JPS5845775B2 - How to expose the fluorescent surface of a color cathode ray tube - Google Patents
How to expose the fluorescent surface of a color cathode ray tubeInfo
- Publication number
- JPS5845775B2 JPS5845775B2 JP8758278A JP8758278A JPS5845775B2 JP S5845775 B2 JPS5845775 B2 JP S5845775B2 JP 8758278 A JP8758278 A JP 8758278A JP 8758278 A JP8758278 A JP 8758278A JP S5845775 B2 JPS5845775 B2 JP S5845775B2
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- Japan
- Prior art keywords
- light
- phosphor
- color
- cathode ray
- ray tube
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
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- Formation Of Various Coating Films On Cathode Ray Tubes And Lamps (AREA)
- Cathode-Ray Tubes And Fluorescent Screens For Display (AREA)
Description
【発明の詳細な説明】
この発明はストライブ状の三色螢光体素子の間に光吸収
層を配してなる螢光面とスロット型シャドウ・マスクと
を有するカラー・ブラウン管の螢光面の露光方法、特に
光吸収層形成の際に行なわれる螢光面の露光方法に関す
るものである。DETAILED DESCRIPTION OF THE INVENTION The present invention relates to a fluorescent surface of a color cathode ray tube having a fluorescent surface formed by disposing a light absorption layer between striped three-color phosphor elements and a slot-shaped shadow mask. The present invention relates to a method of exposing a fluorescent surface, particularly to a method of exposing a fluorescent surface when forming a light absorbing layer.
最近、第1図に示すような赤、緑、青の三色螢光体素子
の間に光吸収層1を配してなる螢光面、いわゆるブラッ
ク・ストライブ・タイプ螢光面2が広く採用されるよう
になってきた。Recently, a so-called black stripe type fluorescent surface 2, which has a light absorption layer 1 arranged between three-color phosphor elements of red, green, and blue, as shown in Fig. 1, has been widely used. It is starting to be adopted.
そしてこのようなブラック・ストライブ・タイプ螢光面
の光吸収層形成時には、次のような露光方法が広く採用
されている。When forming a light absorption layer on such a black stripe type fluorescent surface, the following exposure method is widely used.
すなわち、第2図は三色螢光体素子R,C,Bの配列方
向の断面で見た螢光面の螢光方法を説明するための概略
断面図であり、光吸収層を形成せ°んとするフェース・
プレート3の内面にフォト・レジスト膜4を形成したの
ち、第4図に示すようなスロット型シャドウ・マスク5
をこのフェース・プレート3の内面の定位置に設置し、
紙面に垂直な方向に長い線状光源6を配置する。That is, FIG. 2 is a schematic cross-sectional view for explaining the method of fluorescing the fluorescent surface, as seen in the cross section in the arrangement direction of the three-color phosphor elements R, C, and B, and shows that the light absorbing layer is not formed. face
After forming a photoresist film 4 on the inner surface of the plate 3, a slot-type shadow mask 5 as shown in FIG.
is installed at a fixed position on the inner surface of this face plate 3,
A long linear light source 6 is arranged in a direction perpendicular to the plane of the paper.
そしてこの線状光源6からの光により、スロット型シャ
ドウマスク5の開孔7を通してフォト・レジスト膜4の
露光を行うのであるが、この時露光光線の飛跡を完成ブ
ラウン管の動作時の赤、緑、青3色の電子ビームの飛跡
に擬似させて、三色螢光体素子R2G、Bに対応する露
光を行なうための線状光源6の位置r p g s b
を図のように切りかえ、3つの異なった位置から順次露
光を行う。The light from this linear light source 6 is used to expose the photoresist film 4 through the aperture 7 of the slot-type shadow mask 5. At this time, the trajectory of the exposure light beam is completed to complete the red and green colors when the cathode ray tube is in operation. , the position of the linear light source 6 for performing exposure corresponding to the three-color phosphor elements R2G and B by simulating the trajectory of the three-color blue electron beam r p g s b
Switch as shown in the figure and perform exposure sequentially from three different positions.
なお、図中のSは隣接する光源位置g、b間転よびrj
g間の距離であり、これは通常均等か、はぼ均等に近く
設定される。In addition, S in the figure indicates the adjacent light source position g, b interval, and rj
This is the distance between g, and is usually set equal or close to equal.
このようにすると、スロット型シャドウ・マスク5の開
孔71個あたり3個の露光領域が形成される。In this way, three exposure areas are formed for every 71 openings of the slot-type shadow mask 5.
