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JPS5847471B2 - Manufacturing method of electrolytic assembly - Google Patents
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JPS5847471B2 - Manufacturing method of electrolytic assembly - Google Patents

Manufacturing method of electrolytic assembly

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Publication number
JPS5847471B2
JPS5847471B2 JP56020489A JP2048981A JPS5847471B2 JP S5847471 B2 JPS5847471 B2 JP S5847471B2 JP 56020489 A JP56020489 A JP 56020489A JP 2048981 A JP2048981 A JP 2048981A JP S5847471 B2 JPS5847471 B2 JP S5847471B2
Authority
JP
Japan
Prior art keywords
metal
exchange membrane
cation exchange
membrane
aqueous solution
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
JP56020489A
Other languages
Japanese (ja)
Other versions
JPS57134586A (en
Inventor
啓恭 竹中
栄一 鳥養
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
National Institute of Advanced Industrial Science and Technology AIST
Original Assignee
Agency of Industrial Science and Technology
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Agency of Industrial Science and Technology filed Critical Agency of Industrial Science and Technology
Priority to JP56020489A priority Critical patent/JPS5847471B2/en
Publication of JPS57134586A publication Critical patent/JPS57134586A/en
Publication of JPS5847471B2 publication Critical patent/JPS5847471B2/en
Expired legal-status Critical Current

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  • Electrodes For Compound Or Non-Metal Manufacture (AREA)
  • Electrolytic Production Of Non-Metals, Compounds, Apparatuses Therefor (AREA)
  • Chemically Coating (AREA)

Description

【発明の詳細な説明】 本発明は電解用接合体の製造法に関する。[Detailed description of the invention] The present invention relates to a method for manufacturing an electrolytic assembly.

電解用接合体は薄膜と電極となるべき金属とが接合され
たものであり、水電解、塩酸又は食塩電解等の分野にて
実捲されている固体高分子電解質電解法においてその重
要性を高めつつある。
The electrolytic assembly is a combination of a thin film and a metal that becomes an electrode, and its importance is increasing in the solid polymer electrolyte electrolysis method that is actually used in fields such as water electrolysis, hydrochloric acid or salt electrolysis. It's coming.

現在繁用されている電解用接合体は陽イオン交換膜の両
面にある種の金属層を接合させたものである。
The currently frequently used electrolytic bonding body is one in which a certain type of metal layer is bonded to both sides of a cation exchange membrane.

斯かる電解用接合体としては、電気抵抗が小であること
、陽イオン交換膜に接合される金属層が柔軟性を有して
いること、陽イオン交換膜と金属層との接着性が良好で
あること、電解時において金属層の剥離等がなく耐久性
に優れていること等の性質が要求されている。
Such a bonded body for electrolysis must have low electrical resistance, flexibility of the metal layer bonded to the cation exchange membrane, and good adhesion between the cation exchange membrane and the metal layer. It is required to have properties such as being 1, and having excellent durability without peeling of the metal layer during electrolysis.

従来、電解用接合体の製造法としては、例えばUSP第
3,4 3 2,3 5 5号明細書やUSP第3,2
9 7,4 8 4号明細書に記載されている方法、
特公昭42−5014号公報に記載されている方法、特
開昭55−38934号公報に記載されている方法等各
種の方法が開発されている。
Conventionally, as a manufacturing method of an electrolytic assembly, for example, USP No. 3,4 3 2, 3 5 5 and USP No. 3,2
9 7, 4 8 The method described in specification No. 4,
Various methods have been developed, such as the method described in Japanese Patent Publication No. 42-5014 and the method described in Japanese Patent Application Laid-Open No. 55-38934.

USP第3,4 3 2,3 5 5号明細書やUSP
第3,297,484号明細書に記載の方法は所謂乾式
法と呼ばれる方法であり、予め白金、イリジウム、ロジ
ウム、ルテニウム等の金属又はその酸化物をポリテトラ
フ口口エチレンを結合剤として製膜しておき、次いで該
膜をイオン交換膜に熱圧着して電解用接合体を得る方法
である。
USP No. 3, 4 3 2, 3 5 5 specification and USP
The method described in Specification No. 3,297,484 is a so-called dry method in which metals such as platinum, iridium, rhodium, and ruthenium or their oxides are formed into a film in advance using polytetrafluoroethylene as a binder. This method is followed by thermocompression bonding of the membrane to an ion exchange membrane to obtain an electrolytic assembly.

また特公昭42−5014号公報に記載の方法及び特開
昭55−38934号公報に記載の方法は所謂湿式法と
呼ばれる方法であり、前者はイオン交換膜上に還元剤を
含む溶液を含浸せしめ、次に該膜を金属塩溶液に浸漬し
て膜表面に直接金属を析出させる方法、後者はイオン交
換膜を介して金属塩溶液と還元剤溶液とを配し、還元剤
をイオン交換膜に浸透させて金属塩溶液側の膜上に金属
層を形威させる方法である。
Furthermore, the method described in Japanese Patent Publication No. 42-5014 and the method described in Japanese Patent Application Laid-open No. 55-38934 are so-called wet methods, and the former impregnates an ion exchange membrane with a solution containing a reducing agent. Next, the membrane is immersed in a metal salt solution to deposit the metal directly on the membrane surface.The latter is a method in which a metal salt solution and a reducing agent solution are placed through an ion exchange membrane, and the reducing agent is passed through the ion exchange membrane. This is a method in which a metal layer is formed on the membrane on the metal salt solution side by permeation.

しかしながら、これらの方法により得られる電解用接合
体はいずれも上記電解用接合体として要求される性質を
全て具備するものではない。
However, none of the electrolytic assemblies obtained by these methods has all the properties required for the electrolytic assemblies described above.

即ちUSP第3,4 3 2,3 5 5号明細書やU
SP第3,2 9 7,4 8 4号明細書に記載の方
法により製造される電解用接合体は、その金属膜厚が数
10〜100μと厚く、またポリテトラフロ口エチレン
を結合体として製膜されているために、電気抵抗が極め
て大きく、しかも接着性及び耐久性は不充分である。
In other words, USP No. 3,432,355 and U.S.P.
The electrolytic bonded body manufactured by the method described in SP No. 3,297,484 has a thick metal film of several tens to 100 microns, and the film is formed using polytetrafluoroethylene as a bond. Because of this, the electrical resistance is extremely high, and the adhesion and durability are insufficient.

また特公昭42−5014号公報に記載の方法では、イ
オン交換膜上に含浸される還元剤の量は限られており、
それ故イオン交換膜上に極めて薄い金属層が形成される
に過ぎず、その結果該方法により製造される電解用接合
体は接着性及び耐久性に乏しいものである。
Furthermore, in the method described in Japanese Patent Publication No. 42-5014, the amount of reducing agent impregnated onto the ion exchange membrane is limited;
Therefore, only a very thin metal layer is formed on the ion exchange membrane, and as a result, the electrolytic assembly produced by this method has poor adhesion and durability.

