Deprecated: The each() function is deprecated. This message will be suppressed on further calls in /home/zhenxiangba/zhenxiangba.com/public_html/phproxy-improved-master/index.php on line 456
JPS5854466B2 - Magnetic field discharge device - Google Patents
[go: Go Back, main page]

JPS5854466B2 - Magnetic field discharge device - Google Patents

Magnetic field discharge device

Info

Publication number
JPS5854466B2
JPS5854466B2 JP15234781A JP15234781A JPS5854466B2 JP S5854466 B2 JPS5854466 B2 JP S5854466B2 JP 15234781 A JP15234781 A JP 15234781A JP 15234781 A JP15234781 A JP 15234781A JP S5854466 B2 JPS5854466 B2 JP S5854466B2
Authority
JP
Japan
Prior art keywords
anode
cathode
magnetic field
discharge device
discharge
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
JP15234781A
Other languages
Japanese (ja)
Other versions
JPS5853146A (en
Inventor
賀都鴻 影山
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Toshiba Corp
Original Assignee
Tokyo Shibaura Electric Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Tokyo Shibaura Electric Co Ltd filed Critical Tokyo Shibaura Electric Co Ltd
Priority to JP15234781A priority Critical patent/JPS5854466B2/en
Publication of JPS5853146A publication Critical patent/JPS5853146A/en
Publication of JPS5854466B2 publication Critical patent/JPS5854466B2/en
Expired legal-status Critical Current

Links

Classifications

    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J41/00Discharge tubes for measuring pressure of introduced gas or for detecting presence of gas; Discharge tubes for evacuation by diffusion of ions
    • H01J41/12Discharge tubes for evacuating by diffusion of ions, e.g. ion pumps, getter ion pumps

Landscapes

  • Electron Tubes For Measurement (AREA)

Description

【発明の詳細な説明】 この発明は磁場中放電装置に関する。[Detailed description of the invention] The present invention relates to a magnetic field discharge device.

磁場中放電装置の一種類であるクロストフィールド放電
装置の従来の構成及び問題点について、クロストフィー
ルド放電装置の一種類であるPIG放電装置を例にして
述べる。
The conventional configuration and problems of a crossed field discharge device, which is one type of magnetic field discharge device, will be described using a PIG discharge device, which is one type of crossed field discharge device, as an example.

第1図は従来のPIG放電装置の縦断面図であり、1は
陽極で円筒状中空部2を有している。
FIG. 1 is a longitudinal sectional view of a conventional PIG discharge device, in which numeral 1 denotes an anode and has a cylindrical hollow portion 2. As shown in FIG.

3は該陽極1の開口端の夫々に離間かつ近接して配設さ
れた2個1組の板状の陰極である。
Reference numeral 3 designates a set of two plate-shaped cathodes that are disposed close to and apart from each of the open ends of the anode 1.

4は該陽極1及び陰極3を収容する真空容器の1部であ
る管で、該陽極1は管4に保持されるとともに電気的に
は管4及びフランジ5を通して、該フランジ5に接続さ
れる真空装置の真空容器に接続され接地される。
4 is a tube that is part of a vacuum container that houses the anode 1 and the cathode 3; the anode 1 is held in the tube 4 and electrically connected to the flange 5 through the tube 4 and the flange 5; Connected to the vacuum vessel of the vacuum device and grounded.

6は外部に絶縁を施された導体柱で、2個の該陰極を相
互に一体に固定すると共に電気的に接続する。
Reference numeral 6 denotes a conductor column insulated from the outside, which fixes the two cathodes together and electrically connects them.

7は導体柱で、その内の一本は給電端子8に固定され、
その他は絶縁支持部材9に固定される。
7 is a conductor column, one of which is fixed to the power supply terminal 8;
Others are fixed to the insulating support member 9.

