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JPS5845776B2 - Method and apparatus for forming a fluorescent surface for color picture tubes - Google Patents
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JPS5845776B2 - Method and apparatus for forming a fluorescent surface for color picture tubes - Google Patents

Method and apparatus for forming a fluorescent surface for color picture tubes

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Publication number
JPS5845776B2
JPS5845776B2 JP10111678A JP10111678A JPS5845776B2 JP S5845776 B2 JPS5845776 B2 JP S5845776B2 JP 10111678 A JP10111678 A JP 10111678A JP 10111678 A JP10111678 A JP 10111678A JP S5845776 B2 JPS5845776 B2 JP S5845776B2
Authority
JP
Japan
Prior art keywords
light
film
face panel
space
phosphor film
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
JP10111678A
Other languages
Japanese (ja)
Other versions
JPS5528255A (en
Inventor
正一 前田
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Panasonic Holdings Corp
Original Assignee
Matsushita Electronics Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Matsushita Electronics Corp filed Critical Matsushita Electronics Corp
Priority to JP10111678A priority Critical patent/JPS5845776B2/en
Publication of JPS5528255A publication Critical patent/JPS5528255A/en
Publication of JPS5845776B2 publication Critical patent/JPS5845776B2/en
Expired legal-status Critical Current

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  • Formation Of Various Coating Films On Cathode Ray Tubes And Lamps (AREA)

Description

【発明の詳細な説明】 本発明は、カラー受像管用螢光面、とくにブラックマト
リックス形螢光面の形成方法むよび同螢光面の形成装置
に関する。
DETAILED DESCRIPTION OF THE INVENTION The present invention relates to a method for forming a fluorescent surface for a color picture tube, particularly a black matrix type fluorescent surface, and an apparatus for forming the same.

一般に、ブラックマトリックス形螢光面は、孔捷たはス
トライブからなる多数の空間を備えるように選択的に形
成された光吸収性膜と、前記空間内に充填された3種の
ドツト状またはストライプ状の螢光体膜とからなり、以
下に述べる手順により形成される。
In general, a black matrix type fluorescent surface includes a light-absorbing film selectively formed to have a large number of spaces consisting of perforations or stripes, and three types of dot-shaped or striped holes filled in the spaces. It consists of a striped phosphor film and is formed by the procedure described below.

すなわち、1ず、ポリビニールアルコールと重クロム酸
塩とからなる感光性樹脂液ラフエースパネルの内面に一
様に塗布してここに感光性樹脂膜を形成する。
That is, first, a photosensitive resin liquid made of polyvinyl alcohol and dichromate is uniformly applied to the inner surface of a rough ace panel to form a photosensitive resin film thereon.

ついで、前記フェースパネル内にシャドウマスクを装着
し、3電子ビームの偏向中心となるべき位置に設置した
露光用光源を点灯させる。
Next, a shadow mask is mounted inside the face panel, and an exposure light source installed at a position that is to be the center of deflection of the three electron beams is turned on.

前記光源を3つの偏向中心位置で点灯させることによっ
て、前記感光性樹脂膜を選択露光し、露光点の膜部分を
硬化させる。
By turning on the light source at three deflection center positions, the photosensitive resin film is selectively exposed, and the film portions at the exposed points are cured.

つぎに、水による現像処理を施すと、硬化した樹脂膜部
分のみがフェースパネルの内面に残留するから、ついで
、前記樹脂膜上にグラファイト膜を一様に塗布形成する
Next, when a water development treatment is performed, only the hardened resin film portion remains on the inner surface of the face panel, so a graphite film is then uniformly applied and formed on the resin film.

そして、過酸化水素を与えて前記グラファイト膜の下層
の前記樹脂膜を膨潤させ、再び水による現像処理を施す
と、前記樹脂膜とその直上に位置していたグラファイト
膜部分とがとり除かれ、ブラックマトリックス、つ1す
、多数の空間を備えた光吸収性膜が得られる。
Then, when hydrogen peroxide is applied to swell the resin film below the graphite film, and development treatment with water is performed again, the resin film and the graphite film portion located directly above it are removed. A light-absorbing film with a black matrix, a glass, and a large number of spaces is obtained.