また特開昭55−38934号公報に記載の方法により
製造される電解用接合体は上記の方法で得られる電解用
接合体に比し幾分改善されるものの、該方法では不均一
な厚みを有する金属層がイオン交換膜上に形成されるに
止まり、それ故どの箇所を取り上げても必要最小限の厚
みを有するという金属層をイオン交換膜上に形威させる
ためには多量の金属が必要となり経済面での不利は避け
られない。
Furthermore, although the electrolytic assembly produced by the method described in JP-A-55-38934 is somewhat improved compared to the electrolytic assembly obtained by the above method, the method does not allow for uneven thickness. Therefore, a large amount of metal is required to form a metal layer on the ion exchange membrane that has the minimum necessary thickness no matter where it is picked up. Therefore, economic disadvantage is inevitable.

さらに−ヒ記従来の方法のいずれの場合も複雑な装置や
煩雑な操作を必要とし、そのため犬型の電解用接合体を
多量に製造することは極めて困難である。
Furthermore, all of the conventional methods described above require complicated equipment and complicated operations, making it extremely difficult to produce large quantities of dog-shaped electrolytic conjugates.

本発明者は斯かる現状に鑑み上記欠点のない電解用接合
体の製造法を開発すべく鋭意研究を重ねてきた。
In view of the current situation, the present inventor has conducted extensive research in order to develop a method for producing an electrolytic assembly free of the above-mentioned drawbacks.

そしてその研究過程において、プラスチック表面にニッ
ケル、コバルト、銅等の卑金属の塩を室温下に吸着させ
、次に還元剤溶液で処理して金属塩を金属粒子に還元し
、更に無電解メッキする方法(特公昭54−39812
号公報参照)があることに着目し、斯かる方法を適用し
て電解用接合体を製造しようと試みた。
During the research process, a method was developed in which salts of base metals such as nickel, cobalt, and copper were adsorbed onto the plastic surface at room temperature, and then treated with a reducing agent solution to reduce the metal salts to metal particles, followed by electroless plating. (Special Public Interest Publication No. 54-39812
We focused on the fact that there is a method (see Japanese Patent Publication No. 1), and attempted to manufacture an electrolytic assembly by applying such a method.

即ちプラスチックの中から陽イオン交換膜を選択し、該
膜にニッケル、コバルト、銅等の卑金属の塩を室温下に
吸着させ、次に還元剤溶液で処理して金属塩を金属粒子
に還元し、更に無電解メッキして電解用接合体を製造す
ることを試みた。
That is, a cation exchange membrane is selected from among plastics, salts of base metals such as nickel, cobalt, and copper are adsorbed onto the membrane at room temperature, and then treated with a reducing agent solution to reduce the metal salts to metal particles. Furthermore, an attempt was made to manufacture an electrolytic assembly by electroless plating.

しかしながら、斯かる方法に従えば、還元剤処理により
微量の金属粒子が陽イオン交換膜上に付着されるに止ま
り、斯かる陽イオン交換膜を無電解メッキしても得られ
る金属層を陽イオン交換膜上に強固に付着し得ず、それ
故得られる電解用接合体は接着性に乏しく、また柔軟性
及び耐久性においても不充分であり、到底実用上の使用
に耐え得る電解用接合体を製造し難いことが判明した。
However, if such a method is followed, only a trace amount of metal particles will be deposited on the cation exchange membrane due to the reducing agent treatment, and the metal layer obtained even if such a cation exchange membrane is electrolessly plated will be coated with cations. The electrolytic bond cannot be firmly adhered to the exchange membrane, and therefore the resulting electrolytic bond has poor adhesion, and is also insufficient in flexibility and durability, making it impossible for the electrolytic bond to withstand practical use. It turned out to be difficult to manufacture.

本発明者は次に還元剤溶液の中から水素化硼素ナトリウ
ム溶液を選択し、陽イオン交換膜にニッケル、コバルト
、銅等の卑金属の塩を室温下に吸着させ、次に水素化硼
素ナトリウム水溶液で処理して金属塩を金属粒子に還元
し、更に無電解メッキして電解用接合体を製造すること
を試みた。
Next, the inventor selected a sodium borohydride solution from the reducing agent solutions, adsorbed salts of base metals such as nickel, cobalt, and copper on a cation exchange membrane at room temperature, and then added a sodium borohydride aqueous solution. An attempt was made to reduce the metal salts to metal particles by treating the metal with chlorine, and then perform electroless plating to produce an electrolytic bonded body.

しかしながら、斯かる方法に従った場合においても上記
方法と同様、水素化硼素ナl− IJウム処理により微
量の金属粒子が陽イオン交換膜上に付着されるに止まり
、斯かる陽イオン交換膜を無電解メッキしても得られる
金属層を陽イオン交換膜上に強固に付着し得す、それ故
得られる電解用接合体は接着性に乏しく、また柔軟性及
び耐久性においても不充分であり、到底実用上の使用に
耐え得る電解用接合体を製造し難いことが判明した。
However, even when this method is followed, as with the above method, only a trace amount of metal particles are deposited on the cation exchange membrane due to the sodium boron hydride treatment, and the cation exchange membrane is The metal layer obtained by electroless plating may be firmly adhered to the cation exchange membrane, but the resulting electrolytic bonded body has poor adhesion and is also insufficient in flexibility and durability. However, it has been found that it is extremely difficult to produce an electrolytic assembly that can withstand practical use.

而して更に引き続き研究を重ねた結果、陽イオン交換膜
に上記卑金属とは全く異なる白金族に属する金属のイオ
ンを室温乃至高温下にイオン交換吸着せしめ、次に水素
化硼素塩水溶液で処理して該膜の内表面に金属層を析出
させ、更に該イオン交換膜を上記金属の塩とジアルキル
アミンボランとを含有するという特定のアルカリ性水溶
液と接触させるという操作を推す場合に限り、電気抵抗
が小であり、柔軟性、接着性及び耐久性に優れた所望の
電解用接合体が得られるという事実を見い出した。
As a result of further research, we found that ions of a metal belonging to the platinum group, which is completely different from the above-mentioned base metals, were ion-exchanged and adsorbed onto a cation exchange membrane at room temperature to high temperature, and then treated with an aqueous solution of boron hydride salt. Electrical resistance can be reduced only if the ion exchange membrane is brought into contact with a specific alkaline aqueous solution containing a salt of the metal and a dialkylamine borane. It has been found that a desired electrolytic bonded body which is small in size and has excellent flexibility, adhesiveness and durability can be obtained.

本発明は斯かる知見に基づき完成されたものである。The present invention was completed based on this knowledge.

即ち本発明は、陽イオン交換膜に白金族に属する金属イ
オンを室温乃至高温下にイオン交換吸着せしめ、次いで
水素化硼素塩水溶液で処理して該膜の内表面に金属層を
析出させ、引き続き該膜を上記金属の塩とジアルキルア
ミンボランとを含有するアルカリ性水溶液と接触せしめ
て膜面の金属層を戒長させることを特徴とする電解用接
合体の製造法に係る。
That is, in the present invention, metal ions belonging to the platinum group are ion-exchanged and adsorbed onto a cation exchange membrane at room temperature to high temperature, and then treated with a boron hydride salt aqueous solution to deposit a metal layer on the inner surface of the membrane. The present invention relates to a method for producing a bonded body for electrolysis, which comprises bringing the membrane into contact with an alkaline aqueous solution containing a salt of the metal described above and a dialkylamine borane to lengthen the metal layer on the membrane surface.

