that periodically samples the treated solution, adds a few drops of dilute sulfuric acid, titrates it with potassium permanganate, and detects the end point of the titration using the redox potential. Good too.

6は上記手段5からの出力信号を増幅する手段であって
、次の測定電位と基準電位とによって偏差信号を出す電
子式比例制御子鹿7が必要とする入力信号レベル(即ち
、4〜20mADC,1〜5VDCなど)に増幅する。
Reference numeral 6 denotes means for amplifying the output signal from the means 5, which amplifies the input signal level required by the electronic proportional control fawn 7 (i.e., 4 to 20 mADC, 1 to 5 VDC, etc.).

上記手段7は、手段6の出力信号と、当該手段7に内蔵
する基準電位の発生手段8の出力信号のそれぞれを入力
信号として比較演算し、制御信号を出力として取り出せ
る増幅手段9を備え、さらに調節感度を変更できる比例
動作機能を有する。
The means 7 includes an amplifying means 9 capable of performing a comparison operation using the output signal of the means 6 and the output signal of the reference potential generation means 8 built in the means 7 as input signals, and extracting a control signal as an output, and further It has a proportional action function that allows you to change the adjustment sensitivity.

例えば、自動制御機器便覧(オーム社発行)第■99〜
102頁に開示された調節機能を有するもので、制御信
号レベルは4〜20mADctたは1〜5VDCである
For example, Automatic Control Equipment Handbook (published by Ohmsha) No. 99~
It has the adjustment function disclosed on page 102, and the control signal level is 4-20 mADct or 1-5 VDC.

この手段7に内蔵する手段8は、均一で良好な皮膜が形
成される処理液の酸化還元電位を供給するもので、直流
電位差計回路または基準電圧設定用精密可変抵抗器で構
成されている。
The means 8 built into the means 7 supplies the oxidation-reduction potential of the processing solution to form a uniform and good film, and is composed of a DC potentiometer circuit or a precision variable resistor for setting a reference voltage.

出力信号の設定は、あらかじめ定めた亜硝酸イオン濃度
にセットする。
The output signal is set to a predetermined nitrite ion concentration.

もし、上記濃度設定値が未知の場合は、処理液を別途用
意し、その処理液内に上記手段5を浸漬して供給するよ
うにしてもよい。
If the concentration setting value is unknown, a processing liquid may be separately prepared and the means 5 may be immersed in the processing liquid and supplied.

上記手段7の制御信号が導入される手段10ば、電解に
よって処理液に必要な亜硝酸イオンを生成するため、電
解槽2へ直流電流を供給する手段である。
The means 10 into which the control signal of the means 7 is introduced is a means for supplying direct current to the electrolytic cell 2 in order to generate nitrite ions necessary for the treatment liquid by electrolysis.

供給する直流の電流密度は、電流調整部11が上記手段
7の制御信号によって自動的に増減させ、上述の範囲内
において電解槽2へ供給する。
The current density of the supplied direct current is automatically increased or decreased by the current adjustment section 11 according to the control signal of the means 7, and is supplied to the electrolytic cell 2 within the above-mentioned range.

この手段11の動作は、例えば日本電池■発行「サイリ
スタを使用する部品について」小冊子43−6 (30
H)TAI版に開示された機能を果すものを採用できる
The operation of this means 11 can be explained, for example, in the booklet 43-6 "About parts using thyristors" published by Nippon Battery ■ (30
H) Those that perform the functions disclosed in the TAI version can be adopted.

筐た、手段10ば、商用周波数(504たば60ヘルツ
)を有する交流電力の供給を受け、かつ上述の必要な電
圧に変更し、さらに直流を得るための半導体整流素子群
で構成した整流器12を内蔵する。
A rectifier 12 is constructed of a group of semiconductor rectifying elements for receiving alternating current power having a commercial frequency (504 to 60 hertz), changing the voltage to the above-mentioned required voltage, and further obtaining direct current. Built-in.

い1被処理物を化成槽1の処理液に浸漬または処理液を
被処理物に吹付け、回収して、処理液中の亜硝酸イオン
濃度が低下すると、これを手段5が検出し、その測定信
号は手段6で増幅されて手段7へ伝えられる。
1 When the object to be treated is immersed in the treatment liquid in the chemical conversion tank 1 or the treatment liquid is sprayed onto the object and recovered, and the nitrite ion concentration in the treatment liquid decreases, the means 5 detects this and The measurement signal is amplified by means 6 and transmitted to means 7.

そのとき、手段7に釦いて、基準電位の信号との間に正
または負のいずれかの偏差信号が生じ、当該手段7の出
力信号も増減した信号、即ち、測定信号と比例した制御
信号が得られる。
At that time, when the means 7 is pressed, either a positive or negative deviation signal is generated between the reference potential signal and the output signal of the means 7 is also increased or decreased, that is, a control signal proportional to the measurement signal is generated. can get.

ここでその制御信号量と電流密度の関係を説明すると、
制御信号が増加すると、電流密度も同じく増加する。
To explain the relationship between the control signal amount and current density,
As the control signal increases, the current density also increases.

