JPS5845508B2 - New stencil, its manufacturing method, and thick textile printing method using it - Google Patents

Description

DETAILED DESCRIPTION OF THE INVENTION The present invention relates to a new thick stencil that replaces conventional thick textile printing patterns, a method for producing the same, and a thick textile printing method using the same.

Thick printing is widely used for high-end clothing, washi paper, etc. due to its ability to produce deep colors.

Conventionally, stencils have been used for this type of thick textile printing, which are patterns cut out from thick paper and pasted with gauze.

The manufacturing method involves the following steps: creating the original drawing, copying it onto thick paper, cutting out the drawing area, and pasting on the gauze.

However, all of these processes are manual, and the process of cutting out the image area in particular requires special skills and takes a long time, which poses a problem.

One possible solution to this problem is to use a screen used for screen printing, but this printing screen generally has a resin layer thickness of 10 μm in the mask area (non-image area).
It is thinner than the mesh layer and cannot be used for thick textile printing.

As a result of intensive studies to solve this problem, the present inventors have discovered a new stencil that can be used for thick textile printing, in which the resin layer of the mask part is thickened, and a method for manufacturing the same.

That is, the main points of the present invention are as follows.

- A new stencil characterized by having a structure in which a mesh is interposed as a support in a photocurable resin having a cutout pattern and a thickness of 50 μm or more and 5 mm or less.

■ A cutout pattern is created by interposing a mesh in a liquid photocurable resin layer with a thickness of 50μ or more and 5N or less, irradiating the mesh with actinic rays through a photomask, and then removing the uncured part. A method for producing a novel stencil, characterized in that it has a structure in which a mesh is interposed as a support in a photocurable resin having a thickness of 50μ or more and 5mm or less.

(2) A thick textile printing method characterized by using a stencil having a structure in which a mesh is interposed as a support in a photocurable resin having a cutout pattern and a thickness of 50 μm or more and 5 μm or less.

The stencil of the present invention is novel in that it has a thickness of 50 μm or more and 5 μm or less, and that a mesh is interposed therein, which is different from conventional printing screens.

The thickness varies depending on the necessary printing conditions and the minimum wire diameter of the image area, but it is in the range of 50 to 5, preferably 80 to 1.
Select in the range between.

When the thickness exceeds 5 mm, it takes a long time to cure the resin by irradiating light, which causes a problem in that the punched pattern becomes "broken".

Further, if the thickness is less than 50 μm, thick printing cannot be performed and it is inappropriate.

If used within the above range, a practically useful stencil can be obtained without such problems.

The stencil of the present invention has a mesh interposed therein as shown by O.

In this case, interposition is a state in which the fibers of the mesh are completely embedded in the photocurable resin layer.

The mesh used may be one used for screen printing, and its material may include silk, nylon, polyester, stainless steel, etc.

The effective thickness used is equal to or less than the thickness of the photocurable resin layer.

The effective thickness referred to here is the thickness measured with a thickness meter having a measuring part diameter of 5 mm or more.

Further, the opening of the mesh is generally 20 to 1,000 microns, but if there is an island-like portion of the mask resin, it is preferable to select it so that it does not fall off.

As described above, the stencil of the present invention satisfies the conditions (1) and (@), and the mask portion is made of a photocurable resin.

The photocurable resin referred to herein is a solid or liquid photocurable resin that is cured by irradiation with actinic light.

Since the photocurable resin used in the present invention is used as a printing mold, it is required to have flexibility, dimensional stability, water resistance, adhesive resistance, etc.

Therefore, it is necessary to select a photocurable resin that provides such performance.

Next, an example of a useful manufacturing method for actually producing the stencil described above will be shown, but of course the present invention is not limited to this example.

In the following example, a stencil is produced using a liquid photocurable resin composition in the following three steps.

That is, the steps are (1) disposing a liquid photocurable resin layer with a thickness of 50μ or more and 5N or less with a mesh interposed therein, and (n) passing a photomask through the resin laminate made in (1). Step of irradiating actinic rays, (1
) This is a step of removing the uncured portion.

As the liquid photocurable resin composition, an unsaturated polyester type, an unsaturated polyurethane type, etc. can be used, but as a resin that provides a photocurable resin with the performance described above, is odorless, nontoxic, and has good workability, an acid component is particularly preferred. (4)-00C-CH-C as part
H-C0- and (B)-00C-C6H4-CO with O≦
Contains within the range of (B)/(A)≦1 (molar ratio), and +0CH2CH2+n (n=2
, 34 tobacco 4) alone or as a mixture, with an acid value of 15 to
80 to 40 parts by weight of unsaturated polyester No. 30, 20 to 60 parts by weight of a photopolymerizable monomer mainly composed of 2-hydroxyethyl methacrylate, 0.1 to 10 parts by weight of photopolymerization initiator, thermal polymerization inhibitor Liquid unsaturated polyester resin compositions comprising from 0.01 to 1 part by weight are superior and useful for use in the present invention.

Next, a detailed explanation of the manufacturing process will be given.

An example of the step (1) is shown in FIG.

A base film of 10 to 100 .mu.m is placed on the top 2 of a table having a flat surface, and a frame with a mesh slightly larger than the table is placed on top of the top 2 with the bottom facing up.

Next, spacers are arranged so that the entire thickness becomes a predetermined thickness.