本発明の方法によれば、電気抵抗が極めて小であり、陽
イオン交換膜に接合される金属層が柔軟性を有し、陽イ
オン交換膜と金属層との接着性が良好であり、また電解
時における金属層の剥離等がなく耐久性に優れているな
ど電解用接合体として要求されている全ての性質を具備
する電解用接合体を製造し得る。
According to the method of the present invention, the electrical resistance is extremely low, the metal layer bonded to the cation exchange membrane has flexibility, the adhesion between the cation exchange membrane and the metal layer is good, and It is possible to produce an electrolytic bonded body that has all the properties required for an electrolytic bonded body, such as no peeling of the metal layer during electrolysis and excellent durability.

更に本発明の方法では、複雑な装置や煩雑な操作は不必
要であり、それ故犬型の電解用接合体の量産も容易に行
ない得る。
Furthermore, the method of the present invention does not require complicated equipment or complicated operations, and therefore can easily mass-produce dog-shaped electrolytic conjugates.

また本発明の方法では、イオン交換吸着及び水素化硼素
塩水溶液処理された陽イオン交換膜を特定のアルカリ性
水溶液と接触させる際の条件を選択することにより任意
の厚みを有する金属層が接合された電解用接合体を得る
ことができる。
Furthermore, in the method of the present invention, a metal layer having an arbitrary thickness can be bonded by selecting conditions for contacting a cation exchange membrane treated with ion exchange adsorption and a boron hydride salt aqueous solution with a specific alkaline aqueous solution. A conjugate for electrolysis can be obtained.

加えて本発明で得られる電解用接合体は、金属層中に均
一なミクロポアを有し、そのため電解時において水の補
給及びガスの放出をスムーズに行なうことができ、電解
用接合体として極めて好ましいものである。
In addition, the electrolytic assembly obtained by the present invention has uniform micropores in the metal layer, which allows for smooth water replenishment and gas release during electrolysis, making it extremely desirable as an electrolytic assembly. It is something.

本発明の方法においては、まず陽イオン交換膜に白金族
に属する金属イオンを室温乃至高温下にイオン交換吸着
せしめる(吸着工程)。
In the method of the present invention, metal ions belonging to the platinum group are first ion-exchanged and adsorbed onto a cation exchange membrane at room temperature to high temperature (adsorption step).

陽イオン交換膜としては特に限定がなく公知のものを広
く使用できるが、特にスルホン酸基又はカルボン酸基を
有する過フツ化炭化水素樹脂膜を用いるのが好ましい。
The cation exchange membrane is not particularly limited and a wide variety of known membranes can be used, but it is particularly preferable to use a perfluorinated hydrocarbon resin membrane having sulfonic acid groups or carboxylic acid groups.

使用される陽イオン交換膜の膜厚は通常0.05〜0、
41ILr/L程度、好ましくは0.1〜0.31n7
1L程度である。
The thickness of the cation exchange membrane used is usually 0.05 to 0.
About 41ILr/L, preferably 0.1 to 0.31n7
It is about 1L.

白金族に属する金属としては具体的には白金、ロジウム
、ルテニウム、パラジウム、イリジウム等を挙げること
ができ、斯かる金属は陽イオン交換膜に金属イオンの形
で吸着せしめられる。
Specific examples of metals belonging to the platinum group include platinum, rhodium, ruthenium, palladium, and iridium, and these metals are adsorbed on the cation exchange membrane in the form of metal ions.

金属イオンの形態としては特に限定されないが、本発明
ではアンミン錯イオンの形態で陽イオン交換膜に吸着さ
せるのがよい。
Although the form of the metal ion is not particularly limited, in the present invention, it is preferable to adsorb it on the cation exchange membrane in the form of an ammine complex ion.

陽イオン交換膜に白金族に属する金属イオンをイオン交
換吸着せしめるための具体的方法としては、例えば白金
族に属する金属の塩を含有するアルカリ性水溶液を室温
乃至高温に保持し、陽イオン交換膜を浸漬すればよい。
As a specific method for ion exchange adsorption of metal ions belonging to the platinum group onto a cation exchange membrane, for example, an alkaline aqueous solution containing a salt of a metal belonging to the platinum group is maintained at room temperature to high temperature, and the cation exchange membrane is Just soak it.

白金族に属する金属の塩としては、より具体的には白金
、ロジウム、ルテニウム、パラジウム、イリジウム等の
金属の塩化物、硫酸塩、硝酸塩、過塩素酸塩、クロロア
ンモニウム塩等を挙げることができ、斯かる金属塩をア
ルカリ性水溶液中に通常O、0001〜0.1モル/l
.好ましくは0.01〜0.05モル/lの濃度で存在
するように配合するのがよい。
More specifically, salts of metals belonging to the platinum group include chlorides, sulfates, nitrates, perchlorates, chloroammonium salts, etc. of metals such as platinum, rhodium, ruthenium, palladium, and iridium. , such a metal salt is usually added to an alkaline aqueous solution at a concentration of O, 0001 to 0.1 mol/l.
.. Preferably, it is blended in a concentration of 0.01 to 0.05 mol/l.

アルカリ性水溶液としては、上記金属塩をアンミン錯イ
オンの形態にするため通常はアンモニア水が使用される
As the alkaline aqueous solution, ammonia water is usually used in order to convert the metal salt into an ammine complex ion form.

アンモニア水としては通常0.1〜5重量%、好ましく
は0.5〜2重量%の濃度のものが使用される。
The ammonia water used usually has a concentration of 0.1 to 5% by weight, preferably 0.5 to 2% by weight.

上記金属塩としてクロロアンモニウム塩を用いる場合に
は、アルカリ性水溶液としてアンモニア水を使用しなく
ても金属イオンがアンミン錯イオンの形態で存在し得る
ため、斯かるアンミン錯イオンが安定に存在し得るよう
なpHの範囲内で他の公知のアルカリの水溶液を用いる
ことも本発明では可能である。
When a chloroammonium salt is used as the metal salt, the metal ion can exist in the form of an ammine complex ion without using aqueous ammonia as the alkaline aqueous solution. It is also possible in the present invention to use other known aqueous alkaline solutions within the pH range.

本発明では上記アルカリ性水溶液を室温乃至高温に保持
しておくことを必須としているが、その温度としては通
常室温〜90℃程度、好ましくは60〜80℃である。
In the present invention, it is essential to maintain the alkaline aqueous solution at room temperature to high temperature, and the temperature is usually room temperature to about 90°C, preferably 60 to 80°C.

室温より低いと、金属イオンが陽イオン交換膜に吸着し
難くなり、接着性、耐久性等に優れた所望の電解用接合
体を得ることが困難となる。
If the temperature is lower than room temperature, it becomes difficult for metal ions to be adsorbed on the cation exchange membrane, making it difficult to obtain a desired electrolytic assembly with excellent adhesiveness, durability, and the like.