つぎに、この光吸収性膜の空間内に、赤、青および緑の
各発光をなす3種の螢光体膜を付設する。
Next, three types of phosphor films emitting red, blue, and green light are attached within the space of this light-absorbing film.

第1図には光吸収性膜が太い破線で示されて釦り、この
膜の空間1内に螢光体膜が付設される。
In FIG. 1, a light-absorbing film is shown as a thick dashed line and a phosphor film is attached within the space 1 of this film.

螢光体膜付設工程では、壕ず、フェースパネル2の内面
に感光は螢光体膜3が前記光吸収性膜を覆うように一様
に塗布形成される。
In the phosphor film application step, the phosphor film 3 is uniformly coated on the inner surface of the face panel 2 without any trenches so that the phosphor film 3 covers the light-absorbing film.

そして、シャドウマスク4が所定位置に装着され、露光
用光源5かう放射されて補正レンズ6釦よびシャドウマ
スリ4を通じた光が感光性螢光体膜3に与えられる。
Then, the shadow mask 4 is attached to a predetermined position, and the light emitted from the exposure light source 5 is applied to the photosensitive phosphor film 3 through the correction lens 6 button and the shadow mask 4.

そして、この選択露光処理後に施した現像処理により、
1種のドツト状またはストライブ状の螢光体膜ができ上
るので、残る2種の螢光体膜を前述と同様の要領で付設
する。
Then, through the development process performed after this selective exposure process,
Since one type of dot-shaped or stripe-shaped phosphor film is completed, the remaining two types of phosphor films are applied in the same manner as described above.

選択露光処理時の感光性螢光体膜3上に釦ける照度分布
は、第2図に曲線7で示すようなものとなる。
The illuminance distribution on the photosensitive phosphor film 3 during the selective exposure process is as shown by the curve 7 in FIG.

照度と露光量との間には相反則が成立するので、照度分
布で露光量分布を論じることができる。
Since a reciprocity law holds between illuminance and exposure, the exposure distribution can be discussed in terms of illuminance distribution.

第2図中の光量レベルIaは、これを基準にして現像処
理を施すと光吸収性膜の空間Gに対して、空間Gと同一
幅のドツト状螢光体膜部分が得られることを意味してい
る。
The light intensity level Ia in FIG. 2 means that if the development process is performed based on this level, a dot-shaped phosphor film portion with the same width as the space G will be obtained for the space G of the light-absorbing film. are doing.

曾た、光量レベルIcは、これを基準にして現像処理を
施すと空間Gに対して、隣の空間R1たはBに接する幅
の螢光体膜部分が得られることを意味し、光量レベルI
bは、2つの光量レベルIa、Icの中間ヲ示す。
The light intensity level Ic means that if the development process is performed based on this, a phosphor film portion with a width that touches the adjacent space R1 or B will be obtained for the space G, and the light intensity level I
b indicates the middle of the two light intensity levels Ia and Ic.

したがって、良好な螢光体膜を得るには、zAのレベル
範囲内に納することか必要となる。
Therefore, in order to obtain a good phosphor film, it is necessary to keep the zA level within the range.

一方、螢光面の輝度を高めるためには、光吸収性膜の空
間をできるだけ大きくとり、螢光体膜の有効発光面積を
大きくする必要がある。
On the other hand, in order to increase the brightness of the phosphor surface, it is necessary to increase the space of the light-absorbing film as much as possible to increase the effective light-emitting area of the phosphor film.

