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JPS5844017B2 - Gas-liquid contact nozzle used to treat settling slurry - Google Patents
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JPS5844017B2 - Gas-liquid contact nozzle used to treat settling slurry - Google Patents

Gas-liquid contact nozzle used to treat settling slurry

Info

Publication number
JPS5844017B2
JPS5844017B2 JP52124040A JP12404077A JPS5844017B2 JP S5844017 B2 JPS5844017 B2 JP S5844017B2 JP 52124040 A JP52124040 A JP 52124040A JP 12404077 A JP12404077 A JP 12404077A JP S5844017 B2 JPS5844017 B2 JP S5844017B2
Authority
JP
Japan
Prior art keywords
gas
liquid
nozzle
slurry
liquid contact
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
JP52124040A
Other languages
Japanese (ja)
Other versions
JPS5457469A (en
Inventor
一茂 西
富安 野原
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Mitsubishi Heavy Industries Ltd
Original Assignee
Mitsubishi Heavy Industries Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Mitsubishi Heavy Industries Ltd filed Critical Mitsubishi Heavy Industries Ltd
Priority to JP52124040A priority Critical patent/JPS5844017B2/en
Publication of JPS5457469A publication Critical patent/JPS5457469A/en
Publication of JPS5844017B2 publication Critical patent/JPS5844017B2/en
Expired legal-status Critical Current

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  • Physical Or Chemical Processes And Apparatus (AREA)
  • Compounds Of Alkaline-Earth Elements, Aluminum Or Rare-Earth Metals (AREA)
  • Treating Waste Gases (AREA)
  • Gas Separation By Absorption (AREA)
  • Vaporization, Distillation, Condensation, Sublimation, And Cold Traps (AREA)

Description

【発明の詳細な説明】 本発明は沈降性スラリの気液接触処理に適したノズルに
関する。
DETAILED DESCRIPTION OF THE INVENTION The present invention relates to a nozzle suitable for gas-liquid contact treatment of settling slurries.

従来の気液接触の際の装置の概略を第1,2図を用いて
説明すると、液体供給管3から処理液体が供給され、一
方、気体供給管5から気体が圧送される。
An outline of a conventional apparatus for gas-liquid contact will be explained using FIGS. 1 and 2. A processing liquid is supplied from a liquid supply pipe 3, and a gas is pressure-fed from a gas supply pipe 5.

このとき、気体噴出孔4より気液ノズル2内に供給され
た気体は高流速液体により連続的に剪断されながら両者
は合流し、激しい流動状態の気液混和流となる。
At this time, the gas supplied into the gas-liquid nozzle 2 from the gas jet hole 4 is continuously sheared by the high-velocity liquid, and the two merge to form a gas-liquid mixed flow in a vigorously flowing state.

気液混相流は気液ノズル2から気泡塔1内に吹込まれ、
気泡塔1内で気液の激しい混合攪拌作用により気液接触
を促進し、気液間の反応を進行させるものである。
The gas-liquid multiphase flow is blown into the bubble column 1 from the gas-liquid nozzle 2,
Vigorous mixing and stirring of gas and liquid within the bubble column 1 promotes gas-liquid contact and advances the reaction between gas and liquid.

このような従来装置では、処理液体が沈降性スラリの場
合、気泡塔1の底部、即ちA部付近の攪拌効果が不十分
でスラリ粒子の沈降堆積カS生じ、気体供給管5または
気体供給室6のB部位に気体噴出孔4より流入した沈降
性スラリ粒子の沈降堆積が生じる。
In such a conventional device, when the liquid to be treated is a sedimentary slurry, the stirring effect near the bottom of the bubble column 1, that is, the area A, is insufficient and sedimentation of slurry particles S occurs, causing the gas supply pipe 5 or the gas supply chamber to The sedimentary slurry particles that flowed in from the gas jet holes 4 are deposited in the B portion of 6.