つぎにスロット型シャドウ・マスクを使用した螢光面の
露光に線状光源が使用される理由について第4図ととも
に説明する。Next, the reason why a linear light source is used to expose a fluorescent surface using a slot type shadow mask will be explained with reference to FIG.
第3図は三色螢光体素子R,G、Hの配列方向に垂直な
断面で見た螢光面の露光方法を説明するための概略断面
図である。FIG. 3 is a schematic sectional view for explaining the method of exposing the phosphor surface, taken in a cross section perpendicular to the arrangement direction of the three-color phosphor elements R, G, and H.
スロット型シャドウ・マスク5には開孔7と隣接する開
孔7の間に非透光性のブリッジ部8が存在するため、た
とえば点状光線のような小さな光源により露光を行うと
、ブリッジ部8の後方のフォト・レジスト膜4に達する
光が十分でなく、とぎれを有する開口が光吸収層上に形
成されてし甘う。Since the slot-type shadow mask 5 has a non-light-transmitting bridge portion 8 between the apertures 7 and the adjacent apertures 7, when exposure is performed using a small light source such as a point beam, the bridge portion Insufficient light reaches the photoresist film 4 behind the photoresist layer 8, and an uninterrupted aperture is formed on the light absorbing layer.
したがって非透光性ブリッジ部8の後方のフォト・レジ
スト膜4上にも十分光が到達するように、細長い線状光
源6をスロット型シャドウ・マスク5の開孔7の長手方
向に設置する。Therefore, the elongated linear light source 6 is installed in the longitudinal direction of the opening 7 of the slot-type shadow mask 5 so that sufficient light reaches the photoresist film 4 behind the non-transparent bridge portion 8.
この時の線状光源6の長さAは光吸収層上に形成される
開口の形状に大きな影響を与える。The length A of the linear light source 6 at this time greatly influences the shape of the opening formed on the light absorption layer.
すなわち線状光源6の長さAを最適に選ぶと、スロット
型シャドウ・マスク5の開孔7を通った線状光源6から
の光は、非透光性のブリッジ部8の後方のフォトレジス
ト膜4上にも適当豪速するようになり、開孔γの長手方
向に相隣り合わせた2個の開孔7を通過してきた光が、
非透光性のブリッジ部8の後方で適当な条件に重ね合わ
され、開孔7の後方のフォト・レジスト膜4と同等の露
光量を非透光性のブリッジ部8の後方のフォト・レジス
ト膜4上に与えることが可能となる。In other words, if the length A of the linear light source 6 is optimally selected, the light from the linear light source 6 that passes through the opening 7 of the slot-shaped shadow mask 5 will reach the photoresist behind the non-transparent bridge portion 8. The light that has passed through the two apertures 7 adjacent to each other in the longitudinal direction of the apertures γ now reaches a suitable speed on the membrane 4.
The photoresist film behind the non-light-transmitting bridge portion 8 is overlaid under appropriate conditions and exposed to the same amount of light as the photo-resist film 4 behind the opening 7. It becomes possible to give on 4.
その結果非透光性のブリッジ部8の影響をなくシ、第1
図で示したような凹凸のない直線性の良い開口を光吸収
層上に与えることができる。As a result, the influence of the non-transparent bridge portion 8 is eliminated, and the first
As shown in the figure, an aperture with good linearity and no unevenness can be provided on the light absorption layer.
そしてこのような方法で作成されるブラック・ストライ
ブ・タイプ螢光面を有するカラー・ブラウン管において
は、その動作時には、前記スロット型シャドウ・マスク
5の開孔7を通して、赤、緑、青用の三本の電子銃から
の電子ビームを前記螢光面上の三色螢光体素子R,G、
Bに照射し、螢光体素子の励起発光を行なう。In a color cathode ray tube having a black stripe type fluorescent surface prepared by such a method, during operation, the red, green, and blue colors are passed through the aperture 7 of the slot-type shadow mask 5. The electron beams from the three electron guns are passed through the three-color phosphor elements R, G, on the phosphor surface.
B is irradiated to excite the phosphor element and emit light.