また90℃より高いとアンモニア等が蒸発しアルカリ性
水溶液の組成が変化するので好ましくない。
Further, if the temperature is higher than 90°C, ammonia etc. will evaporate and the composition of the alkaline aqueous solution will change, which is not preferable.

アルカリ性水溶液に陽イオン交換膜を浸漬する操作の具
体例を示せば、例えば陽イオン交換膜をセルにはさみ、
該交換膜が大型膜である場合には更に保持具を付し、次
にセルの画室に室温乃至高温に保持されたアルカリ性水
溶液を加えるのがよい。
To give a specific example of the operation of immersing a cation exchange membrane in an alkaline aqueous solution, for example, the cation exchange membrane is sandwiched between cells,
When the exchange membrane is a large membrane, it is preferable to further attach a holder and then add an alkaline aqueous solution maintained at room temperature to high temperature to the compartment of the cell.

陽イオン交換膜に2種以上の金属イオンを吸着させよう
とする場合には、用いられるアルカリ性水溶液に2種以
上の金属の塩を添加しておけはよい。
When two or more metal ions are to be adsorbed onto the cation exchange membrane, it is advisable to add salts of the two or more metals to the alkaline aqueous solution used.

またセルの画室の一方ずつに異なる金属の塩を含有する
アルカリ性水溶液を加えることにより、その両面に異な
る金属イオンが吸着された陽イオン交換膜を得ることも
できる。
Furthermore, by adding an alkaline aqueous solution containing salts of different metals to one side of each compartment of the cell, a cation exchange membrane in which different metal ions are adsorbed on both sides can be obtained.

アルカリ性水溶液中への陽イオン交換膜の浸漬時間は通
常30〜90分程度であり、斯くして内表面に約0.5
〜2μの厚さに金属イオンが吸着された陽イオン交換膜
が製造される。
The cation exchange membrane is usually immersed in an alkaline aqueous solution for about 30 to 90 minutes, so that about 0.5
A cation exchange membrane with metal ions adsorbed to a thickness of ~2μ is produced.

本発明では次に金属イオンが吸着された陽イオン交換膜
を水素化硼素塩水溶液で処理して金属イオンを還元する
(還元工程)。
In the present invention, the cation exchange membrane on which metal ions have been adsorbed is then treated with an aqueous boron hydride salt solution to reduce the metal ions (reduction step).

本発明では水素化硼素塩水溶液で処理することを必須の
構或要件とする。
In the present invention, treatment with a boron hydride salt aqueous solution is an essential requirement.

而して他の公知の還元剤、例えはヒドラジン、ヒドロキ
シアミン、ジメチルアミンボラン等により該陽イオン交
換膜を処理しても、金属イオンが還元されないか、また
還元される場合があっても接着性良好な金属層が陽イオ
ン交換膜の内表面に形成され得ず、その結果本発明の所
期の目的とする電解用接合体は到底製造され得ない。
Therefore, even if the cation exchange membrane is treated with other known reducing agents, such as hydrazine, hydroxyamine, dimethylamine borane, etc., the metal ions are not reduced, or even if they are reduced, the adhesion remains. A metal layer with good properties cannot be formed on the inner surface of the cation exchange membrane, and as a result, the electrolytic assembly which is the intended object of the present invention cannot be manufactured at all.

水素化硼素塩としては例えば水素化硼素ナトリウム、水
素化硼素カリウム、水素化硼素アンモニウム等を挙げる
ことができる。
Examples of boron hydride salts include sodium borohydride, potassium borohydride, and ammonium borohydride.

本発明で用いられる水素化硼素塩水溶液のpHは10〜
12の範囲内に調節されているのがよい。
The pH of the boron hydride salt aqueous solution used in the present invention is 10 to
It is preferable to adjust it within the range of 12.

水素化硼素塩水溶液のp Hが12より高いと、陽イオ
ン交換膜に吸着されている金属イオンが脱離し該交換膜
の内表面に金属層を形成させ難くなる。
When the pH of the boron hydride salt aqueous solution is higher than 12, metal ions adsorbed on the cation exchange membrane are desorbed, making it difficult to form a metal layer on the inner surface of the exchange membrane.

また水素化硼素塩水溶液のpHが10より低いと、金属
イオンが金属粒子に還元される送度が遅くなり実用的で
はない。
Furthermore, if the pH of the boron hydride salt aqueous solution is lower than 10, the rate at which metal ions are reduced to metal particles becomes slow, making it impractical.

水素化硼素塩水溶液のpHの調節は、陽イオン交換膜に
吸着された金属イオンの脱離を起こさないような、或い
は陽イオン交換膜面及び接合された金属自体の触媒能を
損なうことのないような塩基を用いて行なうのがよい。
The pH of the boron hydride salt aqueous solution should be adjusted in such a way that the metal ions adsorbed on the cation exchange membrane will not be desorbed, or the catalytic ability of the cation exchange membrane surface and the bonded metal itself will not be impaired. It is preferable to use a base such as

斯かる塩基としては例えばアンモニア水や硼酸ナトIJ
ウムと水酸化ナトリウムとによるpH緩衝液が適当であ
る。
Examples of such bases include aqueous ammonia and sodium borate IJ.
A pH buffer of 100 ml and sodium hydroxide is suitable.

水素化硼素塩水溶液中に存在させるべき水素化硼素塩の
濃度としては特に制限されず広い範囲内で適宜選択する
ことができるが、通常0.02〜2モル/l、好ましく
は0.05〜0.5モル/lとするのがよい。
The concentration of the boron hydride salt to be present in the boron hydride salt aqueous solution is not particularly limited and can be appropriately selected within a wide range, but is usually 0.02 to 2 mol/l, preferably 0.05 to 2 mol/l. It is preferable to set it to 0.5 mol/l.

金属イオンが吸着された陽イオン交換膜を水素化硼素塩
水溶液で処理する具体例を示せば、例えば該陽イオン交
換膜を水素化硼素塩水溶液中に浸漬すればよい。
A specific example of treating a cation exchange membrane on which metal ions have been adsorbed with a boron hydride salt aqueous solution is, for example, by immersing the cation exchange membrane in a boron hydride salt aqueous solution.

この際水素化硼素酸水溶液は通常室温〜60℃程度、好
ましくは40〜50℃に保持されるのがよく、浸漬時間
は一般に30〜90分程度でよい。
At this time, the hydrogenated boric acid aqueous solution is usually kept at room temperature to about 60°C, preferably 40 to 50°C, and the immersion time is generally about 30 to 90 minutes.

斯くして陽イオン交換膜の内表面に約0.5〜2μの厚
さに金属層が形成された陽イオン交換膜が製造される。
In this way, a cation exchange membrane is produced in which a metal layer is formed on the inner surface of the cation exchange membrane to a thickness of about 0.5 to 2 microns.