If the thickness of the resin layer is the same as the effective thickness of the mesh, no spacer is required.

Next, pour the photocurable resin and apply a layer of thickness lO~ on top of it.
Cover with a 30μ transparent film and move the roller from the edge of the table using degeneracy while pressing it against the spacer.

This completes a liquid photocurable resin layer with a mesh interposed therebetween.

Next, step (II) begins. That is, as shown in FIG. 2, actinic light is irradiated through a photomask.

The photomask used here has an image area that blocks light.

As active light, an ultraviolet fluorescent lamp, a high-pressure mercury lamp, a carbon arc lamp, or sunlight is used, and the irradiation time is selected so that the resin becomes sufficiently sharp and the minimum diameter of the print line passes through without fading.

The irradiation time varies depending on the resin and conditions, but the standard is 30 seconds to 10 minutes using an ultraviolet band lamp.

Once the exposure is complete (the button process begins).

That is, the base film and transparent film laminated on both sides of the photocurable resin layer are peeled off, and the uncured portions are removed.

The method is, for example, wiping with paper or cloth, washing out with a developer, or a combination thereof.

After removing the uncured portion, drying and post-exposure are performed as necessary.

In this way, the stencil of the present invention with a frame is completed as shown in FIG.

The method of printing cloth, paper, etc. using this stencil is carried out in accordance with the method of printing using a conventional paper pattern.

In this case, the mesh tension frame may be removed before use.

The stencil of the present invention and its manufacturing method have been described above, and its characteristics are that, compared to conventional cut-out dies and its manufacturing method, first and foremost it is possible to simplify the process and significantly shorten the process time. It is.

That is, in conventional paper patterns, the cutting out process and gauze pasting process were performed separately, but in the method of the present invention, image formation and gauze pasting can be performed simultaneously by light irradiation.

In addition, with conventional paper patterns, cutting requires special skills and a very long time, but with the method of the present invention, it is possible to easily create stencils in a short time without requiring special skills. Ta.

The second feature is that with one photomask, the same stencil can be easily reproduced in a short time.

This was not possible with the conventional cut-out method, and by using a duplicate stencil, it became possible to perform multiple simultaneous printings.

The third feature is that it is very easy to create a stencil with a frame as shown in the figure, and mechanical printing is also possible using this stencil with a frame.

In other words, it is possible to save labor through mechanization.

The fourth feature is that there is no need for this operation, compared to the conventional paper pattern that required 6 ``slips'' to prevent the island-shaped parts from falling off.

Furthermore, when a liquid photocurable resin is used, the uncured portion can be removed very easily, which improves work efficiency and is useful.

Taking advantage of these many excellent features, the stencil of the present invention can be widely used in place of thick textile printing patterns.

In addition, it is useful for thick printing and thick painting.

Next, the present invention will be specifically explained with reference to Examples, but the present invention is not limited to the Examples.

Example 70 parts of unsaturated polyester with an acid value of 23 obtained by condensation reaction with maleic anhydride/isophthalic acid/triethylene glycol 2/1/3 (molar ratio), 20 parts of 2-hydroxyethyl methacrylate, 10 parts of ethylene glycol dimethacrylate, 1 part of benzoin isobutyl ether, 0 parts of 2,6-di-t-butyl-p-cresol
．． One part was mixed and dissolved to obtain a liquid photocurable resin composition.

When a stencil was produced using this resin composition according to the method shown in Fig. 1.2.3 under the following conditions, a stencil with a thickness of about 250 μm and a pattern corresponding to a photomask and with the image area cut out was obtained.

Base film: Polypropylene, thickness 20
μ mesh: 220 μm thick, 700 μm opening, polyester spacer: 20 μm transparent film: Polypropylene, 20 μm thick
Exposure conditions: UV replacement lamp (20W)
, 1.5 minute irradiation washout conditions...Weak alkaline water is used.
When a silk cloth was dyed using a printing paste consisting of 2 g of Ing Orange SG), 33 g of water, and 65 g of glue, a pattern corresponding to the photomask was dyed.

[Brief explanation of drawings]

Figure 1 shows a state in which liquid photocurable resin is placed with a mesh interposed therein, Figure 2 shows a state in which actinic rays are irradiated through a photomask, and Figure 3 shows a state in which non-cured parts have been removed. FIG. 1... stand, 2... base film 3
...Mesh 4...Mesh pasting frame, 5...Spacer 6...Photocurable resin, 7...Transparent film 8. ...Photomask, 9...Glass plate, 10...
Actinic light source.

Claims (1)

[Scope of Claims] 1. A novel stencil characterized in that it has a structure in which a mesh is interposed as a support in a photocurable resin having a cutout pattern and having a thickness of 50 μm or more and 5 μm or less. 2. A cutting pattern characterized by interposing a mesh in a liquid photocurable resin layer with a thickness of 50μ or more and 5μ or less, irradiating the mesh with actinic rays through a photomask, and then removing the uncured part. 5mr/ for applied thickness of 50μ or more
A method for producing a novel stencil characterized by having a structure in which a mesh is interposed as a support in a photocurable resin having a size of L or less. 3. A thick textile printing method characterized by using a stencil having a structure in which a mesh is interposed as a support in a photocurable resin having a cutout pattern and having a thickness of 50 μm or more and 5 μm or less.