更には気体噴出孔4がスラリ粒子等の付着生成及び沈降
堆積等により閉塞が生じるという欠点を有する。
Furthermore, there is a drawback that the gas ejection holes 4 become clogged due to adhesion and sedimentation of slurry particles and the like.

そこで本発明者等は上記のような欠点のない沈降性スラ
リの気液接触処理用ノズルを提供すべく研究を重ねた結
果、ノズルの気体噴出孔を複数個とし、気体供給室部に
沈降堆積粒子除去用の洗浄水供給管とドレン抜孔を設け
、更にこの気液ノズルの軸線50〜100’の傾きをな
して気液混合スラリ噴射孔を複数個設けた気液ノズルが
上記の目的に適うことを見出して本発明に到達したもの
である。
Therefore, the inventors of the present invention have conducted repeated research to provide a nozzle for gas-liquid contact treatment of sedimentary slurry that does not have the above-mentioned drawbacks, and as a result, the nozzle has a plurality of gas ejection holes, which prevents sedimentation and accumulation in the gas supply chamber. A gas-liquid nozzle that is provided with a cleaning water supply pipe for removing particles and a drain hole, and further provided with a plurality of gas-liquid mixed slurry injection holes with an inclination of 50 to 100' on the axis of the gas-liquid nozzle is suitable for the above purpose. The present invention was achieved by discovering this.

第3,4図を用いて本発明を更に詳しく説明する。The present invention will be explained in more detail using FIGS. 3 and 4.

気液ノズル2の気体供給室6内部には複数個の気体噴出
孔4aが設けられ、該ノズル2の上部はノズルヘッド7
に、下部は液体供給管3に接続されている。
A plurality of gas ejection holes 4a are provided inside the gas supply chamber 6 of the gas-liquid nozzle 2, and the upper part of the nozzle 2 is connected to a nozzle head 7.
The lower part is connected to the liquid supply pipe 3.

気体供給室6には気体供給管5の外に洗浄水供給管9お
よびその底部付近に複数個のドレン抜孔10が設けられ
ている。
The gas supply chamber 6 is provided with a cleaning water supply pipe 9 in addition to the gas supply pipe 5 and a plurality of drain holes 10 near the bottom thereof.

気液ノズル2の上部にノズルヘッド7が装着され、該ノ
ズルヘッド7は複数個の気液混合スラリ噴射孔8を有し
、その軸線C−C’は気液ノズル2の軸線b −b’と
50〜100’ の傾きαをなしている。
A nozzle head 7 is attached to the upper part of the gas-liquid nozzle 2, and the nozzle head 7 has a plurality of gas-liquid mixed slurry injection holes 8, and its axis C-C' is the axis b-b' of the gas-liquid nozzle 2. and has an inclination α of 50 to 100'.

石灰を使用した湿式排煙脱硫装置の気泡塔を例にとって
、第3〜5図を用いて本発明の作用を述べる。
Taking a bubble column of a wet flue gas desulfurization apparatus using lime as an example, the operation of the present invention will be described using FIGS. 3 to 5.

第5図において、図示されていない吸収塔よりCaSO
3スラリがライン11を経て気泡塔1内に供給され、オ
ーバーフロー管12より流出した該スラリはスラリポン
プ13により液体供給管3を介して高流速状態で気液ノ
ズル2内に供給される。
In FIG. 5, CaSO
3 slurry is supplied into the bubble column 1 through a line 11, and the slurry flowing out from an overflow pipe 12 is supplied by a slurry pump 13 through a liquid supply pipe 3 into a gas-liquid nozzle 2 at a high flow rate.

他方、コンプレッサ14により気体供給管5、気体供給
室6、気体噴出孔群4aを介して気液ノズル2内に供給
された高圧空気は、前記のCaSO3スラリの高流速に
より剪断攪拌され、微細気泡となって気液混和流が形成
される。
On the other hand, the high-pressure air supplied into the gas-liquid nozzle 2 by the compressor 14 through the gas supply pipe 5, gas supply chamber 6, and gas jet hole group 4a is sheared and agitated by the high flow rate of the CaSO3 slurry, resulting in fine bubbles. As a result, a gas-liquid mixed flow is formed.