本発明においては金属層は陽イオン交換膜の内表面に形
威されており、それ故錨効果により金属層と陽イオン交
換膜とが非常に強い接合力により結びつけられた状態に
なっている。
In the present invention, the metal layer is formed on the inner surface of the cation exchange membrane, so that the metal layer and the cation exchange membrane are bound together by a very strong bonding force due to the anchor effect.

また該金属層は、金属光沢を示すと共に既に十分な電気
伝導性を有しており、この点において従来のプラスチッ
クメッキにおいて増感処理で形或される活性化層とは本
質的に相違している。
In addition, the metal layer exhibits metallic luster and already has sufficient electrical conductivity, and in this respect it is essentially different from the activation layer formed by sensitization treatment in conventional plastic plating. There is.

本発明では更に上記で得られる内表面に金属層が埋込ま
れた陽イオン交換膜を白金族に属する金属の塩とジアル
キルアミンボランとを含有するアルカリ性水溶液と接触
させる(戒長工程)。
In the present invention, the cation exchange membrane obtained above with a metal layer embedded in its inner surface is further brought into contact with an alkaline aqueous solution containing a salt of a metal belonging to the platinum group and a dialkylamine borane (Kaicho step).

ここで白金族に属する金属の塩としては上記吸着工程に
おいて記載した金属塩をいずれも使用でき、斯かる金属
塩をアルカリ性水溶液中に通常0.0001〜0.1モ
ル/l,好ましくは0.01〜0.05モノレ/lの濃
度で存在するように配合するのがよい。
As the salt of the metal belonging to the platinum group, any of the metal salts described in the above adsorption step can be used, and such metal salt is added in an alkaline aqueous solution, usually 0.0001 to 0.1 mol/l, preferably 0.0001 to 0.1 mol/l, preferably 0. It is preferable to blend it so that it is present at a concentration of 0.01 to 0.05 monole/l.

またジアルキルアミンボランとしては例えばジメチルア
ミンボラン、ジエチルアミンボラン等を挙げることがで
き、斯かるジアルキルアミンボランをアルカリ性水溶液
中に通常0.05〜0.5モル/L好ましくは0.1〜
0.2モル/lの濃度で存在するように配合するのがよ
い。
Further, examples of the dialkylamine borane include dimethylamine borane, diethylamine borane, etc., and the dialkylamine borane is usually added in an alkaline aqueous solution of 0.05 to 0.5 mol/L, preferably 0.1 to 0.5 mol/L.
It is preferable to blend it so that it is present at a concentration of 0.2 mol/l.

この成長工程において用いられるアルカリ性水溶液のp
Hは8〜13の範囲内にあれば特に制限がなく、陽イオ
ン交換膜に接合される金属の種類に応じてそのpHを適
宜選択すればよい。
p of the alkaline aqueous solution used in this growth process.
H is not particularly limited as long as it is within the range of 8 to 13, and the pH may be appropriately selected depending on the type of metal bonded to the cation exchange membrane.

pHの調節は通常アンモニア水や硼酸塩と水酸化アルカ
リとからなる緩衝液を用いて行なわれる。
The pH is normally adjusted using a buffer solution consisting of aqueous ammonia or borate and alkali hydroxide.

成長工程においては還元剤としてジアルキルアミンボラ
ンを使用することを必須の構戒要件としており、ジアル
キルアミンボランを用いることにより従来の化学メッキ
における如く抑制剤を使用しなくても陽イオン交換膜の
内表面に形或された金属層の表面で選択的に戒長し、該
金属層の表面に強固に接合された良好な金属層が形成さ
れる。
In the growth process, it is essential to use dialkylamine borane as a reducing agent. By using dialkylamine borane, the inner part of the cation exchange membrane can be removed without using an inhibitor like in conventional chemical plating. The metal layer formed on the surface is selectively stretched to form a good metal layer that is firmly bonded to the surface of the metal layer.

この際ジアルキルアミンボランの代りに水素化硼素塩、
ヒドラジン等の他の還元剤を配合したアルカリ性水溶液
で処理したとしても、陽イオン交換膜の内表面に形成さ
れた金属層の表面で選択的或長は起こらず、該金属層の
表面に良好な金属層を形戒し得ない。
At this time, boron hydride salt was used instead of dialkylamine borane.
Even when treated with an alkaline aqueous solution containing other reducing agents such as hydrazine, selective elongation does not occur on the surface of the metal layer formed on the inner surface of the cation exchange membrane. The metal layer cannot be controlled.

内表面に金属層が埋込まれた陽イオン交換膜を白金族に
属する金属の塩及びジアルキルアミンボランとを含有す
るアルカリ性水溶液に接触させる具体例を示せば、例え
ば該陽イオン交換膜をセルにはさみ、次にセルの画室に
高温に保持されたアルカリ性水溶液を加えるのがよい。
A specific example of contacting a cation exchange membrane with a metal layer embedded in the inner surface with an alkaline aqueous solution containing a salt of a metal belonging to the platinum group and a dialkylamine borane is, for example, when the cation exchange membrane is placed in a cell. It is better to add scissors and then an aqueous alkaline solution kept at high temperature to the compartment of the cell.

該アルカリ性水溶液の添加量は成長させて得ようとする
金属層の膜厚に応じて適宜決定すればよい。
The amount of the alkaline aqueous solution added may be appropriately determined depending on the thickness of the metal layer to be grown.

最適条件下においては還元反応は金属面で自己触媒作用
によって選択的に進み、アルカリ性水溶液中に存在する
金属イオンが殆んど消費されるまで続く。
Under optimal conditions, the reduction reaction proceeds selectively at the metal surface by autocatalysis and continues until most of the metal ions present in the alkaline aqueous solution are consumed.

上記陽イオン交換膜に接触させる際のアルカリ性水溶液
は通常60〜90℃好ましくは70〜80℃に加熱され
ているのがよい。
The alkaline aqueous solution brought into contact with the cation exchange membrane is usually heated to 60 to 90°C, preferably 70 to 80°C.

陽イオン交換膜とアルカリ性水溶液との接触時間は通常
30〜90分程度であり、斯くして陽イオン交換膜に膜
厚2〜5μの金属層が接合された本発明の電解用接合体
が製造される。
The contact time between the cation exchange membrane and the alkaline aqueous solution is usually about 30 to 90 minutes, and thus the electrolysis assembly of the present invention in which the metal layer with a thickness of 2 to 5 μm is bonded to the cation exchange membrane is manufactured. be done.

以上の方法により製造される本発明の電解用接合体は常
法に従い水洗、酸(例えば塩酸)洗浄後水中に保存され
る。
The electrolytic assembly of the present invention produced by the above method is washed with water and acid (for example, hydrochloric acid) according to a conventional method, and then stored in water.

本発明の方法により得られる接合金属層は、均一に分布
したミクロポアを有し、柔軟でしかも非常に強い接着性
を有する。
The bonded metal layer obtained by the method of the invention has uniformly distributed micropores, is flexible and has very strong adhesive properties.