ところが、このスロット型シャドウ・マスク5は前述の
ように開孔7と開孔7の間の電子ビームを遮蔽するブリ
ッジ部8とを有するため、螢光体素子の励起発光を行な
った螢光面は、第4図に示すように、非発光部9を有す
る。However, as described above, this slot-type shadow mask 5 has the apertures 7 and the bridge portion 8 that shields the electron beam between the apertures 7, so that the phosphor surface where the phosphor element is excited and emitted light is has a non-light-emitting portion 9, as shown in FIG.
ここで、図中、RN s GN + BN、はスロット
型シャドウ・マスク5のある1個の開孔7を通して赤、
緑、青の各々の電子銃からの電子ビームにより励起発光
した三色螢光体素子R2G、Bの励起発光部である。Here, in the figure, RN s GN + BN, red,
This is an excitation/emission section of three-color phosphor elements R2G and B that are excited and emit light by electron beams from green and blue electron guns, respectively.
通常、光吸収層1で両側を埋められた三色螢光体素子R
,G、Bの幅憑、Wo、WBばほぼ均等につくられ、ま
た三色螢光体素子R,G、Bの励起発光部RN 、GN
t BNの長手方向の長さlも三色螢光体素子R,G
、Bで均等であるため、励起発光部RN、GN、BNの
発光面積も均等となる。Usually, a three-color phosphor element R filled with a light absorption layer 1 on both sides
, G, B, Wo, WB are made almost equally, and the excitation light emitting parts RN, GN of the three-color phosphor elements R, G, B are made almost equally.
t The length l in the longitudinal direction of BN is also the three-color phosphor element R, G
, B are equal, the light emitting areas of the excitation light emitting parts RN, GN, and BN are also equal.
それゆえ、一定の白色画面を得るための赤、緑、青の各
色電子銃のビーム電流の比率、つ1り白色電流比は三色
螢光体素子R,G、Bを形成する螢光体が決1れば、言
いかえれば螢光体の発光色の色度と輝度が決1れば一元
的に決1つてし1う。Therefore, to obtain a constant white screen, the ratio of the beam currents of each color electron gun of red, green, and blue, and the white current ratio are the phosphors forming the three-color phosphor elements R, G, and B. In other words, if the chromaticity and brightness of the luminescent color of the phosphor are determined, then it is determined uniformly.
したがって白色電流比を変えるには螢光体そのものの特
性を変えねばならないが、これは容易に行なわれること
ではない。Therefore, in order to change the white current ratio, it is necessary to change the characteristics of the phosphor itself, but this is not easy to do.
そこで白色電流比を容易に変える方法として、第5図に
示すように、光吸収層で両側を埋められた三色螢光体素
子R,G、Bの幅WR2WG、WBを意識的に不均等な
らしめる方法が提案されている。Therefore, as a way to easily change the white current ratio, as shown in Figure 5, the widths WR2WG and WB of the three-color phosphor elements R, G, and B, whose sides are filled with light absorption layers, are intentionally made uneven. A method of adjusting has been proposed.
第5図に示す螢光面の場合、光吸収層1で両側を埋めら
れた三色螢光体素子R,G、Hのうち、螢光素子Gの幅
W。In the case of the fluorescent surface shown in FIG. 5, the width W of the fluorescent element G among the three-color fluorescent elements R, G, and H whose both sides are filled with the light absorption layer 1.
を他の2色より太きく形成しであるので、赤、緑、青の
各々の電子銃からの電子ビームにより励起発光した三色
螢光体素子R2G、Bの励起発光部RN + GN +
BNのうち、励起発光部GNの発光面積が励起発光部
〜、BNのそれよりも大きくなる。is formed to be thicker than the other two colors, so that the excitation/emission part RN + GN + of the three-color phosphor element R2G, B is excited and emitted by the electron beams from the red, green, and blue electron guns.
Of the BN, the light emitting area of the excitation light emitting section GN is larger than that of the excitation light emitting section ~ and BN.
したがってこの場合には幅%、W、、wBが均等な場合
に比べて同じ白色電流比を得るための緑色の電子銃のビ
ーム電流を減少でき、赤、緑、青の各色電子銃のビーム
電流の比率、つ1り白色電流比を変えることが可能とな
る。Therefore, in this case, the beam current of the green electron gun can be reduced to obtain the same white current ratio compared to the case where the widths %, W, , wB are equal, and the beam current of the red, green, and blue electron guns can be reduced. It becomes possible to change the white current ratio.
これは他の色についても同様であり、この方法によれば
、比較的容易に白色電流比を変えることが可能である。The same applies to other colors, and according to this method, it is possible to change the white current ratio relatively easily.