気液混相流はノズルヘッド7の気液混合スラリ噴射孔群
8より気泡塔1内に噴出されるが、同塔内での微細気泡
とCa S Oaスラリの激しい混合攪拌による気液接
触作用のため気液間の反応が促進されCaSO3スラリ
が順次CaSO4スラリに変化するが、Ca S 04
は沈降性を有する微粒子であるため、同塔内では気体−
液体一固体の三相混相状態で気液間の反応が促進される
ことになる。
The gas-liquid multiphase flow is injected into the bubble column 1 from the gas-liquid mixed slurry injection hole group 8 of the nozzle head 7, but due to the gas-liquid contact effect due to vigorous mixing and stirring of fine bubbles and CaS Oa slurry in the column. Therefore, the reaction between gas and liquid is promoted and CaSO3 slurry gradually changes to CaSO4 slurry, but CaSO4
Since these are fine particles that have sedimentation properties, gas-
The reaction between gas and liquid is promoted in a three-phase mixed phase state of liquid and solid.

CaSO4スラリは沈降性を有するため、気泡塔1の空
気空塔速度が小さかったり、塔下部の流動攪拌状態が不
十分であればCa S O4粒子が塔下部に沈降堆積す
るが、本発明による気液接触ノズルによれば、気液混相
流噴射孔8が同ノズルの軸線と50〜100’の傾きを
なしているため塔下部の流動攪拌が充分に行なわれるの
で、空気空塔速度を沈降粒子に見合った適切な値に選べ
ば、 Ca S 04沈降性粒子の沈降堆積を防止でき
気液反応性の低下を防止できる。
Since the CaSO4 slurry has sedimentation properties, if the air superficial velocity of the bubble column 1 is low or the fluidized stirring state at the bottom of the column is insufficient, CaSO4 particles will settle and accumulate at the bottom of the column. According to the liquid contact nozzle, the gas-liquid multiphase flow injection hole 8 is inclined at an angle of 50 to 100' with respect to the axis of the nozzle, so that sufficient fluid agitation is performed at the bottom of the column, so that the superficial velocity of the air is adjusted to the settling particles. By selecting an appropriate value commensurate with the above, it is possible to prevent sedimentation and accumulation of Ca S 04 precipitable particles and to prevent a decrease in gas-liquid reactivity.

このような状態では気泡塔1のオーバーフロー管12よ
り流出するスラリ中にもCa5O,スラリか含まれるた
め、スラリポンプ13により循環するスラリの一部が気
体噴出孔4を介して気体供給室6及び気体供給管等に流
入し、CaSO4粒子が次第に沈降堆積してこれを解決
する手段のない従来装置においては、気液反応性能が低
下する。
In such a state, the slurry flowing out from the overflow pipe 12 of the bubble column 1 also contains Ca5O and slurry, so a part of the slurry circulated by the slurry pump 13 passes through the gas injection hole 4 to the gas supply chamber 6 and The CaSO4 particles flow into the gas supply pipe, etc., and gradually settle and accumulate, resulting in a decrease in gas-liquid reaction performance in conventional devices that have no means to solve this problem.

他方、本発明の気液接触用ノズルによれば、CaSO4
粒子の沈降堆積による気液反応性能の低下が認められた
場合、第4図に示す如くドレン抜孔10を開いて洗浄水
ポンプ15により洗浄水供給管9を介して洗浄水を供給
して容易に気体供給室6内の沈降堆積粒子を除去でき、
気液反応性能の回復をはかることができる。
On the other hand, according to the gas-liquid contact nozzle of the present invention, CaSO4
If a drop in gas-liquid reaction performance is observed due to sedimentation of particles, the drain hole 10 can be opened as shown in FIG. It is possible to remove sedimentary particles in the gas supply chamber 6,
It is possible to recover gas-liquid reaction performance.

