JPS5848627B2 - Metal plating method for linear objects - Google Patents
Metal plating method for linear objectsInfo
- Publication number
- JPS5848627B2 JPS5848627B2 JP56126502A JP12650281A JPS5848627B2 JP S5848627 B2 JPS5848627 B2 JP S5848627B2 JP 56126502 A JP56126502 A JP 56126502A JP 12650281 A JP12650281 A JP 12650281A JP S5848627 B2 JPS5848627 B2 JP S5848627B2
- Authority
- JP
- Japan
- Prior art keywords
- metal
- heating tube
- crucible
- metal plating
- plating
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
Classifications
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/24—Vacuum evaporation
- C23C14/243—Crucibles for source material
Landscapes
- Chemical & Material Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Optical Fibers, Optical Fiber Cores, And Optical Fiber Bundles (AREA)
- Surface Treatment Of Glass Fibres Or Filaments (AREA)
- Physical Vapour Deposition (AREA)
Description
【発明の詳細な説明】
本発明は真空蒸着による線状体の金属メッキ方法に関す
る。DETAILED DESCRIPTION OF THE INVENTION The present invention relates to a method of metal plating a linear body by vacuum deposition.
光ファイバに金属メッキを施す手段として、1)電気メ
ッキ(無電解メッキ、電解メッキ)、i1)デイツピン
グ、iii)真空メッキ等が有力であるが、夫々は次の
ような欠点を有している。Promising methods for applying metal plating to optical fibers include 1) electroplating (electroless plating, electrolytic plating), i1) dipping, and iii) vacuum plating, but each has the following drawbacks. .
即ち、1)においては、光ファイバが水分にさらされる
ので伝送ロスが増す、11)においては、被覆膜が偏肉
し、ひび割れが生ずる、そして最後に111)の場合、
膜厚が充分な厚さにならず、従ってメッキ速度を上げる
ことができず、また蒸発金属の歩留りが悪い。That is, in case 1), the optical fiber is exposed to moisture, which increases transmission loss, in case 11), the coating film becomes uneven in thickness and cracks occur, and finally in case 111),
The film thickness is not sufficient, so the plating rate cannot be increased, and the yield of evaporated metal is poor.
上記:)及び11)の欠点は、本質的な問題であり、現
段階での技術的解決は困難と思われる。The above drawbacks:) and 11) are essential problems, and it seems difficult to solve them technically at this stage.
この点、111)における欠点は本質的なものではなく
、技術的に解決可能であり、従って本発明は上記3つの
手段の中最後のiii)を対象とするものである。In this point, the drawback in 111) is not essential and can be solved technically, and therefore, the present invention is directed to the last of the above three means (iii).
ところで、真空メッキは一般に、るつぼ内の金属を蒸発
させ、この蒸発金属を線状体等に付着させるのであるが
、上記111)の欠点は、るつぼ内の金属を蒸発させる
、という点に根ざしている。By the way, vacuum plating generally evaporates the metal in a crucible and attaches this evaporated metal to a linear object, etc., but the drawback of 111) above is rooted in the fact that the metal in the crucible is evaporated. There is.
即ち、かかる方法においては、るつぼからの蒸発金属を
被メッキ物上に絞ることは難しく、換言すれば、蒸発金
属を被メッキ物上に集中させることは難しく、このため
、蒸発金属の無駄が多く、歩留りが悪かった。That is, in such a method, it is difficult to squeeze the evaporated metal from the crucible onto the object to be plated, in other words, it is difficult to concentrate the evaporated metal on the object to be plated, and for this reason, much of the evaporated metal is wasted. , the yield was poor.
特に、被メッキ物が、直径125μmという細い光ファ
イバの場合には、上記とあいまってさらに欠点が助長さ
れることになっていた。In particular, when the object to be plated is a thin optical fiber with a diameter of 125 μm, the above-mentioned drawbacks are further exacerbated.
本発明は、真空容器内に設置した2重るつぼ内で、金属
をその融点より少し高い温度で溶解させ、該金属に対し
ては当該金属の融点より相当に高い温度の加熱管をその
相当部分が上記金属液面から突出する状態で設けておき
、さらに該加熱管の内部に線状体を走行させるようにす
ることにより上記問題点を解決しようというもので、こ
れを図面に示す実施例を参照しながら説明すると、第1
図に示すように、真空容器1内に2重るつぼ2を設置し
、同るつぼ2内に、例えばアルミニウム等の金属3を入
れ、同るつぼ2を発熱体4の抵抗加熱により加熱するこ
とによって上記金属3溶融させる。The present invention involves melting a metal at a temperature slightly higher than its melting point in a double crucible placed in a vacuum container, and heating a heating tube at a temperature considerably higher than the melting point of the metal for a considerable portion of the metal. The idea is to solve the above problem by providing a heating tube in such a way that it protrudes from the surface of the metal liquid, and by running a linear body inside the heating tube. To explain with reference, the first
As shown in the figure, a double crucible 2 is installed in a vacuum container 1, a metal 3 such as aluminum is placed in the crucible 2, and the crucible 2 is heated by resistance heating of a heating element 4. Melt metal 3.