このため電解時のガス抜けは良好であり、IOOA/d
m2以上の高電流密度において1000時間以上運転し
ても金属層の脱落は全く起こらない。
Therefore, gas release during electrolysis is good, and IOOA/d
Even after operating for more than 1,000 hours at a high current density of m2 or more, the metal layer does not fall off at all.

以下に実鉋例及び比較例を掲げる。Below are examples of actual planes and comparative examples.

実麓例 1 内径161n7IL1外径50關のフランジを持つL型
ガラス管(内径16mm)2本を用い、フランジ部ヲ合
ワせ、シリコンゴムをパッキングにして径30mmのナ
フイオン125膜〔デュポン社製、カチオン交換膜、当
量重量EW= 1 2 0 0、膜厚5ミル(約0.1
25mm))を挾んでメツキセルを組立てた。
Actual example 1 Using two L-shaped glass tubes (inner diameter 16 mm) with flanges of 161 mm, 7 L, and 50 mm in inner diameter, fit the flanges together, pack with silicone rubber, and use Nafion 125 membrane with a diameter of 30 mm [manufactured by DuPont]. , cation exchange membrane, equivalent weight EW=1200, membrane thickness 5 mils (approximately 0.1
25mm)) were sandwiched together to assemble Metsukicell.

ナフイオン膜は、接合に先立ち、2N−HClで30分
煮沸し、ついで水洗後、水で30分煮沸したものを水中
に保存し、使用時には濡れた状態でセットするようにし
た。
Prior to bonding, the naphion membrane was boiled in 2N-HCl for 30 minutes, then washed with water, boiled in water for 30 minutes, and stored in water, and set in a wet state when used.

接合は特に断わらない限り、つぎの工程に従って行った
Bonding was performed according to the following steps unless otherwise specified.

膜→HCl処理→水洗→吸着→水洗→還元→水洗→戒長
→水洗→HC7処理→熱水処理→水洗→接合体。
Membrane → HCl treatment → water washing → adsorption → water washing → reduction → water washing → Kaicho → water washing → HC7 treatment → hot water treatment → water washing → conjugate.

白金の接合はつぎの浴液を用いた。The following bath solution was used for platinum bonding.

吸着浴 塩化白金ptcl4 o.i5gアン
モニア水(28%) 2ml水
15mlpH
11.5吸着はL型セル
の各々にL7ml!づつ入れ、恒温水槽中で80℃、4
0分間保持した。
Adsorption bath platinum chloride ptcl4 o. i5g ammonia water (28%) 2ml water
15mlpH
11.5 adsorption is L7ml in each L type cell! Place them in a thermostatic water bath at 80℃ for 4 hours.
It was held for 0 minutes.

還元浴 水素化ホウ素ナトリウム 0.1gアンモ
ニア水(28%)2ml 水 15wl
l還元は上記浴液をセルの画室に各17mlづつ入れ4
0℃、30分間保持した。
Reduction bath Sodium borohydride 0.1g Ammonia water (28%) 2ml Water 15wl
For 1 reduction, put 17 ml of the above bath solution into each compartment of the cell.
It was held at 0°C for 30 minutes.

成長浴 塩化白金PtC740.0 2 g アンモニア水(28%) 2mlジメ
チルアミンボラン(5%水溶i) 2ml水
13I71l或長
は上記浴液を各々17TILlづつ入れ、80℃、30
分間保持した。
Growth bath Platinum chloride PtC740.0 2 g Ammonia water (28%) 2 ml Dimethylamine borane (5% water soluble i) 2 ml water
Add 17TILl each of the above bath solutions to 13I71L, and heat at 80℃ for 30
Hold for minutes.

この処理条件で、浴液中での白金の析出は起らず接合金
属面に選択的に析出した。
Under these treatment conditions, platinum did not precipitate in the bath solution, but selectively precipitated on the bonded metal surfaces.

上記の処理を経て、膜の両面に1.6間径、5μ厚の白
金が接合できた。
Through the above treatment, platinum with a diameter of 1.6 μm and a thickness of 5 μm was bonded to both sides of the membrane.

実捲例 2 実椎例1と同様のセルを用い、ナフイオン120膜〔膜
厚10ミル(約0.251n11L)〕を実鉋例1と同
様に前処理して一方に白金、他方にロジウムを接合した
Actual Example 2 Using the same cell as Actual Example 1, a Nafion 120 membrane [film thickness 10 mils (approximately 0.251n11L)] was pretreated in the same manner as Actual Example 1, and one side was coated with platinum and the other side was coated with rhodium. Joined.

白金側の浴液は実推例1と同様な処法によった。The bath solution on the platinum side was prepared in the same manner as in Example 1.

ロジウム側の浴液は以下の組成のものを使用した。The bath liquid on the rhodium side had the following composition.

吸着浴 塩化ロジウムRh(J!30.0 2 gアンモニア水
(28%) 2ml水
15TIll吸着は80℃
、60分行った。
Adsorption bath Rhodium chloride Rh (J! 30.0 2 g Ammonia water (28%) 2 ml water
15TIll adsorption is 80℃
, went for 60 minutes.

還元浴 水素化ホウ素ナトリウム 0.05gアンモ
ニア水(28%) 2ml水
15TLl還元は6
0゜C、60分行った。
Reduction bath Sodium borohydride 0.05g Ammonia water (28%) 2ml water
15TLl reduction is 6
The test was carried out at 0°C for 60 minutes.

成長浴 塩化ロジウムRh(J?30. 0 2 gアンモニア
水(28%) 2mlジメチルアミン
ボラン(5%水溶液)1ml水
14TLl戒長は75゜C1 60分
行った。
Growth bath Rhodium chloride Rh (J?30.0 2 g Ammonia water (28%) 2 ml Dimethylamine borane (5% aqueous solution) 1 ml water
14TLl Kaicho went to 75°C1 for 60 minutes.

ロジウムの析出は金属面で選択的に進行した。Rhodium precipitation progressed selectively on the metal surface.

処理後の白金およびロジウムは5μおよび4μ厚の接合
体が得られた。
After treatment, bonded bodies of platinum and rhodium with a thickness of 5μ and 4μ were obtained.

実捲例 3 実捲例1と同様なセルを用い、ナフイオン125の片面
に白金、片面にイリジウムを接合した。
Actual Winding Example 3 Using a cell similar to Actual Winding Example 1, platinum was bonded to one side of Nafion 125 and iridium was bonded to the other side.

白金の処理浴は実麓例1により、イリジウムの処理浴は
以下のものを用いた。
The treatment bath for platinum was the same as in Example 1, and the treatment bath for iridium was as follows.

吸着浴 塩化イリジウムアンモニウム( NH4)2 I r
C l 60.1g アンモニア水 ITLl水
15mlp
H 10.5
吸着は80℃、60分行った。
Adsorption bath Iridium ammonium chloride (NH4)2 Ir
Cl 60.1g Ammonia water ITLl water
15mlp
H 10.5
Adsorption was carried out at 80°C for 60 minutes.