また本発明の気液接触用ノズルによれば気体噴出孔4a
が複数個設けられているため沈降性粒子等の付着堆積に
よる目詰りからくる性能低下を来し難く、従来のノズル
に比べ長時間にわたり高性能が維持される。
Further, according to the gas-liquid contact nozzle of the present invention, the gas jet hole 4a
Since a plurality of nozzles are provided, performance deterioration due to clogging due to adhesion and accumulation of sedimentary particles is less likely to occur, and high performance is maintained for a longer period of time than conventional nozzles.

本発明で奏せられる効果を挙げると次のようである。The effects achieved by the present invention are as follows.

■、複数個の噴射孔を、その軸線が気液ノズルの軸線と
50〜100°となるように設けたことにより、気液混
合ジェットが円周方向に均等に噴射されると共に、噴射
ジェットカ気泡塔壁に当って反射拡散することにより塔
底部においても気液の攪拌混合が充分に行なわれ、塔底
部におけるスラリ粒子の沈降防止および気液反応が効率
よく行なわれる。
By providing multiple injection holes so that their axes are at an angle of 50 to 100 degrees with the axis of the gas-liquid nozzle, the gas-liquid mixed jet is ejected evenly in the circumferential direction, and the ejected jet causes bubbles. By reflecting and diffusing against the column wall, stirring and mixing of gas and liquid is sufficiently performed at the bottom of the column, and prevention of sedimentation of slurry particles at the bottom of the column and gas-liquid reaction are efficiently carried out.

なお、上記噴射孔の軸線の角度が50°以下では気液混
合ジェットが主に上方に向けて噴射されるため、塔底部
における攪拌効果が小さくスラリ粒子の沈降が生じ易い
Note that when the angle of the axis of the injection hole is 50° or less, the gas-liquid mixing jet is mainly injected upward, so that the stirring effect at the bottom of the column is small and sedimentation of slurry particles is likely to occur.

また噴射孔位置を搭底部付近に設けることにより100
°程度で充分に塔底部の攪拌効果カ3得られるため、こ
れ以上は必要でない。
In addition, by placing the injection hole near the bottom of the tower,
A stirring effect of about 3° at the bottom of the column can be sufficiently obtained, so no more than this is necessary.

2、処理液体が沈降性スラリであっても複数個の気液混
合スラリ噴射孔をノズルの軸線と傾斜して設けることに
より、気泡塔1内の粒子の沈降を防止できる。
2. Even if the processing liquid is a sedimentary slurry, by providing a plurality of gas-liquid mixed slurry injection holes at an angle to the axis of the nozzle, particles in the bubble column 1 can be prevented from settling.

3、気体噴出孔4aを複数個設けることにより、沈降性
粒子等の付着堆積等による同噴出孔の目詰りによる性能
低下を生じにくい。
3. By providing a plurality of gas ejection holes 4a, performance deterioration due to clogging of the ejection holes due to adhesion and accumulation of sedimentary particles, etc., is less likely to occur.

4、空気供給室6に洗浄水供給管9とドレイン抜孔10
を設けることにより同空気供給室に沈降堆積した粒子を
容易に洗浄除去でき、常に良好な気液反応を維持できる
4. Cleaning water supply pipe 9 and drain hole 10 in air supply chamber 6
By providing this, particles that have settled and accumulated in the air supply chamber can be easily washed away, and a good gas-liquid reaction can be maintained at all times.

以上のように本発明による気液接触用ノズルを用いるこ
とにより、従来、困難であった沈降性粒子を含む固−液
二相流体の処理を行なうことができる。
As described above, by using the gas-liquid contact nozzle according to the present invention, it is possible to treat a solid-liquid two-phase fluid containing sedimentary particles, which has conventionally been difficult.