この溶融した金属3中に、円筒状の加熱管4′の先端部
を挿入してその残部が同金属3の液面から上方に突出し
た状態とし、同加熱管4′をその外周に配置した抵抗加
熱体5により加熱する。The tip of a cylindrical heating tube 4' was inserted into the molten metal 3 so that the remaining part protruded upward from the liquid level of the metal 3, and the heating tube 4' was placed around the outer periphery of the molten metal 3. Heating is performed by a resistance heating element 5.
かかる状態で、金属3、即ちアルミニウムをその融点よ
り少し高い温度たる680’Cに設定する。In this state, the temperature of metal 3, that is, aluminum, is set at 680'C, which is slightly higher than its melting point.
この温度でのアルミニウムの蒸気圧力は低いので、真空
容器1内の圧力を10−’トール程度の高真空状態にし
てもアルミニウムは殆ど蒸発しない。Since the vapor pressure of aluminum is low at this temperature, almost no aluminum evaporates even if the pressure inside the vacuum container 1 is set to a high vacuum state of about 10-'Torr.
次に加熱管4′の温度を、上記アルミニウムの融点より
相当高い温度たるsoo’c以上にする。Next, the temperature of the heating tube 4' is set to above soo'c, which is considerably higher than the melting point of the aluminum.
上記のように、金属3と加熱管4′との温度を設定する
と、加熱管4′の温度は、金属3のそれより相当に高い
ので、金属3は、第2図に示すように、加熱管4′の内
周壁をはい上ることになる。When the temperatures of the metal 3 and the heating tube 4' are set as described above, the temperature of the heating tube 4' is considerably higher than that of the metal 3, so the metal 3 is heated as shown in FIG. It will climb up the inner circumferential wall of the tube 4'.
こうしてはい上った金属3′は、加熱管4′によって高
温に加熱され、その温度の蒸気圧に応じて蒸発する。The metal 3' that has climbed up in this way is heated to a high temperature by the heating tube 4', and evaporates according to the vapor pressure at that temperature.
他方、加熱管4′の内部においてその上方から2重るつ
ぼ2の内管6にかけて、光ファイバ7を上方から下方に
向けて走行するようにしておけば、上記蒸発金属8は、
光ファイバ7に付着することになる。On the other hand, if the optical fiber 7 is run from above to the inner tube 6 of the double crucible 2 inside the heating tube 4' from above to the bottom, the evaporated metal 8 can be
It will adhere to the optical fiber 7.
上記加熱管4′の上方には、光ファイバ7を囲むように
高周波コイル9を設けておくのが好ましく、かかる状態
で放電させれば、加熱管4′の上部に達する多少の蒸発
金属8は、励起されて光ファイバ7に被覆されることに
なる。It is preferable to provide a high frequency coil 9 above the heating tube 4' so as to surround the optical fiber 7. If discharge is carried out in such a state, some of the evaporated metal 8 reaching the upper part of the heating tube 4' will be removed. , will be excited and coated on the optical fiber 7.
即ち、光ファイバ7には、最初にイオンプレーテイング
がなされ、次いで真空メッキが行なわれることになり、
従って蒸発金属8の付着強度が犬になると共にメッキ効
率が増大する。That is, the optical fiber 7 is first subjected to ion plating and then vacuum plating.
Therefore, as the adhesion strength of the evaporated metal 8 increases, the plating efficiency increases.
尚、10及び11は、発熱体4及び抵抗加熱体5の夫々
の外周に設けられた断熱材であり、熱効率をよくするた
めのものである。Note that 10 and 11 are heat insulating materials provided on the outer peripheries of the heating element 4 and the resistance heating element 5, respectively, to improve thermal efficiency.
また、12は真空容器1の外周に配置された冷却管であ
り、同容器1が高温になるのを防止するためのものであ
る。Further, 12 is a cooling pipe arranged around the outer periphery of the vacuum container 1, and is used to prevent the container 1 from becoming high temperature.
ここでより具体的な例について述べるト、1)2重るつ
ぼ2の容積を約8 c41加熱管4′の内径を16mm
、その長さを30〜40cIrLとして、また2重るつ
ぼ2にはBN(ボロンライト)を使用し、加熱管4′に
はセラミックを用い、2重るつぼ2の容積の8割に達す
るまでニッケルを充填した。Here we will discuss a more specific example: 1) The volume of the double crucible 2 is approximately 8 mm, and the inner diameter of the C41 heating tube 4' is 16 mm.
, the length was set to 30 to 40 cIrL, BN (boronite) was used for the double crucible 2, ceramic was used for the heating tube 4', and nickel was added until it reached 80% of the volume of the double crucible 2. Filled.