各導体柱7の他端は該陰極3の一個に固定されて該陰極
3を保持し、該給電端子8及びそれに固定された導体柱
7は該陰極3への給電経路を形成し、図示されない電源
の負の高電圧出力は該給電端子8に印加されて該陰極3
と陽極1の間に電圧が印加される。
The other end of each conductor column 7 is fixed to one of the cathodes 3 to hold the cathode 3, and the power supply terminal 8 and the conductor column 7 fixed thereto form a power supply path to the cathode 3, not shown. The negative high voltage output of the power supply is applied to the feed terminal 8 and the cathode 3
A voltage is applied between the anode 1 and the anode 1.

10は磁石で前記陽極の中空部2にその軸心と実質的に
平行な磁場を印加する。
A magnet 10 applies a magnetic field substantially parallel to the axis of the hollow part 2 of the anode.

以上のように構成されたPIG放電装置は、イオンポン
プ、真空計感圧部等として利用されるが、その共通の問
題点は、陰極物質のスパッタリングによる陽極中空部の
変形である。
The PIG discharge device configured as described above is used as an ion pump, a vacuum gauge pressure sensitive section, etc., but a common problem with these devices is deformation of the anode hollow portion due to sputtering of the cathode material.

これをPIG放電状態を説明する第2図に基づいて述べ
ると、陽極の中空部2には矢印Bで示される磁場と、直
流電源13により陽極1及び陰極3間に与えられる電位
差により電子群が捕獲され放電が維持される。
To explain this based on FIG. 2 which explains the PIG discharge state, a group of electrons is generated in the hollow part 2 of the anode due to the magnetic field indicated by arrow B and the potential difference given between the anode 1 and the cathode 3 by the DC power supply 13. is captured and the discharge is maintained.

陽極の中空部2内に形成される放電空間に飛来した分子
は該電子群の電子によりイオン化され、イオン流Iを形
成し、該陰極3を衝撃し陰極物質をスパッタし、スパッ
タされた原子流Sを生じる。
Molecules that fly into the discharge space formed in the hollow part 2 of the anode are ionized by the electrons of the electron group, forming an ion stream I, which impacts the cathode 3 and sputters the cathode material, creating a sputtered atomic stream. produces S.

スパッタされた原子は陰極3の表面か、陽極1の内表面
に衝突して捕獲され、捕獲される面に吸着されていた分
子を埋め込んで堆積し、堆積層Cを形成する。
The sputtered atoms collide with the surface of the cathode 3 or the inner surface of the anode 1 and are captured, and the molecules adsorbed on the captured surface are embedded and deposited to form a deposited layer C.

放電の経過と共に該堆積層Cは厚さを増し、該陽極の中
空部2は縮少変形する。
As the discharge progresses, the thickness of the deposited layer C increases, and the hollow part 2 of the anode shrinks and deforms.

陽極の中空部2の縮少は該放電空間の電場を変化させて
放電状態が所期のものから変化するという悪影響をもた
らし、厚くなった堆積層は放電空間の電子に衝撃されて
脱離する等電子群との相互作用により放電を不安定にす
るという悪影響をももたらす。
The shrinkage of the hollow part 2 of the anode has the negative effect of changing the electric field in the discharge space and changing the discharge state from the desired one, and the thickened deposited layer is bombarded by electrons in the discharge space and detached. Interaction with isoelectronic groups also has the adverse effect of making the discharge unstable.

本発明は上記した従来の欠点を改善するためになされた
もので、堆積層の形成による放電状態の変化及び放電不
安定性の発現を抑制したクロスフィールド放電装置を提
供しようとするものである。
The present invention has been made in order to improve the above-mentioned conventional drawbacks, and aims to provide a cross-field discharge device in which changes in discharge conditions and discharge instability caused by the formation of a deposited layer are suppressed.

以下本発明の一実施例であるPIG放電装置を図面に基
づいて説明する。
DESCRIPTION OF THE PREFERRED EMBODIMENTS A PIG discharge device which is an embodiment of the present invention will be described below based on the drawings.

第3図は正断面図、第4図は第3図におけるL−L線断
面図であり、図中第1図と同一のものには同一の番号を
付しである。
3 is a front sectional view, and FIG. 4 is a sectional view taken along the line L--L in FIG. 3, in which the same parts as in FIG. 1 are given the same numbers.