しかしながら、このような方法では両側を光吸収層で埋
められた三色螢光体素子R,G、Bの幅WR9WG、W
B を常に一定の比率に保たなければならず、光吸収層
形戒時に行なわれる露光の三色螢光体素子に対応する露
光量を常に厳密に制御釦よび管理する必要を生じ、この
ため螢光面の製造工程が複雑化するという欠点があった
。However, in such a method, the widths WR9WG, W of the three-color phosphor elements R, G, B whose both sides are filled with light absorption layers are
B must always be maintained at a constant ratio, and it becomes necessary to always strictly control and manage the exposure amount corresponding to the three-color phosphor element of the exposure performed during the light absorption layer formation process. This method has the disadvantage that the manufacturing process for the fluorescent surface becomes complicated.
この発明はこのような従来のものの欠点を解消するため
になされたもので、螢光面製造工程を複雑化することな
く、白色電流比の変更を可能ならしめるカラー・ブラウ
ン管の螢光面の露光方法を提供するものである。This invention was made in order to eliminate the drawbacks of the conventional ones, and it is an exposure method for the fluorescent surface of a color cathode ray tube that makes it possible to change the white current ratio without complicating the fluorescent surface manufacturing process. The present invention provides a method.
以下この発明の一実施例を図について説明する。An embodiment of the present invention will be described below with reference to the drawings.
前記従来のブラック・ストライブ・タイプ螢光面の露光
方法に釦いて、線状光源6の長さAが最適値よりも小さ
い場合には、非透光性のブリッジ部8の後方に達する光
が少なくなり、重ね合わされた露光量が不足して第7図
に示すように、一定周期で凹部を有する開口が光吸収層
上に形成される。When the length A of the linear light source 6 is smaller than the optimum value in the conventional black stripe type fluorescent surface exposure method, the light reaching the rear of the non-transparent bridge portion 8 As a result, the overlapping exposure amounts become insufficient, and as shown in FIG. 7, openings having concave portions are formed at regular intervals on the light absorption layer.
また逆に線状光線6の長さAが最適値よりも太きい場合
には、非透光性のブリッジ部8の後方に達する光が多く
なり、重ね合わされた露光量が過多となり、第8図で示
すように、一定周期で凸部を有する開口が光吸収層上に
形成される。Conversely, when the length A of the linear light ray 6 is thicker than the optimum value, more light reaches the rear of the non-transparent bridge portion 8, resulting in an excessive amount of superimposed exposure. As shown in the figure, openings having convex portions are formed on the light absorption layer at regular intervals.
第7図および第8図において、光吸収層の開口の凹凸部
が三色螢光体素子R,G、Bの列の組ごとにたがいちが
いとなっているのは、第3図に示すスロット型シャド、
つ・マスク5の開孔7の配列が、通常各列ごとに開孔7
の長手方向の配列ピッチの−だけずれてたがいちがいと
なっていることに起因しているのは言う1でもない。In FIGS. 7 and 8, the uneven portions of the openings in the light absorption layer are different for each set of rows of three-color phosphor elements R, G, and B because of the slots shown in FIG. type shadow,
・The arrangement of the apertures 7 in the mask 5 is normally arranged in each row.
The reason for this is that the arrangement pitch in the longitudinal direction is shifted by -, but there is no difference.
このようなブラック・ストライブ・タイプ螢光面の光吸
収層形成時に行なわれる露光方法に唱いて、露光条件と
、形成された螢光面の特性との関係を考慮してこの発明
はなされたものである。The present invention was developed by considering the relationship between the exposure conditions and the characteristics of the formed fluorescent surface in relation to the exposure method used when forming the light absorption layer of such a black stripe type fluorescent surface. It is something.
つぎにこの発明による露光方法の一実施例を第9固転よ
び第10図を参照して詳細に説明する。Next, an embodiment of the exposure method according to the present invention will be described in detail with reference to FIG. 9 and FIG.
第9図はこの発明に係る露光方法により形成した光吸収
層を有する螢光面について三色螢光体素子を電子ビーム
により励起発光させた状態を、白色電流比を変えるため
に提案された従来の螢光面について励起発光を行なった
第5図と同様に描いたものである。FIG. 9 shows a state in which a three-color phosphor element is excited to emit light by an electron beam on a phosphor surface having a light absorption layer formed by the exposure method according to the present invention, and is shown in a conventional method proposed for changing the white current ratio. This figure is drawn in the same way as in Figure 5, in which excited light emission was performed on the fluorescent surface.