螢光体膜は通常、光吸収性膜の一部分と重なり合うため
、光吸収性膜部分の幅をMlからM2へと減少させると
、部分aにおける螢光体膜が隣りの空間R1たはB内へ
はみ出すことがある。
Since the phosphor film usually overlaps a part of the light-absorbing film, when the width of the light-absorbing film part is reduced from Ml to M2, the phosphor film in part a overlaps with the adjacent space R1 or B. It may stick out.

また、部分すにおける螢光体膜に欠けを生じることがあ
る。
Furthermore, the phosphor film in some parts may be chipped.

したがって、前記幅をM2 とする場合は、レベル範囲
ZAをレベル範囲ZBに圧縮する必要があり、この場合
、製造面での精度が非常にきびしくなる。
Therefore, when the width is set to M2, it is necessary to compress the level range ZA into the level range ZB, and in this case, manufacturing accuracy becomes very strict.

この欠点を解消させるための方策として、外部から光を
補充し、第2図に曲線8で示すような照度分布に改める
ことが考えられる。
As a measure to eliminate this drawback, it is conceivable to supplement the light from the outside and change the illuminance distribution to the one shown by curve 8 in FIG. 2.

第3図に示す構成では、従来と同様の露光用光源5のほ
かに、フェースパネル2の外面側に補助光源5′を設置
している。
In the configuration shown in FIG. 3, in addition to the conventional exposure light source 5, an auxiliary light source 5' is installed on the outer surface of the face panel 2.

捷た、第4図に示す他の例では、フェースパネル2の外
面側に、パネル外面に沿った反射面を有する無指向性反
射板9を設置して訣り、この場合、感光性螢光体膜3に
吸収されることなくフェースパネル2を透過した露光用
光線が、反射板9の反射面で螢光体膜3側へ反射して補
充光線となる。
In another example shown in FIG. 4, an omnidirectional reflector 9 having a reflective surface along the outer surface of the panel is installed on the outer surface of the face panel 2. The exposure light beam that has passed through the face panel 2 without being absorbed by the body membrane 3 is reflected toward the phosphor film 3 side by the reflective surface of the reflector plate 9 and becomes a supplementary light beam.

しかし、第3図に示した補助光源法では、補助光源5′
からの光がフェースパネル2を一様に照射するので、光
吸収性膜の所定の空間内の螢光体膜部分のみならず、隣
りの空間内の螢光体膜部分をも露光してし1う結果とな
り、かぶりによる混色不良を生じる。
However, in the auxiliary light source method shown in FIG.
Since the light uniformly illuminates the face panel 2, not only the portion of the phosphor film in a predetermined space of the light-absorbing film but also the portion of the phosphor film in an adjacent space is exposed. This results in poor color mixing due to fogging.

また、第4図に示した反射露光法では、フェースパネル
2の中央領域C1以外で好1しくない結果を指く。
Further, in the reflection exposure method shown in FIG. 4, it refers to an unfavorable result in areas other than the central area C1 of the face panel 2.

すなわち、中央領域C1では、空間G内を透過しかつ反
射板9の反射面で反射した光線が元の空間G側へ反射す
るものの、周辺領域C2,C3では、空間G内を透過し
た光線11が反射板90反射面で反射光r1 となっ
て外方へそれるので、やはり混色不良を生じる。
That is, in the central region C1, the light rays that have passed through the space G and have been reflected by the reflective surface of the reflector plate 9 are reflected back to the original space G, but in the peripheral regions C2 and C3, the light rays 11 that have passed through the space G The light becomes reflected light r1 on the reflective surface of the reflector plate 90 and is deflected outward, resulting in poor color mixing.

本発明は、前述の諸点に留意してなされたものであり、
つぎに本発明を図面に示した実施例とともに説明する。
The present invention has been made with the above-mentioned points in mind,
Next, the present invention will be explained along with embodiments shown in the drawings.