陽極1は貫通した中空部を有する管状の基体11と、該
基体11に固着され基体の中空部の軸心に向って延在し
、かつ相互に接触しない12個の翼片12と、該翼片1
2の夫々の基体11の中空部の軸心に最も近い表面の部
分を連ねた面上の一部に異なる翼片の全てを電気的に接
続する連絡部材14で構成される。
The anode 1 includes a tubular base body 11 having a hollow portion passing through it, twelve wing pieces 12 that are fixed to the base body 11 and extend toward the axis of the hollow portion of the base body and do not contact each other, and the wings. Piece 1
The connecting member 14 electrically connects all of the different wing pieces to a part on a surface that connects the parts of the surface closest to the axis of the hollow part of each of the two base bodies 11.

2個1組で構成された板状の陰極3は陽極1の開口端の
夫々に離間かつ近接して配設される。
A pair of plate-shaped cathodes 3 are disposed close to and apart from each of the open ends of the anode 1.

15は導体柱で2個の陰極3を相互に固定すると共に電
気的に接続するもので、その外部には絶縁層が形成され
、遮蔽板15aは該保護層を保護する。
Reference numeral 15 is a conductor column that fixes the two cathodes 3 to each other and electrically connects them. An insulating layer is formed on the outside of the conductor column, and the shielding plate 15a protects the protective layer.

16は導体柱で陰極3を支持するとともに陰極3に給電
する給電経路を形成し、陽極1と陰極3の間に電圧を印
加できるように構成されている。
Reference numeral 16 is a conductor column that supports the cathode 3 and forms a power supply path for feeding power to the cathode 3, so that a voltage can be applied between the anode 1 and the cathode 3.

10は磁石で陽極1の形成する中空部2に、その軸芯と
実質的に平行である磁場を発生する。
A magnet 10 generates a magnetic field substantially parallel to the axis of the hollow part 2 formed by the anode 1.

次に上記装置の作用を説明する。Next, the operation of the above device will be explained.

陽陰極間電圧と磁場の強さが適切なとき、連結部材14
の内側表面と交わる磁力線と2個の陰極3の陽極1側の
表面は円柱を形成し、放電を維持する電子群は該円柱内
だけに存在する。
When the voltage between anode and cathode and the strength of the magnetic field are appropriate, the connecting member 14
The lines of magnetic force that intersect with the inner surfaces of the two cathodes 3 and the surfaces of the two cathodes 3 on the anode 1 side form a cylinder, and the electron group that maintains the discharge exists only within the cylinder.

互に隣接する翼片12の間に入った電子は磁場に沿って
連結部材14に衝突し吸収されるので、翼片12及び基
体11により3方向を囲まれ、他の一方向は陽極の中空
部2の該円柱に面する空間には放電は生成されない。
Electrons that enter between adjacent blades 12 collide with the connecting member 14 along the magnetic field and are absorbed, so they are surrounded in three directions by the blades 12 and the base 11, and the other direction is surrounded by the hollow of the anode. No discharge is generated in the space facing the cylinder of part 2.

該円柱内に存在する電子群の電子により、気体分子はイ
オン化され、生成されたイオンは2個の陰極3のいずれ
かに衝突する。
Gas molecules are ionized by the electrons of the electron group existing within the cylinder, and the generated ions collide with either of the two cathodes 3.

イオン衝撃によりスパッタされた陰極物質の一部は対面
する陰極面に衝突して捕獲され、スパッタされた陰極物
質の残りの一部は陽極1の表面に衝突して捕獲され堆積
し、堆積層を形成する。
A part of the cathode material sputtered by ion bombardment collides with the facing cathode surface and is captured, and the remaining part of the sputtered cathode material collides with the surface of the anode 1 and is captured and deposited, forming a deposited layer. Form.