すなわちこれは、赤、緑、青の各々の電子銃からの電子
ビームにより励起発光した三色螢光体素子R,G、Bの
励起発光部RN sGN、BNのうち、励起発光部への
発光面積が励起発光部RN + BNのそれよりも犬に
なるようにしたものであり、その結果第5図と同じ効果
が得られるものである。In other words, this refers to the emission of light to the excited light-emitting parts of the three-color phosphor elements R, G, and B that are excited and emit light by the electron beams from the red, green, and blue electron guns. The area is made to be smaller than that of the excitation light emitting part RN + BN, and as a result, the same effect as in FIG. 5 can be obtained.
また第10図はこの発明の一実施例による螢光面の露光
方法を説明するための概略断面図である。FIG. 10 is a schematic cross-sectional view for explaining a method of exposing a fluorescent surface according to an embodiment of the present invention.
この発明による露光方法においては、1ず第1に光吸収
層形成のためのフォト・レジスト膜の露光時に、従来の
ように直線性の良い凹凸のない開口を光吸収層に与える
最適な線状光源の長さを適用するのではなく、故意に凹
部または凸部のある開口を光吸収層上に形成する。In the exposure method according to the present invention, first of all, when exposing a photoresist film for forming a light absorption layer, an optimum linear shape is created to provide the light absorption layer with an aperture with good linearity and no irregularities unlike the conventional method. Rather than adapting the length of the light source, apertures with recesses or protrusions are intentionally formed on the light absorbing layer.
すなわち、第9図かられかるように、第7図で説明した
のと同様に、最適な線状光源の長さよりも短い光源長で
露光を行うのである。That is, as shown in FIG. 9, exposure is performed with a light source length shorter than the optimal length of the linear light source, in the same way as explained in FIG. 7.
渣た、この発明による露光方法に釦いては、線状光源6
の螢光体素子BおよびRの露光時にむける位置を変え、
螢光体素子Gの露光時の線状光源6の位置gは従来と全
く同じにしているが、螢光体素子BおよびRの露光時の
線状光源6の位置す。Finally, in the exposure method according to the present invention, a linear light source 6 is used.
changing the facing position of the phosphor elements B and R during exposure,
The position g of the linear light source 6 when exposing the phosphor element G is exactly the same as in the conventional case, but the position g of the linear light source 6 when exposing the phosphor elements B and R is the same.
rを位置gを中心として従来と全く逆にし、かつ光源位
置g、b間によびr、g間の距離も従来の距離Sのちょ
うど2倍の28に設定している。The distance r between the light source positions g and b and the distance between r and g is set to 28, which is exactly twice the conventional distance S.
このような状態でフォト・レジスト膜4の露光を行うと
螢光体素子Gの露光は従来と全く同様に行なわれ、カラ
ー・ブラウン管の動作時に赤、緑、青の三色の螢光体素
子R,G、Bの列の組の励起発光において電子銃からの
電子ビームが通過するスロット型シャドウ・マスクの開
孔の長手方向の一列の開孔を通過して来た光により露光
が行なわれるが、螢光体素子B s−よびRの露光につ
いてはこれと異なり、図から明らかなように前記スロッ
ト型シャドウ・マスク5の開孔7の長手方向の一列の開
孔の外側の一列の開孔7を通過して来た光により露光が
行なわれる。When the photoresist film 4 is exposed in this state, the phosphor elements G are exposed in exactly the same way as before, and when the color cathode ray tube is operated, the phosphor elements of the three colors red, green, and blue are exposed. Exposure is performed by light that has passed through a longitudinal row of openings in a slot-type shadow mask through which the electron beam from the electron gun passes during excitation emission in a set of R, G, and B rows. However, the exposure of the phosphor elements Bs- and R is different from this, and as is clear from the figure, a row of apertures on the outside of a row of apertures in the longitudinal direction of the apertures 7 of the slot-type shadow mask 5 is used. Exposure is performed by light passing through the hole 7.