本発明のノズルは排脱装置の酸化塔、各種廃水処理の曝
気槽等、沈降性粒子を含む気−液、液−液接触装置に適
用できる。
The nozzle of the present invention can be applied to gas-liquid and liquid-liquid contact devices containing sedimentary particles, such as oxidation towers in evacuation equipment and aeration tanks in various wastewater treatments.

【図面の簡単な説明】[Brief explanation of the drawing]

第1図、第2図は気泡塔における従来の気液接触処理用
ノズル概念図であり、第3図は本発明の沈降性スラリの
気液接触処理用ノズル概念図であり、第4図は第3図の
IV−IV線矢祝方向断面概念図であり、第5図は方発
明の気液接触用ノズルの操作状況説明図である。
FIGS. 1 and 2 are conceptual diagrams of a conventional gas-liquid contact treatment nozzle in a bubble column, FIG. 3 is a conceptual diagram of a nozzle for gas-liquid contact treatment of sedimentary slurry of the present invention, and FIG. It is a conceptual cross-sectional view taken along the line IV--IV in FIG. 3, and FIG. 5 is an explanatory diagram of the operation state of the gas-liquid contact nozzle of the invention.

Claims (1)

【特許請求の範囲】[Claims] 1 下方から被処理液体を、側方から気体を、各各別々
に且つ強制的に気液ノズル内に供給して気液混合流とな
し、これを気液ノズルの上方から気泡塔内に吹込み供給
し、塔内で微細気泡と被処理液体とを接触させて処理す
る気液ノズルにおいて、同ノズルの気体噴出孔を複数個
となL1気体供給室部に沈降堆積粒子除去用の洗浄水供
給管とドレン抜孔を設け、複数個の気液混合スラリ噴射
孔を上記気液ノズルの軸線と50〜100’の傾きをな
して設けたことを特徴とする、沈降性スラリの処理に用
いる気液接触ノズル。
1. The liquid to be treated is supplied from below and the gas from the side, each separately and forcibly fed into the gas-liquid nozzle to form a gas-liquid mixed flow, which is then blown into the bubble column from above the gas-liquid nozzle. In a gas-liquid nozzle that processes fine bubbles and the liquid to be treated by contacting them in the column, the nozzle has multiple gas ejection holes, and the L1 gas supply chamber has cleaning water for removing settled particles. A gas used for treating sedimentary slurry, characterized in that a supply pipe and a drain hole are provided, and a plurality of gas-liquid mixed slurry injection holes are provided at an inclination of 50 to 100' with respect to the axis of the gas-liquid nozzle. Liquid contact nozzle.
JP52124040A 1977-10-18 1977-10-18 Gas-liquid contact nozzle used to treat settling slurry Expired JPS5844017B2 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP52124040A JPS5844017B2 (en) 1977-10-18 1977-10-18 Gas-liquid contact nozzle used to treat settling slurry

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP52124040A JPS5844017B2 (en) 1977-10-18 1977-10-18 Gas-liquid contact nozzle used to treat settling slurry

Publications (2)

Publication Number Publication Date
JPS5457469A JPS5457469A (en) 1979-05-09
JPS5844017B2 true JPS5844017B2 (en) 1983-09-30

Family

ID=14875519

Family Applications (1)

Application Number Title Priority Date Filing Date
JP52124040A Expired JPS5844017B2 (en) 1977-10-18 1977-10-18 Gas-liquid contact nozzle used to treat settling slurry

Country Status (1)

Country Link
JP (1) JPS5844017B2 (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US11570855B2 (en) 2017-01-12 2023-01-31 Lg Electronics Inc. Induction heat cooking apparatus

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
PL2596859T3 (en) * 2010-07-21 2020-04-30 Otkrytoe Aktsionernoe Obschestvo Research & Design Institute Of Urea And Organic Synthesis Products (Oao Niik) Gas-liquid reactors with vortex mixing chamber

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US11570855B2 (en) 2017-01-12 2023-01-31 Lg Electronics Inc. Induction heat cooking apparatus

Also Published As

Publication number Publication date
JPS5457469A (en) 1979-05-09

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