本発明の陽極の構成により、陰極物質の捕獲は基体11
の内面、翼片12の側面及び陽極の中空部2の軸芯に面
する端面、連結部材14の側面及び陽極の中空部2の軸
芯に面する内筒で行われる。
Due to the configuration of the anode of the present invention, the capture of cathode material is achieved by the substrate 11.
, the side surface of the blade 12 and the end surface facing the axis of the hollow section 2 of the anode, the side surface of the connecting member 14 and the inner cylinder facing the axis of the hollow section 2 of the anode.

上記構成から明らかなように、陰極物質は放電を維持す
る電子群に接しない基本11の内面及び翼片12の側面
に大部分が捕獲される。
As is clear from the above configuration, most of the cathode material is captured on the inner surface of the base 11 and the side surfaces of the blades 12 that are not in contact with the electron group that maintains the discharge.

したがって、該電子群と該堆積層の相互作用は大幅に抑
制され該相互作用による放電不安定性の発現は抑制され
るという効果が得られる。
Therefore, the interaction between the electron group and the deposited layer is significantly suppressed, and the effect of suppressing the occurrence of discharge instability due to the interaction is obtained.

更に翼片12の端面及び連結部材14の内面に堆積した
陰極物質の一部は電子群により空間へ再放出されるが、
再放出された物質の大部分は該陽極の基体11の内面か
、あるいは翼片12の側面に捕獲されるので、翼片12
の端面及び連結部材14の内面への陰極物質の堆積を抑
制され、堆積層の形成による放電状態の変化を抑制する
ことができる。
Furthermore, some of the cathode material deposited on the end surfaces of the blades 12 and the inner surface of the connecting member 14 is re-emitted into space by the electron group.
Since most of the re-emitted material is captured on the inner surface of the anode substrate 11 or on the side surfaces of the winglets 12,
The deposition of the cathode material on the end face of the connecting member 14 and the inner surface of the connecting member 14 can be suppressed, and changes in the discharge state due to the formation of a deposited layer can be suppressed.

以上のように連結部材14は翼片12及び基体11に三
方を囲まれた空間に寄生放電が発生することを抑制する
という効果がある。
As described above, the connecting member 14 has the effect of suppressing the occurrence of parasitic discharge in the space surrounded on three sides by the wing pieces 12 and the base body 11.

この効果は、陽陰極間電圧と磁場の強さによっては図に
示す連結材14では達成されないことがある。
This effect may not be achieved with the connecting member 14 shown in the figure, depending on the voltage between the anode and cathode and the strength of the magnetic field.

その場合には、連結部材14は翼片と基体が陽極の軸芯
に垂直な面に作る空間を実質的に全面的に覆う部分を有
するようにして、寄生放電の発生を抑制することができ
る。
In that case, the connecting member 14 can have a portion that substantially completely covers the space created by the blades and the base in a plane perpendicular to the axis of the anode, thereby suppressing the generation of parasitic discharge. .

なお、本発明は図に示すPIG放電装置のみに限定され
るものではなく、他の形のクロストフィールド放電装置
にも適用可能である。
Note that the present invention is not limited to the PIG discharge device shown in the figure, but is also applicable to other types of crossed field discharge devices.

【図面の簡単な説明】[Brief explanation of drawings]

第1図は従来のPIG放電装置の縦断面図、第2図はP
IG放電状態説明図、第3図は本発明の一実施例を示す
PIG放電装置の断面図、第4図は第3図におけるL−
L線断面図である。 1・・・・・・陽極、2・・・・・・陽極の中空部、3
・・・・・・陰極、11・・・・・・基体、12・・・
・・・翼片、14・・・・・・連結部材、15.16・
・・・・・導体柱、B・・・・・・磁場、■・・・・・
・イオン流、S・・・・・・原子流、C・・・・・・堆
積層、10・・・・・・磁石、13・・・・・・直流電
源。
Figure 1 is a vertical cross-sectional view of a conventional PIG discharge device, and Figure 2 is a PIG discharge device.
FIG. 3 is a cross-sectional view of a PIG discharge device showing an embodiment of the present invention, and FIG. 4 is a diagram for explaining the IG discharge state.
It is a sectional view taken along the L line. 1... Anode, 2... Hollow part of the anode, 3
...Cathode, 11...Substrate, 12...
... Wing piece, 14 ... Connection member, 15.16.
...Conductor column, B...Magnetic field, ■...
- Ion flow, S... Atomic flow, C... Deposition layer, 10... Magnet, 13... DC power supply.