これら外側の1列の開孔7の列は前述した通り、螢光体
素子Gの露光の際に光が通過した1列とはその開孔7の
縦方向の配列が一ピッチ分ずれているため、露光形成さ
れま
た螢光面も第9図のように、螢光体素子R釦よびBの光
吸収層に与えられた開口の凹部の位置が従来の螢光面に
比較して非発光部9の縦方向の配列ピンチの−だけずれ
て形成される。As described above, these outer rows of apertures 7 are shifted by one pitch from the row through which light passes during exposure of the phosphor element G. Therefore, as shown in FIG. 9, the phosphor surface is formed by exposure, and the position of the recessed part of the opening provided in the light absorption layer of the phosphor elements R button and B is different from that of the conventional phosphor surface. The portions 9 are formed with a deviation of - of the vertical alignment pinch.
寸たこのようにして形成された螢光面に3いては、三色
螢光体素子R,G、Bの配列方向の最外部の1列から内
側へ3列1での螢光体素子10は不規則な色配列になっ
てし1い、カラー・ブラウン管動作時に着色現象を起こ
し、見苦しい。On the phosphor surface formed in this manner, three phosphor elements 10 are arranged in three rows 1 from the outermost row in the arrangement direction of the three-color phosphor elements R, G, and B. This results in an irregular color arrangement, which causes a coloring phenomenon when a color cathode ray tube is operated, making it unsightly.
したがって螢光面露光時に光吸収層上の開口または螢光
体素子自体を欠落させてし1う操作を行うことが望まし
い。Therefore, it is desirable to perform an operation in which the opening on the light absorption layer or the phosphor element itself is removed during exposure of the phosphor surface.
たとえば最外郭の螢光体素子10中の螢光体素子Gにつ
いて述べるならば、螢光体素子Gの露光時に線状光源6
とスロット型シャドウ・マスク50間の空間に遮蔽板1
1を図示のように設置し、線状光源6からこの光を遮断
してこの部分の螢光体素子Gの光吸収層上の開口または
螢光体素子自体を欠落させてし捷うのである。For example, if we talk about the phosphor element G in the outermost phosphor element 10, when the phosphor element G is exposed, the linear light source 6
A shielding plate 1 is placed in the space between the slot-shaped shadow mask 50 and
1 is installed as shown in the figure, this light is blocked from the linear light source 6, and the opening on the light absorption layer of the phosphor element G in this area or the phosphor element itself is removed. .
以上は螢光体素子Gの場合について述べたが、螢光体素
子B、Rについても同様の手段により欠落させることが
可能である。Although the case of the phosphor element G has been described above, the phosphor elements B and R can also be omitted by similar means.
このようにして形成された光吸収層1でその両側を埋め
られた三色螢光体素子R,G、Bに、従来と同様にスロ
ット型シャドウ・マスク5の開孔7を通して赤、緑、青
の3本の電子銃からの電子ビームを照射すれば、前記の
ようにスロット型シャドウ・マスク5のブリッジ部8に
対応する非発光部9以外は図のように励起発光される。Red, green, and When irradiated with electron beams from the three blue electron guns, the slot-shaped shadow mask 5 except for the non-light-emitting portion 9 corresponding to the bridge portion 8 is excited to emit light as shown in the figure.
図中、RN、GN、BNは前記従来の場合と同様三色螢
光体素子R,G、Hの励起発光部である。In the figure, RN, GN, and BN are the excitation light emitting parts of the three-color phosphor elements R, G, and H, as in the conventional case.
この励起発光部〜s GN y BNの最大部の幅恥。The width of the maximum part of this excitation light emitting part ~s GN y BN.
Wo 、WBはほぼ均等になされているが、励起発光部
RN + BNでは中央部分で螢光体素子の幅が狭くな
っている。Although Wo and WB are approximately equal, the width of the phosphor element is narrow in the central portion of the excitation/emission portion RN + BN.
このような励起発光部RN +GN、BNの構成では励
起発光部GNの発光面積が励起発光部〜、BNのそれよ
りも大きくなり、前述の第5図により説明したのと実質
的に同等な状態が得られ、白色電流比を変えることが可
能となる。In such a configuration of the excitation light emitting section RN + GN, BN, the light emitting area of the excitation light emitting section GN is larger than that of the excitation light emitting section ~, BN, and a state substantially equivalent to that described with reference to FIG. 5 above is achieved. is obtained, making it possible to change the white current ratio.
昔た発光面積の比率は光吸収層形成時の露光に鮫ける三
色螢光体素子R,G、Hに対応する露光量を一定に保つ
か、または励起発光部〜。In the past, the ratio of the light-emitting area was determined by keeping the exposure amount corresponding to the three-color phosphor elements R, G, and H constant during exposure when forming the light-absorbing layer, or by keeping the exposure amount constant for the excitation light-emitting portion.