第5図に示す反射板10は、第6図に示すような断面へ
状の反射面を有する細長い反射板素体10′を、その長
さ方向軸がシャドウマスクのスロットの長さ方向軸と平
行となるように多数個連続配夕1ルた構成となっている
The reflector 10 shown in FIG. 5 includes an elongated reflector body 10' having a reflecting surface having a rectangular cross section as shown in FIG. The structure is such that a large number of them are arranged in parallel so that they are arranged in succession.

反射板素体10′は第7図に示すように一方の反射面1
1に入射した入射光線11を、反射面11とは直角な他
方の反射面12側へ反射させるので、反射面12で反射
した反射光線r1 は入射光線11 と平行な軌道を
とおってフェースパネル側へ進み、補充光線となる。
The reflector body 10' has one reflecting surface 1 as shown in FIG.
1 is reflected toward the other reflective surface 12, which is perpendicular to the reflective surface 11, so that the reflected light ray r1 reflected from the reflective surface 12 passes through a trajectory parallel to the incident light ray 11 and reaches the face panel side. Proceed to and become a supplementary ray.

第8図ないし第11図は、光吸収性膜の空間G。FIGS. 8 to 11 show the space G of the light-absorbing film.

R,Bの幅および空間相互間の光吸収性膜部分13の幅
を一定とし、反射板素体の大きさを変えたときの入射光
線11.12,13 と反射光線r1 r r2
+ r3 との関係を示すもので、反射板素体の開口部
福をP1光吸収性膜の空間の配列ピッチをH1光吸収性
膜の空間の最大幅をDとしている。
Incident light rays 11, 12, 13 and reflected light rays r1 r r2 when the widths of R and B and the width of the light-absorbing film portion 13 between the spaces are constant and the size of the reflector body is changed.
+r3, where the opening width of the reflector body is P1, the arrangement pitch of the space of the light absorbing film is H1, and the maximum width of the space of the light absorbing film is D.

第8図はP>H−Dとした場合で、空間Gへの入射光線
13は、反射板素体の反射面で反射光線r3 となり、
光吸収性膜部分13に吸収されるので問題はないが、入
射光線11 は反射光線r1 となって隣りの空間R
に入射するので好1しくない。
FIG. 8 shows the case where P>HD, and the incident light ray 13 into the space G becomes a reflected light ray r3 on the reflective surface of the reflector body,
There is no problem because it is absorbed by the light-absorbing film portion 13, but the incident light ray 11 becomes a reflected light ray r1 and is reflected in the adjacent space R.
This is not a good thing because it will be incident on the

第9図はP=H−Dとした場合で、第10図はP<H−
Dとした場合である。
Figure 9 shows the case where P=H-D, and Figure 10 shows the case where P<H-
This is the case of D.

これらの場合は、反射板素体の開口部幅が光吸収性膜部
分13の幅よりも犬とならないので、空間Gへの入射光
線11,12,13・・・・・・・・・が反射板素体の
反射面で反射光線r11 r2 t r3・・・・・
・・・・となって元の空間Gへ入射するため、混色不良
を生じない。
In these cases, the width of the opening of the reflector element is not wider than the width of the light-absorbing film portion 13, so that the incident light rays 11, 12, 13, etc., into the space G are The reflected light rays r11 r2 t r3... on the reflective surface of the reflector body.
. . . and enters the original space G, so no defective color mixture occurs.

第11図ばP二Hとした場合で、反射板素体のフェース
パネル外面への設置を、光吸収性膜部分の配列ピッチに
合わせて行なうことの不便さはあっても良好な螢光面が
得られる。
Figure 11 shows the case of P2H, and although it is inconvenient to install the reflector body on the outer surface of the face panel in accordance with the arrangement pitch of the light-absorbing film part, a good fluorescent surface is obtained. is obtained.