Claims (1)

【特許請求の範囲】[Claims] 1 貫通した中空部を有する基体と該基体に固着され該
基体の中空部の軸芯に向って延在しかつ相互に接触しな
い複数の翼片と、該翼片の夫々の該基体の中空部の軸芯
に最も近い表面の部分を連ねた面上の少くとも一部に異
なる翼片を電気的に接続する連結部材とからなる陽極と
、該陽極に形成される開口端の夫々に離間かつ近接して
配設された2個1組の板状部を有する陰極と、該陽極と
陰極の間に電圧を印加する手段と、該陽極の形成する中
空部にその軸芯と実質的に平行である磁場を発生する手
段とを有することを特徴とする磁場中放電装置。
1. A base body having a penetrating hollow part, a plurality of wing pieces fixed to the base body, extending toward the axis of the hollow part of the base body and not in contact with each other, and a hollow part of each of the wing pieces of the base body. an anode comprising a connecting member that electrically connects different blades on at least a portion of a surface connecting the surface portions closest to the axis of the anode; a cathode having a set of two plate-shaped parts disposed close to each other; a means for applying a voltage between the anode and the cathode; 1. A magnetic field discharge device comprising means for generating a magnetic field.
JP15234781A 1981-09-26 1981-09-26 Magnetic field discharge device Expired JPS5854466B2 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP15234781A JPS5854466B2 (en) 1981-09-26 1981-09-26 Magnetic field discharge device

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP15234781A JPS5854466B2 (en) 1981-09-26 1981-09-26 Magnetic field discharge device

Publications (2)

Publication Number Publication Date
JPS5853146A JPS5853146A (en) 1983-03-29
JPS5854466B2 true JPS5854466B2 (en) 1983-12-05

Family

ID=15538548

Family Applications (1)

Application Number Title Priority Date Filing Date
JP15234781A Expired JPS5854466B2 (en) 1981-09-26 1981-09-26 Magnetic field discharge device

Country Status (1)

Country Link
JP (1) JPS5854466B2 (en)

Also Published As

Publication number Publication date
JPS5853146A (en) 1983-03-29

Similar Documents

Publication Publication Date Title
US4710283A (en) Cold cathode ion beam source
US3913320A (en) Electron-bombardment ion sources
EP1825491B1 (en) Ion source with substantially planar design
US4163151A (en) Separated ion source
JPS6020440A (en) Ion beam processing equipment
US12051560B2 (en) Ion gun and ion milling machine
CN113993261A (en) Magnetic enhanced plasma bridge electron source
JPS5854466B2 (en) Magnetic field discharge device
US4939425A (en) Four-electrode ion source
US4891525A (en) SKM ion source
US3452923A (en) Tetrode ion pump
JP3359447B2 (en) Ion gun
JPH0353402Y2 (en)
US4572982A (en) Apparatus for reducing the effects of thermal stresses on breakdown voltage in high voltage vacuum devices
JPH10275566A (en) Ion source
US6220821B1 (en) Ion pump having protective mask components overlying the cathode elements
US5149415A (en) Film forming apparatus
JPS5822855B2 (en) Triode ion pump
JPH024979B2 (en)
JPH0668961B2 (en) Fast atom beam source
JP3213135B2 (en) Fast atom beam source
EP0095879B1 (en) Apparatus and method for working surfaces with a low energy high intensity ion beam
JP2008077857A (en) Ion gun, method using vacuum processing apparatus equipped with ion gun
JPS5853144A (en) Triode type ion pump
JPH01161699A (en) High-speed atomic beam source