GN、BNの最大部の幅W、、W、、WB を一定に保
っておけば、露光時における線状光源の長さにより自動
的に決定されるので、従来のように三色螢光体素子R,
G、Bに対応する露光量を常に厳密に制御釦よび管理す
る必要はない。If the widths W, , W, , WB of the maximum parts of GN and BN are kept constant, they are automatically determined by the length of the linear light source during exposure, so it is possible to element R,
It is not necessary to always use strict control buttons and manage the exposure amounts corresponding to G and B.
そのうえ発光面積の比率は線状光源の長さを適当に選ぶ
ことにより任意に変えることが可能である。Moreover, the ratio of the light emitting area can be arbitrarily changed by appropriately selecting the length of the linear light source.
以上は露光用光源として静止した線状光源を使用する場
合について述べたが、この発明はこれに限られるもので
はなく、点状光源や一定の長さの線状光源をスロット型
シャドウ・マスクの開孔の長手方向に往復運動させなが
ら行う露光方法に適用しても同様の効果が得られる。The above description has been about the case where a stationary linear light source is used as the exposure light source, but the present invention is not limited to this, and the invention is not limited to this. Similar effects can be obtained even when the exposure method is applied to an exposure method that is performed while reciprocating in the longitudinal direction of the aperture.
以上のように、この発明に係るカラー・ブラウン管の螢
光面の露光方法によれば、光吸収層形成時の露光に釦い
て3色の螢光体素子のうち少なくとも1色の列につきカ
ラー・ブラウン管の動作時の励起発光に用いられる開孔
の長手方向の一列とは異なる開孔の列を通過してきた光
により露光を行うことにより、三色螢光体素子に対応す
る露光量を常に厳密に管理することなく、三色螢光体素
子の発光面積の比率を変えることができ、寸た発光面積
の比率も常に安定しているのでカラー・ブラウン管の白
色電流比の変更を容易に、しかも精度よく行うことが可
能となる効果がある。As described above, according to the method for exposing the phosphor surface of a color cathode ray tube according to the present invention, when the exposure button is pressed during the formation of the light absorbing layer, color phosphor elements are By performing exposure using light that has passed through a row of apertures that is different from the longitudinal row of apertures used for excited light emission during operation of a cathode ray tube, the exposure amount corresponding to the three-color phosphor element is always strictly controlled. The ratio of the light-emitting area of the three-color phosphor element can be changed without having to control the light-emitting area, and the ratio of the light-emitting area is always stable, making it easy to change the white current ratio of color and cathode ray tubes. This has the effect of making it possible to perform the process with high precision.
第1図はブラック・ストライフ・タイプ螢光面の概略平
面図、第2図および第3図はともにブラック・ストライ
ブ・タイプ螢光面の従来の露光方法を説明するための概
略断面図、第4図はスロット型シャドウ・マスクの概略
平面図、第5図はブラック・ストライブ・タイプ螢光面
の三色螢光体素子の励起発光の状態を示す概略平面図、
第6図は従来の白色電流比の変更方法を説明するための
励起発光された螢光面の概略平面図、第7図および第8
図はそれぞれ線状光源の長さが最適値より小なる場合お
よび犬なる場合に露光形成された螢光面の概略平面図、
第9図はこの発明の一実施例による露光方法により形成
したブラック・ストライブ・タイプ螢光面の三色螢光体
素子の励起発光の状態を示す概略平面図、第10図はこ
の発明の一実施例による螢光面の露光方法を説明するた
めの概略断面図である。
1・・・光吸収層、2・・・ブラック・ストライブ・タ
イプ螢光面、4・・・フォト・レジスト膜、5・・・ス
ロット型シャドウ・マスク、6・・・線状光源、7・・
・開孔。
な釦図中、同一あるいは相当部分には同一符号を付して
示しである。FIG. 1 is a schematic plan view of a black stripe type fluorescent surface, and FIGS. 2 and 3 are both schematic cross-sectional views for explaining a conventional exposure method of a black stripe type fluorescent surface. FIG. 4 is a schematic plan view of a slot-type shadow mask, and FIG. 5 is a schematic plan view showing the state of excitation and emission of a three-color phosphor element with a black stripe type phosphor surface.
FIG. 6 is a schematic plan view of a fluorescent surface that is excited and emitted light for explaining the conventional method of changing the white current ratio, and FIGS.