還元浴 pH緩衝液 0. I N−NaOH pH1 0.5’0.
1 M/ 11 H3 B04 1 2 m
il水素化ホウ素ナトIJウム(0.5%溶液) 5継
還元は40゜C1 60分行った。
Reduction bath pH buffer 0. IN-NaOH pH1 0.5'0.
1 M/ 11 H3 B04 1 2 m
il sodium borohydride (0.5% solution) Five-step reduction was carried out at 40°C for 60 minutes.

成長浴 塩化イリジウムI rcl)40.0 5 9pH緩衝
液 (0.IN NaOH十0.11VL4?H3BO4
) pH12.515ml ジメチルアミンボラン(5%溶液) 1 ml戒
長は75℃、30分行なった。
Growth bath Iridium chloride I rcl) 40.0 5 9 pH buffer (0.IN NaOH 10.11VL4?H3BO4
) pH 12.515 ml dimethylamine borane (5% solution) 1 ml was heated at 75° C. for 30 minutes.

成長浴液中でのイリジウム析出損失は0. 5 m9以
下であった。
The iridium precipitation loss in the growth bath was 0. It was less than 5 m9.

上記の処理によって白金およびイリジウムが5μおよび
3μ接合された接合体を得た。
By the above treatment, a bonded body in which platinum and iridium were bonded at 5μ and 3μ was obtained.

実焔例 4 実鉋例1と同様なセルを用い、白金とロジウムの合金を
接合した。
Actual Flame Example 4 Using a cell similar to Actual Planer Example 1, an alloy of platinum and rhodium was joined.

吸着浴 塩化白金r’tcl!4o.i g 塩化ロジウムRhCl30.0 5 g アンモニア水(28%) 2ml水
151nl吸
着は80°C1 45分行った。
Adsorption bath platinum chloride r'tcl! 4 o. i g Rhodium chloride RhCl30.0 5 g Ammonia water (28%) 2 ml water
151nl adsorption was carried out at 80°C for 145 minutes.

還元浴および操作は実焔例1と同様に行った。The reduction bath and operation were carried out in the same manner as in Actual Flame Example 1.

或長浴 塩化白金PtCl40.0 2 g 塩化ロジウムRhC730.0 2 g p I{緩衝液 pH1 1・0
(0.IN NaOH+0.1MAFI3BO4)
15mlジメチルアミンボラン(5%水溶液)
2ml成長は80℃、60分行った。
Long bath Platinum chloride PtCl40.0 2 g Rhodium chloride RhC730.0 2 g p I {Buffer pH1 1.0
(0.IN NaOH+0.1MAFI3BO4)
15ml dimethylamine borane (5% aqueous solution)
Growth of 2 ml was carried out at 80° C. for 60 minutes.

処理後、両面に4μの接合層をもつ接合体が得られた。After treatment, a bonded body with a bonding layer of 4μ on both sides was obtained.

電子顕微鏡による観察によって、各実推例で得た接合体
の断面から電極厚みを測定した。
The electrode thickness was measured from the cross section of the bonded body obtained in each practical example by observation using an electron microscope.

この結果を第1表に示す。The results are shown in Table 1.

実推例 5 実殉例1と同様のメツキセルにナフイオン117膜(E
W=1100、膜厚7ミル(0.175醋)〕を挾み、
白金の吸着温度を変えて行った。
Actual example 5 Nafion 117 membrane (E
W = 1100, film thickness 7 mil (0.175 ㆋ)],
The platinum adsorption temperature was varied.

実捲例1と同様の吸着溶液を用い、室温(25℃)で1
2時間吸着させ、以後実症例1と同様に処理して白金接
合体を得た。
Using the same adsorption solution as in practical example 1, 1
After adsorption for 2 hours, the platinum conjugate was then treated in the same manner as in actual case 1 to obtain a platinum conjugate.

得られた接合体の性質、電解性能は実麓例1のものと同
様であった。
The properties and electrolytic performance of the obtained bonded body were similar to those of Example 1.

実強例 6 実捲例1と同様のメツキセルにナフイオン117膜を挾
み、一方に実帷例1の白金吸着液、他方に実捲例2のロ
ジウム吸着液を配し、室温(25゜C)で15時間放置
して吸着させ、以後実椎例2と同様に処理して白金一膜
一ロジウム接合体を得た。
Practical Strengthening Example 6 A Nafion 117 membrane was sandwiched between the same Metxcel as in Practical Winding Example 1, and the platinum adsorption liquid of Practical Practical Example 1 was placed on one side and the rhodium adsorption liquid of Practical Practical Example 2 was placed on the other. ) for 15 hours for adsorption, and then treated in the same manner as Example 2 to obtain a platinum-one-film-one-rhodium conjugate.

この接合体は、実焔例2で得られた接合体と同様の性能
を示した。
This bonded body showed the same performance as the bonded body obtained in Actual Flame Example 2.

実椎例 7 実晦例1と同様のメツキセルにナフイオン117膜を挾
み、実焔例1の白金吸着液を加え、25゜C、50゜C
.60℃及び80°Cで吸着させた場合の白金吸着速度
を比較した。
Practical Example 7 A Nafion 117 membrane was sandwiched in the same Metxel as in Practical Example 1, and the platinum adsorption solution from Practical Flame Example 1 was added, and the mixture was heated at 25°C and 50°C.
.. The platinum adsorption rates when adsorbed at 60°C and 80°C were compared.

白金として1,O■/dの吸着量に達する時間は、それ
ぞれ12hr(25°G)、8hr(50’C)、4h
r(600C)及びlhr(800G)であった。
The time required to reach an adsorption amount of 1,0/d for platinum is 12 hours (25°G), 8 hours (50'C), and 4 hours, respectively.
r (600C) and lhr (800G).

比較例 I USP第3,4 3 2,3 5 5号明細書に記載の
方法に従い接合体を得た。
Comparative Example I A zygote was obtained according to the method described in USP No. 3,432,355.

即ち白金黒粉末をテトラフルオ口エチレン分散体(デュ
ポン社製、テフロン30J)と混合し、アルミホイル上
に塗布して350°Cで30分間焼結後アルミホイルを
アルカリ水溶液で溶解除去した。
That is, platinum black powder was mixed with a tetrafluoroethylene dispersion (manufactured by DuPont, Teflon 30J), coated on aluminum foil, sintered at 350°C for 30 minutes, and then the aluminum foil was dissolved and removed with an aqueous alkaline solution.

得られる薄膜を予め熱安定化したナフイオン125の両
面に熱圧着して接合体を得た。
The resulting thin film was thermocompression bonded to both sides of Nafion 125, which had been thermally stabilized in advance, to obtain a bonded body.

この薄膜は、厚みが60μであり、白金黒が7m9/一
の割合で存在しており、テトラフルオ口エチレン含量が
20重量%であった。
This thin film had a thickness of 60 μm, platinum black was present at a ratio of 7 m 9 /1, and the content of tetrafluoroethylene was 20% by weight.

比較例 2 特開昭55−38934号公報に記載の方法に従い接合
体を得た。
Comparative Example 2 A bonded body was obtained according to the method described in JP-A-55-38934.