光ファイバ7は、外径125μ瓶のものを使用し、発熱
体4にMIOヒータを用い、高周波コイル9には周波数
1 3. 5 6 MHzで1kWの電力を通じた。The optical fiber 7 has an outer diameter of 125μ, an MIO heater is used as the heating element 4, and the high frequency coil 9 has a frequency of 1.3. Passed 1 kW of power at 5 6 MHz.
1i)外径20間のPVC被覆ケーブルをメッキすべき
線条体とし、線速2 0 0 m/分で走行させ、アル
ミニウムを数百オングストロームの厚さで被覆した。1i) A PVC-coated cable with an outer diameter of 20 mm was used as the filament to be plated, and was run at a linear speed of 200 m/min to coat aluminum to a thickness of several hundred angstroms.
被覆厚は均一であった。The coating thickness was uniform.
尚、2重るつぼ2に充填する金属としては、アルミニウ
ム、ニッケルの他、鉛、銅、クロム、チタン、インジウ
ム等が用いられる。Note that as the metal to be filled in the double crucible 2, other than aluminum and nickel, lead, copper, chromium, titanium, indium, etc. are used.
さらに膜厚を犬にするには、本発明に係る上記構造を2
重にすればよい。In order to further reduce the film thickness, the above structure according to the present invention is
Just make it heavier.
以上のように本発明は、るつぼ内の金属を蒸発させるの
ではなく、加熱管をはい上る金属を蒸発させるのである
から、蒸発金属を絞ることが可能となり、従って、蒸発
金属の歩留りが向上する。As described above, the present invention does not evaporate the metal in the crucible, but evaporates the metal climbing up the heating tube, so it is possible to narrow down the evaporated metal, and therefore, the yield of evaporated metal is improved. .
また、メッキ厚を犬にすることができるので、被メッキ
物の走行速度を上げることができる。Furthermore, since the plating thickness can be reduced, the traveling speed of the object to be plated can be increased.
さらに、被メッキ物の周囲から金属が蒸発するので、周
上均一な厚さのメッキが得られることになる。Furthermore, since the metal evaporates from the periphery of the object to be plated, a uniform thickness of plating can be obtained over the circumference.
第1図は本発明に係る方法に使用される装置を示す概略
部分断面図、第2図は同装置の要部を示す概略断面図で
ある。
1・・・・・・真空容器、2・・・・・・2重るつぼ、
3・・・・・・金属、4′・・・・・・加熱管、I・・
・・・・光ファイバ。FIG. 1 is a schematic partial sectional view showing an apparatus used in the method according to the present invention, and FIG. 2 is a schematic sectional view showing essential parts of the apparatus. 1... Vacuum container, 2... Double crucible,
3...Metal, 4'...Heating tube, I...
...Optical fiber.
Claims (1)
設けると共に該るつぼで溶解した金属の液面上には加熱
管を立てておき、上記2重るつぼ内の金属をその融点よ
り少し高い温度で溶解させると共に上記加熱管を上記金
属の融点より相当に高い温度に設定し、さらに該加熱管
の内部に線状体を走行させるようにしたことを特徴とす
る線状体の金属メッキ方法。 2 金属はアルミニウム、銅、クロム、ニッケル、鉛、
チタン、インジウムの中から選定されることを特徴とす
る特許請求の範囲第1項記載の線状体の金属メッキ方法
。[Claims] 1. A double crucible for melting metal is provided in a vacuum container, and a heating tube is placed above the liquid level of the metal melted in the crucible, and the metal in the double crucible is The linear body is melted at a temperature slightly higher than the melting point of the metal, the heating tube is set at a temperature considerably higher than the melting point of the metal, and a linear body is run inside the heating tube. Body metal plating method. 2 Metals include aluminum, copper, chromium, nickel, lead,
A method for metal plating a linear body according to claim 1, wherein metal plating is selected from titanium and indium.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP56126502A JPS5848627B2 (en) | 1981-08-12 | 1981-08-12 | Metal plating method for linear objects |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP56126502A JPS5848627B2 (en) | 1981-08-12 | 1981-08-12 | Metal plating method for linear objects |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS5827977A JPS5827977A (en) | 1983-02-18 |
| JPS5848627B2 true JPS5848627B2 (en) | 1983-10-29 |
Family
ID=14936789
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP56126502A Expired JPS5848627B2 (en) | 1981-08-12 | 1981-08-12 | Metal plating method for linear objects |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS5848627B2 (en) |
Families Citing this family (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS59154405A (en) * | 1983-02-22 | 1984-09-03 | Fujikura Ltd | Metal coated optical fiber |
| JPH0735569B2 (en) * | 1987-06-05 | 1995-04-19 | 三菱電機株式会社 | Thin film forming equipment |
| CN109609914A (en) * | 2019-02-27 | 2019-04-12 | 昆山国显光电有限公司 | A kind of crucible and its heating control method, evaporation equipment |
-
1981
- 1981-08-12 JP JP56126502A patent/JPS5848627B2/en not_active Expired
Also Published As
| Publication number | Publication date |
|---|---|
| JPS5827977A (en) | 1983-02-18 |
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