The figures are schematic plan views of fluorescent surfaces formed by exposure when the length of the linear light source is smaller than the optimum value, and when the length is longer than the optimum value, respectively.
FIG. 9 is a schematic plan view showing the state of excitation and emission of a three-color phosphor element with a black stripe type fluorescent surface formed by an exposure method according to an embodiment of the present invention, and FIG. FIG. 2 is a schematic cross-sectional view for explaining a method of exposing a fluorescent surface according to an embodiment. DESCRIPTION OF SYMBOLS 1... Light absorption layer, 2... Black stripe type fluorescent surface, 4... Photoresist film, 5... Slot type shadow mask, 6... Linear light source, 7・・・
・Open hole. In the button diagrams, the same or corresponding parts are indicated by the same reference numerals.
Claims (1)
してなる螢光面とスロット型シャドウ・マスクとを有す
るカラー・ブラウン管において、そのカラー・ブラウン
管の動作時に前記スロット型シャドウ・マスクの開孔の
長手方向の1列に配列された開口を通過する赤、緑、青
のそれぞれの電子銃からの電子ビームによって励起発光
する赤、緑、青の三色螢光体素子の列のうち少なくとも
一色の列について、螢光面の露光形成過程にネ・いては
カラー・ブラウン管の動作時の励起発光に用いられる開
孔の長手方向の1列とは異なる開孔の列を通過して来た
光により露光を行うことを特徴とするカラー・ブラウン
管の螢光面の露光方法。 2 螢光面の露光用光源として使用する線状光源の光源
長を適当に選択することにより露光形成された光吸収層
の開口を周期的に凸部筐たは凹部を有するようにしたこ
とを特徴とする特許請求の範囲第1項記載のカラー・ブ
ラウン管の螢光面の露光方法。 3 螢光面の赤、緑、青の三色螢光体素子の最外部の列
より内側へ1列ないし3列の螢光体素子の列について螢
光面露光時に露光光線を遮蔽して光吸収層上の開口昔た
は螢光体素子自体を欠落させることを特徴とする特許請
求の範囲第1項豊たは第2項記載のカラー・ブラウン管
の螢光面の露光方法。[Scope of Claims] 1. A color cathode ray tube having a phosphor surface formed by disposing a light absorption layer between strip-shaped three-color phosphor elements and a slot-shaped shadow mask. During operation, the red, green, and blue electron beams are excited and emit light by electron beams from the red, green, and blue electron guns that pass through the apertures arranged in one row in the longitudinal direction of the slot-shaped shadow mask. Among the rows of color phosphor elements, at least one row of color phosphor elements is different from one row in the longitudinal direction of the apertures used for excitation light emission during operation of a color cathode ray tube, depending on the exposure formation process of the phosphor surface. A method for exposing the fluorescent surface of a color cathode ray tube, which is characterized by exposing the fluorescent surface of a color cathode ray tube to light that has passed through a row of apertures. 2. By appropriately selecting the light source length of the linear light source used as the light source for exposing the fluorescent surface, the apertures of the light absorbing layer formed by exposure are made to have periodic convex portions or concave portions. A method for exposing a fluorescent surface of a color cathode ray tube according to claim 1. 3. For one to three rows of phosphor elements inward from the outermost row of three-color phosphor elements of red, green, and blue on the phosphor surface, the exposure light is shielded during exposure of the phosphor surface. A method for exposing a phosphor surface of a color cathode ray tube according to claim 1 or 2, characterized in that the aperture on the absorption layer or the phosphor element itself is omitted.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP8758278A JPS5845775B2 (en) | 1978-07-17 | 1978-07-17 | How to expose the fluorescent surface of a color cathode ray tube |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP8758278A JPS5845775B2 (en) | 1978-07-17 | 1978-07-17 | How to expose the fluorescent surface of a color cathode ray tube |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS5514676A JPS5514676A (en) | 1980-02-01 |
| JPS5845775B2 true JPS5845775B2 (en) | 1983-10-12 |
Family
ID=13918985
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP8758278A Expired JPS5845775B2 (en) | 1978-07-17 | 1978-07-17 | How to expose the fluorescent surface of a color cathode ray tube |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS5845775B2 (en) |
-
1978
- 1978-07-17 JP JP8758278A patent/JPS5845775B2/en not_active Expired
Also Published As
| Publication number | Publication date |
|---|---|
| JPS5514676A (en) | 1980-02-01 |
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