したがって、光吸収性膜のある空間Gを透過した光線が
反射板で反射したのち元の空間G以外の空間に入射しな
いためには、反射板素体の開口部幅Pを、光吸収性膜の
空間相互間に介在する光吸収性膜部分の幅(H−D)以
下とするか、あるいは前記空間の配列ピッチHに等しい
値にする必要があり、この条件を満たした反射板素体を
多数個連続配列した反射板を第6図に示すようにフェー
スパネルの外面上に設置し、露光用光源から放射されか
つシャドウマスクを通じた光線を感光性螢光体膜に与え
ると、感光性螢光体膜に吸収されずにフェースパネルを
透過した光線は、前記反射板によって反射し、この反射
光により前記感光性螢光体膜の硬化が促進されるのであ
って、かぶりや欠落のないドツト状またはストライブ状
の螢光体膜を効率よく形成することが可能となる。
Therefore, in order to prevent the light rays that have passed through the space G where the light-absorbing film is located from entering spaces other than the original space G after being reflected by the reflector, the opening width P of the reflector body must be adjusted to It is necessary to make the width of the light absorbing film portion interposed between the spaces (H-D) or less, or equal to the arrangement pitch H of the spaces, and a reflector element that satisfies this condition is When a large number of continuously arranged reflectors are installed on the outer surface of the face panel as shown in FIG. 6, and the light rays emitted from the exposure light source and passed through the shadow mask are applied to the photosensitive phosphor film, the photosensitive phosphor film is exposed. The light that passes through the face panel without being absorbed by the light film is reflected by the reflector, and this reflected light accelerates the curing of the photosensitive phosphor film, resulting in dots without fogging or chipping. It becomes possible to efficiently form a phosphor film in the form of a shape or a stripe shape.

なお、かかる反射板は、その縦線がシャドウマスクのス
ットの長さ方向軸に平行となるようにフェースパネル
の外面上に設置されるのであるが、反射板素体は反射板
全域に配列されていなくてもよく、螢光面形成にむいて
とくに問題となる螢光性周辺領域またばその他の領域に
のみ配列することができる。
Note that such a reflector is installed on the outer surface of the face panel so that its vertical lines are parallel to the longitudinal axis of the shadow mask slits, but the reflector body extends over the entire area of the reflector. They do not need to be arranged, and can be arranged only in the fluorescent peripheral region or other regions that are particularly problematic for forming a fluorescent surface.

【図面の簡単な説明】[Brief explanation of drawings]

第1図は従来の螢光面形成方法を説明するための構成図
、第2図は感光性螢光体膜上の照度分布を示す図、第3
図および第4図はそれぞれ従来の螢光面形成方法を説明
するための構成図および説明図、第5図は本発明の一実
施例を説明するための構成図、第6図は本発明において
用いられる反射板の反射板素体の一例を示す拡大斜視図
、第7図は前記反射板素体の反射作用を説明するための
図、第8図ないし第11図は反射板素体の大きさと反射
作用とを説明するための図である。 1・・・・・・光吸収性膜の空間、2・・・・・・フェ
ースパネル、3・・・・・・感光性螢光体膜、4・・・
・・・シャドウマスク、5・・・・・・露光用光源、1
0・・・・・・反射板、10′・・・・・・反射板素体
、11,12・・・・・・反射面、13・・・・・・光
吸収性膜部分。
Figure 1 is a block diagram for explaining the conventional method of forming a fluorescent surface, Figure 2 is a diagram showing the illuminance distribution on a photosensitive phosphor film, and Figure 3 is a diagram showing the illuminance distribution on a photosensitive phosphor film.
4 and 4 are respectively a block diagram and an explanatory diagram for explaining a conventional fluorescent surface forming method, FIG. 5 is a block diagram for explaining an embodiment of the present invention, and FIG. 6 is a block diagram for explaining an embodiment of the present invention. An enlarged perspective view showing an example of the reflector body of the reflector used, FIG. 7 is a diagram for explaining the reflection action of the reflector body, and FIGS. 8 to 11 show the size of the reflector body. FIG. 1... Space of light-absorbing film, 2... Face panel, 3... Photosensitive phosphor film, 4...
... Shadow mask, 5 ... Exposure light source, 1
0... Reflection plate, 10'... Reflection plate element, 11, 12... Reflection surface, 13... Light absorbing film portion.