即ち金属塩溶液として3%塩化白金酸水溶液を用い、ま
た還元剤として5%水素化硼素ナl− IJウム水溶液
を用いた。
That is, a 3% chloroplatinic acid aqueous solution was used as the metal salt solution, and a 5% sodium boron hydride aqueous solution was used as the reducing agent.

ナフイオンの背面から還元剤を浸透させて金属塩溶液側
に白金を析出させて接合体を得た。
A reducing agent was infiltrated from the back side of the naphion and platinum was deposited on the metal salt solution side to obtain a bonded body.

白金は7■/−の割合で存在しており、白金層の厚みは
10μであった。
Platinum was present at a ratio of 7 .mu./-, and the thickness of the platinum layer was 10 .mu.m.

実鉋例1、比較例1又は比較例2で得られた接合体をチ
タン製の電極間に白金メッシュを介して挾んでセルを組
立て、75℃に保った純水中に入れて電解し、この場合
の電流密度一槽電圧変化を測定した。
The bonded body obtained in Actual Plane Example 1, Comparative Example 1, or Comparative Example 2 was sandwiched between titanium electrodes via a platinum mesh to assemble a cell, and the cell was placed in pure water kept at 75°C for electrolysis. In this case, the current density and voltage change in one tank was measured.

得られた結果を第1図に示す。第1図において、曲線A
は比較例1で得られた接合体、曲線Bは比較例2で得ら
れた接合体、曲線Cは実帷例1で得られた接合体につい
てのグラフである。
The results obtained are shown in FIG. In Figure 1, curve A
is a graph for the joined body obtained in Comparative Example 1, curve B is for the joined body obtained in Comparative Example 2, and curve C is for the joined body obtained in Practical Example 1.

また上記接合体の内部抵抗を上記と同じセルによりカレ
ントインクラプター法(90’C)で測定した。
Further, the internal resistance of the above bonded body was measured by the current inruptor method (90'C) using the same cell as above.

その結果実椎例1で得られた接合体の内部抵抗は0.2
0Ω一一であり、比較例1で得られた接合体の内部抵抗
は0.35Ω−aであり、また比較例2で得られた接合
体の内部抵抗は0.20Ω一であった。
As a result, the internal resistance of the zygote obtained in actual vertebra example 1 was 0.2
The internal resistance of the bonded body obtained in Comparative Example 1 was 0.35Ω-a, and the internal resistance of the bonded body obtained in Comparative Example 2 was 0.20Ω-a.

【図面の簡単な説明】[Brief explanation of drawings]

第1図は3種類の接合体についての槽電圧と電流密度と
の関係を示すグラフである。
FIG. 1 is a graph showing the relationship between cell voltage and current density for three types of bonded bodies.

Claims (1)

【特許請求の範囲】 1 陽イオン交換膜に白金族に属する金属イオンを室温
乃至高温下にイオン交換吸着せしめ、次いで水素化硼素
塩水溶液で処理して該膜の内表面に金属層を析出させ、
引き続き該膜を上記金属の塩とジアルキルアミンボラン
とを含有するアルカリ性水溶液と接触せしめて膜面の金
属層を成長させることを特徴とする電解用接合体の製造
方法。 2 陽イオン交換膜がスルホン酸基又はカルボン酸基を
有する過フツ化炭化水素樹脂膜である特許請求の範囲第
1項記載の方法。 3 金属イオンがアンミン錯イオン形態にある陽イオン
である特許請求の範囲第1項又は第2項記載の方法。 4 イオン交換吸着を室温〜90゜Cにて行なう特許請
求の範囲第1項乃至第3項のいずれかに記載の方法。 5 イオン交換吸着を60〜80℃にて行なう特許請求
の範囲第1項乃至第3項のいずれかに記載の方法。 6 水素化硼素塩水溶液のp I{が10〜12である
特許請求の範囲第1項乃至第5項のいずれかに記載の方
法。 7 陽イオン交換膜の内表面に析出する金属層の層厚を
0.5μ以上となす特許請求の範囲第1項乃至第6項の
いずれかに記載の方法。 8 上記金属の塩が塩化物、硫酸塩、硝酸塩、過塩素酸
塩又はクロロアンモニウム塩の形態にある特許請求の範
囲第1項乃至第7項のいずれかに記載の方法。
[Claims] 1. A method in which metal ions belonging to the platinum group are ion-exchanged and adsorbed onto a cation exchange membrane at room temperature to high temperature, and then treated with an aqueous boron hydride solution to deposit a metal layer on the inner surface of the membrane. ,
A method for producing a bonded body for electrolysis, characterized in that the membrane is subsequently brought into contact with an alkaline aqueous solution containing a salt of the metal and a dialkylamine borane to grow a metal layer on the membrane surface. 2. The method according to claim 1, wherein the cation exchange membrane is a perfluorinated hydrocarbon resin membrane having a sulfonic acid group or a carboxylic acid group. 3. The method according to claim 1 or 2, wherein the metal ion is a cation in the form of an ammine complex ion. 4. The method according to any one of claims 1 to 3, wherein the ion exchange adsorption is carried out at room temperature to 90°C. 5. The method according to any one of claims 1 to 3, wherein the ion exchange adsorption is carried out at 60 to 80°C. 6. The method according to any one of claims 1 to 5, wherein p I{ of the boron hydride salt aqueous solution is 10 to 12. 7. The method according to any one of claims 1 to 6, wherein the thickness of the metal layer deposited on the inner surface of the cation exchange membrane is 0.5 μm or more. 8. A method according to any one of claims 1 to 7, wherein the salt of the metal is in the form of a chloride, sulfate, nitrate, perchlorate or chloroammonium salt.
JP56020489A 1981-02-13 1981-02-13 Manufacturing method of electrolytic assembly Expired JPS5847471B2 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP56020489A JPS5847471B2 (en) 1981-02-13 1981-02-13 Manufacturing method of electrolytic assembly

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP56020489A JPS5847471B2 (en) 1981-02-13 1981-02-13 Manufacturing method of electrolytic assembly

Publications (2)

Publication Number Publication Date
JPS57134586A JPS57134586A (en) 1982-08-19
JPS5847471B2 true JPS5847471B2 (en) 1983-10-22

Family

ID=12028555

Family Applications (1)

Application Number Title Priority Date Filing Date
JP56020489A Expired JPS5847471B2 (en) 1981-02-13 1981-02-13 Manufacturing method of electrolytic assembly

Country Status (1)

Country Link
JP (1) JPS5847471B2 (en)

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JPH01319683A (en) * 1988-06-20 1989-12-25 Electroplating Eng Of Japan Co Platinum colloidal solution and electroless platinum plating method using the same solution and production of platinum carrier
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USRE37307E1 (en) 1994-11-14 2001-08-07 W. L. Gore & Associates, Inc. Ultra-thin integral composite membrane
US6054230A (en) 1994-12-07 2000-04-25 Japan Gore-Tex, Inc. Ion exchange and electrode assembly for an electrochemical cell
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* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
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JP2010102953A (en) * 2008-10-23 2010-05-06 Kurita Water Ind Ltd Microbiological power generation device and positive electrode for the microbiological power generation device

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