即ち、上記制御信号レベルが20mADcに達すると、
手段10において電解槽2へ亜硝酸イオン生成電流効率
からみた最大電流密度(具体的には8A/dm2)を供
給し、亜硝酸イオン生成量の増加をうながし、化成槽1
における濃度を所定値に引き戻す。
That is, when the control signal level reaches 20 mADc,
In the means 10, the maximum current density (specifically, 8 A/dm2) in terms of nitrite ion production current efficiency is supplied to the electrolytic cell 2 to promote an increase in the amount of nitrite ion produced, and the chemical conversion tank 1
The concentration at is returned to a predetermined value.

次に、化成槽1の亜硝酸イオン濃度が所定値に達すると
、制御信号が低下し、電流密度も同じく低下する。
Next, when the nitrite ion concentration in the chemical conversion tank 1 reaches a predetermined value, the control signal decreases, and the current density also decreases.

従って、電解槽2にかける亜硝酸イオンの生成量も減少
し、化成槽1へ過剰供給せぬよう動作する。
Therefore, the amount of nitrite ions produced to be applied to the electrolytic tank 2 is also reduced, and the system operates to prevent excessive supply to the chemical conversion tank 1.

一方、化成処理が停止されて、処理液の亜硝酸イオンの
消費が少なくなり、その濃度が所定値以上になると、こ
れに対応して制御信号は小さくなり、手段10の電流密
度も最小となり、亜硝酸イオンの生成量も僅少となる。
On the other hand, when the chemical conversion treatment is stopped and the consumption of nitrite ions in the treatment liquid decreases, and the concentration thereof reaches a predetermined value or more, the control signal correspondingly decreases and the current density of the means 10 also becomes minimum, The amount of nitrite ions produced is also small.

このような調節動作が繰返されて、処理液中の亜硝酸イ
オン濃度は略々一定に維持される。
By repeating such adjustment operations, the nitrite ion concentration in the treatment liquid is maintained approximately constant.

以上の説明で明らかなように、本発明によれば、化成槽
内の亜硝酸イオン濃度を酸化還元電位として測定する手
段を設けたので、所定濃度に相当する酸化還元電位値か
ら差異が生じたことによって、電解槽へ供給する電流密
度を設定でき、自動的に処理液中の亜硝酸イオン濃度を
所定濃度(o、oos±0.0008重量饅)に維持す
ることができる。
As is clear from the above explanation, according to the present invention, a means for measuring the nitrite ion concentration in the chemical conversion tank as a redox potential is provided, so that a difference occurs from the redox potential value corresponding to a predetermined concentration. By doing so, the current density supplied to the electrolytic cell can be set, and the nitrite ion concentration in the treatment liquid can be automatically maintained at a predetermined concentration (o, oos±0.0008 weight cup).

【図面の簡単な説明】[Brief explanation of the drawing]

第1図は本発明装置の一例を示すブロック図、第2図は
亜硝酸イオン生成量と電流密度の関係を示すグラフであ
って、1は化成槽、2は電解槽、5は酸化還元電位測定
手段、7は電子式比例制御手段、8は基準電位供給手段
、10は直流電流調節供給手段を示す。
FIG. 1 is a block diagram showing an example of the apparatus of the present invention, and FIG. 2 is a graph showing the relationship between the amount of nitrite ion produced and current density, where 1 is a chemical conversion tank, 2 is an electrolytic tank, and 5 is a redox potential. 7 is a measuring means, 7 is an electronic proportional control means, 8 is a reference potential supply means, and 10 is a direct current adjustment supply means.

Claims (1)

【特許請求の範囲】[Claims] 1 皮膜化成反応促進剤として亜硝酸イオンを含む酸性
リン酸塩皮膜化成処理液中の亜硝酸イオン濃度を酸化還
元電位として測定する手段、測定電位と基準電位とによ
る偏差信号を比例制御する手段、および制御信号によっ
て直流電流密度を増減しその直流電流を上記処理液中の
両極に供給する手段を備えていて、電流密度に比例して
処理液中の硝酸イオンを亜硝酸イオンに還元しこれによ
って亜硝酸イオン濃度を所定値に維持できるようにした
ことを特徴とするリン酸塩化成処理の制御装置。
1. Means for measuring the nitrite ion concentration in an acidic phosphate film chemical conversion treatment solution containing nitrite ions as a film formation reaction accelerator, as a redox potential, means for proportionally controlling a deviation signal between the measured potential and a reference potential; and a means for increasing or decreasing the DC current density according to a control signal and supplying the DC current to both poles in the processing liquid, reducing nitrate ions in the processing liquid to nitrite ions in proportion to the current density, thereby A control device for phosphate chemical treatment, characterized in that the nitrite ion concentration can be maintained at a predetermined value.
JP7016177A 1977-06-13 1977-06-13 Control device for phosphate chemical treatment Expired JPS5839230B2 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP7016177A JPS5839230B2 (en) 1977-06-13 1977-06-13 Control device for phosphate chemical treatment

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP7016177A JPS5839230B2 (en) 1977-06-13 1977-06-13 Control device for phosphate chemical treatment

Publications (2)

Publication Number Publication Date
JPS544252A JPS544252A (en) 1979-01-12
JPS5839230B2 true JPS5839230B2 (en) 1983-08-29

Family

ID=13423550

Family Applications (1)

Application Number Title Priority Date Filing Date
JP7016177A Expired JPS5839230B2 (en) 1977-06-13 1977-06-13 Control device for phosphate chemical treatment

Country Status (1)

Country Link
JP (1) JPS5839230B2 (en)

Also Published As

Publication number Publication date
JPS544252A (en) 1979-01-12

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