Claims (1)

【特許請求の範囲】 1 フェースパネルの内面に光吸収性膜を選択的に形成
したのち前記光吸収性膜を覆って感光性螢光体膜を一様
に塗布形成し、シャドウマスクを通じて与えた光により
前記感光性螢光体膜を選択露光するにさいし、前記感光
性螢光体膜、前記光吸収性膜の空間および前記フェース
パネルを透過した光を、前記フェースパネルの外面上に
設置した多数の反射板素体1面へ状反射面で反射させ、
この反射光を前記空間内の感光性螢光体膜部分に導くこ
とを特徴とするカラー受像管用螢光面の形成方法。 2 選択的に形成された光吸収性膜およびこの膜を覆っ
て→降に塗布形成された感光性螢光体膜を内面に有する
フェースパネルと、前記フェースパネルの内面に近接し
て設置されたシャドウマスクと、前記シャドウマスクの
内面に向き合って設置された螢光用光源と、前記光源か
ら放射されて前記シャドウマスク、前記感光性螢光体膜
、前記光吸収性膜の空間転よび前記フェースパネルを通
じた光を前記空間へ反射させるために前記フェースパネ
ルの外面上に設置された断面へ状の反射面を有する多数
の反射板素体とを備えてなることを特徴とするカラー受
像管用螢光面の形成装置。
[Claims] 1. After selectively forming a light-absorbing film on the inner surface of the face panel, a photosensitive phosphor film is uniformly applied to cover the light-absorbing film, and is applied through a shadow mask. When selectively exposing the photosensitive phosphor film to light, the light transmitted through the photosensitive phosphor film, the space of the light-absorbing film, and the face panel is placed on the outer surface of the face panel. The light is reflected on one side of a large number of reflector bodies,
A method for forming a phosphor surface for a color picture tube, characterized in that the reflected light is guided to a photosensitive phosphor film portion within the space. 2. A face panel having on its inner surface a selectively formed light-absorbing film and a photosensitive phosphor film coated over the film; and a face panel installed in close proximity to the inner surface of the face panel. a shadow mask; a fluorescent light source disposed facing the inner surface of the shadow mask; and a fluorescent light source emitted from the light source that causes spatial rotation of the shadow mask, the photosensitive phosphor film, and the light-absorbing film, and the face. A firefly for a color picture tube, characterized in that it comprises a number of reflector bodies each having a reflective surface having a rectangular cross section and installed on the outer surface of the face panel in order to reflect the light that has passed through the panel into the space. Light surface forming device.
JP10111678A 1978-08-18 1978-08-18 Method and apparatus for forming a fluorescent surface for color picture tubes Expired JPS5845776B2 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP10111678A JPS5845776B2 (en) 1978-08-18 1978-08-18 Method and apparatus for forming a fluorescent surface for color picture tubes

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP10111678A JPS5845776B2 (en) 1978-08-18 1978-08-18 Method and apparatus for forming a fluorescent surface for color picture tubes

Publications (2)

Publication Number Publication Date
JPS5528255A JPS5528255A (en) 1980-02-28
JPS5845776B2 true JPS5845776B2 (en) 1983-10-12

Family

ID=14292095

Family Applications (1)

Application Number Title Priority Date Filing Date
JP10111678A Expired JPS5845776B2 (en) 1978-08-18 1978-08-18 Method and apparatus for forming a fluorescent surface for color picture tubes

Country Status (1)

Country Link
JP (1) JPS5845776B2 (en)

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP0256582A1 (en) * 1986-08-18 1988-02-24 North American Philips Consumer Electronics Corp. Method of producing a phosphor screen for a colour cathode ray tube

Also Published As

Publication number Publication date
JPS5528255A (en) 1980-02-28

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